A plating tank liquid material adding device integrating production of replenishing liquid, tank preparation and tank washing functions

Abstract

The application belongs to the technical field of electroplating and chemical plating, and discloses a plating bath liquid material adding device integrating the functions of production liquid supplement, tank preparation and tank washing, multiple liquid material storage units, liquid material temporary storage units, operation tank units, liquid material distribution units and liquid material metering units; the liquid material storage unit comprises a storage barrel; the operation tank unit comprises a plating tank; and the liquid material distribution unit comprises a pump. After opening, the temporary storage barrel is arranged, the liquid material is stored by using the temporary storage barrel, the liquid material is delivered to a measuring cup by cooperating with the adding pump with small flow but accurate liquid material adding, and the purpose of adding the liquid material to the plating tank in a quantitative manner can be realized by cooperating with the liquid level sensor arranged in the plating tank, so that the demand of adding a certain missing liquid material during electroplating or chemical plating production is met, and the concentration of the liquid material in the plating tank is maintained, waste caused by excessive addition of the liquid material is prevented, and the problem of poor product quality caused by insufficient addition of the liquid material is avoided.

Description

Technical Field

[0001] This invention belongs to the field of electroplating or electroless plating technology, and relates to a plating tank replenishment device, specifically a plating tank liquid addition device that integrates production replenishment, tank preparation and tank washing functions. Background Technology

[0002] In modern industry, commonly used surface treatment technologies can be divided into two types based on the uniformity of coating distribution on the surface of complex-shaped workpieces: electroless plating (uniform thickness, no edge effect) and electroplating (uneven thickness, edge effect exists). Both electroless and electroplating processes require the consumption of liquids such as sulfuric acid, sodium hydroxide, hydrogen peroxide, hydrochloric acid, and SPS to assist in the surface treatment of the workpiece. These solutions are continuously reduced during production due to carry-over (taken away by the workpiece when leaving the bath), decomposition (especially at high temperatures), side reactions, and the formation of the coating layer. Therefore, they must be replenished promptly to maintain the stability of the plating solution composition.

[0003] Currently, the traditional method involves staff patrolling the lines to observe and replenish the liquid on-site, and monitoring the liquid replenishment process in real time, which is quite cumbersome. To overcome this problem, patent CN216891309U discloses an electroplating tank replenishment system that uses a quick-release assembly to connect the branch pipe to the liquid level valve. When replenishing the electroplating tank, the quick-release assembly and the liquid level valve are inserted into the corresponding branch pipe to replenish the electroplating tank. When the liquid level valve reaches its position, it closes, eliminating the need for real-time monitoring of the liquid replenishment.

[0004] While the technical solutions disclosed in the above patents have solved the problem of real-time monitoring during plating tank replenishment to some extent, the replenishment method is rigid and still requires staff to patrol and observe the line. More importantly, the concentration of the liquid in the plating tank will change as production progresses, and the above replenishment method cannot take into account this concentration change, resulting in reduced quality and failure to meet application requirements. Summary of the Invention

[0005] One objective of this invention is to provide a plating bath liquid addition device that integrates production replenishment, bath preparation, and bath washing functions, thereby solving the technical problem in the prior art where the plating bath cannot selectively replenish small amounts of liquid with precise quantitative control based on the concentration of the liquid, resulting in the plating bath liquid concentration failing to meet the requirements of electroplating or electroless plating. A second objective of this invention is, based on the above objectives, to solve the technical problem of not being able to supply large quantities of liquid when washing or preparing the plating bath before production line start-up.

[0006] The objective of this invention can be achieved through the following technical solutions:

[0007] A plating bath liquid addition device integrating production replenishment, tank preparation, and tank washing functions includes multiple liquid storage units, a working tank unit, a liquid distribution unit, and a liquid metering unit. Each liquid storage unit includes a storage tank connected to a central supply pipe. The working tank unit includes a plating tank with an inlet pipe inside. The liquid distribution unit includes a pump. A T-junction is installed at the pump's output end, with one port connected to the pump and the other two ports connected to a first and second main distribution pipe, respectively. Multiple first branch distribution pipes are connected to the first main distribution pipe in parallel, and each branch distribution pipe is equipped with a first solenoid valve. Multiple second branch distribution pipes are connected to the second main distribution pipe in parallel, and each branch distribution pipe is equipped with a second solenoid valve. The other ends of both the first and second branch distribution pipes are connected to the same corresponding plating tank, and the other end of the second branch distribution pipe is connected to the plating tank via an inlet pipe. Each first branch distribution pipe is also connected to a liquid temporary storage unit, which, after distributing the chemical supply, connects to the plating tank.

[0008] Preferably, the top of the storage tank is provided with a first liquid level sensor a, a second liquid level sensor a, and a third liquid level sensor a, the detection end of which extends into the storage tank.

[0009] Preferably, the liquid storage unit includes a storage tank; the storage tank is provided with a connecting pipe, which is connected to a corresponding first distribution branch pipe.

[0010] Preferably, the top of the temporary storage tank is provided with a first liquid level sensor b, a second liquid level sensor b, and a third liquid level sensor b, the detection end of which extends into the interior of the temporary storage tank.

[0011] Preferably, the liquid metering unit includes a pump, a measuring cup, and a third solenoid valve. The pump draws liquid from the storage tank, delivers the liquid to the measuring cup via a first liquid pipe, and then delivers the liquid to the corresponding plating tank via a second liquid pipe.

[0012] Preferably, a fixed bracket is fixedly connected to the side of the temporary storage bucket; an infusion tube extending into the interior of the temporary storage bucket is provided on the fixed bracket; and a pneumatic pump is installed on the infusion tube corresponding to the fixed bracket.

[0013] Preferably, the maintenance and cleaning of the plating tank includes the following steps:

[0014] A100: Sulfur, sodium hydroxide and hydrogen peroxide, etc., are added to each storage tank through the central liquid supply pipe. When the third liquid level sensor a detects the liquid, an alarm is issued and the addition of liquid to the storage tank is stopped.

[0015] A200: Using a pump and a three-way pipe, the liquid material for cleaning is transported to the second main distribution pipe, and then the corresponding second branch pipe is opened through the second solenoid valve, so that the liquid material is directly transported to the corresponding plating tank through the liquid inlet pipe.

[0016] A300: The liquid material entering the plating tank rinses and replaces the residual liquid material in the plating tank, thereby maintaining the purity of the plating tank.

[0017] Preferably, the process of opening and matching the plating tank includes the following steps:

[0018] B100: Sulfur, sodium hydroxide, hydrogen peroxide, hydrochloric acid and SPS are added to each storage tank through the central liquid supply pipe to prepare the initial plating solution. When the third liquid level sensor a detects the liquid, an alarm is issued and the addition of liquid to the storage tank is stopped.

[0019] B200: Using a pump and a three-way pipe, the liquid material used to prepare the initial plating solution in each storage tank is transported to the corresponding second distribution main pipe. Then, the pipeline of the corresponding second distribution branch pipe is opened through the second solenoid valve, so that the liquid material in one or more storage tanks is directly transported to the corresponding plating tank through the liquid inlet pipe.

[0020] B300: Stop supplying liquid after the plating tank is full.

[0021] Preferably, when the plating tank generates replenishment solution, the following steps are included:

[0022] C100: Sulfur, sodium hydroxide, hydrogen peroxide, hydrochloric acid and SPS, etc., are added to each storage tank through the central liquid supply pipe. The pump and three-way pipe are used to supply the liquid that is missing in production to the first distribution main pipe. After the first solenoid valve opens the corresponding first distribution branch pipe, the first distribution main pipe delivers liquid to the first distribution branch pipe and adds temporary liquid to the temporary storage tank with the help of the connecting pipe.

[0023] C200: A liquid level sensor is installed inside the measuring cup. The height of the liquid level sensor is adjusted to the corresponding measuring range height position according to the volume of liquid to be added to each plating tank.

[0024] C300: The addition pump draws liquid from the temporary storage tank and delivers it to the measuring cup. When the liquid in the measuring cup rises to the specified height, the liquid level sensor alarms, the addition pump stops running, the third solenoid valve opens the second liquid passage, and the liquid in the measuring cup enters the plating tank through the second liquid passage.

[0025] The beneficial effects of this invention are:

[0026] 1. This invention utilizes a high-flow-rate pump to directly pump the liquid material from the storage tank into the plating tank before the production line starts, which increases the liquid material supply and improves efficiency, meeting the needs of maintenance tank cleaning and production line start-up. After the production line starts, a temporary storage tank is set up to store the liquid material. A small-flow-rate but precise liquid material addition pump delivers the liquid material to a measuring cup. With the internal liquid level sensor, the liquid material can be quantitatively added into the plating tank, thus meeting the need to add certain missing liquid materials during electroplating or electroless plating production. This maintains the concentration of liquid material in the plating tank, preventing waste caused by adding too much liquid material and avoiding product quality problems caused by adding too little liquid material.

[0027] 2. The present invention employs a liquid diversion and conveying method using a first distribution main pipe and its accessories and a second distribution main pipe and its accessories. Different liquid conveying methods are used for two different application scenarios: before and after the line is started. The start and stop of the addition system can be controlled according to each liquid level sensor. When the sensor detects a decrease in liquid, it will directly transmit the signal to the computer. The computer directly controls the execution end to start adding the medicine, eliminating the need for manual line tracking and observation, saving manpower, and adapting to more complex addition systems.

[0028] 3. Since the pipelines for each type of liquid material or other liquid are directly connected to each plating tank, the present invention will not cause losses due to human error. Furthermore, since some liquid materials are highly corrosive (such as hydrochloric acid) or highly toxic, manual operation poses safety hazards. The automatic addition method is safer, and the quantitative addition method is more accurate. It can eliminate secondary pollution caused by excessive addition and help wastewater discharge meet standards, which is more environmentally friendly. Attached Figure Description

[0029] The invention will now be further described with reference to the accompanying drawings.

[0030] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0031] Figure 2 This is a schematic diagram of the liquid storage unit of the present invention;

[0032] Figure 3 This is a schematic diagram of the liquid storage unit of the present invention;

[0033] Figure 4 This is a schematic diagram of the working slot unit structure of the present invention;

[0034] Figure 5 This is a schematic diagram of the liquid distribution unit structure of the present invention;

[0035] Figure 6 This is a schematic diagram of the liquid metering unit structure of the present invention;

[0036] Figure 7This is a schematic diagram of the parallel pipeline structure of the present invention;

[0037] Figure 8 This is a schematic diagram of the pneumatic pump structure of the present invention.

[0038] In the diagram: 1. Liquid storage unit; 2. Liquid temporary storage unit; 3. Working tank unit; 4. Liquid distribution unit; 5. Liquid metering unit;

[0039] 101. Storage tank; 102. First liquid level sensor a; 103. Second liquid level sensor a; 104. Third liquid level sensor a; 105. Central liquid supply pipe;

[0040] 201. Temporary storage container; 202. First liquid level sensor b; 203. Second liquid level sensor b; 204. Third liquid level sensor b; 205. Connecting pipe;

[0041] 301. Plating tank; 302. Liquid inlet pipe;

[0042] 401. Pump; 402. Tee; 403. First main distribution pipe; 404. First solenoid valve; 405. First branch distribution pipe; 406. Second main distribution pipe; 407. Second solenoid valve; 408. Second branch distribution pipe;

[0043] 501. Pump addition; 502. First liquid inlet tube; 503. Measuring cup; 504. Third solenoid valve; 505. Second liquid inlet tube;

[0044] 2011, Fixed bracket; 2012, Pneumatic pump; 2013, Infusion tubing. Detailed Implementation

[0045] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0046] Please see Figure 1 As shown, a plating bath liquid addition device integrating production replenishment, tank preparation and tank washing functions includes a liquid storage unit 1, a working tank unit 3, a liquid temporary storage unit 2, a liquid distribution unit 4 and a liquid metering unit 5.

[0047] The liquid storage unit 1 is equipped with multiple units, which are used to store sulfuric acid, sodium hydroxide, hydrogen peroxide, hydrochloric acid, SPS (sodium polydithiopropane sulfonate), brightener and buffer, etc.

[0048] The working tank unit 3 is equipped with multiple tanks, which are used for processes such as pre-neutralization, neutralization, micro-etching, pre-immersion and copper plating.

[0049] Liquid distribution unit 4 is set up one-to-one with liquid storage unit 1, and is used to input the medicine in liquid storage unit 1 into working tank unit 3;

[0050] The liquid storage unit 2 is connected to the liquid distribution unit 4 and the working tank unit 3, and is used to control the amount of medicine delivered from the liquid distribution unit 4 to the working tank unit 3.

[0051] The liquid metering unit 5 is connected to the liquid storage unit 2 and the working tank unit 3, and is used to control the amount of medicine delivered from the liquid storage unit 2 to the working tank unit 3.

[0052] Please refer to it again. Figure 2 As shown, specifically, each unit contains the following structure:

[0053] The liquid storage unit 1 includes a storage tank 101; the top of the storage tank 101 is equipped with a first liquid level sensor a102, a second liquid level sensor a103, and a third liquid level sensor a104, the detection ends of which extend into the storage tank 101. The first liquid level sensor a102 is used to detect the ultra-low liquid level line in the storage tank 101, the second liquid level sensor a103 is used to detect the low liquid level line in the storage tank 101, and the third liquid level sensor a104 is used to detect the high liquid level line in the storage tank 101. The storage tank 101 is connected to a central liquid supply pipe 105, which is used to transport the prepared medicine solution into the storage tank 101 for production use.

[0054] Please refer to it again. Figure 4 As shown, the working tank unit 3 includes a plating tank 301, and a liquid inlet pipe 302 is provided inside the plating tank 301. The upper end of the liquid inlet pipe 302 is located at the top of the plating tank 301, and the lower end is located at the bottom of the plating tank 301.

[0055] Please refer to it again. Figure 5 As shown, the liquid distribution unit 4 includes a pump 401, the input end of which is connected to the corresponding storage tank 101 via a pipe; the output end of the pump 401 is equipped with a three-way pipe 402, one port of which is connected to the pump 401, and the other two ports are respectively connected to the first distribution main pipe 403 and the second distribution main pipe 406.

[0056] The first distribution main pipe 403 is connected to multiple first distribution branch pipes 405 in a parallel structure, and each first distribution branch pipe 405 is equipped with a first solenoid valve 404.

[0057] The second distribution main pipe 406 is connected to multiple second distribution branch pipes 408 in a parallel structure, and each second distribution branch pipe 408 is equipped with a second solenoid valve 407.

[0058] The other ends of the first distribution branch pipe 405 and the second distribution branch pipe 408 are both connected to the same corresponding plating tank 301. The difference is that the other end of the second distribution branch pipe 408 is directly connected to the liquid inlet pipe 302, thereby realizing the connection with the plating tank 301. Each first distribution branch pipe 405 is also connected to a liquid storage unit 2, which connects to the plating tank 301 after the liquid storage unit 2 has allocated the chemical delivery amount.

[0059] Please refer to it again. Figure 3 As shown, the liquid storage unit 2 includes a storage tank 201; the storage tank 201 is provided with a connecting pipe 205, which is connected to the corresponding first distribution branch pipe 405; the top of the storage tank 201 is provided with a first liquid level sensor b202, a second liquid level sensor b203 and a third liquid level sensor b204, the detection ends of which extend into the storage tank 201, wherein the first liquid level sensor b202, the second liquid level sensor b203 and the third liquid level sensor b204 are respectively used to detect the ultra-low liquid level line, the low liquid level line and the high liquid level line inside the storage tank 201.

[0060] Please refer to it again. Figure 6 As shown, the liquid metering unit 5 includes a feeding pump 501, a measuring cup 503, and a third solenoid valve 504. The feeding pump 501 is used to extract liquid from the temporary storage tank 201 and transport the liquid to the measuring cup 503 via the first liquid pipe 502. After the third solenoid valve 504 is opened, the liquid is then transported to the corresponding plating tank 301 through the second liquid pipe 505.

[0061] Please refer to it again. Figure 1 and Figure 7 As shown, the liquid material adding device provided by this invention has two specific application scenarios in actual operation: before and after production line start-up (production line start-up refers to starting to use the production line and preparing for production). In order to facilitate understanding of the above technical solution of this invention, the working principle or operation method of this invention before and after production line start-up in actual process will be described in detail below:

[0062] Before starting the production line, in order to extend the service life of plating tank 301, it is necessary to perform tank cleaning. Specifically, liquid (such as sulfuric acid, sodium hydroxide, hydrogen peroxide) is introduced into plating tank 301 to clean it, removing residual liquid or other impurities and keeping plating tank 301 clean. The steps are as follows:

[0063] A100: Sulfur acid, sodium hydroxide, hydrogen peroxide, hydrochloric acid, and SPS, etc., used in production, are added to each storage tank 101 via the central supply pipe 105. When the third liquid level sensor a104 detects the liquid, an alarm is triggered and the addition of liquid to the storage tank 101 is stopped. Furthermore, when the liquid is not detected by the second liquid level sensor a103, an audible or visual alert is given to the operator indicating the need for additional medication. During this process, medication can be automatically added via a custom program.

[0064] It is worth noting that each storage tank 101 stores only one type of liquid. In practical applications, one or more storage tanks 101 cooperate with each other to transport one or more liquids into the same corresponding plating tank 301 for production needs.

[0065] A200: Pump 401, in conjunction with T-connector 402, delivers the cleaning liquid to the second distribution main pipe 406. Then, the second solenoid valve 407 opens the corresponding second distribution branch pipe 408, allowing the liquid to be directly delivered to the corresponding plating tank 301 via the inlet pipe 302. It is important to note that when the first liquid level sensor a102 in the storage tank 101 does not detect liquid, pump 401 stops operating immediately, prompting the operator to add liquid to prevent damage from dry running. Furthermore, when the second distribution main pipe 406 is open, the first distribution main pipe 403 should be closed; similarly, when the first distribution main pipe 403 is open, the second distribution main pipe 406 should be closed to prevent cross-contamination of the cleaning solution.

[0066] A300: The liquid material entering the plating tank 301 rinses and replaces the residual liquid material in the plating tank 301, thereby maintaining the purity of the plating tank 301 and completing the maintenance work of the plating tank 301 before the line is opened.

[0067] Before starting the production line, in order to ensure the concentration of the liquid materials inside the plating tank 301, it is necessary to prepare the initial plating solution. Specifically, this involves introducing various liquid materials required for production into the plating tank 301 to prepare an initial plating solution with precise chemical composition concentration, coordinated proportions, and balanced additives. The steps are as follows:

[0068] B100: Sulfur, sodium hydroxide, hydrogen peroxide, hydrochloric acid and SPS are added to each storage tank 101 through the central liquid supply pipe 105 to prepare the initial plating solution. When the third liquid level sensor a104 detects the liquid, an alarm is issued and the addition of liquid to the storage tank 101 is stopped.

[0069] B200: Using pump 401 and three-way pipe 402, the liquid material used for production in each storage tank 101 is transported to the corresponding second distribution main pipe 406. Then, the pipeline of the corresponding second distribution branch pipe 408 is opened through the second solenoid valve 407, so that the liquid material in one or more storage tanks 101 is directly transported to the interior of the corresponding plating tank 301 through the liquid inlet pipe 302.

[0070] B300: After the liquid material entering the plating tank 301 is filled (meaning the amount sufficient for production use), the liquid supply is stopped, and the initial plating solution preparation work before the line starts is completed.

[0071] The liquid addition steps for maintenance tank cleaning and line preparation tank preparation are largely the same, with the main difference being: maintenance tank cleaning removes residual liquid or impurities from the plating tank 301 to prevent contamination and damage from mixed liquids generated during the last production run if the plating tank 301 has not been used for a long time. This is a routine maintenance task to avoid affecting its service life. On the other hand, line preparation involves adding initial plating solution to the plating tank 301 before starting production for products that require surface treatment. This is a production preparation task. Although both require the use of the second distribution pipe 406 for direct liquid supply, maintenance tank cleaning may only require one type of liquid, while line preparation typically requires multiple liquids to be supplied simultaneously.

[0072] After the production line is started, during the production process of plating tank 301, a small amount and a fixed quantity of liquid material need to be continuously added to the plating tank 301 to maintain the liquid material volume and concentration inside the plating tank 301, as follows:

[0073] C100: Liquid materials for production use are added to each storage tank 101 via the central supply pipe 105 (only one type of liquid material is added to each storage tank 101). The pump 401 and the three-way pipe 402 supply materials to the first distribution main pipe 403. After the first solenoid valve 404 opens the corresponding first distribution branch pipe 405, the first distribution main pipe 403 then delivers liquid materials to the first distribution branch pipe 405, and, in conjunction with the connecting pipe 205, adds temporarily stored production-deficient liquid materials to the temporary storage tank 201. Furthermore, when the liquid material delivered to the temporary storage tank 201 reaches the liquid level line monitored by the third liquid level sensor b204, the pump 401 is turned off. When the liquid material reaches the liquid level line monitored by the second liquid level sensor b203, the pump 401 is turned on to begin replenishing the liquid.

[0074] C200: A liquid level sensor is installed inside the measuring cup 503 (the measuring range is 500ml in this embodiment). The height of the liquid level sensor is adjusted to the corresponding measuring range height position according to the volume of liquid to be added to each plating tank 301.

[0075] C300: The addition pump 501 draws liquid from the temporary storage tank 201 and delivers it to the measuring cup 503. When the liquid in the measuring cup 503 rises to the specified height, the liquid level sensor alarms, the addition pump 501 stops running, the third solenoid valve 504 opens the second liquid passage 505, and the liquid in the measuring cup 503 enters the plating tank 301 through the second liquid passage 505. Specifically, when the liquid delivered in the temporary storage tank 201 reaches the liquid level line monitored by the first liquid level sensor b202, the addition pump 501 is shut off to prevent dry running and damage.

[0076] During the aforementioned liquid addition process, when replenishing the solvent or base solution in plating tank 301, a float switch combined with a limit switch controls the operation of the addition pump 501 to achieve automatic replenishment of the solvent or base solution. Specifically, the float monitors the electroplating solution level, and when the level drops, it triggers the addition pump 501 or a valve to replenish the solution. Maintaining the concentration of the liquid in plating tank 301 requires the use of an online analyzer (such as the MAZ-XR300 online analyzer, which can simultaneously detect multiple metal ions and non-metallic components). Spectroscopy (such as Moseley's law) or electrochemical sensors (such as pH electrodes and ion-selective electrodes) are used to detect the concentration of metal ions or additives in the electroplating solution in real time, feeding this information back to the control system (which dynamically adjusts the dosage through a PID algorithm or uses an AI model to predict consumption trends) to adjust the dosage and ensure a consistent liquid concentration. Furthermore, for certain chemicals with stable consumption rates, a pre-set dosing program can be used with periodic calibration, such as adding X liters per hour (X being a constant), to automatically replenish such solutions.

[0077] In summary, the main reason for using the first distribution pipe 403 and the second distribution pipe 406 for chemical supply before and after line start-up is the difference in supply efficiency and accuracy of the liquid delivered by the first distribution pipe 403 and the second distribution pipe 406. Before line start-up, in addition to routine maintenance, a large amount of liquid is needed to rinse and replace residual liquid and impurities in the plating tank 301. Therefore, using a pump 401 with a larger flow rate (the reason why pump 401 has a larger flow rate is to quickly fill the temporary storage tank 201 with liquid to improve operating efficiency) to directly pump the liquid in the storage tank 101 into the plating tank 301 can increase the liquid supply and improve efficiency. After line start-up, chemical replenishment is frequently performed in the plating tank 301, and replenishment is generally done by adding small amounts multiple times. Therefore, the high-flow-rate pump 401 cannot meet the needs of adding small amounts multiple times. Based on this, by setting up a temporary storage tank 201 and using the temporary storage tank 201 to store a small amount of liquid material, and cooperating with a small flow rate but precise liquid material addition pump 501 (such as a plunger pump) to deliver the liquid material to the measuring cup 503, and with the liquid level sensor set inside it, the liquid material can be quantitatively added into the plating tank 301 with high precision, which not only prevents waste caused by adding too much liquid material, but also avoids poor product quality caused by adding too little liquid material.

[0078] Specifically, such as Figure 7 As shown, this invention employs a liquid distribution pipe 403 and its accessories, and a second distribution pipe 406 and its accessories to implement a liquid diversion and conveying method. Different liquid conveying methods are used for two different application scenarios: before and after line startup, demonstrating a higher and more intelligent level of automation. It solves the limitations of manual operation. This equipment can control the start and stop of the addition system based on each liquid level sensor. When the sensor detects a decrease in liquid level, it directly transmits a signal to the computer, which directly controls the execution end to start adding chemicals. No manual line tracking or observation is required, saving manpower and adapting to more complex addition systems. Simultaneously, since the pipelines for each type of liquid or other liquid directly correspond to each plating tank 301, losses due to human error (e.g., agent A should be added to tank A but is added to tank B) are avoided. Automated addition reduces human intervention and operational errors, making it suitable for the efficient operation of continuous electroplating or electroless plating production lines. In addition, since some liquids are highly corrosive (such as hydrochloric acid) or highly toxic, manual operation poses safety hazards. The automatic addition method is safer and the quantitative addition method is more precise, which can prevent secondary pollution caused by excessive addition and help wastewater discharge meet standards, making it more environmentally friendly.

[0079] For further details, please refer to [link / reference]. Figure 8 As shown, if equipment failure prevents the addition of liquid materials, a redundancy design is implemented in the temporary storage tank 201 to maintain the continuity of production. Specifically:

[0080] A fixed bracket 2011 is fixedly connected to the side of the temporary storage tank 201; an infusion tube 2013 extending into the temporary storage tank 201 is provided on the fixed bracket 2011; a pneumatic pump 2012 is installed on the infusion tube 2013 corresponding to the fixed bracket 2011. In actual use, the liquid tank containing the liquid is moved under the pneumatic pump 2012, and the liquid is manually added to the temporary storage tank 201 using the pneumatic pump 2012 to maintain the normal operation of the equipment.

[0081] It should be noted that, in this document, terms such as “comprising,” “including,” or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0082] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention.

Claims

1. A plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions, characterized in that: It includes multiple liquid storage units (1), liquid temporary storage units (2), working tank units (3), liquid distribution units (4), and liquid metering units (5); The liquid storage unit (1) includes a storage tank (101). The working tank unit (3) includes a plating tank (301), and the working tank unit (3) is provided with multiple tanks; The liquid distribution unit (4) includes a high-flow pump (401), the input end of which is connected to the corresponding storage tank (101) via a pipe; the output end of the pump (401) is equipped with a three-way pipe (402), one of the ports of which is connected to the pump (401), and the other two ports are respectively connected to the first distribution main pipe (403) and the second distribution main pipe (406). The first distribution main pipe (403) is connected to multiple first distribution branch pipes (405) in a parallel structure; the second distribution main pipe (406) is connected to multiple second distribution branch pipes (408) in a parallel structure. Each first distribution branch pipe (405) is connected to a liquid storage unit (2), and the liquid storage unit (2) is connected to a liquid metering unit (5). The liquid metering unit (5) is connected to a plating tank (301). Each second distribution branch pipe (408) is directly connected to the plating tank (301) via the liquid inlet pipe (302); Each plating tank (301) is connected to at least one first distribution branch pipe (405) and one second distribution branch pipe (408).

2. The plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions according to claim 1, characterized in that: The top of the storage tank (101) is equipped with a first liquid level sensor a (102), a second liquid level sensor a (103), and a third liquid level sensor a (104) with the detection end extending into the storage tank.

3. The plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions according to claim 1, characterized in that: The liquid storage unit (2) includes a storage tank (201); the storage tank (201) is provided with a connecting pipe (205), which is connected to the corresponding first distribution branch pipe (405).

4. The plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions according to claim 3, characterized in that: The top of the temporary storage tank (201) is equipped with a first liquid level sensor b (202), a second liquid level sensor b (203), and a third liquid level sensor b (204) with the detection end extending into the temporary storage tank.

5. The plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions according to claim 3, characterized in that: The liquid metering unit (5) includes a pump (501), a measuring cup (503) and a third solenoid valve (504). A liquid level sensor is installed inside the measuring cup (503). The pump (501) draws liquid from the storage tank (201) and uses the first liquid pipe (502) to transport the liquid to the measuring cup (503). Then, the liquid is transported to the corresponding plating tank (301) through the second liquid pipe (505).

6. The plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions according to claim 3, characterized in that: The temporary storage tank (201) is fixedly connected to a fixed bracket (2011) on its side; the fixed bracket (2011) is provided with an infusion tube (2013) that extends into the interior of the temporary storage tank (201); the infusion tube (2013) is connected to a pneumatic pump (2012) installed on the fixed bracket (2011).

7. The plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions according to claim 1, characterized in that: The storage tank (101) is connected to a central liquid supply pipe (105); a first solenoid valve (404) is installed on each first distribution branch pipe (405); and a second solenoid valve (407) is installed on each second distribution branch pipe (408).

8. The plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions according to claim 1, characterized in that: The following steps are included when cleaning and maintaining the plating tank (301): A100: Add liquid for washing tanks to each storage tank (101) through the central liquid supply pipe (105), and issue an alarm and stop adding liquid to the storage tank (101) when the third liquid level sensor a (104) detects the liquid. A200: Using a pump (401) and a three-way pipe (402), the liquid material for cleaning is transported to the second distribution main pipe (406), and then the pipeline of the corresponding second distribution branch pipe (408) is opened through the second solenoid valve (407), so that the liquid material is directly transported to the interior of the corresponding plating tank (301) through the liquid inlet pipe (302); A300: The liquid material entering the plating tank (301) rinses and replaces the residual liquid material in the plating tank (301) to maintain the purity of the plating tank (301).

9. The plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions according to claim 1, characterized in that: When configuring the plating tank (301), the following steps are included: B100: Add liquid material for preparing the initial plating solution to each storage tank (101) through the central liquid supply pipe (105), and issue an alarm and stop adding liquid material into the storage tank (101) when the third liquid level sensor a (104) detects the liquid material. B200: Using a pump (401) and a three-way pipe (402), the liquid material used to prepare the initial plating solution in each storage tank (101) is transported to the corresponding second distribution main pipe (406), and then the pipeline of the corresponding second distribution branch pipe (408) is opened through the second solenoid valve (407), so that the liquid material in one or more storage tanks (101) is directly transported to the interior of the corresponding plating tank (301) through the liquid inlet pipe (302); B300: Stop supplying liquid after the plating tank (301) is full.

10. The plating bath material addition device integrating production replenishment, tank preparation, and tank washing functions according to claim 1, characterized in that: When the plating tank (301) generates replenishment solution, the following steps are included: C100: Liquid materials for production are added to each storage tank (101) through the central liquid supply pipe (105), and the liquid materials missing in production are supplied to the first distribution main pipe (403) through the cooperation of the pump (401) and the three-way pipe (402). After the first solenoid valve (404) opens the corresponding first distribution branch pipe (405), the first distribution main pipe (403) then delivers liquid materials to the first distribution branch pipe (405), and the liquid materials temporarily stored are added to the temporary storage tank (201) through the connecting pipe (205). C200: A liquid level sensor is installed inside the measuring cup (503). The height of the liquid level sensor is adjusted to the corresponding range height position according to the volume of liquid to be added to each plating tank (301). C300: The addition pump (501) draws liquid from the storage tank (201) and delivers it to the measuring cup (503). When the liquid in the measuring cup (503) rises to the specified height, the liquid level sensor alarms, the addition pump (501) stops running, the third solenoid valve (504) opens the second liquid passage (505), and the liquid in the measuring cup (503) enters the plating tank (301) through the second liquid passage (505).

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