A magnetron sputtering coating machine

Abstract

The application relates to the technical field of coating equipment, and particularly discloses a magnetron sputtering coating machine, which comprises a coating chamber, a vacuum extraction assembly arranged in communication on the coating chamber, a room door capable of being opened and closed arranged on the coating chamber, a workpiece mounting assembly arranged in the coating chamber, an electron gun arranged below the workpiece mounting assembly, a crucible arranged at the output end of the electron gun, a cathode rotating mechanism rotatably arranged on the inner wall of the room door, a planar cathode arranged on the cathode rotating mechanism, a target material arranged in the planar cathode, a shielding cover arranged on the planar cathode, and first and second servo motors in transmission connection with the cathode rotating mechanism and the shielding cover respectively. The application can realize large-area or multi-layer film deposition, improve the diversity of the coating process, and effectively reduce the risk of cross contamination.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of coating equipment, and particularly relates to a magnetron sputtering coating machine. BACKGROUND

[0002] The magnetron sputtering coating technology can deposit a film layer composed of multiple layers of metal or metal oxide on the surface of a substrate, and can flexibly adjust the energy transmittance and reflectivity through the design of the film layer structure, thereby not only having excellent optical performance, but also having a decorative effect. Moreover, the technology overcomes the deficiencies of other coating methods in process stability and film layer compactness, and thus gradually becomes a widely used coating method.

[0003] With the increasing demand for high-performance optical devices in the fields of intelligent devices, automotive electronics, sports protection and the like, the application prospect of the magnetron sputtering coating technology is increasingly broad. However, the existing magnetron sputtering coating machine still has the following deficiencies in actual use:

[0004] 1. Low space utilization: The traditional magnetron sputtering coating machine usually sets the cathode target above the cavity, and the substrate is located directly below it. The internal space layout of the cavity is limited, and it is difficult to set the electron gun in it at the same time, so it cannot be compatible with multiple coating methods. Although the cavity of the vacuum evaporation coating machine can be configured with an electron gun, the size of the target that can be placed is limited, and it cannot meet the needs of large-area or multi-layer film deposition.

[0005] 2. Single working mode: In the existing equipment, the electron gun and the cathode target often cannot work independently, which limits the flexibility of the coating process.

[0006] 3. Cross contamination is easy to occur: When multiple methods are used for coating, the existing anti-pollution measures have poor adaptability, which leads to insufficient film layer purity and affects the quality of the film layer.

[0007] Therefore, we propose a magnetron sputtering coating machine to solve the above technical problems. SUMMARY

[0008] In order to solve the technical problems existing in the prior art, the application proposes a magnetron sputtering coating machine.

[0009] The technical scheme adopted by the application is as follows:

[0010] The utility model provides a magnetron sputtering coating machine, including coating room and the vacuumizing component of communication setting on coating room, be equipped with the openable chamber door on coating room, be equipped with workpiece installation component in coating room, and be equipped with electron gun below workpiece installation component, electron gun sets up in the bottom in coating room, the output of electron gun is equipped with crucible, rotatablely being equipped with cathode rotating mechanism on the inner wall of chamber door, be equipped with plane cathode on cathode rotating mechanism, be equipped with target material in plane cathode, the cover of plane cathode is equipped with shield, the both ends of shield are hinged to the both sides of plane cathode, cathode rotating mechanism and shield are driven connection respectively with first servo motor and second servo motor.

[0011] In a further technical solution, the chamber door is integrally formed with a receiving shell, and the cathode rotating mechanism is rotatably arranged in the receiving shell.

[0012] In a further technical solution, the cathode rotating mechanism includes a main shaft, a shaft sleeve, a rack, and a support frame. The main shaft is rotatably sleeved with the shaft sleeve on both sides. The main shaft is installed on the inner wall of the chamber door through the shaft sleeve. The rack is connected to the main shaft. The support frame is detachably connected to the rack. The plane cathode is installed on the support frame. The first servo motor is installed on the outer wall of the chamber door. One end of the main shaft extends out of the chamber door and is in transmission connection with the first servo motor. The second servo motor is installed on the rack.

[0013] In a further technical solution, the support frame is provided with through holes around the periphery. The rack is provided with screws corresponding to the positions of the through holes. The screws pass through the through holes and are threadedly connected with adjusting nuts on both sides of the through holes.

[0014] In a further technical solution, the workpiece installation assembly includes a workpiece rack, a workpiece disc, and a communication cylinder. The workpiece rack is arranged on the top surface of the coating chamber. The workpiece disc is installed on the communication cylinder. The communication cylinder is detachably connected to the lower part of the workpiece rack.

[0015] In a further technical solution, the workpiece rack is circular. The communication cylinders are uniformly arranged along the circumference of the workpiece rack. The upper end of the workpiece rack is provided with a rotating shaft. The rotating shaft extends out of the coating chamber and is rotatably connected with the coating chamber. The coating chamber is provided with a rotating servo motor. The rotating shaft is in transmission connection with the rotating servo motor.

[0016] In a further technical solution, the chamber door is provided with a plurality of observation windows.

[0017] In a further technical solution, the vacuumizing assembly includes a mechanical pump, a Roots pump, and a molecular pump. The mechanical pump, the Roots pump, and the molecular pump are all in communication with the coating chamber.

[0018] In summary, due to the adoption of the above technical solutions, the present application has the following advantages:

[0019] 1、The cathode rotating mechanism is arranged on the inner wall of the chamber door, which improves the space utilization rate in the coating chamber, so that a larger size target material can be equipped, the requirements of large-area or multi-layer film deposition are met, and the coating effect is further improved.

[0020] 2、The cathode rotating mechanism is arranged on the inner wall of the chamber door, which improves the space utilization rate in the coating chamber, so that a larger size target material can be equipped, the requirements of large-area or multi-layer film deposition are met, and the coating effect is further improved.

[0021] 3、The cathode rotating mechanism is arranged on the inner wall of the chamber door, which improves the space utilization rate in the coating chamber, so that a larger size target material can be equipped, the requirements of large-area or multi-layer film deposition are met, and the coating effect is further improved.

[0022] 4、The cathode rotating mechanism is arranged on the inner wall of the chamber door, which improves the space utilization rate in the coating chamber, so that a larger size target material can be equipped, the requirements of large-area or multi-layer film deposition are met, and the coating effect is further improved.

[0023] 5、The cathode rotating mechanism is arranged on the inner wall of the chamber door, which improves the space utilization rate in the coating chamber, so that a larger size target material can be equipped, the requirements of large-area or multi-layer film deposition are met, and the coating effect is further improved.

[0024] 6、The cathode rotating mechanism is arranged on the inner wall of the chamber door, which improves the space utilization rate in the coating chamber, so that a larger size target material can be equipped, the requirements of large-area or multi-layer film deposition are met, and the coating effect is further improved. BRIEF DESCRIPTION OF DRAWINGS

[0025] The present application will be described by way of example and with reference to the accompanying drawings, in which:

[0026] Figure 1 is a structural schematic diagram of the present application;

[0027] Figure 2 is Figure 1 is a partial enlarged schematic view of A in the present application;

[0028] Figure 3 is a structural schematic diagram of the cathode rotating mechanism of the present application;

[0029] Figure 4 is a structural schematic diagram of the cathode rotating mechanism of the present application after being received in the receiving box.

[0030] Fig. 1: 1-coating chamber, 2-chamber door, 201-housing shell, 3-electron gun, 4-crucible, 5-cathode rotating mechanism, 501-main shaft, 502-shaft sleeve, 503-frame, 504-support frame, 6-flat cathode, 7-target material, 8-shield cover, 9-first servo motor, 10-second servo motor, 11-screw rod, 12-adjusting nut, 13-workpiece frame, 14-workpiece disc, 15-communication cylinder, 16-rotating shaft, 17-rotating servo motor, 18-observation window, 19-mechanical pump, 20-roots pump, 21-molecular pump. DETAILED DESCRIPTION

[0031] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by a person of ordinary skill in the art without creative labor fall within the protection scope of the present application.

[0032] Embodiment:

[0033] Reference Figures 1-4 The present application provides a magnetron sputtering coating machine, which comprises a coating chamber 1 and a vacuum extraction assembly connected to the coating chamber 1. The coating chamber 1 is provided with an openable and closable chamber door 2. A workpiece mounting assembly is arranged in the coating chamber 1, and an electron gun 3 is arranged below the workpiece mounting assembly. The electron gun 3 is arranged at the bottom of the coating chamber 1. The output end of the electron gun 3 is provided with a crucible 4. A cathode rotating mechanism 5 is rotatably arranged on the inner wall of the chamber door 2. A flat cathode 6 is arranged on the cathode rotating mechanism 5. A target material 7 is arranged in the flat cathode 6. A shield cover 8 is arranged on the flat cathode 6. The two ends of the shield cover 8 are hingedly connected to the two sides of the flat cathode 6. The cathode rotating mechanism 5 and the shield cover 8 are respectively drivingly connected to a first servo motor 9 and a second servo motor 10.

[0034] The specific working principle of the magnetron sputtering coating machine is as follows:

[0035] The vacuumizing assembly of the coating chamber 1 establishes and maintains the vacuum environment, and the chamber door 2 is openable and closable for loading and unloading of the substrate to be coated. The workpiece mounting assembly is used for mounting the substrate to be coated, and the electron gun 3 is arranged below the workpiece mounting assembly and located at the bottom of the coating chamber 1, and the output end of the electron gun 3 is provided with a crucible 4 in which the film material required for evaporation coating is placed, which is used to implement the vacuum evaporation coating process. The cathode rotating mechanism 5 is rotatably arranged on the inner wall of the chamber door 2, and the planar cathode 6 is arranged above the cathode rotating mechanism 5, and the target material 7 is arranged in the planar cathode 6, which is used for magnetron sputtering coating. The shielding cover 8 is arranged on the planar cathode 6, and the two ends of the shielding cover 8 are hingedly connected to the two sides of the planar cathode 6 and are driven to open and close by the second servo motor 10, which is used to shield the target material 7 in the non-working state or to expose the target material 7 in the working state, thereby reducing the risk of cross contamination. Specifically, the cathode rotating mechanism 5 is controlled to rotate by the first servo motor 9 to realize position adjustment: when in the working state, the cathode rotating mechanism 5 can be rotated to different angle positions according to process requirements, and at the same time the second servo motor 10 controls the shielding cover 8 to open to expose the target material 7 to implement the magnetron sputtering coating process; when in the non-working state, the second servo motor 10 controls the shielding cover 8 to close to shield the target material 7, and the first servo motor 9 controls the cathode rotating mechanism 5 to rotate and fit on the inner wall of the chamber door 2, thereby reducing the space occupation in the coating chamber 1 and avoiding interference with the electron gun 3, which is conducive to the implementation of the vacuum evaporation coating process. Compared with the traditional coating machine, the magnetron sputtering coating machine simultaneously configures the cathode rotating mechanism 5 and the electron gun 3 in the coating chamber 1, and the two processes can work independently and freely combined, which effectively improves the diversity of the coating process. In addition, the design of the cathode rotating mechanism 5 rotatingly arranged on the inner wall of the chamber door 2 improves the space utilization rate in the coating chamber 1, so that a larger size target material 7 can be provided to meet the needs of large-area or multi-layer film deposition, further improving the coating effect.

[0036] In a specific embodiment, referring to Figure 1 and Figure 4 , the chamber door 2 is integrally formed with a receiving shell 201, and the cathode rotating mechanism 5 is rotatably arranged in the receiving shell 201.

[0037] The cathode rotating mechanism 5 can be received in the receiving shell 201, which is compact in structure and high in space utilization, so that the magnetron sputtering coating machine can use a larger size target material 7, and at the same time the operation space in the coating chamber 1 is increased, which is convenient for operation of different coating processes.

[0038] In a specific embodiment, referring to Figure 1 , Figure 3 and Figure 4The cathode rotating mechanism 5 comprises a main shaft 501, a shaft sleeve 502, a frame 503 and a support frame 504. The shaft sleeve 502 is rotatably sleeved on both sides of the main shaft 501. The main shaft 501 is installed on the inner wall of the chamber door 2 through the shaft sleeve 502. The frame 503 is connected to the main shaft 501. The support frame 504 is detachably connected to the frame 503. The planar cathode 6 is installed on the support frame 504. The first servo motor 9 is installed on the outer wall of the chamber door 2. One end of the main shaft 501 extends out of the chamber door 2 and is in transmission connection with the first servo motor 9. The second servo motor 10 is installed on the frame 503.

[0039] The cathode rotating mechanism 5 is composed of the main shaft 501, the shaft sleeve 502, the frame 503 and the support frame 504. The main shaft 501 is installed on the inner wall of the chamber door 2 through the shaft sleeve 502, thereby ensuring the rotation reliability of the cathode rotating mechanism 5. The frame 503 is connected to the main shaft 501 and can rotate with the main shaft 501, and at the same time, the second servo motor 10 is provided with an installation position. The support frame 504 is installed on the frame 503 and provides a stable installation position for the planar cathode 6. Specifically, the first servo motor 9 drives the main shaft 501 to rotate, thereby driving the frame 503, the support frame 504 and the planar cathode 6 thereon to rotate synchronously, and the angle position adjustment of the cathode rotating mechanism 5 is realized, so as to meet different process requirements.

[0040] In a specific embodiment, referring to Figure 3 The support frame 504 is provided with through holes around the periphery. The frame 503 is provided with screw rods 11 corresponding to the positions of the through holes. The screw rods 11 pass through the through holes and are threadedly connected with adjusting nuts 12 on both sides of the through holes.

[0041] The support frame 504 and the frame 503 are connected through the screw rods 11 and the adjusting nuts 12. Before coating, if it is necessary to adjust the distance between the target material 7 and the substrate to be coated, the height of the support frame 504 can be adjusted by screwing the adjusting nuts 12 on both sides of the through holes of the support frame 504, so that the distance between the target material 7 and the substrate to be coated is adjusted, thereby facilitating the satisfaction of different process requirements.

[0042] In a specific embodiment, referring to Figure 1 and Figure 2 The workpiece mounting assembly comprises a workpiece frame 13, a workpiece disc 14 and a communication cylinder 15. The workpiece frame 13 is arranged on the top surface in the coating chamber 1. The workpiece disc 14 is installed on the communication cylinder 15. The communication cylinder 15 is detachably connected below the workpiece frame 13.

[0043] The workpiece rack 13 is arranged on the top surface of the coating chamber 1, the workpiece disc 14 is arranged on the communicating cylinder 15, and is used for placing the substrate to be coated, the communicating cylinder 15 is detachably connected to the lower portion of the workpiece rack 13, and is convenient for quickly loading and unloading the substrate to be coated, is beneficial to maintenance, and simultaneously improves the operation efficiency and production flexibility.

[0044] In a specific embodiment, referring to Figure 1 and Figure 2 , the workpiece rack 13 is circular, the communicating cylinders 15 are uniformly arranged along the circumference of the workpiece rack 13, the upper end of the workpiece rack 13 is provided with a rotating shaft 16, the rotating shaft 16 penetrates and extends out of the coating chamber 1, and is rotatably connected to the coating chamber 1, the coating chamber 1 is provided with a rotating servo motor 17, and the rotating shaft 16 is drivingly connected to the rotating servo motor 17.

[0045] The workpiece rack 13 is circular, the communicating cylinders 15 are uniformly arranged along the circumference of the workpiece rack 13, and are rotatably connected to the coating chamber 1 through the rotating shaft 16, the workpiece rack 13 is driven to rotate by the rotating servo motor 17, so that the communicating cylinders 15, the workpiece discs 14 and the substrates to be coated on the workpiece rack 13 are continuously and stably moved to the coating position or away from the coating position, thereby effectively increasing the number of the substrates to be coated that can be processed in the coating chamber 1, and improving the production efficiency.

[0046] In a specific embodiment, referring to Figure 1 and Figure 4 , the chamber door 2 is provided with a plurality of observation windows 18.

[0047] Through the observation windows 18 on the chamber door 2, the coating state of the substrate in the coating chamber 1 can be observed during the coating process, the controllability and safety of the operation are improved, and the situation that the vacuum environment is damaged due to frequent opening and closing of the chamber door 2 is reduced.

[0048] In a specific embodiment, referring to Figure 1 , the vacuumizing assembly comprises a mechanical pump 19, a Roots pump 20 and a molecular pump 21, and the mechanical pump 19, the Roots pump 20 and the molecular pump 21 are all in communication with the coating chamber 1.

[0049] The vacuumizing assembly can gradually pump air from rough vacuum, medium vacuum to high vacuum through cooperation of the mechanical pump 19, the Roots pump 20 and the molecular pump 21, the advantages of the pumps are fully utilized, the air pumping time is shortened, and the vacuum environment required for coating is quickly established and maintained.

[0050] The above only describes the embodiments of the present application, and does not limit the patent scope of the present application, and any equivalent structure or equivalent flow conversion obtained by referring to the content of the specification and drawings, or direct or indirect application in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A magnetron sputtering coating machine, characterized in that, The system includes a coating chamber (1) and a vacuum assembly connected to the coating chamber (1). The coating chamber (1) is equipped with an openable and closable door (2). A workpiece mounting assembly is located inside the coating chamber (1), and an electron gun (3) is located below the workpiece mounting assembly. The electron gun (3) is located at the bottom of the coating chamber (1), and a crucible (4) is located at the output end of the electron gun (3). A cathode rotating mechanism (5) is rotatably mounted on the inner wall of the door (2), and the cathode rotating mechanism (5) is equipped with... A planar cathode (6) is provided with a target material (7) inside the planar cathode (6). A shield (8) is provided on the top of the planar cathode (6). The two ends of the shield (8) are respectively hinged to the two sides of the planar cathode (6). The cathode rotation mechanism (5) and the shield (8) are respectively connected to a first servo motor (9) and a second servo motor (10). A storage shell (201) is integrally formed on the door (2). The cathode rotation mechanism (5) is rotatably disposed in the storage shell (201).

2. The magnetron sputtering coating machine according to claim 1, characterized in that, The cathode rotation mechanism (5) includes a main shaft (501), a bushing (502), a frame (503), and a support frame (504). The bushing (502) can be rotatably fitted on both sides of the main shaft (501). The main shaft (501) is installed on the inner wall of the door (2) through the bushing (502). The frame (503) is connected to the main shaft (501). The support frame (504) is detachably connected to the frame (503). The planar cathode (6) is installed on the support frame (504). The first servo motor (9) is installed on the outer wall of the door (2). One end of the main shaft (501) extends out of the door (2) and is connected to the first servo motor (9) for transmission. The second servo motor (10) is installed on the frame (503).

3. The magnetron sputtering coating machine according to claim 2, characterized in that, The support frame (504) has through holes around its perimeter. The frame (503) has screws (11) corresponding to the positions of the through holes. The screws (11) pass through the through holes and are threaded with adjusting nuts (12) on both sides of the through holes.

4. A magnetron sputtering coating machine according to any one of claims 1-3, characterized in that, The workpiece mounting assembly includes a workpiece rack (13), a workpiece tray (14), and a connecting cylinder (15). The workpiece rack (13) is located on the top surface inside the coating chamber (1). The workpiece tray (14) is mounted on the connecting cylinder (15). The connecting cylinder (15) is detachably connected to the bottom of the workpiece rack (13).

5. A magnetron sputtering coating machine according to claim 4, characterized in that, The workpiece holder (13) is circular, and the connecting cylinder (15) is evenly arranged around the workpiece holder (13). The upper end of the workpiece holder (13) is provided with a rotating shaft (16), which extends through the coating chamber (1) and is rotatably engaged with the coating chamber (1). The coating chamber (1) is provided with a rotary servo motor (17), and the rotating shaft (16) is connected to the rotary servo motor (17) in a transmission connection.

6. A magnetron sputtering coating machine according to claim 1, characterized in that, The door (2) is equipped with multiple observation windows (18).

7. A magnetron sputtering coating machine according to claim 1, characterized in that, The vacuum pumping assembly includes a mechanical pump (19), a Roots pump (20), and a molecular pump (21), all of which are connected to the coating chamber (1).

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