Preparation method of high-refraction non-conductive low-stress coating material and application of the material in light efficiency film

Abstract

This invention relates to the field of optical coating technology and discloses a method for preparing high-refractive-index non-conductive low-stress coating materials and their application in optically effective thin films. The method involves coating a flexible substrate with a UV adhesive, imprinting a micro / nano structure onto the UV adhesive layer using a pressing machine, and then placing the imprinted substrate in a vacuum coating machine for vacuum coating. A post-oxidation sputtering coating technique is used to alternately deposit low-refractive-index material SiAlO and high-refractive-index material NbAlO on the substrate surface to form a multilayer antireflection and anti-reflection film system. Using Si and Al targets as raw materials, oxygen is simultaneously introduced into both targets to obtain low-refractive-index SiAlO; using Nb and Al targets as raw materials, oxygen is simultaneously introduced into both targets to obtain high-refractive-index NbAlO. This method combines high- and low-refractive-index non-conductive materials with magnetron sputtering deposition to stack T*PVD micro / nano 3A optically effective thin films on a flexible substrate structure to address solar radiation issues and the poor adhesion caused by thick film layers.

Description

Technical Field

[0001] This invention relates to the field of optical coating technology, specifically a technique for preparing a composite layer of high refractive index non-conductive material (SiAlN) and low refractive index material (SiNO) through sputtering coating process. This technique is used to prepare a high refractive index non-conductive low stress coating material for hardening and antireflection thin films on glass substrates and its application in optically effective thin films. Background Technology

[0002] T*PVD micro / nano 3A luminous efficacy films are luminous efficacy films with 3A certification achieved at the micro / nano scale, formed by combining target-material type and physical vapor deposition. These T*PVD micro / nano 3A luminous efficacy films achieve different wavelength requirements by stacking high and low refractive index materials on a resin-based substrate with varying refractive index thicknesses. Examples include: high transmittance and low reflection in the visible light range of 380-780nm, and high transmittance and low reflection in the infrared range of 800-1300nm, while simultaneously achieving low-stress functionality / decorative properties and reliability advantages. Currently, 3A luminous efficacy films are widely used in consumer electronics decoration and screens, laptop screens, automotive center console screens / windshields, and other fields, possessing an extremely broad market potential.

[0003] Existing 3A light-efficiency films on the market require the use of high and low refractive index materials on glass substrates. However, glass is not shatter-resistant, easily deformed under high stress, and is costly. Currently, due to the inability to solve the high stress problem, it is impossible to deposit films larger than 1000nm onto resin-based substrates to achieve non-conductive, high-transmittance, and low-reflection properties. Thicker films are also prone to cracking and peeling. In terms of performance, solar radiation and vibration / friction tests fail to meet the film's durability requirements, and adhesion is poor, resulting in significant product limitations. Summary of the Invention

[0004] In view of this, in order to overcome the shortcomings of the prior art, the purpose of this invention is to provide a method for preparing high-refractive-index non-conductive low-stress coating materials and their application in optical efficiency thin films. By combining high- and low-refractive-index non-conductive materials with magnetron sputtering deposition and stacking of T*PVD micro-nano 3A optical efficiency thin films on a flexible substrate structure, the problem of solar radiation is solved, and the problem of poor adhesion caused by thick film layers is addressed, thus achieving the customer's demand for high quality and high saturation. It also meets the customer's requirements for high transmittance and low reflectance in different wavelength bands and reduces costs.

[0005] To achieve the above objectives, the present invention provides the following technical solution:

[0006] In a first aspect, the present invention provides a method for preparing a high-refractive-index non-conductive low-stress coating material, comprising the following steps:

[0007] A UV adhesive is coated on the surface of a flexible substrate, and a micro-nano structure is imprinted on the surface of the UV adhesive layer using an imprinter. The substrate with the imprinted texture is then placed in a vacuum coating machine for vacuum coating.

[0008] Using post-oxidation sputtering deposition technology, low-refractive-index material SiAlO and high-refractive-index material NbAlO are alternately deposited on the substrate surface to form a multilayer antireflective (AR) film system, wherein:

[0009] Using Si and Al targets as raw materials, oxygen is simultaneously introduced into both Si and Al targets to obtain the low-refractive-index material SiAlO.

[0010] Using Nb and Al targets as raw materials, oxygen is simultaneously introduced into both Nb and Al targets to obtain the high refractive index material NbAlO.

[0011] As a further embodiment of the present invention, the flexible substrate is a PET film with a thickness of 50-125 μm, and the UV adhesive coating thickness is 10-20 μm.

[0012] As a further aspect of the present invention, when coating the surface of the flexible substrate with UV adhesive, the refractive index of the UV adhesive is controlled to be 1.51-1.52, and the pencil hardness is 2H-3H.

[0013] As a further aspect of the present invention, when imprinting micro-nano structures on the surface of a UV adhesive layer using an imprinter, the haze is controlled to be 3-30 and the gloss to be 15-25.

[0014] As a further aspect of the present invention, when the substrate is placed in a vacuum coating machine for vacuum coating, the vacuum is evacuated to 5.0 × 10⁻⁻⁻⁶. 4 Pa up to 2.0 × 10⁻ 4 Pa, the temperature of the storage compartment is heated to 60℃-80℃.

[0015] As a further aspect of the present invention, the ion ratio of the Si target to the Al target is Si: 80%, Al: 20%; the ion ratio of the Nb target to the Al target is Nb: 92%, Al: 8%.

[0016] As a further aspect of the present invention, when oxygen is simultaneously introduced into both Si and Al targets to obtain the low-refractive-index material SiAlO, the power of the Si target is controlled at 18-20 kW, the power of the Al target is controlled at 9-10 kW, the vacuum chamber pressure is 3.0×10⁻¹Pa, and the ion ratio is Si:Al = 80%:20% to 60%:40%; the non-conductive low-stress refractive index of the 600 nm coating is controlled between 1.49 and 1.51 by using the spectral transmission and reflection curve.

[0017] As a further aspect of the present invention, when oxygen is simultaneously introduced into both Nb and Al targets to obtain the high-refractive-index material NbAlO, the power of the Nb target is controlled at 18-20 kW, the power of the Al target is controlled at 9-10 kW, the vacuum chamber pressure is 3.0×10⁻¹Pa, and the ion ratio is Nb:Al = 92%:8% to 85%:15%; the non-conductive low-stress refractive index of the 600 nm coating is controlled between 2.29 and 2.31 by using the spectral transmission and reflection curve.

[0018] As a further embodiment of the present invention, the AR film structure consists of alternating stacked SiAlO and NbAlO layers, with a total of 9 layers and a thickness of 5.02-84.49 nm for each layer.

[0019] As a further aspect of the present invention, the coating thickness of the multilayer antireflective coating system is controlled at 600nm, and the transmittance in the 400-700nm wavelength band exceeds 95%, while the reflectance is less than 0.5%.

[0020] As a further aspect of the present invention, the extinction coefficients of both the low-refractive-index material SiAlO and the high-refractive-index material NbAlO are 0, and the transmittance at a wavelength of 550 nm is ≥95%.

[0021] Secondly, the present invention also provides an application of a high-refractive-index non-conductive low-stress coating material prepared by the preparation method described above in a light-efficiency thin film, wherein the light-efficiency thin film is a T*PVD micro / nano 3A light-efficiency thin film, comprising the following structure:

[0022] (a) Flexible substrate layer;

[0023] (b) A UV adhesive layer with micro / nano structures embossed on it;

[0024] (c) A multilayer AR film consisting of alternating stacks of SiAlO and NbAlO;

[0025] (d) Anti-fingerprint layer;

[0026] The optically effective thin film has an average transmittance of ≥95% in the 380-780 nm visible light band and an average reflectance of ≤0.5% in the 800-1300 nm infrared band.

[0027] As a further embodiment of the present invention, the light-efficiency film is bonded to a transparent substrate with OCA adhesive and applied to consumer electronics screens, automotive center console screens, or windshields to meet the optical requirements of anti-glare, anti-fatigue, and anti-myopia.

[0028] As a further aspect of the present invention, the film adhesion test of the light-efficiency film reaches grade 5B of the cross-cut adhesion test, the film resistance is >4000 MΩ, the temperature resistance range is -40℃ to 100℃, and it passes the tests of artificial sweat, UV aging, and cosmetic resistance.

[0029] Compared with the prior art, the present invention provides a method for preparing a high-refractive-index non-conductive low-stress coating material and its application in optically effective thin films, which has the following beneficial effects:

[0030] The high-refractive-index, non-conductive, low-stress coating material prepared in this invention uses a flexible PET substrate instead of a traditional glass substrate. Combined with UV adhesive layers and micro / nano imprinting technology, it solves the deformation problems caused by the fragility and high stress of glass substrates, making the optical film flexible, drop-resistant, and lightweight, extending its application to flexible screens, curved automotive glass, and other scenarios. By optimizing the ion ratio of SiAlO and NbAlO and the sputtering process, the film stress is significantly reduced, and the warpage is decreased. It has passed high-temperature, low-temperature, and constant-temperature and constant-humidity tests without cracking or peeling. The multilayer AR film system (alternating SiAlO / NbAlO) achieves wide-band optical modulation, resulting in: visible light (380-780nm): average transmittance ≥95%, reflectance ≤0.5%; infrared light (800-1300 nm): transmittance ≥95%, reflectance ≤0.5%; extinction coefficient K=0, no light absorption loss, and color saturation improved by more than 30%, meeting the requirements for high-quality decoration and functionality.

[0031] This invention solves the problems of brittleness, high cost, and narrow spectrum of traditional glass-based optical films through material innovation (SiAlO / NbAlO non-conductive composite system), process optimization (low-stress sputtering), and structural design (flexible substrate + micro-nano imprinting). It realizes the large-scale application of high-performance, low-cost, and flexible 3A optical films, resulting in significant cost savings. From the perspective of design and actual effects, the decorative colors are purer, the saturation is higher, the film strength is better, and all functional tests better meet customer needs. Attached Figure Description

[0032] The accompanying drawings are provided to further illustrate the invention and form part of the specification. They are used in conjunction with embodiments of the invention to explain the invention and do not constitute a limitation thereof. In the drawings:

[0033] Figure 1 This is a schematic diagram of the antireflection and anti-reverse layer structure in a high-refractive-index non-conductive low-stress coating material prepared by a method for preparing a high-refractive-index non-conductive low-stress coating material according to an embodiment of the present invention.

[0034] Figure 2 This is a schematic diagram of the decorative layered structure in a high-refractive-index non-conductive low-stress coating material prepared by a method for preparing a high-refractive-index non-conductive low-stress coating material according to an embodiment of the present invention.

[0035] Figure 3 This is a schematic diagram of AR transmission in a method for preparing a high-refractive-index non-conductive low-stress coating material according to an embodiment of the present invention.

[0036] Figure 4 This is a schematic diagram of AR reflection in a method for preparing a high-refractive-index non-conductive low-stress coating material according to an embodiment of the present invention. Detailed Implementation

[0037] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the specific embodiments of the present invention will be described in detail below with reference to the specification.

[0038] This invention provides a method for preparing a high-refractive-index non-conductive low-stress coating material. The specific preparation steps of this method are as follows:

[0039] Step 1: Coat the surface of the flexible substrate with UV adhesive, imprint micro-nano structures on the surface of the UV adhesive layer using an imprinter, and place the substrate with the imprinted texture into a vacuum coating machine for vacuum coating.

[0040] Step 2: Using post-oxidation sputtering deposition technology, alternately deposit low-refractive-index material SiAlO and high-refractive-index material NbAlO on the substrate surface to form a multilayer antireflective (AR) film system, wherein:

[0041] Using Si and Al targets as raw materials, oxygen is simultaneously introduced into both Si and Al targets to obtain the low-refractive-index material SiAlO.

[0042] Using Nb and Al targets as raw materials, oxygen is simultaneously introduced into both Nb and Al targets to obtain the high refractive index material NbAlO.

[0043] In step 1, the flexible substrate is a PET film with a thickness of 50-125 μm, and the UV adhesive coating thickness is 10-20 μm. When coating the flexible substrate with UV adhesive, the refractive index of the UV adhesive is controlled to be 1.51-1.52, and the pencil hardness is 2H-3H. When imprinting the micro-nano structure on the surface of the UV adhesive layer using an embossing machine, the haze is controlled to be 3-30, and the gloss is controlled to be 15-25. When the substrate is placed in a vacuum coating machine for vacuum coating, the vacuum is evacuated to 5.0 × 10⁻⁻⁻⁶. 4 Pa up to 2.0 × 10⁻ 4 Pa, the temperature of the storage compartment is heated to 60℃-80℃.

[0044] In step 2, the ion ratio of the Si target to the Al target is Si:80%, Al:20%; the ion ratio of the Nb target to the Al target is Nb:92%, Al:8%. When oxygen is simultaneously introduced into the Si and Al targets to obtain the low-refractive-index material SiAlO, the power of the Si target is controlled at 18-20 kW, the power of the Al target is 9-10 kW, the vacuum chamber pressure is 3.0×10⁻¹Pa, and the ion ratio is Si:Al = 80%:20% to 60%:40%. The non-conductive low-stress refractive index of the 600 nm coated film is controlled between 1.49 and 1.51 by using the spectral transmission and reflection curve.

[0045] In the process of obtaining high-refractive-index material NbAlO by simultaneously filling Nb and Al targets with oxygen, the power of the Nb target is controlled at 18-20 kW, the power of the Al target is controlled at 9-10 kW, the vacuum chamber pressure is 3.0×10⁻¹ Pa, and the ion ratio is Nb:Al = 92%:8% to 85%:15%. The non-conductive low-stress refractive index of the 600 nm coating is controlled between 2.29 and 2.31 by capturing the spectral transmission and reflection curves.

[0046] In this embodiment, the AR film structure consists of alternating stacked SiAlO and NbAlO layers, with a total of 9 layers. The thickness of each layer is 5.02-84.49 nm. The coating thickness of the multilayer antireflection and anti-reflection film system is controlled at 600 nm, and the transmittance in the 400-700 nm band exceeds 95%, while the reflectance is less than 0.5%.

[0047] The extinction coefficients of both the low-refractive-index material SiAlO and the high-refractive-index material NbAlO are 0, and their transmittance at a wavelength of 550 nm is ≥95%.

[0048] Its application involves the preparation of high-refractive-index non-conductive low-stress coating materials using this method, specifically in the application of luminous efficiency thin films. These luminous efficiency thin films are T*PVD micro / nano 3A luminous efficiency thin films, comprising the following structure:

[0049] (a) Flexible substrate layer;

[0050] (b) A UV adhesive layer with micro / nano structures embossed on it;

[0051] (c) A multilayer AR film consisting of alternating stacks of SiAlO and NbAlO;

[0052] (d) Anti-fingerprint layer;

[0053] The optically effective thin film has an average transmittance of ≥95% in the 380-780 nm visible light band and an average reflectance of ≤0.5% in the 800-1300 nm infrared band.

[0054] The light-effect film is bonded to a transparent substrate using OCA adhesive and can be applied to consumer electronics screens, automotive center console screens, or windshields to meet optical requirements for anti-glare, anti-fatigue, and anti-myopia. The film adhesion test achieves a 5B grade in the cross-cut adhesion test, the film resistance is >4000 MΩ, the temperature resistance range is -40℃ to 100℃, and it has passed tests for artificial sweat, UV aging, and cosmetic resistance.

[0055] Many specific details are set forth in the following description in order to provide a full understanding of the invention. However, the invention may also be practiced in other ways different from those described herein, and those skilled in the art can make similar extensions without departing from the spirit of the invention. Therefore, the invention is not limited to the specific embodiments disclosed below.

[0056] Secondly, the term "one embodiment" or "embodiment" as used herein refers to a specific feature, structure, or characteristic that may be included in at least one implementation of the present invention. The phrase "in one embodiment" appearing in different places in this specification does not necessarily refer to the same embodiment, nor is it a single or selective embodiment that is mutually exclusive with other embodiments. Example 1

[0057] See Figure 1 and Figure 2 As shown, this invention provides a method for preparing a high-refractive-index non-conductive low-stress coating material, used for the preparation and performance testing of high-refractive-index non-conductive low-stress coating materials for mobile phone screens. The preparation method includes the following steps:

[0058] Step 1: Preparation of Materials and Equipment

[0059] Flexible substrate: 75 μm thick PET film;

[0060] UV adhesive: refractive index 1.51 (after curing), pencil hardness 3H;

[0061] Target materials: Si, Al, and Nb targets with a purity of 99.999%;

[0062] Equipment: Post-oxidation magnetron sputtering coating machine (equipped with 3 sets of 20 kW medium frequency power supplies), imprinting machine, spectrometer.

[0063] Step 2: Preparation Steps

[0064] 1. Substrate pretreatment and imprinting of micro / nano structures:

[0065] (1) A UV adhesive with a thickness of 15 μm was coated on the PET surface and cured with UV (wavelength 365 nm, energy 1000 mJ / cm²) to obtain a UV adhesive layer with a refractive index of 1.51 and a hardness of 3H.

[0066] (2) The "bullet head" micro-nano structure was imprinted using an imprinter. Parameters: pressure 50 MPa, temperature 120℃, haze 15 and gloss 20 after imprinting.

[0067] 2. Vacuum coating:

[0068] (1) Load the substrate into the sputtering machine and evacuate it to a vacuum level of 2.0 × 10⁻ 4 Pa, heated to 70℃ and kept at that temperature;

[0069] (2) Deposition of SiAlO layer (low refractive index material):

[0070] Simultaneously turn on the Si target and the Al target, with the Si target power at 19 kW and the Al target power at 9.5 kW, and fill with oxygen (flow rate 50 sccm).

[0071] The ion ratio was controlled as Si:Al = 80%:20%, the vacuum chamber pressure was 3.0 × 10⁻¹ Pa, the coating thickness was 61.24 nm, and the refractive index was 1.51.

[0072] (3) Deposition of NbAlO layer (high refractive index material):

[0073] Switch to Nb target and Al target, Nb target power 19 kW, Al target power 9.5 kW, and fill with oxygen (flow rate 50 sccm).

[0074] The ion ratio was controlled as Nb:Al = 92%:8%, the vacuum chamber pressure was 3.0 × 10⁻¹ Pa, the coating thickness was 19.99 nm, and the refractive index was 2.31.

[0075] (4) Steps 2 and 3 were repeated alternately to deposit a total of 9 film layers (SiAlO / NbAlO alternating) with a total thickness of 600 nm.

[0076] Step 3, Post-processing:

[0077] An anti-fingerprint layer (AF, refractive index 1.38, thickness 10 nm) was coated on the film surface; the film was then bonded to a glass substrate (thickness 0.7 mm) using OCA adhesive.

[0078] For AR reflection testing of the high-refractive-index non-conductive low-stress coating material prepared above, please refer to [reference needed]. Figure 1 The laminated structure diagram shows that a flexible PET substrate is coated with UV adhesive, and the refractive index and hardness of the UV adhesive are adjusted, controlling the refractive index between 1.51 and 1.52, and the pencil hardness between 2H and 3H. The texture conforms to the T*PVD micro-nano 3A optical film embossed using an embossing machine. For functional applications, the haze needs to be controlled between 3 and 30; the gloss needs to be controlled between 15 and 25. For decorative applications, such as... Figure 2As shown, different patterns or textures with different light refractions need to be embossed, such as discharge patterns, lens Fresnel patterns, lotus patterns, bullet patterns, and other textures required by the customer. A non-conductive high- and low-refractive-index material is coated on the texture to create a color layer. Non-color ink is then screen-printed on this color layer, and OCA bonding is used to attach it to a transparent substrate, achieving a combination of color and light to present artistic beauty. The fabricated non-conductive high- and low-refractive-index material coating high-transmittance, low-reflection AR film stacked structure achieves high transmission and low reflection in the required wavelength band. The release film is peeled off and bonded to the transparent substrate to meet anti-glare, anti-fatigue, and anti-myopia effects. Figure 3 and Figure 4 As shown, the average transmission in the 400-700 band is above 95%, and the average reflection is below 0.5%.

[0079] The equipment selected includes a post-oxidation sputtering coating machine with ICP / CCR / RF sources; the machine is equipped with three sets of intermediate frequency power supplies, each 20KW; the machine is loaded with 99.999% pure targets: one pair of Al targets, one pair of Nb targets, and one pair of Si targets. The optimal SiAlO ion ratio is (Si) 80%:(Al) 20%; refractive index 1.49; the optimal NbAlO ion ratio is (Si) 92%:(Al) 8%; refractive index 2.31; the vacuum level is controlled at 5.0 × 10⁻⁶. -4 Pa up to 2.0 × 10 -4 Pa, chamber temperature heating: 60-80 degrees Celsius; oxygen is simultaneously introduced into both Si and Al targets to obtain the low-refractive-index material SiAlO; Si power is 18-20 kW, Al power is 9-10 kW to control the ion ratio; the vacuum chamber coating pressure is checked to be 3.0 × 10⁻⁶. -1 Between Pa, the coating thickness is approximately 600 nm. The non-conductive low-stress refractive index is controlled between 1.49 and 1.51 by analyzing the spectral transmission and reflection curves. High-refractive-index material NbAlO is obtained by simultaneously filling Nb and Al targets with oxygen. The Nb power is 18-20 kW, and the Al power is 9-10 kW to control the ion ratio. The vacuum chamber coating pressure is checked to be 3.0 × 10⁻⁶ Pa. -1 Between Pa, the non-conductive low-stress refractive index of the coating of about 600 nm was controlled between 2.29 and 2.31 by capturing the spectral transmission and reflection curves; the specific ionic experimental results of SiAlO and NbAlO are shown in Tables 1 and 2 below.

[0080] Table 1. Ion Test Results of SiAlO Target Material

[0081]

[0082] Table 2. Ion Test Results of NbAlO Target Material

[0083]

[0084] Structures were embossed on a 50µm-125µm thick PET flexible substrate using an embossing machine. A 10-20µm thick UV adhesive layer was applied. After embossing structural components such as bullet heads, lenses, light pillars, and AG (Aero-Glass) elements, a film was deposited to verify the film stress. Based on the optimal experimental materials and the design of the AR film system, the results of using 9 layers of AR film under different stresses are shown in Table 3 below.

[0085] Table 3. Profit Comparison of 9-Layer AR with Different Refractive Indices

[0086]

[0087] The optimal material design for the AR mechanism is shown in Table 4.

[0088] Table 4. Selection of Optimal Material Design AR Mechanism

[0089]

[0090] The high-refractive-index material NbAlO4 (refractive index 2.29-2.31) and the low-refractive-index material SiAlO4 (refractive index 1.49-1.51) were used. The complete AR stack performance tests are shown in Table 5.

[0091] Table 5 AR Stack Completeness Test Table

[0092]

[0093] Everything is OK, all functionalities have been resolved; high transmittance and low reflectance are achieved, such as... Figure 3 and Figure 4 As shown.

[0094] It is important to note that the constructions and arrangements of this application shown in several different exemplary embodiments are merely illustrative. Although only a few embodiments are described in detail in this disclosure, those who consult this disclosure will readily understand that many modifications are possible (e.g., changes in the size, dimensions, structure, shape, and proportions of various elements, as well as parameter values ​​(e.g., temperature, pressure, etc.), mounting arrangements, use of materials, color, orientation, etc.) without substantially departing from the novel teachings and advantages of the subject matter described in this application). For example, an element shown as integrally formed may be composed of multiple parts or elements, the position of elements may be inverted or otherwise altered, and the nature or number or position of discrete elements may be changed or altered. Therefore, all such modifications are intended to be included within the scope of the invention. The order or sequence of any process or method steps may be changed or rearranged according to alternative embodiments. In the claims, any "device plus function" clause is intended to cover the structure described herein that performs the function, and not only structurally equivalent but also equivalent in structure. Other substitutions, modifications, alterations, and omissions may be made in the design, operation, and arrangement of the exemplary embodiments without departing from the scope of the invention. Therefore, the present invention is not limited to the specific embodiments, but extends to various modifications that still fall within the scope of the appended claims.

[0095] Furthermore, in order to provide a concise description of exemplary embodiments, not all features of actual embodiments (i.e., those features that are not relevant to the best mode of carrying out the invention as currently considered, or those features that are not relevant to implementing the invention) may be omitted.

[0096] It should be understood that numerous specific implementation decisions can be made during the development of any practical implementation, such as in any engineering or design project. Such development efforts may be complex and time-consuming, but for those skilled in the art who benefit from this disclosure, the development effort will be a routine task in design, manufacturing, and production without requiring extensive experimentation.

[0097] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit it. Although the present invention has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention, and all such modifications or substitutions should be covered within the scope of the claims of the present invention.

Claims

1. A method for preparing a high-refractive-index non-conductive low-stress coating material, characterized in that, Includes the following steps: A UV adhesive is coated on the surface of a flexible substrate, and a micro / nano structure is imprinted on the surface of the UV adhesive layer using an imprinting machine; The substrate with the embossed texture is placed in a vacuum coating machine. During vacuum coating, the substrate is evacuated to a vacuum level of 5.0 × 10⁻⁻⁻⁶. 4 Pa up to 2.0 × 10⁻ 4 Pa, the temperature of the storage compartment is heated to 60℃-80℃; By employing post-oxidation sputtering coating technology, low-refractive-index material SiAlO and high-refractive-index material NbAlO are alternately deposited on the surface of a substrate to form a multilayer antireflection and anti-reflection film system; Among them, the deposition of low refractive index material SiAlO: using Si target and Al target as raw materials, oxygen is simultaneously introduced into the vacuum chamber during the sputtering process to deposit and form low refractive index material SiAlO; Deposition of high refractive index material NbAlO: Using Nb and Al targets as raw materials, oxygen is simultaneously introduced into the vacuum chamber during sputtering to deposit high refractive index material NbAlO; The ion ratio of the Si target to the Al target is Si:80%, Al:20%; the ion ratio of the Nb target to the Al target is Nb:92%, Al:8%; when oxygen is simultaneously introduced into the Si and Al targets to obtain the low-refractive-index material SiAlO, the power of the Si target is controlled at 18-20 kW, the power of the Al target is 9-10 kW, and the vacuum chamber pressure is 3.0 × 10⁻⁶ kW. -1 Pa, with an ion ratio of Si:Al = 80%:20% to 60%:40%; the 600 nm coating thickness is controlled by spectral transmission and reflection curves to maintain a non-conductive low-stress refractive index between 1.49 and 1.51; or, when Nb and Al targets are simultaneously filled with oxygen to obtain the high-refractive-index material NbAlO, the Nb target power is controlled at 18-20 kW, the Al target power at 9-10 kW, and the vacuum chamber pressure at 3.0 × 10⁻⁶. -1 Pa, with an ion ratio of Nb:Al = 92%:8% to 85%:15%; the 600 nm coating was controlled between 2.29 and 2.31 by measuring the non-conductive low-stress refractive index through spectral transmission and reflection curves.

2. The method for preparing a high-refractive-index non-conductive low-stress coating material according to claim 1, characterized in that, The flexible substrate is a PET film with a thickness of 50-125 μm, and the UV adhesive coating thickness is 10-20 μm.

3. The method for preparing a high-refractive-index non-conductive low-stress coating material according to claim 2, characterized in that, When coating a flexible substrate with UV adhesive, the refractive index of the UV adhesive is controlled to be 1.51-1.52, and the pencil hardness is 2H-3H.

4. The method for preparing a high-refractive-index non-conductive low-stress coating material according to claim 3, characterized in that, When imprinting micro-nano structures onto the surface of a UV adhesive layer using an embossing machine, the haze is controlled to be 3-30 and the gloss to be 15-25.

5. The method for preparing the high-refractive-index non-conductive low-stress coating material according to claim 4, characterized in that, The coating thickness of the multilayer antireflective coating system is controlled at 600nm, and the transmittance in the 400-700nm wavelength band exceeds 95%, while the reflectance is less than 0.5%.

6. The application of a high-refractive-index non-conductive low-stress coating material prepared by the preparation method of any one of claims 1-5 in optically effective thin films, characterized in that, The light-efficiency film is a T*PVD micro-nano 3A light-efficiency film.

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