A flow detection method, controller and gas mass flow verification system

By using a gas mass flow verification system, the gas flow rate is calculated by obtaining volume parameters from a calibration system and a dry pump. This solves the problem of inconsistent flow output under multiple machines, multiple chambers, and multiple gas paths, and achieves high-precision gas flow measurement and consistent control.

CN120970776BActive Publication Date: 2026-02-10SHENZHEN HUAXIN SEMICON EQUIP TECH CO LTD
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Patent Information

Application Number
CN202511457593.9
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-10-13
Publication Date
2026-02-10
Estimated Expiration
2045-10-13

AI Technical Summary

Technical Problem

In semiconductor manufacturing, mass flow controllers with multiple machines, chambers, and gas paths suffer from individual differences and environmental interference, resulting in inconsistent gas flow outputs and affecting product quality.

Method used

A gas mass flow verification system is adopted. Through a calibration system, a calibration tank system and a dry pump, the gas output module is used to transmit gas and obtain volume parameters under stable conditions to calculate the gas flow rate and achieve accurate measurement.

Benefits of technology

This improves the accuracy of gas flow measurement, ensures gas flow consistency between different MFCs and chambers, and enhances the quality of semiconductor products.

✦ Generated by Eureka AI based on patent content.

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Abstract

Embodiments of the present application relate to the technical field of semiconductor manufacturing, and specifically relate to a flow detection method, a controller and a gas mass flow verification system. Embodiments of the present application utilize a gas output module to transmit gas to a first pipeline space. After the first pipeline space enters a stable state of the gas, a second valve is closed and the gas output module is controlled to stop outputting the gas. A first target volume parameter of a fifth pipeline space after entering the stable state of the gas is obtained. The gas output module is controlled to output the gas again and the second valve is controlled to open. After the first pipeline space enters the stable state of the gas and a ventilation condition meets a preset condition, the second valve is closed and the gas output module is controlled to stop outputting the gas. A second target volume parameter of the fifth pipeline space after entering the stable state of the gas again is obtained. According to the first target volume parameter and the second target volume parameter, the gas flow is accurately calculated, the accuracy of the gas flow measurement is improved, and the measurement verification of the gas flow is realized.
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Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing technology, and in particular to a flow detection method, controller, and gas mass flow verification system. Background Technology

[0002] In semiconductor manufacturing processes, precise gas supply to the process chamber is a key prerequisite for achieving high-precision control of each step. Therefore, the accuracy of gas flow control to the process chamber is crucial—flow control errors will directly affect the quality of the finished wafer.

[0003] Semiconductor manufacturing environments are complex scenarios with multiple machines, chambers, and gas input paths. Each gas source is equipped with a corresponding mass flow controller (MFC) to regulate the gas flow rate entering the process chamber. However, the individual differences between the MFCs equipped with different gas sources make it difficult to guarantee the consistency of mass flow output across multiple machines, chambers, and gas paths.

[0004] Meanwhile, factors such as changes in chamber ambient temperature, volume differences, pressure measurement accuracy, as well as large gas consumption or long measurement time during the measurement process, will further affect the measurement accuracy of MFC; this directly leads to the difficulty in ensuring the consistency of gas parameter control in semiconductor manufacturing, ultimately affecting the quality of semiconductor products.

[0005] In related technologies, although the performance of MFC is improved by optimizing its structure or control logic, it is still difficult to achieve accurate measurement of its output gas, which cannot meet the stringent requirements of semiconductor processes for gas flow measurement accuracy. Summary of the Invention

[0006] One objective of this application is to provide a flow detection method, controller, and gas mass flow verification system, applied to a gas mass flow verification system, to solve the technical problems in related technologies where individual differences and interference from multiple factors such as chamber environment and other factors cause flow output differences in MFCs with multiple machines, multiple chambers, and multiple gas paths, and there is no further measurement verification.

[0007] In a first aspect, embodiments of this application provide a flow detection method applied to a gas mass flow verification system. The gas mass flow verification system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, and a third valve. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module, which is communicatively connected to the calibration system. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of the third valve and the fourth valve, respectively. The output end of the third valve is used to connect to the dry pump, and the output end of the fourth valve is used to connect to the calibration tank. The flow detection method includes:

[0008] The control gas output module transmits gas to the first pipeline space, which is composed of the second pipeline space, the third pipeline space, and the fourth pipeline space. The second pipeline space is the pipeline space formed between the second valve, the third valve, and the fourth valve. The third pipeline space is the pipeline space formed between the first valve and the second valve. The fourth pipeline space is the pipeline space formed between the output end of the gas output module and the first valve.

[0009] In response to the first pipeline space entering a stable gas state, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter a closed state.

[0010] In response to the fifth pipeline space entering a stable gas state, the first target volume parameter of the fifth pipeline space is obtained. The fifth pipeline space is composed of the third pipeline space and the fourth pipeline space.

[0011] The gas output module is controlled to output gas and the second valve is controlled to open.

[0012] In response to the first pipeline space entering a stable gas state and the ventilation conditions meeting the preset conditions, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter the closed state.

[0013] In response to the fifth pipeline space re-entering a stable gas state, the second target volume parameter of the fifth pipeline space is obtained;

[0014] The gas flow rate is calculated based on the first target volume parameter and the second target volume parameter.

[0015] In a second aspect, embodiments of this application provide a controller, including a memory and a processor, wherein the memory is connected to the processor, and the processor is configured to execute one or more computer programs stored in the memory, wherein when the processor executes the one or more computer programs, the processor device causes the processor device to implement the traffic detection method as described in the first aspect.

[0016] Thirdly, embodiments of this application provide a gas mass flow verification system, including a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, a third valve, and a controller as described in the second aspect. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of the third valve and the fourth valve, respectively. The output end of the third valve is used to connect to the dry pump. The output end of the fourth valve is used to connect to the calibration tank. The controller is communicatively connected to the first valve, the second valve, the third valve, the fourth valve, and the gas output module.

[0017] This embodiment utilizes a gas output module to transmit gas to a first pipeline space. After the first pipeline space enters a stable gas state, the second valve is closed and the gas output module is stopped outputting gas, connecting the third and fourth pipeline spaces to form a fifth pipeline space. The first target volume parameter of the fifth pipeline space after entering a stable gas state is obtained. The gas output module is then controlled to output gas again, and the second valve is opened. After the first pipeline space enters a stable gas state and the ventilation conditions meet preset conditions, the second valve is closed and the gas output module is stopped outputting gas. The second target volume parameter of the fifth pipeline space after re-entering a stable gas state is obtained. Based on the first and second target volume parameters, the gas flow rate is accurately calculated, improving the accuracy of gas flow rate measurement and enabling the verification of gas flow rate measurement. Attached Figure Description

[0018] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments of this application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 This is a schematic diagram of the structure of a gas mass flow rate verification system provided in some embodiments of this application;

[0020] Figure 2a Another schematic diagram of the gas mass flow verification system provided in some embodiments of this application;

[0021] Figure 2b A schematic diagram of the piping space and component connections in a gas mass flow verification system provided in some embodiments of this application;

[0022] Figure 2c A schematic diagram illustrating the gas flow detection process performed by the gas mass flow verification system provided in some embodiments of this application;

[0023] Figure 3 A schematic diagram showing the connection between the calibration system and the gas output module in a gas mass flow verification system provided in some embodiments of this application;

[0024] Figure 4 A schematic diagram illustrating the interaction during the gas flow detection process of the gas mass flow verification system provided in some embodiments of this application;

[0025] Figure 5 This is a schematic diagram of the controller structure in a calibration system provided in some embodiments of this application;

[0026] Figure 6 A flowchart illustrating some embodiments of the traffic detection method provided in this application;

[0027] Figure 7 for Figure 6 A schematic diagram of a sub-process of step S63 in the flow detection method shown in the embodiment;

[0028] Figure 8 for Figure 6 A schematic diagram of a sub-process of step S67 in the flow detection method shown in the embodiment;

[0029] Figure 9 This is a schematic diagram of the flow detection device provided in some embodiments of this application. Detailed Implementation

[0030] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for illustrative purposes only and are not intended to limit the scope of this application. All other embodiments obtained by those skilled in the art based on the embodiments in this application without inventive effort are within the scope of protection of this application.

[0031] It should be noted that, unless there is a conflict, the various features in the embodiments of this application can be combined with each other, all of which are within the protection scope of this application. Furthermore, although functional modules are divided in the device schematic diagram and a logical order is shown in the flowchart, in some cases, the steps shown or described can be executed in a different order than the module division in the device or the order in the flowchart. Moreover, the terms "first," "second," and "third" used in this application do not limit the data or execution order, but only distinguish identical or similar items with essentially the same function and effect.

[0032] In semiconductor manufacturing processes, precise gas supply to the process chamber is a key prerequisite for achieving high-precision control of each step. Therefore, the accuracy of gas flow control to the process chamber is crucial—flow control errors will directly affect the quality of the finished wafer.

[0033] Semiconductor manufacturing environments are complex scenarios with multiple machines, chambers, and gas input paths. Each gas source is equipped with a corresponding mass flow controller (MFC) to regulate the gas flow rate entering the process chamber. However, the individual differences between the MFCs equipped with different gas sources make it difficult to guarantee the consistency of mass flow output across multiple machines, chambers, and gas paths.

[0034] Meanwhile, factors such as changes in chamber ambient temperature, volume differences, pressure measurement accuracy, as well as large gas consumption or long measurement time during the measurement process, will further affect the measurement accuracy of MFC; this directly leads to the difficulty in ensuring the consistency of gas parameter control in semiconductor manufacturing, ultimately affecting the quality of semiconductor products.

[0035] In related technologies, although the performance of MFC is improved by optimizing its structure or control logic, it is still difficult to achieve accurate measurement of its output gas, which cannot meet the stringent requirements of semiconductor processes for gas flow measurement accuracy.

[0036] In view of this, this application provides a gas mass flow rate verification system, which aims to perform the same standard measurement verification on different MFCs in a new way without going through the main chamber, so that a relatively consistent processing result can still be achieved in the complex use of different MFCs and different chambers in the semiconductor manufacturing process.

[0037] In view of this, embodiments of this application provide a flow rate detection method applied to a gas mass flow rate verification system. The gas mass flow rate verification system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, a third valve, and a controller. The calibration tank system includes a calibration tank and a fourth valve. By using a gas output module to transmit gas to a first pipeline space, and after the gas enters a stable state in a fifth pipeline space, a first target volume parameter and a second target volume parameter of the fifth pipeline space are obtained. Based on the first target volume parameter and the second target volume parameter, the gas flow rate is accurately calculated, achieving accurate measurement of gas flow rate, improving the accuracy of gas flow rate measurement, realizing the measurement verification of gas flow rate, and reducing the impact on semiconductor manufacturing processes.

[0038] Please see Figure 1 and Figure 2a , Figure 1 and Figure 2a The schematic diagram illustrates the structure of a gas mass flow verification system provided in some embodiments of this application.

[0039] like Figure 1 and Figure 2aAs shown, the gas mass flow verification system 100 includes a calibration system 110, a calibration tank system 120, and a dry pump 130. The calibration system 110 includes a first valve VAL1, a second valve VAL2, a third valve VAL3, and a controller 111. The calibration tank system 120 includes a calibration tank 121 and a fourth valve VAL4. It should be understood that the first valve VAL1, second valve VAL2, third valve VAL3, and fourth valve VAL4 can all be any suitable type of valve, such as a solenoid valve or a pneumatic diaphragm valve. Engineers can set the first valve VAL1, second valve VAL2, third valve VAL3, and fourth valve VAL4 in any suitable position according to actual needs; this embodiment does not impose any limitations on this.

[0040] The input terminal of the first valve VAL1 is used to connect to the gas output module 103. The output terminal of the first valve VAL1 is connected to the input terminal of the second valve VAL2. The output terminal of the second valve VAL2 is connected to the input terminals of the third valve VAL3 and the fourth valve VAL4 respectively. The output terminal of the third valve VAL3 is used to connect to the dry pump 130. The output terminal of the fourth valve VAL4 is used to connect to the calibration tank 121. The controller 111 is communicatively connected to the first valve VAL1, the second valve VAL2, the third valve VAL3, the fourth valve VAL4, and the gas output module 103. The gas output module 103 includes a gas source ( Figure 1 and Figure 2a (Not shown in the image), Mass Flow Controller (MFC) 1031 and Gas Control Valve VALSec, the gas source is used to provide various types of gas, the Mass Flow Controller 1031 is used to control the flow rate of the gas output from the gas source, and the Gas Control Valve VALSec is used to control the opening or closing of the gas output channel (i.e., the channel from the Mass Flow Controller 1031 to the chamber or the gas mass flow verification system 100).

[0041] Please see Figure 2a and Figure 2b The first pipeline space is composed of the second, third, and fourth pipeline spaces. The target pipeline space is composed of the third and second pipeline spaces. The second pipeline space is the pipeline space formed between the second valve VAL2, the third valve VAL3, and the fourth valve VAL4. The second volume of the second pipeline space is as follows: Figure 2a and Figure 2b The pipeline space volume V2 is shown. The third pipeline space is the pipeline space formed between the first valve VAL1 and the second valve VAL2. The third volume of the third pipeline space is as follows: Figure 2a and Figure 2bThe pipeline space volume V3 is shown. The fourth pipeline space is the pipeline space formed between the output end of the gas output module 103 and the first valve VAL1, and the fourth volume of the fourth pipeline space is shown below. Figure 2a and Figure 2b The pipeline space shown is volume V4. The reference pipeline space is the pipeline space formed between the fourth valve and the calibration vessel 121. The standard pipeline space is composed of the first pipeline space and the reference pipeline space. The fifth pipeline space is composed of the third pipeline space and the fourth pipeline space. The sixth pipeline space is composed of the target pipeline space and the reference pipeline space. The volume of the calibration vessel 121 is the known first volume V1, which can be any suitable volume, such as 326 ml, 286 ml, etc.

[0042] Please see Figure 2c The process of using a gas mass flow verification system to perform gas flow detection on different MFC output gases in this embodiment is as follows:

[0043] First, the airtightness of the pipelines between the gas output module and the gas mass flow verification system, and between the calibration tank and the gas mass flow verification system, is tested, specifically the airtightness of the first pipeline space. The fourth valve VAL4 is closed, while the first valve VAL1, second valve VAL2, and third valve VAL3 are opened, causing the dry pump 130 to perform a vacuum operation, extracting gas from the first pipeline space. It is then determined whether the first pipeline space has entered a stable gas state. After this, the pressure of the first pipeline space is acquired, and after a time interval, it is determined again whether the first pipeline space has entered a stable gas state. Once the first pipeline space has again entered a stable gas state, the pressure is acquired again. The difference between the two pressure acquisitions is calculated, along with the time difference between the two pressure acquisitions. The gas leakage rate of the first pipeline space is obtained by dividing the pressure difference by the time difference. The gas leakage rate is compared with a preset leakage rate threshold. If the gas leakage rate is less than the preset leakage rate threshold, the airtightness of the first pipeline space is determined to be good. If the gas leakage rate is greater than or equal to the preset leakage rate threshold, the airtightness of the first pipeline space is determined to be faulty. The first valve VAL1, the second valve VAL2, and the third valve VAL3 are controlled to enter the closed state, ending the airtightness test.

[0044] In this embodiment, a stable gas state refers to a situation where the pressure fluctuation value of the gas in the pipeline space is less than or equal to the actual judgment pressure threshold after a continuous preset number of samplings. For example, if the pressure fluctuation value of the gas is less than or equal to the actual judgment pressure threshold after 300 consecutive samplings, it indicates that the pipeline space has entered a stable gas state. The actual judgment pressure threshold is calculated as: base threshold × threshold multiplier K. For example, if the base threshold is set to 1 mTorr, and K = 1, then the actual judgment pressure threshold is 1 × 1 = 1 mTorr; if K = 0.8, then the actual judgment pressure threshold is 1 × 0.8 = 0.8 mTorr.

[0045] Then, the gas output module and dry pump are used to purge and evacuate the first pipeline space. Specifically, the gas control valve VALSec of the gas output module is opened, and the first valve VAL1 and the second valve VAL2 are opened, while the third valve VAL3 and the fourth valve VAL4 are closed, isolating the dry pump, calibration tank, and first pipeline space. The gas output module outputs gas to purge the first pipeline space. After the purging time reaches a preset reference duration or the pressure in the first pipeline space reaches a preset reference pressure, it indicates that one purging operation has been completed. The gas control valve VALSec of the gas output module is then closed, and the third valve VAL3 is opened, causing the dry pump to perform a vacuum operation, removing impurities and gases remaining in the first pipeline space after purging. This completes one purging and evacuation operation. It should be understood that the first pipeline space can be purged and emptied using the gas output module and dry pump before and after each gas flow rate detection. Obviously, engineers can purge and empty the first pipeline space once or multiple times as needed, and this application embodiment does not limit this in any way.

[0046] Next, the volume of the external pipeline space is calibrated. This is done by diffusing gas from the calibration tank into the corresponding pipeline space and detecting the volume verification parameters (i.e., pressure and temperature) of the corresponding pipeline space. Based on the volume verification parameters of the corresponding pipeline space and the known first volume of the calibration tank, the volume of the external pipeline space is calculated. Thus, the volume of the external pipeline space is calibrated. The external pipeline space includes a second pipeline space and a third pipeline space.

[0047] Furthermore, the volume of the front-end pipeline space is calibrated. Specifically, gas from the calibration tank is diffused into the first pipeline space to detect its volume verification parameters (i.e., pressure and temperature). Based on these parameters, the known volumes of the first, second, and third pipeline spaces, and the calibration tank itself, the volume of the front-end pipeline space is calculated. This process calibrates the volume of the front-end pipeline space. The front-end pipeline space is the fourth pipeline space.

[0048] Finally, the flow rate of the gas output by the gas output module is detected. That is, the gas flow rate is calculated based on the volume of the external pipeline space and the volume of the front-end pipeline space, combined with the volume verification parameters of the external pipeline space and the front-end pipeline space. In this way, the gas flow rate of the gas output module is detected.

[0049] It is worth noting that after the gas flow rate is measured by the gas mass flow rate verification system 100, the data measured by the gas mass flow rate verification system 100 is fed back to the MFC through an additional flow feedback monitoring system. This allows the MFC to further calibrate the output gas flow rate based on the data measured by the gas mass flow rate verification system 100, thereby achieving precise control of the gas source output gas flow rate. The gas mass flow rate verification system 100 does not directly control the gas flow rate; instead, it feeds back the detected gas flow rate to the MFC, causing the MFC to adjust the valve opening according to the detected gas flow rate, thus controlling the output gas flow rate.

[0050] The first sensing device is installed in the third pipeline space. The first sensing device is configured to detect the pressure and temperature of the third pipeline space. Obviously, the engineers can use any suitable method to install the first sensing device in the third pipeline space according to actual needs, such as by attaching or suspending.

[0051] A second sensing device is installed in the reference pipeline space. The second sensing device is configured to detect the pressure and temperature of the calibration tank 121. Obviously, engineers can use any suitable method to install the second sensing device in the reference pipeline space according to actual needs, such as by attaching or suspending.

[0052] It is worth noting that the third pipeline space is equipped with a first sensing device with a high range and a low range, and the reference pipeline space is equipped with a second sensing device with a high range and a low range. The first and second sensing devices with high range (e.g., 100 Torr) and low range (e.g., 20 Torr) are two independent sets of sensors, signal amplification circuits and ADC circuits, each with a clearly defined effective range.

[0053] The measurement range is categorized as follows: High Range (100 Torr): Effective measurement range 0-100 Torr (sensor, amplifier, and ADC circuit all operate linearly). Low Range (20 Torr): Effective measurement range 0-20 Torr (beyond 20 Torr, the sensor / amplifier becomes non-linear or even saturates, causing ADC data distortion). For example, at 40 Torr, the first and second sensors in the high range will correctly measure 40 Torr, while the first and second sensors in the low range will measure close to 20 Torr. In this case, the pressure and temperature values ​​used for calculation are those detected by the first and second sensors in the high range. Engineers can use the appropriate first and second sensors based on the effective measurement range to detect pressure and temperature, thereby calculating pipeline volume, gas flow rate, etc.

[0054] It is understood that engineers can use appropriate components or devices to connect and fix the various systems, modules, or components in the gas mass flow verification system 100 according to actual needs, or strengthen the airtightness of the corresponding systems, modules, or components, etc. This application embodiment does not impose any limitations in this regard; for example, refer to... Figure 2b Engineers use two connectors at both ends (i.e., input and output ends) of the first valve VAL1, the second valve VAL2, the third valve VAL3, and the fourth valve VAL4. The two connectors are used to connect and fix the valves to the pipeline. Alternatively, ball valves or stop valves can be used to enhance the airtightness of the calibration tank 121.

[0055] In practical applications, the gas mass flow verification system 100 can interface with multiple different gas output modules 103. The controller 111 of the calibration system 110 controls the opening and closing of the gas control valves (VALSec) in these modules, thereby transmitting different types of gas. Alternatively, the gas mass flow verification system 100 can interface with a single gas output module 103 equipped with various gas sources. The controller 111 of the calibration system 110 controls the opening and closing of the gas control valves (VALSec) corresponding to different gas sources within the gas output module 103, thus transmitting different types of gas.

[0056] For example, see Figure 3 As shown, the gas mass flow rate verification system 100 ( Figure 3 Only the calibration system 110 and the dry pump 130 are shown in the diagram. They are connected to a gas output module 103, which is equipped with oxygen ( ),hydrogen( ) and helium ( There are three gas sources in total. The MFC corresponding to each gas source controls the flow rate of its output gas. The output gas is transported to chamber 400 or gas mass flow verification system 100 through pipeline.

[0057] In practical industrial applications, the gas output module 103 delivers one or more types of gas into the chamber 400 via an MFC (Mechanical Control Controller), where the MFC controls the gas flow rate. For example, if the gas flow rate entering the chamber 400 needs to be controlled to 200 Sccm, originally... If the gas flow rate is 210 Sccm, then the MFC (Mass Flow Controller) will adjust the valve opening to control the gas flow rate at 210 Sccm (but there will be actual deviations; the MFC might actually measure 204 Sccm). This is because different commercial mass flow controllers (MFCs) have usage variations, such as different flow ranges (the measured values ​​will differ between 500 Sccm and 2000 Sccm ranges), and different types of gas also affect gas flow control. The corresponding MFC output gas flow rate is 203 Sccm. The corresponding gas flow rate output by the MFC is 202 Sccm.

[0058] In this embodiment, by measuring the gas flow rate using the gas mass flow rate verification system 100, the gas flow rate measured by the gas mass flow rate verification system 100 can maintain a basically consistent error with the gas flow rate output by the MFC. For example... End gas source, End gas source and The gas flow rates of the end gas sources are 203.5 Sccm, 202.5 Sccm, and 201.5 Sccm (each differing by only 0.5 Sccm, or a very small error of 0.1%). The gas flow rate errors measured in different chambers 400 also remain within 0.5 Sccm, rather than some gas flow rates deviating by 1 Sccm and others by 3 Sccm. In other words, the gas mass flow rate verification system 100 ensures the "consistency" of gas flow rate measurement errors, with a small deviation range and high accuracy.

[0059] Please see Figure 4In some embodiments, the gas mass flow verification system 100 receives sensor values ​​from a first sensor 101 and a second sensor 102 in real time. The sensor values ​​from the first sensor 101 include the temperature and pressure values ​​of the third pipeline space, and the sensor values ​​from the second sensor 102 include the pressure and temperature of the calibration tank 121. After receiving instructions from a host computer 200 (e.g., a computer, server, or other device) via the network, the system responds to each instruction and executes corresponding calculations and actions. For example, it generates and sends a VALSec control command to the gas control valve VALSec of the gas output module 103 to control the opening or closing of the gas control valve VALSec. It is understood that, in addition to the internal calculations of the gas mass flow verification system 100, some instructions will also call data (e.g., temperature and its coefficient, pressure and its coefficient) from an external calibration device 300 via the network according to actual application needs, and execute corresponding calculations and actions. The gas mass flow verification system 100 completes various process instructions by driving internal valves (i.e., its own first valve VAL1, second valve VAL2, third valve VAL3 and fourth valve VAL4) through internal calculations and internal valve control signals, and by driving the gas control valve VALSec of the gas output module 103 through VALSec control commands. Finally, the gas flow calculation results are fed back to the host computer 200 through the network, thereby completing the gas flow detection.

[0060] In some embodiments, please refer to Figure 4 When the gas mass flow verification system 100 is connected to multiple gas output modules 103, the gas mass flow verification system 100 also generates and sends the pressure difference signal of each gas output module 103 to each gas output module 103, so that each gas output module 103 can monitor in real time that the pressure difference of each gas output module 103 is less than the set value, thereby ensuring stable and safe operation, ensuring pressure balance between each gas output module 103 during the production process, and avoiding equipment damage and production accidents caused by pressure fluctuations.

[0061] After the gas flow rate is measured by the gas mass flow rate verification system 100, an additional flow feedback monitoring system further calibrates the output gas flow rate based on the data measured by the gas mass flow rate verification system 100, thereby achieving precise control of the gas source output gas flow rate. Specifically, the gas after reaction in chamber 400 or measurement by the gas mass flow rate verification system 100 can be extracted using a dry pump 130 and stored in a suitable container or used directly; this application embodiment does not impose any limitations on this.

[0062] It is understandable that during the gas flow rate measurement process of the gas mass flow rate verification system 100, the pipeline volume of the calibration system 110 itself needs to be calibrated first. In this embodiment, the gas flow rate is measured after the volume of the front pipeline (i.e., the fourth pipeline space), the second pipeline space, and the third pipeline space in the calibration system 110 are calibrated.

[0063] Please see Figure 5 , Figure 5 A schematic diagram of the controller structure in a calibration system provided in some embodiments of this application is shown.

[0064] like Figure 5 As shown, the controller 111 includes at least one processor 1111 and a memory 1112 connected in communication. Figure 5 Taking a bus system 1113 and a processor 1111 as an example, the various components in the controller 111 are coupled together through the bus system 1113, which is used to realize the connection and communication between the various components. It is easy to understand that the bus system 1113, in addition to the data bus, may also include a power bus, a control bus, and a status signal bus, etc. However, for the sake of clarity and brevity, in... Figure 5 The general designates all buses as Bus System 1113. Understandably, Figure 5 The structures shown in the embodiments are merely illustrative and do not limit the structure of the controller described above. For example, the controller may also include components that are more... Figure 5 The structure shown has more or fewer components, or has the same as Figure 5 The diagram shows different configurations of the structure.

[0065] Specifically, the processor 1111 provides computational and control capabilities to support the controller 111 in executing corresponding business logic and functions. For example, it supports the controller 111 in executing the traffic detection method provided in the embodiments of this application, or in executing the steps in any possible implementation of the traffic detection method provided in the embodiments of this application. Those skilled in the art will understand that the processor 1111 can be a general-purpose processor, including a central processing unit (CPU), a network processor (NP), etc.; it can also be a digital signal processor (DSP), an application-specific integrated circuit (ASIC), a field-programmable gate array (FPGA), or other programmable logic devices, discrete gate or transistor logic devices, or discrete hardware components.

[0066] The memory 1112, as a non-transitory computer-readable storage medium, can be used to store non-transitory software programs, non-transitory computer-executable programs, instructions, and modules, such as the program and instructions / modules corresponding to the traffic detection method in the embodiments of this application. In some embodiments, the memory 1112 may include a program storage area and a data storage area. The program storage area may store the operating system and an application program required for at least one function, and the data storage area may store data created according to the use of the processor 1111. The processor 1111 executes various functional applications and data processing of the controller 111 by running the non-transitory software programs, instructions, and modules stored in the memory 1112, thereby implementing the traffic detection method provided in the embodiments of this application, or executing the steps in any possible implementation of the traffic detection method provided in the embodiments of this application. In some embodiments, the memory 1112 may include high-speed random access memory and may also include non-transitory memory. For example, at least one disk storage device, flash memory device, or other non-transitory solid-state storage device. In some embodiments, the memory 1112 may also include memory remotely located relative to the processor 1111, and these remotely located memories may be connected to the processor 1111 through a communication network. It is understood that examples of the aforementioned communication networks include, but are not limited to, the Internet, corporate intranets, local area networks, mobile communication networks, and combinations thereof.

[0067] As can be understood from the above, the implementing entity of any traffic detection method provided in the embodiments of this application can be any suitable type of controller with certain computing and control capabilities, such as the controller 111 described above. In some feasible implementations, the traffic detection method provided in the embodiments of this application can be implemented by a processor executing computer program instructions stored in memory.

[0068] The flow detection method provided in this application will be described in detail below with reference to exemplary applications and implementations of the gas mass flow verification system provided in the embodiments of this application.

[0069] It is understood that the specific process of the traffic detection method provided in this application embodiment is as follows:

[0070] First, the third valve VAL3 and the fourth valve VAL4 are closed, isolating the dry pump from the second pipeline space and the reference pipeline space from the second pipeline space. At this time, the second, third, and fourth pipeline spaces are connected to form the first pipeline space, and the first and second valves are open. The gas control valve VALSec of the gas output module is opened. After detecting that the first pipeline space has entered a stable gas state, the gas output module stops outputting gas (i.e., the gas control valve VALSec of the gas output module is closed).

[0071] Then, the second valve VAL2 is controlled to close, isolating the second pipeline space from the third pipeline space, and connecting the third and fourth pipeline spaces to form the fifth pipeline space. After detecting that the fifth pipeline space has entered a stable gas state, the first target volume parameters of the fifth pipeline space (i.e., the first pressure and the first temperature of the fifth pipeline space) are obtained.

[0072] Next, the gas control valve VALSec of the control gas output module is opened, and the second valve VAL2 is also opened. The second, third, and fourth pipeline spaces are connected to form the first pipeline space, allowing the gas output by the gas output module to enter the first pipeline space. After detecting that the first pipeline space has entered a stable gas state and the ventilation conditions meet the preset conditions, the control gas output module stops outputting gas.

[0073] Furthermore, the second valve VAL2 is controlled to close again, isolating the second pipeline space from the third pipeline space. The third and fourth pipeline spaces are then reconnected to form the fifth pipeline space. Once the fifth pipeline space is detected to have returned to a stable gas state, the second target volume parameters (i.e., the second pressure and second temperature of the fifth pipeline space) are acquired again.

[0074] Finally, the gas flow rate is calculated based on the first and second target volume parameters. According to the ideal gas law PV=nRT (where P represents pressure, V represents volume (i.e., the volume of the pipeline space), n represents the amount of substance, R represents the ideal gas constant, and T represents temperature), Q=nR is constant in a closed system. Therefore, when calculating the gas flow rate based on the first and second target volume parameters, we can obtain n=PV / RT and ∆n=P2*Vb / R*T2-P1*Va / R*T1, where P1 and T1 are the first pressure and the first temperature, respectively, P2 and T2 are the second pressure and the second temperature, respectively, Va and Vb both represent the volume of the fifth pipeline space (i.e., the sum of the third volume of the third pipeline space, the fourth volume of the fourth pipeline space, and the preset volume threshold), and ∆n is the change in the amount of gas in the fifth pipeline space at the two sampling times of the target volume parameters. The third volume of the third pipeline space, the fourth volume of the fourth pipeline space, the first sampling time of the first target volume parameter, and the second sampling time of the second target volume parameter are obtained. The difference between the first sampling time of the first target volume parameter and the second sampling time of the second target volume parameter is calculated to obtain the time difference ∆t. Finally, the gas flow rate F=∆n / ∆t is calculated.

[0075] The specific process for obtaining the third volume of the third pipeline space is as follows:

[0076] First, a fixed amount of gas is introduced into the calibration tank using the gas output module. After the calibration tank is filled with a fixed amount of gas, the gas control valve VALSec of the gas output module is closed. At this time, the fourth pipeline space, the third pipeline space, the second pipeline space, and the reference pipeline space constitute a closed system.

[0077] Then, the first valve VAL1 and the fourth valve VAL4 are closed, isolating the fourth pipeline space from the third pipeline space and the reference pipeline space from the second pipeline space. At this time, the second and third pipeline spaces are connected to form the target pipeline space. The third valve VAL3 is then opened, causing the dry pump to perform a vacuum operation to extract the gas from the target pipeline space. After detecting that the target pipeline space has entered a stable gas state, the first volume test parameters of the calibration tank (i.e., the first test pressure and the first test temperature of the calibration tank) are obtained.

[0078] Next, the first valve VAL1 and the third valve VAL3 are closed, isolating the dry pump and the third pipeline space from the second pipeline space. At this time, the gas with a fixed amount of substance in the calibration tank diffuses only into the second pipeline space. After the second pipeline space is detected to have entered a stable gas state, the second volume test parameters of the calibration tank (i.e., the second test pressure and the second test temperature of the calibration tank) are obtained.

[0079] Furthermore, the first valve VAL1 is opened, connecting the second and third pipeline spaces to re-form the target pipeline space. At this time, the amount of gas in the calibration vessel is controlled to diffuse only into the target pipeline space, and after the second pipeline space is detected to have entered a stable gas state, the third volume test parameters of the calibration vessel (i.e., the third test pressure and the third test temperature of the calibration vessel) are obtained.

[0080] Finally, based on the first volume test parameters, the second volume test parameters, and the known first volume of the calibration vessel, the second volume of the second pipeline space is calculated. Similarly, based on the first volume test parameters, the third volume test parameters, and the known first volume of the calibration vessel, the third volume of the third pipeline space is calculated. According to the ideal gas law PV=nRT (where P represents pressure, V represents volume (i.e., the volume of the pipeline space), n represents the amount of substance, R represents the ideal gas constant, and T represents temperature), in a closed system, Q=nR is constant. Therefore, when calculating the second volume of the second pipeline space based on the first volume test parameters, the second volume test parameters, and the known first volume of the calibration vessel, we can obtain (P41*V1) / T41=[P42*(V1+V2)] / T42, where P41... Let T41 and T42 be the first test pressure and the first test temperature, respectively; let P42 and T42 be the second test pressure and the second test temperature, respectively; and let V1 and V2 be the first volume and the second volume, respectively. Thus, according to the above formula, the second volume V2 can be calculated as V2 = T42 * (P41 * V1) / (T41 * P42) - V1. After deformation, we can get V2 = (T42 * P41 / T41 * P42) * V1 - V1 = [(T42 * P41 / T41 * P42) - 1] * V1.

[0081] Similarly, based on the first volume test parameters, the third volume test parameters, and the known first volume of the calibration tank, when calculating the third volume of the third pipeline space, we can obtain (P41*V1) / T41=[P43*(V1+V2+V3)] / T43, where P41 and T41 are the first test pressure and the first test temperature, respectively; P43 and T43 are the third test pressure and the third test temperature, respectively; and V1, V2, and V3 are the first volume, the second volume, and the third volume, respectively. Thus, according to the above formula, we can calculate the third volume V3=T43*(P41*V1) / (T41*P43)-V1-V2, which, after deformation, gives V3=[(T43*P41) / (T41*P43)-1]*V1-V2.

[0082] The specific process for obtaining the fourth volume of the fourth pipeline space is as follows:

[0083] First, a fixed amount of gas is introduced into the calibration tank using the gas output module. After the calibration tank is filled with a fixed amount of gas, the gas control valve VALSec of the gas output module is closed. At this time, the fourth pipeline space, the third pipeline space, the second pipeline space, and the reference pipeline space constitute a closed system.

[0084] Then, the fourth valve VAL4 is closed, isolating the reference pipeline space from the second pipeline space. At this time, the second, third, and fourth pipeline spaces are connected to form the first pipeline space. The third valve VAL3 is opened, causing the dry pump to perform a vacuum operation, extracting the gas from the first pipeline space. After detecting that the first pipeline space has entered a stable gas state, the first volume calibration parameters of the calibration tank (i.e., the first reference pressure and the first reference temperature of the calibration tank) are obtained.

[0085] Next, the third valve VAL3 is closed, isolating the dry pump from the second pipeline space. At this time, the gas with a fixed amount of substance in the calibration tank diffuses only into the first pipeline space. When the first pipeline space is detected to have entered a stable gas state, the second volume calibration parameters of the calibration tank (i.e., the second reference pressure and the second reference temperature of the calibration tank) are obtained.

[0086] Furthermore, based on the first volume calibration parameters, the second volume calibration parameters, and the known first volume of the calibration vessel, the target volume of the first pipeline space is calculated. According to the ideal gas law PV=nRT (where P represents pressure, V represents volume (i.e., the volume of the pipeline space), n represents the amount of substance, R represents the ideal gas constant, and T represents temperature), in a closed system, Q=nR is constant. Therefore, when calculating the target volume of the first pipeline space based on the first volume calibration parameters, the second volume calibration parameters, and the known first volume of the calibration vessel, we can obtain (P51*V1) / T51=[P52*(V1+V2+V3+V4)] / T52, where P51 and T51 are the first reference pressure and... The first reference temperature, P52 and T52 are the second reference pressure and the second reference temperature, respectively. V1, V2, V3, and V4 are the first volume, the second volume of the second pipeline space, the third volume of the third pipeline space, and the fourth volume of the fourth pipeline space, respectively. Thus, according to the above formula, the target volume of the first pipeline space V2+V3+V4=T52*(P51*V1) / (T51*P52)-V1 can be calculated. After deformation, we can get V2+V3+V4=[(T52*P51 / T51*P52)-1]*V1.

[0087] Finally, the second volume V2 of the second pipeline space and the third volume V3 of the third pipeline space are obtained. Based on the target volume of the first pipeline space, the second volume V2, and the third volume V3, the fourth volume V4 of the fourth pipeline space is calculated, that is, the fourth volume V4 = [(T52*P51 / T51*P52)-1]*V1-V2-V3.

[0088] Please see Figure 6 , Figure 6 The schematic diagram illustrates a flow chart of a traffic detection method provided in some embodiments of this application.

[0089] It is readily understood that the flow detection method provided in this application embodiment can be applied to the aforementioned controller (e.g., the controller 111 of the calibration system 110 in the gas mass flow verification system 100). Specifically, the execution entity of the flow detection method is one or at least two processors of the controller.

[0090] For details, please refer to Figure 6 As shown, the flow detection method includes, but is not limited to, the following steps S61-S67:

[0091] S61: Control the gas output module to transmit gas to the first pipeline space.

[0092] In this step, both the third and fourth valves are closed, isolating the dry pump and calibration tank from the first pipeline space. After a delay of a preset duration, the first and second valves are opened, connecting the second, third, and fourth pipeline spaces to form the first pipeline space. In this embodiment, the gas control valve of the gas output module is opened to transmit gas to the first pipeline space, thereby delivering the gas output from the gas output module to the first pipeline space. It is understood that the preset duration can be any suitable duration, such as 2 seconds, 5 seconds, or other durations.

[0093] S62: In response to the first pipeline space entering a stable gas state, control the gas output module to stop outputting gas and control the second valve to enter the closed state.

[0094] After determining that the first pipeline space has entered a stable gas state, this embodiment controls the gas output module to stop outputting gas (i.e., controls the gas control valve of the gas output module to enter the closed state) and controls the second valve to enter and be in the closed state. In this way, occasional pressure fluctuations (such as electromagnetic interference, airflow transients, etc.) are filtered out, and the continuous stable state of the first pipeline space is identified (avoiding misjudging a single small pressure fluctuation as a stable state).

[0095] S63: In response to the fifth pipeline space entering a stable gas state, obtain the first target volume parameter of the fifth pipeline space.

[0096] In this embodiment, the second valve is closed, isolating the second pipeline space from the third and fourth pipeline spaces. The third and fourth pipeline spaces are connected to form the fifth pipeline space. After determining that the fifth pipeline space has entered a stable gas state, the first target volume parameter of the fifth pipeline space is obtained. In this way, occasional pressure fluctuations (such as electromagnetic interference and transient airflow) can be filtered out, and the continuous stable state of the fifth pipeline space can be identified (avoiding misjudging a single small pressure fluctuation as a stable state).

[0097] Please see Figure 7 , Figure 7 The illustration shows a sub-process diagram of step S63 in the traffic detection method provided in some embodiments of this application.

[0098] like Figure 7 As shown, in response to the fifth pipeline space entering a stable gas state, the first target volume parameter of the fifth pipeline space is obtained, specifically including but not limited to the following steps S631-S632:

[0099] S631: Controls the third valve to open, causing the dry pump to perform a vacuuming operation to set the second pipeline space into a vacuum state.

[0100] In this embodiment, the third valve is controlled to enter and be in the open state, so that the dry pump is connected to the first pipeline space, and the dry pump performs a vacuum operation to set the second pipeline space into a vacuum state. That is, the gas in the second pipeline space is extracted by the dry pump performing a vacuum operation, so that the second pipeline space enters and is in a vacuum state.

[0101] In some embodiments, the third valve is controlled to open, causing the dry pump to perform a vacuuming operation to set the second pipeline space into a vacuum state, specifically including but not limited to the following steps S6311-S6313:

[0102] S6311: Controls the third valve to open, enabling the dry pump to perform a vacuuming operation.

[0103] S6312: Obtain the reference pressure of the second pipeline space.

[0104] In this embodiment of the application, the reference pressure of the second pipeline space is continuously acquired during the vacuuming operation of the dry pump.

[0105] For example, in some embodiments, the reference pressure of the second conduit space is obtained, specifically including but not limited to the following steps S63121-S63123:

[0106] S63121: Obtain the pressure to be corrected in the second pipeline space detected by the access sensor.

[0107] In this embodiment, a flow sensor can also be installed in the second pipeline space. The flow sensor is configured to detect the pressure and temperature of the second pipeline space. In this embodiment, the pressure of the second pipeline space detected by the flow sensor installed in the second pipeline space is obtained, wherein the detected pressure of the second pipeline space is the pressure to be corrected in the second pipeline space.

[0108] S63122: Obtain the pressure correction coefficient.

[0109] S63123: Based on the pressure correction coefficient, the pressure to be corrected is corrected to obtain the reference pressure of the second pipeline space.

[0110] In this embodiment, the pressure correction coefficients for the pipeline space are stored in any suitable storage medium. The pressure correction coefficients are obtained from the storage medium, and the pressure to be corrected is corrected according to the pressure correction coefficients to obtain the reference pressure of the second pipeline space. For example, in some embodiments, the pressure correction coefficients are added to a preset correction threshold to obtain a pressure correction sum, and the pressure to be corrected is multiplied by the pressure correction sum to obtain the reference pressure of the second pipeline space. As another example, in some embodiments, the pressure correction coefficients include a deviation ratio and an offset parameter. The pressure to be corrected is multiplied by the deviation ratio to obtain the total pressure deviation, and the total pressure deviation is added to the offset parameter to obtain the reference pressure of the second pipeline space.

[0111] S6313: In response to the reference pressure of the second pipeline space being less than the preset vacuum threshold, it is determined that the second pipeline space has entered a vacuum state.

[0112] In this embodiment, the reference pressure of the second pipeline space is compared with a preset vacuum threshold. If the reference pressure of the second pipeline space is less than the preset vacuum threshold, it indicates that the second pipeline space has entered and is in a vacuum state, and it can be determined that the second pipeline space has entered a vacuum state. Understandably, the preset vacuum threshold can be any suitable value, for example, 200 mmTorr.

[0113] S632: In response to the second pipeline space entering a vacuum state and the fifth pipeline space entering a gas stable state, obtain the first target volume parameter of the fifth pipeline space.

[0114] In this embodiment of the application, after determining that the second pipeline space has entered a vacuum state and the fifth pipeline space has entered a stable gas state, the temperature and pressure of the third pipeline space detected by the first sensor are then obtained. Since the third pipeline space and the fourth pipeline space are connected to form the fifth pipeline space, the temperature and pressure of the third pipeline space detected by the first sensor are the temperature and pressure of the fifth pipeline space (i.e., the first target volume parameter of the fifth pipeline space).

[0115] S64: Control the gas output module to output gas and control the second valve to enter the open state.

[0116] In this step, the third valve is controlled to enter the closed state, isolating the dry pump from the second pipeline space, and the second valve is controlled to enter and enter the open state, connecting the second, third, and fourth pipeline spaces to form the first pipeline space. The first valve is in the open state. In this embodiment, the gas output module is controlled to output gas (i.e., the gas control valve of the gas output module is controlled to enter the open state), transmitting the gas output by the gas output module to the first pipeline space.

[0117] S65: In response to the first pipeline space entering a stable gas state and the ventilation conditions meeting the preset conditions, control the gas output module to stop outputting gas and control the second valve to enter the closed state.

[0118] In this embodiment, the ventilation condition indicates that the gas filling the first pipeline space has reached the upper limit of the gas volume that the first pipeline space can hold, and the gas in the first pipeline space is saturated. For example, in some embodiments, the interval between the start of gas output to the first pipeline space and the current time is calculated, and the interval is the ventilation time of the first pipeline space. The ventilation time of the first pipeline space is used to determine whether the ventilation condition of the first pipeline space meets the preset condition. Alternatively, in other embodiments, the pressure of the first pipeline space is monitored in real time, and the ventilation condition of the first pipeline space is used to determine whether the ventilation condition of the first pipeline space meets the preset condition.

[0119] For example, in some embodiments, in response to the first pipeline space entering a stable gas state and the ventilation conditions meeting preset conditions, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter a closed state, specifically including but not limited to the following step S651:

[0120] S651: In response to the first pipeline space entering a stable gas state and the ventilation time of the first pipeline space reaching a preset time threshold, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter a closed state.

[0121] In some embodiments of this application, the ventilation duration of the first pipeline space is calculated based on the initial time of ventilation to the first pipeline space and the current system time. When it is detected that the first pipeline space has entered a stable gas state and the ventilation duration of the first pipeline space reaches a preset duration threshold, it indicates that the gas in the first pipeline space is saturated. The gas output module is then controlled to stop outputting gas (i.e., the gas control valve of the gas output module is controlled to enter the closed state) and the second valve is controlled to enter the closed state.

[0122] Understandably, the preset duration threshold can be any suitable duration, such as 10s, 20s or other durations.

[0123] For example, in some embodiments, in response to the first pipeline space entering a stable gas state and the ventilation conditions meeting preset conditions, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter a closed state, specifically including but not limited to the following step S652:

[0124] S652: In response to the first pipeline space entering a stable gas state and the pressure of the first pipeline space reaching a preset pressure threshold, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter a closed state.

[0125] In other embodiments of this application, the pressure of the third pipeline space detected by the first sensing device is obtained. It can be understood that since the second pipeline space, the third pipeline space and the fourth pipeline space are connected to form the first pipeline space, the pressure of the third pipeline space detected by the first sensing device is the pressure of the first pipeline space. Thus, when it is detected that the first pipeline space has entered a stable gas state and the pressure of the first pipeline space reaches a preset pressure threshold, it indicates that the gas in the first pipeline space is saturated. Then, the gas output module is controlled to stop outputting gas (that is, the gas control valve of the gas output module is controlled to enter the closed state) and the second valve is controlled to enter the closed state.

[0126] It is easy to understand that the preset pressure threshold can be any suitable value. Engineers can set the preset pressure threshold according to the characteristics of the equipment such as pipeline length, diameter, material, and gas type.

[0127] S66: In response to the fifth pipeline space re-entering a stable gas state, obtain the second target volume parameter of the fifth pipeline space.

[0128] In this embodiment of the application, after the second valve is controlled to enter the closed state, the second pipeline space is isolated from the third pipeline space and the fourth pipeline space. The third pipeline space and the fourth pipeline space are connected to form the fifth pipeline space. After it is determined that the fifth pipeline space has entered the gas stable state, the volume parameter of the fifth pipeline space is obtained again, that is, the second target volume parameter of the fifth pipeline space is obtained.

[0129] S67: Calculate the gas flow rate based on the first target volume parameter and the second target volume parameter.

[0130] In this embodiment of the application, the first target volume parameter includes a first pressure and a first temperature with respect to the fifth pipeline space, and the second target volume parameter includes a second pressure and a second temperature with respect to the fifth pipeline space.

[0131] Please see Figure 8 , Figure 8 The illustration shows a sub-process diagram of step S67 in the traffic detection method provided in some embodiments of this application.

[0132] like Figure 8 As shown, in some embodiments, the gas flow rate is calculated based on a first target volume parameter and a second target volume parameter, specifically including but not limited to the following steps S671-S672:

[0133] S671: Obtain the third volume of the third pipeline space and the fourth volume of the fourth pipeline space.

[0134] For example, in some embodiments, obtaining the third volume of the third conduit space and the fourth volume of the fourth conduit space specifically includes, but is not limited to, the following steps S671A-S671L:

[0135] S671A: In response to the calibration vessel being filled with the target molar of gas, acquire the first volume test parameter of the calibration vessel with the fourth valve closed, the volume of the calibration vessel being the known first volume.

[0136] S671B: In response to the target pipeline space entering a vacuum state, the gas in the calibration vessel is controlled to diffuse only into the second pipeline space, which is composed of the third pipeline space and the second pipeline space.

[0137] S671C: In response to the second pipeline space entering a stable gas state, acquire the second volume test parameters of the calibration vessel.

[0138] S671D: Determine the second volume of the second pipeline space based on the first volume inspection parameter, the second volume inspection parameter, and the first volume.

[0139] S671E: Controls the gas in the calibration vessel to diffuse only into the target piping space.

[0140] S671F: In response to the target pipeline space entering a stable gas state, acquire the third volume test parameter of the calibration vessel.

[0141] S671G: Based on the first volume test parameter, the third volume test parameter, and the first volume, determine the third volume of the third pipeline space.

[0142] S671H: In response to the first pipeline space entering a vacuum state, control the gas in the calibration vessel to diffuse only into the first pipeline space.

[0143] S671J: In response to the first pipeline space entering a stable gas state, acquire the fourth volume test parameter of the calibration vessel.

[0144] S671K: Calculate the target volume of the first pipeline space based on the first volume inspection parameter, the fourth volume inspection parameter, and the first volume.

[0145] S671L: Determine the fourth volume of the fourth piping space based on the target volume, the second volume, and the third volume.

[0146] S672: Calculate the gas flow rate based on the third volume, fourth volume, first pressure, first temperature, second pressure, and second temperature.

[0147] In some embodiments, the gas flow rate is calculated based on the third volume, the fourth volume, the first pressure, the first temperature, the second pressure, and the second temperature, specifically including but not limited to the following steps S6721-S6724:

[0148] S6721: Add the third volume, the fourth volume, and the preset volume threshold to obtain the reference volume.

[0149] S6722: Divide the product of the reference volume and the first pressure by the product of the ideal gas constant and the first temperature to obtain the first value.

[0150] S6723: Divide the product of the reference volume and the second pressure by the product of the ideal gas constant and the second temperature to obtain the second value.

[0151] S6724: Calculate gas flow rate based on the first and second values.

[0152] In this embodiment, the preset volume threshold is the volume of the valve. The purpose is to calculate the pipeline volume. Therefore, the preset volume threshold (i.e., the volume of the first valve in the fifth pipeline space at this time) needs to be added to the third and fourth volumes to obtain the reference volume.

[0153] The ideal gas constant is a proportionality constant whose value is determined by the unit system. For example, in a unit energy system, the ideal gas constant is 8.314 J / (mol·K), while in a unit volume-pressure system, the ideal gas constant is 0.0821 L·atm / (mol·K).

[0154] In some embodiments, the gas flow rate is calculated based on the first value and the second value, specifically including but not limited to the following steps S67241-S67242:

[0155] S67241: The first sampling time for obtaining the first target volume parameter and the second sampling time for obtaining the second target volume parameter.

[0156] The first sampling time for the first target volume parameter is the sampling time for the first temperature and first pressure of the third pipeline space detected by the first sensor. The first temperature and first pressure of the third pipeline space detected by the first sensor are the first target volume parameters of the fifth pipeline space. Similarly, the second sampling time for the second target volume parameter is the sampling time for the second temperature and second pressure of the third pipeline space detected by the first sensor. The second temperature and second pressure of the third pipeline space detected by the first sensor are the second target volume parameters of the fifth pipeline space.

[0157] This application embodiment parses the first timestamp of the first target volume parameter, extracts the first sampling time of the first target volume parameter from the first timestamp, and parses the second timestamp of the second target volume parameter, extracts the second sampling time of the second target volume parameter from the second timestamp.

[0158] S67242: Calculate gas flow rate based on the first sampling time, the second sampling time, the first value, and the second value.

[0159] In some embodiments, the gas flow rate is calculated based on the first sampling time, the second sampling time, the first value, and the second value, specifically including but not limited to the following steps S67A-S67C:

[0160] S67A: Subtract the first sampling time from the second sampling time to obtain the reference time.

[0161] The reference time represents the interval between the second sampling time and the first sampling time, that is, the time interval between the two sampling times.

[0162] S67B: Subtract the first value from the second value to obtain the reference difference.

[0163] The reference difference represents the difference between the amount of gas in the fifth pipeline space at the second sampling time and the amount of gas in the fifth pipeline space at the first sampling time, that is, the change in the amount of gas in the fifth pipeline space between the two sampling times.

[0164] S67C: Divide the reference difference by the reference time to obtain the gas flow rate.

[0165] Understandably, before and after each gas flow rate measurement, the second, third, and fourth pipeline spaces are purged and evacuated using the gas output module and a dry pump. Specifically, the gas control valve of the gas output module is opened, and the first and second valves are also opened, while the third and fourth valves are closed. This connects the second, third, and fourth pipeline spaces to form the first pipeline space, while isolating the dry pump and calibration tank from this space. The gas output module outputs gas to purge the first pipeline space. Once the purging time reaches a preset reference duration or the pressure in the first pipeline space reaches a preset reference pressure, the purging operation is complete. The gas control valve of the gas output module is then closed, the third valve is opened, and the dry pump performs a vacuum operation to remove any remaining impurities and gases from the first pipeline space after purging. This completes one purging and evacuation operation. Obviously, engineers can purge and remove the first pipeline space once or multiple times as needed, and this application embodiment does not impose any limitations on this.

[0166] It should be noted that in the above embodiments, there is no necessarily a certain order between the steps. Those skilled in the art can understand from the description of the embodiments of this application that the above steps may have different execution orders in different embodiments, that is, they may be executed in parallel or in turn, etc.

[0167] In general, the flow detection method provided in this application transmits gas to a first pipeline space using a gas output module. After the first pipeline space enters a stable gas state, the second valve is closed and the gas output module is controlled to stop outputting gas, thereby connecting the third and fourth pipeline spaces to form a fifth pipeline space. The first target volume parameter of the fifth pipeline space after entering a stable gas state is obtained. Then, the gas output module is controlled to output gas again and the second valve is controlled to open. After the first pipeline space enters a stable gas state and the ventilation conditions meet the preset conditions, the second valve is closed and the gas output module is controlled to stop outputting gas. The second target volume parameter of the fifth pipeline space after re-entering a stable gas state is obtained. Based on the first and second target volume parameters, the gas flow rate is accurately calculated, improving the accuracy of gas flow rate measurement and realizing the measurement verification of gas flow rate. Furthermore, by combining the volume of the pipeline space with the calculation and calibration based on the accurately collected temperature and pressure, the accuracy of gas flow detection in industrial scenarios with dynamic temperature changes is improved. In addition, with the gas mass flow verification system provided in the embodiments of this application, multiple cycles of verification calibration and steady-state criteria are performed to meet the accuracy requirements of semiconductor equipment for pipeline volume and reduce the impact on semiconductor manufacturing processes.

[0168] As another aspect of the embodiments of this application, this application also provides a traffic detection device. The traffic detection device can be a software module, which includes several instructions stored in a memory. A processor can access the memory and execute the instructions to complete the traffic detection methods described in the various embodiments above.

[0169] In some embodiments, the flow detection device can also be constructed from hardware components. For example, the flow detection device can be constructed from one or more chips, which can work together to complete the flow detection methods described in the various embodiments above. As another example, the flow detection device can also be constructed from various logic devices, such as general-purpose processors, digital signal processors (DSPs), application-specific integrated circuits (ASICs), field-programmable gate arrays (FPGAs), microcontrollers, ARM (Acorn RISC Machine) or other programmable logic devices, discrete gate or transistor logic, discrete hardware components, or any combination of these components.

[0170] Please see Figure 9 , Figure 9 The schematic diagram illustrates the structure of a flow detection device provided in some embodiments of this application. It is readily understood that the flow detection device can be configured in a gas mass flow verification system. The gas mass flow verification system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, and a third valve. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module, which is communicatively connected to the calibration system. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of both the third and fourth valves. The output end of the third valve is used to connect to the dry pump, and the output end of the fourth valve is used to connect to the calibration tank.

[0171] Specifically, such as Figure 9 As shown, the flow detection device 900 includes a first control module 910, a second control module 920, a first acquisition module 930, a third control module 940, a fourth control module 950, a second acquisition module 960, and a calculation module 970.

[0172] The first control module 910 controls the gas output module to transmit gas to the first pipeline space, which is composed of the second, third, and fourth pipeline spaces. The second pipeline space is formed between the second, third, and fourth valves; the third pipeline space is formed between the first and second valves; and the fourth pipeline space is formed between the output end of the gas output module and the first valve. The second control module 920, in response to the first pipeline space entering a stable gas state, controls the gas output module to stop outputting gas and controls the second valve to enter a closed state. The first acquisition module 930, in response to the fifth pipeline space entering a stable gas state, acquires the first target volume parameter of the fifth pipeline space, which is composed of the third and fourth pipeline spaces. The third control module 940 controls the gas output module to output gas and controls the second valve to enter an open state. The fourth control module 950, in response to the first pipeline space entering a stable gas state and the ventilation conditions meeting preset conditions, controls the gas output module to stop outputting gas and controls the second valve to enter a closed state. The second acquisition module 960 is used to acquire the second target volume parameter of the fifth pipeline space in response to the fifth pipeline space re-entering a stable gas state. The calculation module 970 is used to calculate the gas flow rate based on the first and second target volume parameters.

[0173] In some embodiments, the fourth control module 950 is specifically used to: control the gas output module to stop outputting gas and control the second valve to enter a closed state in response to the first pipeline space entering a gas stable state and the ventilation time of the first pipeline space reaching a preset time threshold; or, control the gas output module to stop outputting gas and control the second valve to enter a closed state in response to the first pipeline space entering a gas stable state and the pressure of the first pipeline space reaching a preset pressure threshold.

[0174] In some embodiments, the first acquisition module 930 is specifically used to: control the third valve to enter the open state, cause the dry pump to perform a vacuuming operation to set the second pipeline space to enter the vacuum state, and in response to the second pipeline space entering the vacuum state and the fifth pipeline space entering the gas stable state, acquire the first target volume parameter of the fifth pipeline space.

[0175] In some embodiments, the first acquisition module 930 is further specifically used to: control the third valve to enter the open state, cause the dry pump to perform a vacuuming operation, acquire the reference pressure of the second pipeline space, and determine that the second pipeline space has entered a vacuum state in response to the reference pressure of the second pipeline space being less than a preset vacuum threshold.

[0176] In some embodiments, the first target volume parameter includes a first pressure and a first temperature with respect to the fifth pipeline space, and the second target volume parameter includes a second pressure and a second temperature with respect to the fifth pipeline space. The calculation module 970 is specifically used to: obtain the third volume of the third pipeline space and the fourth volume of the fourth pipeline space, and calculate the gas flow rate based on the third volume, the fourth volume, the first pressure, the first temperature, the second pressure, and the second temperature.

[0177] In some embodiments, the calculation module 970 is specifically used to: add the third volume, the fourth volume and the preset volume threshold to obtain a reference volume; divide the product of the reference volume and the first pressure by the product of the ideal gas constant and the first temperature to obtain a first value; divide the product of the reference volume and the second pressure by the product of the ideal gas constant and the second temperature to obtain a second value; and calculate the gas flow rate based on the first value and the second value.

[0178] In some embodiments, the calculation module 970 is further specifically used to: obtain the first sampling time of the first target volume parameter and the second sampling time of the second target volume parameter, and calculate the gas flow rate based on the first sampling time, the second sampling time, the first value and the second value.

[0179] In some embodiments, the calculation module 970 is further specifically used to: subtract the first sampling time from the second sampling time to obtain a reference time, subtract the first value from the second value to obtain a reference difference, and divide the reference difference by the reference time to obtain the gas flow rate.

[0180] It should be noted that, for the sake of simplicity and brevity, the above-described flow detection device can execute the corresponding functional modules of the flow detection method provided in the embodiments of this application and achieve the corresponding beneficial effects. Technical details not described in detail in the embodiments of the flow detection device can be referred to the flow detection method provided in the embodiments of this application. The specific working process of the above-described flow detection device can also be referred to the specific execution process corresponding to the flow detection method provided in the foregoing embodiments of this application, and will not be elaborated here.

[0181] This application also provides a computer-readable storage medium storing a computer program, the computer program including program instructions, which, when executed by a computer, cause the computer to perform the traffic detection method as described in the foregoing embodiments.

[0182] Those skilled in the art will understand that all or part of the processes in the above embodiments can be implemented by a computer program instructing related hardware. The program can be stored in a computer-readable storage medium, and when executed, it can include the processes of the embodiments of the above methods. The storage medium can be a magnetic disk, optical disk, read-only memory (ROM), or random access memory (RAM), etc.

[0183] The above-disclosed embodiments are merely preferred embodiments of this application and should not be construed as limiting the scope of this application. Therefore, any equivalent variations made in accordance with the claims of this application shall still fall within the scope of this application.

Claims

1. A flow rate detection method, applied to a gas mass flow rate verification system, characterized in that, The gas mass flow verification system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, and a third valve. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module, which is communicatively connected to the calibration system. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of the third valve and the fourth valve, respectively. The output end of the third valve is used to connect to the dry pump. The output end of the fourth valve is used to connect to the calibration tank. The flow detection method includes: The gas output module is controlled to transmit gas to a first pipeline space, which is composed of a second pipeline space, a third pipeline space, and a fourth pipeline space. The second pipeline space is formed between the second valve, the third valve, and the fourth valve. The third pipeline space is formed between the first valve and the second valve. The fourth pipeline space is formed between the output end of the gas output module and the first valve. In response to the first pipeline space entering a stable gas state, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter a closed state. In response to the fifth pipeline space entering a stable gas state, the first target volume parameter of the fifth pipeline space is obtained, wherein the fifth pipeline space is composed of the third pipeline space and the fourth pipeline space. The gas output module is controlled to output gas, and the second valve is controlled to enter the open state. In response to the first pipeline space entering a stable gas state and the ventilation conditions meeting preset conditions, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter a closed state. In response to the fifth pipeline space re-entering a stable gas state, the second target volume parameter of the fifth pipeline space is obtained; The gas flow rate is calculated based on the first target volume parameter and the second target volume parameter.

2. The flow detection method according to claim 1, characterized in that, The step of controlling the gas output module to stop outputting gas and controlling the second valve to enter a closed state in response to the first pipeline space entering a stable gas state and the ventilation conditions meeting preset conditions includes: In response to the first pipeline space entering a stable gas state and the ventilation time of the first pipeline space reaching a preset time threshold, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter a closed state; or, In response to the first pipeline space entering a stable gas state and the pressure of the first pipeline space reaching a preset pressure threshold, the gas output module is controlled to stop outputting gas and the second valve is controlled to enter a closed state.

3. The flow detection method according to claim 1, characterized in that, The step of obtaining the first target volume parameter of the fifth pipeline space in response to the fifth pipeline space entering a stable gas state includes: The third valve is controlled to open, causing the dry pump to perform a vacuum operation to set the second pipeline space into a vacuum state; In response to the second pipeline space entering a vacuum state and the fifth pipeline space entering a gas stable state, the first target volume parameter of the fifth pipeline space is obtained.

4. The flow detection method according to claim 3, characterized in that, The step of controlling the third valve to enter the open state, causing the dry pump to perform a vacuum operation to set the second pipeline space into a vacuum state, includes: Control the third valve to enter the open state, so that the dry pump can perform a vacuuming operation; Obtain the reference pressure of the second pipeline space; In response to the reference pressure in the second pipeline space being less than a preset vacuum threshold, it is determined that the second pipeline space has entered a vacuum state.

5. The flow detection method according to claim 1, characterized in that, The first target volume parameters include a first pressure and a first temperature regarding the fifth pipeline space, and the second target volume parameters include a second pressure and a second temperature regarding the fifth pipeline space. The calculation of gas flow rate based on the first target volume parameters and the second target volume parameters includes: Obtain the third volume of the third pipeline space and the fourth volume of the fourth pipeline space; The gas flow rate is calculated based on the third volume, the fourth volume, the first pressure, the first temperature, the second pressure, and the second temperature.

6. The flow detection method according to claim 5, characterized in that, The calculation of the gas flow rate based on the third volume, the fourth volume, the first pressure, the first temperature, the second pressure, and the second temperature includes: The reference volume is obtained by adding the third volume, the fourth volume, and the preset volume threshold. The first value is obtained by dividing the product of the reference volume and the first pressure by the product of the ideal gas constant and the first temperature. The second value is obtained by dividing the product of the reference volume and the second pressure by the product of the ideal gas constant and the second temperature. The gas flow rate is calculated based on the first value and the second value.

7. The flow detection method according to claim 6, characterized in that, The calculation of the gas flow rate based on the first value and the second value includes: Obtain the first sampling time of the first target volume parameter and the second sampling time of the second target volume parameter; The gas flow rate is calculated based on the first sampling time, the second sampling time, the first value, and the second value.

8. The flow detection method according to claim 7, characterized in that, The calculation of the gas flow rate based on the first sampling time, the second sampling time, the first value, and the second value includes: Subtract the first sampling time from the second sampling time to obtain the reference time; Subtract the first value from the second value to obtain the reference difference; The gas flow rate is obtained by dividing the reference difference by the reference time.

9. A controller, characterized in that, The device includes a memory and a processor, the memory being connected to the processor, the processor being configured to execute one or more computer programs stored in the memory, the processor causing the controller to implement the traffic detection method as described in any one of claims 1-8 when executing the one or more computer programs.

10. A gas mass flow rate verification system, characterized in that, The system includes a calibration system, a calibration tank system, and a dry pump. The calibration system includes a first valve, a second valve, a third valve, and a controller as described in claim 9. The calibration tank system includes a calibration tank and a fourth valve. The input end of the first valve is used to connect to a gas output module. The output end of the first valve is connected to the input end of the second valve. The output end of the second valve is connected to the input ends of the third valve and the fourth valve, respectively. The output end of the third valve is used to connect to the dry pump. The output end of the fourth valve is used to connect to the calibration tank. The controller is communicatively connected to the first valve, the second valve, the third valve, the fourth valve, and the gas output module.

Citation Information

Patent Citations

  • Volume calibration method, controller and gas mass flow verification system

    CN121007621A