Chain type material box used in chemical vapor deposition method and discharging method of chain type material box

Abstract

The invention discloses a chain type material box used in a chemical vapor deposition method and a discharging method thereof, a production device of the chain type material box comprises a material box body, a closed cavity, a chain type conveyor and a discharging device, the closed cavity comprises an inlet end, an outlet end and a middle pipeline, the middle pipeline comprises an upper-layer pipeline, the upper-layer pipeline comprises a reaction furnace, and the reaction furnace is connected with the closed cavity. The chain conveyor comprises a chain and a chain wheel; the material box is fixed on the chain, the upper-layer chain runs in the upper-layer pipeline, and the lower-layer chain runs in the lower-layer pipeline; the opening of the material box in the upper-layer pipeline is upward, and the opening in the lower-layer pipeline is downward; the discharging device located at the outlet end comprises a chain wheel, when the material box is located at the position of the chain wheel at the outlet end, the material box rotates from the upper-layer pipeline to the lower-layer pipeline, that is, the material box is converted from the upward opening state to the downward opening state, and meanwhile chemical reactants in the material box are discharged through the discharging device. The production device has the main advantages of being simple in structure, high in efficiency, low in energy consumption, safe, reliable and easy to maintain.

Description

Technical Field

[0001] This invention relates to the field of equipment technology for preparing chemical reactants using chemical vapor deposition, specifically a chain-type feed box and its discharge method used in chemical vapor deposition. Background Technology

[0002] Currently, in production equipment using chemical vapor deposition to prepare chemical reactants, the feed boxes in the reactor move forward by pushing the feed boxes in front of them from behind. Adjacent feed boxes are independent and not connected to each other. Therefore, such production equipment is generally arranged in a forward-backward configuration, i.e., head-to-tail, horizontal or vertical circulation. Its main drawback is: 1) The structure at the junction of the head and tail, where the material box changes from the forward direction to the reverse direction, is too complicated; 2) When unloading materials, the material box with the opening facing upwards needs to be rotated 180 degrees using a special device; 3) The conversion or flipping of the material box requires a large number of bearings, sealing elements and actuators (such as motors, cylinders or hydraulic cylinders), but these elements and components cannot withstand high temperatures, so cooling is required. Cooling, in turn, leads to the complex structure and high energy consumption of the production device. 4) If the seal leaks due to quality issues or prolonged use, it will be extremely dangerous because the carbon source gas and carrier gas are generally flammable gases. Summary of the Invention

[0003] To address the problems existing in the prior art, the present invention aims to provide a chain-type feed box and its discharge method for chemical vapor deposition, thereby solving the problems mentioned in the background art.

[0004] To achieve the above objectives, the present invention provides the following technical solution: The production apparatus 1 for preparing chemical reactants using chemical vapor deposition includes a material box 2, a closed chamber 3, a chain conveyor 4, and a discharge device 5. The closed chamber 3 includes an inlet end 3A, an outlet end 3B, and an intermediate pipe 3C. The inlet end 3A and the outlet end 3B are located at opposite ends of the intermediate pipe 3C. The intermediate pipe 3C includes an upper pipe 7 and a lower pipe 3C1. The upper pipe 7 includes a reactor 7A. The chain conveyor 4 includes a chain 4A and a sprocket 4B. The material box 2 is fixed to the chain 4A. A; Chain 4A includes an upper chain 4A1 and a lower chain 4A2. The upper chain 4A1 runs in the upper pipe 7, and the lower chain 4A2 runs in the lower pipe 3C1. The material box 2 has its opening facing upward in the upper pipe 7 and downward in the lower pipe 3C1. The discharge device 5 located at the outlet end 3B includes a sprocket 4B. When the material box 2 is at the sprocket 4B at the outlet end 3B, it rotates from the upper pipe 7 to the lower pipe 3C1, that is, the material box 2 changes from having its opening facing upward to having its opening facing downward. At the same time, the chemical reactants in the material box 2 are discharged through the discharge device 5.

[0005] As a further aspect of the present invention: the upper pipe 7 and the lower pipe 3C1 are independent separate pipes.

[0006] As a further aspect of the present invention: the upper pipe 7 includes an inlet section 7B and an outlet section 7C, which are located at the two ends of the reactor 7A respectively; the inlet section 7B includes a flow-blocking block 7B1 with a length greater than that of the material box 2, and the lower plane of the flow-blocking block 7B1 is slightly higher than the upper plane of the material box 2, thereby controlling the flow rate of gas between the inlet end 3A and the reactor 7A.

[0007] As a further aspect of the present invention: the outlet section 7C includes a contoured flow barrier 7C1, the bottom shape curve of which is higher than the top highest curve of the transverse cross section of the carbon nanotubes stacked in the material box 2.

[0008] As a further aspect of the present invention: the outlet section 7C includes a flow barrier 7C2. When the chain conveyor 4 is running, the flow barrier 7C2 rises, and the lower plane of the flow barrier 7C2 is higher than the highest position of the carbon nanotubes accumulated in the material box 2. When the chain conveyor 4 stops running, the flow barrier 7C2 descends, and its center is located at the center of the interval between two adjacent material boxes 2. Its lower plane is slightly higher than the upper plane of the material box 2. The flow barrier 7C2 controls the flow rate of gas between the reactor 7A and the outlet end 3B. The thickness of the flow barrier 7C2 is greater than the sum of the interval distance between two adjacent material boxes 2 and the wall thickness of the two material boxes 2.

[0009] As a further aspect of the present invention: the inlet section 7B includes an inlet cooling device 7B2, which regulates the temperature of the gas inside the inlet end 3A.

[0010] As a further aspect of the present invention: the production device 1 includes an inlet pipe 1A and an exhaust pipe 1B. The inlet pipe 1A is located at the end of the reactor 7A near the outlet section 7C, and the exhaust pipe 1B is located at the end of the reactor 7A near the inlet section 7B.

[0011] As a further aspect of the present invention: the chain conveyor 4 includes a drive device 4C and a drive shaft 4D. The sprocket 4B includes a drive sprocket 4B1 located at the outlet end 3B and a passive sprocket 4B2 located at the inlet end 3A. The drive sprocket 4B1 is mounted on the drive shaft 4D. The drive device 4C located outside the closed chamber 3 drives the drive sprocket 4B1 inside the closed chamber 3 to rotate via the drive shaft 4D, thereby realizing the operation of the chain 4A.

[0012] As a further aspect of the present invention: the production apparatus 1 is used to prepare carbon nanotubes. The production apparatus 1 includes a storage chamber 1E and a feeding device 6. The production process for preparing carbon nanotubes mainly includes the following operations: 1) The carbon source gas and the carrier gas enter the reactor 7A through the inlet pipe 1A. The gas in the reactor 7A is transformed into high-temperature gas under the action of the heating device 1C. 2) The set amount of catalyst is dropped into the feed box 2, which is located at the inlet end 3A with the opening facing upwards, through the feeding device 6; 3) The material box 2 inside the inlet end 3A enters the reactor 7A through the inlet section 7B; 4) The carbon nanotubes generated by the high-temperature carbon source gas under the action of the catalyst are accumulated in the material box 2, and the hydrogen gas generated by the chemical reaction is discharged through the exhaust pipe 1B. 5) The material box 2 inside the reactor 7A enters the outlet end 3B through the outlet section 7C; 6) The carbon nanotubes in the material box 2 fall into the storage chamber 1E through the discharge device 5; 7) The material box 2 with its opening facing downward at the outlet end 3B returns to the inlet end 3A via the lower chain 4A2; 8) Repeat the above operations continuously to complete the continuous production of carbon nanotubes.

[0013] As a further aspect of the present invention: the discharge device 5 includes a brush device 5A located below the material box 2 with the opening facing downwards, and the carbon nanotubes adhering to the wall panel of the material box 2 fall into the storage chamber 1E through the brush device 5A.

[0014] In summary, compared with the prior art, this invention has the following advantages due to the use of a chain conveyor, where all the material boxes are fixed on the chain, and the upper chain carries the material boxes containing the catalyst in the reactor, while the lower chain carries the empty material boxes back. Without a traditional material box flipping mechanism or a traditional material box conversion device, and with a significant reduction in bearings, sealing elements, and actuators, this carbon nanotube production device is simple in structure, highly efficient, energy-saving, safe, reliable, and easy to maintain. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the structure of production device 1, which consists of material box 2, closed chamber 3, chain conveyor 4 and discharge device 5; Figure 2 yes Figure 1 The top view is also a structural schematic diagram showing that the inlet end 3A and the outlet end 3B are located at the two ends of the intermediate pipe 3C, respectively. Figure 3 yes Figure 1 The diagram shows the GG structure; it is also a structural diagram showing the upper chain 4A1 running in the upper pipe 7 and the lower chain 4A2 running in the lower pipe 3C1. Figure 4This is a schematic diagram of the position of the inlet end 3A; it is also a schematic diagram of the structure where the material box 2 moves to the position directly below the feeding device 6, with the cover of the feeding device 6 located above the material box 2, and the catalyst is added to the material box 2. Figure 5 This is a schematic diagram of the location of the outlet end 3B; it is also a schematic diagram of the structure after the material box 2 is flipped over, the material is discharged by gravity falling through the material discharge device 5; Figure 6 This is a structural diagram of the upper pipeline 7, including the inlet section 7B and the outlet section 7C. Figure 7 This is a schematic diagram of the location of the inlet section 7B, and also a schematic diagram of the structure where the lower plane of the flow blocking block 7B1 is slightly higher than the upper plane of the material box 2; Figure 8 This is a schematic diagram of the location of the outlet section 7C, and also a schematic diagram of the structure where the bottom shape curve of the contoured flow blocking block 7C1 is higher than the top highest curve of the transverse cross section of the carbon nanotubes stacked in the material box 2. Figure 9 This is a schematic diagram of the chain conveyor 4; Figure 10 This is a schematic diagram of the structure where the flow barrier 7C2 descends, and its center is located at the center of the interval between two adjacent material boxes 2.

[0016] In the diagram, 1 is the production unit, 1A is the air inlet pipe, 1B is the exhaust pipe, 1C is the heating unit, 1D is the insulation chamber, and 1E is the storage chamber. 2 is the material box, 3 is the enclosed chamber, 3A is the inlet end, 3B is the outlet end, 3C is the intermediate pipe, and 3C1 is the lower pipe. 4 represents a chain conveyor; 4A is the chain; 4A1 is the upper chain; 4A2 is the lower chain; 4B is the sprocket; 4B1 is the driving sprocket; 4B2 is the driven sprocket; 4C is the drive unit; and 4D is the drive shaft. 5 is the discharge device, 5A is the brush device, and 6 is the feeding device. 7 is the upper pipe, 7A is the reactor, 7B is the inlet section, 7B1 is the flow baffle, 7B2 is the inlet cooling device, 7C is the outlet section, 7C1 is the conformal flow baffle, and 7C2 is the flow baffle. Detailed Implementation

[0017] The technical solutions of the embodiments of the present invention will be described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0018] Please see Figures 1-10In this embodiment of the invention, the production apparatus 1 for preparing chemical reactants using chemical vapor deposition includes a material box 2, a closed chamber 3, a chain conveyor 4, and a discharge device 5. The closed chamber 3 includes an inlet end 3A, an outlet end 3B, and an intermediate pipe 3C. The inlet end 3A and the outlet end 3B are located at opposite ends of the intermediate pipe 3C. The intermediate pipe 3C includes an upper pipe 7 and a lower pipe 3C1. The upper pipe 7 includes a reactor 7A. The chain conveyor 4 includes a chain 4A and a sprocket 4B. The material box 2 is fixed to the chain 4A. The chain 4A... A includes an upper chain 4A1 and a lower chain 4A2. The upper chain 4A1 runs in the upper pipe 7, and the lower chain 4A2 runs in the lower pipe 3C1. The material box 2 has its opening facing upward in the upper pipe 7 and downward in the lower pipe 3C1. The discharge device 5 located at the outlet end 3B includes a sprocket 4B. When the material box 2 is at the sprocket 4B at the outlet end 3B, it rotates from the upper pipe 7 to the lower pipe 3C1, that is, the material box 2 changes from having its opening facing upward to having its opening facing downward. At the same time, the chemical reactants in the material box 2 are discharged through the discharge device 5.

[0019] It should be noted that the production unit 1 also includes a heating device 1C and a heat preservation chamber 1D, with the heating device 1C located between the heat preservation chamber 1D and the reactor 7A.

[0020] The upper pipe 7 and the lower pipe 3C1 are independent split pipes.

[0021] It should be noted that the upper pipe 7 and the lower pipe 3C1 can also be a single, integrated pipe.

[0022] The upper pipe 7 includes an inlet section 7B and an outlet section 7C, which are located at the two ends of the reactor 7A, respectively. The inlet section 7B includes a flow-blocking block 7B1 with a length greater than that of the material box 2. The lower plane of the flow-blocking block 7B1 is slightly higher than the upper plane of the material box 2. The flow-blocking block 7B1 controls the flow rate of gas between the inlet end 3A and the reactor 7A.

[0023] The outlet section 7C includes a contoured flow barrier 7C1, the bottom shape curve of which is higher than the top highest curve of the transverse cross section of the carbon nanotubes stacked in the material box 2.

[0024] The outlet section 7C includes a flow barrier 7C2. When the chain conveyor 4 is running, the flow barrier 7C2 rises, and the lower plane of the flow barrier 7C2 is higher than the highest point of the carbon nanotubes accumulated in the material box 2. When the chain conveyor 4 stops running, the flow barrier 7C2 descends, and its center is located at the center of the interval between two adjacent material boxes 2. Its lower plane is slightly higher than the upper plane of the material box 2. The flow barrier 7C2 controls the flow of gas between the reactor 7A and the outlet end 3B. The thickness of the flow barrier 7C2 is greater than the sum of the interval distance between two adjacent material boxes 2 and the wall thickness of the two material boxes 2.

[0025] The inlet section 7B includes an inlet cooling device 7B2, which regulates the temperature of the gas inside the inlet end 3A.

[0026] It should be noted that the inlet cooling device 7B2 can be a water cooling device, and the outlet section 7C can also be equipped with an outlet cooling device. The temperature of the gas in the outlet end 3B can be adjusted through the outlet cooling device.

[0027] The production apparatus 1 includes an inlet pipe 1A and an exhaust pipe 1B. The inlet pipe 1A is located at the end of the reactor 7A near the outlet section 7C, and the exhaust pipe 1B is located at the end of the reactor 7A near the inlet section 7B.

[0028] The chain conveyor 4 includes a drive device 4C and a drive shaft 4D. The sprocket 4B includes a drive sprocket 4B1 located at the outlet end 3B and a driven sprocket 4B2 located at the inlet end 3A. The drive sprocket 4B1 is mounted on the drive shaft 4D. The drive device 4C, located outside the enclosed chamber 3, drives the drive sprocket 4B1 inside the enclosed chamber 3 to rotate via the drive shaft 4D, thereby realizing the operation of the chain 4A.

[0029] The production apparatus 1 is used to prepare carbon nanotubes. The production apparatus 1 includes a storage chamber 1E and a feeding device 6. The production process for preparing carbon nanotubes mainly includes the following operations: 1) The carbon source gas and the carrier gas enter the reactor 7A through the inlet pipe 1A. The gas in the reactor 7A is transformed into high-temperature gas under the action of the heating device 1C. 2) The set amount of catalyst is dropped into the feed box 2, which is located at the inlet end 3A with the opening facing upwards, through the feeding device 6; 3) The material box 2 inside the inlet end 3A enters the reactor 7A through the inlet section 7B; 4) The carbon nanotubes generated by the high-temperature carbon source gas under the action of the catalyst are accumulated in the material box 2, and the hydrogen gas generated by the chemical reaction is discharged through the exhaust pipe 1B. 5) The material box 2 inside the reactor 7A enters the outlet end 3B through the outlet section 7C; 6) The carbon nanotubes in the material box 2 fall into the storage chamber 1E through the discharge device 5; 7) The material box 2 with its opening facing downward at the outlet end 3B returns to the inlet end 3A via the lower chain 4A2; 8) Repeat the above operations continuously to complete the continuous production of carbon nanotubes.

[0030] The discharge device 5 includes a brush device 5A located below the material box 2 with the opening facing downwards. The carbon nanotubes adhering to the wall panel of the material box 2 fall into the storage chamber 1E through the brush device 5A.

[0031] It should be noted that the discharge device 5 can also be a vibrating discharge device.

[0032] In the description of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "front," and "rear," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention. In this invention, it should also be noted that the terms "installation" and "connection" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, an integrally formed connection, a mechanical connection, or an indirect connection through an intermediate medium. The specific meaning of the terms in this invention can be understood according to the specific circumstances.

[0033] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A chain-type feed box and its discharge method for use in chemical vapor deposition, characterized in that: A production apparatus (1) for preparing chemical reactants using chemical vapor deposition includes a material box (2), a closed chamber (3), a chain conveyor (4), and a discharge device (5). The closed chamber (3) includes an inlet end (3A), an outlet end (3B), and an intermediate pipe (3C). The inlet end (3A) and the outlet end (3B) are located at opposite ends of the intermediate pipe (3C). The intermediate pipe (3C) includes an upper pipe (7) and a lower pipe (3C1). The upper pipe (7) includes a reactor (7A). The chain conveyor (4) includes a chain (4A) and sprockets (4B). The material box (2) is fixed to the chain (4A). The chain (4A) includes... The upper chain (4A1) and the lower chain (4A2) are connected. The upper chain (4A1) runs in the upper pipe (7) and the lower chain (4A2) runs in the lower pipe (3C1). The material box (2) has an upward opening in the upper pipe (7) and a downward opening in the lower pipe (3C1). The discharge device (5) located at the outlet end (3B) includes a sprocket (4B). When the material box (2) is at the sprocket (4B) at the outlet end (3B), it rotates from the upper pipe (7) to the lower pipe (3C1), that is, the material box (2) changes from having an upward opening to having a downward opening. At the same time, the chemical reactants in the material box (2) are discharged through the discharge device (5).

2. The chain-type feed box and its discharge method for chemical vapor deposition as described in claim 1, characterized in that: The upper pipe (7) and the lower pipe (3C1) are independent split pipes.

3. A chain-type feed box and its discharge method for chemical vapor deposition as described in claim 2, characterized in that: The upper pipe (7) includes an inlet section (7B) and an outlet section (7C), which are located at both ends of the reactor (7A). The inlet section (7B) includes a flow-blocking block (7B1) with a length greater than that of the material box (2). The lower plane of the flow-blocking block (7B1) is slightly higher than the upper plane of the material box (2). The flow-blocking block (7B1) controls the flow rate of gas between the inlet end (3A) and the reactor (7A).

4. The chain-type feed box and its discharge method for chemical vapor deposition as described in claim 3, characterized in that: The outlet section (7C) includes a contoured flow barrier (7C1), the bottom shape curve of which is higher than the top highest curve of the transverse cross section of the carbon nanotubes stacked in the box (2).

5. A chain-type feed box and its discharge method for chemical vapor deposition as described in claim 4, characterized in that: The outlet section (7C) includes a flow barrier (7C2). When the chain conveyor (4) is running, the flow barrier (7C2) rises, and the lower plane of the flow barrier (7C2) is higher than the highest position of the carbon nanotubes piled in the material box (2). When the chain conveyor (4) stops running, the flow barrier (7C2) falls, and its center is located at the center of the interval between two adjacent material boxes (2). Its lower plane is slightly higher than the upper plane of the material box (2). The flow barrier (7C2) controls the flow of gas between the reactor (7A) and the outlet end (3B). The thickness of the flow barrier (7C2) is greater than the sum of the interval distance between two adjacent material boxes (2) and the wall thickness of the two material boxes (2).

6. A chain-type feed box and its discharge method for chemical vapor deposition as described in claim 5, characterized in that: The inlet section (7B) includes an inlet cooling device (7B2) to regulate the temperature of the gas in the inlet end (3A).

7. A chain-type feed box and its discharge method for chemical vapor deposition as described in claim 6, characterized in that: The production apparatus (1) includes an inlet pipe (1A) and an exhaust pipe (1B). The inlet pipe (1A) is located at the end of the reactor (7A) near the outlet section (7C), and the exhaust pipe (1B) is located at the end of the reactor (7A) near the inlet section (7B).

8. A chain-type feed box and its discharge method for chemical vapor deposition as described in claim 7, characterized in that: The chain conveyor (4) includes a drive unit (4C) and a drive shaft (4D). The sprocket (4B) includes a drive sprocket (4B1) located at the outlet end (3B) and a passive sprocket (4B2) located at the inlet end (3A). The drive sprocket (4B1) is mounted on the drive shaft (4D). The drive unit (4C) located outside the closed chamber (3) drives the drive sprocket (4B1) inside the closed chamber (3) to rotate via the drive shaft (4D), thereby realizing the operation of the chain (4A).

9. A chain-type feed box and its discharge method for chemical vapor deposition as described in claim 8, characterized in that: The production apparatus (1) is used to prepare carbon nanotubes. The production apparatus (1) includes a storage chamber (1E) and a feeding device (6). The production process for preparing carbon nanotubes mainly includes the following operations: 1) The carbon source gas and the carrier gas enter the reactor (7A) through the inlet pipe (1A), and the gas in the reactor (7A) becomes a high-temperature gas under the action of the heating device (1C); 2) A set amount of catalyst is dropped into the feed box (2) located at the inlet end (3A) with the opening facing upwards via the feeding device (6); 3) The material box (2) in the inlet end (3A) enters the reactor (7A) through the inlet section (7B); 4) The carbon nanotubes generated by the high-temperature carbon source gas under the action of the catalyst are accumulated in the material box (2), and the hydrogen gas generated by the chemical reaction is discharged through the exhaust pipe (1B); 5) The material box (2) inside the reactor (7A) enters the outlet end (3B) through the outlet section (7C); 6) The carbon nanotubes in the material box (2) fall into the storage bin (1E) through the discharge device (5); 7) The material box (2) with the opening facing downward at the outlet end (3B) returns to the inlet end (3A) via the lower chain (4A2); 8) Repeat the above operations continuously to complete the continuous production of carbon nanotubes.

10. A chain-type feed box and its discharge method for chemical vapor deposition as described in claim 9, characterized in that: The discharge device (5) includes a brush device (5A) located below the material box (2) with the opening facing downwards. The carbon nanotubes adhering to the wall of the material box (2) fall into the storage chamber (1E) through the brush device (5A).

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