UVW alignment platform control method and system

Abstract

The application discloses a UVW alignment platform control method and system, which is applied to the field of precision control. The method is executed by a control device, and comprises the following steps: rotating the platform multiple times to determine the position of the rotation center; moving the platform to an alignment state; acquiring the pose of the platform in the alignment state and the positions of two marker points in the alignment state; determining the pose of a template based on the positions of the two marker points in the alignment state and the position of the rotation center; acquiring the positions of the two marker points in a real-time state; determining the pose of the platform in the real-time state based on the positions of the two marker points in the real-time state and the position of the rotation center; determining the pose deviation of the platform based on the pose of the platform in the real-time state and the pose of the template; and moving the platform to the alignment state according to the pose deviation. In this way, the dependence on an upper computer is eliminated, so that the labor cost and material cost are reduced, and the execution response speed of the platform is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of precision control, and particularly relates to a UVW alignment platform control method and system. BACKGROUND

[0002] The UVW alignment platform is a multi-axis (usually three-axis orthogonal) precision motion system, which realizes high-precision position alignment, attitude adjustment or trajectory tracking of a target object through the coordinated motion of three linear axes U, V and W. At present, the UVW alignment platform control scheme on the market mainly uses the upper computer software to cooperate with the visual CCD (Charge Coupled Device) to realize high-precision positioning. The platform positioning needs the upper computer (such as an industrial computer) to perform image processing calculation, and then sends the coordinates to the PLC (Programmable Logic Controller) or the motion control card through the communication network, and the PLC executes the positioning.

[0003] However, the existing UVW alignment platform control scheme has the following disadvantages: it depends on the upper computer control algorithm, needs to be debugged by the supplier, and the labor cost is high; the control equipment needs to be used with the upper computer (such as an industrial computer), which increases the material cost; the communication between the upper computer and the PLC has a delay, which further affects the execution response speed of the alignment platform. SUMMARY

[0004] The purpose of the present application is to provide a UVW alignment platform control scheme which does not depend on the upper computer system.

[0005] In a first aspect, the application provides a UVW alignment platform control method. The method is performed by a control device and includes: controlling the alignment platform to rotate around a rotation center for multiple times, and obtaining two sets of marker point positions corresponding to two marker points on the alignment platform by a vision system, wherein each set of marker point positions includes the position of the corresponding marker point after each rotation; determining the position of the rotation center based on the two sets of marker point positions; controlling the alignment platform to move to an alignment state, the alignment state indicating that the pose of the alignment platform is consistent with the pose of a template; obtaining the pose of the alignment platform in the alignment state; obtaining the positions of the two marker points in the alignment state by the vision system; determining the pose of the template based on the positions of the two marker points in the alignment state and the position of the rotation center; obtaining the positions of the two marker points in a real-time state by the vision system; determining the pose of the alignment platform in the real-time state based on the positions of the two marker points in the real-time state and the position of the rotation center; determining the pose deviation of the alignment platform based on the pose of the alignment platform in the real-time state and the pose of the template; and controlling the alignment platform to move to the alignment state according to the pose deviation.

[0006] In some embodiments, the vision system includes a first camera and a second camera, wherein the first camera is used to capture the position of a marker point A in the two marker points, and the second camera is used to capture the position of a marker point B in the two marker points. The control of the alignment platform to rotate around the rotation center for multiple times includes: controlling the alignment platform to rotate around the rotation center for three times. The determination of the position of the rotation center based on the two sets of marker point positions includes: determining a first position (Xa, Ya) of the rotation center by a three-point circle method based on the three positions of the marker point A captured by the first camera; and determining a second position (Xb, Yb) of the rotation center by the three-point circle method based on the three positions of the marker point B captured by the second camera.

[0007] In some embodiments, the pose of the template is determined in the following manner:

[0008] TeachX = ((Xc - Xa) + (Xd - Xb)) / 2

[0009] TeachY = ((Yc - Ya) + (Yd - Yb)) / 2

[0010] TeachR = arctan(((Yc - Ya) - (Yd - Yb)) / ((Xc - Xa) - (Xd - Xb)))

[0011] Wherein, (Xc, Yc) represents the position of the mark point A collected by the first camera in the alignment state, (Xd, Yd) represents the position of the mark point B collected by the second camera in the alignment state; (TeachX, TeachY, TeachR) represents the pose of the template.

[0012] The pose of the alignment platform in the real-time state is determined in the following manner:

[0013] RealX = ((Xna - Xa) + (Xnb - Xb)) / 2

[0014] RealY = ((Yna - Ya) + (Ynb - Yb)) / 2

[0015] RealR = arctan(((Yna - Ya) - (Ynb - Yb)) / ((Xna - Xa) - (Xnb - Xb)))

[0016] Wherein, (Xna, Yna) represents the position of the mark point A collected by the first camera in the real-time state, (Xnb, Ynb) represents the position of the mark point B collected by the second camera in the real-time state; (RealX, RealY, RealR) represents the pose of the alignment platform in the real-time state.

[0017] In some embodiments, the pose deviation is determined in the following manner:

[0018] AR = RealR - TeachR ΔX = RealX - ((TeachX

[0019] cos(AR) - TeachY sin(AR)) ΔY1 = RealY - ((TeachX

[0020] sin(AR) + TeachY cos(AR))

[0021] Wherein, AR represents the angle deviation, ΔX represents the position deviation in the X direction, and ΔY1 represents the position deviation in the Y direction.

[0022] The pose (ResultX, ResultY, ResultR) of the alignment platform after correction satisfies:

[0023] ResultX = Xo + ΔX

[0024] ResultY = Yo + ΔY1

[0025] ResultR=Ro+ΔR

[0026] wherein (Xo, Yo, Ro) represents the pose of the alignment platform in the alignment state.

[0027] In some embodiments, the relative pushing amount of each axis of the alignment platform required for rotating an angle δθ around the rotation center satisfies:

[0028] ΔX1=Rcos(δθ+θX1)-Rcos(θX1)

[0029] ΔX2=Rcos(δθ+θX2)-Rcos(θX2)

[0030] ΔY=Rsin(δθ+θY)-Rsin(θY)

[0031] wherein ΔX1 represents the relative pushing amount of the V-axis, ΔX2 represents the relative pushing amount of the W-axis, ΔY represents the relative pushing amount of the U-axis, θX1 represents the angle parameter of the V-axis, θX2 represents the angle parameter of the W-axis, θY represents the angle parameter of the U-axis, and R represents the radius of the three-point circle formed by the rotation centers of the axes.

[0032] In order to control the alignment platform to move to the alignment state according to the pose deviation, the target position (X1, X2, Y) of each axis of the alignment platform satisfies:

[0033] X1=ΔX1+x

[0034] X2=-(ΔX2+x)

[0035] Y=ΔY-y

[0036] wherein (x, y) is the coordinate of the center of the alignment platform after correction, and the relative pushing amounts ΔX1, ΔX2, and ΔY are determined based on the angle deviation in the pose deviation.

[0037] In a second aspect, the present application provides a UVW alignment platform control system. The system is implemented in a control device, and includes a rotation parameter determination module, a reference pose determination module, a real-time pose determination module, a pose deviation determination module, and a control module.

[0038] The rotation parameter determination module is configured to: control the alignment platform to rotate multiple times around a rotation center, and obtain two sets of marker point positions corresponding to two marker points on the alignment platform through a vision system, wherein each set of marker point positions includes the position of the corresponding marker point after each rotation; and determine the position of the rotation center based on the two sets of marker point positions.

[0039] The reference pose determination module is configured to: control the alignment platform to move to an alignment state, the alignment state indicating that the pose of the alignment platform is consistent with the pose of the template; acquire the pose of the alignment platform in the alignment state; obtain the positions of the two marker points in the alignment state through the vision system; and determine the pose of the template based on the positions of the two marker points in the alignment state and the position of the rotation center.

[0040] The real-time pose determination module is configured to: obtain the positions of the two marker points in a real-time state through the vision system; and determine the pose of the alignment platform in the real-time state based on the positions of the two marker points in the real-time state and the position of the rotation center.

[0041] The pose deviation determination module is configured to: determine the pose deviation of the alignment platform based on the pose of the alignment platform in the real-time state and the pose of the template.

[0042] The control module is configured to: control the alignment platform to move to the alignment state according to the pose deviation.

[0043] In a third aspect, a computer readable storage medium is provided. The computer readable storage medium stores a computer program. When the computer program is run on a control device, the control device performs the UVW alignment platform control method according to the first aspect.

[0044] In a fourth aspect, a computer program product is provided. When the computer program product is run on a control device, the control device performs the UVW alignment platform control method according to the first aspect.

[0045] Compared with the prior art, the technical scheme provided by the embodiments of the present application has the following advantages:

[0046] (1) The control algorithm is entirely executed by the control device, which eliminates the dependence on the upper computer system, thereby reducing the labor cost and material cost;

[0047] (2) The control algorithm is entirely executed by the control device, which also improves the execution response speed of the alignment platform. BRIEF DESCRIPTION OF DRAWINGS

[0048] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present application and, together with the description, serve to explain the principles of the present application.

[0049] Figure 1 A flowchart of the UVW alignment platform control method provided by the embodiments of the present application.

[0050] Figure 2A rotation diagram of the alignment platform.

[0051] Figure 3 A comparison diagram of the alignment platform in the initial state and the real-time state.

[0052] Figure 4 A comparison diagram of the alignment platform in the alignment state and the real-time state.

[0053] Figure 5 A diagram of setting an angle for point rotation around a point.

[0054] Figure 6 A parameter diagram of the alignment platform.

[0055] Figure 7 A module diagram of the UVW alignment platform control system provided by the embodiment of the present application.

[0056] Figure 8 A composition diagram of the control device provided by the embodiment of the present application. DETAILED DESCRIPTION

[0057] In order to more clearly understand the above-mentioned purposes, features and advantages of the present application, the embodiments of the present application will be further described below. It should be noted that the embodiments of the present application and the features in the embodiments can be combined with each other without conflict.

[0058] In the following description, many specific details are set forth in order to fully understand the present application, but the present application can also be implemented in other ways different from those described herein. Obviously, the embodiments in the specification are only some of the embodiments of the present application, not all the embodiments.

[0059] Figure 1 A flowchart of the UVW alignment platform control method provided by the embodiment of the present application. As shown in Figure 1 The flowchart 100 includes the following steps.

[0060] Steps 112 and 114 are used to determine the position of the rotation center of the alignment platform.

[0061] Step 112, determining to control the alignment platform to rotate multiple times around the rotation center, and obtaining two sets of marker point positions corresponding to two marker points on the alignment platform through a vision system. Each set of marker point positions includes the position of the corresponding marker point after each rotation.

[0062] In some embodiments, the vision system includes two cameras (for example, two CCD cameras), wherein each camera is used to collect the position of one of the two marker points. For example, referring to Figure 2, the two marker points are symmetrically arranged on the diagonal of the alignment platform, one camera is responsible for collecting the positions A1, A2, A3 of one marker point A, and the other camera is responsible for collecting the positions B1, B2, B3 of the other marker point B.

[0063] Step 114, determining the position of the rotation center based on the two sets of marker point positions.

[0064] In some embodiments, the alignment platform can be controlled to rotate around the rotation center three times, and correspondingly, three positions of each marker point can be obtained by the vision system. That is, each set of marker points includes three positions (such as coordinates) of the corresponding marker point. Further, the position of the rotation center (i.e. the center of the circle) can be solved by the three-point circle method. Specifically, the three coordinates in each set of marker points are substituted into the standard equation of a circle to obtain three equations, thereby establishing an equation group. The center coordinates can be determined by solving the equation group, that is, the position of the rotation center corresponding to the set of marker points. In addition, the rotation radius (i.e. the radius of the circle) can also be solved by the three-point circle method.

[0065] In some embodiments, with reference to Figure 2 When the vision system includes two cameras (such as CCD cameras), based on the three-point coordinates (A1, A2, A3 or B1, B2, B3) collected by each camera, the position of the rotation center and the rotation radius corresponding to the camera are obtained by the three-point circle method. For example, based on the three positions of the marker point A collected by one of the cameras (referred to as the first camera), the first position of the rotation center (i.e. the center coordinates) and the first rotation radius are determined as (Xa, Ya) and Ra, respectively. Based on the three positions of the marker point B collected by the other camera (referred to as the second camera), the second position of the rotation center (i.e. the center coordinates) and the second rotation radius are determined as (Xb, Yb) and Rb, respectively.

[0066] Steps 122 to 128 are used to determine the pose of the template. The template refers to a reference object to be aligned, and alignment means moving the alignment platform to a pose consistent with the pose of the template.

[0067] Step 122, controlling the alignment platform to move to an alignment state.

[0068] In this application, the alignment state refers to the pose of the alignment platform being consistent with the pose of the template. Step 122 can be achieved by manual control. For example, the control device has a touch screen, and the user inputs control instructions through the control interface on the touch screen to control the alignment platform to move to the alignment state.

[0069] Step 124, obtaining the pose of the alignment platform in the alignment state.

[0070] For convenience of description, the pose of the alignment platform in the alignment state is denoted as (Xo, Yo, Ro). In this application, the pose is represented by three coordinates in the XYR coordinate system (for reference Figure 6 ), where the X coordinate (such as Xo) represents the position in the X direction, the Y coordinate (such as Yo) represents the position in the Y direction, and the R coordinate (such as Ro) represents the rotation angle (i.e., the attitude).

[0071] In step 126, the positions of the two marker points in the alignment state are obtained by the vision system.

[0072] In step 128, the pose of the template is determined based on the positions of the two marker points in the alignment state and the position of the rotation center. The pose of the template is the pose of the alignment platform in the alignment state.

[0073] In some embodiments, the pose of the template is determined in the following manner:

[0074] TeachX = ((Xc-Xa) + (Xd-Xb)) / 2 (1)

[0075] TeachY = ((Yc-Ya) + (Yd-Yb)) / 2 (2)

[0076] TeachR = arctan(((Yc-Ya) - (Yd-Yb)) / ((Xc-Xa) - (Xd-Xb))) (3)

[0077] where (Xc, Yc) represents the position of marker point A in the alignment state captured by the first camera, (Xd, Yd) represents the position of marker point B in the alignment state captured by the second camera; (TeachX, TeachY, TeachR) represents the pose of the template, (TeachX, TeachY) is the coordinate of the center of the template, and TeachR represents the attitude of the template.

[0078] Steps 132 and 134 are used to determine the pose of the alignment platform in the real-time state (also referred to as the current state).

[0079] In step 132, the positions of the two marker points in the real-time state are obtained by the vision system.

[0080] In step 134, the pose of the alignment platform in the real-time state is determined based on the positions of the two marker points in the real-time state and the position of the rotation center.

[0081] For reference Figure 3 , in order to distinguish, the positions of the two marker points in the initial state are denoted as A and B, and the positions of the two marker points in the real-time state are denoted as A' and B'. For reference Figure 6, the origin of the XYR coordinate system is the rotation center of the alignment platform, the X1 axis and the X2 axis (i.e., the V axis and the W axis) of the alignment platform are parallel to the X direction of the XYR coordinate system, and the Y axis (i.e., the U axis) of the alignment platform is parallel to the Y direction of the XYR coordinate system. Figure 3 In the figure, the cross mark represents the center (i.e., the rotation center) of the alignment platform, and the coordinates of the center of the alignment platform can be taken as the position of the alignment platform.

[0082] With reference to the foregoing embodiment, the pose of the alignment platform in the real-time state can be determined in the following manner:

[0083] RealX = ((Xna - Xa) + (Xnb - Xb)) / 2 (4)

[0084] RealY = ((Yna - Ya) + (Ynb - Yb)) / 2 (5)

[0085] RealR = arctan (Δy / Δx)

[0086] = arctan(((Yna - Ya) - (Ynb - Yb)) / ((Xna - Xa) - (Xnb - Xb))) (6)

[0087] where (Xna, Yna) represents the position of the mark point A captured by the first camera in the real-time state, (Xnb, Ynb) represents the position of the mark point B captured by the second camera in the real-time state, and (RealX, RealY, RealR) represents the pose of the alignment platform in the real-time state.

[0088] In step 140, the pose deviation of the alignment platform is determined based on the pose of the alignment platform in the real-time state and the pose of the template.

[0089] With reference to Figure 4 In order to distinguish, the positions of the two mark points in the alignment state are denoted as A and B, and the positions of the two mark points in the real-time state are denoted as A' and B'. Figure 4 In the figure, as described above, the cross mark represents the center (also the rotation center) of the alignment platform, and the coordinates of the center of the alignment platform can be taken as the position of the alignment platform.

[0090] With reference to Figure 5 Given A (x0, y0) and B (x1, y1), A is the center, B is a point on the circumference, and B rotates by an angle of α to reach C. Then, C (x2, y2) satisfies:

[0091] x2 = (x1 - x0)cosα - (y1 - y0)sinα + x0 (7)

[0092] y2 = (xl - xo) sin a + (yl - yo) cos a + yo (8)

[0093] In some embodiments, the pose deviation can be determined in the following manner by applying equation (7) and equation (8):

[0094] AR = RealR - TeachR (9)

[0095] AX = RealX - ((TeachX cos (AR) - TeachY sin (AR)) (10)

[0096] AY1 = RealY - ((TeachX sin (AR) + TeachY cos (AR)) (11)

[0097] wherein AR represents the angle deviation, AX represents the position deviation in the X direction, and AY1 represents the position deviation in the Y direction.

[0098] The pose of the alignment platform after rectification (ResultX, ResultY, ResultR) satisfies:

[0099] ResultX = Xo + AX (12)

[0100] ResultY = Yo + AY1 (13)

[0101] ResultR = Ro + AR (14)

[0102] wherein (Xo, Yo, Ro) represents the pose of the alignment platform in the alignment state.

[0103] Step 150, controlling the alignment platform to move to the alignment state according to the pose deviation.

[0104] In some embodiments, referring to Figure 6 the relative pushing amount of each axis required for the alignment platform to rotate an angle of 6Q around the rotation center satisfies:

[0105] AX1 = R cos (6Q + 6X1) - R cos (6X1) (15)

[0106] AX2 = R cos (6Q + 6X2) - R cos (6X2) (16)

[0107] AY = R sin (6Q + 6Y) - R sin (6Y) (17)

[0108] Wherein, ΔX1 represents the relative pushing amount of the V-axis (also referred to as the X1-axis), ΔX2 represents the relative pushing amount of the W-axis (also referred to as the X2-axis), ΔY represents the relative pushing amount of the U-axis (also referred to as the Y-axis), θX1 represents the angle parameter of the V-axis (X1-axis), θX2 represents the angle parameter of the W-axis (X2-axis), θY represents the angle parameter of the U-axis (Y-axis), and R represents the radius of a three-point circle formed by the rotation centers of the axes. Figure 6 Wherein, the V-axis (X1-axis) is located at the right upper part of the platform, the W-axis (X2-axis) is located at the left lower part of the platform, and the V-axis (U-axis) is located at the left upper part of the platform. The angle parameter of each entity axis (U / V / W) is the rotation angle of the line connecting the rotation center of the entity axis and the rotation center of the alignment platform in the XYR coordinate system.

[0109] In order to control the alignment platform to move to the alignment state according to the pose deviation, the target positions (X1, X2, Y) of the axes of the alignment platform satisfy:

[0110] X1=ΔX1+x (18)

[0111] X2=-(ΔX2+x) (19)

[0112] Y=ΔY-y (20)

[0113] Wherein, (x, y) is the coordinate of the center of the alignment platform after correction, and the relative pushing amounts ΔX1, ΔX2, and ΔY are determined based on the angle deviation (such as ΔR) in the pose deviation.

[0114] Figure 7 A module diagram of a UVW alignment platform control system provided by the embodiment is provided. The system 200 is implemented in a control device. As shown in the figure, Figure 7 The system 200 includes a rotation parameter determination module 210, a reference pose determination module 220, a real-time pose determination module 230, a pose deviation determination module 240, and a control module 250.

[0115] The rotation parameter determination module 210 is configured to: control the alignment platform to rotate multiple times around the rotation center, and obtain two sets of marker point positions corresponding to two marker points on the alignment platform through a vision system, wherein each set of marker point positions includes the position of the corresponding marker point after each rotation; and determine the position of the rotation center based on the two sets of marker point positions.

[0116] The reference pose determination module 220 is used to: control the alignment platform to move to the alignment state, wherein the alignment state refers to the pose of the alignment platform being consistent with the pose of the template; acquire the pose of the alignment platform in the alignment state; obtain the position of the two marker points in the alignment state through the vision system; and determine the pose of the template based on the position of the two marker points in the alignment state and the position of the rotation center.

[0117] The real-time pose determination module 230 is used to: obtain the positions of the two marker points in real-time through the vision system; and determine the pose of the alignment platform in real-time based on the positions of the two marker points in real-time and the position of the rotation center.

[0118] The pose deviation determination module 240 is used to: determine the pose deviation of the alignment platform based on the pose of the alignment platform in the real-time state and the pose of the template.

[0119] The control module 250 is used to: control the alignment platform to move to the alignment state according to the pose deviation.

[0120] For more details about System 200 and its modules, please refer to [link / reference]. Figure 1 And its related descriptions.

[0121] Figure 8 This is a schematic diagram illustrating the composition of the control device provided in an embodiment of this application. Figure 8 As shown, the control device 800 includes a processor 810 and a memory 820. The memory 810 stores a computer program. When the processor 820 executes the computer program, it implements the UVW alignment platform control method provided in the embodiments of this application. In some embodiments, the control device 800 is a PLC.

[0122] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to the process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0123] The foregoing is just a description of embodiments of the application, which enable any person skilled in the art to understand and implement the application. Various modifications to the embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein can be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments described herein but is to be accorded the widest scope consistent with this disclosure and the principles and features disclosed herein.

Claims

1. A UVW alignment stage control method, characterized in that, The method is executed by a control device, and comprises: controlling the alignment platform to rotate around a rotation center for multiple times, and obtaining two sets of marker point positions corresponding to two marker points on the alignment platform respectively by a vision system, wherein each set of marker point positions comprises a position of a corresponding marker point after each rotation; determining a position of the rotation center based on the two sets of marker point positions; controlling the alignment platform to move to an alignment state, the alignment state indicating that a pose of the alignment platform is consistent with a pose of a template; obtaining the pose of the alignment platform in the alignment state; obtaining positions of the two marker points in the alignment state by the vision system; determining the pose of the template based on the positions of the two marker points in the alignment state and the position of the rotation center; obtaining positions of the two marker points in a real-time state by the vision system; determining the pose of the alignment platform in the real-time state based on the positions of the two marker points in the real-time state and the position of the rotation center; determining a pose deviation of the alignment platform based on the pose of the alignment platform in the real-time state and the pose of the template; controlling the alignment platform to move to the alignment state according to the pose deviation; a relative pushing amount of each axis of the alignment platform required for rotating an angle δθ around the rotation center satisfies: ΔX1=Rcos(δθ+θX1)-Rcos(θX1) ΔX2=Rcos(δθ+θX2)-Rcos(θX2) ΔY=Rsin(δθ+θY)-Rsin(θY) wherein ΔX1 represents a relative pushing amount of a V-axis, ΔX2 represents a relative pushing amount of a W-axis, ΔY represents a relative pushing amount of a U-axis, θX1 represents an angle parameter of the V-axis, θX2 represents an angle parameter of the W-axis, θY represents an angle parameter of the U-axis, and R represents a radius of a three-point circle formed by rotation centers of the axes; in order to control the alignment platform to move to the alignment state according to the pose deviation, target positions (X1, X2, Y) of the axes of the alignment platform satisfy: X1=ΔX1+x X2=-(ΔX2+x) Y=ΔY-y wherein (x, y) are coordinates of the center of the alignment platform after correction, and the relative pushing amounts ΔX1, ΔX2 and ΔY are determined based on an angle deviation in the pose deviation.

2. The method of claim 1, wherein, the vision system comprises a first camera and a second camera, wherein the first camera is used to collect a position of a marker point A in the two marker points, and the second camera is used to collect a position of a marker point B in the two marker points; the control of the alignment platform to rotate around the rotation center for multiple times comprises: controlling the alignment platform to rotate around the rotation center for three times; the determination of the position of the rotation center based on the two sets of marker point positions comprises: determining a first position (Xa, Ya) of the rotation center by a three-point circle method based on three positions of the marker point A collected by the first camera; determining a second position (Xb, Yb) of the rotation center by the three-point circle method based on three positions of the marker point B collected by the second camera.

3. The method of claim 2, wherein, The pose of the template is determined in the following manner: TeachX = ((Xc - Xa) + (Xd - Xb)) / 2 TeachY = ((Yc - Ya) + (Yd - Yb)) / 2 TeachR = arctan(((Yc - Ya) - (Yd - Yb)) / ((Xc - Xa) - (Xd - Xb))) Wherein, (Xc, Yc) represents the position of the mark point A collected by the first camera in the alignment state, (Xd, Yd) represents the position of the mark point B collected by the second camera in the alignment state; (TeachX, TeachY, TeachR) represents the pose of the template; The pose of the alignment platform in the real-time state is determined in the following manner: RealX = ((Xna - Xa) + (Xnb - Xb)) / 2 RealY = ((Yna - Ya) + (Ynb - Yb)) / 2 RealR = arctan(((Yna - Ya) - (Ynb - Yb)) / ((Xna - Xa) - (Xnb - Xb))) Wherein, (Xna, Yna) represents the position of the mark point A collected by the first camera in the real-time state, (Xnb, Ynb) represents the position of the mark point B collected by the second camera in the real-time state; (RealX, RealY, RealR) represents the pose of the alignment platform in the real-time state.

4. The method of claim 3, wherein, The pose deviation is determined in the following manner: AR = RealR - TeachR ΔX = RealX - ((TeachX cos(ΔR) - TeachY sin(ΔR)) AY1 = RealY - ((TeachX sin(AR) + TeachY cos(AR)) Wherein, AR represents the angle deviation, AX represents the position deviation in the X direction, and AY1 represents the position deviation in the Y direction; The pose (ResultX, ResultY, ResultR) of the alignment platform after correction satisfies: ResultX = Xo + AX ResultY = Yo + AY1 ResultR = Ro + AR Wherein, (Xo, Yo, Ro) represents the pose of the alignment platform in the alignment state.

5. A UVW alignment stage control system, characterized by, The system is implemented in a control device, which includes a rotation parameter determination module, a reference pose determination module, a real-time pose determination module, a pose deviation determination module, and a control module; The rotation parameter determination module is configured to: control the alignment platform to rotate around a rotation center for multiple times, and obtain two sets of mark point positions corresponding to two mark points on the alignment platform through a vision system, wherein each set of mark point positions includes the position of the corresponding mark point after each rotation; and determine the position of the rotation center based on the two sets of mark point positions; The reference pose determination module is configured to: control the alignment platform to move to an alignment state, the alignment state indicating that the pose of the alignment platform is consistent with the pose of a template; obtain the pose of the alignment platform in the alignment state; obtain the positions of the two mark points in the alignment state through the vision system; and determine the pose of the template based on the positions of the two mark points in the alignment state and the position of the rotation center. The rotation parameter determination module is configured to: control the alignment platform to rotate around a rotation center for multiple times, and obtain two sets of mark point positions corresponding to two mark points on the alignment platform through a vision system, wherein each set of mark point positions includes the position of the corresponding mark point after each rotation; and determine the position of the rotation center based on the two sets of mark point positions. The real-time pose determination module is configured to: obtain positions of the two marker points in a real-time state through the vision system; and determine a pose of the alignment platform in the real-time state based on the positions of the two marker points in the real-time state and the position of the rotation center. The pose deviation determination module is configured to: determine a pose deviation of the alignment platform based on the pose of the alignment platform in the real-time state and the pose of the template. The control module is configured to: control the alignment platform to move to the alignment state according to the pose deviation. The relative pushing amounts of each axis of the alignment platform required for rotating an angle δθ around the rotation center satisfy: ΔX1=Rcos(δθ+θX1)-Rcos(θX1) ΔX2=Rcos(δθ+θX2)-Rcos(θX2) ΔY=Rsin(δθ+θY)-Rsin(θY) where ΔX1 represents the relative pushing amount of the V-axis, ΔX2 represents the relative pushing amount of the W-axis, ΔY represents the relative pushing amount of the U-axis, θX1 represents the angle parameter of the V-axis, θX2 represents the angle parameter of the W-axis, θY represents the angle parameter of the U-axis, and R represents the radius of a three-point circle formed by the rotation centers of each axis. To control the alignment platform to move to the alignment state according to the pose deviation, the target positions (X1, X2, Y) of each axis of the alignment platform satisfy: X1=ΔX1+x X2=-(ΔX2+x) Y=ΔY-y where (x, y) are the coordinates of the center of the alignment platform after correction, and the relative pushing amounts ΔX1, ΔX2, and ΔY are determined based on the angle deviation in the pose deviation.

6. A control device characterized by comprising: The control device is a PLC.

7. The control device according to claim 6, characterized by The computer readable storage medium stores a computer program, and when the computer program is executed on the control device, the control device executes the UVW alignment platform control method according to any one of claims 1-4.

8. A computer-readable storage medium, characterized in that, The computer readable storage medium stores a computer program, and when the computer program is executed on the control device, the control device executes the UVW alignment platform control method according to any one of claims 1-4.

9. A computer program product, characterised in that, The computer program product is executed on the control device, and the control device executes the UVW alignment platform control method according to any one of claims 1-4.

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