Abnormality processing method and device for deep cooling helium extraction production line

Abstract

The present disclosure belongs to the technical field of helium treatment, and provides an abnormality processing method and device for a cryogenic helium extraction production line, which comprises collecting first replacement gas in a storage device connected to a first helium production line; detecting whether the composition of the first replacement gas exceeds a preset standard; if it does, determining an abnormal node in the first helium production line according to the composition of the first replacement gas; adjusting the gas conveying pipeline of the first helium production line according to the abnormal node, so that the first replacement gas performs backblowing on the abnormal node; adjusting the gas conveying pipeline of the abnormal node according to the backblowing preset duration of the abnormal node, and collecting second replacement gas in the storage device according to a preset interval; and if the detection result of the second replacement gas corresponds to the abnormal node, generating an abnormality alarm. The technical problem of high cost of processing the pollution of the helium production line can be solved.

Description

Technical Field

[0001] This disclosure relates to the field of helium processing technology, and in particular to an anomaly handling method and apparatus for a cryogenic helium extraction production line. Background Technology

[0002] Helium plays an indispensable role in modern industry and scientific research, and is widely used in critical applications such as nuclear magnetic resonance imaging, fiber optic manufacturing, semiconductor production, and liquid helium cooling. With the rapid development of the global economy and continuous technological advancements, the demand for helium across various industries continues to rise. This places increasingly stringent demands on helium production efficiency and product quality, making efficient and high-quality helium production and storage technologies crucial for industry development.

[0003] Cryogenic helium extraction is a method of separating helium by utilizing the critical temperature differences among the components of natural gas. This technology extracts helium from natural gas through cryogenic processing, yielding products with high purity and yield, and exhibiting superior system reliability and stability. It is currently the most widely used helium extraction method, accounting for approximately 90% of helium extraction. However, several factors can lead to contamination of the helium production line during cryogenic helium extraction. For example, before use, helium storage tanks are prone to retaining trace impurities due to vibrations during transportation and unstable storage environments. These impurities, once mixed with stored ultrapure helium, severely affect the purity of the helium, rendering it substandard and reducing product quality. Alternatively, in the production of refined helium, the helium is passed sequentially through multiple purification towers equipped with molecular sieves. The adsorption properties of the molecular sieves remove various impurities from the helium, thereby improving its purity. However, these molecular sieves can become clogged and ineffective after prolonged use.

[0004] When dealing with contamination in cryogenic helium extraction production lines, large quantities of refined helium are often used, which increases the cost of treating contamination in helium production lines. Therefore, there is an urgent need for a low-cost method for treating contamination in helium production lines. Summary of the Invention

[0005] The purpose of this disclosure is to provide an anomaly handling method and apparatus for cryogenic helium extraction production lines, in order to solve the problem that in the prior art, when dealing with contamination in helium production lines, a large amount of refined helium is often used, which leads to increased costs in dealing with contamination in helium production lines.

[0006] To address the aforementioned technical problems, the present disclosure provides the following technical solutions:

[0007] The first aspect of this disclosure provides a method for handling anomalies in a cryogenic helium extraction production line, the method comprising:

[0008] Collect the first displacement gas from the storage device connected to the first helium production line;

[0009] Detect whether the composition of the first replacement gas exceeds the preset standard;

[0010] If the error exceeds the limit, the abnormal node in the first helium production line is determined based on the composition of the first replacement gas.

[0011] Adjust the gas pipeline of the first helium production line according to the abnormal node so that the first replacement gas backflushs the abnormal node;

[0012] Adjust the gas supply pipeline of the abnormal node according to the preset backflush duration of the abnormal node, and collect the second replacement gas in the storage device according to the preset interval.

[0013] If the detection result of the second replacement gas corresponds to an abnormal node, an abnormal alarm will be generated.

[0014] In some embodiments, adjusting the gas transmission pipeline of the first helium production line according to the abnormal node includes:

[0015] Disconnect the abnormal node from the preceding process and connect the preceding process to the preset processing flow of the second helium production line. The preset processing flow corresponds to the abnormal node.

[0016] In some embodiments, adjusting the gas supply pipeline of the abnormal node according to a preset backflush duration and collecting the second replacement gas in the storage device at preset intervals includes:

[0017] The abnormal node, the subsequent process of the abnormal node, and the storage device are configured into a gas circulation loop. The first replacement gas circulates in the gas circulation loop at a preset interval so that the abnormal node and the subsequent process of the abnormal node process the first replacement gas.

[0018] The processed first replacement gas is used as the second replacement gas and collected in a storage device.

[0019] In some embodiments, after collecting the second replacement gas from the storage device at preset intervals, the method further includes:

[0020] The detection results of the first replacement gas and the detection results of the second replacement gas are compared to obtain comparison data, and it is determined whether the comparison data exceeds the preset range.

[0021] If the value exceeds the limit, the detection results of the second replacement gas will be analyzed, and an abnormal alarm will be generated.

[0022] If the requirements are not exceeded, restore the gas supply pipeline of the first helium production line and transport the second replacement gas to the initial process of the first helium production line for secondary processing.

[0023] In some embodiments, the process further includes collecting the first replacement gas from a storage device connected to the first helium production line before:

[0024] Establish a database that corresponds to the size of storage devices and the threshold range of various impurity concentrations within them;

[0025] Obtain the size information of the storage device, and obtain the corresponding impurity concentration threshold range based on the database and size information, and use each impurity concentration threshold range as a preset standard.

[0026] In some embodiments, determining the abnormal node in the first helium production line based on the composition of the first replacement gas further includes:

[0027] The impurity concentration threshold range is compared with the composition of the first replacement gas to obtain information on impurities that exceed the impurity concentration threshold range.

[0028] Based on the impurity information, obtain the processing flow of the impurities corresponding to the impurity information of the first helium production line, and identify the processing flow as an abnormal node.

[0029] In some embodiments, detecting whether the composition of the first replacement gas exceeds a preset standard further includes:

[0030] If the requirements are not exceeded, the first displacement gas will be transported to the initial process of the first helium production line for secondary processing.

[0031] A second aspect of this disclosure provides a cryogenic helium extraction production line, comprising:

[0032] The acquisition module is used to acquire the first displacement gas in the storage device connected to the first helium production line;

[0033] The detection module is used to detect the components of the first replacement gas;

[0034] The processing module is used to determine whether the composition of the first replacement gas exceeds the preset standard. If it does, the abnormal node in the first helium production line is determined based on the composition of the first replacement gas.

[0035] The first execution module is used to adjust the gas transmission pipeline of the first helium production line according to the abnormal node, so that the first replacement gas backflushs the abnormal node;

[0036] The second execution module is used to adjust the gas supply pipeline of the abnormal node according to the preset backflush duration of the abnormal node, and to collect the second replacement gas in the storage device according to the preset interval.

[0037] The third execution module is used to generate an abnormal alarm when the detection result of the second replacement gas corresponds to an abnormal node.

[0038] A third aspect of this disclosure provides a computer device comprising: a memory, a processor, and a computer program stored in the memory, wherein the processor executes the computer program to implement the steps of the anomaly handling method for a cryogenic helium extraction production line provided in the first aspect of this disclosure.

[0039] The fourth aspect of this disclosure provides a computer-readable storage medium having computer instructions stored thereon, which, when executed by a processor, implement the steps of the anomaly handling method for a cryogenic helium extraction production line provided in the first aspect of this disclosure.

[0040] The fifth aspect of this disclosure provides a computer program product including computer instructions that, when executed by a processor, implement the steps of the anomaly handling method for a cryogenic helium extraction production line provided in the first aspect of this disclosure.

[0041] The first aspect of this disclosure provides a method for handling anomalies in a cryogenic helium extraction production line. First, a first displacement gas is collected from the storage device, and its composition is tested to determine if it exceeds a preset standard. The preset standard is used to determine whether the impurity originates from the storage device or a specific step in the first helium production line. When the composition of the first displacement gas exceeds the preset standard, an anomaly is identified in the first helium production line based on its composition. The gas supply pipeline of the first helium production line is then adjusted to ensure normal production. Subsequently, the anomaly is backflushed with the first displacement gas. Because its impurity content is lower than that of crude helium or helium with low purity, it effectively solves the molecular sieve blockage problem without introducing new impurities, and the cost is lower than backflushing with refined helium. Next, the gas supply pipeline is adjusted according to the preset backflushing time of the anomaly, and a second displacement gas is collected from the storage device at preset intervals. The anomaly is independently tested to determine if the second displacement gas meets the requirements. If the detection result of the second displacement gas corresponds to the anomaly, an anomaly alarm is generated to remind the operator to intervene manually. This method can identify and resolve abnormal issues in cryogenic helium extraction production lines at low cost, ensuring stable production, reducing production costs and the frequency of manual intervention, and improving production efficiency and helium product quality. Attached Figure Description

[0042] The above and other objects, features, and advantages of exemplary embodiments of the present disclosure will become readily apparent upon reading the following detailed description with reference to the accompanying drawings. In the drawings, several embodiments of the present disclosure are illustrated by way of example and not limitation, with the same or corresponding reference numerals denoteing the same or corresponding parts, wherein:

[0043] Figure 1The diagram illustrates the first process flow of the anomaly handling method for a cryogenic helium extraction production line disclosed herein.

[0044] Figure 2 The diagram illustrates the second process flow of the anomaly handling method for a cryogenic helium extraction production line disclosed herein.

[0045] Figure 3 The diagram illustrates the third process flow of the anomaly handling method for a cryogenic helium extraction production line disclosed herein.

[0046] Figure 4 A schematic diagram of the cryogenic helium extraction production line disclosed herein is shown.

[0047] Explanation of reference numerals in the attached figures:

[0048] 1. First execution module; 2. Second execution module; 3. Third execution module; 4. Acquisition module; 5. Detection module; 6. Processing module. Detailed Implementation

[0049] The embodiments of this disclosure will be further described in detail below with reference to the accompanying drawings and examples. The detailed description of the embodiments and the accompanying drawings are used to illustrate the principles of this disclosure by way of example, but should not be used to limit the scope of this disclosure. This disclosure can be implemented in many different forms and is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

[0050] These embodiments are provided to make the disclosure thorough and complete, and to fully express the scope of the disclosure to those skilled in the art. It should be noted that, unless otherwise specifically stated, the relative arrangement of components and steps, material composition, numerical expressions, and values ​​set forth in these embodiments should be interpreted as exemplary only and not as limiting.

[0051] It should be noted that, in the description of this disclosure, unless otherwise stated, "a plurality of" means two or more; the terms "upper," "lower," "left," "right," "inner," and "outer," etc., indicating orientation or positional relationship, are only for the convenience of describing this disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this disclosure. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0052] Furthermore, the terms "first," "second," and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different parts. "Vertical" is not strictly vertical, but within the permissible margin of error. "Parallel" is not strictly parallel, but within the permissible margin of error. Terms such as "including" or "contains" mean that the element preceding the word encompasses the element listed after the word, and do not exclude the possibility of encompassing other elements as well.

[0053] Example 1

[0054] like Figure 1 As shown, the first aspect of this disclosure provides an anomaly handling method for a cryogenic helium extraction production line, the method comprising the following steps:

[0055] S101. Collect the first replacement gas from the storage device connected to the first helium production line;

[0056] Specifically, the first replacement gas in the storage device can be collected through a valve and a gas cylinder, or it can be directly delivered to the detection device via a pipeline; there are no specific limitations on this method. To obtain the first replacement gas, the storage device can be connected to the refined helium outlet of the first helium production line. Then, refined helium is introduced into the storage device, allowed to stand for a period of time, and then released. This process is repeated until the gas in the storage device passes the test. The standing time is not specifically limited and can be 5-15 minutes, depending on the size of the storage device. Generally, repeating the charging and discharging process 4-6 times is sufficient to completely replace impurities in the storage device; the specific time can be selected based on the size of the storage device. The gas released from the storage device during the replacement process can be used as the first replacement gas. The first helium production line may include: a membrane treatment unit, a cryogenic treatment unit, a dehydrogenation and dehydration unit, and a low-temperature adsorption unit, etc.

[0057] S102. Detect whether the composition of the first replacement gas exceeds the preset standard;

[0058] Specifically, the detection of the first replacement gas can be performed using standard detection methods in existing technologies, such as gas chromatography and helium mass spectrometry leak detectors. The preset standard can be determined based on the range of impurities within conventional storage devices or through a database. It is important to note that the preset standard can be a range of impurity concentrations, i.e., the range of impurity concentrations that would occur within the storage device under normal storage conditions without damage. These impurities can arise from deviations during transportation or operation. With this setting, if the composition of the first replacement gas does not exceed the preset standard, the main impurities within the first replacement gas originate from the storage device; if the composition of the first replacement gas exceeds the preset standard, the main impurities within the first replacement gas originate from the first helium production line.

[0059] S103. If the error exceeds the limit, determine the abnormal node in the first helium production line based on the composition of the first replacement gas.

[0060] Specifically, generally speaking, the first replacement gas will contain at least one impurity. If only one processing step in the first helium production line malfunctions, the impurity concentration that process should handle will be higher than the preset standard. This allows us to determine which specific processing step in the first helium production line is malfunctioning, and the malfunctioning process can be designated as an anomaly node. When multiple processing steps in the first helium production line malfunction, this can also be determined by the simultaneous presence of multiple impurity concentrations in the first replacement gas exceeding the preset standard, without any specific limitation.

[0061] S104. Adjust the gas transmission pipeline of the first helium production line according to the abnormal node so that the first replacement gas backflushs the abnormal node;

[0062] Specifically, adjusting the gas supply pipeline of the first helium production line based on the abnormal node can involve disconnecting the abnormal node from the upstream process or connecting the upstream process of the abnormal node to another helium production line; there are no specific limitations on this. The purpose is to prevent interference between the production gas flow of the first helium production line and the backflushing gas flow of the first replacement gas, thus avoiding any impact on the backflushing effect. The production gas flow can be understood as the direction of airflow within the first helium production line during normal operation; generally, the backflushing gas flow is opposite to the production gas flow direction.

[0063] S105. Adjust the gas supply pipeline of the abnormal node according to the preset backflush duration of the abnormal node, and collect the second replacement gas in the storage device according to the preset interval.

[0064] Specifically, in the abnormal node, the helium processing component can be a molecular sieve or a separation membrane. During the initial helium production process, the production gas flows from the first side of the molecular sieve or separation membrane to the second side opposite to the first side. The backflushing process at the abnormal node involves the gas flowing from the second side of the molecular sieve or separation membrane to the first side. Adjusting the gas supply pipeline of the abnormal node according to the preset backflushing time can be understood as changing the flow of the first replacement gas from the second side to the first side of the molecular sieve or separation membrane to the first side by adjusting the pipes and valves. This tests whether the abnormal node has regained its normal operating capability, and the gas processed during the test is stored as the second replacement gas in the storage device. The preset backflushing time and interval can be selected according to actual needs and are not specifically limited.

[0065] S106. If the detection result of the second replacement gas corresponds to an abnormal node, an abnormal alarm is generated.

[0066] Specifically, the second replacement gas can be detected using the same method as the first replacement gas, without any specific limitations. If the composition of the second replacement gas still does not meet the preset standard, it can be understood that the abnormal node still has a problem, thus generating an abnormal alarm to remind the operator to intervene manually. The abnormal alarm can be a voice alarm or a corresponding text report, without specific limitations.

[0067] The first aspect of this disclosure, as provided in Embodiment 1, provides an anomaly handling method for a cryogenic helium extraction production line. First, a first displacement gas is collected from a storage device, and its composition is tested to determine whether it exceeds a preset standard. The preset standard is used to determine whether the impurity originates from the storage device or a specific step in the first helium production line. When the composition of the first displacement gas exceeds the preset standard, an anomaly node in the first helium production line is identified based on its composition, and the gas supply pipeline of the first helium production line is adjusted to ensure normal production. Subsequently, the anomaly node is backflushed with the first displacement gas. Because its impurity content is lower than that of crude helium or helium with low refining purity, it effectively solves the molecular sieve blockage problem without introducing new impurities, and the cost is lower than backflushing with refined helium. Next, the gas supply pipeline is adjusted according to the preset backflushing time of the anomaly node, and a second displacement gas is collected from the storage device at preset intervals. The anomaly node is independently tested to determine whether the second displacement gas meets the requirements. If the detection result of the second displacement gas corresponds to the anomaly node, an anomaly alarm is generated to remind the operator to intervene manually. This method can identify and resolve anomalies in helium production lines at low cost, ensuring stable production, reducing production costs and the frequency of manual intervention, and improving production efficiency and helium product quality.

[0068] In some embodiments, adjusting the gas transmission pipeline of the first helium production line according to the abnormal node includes:

[0069] The abnormal node is disconnected from the preceding process, and the preceding process is connected to the preset processing flow of the second helium production line, which corresponds to the abnormal node.

[0070] Specifically, disconnecting the abnormal node from the preceding process can be achieved through valves or by switching pipelines; there are no specific limitations. In this embodiment, valves can be used to disconnect the abnormal node from the preceding process. Connecting the preceding process to the processing flow corresponding to the abnormal node of the second helium production line and the first helium production line can be understood as the first and second helium production lines being the same production line, with their internal processing flows corresponding one-to-one. Connecting the preceding process to the preset processing flow of the second helium production line, where the preset processing flow corresponds to the abnormal node, can be understood as merging the preceding process of the abnormal node of the first helium production line with the second helium production line, and connecting the preceding process of the abnormal node of the first production line to the processing flow corresponding to the abnormal node in the second production line. This connection can be achieved through pipelines and valves; there are no specific limitations on its structure. Simultaneously, the gas processing efficiency of the first and second helium production lines can be adjusted to prevent the second helium production line from overloading. With this setup, during the abnormal handling process of the first production line, it is not necessary to completely stop the first helium production line; instead, it can continue production in coordination with the second production line, minimizing production losses caused by the abnormal handling of the first helium production line.

[0071] like Figure 2 As shown, in some embodiments, adjusting the gas supply pipeline of the abnormal node according to the preset backflush duration of the abnormal node, and collecting the second replacement gas in the storage device according to the preset interval includes:

[0072] S1051. The abnormal node, the subsequent process of the abnormal node, and the storage device are configured into a gas circulation loop. The first replacement gas circulates in the gas circulation loop at a preset interval so that the abnormal node and the subsequent process of the abnormal node process the first replacement gas.

[0073] Specifically, during backflushing of the abnormal node, the abnormal node and the storage device are connected via pipelines, and the first replacement gas in the storage device backflushes the abnormal node. Constructing a gas circulation loop around the abnormal node, its downstream processes, and the storage device can be understood as connecting the abnormal node, its downstream processes, and the storage device via pipelines and valves, with the first replacement gas in the storage device forward-flushing the abnormal node, thus refining the first replacement gas in the storage device through the abnormal node and its downstream processes. The preset interval can be determined based on actual conditions such as the amount of first replacement gas in the storage device, impurity concentration, and the operating efficiency of the helium production line.

[0074] S1052. The processed first replacement gas is used as the second replacement gas and collected in the storage device.

[0075] Specifically, after the first replacement gas circulates in the gas circulation loop at a preset interval, it is ensured that the first replacement gas is fully processed within the loop. The processed first replacement gas, now stored in the storage device, can then be used as the second replacement gas for detection. This configuration eliminates the need to introduce helium of uncertain composition when testing abnormal nodes using the first replacement gas, preventing the introduction of helium with impurities that could affect the detection results. Furthermore, since the specific composition of the first replacement gas is known, simply comparing the compositions of the first and second replacement gases is sufficient to determine whether the abnormal node has returned to normal.

[0076] In this embodiment, the first displacement gas is the gas obtained after multiple displacements in the storage device. When sampling it, only a portion of the first displacement gas is taken out of the storage device for testing, while the majority of the displacement gas remains in the buffer tank of the first helium production line or other additional storage tanks. The second displacement gas is the gas obtained after the first displacement gas is processed by the circulation loop. When sampling it, only a portion of the second displacement gas is taken out of the storage device for testing.

[0077] like Figure 2 As shown, in some embodiments, after collecting the second replacement gas from the storage device at preset intervals, the method further includes:

[0078] S1053. Compare the detection results of the first replacement gas with the detection results of the second replacement gas to obtain comparison data, and determine whether the comparison data exceeds the preset range.

[0079] Specifically, comparing the detection results of the first and second replacement gases can be done by subtracting the impurity concentrations of the first and second replacement gases, using the difference as the comparative data; or by comparing the changes in the proportions of corresponding impurities in the first and second replacement gases, without specific limitations. The preset range can be determined based on actual conditions, such as 1 ppm or 5 ppm, etc. The key is to demonstrate a significant change in the impurity concentrations of the first and second replacement gases.

[0080] S10531. If the value exceeds the limit, analyze the detection results of the second replacement gas and generate an abnormal alarm.

[0081] S10532. If the requirements are not exceeded, restore the gas supply pipeline of the first helium production line and transport the second replacement gas to the initial process of the first helium production line for secondary processing of the second replacement gas.

[0082] Specifically, restoring the gas pipeline of the first helium production line can be understood as restoring the first helium production line to its normal production process. Since the comparison data does not exceed the preset range, it proves that the abnormal node has returned to normal working capacity. At this point, there is no need to test the abnormal node with the second replacement gas. Therefore, the second replacement gas is sent to the initial process of the first helium production line for secondary processing to process the second replacement gas into a qualified refined gas.

[0083] In some embodiments, the process further includes collecting the first replacement gas from a storage device connected to the first helium production line before:

[0084] Establish a database that corresponds to the size of storage devices and the threshold range of various impurity concentrations within them;

[0085] Specifically, under normal circumstances, storage devices of different sizes have different internal impurity concentrations. The threshold ranges for each impurity concentration can be understood as follows: if the impurities inside the storage device exceed these thresholds, it indicates that the impurities originate from the first helium production line. If the impurities inside the storage device do not exceed these thresholds, then the impurities originate from deviations in the operation, transportation, or other processes. This database can be obtained through experience gained from multiple experiments or measurements, and is not specifically limited to it.

[0086] Obtain the size information of the storage device, and obtain the corresponding impurity concentration threshold range based on the database and size information, and use each impurity concentration threshold range as a preset standard.

[0087] Specifically, generally speaking, the size of storage devices conforms to multiple fixed sizes according to standards. The size of the storage device can be matched with the size in the database to determine the threshold range of impurity concentration corresponding to each size.

[0088] like Figure 3 As shown, in some embodiments, determining the abnormal node in the first helium production line based on the composition of the first replacement gas further includes:

[0089] S1031. Compare the impurity concentration threshold range with the composition of the first replacement gas to obtain impurity information that exceeds the impurity concentration threshold range.

[0090] Specifically, comparing the impurity concentration threshold range with the composition of the first replacement gas can be understood as comparing the concentration of each impurity in the first replacement gas with its corresponding impurity concentration threshold range, and using the names of impurities that exceed the impurity concentration threshold range as impurity information.

[0091] S1032. Obtain the processing flow of the impurities corresponding to the impurity information of the first helium production line based on the impurity information, and identify the processing flow as an abnormal node.

[0092] In some embodiments, detecting whether the composition of the first replacement gas exceeds a preset standard further includes:

[0093] If the requirements are not exceeded, the first displacement gas will be transported to the initial process of the first helium production line for secondary processing.

[0094] Specifically, if the levels are within acceptable limits, it proves that the impurities in the components of the first replacement gas are due to transportation, operation, or other reasons, rather than problems in the first helium production process. Multiple replacements of the storage device can bring the impurities within acceptable limits.

[0095] Example 2

[0096] like Figure 4As shown in Embodiment 2 of the second aspect of this disclosure, a cryogenic helium extraction production line is provided, comprising: a collection module 4, a detection module 5, a processing module 6, a first execution module 1, a second execution module 2, and a third execution module 3; the collection module 4 is used to collect a first displacement gas in a storage device connected to the first helium production line; the detection module 5 is used to detect the composition of the first displacement gas; the processing module 6 is used to determine whether the composition of the first displacement gas exceeds a preset standard, and if so, to determine an abnormal node in the first helium production line based on the composition of the first displacement gas; the first execution module 1 is used to adjust the gas supply pipeline of the first helium production line according to the abnormal node, so that the first displacement gas backflushes the abnormal node; the second execution module 2 is used to adjust the gas supply pipeline of the abnormal node according to a preset backflush duration of the abnormal node, and to collect the second displacement gas in the storage device at preset intervals;

[0097] Specifically, the acquisition module 4 can consist of pipes, valves, and sampling tanks, or it can involve manual sampling with the valves and tanks; there are no specific limitations. The detection module 5 can be a device for detecting refined helium, such as a gas chromatograph or a helium mass spectrometer leak detector. The processing module 6 can be a CPU, microcontroller, or other processing device. The first processing module 6 can consist of solenoid valves, pipes, and a pump. It regulates the gas supply pipeline of the first helium production line through the solenoid valves and pipes, and performs backflushing through the pump, or backflushing through pressure difference; there are no specific limitations. The second execution module 2 can also consist of a valve and pipes to adjust the gas supply pipeline at abnormal nodes, and it can collect the second replacement gas through the acquisition device. The detection results of the second replacement gas corresponding to the abnormal node are processed by the processing module 6, and then the third execution module 3 generates an abnormal alarm. The third execution module 3 can be an alarm or a display screen; there are no specific limitations. The cryogenic helium extraction production line provided in this second public embodiment can execute the abnormal handling method for the cryogenic helium extraction production line provided in this first public embodiment. For details, please refer to the content described in the first embodiment, which will not be repeated here.

[0098] The second aspect of this disclosure provides a cryogenic helium extraction production line that can detect anomalies in its specific processing flow and use a first replacement gas to backflush abnormal nodes. This effectively solves the molecular sieve blockage problem without introducing new impurities. The cost is also lower than that of backflushing with refined helium, ensuring stable production, reducing production costs and the frequency of manual intervention, and improving production efficiency and helium product quality.

[0099] Furthermore, computer-readable storage media and memory may include non-persistent memory, random access memory (RAM), and / or non-volatile memory, such as read-only memory (ROM) or flash RAM. Computer-readable storage media include at least one memory chip. The processor may be one or more types, such as a central processing unit (CPU) or a microcontroller, and includes at least one processing chip. Computer program products and computer programs may be a collection of ordered instructions written in a computer programming language, capable of running on various computer devices, such as personal computers and servers. Regarding the software environment, an operating system and a corresponding programming language runtime environment need to be installed, but there are no specific limitations on this.

[0100] The above description is merely a specific embodiment of this disclosure, but the scope of protection of this disclosure is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this disclosure should be included within the scope of protection of this disclosure. Therefore, the scope of protection of this disclosure should be determined by the scope of the claims.

[0101] It should also be noted that those skilled in the art will understand that the embodiments of this disclosure can be provided as methods, systems, or computer program products. Therefore, this disclosure can take the form of a completely hardware embodiment, a completely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, this disclosure can take the form of a computer program product embodied on one or more computer-usable storage media (including but not limited to disk computer-readable storage media, CD-ROMs, optical computer-readable storage media, etc.) containing computer-usable program code.

[0102] All terms used in this disclosure have the same meaning as understood by one of ordinary skill in the art to which this disclosure pertains, unless otherwise specifically defined. It should also be understood that terms defined in general dictionaries should be interpreted as having meanings consistent with their meanings in the context of the relevant art, and not as having idealized or highly formalized meanings, unless expressly defined herein.

[0103] Techniques, methods, and equipment known to those skilled in the art may not be discussed in detail, but where appropriate, they should be considered part of the specification.

Claims

1. A method for handling anomalies in a cryogenic helium extraction production line, characterized in that, The method includes: Collect the first displacement gas from the storage device connected to the first helium production line; Detect whether the composition of the first replacement gas exceeds a preset standard; If the error exceeds the limit, the abnormal node in the first helium production line is determined based on the composition of the first replacement gas. Adjust the gas delivery pipeline of the first helium production line according to the abnormal node so that the first replacement gas backflushs the abnormal node; The gas supply pipeline of the abnormal node is adjusted according to the preset backflush duration of the abnormal node, and the second replacement gas in the storage device is collected according to the preset interval. The step of adjusting the gas supply pipeline of the abnormal node according to the preset backflush duration of the abnormal node, and collecting the second replacement gas in the storage device according to the preset interval includes: The abnormal node, the post-process of the abnormal node, and the storage device constitute a gas circulation loop. The first replacement gas circulates in the gas circulation loop at the preset interval, so that the abnormal node and the post-process of the abnormal node process the first replacement gas. The processed first displacement gas is used as the second displacement gas and collected in the storage device; If the detection result of the second replacement gas corresponds to the abnormal node, an abnormal alarm is generated.

2. The anomaly handling method for a cryogenic helium extraction production line according to claim 1, characterized in that, The step of adjusting the gas transmission pipeline of the first helium production line according to the abnormal node includes: The abnormal node is disconnected from the preceding process, and the preceding process is connected to the preset processing flow of the second helium production line, the preset processing flow corresponding to the abnormal node.

3. The anomaly handling method for a cryogenic helium extraction production line according to claim 1, characterized in that, After collecting the second replacement gas from the storage device at preset intervals, the process further includes: The detection results of the first replacement gas and the detection results of the second replacement gas are compared to obtain comparison data, and it is determined whether the comparison data exceeds a preset range. If the value exceeds the limit, the detection result of the second replacement gas is analyzed, and an abnormal alarm is generated. If the requirements are not exceeded, restore the gas supply pipeline of the first helium production line and transport the second replacement gas to the initial process of the first helium production line for secondary processing of the second replacement gas.

4. The anomaly handling method for a cryogenic helium extraction production line according to claim 1, characterized in that, The process of collecting the first replacement gas from the storage device connected to the first helium production line also includes: Establish a database that corresponds to the size of storage devices and the threshold range of various impurity concentrations within them; Obtain the size information of the storage device, and obtain the impurity concentration threshold ranges corresponding to the size information based on the database and the size information, and use the impurity concentration threshold ranges as the preset standard.

5. The anomaly handling method for a cryogenic helium extraction production line according to claim 4, characterized in that, The step of determining the abnormal node in the first helium production line based on the composition of the first replacement gas also includes: The impurity concentration threshold range is compared with the composition of the first replacement gas to obtain impurity information that exceeds the impurity concentration threshold range; Based on the impurity information, obtain the processing flow of the first helium production line for processing the impurities corresponding to the impurity information, and identify the processing flow as the abnormal node.

6. The anomaly handling method for a cryogenic helium extraction production line according to claim 1, characterized in that, The step of detecting whether the composition of the first replacement gas exceeds the preset standard also includes: If the requirements are not exceeded, the first displacement gas is transported to the initial process of the first helium production line for secondary processing.

7. A cryogenic helium extraction production line, characterized in that, include: A data acquisition module is used to acquire the first displacement gas in a storage device connected to the first helium production line; A detection module, wherein the detection module is used to detect the components of the first replacement gas; The processing module is used to determine whether the composition of the first replacement gas exceeds a preset standard. If it does, the abnormal node in the first helium production line is determined based on the composition of the first replacement gas. The first execution module is used to adjust the gas delivery pipeline of the first helium production line according to the abnormal node, so that the first replacement gas backflushs the abnormal node; The second execution module is used to adjust the gas supply pipeline of the abnormal node according to the preset backflush duration of the abnormal node, and to collect the second replacement gas in the storage device according to the preset interval, including; The abnormal node, the post-process of the abnormal node, and the storage device constitute a gas circulation loop. The first replacement gas circulates in the gas circulation loop at the preset interval, so that the abnormal node and the post-process of the abnormal node process the first replacement gas. The processed first displacement gas is used as the second displacement gas and collected in the storage device; The third execution module is used to generate an abnormal alarm when the detection result of the second replacement gas corresponds to the abnormal node.

8. A computer device, comprising a memory, a processor, and a computer program stored in the memory, characterized in that, The processor executes the computer program to implement the steps of the method according to any one of claims 1-6.

9. A computer-readable storage medium storing computer instructions thereon, characterized in that, When executed by a processor, the computer instructions implement the steps of the method described in any one of claims 1-6.

10. A computer program product comprising computer instructions, characterized in that, When executed by a processor, the computer instructions implement the steps of the method described in any one of claims 1-6.

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