Beam generation method, apparatus, and electronic device

Abstract

The application provides a beam generation method and device and electronic equipment, relates to the technical field of antennas, and is applied to an antenna system. The antenna system comprises a feed array and a metasurface structure. The feed array comprises at least two feeds, and the metasurface structure comprises a plurality of arrayed metasurface units. The method comprises the following steps: acquiring coordinate information of each feed and each metasurface unit; determining a secondary field pattern corresponding to each beam emitted by each feed based on the coordinate information of each metasurface unit and target beam scanning requirements; correcting the secondary field pattern corresponding to each beam emitted by each feed, and synthesizing a target field pattern based on the corrected secondary field patterns; determining target excitation data corresponding to each metasurface unit based on the target field pattern; and determining control parameters corresponding to each metasurface unit according to the target excitation data, so as to control the generation of a target beam. In this way, the target beam can be freely regulated and controlled.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of antennas, in particular to a beam generation method and device and electronic equipment. BACKGROUND

[0002] With the rapid development of wireless communication technology, high-gain antennas are widely used because they can focus signals to a specific area, thereby improving signal-to-noise ratio, spectral efficiency, and anti-interference capability.

[0003] However, the coverage of high-gain antenna systems is small, and the flexible regulation of coverage angle cannot be achieved. SUMMARY

[0004] In order to at least overcome the above-mentioned deficiencies in the prior art, the purpose of the present application is to provide a beam generation method, device and electronic equipment.

[0005] In a first aspect, the embodiments of the present application provide a beam generation method applied to an antenna system, wherein the antenna system comprises a feed array and a metasurface structure; the feed array comprises at least two feeds, and the metasurface structure comprises a plurality of arrayed metasurface units;

[0006] The beam generation method comprises:

[0007] obtaining coordinate information of each feed and each metasurface unit based on a coordinate system with a geometric center point of the metasurface structure as a coordinate origin;

[0008] determining target beam scanning requirements corresponding to each feed respectively, and determining secondary field pattern corresponding to the beam emitted by each feed based on the coordinate information of each metasurface unit and the target beam scanning requirements; the target beam scanning requirements include target beam direction and target beam direction pattern sidelobe level;

[0009] determining a primary field amplitude pattern corresponding to each feed respectively, and determining field amplitude and path phase delay of each feed irradiated to each metasurface unit based on the coordinate information of each feed and each metasurface unit and the primary field amplitude pattern;

[0010] correcting the secondary field pattern corresponding to the beam emitted by each feed according to the field amplitude and path phase delay of each feed irradiated to each metasurface unit, and synthesizing a target field pattern based on the corrected secondary field pattern;

[0011] determining target excitation data corresponding to each metasurface unit respectively based on the target field pattern;

[0012] The control parameters corresponding to each of the metasurface units are determined according to the target excitation data, and the voltage corresponding to each of the metasurface units is adjusted based on the control parameters, so as to control generation of the target beam.

[0013] In a possible implementation, the step of determining the target excitation data corresponding to each of the metasurface units based on the target field pattern comprises:

[0014] The complex excitation corresponding to each of the metasurface units is determined based on the target field pattern, and the real part and the imaginary part of the complex excitation are obtained;

[0015] The target excitation data corresponding to each of the metasurface units is determined based on the real part and the imaginary part of the complex excitation.

[0016] In a possible implementation, the step of determining the primary field amplitude pattern corresponding to each of the feeds and determining the field amplitude radiated by each of the feeds to each of the metasurface units based on the coordinate information of each of the feeds and each of the metasurface units and the primary field amplitude pattern comprises:

[0017] The path between each of the feeds and each of the metasurface units is determined according to the coordinate information of each of the feeds and each of the metasurface units;

[0018] The angle of the beam emitted by each of the feeds to each of the metasurface units is determined based on the path between each of the feeds and each of the metasurface units;

[0019] The primary field amplitude pattern corresponding to each of the feeds is determined, and the field amplitude radiated by each of the feeds to each of the metasurface units is determined based on the primary field amplitude pattern and the angle of the beam emitted by each of the feeds to each of the metasurface units.

[0020] In a possible implementation, the path between each of the feeds and each of the metasurface units is The path between each of the feeds and each of the metasurface units is calculated by the following method:

[0021]

[0022] The angle of the beam emitted by each of the feeds to each of the metasurface units is calculated by the following method:

[0023]

[0024]

[0025] The field amplitude radiated by each of the feeds to each of the metasurface units​​ It is calculated in the following way:

[0026]

[0027] in, This represents the coordinates of the nth metasurface element. This represents the coordinates of the i-th feed source. This represents the path between the i-th feed source and the n-th metasurface unit. This represents the primary field amplitude pattern corresponding to the i-th feed source. , ) represents the angle from the beam emitted by the i-th feed source to the n-th metasurface unit.

[0028] In one possible implementation, the secondary field pattern is obtained as follows:

[0029]

[0030] in, This represents the secondary field pattern corresponding to the beam emitted by the i-th feed source after modulation by the metasurface structure. This represents the total desired field amplitude after the i-th feed source in the metasurface array aperture illuminates the n-th metasurface element. () represents the target beam direction corresponding to the i-th feed source. This represents the far-field radiation pattern of each of the metasurface units. Let N represent the coordinates of the nth metasurface element, N represent the number of metasurface elements in the metasurface structure, and j represent the imaginary part of the complex number.

[0031] In one possible implementation, the target field pattern is obtained in the following way:

[0032]

[0033] in, This represents the target field pattern. This represents the secondary field pattern corresponding to the beam emitted by the i-th feed source after modulation by the metasurface structure. This represents the total expected field amplitude after the i-th feed source in the metasurface array aperture illuminates the n-th metasurface element. This represents the field amplitude of the i-th feed source illuminating the n-th metasurface unit. () represents the target beam direction corresponding to the i-th feed source. This represents the far-field radiation pattern of each of the metasurface units. This represents the coordinates of the nth metasurface element. represents the path between the i-th feed source and the n-th metasurface unit, k represents the wave number, N represents the number of metasurface units in the metasurface structure, I represents the number of feeds in the feed array, and j represents the complex imaginary part.

[0034] In a possible implementation, the target excitation data includes a target excitation phase corresponding to each of the metasurface units.

[0035] The step of determining a control parameter corresponding to each of the metasurface units according to the target excitation data, and adjusting a voltage corresponding to each of the metasurface units based on the control parameter, so as to control generation of the target beam, includes:

[0036] obtaining a voltage-phase curve of the metasurface unit;

[0037] obtaining a control parameter corresponding to the target excitation phase according to the voltage-phase curve of the metasurface unit, and adjusting a voltage corresponding to each of the metasurface units based on the control parameter, so as to control generation of the target beam.

[0038] In a possible implementation, the target excitation data includes a target excitation phase and a target excitation amplitude corresponding to each of the metasurface units.

[0039] The step of determining a control parameter corresponding to each of the metasurface units according to the target excitation data, and adjusting a voltage corresponding to each of the metasurface units based on the control parameter, so as to control generation of the target beam, includes:

[0040] obtaining a voltage-amplitude-phase curve of the metasurface unit;

[0041] obtaining a control parameter corresponding to the target excitation phase and the target excitation amplitude according to the voltage-amplitude-phase curve of the metasurface unit, and adjusting a voltage corresponding to each of the metasurface units based on the control parameter, so as to control generation of the target beam.

[0042] In a second aspect, the embodiments of the present application further provide a beam generation apparatus, applied to an antenna system, the antenna system including a feed array and a metasurface structure; the feed array including at least two feeds, and the metasurface structure including a plurality of arrayed metasurface units.

[0043] The beam generation apparatus includes:

[0044] The obtaining module is configured to obtain coordinate information of each of the feeds and each of the metasurface units based on a coordinate system with a geometric center point of the metasurface structure as a coordinate origin.

[0045] The first determining module is configured to determine target beam scanning requirements corresponding to each of the feeds respectively, and determine secondary field pattern corresponding to the beams emitted by each of the feeds based on coordinate information of each of the metasurface units and the target beam scanning requirements; the target beam scanning requirements include target beam direction and target beam direction pattern side lobe level.

[0046] The second determining module is configured to determine primary field amplitude pattern corresponding to each of the feeds respectively, and determine field amplitude and path phase delay of each of the feeds irradiated to each of the metasurface units based on coordinate information of each of the feeds and each of the metasurface units and the primary field amplitude pattern.

[0047] The synthesizing module is configured to correct the secondary field pattern corresponding to the beams emitted by each of the feeds according to the field amplitude and path phase delay of each of the feeds irradiated to each of the metasurface units, and synthesize target field pattern based on the corrected secondary field pattern.

[0048] The third determining module is configured to determine target excitation data corresponding to each of the metasurface units respectively based on the target field pattern.

[0049] The control module is configured to determine control parameters corresponding to each of the metasurface units respectively according to the target excitation data, and adjust voltage corresponding to each of the metasurface units based on the control parameters, so as to control generation of the target beam.

[0050] In a third aspect, an embodiment of the present application further provides an electronic device, which includes a processor and a machine readable storage medium, the machine readable storage medium stores machine executable instructions, and the machine executable instructions, when executed by the processor, implement the beam generation method in any of the above aspects.

[0051] Based on any of the above aspects, the beam generation method, device and electronic device provided by the embodiments of the present application correct the secondary field pattern to obtain the target field pattern, and obtain control parameters corresponding to each of the metasurface units based on the target field pattern, so as to adjust voltage corresponding to each of the metasurface units, which can realize free control of the target beam, and each of the beams in the target beam has field of view scanning working capability and is not limited to a specific scanning angle. BRIEF DESCRIPTION OF DRAWINGS

[0052] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required to be called in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present application, and therefore should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can also be obtained without creative labor.

[0053] Figure 1 Structure diagram of an antenna system provided for the embodiment;

[0054] Figure 2 Structure diagram of an antenna system provided for the embodiment;

[0055] Figure 3 Structure diagram of a metasurface unit provided for the embodiment;

[0056] Figure 4 Structure diagram of a metasurface unit provided for the embodiment;

[0057] Figure 5 Flow diagram of a beam generation method provided for the embodiment;

[0058] Figure 6 Sub-step diagram of step S150 provided for the embodiment;

[0059] Figure 7 Sub-step diagram of step S130 provided for the embodiment;

[0060] Figure 8 Sub-step diagram of step S160 provided for the embodiment;

[0061] Figure 9 Voltage-phase curve diagram of a metasurface unit provided for the embodiment;

[0062] Figure 10 Sub-step diagram of step S160 provided for the embodiment;

[0063] Figure 11 Structure diagram of an antenna system provided for the embodiment;

[0064] Figure 12 Structure diagram of an antenna system provided for the embodiment;

[0065] Figure 13 Angle-gain relationship diagram of a target beam provided for the embodiment;

[0066] Figure 14 Structure diagram of an electronic device provided for the embodiment;

[0067] Figure 15 Structure diagram of a beam generation apparatus provided for the embodiment.

[0068] Icon: 100 - metasurface structure; 110 - first metal layer; 111 - feed patch; 112 - electrically tunable element; 113 - ground patch; 120 - first dielectric layer; 130 - second metal layer; 140 - second dielectric layer; 150 - third metal layer; 160 - via; 210 - feed source; 300 - high-gain secondary reflected beam; 800 - electronic device; 810 - processor; 820 - machine-readable storage medium; 830 - beam generation apparatus; 831 - obtaining module; 832 - first determining module; 833 - second determining module; 834 - synthesizing module; 835 - third determining module; 836 - controlling module. DETAILED DESCRIPTION

[0069] In order to make the objectives, technical solutions and advantages of the embodiments of the present application clearer, the following will be combined with the accompanying drawings for the embodiments of the present application to make a clear and complete description of the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and shown in the accompanying drawings can be arranged and designed in various different configurations.

[0070] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the claimed present application, but only represents selected embodiments of the present application. All other embodiments obtained by those of ordinary skill in the art based on the embodiments in the present application without making creative efforts fall within the scope of protection of the present application.

[0071] It should be noted that: similar reference numerals and letters represent similar items in the following drawings, therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.

[0072] In the description of the present application, it should be noted that the orientation or position relationship indicated by the terms "upper", "lower", etc. is based on the orientation or position relationship shown in the drawings, or the orientation or position relationship in which the product of the present application is usually placed, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second", etc. are only used for differentiation in description, and cannot be understood as indicating or implying relative importance.

[0073] It should be noted that the different features in the embodiments of the present application can be combined with each other without conflict.

[0074] The inventors have found that, in order to achieve wide-angle coverage of a high-gain antenna or perform a multi-target tracking task, a multi-beam antenna can be used to work simultaneously. The multi-beam antenna uses the same physical radiation aperture to generate multiple high-gain beams at the same time, each beam pointing to a specific direction and the beams being uncorrelated, so that wide-angle coverage can be achieved by multiple beams without reducing the beam gain.

[0075] Beam forming is a core technology for realizing multi-beam, and by processing the signals of each super surface unit in the super surface structure, the radiation pattern of the antenna can meet specific requirements. Commonly used beam forming technologies can include digital beam forming, analog beam forming and hybrid beam forming.

[0076] Digital beam forming processes the signals of each super surface unit in the super surface structure by digitalization, including frequency conversion, signal acquisition and the like, and then delays and sums the signals as needed to form multiple simultaneous beams. However, this method requires a large number of hardware devices such as mixers, analog-to-digital converters (ADCs), etc., significantly increasing the cost and power consumption of the system.

[0077] Analog beam forming mainly includes two methods: the first method separately processes the signals of each antenna unit, delays the signals through a delay line or the like, and then sums the delayed signals to form a beam. However, the splitting and combining of the feed network increases the link loss and reduces the efficiency of the system. The second method uses optical elements such as reflectors, reflective arrays or lenses to process the signals, and distributes the signals through structures such as Butler matrices or feed arrays to form multiple beams. However, the number and scanning angle of the target beams generated by this method cannot be flexibly controlled.

[0078] Hybrid beam forming is a combination of analog and digital beam forming technologies, which divides the super surface structure into smaller sub-arrays, performs analog beam forming in the sub-arrays, and delays and sums the signals using analog circuits. The signals between the sub-arrays are processed digitally, and the output signals of each sub-array are processed digitally. However, the coverage range of the target beams generated by this method is limited by the sub-array pattern, and flexible coverage of a wider field of view cannot be achieved.

[0079] The present embodiment provides a solution to the above problems, and the specific embodiments of the present application will be described in detail below with reference to the accompanying drawings.

[0080] The present embodiment provides a beam generation method, which can be applied to an antenna system. Please refer to Figure 1The antenna system can include a feed array and the metasurface structure 100. The feed array can include at least two feeds 210, and the metasurface structure 100 can include a plurality of arrayed metasurface units.

[0081] In some examples, referring to Figure 1 and Figure 2 , a coordinate system is constructed with the geometric center point of the metasurface structure 100 as the coordinate origin. When the operating frequency band of the metasurface structure 100 is 19 GHz, the feed array includes two independent feeds 210, and the metasurface structure 100 includes 16x16 arrayed metasurface units, the two feeds 210 can be symmetrically distributed along the x-axis, and the spacing between the two feeds 210 can be 40 mm. The radiation apertures of the two feeds 210 are both directed towards the geometric center point of the metasurface structure 100. The 10 dB illumination cone level of the feed radiation pattern can be selected to the edge of the metasurface structure 100. The size of each metasurface unit in the metasurface structure 100 can be 9.2x9.2 mm, which can ensure that the array reflection beam scanning is within ±45° without grating lobes. At a certain moment, the secondary reflection beam direction of the electromagnetic wave emitted by one of the feeds 210 after being modulated by the metasurface structure 100 can be = 30°, = 0°, and the secondary reflection beam direction of the electromagnetic wave emitted by the other feed 210 after being modulated by the metasurface structure 100 can be = 0°, = 0°.

[0082] In this embodiment, the antenna system can further include a radio frequency signal transmitting device. The radiation direction of each feed 210 in the feed array can be directed towards the geometric center point of the metasurface structure 100. The radio frequency signal transmitting device can transmit electromagnetic signals of the same frequency band to the metasurface structure 100 through each feed 210 in the feed array. Each metasurface unit of the metasurface structure 100 can simultaneously receive the signals transmitted by each feed 210, and each metasurface unit is provided with an electrically controlled element 112, which can dynamically adjust the phase / delay of the electromagnetic signals to simultaneously generate a large number of beams, and the number of generated beams can be equal to the number of feeds 210.

[0083] In addition, the antenna system can further include a radio frequency signal receiving device, and the antenna system can also be used for receiving signals. After the metasurface structure 100 receives the incident signals, the incident signals can be modulated and sent to the feed array. The feed array transmits the signals to the radio frequency signal receiving device for analysis of the signals.

[0084] Referring to Figure 3 and Figure 4The super surface unit can include a first metal layer 110, a first dielectric layer 120, a second metal layer 130, a second dielectric layer 140, and a third metal layer 150 arranged in a stack, the first metal layer 110 can include a feed patch 111, a ground patch 113, and an electrical control element 112, the electrical control element 112 can be used to realize electrical connection of the feed patch 111 and the ground patch 113. The third metal layer 150 can be used as a metal ground layer, the ground patch 113 and the third metal layer 150 can be electrically connected through a via hole 160, and the second metal layer 130 can be used to realize phase modulation bandwidth widening. When the voltage on the feed patch 111 changes, the lumped parameter of the electrical control element 112 also changes, thereby causing the reflection phase of the super surface unit to change. In the above design, each super surface unit only has a radio frequency phase modulation function, which can significantly reduce production cost and design difficulty.

[0085] The embodiment belongs to analog beamforming, has the advantages of low cost and low power consumption of traditional analog beamforming; the feed array combined with the super surface structure 100 avoids radio frequency loss of the multi-beam feed network, and realizes flexible and rapid switching of multiple beams.

[0086] Please refer to Figure 5 , Figure 5 The flowchart of the beam generation method provided in the example embodiment is shown in the figure, and the beam generation method can be applied to the antenna system shown in the figure. The beam generation method can include the following steps. Figure 1

[0087] In step S110, coordinate information of each feed 210 in the feed array and each super surface unit in the super surface structure 100 is obtained based on a coordinate system with a geometric center point of the super surface structure 100 as a coordinate origin.

[0088] In the embodiment, a coordinate system is constructed with the geometric center point of the super surface structure 100 as the coordinate origin, and the coordinate information of each feed 210 in the feed array and the coordinate information of each super surface unit in the super surface structure 100 are obtained.

[0089] Specifically, the number of super surface units in the super surface structure 100 is N, and the coordinates of the nth super surface unit can be The number of feeds 210 in the feed array is I, and the coordinates of the ith feed 210 can be .

[0090] In step S120, the target beam scanning requirements corresponding to each feed 210 are determined, and the subfield pattern corresponding to the beam emitted by each feed 210 is determined based on the coordinate information of each super surface unit and the target beam scanning requirements. The target beam scanning requirements include a target beam direction and a target beam direction pattern sidelobe level. ​

[0091] In this embodiment, the target beam scanning requirements corresponding to each feed source 210 can be pre-set, which can include target beam direction, target beam direction pattern side lobe level (e.g. whether the target beam has low side lobe requirement) and the like. Then, the beam corresponding to each feed source 210 is determined according to the determined target beam scanning requirements, the number of feed sources 210 and the coordinate information of each metasurface unit obtained in step S110, wherein the beam corresponding to the i-th feed source 210 can refer to the beam pointing to the target beam direction formed after the beam emitted by the i-th feed source 210 irradiates the metasurface structure 100.

[0092] Specifically, the secondary field pattern of the i-th feed source 210 after irradiating the metasurface structure 100 can be:

[0093]

[0094] wherein, may represent the total expected field amplitude of the i-th feed source irradiating the n-th metasurface unit in the metasurface array aperture, The value of can be determined by the target beam direction pattern side lobe level, for example, if the target beam has low side lobe requirement, it can be valued according to Taylor distribution, Chebyshev distribution and the like; if the target beam has no low side lobe or other special beam requirement, it can be valued as 1. may represent the target beam direction corresponding to the i-th feed source 210, may represent the far field pattern of each metasurface unit, may represent the coordinates of the n-th metasurface unit, and N can represent the number of metasurface units in the metasurface structure 100.

[0095] Step S130, determine the primary field amplitude pattern corresponding to each feed source 210, and determine the field amplitude and path phase delay of each feed source 210 irradiating each metasurface unit based on the coordinate information of each feed source 210 and each metasurface unit and the primary field amplitude pattern.

[0096] In this embodiment, the field amplitude of the i-th feed source 210 irradiating the n-th metasurface unit and the path phase delay of the i-th feed source 210 irradiating the n-th metasurface unit can be determined according to the coordinate information of each feed source 210 in the feed source array obtained in step S110, the coordinate information of each metasurface unit in the metasurface structure 100 and the primary field amplitude pattern corresponding to each feed source 210. Wherein the primary field amplitude pattern corresponding to each feed source 210 can be obtained by modeling and simulating the feed source 210 through full-wave electromagnetic simulation software.

[0097] Step S140, the field amplitude and path phase delay of each feed source 210 irradiated to each super surface unit are used to modify the secondary field pattern corresponding to the beam emitted by each feed source 210, and the target field pattern is synthesized based on the modified secondary field pattern.

[0098] In this embodiment, the field amplitude and path phase delay of each feed source 210 irradiated to each super surface unit obtained in step S130 are used to modify the secondary field pattern corresponding to the beam emitted by each feed source 210, and the target field pattern is synthesized based on the modified secondary field pattern.

[0099] Specifically, the target field pattern after each feed source 210 irradiates to the super surface unit can be:

[0100]

[0101] Wherein, may represent the secondary field pattern corresponding to the beam emitted by the i-th feed source 210 after being modulated by the super surface structure, may represent the total expected field amplitude of the i-th feed source irradiated to the n-th super surface unit in the aperture of the super surface array, The value of can be determined by the sidelobe level of the target beam pattern, for example, if the target beam has low sidelobe requirements, it can be assigned according to Taylor distribution, Chebyshev distribution, etc.; If the target beam has no low sidelobe or other special beam requirements, it can be assigned as 1. may represent the field amplitude of the i-th feed source 210 irradiated to the n-th super surface unit, may represent the target beam direction corresponding to the i-th feed source 210, may represent the far field pattern of each super surface unit, may represent the coordinates of the n-th super surface unit, may represent the path between the i-th feed source 210 irradiated to the n-th super surface unit, N can represent the number of super surface units in the super surface structure 100, I can represent the number of feed sources 210 in the feed source array, and k can represent the wave number, , may represent the wavelength.

[0102] Step S150, determine the target excitation data corresponding to each super surface unit based on the target field pattern.

[0103] In this embodiment, the target excitation data corresponding to each super surface unit can be obtained according to the target field pattern obtained in step S140, wherein the target excitation data can include the target excitation phase and the target excitation amplitude corresponding to each super surface unit.

[0104] In step S160, the control parameters corresponding to each of the metasurface units are determined according to the target excitation data, and the voltages corresponding to each of the metasurface units are adjusted based on the control parameters, so as to control the generation of the target beam.

[0105] In this embodiment, the control parameters corresponding to each of the metasurface units can be determined according to the target excitation data obtained in step S150, and the voltages corresponding to each of the metasurface units are adjusted based on the control parameters, so as to control the generation of the target beam. Specifically, when the electrically tunable element 112 of the metasurface unit is a varactor diode, the control parameter can refer to a specific voltage value; when the electrically tunable element 112 of the metasurface unit is a switch diode, the control parameter can refer to the working state of the switch diode, for example, on or off. The target beam can be a high-gain multi-beam with different pointing directions in the field of view, or a high-gain multi-beam with the same pointing direction in the field of view, and the number of beams can be equal to the number of feed sources 210.

[0106] When the beams emitted by the plurality of feed sources 210 irradiate each of the metasurface units in the metasurface structure 100, the voltages corresponding to each of the metasurface units can be adjusted based on the control parameters. The adjusted voltages corresponding to each of the metasurface units can be different or the same. For example, when the metasurface structure 100 includes 169 metasurface units, the adjusted voltages corresponding to each of the 169 metasurface units are different. For different positions of the feed source 210, the adjusted voltages corresponding to each of the metasurface units are the same, and the beams generated after being modulated by the metasurface structure 100 are different due to the different positions of the feed sources. At a certain moment, the voltage value corresponding to each of the metasurface units can only be one value in physical implementation. In this embodiment, the secondary beams required by each of the feed sources 210 after the metasurface structure is irradiated by the feed sources 210 at different positions can be realized by the unique voltage value corresponding to each of the metasurface units. For example, when the metasurface structure 100 includes four metasurface units and the feed source array includes two feed sources 210 at different positions, when one of the feed sources 210 emits a beam, the adjusted voltages of the four metasurface units can be 3V, 5V, 6V and 9V respectively; when the other feed source 210 emits a beam, the adjusted voltages of the four metasurface units must also be 3V, 5V, 6V and 9V respectively.

[0107] Based on the above design, in the beam generation method provided in this embodiment, by correcting the secondary field pattern to obtain a target field pattern, and based on the target field pattern, control parameters corresponding to each metasurface unit are obtained, so as to adjust the voltage corresponding to each metasurface unit, the free control of the target beam can be realized, and each beam in the target beam has the field of view scanning capability and is not limited to a specific scanning angle. Moreover, the embodiment does not need a complex feed synthesis and distribution network, and is easy to implement, without feed network loss.

[0108] In addition, the beam generation method provided in this embodiment is used to solve the unit excitation by single matrix operation, which reduces the optimization process of unknown parameters and can effectively improve the algorithm efficiency.

[0109] In a possible implementation manner, referring to Figure 6 , step S150 can include the following sub-steps.

[0110] In step S151, the complex excitation corresponding to each metasurface unit is determined based on the target field pattern, and the real part and the imaginary part of the complex excitation are obtained.

[0111] In this embodiment, the complex excitation of the nth metasurface unit can be obtained according to the target field pattern, and the complex excitation is converted into a complex number form, so as to obtain the real part and the imaginary part of the complex excitation.

[0112] Specifically, the part of summing i in the target field pattern can represent the complex excitation of the nth metasurface unit, which can be converted into a complex number form combined with the real part and the imaginary part as follows:

[0113]

[0114] Therefore, the real part of the complex excitation of the nth metasurface unit can be:

[0115]

[0116] The imaginary part of the complex excitation of the nth metasurface unit can be:

[0117]

[0118] wherein, may represent the total expected field amplitude of the i th feed source in the metasurface array aperture after irradiating the nth metasurface unit, may represent the field amplitude of the i th feed source 210 irradiating the nth metasurface unit, may represent the target beam direction corresponding to the i th feed source 210, may represent the coordinates of the nth metasurface unit, may represent the path between the i-th feed source 210 and the n-th metasurface unit, I may represent the number of feed sources 210 in the feed source array, k may represent the wave number, , may represent the wavelength.

[0119] In step S152, the target excitation data corresponding to each of the metasurface units is determined based on the real part and the imaginary part of the complex excitation.

[0120] In this embodiment, the target excitation phase and the target excitation amplitude corresponding to each of the metasurface units can be calculated according to the real part and the imaginary part obtained in step S151.

[0121] Specifically, the target excitation amplitude corresponding to the n-th metasurface unit can be:

[0122]

[0123] The target excitation phase corresponding to the n-th metasurface unit can be:

[0124]

[0125] wherein, may represent the real part of the complex excitation of the n-th metasurface unit, may represent the imaginary part of the complex excitation of the n-th metasurface unit.

[0126] In one possible implementation, please refer to Figure 7 Step S130 can include the following sub-steps.

[0127] In step S131, the path between each of the feed sources 210 and each of the metasurface units is determined according to the coordinate information of each of the feed sources 210 and each of the metasurface units.

[0128] In this embodiment, the path between each of the feed sources 210 and each of the metasurface units can be calculated according to the coordinate information of each of the feed sources 210 and the coordinate information of each of the metasurface units. Specifically, the path between the i-th feed source 210 and the n-th metasurface unit can be calculated as follows: may be calculated as follows:

[0129]

[0130] wherein, may represent the coordinate of the n-th metasurface unit, may represent the coordinate of the i-th feed source 210.

[0131] Step S132, determining the angle of the beam emitted by each of the feed sources 210 to each of the metasurface units based on the path between each of the feed sources 210 and each of the metasurface units.

[0132] In this embodiment, the angle of the beam emitted by each of the feed sources 210 to each of the metasurface units can be calculated according to the coordinate information of each of the feed sources 210, the coordinate information of each of the metasurface units, and the path between the i-th feed source 210 and the n-th metasurface unit.

[0133] Specifically, the elevation angle of the beam emitted by the i-th feed source 210 to the n-th metasurface unit can be obtained by the following calculation method:

[0134]

[0135] The azimuth angle of the beam emitted by the i-th feed source 210 to the n-th metasurface unit can be obtained by the following calculation method:

[0136]

[0137] wherein, represents the coordinate of the n-th metasurface unit, represents the coordinate of the i-th feed source 210, represents the path between the i-th feed source 210 and the n-th metasurface unit.

[0138] Step S133, determining the primary field amplitude pattern corresponding to each of the feed sources 210 respectively, and determining the field amplitude of each of the feed sources 210 irradiated to each of the metasurface units based on the primary field amplitude pattern and the angle of the beam emitted by each of the feed sources 210 to each of the metasurface units.

[0139] In this embodiment, the primary field amplitude pattern of the i-th feed source 210 can be calculated by full-wave electromagnetic simulation software firstly, and then the field amplitude of the i-th feed source 210 irradiated to the n-th metasurface unit is obtained according to the angle of the beam emitted by the i-th feed source 210 to the n-th metasurface unit obtained in step S132 and the corresponding relationship between the angle and the field amplitude in the primary field amplitude pattern .

[0140] Specifically, the field amplitude of the i-th feed source 210 irradiated to the n-th metasurface unit can be calculated by the following method:

[0141]

[0142] wherein, The i-th feed 210 can represent the primary field amplitude pattern of the i-th feed 210. The i-th feed 210 can represent the primary field amplitude pattern of the i-th feed 210.

[0143] In a possible implementation, if each super surface unit in the super surface structure 100 only has a phase modulation function, the target excitation data can include a target excitation phase corresponding to each super surface unit.

[0144] Referring to Figure 8 Step S160 can include the following sub-steps.

[0145] In step S161, a voltage-phase curve of the super surface unit is obtained.

[0146] In this embodiment, the voltage-phase curve of the super surface unit can be tested by an arc reflection test system or a lens transmission test system.

[0147]

[0148] In this embodiment, the voltage-phase curve of the super surface unit can be tested by an arc reflection test system or a lens transmission test system.

[0149] In step S162, a control parameter corresponding to the target excitation phase is obtained according to the voltage-phase curve of the super surface unit, and the voltage corresponding to each super surface unit is adjusted based on the control parameter, so as to control the generation of the target beam.

[0150] In this embodiment, the control parameter of the n-th super surface unit can be obtained according to the target excitation phase corresponding to the n-th super surface unit based on the voltage-phase curve obtained in step S161. When the electrically controlled element 112 of the super surface unit is a varactor diode, the control parameter can be a specific voltage value. When the electrically controlled element 112 of the super surface unit is a switch diode, the control parameter can be the working state of the switch diode, for example, on or off.

[0151] After obtaining the control parameter corresponding to each super surface unit, the voltage of each super surface unit can be adjusted to a specific voltage value or a specific working state, so as to modulate the target beam phase and generate a target beam meeting the target beam scanning requirement.

[0152] ​When each super surface unit in the super surface structure 100 only has a phase modulation function, the embodiment can still realize the generation of a simulated multi-beam, and the pointing of the main beam can be consistent with the target beam scanning requirement, but high sidelobes may be formed to interfere and cause gain reduction. Therefore, the embodiment can be applicable to scenarios with low requirements for aperture efficiency and interference suppression.

[0153] Please refer to Figure 9 , Figure 9 An example of the voltage-phase curve of the super surface unit provided in the embodiment is shown in the figure. When the working frequency band of the super surface structure 100 is 19 GHz, the super surface structure 100 includes 16x16 array arranged super surface units, and when the voltage of the feed patch 111 of the super surface unit rises from 0V to 20V, the reflection phase of the unit changes by 289°. 8 states can be selected from 0V to 20V to constitute 3-bit phase modulation, for example, 0V, 2V, 3V, 4V, 6V, 8V, 10V and 20V can be selected to constitute 3-bit phase modulation. After calculating the target excitation phase corresponding to each super surface unit, the control voltage corresponding to each super surface unit can be determined according to the voltage-phase curve diagram corresponding to the eight states.

[0154] In a possible implementation, if each super surface unit in the super surface structure 100 has both phase modulation function and amplitude modulation function, the target excitation data can include the target excitation phase and the target excitation amplitude corresponding to each super surface unit.

[0155] Please refer to Figure 10 , step S160 can include the following sub-steps.

[0156] Step S163, obtaining the voltage-amplitude-phase curve of the super surface unit.

[0157] In the embodiment, the voltage-amplitude-phase curve of the super surface unit can be tested by an arc reflection test system or a lens transmission test system.

[0158]

[0159] Wherein, V can represent the control parameter of the nth super surface unit, Amp can represent the target excitation amplitude corresponding to the nth super surface unit, and Phase can represent the target excitation phase corresponding to the nth super surface unit.

[0160] Step S164, obtaining the control parameter corresponding to the target excitation phase and the target excitation amplitude according to the voltage-amplitude-phase curve of the super surface unit, and adjusting the voltage corresponding to each super surface unit based on the control parameter, thereby controlling the generation of the target beam.

[0161] In this embodiment, the control parameter of the nth metasurface unit can be obtained according to the target excitation amplitude and the target excitation phase corresponding to the nth metasurface unit based on the voltage-amplitude-phase curve obtained in step S163. When the electrically tunable element 112 of the metasurface unit is a varactor diode, the control parameter can refer to a specific voltage value. When the electrically tunable element 112 of the metasurface unit is a switch diode, the control parameter can refer to the working state of the switch diode, for example, on or off.

[0162] After obtaining the control parameter corresponding to each metasurface unit respectively, the voltage of each metasurface unit can be adjusted to a specific voltage value or a specific working state, so as to realize the modulation of the target beam phase, thereby generating a target beam meeting the target beam scanning requirement.

[0163] It should be noted that the metasurface units in the metasurface structure 100 can be transmissive units or reflective units, which can be selected according to actual needs, and are not limited here.

[0164] In some examples, referring to Figure 11 , the feed array can include four independently arranged feeds 210, and the four feeds 210 are arranged in a 2x2 array. The metasurface units in the metasurface structure 100 can be reflective units. After the beams respectively emitted by the four feeds 210 irradiate on the metasurface structure 100, four independent high-gain secondary reflected beams 300 can be formed. The four feeds 210 can correspond to the four independent high-gain secondary reflected beams 300 respectively. Exemplarily, the four feeds 210 can all be horn feeds.

[0165] In other examples, referring to Figure 12 , the feed array can include four independently arranged feeds 210, and the four feeds 210 are arranged in a 2x2 array. The metasurface units in the metasurface structure 100 can be transmissive units. After the beams respectively emitted by the four feeds 210 irradiate on the metasurface structure 100, four independent high-gain secondary reflected beams 300 can be formed. The four feeds 210 can correspond to the four independent high-gain secondary reflected beams 300 respectively. Exemplarily, the four feeds 210 can all be horn feeds.

[0166] Referring to Figure 13 , Figure 13 The angle and gain relationship diagram of the target beam generated by the beam generation method provided in the present application is shown in the figure. When the feed array includes two feeds 210, at a certain moment, the target beam can include a beam 1 pointing to = 30°, and a beam pattern side lobe level is less than -12dB, and a beam 2 pointing to = 0°, the beam 2 has a side lobe level less than -14dB. For this target beam, the control parameters corresponding to each metasurface unit can be obtained by the beam generation method provided in this embodiment, so that the beam emitted by one of the feed sources 210 can be modulated by the metasurface to obtain the beam 1, and the beam emitted by the other feed source 210 can be modulated by the metasurface to obtain the beam 2. In the next moment, when the pointing or the side lobe level of the beam 1 and the beam 2 changes (i.e., the pointing of the beam 1 is not 30°, or the side lobe level of the beam 1 is not less than -12dB; the pointing of the beam 2 is not 0°, or the side lobe level of the beam 2 is not less than -14dB), the control parameters of each metasurface unit need to be recalculated and updated, so that multiple high-gain beams with arbitrary pointing in the field of view can be scanned.

[0167] This embodiment also provides an electronic device 800, please refer to Figure 14 , Figure 14 a block schematic diagram of the electronic device 800. The electronic device 800 includes a processor 810, a machine readable storage medium 820, and a beam generation apparatus 830. The machine readable storage medium 820 and the processor 810 are directly or indirectly electrically connected to each other to realize the transmission or interaction of data. For example, these elements can be electrically connected to each other through one or more communication buses or signal lines. The beam generation apparatus 830 includes a plurality of software functional modules that can be stored in the machine readable storage medium 820 in the form of software or firmware or solidified in the operating system (OS) of the beam generation apparatus 830. The processor 810 is configured to execute the executable modules stored in the machine readable storage medium 820, such as the software functional modules included in the beam generation apparatus 830 and computer programs, etc.

[0168] The machine readable storage medium 820 can be, but is not limited to, a random access memory (RAM), a read-only memory (ROM), a programmable read-only memory (PROM), an erasable programmable read-only memory (EPROM), an electrically erasable programmable read-only memory (EEPROM), etc. The machine readable storage medium 820 is configured to store programs, and the processor 810 executes the programs after receiving an execution instruction.

[0169] The processor 810 can be an integrated circuit chip having a processing capability of signals. The processor 810 described above can be a general processor 810, including a central processing unit 810 (CPU), a network processor 810 (NP), etc.; can also be a digital signal processor 810 (DSP), an application specific integrated circuit (ASIC), a field programmable gate array (FPGA) or other programmable logic device, a discrete gate or transistor logic device, a discrete hardware component. The disclosed methods, steps and logic block diagrams in the embodiments of the present application can be implemented or executed. The general processor 810 can be a microprocessor or the processor 810 can also be any conventional processor 810, etc.

[0170] Please refer to Figure 15 The embodiment of the present application also provides a beam generation apparatus 830, the beam generation apparatus 830 includes a plurality of function modules which can be stored in the machine readable storage medium 820 in the form of software. Functionally, the beam generation apparatus 830 can include an acquisition module 831, a first determination module 832, a second determination module 833, a synthesis module 834, a third determination module 835 and a control module 836. Wherein:

[0171] The acquisition module 831 can be used to acquire the coordinate information of each feed source 210 and each super surface unit based on the coordinate system with the geometric center point of the super surface structure 100 as the coordinate origin.

[0172] In the embodiment, the acquisition module 831 can be used to execute Figure 5 The specific description of the acquisition module 831 can be referred to the description of step S110.

[0173] The first determination module 832 can be used to determine the target beam direction corresponding to each feed source 210 respectively, and determine the secondary field pattern corresponding to the beam emitted by each feed source 210 based on the coordinate information of each super surface unit and the target beam direction; the target beam scanning requirement includes the target beam direction and the target beam direction pattern side lobe level.

[0174] In the embodiment, the first determination module 832 can be used to execute Figure 5 The specific description of the first determination module 832 can be referred to the description of step S120.

[0175] The second determination module 833 can be configured to determine a primary field amplitude pattern corresponding to each of the feeds, and determine a field amplitude and a path phase delay of each of the super surface units irradiated by each of the feeds 210 based on coordinate information of each of the feeds 210 and each of the super surface units and the primary field amplitude pattern.

[0176] In this embodiment, the second determination module 833 can be configured to perform Figure 5 The step S130 shown in the figure can be referred to for specific description of the second determination module 833.

[0177] The synthesis module 834 can be configured to correct a secondary field pattern corresponding to each of the beams emitted by each of the feeds 210 based on the field amplitude and the path phase delay of each of the super surface units irradiated by each of the feeds 210, and synthesize a target field pattern based on the corrected secondary field pattern.

[0178] In this embodiment, the synthesis module 834 can be configured to perform Figure 5 The step S140 shown in the figure can be referred to for specific description of the synthesis module 834.

[0179] The third determination module 835 can be configured to determine target excitation data corresponding to each of the super surface units based on the target field pattern.

[0180] In this embodiment, the third determination module 835 can be configured to perform Figure 5 The step S150 shown in the figure can be referred to for specific description of the third determination module 835.

[0181] The control module 836 can be configured to determine a control parameter corresponding to each of the super surface units based on the target excitation data, and adjust a voltage corresponding to each of the super surface units based on the control parameter, so as to control generation of a target beam.

[0182] In this embodiment, the control module 836 can be configured to perform Figure 5 The step S160 shown in the figure can be referred to for specific description of the control module 836.

[0183] In summary, the embodiment provides a beam generation method, device and electronic equipment, the secondary field pattern is corrected to obtain a target field pattern, and the control parameter corresponding to each of the super surface units is obtained based on the target field pattern, so as to adjust the voltage corresponding to each of the super surface units, the free regulation and control of the target beam can be realized, each of the beams in the target beam has the field of view scanning working ability, and is not limited to a specific scanning angle.

[0184] It has to be noted that, in the present document, the terms "first", "second", etc. merely serve to identify different entities or actions and do not necessarily require or imply any actual relationship or order between these entities or actions. Moreover, the terms "comprises", "comprising", or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can include other elements not expressly listed or inherent to such process, method, article, or apparatus. An element proceeded by "comprises... a" does not, without further constraints, exclude the presence of additional identical elements in the process, method, article, or apparatus that comprises the element.

[0185] The foregoing is merely illustrative of the principles of this application and various modifications can be made by those skilled in the art without departing from the scope and spirit of the application. Any such modifications are intended to be within the scope of the claims.

Claims

1. A method of beam generation, the method comprising: The application is applied to an antenna system, the antenna system comprises a feed array and a metasurface structure; the feed array comprises at least two feeds, and the metasurface structure comprises a plurality of arrayed metasurface units; The method comprises: Obtaining coordinate information of each feed and each metasurface unit based on a coordinate system with a geometric center point of the metasurface structure as a coordinate origin; Determining target beam scanning requirements corresponding to each feed respectively, and determining a secondary field pattern corresponding to a beam emitted by each feed based on the coordinate information of each metasurface unit and the target beam scanning requirements; the target beam scanning requirements comprise a target beam direction and a target beam direction pattern sidelobe level; wherein the secondary field pattern corresponding to the beam emitted by the i-th feed refers to a beam pointing to the target beam direction formed after the beam emitted by the i-th feed irradiates the metasurface structure; Determining a primary field amplitude pattern corresponding to each feed respectively, and determining a field amplitude and a path phase delay of each feed irradiated to each metasurface unit based on the coordinate information of each feed and each metasurface unit and the primary field amplitude pattern; According to the field amplitude and the path phase delay of each feed irradiated to each metasurface unit, the secondary field pattern corresponding to the beam emitted by each feed is corrected, and a target field pattern is synthesized based on the corrected secondary field pattern; Determining target excitation data corresponding to each metasurface unit respectively based on the target field pattern; According to the target excitation data, control parameters corresponding to each metasurface unit are determined, and voltages corresponding to each metasurface unit are adjusted based on the control parameters, so as to control the generation of the target beam; The target field pattern is obtained by the following method: ； wherein, represents a target field pattern, represents a corresponding secondary field pattern of the beam transmitted by the i-th feed source after modulation by the metasurface structure, α i,n represents the total expected field amplitude of the i-th feed source irradiated to the n-th metasurface unit in the aperture of the metasurface array, b i,n represents the field amplitude of the i-th feed source irradiated to the n-th metasurface unit, represents the corresponding target beam direction of the i-th feed source, represents the far-field pattern of each of the metasurface units, (x n ,y n ,0) represents the coordinates of the n-th metasurface unit, s i,n represents the path between the i-th feed source irradiated to the n-th metasurface unit, k represents the wave number, N represents the number of metasurface units in the metasurface structure, I represents the number of feed sources in the feed array, and j represents the imaginary part of the complex number.

2. The method of claim 1, wherein, The step of determining the target excitation data corresponding to each metasurface unit respectively based on the target field pattern comprises: Determining complex excitation corresponding to each metasurface unit respectively based on the target field pattern, and obtaining a real part and an imaginary part of the complex excitation; Determining the target excitation data corresponding to each metasurface unit respectively based on the real part and the imaginary part of the complex excitation.

3. The method of claim 1, wherein, The step of determining the primary field amplitude pattern corresponding to each feed respectively, and determining the field amplitude of each feed irradiated to each metasurface unit based on the coordinate information of each feed and each metasurface unit and the primary field amplitude pattern comprises: Determining a path between each feed and each metasurface unit according to the coordinate information of each feed and each metasurface unit; Determining an angle of the beam emitted by each feed to each metasurface unit based on the path between each feed and each metasurface unit; Determining the primary field amplitude pattern corresponding to each feed respectively, and determining the field amplitude of each feed irradiated to each metasurface unit based on the primary field amplitude pattern and the angle of the beam emitted by each feed to each metasurface unit.

4. The method of claim 3, wherein, paths between each of the feeds to each of the metasurface elements s i,n calculated by ； angles at which beams emitted by each of the feeds strike each of the metasurface elements is calculated by ； ； field amplitudes of each of the feeds to each of the metasurface units b i,n is calculated by ； wherein (x n ,y n ,0) represents the coordinates of the nth metasurface unit, (X i ,Y i ,Z i ) represents the coordinates of the ith feed source, s i,n represents the path between the ith feed source and the nth metasurface unit, represents the primary field amplitude pattern corresponding to the ith feed source, represents the angle of the beam emitted by the ith feed source to the nth metasurface unit.

5. The method of claim 1, wherein, The secondary field pattern is obtained by the following method: ； wherein, represents the corresponding secondary field pattern of the beam transmitted by the i-th feed source after modulated by the metasurface structure, α i,n represents the total expected field amplitude of the i-th feed source irradiated to the n-th metasurface unit in the aperture of the metasurface array, represents the target beam direction corresponding to the i-th feed source, represents the far-field pattern of each of the metasurface units, (x n ,y n ,0) represents the coordinates of the n-th metasurface unit, N represents the number of metasurface units in the metasurface structure, and j represents the imaginary part of a complex number.

6. The method of claim 1, wherein, The target excitation data comprises a target excitation phase corresponding to each metasurface unit respectively; The step of determining the control parameter corresponding to each of the metasurface units according to the target excitation data, and adjusting the voltage corresponding to each of the metasurface units based on the control parameter, thereby controlling the generation of the target beam, comprises: obtaining the voltage-phase curve of the metasurface unit; obtaining the control parameter corresponding to the target excitation phase according to the voltage-phase curve of the metasurface unit, and adjusting the voltage corresponding to each of the metasurface units based on the control parameter, thereby controlling the generation of the target beam.

7. The method of claim 1, wherein, The target excitation data comprises the target excitation phase and the target excitation amplitude corresponding to each of the metasurface units; The step of determining the control parameter corresponding to each of the metasurface units according to the target excitation data, and adjusting the voltage corresponding to each of the metasurface units based on the control parameter, thereby controlling the generation of the target beam, comprises: obtaining the voltage-amplitude-phase curve of the metasurface unit; obtaining the control parameter corresponding to the target excitation phase and the target excitation amplitude according to the voltage-amplitude-phase curve of the metasurface unit, and adjusting the voltage corresponding to each of the metasurface units based on the control parameter, thereby controlling the generation of the target beam.

8. A beam generation apparatus based on the beam generation method of claim 1, characterized by, The application is applied to an antenna system, which comprises a feed array and a metasurface structure; the feed array comprises at least two feeds, and the metasurface structure comprises a plurality of array-arranged metasurface units; The beam generation device comprises: an obtaining module, configured to obtain the coordinate information of each of the feeds and each of the metasurface units based on a coordinate system with a geometric center point of the metasurface structure as a coordinate origin; a first determining module, configured to determine the target beam scanning requirement corresponding to each of the feeds, and determine the secondary field pattern corresponding to the beam emitted by each of the feeds based on the coordinate information of each of the metasurface units and the target beam scanning requirement; the target beam scanning requirement comprises a target beam direction and a target beam direction pattern sidelobe level; a second determining module, configured to determine the primary field amplitude pattern corresponding to each of the feeds, and determine the field amplitude and path phase delay of each of the metasurface units irradiated by each of the feeds based on the coordinate information of each of the feeds and each of the metasurface units and the primary field amplitude pattern; a synthesizing module, configured to correct the secondary field pattern corresponding to the beam emitted by each of the feeds according to the field amplitude and path phase delay of each of the metasurface units irradiated by each of the feeds, and synthesize a target field pattern based on the corrected secondary field pattern; a third determining module, configured to determine the target excitation data corresponding to each of the metasurface units based on the target field pattern; a control module, configured to determine the control parameter corresponding to each of the metasurface units according to the target excitation data, and adjust the voltage corresponding to each of the metasurface units based on the control parameter, thereby controlling the generation of the target beam.

9. An electronic device, comprising: The electronic device includes a processor and a machine readable storage medium storing machine executable instructions that, when executed by the processor, implement the beam generation method of any one of claims 1-7.

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