An optical cleaning simulation analysis method and device, electronic equipment and storage medium

Abstract

The application provides a kind of light cleaning simulation analysis method, device, electronic equipment and storage medium, it relates to light cleaning technical field.The method comprises the following steps: obtaining the geometric model of light cleaning chamber, and setting simulation parameters for the geometric model;Add geometric optical physical field and laminar flow physical field in the geometric model;Set material initial condition to the geometric model;By ray tracing to the geometric optical physical field and steady-state solution to the laminar flow physical field, simulate the ultraviolet irradiance and gas flow field inside the light cleaning chamber, obtain simulation result;By simulating and analyzing the simulation result, obtain simulation analysis result.The method of the application aims to solve the problem that the existing light cleaning technology lacks effective guidance when exploring the gas path and light source layout, resulting in low research efficiency and high trial and error cost, to improve the efficiency of research exploration and reduce the cost of exploration in experiments.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of photo cleaning, in particular to a photo cleaning simulation analysis method and device, electronic equipment and storage medium. BACKGROUND

[0002] The display industry is accelerating upgrading to large size and high resolution, and the surface cleanliness of the glass substrate and the process reliability are becoming the key factors restricting the yield of the display panel. The traditional wet cleaning process has problems such as chemical pollution and substrate damage, while the 172nm ultraviolet (UV) cleaning technology has become an important development direction of the industry due to its advantages of no pollution and high efficiency. The cleaning principle is that when an organic compound (hydrocarbon) absorbs ultraviolet photon energy, it is decomposed into ions, free atoms, excited molecules or neutral molecules. At the same time, the 172nm ultraviolet light excites O2 to produce active O atoms and O3, and the active O atoms and O3 oxidize the organic matter on the surface of the substrate to produce CO2 and H2O, thereby achieving the purpose of removing the organic matter on the surface of the substrate.

[0003] The cleaning chamber as the most critical component is provided with: a plurality of 172nm ultraviolet light emitting devices; a plurality of gas supply devices for introducing nitrogen and clean dry oxygen into the chamber; a conveying device for conveying the substrate; an exhaust device for exhausting the gas in the chamber; and a substrate inlet and a substrate outlet oppositely arranged.

[0004] The distribution of the gas flow field in the chamber will affect the irradiation intensity of the ultraviolet light on the glass substrate, and also affect the concentration of active oxygen atoms and O3 generated in the chamber, thereby affecting the photo cleaning effect. Therefore, the reasonable gas path and light source layout in the large-size glass substrate photo cleaning chamber are particularly important. However, researchers often lack experimental direction guidance in exploring the gas path and light source layout, resulting in low research efficiency and high trial and error cost. Therefore, how to improve the research efficiency and reduce the research cost has become a problem to be solved in the photo cleaning technology. SUMMARY

[0005] The present application relates to the technical field of photo cleaning, in particular to a photo cleaning simulation analysis method and device, electronic equipment and storage medium.

[0006] In a first aspect, the present application provides a light cleaning simulation analysis method for simulating and analyzing a light cleaning chamber, wherein the light cleaning chamber is internally provided with a plurality of ultraviolet light sources and a plurality of airflow channels, and the light cleaning chamber is capable of placing a substrate to be cleaned; the ultraviolet light source is used to emit ultraviolet light rays and irradiate on the substrate to remove the attachments on the surface of the substrate; and the airflow channel is used for the preset gas to flow through the surface of the substrate.

[0007] The light cleaning simulation analysis method comprises the following steps:

[0008] S1. Obtain a geometric model of the light cleaning chamber, and set simulation parameters for the geometric model; the simulation parameters include a feeding mode of the preset gas in the airflow channel;

[0009] S2. Add a geometric-optical physical field and a laminar flow physical field in the geometric model; the geometric-optical physical field is used to describe the distribution of the ultraviolet light rays in the geometric model and the irradiance of the substrate surface; and the laminar flow physical field is used to describe the flow of the preset gas in the airflow channel;

[0010] S3. Set material initial conditions for the geometric model;

[0011] S4. Simulate the ultraviolet irradiance and the gas flow field inside the light cleaning chamber by ray tracing the geometric-optical physical field and steady-state solving the laminar flow physical field, and obtain simulation results;

[0012] S5. Obtain simulation analysis results by simulating and analyzing the simulation results.

[0013] The light cleaning simulation analysis method provided by the present application can use a simulation model to study the light cleaning process under various working conditions, the simulation results can predict the light cleaning process to a certain extent, and the simulation results can guide the experimental direction, thereby improving the research and exploration efficiency and reducing the exploration cost in experiments.

[0014] Further, the preset gas includes nitrogen and oxygen.

[0015] Further, the step S1 of setting simulation parameters for the geometric model comprises:

[0016] The plurality of airflow channels are divided into nitrogen channels and oxygen channels according to a preset quantity ratio, and the number of the nitrogen channels is greater than the number of the oxygen channels;

[0017] The nitrogen channels are set to feed the nitrogen, and the oxygen channels are set to feed the oxygen.

[0018] In this way, the substrate first receives sufficient irradiation intensity after entering the chamber, and then is oxidized by the generated ozone and atomic oxygen in the oxygen area, realizing an efficient and uniform photo-cleaning process.

[0019] Further, the step of adding a geometric-optical-physical field in the geometric model in step S2 comprises:

[0020] The geometric-optical-physical field is obtained by simulating the ultraviolet light source as a surface light source, releasing a preset number of ultraviolet light rays from the boundary of the surface light source at a preset ultraviolet light wavelength and a preset ultraviolet light power, and the direction vector of the ultraviolet light rays being in a preset shape;

[0021] The geometric-optical-physical field is added to the geometric model.

[0022] This accurate physical field description helps to more effectively evaluate the photo-cleaning effect, guide the optimization of light source layout, and reduce the trial-and-error cost in actual experiments, thereby improving the reliability and guidance value of photo-cleaning simulation analysis.

[0023] Further, the direction vector of the ultraviolet light rays is conical, the number of wave vector space rays is 1, and the cone angle is 30°.

[0024] Further, the step of adding a laminar flow physical field in the geometric model in step S2 comprises:

[0025] The laminar flow physical field is obtained by simulating the flow process of a preset gas by simulating the inner wall of the substrate as a non-slip wall and combining the gas inlet boundary and gas outlet boundary of the gas flow channel at a preset gas flow rate, a preset outlet pressure, and a preset gas dynamic viscosity;

[0026] The laminar flow physical field is added to the geometric model.

[0027] This not only improves the accuracy of simulation analysis, but also provides a solid data basis for evaluating the influence of the gas environment inside the photo-cleaning chamber on the photo-cleaning effect, thereby more effectively guiding the optimization of the photo-cleaning process.

[0028] Further, the specific steps in step S3 comprise:

[0029] The geometric model is meshed and the initial conditions of the materials are set.

[0030] Secondly, the present invention provides a light cleaning simulation analysis device for simulating and analyzing a light cleaning chamber. The light cleaning chamber is provided with an ultraviolet light source and an airflow channel, and the interior of the light cleaning chamber can hold a substrate to be cleaned. The ultraviolet light source is used to emit ultraviolet rays and irradiate the substrate to remove the adhering substances on the surface of the substrate. The airflow channel is used to allow a preset gas to flow through the surface of the substrate.

[0031] The optical cleaning simulation analysis device includes:

[0032] The model module is used to acquire the geometric model of the optical cleaning chamber and set simulation parameters for the geometric model; the simulation parameters include the preset gas introduction method in the airflow channel;

[0033] The physics field module is used to add a geometric optical physics field and a laminar flow physics field to the geometric model; the geometric optical physics field is used to describe the distribution of the ultraviolet rays in the geometric model and the irradiance of the substrate surface; the laminar flow physics field is used to describe the flow of the preset gas in the airflow channel.

[0034] The setting module is used to set the initial material conditions for the geometric model;

[0035] The simulation module is used to simulate the ultraviolet irradiance and gas flow field inside the optical cleaning chamber by performing ray tracing on the geometric optical physical field and steady-state solution on the laminar physical field, and to obtain simulation results;

[0036] The analysis module is used to perform simulation analysis on the simulation results to obtain simulation analysis results.

[0037] The optical cleaning simulation analysis device provided by this invention can acquire detailed physical field data at a lower cost and faster speed by establishing a multi-physics coupled simulation model, and perform quantitative analysis. By analyzing these simulation results, experimental directions can be guided and blind trial and error can be avoided.

[0038] Thirdly, the present invention provides an electronic device including a processor and a memory, the memory storing computer-readable instructions, which, when executed by the processor, perform the steps of the optical cleaning simulation analysis method provided in the first aspect above.

[0039] Fourthly, the present invention provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, performs the steps of the optical cleaning simulation analysis method provided in the first aspect above.

[0040] As described above, the optical cleaning simulation analysis method provided by this invention obtains the geometric model of the optical cleaning chamber and sets simulation parameters. Geometric optical physical fields and laminar flow physical fields are added to this model. The model is then meshed, and initial material conditions are set. Ray tracing and steady-state solutions are then performed on the physical fields to simulate the ultraviolet irradiance and gas flow field inside the chamber. Finally, the simulation results are analyzed. This method effectively solves the problems of low efficiency and high trial-and-error costs in exploring the gas path and light source layout within the optical cleaning chamber in existing technologies. By establishing an accurate simulation model, the distribution of ultraviolet light within the chamber, the irradiance on the substrate surface, and the flow of a preset gas in the airflow channel can be comprehensively simulated, thereby predicting the optical cleaning effect. This simulation analysis can provide researchers with effective guidance, significantly improve the efficiency of research exploration, and greatly reduce the exploration costs in experiments, thus accelerating the development of optical cleaning technology for large-size glass substrates.

[0041] Other features and advantages of the invention will be set forth in the following description, and will be apparent in part from the description, or may be learned by practicing embodiments of the invention. The objects and other advantages of the invention may be realized and obtained by means of the structures particularly pointed out in the written description and the accompanying drawings. Attached Figure Description

[0042] Figure 1 This is a flowchart of a light cleaning simulation analysis method provided in an embodiment of the present invention.

[0043] Figure 2 This is a schematic diagram of the structure of the optical cleaning chamber in an embodiment of the present invention.

[0044] Figure 3 This is a schematic diagram of the geometric model after meshing according to an embodiment of the present invention.

[0045] Figure 4 This is a schematic diagram of the velocity field in the simulation results of an embodiment of the present invention.

[0046] Figure 5 This is a schematic diagram of the pressure distribution in the simulation results of an embodiment of the present invention.

[0047] Figure 6 This is a schematic diagram of the ultraviolet ray trajectory in the simulation results of an embodiment of the present invention.

[0048] Figure 7 This is a schematic diagram of ultraviolet radiation irradiance in the simulation results of an embodiment of the present invention.

[0049] Figure 8 This is a schematic diagram of a light cleaning simulation analysis device provided in an embodiment of the present invention.

[0050] Figure 9This is a schematic diagram of the structure of an electronic device provided in an embodiment of the present invention.

[0051] Label Explanation:

[0052] 100. Ultraviolet light source; 200. Substrate; 310. Air inlet; 320. Air outlet; 400. Model module; 500. Physics field module; 600. Settings module; 700. Simulation module; 800. Analysis module; 13. Electronic equipment; 1301. Processor; 1302. Memory; 1303. Communication bus. Detailed Implementation

[0053] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. The components of the embodiments of the present invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0054] It should be noted that similar reference numerals and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. Furthermore, in the description of this invention, terms such as "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0055] It should be noted that the terms "up and down," "left and right," and "front and back" used below are all in the appendix. Figure 2 The arrows are for reference.

[0056] Reference Appendix Figure 1This invention provides a simulation analysis method for optical cleaning, used to simulate and analyze an optical cleaning chamber. The optical cleaning chamber is equipped with multiple ultraviolet light sources 100 and multiple airflow channels, and the interior of the optical cleaning chamber can hold a substrate 200 to be cleaned. The multiple ultraviolet light sources 100 are equidistantly distributed along a straight line on the upper side of the optical cleaning chamber and located directly above the substrate 200. The ultraviolet light sources 100 are used to emit ultraviolet rays and irradiate the substrate 200 to remove the adhering substances on the surface of the substrate 200. Each airflow channel includes an air inlet 310 and an air outlet 320. All air inlets 310 are equidistantly distributed along a straight line on the front side of the optical cleaning chamber, and all air outlets 320 are equidistantly distributed along a straight line on the rear side of the optical cleaning chamber. The airflow channels are used to allow a preset gas to flow through the surface of the substrate 200 in a front-back direction.

[0057] The optical cleaning simulation analysis method includes the following steps:

[0058] S1. Obtain the geometric model of the optical cleaning chamber and set simulation parameters for the geometric model; the simulation parameters include the preset gas introduction method in the airflow channel;

[0059] S2. Add a geometric optical physical field and a laminar flow physical field to the geometric model; the geometric optical physical field is used to describe the distribution of ultraviolet rays in the geometric model and the irradiance of the substrate surface; the laminar flow physical field is used to describe the flow of the preset gas in the airflow channel (with the addition of two physical fields, geometric optics and laminar flow, the arrangement of the inlet fluid gas path and the light source is optimized, and the simulation results can guide the experimental direction, thereby improving the efficiency of research and exploration and reducing the cost of exploration in experiments).

[0060] S3. Mesh the geometric model and set the initial material conditions;

[0061] S4. By performing ray tracing on the geometric optical physical field and solving the laminar physical field in a steady state, the ultraviolet irradiance and gas flow field inside the optical cleaning chamber are simulated, and the simulation results are obtained.

[0062] S5. The simulation analysis results are obtained by performing simulation analysis on the simulation results.

[0063] The optical cleaning chamber is the core equipment for optical cleaning, and its internal environment is crucial to the cleaning effect. An ultraviolet (UV) light source generates UV rays of specific wavelengths that interact with deposits on the substrate surface, causing them to decompose or detach. Airflow channels guide a pre-set gas flow across the substrate surface to assist the UV cleaning process and control the gas environment within the chamber. The substrate is the object to be cleaned, typically a glass substrate used in display panel manufacturing. The geometric model is a digital representation of the optical cleaning chamber in simulation software, containing precise geometric information about the chamber's dimensions, structure, and internal components. Simulation parameters are various physical quantities and conditions that need to be set during simulation analysis, such as the gas introduction method, UV wavelength, and power. The geometric optical physics field simulates the propagation path, reflection, and absorption of UV rays within the chamber and calculates the irradiance distribution on the substrate surface. The laminar flow physics field simulates the flow state of the pre-set gas within the airflow channels, including velocity and pressure distribution.

[0064] The core of the optical cleaning simulation analysis method proposed in this application lies in achieving accurate simulation of the complex physical processes inside the optical cleaning chamber through multi-physics field coupling simulation.

[0065] Specifically, in step S1, the first step is to obtain the geometric model of the optical cleaning chamber. This geometric model can be created using CAD software or imported from existing design drawings. For example, based on the actual dimensions and structure of the optical cleaning chamber, the chamber's outer shell, the installation location of the ultraviolet light source, the shape and distribution of the airflow channels, and the placement area of ​​the substrate can be accurately drawn in simulation software. After obtaining the geometric model, simulation parameters need to be set for it. These simulation parameters are the basis for subsequent simulation calculations. For example, the pre-defined gas introduction method in the airflow channels can be set, which can be achieved by setting the flow rate, pressure, or velocity boundary conditions of the inlet.

[0066] In step S2, a geometrical optical field and a laminar flow field need to be added to the geometric model. The geometrical optical field describes the distribution of ultraviolet rays in the geometric model and the irradiance of the substrate surface. For example, the emission characteristics of the ultraviolet light source, such as emission wavelength, power, and emission angle, can be set to simulate the propagation path of ultraviolet rays after emission from the light source within the cavity, including reflection from the cavity wall, interaction with the gas, and the final irradiance distribution reaching the substrate surface. The laminar flow field describes the flow of a preset gas within the airflow channel. For example, the type, density, viscosity, and other physical properties of the gas can be set, and the boundary conditions of the inlet and outlet can be defined to simulate the gas flow velocity, pressure distribution, and the presence of eddies within the cavity.

[0067] Furthermore, the simulation parameters also include the following main parameters and specific parameter values ​​based on the aforementioned optical cleaning chamber structure:

[0068]

[0069] In step S3, the geometric model needs to be meshed and initial material conditions set. Mesh generation is the process of discretizing a continuous geometric model into a finite number of small elements (see Appendix). Figure 3 This is a prerequisite for numerical calculations. For example, based on the complexity of the chamber and the required simulation accuracy, an appropriate mesh type (such as tetrahedral mesh, hexahedral mesh, etc.) and mesh density can be selected to mesh the entire chamber model. Simultaneously, initial material conditions need to be set; for example, the initial temperature, initial pressure, and initial gas concentration distribution inside the chamber can be set.

[0070] In step S4, the ultraviolet irradiance and gas flow field inside the optical cleaning chamber are simulated by performing ray tracing on the geometric optical physical field and steady-state solution on the laminar flow physical field, thereby obtaining the simulation results. Ray tracing is a method to simulate the propagation path of light rays. By tracing the paths of a large number of ultraviolet rays, the irradiance at various points on the substrate surface can be calculated. Steady-state solution refers to calculating the distribution of physical quantities when the system reaches a steady state, given boundary and initial conditions. For example, the stable gas velocity field, pressure field, and ultraviolet irradiance distribution inside the chamber can be calculated.

[0071] In step S5, simulation analysis is performed on the simulation results to obtain the results. For example, the gas flow lines inside the chamber, the velocity distribution cross-section, the uniformity of ultraviolet irradiation on the substrate surface, and the pressure distribution can be visualized. By analyzing these results, the rationality of the current gas path and light source layout can be evaluated, potential problem areas can be identified, and a basis for subsequent optimization design can be provided. For example, it can be observed whether a relatively stable gas flow field has been formed above the substrate surface to reduce ultraviolet light attenuation and improve the photo-cleaning effect; it can also be analyzed to determine whether the ultraviolet light ray trajectory and irradiance on the substrate fully cover the substrate and whether the irradiation intensity meets the photo-cleaning requirements.

[0072] The optical cleaning simulation analysis method proposed in this application incorporates elements such as the geometric model of the optical cleaning chamber, the ultraviolet light source, the airflow channel, and the substrate into the simulation system, and introduces coupled analysis of geometric optical physical fields and laminar flow physical fields. This method can comprehensively and accurately simulate the ultraviolet irradiance and gas flow field inside the optical cleaning chamber. This method can effectively solve the problems of lack of effective guidance, low research efficiency, and high trial-and-error costs in traditional research.

[0073] Specifically, this application constructs an accurate simulation model to simulate and study the photo-cleaning process under various operating conditions. The simulation results can predict the photo-cleaning process to a certain extent; for example, it can predict the gas flow field distribution under different airflow channel introduction methods, and the irradiance uniformity of the substrate surface under different ultraviolet light source layouts. Analysis of these simulation results can guide experimental directions and avoid blind trial and error. For example, if the simulation results show insufficient ultraviolet irradiance in a certain area, or dead zones in the gas flow field, the light source layout or airflow channel design can be adjusted accordingly, thereby optimizing the solution before actual experiments. This simulation-based guidance significantly improves the efficiency of research and exploration and greatly reduces the cost of experimental exploration.

[0074] In practical applications, the velocity field and velocity distribution cross-section of the gas entering the cavity can be viewed in the simulation results. Based on the above structure of the optical cleaning chamber, as shown in the attached figure... Figure 4 A velocity field of gas within a light-cleaning chamber is shown (attached). Figure 4 The arrows indicate the direction of the velocity field. The first scale on the right represents the velocity magnitude of the tangential plane in the left-right direction (in m / s); the second scale on the right represents the velocity magnitude of the tangential plane in the front-back direction (in m / s). It can be seen that a relatively stable gas flow field is formed above the substrate surface, thereby reducing ultraviolet light attenuation and improving the photocleaning effect. (Appendix) Figure 5 The pressure distribution inside the light cleaning chamber is shown (the scale on the right indicates the pressure magnitude in Pa). It can be seen that the pressure distribution inside the chamber is uniform and maintained near atmospheric pressure.

[0075] Compared to existing methods that primarily rely on experience and repeated experiments to optimize the design of optical cleaning chambers, the simulation analysis method proposed in this application offers significant advantages. Existing methods often require substantial time and resources for physical experiments, and the interpretation of experimental results and the determination of optimization directions are subject to a degree of subjectivity. In contrast, this application, by establishing a multi-physics coupled simulation model, can acquire detailed physical field data at a lower cost and faster speed, and perform quantitative analysis. For example, simulation allows for the intuitive observation of details of the gas flow field within the chamber, such as velocity and pressure distributions, as well as the propagation path of ultraviolet rays and the irradiance distribution on the substrate surface—information that is difficult to obtain directly in physical experiments. This comprehensive data support enables designers to gain a deeper understanding of the physical mechanisms involved in the optical cleaning process, thereby making more scientific and accurate design decisions. Therefore, this application not only improves the research efficiency of optical cleaning technology but also provides a powerful tool for the optimized design of optical cleaning equipment.

[0076] In some embodiments, the preset gas includes nitrogen and oxygen.

[0077] Furthermore, in step S1, the steps of setting simulation parameters for the geometric model include:

[0078] Multiple airflow channels are divided into nitrogen channels and oxygen channels according to a preset ratio, with the number of nitrogen channels being greater than the number of oxygen channels;

[0079] The nitrogen channel is set to allow nitrogen to pass through, and the oxygen channel is set to allow oxygen to pass through.

[0080] Specifically, the aforementioned multiple airflow channels are divided into nitrogen channels and oxygen channels, with each channel designed to introduce its corresponding gas. This aims to simulate the gas environment in different areas within the photo-cleaning chamber. The nitrogen channels introduce nitrogen to create an inert gas environment in the area, suppressing the attenuation of ultraviolet rays during transmission due to reaction with oxygen, thus ensuring the substrate surface receives high-intensity ultraviolet light. The oxygen channels introduce oxygen to promote the generation of reactive oxygen species such as ozone and atomic oxygen under the influence of ultraviolet light, thereby oxidizing and removing deposits on the substrate surface. The greater number of nitrogen channels than oxygen channels optimizes the generation and distribution of reactive oxygen species while ensuring sufficient ultraviolet irradiation intensity, resulting in a better cleaning effect.

[0081] This application's solution achieves precise control of the gas environment inside the photo-cleaning chamber by dividing the airflow channel into nitrogen and oxygen channels and introducing nitrogen and oxygen respectively. Specifically, in the initial region where the substrate enters the chamber, nitrogen is introduced through the nitrogen channel to form an inert protective gas environment. This effectively suppresses the attenuation caused by the reaction of ultraviolet rays (especially 172nm ultraviolet light) with oxygen during their transmission path, thus ensuring that the substrate surface receives sufficiently strong ultraviolet irradiation to efficiently break the molecular bonds of organic matter. Subsequently, as the substrate moves to subsequent regions, oxygen is introduced through the oxygen channel. Under the action of ultraviolet light, this region can generate and maintain a high concentration of ozone and atomic oxygen. These reactive oxygen species can further oxidize the organic matter decomposed by ultraviolet light, thereby achieving thorough photo-cleaning. This method of dividing the airflow into regions and introducing separate gases allows ultraviolet irradiation and the oxidation of reactive oxygen species to proceed synergistically, optimizing the entire photo-cleaning process.

[0082] Through the above technical solution, this application can more accurately simulate the ultraviolet irradiation and gas flow field distribution inside the photo-cleaning chamber under different gas environments. By optimizing the introduction method and ratio of nitrogen and oxygen, the problems of excessively rapid ultraviolet light decay or uneven concentration of reactive oxygen species in traditional solutions can be effectively solved. This allows for prediction and guidance of actual photo-cleaning processes during the simulation analysis stage, ensuring uniform and efficient cleaning of the substrate surface. This refined gas introduction method not only improves the accuracy of the simulation model but also provides a strong theoretical basis for the optimized design of actual photo-cleaning equipment, significantly improving the efficiency of research and exploration while reducing the cost of experimental exploration.

[0083] In some preferred embodiments, it is assumed that the photo-cleaning chamber has seven air inlets. To achieve effective management of ultraviolet light attenuation and optimized control of reactive oxygen species concentration, the first four airflow channels can be designated as nitrogen channels, with nitrogen introduced as a protective gas. In this region, nitrogen forms an inert environment, significantly suppressing the attenuation of 172nm ultraviolet light reaching the substrate, thereby allowing the substrate to receive high-intensity ultraviolet irradiation to effectively break the molecular bonds of organic matter. Simultaneously, the latter three airflow channels are designated as oxygen channels, with oxygen introduced. In this region, under ultraviolet irradiation, the concentrations of ozone and atomic oxygen can be generated and managed, increasing them to a desired level to oxidize and remove decomposed organic matter. In this way, the substrate first receives sufficient irradiation intensity upon entering the chamber, and then enters the oxygen region to be oxidized by the generated ozone and atomic oxygen, achieving a highly efficient and uniform photo-cleaning process.

[0084] In practical applications, the distribution of ultraviolet rays on the substrate can also be viewed in the simulation results. Based on the above-mentioned structure of the optical cleaning chamber and the allocation of airflow channels, the attached... Figure 6 The image shows the ray trajectory of 172nm ultraviolet light on the substrate (the scale on the right indicates the number of rays, in units of individual rays). (Attached) Figure 7 The irradiance of the substrate by 172nm ultraviolet light is shown (the right-hand bar indicates the flux ratio of the vertical cross-section, in W / m). 2 As shown in the figure, the substrate is basically fully covered. It can also be seen that the nitrogen-filled section receives stronger irradiation, while the oxygen-filled section experiences some attenuation of ultraviolet light, resulting in the generation of ozone and atomic oxygen, thus receiving weaker irradiation. The area with the highest irradiation reaches 600 W / m², which meets the irradiation intensity required for photocleaning and is consistent with actual irradiation conditions.

[0085] In some embodiments, step S2, the step of adding a geometric optical physical field to the geometric model, includes:

[0086] By simulating an ultraviolet light source as a surface light source, and using a preset ultraviolet light wavelength and a preset ultraviolet light power, a preset number of ultraviolet light rays are emitted from the boundary of the surface light source, and the direction vector of the ultraviolet light rays has a preset shape, thus obtaining the geometric optical physical field.

[0087] Add the geometric optical physical field to the geometric model.

[0088] The simulation of the ultraviolet light source as a surface source aims to more realistically reflect the geometry and radiating area of ​​an actual ultraviolet light source, avoiding simplification errors that may arise from traditional point or line source models. This results in a simulated ultraviolet ray distribution that more closely approximates reality. Preset ultraviolet wavelength and power are fundamental physical properties of the ultraviolet light source. Their precise setting ensures that the simulation model matches the characteristics of the actual ultraviolet light source. For example, for a specific wavelength of ultraviolet light, its wavelength and power are fixed and require precise input to guarantee the accuracy of the simulation results. The simulation releases a preset number of ultraviolet rays from the boundary of the surface source. This preset number of ultraviolet rays determines the level of detail and computational cost of the simulation results. By setting an appropriate number of rays, sufficiently detailed ultraviolet light distribution and irradiance information can be obtained while maintaining computational efficiency. The direction vector of the ultraviolet rays has a preset shape, which describes the spatial distribution characteristics of the ultraviolet light emitted from the light source. By setting its shape, the radiation patterns of different types of light sources (such as collimated light sources and diffused light sources) can be simulated, thereby more accurately predicting the propagation path of ultraviolet light inside the cavity and the irradiation uniformity on the substrate surface. Thus, through the above detailed simulation process, the geometric optical physical field can be obtained and added to the geometric model for subsequent simulation analysis.

[0089] This application's solution simulates the ultraviolet light source as a surface source and precisely sets the ultraviolet wavelength, power, number, and direction vector shape of the ultraviolet rays. This allows for a more realistic and detailed description of the propagation process of ultraviolet rays within the optical cleaning chamber. The surface source simulation fully reflects the geometric characteristics of the light source, avoiding simplification errors that might arise from point or line sources. Preset wavelengths and power ensure the accuracy of the ultraviolet energy, while preset number and direction vector shapes guarantee the precision of ray tracing and the reproduction of the actual radiation pattern. Therefore, the resulting geometrical optical physical field accurately reflects the distribution of ultraviolet light within the chamber and the irradiance on the substrate surface, providing reliable basic data for subsequent simulation analysis.

[0090] The above technical solutions significantly improve the accuracy and realism of geometric optical physical field simulations. Specifically, by simulating the ultraviolet light source as a surface source and finely setting various parameters of the ultraviolet rays, the complex propagation path and energy attenuation of ultraviolet light within the optical cleaning chamber can be captured more accurately, resulting in more precise predictions of the ultraviolet irradiance distribution on the substrate surface. This accurate physical field description helps to more effectively evaluate the optical cleaning effect, guide the optimization of light source layout, and reduce the trial-and-error costs in actual experiments, thereby enhancing the reliability and guiding value of optical cleaning simulation analysis.

[0091] In some embodiments, the direction vector of the ultraviolet rays is conical, the wave vector space ray number is 1, and the cone angle is 30°.

[0092] Specifically, the conical direction vector of the ultraviolet rays means that, when simulating the emission characteristics of an ultraviolet light source, the ultraviolet rays, after being emitted from the surface of the source, do not propagate in a completely parallel direction, but rather diffuse in a conical manner. This conical diffusion can more realistically simulate the beam divergence characteristics of actual ultraviolet light sources. The wave vector space ray number is 1, which can be understood as the number of sampling points used to describe the ray direction in wave vector space being 1. This is usually done to simplify calculations or, in a specific simulation scenario, to characterize the overall propagation trend of the conical beam with a representative direction. The cone angle is 30°, meaning the half-apex angle of the conical beam is 30 degrees, that is, the angle from the central axis of the cone to the edge of the cone is 30 degrees. This cone angle parameter directly determines the diffusion range and intensity distribution of the ultraviolet rays in space and is one of the key parameters for accurately simulating ultraviolet irradiance.

[0093] The proposed solution sets the direction vector of ultraviolet rays to a cone shape and specifies the number of ray-length waves and the cone angle, enabling a more accurate simulation of the actual emission characteristics of ultraviolet light sources using geometrical optics. Consequently, during ray tracing, the propagation path of ultraviolet rays within the optically cleaned cavity and the irradiance distribution on the substrate surface can be more realistically represented. This precise parameter setting helps capture the complex behaviors of ultraviolet light scattering, reflection, and absorption within the cavity, thereby improving the reliability of the simulation results.

[0094] By employing the aforementioned technical solution, the direction vector of ultraviolet rays is precisely defined as a cone, and specific wave vector spatial ray numbers and cone angles are set, significantly improving the simulation accuracy of the geometric optical physical field. This not only enables more accurate prediction of the irradiance distribution of ultraviolet light on the substrate surface but also provides more reliable data support for the design optimization of optical cleaning chambers, thereby effectively guiding experimental directions and reducing exploration costs in actual experiments.

[0095] In some embodiments, step S2, the step of adding laminar physical fields to the geometric model, includes:

[0096] The substrate is simulated as a non-slip inner wall, and the flow process of the preset gas is simulated with preset gas flow rate, preset outlet pressure and preset gas dynamic viscosity, combined with the inlet boundary and outlet boundary of the airflow channel, to obtain the laminar flow physical field.

[0097] Add laminar physical fields to the geometric model.

[0098] Specifically, simulating the substrate as a non-slip inner wall means setting the substrate surface as a boundary condition where the fluid velocity is zero in the fluid dynamics simulation. This setting conforms to actual physical conditions, where the relative velocity of a fluid is zero when it comes into contact with a solid surface due to viscosity. The preset gas velocity refers to the gas inlet velocity set at the inlet boundary of the airflow channel, which determines the initial momentum and flow rate of the gas entering the optical cleaning chamber. The preset outlet pressure refers to the gas outlet pressure set at the outlet boundary of the airflow channel, which affects the driving force of gas flow within the chamber. The preset gas dynamic viscosity is a physical property of the preset gas itself, used to describe the internal friction force during gas flow, and has a decisive influence on the resistance characteristics of gas flow. By combining the inlet and outlet boundaries of the airflow channel, the inflow and outflow areas of the gas can be clearly defined, thereby constructing a complete fluid domain.

[0099] The proposed solution simulates the substrate as a non-slip inner wall and precisely sets key parameters such as preset gas flow rate, preset outlet pressure, and preset gas dynamic viscosity, providing accurate boundary conditions and fluid properties for simulating the laminar flow physical field. This allows for a realistic simulation of the flow behavior and velocity distribution of the preset gas within the optical cleaning chamber, particularly near the substrate surface. This precise flow field simulation is crucial for subsequent analysis of the attenuation of ultraviolet rays in the gaseous medium and the removal of contaminants under the influence of airflow, ensuring the reliability of the simulation results.

[0100] Through the above technical solutions, the construction process of the laminar flow physical field is given clear physical meaning and precise parameter settings, making the description of the flow of the preset gas in the airflow channel more realistic and reliable. This not only improves the accuracy of simulation analysis, but also provides a solid data foundation for evaluating the impact of the gas environment inside the photo-cleaning chamber on the photo-cleaning effect, thereby enabling more effective guidance for the optimization of the photo-cleaning process.

[0101] Please refer to Figure 8 , Figure 8This invention provides a photo-cleaning simulation analysis device in some embodiments, used for simulating and analyzing a photo-cleaning chamber. The photo-cleaning chamber contains an ultraviolet light source and an airflow channel, and can accommodate a substrate to be cleaned. The ultraviolet light source emits ultraviolet rays to irradiate the substrate surface to remove deposits. The airflow channel allows a preset gas to flow over the substrate surface. This photo-cleaning simulation analysis device is integrated into a back-end control device in the form of a computer program, including:

[0102] Model module 400 is used to acquire the geometric model of the optical cleaning chamber and set simulation parameters for the geometric model; the simulation parameters include the preset gas introduction method in the airflow channel;

[0103] The physics module 500 is used to add geometric optical physics fields and laminar flow physics fields to the geometric model; the geometric optical physics field is used to describe the distribution of ultraviolet rays in the geometric model and the irradiance of the substrate surface; the laminar flow physics field is used to describe the flow of preset gas in the airflow channel.

[0104] Module 600 is used to set the initial material conditions for the geometric model;

[0105] The simulation module 700 is used to simulate the ultraviolet irradiance and gas flow field inside the optical cleaning chamber by ray tracing the geometric optical physical field and solving the laminar physical field in a steady state, and to obtain simulation results.

[0106] The analysis module 800 is used to perform simulation analysis on the simulation results to obtain simulation analysis results.

[0107] In some embodiments, the model module 400 performs the following when setting simulation parameters for the geometric model:

[0108] Multiple airflow channels are divided into nitrogen channels and oxygen channels according to a preset ratio, with the number of nitrogen channels being greater than the number of oxygen channels;

[0109] The nitrogen channel is set to allow nitrogen to pass through, and the oxygen channel is set to allow oxygen to pass through.

[0110] In some embodiments, the physics module 500 performs the following when adding a geometric optical physics field to the geometric model:

[0111] By simulating an ultraviolet light source as a surface light source, and using a preset ultraviolet light wavelength and a preset ultraviolet light power, a preset number of ultraviolet light rays are emitted from the boundary of the surface light source, and the direction vector of the ultraviolet light rays has a preset shape, thus obtaining the geometric optical physical field.

[0112] Add the geometric optical physical field to the geometric model.

[0113] In some embodiments, the physics module 500 performs the following when adding laminar physics fields to the geometric model:

[0114] The substrate is simulated as a non-slip inner wall, and the flow process of the preset gas is simulated with preset gas flow rate, preset outlet pressure and preset gas dynamic viscosity, combined with the inlet boundary and outlet boundary of the airflow channel, to obtain the laminar flow physical field.

[0115] Add laminar physical fields to the geometric model.

[0116] In some embodiments, the setting module 600 is executed when setting initial material conditions for the geometric model:

[0117] Mesh the geometric model and set the initial material conditions.

[0118] Please refer to Figure 9 , Figure 9 This is a schematic diagram of the structure of an electronic device provided in an embodiment of the present invention. The present invention provides an electronic device 13, including: a processor 1301 and a memory 1302. The processor 1301 and the memory 1302 are interconnected and communicate with each other via a communication bus 1303 and / or other forms of connection mechanism (not shown). The memory 1302 stores computer-readable instructions executable by the processor 1301. When the electronic device is running, the processor 1301 executes the computer-readable instructions to execute the optical cleaning simulation analysis method in any optional implementation of the above embodiments, to achieve the following function: obtaining the geometric model of the optical cleaning chamber. The model was designed, and simulation parameters were set for the geometric model. The simulation parameters included the preset gas introduction method in the airflow channel. Geometric optical physics field and laminar flow physics field were added to the geometric model. The geometric optical physics field was used to describe the distribution of ultraviolet rays in the geometric model and the irradiance on the substrate surface. The laminar flow physics field was used to describe the flow of the preset gas in the airflow channel. Initial material conditions were set for the geometric model. By performing ray tracing on the geometric optical physics field and steady-state solution on the laminar flow physics field, the ultraviolet irradiance and gas flow field inside the optical cleaning chamber were simulated to obtain the simulation results. The simulation results were then analyzed to obtain the simulation analysis results.

[0119] This invention provides a computer-readable storage medium storing a computer program. When the computer program is executed by a processor, it performs the optical cleaning simulation analysis method in any optional implementation of the above embodiments to achieve the following functions: acquiring a geometric model of the optical cleaning chamber and setting simulation parameters for the geometric model; the simulation parameters include a preset gas introduction method in the airflow channel; adding a geometric optical physical field and a laminar flow physical field to the geometric model; the geometric optical physical field is used to describe the distribution of ultraviolet rays in the geometric model and the irradiance of the substrate surface; the laminar flow physical field is used to describe the flow of the preset gas in the airflow channel; setting initial material conditions for the geometric model; simulating the ultraviolet irradiance and gas flow field inside the optical cleaning chamber by ray tracing the geometric optical physical field and performing steady-state solution of the laminar flow physical field, and obtaining simulation results; and obtaining simulation analysis results by performing simulation analysis on the simulation results.

[0120] The computer-readable storage medium can be implemented by any type of volatile or non-volatile storage device or a combination thereof, such as Static Random Access Memory (SRAM), Electrically Erasable Programmable Read-Only Memory (EEPROM), Erasable Programmable Read Only Memory (EPROM), Programmable Red-Only Memory (PROM), Read-Only Memory (ROM), magnetic storage, flash memory, magnetic disk, or optical disk.

[0121] In the embodiments provided by this invention, it should be understood that the disclosed apparatus and method can be implemented in other ways. The apparatus embodiments described above are merely illustrative. For example, the division of units is only a logical functional division, and in actual implementation, there may be other division methods. Furthermore, multiple units or components may be combined or integrated into another system, or some features may be ignored or not executed. Additionally, the displayed or discussed mutual couplings, direct couplings, or communication connections may be through some communication interfaces; indirect couplings or communication connections between devices or units may be electrical, mechanical, or other forms.

[0122] Furthermore, the units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the units can be selected to achieve the purpose of this embodiment according to actual needs.

[0123] Furthermore, the functional modules in the various embodiments of the present invention can be integrated together to form an independent part, or each module can exist independently, or two or more modules can be integrated to form an independent part.

[0124] In this document, relational terms such as first and second are used only to distinguish one entity or operation from another entity or operation, without necessarily requiring or implying any such actual relationship or order between these entities or operations.

[0125] The above description is merely an embodiment of the present invention and is not intended to limit the scope of protection of the present invention. For those skilled in the art, the present invention can have various modifications and variations. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A simulation analysis method for optical cleaning, used for simulating and analyzing an optical cleaning chamber, characterized in that, The optical cleaning chamber is equipped with multiple ultraviolet light sources and multiple airflow channels, and the interior of the optical cleaning chamber can hold a substrate to be cleaned; the ultraviolet light sources are used to emit ultraviolet rays and irradiate the substrate to remove the adhering substances on the surface of the substrate; the airflow channels are used to allow preset gas to flow through the surface of the substrate. The optical cleaning simulation analysis method includes the following steps: S1. Obtain the geometric model of the optical cleaning chamber and set simulation parameters for the geometric model; the simulation parameters include the preset gas introduction method in the airflow channel; S2. Add a geometric optical physical field and a laminar flow physical field to the geometric model; the geometric optical physical field is used to describe the distribution of the ultraviolet rays in the geometric model and the irradiance of the substrate surface; the laminar flow physical field is used to describe the flow of the preset gas in the airflow channel; S3. Set initial material conditions for the geometric model; S4. By performing ray tracing on the geometric optical physical field and solving the laminar physical field in a steady state, the ultraviolet irradiance and gas flow field inside the optical cleaning chamber are simulated to obtain the simulation results; S5. By performing simulation analysis on the simulation results, the simulation analysis results are obtained; Step S2, the step of adding a geometric optical physical field to the geometric model, includes: By simulating an ultraviolet light source as a surface light source, and simulating the release of a preset number of ultraviolet rays from the boundary of the surface light source with a preset ultraviolet light wavelength and a preset ultraviolet light power, and with the direction vector of the ultraviolet rays having a preset shape, the geometric optical physical field is obtained. The geometric optical physical field is added to the geometric model.

2. The optical cleaning simulation analysis method according to claim 1, characterized in that, The preset gas includes nitrogen and oxygen.

3. The optical cleaning simulation analysis method according to claim 2, characterized in that, Step S1, the step of setting simulation parameters for the geometric model includes: The multiple airflow channels are divided into nitrogen channels and oxygen channels according to a preset ratio, wherein the number of nitrogen channels is greater than the number of oxygen channels; The nitrogen channel is configured to supply nitrogen gas, and the oxygen channel is configured to supply oxygen gas.

4. The optical cleaning simulation analysis method according to claim 1, characterized in that, The direction vector of the ultraviolet rays is conical, with a wave vector spatial ray number of 1 and a cone angle of 30°.

5. The optical cleaning simulation analysis method according to claim 1, characterized in that, Step S2, the step of adding laminar flow physics fields to the geometric model, includes: The substrate is simulated as a non-slip inner wall, and the flow process of the preset gas is simulated with a preset gas flow rate, preset outlet pressure and preset gas dynamic viscosity, combined with the inlet boundary and outlet boundary of the airflow channel, to obtain the laminar flow physical field. Add the laminar physical field to the geometric model.

6. The optical cleaning simulation analysis method according to claim 1, characterized in that, The specific steps in step S3 include: The geometric model is meshed and initial material conditions are set.

7. A light-cleaning simulation analysis device for simulating and analyzing a light-cleaning chamber, characterized in that, The optical cleaning chamber is equipped with an ultraviolet light source and an airflow channel, and the interior of the optical cleaning chamber can hold a substrate to be cleaned; the ultraviolet light source is used to emit ultraviolet rays and irradiate the substrate to remove the adhering substances on the surface of the substrate. The airflow channel is used to allow a preset gas to flow across the surface of the substrate; The optical cleaning simulation analysis device includes: The model module is used to acquire the geometric model of the optical cleaning chamber and set simulation parameters for the geometric model; the simulation parameters include the preset gas introduction method in the airflow channel; The physics field module is used to add a geometric optical physics field and a laminar flow physics field to the geometric model; the geometric optical physics field is used to describe the distribution of the ultraviolet rays in the geometric model and the irradiance of the substrate surface; the laminar flow physics field is used to describe the flow of the preset gas in the airflow channel. The setting module is used to set the initial material conditions for the geometric model; The simulation module is used to simulate the ultraviolet irradiance and gas flow field inside the optical cleaning chamber by performing ray tracing on the geometric optical physical field and steady-state solution on the laminar physical field, and to obtain simulation results; The analysis module is used to perform simulation analysis on the simulation results to obtain simulation analysis results; The physics module is executed when adding geometric optical physics fields to the geometric model: By simulating an ultraviolet light source as a surface light source, and using a preset ultraviolet light wavelength and a preset ultraviolet light power, a preset number of ultraviolet light rays are emitted from the boundary of the surface light source, and the direction vector of the ultraviolet light rays has a preset shape, thus obtaining the geometric optical physical field. Add the geometric optical physical field to the geometric model.

8. An electronic device, characterized in that, It includes a processor and a memory, the memory storing computer-readable instructions, which, when executed by the processor, perform the steps in the optical cleaning simulation analysis method as described in any one of claims 1-6.

9. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it performs the steps in the optical cleaning simulation analysis method as described in any one of claims 1-6.

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