Fixture for flushing contaminants from base

Abstract

A fixture for cleaning a susceptor of a substrate processing system includes a first portion of the fixture, a second portion of the fixture, a plurality of fasteners, and an adapter. The first portion is configured to be coupled to a first surface of a base of the susceptor. The first portion includes a first port configured to be in fluid connection with an inflation chamber in the base of the base. The second portion is configured to be coupled to a second surface of the base of the susceptor. The fastener is configured to secure the first portion and the second portion of the fixture to clamp the base portion of the base between the first portion and the second portion of the fixture. The adapter is configured to be coupled to a conduit in the stem of the base, the adapter including a second port configured to be in fluid connection with the plenum via the conduit.

Description

[0001] Cross-reference to related applications This application claims priority to U.S. Provisional Application No. 63 / 455,232, filed March 28, 2023. The entire disclosure of the aforementioned application is incorporated herein by reference. Technical Field

[0002] This disclosure relates generally to substrate processing systems, and more particularly to fixtures for rinsing contaminants from a substrate within a substrate processing system. Background Technology

[0003] The background description provided herein is for the purpose of presenting the general context of this disclosure. The work of the currently designated inventors within the scope described in this background section, as well as aspects of the specification that could not be identified as prior art at the time of filing, are neither express nor implied admissions of prior art to this disclosure.

[0004] The substrate used to support the substrate in a substrate processing system is manufactured by brazing various components. Brazing is a process of joining two or more metal components by melting a filler metal and allowing it to flow into the joint between the two components. The filler metal has a lower melting point than the metal components being joined. Brazing differs from welding because, unlike welding, brazing does not involve melting the components being joined. Brazing also differs from soldering because it uses higher temperatures and is used to join components that fit more tightly than soldering. In brazing, filler metal flows into the gap between the closely fitted components through capillary action. The filler metal is heated to slightly above its melting point in a suitable atmosphere (e.g., in the presence of a chemical agent called flux). The filler metal flows over the base metal components in a process called wetting and is cooled to join the components together. One advantage of brazing is its ability to join the same or different metals with considerable strength. However, even after thoroughly cleaning the brazed components, residual brazing material can still be deposited in the gaps between the components. Summary of the Invention

[0005] A fixture for cleaning a pedestal of a substrate processing system includes a first portion of a fixture, a second portion of a fixture, a plurality of fasteners, and an adapter. The first portion of the fixture is configured to couple to a first surface of a base of the pedestal. The first portion includes a first port configured to fluidly connect with a plenum in the base of the pedestal. The second portion of the fixture is configured to couple to a second surface of the base of the pedestal. The plurality of fasteners is configured to secure the first portion and the second portion of the fixture to clamp the base of the pedestal between the first portion and the second portion of the fixture. The adapter is configured to couple to a conduit in a stem of the pedestal, the adapter including a second port configured to fluidly connect with the plenum via the conduit.

[0006] In additional features, the first portion and the adapter are configured to circulate a cleaning fluid through the first port and the second port and the plenum.

[0007] In additional features, the cleaning fluid includes a mixture of acids.

[0008] In additional features, the first port is configured to receive a cleaning fluid that flows through the plenum and out the second port.

[0009] In additional features, the second port is configured to receive a cleaning fluid that flows through the plenum and out the first port.

[0010] In additional features, the fixture further includes an annular gasket disposed between the first portion and the first surface of the base of the pedestal. The annular gasket is configured to seal areas on the first surface of the base of the pedestal radially inward and outward from the annular gasket.

[0011] In additional features, the adapter is configured to seal a second conduit in the stem of the pedestal that is disposed to create a vacuum on the first surface of the base of the pedestal.

[0012] In additional features, the first portion includes a plate, a manifold, a plurality of conduits, and a gasket. The plate includes a first surface and a second surface. The manifold is connected to the first surface of the plate and to the first port. The plurality of conduits is connected to the manifold. The gasket is disposed between the second surface of the plate and the first surface of the base of the pedestal.

[0013] In additional features, the plate includes an annular groove on the second surface of the plate. The gasket is disposed in the annular groove. The plate and the gasket include a plurality of through-holes that are aligned with each other and with the grooves of the plenum on the first surface of the base of the base. The plurality of conduits are respectively connected to the plurality of through-holes in the plate.

[0014] In additional features, the annular groove and the gasket include alignment features that align the plurality of through-holes of the plate and the gasket.

[0015] In additional features, the gasket is configured to seal areas on the first surface of the base of the base radially inward and outward from the gasket.

[0016] In additional features, the securing apparatus further includes a plurality of plugs configured to couple with a plurality of support structures disposed on a perimeter of the base of the base to support a load ring. The plate includes a plurality of protrusions that extend radially from an outer rim of the plate to an outer diameter of the gasket. The plurality of protrusions are configured to fit in the plurality of support structures, respectively. Radially inner ends of the plurality of protrusions position the plurality of plugs to contact the outer diameter of the gasket and seal the plurality of support structures.

[0017] In additional features, the gasket includes a plurality of pads that respectively surround the plurality of through-holes of the gasket, respectively extend over the plurality of plugs, and extend radially inward from an inner diameter of the gasket beyond an inner diameter of the grooves of the plenum on the first surface of the base of the base.

[0018] In additional features, the securing apparatus further includes a metal ring disposed on a perimeter of the first surface of the plate. The plurality of fasteners pass through the metal ring.

[0019] In additional features, the plate includes a plurality of feet attached to the first surface of the plate.

[0020] In additional features, the plate includes a material that is resistant to chemical corrosion.

[0021] In additional features, the second portion includes an annular plate and a ridge. The annular groove is on a first surface of the annular plate and extends along an inner diameter of the annular plate. An outer diameter of the annular groove is greater than an outer diameter of the base of the base. An inner diameter of the annular groove is less than the outer diameter of the base of the base. The ridge extends from the outer diameter of the annular groove on the first surface of the annular plate, the ridge including a plurality of through-holes to accommodate the plurality of fasteners.

[0022] In additional features, the securing fixture further includes a plurality of guide structures on the ridge to receive a plurality of support structures disposed on a perimeter of the base of the base to support a load ring.

[0023] In additional features, the securing fixture further includes a metal ring disposed on a perimeter of the second surface of the annular plate. The plurality of fasteners pass through the metal ring.

[0024] In additional features, the securing fixture further includes a plurality of handles on a perimeter of the annular plate.

[0025] In additional features, the annular plate includes a plurality of feet attached to the second surface of the annular plate.

[0026] In additional features, the securing fixture further includes a plurality of hooks attached to the second surface of the annular plate.

[0027] In additional features, the annular plate includes a material that is resistant to chemical corrosion.

[0028] In additional features, the adapter includes a clamp, a first component, and a second component. The clamp clamps the conduit and a second conduit disposed in the stem of the base. The first component includes a first circular member configured to attach to the stem of the base and a first cylindrical member extending from the first circular member. The second component includes a second circular member, a second cylindrical member, and a solid cylindrical member. The second cylindrical member extends from the second circular member and sealingly attaches to the first cylindrical member. The solid cylindrical member extends from the second circular member within the second cylindrical member to the clamp and sealingly the second conduit.

[0029] The solid cylindrical member includes a bore including a first end connected to the conduit in the clamp and a second end defining the second port.

[0030] Further scope of the applicability of the present disclosure will become apparent from the detailed description, claims, and drawings. The detailed description and specific examples are given for purposes of illustration only and are not intended to limit the scope of the present disclosure. BRIEF DESCRIPTION OF DRAWINGS

[0031] The present disclosure will become more fully understood from the detailed description and drawings, wherein: FIG. 1A shows an example of a substrate processing system; FIG. 1B shows an example of a base for processing a substrate in the substrate processing system of FIG. 1A; FIG. 2 shows a top view of the base of FIG. 1B; Figure 3 shows a top view of a plenum in a base portion of the pedestal of Figure IB for supplying edge gas during substrate processing; Figures 4 and 5 show cross-sectional views of the plenum of Figure 3; Figure 6 shows an example of a fixture for cleaning the plenum of Figure 3 in accordance with the present disclosure; Figure 7 shows a top view of a top plate of the fixture upper portion of Figure 6; Figure 8 shows a bottom view of the top plate of Figure 7; Figure 9 shows a cross-sectional view of the top plate of Figure 7; Figure 10 shows a top view of a grommet coupled to a bottom surface of the top plate of Figure 7; Figure 11 shows a bottom view of the grommet of Figure 10 coupled to a top surface of the pedestal of Figure IB; Figure 12 shows a top view of the pedestal with the grommet of Figures 10 and 11 and without the top plate of Figures 7-9; Figure 13 shows a partial cross-sectional view of a portion of the top view shown in Figure 12; Figure 14 shows a top view of a bottom plate of the fixture of Figure 6; Figure 15 shows a bottom view of the bottom plate of the fixture of Figure 6; Figure 16 shows a cross-sectional view of the bottom plate of Figures 14 and 15; Figure 17 shows a cross-sectional view of a guide structure on the bottom plate shown in Figure 14; Figure 18 shows a top view of the top plate of the fixture upper portion of Figure 6 including a manifold assembly and conduits to facilitate flow of cleaning fluid through the fixture and pedestal shown in Figure 6; Figure 19 shows a side view of the manifold assembly shown in Figure 18; and Figure 20 shows a cross-sectional view of an adapter coupled to a stem portion of the pedestal of Figure IB to facilitate flow of cleaning fluid through the fixture and pedestal shown in Figure 6.

[0032] In the drawings, reference numerals can be repeated among the figures for like and / or identical elements. DETAILED DESCRIPTION

[0033] The pedestal typically includes a base portion and a stem portion made of a metal or alloy or metallic material. During processing, a substrate is placed on the base portion. The base portion includes a plurality of hard-brazed metal layers. The pedestal includes a number of passages through the base portion and the stem portion. For example, in a pedestal that uses vacuum clamping to clamp a substrate during processing, a plenum and a variety of passages are formed in the pedestal to enable vacuum clamping. The passages have small openings on a top surface of the base portion of the pedestal. The passages are connected to conduits that pass through the stem portion of the pedestal. The conduits are connected to a vacuum pump that creates a vacuum in the passages to clamp the substrate to the base portion of the pedestal.

[0034] Additionally, some pedestals are designed to supply an edge gas (e.g., a purge gas or a conditioning gas) that flows out through the upper periphery of the base around the edge of the substrate to control processing (e.g., deposition or etching) at the edge of the substrate. These pedestals include plenum chambers for supplying the edge gas and gas channels that are isolated from the plenum chambers and channels for vacuum clamping. The gas channels are connected to a gas conduit that also passes through the stem portion of the pedestal and is connected to a gas supply that supplies the edge gas during substrate processing.

[0035] In brazed pedestals, excess filler material overflows into cavities such as plenum chambers and channels within the pedestal. The residual filler material in these cavities flakes off in the form of particles due to the harsh thermal and chemical conditions prevalent in the processing chamber during substrate processing. Particles in the plenum chambers and channels for vacuum clamping flow downward and are removed by the vacuum pump and do not contaminate the processing chamber. However, particles in the plenum chambers and gas channels for supplying edge gas to the upper periphery of the base flow upward with the edge gas and are ejected into the processing chamber and contaminate the processing chamber. This contamination is highly undesirable in substrate processing.

[0036] The present disclosure provides a system and method for removing residual filler material from cavities in a brazed pedestal to prevent contamination of the processing chamber during substrate processing. Specifically, the system includes a fixture designed to supply an acid mixture through the gas conduit into and through the plenum chambers and gas channels for supplying edge gas. The acid mixture etches and removes the residual filler material from the plenum chambers and gas channels. The fixture includes seals to protect the upper surface of the pedestal from the acid mixture. The fixture cleans the plenum chambers and gas channels without etching the upper surface of the pedestal. The acid mixture can include one or more acids and water or other suitable diluent. Non-limiting examples of acid mixtures include 2.5% HF, 0.7% HNO3, and 97.8% H2O by weight, although other acids, diluents, and concentrations can also be used. For example, the acid mixture can include 0.25-5% HF, 1-5% HNO3, and the balance H2O.

[0037] The acid mixture can be flushed through the pedestal in either direction - from the stem end to the base end or from the base end to the stem end. For example, the gas mixture can be supplied from the edge gas conduit end and can be collected at the base end. Alternatively, the gas mixture can be supplied from the base end and can be collected at the gas conduit end. After flushing the pedestal with the acid mixture, water is flushed through the pedestal (again in either direction) to remove any residual acid and particles. The fixture is described in more detail below.

[0038] The present disclosure is organized as follows. FIGS. 1A and IB show examples of a substrate processing system and a pedestal used in the substrate processing system. FIGS. 2-5 show examples of components of a pedestal being cleaned and components of the pedestal protected by a securing fixture of the present disclosure. FIG. 6 schematically shows an example of a securing fixture. FIGS. 7-13 show various components of an upper portion of the securing fixture in more detail. FIGS. 14-20 show components of a lower portion of the securing fixture in more detail.

[0039] Substrate processing system FIG. 1A shows an example of a substrate processing system 10. The substrate processing system 10 includes a processing chamber 12. The processing chamber 12 includes a pedestal 14 and a showerhead 16. The pedestal 14 includes a base 18 and a stem 20. The stem 20 extends from the base 18 and is coupled to a bottom of the processing chamber 12. The base 18 and the stem 20 include a metallic material. For example, the metallic material includes aluminum, stainless steel, or an alloy of the metallic material. During processing, a substrate 24 is disposed on a top surface of the base 18 of the pedestal 14.

[0040] The showerhead 16 includes a base 26 and a stem 28. The base 26 of the showerhead 16 is cylindrical. The diameter of the base 26 of the showerhead 16 is larger than the substrate 24 and the base 18 of the pedestal 14. The stem 28 of the showerhead 16 extends from the base 26 of the showerhead. The stem 28 of the showerhead 16 is attached to a top plate of the processing chamber 12. The stem 28 of the showerhead 16 receives various gases (e.g., process gases, cleaning gases, etc.) from a gas delivery system 50 via a manifold 52. The base 26 of the showerhead 16 includes a faceplate that includes through-holes or slots (not shown) through which gases are introduced into the processing chamber 12.

[0041] The substrate processing system 10 includes a gas delivery system 50. The gas delivery system 50 includes a gas source 54, a valve 56, and a mass flow controller (MFC) 58. The gas source 54 supplies various gases, such as process gases, inert gases (also referred to as purge gases, edge gases, carrier gases), cleaning gases, etc. The valve 56 is connected to the gas source 54 and can be controlled to supply the gases to the MFC 58. The MFC 58 regulates the flow of the gases to the manifold 52. The manifold supplies the gases or gas mixtures to the showerhead 16.

[0042] The substrate processing system 10 includes a radio frequency (RF) power source 60. The RF power source supplies RF power to the showerhead 16 during processing of the substrate 24 and during cleaning of the processing chamber 12. The RF power energizes the gases (e.g., process gases, cleaning gases) introduced into the processing chamber 12 to generate a plasma between the showerhead 16 and the pedestal 14.

[0043] The base 18 of the pedestal 14 includes a heater 62. The heater 62 heats the base 18 of the pedestal 14, which in turn heats the substrate 24. The base 18 of the pedestal 14 includes a temperature sensor 64 to sense the temperature of the pedestal 14. The base 18 of the pedestal 14 also includes cooling channels (not shown). A coolant supply 66 supplies coolant to the cooling channels in the base 18 of the pedestal 14 to control the temperature of the pedestal 14.

[0044] The base 26 of the showerhead 16 also includes a heater (not shown) to heat the gas introduced into the processing chamber 12. The base 26 of the showerhead 16 includes a temperature sensor 68 to sense the temperature of the showerhead 16. The base 26 of the showerhead 16 also includes cooling channels (not shown). The coolant supply 66 supplies coolant to the cooling channels in the base 26 of the showerhead 16 to control the temperature of the showerhead 16.

[0045] The substrate processing system 10 includes another set of valves 70. An edge gas from one of the gas sources 54 is introduced into the pedestal 14 via one of the valves 70. The edge gas flows around the edge of the substrate 24 to control processing (e.g., deposition, etching) at the edge (bevel) of the substrate 24. A vacuum pump 72 is connected to the pedestal 14 via another one of the valves 70. To clamp the substrate 24, the vacuum pump 72 creates a vacuum on the top surface of the base 18 of the pedestal 14.

[0046] Alternatively, although not shown, the pedestal 14 can use other types of support mechanisms to support the substrate 24. For example, the substrate 24 can be supported by a mesa disposed on the top surface of the base 18 of the pedestal 14. The mesa is a small raised portion, also known as a minimum contact area (MCA), which can have different shapes (e.g., cylindrical or polygonal). Regardless of the scheme used to support the substrate 24, the base 18 of the pedestal 14 can supply an edge gas that flows around the edge of the substrate 24 to control processing (e.g., deposition, etching) at the edge (bevel) of the substrate 24.

[0047] The substrate processing system 10 includes a controller 80. The controller 80 controls the valves 56 and 70, the MFCs 58, the heaters in the pedestal 14 and the showerhead 16, the RF power source 60, the supply of coolant from the coolant supply 66 to the pedestal 14 and the showerhead 16, and the vacuum pump 72. The controller 80 monitors the temperatures of the pedestal 14 and the showerhead 16 with the temperature sensors 64 and 68 in the pedestal 14 and the showerhead 16. The controller 80 controls the temperatures of the pedestal 14 and the showerhead 16 by controlling the heaters in the pedestal 14 and the showerhead 16, and by controlling the supply of coolant from the coolant supply 66 to the pedestal 14 and the showerhead 16.

[0048] Pedestal FIG. IB shows an example of a susceptor 100 that includes a metallic material, such as aluminum, stainless steel, or an alloy of a metallic material. Susceptor 100 shows susceptor 14 of FIG. IA in more detail. Susceptor 100 can be used in place of susceptor 14 shown in FIG. IA in processing chamber 12. Susceptor 100 includes a base 102 and a stem 104. For example, base 102 includes three cylindrical plates 110, 112, 114. Plates 110, 112, 114 include a metallic material. Plates 110, 112, 114 are brazed together to form base 102 of susceptor 100.

[0049] In base 102 of susceptor 100, plate 110 includes a groove 120 on a top surface of plate 110. Groove 120 is annular. Groove 120 is interconnected by radially extending grooves (not shown). A conduit 122 extends through stem 104 of susceptor 100, through plates 114, 112, and 110, and connects to groove 120 near a center of plate 110. Conduit 122 connects to vacuum pump 72 (shown in FIG. IA). Vacuum pump 72 creates a vacuum through the annular and radial grooves to clamp substrate 24 to the top surface of plate 110.

[0050] Plate 110 also includes an annular groove 130 along an outer periphery of the top surface of plate 110. Groove 130 is not in fluid communication with groove 120. Plate 112 includes grooves 132 and 134 that are connected to each other and in fluid communication with groove 130 in plate 110. A conduit 136 extends through stem 104 of susceptor 100, through plates 114 and 112, and connects to groove 134 near a center of plate 112. Conduit 136 supplies an edge gas through grooves 134, 132, 130 to control processing around an edge of substrate 24.

[0051] Base 102 of susceptor 100 also includes a plurality of support structures 150-1, 150-2, 150-3 (shown in FIG. 2, only one of the support structures is shown at 150 in FIG. IB, collectively referred to as support structures 150) around a periphery of base 102. Support structures 150 support a carrier ring (not shown) for transferring substrate 24 into and out of processing chamber 12. Support structures 150 are shown and described in further detail below with reference to FIG. 2.

[0052] A heater (such as heater 62 shown in FIG. IA) is disposed between plates 112 and 114. A temperature sensor (such as temperature sensor 64 shown in FIG. IA) is disposed in plate 110 (or alternatively in plate 112). A conduit extends through stem 104 of susceptor 100 and through plate 114. Electrical connections to various components of susceptor 100, such as heater 62 and temperature sensor 64, are provided through the conduit. The electrical connections are connected to controller 80 (shown in FIG. IA).

[0053] As described above, the plates 110, 112, and 114 are made of a metal material and are brazed to form the base 102 of the pedestal 100. Residual filler material used in the brazing process remains in the grooves 134, 132, 130. Due to the harsh thermal and chemical environment used in different processes performed in the process chamber 12 (shown in FIG. 1A), the residual filler material deteriorates (e.g., corrodes, flakes off) over time and forms particles. The particles are then ejected into the process chamber when edge gas is supplied through the grooves 134, 132, 130, thereby contaminating the process chamber 12.

[0054] A fixture for cleaning and removing residual filler material from the pedestal 100 according to the present disclosure is shown and described below with reference to FIG. 6. Before detailing the fixture, reference is made to FIGS. 2-5 showing and describing a top view of the pedestal 100 showing the grooves 130, and a plenum disposed in the base 102 of the pedestal 100 for supplying edge gas.

[0055] Pedestal components cleaned and protected by the fixture FIG. 2 shows a top view of the pedestal 100. In the shown view, only the top surface of the base 102 of the pedestal 100 (a top view of the plate 110) is visible. The vacuum clamping area on the top surface of the plate 110 of the base 102 (including the grooves 120 for clamping) is enclosed by a dashed circle and not shown in detail. The grooves 130 through which edge gas is ejected around the edge of the substrate 24 are shown as well.

[0056] The base 102 of the pedestal 100 includes support structures 150 to support a carrier ring (not shown). Each support structure 150 includes slots 152 and grooves 154 that extend into the periphery of the plate 110. The slots of the support structures 150 are shown at 152-1, 152-2, 152-3 (collectively, slots 152). The grooves of the support structures 150 are shown at 154-1, 154-2, 154-3 (collectively, grooves 154).

[0057] The grooves 154 intersect the grooves 130 on the plate 110 through which edge gas is ejected around the edge of the substrate 24. The fixture 200 shown in FIG. 6 provides features (described in detail below) that cover the grooves 154 during a cleaning process. Due to these features, cleaning fluid does not flow into the vacuum clamping area enclosed by the dashed circle and does not damage the top surface of the plate 110 that includes the grooves 120 for vacuum clamping or the deck for supporting the substrate 24.

[0058] Figure 3 shows an example of a top view of plate 112. The top view of plate 112 shows an example of plenum and grooves in plate 112 of base 102 of pedestal 100. The plenum and grooves are used to supply edge gas from conduit 136 to grooves 130. Plate 112 contains grooves 132 and 134. Examples of cross-sectional views of grooves 134, 132 are shown in Figures 4 and 5. When base 102 is formed by brazing plates 110, 112, 114, the bottom surface of plate 110 is brazed to the top surface of plate 112. The bottom surface of plate 110 defines a plenum in plate 112 with grooves 132 and 134 for edge gas to flow through as described below.

[0059] Plate 112 contains a hole 160 near the center of plate 112. Conduit 136 (shown in Figure IB) is connected to hole 160. Edge gas from conduit 136 flows through hole 160 and into groove 134. Groove 134 extends radially and connects to annular groove 132. Although only three grooves 134 are shown as an example, any number of grooves 134 can be used. Furthermore, although grooves 134 are shown as radial, grooves 134 can have other shapes.

[0060] Edge gas from conduit 136 and hole 160 flows through groove 134 into groove 132. As shown in Figure IB, plate 110 contains groove 130, which is also annular and in fluid communication with groove 132 in plate 112. Edge gas flows from groove 132 into groove 130 and is ejected from groove 130 around substrate 24. In some examples, edge gas can also flow under substrate 24 to prevent processing (e.g., deposition, etching) on the backside (i.e., underside) of substrate 24.

[0061] During brazing of plates 110, 112, residual filler material remains in grooves 134, 132, 130. Due to the harsh thermal and chemical conditions prevalent in processing chamber 12, the residual filler material can deteriorate over time. The deteriorated filler material forms particles, which are ejected with the flow of edge gas, contaminating processing chamber 12. The fixture described below with reference to Figure 6 cleans and removes the residual filler material from grooves 134, 132, 130. Thus, contamination of processing chamber 12 is prevented.

[0062] Figures 4 and 5 show examples of cross-sectional views of plate 112 along lines A-A and B-B shown in Figure 3. The cross-sectional view of plate 112 shows examples of grooves 134 and 132.

[0063] Fixture FIG. 6 shows an example of a fixture 200 for cleaning a pedestal 100, in accordance with the present disclosure. The fixture 200 primarily comprises an upper portion and a lower portion. The upper and lower portions of the fixture 200 can also be referred to as a first portion and a second portion, respectively. Each of the upper and lower portions of the fixture 200 comprises various components, which are shown and described in greater detail with reference to FIGS. 7-20. FIG. 6 schematically shows a side view of the fixture 200, in which only side views of some of the components of the fixture 200 are visible. Various views of these components continue to be shown and described in greater detail with reference to FIG. 7.

[0064] As described below, the fixture 200 can clean the pedestal 100 by supplying cleaning fluid from either direction: from the stem 104 to the base 102 (in the direction of the edge gas flow) or from the base 102 to the stem 104. FIG. 6 shows the fixture 200 attached to the pedestal 100, with the pedestal 100 in an upright position, with the base 102 at the top and the stem 104 at the bottom, which is the normal position of the pedestal 100 for use in the processing chamber 12. The fixture 200 and pedestal can be used in the position shown in FIG. 6 when cleaning fluid is supplied from the top of the fixture 200 (i.e., through the base 102 of the pedestal 100) and collected at the bottom of the fixture 200 (i.e., through the stem 104 of the pedestal 100).

[0065] Alternatively, the entire assembly comprising the pedestal 100 and the fixture 200 shown in FIG. 6 can be inverted or turned upside down (i.e., rotated 180 degrees compared to the orientation shown in FIG. 6). In the rotated or inverted position, the stem 104 of the pedestal 100 is at the top, the base 102 of the pedestal is at the bottom, and the top and bottom of the fixture become the bottom and top, respectively.

[0066] Throughout the present disclosure, all references to top and bottom views, side views; top and bottom sides; upper and lower sides; top and bottom portions; upper and lower portions; top and bottom surfaces; upper and lower surfaces; top and bottom regions; upper and lower regions, and the like, of various components and assemblies are assumed to be in the orientation of the fixture 200 and pedestal 100 shown in FIG. 6.

[0067] In FIG. 6, the fixture 200 comprises an upper portion 202 and a lower portion 204. For orientation neutrality, the upper and lower portions 202, 204 of the fixture 200 can also be referred to as a first portion and a second portion, respectively. The upper portion 202 of the fixture 200 is coupled to the top surface of the base 102 of the pedestal 100 (i.e., to the top surface of the plate 110). The lower portion 204 of the fixture 200 is coupled to the bottom surface of the base 102 of the pedestal 100 (i.e., to the bottom surface of the plate 114).

[0068] The diameter (or outer dimension) of the upper portion 202 and the lower portion 204 of the fixture 200 is greater than the diameter of the base portion 102 of the pedestal 100. The upper portion 202 and the lower portion 204 of the fixture 200 extend radially beyond the support structure 150 of the base portion 102 of the pedestal 100. A plurality of fasteners 205 are used to secure the upper portion 202 and the lower portion 204 of the fixture 200. When secured, the pedestal 100 is clamped (sandwiched) between the upper portion 202 and the lower portion 204 of the fixture 200.

[0069] The upper portion 202 of the fixture 200 includes feet 206-1, 206-2, 206-3 (foot 206-3 is not visible in the illustrated view, collectively referred to as feet 206). Although only three feet 206 are shown by way of example, the upper portion 202 of the fixture 200 can include additional feet. The feet 206 are secured to the upper portion 202 of the fixture 200. When the fixture 200 (with the pedestal 100 clamped therein) is inverted to perform a cleaning process, the fixture 200 (with the pedestal 100 clamped therein) is placed on the feet 206 of the upper portion 202 of the fixture 200.

[0070] The lower portion 204 of the fixture 200 includes feet 208-1, 208-2, 208-3 (foot 208-3 is not visible in the illustrated view, collectively referred to as feet 208). Although only three feet 208 are shown by way of example, the lower portion 204 of the fixture 200 can include additional feet. The feet 208 provide stability when the pedestal 100 is mounted on the lower portion 204 of the fixture 200.

[0071] The lower portion 204 of the fixture 200 includes handles 207-1, 207-2 (and handles 207-3, 207-4, which are not visible in the illustrated view, collectively referred to as handles 207). The handles are attached to the sides of the lower portion 204 of the fixture 200. Once the pedestal 100 is clamped inside the fixture 200, the handles 207 facilitate moving the fixture 200.

[0072] The lower portion 204 additionally includes hooks or similar structures (and at least one additional hook 210-3, collectively referred to as hooks 210) shown at 210-1, 210-2. The hooks 210 are attached to a cradle (not shown). The cradle is used to transport the assembly including the fixture 200 and the susceptor 100 clamped inside the fixture 200. With the cradle, the assembly is transported to the cleaning site in an inverted position. Once at the cleaning site, the assembly (i.e., the fixture 200 and the susceptor 100 clamped inside the fixture 200, and with the assembly in the inverted position) is placed on the feet 206 of the upper portion 202 of the fixture 200. At this point, the fixture 200 is ready to clean the susceptor 100, as described in detail below.

[0073] To clean the susceptor 100, the fixture 200 includes a manifold member 220 attached to the upper portion 202 of the fixture 200. The manifold member 220 is shown and described in detail below. Briefly, the manifold member 220 includes an inlet 222. The inlet 222 can also be referred to as an outlet, depending on whether the cleaning fluid is supplied to the fixture 200 from the upper portion 202 or the lower portion 204 of the fixture 200. A plurality of conduits (shown at 370 in subsequent figures) extend from the manifold member 220. As shown and described in detail below with reference to subsequent figures, the conduits are attached to components inside the upper portion 202 of the fixture 200. These components in the upper portion 202 of the fixture 200 fluidly connect the conduits to the trenches 130 in the susceptor 100 for supplying the edge gas described above.

[0074] As described in further detail below, the upper portion 202 of the fixture 200 includes additional features and components that fit into (couple to) the trench 154 in the support structure 150 of the base 102 of the susceptor 100. These features and components are designed to direct and maintain the flow of cleaning fluid only through the trenches 130 in the base 102 of the susceptor 100 and prevent the flow of cleaning fluid over the trenches 120 or the upper surface of the mesa of the susceptor 100 used for vacuum clamping (i.e., over the upper surface of the plate 110 of the susceptor).

[0075] In addition, to clean the pedestal 100, the fixture 200 includes an adapter (coupling assembly) 230 that attaches to the stem 104 of the pedestal 100 near the lower portion 204 of the fixture 200. The adapter 230 is shown and described in detail below. Briefly, the adapter 230 includes an inlet 232. Again, the inlet 232 can also be referred to as an outlet 232, depending on whether the cleaning fluid is supplied to the fixture from the upper portion 202 or the lower portion 204 of the fixture 200. For direction neutrality, the inlet / outlet 222 and 232 of the manifold member 220 and the adapter 230 can also be referred to as first and second ports, respectively. As shown and described in detail below with reference to subsequent figures, the adapter 230 couples the conduit 136 to the inlet 232. The adapter 230 blocks (seals) the conduit 122 used for vacuum clamping. The adapter 230 prevents the cleaning fluid from entering the conduit 122 used for vacuum clamping.

[0076] In use, with the assembly of the fixture 200 and the pedestal clamped in the fixture 200 in an inverted position, cleaning fluid is supplied through the inlet 232 (second port) and the adapter 230. The cleaning fluid flows through the conduit 136; through the grooves 134, 132, 130 in the base 102 of the pedestal 100; through the conduit attached to the upper portion 202 of the fixture 200; through the manifold member 220; and out through the outlet 222 (first port). Alternatively, with the assembly in the orientation shown in FIG. 6, cleaning fluid can be supplied through the inlet 222 (first port) and the manifold member 220. The cleaning fluid flows through the conduit attached to the manifold member 220 and the upper portion 202 of the fixture 200; through the grooves 134, 132, 130 in the base 102 of the pedestal 100; through the conduit 136; through the adapter 230; and out through the outlet 232 (second port).

[0077] Regardless of the direction in which the cleaning fluid is supplied and circulated through the fixture 200 and the pedestal 100, the cleaning fluid cleans the grooves 134, 132, 130 in the base 102 of the pedestal 100. The cleaning fluid removes residual fill material from the grooves 134, 132, 130 in the base 102 of the pedestal 100. After the pedestal 100 is manufactured and cleaned as described above, when edge gas is supplied through the conduit 136, no particles are formed from the residual fill material in the grooves that degrade with the flow of the edge gas, no particles are ejected into the processing chamber 12 with the flow of the edge gas, and contamination of the processing chamber is prevented.

[0078] Although not shown, the fixture 200 can receive cleaning fluid from a source of cleaning fluid, and cleaning fluid exiting the fixture 200 can be collected in a reservoir. For example, the source of cleaning fluid can be connected to the first port (component 222) of the fixture 200, and the reservoir can be connected to the second port (component 232) of the fixture 200. Cleaning fluid enters the fixture 200 via the first port (component 222), cleans the base 100, exits the fixture 200 via the second port (component 232), and collects in the reservoir. Alternatively, the source of cleaning fluid can be connected to the second port (component 232) of the fixture 200, and the reservoir can be connected to the first port (component 222) of the fixture 200. Cleaning fluid enters the fixture 200 via the second port (component 232), cleans the base 100, exits the fixture 200 via the first port (component 222), and collects in the reservoir.

[0079] The fixture 200 is now described in further detail. Figures 7-13 show various components of the upper portion 202 of the fixture 200 in greater detail. Figures 14-20 show components of the lower portion 204 of the fixture 200 in greater detail. The order in which the components of the fixture 200 described in Figures 7-20 are combined is described after the description of Figures 7-20.

[0080] Upper portion of the fixture The upper portion 202 of the fixture 200 includes a top plate 300, which is shown and described in detail with reference to Figures 7-9 and 13, and a gasket 350, which is shown and described in detail with reference to Figures 10, 11, and 13.

[0081] Figure 7 shows an example of a top view of the top plate 300. In this figure, the manifold component 220 and the conduit on the top plate 300 are omitted to show other features of the top plate 300. The manifold component 220 and the conduit are shown and described in detail with reference to Figures 18 and 19.

[0082] In Figure 7, the top plate 300 includes a non-metallic material, such as high-density polyethylene (HDPE). This material is resistant to corrosion from various acids and other chemicals that can be used in cleaning fluid. This material also does not mar (e.g., scratch or damage) the top surface of the base 100.

[0083] The top plate 300 includes a plurality of holes 302-1, 302-2, 302-3 (collectively, holes 302) near the center of the top plate 300 to mount a manifold component 220 (shown in FIG. 18) on the top surface of the top plate 300. The top plate 300 includes a plurality of holes 304-1, 304-2, 304-3 (collectively, holes 304) near the periphery of the top plate 300. A plurality of conduits (e.g., tubes shown at 370 in FIG. 18) are connected to the manifold component 220 and to the holes 304 to facilitate the flow of cleaning fluid. The holes 304 are aligned with the grooves 130 (shown in FIG. 8) to facilitate the flow of cleaning fluid into the grooves 130.

[0084] The foot 206 is attached to the top surface of the top plate 300. The foot 206 includes a non-metallic material, such as polyether ether ketone (PEEK), that is resistant to chemical corrosion and has mechanical strength to bear the weight of the fixture 200 and the base 100 when the assembly is inverted and the base 100 is being cleaned.

[0085] The top plate 300 has a diameter that is larger than the outer diameter of the base 102 of the base 100. The top plate 300 includes a plurality of sealing fixtures 310-1, 310-2, 310-3 (collectively, sealing fixtures 310) at the periphery of the top plate 300. The sealing fixtures 310 are described in more detail with reference to FIGS. 8 and 13. Briefly, the sealing fixtures 310 extend radially outward from the outer edge of the top plate 300. The sealing fixtures 310 are integral to the top plate 300. The sealing fixtures 310 include the same material as the top plate 300. The sealing fixtures 310 are shaped to conform to the shape of the support structure 150 (shown in FIG. 2) of the base 100. The sealing fixtures 310 include features at the bottom that engage and seal against features of the support structure 150 (shown in FIG. 8) of the base 100. In a base that does not include a support structure 150, the sealing fixtures 310 can be omitted.

[0086] A metal ring (e.g., a stainless steel ring) 320 is attached to the top surface of the top plate 300. The top surface of the top plate 300 includes a groove 321 (shown in FIG. 9) in which the metal ring 320 is mounted. The metal ring 320 and the top plate 300 include through holes 322. Fasteners 205 (shown in FIG. 6) are inserted into the through holes 322 to clamp the upper portion 202 and the lower portion 204 of the fixture 200. The metal ring 320 helps to distribute the load and improve the load handling capability of the assembly when the base 100 is clamped in the fixture 200.

[0087] FIG. 8 shows an example of a bottom view of the top plate 300. For brevity, elements shown in FIG. 8 that have been described above are not described again. The bottom surface of the top plate 300 includes a groove 330. As described below with reference to FIGS. 10 and 11, a gasket 350 is installed in the groove 330. The groove 330 includes a plurality of alignment features 332 for aligning with corresponding alignment features (shown in FIGS. 10 and 11) on the gasket 350 when the gasket 350 is installed in the groove 330.

[0088] At the bottom surface of the sealing fixture 310, the bottom surface of the top plate 300 includes a protrusion 334 (shown at 334-1, 334-2, 334-3, collectively referred to as the protrusion 334) that extends radially between an outer edge of the groove 330 and an outer edge of the sealing fixture 310. With reference to the gasket 350, the protrusion 334 extends radially between an outer edge of the top plate 300 and an outer diameter of the gasket 350. The shape of the protrusion 334 conforms to the shape of the groove 154 (shown in FIG. 2) of the support structure 150 of the base 100. When the top plate 300 is installed on the top surface of the base 102 of the base 100, the bottom surface of the top plate 300 engages the top surface of the base 102 of the base 100. The protrusion 334 engages the groove 154 of the support structure 150 of the base 100. As described in more detail with reference to FIGS. 12 and 13, the groove 154 and a plug (shown at 360 in FIG. 13) seal the support structure 150 of the base 100 from the cleaning fluid.

[0089] FIG. 9 shows a cross-sectional view of the top plate 300 taken along the line C-C shown in FIGS. 7 and 8. The view shows the top surface of the top plate 300 on the top side and the bottom surface of the top plate 300 on the bottom side. Since the elements of the top plate 300 shown in FIG. 9 have been described above, they are not described again for brevity.

[0090] FIGS. 10 and 11 show examples of a top view and a bottom view, respectively, of the gasket 350. The gasket 350 is annular. The outer diameter of the gasket 350 is greater than the outer diameter of the groove 130 (shown in FIGS. 2, 12, and 13) on the top surface of the base 102 of the base 100. The outer diameter of the gasket 350 is less than the outer diameter of the top plate 300 and the base 102 of the base 100. The inner diameter of the gasket 350 is less than the inner diameter of the groove 130 (shown in FIGS. 2, 12, and 13) on the top surface of the base 102 of the base 100.

[0091] Washer 350 comprises a non-metallic and flexible material, such as a fluoroelastomer. The top surface of washer 350 is attached to the bottom surface of top plate 300. The top surface of washer 350 is pressed into a groove 330 in the bottom side of top plate 300. The top surface of washer 350 includes alignment features 352. When the top surface of washer 350 is attached to the bottom surface of top plate 300, the alignment features 352 on the top surface of washer 350 are aligned with the alignment features 332 in the groove 330 on the bottom surface of top plate 300.

[0092] The gasket 350 includes a plurality of through holes 354. When the gasket 350 is attached to the top plate 300 as described above, the through holes 354 of the gasket 350 are aligned with the holes 304 in the top plate 300. Alignment features 332 in the groove 330 and alignment features 352 on the top surface of the gasket 350 ensure that the through holes 354 of the gasket 350 are aligned with the holes 304 in the top plate 300. The through holes 354 facilitate the flow of cleaning fluid between the holes 304 in the top plate 300 and the groove 130.

[0093] When the top plate 300 and gasket 350 are mounted on the top surface of the base 102 of the base 100, the bottom surface of the gasket 350 covers and seals the groove 130 on the top surface of the base 102 of the base 100. The gasket 350 prevents cleaning fluid from flowing over the remaining portion of the top surface of the base 102 of the base 100 (e.g., the area enclosed by the dashed circle shown in Figure 3). The seal provided by the gasket 350 is also shown in Figures 12 and 13.

[0094] Figure 11 shows a bottom view of washer 350. A plurality of pads 356 are disposed on the bottom surface of washer 350. Pads 356 surround through-hole 354. Pads 356 may be elliptical or rectangular. Pads 356 extend in the radial direction. Pads 356 engage with the plug shown at 360 in Figures 12 and 13 and prevent cleaning fluid from flowing into the support structure 150 of base 100. Pads 356 also prevent cleaning fluid from flowing through and towards the center of the top surface of base 102 (i.e., the area enclosed by the dashed circle shown in Figure 2).

[0095] Figure 12 shows an example top view of the base 100, in which a gasket 350 seals a groove 130, which is covered by the gasket 350. The top surface of the gasket 350 is visible in the view shown. The bottom surface of the gasket 350 contacts the top surface of the base 102 of the base 100 (i.e., the top surface of the plate 110) and is not visible in the view shown. The top plate 300 of the fixture 200 located on the top surface of the base 100 is omitted in the figure to show how the gasket 350 seals the groove 130. The gasket 350 seals the areas of the top surface of the base 102 of the base 100 radially inward and outward from the gasket 350.

[0096] A plurality of plugs 360 (shown at 360-1, 360-2, 360-3, collectively referred to as plugs 360) are inserted into the grooves 154 in the support structure 150 of the base 100. The plugs 360 can be made of the same material as the gasket 350. The inner ends of the plugs 360 engage the gasket 350 when the top plate 300 and the gasket 350 are installed on the top surface of the base 100. The protrusions 334 (shown in FIG. 8) on the bottom side of the top plate 300 fit into the grooves 154 in the support structure 150 of the base 100. The outer ends of the plugs 360 engage the inner ends of the protrusions 334. Thus, the gasket 350, the plugs 360, and the protrusions 334 seal the support structure 150 and prevent the flow of cleaning fluid into the support structure 150 of the base 100.

[0097] FIG. 13 shows a partial cross-sectional view of a portion of the top view of the base 100 shown in FIG. 12. The view shows a cross-sectional view of the gasket 350. For brevity, the elements shown in FIG. 13 that have been described above are not described again. The additional elements shown and not described above include the fastener 323 and the conduit 370. The fastener 323 is used to fasten the metal ring 320 to the top plate 300 and into the grooves 321 in the edges of the top plate 300. The conduit 370 is attached to the hole 304 in the top plate 300 and the through hole 354 of the gasket 350 to supply cleaning fluid to the grooves 130. The conduit 370 is connected to the manifold component 220 that is attached to the top surface of the top plate 300. The conduit 370 and the manifold component 220 are described in more detail below with reference to FIG. 19.

[0098] Lower portion of the fixture The lower portion 204 of the fixture 200 includes a bottom plate 400, which is shown and described in detail with reference to FIGS. 14-17. FIGS. 14 and 15 show a top view and a bottom view, respectively, of the bottom plate 400. FIG. 16 shows a cross-sectional view of the bottom plate 400. FIG. 17 shows a cross-sectional view of the guide structure of the bottom plate 400.

[0099] FIG. 14 shows an example of a top view of the bottom plate 400 of the fixture 200. The bottom plate 400 is also made of the same material as the top plate 300 of the fixture. The bottom plate 400 includes a handle 207. The handle 207 extends radially from the outer edge of the bottom plate 400. The purpose of the handle 207 has been described above with reference to FIG. 6, and thus is not described again for brevity.

[0100] The bottom plate 400 is annular and includes a through hole (opening) 402 at the center of the bottom plate 400. The stem portion 104 of the base 100 can pass through the through hole 402 when the base 100 is clamped between the top plate 300 and the bottom plate 400 of the fixture 200. The inner diameter of the bottom plate 400 defines the through hole 402. The inner diameter of the bottom plate 400 is smaller than the outer diameter of the base portion 102 of the base 100. The outer diameter of the bottom plate 400 is larger than the outer diameter of the base portion 102 of the base 100.

[0101] The top surface of the base plate 400 includes a groove 404 along the inner diameter of the base plate 400 and includes a ridge 406 along the outer diameter of the base plate 400. The ridge 406 extends vertically upward from the outer diameter of the groove 404. The outer diameter of the ridge 406 defines the outer diameter of the base plate 400. The ridge 406 includes a plurality of through holes 405 to accommodate fasteners 205 when the top plate 300 of the fixture 200 is clamped to the base plate 400 and the base 100 is clamped between the top plate 300 and the base plate 400 of the fixture 200. The outer diameter of the groove 404 is greater than the outer diameter of the base 102 of the base 100. Thus, when the base 100 is disposed on the top surface of the base plate 400, the bottom surface of the base 102 of the base 100 (i.e., the bottom surface of the plate 114) rests on the groove 404.

[0102] The top surface of the base plate 400 includes a plurality of guide structures 410-1, 410-2, 410-3 (collectively, guide structures 410). The guide structures 410 are mounted on the ridge 406. A cross-sectional view of the guide structure 410 is shown in FIG. 17. Each guide structure 410 includes a horizontal member 412 (shown in FIG. 17) attached to the ridge 406. The guide structure 410 includes a pair of vertical members 414 extending vertically upward from both ends of the horizontal member 412.

[0103] The vertical members 414 of the guide structure 410 include holes 407. The ridge 406 of the base plate 400 includes corresponding through holes. The guide structure 410 is fastened to the ridge 406 with fasteners passing through the holes 407 and the corresponding through holes in the ridge 406. When the base 100 is disposed on the top side of the base plate 400, the guide structures 410 surround the support structure 150 of the base 100. The bottom surface of the support structure 150 of the base 100 rests on the horizontal members 412 of the guide structures 410.

[0104] The base plate 400 includes through holes 409 to mount the hook 210 (shown in FIGS. 6 and 15) from the bottom surface of the base plate 400. The purpose of the hook 210 has been described above with reference to FIG. 6 and thus is not described again for brevity.

[0105] FIG. 15 shows an example of a bottom view of the base plate 400 of the fixture 200. For brevity, the elements shown in FIG. 15 that have been described above are not described again. The foot 208 is similar to the foot 206. The foot 208 is attached to the bottom surface of the base plate 400. The purpose of the foot 208 has been described above with reference to FIG. 6 and thus is not described again for brevity.

[0106] A metal ring 420 is attached to the bottom surface of the base plate 400. The metal ring 420 is similar to the metal ring 320 attached to the top plate 300 of the fixture 200. Therefore, the metal ring 420 is not described in more detail for the sake of brevity. The bottom surface of the base plate 400 includes a groove 421 (shown in Fig. 16) in which the metal ring 420 is mounted with fasteners 424. The metal ring 420 and the base plate 400 include holes to accommodate the fasteners 424. The metal ring 420 includes through holes that are aligned with the through holes 405 in the base plate 400. The fasteners 205 (shown in Fig. 6) are inserted through the through holes 322 of the top plate 300 and the metal ring 320, and into the through holes 405 of the base plate 400 and the metal ring 420 to clamp the top plate 300 and the base plate 400 with the base 100 clamped in the fixture 200.

[0107] Fig. 16 shows a cross-sectional view of the base plate 400 taken along the line D-D shown in Figs. 14 and 15. The view shows the top surface of the base plate 400 at the top and the bottom surface of the base plate 400 at the bottom. Since the elements of the base plate 400 shown in Fig. 16 have been described above, they are not described again for the sake of brevity.

[0108] Fig. 17 shows a cross-sectional view of the guide structure 410 shown in Fig. 14. The cross-section is taken along an axis that is parallel to the vertical members 414 of the guide structure 410. Since the components of the guide structure 410 shown in Fig. 17 have been described above, they are not described again for the sake of brevity.

[0109] Manifold assembly Figs. 18 and 19 show an example of the manifold component 220 shown in Fig. 6. Fig. 18 shows an example of a top view of the manifold component 220 mounted on the top surface of the top plate 300 of the fixture 200 and the conduits 370. Fig. 19 shows an example of a side view of the manifold component 220. In the views shown in Figs. 18 and 19, the manifold component 220 is in the same position (orientation) as shown in Fig. 6.

[0110] In Figs. 18 and 19, the manifold component 220 includes the inlet 222 (also shown and described above with reference to Fig. 6). A plurality of conduits 370-1, 370-2, 370-3 (collectively referred to as the conduits 370) are connected to the manifold component 220 at 372-1, 372-2, 372-3 (shown as 372 in Fig. 19), respectively. Although the conduits 370 are shown schematically with straight lines, the conduits 370 include tubing that can be bent as needed to route the conduits 370 (e.g., around the foot 206). The remaining structural and functional details of the manifold component 220 and the conduits 370 have been described in detail above, and therefore are not described again for the sake of brevity.

[0111] Adapter FIG. 20 shows an example of a cross-sectional view of the adapter 230 shown in FIG. 6. In the view shown, the adapter 230 is shown in an inverted position (orientation) as compared to the position (orientation) of the adapter 230 shown in FIG. 6. Thus, in the view shown, the base 102 of the base 100 is below the stem 104. In the following description of the adapter 230, any directional language used to describe components of the adapter 230 is used in conjunction with the adapter 230 positioned as shown in the figures.

[0112] The adapter 230 generally comprises three components: a clamp 500, a first component 502, and a second component 504. The clamp 500 comprises two members (not visible in the figures shown). The two members of the clamp 500 surround the conduits 122, 136. The two members are clamped together around the conduits 122, 136. Thus, the clamp 500 clamps and holds the conduits 122, 136 in a fixed position.

[0113] The first component 502 of the adapter 230 has a cup or well shape (generally a U-shape). The first component 502 can be cylindrical or have any other shape. The second component 504 has a shape that corresponds to the shape of the first component. For example, when the first component 502 is cylindrical, the second component is also cylindrical.

[0114] When the first component 502 and the second component 504 are cylindrical, the first component 502 comprises a horizontal member 510 and a vertical member 512. The horizontal member 510 comprises a flat circular disc. The vertical member 512 is cylindrical and hollow. A first surface of the horizontal member 510 is attached to the stem 104 of the base 100. The vertical member 512 extends perpendicularly from a second surface of the horizontal member 510. The vertical member 512 extends in a direction opposite the stem 104 of the base. A first end of the vertical member 512 is attached to the second surface of the horizontal member 510. A second end of the vertical member 512 extends perpendicularly to the horizontal member 510, thereby defining a cavity 514 in the first component 502. Thus, the first component 502 is closed at a first end (i.e., at the end where the horizontal member 510 and the first end of the vertical member 512 meet) and open at a second end (i.e., at the second end of the vertical member 512). The conduits 122, 136, 140 pass through the horizontal member 510 into the cavity 514 in the first component 502. The conduits 122 and 136 are clamped by the clamp 500 as described above.

[0115] The second part 504 of the adapter 230 is similar in shape to the first part 502. For example, the second part 504 is also cylindrical. The second part 504 includes a horizontal member 520 and a vertical member 522. The horizontal member 520 is circular. The vertical member 522 is cylindrical and hollow. The vertical member 522 extends perpendicularly from a first surface of the horizontal member 520. A first end of the vertical member 522 is attached to the first surface of the horizontal member 520. A second end of the vertical member 522 extends perpendicularly from the horizontal member 520, thereby defining a cavity 524 in the second part 504. Thus, the second part 504 is also closed at a first end (i.e., at the end where the first end of the horizontal member 520 and the vertical member 522 meet) and open at a second end (i.e., at the second end of the vertical member 522).

[0116] The second part 504 includes a cylindrical block 530. The cylindrical block 530 is solid. The diameter of the cylindrical block 530 is smaller than the inner diameter of the vertical member 522 of the second part 504. A first end of the cylindrical block 530 is attached to the first surface of the horizontal member 520. A second end of the cylindrical block extends perpendicularly from the horizontal member 520 in the same direction as the vertical member 522. The second end of the cylindrical block 530 extends into the cavities 514, 524. The second end of the cylindrical block 530 extends up to the clamp 500.

[0117] The conduit 122 for vacuum chucking and clamped by the clamp 500 extends through the clamp 500 into the cylindrical block 530. For example, the cylindrical block 530 includes a shallow hole at the second end of the cylindrical block 530. The conduit 122 extends and terminates in the shallow hole in the cylindrical block 530. Since the cylindrical block 530 is solid, the conduit 122 is sealed by the cylindrical block 530.

[0118] The cylindrical block 530 includes a hole 532. A first end of the hole 532 is at the second end of the cylindrical block 530. The first end of the hole 532 is connected to the conduit 136 for supplying edge gas and clamped by the clamp 500. A second end of the hole 532 is at a second surface of the horizontal member 520. The second end of the hole 532 forms the inlet 232 (shown in FIG. 6) at the second surface of the horizontal member 520.

[0119] The first and second parts 502, 504 are assembled together as described below. The inner diameter of the vertical member 522 of the second part 504 is equal to the outer diameter of the vertical member 512 of the first part 502. Thus, the vertical member 522 of the second part 504 slides over and around the vertical member 512 of the first part 502. The vertical members 512 and 522 of the first and second parts 502, 504 are sealingly attached to each other. When the first and second parts 502, 504 are assembled together as described above, the cavities 514 and 524 in the first and second parts 502, 504 define a single cavity in the adapter 230.

[0120] When the conduits 122 and 136 are clamped by the fixture 500 and the first and second components 502, 504 are assembled together, the conduit 122 is inserted into the cylindrical block 530. The conduit 122 is sealed by the cylindrical block 530. The conduit 136 is connected to the hole 534 and through the hole to the inlet 232.

[0121] The various components of the fixture 200 are assembled as shown below to clamp the base 100 between the upper 202 and lower 204 portions of the fixture. The base plate 400 is placed on the feet 208. The base 100 is inserted through the through hole 402 in the base plate 400 in an upright position (the base 102 facing up and the stem 104 facing down). The support structure 150 of the base 102 of the base is aligned with the guide structure 410 of the base plate 400 of the fixture 200. The base 102 rests on the groove 404 of the base plate 400. The washer 350 is placed on the groove 130 on the top surface of the base 102 of the base 100. The plug 360 is inserted into the groove 154 in the support structure 150 of the base 100. The top plate 300 of the fixture 200, and the manifold component 220 and the conduit 370 are placed on the top surface of the base 102 of the base 100. The protrusion 334 engages the plug 360 and the groove 154 of the support structure 150 of the base 100. The fasteners 205 are tightened to clamp the base between the top 300 and bottom 400 plates of the fixture 200.

[0122] When assembled as described above, the inlet 232 of the adapter 230, the hole 532 in the adapter 230, the conduit 136 in the stem 104 of the base 100, the grooves 134, 132, 130 in the plate 112 of the base of the base 100, the through hole 354 in the washer 350 in the top plate 300 of the fixture 200, the hole 304 in the top plate 300 of the fixture 200, the conduit 370 attached to the hole 304, the manifold component 220, and the outlet 222 are in fluid communication with each other.

[0123] The assembly comprising the fixture 200 and the susceptor 100 clamped in the fixture 200 is transported to the cleaning site by a carrier and placed in an inverted position on the foot 206. The adapter 230 is connected to the stem 104 of the susceptor 100. A cleaning fluid comprising a mixture of various acids and other chemicals is supplied from the inlet 232 and collected at the outlet 222. As the acid mixture is supplied through the susceptor 100 using the fixture as described above, the mixture of acids and other chemicals is optimized to remove residual fill material that is lodged in the flow path of the edge gas, such as the trenches 134, 132, 130. After cleaning the susceptor 100 using the fixture 200 as described above, the cleaned susceptor 100 can be used in the substrate processing system 10 of FIG. 1A. When the edge gas is supplied to the susceptor 100, the susceptor 100 does not spray contaminants into the processing chamber 12 with the flow of the edge gas.

[0124] The foregoing description is merely illustrative in nature and is in no way intended to limit the disclosure, its application, or uses. The broad teachings of the disclosure can be implemented in a variety of forms. Therefore, while this disclosure includes particular examples, the true scope of the disclosure should not be so limited since other modifications will become apparent upon a study of the drawings, specification, and appended claims.

[0125] It should be appreciated that one or more steps in the methods can be performed in a different order (or simultaneously) without changing the principles of the present disclosure. Moreover, while each of the examples is described above as having certain features, any one or more of those features described with respect to any example of the disclosure can be implemented and / or combined with the features of any other example, even if that combination was not explicitly described. In other words, the described examples are not mutually exclusive, and substitutions of one or more examples for one another remain within the scope of the disclosure.

[0126] Various terminology is used to describe spatial and functional relationships between elements (for example, between modules, circuit elements, semiconductor layers, etc.) as well as various terminology for describing relationships between elements. Such terminology includes the relationship between elements as "connected," "engaged," "coupled," "adjacent," "applied against," "on," "above," "below," and "disposed." When describing relationships between first and second elements, such relationships can be either direct relationships, where no other intervening elements are present between the first and second elements, or indirect relationships, where one or more intervening elements are present between the first and second elements (either spatially or functionally), unless the relationship between the first and second elements is explicitly described as a "direct" relationship. As used herein, the phrase "at least one of A, B, and C" should be interpreted to mean a logical (OR) of the nonexclusive disjunction of A, B, and C, and should not be interpreted to mean "at least one of A, at least one of B, and at least one of C."

[0127] In some implementations, a controller is part of a system, which can be part of the above-described examples. Such systems can include semiconductor processing equipment, including one or more processing tools, one or more chambers, one or more platforms for processing, and / or specific processing components (wafer pedestals, gas flow systems etc.). These systems can be integrated with electronics for controlling the operations of the systems before, during, and after processing of semiconductor wafers or substrates.

[0128] The electronics can be referred to as a "controller" which can control various components of one or more systems. The controller can be programmed to control any of the processes disclosed herein, including the delivery of processing gases, temperature settings (e.g., heating and / or cooling), pressure settings, vacuum settings, power settings, radio frequency (RF) generator settings, RF matching circuit settings, frequency settings, flow rate settings, fluid delivery settings, positional and operation settings, wafer transfer into and out of a tool and other transfer tools, and / or load locks connected to or interfaced with a specific system.

[0129] Broadly speaking, the controller can be defined as electronics having various integrated circuits, logic, memory, and / or software that receive instructions, issue instructions, control operation, enable cleaning operations, enable endpoint measurements, and the like. The integrated circuits can include chips in the form of firmware that store program instructions, digital signal processors (DSPs), chips defined as application specific integrated circuits (ASICs), and / or one or more microprocessors, or microcontrollers that execute program instructions (software).

[0130] The program instructions can be transmitted to the controller in various forms of signals, such as electrical, electromagnetic, optical, or a combination thereof. For example, the program instructions can be carried by electrical signals, optical signals, or a combination thereof. The program instructions can be transmitted to the controller directly from one or more remote computer(s) or servers via a network, or via a physical medium such as a CD-ROM, DVD, Blu-ray Disc™, memory card, or other storage device. The program instructions can be transmitted to the controller from one or more remote computer(s) or servers via a network, including the Internet, a local area network, a wide area network, a wireless network, or a combination thereof. The network can include a wired network, a wireless network, a combination thereof, or any other suitable communication network or networks. The network can include a cellular network, a wireless local area network, a worldwide interoperability networks, or any other suitable communication network or networks. The network can include a local area network, a wide area network, or a combination thereof.

[0131] In some implementations, the controller can be a part of, or coupled to, a computer that is integrated with, coupled to, otherwise networked to, or a combination thereof, the system. For example, the controller can be in the "cloud" or all or a part of a fab host computer system, which can allow for remote access of the wafer processing. The computer can enable remote access to the system to monitor current progress of manufacturing operations, examine a history of past manufacturing operations, examine trends or performance metrics from a plurality of manufacturing operations, change parameters of current processing, set processing steps to follow in the current processing, or start new processes.

[0132] In some examples, a remote computer (e.g. a server) can provide process recipes to the system over a network, which can include a local network or the Internet. The remote computer can include a user interface that enables entry or programming of parameters and / or settings, which are then transmitted over the network from the remote computer to the system. In some examples, the controller receives instructions in the form of data, which specify parameters for each of the processing steps to be executed during one or more operations. It should be understood that the parameters can be specific to the type of process to be performed and the type of tool that the controller is configured to interface with or control.

[0133] Thus, as described above, the controller can be distributed, such as by including one or more discrete controllers that are networked together and working towards a common purpose, such as the processes and controls described herein. An example of a distributed controller for such purposes is one or more integrated circuits on a chamber in communication with one or more integrated circuits located remotely, such as at the platform level or as part of a remote computer, that combine to control a process on the chamber.

[0134] An exemplary system can include, but is not limited to, a plasma etch chamber or module, a deposition chamber or module, a spin-rinse chamber or module, a metal plating chamber or module, a clean chamber or module, a bevel edge etch chamber or module, a physical vapor deposition (PVD) chamber or module, a chemical vapor deposition (CVD) chamber or module, an atomic layer deposition (ALD) chamber or module, an atomic layer etch (ALE) chamber or module, an ion implantation chamber or module, a track chamber or module, and any other semiconductor processing systems that can be associated or used in the manufacturing and / or preparation of semiconductor wafers.

[0135] As noted above, depending on the process step or steps to be performed by the tool, the controller might communicate with one or more of other tool circuits or modules, other tool components, cluster tools, other tool interfaces, adjacent tools, neighboring tools, tools located throughout a factory, a main computer, another controller, or tools used in material transport that bring containers of wafers to and from tool locations and / or load ports in a semiconductor manufacturing factory.

Claims

1. A fixture for a base of a clean substrate processing system, the fixture comprising: A first portion of the fixing device is configured to be coupled to a first surface of the base of the base, the first portion including a first port configured to be in fluid connection with an air chamber in the base of the base; The second part of the fixing device is configured to be coupled to the second surface of the base of the base; At least one fastener is configured to secure the first and second portions of the fixing device to clamp the base of the base between the first and second portions of the fixing device; as well as An adapter configured to couple to a conduit in a rod portion of the base, the adapter including a second port configured to be fluidly connected to the inflation chamber via the conduit.

2. The fixture of claim 1, wherein the first portion and the adapter are configured to circulate cleaning fluid through the first port and the second port and the inflation chamber.

3. The fixture of claim 2, wherein the cleaning fluid comprises a mixture of acids.

4. The fixture of claim 1, wherein the first port is configured to receive cleaning fluid, the cleaning fluid flowing through the inflation chamber and exiting the second port.

5. The fixture of claim 1, wherein the second port is configured to receive cleaning fluid that flows through the inflation chamber and exits the first port.

6. The fixing device of claim 1, further comprising an annular washer disposed between the first portion and the first surface of the base of the base, wherein the annular washer is configured to seal radially inward and outward regions on the first surface of the base of the base.

7. The fixing device of claim 1, wherein the adapter is configured to seal a second conduit in the rod portion of the base, the second conduit being configured to create a vacuum on the first surface of the base portion of the base.

8. The fixing device according to claim 1, wherein the first part comprises: A plate comprising a first surface and a second surface; A manifold that is connected to the first surface of the plate and to the first port; Multiple catheters connected to the manifold; as well as A gasket is disposed between the second surface of the plate and the first surface of the base of the base.

9. The fixing device according to claim 8, wherein: The plate includes an annular groove on the second surface of the plate; The washer is disposed in the annular groove; The plate and the gasket include a plurality of through holes aligned with each other and with grooves in the air chamber on the first surface of the base of the base; and The plurality of conduits are respectively connected to the plurality of through holes in the plate.

10. The fastener of claim 9, wherein the annular groove and the washer include alignment features configured to align the plurality of through holes of the plate and the washer.

11. The fastener of claim 9, wherein the washer is configured to seal the radially inward and outward regions of the first surface of the base of the base.

12. The fixing device of claim 9, further comprising a plurality of plugs configured to couple with a plurality of support structures disposed on the periphery of the base of the base to support a bearing ring, wherein: The plate includes a plurality of protrusions extending radially from the outer edge of the plate to the outer diameter of the washer; The plurality of protrusions are configured to be respectively fitted into the plurality of support structures; and The radially inner ends of the plurality of protrusions position the plurality of plugs to contact the outer diameter of the gasket and seal the plurality of support structures.

13. The fastener of claim 12, wherein the washer comprises a plurality of pads, the plurality of pads: respectively surrounding the plurality of through holes of the washer; respectively extending above the plurality of plugs; and extending radially inward from the inner diameter of the washer beyond the inner diameter of the groove of the inflation chamber on the first surface of the base of the base.

14. The fastener of claim 8, further comprising a metal ring disposed on the periphery of the first surface of the plate, wherein the fastener passes through the metal ring.

15. The fastener of claim 8, wherein the plate includes a plurality of feet attached to the first surface of the plate.

16. The fixture of claim 8, wherein the plate comprises a chemically resistant material.

17. The fixing device of claim 1, wherein the second portion comprises an annular plate, the annular plate comprising: An annular groove is located on a first surface of the annular plate and extends along the inner diameter of the annular plate. The outer diameter of the annular groove is larger than the outer diameter of the base of the base, and the inner diameter of the annular groove is smaller than the outer diameter of the base of the base. A ridge, which extends from the outer diameter of the annular groove on the first surface of the annular plate, includes a plurality of through holes to accommodate the fastener.

18. The fixing device of claim 17, further comprising a plurality of guide structures on the ridge for receiving a plurality of support structures disposed on the periphery of the base of the base to support a bearing ring.

19. The fastener of claim 17, further comprising a metal ring disposed on the periphery of the second surface of the annular plate, wherein the fastener passes through the metal ring.

20. The fixing device according to claim 17, further comprising a plurality of handles located on the periphery of the annular plate.

21. The fixing device of claim 17, wherein the annular plate includes a plurality of feet attached to the second surface of the annular plate.

22. The fixing device of claim 17, further comprising a plurality of hooks attached to a second surface of the annular plate.

23. The fixture of claim 17, wherein the annular plate comprises a chemically resistant material.

24. The fixing device according to claim 1, wherein the adapter comprises: A clamp that holds the conduit and a second conduit disposed in the rod portion of the base; The first component includes a first circular member configured to be attached to the rod portion of the base and a first cylindrical member extending from the first circular member; as well as The second component includes a second circular member, a second cylindrical member extending from the second circular member and sealingly attached to the first cylindrical member, and a solid cylindrical member extending from the second circular member to the clamp within the second cylindrical member and sealing the second conduit.

25. The fixing device of claim 24, wherein the solid cylindrical member includes a hole, the hole including a first end connected to the conduit in the clamp and a second end defining the second port.

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