Novel winding coating magnetic control cathode system device

Abstract

The invention relates to a novel winding and coating magnetic control cathode system device, and belongs to the field of vacuum coating equipment, the novel winding and coating magnetic control cathode system device comprises a vacuum chamber, a coating roller system, a supporting frame body, a sliding frame, a cathode system and a locking piece, the coating roller system is arranged in the vacuum chamber and used for conveying a base material roll material to the cathode system for coating, and then winding is conducted; the supporting frame body is arranged outside the vacuum cavity, the sliding frame is arranged on the supporting frame body in a sliding mode, the cathode system is arranged on the sliding frame and arranged on the vacuum cavity in a sliding and penetrating mode, and the locking piece is arranged on the sliding frame and used for locking the sliding frame to the supporting frame body. The application has the effects of reducing the interference of the coating roller system on the maintenance of the cathode system and improving the convenience of maintaining the cathode system by the winding vacuum coating equipment.

Description

Technical Field

[0001] This application relates to the field of vacuum coating equipment, and in particular to a novel roll-to-roll magnetic cathode coating system. Background Technology

[0002] Roll-to-roll vacuum coating equipment is a large-scale industrial device used for continuous coating of flexible substrates, such as metal foils and plastic films. It is widely used in industries such as lithium batteries, photovoltaics, and hydrogen energy. Inside the vacuum chamber, the substrate is loaded in roll form, starting from the unwinding roller, passing through the guide roller and flattening roller, and then coated on the surface of the main drum. Finally, the coated roll is retrieved by the rewinding roller. The commonly used technique is physical vapor deposition (PVD), but it is not limited to evaporation coating or magnetron sputtering coating.

[0003] Magnetron sputtering, a widely used roll-to-roll coating technology, uses ionized argon gas in a vacuum chamber to create plasma that bombards the cathode target material, depositing it onto the substrate surface in atomic or molecular form to form a stable thin film. The environmental pressure for magnetron sputtering is typically controlled between 0.1 and 1 Pa. The deposition process continuously consumes target material, necessitating regular cathode maintenance and target replacement. Modern large-scale roll-to-roll vacuum coating equipment features highly complex roller systems. With limited space between the roll material, rollers, main drum, and cathode, regularly replacing the target and protective plates in the cathode system presents a significant challenge. Summary of the Invention

[0004] To improve the ease of maintenance of the cathode system in roll-to-roll vacuum coating equipment, this application provides a novel roll-to-roll magnetically controlled cathode system device.

[0005] The novel roll-wound coated magnetron cathode system device provided in this application adopts the following technical solution: A novel roll-to-roll coating magnetron cathode system includes a vacuum chamber, a coating roller system, a support frame, a sliding frame, a cathode system, and a locking component. The coating roller system is disposed within the vacuum chamber and is used to transport the substrate roll to the cathode system for coating before winding. The support frame is disposed outside the vacuum chamber. The sliding frame is slidably disposed on the support frame. The cathode system is disposed on the sliding frame and slidably passes through the vacuum chamber. The locking component is disposed on the sliding frame and is used to lock the sliding frame to the support frame.

[0006] By adopting the above technical solution, the coating roller system conveys the substrate roll to the cathode system. After the cathode system coats the substrate, the coating roller system then rewinds the coated substrate. When maintenance of the cathode system is required, the locking device is released from the locking of the sliding frame on the support frame, and then the sliding frame is dragged away from the vacuum chamber. The sliding frame pulls the cathode system out of the vacuum chamber, which allows for maintenance of the cathode system. This reduces the interference of the coating roller system on the maintenance of the cathode system and improves the convenience of maintaining the cathode system in the winding vacuum coating equipment.

[0007] Optionally, the vacuum chamber includes a cavity, a large wall panel, a supporting beam, and a small wall panel. The cavity is hollow inside and open on one side. The large wall panel is detachably mounted on a sliding frame and is used to close the open end of the cavity. The supporting beam is mounted on the large wall panel, and the small wall panel is mounted on the end of the supporting beam away from the large wall panel. The coating roller system is mounted between the large wall panel and the small wall panel.

[0008] By adopting the above technical solution, the supporting beam supports and connects the large wall panel and the small wall panel, so that the large wall panel and the small wall panel form an overall space for the installation of the coating roller system. When the coating roller system needs to be maintained, the sliding frame is pulled away from the cavity. The sliding frame pulls the large wall panel out of the cavity, and the large wall panel pulls the coating roller system out of the cavity, which facilitates the maintenance of the coating roller system by the staff. When only the cathode system needs to be maintained, the connection between the large wall panel and the sliding frame is disconnected. At this time, the sliding frame is pulled away from the cavity, and the sliding frame only pulls the cathode system out from between the large wall panel and the small wall panel.

[0009] Optionally, the coating roller system includes an unwinding roller, a guide roller, a main drum, and a rewinding roller. The unwinding roller is disposed between the large wall panel and the small wall panel and is used for feeding the substrate roll. Multiple guide rollers are disposed between the large wall panel and the small wall panel. The main drum is disposed between the large wall panel and the small wall panel. A gap is left between the main drum and the cathode system for the substrate to pass through for coating. The rewinding roller is disposed between the large wall panel and the small wall panel and rewinds the coated substrate.

[0010] By adopting the above technical solution, the substrate roll is placed on the unwinding roller, and then the free end of the substrate roll is pulled and wound around multiple guide rollers and the main drum in sequence. The free end of the substrate roll is then wound around the take-up roller, and the take-up roller takes up the free end of the substrate. This allows the substrate to be pulled through the gap between the main drum and the cathode system, and the cathode system can then coat the substrate.

[0011] Optionally, the support frame is provided with a linear slide rail, and the sliding frame is provided with a mounting sleeve, which is slidably fitted onto the linear slide rail.

[0012] By adopting the above technical solution, the linear slide rail supports and guides the sliding of the mounting sleeve, thereby supporting and guiding the sliding of the sliding frame, improving the stability of the sliding frame driving the cathode system to move, reducing the possibility of the cathode system falling off the support frame, and ensuring the safety of the equipment.

[0013] Optionally, the sliding frame is provided with a cathode main support, which extends along the direction of the cathode system and is connected to the cathode system.

[0014] By adopting the above technical solution, the cathode main support supports the cathode system, improves the stability of the cathode system after it is removed from the cavity, and facilitates the maintenance of the cathode system.

[0015] Optionally, the cathode main support is longer than the cathode system on the side facing the small wall panel, and the cathode main support is bolted to the small wall panel.

[0016] By adopting the above technical solution, when the cathode system is installed into the cavity, the main cathode support is bolted to the small wall plate, thereby changing the main cathode support from a cantilever state to a fixed state, further improving the stability of the cathode system.

[0017] Optionally, the cathode system includes a support frame, a cathode body, a protective sleeve, and a transition flange. The support frame is mounted on a sliding frame, the cathode body is mounted on the support frame, the protective sleeve is fitted onto the support frame to enclose it, and the transition flange is mounted on the support frame and used for flange connection to the large wall panel.

[0018] By adopting the above technical solution, the support frame supports the cathode body, and the protective sleeve covers the cathode body inside the support frame, ensuring a good working environment for the cathode body. Furthermore, the detachable connection between the large wall panel and the sliding frame can be achieved by connecting the flange to the flange of the large wall panel.

[0019] Optionally, a first sealing ring is provided circumferentially on the side of the adapter flange facing the large wall panel, and a second sealing ring is provided circumferentially on the side of the large wall panel facing the cavity.

[0020] By adopting the above technical solution, the first sealing ring seals the space between the transition flange and the large wall plate, and the second sealing ring seals the space between the large wall plate and the cavity, thereby improving the sealing performance of the large wall plate when assembled onto the cavity and the cathode system when installed into the cavity.

[0021] Optionally, the protective sleeve includes multiple protective plates, which are bolted to the support frame to provide circumferential protection for the support frame.

[0022] By adopting the above technical solution, the protective plate is bolted to the support frame, which facilitates the installation and removal of the protective plate when maintaining the cathode body.

[0023] Optionally, the cathode body includes a cathode target, an auxiliary anode, a water-cooling pipe, and an argon gas dispersion pipe. The cathode target is slidably inserted into the support frame, the auxiliary anode is disposed on the support frame, the water-cooling pipe is arranged on the support frame and located on both sides of the cathode target, and one argon gas dispersion pipe is respectively provided on each side of the cathode target.

[0024] By adopting the above technical solution, multiple protective plates enclose the cathode target, auxiliary anode, water-cooling pipe, and argon gas dispersion pipe on the support frame, forming a magnetron sputtering space. This effectively controls the diffusion of argon gas input from the argon gas dispersion pipe, maintaining a better magnetron sputtering coating environment within the protective plate-enclosed magnetron sputtering space. Furthermore, it can control the pressure of the cavity outside the protective plate-enclosed magnetron sputtering space, creating an evaporation vacuum coating environment outside the protective plate-enclosed magnetron sputtering space. By separately controlling the pressure within the protective plate-enclosed magnetron sputtering space and the pressure of the cavity outside the protective plate-enclosed magnetron sputtering space, both magnetron sputtering coating and evaporation coating are compatible.

[0025] In summary, this application includes at least one of the following beneficial technical effects: 1. Drag the sliding frame away from the vacuum chamber. The sliding frame will pull the cathode system out of the vacuum chamber, which can be used to maintain the cathode system. This reduces the interference of the coating roller system on the maintenance of the cathode system and improves the convenience of maintaining the cathode system of the winding vacuum coating equipment. 2. When maintenance of the coating roller system is required, pull the sliding frame away from the cavity. The sliding frame will pull the large wall panel out of the cavity, and the large wall panel will pull the coating roller system out of the cavity, making it easier for staff to maintain the coating roller system. 3. By separately controlling the pressure within the magnetron sputtering space enclosed by the protective plate and the pressure in the cavity outside the magnetron sputtering space enclosed by the protective plate, both magnetron sputtering coating and evaporation coating can be compatible. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the structure of a novel roll-to-roll coated magnetron cathode system device according to an embodiment of this application.

[0027] Figure 2 This is a schematic diagram of the structure of the large wall panel extraction cavity according to an embodiment of this application.

[0028] Figure 3 This is a schematic diagram of the coating roller system according to an embodiment of this application.

[0029] Figure 4 This is a structural schematic diagram of the support frame and sliding frame according to an embodiment of this application.

[0030] Figure 5This is a structural schematic diagram of the support frame and sliding frame from another perspective of an embodiment of this application.

[0031] Figure 6 This is a schematic diagram of the cathode system according to an embodiment of this application.

[0032] Figure 7 This is a schematic diagram of the cathode system in an embodiment of this application after the protective sleeve has been concealed.

[0033] Figure 8 This is a schematic diagram of the partitioning within the cavity according to an embodiment of this application.

[0034] Reference numerals: 1. Vacuum chamber; 11. Chamber body; 12. Large wall panel; 13. Support beam; 14. Small wall panel; 2. Coating roller system; 21. Unwinding roller; 22. Guide roller; 23. Main drum; 24. Rewinding roller; 3. Support frame; 4. Sliding frame; 5. Cathode system; 51. Support frame; 52. Cathode body; 521. Cathode target; 522. Auxiliary anode; 523. Water cooling pipe; 524. Argon dispersion pipe; 53. Protective sleeve; 531. Protective plate; 54. Adapter flange; 6. Locking element; 7. Linear slide rail; 8. Mounting sleeve; 9. Cathode main support; 10. First sealing ring; 20. Second sealing ring. Detailed Implementation

[0035] The following is in conjunction with the appendix Figure 1-8 This application will be described in further detail.

[0036] This application discloses a novel roll-to-roll coated magnetron cathode system device.

[0037] Reference Figure 1 , Figure 2 The novel roll-to-roll coating magnetron cathode system includes a vacuum chamber 1, a coating roller system 2, a support frame 3, a sliding frame 4, a cathode system 5, and a locking component 6.

[0038] Reference Figure 2 , Figure 3 The vacuum chamber 1 includes a cavity 11, a large wall panel 12, a supporting beam 13, and small wall panels 14. The cavity 11 is hollow inside and open at one end. The large wall panel 12 is fastened to the open end of the cavity 11 and is detachably connected to the cavity 11 by bolts. A second sealing ring 20 is circumferentially installed on the side of the large wall panel 12 facing the cavity 11. The second sealing ring 20 abuts against the side wall of the open end of the cavity 11, thereby sealing the large wall panel 12 and the cavity 11 when the large wall panel 12 is fastened to the open end of the cavity 11, ensuring the airtightness of the vacuum chamber 11. Multiple supporting beams 13 are installed on the large wall panel 12, and small wall panels 14 are installed at the end of the supporting beam 13 away from the large wall panel 12.

[0039] The large wall panel 12, the supporting beam 13, and the small wall panel 14 form a stable overall space, which facilitates the subsequent installation of the coating roller system 2 and the cathode system 5 within the overall space formed by the large wall panel 12, the supporting beam 13, and the small wall panel 14, and the coating of the substrate within the space formed by the large wall panel 12 and the cavity 11.

[0040] Reference Figure 2 , Figure 3 The coating roller system 2 is installed inside the vacuum chamber 1. The coating roller system 2 is used to transport the substrate roll to the cathode system 5 for coating and then rewind the substrate. The coating roller system 2 includes an unwinding roller 21, a guide roller 22, a main drum 23, and a rewinding roller 24. The unwinding roller 21 is installed between the large wall plate 12 and the small wall plate 14. The substrate roll to be coated is fitted onto the unwinding roller 21. Multiple guide rollers 22 are installed between the large wall plate 12 and the small wall plate 14. The main drum 23 is installed between the large wall plate 12 and the small wall plate 14, and a gap is left between the main drum 23 and the cathode system 5 for the substrate to pass through for coating. In this embodiment, the gap between the main drum 23 and the cathode system 5 is... The thickness is 1-2mm, which allows the substrate to pass between the main drum 23 and the cathode system 5 for coating while increasing the gas barrier effect between the cathode system 5 and the outside, reducing the outflow of gas from the cathode system 5 to the outside. The take-up roller 24 is installed between the large wall plate 12 and the small wall plate 14. The take-up roller 24 is used to rewind the coated substrate to form a substrate roll. In this embodiment, the take-up roller 24 includes a roller body and a servo motor. The roller body is installed between the large wall plate 12 and the small wall plate 14, and the servo motor is installed on the large wall plate 12. The output shaft of the servo motor is coaxially connected to the roller body. When the servo motor is started, the servo motor drives the roller body to rotate, thereby winding the substrate.

[0041] The operator places the substrate roll to be coated onto the unwinding roller 21, then pulls the free end of the substrate roll to be wound sequentially onto multiple guide rollers 22 and the main drum 23. Finally, the free end of the substrate roll is connected to the take-up roller 24. The take-up roller 24 gradually pulls the substrate roll off the unwinding roller 21, pulling the substrate through the gap between the main drum 23 and the cathode system 5. The cathode system 5 can then coat the substrate. Then the take-up roller 24 rewinds the coated substrate to form a substrate roll.

[0042] Reference Figure 4 , Figure 5The support frame 3 is installed outside the vacuum chamber 1. In this embodiment, the support frame 3 includes a column support and a plane support. The column support is installed vertically on the ground outside the vacuum chamber 1, and the plane support is installed horizontally on the column support. Two linear slide rails 7 are installed on the support frame 3 along the direction towards the cavity 11. Both ends of the sliding frame 4 are equipped with mounting sleeves 8. The mounting sleeves 8 are slidably fitted on the linear slide rails 7, thereby realizing the sliding of the sliding frame 4 on the support frame 3. The locking member 6 is installed on the sliding frame 4 and is used to lock the sliding frame 4 on the support frame 3. In this embodiment, the locking member 6 includes a pin. Multiple pin holes are spaced apart on the linear slide rails 7 along the sliding direction of the sliding frame 4. The pin is slidably inserted into the mounting sleeve 8 and passes through one of the pin holes.

[0043] The linear guide rail 7 supports and guides the sliding of the mounting sleeve 8, thereby supporting and guiding the sliding of the sliding frame 4, improving the stability of the sliding frame 4 on the support frame 3. Furthermore, the sliding frame 4 and the two mounting sleeves 8 form a whole with a width greater than the distance between the two linear guide rails 7, reducing the possibility of the sliding frame 4 falling off the support frame 3 and ensuring the safety of the equipment.

[0044] Reference Figure 2 , Figure 3 The cathode system 5 is installed on the sliding frame 4 and slides through the large wall panel 12. The cathode system 5 and the large wall panel 12 are detachably connected. The bottom of the large wall panel 12 protrudes downward to form a protrusion. The height of the protrusion is the same as the height of the cavity 11 in contact with the ground. This allows the protrusion at the bottom of the large wall panel 12 to support the large wall panel 12 when it is subsequently removed from the cavity 11, thereby reducing the load on the sliding frame 4 when the large wall panel 12 is removed.

[0045] When maintenance of the cathode system 5 is required, disconnect the cathode system 5 from the large wall plate 12, then release the locking piece 6 from locking the sliding frame 4 on the support frame 3, and pull the sliding frame 4 away from the cavity 11. The sliding frame 4 can then pull the cathode system 5 out of the large wall plate 12 and the cavity 11 for convenient maintenance. When maintenance of the coating roller system 2 is required, disconnect the connection between the large wall plate 12 and the cavity 11, keeping the connection between the cathode system 5 and the large wall plate 12 intact, and then pull the sliding frame 4 away from the wall. The sliding frame 4 will pull the large wall plate 12 out of the cavity 11, and the large wall plate 12 will pull the coating roller system 2 out of the cavity 11 for easy maintenance by the staff.

[0046] Reference Figure 2 , Figure 4The sliding frame 4 is equipped with a cathode main support 9. The cathode main support 9 extends along the cathode system 5 in the direction toward the small wall plate 14. The cathode main support 9 is connected to the cathode system 5, and the length of the cathode main support 9 on the side toward the small wall plate 14 is greater than the length of the cathode system 5 on the side toward the small wall plate 14. When the large wall plate 12 is fastened to the cavity 11, the cathode main support 9 abuts against the small wall plate 14 and is bolted to the small wall plate 14.

[0047] The cathode system 5 extends into one side of the large wall panel 12 in a cantilever state. The cathode main support 9 supports the cathode system 5, improving the stability of the cathode system 5 during the movement process after the sliding frame 4 moves the cathode system 5 away from the cavity 11. This makes it easier for workers to pull out the cathode system 5 for maintenance. When the cathode system 5 is installed into the cavity 11, the cathode main support 9 can be bolted to the small wall panel 14, so that the cathode main support 9 also changes from a cantilever state to a fixed state, improving the stability of the cantilever section of the cathode system 5.

[0048] Reference Figure 5 , Figure 6 , Figure 7 The cathode system 5 includes a support frame 51, a cathode body 52, a protective sleeve 53, and a transition flange 54. The support frame 51 is mounted on the sliding frame 4, and the cathode body 52 is mounted on the support frame 51. The cathode body 52 includes a cathode target 521, an auxiliary anode 522, a water-cooling pipe 523, and an argon gas dispersion pipe 524. The support frame 51 has a space for inserting the cathode target 521, which is slidably inserted into the support frame 51. The auxiliary anode 522 is mounted on the support frame 51. One water-cooling pipe 523 is installed at each end of the support frame 51, with the two water-cooling pipes 523 located on opposite sides of the cathode target 521. One argon gas dispersion pipe 524 is installed on each side of the support frame 51 on opposite sides of the cathode target 521. The protective sleeve... The protective sleeve 53 is installed on the support frame 51. The protective sleeve 53 closes the outer perimeter of the support frame 51, leaving only a notch for the main drum 23 to drive the substrate to extend in. The protective sleeve 53 includes multiple protective plates 531, which are arranged along the outer perimeter of the support frame 51. All the protective plates 531 are bolted to the support frame 51. The transition flange 54 is installed on the end of the support frame 51 facing the large wall plate 12. The transition flange 54 is connected to the flange of the large wall plate 12. A first sealing ring 10 is installed circumferentially on the side of the transition flange 54 facing the large wall plate 12, so that when the transition flange 54 is connected to the large wall plate 12, the first sealing ring 10 abuts against the large wall plate 12, thereby sealing the transition flange 54 and the large wall plate 12 and improving the sealing performance of the cathode system 5 installed in the cavity 11.

[0049] The support frame 51 supports the various structures of the cathode body 52, and multiple protective plates 531 enclose and protect the various structures of the cathode body 52. ​​Simultaneously, water-cooling pipes 523 circulate coolant to cool the internal environment enclosed by the multiple protective plates 531, ensuring a good coating working environment. The protective sleeve 53, composed of multiple protective plates 531, facilitates the disassembly and assembly of the multiple protective plates 531 during maintenance of the cathode system 5, improving the ease of disassembly and assembly of the protective sleeve 53. Furthermore, the multiple protective plates 531 protect the cathode target 521, auxiliary anode 522, and water-cooling pipes. The protective plate 531 and argon gas dispersion tube 523 surround the support frame 51, forming a magnetron sputtering space. This effectively suppresses the diffusion of argon gas input through the argon gas dispersion tube 524. By controlling the argon gas input through the argon gas dispersion tube 524, the magnetron sputtering space formed by the protective plate 531 can be maintained at a vacuum pressure of 1 Pa, which is an optimal magnetron sputtering coating environment. Furthermore, by separating the magnetron sputtering space formed by the protective plate 531 from the cavity 11, the pressure in the cavity 11 outside the magnetron sputtering space formed by the protective plate 531 can be controlled at 10 Pa. -3 Pa causes an evaporation vacuum coating environment to be formed outside the magnetron sputtering space enclosed by the protective plate 531. By separately controlling the pressure inside the magnetron sputtering space enclosed by the protective plate 531 and the pressure in the cavity 11 outside the magnetron sputtering space enclosed by the protective plate 531, both magnetron sputtering coating and evaporation coating can be compatible.

[0050] The implementation principle of a novel roll-to-roll magnetically controlled cathode system device for coating in this application is as follows: The substrate roll is conveyed to the cathode system 5 via the coating roller system 2 for coating, and then rewound to achieve coating of the substrate. When maintenance of the coating roller system 2 is required, the bolts connecting the large wall panel 12 and the cavity 11 are removed, and the locking piece 6 is released to position the sliding frame 4 on the support frame 3. Then, the sliding frame 4 is pulled away from the cavity 11, and the sliding frame 4 can then drive the large wall panel 12 and the small wall panel 14 out of the cavity 11 via the cathode system 5. The coating roller system 2 can be easily pulled out of the cavity 11 for convenient maintenance. If the cathode system 5 needs to be maintained, the connection between the adapter flange 54 and the large wall plate 12 can be disconnected, and then the sliding frame 4 can be pulled away from the large wall plate 12. The sliding frame 4 can then drive the cathode system 5 to detach from the large wall plate 12. Then the protective plate 531 and the cathode target 521 can be removed for maintenance of the cathode system 5. This reduces the interference of the coating roller system 2 on the maintenance of the cathode system 5 and improves the convenience of maintaining the cathode system 5 in the winding vacuum coating equipment.

[0051] The above are all preferred embodiments of the present application, and are not intended to limit the scope of protection of the present application. Therefore, any equivalent changes made based on the structure, shape, and principle of the present application should be included in the scope of protection of the present application.

Claims

1. A novel roll-to-roll coated magnetron cathode system device, characterized in that: The system includes a vacuum chamber (1), a coating roller system (2), a support frame (3), a sliding frame (4), a cathode system (5), and a locking element (6). The coating roller system (2) is located inside the vacuum chamber (1) and is used to transport the substrate roll to the cathode system (5) for coating and then rewinding. The support frame (3) is located outside the vacuum chamber (1). The sliding frame (4) is slidably mounted on the support frame (3). The cathode system (5) is mounted on the sliding frame (4) and slides through the vacuum chamber (1). The locking element (6) is mounted on the sliding frame (4) and is used to lock the sliding frame (4) to the support frame (3).

2. The novel roll-to-roll coated magnetron cathode system device according to claim 1, characterized in that: The vacuum chamber (1) includes a cavity (11), a large wall panel (12), a supporting beam (13), and a small wall panel (14). The cavity (11) is hollow inside and open on one side. The large wall panel (12) is detachably mounted on the sliding frame (4) and is used to close the open end of the cavity (11). The supporting beam (13) is mounted on the large wall panel (12). The small wall panel (14) is mounted on the end of the supporting beam (13) away from the large wall panel (12). The coating roller system (2) is mounted between the large wall panel (12) and the small wall panel (14).

3. The novel roll-to-roll coated magnetron cathode system device according to claim 2, characterized in that: The coating roller system (2) includes an unwinding roller (21), a guide roller (22), a main drum (23), and a rewinding roller (24). The unwinding roller (21) is arranged between the large wall plate (12) and the small wall plate (14) and is used to provide the substrate roll. Multiple guide rollers (22) are arranged between the large wall plate (12) and the small wall plate (14). The main drum (23) is arranged between the large wall plate (12) and the small wall plate (14). A gap is left between the main drum (23) and the cathode system (5) for the substrate to pass through for coating. The rewinding roller (24) is arranged between the large wall plate (12) and the small wall plate (14) and rewinds the coated substrate.

4. The novel roll-to-roll coated magnetron cathode system device according to claim 1, characterized in that: The support frame (3) is provided with a linear slide rail (7), and the sliding frame (4) is provided with an installation sleeve (8), which is slidably mounted on the linear slide rail (7).

5. The novel roll-to-roll coated magnetron cathode system device according to claim 1, characterized in that: The sliding frame (4) is provided with a cathode main support (9), which extends along the direction of the cathode system (5) and is connected to the cathode system (5).

6. The novel roll-to-roll coated magnetron cathode system device according to claim 5, characterized in that: The cathode main support (9) is longer than the cathode system (5) on the side facing the small wall plate (14), and the cathode main support (9) is bolted to the small wall plate (14).

7. A novel roll-to-roll coated magnetron cathode system device according to claim 2, characterized in that: The cathode system (5) includes a support frame (51), a cathode body (52), a protective sleeve (53), and a transition flange (54). The support frame (51) is mounted on the sliding frame (4), the cathode body (52) is mounted on the support frame (51), the protective sleeve (53) is fitted onto the support frame (51) to enclose the support frame (51), and the transition flange (54) is mounted on the support frame (51) and is used for flange connection to the large wall panel (12).

8. A novel roll-to-roll coated magnetron cathode system device according to claim 7, characterized in that: The transition flange (54) is provided with a first sealing ring (10) on the side facing the large wall panel (12), and the large wall panel (12) is provided with a second sealing ring (20) on the side facing the cavity (11).

9. A novel roll-to-roll coated magnetron cathode system device according to claim 7, characterized in that: The protective sleeve (53) includes multiple protective plates (531), which are bolted to the support frame (51) to provide circumferential protection for the support frame (51).

10. A novel roll-to-roll coated magnetron cathode system device according to claim 7, characterized in that: The cathode body (52) includes a cathode target (521), an auxiliary anode (522), a water-cooling pipe (523), and an argon dispersion pipe (524). The cathode target (521) is slidably inserted on the support frame (51). The auxiliary anode (522) is set on the support frame (51). The water-cooling pipe (523) is arranged on the support frame (51) and located on both sides of the cathode target (521). There is one argon dispersion pipe (524) on each side of the cathode target (521).

Images