Wafer ammonia counterflow furnace

Abstract

The application provides a wafer ammonia reverse furnace, and belongs to the technical field of wafer preparation, which solves the technical problem of uneven contact of ammonia with the wafer surface in the existing one-way flow direction. The wafer ammonia reverse furnace comprises a lower frame, a fixed upper frame on the lower frame, a furnace chamber formed in the upper frame, a furnace canister arranged in the furnace chamber, a plurality of pairs of mounting seats arranged and fixed in the furnace canister, a placing plate arranged on each pair of mounting seats, a placing groove formed in the top surface of each placing plate, a ceramic net fixed at the groove opening of the placing groove, a plurality of blowing angle adjusting sleeves rotatably connected in the placing groove, a plurality of wafers placed on the ceramic net, a plurality of plug-in connectors fixed on each pair of mounting seats, and the top end of each plug-in connector is in a round head shape. The wafer ammonia reverse furnace has the advantages of changing the blowing angle of ammonia, improving the contact area of the wafer and ammonia, and improving the wafer reaction effect.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of wafer preparation, and relates to a reverse furnace, in particular to a wafer ammonia reverse furnace. BACKGROUND

[0002] The ammonia reverse furnace is a key equipment for processing photoresist in the field of microfabrication. It optimizes the pattern transfer effect of photoresist by utilizing the chemical properties of ammonia, especially its role as a polarity modifier.

[0003] After retrieval, a wafer forming equipment for a photovoltaic power station is disclosed in Chinese patent literature

Application Number: 202210893976.0; Publication Number: CN 115301899 A

[0004] Although the wafer liquid is automatically condensed and formed, manual operation is reduced, and work efficiency is improved in the patent, the application cannot cooperate with ammonia gas through ammonia gas derivatives (such as hexamethyldisilazane, HMDS), form a hydrophobic layer on the substrate surface through a silanization reaction, and ammonia gas can optimize the adsorption uniformity of HMDS, reduce bubbles and defects, and ammonia gas can be used as a cosolvent to adjust the polarity of the photoresist solution, and improve the uniformity of high-viscosity glue coating. SUMMARY

[0005] The purpose of the present application is to solve the above-mentioned problems existing in the prior art, and to provide a wafer ammonia reverse furnace. The technical problems to be solved by the present application are: how to change the blowing angle of ammonia gas, improve the contact area between the wafer and the ammonia gas, and improve the wafer reaction effect.

[0006] The purpose of the present application can be achieved by the following technical solutions:

[0007] The application discloses a wafer ammonia reverse furnace which comprises a lower frame, an upper frame fixed on the lower frame, a furnace chamber formed in the upper frame, a furnace can arranged in the furnace chamber, a plurality of pairs of mounting seats arranged and fixed in the furnace can, a placing plate arranged on each pair of mounting seats, a placing groove formed in the top surface of each placing plate, a ceramic net fixed at the groove opening of the placing groove, a plurality of blowing angle adjusting sleeve openings rotatably connected in the placing groove, a plurality of wafers placed on the ceramic net, a plurality of plug-in connectors fixed on each pair of mounting seats, a round head formed at the top end of each plug-in connector, a plurality of plug-in grooves formed in the left and right sides of each placing plate, a leakage-proof adhesive layer fixed in each plug-in groove, a plurality of conveying channels one formed in the left and right sides of each placing plate, a plurality of driving cavities formed in the left and right sides of each placing plate, the driving cavities and the plug-in grooves in communication through the corresponding conveying channels one, a driving rod rotatably connected in each driving cavity, a ceramic blade arranged and fixed on each driving rod, a reciprocating screw coaxially fixedly connected to the bottom end of each driving rod, a plurality of control racks slidingly connected to the left and right sides of each placing plate, each control rack in threaded connection with the corresponding reciprocating screw, a plurality of control gears rotatably connected to the left and right sides of each placing plate, each control rack in meshing connection with the corresponding control gear, each control gear coaxially fixedly connected with the corresponding blowing angle adjusting sleeve opening, and a plurality of ammonia blowing seats fixed in each placing plate, and a blowing opening of each ammonia blowing seat extending into the bottom opening of the corresponding blowing angle adjusting sleeve opening.

[0008] The working principle of the application is that when ammonia is conveyed, the ammonia flows into the driving cavities through the conveying channels one, and the ceramic blades are pushed through the thrust brought by the ammonia flow, so that the ceramic blades drive the driving rods to rotate, the driving rods drive the reciprocating screws to rotate after rotating, the reciprocating screws drive the control racks to move up and down after rotating, the control racks drive the corresponding control gears to reciprocating rotate after moving up and down, so that the blowing angle adjusting sleeve opening can swing at an angle, so that the contact area of the wafer and the ammonia is increased when the ammonia blowing seats blow the ammonia, and the wafer reaction effect is improved.

[0009] The upper frame is fixed with an ammonia frame, the ammonia frame is fixed with an ammonia pipeline, the ammonia frame is fixed with an ammonia interface, each connector is provided with a gas outlet, one end of the ammonia pipeline is connected with the ammonia interface, and the other end of the ammonia pipeline is divided into a plurality of branch pipes, each branch pipe is fixedly connected with a quick connector one, the furnace body is provided with a pair of quick connectors two, each quick connector one is inserted and matched with the corresponding quick connector two, and each quick connector two is connected with the corresponding gas outlet, and each gas outlet is connected with the corresponding conveying channel one, and each placing plate is provided with a plurality of conveying channels two on the left and right sides, one end of each conveying channel two is communicated with the corresponding driving cavity, and the other end of each conveying channel two is connected with the gas blowing seat.

[0010] With the above structure, the external ammonia conveying pipeline can be connected through the ammonia interface, the ammonia enters the ammonia frame from the ammonia interface, and the ammonia is shunted into the corresponding gas inlet through the ammonia pipeline at this time, so that when the placing plate is inserted and matched with the mounting seat, the ammonia can flow into the conveying channel one, and the blowing angle adjusting sleeve can be swung at an angle, and the ammonia flowing in the driving cavity can be input into the ammonia blowing seat through the conveying channel two, and blown out through the ammonia blowing seat. At this time, the blowing angle adjusting sleeve swings at an angle, so that the blowing angle of the ammonia can be changed.

[0011] The furnace opening is rotatably connected with a furnace door, and the furnace door is a double-layer structure, the outer layer of the furnace door is made of aluminum alloy material, and the inner layer of the furnace door is made of silicon nitride material, the upper frame is provided with a glove box frame, and the glove box frame is hingedly connected with a protective door plate, the protective door plate and the glove box frame are fixed with a matched electromagnetic door lock, the inner edge of the protective door plate and the opening edge of the glove box frame are fixed with a high-temperature-resistant gas-tight gasket one, and the inner edge of the furnace door and the opening edge of the furnace are fixed with a high-temperature-resistant gas-tight gasket two. The ammonia frame, the glove box frame and the upper frame are fixed with exhaust pipes, each exhaust pipe is fixed with a wind valve, and each exhaust pipe is fixed with an exhaust fan.

[0012] With the above structure, the safety of the double-layer structure of the furnace door can be ensured, and the ammonia has strong corrosive property, the service life is improved by the double-layer structure, and the furnace and the outside are isolated by the glove box frame, so that the safety effect during use is further improved, and the ammonia frame, the glove box frame and the upper frame are exhausted through the exhaust pipes, so that when ammonia leakage occurs, the ammonia frame, the glove box frame and the upper frame can be exhausted through the exhaust pipes, and the safety performance is further improved.

[0013] The furnace surface is arranged with a plurality of heating pipes, and a plurality of vertical plates are fixedly arranged on the furnace surface, and a partition plate is fixed between each adjacent vertical plate, and each partition plate covers a corresponding heating pipe.

[0014] With the above structure, the furnace can be heated by the heating pipes, and the heating pipes are covered by the vertical plates and the partition plates to protect the heating pipes and improve the overall structural strength of the furnace.

[0015] The ammonia gas alarm is fixed in the ammonia gas chamber and the furnace chamber, the support frame is fixed on the pad frame by bolts, the top surface of the support frame is fixed with the furnace, and a pair of mounting plates are fixed on the top of the furnace.

[0016] With the above structure, the furnace can be lifted by the support frame and the pad frame, so that the furnace has space between the furnace and the furnace, and the furnace does not directly contact the furnace, improving the safety of the overall operation.

[0017] The bottom surface of the lower frame is rotatably connected with two pairs of Forma wheels, and the liquid injection frame is fixed on the furnace, the liquid injection cavity is provided in the liquid injection frame, the electrorheological fluid is arranged in the liquid injection cavity, the piston is slidably arranged in the liquid injection cavity, the rotating seat is rotatably connected to the liquid injection frame, the cross-shaped knife slot is provided in the rotating seat, the drive screw is rotatably connected to the liquid injection cavity, the drive sleeve rod is threadedly connected to the drive screw, the drive sleeve rod is fixedly connected with the piston, and the drive screw is coaxially fixedly connected with the rotating seat.

[0018] With the above structure, the Forma wheel can realize the integration of movement and fixation of the device, the Forma wheel base can be adjusted to switch between moving and fixed states (the wheels are in contact with the ground when moving, and the base supports the ground when fixed), the rotating seat can be rotated by engaging the cross-shaped knife slot with the cross-shaped screwdriver, the drive screw can be rotated after the rotating seat is rotated, the drive sleeve rod can be pushed to move, the piston can be further pushed to move, and the electrorheological fluid in the liquid injection cavity can be input into the liquid capsule, at this time the liquid capsule expands and engages with the corresponding limiting slot, and the electrorheological fluid is solidified by the positive and negative charges, thereby realizing the quick disassembly and assembly of the quick connector one and the quick connector two.

[0019] The inside of the furnace is divided into various temperature zones by the various placing plates, and a plurality of high-precision thermocouples are fixed in the corresponding temperature zones in the furnace.

[0020] With the above structure, the temperature of each temperature zone can be sensed by the high-precision thermocouple, so as to uniformly heat the furnace tube by cooperating with the heating tube, and improve the temperature control precision.

[0021] The exhaust valve is fixed on the furnace tube, the input end of the exhaust valve is communicated with the inside of the furnace tube, and the output end of the exhaust valve is communicated with the furnace.

[0022] With the above structure, the ammonia gas in the furnace tube can be pre-discharged into the furnace by the exhaust valve, and then the ammonia gas can be extracted and discharged through the exhaust pipeline, so that the personnel can normally collect the wafer in the furnace tube.

[0023] Compared with the prior art, the wafer ammonia gas reverse furnace has the following advantages:

[0024] 1. The blowing angle adjusting sleeve can swing, and the ammonia gas flowing in the driving cavity can be input into the ammonia gas blowing seat through the conveying channel two, and blown out through the ammonia gas blowing seat. At this time, the blowing angle adjusting sleeve swings, which can change the blowing angle of the ammonia gas, improve the contact area of the wafer and the ammonia gas, and improve the wafer reaction effect.

[0025] 2. The ammonia gas frame, glove box frame and upper frame are exhausted through the exhaust pipeline, so that when ammonia gas leakage occurs, the ammonia gas frame, glove box frame and upper frame can be exhausted through the exhaust pipeline, further improving the safety performance.

[0026] 3. The furnace tube is lifted by the supporting frame and the pad frame, so that the furnace tube has space with the furnace, and the furnace tube does not directly contact the furnace, improving the safety of the whole operation.

[0027] 4. The temperature of each temperature zone is sensed by the high-precision thermocouple, so as to uniformly heat the furnace tube by cooperating with the heating tube, and improve the temperature control precision. BRIEF DESCRIPTION OF DRAWINGS

[0028] Figure 1 is a structural schematic diagram of the present application.

[0029] Figure 2 is a structural schematic diagram of the present application after the protection door is opened.

[0030] Figure 3 is a structural schematic diagram of the present application after the furnace door is opened.

[0031] Figure 4 is a structural schematic diagram of the furnace tube in the present application.

[0032] Figure 5 is a structural schematic diagram of the inside of the furnace tube in the present application.

[0033] Figure 6is the structural schematic diagram of the inside of the ammonia gas frame in the application.

[0034] Figure 7 is the structural schematic diagram of the inside of the placing plate in the application.

[0035] Figure 8 is the structural schematic diagram of the inside of the ammonia gas blowing seat in the application.

[0036] Figure 9 is the top view schematic diagram of the inside structure of the placing plate in the application.

[0037] Figure 10 is the top view schematic diagram of the inside structure of the liquid injection frame in the application.

[0038] Figure 11 is the structural schematic diagram of the un-inflated state of the liquid capsule in the application.

[0039] Figure 12 is the structural schematic diagram of the inflated state of the liquid capsule in the application.

[0040] Figure 13 is the structural schematic diagram of the inflated state of the liquid capsule in the application. Figure 7 is the enlarged schematic diagram of the structure of the a area in the application.

[0041] In the figure, 1, lower frame; 2, upper frame; 3, furnace; 4, furnace; 5, mounting seat; 6, placing plate; 7, placing groove; 8, ceramic net; 9, blowing angle adjusting sleeve opening; 10, plug; 11, plug groove; 12, leak-proof adhesive layer; 13, conveying channel one; 14, driving cavity; 15, driving rod; 16, ceramic blade; 17, reciprocating screw; 18, control rack; 19, control gear; 20, ammonia gas blowing seat; 21, ammonia gas pipeline; 22, ammonia gas interface; 23, ammonia gas frame; 24, gas outlet; 25, conveying channel two; 26, furnace door; 27, glove box frame; 28, electromagnetic door lock; 29, exhaust pipeline; 30, air valve; 31, heating pipe; 32, vertical plate; 33, partition plate; 34, protection door plate; 35, ammonia gas alarm; 36, pad frame; 37, support frame; 38, mounting plate; 39, Foma wheel; 40, high-precision thermocouple; 41, exhaust valve; 42, quick connector one; 43, quick connector two; 44, liquid injection frame; 45, liquid injection cavity; 46, piston; 47, rotating seat; 48, driving screw; 49, driving sleeve rod; 50, liquid capsule; 51, positive and negative charges; 52, limiting groove; 53, high-temperature-resistant pipeline. DETAILED DESCRIPTION

[0042] The following is a specific embodiment of the application and further describes the technical solutions of the application in conjunction with the drawings, but the application is not limited to these embodiments.

[0043] As Figures 1-13As shown, a wafer ammonia reversing furnace, including lower frame 1, the upper frame 2 fixed on the lower frame 1, the hearth 3 is opened in the upper frame 2, the furnace 4 is arranged in the hearth 3, a plurality of pairs of mounting seats 5 are arranged and fixed in the furnace 4, the placing plate 6 is arranged on each mounting seat 5, the top surface of each placing plate 6 is provided with a placing groove 7, the notch of the placing groove 7 is fixed with a ceramic net 8, and a plurality of blowing angle adjusting sleeve openings 9 are rotatably connected in the placing groove 7, a plurality of wafers are placed on the ceramic net 8, a plurality of plug-in connectors 10 are fixed on each mounting seat 5, the top end of each plug-in connector 10 is in a round head shape, and a plurality of plug-in slots 11 are arranged on the left and right sides of each placing plate 6, a leakage-proof adhesive layer 12 is fixed in each plug-in slot 11, a plurality of conveying channels 1 are arranged on the left and right sides of each placing plate 6, a plurality of drive cavities 14 are arranged on the left and right sides of each placing plate 6, each plug-in slot 11 and the drive cavity 14 are communicated through the corresponding conveying channel 1, the drive rod 15 is rotatably connected in each drive cavity 14, the ceramic blade 16 is arranged and fixed on each drive rod 15, the reciprocating lead screw 17 is coaxially fixedly connected to the bottom end of each drive rod 15, a plurality of control racks 18 are slidably connected to the left and right sides of each placing plate 6, each control rack 18 is threadedly connected with the corresponding reciprocating lead screw 17, a plurality of control gears 19 are rotatably connected to the left and right sides of each placing plate 6, each control rack 18 is engaged with the corresponding control gear 19, and each control gear 19 is coaxially fixedly connected with the corresponding blowing angle adjusting sleeve opening 9, and a plurality of ammonia blowing seats 20 are fixed in each placing plate 6, the blowing port of each ammonia blowing seat 20 extends into the bottom opening of the corresponding blowing angle adjusting sleeve opening 9.

[0044] The working principle of the present application is: when the ammonia gas is conveyed, the ammonia gas flows into the drive cavity 14 through the conveying channel 1, and the ceramic blade 16 is pushed by the thrust generated by the ammonia gas flow, so as to drive the drive rod 15 to rotate, and the reciprocating lead screw 17 is driven to rotate after the drive rod 15 rotates, and the control rack 18 is driven to move up and down after the reciprocating lead screw 17 rotates, and the corresponding control gear 19 is driven to reciprocate after the control rack 18 moves up and down, so that the blowing angle adjusting sleeve opening 9 can swing at an angle, so that the contact area of the wafer and the ammonia gas is increased when the ammonia blowing seat 20 blows the ammonia gas, and the wafer reaction effect is improved.

[0045] The upper frame 2 is fixed with an ammonia frame 23, the ammonia frame 23 is fixed with an ammonia pipeline 21, the ammonia frame 23 is fixed with an ammonia interface 22, each plug connector 10 is provided with a gas outlet 24, one end of the ammonia pipeline 21 is connected with the ammonia interface 22, and the other end of the ammonia pipeline 21 is divided into a plurality of branch pipes, and each branch pipe is fixedly connected with a quick connector one 42, the furnace body 4 is provided with a pair of quick connector two 43, each quick connector one 42 is inserted and matched with the corresponding quick connector two 43, each quick connector two 43 is connected with the corresponding gas outlet 24, and each gas outlet 24 is connected with the corresponding conveying channel one 13, and the left and right sides of each placing plate 6 are provided with a plurality of conveying channels two 25, one end of each conveying channel two 25 is communicated with the corresponding driving cavity 14, and the other end of each conveying channel two 25 is connected with the gas inlet of the ammonia blowing seat 20.

[0046] With the above structure, the external ammonia conveying pipeline can be connected through the ammonia interface 22, the ammonia enters the ammonia frame 23 from the ammonia interface 22, and the ammonia is shunted and conveyed into the corresponding gas inlet through the ammonia pipeline 21, so that when the placing plate 6 is inserted and matched with the mounting seat 5, the ammonia can flow into the conveying channel one 13, and the blowing angle adjusting sleeve 9 can be swung at an angle, and the ammonia flowing in the driving cavity 14 can be input into the ammonia blowing seat 20 through the conveying channel two 25, and blown out through the ammonia blowing seat 20, so that the blowing angle adjusting sleeve 9 can change the blowing angle of the ammonia.

[0047] The furnace door 26 is rotatably connected at the opening of the hearth 3, and the furnace door 26 is a double-layer structure, the outer layer structure of the furnace door 26 is made of aluminum alloy material, and the inner layer structure of the furnace door 26 is made of silicon nitride material, the upper frame 2 is provided with a glove box frame 27, and the glove box frame 27 is hingedly connected with a protective door plate 34, the protective door plate 34 and the glove box frame 27 are fixed with a matched electromagnetic door lock 28, the inner edge of the protective door plate 34 and the opening edge of the glove box frame 27 are fixed with high-temperature-resistant gas-tight gaskets one, the inner edge of the furnace door 26 and the opening edge of the hearth 3 are fixed with high-temperature-resistant gas-tight gaskets two, the ammonia frame 23, the glove box frame 27 and the upper frame 2 are fixed with exhaust pipelines 29, each exhaust pipeline 29 is fixed with a wind valve 30, and each exhaust pipeline 29 is fixed with an exhaust fan.

[0048] With the above structure, safety can be ensured through the double-layer structure of the furnace door 26, and ammonia gas has strong corrosive properties, so the service life is improved through the double-layer structure, and the furnace 3 is isolated from the outside through the glove box frame 27, further improving the safety effect during use, and the ammonia gas frame 23, the glove box frame 27, and the upper frame 2 are exhausted through the exhaust pipe 29, so that when ammonia gas leakage occurs, the ammonia gas frame 23, the glove box frame 27, and the upper frame 2 can be exhausted through the exhaust pipe 29, further improving the safety performance.

[0049] The furnace tube 4 is fixed with a plurality of heating pipes 31 on the surface, and a plurality of vertical plates 32 are fixed on the surface of the furnace tube 4. Each vertical plate 32 is fixed with a partition plate 33 between adjacent vertical plates 32, and each partition plate 33 covers the corresponding heating pipe 31.

[0050] With the above structure, the furnace tube 4 can be heated by the heating pipe 31, and the heating pipe 31 can be protected by the vertical plate 32 and the partition plate 33, and the overall structural strength of the furnace tube 4 is improved.

[0051] The ammonia gas alarm 35 is fixed in the ammonia gas frame 23 and the furnace 3, the pad frame 36 is fixed in the furnace 3, the support frame 37 is fixed on the pad frame 36 through bolts, the top surface of the support frame 37 is fixed with the furnace tube 4, and a pair of mounting plates 38 are fixed on the top of the furnace tube 4. The mounting plate 38 is fixed in the furnace 3 by bolts.

[0052] With the above structure, the furnace tube 4 can be lifted by the support frame 37 and the pad frame 36, so that the furnace tube 4 has space with the furnace 3, and the furnace tube 4 will not directly contact the furnace 3, improving the safety of the overall operation.

[0053] The bottom surface of the lower frame 1 is rotatably connected with two pairs of Forma wheels 39, and the liquid injection frame 44 is fixed on the furnace tube 4. The liquid injection cavity 45 is formed in the liquid injection frame 44, and the electrorheological fluid is arranged in the liquid injection cavity 45. The piston 46 is slidably arranged in the liquid injection cavity 45, the rotating seat 47 is rotatably connected to the liquid injection frame 44, the cross-shaped knife slot is formed in the rotating seat 47, the drive screw 48 is rotatably connected to the liquid injection cavity 45, the drive sleeve rod 49 is threadedly connected to the drive screw 48, the drive sleeve rod 49 is fixedly connected with the piston 46, and the drive screw 48 is coaxially fixedly connected with the rotating seat 47. Each quick connector two 43 is fixed with a liquid capsule 50, each liquid capsule 50 is fixed with positive and negative charges 51, and each quick connector one 42 is provided with a limiting groove 52. The high-temperature-resistant pipeline 53 is arranged on the liquid injection frame 44, one end of the high-temperature-resistant pipeline 53 communicates with the liquid injection cavity 45, and the other end of the high-temperature-resistant pipeline 53 communicates with each liquid capsule 50.

[0054] With the above structure, the movement and fixing of the device can be realized by the form wheel 39, the movement or fixing state of the device can be switched by adjusting the base of the form wheel 39 (the wheel is in contact with the ground when moving, and the base supports the ground when fixed), the rotating seat 47 is rotated by the person using the cross screwdriver to engage the cross cutter, the driving screw 48 is rotated after the rotating seat 47 is rotated, the driving sleeve rod 49 is pushed to move by the driving screw 48, the piston 46 is further pushed to move by the driving sleeve rod 49, and the current variable liquid in the liquid injection cavity 45 is input into the liquid sac 50, at this time the liquid sac 50 is expanded and matched with the corresponding limiting groove 52, and the current variable liquid is solidified by the positive and negative charges 51, so that the quick socket one 42 and the quick socket two 43 can be quickly disassembled and assembled.

[0055] The inside of the furnace tube 4 is divided into various temperature zones by the various placing plates 6, and a plurality of high-precision thermocouples 40 corresponding to the temperature zones are fixed in the furnace tube 4.

[0056] With the above structure, the temperature of each temperature zone can be sensed by the high-precision thermocouple 40, and the furnace tube 4 is uniformly heated by the heating pipe 31, so as to improve the temperature control precision.

[0057] The furnace tube 4 is fixed with an exhaust valve 41, the input end of the exhaust valve 41 is communicated with the inside of the furnace tube 4, and the output end of the exhaust valve 41 is communicated with the furnace chamber 3.

[0058] With the above structure, the ammonia gas in the furnace tube 4 can be pre-discharged into the furnace chamber 3 through the exhaust valve 41, and then the ammonia gas is extracted and discharged through the exhaust pipeline 29, so that the person can normally collect the wafer in the furnace tube 4.

[0059] The working principle of the present application is as follows: the wafer coated with photoresist is placed on the ceramic net 8, at this time the furnace door 26 is closed with the protection door plate 34, at this time the furnace 4 is heated by the heating pipe 31, and the wafer is reacted under high temperature and vacuum state, and during the reaction process, the ammonia gas is connected with the external ammonia gas pipeline through the ammonia gas interface 22, the ammonia gas enters the ammonia gas frame 23 from the ammonia gas interface 22, at this time the ammonia gas is shunted and delivered into the corresponding gas inlet through the ammonia gas pipeline 21, so when the placing plate 6 is inserted and matched with the mounting seat 5, the ammonia gas can flow into the conveying channel I 13, the ammonia gas flows into the driving cavity 14 through the conveying channel I 13, and the ammonia gas flow brings a pushing force to push the ceramic blade 16, so as to drive the driving rod 15 to rotate through the ceramic blade 16, after the driving rod 15 rotates, the reciprocating lead screw 17 is driven to rotate, after the reciprocating lead screw 17 rotates, the control rack 18 is driven to move up and down, after the control rack 18 moves up and down, the corresponding control gear 19 is driven to reciprocate, so that the blowing angle adjusting sleeve 9 can swing at an angle, and the ammonia gas flowing in the driving cavity 14 can be input into the ammonia gas blowing seat 20 through the conveying channel II 25, and blown out through the ammonia gas blowing seat 20, at this time the blowing angle adjusting sleeve 9 swings at an angle, so as to change the blowing angle of the ammonia gas, increase the contact area of the wafer and the ammonia gas, and improve the wafer reaction effect.

[0060] In summary, when the ammonia gas is delivered, the ammonia gas flows into the driving cavity 14 through the conveying channel I 13, and the ammonia gas flow brings a pushing force to push the ceramic blade 16, so as to drive the driving rod 15 to rotate through the ceramic blade 16, after the driving rod 15 rotates, the reciprocating lead screw 17 is driven to rotate, after the reciprocating lead screw 17 rotates, the control rack 18 is driven to move up and down, after the control rack 18 moves up and down, the corresponding control gear 19 is driven to reciprocate, so that the blowing angle adjusting sleeve 9 can swing at an angle, so that when the ammonia gas is blown by the ammonia gas blowing seat 20, the contact area of the wafer and the ammonia gas is increased, and the wafer reaction effect is improved.

[0061] The specific embodiments described herein merely exemplify the spirit of the present application. Those skilled in the art of the present application can make various modifications or supplements to the described specific embodiments or replace them with similar ways, without departing from the spirit of the present application or exceeding the scope defined by the appended claims.

Claims

1. A wafer ammonia counterflow furnace comprising a lower frame (1) and an upper frame (2) fixed on the lower frame (1), characterized in that, The upper frame (2) is provided with a hearth (3), the hearth (3) is provided with a furnace (4), the furnace (4) is arranged and fixed with a plurality of pairs of mounting seats (5), each pair of mounting seat (5) is provided with a placing plate (6), the top surface of each placing plate (6) is provided with a placing groove (7), the notch of the placing groove (7) is fixed with a ceramic net (8), and a plurality of blowing angle adjusting sleeves (9) are rotatably connected in the placing groove (7), the ceramic net (8) is placed with a plurality of wafers, a plurality of plug-in connectors (10) are fixed on each pair of mounting seat (5), the top end of each plug-in connector (10) is in a round head shape, and a plurality of plug-in grooves (11) are formed on the left and right sides of each placing plate (6), a leakage prevention adhesive layer (12) is fixed in each plug-in groove (11), a plurality of conveying channels (13) are formed on the left and right sides of each placing plate (6), a plurality of driving cavities (14) are formed on the left and right sides of each placing plate (6), each plug-in groove (11) and the driving cavity (14) are communicated through the corresponding conveying channel (13), a driving rod (15) is rotatably connected in each driving cavity (14), a ceramic blade (16) is arranged and fixed on each driving rod (15), a reciprocating screw (17) is coaxially fixedly connected to the bottom end of each driving rod (15), a plurality of control racks (18) are slidably connected to the left and right sides of each placing plate (6), each control rack (18) is threadedly connected with the corresponding reciprocating screw (17), a plurality of control gears (19) are rotatably connected to the left and right sides of each placing plate (6), each control rack (18) is engaged with the corresponding control gear (19), each control gear (19) is coaxially fixedly connected with the corresponding blowing angle adjusting sleeve (9), and a plurality of ammonia blowing seats (20) are fixed in each placing plate (6), the blowing port of each ammonia blowing seat (20) extends into the bottom opening of the corresponding blowing angle adjusting sleeve (9).

2. The wafer ammonia reverse furnace according to claim 1, wherein The upper frame (2) is fixed with an ammonia frame (23), the ammonia frame (23) is fixed with an ammonia pipeline (21), the ammonia frame (23) is fixed with an ammonia interface (22) outside, each plug connector (10) is provided with a gas outlet (24), one end of the ammonia pipeline (21) is connected with the ammonia interface (22), and the other end of the ammonia pipeline (21) is divided into a plurality of branch pipes, and each branch pipe is fixedly connected with a quick connector (42) at one end, the furnace (4) is provided with a pair of quick connectors (43), each quick connector (42) is inserted and matched with the corresponding quick connector (43), and each quick connector (43) is connected with the corresponding gas outlet (24), and each gas outlet (24) is connected with the corresponding conveying channel (13), and the left and right sides of each placing plate (6) are provided with a plurality of conveying channels (25), one end of each conveying channel (25) is communicated with the corresponding driving cavity (14), and the other end of each conveying channel (25) is connected with the gas inlet of the ammonia blowing seat (20).

3. The wafer ammonia reverse furnace according to claim 2, wherein The furnace (3) is rotatably connected with a furnace door (26) at the opening, and the furnace door (26) is a double-layer structure, the outer layer structure of the furnace door (26) is made of aluminum alloy material, and the inner layer structure of the furnace door (26) is made of silicon nitride material, the upper frame (2) is provided with a glove box frame (27), and the glove box frame (27) is hingedly connected with a protective door plate (34), the protective door plate (34) and the glove box frame (27) are fixed with a matched electromagnetic door lock (28), the inner edge of the protective door plate (34) and the opening edge of the glove box frame (27) are fixed with high-temperature-resistant gas-tight gaskets, the inner edge of the furnace door (26) and the opening edge of the furnace (3) are fixed with high-temperature-resistant gas-tight gaskets, the ammonia frame (23), the glove box frame (27) and the upper frame (2) are fixed with exhaust pipes (29), each exhaust pipe (29) is fixedly provided with a wind valve (30), and each exhaust pipe (29) is fixedly provided with an exhaust fan.

4. The wafer ammonia reverse furnace according to claim 1, wherein The surface of the furnace (4) is arranged with a plurality of heating pipes (31), and the surface of the furnace (4) is fixedly arranged with a plurality of vertical plates (32), each vertical plate (32) and the adjacent vertical plate (32) are fixedly provided with a partition plate (33), and each partition plate (33) covers the corresponding heating pipe (31).

5. The wafer ammonia reverse furnace according to claim 2, wherein The ammonia frame (23) and the furnace (3) are fixed with ammonia alarms (35), the furnace (3) is fixed with a backing plate frame (36), the backing plate frame (36) is fixedly provided with a support frame (37) through bolts, the top surface of the support frame (37) is fixed with the furnace (4), and the top of the furnace (4) is fixed with a pair of mounting plates (38), and the mounting plates (38) are fixedly connected with the furnace (3) through bolts.

6. The wafer ammonia reverse furnace according to claim 1, wherein The bottom surface of the lower frame (1) is rotationally connected with two pairs of Forma wheels (39), and the furnace tube (4) is fixed with a liquid injection frame (44), a liquid injection cavity (45) is formed in the liquid injection frame (44), and a current change liquid is arranged in the liquid injection cavity (45), a piston (46) is slidably arranged in the liquid injection cavity (45), a rotating seat (47) is rotationally connected to the liquid injection frame (44), a cross-shaped cutting edge is formed in the rotating seat (47), a drive screw (48) is rotationally connected to the liquid injection cavity (45), a drive sleeve rod (49) is threadedly connected to the drive screw (48), the drive sleeve rod (49) is fixedly connected with the piston (46), and the drive screw (48) is coaxially fixedly connected with the rotating seat (47), each quick connector two (43) is fixed with a liquid capsule (50), each liquid capsule (50) is fixed with positive and negative charges (51), each quick connector one (42) is formed with a limiting groove (52), and the liquid injection frame (44) is provided with a high-temperature-resistant pipeline (53), one end of the high-temperature-resistant pipeline (53) is communicated with the liquid injection cavity (45), and the other end of the high-temperature-resistant pipeline (53) is communicated with each liquid capsule (50).

7. The wafer ammonia reverse furnace according to claim 1, wherein The furnace tube (4) is divided into various temperature zones by the various placing plates (6), and a plurality of high-precision thermocouples (40) corresponding to the temperature zones are fixed in the furnace tube (4).

8. The wafer ammonia reverse furnace according to claim 1, wherein The furnace tube (4) is fixed with an exhaust valve (41), the input end of the exhaust valve (41) is communicated with the inside of the furnace tube (4), and the output end of the exhaust valve (41) is communicated with the furnace chamber (3).

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