Method for preparing transparent gradient color film by magnetron sputtering plane target

Abstract

The invention provides a method for preparing a transparent gradient color film by magnetron sputtering a planar target, which is characterized by comprising the following steps: S1, preparing, S2, cleaning a substrate, S3, bombarding, and S4, coating. The preparation method provided by the invention is simple and convenient to implement, and the transparent gradient color film prepared by adopting the magnetron sputtering method is better than other gradient color films prepared by adopting a chemical vapor deposition method and dyeing treatment. The process is stable, the color layer is uniform, the preparation speed is high, the film forming quality is good, and particularly, the gradient color width and the color diversity can be freely adjusted according to the unfolding angle of the folding type baffle on the anode cover.

Description

Technical Field

[0001] This invention relates to the field of thin film technology, specifically to a method for preparing transparent gradient color thin films using a magnetron sputtering planar target. Background Technology

[0002] Gradient color thin film technology, as a combination of modern materials science and surface treatment technology, has shown broad application prospects in fields such as solar cells, display devices, and decorative materials.

[0003] As consumers' aesthetic demands continue to rise, traditional single colors can no longer satisfy the market's pursuit of personalization and visual impact. Gradient color design has become a popular choice in various fields due to its natural and smooth color transition and unique sense of space.

[0004] Traditional gradient color films are typically prepared using dyeing or physical vapor deposition techniques. The former achieves color gradients through dye penetration, but suffers from problems such as uneven color layers and poor weather resistance; the latter, such as vacuum evaporation technology, can achieve multi-layer stacking, but it is difficult to precisely control the transition of multi-color gradients, especially when there are three or more colors, which are prone to color band breaks or color distortion. Summary of the Invention

[0005] The present invention aims to overcome the shortcomings of the prior art by providing a method for preparing transparent gradient color thin films using a magnetron sputtering planar target.

[0006] This application provides the following technical solution: A method for preparing transparent gradient-colored thin films using a magnetron sputtering planar target, characterized by the following steps: S1: preparation step, Unfold the folding baffle on the magnetron sputtering planar target anode cover in the process chamber of the magnetron sputtering equipment, adjust it to the required position, and then lock it. Next, evacuate the magnetron sputtering equipment to a vacuum level of 5.0 × 10⁻⁶. -6 torr; S2: Substrate cleaning step, The glass substrate was ultrasonically cleaned with acetone, alcohol and deionized water in sequence on the outside of the magnetron sputtering equipment to remove surface stains, and then dried for later use. S3: Bombardment step, The dried glass was placed on the sample holder of the magnetron sputtering equipment and then transferred to the process chamber. Argon gas was introduced to pre-sputter the target material, and the vacuum level was controlled at 2.0 × 10⁻⁶. -3 torr; S4: Coating step, A thin film is deposited on the impurity-removed glass using magnetron sputtering. The target material is sputtered repeatedly to achieve the target thickness, forming a transparent gradient color film. The foldable baffle includes a set of baffles of the same external dimensions stacked together. The baffles are made of stainless steel and are connected to the magnetron sputtering planar target anode cover at one end by screws.

[0007] Based on the above technical solutions, the following further technical solutions are also possible: The screw is attached to the corner of the anode cover on one side of the magnetron sputtering planar target.

[0008] The transparent film is TiO2, ZrO2, or SiN. X Any one of them.

[0009] The target material is any one of Ti, Zr, and Si.

[0010] In the coating step, the power supply is 3000-2000W, the Ar sputtering rate is 200sccm, the O2 sputtering rate is 30-40sccm, and the sputtering is repeated 80-260 times.

[0011] S1: In the preparation step, the folding baffle is unfolded and adjusted to the required position, forming a set of folding baffles unfolded into an acute-angled fan-shaped structure.

[0012] Advantages of the invention: The preparation method provided by this invention is simple and convenient to implement. The transparent gradient color film prepared by magnetron sputtering has better performance than other gradient color films prepared by chemical vapor deposition and dyeing. The process of this invention is more stable, the color layer is more uniform, the preparation speed is faster, and the film quality is better. In particular, the width of the gradient color and the diversity of colors can be arbitrarily adjusted by the unfolding angle of the folded baffle on the anode cover. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the structure inside the process chamber provided by the present invention; Figure 2 yes Figure 1 A schematic diagram of the unfolded folding baffle. Detailed Implementation

[0014] like Figure 1-2 As shown, Example 1: A method for preparing transparent gradient color thin films by magnetron sputtering planar targets, characterized by the following steps: S1: Preparation step, Ti target b is placed on cathode a in process chamber 1 of the magnetron sputtering equipment. A folded baffle 5 is connected to the corner of a magnetron sputtering planar target anode cover 4 covering the Ti target b. The folded baffle 5 consists of a set of baffles 5a stacked sequentially with the same external dimensions. One end of the set of baffles 5a is connected to the magnetron sputtering planar target anode cover 4 by screws 5b. The set of baffles 5a is unfolded and adjusted to a desired position, so that the folded baffle 5 forms an acute-angled fan-shaped structure. Then, the screws 5b are tightened for fixation. The magnetron sputtering equipment is then evacuated to a vacuum of 5.0 × 10⁻⁶. -6 torr.

[0015] S2: Substrate cleaning step, 1.1mm ordinary glass was selected as the substrate material. The glass substrate 3 was ultrasonically cleaned with acetone, alcohol and deionized water in sequence outside the magnetron sputtering equipment to remove surface stains and then dried for later use.

[0016] S3: Bombardment step, The dried glass substrate 3 is placed on the sample holder 2 of the magnetron sputtering equipment and then transferred to the process chamber 1. The magnetron sputtering equipment is then evacuated until the vacuum level in the sputtering chamber reaches 5.0 × 10⁻⁶. -6 During torr, argon gas was introduced at 200 sccm, and the vacuum level was adjusted to 2.0 × 10⁻⁶. -3 The torr process pre-sputters the Ti target to remove surface impurities and oxides. Sample holder 2 is a component included in existing magnetron sputtering equipment and will not be described in detail here.

[0017] S4: Coating step, After pre-sputtering, a transparent gradient layer is prepared. The Ti target process during film deposition is as follows: power supply is 3000W, Ar is 200sccm, O2 is 40sccm, and the process is repeated 123 times. The resulting TiO2 film has a thickness of 146-255nm and is a transparent gradient film with a gradient from light blue to blue to green. Example

[0018] The difference between Example 2 and Example 1 lies in the placement of the Zr target on the cathode a in S3: bombardment step, S4: coating step and S1: preparation step. Other identical contents in S1 preparation step and substrate cleaning step will not be repeated here.

[0019] S3: Bombardment step, The dried glass substrate 3 is placed on the sample holder of the magnetron sputtering equipment and then transferred to the process chamber 1. The magnetron sputtering equipment is then evacuated until the vacuum level in the sputtering chamber reaches 5.0 × 10⁻⁶. -6 During torr, argon gas was introduced at 200 sccm, and the vacuum level was adjusted to 2.0 × 10⁻⁶. -3torr, pre-sputtering of Zr target to remove surface impurities and oxides; S4: Coating step, After pre-sputtering, a transparent gradient layer is prepared. The Zr target process during coating is as follows: power supply is 2000W, Ar is 200sccm, O2 is 30sccm, and the process is repeated 86 times. The resulting ZrO2 film has a thickness of 110-150nm and is a transparent gradient film with a gradient from light blue to blue to green. Example

[0020] The difference between Examples 3 and 2 and 1 lies in the placement of the Si target on the cathode a in S3: bombardment step, S4: coating step and S1: preparation step. Other identical contents in S1 preparation step and substrate cleaning step will not be repeated here.

[0021] S3: Bombardment step, The dried glass substrate 3 is placed on the sample holder of the magnetron sputtering equipment and then transferred to the process chamber 1. The magnetron sputtering equipment is then evacuated until the vacuum level in the sputtering chamber reaches 5.0 × 10⁻⁶. -6 During torr, argon gas was introduced at 200 sccm, and the vacuum level was adjusted to 2.0 × 10⁻⁶. -3 torr, pre-sputtering the Si target to remove surface impurities and oxides; S4: Coating step, After pre-sputtering, a transparent gradient layer is prepared. The Si target process during deposition is as follows: power supply 3000W, Ar 200 sccm, O2 30 sccm, repeated 255 times. The resulting SiN... X The film thickness is 200–270 nm, and it is a transparent gradient film with a green-yellow-orange gradient.

Claims

1. A method for preparing transparent gradient color thin films by magnetron sputtering of a planar target, characterized in that: It includes the following steps, S1: Preparation steps, Unfold the folding baffle (5) on the magnetron sputtering planar target anode cover (4) inside the process chamber (1) of the magnetron sputtering equipment, adjust it to the required position, and then lock it. Then, evacuate the magnetron sputtering equipment to 5.0 × 10⁻⁶. -6 torr; S2: Substrate cleaning step, The glass substrate (3) was ultrasonically cleaned with acetone, alcohol and deionized water in sequence outside the magnetron sputtering equipment to remove surface stains and then dried for later use. S3: Bombardment step, The dried glass substrate (3) was placed on the sample holder of the magnetron sputtering equipment and then transferred to the process chamber (1). Argon gas was introduced to pre-sputter the target material, and the vacuum degree was controlled to be 2.0 × 10⁻⁶. -3 torr; S4: Coating step, Then, a thin film is deposited by magnetron sputtering, in which the target material is sputtered repeatedly to achieve the target thickness, forming a transparent gradient color film. The foldable baffle includes a set of baffles (5a) of the same external dimensions stacked together, and one end of the set of baffles (5a) is connected to the magnetron sputtering planar target anode cover (4) by screws (5b).

2. The method for preparing a transparent gradient-colored thin film by magnetron sputtering of a planar target according to claim 1, characterized in that: The screw (5b) is connected to the corner on one side of the magnetron sputtering planar target anode cover (4).

3. The method for preparing a transparent gradient-colored thin film by magnetron sputtering of a planar target according to claim 1, characterized in that: The transparent film is TiO2, ZrO2, or SiN. X Any one of them.

4. The method for preparing a transparent gradient-colored thin film by magnetron sputtering of a planar target according to claim 1, characterized in that: The target material is any one of Ti, Zr, and Si.

5. The method for preparing a transparent gradient-colored thin film by magnetron sputtering of a planar target according to claim 1, characterized in that: In the coating step, the power supply is 3000-2000W, the Ar sputtering rate is 200sccm, the O2 sputtering rate is 30-40sccm, and the sputtering is repeated 80-260 times.

6. The method for preparing a transparent gradient-colored thin film by magnetron sputtering of a planar target according to claim 1, characterized in that: S1: In the preparation step, the foldable baffle (5) is unfolded and adjusted to the required position, forming a set of foldable baffles (5) unfolded into an acute-angled fan-shaped structure.

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