Equipment for plating oxidation film on electric arc evaporation source

Abstract

The equipment comprises a vacuum chamber and an evaporation source hinged to the vacuum chamber, the vacuum chamber serves as an arc source anode, the evaporation source comprises a magnetic conductive central column, an outer magnetic conductive cylinder and a magnetic shoe, one end of the outer magnetic conductive cylinder is fixedly connected with the magnetic shoe, the other end of the outer magnetic conductive cylinder is provided with an annular shielding disc, and a target material is arranged on the inner ring side of the shielding disc. The magnetic conductive central column is located in the outer magnetic conductive cylinder, one end of the magnetic conductive central column is connected with the magnetic shoe, the other end of the magnetic conductive central column is located below the target material, the electromagnetic coil is arranged on the peripheral side of the magnetic conductive central column, and a cathode access port is formed in the end, connected with the magnetic shoe, of the magnetic conductive central column; when the electromagnetic coil is electrified, one end, close to the target material, of the magnetic conductive central column is an N pole, the other end of the magnetic conductive central column is an S pole, and the outer magnetic conductive cylinder and the shielding disc are S poles. The external magnetic field structure of the multi-arc target is reasonably shaped, so that magnetic field leakage is reduced, the magnetic field is effectively concentrated on the target surface and in front of the target surface, arc spots move on the whole target surface, the phenomena that an oxide layer appears on the surface of the target material, the target material is poisoned, the target material cannot discharge in the coating process, and therefore work of an evaporation source is stopped are avoided, and the film layer quality is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of oxidation film plating equipment, and particularly relates to an oxidation film plating equipment with an arc evaporation source. BACKGROUND

[0002] The oxidation film plating equipment with an arc evaporation source is a kind of vacuum coating equipment for plating an oxidation film on the surface of an object. The target material is evaporated and ionized by arc discharge, and reacts with oxygen to deposit an oxidation film on the surface of the substrate. The oxidation film plating equipment with an arc evaporation source is widely used in the fields of electronic industry and mechanical manufacturing.

[0003] However, the oxidation film plating equipment with an arc evaporation source has the following problems. During the process of plating an oxidation film in a vacuum, an oxide coating is formed on the cathode arc source and the anode wall of the vacuum chamber. With the increase of time, the oxide layer thickens, and an anode deficiency phenomenon occurs between the arc source and the vacuum chamber, which has the following effects: When the arc evaporation source works in an oxygen environment, an oxide layer is formed on the surface of the target material in a short time, and the target material is poisoned, which causes the arc discharge at the target to be blocked, resulting in arc breaking or arc extinguishing, and the discharge process is terminated, and the arc evaporation source cannot work continuously. SUMMARY

[0004] To solve the problems in the background and avoid oxidation of the target surface and the wall of the vacuum chamber, the present application provides an oxidation film plating equipment with an arc evaporation source, which comprises a vacuum chamber and an evaporation source hingedly connected to the vacuum chamber. The evaporation source comprises a magnetic center column, an outer magnetic cylinder and a magnetic shoe. One end of the outer magnetic cylinder is fixedly connected with the magnetic shoe, and the other end of the outer magnetic cylinder is provided with an annular shielding disc. The target material is arranged on the inner ring side of the shielding disc. The magnetic center column is located in the outer magnetic cylinder. One end of the magnetic center column is connected with the magnetic shoe, and the other end of the magnetic center column is located below the target material. The magnetic center column is provided with an electromagnetic coil on the circumferential side. One end of the magnetic center column connected with the magnetic shoe is provided with a cathode inlet. When the electromagnetic coil is electrified, one end of the magnetic center column close to the target material is N-pole, and the other end of the magnetic center column is S-pole. The outer magnetic cylinder and the shielding disc are S-pole. Preferably, the outer magnetic cylinder is provided with a water cooling structure, and the water cooling structure is located on the circumferential side of the magnetic center column.

[0005] Preferably, the water cooling structure comprises a water sealing sleeve, a water guide sleeve and a water cooling seat. The water sealing sleeve is located at the lower part of the magnetic center column. The water guide sleeve and the water cooling seat are located at one end of the water sealing sleeve close to the target material, and the water guide sleeve is located in the water cooling seat. A first water guide channel is arranged in the water sealing sleeve, and a second water guide channel is arranged in the water guide sleeve. There is a space between the water cooling seat and the water guide sleeve. The first water guide channel, the second water guide channel and the space between the water cooling seat and the water guide sleeve are connected in communication. A water inlet is arranged on the magnetic shoe and connected with the first water guide channel.

[0006] Preferably, the first water guide channel has two symmetrically distributed ones, the second water guide channel has two, the two second water guide channels are symmetrically located, one end of each first water guide channel corresponds to one second water guide channel, the other end of each first water guide channel corresponds to one water outlet, and the two second water guide channels are connected with the water cooling seat and the water guide sleeve.

[0007] Preferably, a water cooling insulation sleeve is arranged between the water cooling seat and the outer magnetic cylinder, and a sealing ring is arranged outside the water cooling insulation sleeve and between the outer magnetic cylinder and the water cooling seat.

[0008] Preferably, a compression ring is threadedly connected to the outside of the water cooling seat near one end of the target material, the inside of the compression ring near the target material is a first inclined surface, the first inclined surface is inclined upward from the outside of the water cooling seat to the center of the water cooling seat, the target material is provided with a second inclined surface matched with the first inclined surface near one end of the water cooling seat, and the second inclined surface is located between the first inclined surface and the water cooling seat.

[0009] Preferably, a cap is embedded in the water cooling seat near one end of the target material, and the magnetic center column is threadedly connected with the cap near one end of the target material.

[0010] Preferably, an electrode insulation pad is arranged between the magnetic center column and the magnetic shoe.

[0011] Preferably, the annular shielding disc is provided with a shielding disc opening away from the outer magnetic cylinder.

[0012] Preferably, a first flange is arranged outside the outer magnetic cylinder, the first flange is connected with a second flange, an insulation ring is arranged between the first flange and the second flange, an arc striking needle is movably connected to the second flange, and one side of the second flange is hingedly connected with the vacuum chamber.

[0013] The present application has the following beneficial effects: The present application is provided with an electromagnetic coil around the magnetic center column, when the electromagnetic coil is electrified, one end of the magnetic center column near the target material is N pole, and the other end of the magnetic center column is S pole, because the outer magnetic cylinder and the shielding disc are S pole, the N pole and the S pole generate a space magnetic field, and because the N pole and the S pole are opposite in the same plane, the generated magnetic force line is relatively horizontal, so that the magnetic field leakage is reduced, and the magnetic field is effectively concentrated on the target surface and in front of the target material, so that the arc spot movement not only makes circular motion on the target material surface under the Lorentz force, but also has wide freedom in the radial direction of the target material, so that the arc spot can move on the target surface comprehensively, without causing target poisoning problem, the target material surface is not easy to be oxidized, and the arc source discharge is avoided to terminate, so as to ensure the normal operation of the evaporation source. The present application simplifies the multi-arc target structure, the target surface discharge is more easily controlled, and the film layer quality is better guaranteed. BRIEF DESCRIPTION OF DRAWINGS

[0014] Figure 1The schematic diagram of the whole structure of the present application; Figure 2 The schematic diagram of the evaporation source structure of the present application; Figure 3 The schematic diagram of the evaporation source structure of the present application; Figure 4 The schematic diagram of the water-cooling seat structure of the present application; Figure 5 The schematic diagram of the water jacket structure of the present application Figure 1 ; Figure 6 The schematic diagram of the water jacket structure of the present application Figure 2 ; Figure 7 The schematic diagram of the water seal structure of the present application.

[0015] In the figure, 1 is a vacuum chamber, 2 is a frame, 3 is a magnetic center column, 4 is an outer magnetic cylinder, 5 is a magnetic shoe, 51 is a water inlet, 6 is a shielding disc, 7 is a cathode inlet, 8 is a water seal, 81 is a first water guide channel, 9 is a water jacket, 91 is a second water guide channel, 10 is a water-cooled insulation sleeve, 11 is a sealing ring, 12 is a pressing ring, 13 is a cap, 14 is a target material, 15 is an electrode insulation pad, 16 is a first flange, 17 is a second flange, 18 is an insulation ring, 19 is an arc guide pin, 20 is a first insulation sleeve, 21 is an evaporation source, 22 is a water-cooling seat, and 23 is a shielding disc opening. DETAILED DESCRIPTION

[0016] In order to make the present application clearer and more understandable, the technical solutions of the present application are further described in detail in combination with the accompanying drawings and examples. It should be understood that the given examples are only one of the implementation manners, and do not represent all the examples.

[0017] In this article, the terms such as "inner" and "outer" are established based on the positional relationship shown in the drawings. According to different drawings, the corresponding positional relationship may also change accordingly, and therefore, it cannot be understood as an absolute limitation on the protection scope.

[0018] In combination with the Figure 1 -attached Figure 7The utility model relates to an arc evaporation source equipment for plating oxide film, which comprises a vacuum chamber 1 and an evaporation source hinged to the vacuum chamber 1, wherein the evaporation source comprises a magnetic center column 3, an outer magnetic cylinder 4 and a magnetic shoe 5, the outer magnetic cylinder 4 is fixedly connected with the magnetic shoe 5 at one end, and an annular shielding disc 6 is arranged at the other end of the outer magnetic cylinder 4, a target material 14 is arranged on the inner ring side of the shielding disc 6, the magnetic center column 3 is located in the outer magnetic cylinder 4, the magnetic center column 3 is connected with the magnetic shoe 5 at one end, and the other end of the magnetic center column 3 is located below the target material 14, an electromagnetic coil is arranged on the side of the magnetic center column 3, and a cathode inlet 7 is arranged at the end of the magnetic center column 3 connected with the magnetic shoe 5. During film plating, the cathode inlet 7 is used for connecting an arc source cathode, and the vacuum chamber 1 serves as an arc source anode. When the electromagnetic coil is electrified, the end of the magnetic center column 3 close to the target material 14 is an N pole, the other end of the magnetic center column 3 is an S pole, and the outer magnetic cylinder 4 and the shielding disc 6 are S poles. The end face of the end of the magnetic center column 3 close to the target material 14 and the side of the shielding disc 6 close to the magnetic center column 3 are located in the same plane, and when the electromagnetic coil is electrified, relatively horizontal magnetic force lines can be generated.

[0019] The vacuum chamber 1 is supported by a frame 2, the evaporation source is hinged to the side of the vacuum chamber 1, during film plating, the target material 14 is located in the vacuum chamber 1, and the magnetic shoe 5 is located on the side of the evaporation source away from the vacuum chamber 1.

[0020] Specifically, a water cooling structure is arranged in the outer magnetic cylinder 4, and the water cooling structure is located on the side of the magnetic center column 3. The water cooling structure comprises a water sealing sleeve 8, a water guide sleeve 9 and a water cooling seat 22, the water sealing sleeve 8 is located at the lower part of the magnetic center column 3, the water guide sleeve 9 and the water cooling seat 22 are located at the end of the water sealing sleeve 8 close to the target material 14, and the water guide sleeve 9 is located in the water cooling seat 22. A first water guide channel 81 is arranged in the water sealing sleeve 8, a second water guide channel 91 is arranged in the water guide sleeve 9, there is a spacing between the water cooling seat 22 and the water guide sleeve 9, the first water guide channel 81, the second water guide channel 91 and the spacing between the water cooling seat 22 and the water guide sleeve 9 are connected in communication, and a water inlet 51 in communication with the first water guide channel 81 is arranged on the magnetic shoe 5. Cooling water is introduced into the water guide channel to achieve the cooling effect of the evaporation source. Water is introduced or drained into the water guide channel through the water inlet 51.

[0021] More specifically, the first water guide channels 81 are symmetrically distributed in two, the second water guide channels 91 are two, the two second water guide channels 91 are symmetrically positioned, one end of each first water guide channel 81 corresponds to one second water guide channel 91, the other end of each first water guide channel 81 corresponds to one water outlet 51, and the two second water guide channels 91 are communicated with the space between the water cooling seat 22 and the water guide sleeve 9. The two water outlets 51 are respectively used for water inlet and water outlet, realizing the circulation of cooling water. The cooling water enters one first water guide channel 81 and one second water guide channel 91, passes through the space between the water cooling seat 22 and the water guide sleeve 9, and enters another second water guide channel 91 and another first water guide channel 81.

[0022] Specifically, the water cooling insulation sleeve 10 is arranged between the water cooling seat 22 and the outer magnetic cylinder 4, the outer side of the water cooling insulation sleeve 10 is provided with a sealing ring 11, and the sealing ring 11 is located between the outer magnetic cylinder 4 and the water cooling seat 22. The part where the water cooling seat 22 and the water seal sleeve 8 contact may have the possibility of water seepage, and the sealing ring 11 can avoid the seepage water from seeping from the water cooling insulation sleeve 10 to the target material 14.

[0023] Specifically, the water cooling seat 22 is threadedly connected with a compression ring 12 on the outer side of one end close to the target material 14, the inner side of one end of the compression ring 12 close to the target material 14 is a first inclined surface, the first inclined surface is inclined upward from the outer side of the water cooling seat 22 to the center of the water cooling seat 22, and the target material 14 is provided with a second inclined surface matched with the first inclined surface on one end close to the water cooling seat 22. The second inclined surface is located between the first inclined surface and the water cooling seat 22. The compression ring 12 applies pressure to the second inclined surface of the target material 14 through the first inclined surface, so as to fix the target material 14.

[0024] Specifically, the water cooling seat 22 is embedded with a cap 13 on one end close to the target material 14, and the magnetic center column 3 is threadedly connected with the cap 13 on one end close to the target material 14. The cap 13 is provided with a threaded hole on one side close to the magnetic center column 3, and the magnetic center column 3 is provided with an external thread matched with the threaded hole on one end close to the cap 13.

[0025] Specifically, the magnetic center column 3 is provided with an electrode insulation pad 15 between the magnetic center column 3 and the magnetic shoe 5.

[0026] Specifically, the annular shielding disc 6 is provided with a shielding disc opening 23 on the side away from the outer magnetic cylinder 4.

[0027] Specifically, the outer magnetic cylinder 4 is provided with a first flange 16, the first flange 16 is connected with a second flange 17, an insulation ring 18 is arranged between the first flange 16 and the second flange 17, an arc leading needle 19 is movably connected to the second flange 17, and the second flange 17 is hingedly connected to the vacuum chamber 1. More specifically, the second flange 17 is hingedly connected to the vacuum chamber 1 through a door hinge seat, and the second flange 17 forms a door plate for opening / closing the vacuum chamber 1. The first flange 16 and the second flange 17 are connected through bolts, and a first insulation sleeve 20 is arranged in the bolt hole of the first flange 16.

[0028] The arc leading needle 19 can rotate and stretch, when stretching, the arc leading needle 19 can approach or move away from the target material 14, when rotating, the arc leading needle 19 can move out of or into the area where the target material 14 is located. The stretching action of the arc leading needle 19 can be driven by a gas cylinder, the rotating action of the arc leading needle 19 can be driven by a rotating gas cylinder, and the stretching and rotating actions of the arc leading needle 19 are conventional settings, which will not be repeated here.

[0029] Although the embodiments of the present application have been shown and described, various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present application, the scope of the present application being defined by the appended claims and their equivalents.

Claims

1. An apparatus for depositing an oxide film using an arc evaporation source, comprising a vacuum chamber (1) and an evaporation source hinged to the vacuum chamber (1), characterized in that: The evaporation source includes a magnetically conductive central column (3), an outer magnetically conductive cylinder (4), and a magnetic shoe (5). One end of the outer magnetically conductive cylinder (4) is fixedly connected to the magnetic shoe (5), and the other end of the outer magnetically conductive cylinder (4) is provided with an annular shielding disk (6). The inner ring side of the shielding disk (6) is provided with a target material (14). The magnetically conductive central column (3) is located inside the outer magnetically conductive cylinder (4). One end of the magnetically conductive central column (3) is connected to the magnetic shoe (5), and the other end of the magnetically conductive central column (3) is located below the target material (14). The magnetically conductive central column (3) is provided with an electromagnetic coil around its periphery, and the end of the magnetically conductive central column (3) connected to the magnetic shoe (5) is provided with a cathode inlet (7). When the electromagnetic coil is energized, the end of the magnetic center column (3) closest to the target material (14) is the N pole, and the other end of the magnetic center column (3) is the S pole. The outer magnetic cylinder (4) and the shielding disk (6) are the S poles.

2. The equipment for depositing oxide films using an arc evaporation source according to claim 1, characterized in that: The outer magnetic cylinder (4) is equipped with a water-cooling structure, which is located around the magnetic center column (3).

3. The equipment for depositing oxide films using an arc evaporation source according to claim 2, characterized in that: The water-cooling structure includes a water seal sleeve (8), a water guide sleeve (9), and a water-cooling base (22). The water seal sleeve (8) is located at the lower part of the magnetic center column (3). The water guide sleeve (9) and the water-cooling base (22) are located at the end of the water seal sleeve (8) close to the target material (14), and the water guide sleeve (9) is located inside the water-cooling base (22). The water seal sleeve (8) is provided with a first water guiding channel (81), and the water guiding sleeve (9) is provided with a second water guiding channel (91). There is a gap between the water cooling base (22) and the water guiding sleeve (9). The first water guiding channel (81), the second water guiding channel (91), and the gap between the water cooling base (22) and the water guiding sleeve (9) are connected. The magnetic shoe (5) is provided with a water inlet (51) that communicates with the first water guiding channel (81).

4. The equipment for depositing oxide films using an arc evaporation source according to claim 3, characterized in that: There are two symmetrically distributed first water guiding channels (81) and two second water guiding channels (91). The two second water guiding channels (91) are symmetrically positioned. One end of each first water guiding channel (81) is connected to a second water guiding channel (91), and the other end of each first water guiding channel (81) is connected to a water inlet (51). The two second water guiding channels (91) are connected to the water cooling base (22) and the water guiding sleeve (9).

5. The equipment for depositing oxide films using an arc evaporation source according to claim 3, characterized in that: A water-cooled insulating sleeve (10) is provided between the water-cooled base (22) and the outer magnetic cylinder (4). A sealing ring (11) is provided on the outside of the water-cooled insulating sleeve (10). The sealing ring (11) is located between the outer magnetic cylinder (4) and the water-cooled base (22).

6. The equipment for depositing oxide films using an arc evaporation source according to claim 3, characterized in that: The water-cooled base (22) is threaded with a pressure ring (12) on the outer side of the end near the target (14). The inner side of the end of the pressure ring (12) near the target (14) is a first inclined surface. The first inclined surface is inclined upward from the outer side of the water-cooled base (22) toward the center of the water-cooled base (22). The end of the target (14) near the water-cooled base (22) is provided with a second inclined surface that matches the first inclined surface. The second inclined surface is located between the first inclined surface and the water-cooled base (22).

7. The equipment for depositing oxide films using an arc evaporation source according to claim 3, characterized in that: The water-cooled base (22) has a cap (13) embedded in one end near the target (14), and the magnetic center column (3) is threadedly connected to the cap (13) at one end near the target (14).

8. The equipment for depositing oxide films using an arc evaporation source according to claim 1, characterized in that: An electrode insulating pad (15) is provided between the magnetic center column (3) and the magnetic shoe (5).

9. The equipment for depositing oxide films using an arc evaporation source according to claim 1, characterized in that: The annular shielding disk (6) has an opening (23) on the side away from the outer magnetic cylinder (4).

10. The equipment for depositing oxide films using an arc evaporation source according to claim 1, characterized in that: The outer magnetic cylinder (4) is provided with a first flange (16) on the outside. The first flange (16) is connected to the second flange (17). An insulating ring (18) is provided between the first flange (16) and the second flange (17). An arc-starting needle (19) is movably connected to the second flange (17). One side of the second flange (17) is hinged to the vacuum chamber (1).

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