Polishing method and system for textured microcrystalline glass

By preheating the textured microcrystalline glass and using laser polishing, the laser scattering problem caused by the textured phenomenon was solved, the yield of laser cutting and drilling was improved, and damage to the glass surface was avoided.

CN121104381APending Publication Date: 2025-12-12BIEL OPTIC HUIZHOU +1
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Patent Information

Application Number
CN202511458077.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-10-13
Publication Date
2025-12-12

AI Technical Summary

Technical Problem

During laser cutting or drilling of microcrystalline glass, the laser beam is scattered due to the texturing phenomenon, which affects the cutting and drilling effect. Existing technologies such as spraying chemical liquids have limited effectiveness and are not applicable, and may also shorten the equipment life.

Method used

Before laser cutting or drilling, the textured microcrystalline glass is polished, including heating to 200-400 degrees Celsius and polishing with a laser along the polishing path. The polishing point dwell time is 50-1000ms, and the spot distribution is adjusted using a positive defocused beam and a focusing lens.

Benefits of technology

It significantly improves the yield of laser cutting and drilling, avoids cracks or breakage on the glass surface, and enhances product quality.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses a polishing method and system for textured microcrystalline glass, and relates to the field of laser polishing. The method comprises the following steps: placing to-be-processed textured microcrystalline glass on a processing platform with a heating function, and heating the textured microcrystalline glass to 200-400 DEG C; a polishing path is set according to the position and shape of a machining area of the cutting or punching laser; and laser is used for polishing the textured microcrystalline glass along the polishing path, during polishing, the laser stays at each polishing point, and the staying time is 50-1000 ms. The system comprises a laser, a beam expander, a reflector, a focusing system and a processing platform, the processing platform comprises a heating platform, and textured microcrystalline glass is arranged on the heating platform. According to the scheme provided by the invention, the textured microcrystalline glass is heated before laser cutting or punching, and the laser is adopted to polish the processing area, so that the light transmittance of the textured microcrystalline glass is improved, and the yield of laser cutting or punching is improved.
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Description

TECHNICAL FIELD

[0001] The present application relates to the field of laser polishing, in particular to a polishing method and system for roughened microcrystalline glass. BACKGROUND

[0002] The surface of the microcrystalline glass usually has a certain degree of pits and black spots, which is generally called roughening phenomenon. When the microcrystalline glass is laser cut or laser drilled, the pits and black spots will cause part of the laser beam to scatter, which will cause the laser to be unable to focus, thereby affecting the cutting and drilling effect, and causing the proportion of defective products to increase. For example, during the laser drilling process, if the glass surface of the laser incidence surface has roughening, the glass material in the local area will not be removed during the drilling process. The reasons are as follows: laser drilling is through laser transmission through the glass surface, focusing inside the material, and removing the material layer by layer from the lower surface to the upper surface of the material. Laser cutting is through Bessel beam focusing inside the material and penetrating the material to cut the material. Therefore, the inability of the laser to concentrate will cause the local area to be unable to be removed, which will affect both cutting and drilling.

[0003] To solve the above problems, in the prior art, a water-based solution containing a certain chemical substance is sprayed on the cutting track, and the liquid is used to fill the concave and convex surfaces of the glass to eliminate the scattering of the laser beam. The above scheme has a certain effect on improving the yield of laser cutting in actual use, but it cannot completely solve the related problems, and spraying liquid inside the cutting equipment will shorten the service life of the optical components to some extent. For the laser drilling scene, due to the heating of the laser, the liquid will quickly evaporate, resulting in little improvement in drilling yield. Moreover, when the hole to be processed is close to the edge of the glass, the liquid will flow into the bottom of the glass along the edge, which will affect the glass drilling effect.

[0004] Therefore, it is necessary to provide a solution with a different idea to solve the above problems. SUMMARY

[0005] To achieve the above purpose, the present application provides a polishing method and system for roughened microcrystalline glass.

[0006] In a first aspect, the present application provides a polishing method for roughened microcrystalline glass, characterized in that the polishing method is used for polishing the processing area before laser cutting or drilling, and the polishing method comprises the following steps: S1, placing the roughened microcrystalline glass to be processed on a processing platform with heating function, and heating the roughened microcrystalline glass to 200-400 degrees Celsius; S2, setting a polishing path according to the position and shape of the processing area; S3. Polish the textured microcrystalline glass using a laser along the polishing path. During polishing, the laser stays at each polishing point for 50 to 1000 ms.

[0007] Furthermore, preferably, the dwell time in step S3 is achieved by controlling the emission time of the laser source.

[0008] Furthermore, as a preferred embodiment, in step S3, the laser beam acting on the glass surface during polishing is a laser beam with positive defocus.

[0009] In a second aspect, the present invention provides a polishing system for texturing microcrystalline glass, comprising a laser, a beam expander, a mirror, a focusing system, and a processing platform; The laser is used to emit a laser beam to polish the processing area before laser cutting or drilling; The beam expander is disposed in the laser beam output optical path of the laser and is used to increase the spot diameter of the laser beam and reduce its energy density. The reflector is used to redirect the optical path of the expanded laser beam. The focusing system is used to focus the redirected laser beam onto the surface of the textured microcrystalline glass. The processing platform is used to support the textured microcrystalline glass and works with the focusing system to achieve scanning of the laser beam on the surface of the textured microcrystalline glass. The processing platform is equipped with a heating platform, which is configured to preheat the texturized microcrystalline glass to 200°C to 400°C before laser processing.

[0010] Furthermore, as a preferred embodiment, the focal length of the focusing system is 75–300 mm.

[0011] Furthermore, as a preferred embodiment, the focusing system is a combination of a galvanometer and a field lens.

[0012] Furthermore, as a preferred embodiment, the focusing system is a focusing lens, which is a cylindrical convex lens or a DOE optical component.

[0013] Furthermore, as a preferred embodiment, the heating platform is provided with a groove for accommodating the textured microcrystalline glass.

[0014] Furthermore, as a preferred embodiment, the polishing system further includes a first moving mechanism for driving the focusing system to move relative to the processing platform in the horizontal and vertical directions.

[0015] Furthermore, as a preferred embodiment, the polishing system further includes a second moving mechanism for driving the heating platform to move in both horizontal and vertical directions.

[0016] Compared with the prior art, the present invention provides a polishing method for textured microcrystalline glass, which has the following beneficial effects: In this embodiment of the invention, before laser cutting or drilling the textured microcrystalline glass, the textured microcrystalline glass to be processed is placed on a processing platform with a heating function, and the textured microcrystalline glass is heated to 200-400 degrees Celsius. A polishing path is set according to the position and shape of the processing area of ​​the cutting or drilling laser. The textured microcrystalline glass is polished using a laser along the polishing path. During polishing, the laser stays at each polishing point for 50-1000 ms. The polishing process eliminates the scattering of the laser beam by the glass surface, significantly improving the yield of laser cutting and drilling. At the same time, preheating is performed before polishing so that the textured microcrystalline glass reaches a basic temperature before polishing. Furthermore, the laser stays at each polishing point for a preset time to fully conduct heat to the glass. This avoids the problem of residual stress inside the glass due to the temperature gradient between the laser and the glass after polishing without heating or with insufficient heat conduction, which can lead to cracks or chipping on the glass surface. Attached Figure Description

[0017] Figure 1 A schematic flowchart of a polishing method for texturing microcrystalline glass provided in an embodiment of the present invention; Figure 2 This is a schematic diagram of a polishing system for texturing microcrystalline glass provided in one embodiment of the present invention; Figure 3 A schematic diagram of a polishing system for texturing microcrystalline glass provided in another embodiment of the present invention; Figure 4 This is a schematic diagram of a polishing path for a polishing method for texturing microcrystalline glass, provided in one embodiment of the present invention. Figure 5 A schematic diagram of a polishing path for a polishing method for texturing microcrystalline glass, provided for another embodiment of the present invention; Figure 6 This is a schematic diagram illustrating the effect of a polishing method for texturing microcrystalline glass provided in an embodiment of the present invention. In the diagram: 1. Laser; 2. Beam expander; 3. Mirror; 4. Processing platform; 5. Textured microcrystalline glass; 6. Heating platform; 7. Galvanometer and field mirror; 8. Focusing mirror; 01. Drilling part; 011. Drilling diameter; 012. First polishing diameter; 02. Cutting part; 021. Cutting diameter; 022. Second polishing diameter. Detailed Implementation

[0018] To make the above-mentioned objects, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of the present invention. However, the present invention can be practiced in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0019] Please see Figures 1-6 This invention provides a polishing method for texturing microcrystalline glass. The polishing method is used to polish the processing area before laser cutting or drilling. The polishing method includes the following steps: S1. Place the textured microcrystalline glass to be processed onto a processing platform with heating function, and heat the textured microcrystalline glass to 200-400 degrees Celsius. S2. Set the polishing path according to the position and shape of the processing area; S3. Polish the textured microcrystalline glass using a laser along the polishing path. During polishing, the laser stays at each polishing point for 50 to 1000 ms.

[0020] In step 1, the processing platform has grooves into which the textured microcrystalline glass to be processed can be placed. Because the textured microcrystalline glass has a certain thickness, the grooves allow for a more uniform temperature distribution during heating, preventing excessive temperature differences between the upper and lower surfaces. Heating the textured microcrystalline glass serves as a preheating process to reduce the temperature gradient during laser polishing. Laser polishing involves irradiating the glass with a laser beam. The glass absorbs the laser beam and generates heat, gradually softening the uneven surface until it melts. The molten glass then spreads evenly under gravity, eliminating surface roughness. During polishing, the area of ​​the textured microcrystalline glass irradiated by the laser generates significant heat. If the temperature difference between the overall textured microcrystalline glass and the irradiated area is too large, it can cause residual stress within the glass after processing, making the surface prone to cracking or chipping. In this embodiment of the invention, the textured microcrystalline glass is preheated to reduce the temperature gradient between the textured microcrystalline glass and the laser irradiation area. The preheating temperature is 200–400 degrees Celsius. Since the material, thickness, and laser parameters used for polishing of the textured microcrystalline glass all affect the preheating temperature, it needs to be adjusted according to the actual processing conditions.

[0021] In step S2, since the method provided by the present invention is only used for the process before laser cutting, it is necessary to ensure that the overall surface of the textured microcrystalline glass remains unchanged and to perform small-scale polishing only at the laser cutting path. Therefore, it is necessary to set the polishing path according to the position and shape of the processing area, and at the same time, it is necessary to ensure that the preheating treatment in step S1 will not cause the entire surface of the textured microcrystalline glass to melt.

[0022] In step S3, laser polishing is performed using an intermittent dot-mapping method. That is, the laser beam moves along the polishing path, stopping intermittently during the movement. During the stop, the laser emits light to polish. When the movement continues after the stop, the laser stops emitting light. Each polishing point is stopped for a certain period of time, allowing the laser beam to fully conduct heat inside the glass at the stop position, thus completing the polishing. The dwell time at the polishing point is affected by both the glass and the laser. During the processing, the dwell time at the polishing point is between 50 and 1000 ms, and the laser emission time corresponds to the dwell time at the polishing point.

[0023] It is important to note that in this embodiment of the invention, the laser beam acting on the glass surface during polishing is a positively defocused beam. After positive defocusing, the energy distribution within the laser spot formed on the glass surface is more dispersed, which is more beneficial for heating the glass material. Therefore, after the laser is emitted, a cylindrical convex lens or a focusing lens of a DOE optical component is used to process the laser, thereby changing the phenomenon of excessive energy concentration in the central part of the Gaussian beam. The size of the spot acting on the glass surface is determined by the distance between the focusing lens and the glass surface; the size of the spot can be adjusted simply by controlling the distance between the focusing lens and the textured microcrystalline glass.

[0024] In this embodiment of the invention, a CO2 laser is selected as the laser source, and the focal length of the focusing lens is between 75 and 300 mm. As a preferred embodiment, when a CO2 laser is selected as the laser source, the glass (microcrystalline glass) thickness is 3.9 mm, the focal length of the focusing lens is 150 mm, the spot size is adjusted to 1 mm, and the polished glass surface can reach 50-100 nm.

[0025] like Figure 2 , 3As shown, this embodiment of the invention also provides a polishing system for textured microcrystalline glass, including a laser 1, a beam expander 2, a reflector 3, a focusing system, and a processing platform 4. The laser 1 is used to emit a laser beam to polish the processing area before laser cutting or drilling. The beam expander 2 is disposed on the output optical path of the laser beam of the laser 1 to expand the spot diameter of the laser beam and reduce its energy density. The reflector 3 is used to redirect the optical path of the expanded laser beam. The focusing system is used to focus the redirected laser beam onto the surface of the textured microcrystalline glass 5. The processing platform 4 is used to support the textured microcrystalline glass 5 and cooperates with the focusing system to scan the surface of the textured microcrystalline glass 5 with the laser beam. The processing platform 4 is provided with a heating platform 6, which is configured to preheat the textured microcrystalline glass 5 to 200°C to 400°C before laser processing.

[0026] In some embodiments of the present invention, the focusing system is a combination of a galvanometer and a field lens 7. In other embodiments of the present invention, the focusing system is a focusing lens 8, which employs a cylindrical convex lens or a DOE optical component.

[0027] In this embodiment of the invention, the heating platform 6 is provided with a groove for accommodating the textured microcrystalline glass 5.

[0028] In some embodiments of the present invention, the polishing system further includes a first moving mechanism for driving the focusing system to move relative to the processing platform 4 in the horizontal and vertical directions.

[0029] In other embodiments of the present invention, the polishing system further includes a second moving mechanism for driving the heating platform 6 to move in the horizontal and vertical directions.

[0030] like Figure 2 The diagram shown is a schematic diagram of a polishing system for textured microcrystalline glass provided in an embodiment of the present invention. The laser is emitted by the laser 1, and after being adjusted by the beam expander 2, it reaches the reflector 3. The reflector 3 is used to change the path of the laser so that the laser is directed towards the focusing lens 8. After being focused by the focusing lens 8, the laser is directed towards the upper surface of the textured microcrystalline glass 5 to form a circular spot. The energy distribution focused on the glass surface is in a flat-top mode. The lower surface of the textured microcrystalline glass 5 is placed in the groove of the heating platform 6.

[0031] In this process, the position of the laser beam on the surface of the textured microcrystalline glass 5 is changed by moving the position of the focusing lens 8, thus forming a polishing path. Alternatively, the position of the textured microcrystalline glass 5 can also be moved to change the position of the laser beam on its surface, forming a polishing path. During this process, the laser emission from the laser 1 is intermittent, and the positions of the focusing lens 8 and the textured microcrystalline glass 5 are intermittently fixed. During these pauses, the laser beam emitted by the laser 1 polishes the surface of the textured microcrystalline glass 5 with a circular spot through the focusing lens 8. The intermittent emission of the laser 1 reduces its own consumption. The time the laser spends at the positions of the focusing lens 8 and the textured microcrystalline glass 5 is used for polishing; the pause point is the polishing point, and the time spent at the polishing point is a preset time. This preset time ensures that the laser can sufficiently conduct heat to the glass.

[0032] In a preferred embodiment, the laser 1, beam expander 2, reflector 3 and focusing lens 8 are fixedly connected by an overhead crane structure. The overhead crane structure can adjust the distance between the focusing lens 8 and the textured microcrystalline glass 5, thereby adjusting the size of the laser spot formed on the textured microcrystalline glass 5. The overhead crane structure can also move in a direction parallel to the textured microcrystalline glass 5, thereby adjusting the position of the laser on the surface of the textured microcrystalline glass 5 and forming a polishing path.

[0033] In a preferred embodiment, the laser 1, beam expander 2, reflector 3, and focusing lens 8 are fixed above the heating platform 6. A mechanical shaft is connected to the heating platform 6 in a direction opposite to the focusing lens 8 to adjust the distance between the heating platform 6 and the focusing lens 8, thereby adjusting the spot size formed by the laser on the textured microcrystalline glass 5. A mechanical shaft assembly is arranged on the heating platform 6 in a direction parallel to the focusing lens 8. This mechanical shaft assembly consists of at least two non-parallel mechanical shafts and is used to adjust the position of the laser on the surface of the textured microcrystalline glass 5, forming a polishing path.

[0034] As a preferred embodiment, such as Figure 3 The diagram shown is a schematic representation of a polishing system for texturing microcrystalline glass according to another embodiment of the present invention. Other components in this embodiment are the same as those in the present invention. Figure 2 The embodiment is the same, except that the focusing lens 8 is replaced with a galvanometer and a field lens 7. The galvanometer can serve only a focusing function. Figure 2 Similar to the embodiment, the relative position of the focusing system and the surface of the textured glass-ceramic 5 is changed to form a polishing path. Alternatively, the emission angle of the laser beam can be controlled by a galvanometer, changing the position of the laser spot on the surface of the textured glass-ceramic 5 to form a polishing path. Since the galvanometer adjusts the beam angle faster than the focusing lens 8 relative to the textured glass-ceramic 5, its disadvantage lies only in the adjustment area. Therefore, the galvanometer can be used to adjust the beam angle for small-format applications, while the focusing lens 8 is used only for large-format products where it is not feasible.

[0035] As a preferred embodiment, such as Figure 4 When processing the part 01 that requires laser drilling, the laser cutting path is the drilling diameter 011. At this time, the polishing device performs polishing operation according to the first polishing diameter 012. The first polishing diameter 012 is composed of multiple sets of circular areas that partially overlap, are connected end to end, and are uniformly stacked. The circular areas are formed by the irradiation of a circular spot formed by the laser on the surface of the textured microcrystalline glass 5.

[0036] As a preferred embodiment, such as Figure 5 When processing the workpiece 02 that requires laser cutting, the laser cutting path is the cutting diameter 021. At this time, the polishing device performs polishing operation according to the second polishing diameter 022. The second polishing diameter 022 is formed by multiple sets of circular areas that are partially and uniformly overlapped. The circular areas are formed by the irradiation of circular light spots formed by the laser on the surface of the textured microcrystalline glass 5.

[0037] As a preferred embodiment, such as Figure 6 This is a schematic diagram of the effect after laser polishing. Area A is the glass surface after laser polishing, and the roughness can reach 10-100nm. The yield of subsequent laser cutting can be improved from 75-80% to 99.8%.

[0038] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A polishing method for texturing microcrystalline glass, characterized in that: The polishing method is used to polish the processing area before laser cutting or drilling, and the polishing method includes the following steps: S1. Place the textured microcrystalline glass to be processed onto a processing platform with heating function, and heat the textured microcrystalline glass to 200-400 degrees Celsius. S2. Set the polishing path according to the position and shape of the processing area; S3. Polish the textured microcrystalline glass using a laser along the polishing path. During polishing, the laser stays at each polishing point for 50 to 1000 ms.

2. The polishing method for texturing microcrystalline glass according to claim 1, characterized in that: The dwell time in step S3 is achieved by controlling the emission time of the laser source.

3. A polishing method for texturing microcrystalline glass according to any one of claims 1 or 2, characterized in that: In step S3, the laser beam acting on the glass surface during polishing is a laser beam with positive defocus.

4. A polishing system for texturing microcrystalline glass, characterized in that: Includes laser (1), beam expander (2), mirror (3), focusing system, and processing platform (4); The laser (1) is used to emit a laser beam to polish the processing area before laser cutting or drilling; The beam expander (2) is disposed on the laser beam output optical path of the laser (1) to expand the spot diameter of the laser beam and reduce its energy density; The reflector (3) is used to redirect the optical path of the expanded laser beam; The focusing system is used to focus the redirected laser beam onto the surface of the textured microcrystalline glass (5); The processing platform (4) is used to support the textured microcrystalline glass (5) and cooperates with the focusing system to realize the scanning of the laser beam on the surface of the textured microcrystalline glass (5); The processing platform (4) is provided with a heating platform (6), which is configured to preheat the texturized microcrystalline glass (5) to 200°C to 400°C before laser processing.

5. A polishing system for texturing microcrystalline glass according to claim 4, characterized in that: The focal length of the focusing system is 75–300 mm.

6. A polishing system for texturing microcrystalline glass according to claim 4, characterized in that: The focusing system is a combination of a galvanometer and a field lens (7).

7. A polishing system for texturing microcrystalline glass according to claim 4, characterized in that: The focusing system is a focusing lens (8), which is a cylindrical convex lens or a DOE optical component.

8. A polishing system for texturing microcrystalline glass according to claim 4, characterized in that: The heating platform (6) is provided with a groove for accommodating the textured microcrystalline glass (5).

9. A polishing system for texturing microcrystalline glass according to claim 4, characterized in that: The polishing system further includes a first moving mechanism for driving the focusing system to move relative to the processing platform (4) in the horizontal and vertical directions.

10. A polishing system for texturing glass-ceramics according to claim 4, characterized in that: The polishing system further includes a second moving mechanism for driving the heating platform (6) to move in the horizontal and vertical directions.