Cleaning device based on chemical vapor deposition reactor and residue recovery structure thereof

Abstract

The invention relates to the technical field of chemical vapor deposition equipment, and discloses a cleaning device based on a chemical vapor deposition reactor and a residue recovery structure thereof.The cleaning device comprises the CVD reactor 1, a reaction part 2 is arranged in the CVD reactor 1 and serves as a basic bearing and process adaptation structure of the CVD reactor 1, and a temperature environment needed by reaction is provided; the reaction part 2 comprises heating plates 21, the heating plates 21 are installed in the CVD reactor 1 in an annular array mode, two cross beams 22 are connected into the CVD reactor 1, guide plates 23 are symmetrically installed between the two cross beams 22, and the guide plates 23 are connected with the heating plates 21 through a pipeline. Oxidative free radicals are generated through the vacuum electrolysis effect of the spiral electrode to oxidize metal oxide residues, the ultraviolet lamp and the light-transmitting column array form global photolysis irradiation, the ultraviolet lamp and the light-transmitting column array cooperate to efficiently decompose multiple types of residues such as carbon-based residues and metal-based residues, and the problem that a traditional single cleaning technology is poor in adaptability is solved.

Description

Technical Field

[0001] This invention relates to the field of chemical vapor deposition equipment technology, specifically to a cleaning device based on a chemical vapor deposition reactor and its residue recovery structure. Background Technology

[0002] Chemical vapor deposition (CVD) is a core process in semiconductor manufacturing, photovoltaic thin film preparation, and functional coating synthesis. During the reaction process, incomplete precursor reactions and byproduct deposition can lead to the formation of persistent residues on the surfaces of critical components such as the reactor inner wall, stage, and nozzles. These residues can cause decreased film deposition uniformity, increased defect rates, and even serious problems such as reactor pipe blockage and temperature field disturbances, directly impacting production efficiency and product quality. Therefore, efficient cleaning technology for CVD reactors is crucial for ensuring process stability. Currently, existing CVD reactor cleaning technologies are mainly divided into mechanical cleaning and chemical cleaning.

[0003] Mechanical cleaning technology removes residues by contacting and rubbing mechanical parts such as scrapers and brushes against the inner wall of the reactor. Although it can handle thick layers of residues, it is easy to scratch or wear the precision surfaces of the reactor. It is especially unsuitable for equipment with complex cavity structures or nanometer-level precision requirements. At the same time, the dust generated during mechanical cleaning can easily cause secondary pollution of the reaction chamber, and it is difficult to remove residues in narrow passages, corners and other areas, resulting in prominent cleaning dead corners. Chemical cleaning technologies rely on the corrosive effects of strong acids, strong alkalis, or fluorinated etchants to decompose residues. While they can achieve high cleaning efficiency, chemical reagents can easily corrode the metal chambers or seals of reactors, leading to a shortened equipment lifespan. In addition, wastewater treatment requires complex environmental protection processes, posing a risk of secondary pollution. Furthermore, for residues containing organometallic compounds, chemical etching can easily generate toxic volatiles, threatening the safety of operators and failing to meet the development trend of green manufacturing. In summary, existing CVD reactor cleaning technologies have significant limitations in terms of cleaning efficiency, environmental friendliness, and residue adaptability, failing to meet the practical requirements for high-precision, multi-type residue cleaning. Therefore, this paper proposes a cleaning device and its residue recovery structure based on a chemical vapor deposition reactor to address the aforementioned problems. Summary of the Invention

[0004] (a) Technical problems to be solved To address the shortcomings of existing technologies, this invention provides a cleaning device and its residue recovery structure based on a chemical vapor deposition reactor, which solves the significant limitations of existing CVD reactor cleaning technologies in terms of cleaning efficiency, environmental friendliness, and residue adaptability.

[0005] (II) Technical Solution To achieve the above objectives, the present invention provides the following technical solution: a cleaning device based on a chemical vapor deposition reactor, comprising a CVD reactor, wherein a reaction section is provided inside the CVD reactor, the reaction section includes heating plates, the heating plates are arranged in a ring array inside the CVD reactor, two crossbeams are connected inside the CVD reactor, guide plates are symmetrically installed between the two crossbeams, a light-transmitting plate is snapped between the two guide plates, a spiral electrode is installed on the heating plates, an installation section is provided on the reaction section, the installation section includes a lamp holder, the lamp holder is installed on the light-transmitting plate, a photolysis section is provided on the installation section, the photolysis section includes an ultraviolet lamp, the ultraviolet lamp is installed on the lamp holder.

[0006] Preferably, the reaction section further includes a support rod, which is fixedly connected to the light-transmitting plate, and a feeding platform is installed on the support rod.

[0007] Preferably, the mounting part further includes a screw hole, which is formed on the light-transmitting plate. The light-transmitting plate also has a limiting hole and a sliding hole, and an arc-shaped baffle is installed on the light-transmitting plate.

[0008] Preferably, the spiral electrode is fixedly inserted through the two guide plates and located between the outer wall of the arc-shaped baffle and the inner wall of the CVD reactor, and the two guide plates are inclined on the side that is close to each other.

[0009] Preferably, the photolysis section further includes a sealing sleeve, which is installed on the outer wall of the CVD reactor. A motor is sealed and installed on the sealing sleeve, and the output shaft of the motor is connected to a screw, which moves through the CVD reactor.

[0010] Preferably, the end of the screw is rotatably connected to the inner wall of the arc-shaped baffle, the screw is threadedly connected to the screw hole, and a limiting arm is fixedly connected to the inner wall of the arc-shaped baffle. The limiting arm has an L-shaped structure and is slidably connected to the limiting hole.

[0011] Preferably, the light-transmitting plate is provided with a light compensation part, the light compensation part includes a slide, the slide is a U-shaped structure, the lug end of the slide is slidably connected to the sliding hole, a prism frame is fixedly connected to the lug end of the slide, and a light-transmitting column is fixedly connected to the prism frame, the light-transmitting column is arranged in a prism array.

[0012] Preferably, a bracket is fixedly connected to the inner wall of the prismatic frame, a suction cup is installed on the bracket, a chuck is installed on the loading platform, and an air hole is opened on the chuck.

[0013] Preferably, a vacuum tube is connected and installed on the CVD reactor, the vacuum tube is aligned with the center of the chuck and suction cup, a front cover and a rear cover are installed on the CVD reactor, one end of the spiral electrode is fixedly extended to the outside of the CVD reactor, and the other end of the spiral electrode is fixedly extended to the outside of the rear cover.

[0014] A residue recovery structure for a cleaning device based on a chemical vapor deposition reactor is provided. According to the aforementioned cleaning device based on a chemical vapor deposition reactor, a recovery section is installed on the arc-shaped baffle. The recovery section includes a sliding arm, which is fixedly connected to the inner wall of the arc-shaped baffle. A scraper arm is slidably installed on the sliding arm, and a support arm is fixedly connected to the scraper arm. A handle is provided at the end of the support arm.

[0015] (III) Beneficial Effects Compared with the prior art, the present invention provides a cleaning device and its residue recovery structure based on a chemical vapor deposition reactor, which has the following beneficial effects: 1. The cleaning device and its residue recovery structure based on chemical vapor deposition reactor use the vacuum electrolysis of spiral electrodes to generate oxidizing free radical metal oxide residues. Ultraviolet lamps and light-transmitting column arrays form a full-domain photolysis irradiation. The two work together to achieve efficient decomposition of various types of residues such as carbon-based and metal-based residues, solving the problem of poor adaptability of traditional single cleaning technologies.

[0016] 2. The cleaning device and residue recovery structure based on the chemical vapor deposition reactor use non-mechanical contact methods of photolysis and electrolysis to remove residues, avoiding scratches and wear on the inner wall of the reactor, heating plate and other precision components caused by mechanical cleaning, and ensuring the stability of subsequent deposition processes.

[0017] 3. The cleaning device and its residue recovery structure based on chemical vapor deposition reactor use a light-transmitting column array to introduce ultraviolet light into narrow channels, corners and other areas through directional conduction. Combined with the residue collection effect of the arc-shaped baffle, it solves the problem of dead corner residue in traditional cleaning.

[0018] 4. The cleaning device and its residue recovery structure based on chemical vapor deposition reactor adopt green and environmentally friendly methods that do not require strong acids or alkalis. The cleaning products are harmless small molecules such as carbon dioxide and water. The residue is recovered through negative pressure and mechanical scraping, which is in line with the trend of green manufacturing and reduces the cost of waste liquid treatment.

[0019] 5. The cleaning device and its residue recovery structure based on chemical vapor deposition reactor adopts designs such as lifting and lowering of the light-transmitting plate and unfolding and shrinking of the light compensation section, which can be adapted to reactors of different sizes and residue distribution scenarios, thus improving the versatility of the device.

[0020] 6. The cleaning device and its residue recovery structure based on the chemical vapor deposition reactor adopts structural designs such as arc-shaped baffle protection, negative pressure fixation, and sealing sleeve to prevent leakage, which reduces the damage to the equipment during the cleaning process and extends the overall service life of the CVD reactor. Attached Figure Description

[0021] Figure 1 This is a front view schematic diagram of a cleaning device and its residue recovery structure based on a chemical vapor deposition reactor proposed in this invention. Figure 2 This is a rear view schematic diagram of a cleaning device and its residue recovery structure based on a chemical vapor deposition reactor proposed in this invention. Figure 3 This is a schematic diagram of the interior of a CVD reactor, which is a cleaning device and residue recovery structure based on a chemical vapor deposition reactor proposed in this invention. Figure 4 This is a schematic diagram of the heating plate of a cleaning device and residue recovery structure based on a chemical vapor deposition reactor proposed in this invention. Figure 5 This is a diagram showing the connection between the transparent plate and the feeding platform of a cleaning device and its residue recovery structure based on a chemical vapor deposition reactor proposed in this invention. Figure 6 This is a diagram showing the connection between the light-transmitting plate and the ultraviolet lamp column of a cleaning device and its residue recovery structure based on a chemical vapor deposition reactor proposed in this invention. Figure 7 This is a schematic diagram of a prism-shaped frame for a cleaning device and residue recovery structure based on a chemical vapor deposition reactor proposed in this invention. Figure 8 This is a schematic diagram of the recovery section of a cleaning device based on a chemical vapor deposition reactor and its residue recovery structure proposed in this invention.

[0022] In the diagram: 1. CVD reactor; 2. Reaction section; 21. Heating plate; 22. Crossbeam; 23. Guide plate; 24. Light-transmitting plate; 25. Support rod; 26. Feeding platform; 27. Spiral electrode; 3. Mounting section; 31. Lamp holder; 32. Screw hole; 33. Limiting hole; 34. Sliding hole; 35. Arc-shaped baffle; 4. Photolysis section; 41. Sealing sleeve; 42. Motor; 43. Screw; 44. Limiting arm; 45. Ultraviolet lamp; 5. Light compensation section; 51. Slide carriage; 52. Prism-shaped frame; 53. Support; 54. Suction cup; 55. Light-transmitting column; 56. Chuck; 6. Recovery section; 61. Sliding arm; 62. Scraper arm; 63. Support arm; 64. Handle; 7. Vacuum tube; 8. Front cover; 9. Rear cover. Detailed Implementation

[0023] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0024] Please see Figure 1-8 This invention provides a technical solution: a cleaning device based on a chemical vapor deposition reactor (CVD reactor), comprising a CVD reactor 1, a reaction section 2 disposed within the CVD reactor 1, serving as the basic support and process adaptation structure of the CVD reactor 1, providing the temperature environment required for the reaction, assisting the collection of residues into the recovery area, and providing an electrode foundation for subsequent vacuum electrolytic cleaning. The reaction section 2 includes heating plates 21 arranged in a ring array within the CVD reactor 1. Two crossbeams 22 are connected within the CVD reactor 1, and guide beams are symmetrically installed between the two crossbeams 22. Plate 23, a light-transmitting plate 24 is snapped between two guide plates 23, a spiral electrode 27 is installed on the heating plate 21, and an installation part 3 is provided on the reaction part 2 as the core structure for device adjustment and protection to ensure stable installation of the photolysis light source. The installation part 3 includes a lamp holder 31, which is installed on the light-transmitting plate 24. The light-transmitting plate 24 is made of quartz glass. The installation part 3 is provided with a photolysis part 4, which is the core module for photolysis of photoelectric synergistic cleaning and directly photolysis of the chemical bonds of carbon-based residues. The photolysis part 4 includes an ultraviolet lamp 45, which is installed on the lamp holder 31.

[0025] In this invention, the reaction section 2 also includes a support rod 25, which is fixedly connected to the light-transmitting plate 24. A feeding platform 26 is installed on the support rod 25. The mounting section 3 also includes a screw hole 32, which is opened on the light-transmitting plate 24. The light-transmitting plate 24 also has a limiting hole 33 and a sliding hole 34. An arc-shaped baffle 35 is installed on the light-transmitting plate 24. The spiral electrode 27 is fixedly inserted through the two guide plates 23 and located between the outer wall of the arc-shaped baffle 35 and the inner wall of the CVD reactor 1. The sides of the two guide plates 23 that are close to each other are both inclined structures.

[0026] In this embodiment, the photolysis unit 4 also includes a sealing sleeve 41, which is installed on the outer wall of the CVD reactor 1. A motor 42 is sealed and installed on the sealing sleeve 41. The output shaft of the motor 42 is connected to a screw 43, which moves through the CVD reactor 1. The end of the screw 43 is rotatably connected to the inner wall of the arc-shaped baffle 35. The screw 43 is threadedly connected to the screw hole 32. A limiting arm 44 is fixedly connected to the inner wall of the arc-shaped baffle 35. The limiting arm 44 has an L-shaped structure and is slidably connected to the limiting hole 33.

[0027] It is worth noting that a light compensation section 5 is provided on the light-transmitting plate 24. As an ultraviolet enhancement and structural fixing module, it introduces ultraviolet light into the corners of the reactor and other cleaning dead corners through focusing and directional transmission, making up for the blind spots of light. The light compensation section 5 includes a slide 51, which is a U-shaped structure. The lug end of the slide 51 is slidably connected to the sliding hole 34. A prism frame 52 is fixedly connected to the lug end of the slide 51. A light-transmitting column 55 is fixedly connected to the prism frame 52. The light-transmitting column 55 is made of quartz glass and is arranged in a prism array. A bracket 53 is fixedly connected to the inner wall of the prism frame 52. A suction cup 54 is installed on the bracket 53. A chuck 56 is installed on the loading table 26. The chuck 56 has air holes.

[0028] It is worth noting that a vacuum tube 7 is connected and installed on the CVD reactor 1. The vacuum tube 7 is aligned with the center of the chuck 56 and the suction cup 54. A front cover 8 and a rear cover 9 are installed on the CVD reactor 1. One end of the spiral electrode 27 is fixedly extended to the outside of the CVD reactor 1, and the other end of the spiral electrode 27 is fixedly extended to the outside of the rear cover 9.

[0029] A residue recovery structure for a cleaning device based on a chemical vapor deposition reactor is provided. According to the aforementioned cleaning device based on a chemical vapor deposition reactor, a recovery section 6 is installed on an arc-shaped baffle 35. In conjunction with the negative pressure airflow of a vacuum tube 7, the scraped residue is collected in a directional manner to avoid secondary pollution. The recovery section 6 includes a sliding arm 61, which is fixedly connected to the inner wall of the arc-shaped baffle 35. A scraper arm 62 is slidably installed on the sliding arm 61, and a support arm 63 is fixedly connected to the scraper arm 62. A handle 64 is provided at the end of the support arm 63.

[0030] Working principle: After the normal deposition process of CVD reactor 1 is completed, the device is in the initial standby state. The light-transmitting plate 24 is connected to the crossbeam 22 through the guide plate 23 and is located in the lower part of the reactor. The ultraviolet lamp 45 is fixed on the lamp holder 31 of the light-transmitting plate 24 and is in the non-working state. The slide 51 of the light compensation part 5 is slidably connected to the sliding hole 34 of the light-transmitting plate 24 through the ear end. The prism frame 52 and the light-transmitting column 55 are in the retracted position and are not in contact with the loading platform 26. The vacuum tube 7 is connected to the vacuum pump. The chuck 56 and the suction cup 54 are in the normal pressure state. The scraper arm 62 of the recovery part 6 rests on one side of the arc baffle 35.

[0031] The motor 42 of the photolysis unit 4 is started. The output shaft of the motor 42 drives the screw 43 to rotate. The screw 43 is threaded into the screw hole 32 of the light-transmitting plate 24. At the same time, the light-transmitting plate 24 slides along the limiting arm 44 until it reaches the middle area of ​​the reactor. The vacuum tube 7 is started to draw a vacuum. The negative pressure is transmitted to the chuck 56 and the suction cup 54 through the pipeline. Under the suction of the negative pressure, the suction cup 54 is tightly attached to the surface of the chuck 56. At the same time, the slide 51 slides along the sliding hole 34, which drives the light-transmitting columns 55 on the prism frame 52 to pass through the gap of the loading platform 26 in an array, forming an ultraviolet-enhanced conduction array covering the middle area of ​​the reactor.

[0032] When the spiral electrode 27 is energized, an electrolytic effect is generated in the vacuum environment inside the reactor. An electrolytic electric field is formed between the outer wall of the arc-shaped baffle 35 and the inner wall of the reactor, which excites the residual gas to generate oxidizing free radicals. These free radicals electrolytically oxidize the metal oxide residues on the inner wall of the reactor and the surface of the heating plate 21, transforming them into easily decomposable intermediate products.

[0033] The ultraviolet lamp 45 is turned on simultaneously, and the ultraviolet light is transmitted to the inside of the reactor through the quartz glass light-transmitting plate 24. Some of the light directly irradiates the residue on the inside of the arc-shaped baffle 35 and the inner wall of the reactor, and uses photon energy to break the chemical bonds of the carbon-based residue, decomposing it into small molecule gaseous products.

[0034] The quartz glass light-transmitting columns 55 on the prism frame 52 are distributed in an array to direct ultraviolet light to traditional cleaning dead corners such as the corners of the reactor and the bottom of the feeding platform 26. Through light reflection and focusing effect, the local ultraviolet illuminance is improved, the photolysis effect on residues in narrow areas is enhanced, and the entire area is cleaned without dead corners.

[0035] The motor 42 finely adjusts the height of the light-transmitting plate 24 through the screw 43, driving the ultraviolet lamp 45 and the light-transmitting column 55 to rise and fall synchronously, so that the ultraviolet light and the electrolytic electric field form a dynamic coupling area, ensuring that the photolysis products and electrolytic free radicals react fully, and further oxidize the intermediate products into carbon dioxide, water and volatile metal halides.

[0036] Vacuum tube 7 continuously draws a vacuum, forming a directional airflow inside the reactor to draw out the gaseous products and tiny solid residues generated by photolysis and electrolysis. The residues that are not drawn out will roll down the inclined surface of guide plate 23 to the arc-shaped baffle 35 for collection. When the photoelectric collaborative cleaning reaches the set time, the ultraviolet lamp 45 and the spiral electrode 27 stop working, the motor 42 drives the light-transmitting plate 24 to descend and reset, and the light-transmitting column 55 retracts and detaches from the loading platform 26 along with the prism frame 52. By pulling the support arm 63 through the handle 64, the scraper arm 62 slides along the sliding arm 61 to mechanically scrape off the solid residues accumulated at the bottom of the inner wall of the arc-shaped baffle 35.

Claims

1. A cleaning apparatus based on a chemical vapor deposition reactor, comprising a CVD reactor (1), characterized in that: The CVD reactor (1) is provided with a reaction section (2), which includes a heating plate (21). The heating plate (21) is arranged in a ring array inside the CVD reactor (1). Two crossbeams (22) are connected inside the CVD reactor (1). Guide plates (23) are symmetrically installed between the two crossbeams (22). A light-transmitting plate (24) is snapped between the two guide plates (23). A spiral electrode (27) is installed on the heating plate (21). The reaction section (2) is provided with a mounting section (3), which includes a lamp holder (31) mounted on a light-transmitting plate (24). The mounting section (3) is provided with a photolysis section (4), which includes an ultraviolet lamp (45) mounted on the lamp holder (31).

2. The cleaning device based on a chemical vapor deposition reactor according to claim 1, characterized in that: The reaction section (2) also includes a support rod (25), which is fixedly connected to the light-transmitting plate (24), and a feeding platform (26) is installed on the support rod (25).

3. The cleaning device based on a chemical vapor deposition reactor according to claim 2, characterized in that: The mounting part (3) also includes a screw hole (32), which is opened on the light-transmitting plate (24). The light-transmitting plate (24) also has a limiting hole (33) and a sliding hole (34). An arc-shaped baffle (35) is installed on the light-transmitting plate (24).

4. A cleaning device based on a chemical vapor deposition reactor according to claim 3, characterized in that: The spiral electrode (27) is fixedly inserted through the two guide plates (23) and located between the outer wall of the arc-shaped baffle (35) and the inner wall of the CVD reactor (1). The two guide plates (23) are inclined on the side that is close to each other.

5. A cleaning device based on a chemical vapor deposition reactor according to claim 4, characterized in that: The photolysis section (4) also includes a sealing sleeve (41), which is installed on the outer wall of the CVD reactor (1). A motor (42) is sealed on the sealing sleeve (41), and the output shaft of the motor (42) is connected to a screw (43). The screw (43) moves through the CVD reactor (1).

6. A cleaning device based on a chemical vapor deposition reactor according to claim 5, characterized in that: The end of the screw (43) is rotatably connected to the inner wall of the arc-shaped baffle (35). The screw (43) is threadedly connected to the screw hole (32). The inner wall of the arc-shaped baffle (35) is fixedly connected to a limiting arm (44). The limiting arm (44) is an L-shaped structure. The limiting arm (44) is slidably connected to the limiting hole (33).

7. A cleaning device based on a chemical vapor deposition reactor according to claim 6, characterized in that: The light-transmitting plate (24) is provided with a light compensation part (5), which includes a slide (51). The slide (51) has a U-shaped structure. The lug end of the slide (51) is slidably connected to the sliding hole (34). A prism frame (52) is fixedly connected to the lug end of the slide (51). A light-transmitting column (55) is fixedly connected to the prism frame (52). The light-transmitting column (55) is arranged in a prism array.

8. A cleaning apparatus based on a chemical vapor deposition reactor according to claim 7, characterized in that: The inner wall of the prism frame (52) is fixedly connected to a bracket (53), a suction cup (54) is installed on the bracket (53), a chuck (56) is installed on the loading platform (26), and an air hole is opened on the chuck (56).

9. A cleaning device based on a chemical vapor deposition reactor according to claim 8, characterized in that: A vacuum tube (7) is connected to the CVD reactor (1). The vacuum tube (7) is aligned with the center of the chuck (56) and the suction cup (54). A front cover (8) and a rear cover (9) are installed on the CVD reactor (1). One end of the spiral electrode (27) is fixedly extended to the outside of the CVD reactor (1), and the other end of the spiral electrode (27) is fixedly extended to the outside of the rear cover (9).

10. A residue recovery structure for a cleaning device based on a chemical vapor deposition reactor, as described in any one of claims 3-9, characterized in that: A recycling section (6) is installed on the arc-shaped baffle (35). The recycling section (6) includes a sliding arm (61). The sliding arm (61) is fixedly connected to the inner wall of the arc-shaped baffle (35). A scraper arm (62) is slidably installed on the sliding arm (61). A support arm (63) is fixedly connected to the scraper arm (62). A handle (64) is provided at the end of the support arm (63).

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