Magnetron sputtering magnet variable-track movement device based on double-track constraint

By using a magnetron sputtering magnet trajectory change motion device with dual-track constraint, the problems of low target utilization and poor coating uniformity in traditional magnetron sputtering equipment are solved, achieving uniform coverage of the target area and improving coating quality.

CN120967313AActive Publication Date: 2025-11-18WUXI SHANGJI SEMICON TECH CO LTD
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Patent Information

Application Number
CN202511512903.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-10-22
Publication Date
2025-11-18
Estimated Expiration
2045-10-22

AI Technical Summary

Technical Problem

In traditional magnetron sputtering equipment, the magnet movement mechanism leads to problems such as low target utilization, poor coating uniformity, and uneven loss between the target center and edge.

Method used

A magnetron sputtering magnet trajectory change motion device based on dual-track constraint is adopted. The movement of the magnet is restricted by the first and second tracks that are set in a cross configuration. Combined with the design of connecting rods and bridges, the magnet moves along an elliptical trajectory. The trajectory parameters are adjusted by a rotary drive mechanism to achieve uniform coverage of the target area.

Benefits of technology

It improves the utilization rate of the target material, balances the loss difference between the center and the edge of the target material, improves the coating uniformity, and adapts to the process requirements of substrates of different sizes.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses a magnetron sputtering magnet variable-track motion device based on double-track constraint, which comprises a limiting mechanism, a mounting block, a connecting rod, a connecting bridge, a first rotary driving mechanism and a second rotary driving mechanism, the limiting mechanism comprises a first track and a second track which are arranged in a crossed manner, and the connecting bridge is rotatably arranged at the intersection point of the tracks; a sliding groove is formed in the connecting bridge, and the mounting block is arranged in the sliding groove in a sliding mode; the first rotary driving mechanism is used for driving the connecting bridge to rotate around an intersection point, the mounting block is driven to rotate through the connecting bridge, and the mounting block and the magnet on the mounting block can move along an elliptical track by combining the sliding constraint of the connecting rod in the first track and the second track and the sliding constraint of the mounting block in the sliding groove, so that a traditional fixed track or single circular track is replaced; the second rotation driving mechanism drives the limiting mechanism to rotate synchronously or intermittently, so that the falling point of the elliptical track can change periodically, the coverage limitation of a single elliptical track is broken, and the target material area swept by the magnet is expanded.
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Description

TECHNICAL FIELD

[0001] The application relates to the technical field of wafer manufacturing equipment, and particularly relates to a magnetron sputtering magnet variable trajectory movement device based on double-track constraint. BACKGROUND

[0002] As a core technology in the fields of semiconductors and optical coating, the magnetron sputtering technology can improve sputtering efficiency by constraining the trajectory of a plasma through a magnetic field. However, in the traditional magnetron sputtering equipment, the magnet movement mechanism always has the technical pain points of low target material utilization rate and poor coating uniformity.

[0003] The magnet movement trajectory of the traditional planar magnetron sputtering target is fixed, and the target material utilization rate is usually less than 40%. In addition, the etching area is prone to form a "racetrack-shaped" pit, which leads to excessive consumption of the target material in the local area. Although the rotating cylindrical target can improve the target material utilization rate to a certain extent, the core problem of single trajectory has not been solved. The rotating cylindrical target can only realize a fixed circular trajectory and cannot dynamically adjust the etching area according to the real-time loss state of the target material. Therefore, it is difficult to balance the loss difference between the center and the edge of the target material, which leads to prominent edge effect and the situation that the edge is excessively consumed while the center is not fully etched. SUMMARY

[0004] The application aims to overcome the deficiencies in the prior art and provide a magnetron sputtering magnet variable trajectory movement device based on double-track constraint.

[0005] The application provides a magnetron sputtering magnet variable trajectory movement device based on double-track constraint, which comprises a limiting mechanism, a mounting block, a connecting rod and a connecting bridge. The limiting mechanism comprises a first track and a second track which are cross arranged. The mounting block is used for arranging a magnet. One end of the connecting rod is slidably arranged in the first track, and the other end is slidably arranged in the second track. The connecting bridge is rotatably arranged at the intersection of the first track and the second track, and a sliding groove is arranged on the connecting bridge. The mounting block is slidably arranged in the sliding groove. A first rotary driving mechanism is used for driving the connecting bridge to rotate around the intersection, and the connecting bridge drives the mounting block to rotate. In combination with the sliding constraint of the connecting rod in the first track and the second track and the sliding constraint of the mounting block in the sliding groove, the mounting block and the magnet thereon can move along an elliptical trajectory. A second rotary driving mechanism is used for driving the limiting mechanism to rotate around the intersection. While the first rotary driving mechanism drives the mounting block to move in an ellipse, the second rotary driving mechanism can drive the limiting mechanism to rotate synchronously or intermittently, so that the landing point of the elliptical trajectory of the mounting block changes periodically, thereby expanding the target material area swept by the magnet.

[0006] Further, the connecting bridge is suspended above the limiting mechanism, and the first rotary driving mechanism comprises: a rotary driving member arranged on the connecting bridge; a bevel gear connected with an output end of the rotary driving member; a linkage gear meshed with the bevel gear and connected with the connecting bridge and arranged directly above the intersection, for driving the connecting bridge to rotate.

[0007] Further, the included angle of the first track and the second track is adjustable; by adjusting the included angle of the first track and the second track, the eccentricity of the elliptical trajectory of the mounting block can be changed; when the included angle increases, the minor axis of the elliptical trajectory increases and the major axis decreases; when the included angle decreases, the minor axis of the elliptical trajectory decreases and the major axis increases.

[0008] Further, the double-track-constrained magnetic control sputtering magnet trajectory-changing movement device further comprises a variable-included-angle driving assembly for driving at least one of the first track and the second track to rotate around the intersection; the intersection positions of the first track and the second track are arranged in a nested form, so that the guide surfaces of the first track and the second track for guiding the movement of the connecting rod are in the same plane; the end portions of the first track and the second track near the intersection positions are arranged in a V shape, and the closer to the intersection position, the smaller the width of the guide surface, so that the first track and the second track have an avoidance gap therebetween; the existence of the avoidance gap can avoid interference between the first track and the second track when they rotate relative to each other.

[0009] Further, the intersection position of one of the first track and the second track is provided with an external gear, and the intersection position of the other is provided with an internal gear; the inner diameter of the internal gear is greater than the outer diameter of the external gear, and when the guide surfaces of the first track and the second track are coplanar, the external gear is inserted into the internal gear; the variable-included-angle driving assembly comprises a variable-included-angle rotary driving member and a planetary gear, the planetary gear is located between the external gear and the internal gear and simultaneously meshes with the external gear and the internal gear; the variable-included-angle rotary driving member is used to drive the planetary gear to rotate, so as to realize the synchronous and reverse rotation of the external gear and the internal gear.

[0010] Further, the length of the sliding groove is adjustable; by adjusting the length of the sliding groove, the maximum adjustable eccentricity of the mounting block in the sliding groove can be changed, so as to change the eccentricity of the elliptical trajectory of the mounting block.

[0011] Further, the length of the connecting rod is adjustable; by adjusting the length of the connecting rod, the size of the elliptical trajectory of the mounting block can be changed; when the connecting rod grows, both the major axis and the minor axis of the elliptical trajectory become longer; when the connecting rod shortens, both the major axis and the minor axis of the elliptical trajectory become shorter.

[0012] Further, the double-track-constrained magnetron sputtering magnet trajectory-changing movement device further comprises a bellows provided on the connecting rod and connected with the mounting block; when the bellows is inflated and expanded, the length of the bellows is fixed, the bellows can prevent the mounting block from moving along the sliding groove, so that the mounting block moves in a circular motion around the intersection point, thereby covering the area not covered by the elliptical trajectory; the connecting rod has a limiting state and a free state; when the mounting block moves along the elliptical trajectory, the connecting rod is in the limiting state, the length of the connecting rod is fixed, and the major axis and the minor axis of the elliptical trajectory are determined; when the mounting block moves along the circular trajectory, the connecting rod is in the free state, and the connecting rod can be adaptively expanded and contracted after contacting the wall.

[0013] Further, the connecting rod comprises an outer cylinder and an inner rod slidingly arranged in the outer cylinder, and a gas spring is further arranged in the outer cylinder; the gas spring is configured to resist the force applied by the first track and the second track when the mounting block moves in an elliptical motion, so that the length of the connecting rod is fixed; by applying an axial force greater than the unlocking force of the gas spring to the inner rod, the length of the connecting rod can be changed, and after the axial force is removed, the gas spring can be automatically locked at the new length position.

[0014] Further, the double-track-constrained magnetron sputtering magnet trajectory-changing movement device further comprises an unlocking controller configured to send an unlocking signal to the gas spring when the mounting block moves in a circular motion, so that the locking force of the gas spring decreases, and to cancel the unlocking signal when the mounting block moves in an elliptical motion, so that the locking force of the gas spring is restored; or an electromagnetic locking pin mechanism configured to be electrified to be locked when the mounting block moves in an elliptical motion, so as to enhance the rigidity of the connecting rod, and to be de-energized to be released when the mounting block moves in a circular motion, so as to allow the connecting rod to freely expand and contract.

[0015] The application provides a double-track-constrained magnetron sputtering magnet trajectory-changing movement device, which comprises a limiting mechanism, a mounting block, a connecting rod, a connecting rod, a first rotary driving mechanism and a second rotary driving mechanism. The limiting mechanism comprises a first track and a second track arranged in a cross shape. The connecting rod is rotatably arranged at the intersection of the first track and the second track. A sliding groove is arranged on the connecting rod, and the mounting block is slidingly arranged in the sliding groove. The first rotary driving mechanism is used to drive the connecting rod to rotate around the intersection, and the mounting block is driven to rotate by the connecting rod. In combination with the sliding constraint of the connecting rod in the first track and the second track and the sliding constraint of the mounting block in the sliding groove, the mounting block and the magnet thereon can move along an elliptical trajectory, replacing the conventional fixed racetrack or single circular trajectory, so as to avoid local excessive consumption of the target material and improve the utilization rate of the target material. The second rotary driving mechanism drives the limiting mechanism to rotate synchronously or intermittently, so that the landing point of the elliptical trajectory changes periodically, thereby breaking the coverage limitation of the single elliptical trajectory, expanding the target material area swept by the magnet, balancing the loss difference between the center and the edge of the target material, and relieving the problem of excessive consumption of the edge. At the same time, the elliptical trajectory and the landing point change can adapt to different sizes of substrates, optimize the magnetic field coverage range, improve the problem of decreased film uniformity caused by fixed trajectory of the traditional equipment, and meet the diversified process requirements. Attached Figure Description

[0016] Figure 1 A schematic diagram of a magnetron sputtering magnet trajectory change motion device based on dual-track constraint provided in this application; Figure 2 for Figure 1 The diagram shows a different angle of the magnetron sputtering magnet trajectory change motion device based on dual-track constraint. Figure 3 for Figure 1 The diagram shows a top view of the structure of the first and second tracks in the magnetron sputtering magnet trajectory change motion device based on dual-track constraints. Figure 4 for Figure 3 A schematic diagram of the structure of the first and second tracks from another angle; Figure 5 A simplified structural diagram of a limiting mechanism provided in this application; Figure 6 for Figure 5 A schematic diagram showing the formation of the elliptical trajectory in the limiting mechanism shown; Figure 7 for Figure 6 A schematic diagram showing the formation of the elliptical trajectory after the angle between the two tracks changes in the limiting mechanism shown; Figure 8 A schematic diagram of another magnetron sputtering magnet trajectory change motion device based on dual-track constraint provided in this application; Figure 9 for Figure 8 The exploded view of the structure of the first and second tracks in the magnetron sputtering magnet trajectory change motion device based on dual-track constraint is shown. Figure 10 for Figure 8 The diagram shows the transmission structure of the variable angle drive component in the magnetron sputtering magnet variable trajectory motion device based on dual track constraints. Figure 11 This is a schematic diagram of another magnetron sputtering magnet trajectory change motion device based on dual-track constraint provided in this application. Detailed Implementation

[0017] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application are described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.

[0018] The application provides a double-track-constrained magnetron sputtering magnet trajectory-changing motion device, which comprises a limiting mechanism, a mounting block 21, a connecting rod 22 and a connecting bridge 23.

[0019] Specifically refer to Figure 1 and Figure 2 In the illustrated embodiment, the limiting mechanism is composed of the first track 11 and the second track 12 arranged in cross, and is the basic constraint component for the movement of the mounting block 21.

[0020] In combination with reference to Figures 5 to 7 , the four end points of the two tracks can be connected to form a boundary structure after the two tracks intersect. If the lengths of the two tracks are consistent and the intersection point is the midpoint of the two tracks, the boundary structure is a rectangle; if the lengths of the two tracks are inconsistent or the intersection point is not the midpoint of the two tracks, the boundary structure can be a parallelogram. Regardless of the form, the boundary structure limits the maximum movement boundary of the mounting block 21, and the movement of the mounting block 21 will not exceed the frame range defined by the end points of the tracks.

[0021] Meanwhile, the guide surfaces of the first track 11 and the second track 12 provide a sliding path for the connecting rod 22, and the two ends of the connecting rod 22 are slidably arranged in the two tracks, and can only reciprocate along the extension direction of the tracks, which limits the displacement direction of the connecting rod 22 from the X and Y dimensions, and further sets a directional constraint for the movement of the mounting block 21, avoiding irregular deviation.

[0022] Continue to refer to Figure 1 and Figure 2 , the connecting rod 22 plays a dual role of force and motion transmission and rigid constraint in the formation of the elliptical trajectory. The mounting block 21 is arranged at the middle part of the connecting rod 22, can transmit the rotation tendency of the connecting bridge 23 to the connecting rod 22, and the sliding of the two ends of the connecting rod 22 along the tracks can further transmit the constraint of the tracks to the mounting block 21.

[0023] In the elliptical motion mode, the connecting rod 22 keeps a fixed effective length, which represents the maximum possible distance from the mounting block 21 to the intersection point of the tracks (also the center of rotation) and is one of the core determinants of the basic size of the elliptical track (the greater the effective length of the connecting rod 22, the greater the basic size of the elliptical track, and vice versa).

[0024] Continuing to refer to Figure 1 and Figure 2 , the connecting bridge 23 is the core of power transmission for the elliptical motion. The connecting bridge 23 is rotatably arranged at the intersection point of the first track 11 and the second track 12 (which is also the center point of the rectangle or parallelogram formed by the four end points of the limiting mechanism and the center point of the elliptical track), and under the drive of the first rotary driving mechanism, the connecting bridge 23 can rotate around the intersection point to provide the mounting block 21 with the initial power for the circular motion. The connecting bridge 23 is provided with a sliding groove 23a extending in the radial direction of the circle when the intersection point is taken as the center of the circle, and the mounting block 21 is slidingly arranged in the sliding groove 23a. When the connecting bridge 23 rotates, it drives the mounting block 21 to move synchronously around the intersection point, so that the mounting block 21 has a tendency to move along the circular track, which is the basis of power for forming the elliptical track.

[0025] The sliding groove 23a, as an axially extending structure provided on the connecting bridge 23, is the key to displacement compensation and the core component for converting the circular motion tendency into elliptical motion.

[0026] Since the connecting rod 22 is constrained by the tracks, it cannot make a complete circular motion with the mounting block 21. When the connecting bridge 23 drives the mounting block 21 to rotate close to the end of the track, the sliding of the connecting rod 22 will be blocked by the end point of the track. At this time, the mounting block 21 will slide axially along the sliding groove 23a to approach or move away from the intersection point, and through this displacement compensation, the constraint of the track on the connecting rod 22 is adapted.

[0027] Specifically, when the mounting block 21 rotates with the connecting bridge 23 to the limit position in the extension direction of the track, the mounting block 21 will slide along the sliding groove 23a away from the intersection point to ensure that the connecting rod 22 can reach the end of the track; when the mounting block 21 rotates to the inside position in the intersection direction of the track, the mounting block 21 will slide along the sliding groove 23a towards the intersection point to avoid interference between the connecting rod 22 and the track.

[0028] The first rotary driving mechanism can adopt any driving structure that can drive the connecting bridge 23 to rotate around the intersection point of the tracks, such as a rotary cylinder or a motor.

[0029] To avoid interference of the connecting bridge 23 and the first rotary driving mechanism to the sliding of the connecting rod 22 in the track, the connecting bridge 23 and the first rotary driving mechanism are preferably suspended above the first track 11 and the second track 12 to ensure that the guide surface is not blocked and the connecting rod 2 can slide freely, as long as the rotation axis of the connecting bridge 23 is directly opposite the intersection point of the two tracks.

[0030] More specifically, the first rotary drive mechanism drives the connecting bridge 23 to rotate at an angular velocity ω, and the connecting bridge 23 drives the mounting block 21 to rotate around the intersection point. At this time, the position of the mounting block 21 is determined by the rotation angle of the connecting bridge and the track constraint. Taking a simplified model with a track included angle of 90° as an example, its trajectory can be approximately described by a parametric equation: x = (L - e) · sin(ωt); y = (L + e) · cos(ωt); where e is the eccentric distance, which refers to the offset distance of the mounting block 21 in the sliding groove 23a, and also refers to the horizontal distance between the mounting block 21 and the intersection point.

[0031] From the equation, it can be seen that the maximum displacement of the mounting block 21 in the x direction is L-e, and the minimum displacement is -(L-e). The maximum displacement in the y direction is L+e, and the minimum displacement is -(L+e). The total length of the trajectory formed in the x direction is 2(L-e), and the total length in the y direction is 2(L+e). Since e≥0, 2(L+e) is always greater than or equal to 2(L-e), therefore, the x direction is the short axis direction of the ellipse, and the y direction is the long axis direction. The long axis of the ellipse coincides with the long center axis of the rectangle formed by the limiting mechanism, and the short axis coincides with the short center axis of the rectangle. Because the maximum displacement of the mounting block 21 is limited by the track endpoints, the natural orientation of the motion trajectory must be consistent with the center axis of the rectangle, ultimately forming an elliptical trajectory symmetric along the center axis of the rectangle.

[0032] In actual magnetron sputtering equipment, a magnet is arranged on the mounting block 21. This allows the mounting block 21 with the magnet to perform elliptical motion. On the one hand, it can fully utilize the rectangular / parallelogram boundary range formed by the limiting mechanism to cover most of the area of the target surface (the long axis and the short axis of the elliptical trajectory can be flexibly adapted to the size of the target material by adjusting the effective length of the connecting rod, the eccentric distance, and the track included angle, to avoid the problem of insufficient etching in the center and excessive consumption of the edge of the target material), thereby improving the utilization rate of the target material. On the other hand, by adjusting the parameters, different sizes of substrates can be adapted (for example, for rectangular substrates, the long axis and the short axis of the ellipse can be aligned with the length and width directions of the substrate, so that the magnetic field is more evenly distributed on the surface of the substrate), which can avoid excessive concentration of the magnetic field in a certain area, reduce the film thickness error, and improve the film uniformity.

[0033] In addition, in the magnetron sputtering process, the loss characteristics of different target materials (such as metal targets, ceramic targets) and the size requirements of different substrates are quite different, and the traditional fixed trajectory magnetic field cannot be flexibly adjusted. The elliptical trajectory of the present application has the characteristics of multiple parameters, which can adjust the overall size of the ellipse by changing the effective length of the connecting rod, fine-tune the major and minor axes of the ellipse by changing the eccentric distance, and change the eccentricity of the ellipse by adjusting the angle between the first track 11 and the second track 12. This adjustability allows the elliptical trajectory to be flexibly adjusted according to the real-time loss state of the target material (such as adjusting the eccentricity of the ellipse to shift the trajectory towards the center of the target material when the edge loss is severe), the size of the substrate (such as increasing the size of the ellipse for large-size substrates), thereby adapting to the diversified magnetron sputtering process requirements and improving the versatility of the equipment.

[0034] Further, the magnetron sputtering magnet trajectory-changing motion device based on double-track constraint provided by the present application further comprises a second rotary driving mechanism for driving the limiting mechanism to rotate around the intersection; while the first rotary driving mechanism drives the mounting block 21 to move in an elliptical motion, the second rotary driving mechanism can drive the limiting mechanism to rotate synchronously or intermittently, so that the landing point of the elliptical trajectory of the mounting block 21 changes periodically, thereby expanding the area of the target material swept by the magnet.

[0035] The second rotary driving mechanism can adopt any driving structure that can drive the limiting mechanism to rotate around the intersection of the track, such as a rotary cylinder, a motor, etc.

[0036] To avoid interfering with the guide surface, the second rotary driving mechanism can be arranged on the side (gear or belt drive) or below (direct drive) of the limiting mechanism.

[0037] When the first rotary driving mechanism drives the mounting block 21 to move in an elliptical motion, the second rotary driving mechanism drives the limiting mechanism to rotate synchronously or intermittently, which drives the reference position of the elliptical trajectory to rotate around the intersection.

[0038] Specifically, when rotating synchronously, the elliptical trajectory forms a continuous spiral-shaped composite trajectory; when rotating intermittently, the landing point of each elliptical trajectory is offset in the circumferential direction. Both of these two ways can break the coverage limitation of a single elliptical trajectory, expand the area swept by the magnet from a single elliptical range to a ring-shaped coverage area centered on the intersection, thereby greatly improving the effective utilization area of the target material and reducing the local unetched area of the target material.

[0039] The traditional fixed elliptical trajectory can cause the corresponding area of the target material on the elliptical trajectory to be repeatedly etched, especially the edges of the target material corresponding to the long axis of the ellipse, which is prone to excessive consumption (forming a pit), while other areas of the target material have the problem of insufficient consumption. The self-rotation of the limiting mechanism can periodically cover different positions of the target material with the elliptical trajectory, so that the etching area originally concentrated on the edge is dispersed to the annular range of the target material, thereby achieving uniform wear of each area of the target material, and further prolonging the service life of the target material and reducing the replacement cost.

[0040] The film quality of magnetron sputtering depends on the uniformity of the magnetic field coverage. The traditional fixed elliptical trajectory can only cover part of the target material, resulting in uneven film thickness on the corresponding area of the substrate. By rotating the limiting mechanism, the elliptical trajectory covers a wider area of the target material, which can make the plasma confinement range on the surface of the target material more uniform, thereby ensuring that the film thickness of each position of the substrate is consistent, especially suitable for large-size rectangular or circular substrates, which can avoid film defects caused by insufficient magnetic field coverage at the edge of the substrate.

[0041] In an embodiment, the limiting mechanism intermittently rotates around the intersection point.

[0042] When working, the first rotary drive mechanism is started, the servo motor drives the connecting bridge 23 to rotate at a fixed angular velocity, and the mounting block 21 moves along the standard elliptical trajectory under the cooperation of the connecting rod 22, the track and the chute 23a.

[0043] After the mounting block 21 completes one or more elliptical trajectory cycles (which can be determined by the number of rotations of the servo motor or the feedback of the encoder), or the mounting block 21 completes the preset time length of elliptical motion, the second rotary drive mechanism is started, so that the limiting mechanism rotates 10° around the intersection point (the specific angle can be preset according to the size of the target material).

[0044] After the limiting mechanism is rotated into position, the second rotary drive mechanism stops, and the first rotary drive mechanism remains working. At this time, the mounting block 21 will move along the elliptical trajectory of the new reference position.

[0045] After the mounting block 21 again completes one or more elliptical trajectory cycles, or the mounting block 21 again completes the preset time length of elliptical motion, the second rotary drive mechanism is used to rotate the limiting mechanism by another 10° (compared to the initial position, it is rotated by 20°), and the mounting block 21 will move along the elliptical trajectory of the new reference position again.

[0046] In this way, the periodic misplacement of the elliptical trajectory landing point is achieved.

[0047] This mode has simple control logic and does not require complex synchronization algorithms. The second rotary drive mechanism can use an ordinary stepper motor, which has low structure cost. In addition, the parameters of each elliptical trajectory are fixed, which is easy to predict and simulate the trajectory, and is suitable for magnetron sputtering scenarios that are sensitive to cost and do not require high sweeping efficiency.

[0048] In another embodiment, the self-rotation of the limiting mechanism is performed simultaneously with the elliptical motion of the mounting block 21.

[0049] In operation, the first and second rotation driving mechanisms are started simultaneously, and the PLC coordinates the rotation speeds and phases of the two in real time. The connecting bridge 23 drives the mounting block 21 to perform an elliptical motion with ω1, and the limiting mechanism performs a synchronous self-rotation with ω2. The elliptical trajectory of the mounting block 21 is shifted with the self-rotation of the limiting mechanism, and finally a continuous "petal-shaped" composite trajectory is formed. By adjusting the PLC parameters and changing the rotation speed ratio of ω1 and ω2, the trajectory density and shape can be optimized in real time. For example, if the ratio of ω2 to ω1 is increased, the number of petals of the petal-shaped trajectory is increased, and the target material coverage is more intensive. If the ratio is reduced, the number of petals is reduced, and the coverage range is wider.

[0050] This mode of motion is smooth without start-stop impact, has small vibration, and the trajectory has no overlap and gap, which can maximize the target material coverage range and utilization rate, and has strong dynamic adaptability, without the need to stop the machine to adjust the scanning strategy, and is suitable for high-precision magnetron sputtering scenarios that require high uniformity of film deposition and adaptation to large-size substrates.

[0051] The magnetron sputtering magnet variable trajectory motion device based on double-track constraint provided in the application is provided with a first track 11 and a second track 12 that intersect through a limiting mechanism, and the sliding constraint of the connecting rod 22 at both ends along the tracks defines the movement boundary of the mounting block 21. The connecting bridge 23 rotates around the intersection and drives the mounting block 21 through the sliding groove 23a, and under the double constraint, the mounting block 21 forms an elliptical trajectory, replacing the traditional fixed racetrack-shaped or single circular trajectory, which can avoid local excessive consumption of the target material and improve the utilization rate of the target material. The second rotation driving mechanism drives the limiting mechanism to perform a synchronous or intermittent self-rotation, which can cause periodic changes in the landing point of the elliptical trajectory, thereby breaking the coverage limitation of the single elliptical trajectory, expanding the target material area swept by the magnet, balancing the loss difference between the center and the edge of the target material, and relieving the problem of excessive consumption at the edge. At the same time, the elliptical trajectory and the landing point changes can adapt to substrates of different sizes, optimize the magnetic field coverage range, improve the problem of film deposition uniformity caused by the fixed trajectory of the traditional equipment, and meet diversified process requirements.

[0052] Optionally, the connecting bridge 23 is suspended above the limiting mechanism, and the first rotation driving mechanism comprises a rotation driving member 31 arranged on the connecting bridge 23, a bevel gear 32 connected to the output end of the rotation driving member 31, and a linkage gear 33 engaged with the bevel gear 32, connected to the connecting bridge 23, and arranged directly above the intersection position of the first track 11 and the second track 12, for driving the connecting bridge 23 to rotate.

[0053] For details, please refer to Figure 1 and Figure 2, In the illustrated embodiment, the bridge 23 is in the form of a long plate, and is suspended above the first track 11 and the second track 12. The bridge 23 is provided with a rotating shaft, the lower end of which is fixedly connected to the bridge 23, and the upper end of which is rotatably arranged on an external base (such as a cover for covering the entire magnet device). The rotating shaft is opposite the intersection of the two tracks, and the linkage gear 33 is sleeved on the rotating shaft.

[0054] With reference back to Figure 1 and Figure 2 , along the extension direction of the bridge 23, one side of the rotating shaft is provided with a sliding groove 23a, and the other side is provided with a rotating drive 31; the output end of the rotating drive 31 points to the rotating shaft. The bevel gear 32 is coaxially fixed with the output end of the rotating drive 31 through a shaft coupling, and at the same time, the bevel gear 32 is in meshing engagement with the linkage gear 33.

[0055] In use, the rotating drive 31 is started, the output end of which drives the bevel gear 32 to rotate, the bevel gear 32 transmits power to the linkage gear 33 through meshing transmission, and the linkage gear 33 can carry the rotating shaft and the bridge 23 to rotate around the intersection. During the rotation of the bridge 23, the rod body drives the mounting block 21 embedded in the sliding groove 23a to move in a circular motion trend.

[0056] The bridge 23 is suspended above the limiting mechanism, and the bridge 23, the tracks and the connecting rod 22 sliding along the tracks form a layered layout, which can completely avoid the sliding path of the connecting rod 22 in the first track 11 and the second track 12, and avoid mechanical interference between the bridge 23 and the connecting rod 22 in space.

[0057] At the same time, the rotating drive 31 is integrated on the bridge 23, without occupying additional space around the tracks, making the overall structure more compact. The meshing transmission of the bevel gear 32 and the linkage gear 33 can accurately change the direction of the power, adapt to the spatial layout of the suspension of the bridge 23, and can ensure the stable rotation of the bridge 23, providing reliable power transmission for the stable formation of the elliptical trajectory of the mounting block 21.

[0058] Optionally, the first track 11 and the second track 12 are each provided with an edge blocking portion for preventing the sliding end of the connecting rod 22 from disengaging from the corresponding track.

[0059] Specifically, as shown in Figures 1 to 4 , in the illustrated embodiment, the edge blocking portion of the first track 11 and the second track 12 is in the form of a protruding structure integrally formed along the edge of the track guide surface, which is adapted to the track to form a sliding groove facilitating the sliding of the connecting rod 22, and can realize clamping limiting of the sliding end of the connecting rod 22 to avoid disengagement of the sliding end of the connecting rod 22 from the guide surface.

[0060] When the mounting block 21 makes elliptical motion, the two ends of the connecting rod 22 need to slide back and forth along the track at a high frequency. Under the influence of the rotation driving force of the connecting bridge 23, the sliding end is prone to deflection to the outside of the track (such as tilting up along the width of the track). The guard can limit the deflection range of the sliding end through physical blocking to ensure that the sliding end always moves in contact with the guide surface.

[0061] Optionally, the sliding end of the connecting rod 22 in the track is provided with a slider adapted to the shape of the track.

[0062] For details, please refer to Figure 1 and Figure 2 In the illustrated embodiment, the main body of the connecting rod 22 is configured as a long rod, and both ends of the connecting rod 22 are provided with rectangular sliders that are adapted to the rectangular sliding groove.

[0063] Ensuring a precise fit between the slider and the track groove limits the displacement of the connecting rod 22 along the width direction of the track, prevents the sliding end from wobbling within the track, ensures that the connecting rod 22 only reciprocates along the extension direction of the track, and guarantees the stability of the elliptical motion of the mounting block 21.

[0064] Optionally, the included angle between the first track 11 and the second track 12 is adjustable; by adjusting the included angle between the first track 11 and the second track 12, the eccentricity of the elliptical trajectory of the mounting block 21 can be changed: when the included angle increases, the minor axis of the elliptical trajectory increases and the major axis decreases, and the elliptical trajectory becomes relatively wider; when the included angle decreases, the minor axis of the elliptical trajectory decreases and the major axis increases, and the elliptical trajectory becomes relatively narrower.

[0065] For details, please refer to Figure 5 In the illustrated embodiment, the first track 11 and the second track 12 intersect in an X-shape, with an included angle α and an included angle β between the first track 11 and the second track 12, where the included angle α is smaller than the included angle β. The "included angle between the first track 11 and the second track 12" mentioned in this application refers to the included angle α.

[0066] Continue to refer to Figure 6 The first track 11 and the second track 12 are of equal length and their centers intersect. Therefore, the four endpoints of the first track 11 and the second track 12 can form a rectangular limiting boundary. Under the constraints of the track and the slide 23a, the mounting block 21 will perform elliptical motion. The major axis of the ellipse must be located on the major central axis (i.e., the Y-axis) of the rectangular limiting boundary, and the minor axis of the ellipse must be located on the minor central axis (i.e., the X-axis) of the rectangular limiting boundary. The endpoints of the ellipse (the extreme positions on the X-axis and Y-axis) are limited by the length of the connecting rod 22.

[0067] Continue to refer to Figure 7 Compared to Figure 6 The state shown Figure 7The angle between the first track 11 and the second track 12 is increased. In the case where other parameters remain unchanged (such as the length of the connecting rod 22 remaining unchanged), the long axis of the elliptical track is obviously reduced in size, and the short axis is correspondingly increased in size, and the track is changed from a long and narrow shape to a fat and round shape.

[0068] By changing the angle between the tracks, the specific shape of the elliptical track can be changed. On the one hand, the utilization rate of the target material can be further improved. For example, when the edge of the material is excessively consumed, the angle between the tracks is increased to make the elliptical track fat, which can expand the coverage of the track in the central area of the target material, and balance the loss of the edge and the center. On the other hand, the elliptical track can be changed according to specific processes. For example, when the substrate is long and narrow, the angle can be reduced to make the elliptical track narrow, so as to adapt to the magnetic field coverage requirement in the length direction of the substrate, and improve the uniformity of the film.

[0069] In an embodiment, the first track 11 and the second track 12 are rotatably connected together through bearings. The rotating bearing has a certain damping. When the angle needs to be adjusted, the first track 11 or the second track 12 can be manually or mechanically operated.

[0070] In another embodiment, the magnetron track changing movement device based on double-track constraint provided by the application further comprises a variable-angle driving assembly, which is used to drive at least one of the first track 11 and the second track 12 to rotate around the intersection.

[0071] The variable-angle driving assembly can adopt any structure that can conveniently realize the relative rotation of the two tracks around the intersection, such as a motor matched with a gear rack, a synchronous belt, a crank rocker mechanism, etc.

[0072] In use, the first track 11 can be fixed and the second track 12 can be rotated, or the first track 11 can be rotated and the second track 12 can be fixed, or the first track 11 and the second track 12 can be synchronously and oppositely rotated.

[0073] Optionally, the positions where the first track 11 and the second track 12 intersect are arranged in a nested form, so that the guide surfaces of the first track 11 and the second track 12 for guiding the movement of the connecting rod 22 are in the same plane.

[0074] For details, please refer to Figure 9 In the illustrated embodiment, the lower surface of the middle part of the first track 11 is provided with an upper groove, and the upper surface of the middle part of the second track 12 is provided with a lower groove. The upper and lower grooves are opposite and have a matching shape. When the two tracks are cross-assembled, the upper and lower grooves are mutually engaged, forming a concave-convex fitting structure, so that the guide surface of the first track 11 and the guide surface of the second track 12 are exactly in the same horizontal plane without height difference or step.

[0075] The nested form is arranged, on the one hand, to ensure the smoothness and trajectory accuracy of the sliding of the connecting rod 22. Since the guide surfaces of the two tracks are coplanar, the connecting rod 22 will not be jammed or impacted due to the height difference when it slides from one end of the track to the vicinity of the intersection and then transitions to the other end, thereby ensuring the continuity and stability of the elliptical trajectory of the mounting block 21 and preventing the trajectory from deviating or fluctuating. On the other hand, through the structure of the concave-convex nesting, the two tracks do not need to be arranged in an up-down staggered manner at the intersection (to avoid occupying too much vertical space) and can intersect in the same plane, thereby greatly reducing the overall thickness of the limiting mechanism to adapt to the compact space environment inside the magnetron sputtering device and avoiding the problem of uneven force on the connecting rod 22 caused by the up-down staggered arrangement of the tracks, which helps to prolong the service life of the connecting rod 22 and the tracks.

[0076] Optionally, the end portions of the first track 11 and the second track 12 near the intersection position are arranged in a V shape, and the closer to the intersection position, the smaller the width of the guide surface, so that the first track 11 and the second track 12 have an avoidance gap 10a therebetween. The existence of the avoidance gap 10a can avoid interference between the first track 11 and the second track 12 when they rotate relative to each other.

[0077] Specifically, reference can be made to Figure 3 and Figure 4 In the illustrated embodiment, the portions of the two tracks near the intersection are both formed in a V-shaped cutting structure along the extension direction thereof toward the intersection. Taking the first track 11 as an example, the first track 11 is in the shape of a rectangle as a whole, and the middle portion of the first track 11 is the intersection position. The middle portion of the first track 11 is arranged in a circular shape, and the two ends connected to the circular middle portion are both arranged in a V shape with the pointed end facing the intersection and the opening facing the outside of the track. This makes four avoidance gaps 10a exist between the two tracks.

[0078] As can be easily understood, if the intersection portions of the two tracks remain in a rectangular structure, they are likely to collide or rub against each other during rotation, which can easily cause the angle adjustment to be jammed or even damage the tracks. The V-shaped end portions are shrunk toward the intersection side through the guide surface, forming avoidance gaps 10a around the intersection between the two tracks. The avoidance gaps 10a provide sufficient space for the relative rotation of the intersection portions of the tracks. Whether the two tracks rotate toward each other (to reduce the included angle) or rotate away from each other (to increase the included angle), the inclined side surfaces of the V-shaped end portions will not contact each other, ensuring smooth and interference-free angle adjustment.

[0079] In addition, Figure 3 and Figure 4 In the illustrated embodiment, the first track 11 and the second track 12 are also arranged in a nested form, and the middle portions of the two tracks are both arranged in a circular shape and are arranged in an upper concave or lower concave form for easy clamping. When the two tracks are clamped, the two circular middle portions are in close contact, and the guide surfaces are in the same plane. At the same time, the two circular middle portions are coaxially arranged to facilitate the relative rotation of the two tracks.

[0080] In one embodiment, the intersection of one of the first track 11 and the second track 12 is provided with an external gear 11a, and the intersection of the other is provided with an internal gear 11b; the internal gear 11b has an inner diameter greater than the outer diameter of the external gear 11a, and when the guide surfaces of the first track 11 and the second track 12 are coplanar, the external gear 11a is inserted into the internal gear 11b; the variable-angle driving assembly includes a variable-angle rotary driving member and a planetary gear 11c, the planetary gear 11c is located between the external gear 11a and the internal gear 11b and simultaneously meshes with the external gear 11a and the internal gear 11b; the variable-angle rotary driving member is used to drive the planetary gear 11c to rotate, thereby achieving the synchronous and reverse rotation of the external gear 11a and the internal gear 11b.

[0081] Specifically, refer to Figures 8 to 10 In the illustrated embodiment, the lower surface of the middle part of the first track 11 is provided with an upper groove, and the upper surface of the middle part of the second track 12 is provided with an upper groove, and the two tracks are buckled together through the upper and lower grooves to achieve the coplanar of the guide surfaces.

[0082] Continue to refer to Figure 9 The upper groove of the first track 11 is provided with an external gear 11a, and the external gear 11a is an annular straight gear, and its axis coincides with the central axis of the intersection of the two tracks. The lower surface of the middle part of the second track 12 is provided with an internal gear 11b, and the internal gear 11b is an annular internal tooth structure, and its axis also coincides with the central axis of the intersection. The inner diameter of the internal gear 11b is greater than the outer diameter of the external gear 11a, so that the external gear 11a can be completely inserted into the inner cavity of the internal gear 11b.

[0083] In combination with reference to Figure 10 The planetary gear 11c is a single straight gear, which is rotatably arranged in the annular gap between the external gear 11a and the internal gear 11b. The tooth surface of the planetary gear 11c simultaneously meshes with the external teeth of the external gear 11a and the internal teeth of the internal gear 11b, and the axis of the planetary gear 11c is parallel to the axes of the external gear 11a and the internal gear 11b, so as to ensure the stability of the meshing transmission.

[0084] The variable-angle rotary driving member can adopt a rotary cylinder, a motor or any other driving structure capable of driving the planetary gear 11c to rotate around the support shaft.

[0085] Since the planetary gear 11c simultaneously meshes with the external gear 11a and the internal gear 11b, when the variable-angle rotary driving member drives the planetary gear 11c to rotate, the planetary gear 11c can simultaneously generate reverse transmission forces on the external gear 11a and the internal gear 11b; the external gear 11a is driven by the meshing force of the planetary gear 11c to rotate in the direction opposite to the rotation direction of the planetary gear 11c; the internal gear 11b is driven by the meshing force of the planetary gear 11c to rotate in the same direction as the rotation direction of the planetary gear 11c, thereby achieving the synchronous and reverse rotation of the external gear 11a and the internal gear 11b.

[0086] Since the outer gear 11a is rigidly connected with the first track 11 and the inner gear 11b is rigidly connected with the second track 12, the outer gear 11a can drive the first track 11 to rotate around the intersection point, and the inner gear 11b can drive the second track 12 to rotate around the intersection point, so as to realize the synchronous and reverse rotation of the two tracks.

[0087] The synchronous and reverse rotation of the two tracks is realized through the linkage of the planetary gear 11c. Compared with the single-track rotation angle adjustment mode, the adjustment range of the angle is doubled under the same driving stroke, which can greatly improve the angle adjustment efficiency, and then quickly adapt to the demand of the target material loss state or the substrate size on the eccentricity of the elliptical track.

[0088] In addition, the outer gear 11a and the inner gear 11b adopt an inner-outer nested design, the planetary gear 11c is embedded in the gap between the two, and the overall gear transmission structure is concentrated at the track intersection point, without occupying additional space around the device, perfectly adapting to the compact layout requirement of the magnetron sputtering device, and avoiding the influence of the large angle adjustment mechanism on the installation of other components.

[0089] In order to improve the stability of the rotation of the two tracks, the magnetron sputtering magnet track-changing motion device based on double-track constraint provided by the application further comprises a base 1, a guide protrusion 2 is arranged on the base 1, the back surfaces of the first track 11 and the second track 12 are each provided with a ring-shaped groove 11d, the ring-shaped groove 11d is matched with the guide protrusion 2, the first track 11 and the second track 12 are rotatably arranged on the base 1, the guide protrusion 2 is inserted into the ring-shaped groove 11d, and when the tracks rotate, the ring-shaped groove 11d and the guide protrusion 2 are limited to each other, so as to avoid the position deviation of the tracks.

[0090] For details, please refer to Figure 8 In the illustrated embodiment, the base 1 is the supporting foundation of the entire device, and the base 1 is arranged in a circular plate shape (adapted to the magnetron sputtering device, the process cavity is generally arranged in a cylindrical shape, and the base 1 can be used as the cavity top to close the process cavity), the center of which coincides with the intersection point of the first track 11 and the second track 12, so as to ensure that the rotation center of the tracks is consistent with the center of the base 1.

[0091] For details, please refer to Figure 8 The guide protrusion 2 is an annular protrusion integrally formed on the surface of the base 1, and the center of the circle formed by the guide protrusion 2 coincides with the center of the base 1 (i.e. the intersection point of the tracks), forming an annular guide path with the intersection point of the tracks as the center.

[0092] For details, please refer to Figure 9The back surface (the side facing the base 1) of the first track 11 and the second track 12 is machined with a ring-shaped groove 11d, and any track length square has one ring-shaped groove 11d at each end. After the two tracks are crossed and buckled, the ring-shaped tracks of the four ring-shaped grooves 11d are on the same circle, and the center of the circle is also aligned with the rotation center of the track (the intersection of the tracks). The cross-sectional shape of the ring-shaped groove 11d (such as a rectangle, a trapezoid) is matched with the cross-sectional shape of the guide ridge 2. When the track is placed on the base 1, the guide ridge 2 can be inserted into the ring-shaped groove 11d to form a radial offset assembly relationship.

[0093] The guide ridge 2 can limit the ring-shaped groove 11d radially, so that the track can only move along the ring-shaped path formed by the guide ridge 2, and cannot produce radial (away from or close to the intersection) offset of the base 1. At the same time, the ring-shaped groove 11d and the guide ridge 2 are in surface contact, which can disperse the weight load of the track, avoid the track from warping due to uneven local stress, and be beneficial to protecting the horizontal of the guide surface.

[0094] In a specific embodiment, the bridge 23 and the first rotary driving mechanism are suspended above the two tracks. The two tracks are rotatably arranged on the base 1, and the variable angle driving assembly is arranged on the base 1 and can change the angle of the two tracks; the second rotary driving mechanism is used to drive the base 1 to rotate around the intersection; the base 1 is arranged in a disc shape, and a ring of teeth is arranged on the cylindrical surface of the base 1; the second rotary driving mechanism includes a motor and a driving gear, the driving gear is engaged with the cylindrical surface of the base 1, and when the motor drives the driving gear to rotate, the base 1 can drive the limiting mechanism thereon to rotate around the intersection.

[0095] Optionally, the length of the sliding groove 23a is adjustable; by adjusting the length of the sliding groove 23a, the maximum adjustable eccentricity of the mounting block 21 in the sliding groove 23a can be changed, so as to change the eccentricity of the elliptical trajectory of the mounting block 21.

[0096] The core of changing the length of the sliding groove 23a is to adjust the adjustable eccentricity range of the mounting block 21, which directly affects the shape and eccentricity of the elliptical trajectory.

[0097] From the track change, the length of the sliding groove 23a determines the maximum sliding distance (i.e. the maximum adjustable eccentricity e max ) of the mounting block 21 in the axial direction of the bridge 23. When the length of the sliding groove 23a increases, e maxAs the eccentricity e increases, the mounting block 21 can slide along the sliding groove 23a to a further position away from the intersection of the track, and in combination with the elliptical parameter relationship, the major axis a ≈ L + e and the minor axis b ≈ (L - e)・cos(θ / 2), L is the effective length of the connecting rod, and θ is the angle of the track, at this time, the major axis direction is slightly elongated (or remains relatively unchanged, depending on the length constraint of the track), the minor axis direction is shortened due to the decrease of L - e, and the overall shape of the elliptical trajectory is more elongated, and the eccentricity increases; similarly, when the length of the sliding groove 23a decreases, e max is limited, the mounting block 21 cannot move away from the intersection, and the decrease of e shortens the maximum distance of the major axis direction and elongates the minor axis direction due to the increase of L - e, so that the elliptical trajectory is more circular in shape, and the eccentricity decreases.

[0098] That is, changing the length of the sliding groove 23a can also achieve fine adjustment of the shape of the elliptical trajectory, thereby improving the flexibility of the device in adapting to the magnetron sputtering process; for example, when the central region of the target material is etched insufficiently, the length of the sliding groove 23a can be shortened to make the trajectory close to a circle, thereby enhancing the magnetic field coverage of the central region; when it is necessary to expand the coverage range of the edge of the target material, the length of the sliding groove 23a can be lengthened to make the trajectory elongated / flat, thereby adapting to the etching requirements of the edge.

[0099] In an embodiment, the end of the connecting bridge 23 away from the intersection is provided with an axially extending screw hole, which communicates with the sliding groove 23a; a screw rod is arranged in the screw hole, and by screwing the screw rod, the length of the screw rod inserted into the sliding groove 23a can be changed. The longer the screw rod inserted into the sliding groove 23a, the shorter the effective length of the sliding groove 23a, and the smaller the maximum distance that the mounting block 21 can reach along the sliding groove 23a.

[0100] In another embodiment, the connecting bridge 23 is provided in a pull-out structure of an outer sleeve and an inner rod nested in the outer sleeve, and by pulling out the inner rod from the outer sleeve, the length of the sliding groove 23a can be lengthened, and by pushing the inner rod into the outer sleeve, the length of the sliding groove 23a can be shortened.

[0101] The present application does not limit the specific form of the length adjustment of the sliding groove 23a.

[0102] Alternatively, the length of the connecting rod 22 can be adjusted; by adjusting the length of the connecting rod 22, the size of the elliptical trajectory of the mounting block 21 can be changed; when the connecting rod 22 is lengthened, both the major axis and the minor axis of the elliptical trajectory are lengthened; when the connecting rod 22 is shortened, both the major axis and the minor axis of the elliptical trajectory are shortened.

[0103] The essence of the length change of the connecting rod 22 is to directly change the overall size of the elliptical trajectory by adjusting the basic distance from the mounting block 21 to the intersection of the track.

[0104] For details, please refer to Figure 6 or Figure 7, the figure shows two different lengths of connecting rod 22 under the elliptical trajectory. It can be seen that when the connecting rod 22 is long, the major axis and minor axis of the elliptical trajectory are both longer, and the overall size of the elliptical trajectory is larger and longer.

[0105] It is easy to understand that the effective length of the connecting rod 22 is the basic determinant of the size of the major axis and minor axis of the elliptical trajectory, because when the connecting rod 22 slides along the first track 11 and the second track 12, its length directly limits the basic movement radius of the mounting block 21 when rotating around the intersection, when the connecting rod is lengthened, the maximum stroke of the mounting block 21 sliding along the track increases, and the major axis (corresponding to the maximum displacement of the connecting rod 22 along the extension direction of the track) and the minor axis (corresponding to the maximum displacement of the connecting rod 22 along the vertical direction of the track) of the ellipse are expanded synchronously; similarly, when the connecting rod 22 is shortened, the maximum sliding stroke of the mounting block 21 is reduced, and the major axis and the minor axis are synchronously reduced, and the eccentricity of the ellipse remains relatively stable during the process, only the overall size changes proportionally.

[0106] In an embodiment, the connecting rod 22 includes an outer threaded segment and an inner threaded sleeve, which are connected through inner and outer threaded structures. By screwing the outer threaded segment, the connection position of the outer threaded segment and the inner threaded sleeve can be adjusted, the insertion / outsertion length of the outer threaded segment is changed, and then the effective length of the connecting rod 22 is changed.

[0107] In another embodiment, the connecting rod 22 is connected by multiple segments of rod parts that can be stacked. Increasing the rod parts can lengthen the connecting rod 22, and reducing the rod parts can shorten the connecting rod 22. These rod parts can be connected through detachable ways such as insertion, screwing, magnetic attraction, etc.

[0108] The application does not limit the specific configuration of the length-adjustable connecting rod 22.

[0109] It should be noted that in actual equipment, the angle between the two tracks can be changed, the length of the sliding groove 23a can be changed, or the length of the connecting rod 22 can be changed, or at least two parameters related to the elliptical trajectory can be changed, so that the shape of the elliptical trajectory is changed, and the elliptical trajectory is more suitable for the process, or the utilization of the target material is more comprehensive.

[0110] Optionally, the double-track-constrained magnetron sputtering magnet variable trajectory motion device provided by the application further comprises a bellows 41, which is arranged on the connecting bridge 23 and connected with the mounting block 21; when the bellows 41 is inflated and expanded, its length is fixed, which can prevent the mounting block 21 from moving along the sliding groove 23a, so that the mounting block 21 makes a circular motion around the intersection, thereby covering the area not involved in the elliptical trajectory.

[0111] For details, please refer to Figure 11In the illustrated embodiment, the connecting bridge 23 is provided with a rotary inflation joint, and the corrugated tube 41 is connected to the inflation joint at one end and to the mounting block 21 at the other end. The rotary inflation joint is connected to an external inflation device, which can ensure reliable connection between the corrugated tube 41 and the inflation device during rotation of the connecting bridge 23.

[0112] The corrugated tube 41 functions to fix the length by inflation, thereby changing the movement constraint state of the mounting block 21, to realize switching between the elliptical trajectory and the circular trajectory, and to adjust the length by the amount of inflation to change the radius of the circular trajectory.

[0113] Specifically, when the mounting block 21 moves along the elliptical trajectory, the corrugated tube 41 is in an uninflated state, and its length can be flexibly extended or retracted without affecting the sliding of the mounting block 21 along the sliding groove 23a; at this time, the mounting block 21 is subjected to the double action of sliding constraint along the first track 11 and the second track 12 and displacement compensation along the sliding groove 23a by the connecting rod 22, forming an elliptical trajectory.

[0114] When switching to a circular trajectory, compressed gas (such as 0.3 MPa dry compressed air) is introduced into the corrugated tube 41, which expands and sets after inflation, and the length is fixed and rigid, thereby preventing the mounting block 21 from sliding axially along the sliding groove 23a (limiting the radial displacement degree of freedom of the mounting block 21). At this time, the first rotary drive mechanism continues to drive the connecting bridge 23 to rotate around the track intersection, and the mounting block 21 cannot slide along the sliding groove 23a due to the fixed action of the corrugated tube 41, but can only make a circular motion around the intersection with the connecting bridge 23.

[0115] To facilitate the mounting block 21 to make a circular motion around the intersection, the connecting rod 22 has a restricted state and a free state; when the mounting block 21 moves along the elliptical trajectory, the connecting rod 22 is in the restricted state, the length of the connecting rod 22 is fixed, and the major axis and the minor axis of the elliptical trajectory are determined; when the mounting block 21 moves along the circular trajectory, the connecting rod 22 is in the free state and can adaptively extend or retract after contacting the wall.

[0116] When the connecting rod 22 is in the restricted state and the length is fixed, it can provide a stable basic size reference for the elliptical trajectory through the rigid length, ensure that the track constraint and the displacement compensation of the sliding groove 23a can be accurately converted into an elliptical trajectory with fixed parameters, and avoid uneven coverage of the target material or decline in film coating precision due to deformation of the connecting rod 22.

[0117] After the corrugated pipe 41 is inflated and fixed to the mounting block 21, the mounting block 21 cannot slide along the sliding groove 23a and can only make a circular motion around the intersection with the connecting bridge 23. At this time, the two ends of the connecting rod 22 still need to slide along the first track 11 and the second track 12. If the connecting rod 22 is still in the limited state at this time, when it slides to the end of the track, the fixed length of the connecting rod 22 will be restricted by the boundary of the track, preventing the mounting block 21 from continuing to make a circular motion, resulting in a track jam or even damage to the mechanism. Therefore, the connecting rod 22 needs to switch to a free state to adapt to the track constraint by length extension when the connecting rod 22 touches the wall, avoiding interference with the circular motion and ensuring that the mounting block 21 can form a continuous and stable circular track around the intersection, thereby covering the center area of the target material not covered by the elliptical track and realizing the complementary functions of the two tracks.

[0118] The two states of the connecting rod 22 are the key to adapting to the motion logic of the elliptical and circular tracks, respectively. The limited state can provide a rigid size reference for the elliptical track to ensure track accuracy, and the free state can avoid the constraint interference of the circular track to ensure the continuity of the motion. The two states work together to support the multi-track composite scanning function of the device, ultimately achieving the core goal of improving target material utilization and optimizing film uniformity.

[0119] It needs to be explained that the elliptical track is constrained by the track, and the central area (the area near the intersection of the track) often has a problem of insufficient magnetic field coverage, resulting in a blind area in the center of the target material that is not fully etched. The circular track has the intersection of the track as the center and can accurately cover the central area of the target material, complementing the edge coverage of the elliptical track, so that the target material can be scanned from the center to the edge by the magnet, avoiding local waste of the target material and further improving the utilization of the target material.

[0120] In addition, in some magnetron sputtering processes (such as the center area of a semiconductor wafer), the film quality of the central area of the target material directly affects the performance of the product, and the elliptical track is prone to result in a thin center film due to insufficient coverage. The circular track can form a uniform magnetic field in the central area of the target material, ensuring that the plasma density in the central area is consistent with the edge, meeting the high-precision film deposition requirements.

[0121] In actual devices, the elliptical track or the circular track can be selected according to specific needs, or the elliptical track can be used in combination with the circular track to achieve targeted magnetic field effects, improve the ionization effect of the device, and further optimize the uniformity of the film.

[0122] It needs to be supplemented that the length of the corrugated pipe 41 can change with the change in the inflation amount. When the inflation amount increases, the expansion degree of the corrugated pipe 41 is greater, and the axial length increases accordingly. When the inflation amount decreases, the expansion degree decreases, and the axial length shortens. After the length is adjusted, it is kept stable by gas pressure. This feature allows the radius of the circular track to be adjustable.

[0123] When the radius of the circular trajectory needs to be increased, the inflation amount of the bellows 41 is increased (e.g., the pressure is increased from 0.3 MPa to 0.5 MPa), so that the length of the bellows 41 is increased, the radius of the rotation of the mounting block 21 around the intersection point is increased, and the coverage range of the circular trajectory is expanded, which can adapt to the central area coverage of a large-size target material.

[0124] When the radius of the circular trajectory needs to be reduced, the inflation amount of the bellows 41 is reduced (e.g., the pressure is reduced to 0.1 MPa), so that the length of the bellows 41 is reduced, the mounting block 21 moves towards the intersection point, and the radius of the circular trajectory is reduced, which can adapt to the central film coating of a small-size substrate.

[0125] This adjustability can improve the adaptability of the device to target materials / substrates of different sizes. Without replacing the bellows 41 or adjusting the structure of the connecting bridge 23, the radius of the circular trajectory can be changed by controlling the inflation amount, thereby meeting the magnetic field coverage required by different processes.

[0126] In an embodiment, the connecting rod 22 includes an outer cylinder and an inner rod slidingly arranged in the outer cylinder, and a gas spring is further arranged in the outer cylinder; the gas spring is configured to resist the force applied by the first track 11 and the second track 12 when the mounting block 21 performs an elliptical motion, so that the connecting rod 22 maintains a fixed length; by applying an axial force greater than the unlocking force of the gas spring to the inner rod, the length of the connecting rod 22 can be changed, and after the axial force is removed, the gas spring can automatically lock at the new length position.

[0127] Specifically, the outer cylinder is a basic load-bearing component of the connecting rod 22, which is in a hollow cylindrical shape. The middle part of the outer cylinder is rigidly connected to the mounting block 21 by bolts, and both ends are open to adapt to the sliding of the inner rod. An axially extending guide groove is processed on the inner wall of the outer cylinder to ensure that the inner rod does not deviate radially when sliding axially. The inner part of the outer cylinder further reserves a cavity for accommodating the gas spring, and the two ends of the cavity are respectively attached to the bottom of the outer cylinder and the end of the inner rod, thereby providing installation and force receiving space for the gas spring.

[0128] The connecting rod 22 includes two inner rods arranged at one end of the outer cylinder. The inner rod is a telescopic transmission component, and a guide block (e.g., a rectangle or a polygon to avoid relative rotation between the outer cylinder and the inner rod) is arranged on the outer wall of the inner rod to adapt to the guide groove. One end of the inner rod is slidingly embedded in the outer cylinder, and the other end is slidingly arranged in the track. The end of the inner rod close to the outer cylinder is provided with an annular step for clamping the piston rod end of the gas spring, so that the force of the gas spring can be accurately transmitted to the inner rod to realize the locking and unlocking of the length.

[0129] The gas spring is a core control component of the length of the connecting rod 22, adopts a piston structure filled with high-pressure nitrogen, the cylinder end is fixed with the bottom of the outer cylinder, and the piston rod end is in abutment with the annular step of the inner rod. The gas spring is provided with a locking mechanism, is in a locked state when no external force is applied, and has stable locking force. When an axial force greater than the unlocking force is applied, the locking mechanism is released, the piston rod can be extended and retracted along the cylinder, and after the external force is removed, the locking mechanism is automatically locked again, so that the current length is maintained.

[0130] More specifically, the rigid connection of the outer cylinder and the mounting block 21 ensures that the connecting rod 22 can transmit the movement trend of the mounting block 21 to the inner rod. The end of the inner rod away from the outer cylinder is provided with a sliding block, and the sliding force of the sliding block along the first track 11 and the second track 12 can be reversely transmitted to the inner rod. The gas spring is interposed between the outer cylinder and the inner rod, the cylinder body is fixed with the outer cylinder, and the piston rod is in abutment with the inner rod, so as to form elastic constraint on the relative displacement of the two. In the locked state, the locking force of the gas spring is greater than the force of the track on the sliding block, so that the inner rod cannot slide along the outer cylinder, the outer cylinder and the inner rod are kept relatively fixed, and the overall length of the connecting rod 22 is stable. In the unlocked state, the external force overcomes the unlocking force of the gas spring, the piston rod slides with the inner rod, drives the outer cylinder and the inner rod to relatively displace, and the length adjustment of the connecting rod 22 is realized. At the same time, the guide block of the inner rod cooperates with the guide groove of the outer cylinder, so as to ensure that the inner rod does not rotate and deviate during the length adjustment process, and the sliding block is prevented from being stuck due to uneven force on the connecting rod 22.

[0131] When the mounting block 21 moves along the elliptical track, the gas spring is in a natural locked state, the locking force of the gas spring can resist the axial force applied to the inner rod by the sliding block through the first track 11 and the second track 12 (such as the reaction force when the sliding block slides and touches the wall), the outer cylinder and the inner rod have no relative displacement, and the length of the connecting rod 22 is fixed.

[0132] When the size of the elliptical track needs to be changed (such as adapting to a new size of target material), an axial force is applied to the inner rod of the connecting rod 22 (which can be realized by manual pushing or electric pushing), and the axial force needs to be greater than the unlocking force of the gas spring (for example, the unlocking force of the gas spring is 500N, and an axial force of 600N is applied). At this time, the gas spring locking mechanism is released, the piston rod slides along the outer cylinder with the inner rod (when the inner rod is pushed inward, the length of the connecting rod 22 is shortened; when the inner rod is pulled outward, the length of the connecting rod 22 is increased).

[0133] After the connecting rod 22 is adjusted to the target length, the applied axial force is removed, the gas spring is automatically locked again, the piston rod and the inner rod are kept relatively fixed, and the connecting rod 22 is stably kept at the new length. Then the device is started, and the mounting block 21 can move along the elliptical track corresponding to the new length.

[0134] The locking force of the gas spring can stably maintain the length of the connecting rod 22, avoid the extension of the connecting rod 22 due to the track force during the elliptical motion, ensure the fixed size of the long axis and short axis of the elliptical track, prevent the uneven coverage of the target material caused by the track deviation, and ensure the uniformity of the coating. When the elliptical track needs to be changed, the connecting rod 22 or the components do not need to be disassembled or replaced, and the length of the connecting rod 22 can be adjusted by applying an axial force. After the axial force is removed, the gas spring is automatically locked, which is convenient to operate and can greatly shorten the equipment adjustment time during process switching. By flexibly adjusting the length of the connecting rod 22, different sizes of target materials can be quickly adapted without replacing the entire connecting rod assembly, which can reduce the equipment maintenance cost and spare parts inventory pressure. In addition, the elastic constraint of the gas spring can also buffer the reaction force of the track, reduce the impact and wear of the sliding block and the track, and prolong the service life of the connecting rod 22 and the track.

[0135] In the elliptical track mode, the bellows 41 is in an uninflated state, and its length can be flexibly extended and retracted, and it cannot limit the sliding of the mounting block 21 along the sliding groove 23a. At this time, the system mechanical transmission path is dominated by track constraint. The selected gas spring needs to meet the locking force F lock greater than the axial force F ellipse experienced by the connecting rod 22 during elliptical motion. When the first rotary drive mechanism drives the connecting bridge 23 to rotate, the mounting block 21 is driven by the connecting bridge 23 to generate a circular motion trend, but the connecting rod 22 is constrained by the first track 11 and the second track 12 and can only slide along the extension direction of the track. At this time, the reaction force of the track on the connecting rod 22 is converted into the axial force F ellipse of the connecting rod 22. Since F ellipse is less than F lock , the gas spring remains in a locked state, and there is no relative displacement between the outer cylinder and the inner rod. The length of the connecting rod 22 is fixed, providing stable rigid support for the mounting block 21, ensuring that it forms an elliptical track with fixed parameters under the cooperative action of track constraint and displacement compensation of the sliding groove 23a.

[0136] In the circular track mode, the bellows 41 is inflated to a fixed length state, and its two ends are rigidly connected with the connecting bridge 23 and the mounting block 21, respectively, completely changing the system mechanical transmission path. The mounting block 21 is limited by the bellows 41 and cannot slide along the sliding groove 23a, but can only move in a circular motion around the track intersection point with the connecting bridge 23. At this time, the track constraint is converted into an obstacle force that needs to be overcome.

[0137] In an embodiment, the connecting rod 22 selects a low-locking-force gas spring, F lock is slightly greater than F ellipse。

[0138] When the first rotary drive mechanism drives the connecting bridge 23 to rotate, the circular motion trend of the mounting block 21 forces the connecting rod 22 to slide along the track. After the end of the connecting rod 22 touches the wall, the reaction force applied by the track increases suddenly, forming a force greater than F lockThe axial force forces the gas spring to unlock, and the inner rod is passively extended and retracted along the outer cylinder to adapt to the circumferential motion track of the mounting block 21, avoiding the movement jamming or mechanism damage of the connecting rod 22 due to the fixed length.

[0139] In this embodiment, the entire process does not require an additional unlocking controller, but only switches the mechanical path through the inflation state of the bellows 41, and uses the characteristics of the low-locking-force gas spring to achieve passive extension and retraction.

[0140] In another embodiment, the magnet trajectory changing device based on double-track constraint provided by the application further comprises an unlocking controller configured to send an unlocking signal to the gas spring to reduce the locking force when the mounting block 21 moves in a circular motion, and to cancel the unlocking signal to restore the locking force when the mounting block 21 moves in an elliptical motion.

[0141] At this time, the gas spring can adopt a normally closed unlocking gas spring, and the unlocking controller is a control component specially designed for switching between the two states of the elliptical mode locking and the circular mode unlocking of the gas spring.

[0142] Specifically, the unlocking controller is composed of a signal generating unit, an execution element (a micro electromagnetic valve or a gas control valve), and a signal transmission structure (a control line and a multi-channel rotary joint). Among them, the signal generating unit can be integrated into the total control system of the magnetron sputtering equipment, and is used to generate a control instruction of "unlocking" or "restoring locking" according to the trajectory mode requirement; the execution element is directly connected with the unlocking valve of the gas spring, and controls the opening and closing of the unlocking valve by receiving the instruction; in the signal transmission structure, the control line (wire or thin gas pipe) is arranged along the preset channel inside the connecting bridge 23 to avoid winding of the line during movement, and the multi-channel rotary joint is installed at the rotating connection between the connecting bridge 23 and the base to ensure that the control signal or low-pressure gas can still be stably transmitted when the connecting bridge 23 rotates, realizing reliable connection between the unlocking controller and the gas spring.

[0143] The use of the unlocking controller needs to be synchronized with the trajectory mode switching of the device, relying on the logical process of "signal instruction → execution element action → gas spring state change", and the specific operation is as follows: When the elliptical trajectory is running, the total control system sends a "cancel unlocking signal" instruction to the unlocking controller. After receiving the instruction, the signal generating unit of the unlocking controller controls the execution element to be de-energized or to cut off the low-pressure gas supply, so that the unlocking valve of the gas spring is closed. At this time, the gas spring restores the normally closed high-pressure locking state, and the locking force remains at the maximum value, which can resist the axial force applied to the connecting rod 22 by the first track 11 and the second track 12, and ensure that the length of the connecting rod 22 is fixed, providing rigid support for the mounting block 21 to stably form an elliptical trajectory. The entire process does not require manual intervention, and the unlocking controller automatically maintains the locking state.

[0144] After switching to the circular trajectory mode and the bellows 41 is inflated and fixed, the total control system sends a "unlock signal" instruction to the unlocking controller. The unlocking controller triggers the unlocking valve of the gas spring to open by executing elements (such as energizing a micro electromagnetic valve or introducing low-pressure gas), so that the pressure on both sides of the gas spring cylinder is quickly balanced, and the locking force is instantly reduced to nearly zero (only a small mechanical friction force remains). At this time, the first rotary drive mechanism drives the connecting bridge 23 to rotate, and when the mounting block 21 moves in a circular motion, the axial force generated by the connecting rod 22 constrained by the track can easily push the inner rod to extend and retract along the outer cylinder, without the obstruction of the locking force, ensuring continuous and smooth circular motion.

[0145] When switching back to the elliptical trajectory mode from the circular trajectory mode, the total control system stops sending the "unlock signal", and the unlocking controller controls the reset of the executing element, the closing of the gas spring unlocking valve, the recovery of the high-pressure state, and the rapid increase of the locking force to the maximum value. The connecting rod 22 is re-fixed in length, and the device can immediately enter the elliptical trajectory operation, with rapid switching response and no need for shutdown adjustment.

[0146] Compared with the above-mentioned compromise solution of the low-locking-force gas spring, the unlocking controller actively controls the gas spring to make its locking force nearly zero, and there is no locking force to hinder the extension and retraction of the connecting rod 22, which fundamentally solves the problem of drag force and component wear during circular motion, effectively prolongs the service life of the connecting rod 22, the track and the slider, avoids the track jamming caused by resistance, and ensures the circular trajectory precision. In the elliptical mode, the unlocking controller restores the maximum locking force of the gas spring, which can stably resist the axial force of the track on the connecting rod 22, avoids the parameter deviation of the elliptical trajectory caused by the accidental extension and retraction of the connecting rod 22, and ensures the uniformity of the target material coverage.

[0147] In another embodiment, the magnetron sputtering magnet trajectory-changing motion device based on double-track constraint provided by the present application further comprises an electromagnetic locking pin mechanism configured to be energized to lock when the mounting block 21 moves in an elliptical motion, to enhance the rigidity of the connecting rod 22, and to be de-energized to release when the mounting block 21 moves in a circular motion, to allow the connecting rod 22 to freely extend and retract.

[0148] The electromagnetic locking pin mechanism is a mechanical-electric control composite component designed to strengthen the rigidity of the connecting rod 22, realize the locking in the elliptical mode and the release in the circular mode.

[0149] The electromagnetic locking pin mechanism is composed of an electromagnetic locking pin body, a pin hole positioning structure, and a control circuit. The electromagnetic locking pin body is the core executive component, usually a miniature DC electromagnetic lock, fixed on the outer cylinder side wall of the connecting rod 22 by bolts, and its locking pin rod can be extended and retracted along the axial direction. The pin hole positioning structure is a plurality of circular pin holes processed on the side wall of the inner rod, with a spacing adapted to the extension and retraction stroke of the inner rod, ensuring that when the electromagnetic locking pin is powered to extend, the locking pin rod can be accurately inserted into the pin hole, forming a rigid locking of the outer cylinder and the inner rod. One end of the control circuit is connected to the power interface of the electromagnetic locking pin, and the other end is arranged along the preset channel inside the connecting bridge 23, connected to the external control system through a multi-channel rotary joint, realizing stable power supply and signal transmission during the rotation of the connecting bridge 23, while a common gas spring (without unlocking function) is matched, which is installed between the outer cylinder and the inner rod, only providing constant pre-tightening force to ensure that the inner rod and the outer cylinder are always in close contact, providing a position reference for the accurate insertion of the electromagnetic locking pin.

[0150] The use of the electromagnetic locking pin mechanism needs to be synchronized with the switching of the trajectory mode of the device, relying on the electric control logic of "power-on locking / power-off releasing" and combining with the pre-tightening assistance of the common gas spring, the specific operation is as follows: When running in an elliptical trajectory, the external control system sends a power-on signal to the electromagnetic locking pin mechanism. After the electromagnetic locking pin body is powered on, an electromagnetic attraction is generated, driving the locking pin rod to extend along the axial direction and accurately insert into the corresponding pin hole on the side wall of the inner rod. At this time, the electromagnetic locking pin rigidly fixes the outer cylinder and the inner rod through the mechanical insertion structure, forming an "absolute locking" state, which can completely resist the axial force applied to the connecting rod 22 by the first track 11 and the second track 12; while the common gas spring only provides constant pre-tightening force to ensure that the inner rod and the outer cylinder do not shake with gaps, and does not bear the main locking task, the overall rigidity of the connecting rod 22 is greatly enhanced, and the mounting block 21 is driven by the connecting bridge 23 and constrained by the track to form an elliptical trajectory with fixed parameters.

[0151] After switching to a circular trajectory mode and inflating the bellows 41 to fix the mounting block 21, the external control system stops supplying power to the electromagnetic locking pin mechanism. After the electromagnetic locking pin body is powered off, the electromagnetic attraction disappears, and the locking pin rod is automatically retracted under the action of the return spring, disengaging from the pin hole of the inner rod and releasing the mechanical locking of the outer cylinder and the inner rod. At this time, the locking force of the common gas spring is much smaller than the system drag force (the reaction force of the track on the slider), which cannot limit the extension and retraction of the inner rod, and the connecting rod 22 freely extends and retracts with the circular motion of the mounting block 21, avoiding interference with the circular motion and ensuring that the mounting block 21 forms a continuous and smooth circular trajectory around the track intersection.

[0152] When switching back from the circular trajectory mode to the elliptical trajectory mode, only the electromagnetic locking pin mechanism needs to be powered on again, and the locking pin rod is extended and inserted into the pin hole, and the connecting rod 22 can restore the rigid locking state, and the device can immediately enter the elliptical trajectory operation. The switching process does not need to adjust the common gas spring, and the response is fast and the operation is simple.

[0153] When the length of the connecting rod is changed, the inner rod is pulled to the required position by applying an axial force, and then the lock pin rod is inserted into the corresponding pin hole.

[0154] The electromagnetic lock pin realizes absolute locking through a mechanical pin, and the locking force is much greater than that of a common gas spring or a low-locking-force gas spring. The locking force can completely resist the axial force of the track, avoid the slight expansion of the connecting rod 22 during the elliptical movement, and control the size precision error of the major axis and minor axis of the elliptical track within ±0.5%, which is especially suitable for the semiconductor coating process with extremely high track precision requirements.

[0155] The above embodiments only express several embodiments of the present application, and the description is relatively specific and detailed, but it cannot be understood as a limitation on the scope of the patent application. It should be noted that for ordinary skilled persons in the art, several modifications and improvements can be made without departing from the concept of the present application, which are all within the protection scope of the present application. Therefore, the protection scope of the patent of the present application should be subject to the appended claims.

Claims

1. A dual track constraint based magnetron sputtering magnet trajectory changing device, characterized in that, The application relates to a magnetic field scanning device. The device comprises: a limiting mechanism comprising a first track (11) and a second track (12) arranged in cross; a mounting block (21) for setting a magnet; a connecting rod (22) connected with the mounting block (21), one end of the connecting rod (22) being slidingly arranged in the first track (11) and the other end being slidingly arranged in the second track (12); a connecting bridge (23) rotatably arranged at the intersection of the first track (11) and the second track (12), the connecting bridge (23) being provided with a sliding groove (23a), and the mounting block (21) being slidingly arranged in the sliding groove (23a); a first rotary driving mechanism for driving the connecting bridge (23) to rotate around the intersection, the connecting bridge (23) driving the mounting block (21) to rotate, the mounting block (21) and the magnet thereon being capable of moving along an elliptical track in combination with the sliding constraint of the connecting rod (22) in the first track (11) and the second track (12) and the sliding constraint of the mounting block (21) in the sliding groove (23a); a second rotary driving mechanism for driving the limiting mechanism to rotate around the intersection; 2. The double rail confinement based magnetron sputter magnet trajectory changing motion device of claim 1, wherein, while the first rotary driving mechanism drives the mounting block (21) to move in an elliptical track, the second rotary driving mechanism can drive the limiting mechanism to rotate synchronously or intermittently, so that the landing point of the elliptical track of the mounting block (21) changes periodically, thereby expanding the target material region swept by the magnet. The connecting bridge (23) is suspended above the limiting mechanism, and the first rotary driving mechanism comprises: a rotary driving member (31) arranged on the connecting bridge (23); a bevel gear (32) connected with the output end of the rotary driving member (31); 3. The double rail confinement based magnetron sputter magnet trajectory changing motion device of claim 1, wherein, a linkage gear (33) engaged with the bevel gear (32) and connected with the connecting bridge (23) and arranged directly above the intersection, for driving the connecting bridge (23) to rotate. The included angle between the first track (11) and the second track (12) is adjustable; by adjusting the included angle between the first track (11) and the second track (12), the eccentricity of the elliptical track of the mounting block (21) can be changed: when the included angle increases, the minor axis of the elliptical track increases and the major axis decreases; 4. The double rail confinement based magnetron sputter magnet trajectory changing motion device of claim 3, wherein, when the included angle decreases, the minor axis of the elliptical track decreases and the major axis increases. The device further comprises a variable included angle driving assembly for driving at least one of the first track (11) and the second track (12) to rotate around the intersection; the positions where the first track (11) and the second track (12) intersect are arranged in a nested form, so that the guide surfaces of the first track (11) and the second track (12) for guiding the movement of the connecting rod (22) are in the same plane; the end portions of the first track (11) and the second track (12) near the intersection position are arranged in a V shape, the width of the guide surface decreases as the end portions approach the intersection position, so that there is an avoiding gap (10a) between the first track (11) and the second track (12). The avoidance gap (10a) can avoid the first track (11) and the second track (12) interfering with each other when rotating relatively.

5. The double rail confinement based magnetron sputter magnet trajectory changing motion device of claim 4, wherein, The intersection position of one of the first track (11) and the second track (12) is provided with an external gear (11a), and the intersection position of the other is provided with an internal gear (11b); The inner diameter of the internal gear (11b) is greater than the outer diameter of the external gear (11a), and when the guide surfaces of the first track (11) and the second track (12) are coplanar, the external gear (11a) is inserted into the internal gear (11b); The variable-angle driving assembly includes a variable-angle rotating driving member and a planetary gear (11c), and the planetary gear (11c) is located between the external gear (11a) and the internal gear (11b) and simultaneously meshes with the external gear (11a) and the internal gear (11b); The variable-angle rotating driving member is used to drive the planetary gear (11c) to rotate, so as to realize the synchronous and reverse rotation of the external gear (11a) and the internal gear (11b).

6. The double rail confinement based magnetron sputter magnet trajectory- varying motion device of claim 1, wherein, The length of the sliding groove (23a) is adjustable; By adjusting the length of the sliding groove (23a), the maximum adjustable eccentricity of the mounting block (21) in the sliding groove (23a) can be changed, so as to change the eccentricity of the elliptical trajectory of the mounting block (21).

7. The double rail confinement based magnetron sputter magnet trajectory- varying motion device of claim 1, wherein, The length of the connecting rod (22) is adjustable; By adjusting the length of the connecting rod (22), the size of the elliptical trajectory of the mounting block (21) can be changed; When the connecting rod (22) is lengthened, both the major axis and the minor axis of the elliptical trajectory are lengthened; When the connecting rod (22) is shortened, both the major axis and the minor axis of the elliptical trajectory are shortened.

8. The double rail confinement based magnetron sputter magnet trajectory- varying motion device of claim 1, wherein, A bellows (41) is further included, which is arranged on the connecting bridge (23) and connected with the mounting block (21); When the bellows (41) is inflated and expanded, its length is fixed, which can prevent the mounting block (21) from moving along the sliding groove (23a), so that the mounting block (21) moves in a circular motion around the intersection point, thereby covering the area not involved in the elliptical trajectory; The connecting rod (22) has a limited state and a free state; When the mounting block (21) moves along the elliptical trajectory, the connecting rod (22) is in the limited state, the length of the connecting rod (22) is fixed, and the major axis and the minor axis of the elliptical trajectory are determined; When the mounting block (21) moves along the circular trajectory, the connecting rod (22) is in the free state, and the connecting rod (22) can adaptively stretch and contract after touching the wall.

9. A magnetic control sputtering magnet trajectory changing motion device based on double rail constraint according to claim 7 or 8, characterized in that, The connecting rod (22) includes an outer cylinder and an inner rod slidingly arranged in the outer cylinder, and a gas spring is further arranged in the outer cylinder; The gas spring is configured to resist the force applied by the first track (11) and the second track (12) when the mounting block (21) moves elliptically, so that the connecting rod (22) maintains a fixed length; By applying an axial force greater than the gas spring unlocking force to the inner rod, the length of the connecting rod (22) can be changed, and after the axial force is removed, the gas spring can automatically lock at the new length position.

10. The double rail confinement based magnetron sputter magnet trajectory changing motion device of claim 9, wherein, Also comprising: An unlocking controller configured to send an unlocking signal to the gas spring to reduce its locking force when the mounting block (21) is in circular motion, and to cancel the unlocking signal to restore its locking force when the mounting block (21) is in elliptical motion; Or, an electromagnetic locking pin mechanism configured to be energized to lock when the mounting block (21) is in elliptical motion to enhance the rigidity of the connecting rod (22), and to be de-energized to release when the mounting block (21) is in circular motion to allow the connecting rod (22) to freely stretch and contract.

Citation Information

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