Method for operating a particle radiation device, computer program product and particle radiation device for performing the method

Abstract

The invention relates to a method for operating a particle radiation device for imaging, analyzing and / or processing an object. The invention further relates to a computer program product and to a particle radiation device for carrying out the method. The method comprises the following steps: determining a working distance; directing and / or shaping the particle beam using a converging lens to produce a first intersection of the particle beam in an objective lens; guiding and / or shaping the particle beam using the objective lens to produce a second intersection of the particle beam that can be arranged on the object; and deflecting the particle beam to a position associated with the working distance along the optical axis of the particle radiation device using a deflection device arranged in the objective lens as a function of the working distance, the deflection device being actuated by means of a control signal in such a way that aberrations generated by the objective lens are reduced.

Description

TECHNICAL FIELD

[0001] The present application relates to a method for operating a particle radiation device for imaging, analyzing and / or processing an object. Furthermore, the present application also relates to a computer program product and a particle radiation device for carrying out the method. The particle radiation device is designed, for example, as an electron radiation device and / or an ion radiation device. BACKGROUND

[0002] Electron radiation devices, in particular scanning electron microscopes (hereinafter also referred to as SEM) and / or transmission electron microscopes (hereinafter also referred to as TEM), are used for investigating objects (hereinafter also referred to as samples) in order to gain knowledge about their properties and behavior under certain conditions.

[0003] In the case of a SEM, an electron beam (hereinafter also referred to as primary electron beam) is generated by means of a beam generator and focused by means of a beam guiding system onto the object to be investigated. The primary electron beam is guided by means of deflection means in the form of a scanning device over the surface of the object to be investigated. The electrons of the primary electron beam interact here with the object to be investigated. As a result of the interaction, in particular electrons (so-called secondary electrons) are emitted from the object and electrons of the primary electron beam are returned scattered (so-called backscattered electrons). The secondary electrons and the backscattered electrons are detected and used for generating an image. Thereby, an imaging of the object to be investigated is obtained. Furthermore, in the interaction interaction radiation is generated, for example X-ray radiation and / or cathodoluminescence, which is detected by means of a detector and subsequently evaluated for analyzing the object.

[0004] In the case of a TEM, likewise a primary electron beam is generated by means of a beam generator and guided by means of a beam guiding system onto the object to be investigated. The primary electron beam transmits the object to be investigated. The electrons of the primary electron beam interact with the material of the object to be investigated when the primary electron beam passes through the object to be investigated. The electrons that have penetrated the object to be investigated are imaged on a light screen or on a detector, for example a camera, by means of a system consisting of an objective and a projection lens (Projektiv). Here, the imaging can also be carried out in a scanning mode of the TEM. Such a TEM is generally referred to as STEM. It can also be proposed that electrons that are returned scattered at the object to be investigated and / or secondary electrons that are emitted from the object to be investigated are detected by means of a further detector in order to image the object to be investigated.

[0005] It is known to combine the functions of a STEM and a SEM in a single particle radiation device. Thereby, the object can be investigated by means of the SEM function and / or the STEM function by means of such a particle radiation device.

[0006] Furthermore, particle radiation devices with an ion radiation column are known. Ions for processing an object are generated by means of an ion beam generator arranged in the ion radiation column. During the processing, material of the object is, for example, abraded or material is applied to the object, for example by means of a gas feed. In addition or alternatively, the ions are used for imaging.

[0007] Furthermore, it is known from the prior art that combined devices are used to investigate objects, in which not only electrons but also ions can be directed onto the object to be investigated. It is known, for example, to equip a SEM with an ion radiation column. Ions are generated by means of an ion beam generator arranged in the ion radiation column, which are used for preparing the object (for example, abrading material of the object or applying material to the object) or also for imaging. For this purpose, the ions are scanned over the object by means of deflection means in the form of a scanning device. The SEM is used here, inter alia, to observe the preparation process, but also to further investigate the prepared or unprepared object.

[0008] When producing an object image, it is possible for the object to be imaged with a high local resolution by means of the particle radiation device. This is achieved, inter alia, by a very small diameter of the primary electron beam in the object plane. Furthermore, the higher the initial acceleration of the electrons of the primary electron beam in the particle radiation device and, finally, the deceleration to the desired landing energy in the objective or in the region between the objective and the object (referred to as landing energy), the higher the local resolution can be. The electrons of the primary electron beam are accelerated, for example, with an acceleration voltage of 2 kV to 30 kV and are guided by means of the electron radiation column of the particle radiation device. Only in the region between the objective and the object, the electrons of the primary electron beam are decelerated to the desired landing energy, with which the electrons hit the object. The landing energy of the electrons of the primary electron beam is in the range from 10 eV to 30 keV, for example.

[0009] In order to scan the particle beam over the object, it is known to arrange a scanner device at the particle radiation device. The scanner device is designed, for example, as a deflection device. The deflection device has a first deflection unit and a second deflection unit, wherein the first deflection unit and the second deflection unit are arranged in succession along the optical axis of the particle radiation device. By means of a deflection combination of the particle beam (the deflection can be effected by means of the first deflection unit and the second deflection unit), the position of a virtual turning point (Kipp point) of the particle beam can be moved along the optical axis of the particle radiation device, wherein the deflection appears as if it were produced by a tilt around this turning point.

[0010] It is known to operate a particle radiation device in a so-called "fish-eye mode" in order to produce a large image of an object, for example in the form of a large semiconductor wafer. This large image is used, for example, for navigation of the object and / or of another structural unit of the particle radiation device relative to the object in a sample chamber of the particle radiation device. In order to implement the "fish-eye mode", a first deflection unit and a second deflection unit produce deflections, for example, in the same direction. In this way, a rather large overview image of the object is obtained. In other words, a rather large image field of the particle radiation device is provided by the fish-eye mode. Furthermore, it is known that, in order to implement the fish-eye mode, the objective of the particle radiation device should be strongly excited. In this way, a large deflection angle is achieved for the particle beam focused by the objective, so that a large-area region of the object can be imaged. However, the fish-eye mode, which provides a large deflection angle for the particle beam, usually leads to aberrations, which are visible in the image of the large-area region of the object produced. These aberrations can lead to errors in the navigation of the object and / or of other structural units of the particle radiation device relative to the object in the sample chamber.

[0011] With regard to the prior art, reference is made to DE 10 2010 053 194 A1 and DE 10 2011 076 893 A1. SUMMARY

[0012] The basic object of the present application is to give a method and a particle radiation device for carrying out the method, by means of which a large image field of the particle radiation device is always achieved in different operating modes of the particle radiation device, so that errors in the navigation of the object and / or of other structural units of the particle radiation device relative to the object in a sample chamber of the particle radiation device are small.

[0013] According to the application, this object is achieved by a method having the features of claim 1. A computer program product having program code is given by claim 16, which controls a particle radiation device to carry out the method. Furthermore, a particle radiation device for imaging, analyzing and / or processing an object is given, which has the features of claim 17. Further features of the application result from the following description, the claims and / or the drawings.

[0014] The method according to the application serves for operating a particle radiation device for imaging, analyzing and / or processing an object. The particle radiation device has at least one beam generator for generating a particle beam with charged particles. These charged particles are, for example, electrons or ions. Furthermore, the particle radiation device has an objective for guiding and / or shaping the particle beam, in particular for focusing the particle beam onto the object. In the region between the beam generator and the objective, at least one converging lens is arranged along the optical axis of the particle radiation device.

[0015] In the method according to the application, the distance is determined using the control device of the particle radiation apparatus. The distance is given by (a) an object distance between an outer boundary of the objective of the particle radiation apparatus and the object or (b) a focal plane distance between an outer boundary of the objective of the particle radiation apparatus and a focal plane of the objective. The above-mentioned distance according to case (a) or case (b) is also referred to as working distance. The way of determining this distance will be explained in detail below.

[0016] Furthermore, in the method according to the application, the particle beam is guided and / or shaped using a condenser lens arranged between the beam generator and the objective in order to produce a first crossover in the objective. The control device is used to operate the condenser lens with a preset value of the condenser lens current in order to produce the first crossover. Here, the crossover is understood in both the above and below as a point or region of convergence of the particle beam generated by the beam generator. In other words, the particles meet at this point or in this region. In yet other words, the crossover is also understood as a region or plane in which the dimension of the particle beam emitted from the beam generator in a direction perpendicular to the direction of propagation of the particle beam has a local minimum. If the particle beam is approximately Gaussian distributed perpendicular to the direction of propagation, the crossover along the direction of propagation is the region of the Gaussian bell curve in which the width is smallest. Thus, the width of the bell curve before and after the crossover, respectively, is greater than the width at the crossover, seen along the beam direction (direction of propagation). In the case of stigmatic focusing of the particle beam, the crossover is generally understood as the plane between the two (or two) line foci in which the particle beam has a rotationally symmetrical intensity distribution whose dimension perpendicular to the direction of propagation of the particle beam is smallest.

[0017] Furthermore, in the method according to the application, the particle beam is guided / shaped using the objective such that a second crossover of the particle beam is produced which can be arranged on the object. For this purpose, the control device is used to operate the objective with a preset value of the objective current. In this regard, in the method according to the application, two kinds of crossover are produced: on the one hand the first crossover and on the other hand the second crossover. Seen in the direction from the beam generator towards the object, the first crossover is arranged along the optical axis of the particle radiation apparatus, followed by the second crossover.

[0018] The particle radiation device has a deflection device arranged in the objective, which deflection device is provided with at least one first deflection unit and at least one second deflection unit. The deflection device is designed, for example, as a scanning device of the particle radiation device. Viewed in the direction of the beam generator towards the objective, the first deflection unit is arranged first along the optical axis, followed by the second deflection unit. The first deflection unit and / or the second deflection unit is arranged, for example, in the objective of the particle radiation device. It is proposed, in particular, that the first deflection unit and / or the second deflection unit is arranged in the objective along the optical axis of the particle radiation device. The first deflection unit is designed, for example, as an electrostatic and / or magnetic deflection unit. It is proposed, for example, in addition, that the second deflection unit is designed as an electrostatic and / or magnetic deflection unit.

[0019] In the method according to the application it is proposed that the particle beam generated by the beam generator of the particle radiation device is deflected by means of the deflection device to a position along the optical axis of the particle radiation device in accordance with the determined distance, i.e. the determined working distance. This position is therefore associated with the determined distance. In other words, the particle beam is guided by means of the deflection device to this position along the optical axis of the particle radiation device in accordance with the determined working distance. The above-mentioned position of the particle beam along the optical axis of the particle radiation device is, for example, the turning point of the particle beam, which has already been explained above. In addition, the above-mentioned position of the particle beam along the optical axis is arranged in the second deflection unit. The control device of the particle radiation device manipulates the deflection device by means of the control signal in such a way that the aberration generated by the objective is reduced. The aberration generated by the objective is smaller compared to the aberration generated by the objective if the particle beam is not deflected to the above-mentioned position. In the ideal case, the control device of the particle radiation device manipulates the deflection device by means of the control signal in such a way that the aberration generated by the objective is avoided.

[0020] By the above-mentioned generation of the first intersection and the second intersection and by the above-mentioned deflection of the particle beam to a position along the optical axis of the particle radiation device, the aberration generated by the objective is reduced or, in the ideal case, completely avoided in the application. As a result, a large field of view with smaller and / or no aberration can be achieved compared to the prior art. Thus, on the basis of the application, a large field of view of the particle radiation device can always be achieved in different operating modes of the particle radiation device, so that the navigation error of the particle radiation device to another structural element of the particle radiation device with respect to the object and / or the object in the sample chamber of the particle radiation device is small.

[0021] It is proposed, for example, that the first intersection is arranged in the region of the pole gap of the pole piece of the objective. It is proposed, in particular, that the first intersection and / or the second deflection unit is arranged in the region of the pole gap of the pole piece of the objective.

[0022] It is additionally or alternatively proposed in an embodiment of the method according to the application that the control device of the particle radiation device manipulates the deflection device in such a way that the aberration generated by the objective is minimized.

[0023] In another embodiment of the method according to the invention, it is additionally or alternatively proposed that a control device is used to operate the first deflection unit by means of a first control signal. Furthermore, a control device is used to operate the second deflection unit by means of a second control signal. The position of the particle beam associated with a determined distance is determined by the ratio of the first control signal to the second control signal. In other words, the position associated with the determined distance depends on the ratio of the first control signal to the second control signal.

[0024] In yet another embodiment of the method according to the invention, it is additionally or alternatively proposed that a control device be used to set and / or determine the landing energy of the particles of the particle beam that strike the object. For example, determining the landing energy includes measuring the landing energy and / or reading the landing energy from a landing energy measuring device. Preset values ​​for the objective lens current and / or converging lens current are selected based on the landing energy. Thus, in this embodiment, the first cross also depends on the landing energy of the particles of the particle beam; the second cross is independent of the landing energy of the particles of the particle beam and is always located at the position of the object. For example, in the embodiment of the method according to the invention explained herein, a control device having acceleration and / or deceleration devices for the particles of the particle beam is used as the control device.

[0025] In yet another embodiment of the method according to the invention, it is additionally or alternatively proposed that the distance be determined by setting a preset value for the converging lens current, wherein the preset value for the objective lens current remains constant. Therefore, in this embodiment of the method according to the invention, the working distance is set solely by the converging lens. The objective lens current remains constant. In other words, the objective lens current is constant.

[0026] In an embodiment of the method according to the invention, it is additionally or alternatively proposed that the distance according to case (a) (i.e., determining the working distance) be determined by the relative movement of the object relative to the objective lens and / or by determining the object distance. Determining the object distance includes, for example, measuring the object distance and / or reading the object distance at a measuring device. In yet another embodiment of the method according to the invention, it is additionally or alternatively proposed that the distance according to case (b) be determined by manipulating the objective lens to position the focal plane of the objective lens and / or by determining the focal plane distance. Determining the focal plane distance includes, for example, measuring the focal plane distance and / or reading the focal plane distance at a measuring device.

[0027] In another embodiment of the method according to the application it is additionally or alternatively proposed that the distance (i.e. the working distance) is determined by at least one of the following method steps: (i) moving the object holder arranged with the object along the optical axis of the particle radiation device; (ii) moving the object holder arranged with the object relative to the optical axis of the particle radiation device, wherein the movement is not performed perpendicular to the optical axis; (iii) moving the objective of the particle radiation device along the optical axis of the particle radiation device using a movement device; and (iv) moving the objective of the particle radiation device relative to the optical axis using a movement device, wherein the movement is not performed perpendicular to the optical axis.

[0028] In yet another embodiment of the method according to the application it is additionally or alternatively proposed that the position of the particle beam along the optical axis associated with the determined distance (i.e. the determined working distance) is calculated using a control device. For example, the associated position can be calculated by means of a simulation of the course of the particle beam under predefinable and settable conditions. These conditions include, for example, control parameter values of the structural units of the particle radiation device by means of which the course of the particle beam in the particle radiation device and / or the shape of the particle beam can be influenced. In the simulation, in particular a linear approximation calculation or a method also known as "Ray Tracing" can be used. For example, after the position associated with the determined distance has been calculated, the particle beam is deflected to this position along the optical axis of the particle radiation device using a deflection device.

[0029] In still another embodiment of the method according to the application it is additionally or alternatively proposed that the associated position of the particle beam along the optical axis changes when the determined distance (i.e. the determined working distance) changes. Thus, in this embodiment of the method according to the application the determined distance is a first distance, the associated position of the particle beam along the optical axis is a first associated position, the object distance is a first object distance, the focal plane distance is a first focal plane distance, and the predefinable value of the condenser lens current is a first predefinable value of the condenser lens current. This embodiment of the method according to the application has the following method steps:

[0030] - determining a second distance using the control device of the particle radiation device, wherein the second distance is greater than or smaller than the first distance, and wherein the second distance is given by (c) a second object distance between the outer boundary of the objective of the particle radiation device and the object or (d) a second focal plane distance between the outer boundary of the objective of the particle radiation device and the focal plane of the objective;

[0031] - guiding and / or shaping the particle beam using the condenser lens such that a further first intersection of the particle beam in the objective is produced. For this purpose, the control device is used to operate the condenser lens with a further predefinable value of the condenser lens current;

[0032] - In this embodiment of the method according to the application, the value of the objective current is constant. The particle beam is guided and / or shaped using the objective such that the particle beam produces a further second intersection at the object;

[0033] - The particle beam generated by the beam generator of the particle radiation device is deflected by the deflection device to a second position along the optical axis of the particle radiation device in accordance with the determined second distance, i.e. the determined second working distance. This second position is therefore associated with the determined second distance. In other words, the particle beam is guided by the deflection device to this second position along the optical axis of the particle radiation device in accordance with the determined second working distance. The above-mentioned second position of the particle beam along the optical axis of the particle radiation device is, for example, a further turning point of the particle beam. Furthermore, the above-mentioned second position of the particle beam along the optical axis is arranged within the second deflection unit. In this embodiment of the method according to the application, the control device of the particle radiation device also manipulates the deflection device by means of a further control signal such that the aberrations produced by the objective can be reduced in a predefinable manner. By the production of the above-mentioned further first intersection and further second intersection and by the above-mentioned deflection of the particle beam to a second position along the optical axis of the particle radiation device, the aberrations produced by the objective are reduced or, in the ideal case, avoided in the present application. The above-mentioned embodiments with regard to the reduction of the aberrations also apply accordingly here. Thus, in this embodiment, too, a large image field with less and / or no aberrations can be achieved compared to the prior art.

[0034] It is proposed, for example, that the further first intersection is arranged in the region of the pole gap of the pole piece of the objective.

[0035] It is additionally or alternatively proposed in an embodiment of the method according to the application that the greater the working distance, the closer the first position and / or the second position is to the object.

[0036] It is additionally or alternatively proposed in an embodiment of the method according to the application that the position of the particle beam along the optical axis associated with the determined distance, i.e. the determined working distance, is loaded into the control device from a database and / or a storage unit. The particle beam is then deflected using the deflection device such that the particle beam is guided to the loaded position. In other words, it is proposed in this embodiment of the method according to the application that the relationship of the position of the turning point to the working distance is stored in a database and / or a storage unit. If the working distance is determined, the associated position can be loaded and set from the database and / or the storage unit. The above-mentioned embodiments of the method according to the application are implemented, for example, for loading the above-mentioned first position and / or the second position.

[0037] In another embodiment of the method according to the application it is additionally or alternatively proposed that the central path of the particle beam has an axial distance from the optical axis of the particle radiation device at the position along the optical axis. In the case of the determined distance, the axial distance of the central path of the particle beam at the position along the optical axis is smaller than all other axial distances of the central path of the particle beam from the optical axis of the particle radiation device, wherein the other axial distances are arranged between the center of the second deflection unit of the deflection device and the object for the determined distance according to case (a) and wherein the other axial distances are arranged between the center of the second deflection unit of the deflection device and the focal plane for the determined distance according to case (b).

[0038] In yet another embodiment of the method according to the application it is additionally or alternatively proposed that the objective lens generates a magnetic field excited by an objective lens current. The magnetic field has a local distribution along the optical axis of the particle radiation device in the region of the objective lens. The local distribution of the magnetic field has a half-value width. The first intersection of the particle beam lies within the half-value width of the local distribution. The second intersection of the particle beam always lies at the position of the object. Additionally or alternatively, the associated position lies within the half-value width of the local distribution. Considerations have shown that the method according to the application is performed particularly well when the first intersection of the particle beam is arranged within the half-value width of the local distribution of the magnetic field of the objective lens.

[0039] In still another embodiment of the method according to the application it is additionally or alternatively proposed that an electrostatic and / or magnetic deflection device is used as the deflection device.

[0040] In an embodiment of the method according to the application it is additionally or alternatively proposed that the particle beam is defocused by the objective lens such that a maximum deflection of the particle beam relative to the optical axis of the particle radiation device is achieved.

[0041] All of the above and below described embodiments of the method according to the application are not restricted to the method step sequence set out. The application also comprises different method step sequences which are suitable to achieve the objects of the application. Alternatively or additionally, in the method according to the application it is also proposed that at least two method steps are performed in parallel. Furthermore, the above and below described embodiments of the method according to the application are not restricted to the full scope of all method steps mentioned above or below. In particular it is proposed that in further embodiments individual or several of the above or below described method steps are omitted.

[0042] The present application also relates to a computer program product having a program code, which can be loaded into or is loaded into a processor of a particle radiation device, wherein the program code, when executed in the processor, controls the particle radiation device such that a method having at least one of the above or below mentioned features or a method having a combination of at least two of the above or below mentioned features is carried out. In other words, the present application also relates to a non-transitory computer readable medium having software, which can be loaded into or is loaded into a processor of a particle radiation device, wherein the software, when executed in the processor, controls the particle radiation device such that a method having at least one of the above or below mentioned features or a method having a combination of at least two of the above or below mentioned features is carried out. The software comprises executable code for carrying out at least one method step.

[0043] In this regard, the present application also relates to a processor, which is arranged at a particle radiation device and is designed to carry out a method having at least one of the above or below mentioned features or to carry out a method having a combination of at least two of the above or below mentioned features.

[0044] The present application also relates to a particle radiation device for imaging, analyzing and / or processing an object, wherein the particle radiation device has been set out above and will be set out further below. This will be briefly outlined below. The particle radiation device according to the present application has at least one beam generator for generating a particle beam with charged particles. The charged particles are for example electrons or ions. Furthermore, the particle radiation device according to the present application has at least one condenser lens for directing and / or shaping the particle beam onto the object. Furthermore, the particle radiation device according to the present application has at least one objective for directing and / or shaping, in particular focusing, the particle beam onto the object. For example, the condenser lens is arranged in a region between the beam generator and the objective. Furthermore, the particle radiation device according to the present application has at least one deflection device, which is provided with at least one first deflection unit and at least one second deflection unit. Viewed in the direction of the objective from the beam generator, for example along the optical axis, first the first deflection unit and then the second deflection unit are arranged. The first deflection unit and / or the second deflection unit are arranged within the objective of the particle radiation device. In particular, it is proposed that the first deflection unit and / or the second deflection unit are arranged within the objective along the optical axis of the particle radiation device. The first deflection unit is for example designed as an electrostatic and / or magnetic deflection unit. Furthermore, for example, it is proposed that the second deflection unit is designed to be electrostatic and / or magnetic. Furthermore, the method according to the present application has at least one control device, which is provided with at least one processor. In the processor, a computer program product having the above-mentioned features is loaded.

[0045] It is additionally or alternatively proposed in an embodiment of the particle radiation apparatus according to the application that the first deflection unit is arranged in the objective on the side of the objective facing the beam generator. It is additionally or alternatively further proposed that the second deflection unit is arranged in the objective on the side of the objective facing the object.

[0046] It is additionally or alternatively proposed in a further embodiment of the particle radiation apparatus according to the application that the particle radiation apparatus has at least one detector unit for detecting interaction particles and / or interaction radiation resulting from the interaction of the particle beam with the object. It is additionally or alternatively proposed that the particle radiation apparatus has at least one acceleration device for accelerating the particles and / or a deceleration device for decelerating the particles in the particle radiation apparatus.

[0047] It is additionally or alternatively proposed in yet another embodiment of the particle radiation apparatus according to the application that the particle radiation apparatus has an object holder designed to be movable, the object being arrangeable at the object holder. For example, the object holder is a stage designed to be movable, a so-called platform. It is additionally or alternatively proposed that the particle radiation apparatus according to the application has a movement device for moving the objective.

[0048] It is additionally or alternatively proposed in a further embodiment of the particle radiation apparatus according to the application that the beam generator is designed as a first beam generator and the particle beam is formed as a first particle beam with first charged particles. The objective is designed as a first objective for focusing the first particle beam onto the object. Furthermore, the particle radiation apparatus according to the application has at least one second beam generator for generating a second particle beam with second charged particles. Furthermore, the particle radiation apparatus according to the application has at least one second objective for focusing the second particle beam onto the object. The second charged particles are, for example, electrons or ions.

[0049] It is additionally or alternatively proposed in an embodiment of the particle radiation apparatus according to the application that the first deflection unit and / or the second deflection unit is designed to be layered. It is in particular proposed in an embodiment that the first deflection unit and / or the second deflection unit is designed to have a plurality of layers. For example, the magnetic unit of the first deflection unit and / or the second deflection unit is designed to have a plurality of layers. In particular, the first deflection unit and / or the second deflection unit has more than one layer of saddle coils for the x direction and the y direction in order to increase the deflection at constant current. The layers are here, for example, connected in series.

[0050] In addition or alternatively it is proposed in a further embodiment of the particle radiation device according to the application that the objective has at least one pole piece, which is provided with a pole piece gap. The size and / or shape of the pole piece gap is for example settable. To this end, the objective has a setting device, by means of which the size and / or shape of the pole piece gap can be set.

[0051] It is in particular proposed that the particle radiation device according to the application is designed as an electron radiation device and / or as an ion radiation device. BRIEF DESCRIPTION OF DRAWINGS

[0052] Further practical embodiments and advantages of the application are described below in connection with the drawings. In the drawings:

[0053] Figure 1 A schematic diagram of a first embodiment of a particle radiation device according to the application is shown;

[0054] Figure 2 A schematic diagram of a second embodiment of a particle radiation device according to the application is shown;

[0055] Figure 3 A schematic diagram of a third embodiment of a particle radiation device according to the application is shown;

[0056] Figure 4 A schematic diagram of an embodiment of a movable object table is shown;

[0057] Figure 5 A further schematic diagram of an embodiment of a movable object table according to Figure 4 the application is shown;

[0058] Figure 6 A schematic diagram of a flow of a first embodiment of a method according to the application is shown;

[0059] Figure 7 A schematic diagram of a flow of a second embodiment of a method according to the application is shown;

[0060] Figure 8 A schematic diagram of a flow of a third embodiment of a method according to the application is shown;

[0061] Figure 9 A schematic diagram of a flow of a fourth embodiment of a method according to the application is shown;

[0062] Figure 10 A schematic diagram of a flow of a fifth embodiment of a method according to the application is shown; and

[0063] Figure 11 A schematic diagram of the objective magnetic field versus z coordinate is shown. DETAILED DESCRIPTION

[0064] The present application will now be elucidated in detail by means of a particle radiation apparatus in the form of an SEM and in the form of a combined apparatus with an electron radiation column and an ion radiation column. It is explicitly stated that the present application can be applied to any particle radiation apparatus, in particular to any electron radiation apparatus and / or any ion radiation apparatus.

[0065] Figure 1 A schematic diagram of an embodiment of a particle radiation apparatus according to the present application in the form of an SEM 100 is shown. The SEM 100 has a beam generator 1 with an electron source, an extraction electrode 2, a control electrode 3 and an anode 4. The anode 4 constitutes the source-side end of a beam guide tube 21 of the SEM 100. The beam generator 1 is designed, for example, as a hot field emitter. Alternatively, the beam generator 1 is designed, for example, as a hot tungsten emitter or a lanthanum hexaboride (LaB6) emitter.

[0066] The electrons emitted from the beam generator 1 form a primary electron beam. The electrons are accelerated to the anode potential due to the potential difference between the beam generator 1 and the anode 4. The potential of the anode 4 is in the range of, for example, +1 kV to 30 kV compared to the potential of the beam generator 1, so that the electrons have a kinetic energy in the range of 1 keV to 30 keV.

[0067] The SEM 100 has, along an optical axis 20, first a first condenser lens 5 and then a second condenser lens 6, seen in the direction from the anode 4 towards the objective 10. Between the first condenser lens 5 and the second condenser lens 6, a baffle unit 7 is arranged in the beam guide tube 21. The baffle unit 7 is designed, for example, as a multi-leaf baffle unit. Figure 1 In the SEM 100 shown, the objective 10 is designed as a magnetic lens and has a pole piece 22 with a pole piece gap 23. An annular coil 11 for generating a magnetic field of the objective 10 is arranged in the pole piece 22.

[0068] Arranged along the optical axis 20 of the SEM 100, viewed in the direction of the objective 10 starting from the second condenser lens 6, are deflection devices having a first deflection unit 9 and a second deflection unit 12. The first deflection unit 9 is arranged at least partially, in particular completely, on the source side within the objective 10. In contrast, the second deflection unit 12 is arranged on the object side within the objective 10 on the beam guide tube 21. The first deflection unit 9 and the second deflection unit 12 are, for example, crossed beam deflection units. In other words, the first deflection unit 9 and the second deflection unit 12 are each designed such that they deflect the primary electron beam in two mutually non-parallel directions, which are oriented perpendicular to the direction of the optical axis 20. For example, the first deflection unit 9 and / or the second deflection unit 12 are designed as magnetic deflection units. In particular, the first deflection unit 9 and / or the second deflection unit 12 each have, respectively, for example, four hollow coils arranged around the optical axis 20 of the SEM 100. The application is not, however, limited to the number of hollow coils mentioned. Rather, any number of hollow coils suitable for the application can be used. It is additionally or alternatively proposed that the first deflection unit 9 and / or the second deflection unit 12 are designed as electrostatic deflection units. In particular, the first deflection unit 9 and / or the second deflection unit 12 each have, respectively, for example, four electrodes arranged around the optical axis 20 of the SEM 100, which can be applied with different electrostatic potentials. The application is not, however, limited to the number of electrodes mentioned. Rather, any number of electrodes suitable for the application can be used.

[0069] It is additionally or alternatively proposed in embodiments of the SEM 100 that the first deflection unit 9 and / or the second deflection unit 12 are designed as layered. It is proposed in particular in embodiments that the first deflection unit 9 and / or the second deflection unit 12 are designed with multiple layers. For example, the magnetic units of the first deflection unit 9 and / or the second deflection unit 12 are designed with multiple layers. In particular, the first deflection unit 9 and / or the second deflection unit 12 have more than one layer of saddle coils for the x-direction and the y-direction in order to increase the deflection at constant current. The layers here, for example, are connected in series.

[0070] As set out above, the objective 10 has a pole piece 22, which is provided with a pole piece gap 23. The size and / or shape of the pole piece gap 23 can be set, for example. To this end, the objective 10 has a setting device, with which the size and / or shape of the pole piece gap 23 can be set. The second deflection unit 12 is arranged in the region of and / or at the pole piece gap 23.

[0071] The objective 10 is arranged at the sample chamber 13. In particular, the objective 10 protrudes through an opening of the sample chamber 13 into an inner space of the sample chamber 13. Arranged in the inner space of the sample chamber 13 is a stage 19, which is designed to be movable. An object 15 can be arranged at the stage 19.

[0072] By means of the objective 10, the primary electron beam generated by the beam generator 1 and shaped by means of the first condenser lens 5 and / or the second condenser lens 6 is focused in the object plane 16. By appropriate activation of the first deflection unit 9 and the second deflection unit 12, it is ensured that the primary electron beam can be deflected in the object plane 16 perpendicular to the optical axis 20 of the SEM 100, so that the surface of the object 15 arranged in the object plane 16 can be scanned by different deflections of the primary electron beam. Here, the electrons of the primary electron beam interact with the object 15. As a result of the interaction, inter alia, electrons are emitted from the object 15 (so-called secondary electrons) and the electrons of the primary electron beam are backscattered (so-called backscattered electrons). The secondary electrons and the backscattered electrons are detected and used to generate an image. Thereby, an imaging of the object 15 to be investigated is obtained. Furthermore, in the interaction, interaction radiation is generated which is detected for the analysis of the object 15 and subsequently evaluated, for example X-ray radiation and / or cathodoluminescence.

[0073] For the detection of the above-mentioned interaction particles and / or the above-mentioned interaction radiation, for example, a first detector unit 14 is arranged in the sample chamber 13. In addition thereto or instead thereof, for example, a second detector unit 8 for detecting the above-mentioned interaction particles is arranged in the region between the first deflection unit 9 and the second condenser lens 6 in the beam guide 21.

[0074] In Figure 1 In the embodiment of the SEM 100 shown, a pressure stage holder 17 is provided, which can be arranged at a pole piece 22 of the objective 10, which pole piece protrudes into the sample chamber 13. The pressure stage holder 17 has a pressure stage with a baffle opening 18. Further pressure stages can be arranged, for example, within the beam guide 21 of the SEM 100. This is not shown in Figure 1 In Figure 1 Vacuum pumps are also not shown in which these are required to generate and maintain the vacuum required for operating the SEM 100 within the beam guide 21 and the sample chamber 13.

[0075] If the SEM 100 shall be operated in the sample chamber 13 under high vacuum conditions, the pressure staging plate holder 17 is not absolutely necessary and can thus be removed from the pole piece 22 of the objective 10. By contrast, if the SEM 100 shall be operated in the sample chamber 13 under a comparatively higher pressure (pressure range approximately 1 Pa to 3000 Pa), the pressure staging plate holder 17 shall be installed at the pole piece 22 of the objective 10, whereby the vacuum within the beam guiding tube 21 is kept sufficiently good by differential pumping despite the higher pressure in the sample chamber 13. With the pressure staging plate holder 17 installed, the edge of the baffle plate opening 18 within the pressure staging plate holder 17 can cause the image field which can be scanned in the object plane 16 to be cropped.

[0076] In particular, the first detector unit 14, the second detector unit 8, the first deflection unit 9 and the second deflection unit 12 are connected with a control device 123, which has a monitor 124. The control device 123 processes the detection signals which are generated by the first detector unit 14 and the second detector unit 8 and displays them in the form of an image on the monitor 124. The control device 123 further has a database 126 in which data are stored and from which data are read out. Furthermore, the control device 123 is connected with other units of the SEM 100. This is not further shown in Figure 1

[0077] The control device 123 of the SEM 100 has a processor 127. In the processor 127 a computer program product with program code is loaded, which, when executed, implements a method for operating the SEM 100. This will be further explained in more detail in the following.

[0078] In the SEM 100, the distance A can be set using the control device 123 of the SEM 100. The distance A is given by (a) an object distance between an outer boundary of the objective 10 of the SEM 100 and the object 15 or (b) a focal plane distance between an outer boundary of the objective 10 of the SEM 100 and a focal plane of the objective 10. The focal plane is for example located in the object plane 16. The above-mentioned distance A according to case (a) or case (b) is also referred to as working distance. The distance A is set for example under case (a) by moving the object table 19 and / or by moving the objective 10 by means of the movement device 25. In particular, under case (b) the distance A is set by a variation of the excitation of the objective 10 along the optical axis 20 of the SEM 100.

[0079] Figure 2 ​A schematic diagram of a further SEM 100 is shown. The further SEM 100 has a first beam generator in the form of an electron source 101 which is designed as a cathode. Furthermore, the further SEM 100 is provided with an extraction electrode 102 and an anode 103 which is plugged onto one end of a beam guide tube 104 of the further SEM 100. The electron source 101 is designed as a hot field emitter, for example. The invention is not restricted to such an electron source 101, however. Rather, any electron source which is suitable for the invention can be used.

[0080] Electrons emitted from the electron source 101 form a primary electron beam. The electrons are accelerated to the anode potential as a result of the potential difference between the electron source 101 and the anode 103. In the embodiment shown here, the anode potential is 100 V to 35 kV, for example 5 kV to 15 kV, in particular 8 kV, relative to the ground potential of the housing of the sample chamber 120. Alternatively, however, the anode potential can also be at ground potential.

[0081] Arranged at the beam guide tube 104 are two condenser lenses, namely a first condenser lens 105 and a second condenser lens 106. In this case, viewed in the direction from the electron source 101 towards the first objective 107, the first condenser lens 105 is arranged first and then the second condenser lens 106. It is expressly stated that other embodiments of the further SEM 100 can have only one single condenser lens. Arranged between the anode 103 and the first condenser lens 105 is a first baffle unit 108. The first baffle unit 108 is at the high voltage potential, i.e. the potential of the anode 103, or at ground together with the anode 103 and the beam guide tube 104. The first baffle unit 108 has a plurality of first baffle openings 108A, in Figure 2 One of the plurality of first baffle openings is shown in the middle. There are two first baffle openings 108A, for example. The opening diameter of each of the plurality of first baffle openings 108A is different. The desired first baffle opening 108A can be set onto the optical axis OA of the further SEM 100 by means of an adjustment mechanism (not shown). It is expressly stated that the first baffle unit 108 can have only one single first baffle opening 108A in other embodiments. In such an embodiment, no adjustment mechanism can be provided. The first baffle unit 108 is then designed to be positionally fixed. Arranged between the first condenser lens 105 and the second condenser lens 106 is a positionally fixed second baffle unit 109. Instead of this, it is proposed that the second baffle unit 109 is designed to be movable.

[0082] The first objective 107 has a pole piece 110 in which a hole is designed. The beam guide tube 104 is guided through this hole. Arranged in the pole piece 110 is a coil 111. Furthermore, the pole piece 110 also has a pole gap 23.

[0083] In the lower region of the beam guiding tube 104 an electrostatic deceleration device is arranged. This deceleration device has a separate electrode 112 and a tubular electrode 113. The tubular electrode 113 is arranged on the end of the beam guiding tube 104 which faces the object 125, which is arranged on an object holder 114 designed to be movable.

[0084] The tubular electrode 113 is at the potential of the anode 103 together with the beam guiding tube 104, while the separate electrode 112 as well as the object 125 are at a lower potential relative to the anode 103. In the present case this is the ground potential of the housing of the sample chamber 120. In this way the electrons of the primary electron beam can be decelerated to the desired energy required for the investigation of the object 125.

[0085] The object 125 and the separate electrode 112 can also be at a different and ground- independent potential. Thereby the position of the deceleration of the primary electron beam relative to the object 125 can be set. If the deceleration is performed for example at a position quite close to the object 125, the imaging errors are less.

[0086] The further SEM 100 also has a deflection device with a first deflection unit 130 and a second deflection unit 115. The first deflection unit 130 is arranged on the source side within the first objective 107. In contrast thereto, the second deflection unit 115 is arranged on the object side within the first objective 107 on the beam guiding tube 104. Furthermore, the second deflection unit 115 is arranged in the region of the pole gap 23 and / or at the pole gap 23 of the pole 110. The first deflection unit 130 and the second deflection unit 115 are crossed beam deflection units. In other words, the first deflection unit 130 and the second deflection unit 115 are both designed such that they deflect the primary electron beam in two mutually non-parallel directions, which are oriented perpendicular to the direction of the optical axis OA of the further SEM 100. For example, the first deflection unit 130 and / or the second deflection unit 115 are designed as magnetic deflection units. In particular, the first deflection unit 130 and / or the second deflection unit 115 each have, respectively, for example, four air coils arranged around the optical axis OA of the further SEM 100. The application is not, however, limited to the number of air coils mentioned. Rather, any number of air coils suitable for the application can be used. It is additionally proposed that the first deflection unit 130 and / or the second deflection unit 115 are designed as electrostatic deflection units. In particular, the first deflection unit 130 and / or the second deflection unit 115 each have, respectively, for example, four electrodes arranged around the optical axis OA of the further SEM 100, which can be applied with different electrostatic potentials. The application is not, however, limited to the number of electrodes mentioned. Rather, any number of electrodes suitable for the application can be used. By means of the first deflection unit 130 and the second deflection unit 115, the primary electron beam is deflected and can be caused to sweep (or scan) over the object 125. Here, the electrons of the primary electron beam interact with the object 125. As a result of the interaction, interaction particles are generated which are detected. As interaction particles, in particular, electrons are emitted from the surface of the object 125 (so-called secondary electrons) or electrons of the primary electron beam are backscattered (so-called backscattered electrons).

[0087] For detecting secondary electrons and / or backscattered electrons, a detector assembly is arranged in the beam guiding tube 104, which detector assembly has a first detector 116 and a second detector 117. The first detector 116 is arranged in the beam guiding tube 104 along the optical axis OA on the source side here, while the second detector 117 is arranged in the beam guiding tube 104 on the object side along the optical axis OA. The first detector 116 and the second detector 117 are arranged offset from one another in the direction of the optical axis OA of the further SEM 100. The first detector 116 as well as the second detector 117 each have a through opening through which the primary electron beam can pass. The first detector 116 and the second detector 117 are approximately at the potential of the anode 103 and the beam guiding tube 104. The optical axis OA of the further SEM 100 extends through the respective through opening.

[0088] The second detector 117 is mainly used for detecting secondary electrons. Secondary electrons upon leaving the object 125 have a small kinetic energy and an arbitrary direction of movement at first. By means of the strong attractive field emitted from the tubular electrode 113, the secondary electrons are accelerated in the direction of the first objective 107. The secondary electrons enter the first objective 107 approximately parallel. The beam diameter of the beam of secondary electrons also remains small in the first objective 107. The first objective 107 now strongly acts on the secondary electrons and produces a comparatively short secondary electron focus having a sufficiently steep angle with respect to the optical axis OA, so that the secondary electrons after the focus disperse from one another and hit the second detector over the active area of the second detector 117. In contrast, only a small fraction of the electrons backscattered at the object 125, i.e. backscattered electrons having a comparatively high kinetic energy upon leaving the object 125 with respect to the secondary electrons, are registered by the second detector 117. The high kinetic energy and the angle with respect to the optical axis OA of the backscattered electrons upon leaving the object 125 result in the beam waist of the backscattered electrons, i.e. the region of the beam having the smallest diameter, being located in the vicinity of the second detector 117. The majority of the backscattered electrons pass through the through opening of the second detector 117. The first detector 116 is thus essentially used for registering backscattered electrons.

[0089] In a further embodiment of the further SEM 100, the first detector 116 can be designed to also have a counter field grid 116A. The counter field grid 116A is arranged on the side of the first detector 116 which is directed towards the object 125. The counter field grid 116A has a negative potential with respect to the potential of the beam guiding tube 104, so that only backscattered electrons having a high kinetic energy pass through the counter field grid 116A to the first detector 116. Additionally or alternatively, the second detector 117 has a further counter field grid which is designed analogously to the aforementioned counter field grid 116A of the first detector 116 and has a similar function.

[0090] In addition, the further SEM 100 has a sample chamber detector 119, for example an Everhart-Thornley detector or an ion detector with a light-shielded detection surface, in the sample chamber 120.

[0091] The detection signals generated with the first detector 116, the second detector 117 and the sample chamber detector 119 are used to generate one image or a plurality of images of the surface of the object 125.

[0092] It is expressly pointed out that the barrier openings of the first barrier unit 108 and the second barrier unit 109 and the through-openings of the first detector 116 and the second detector 117 are shown exaggerated. The through-openings of the first detector 116 and the second detector 117 have an extension perpendicular to the optical axis OA in the range of 0.5 mm to 5 mm. For example, they are designed circular and have a diameter perpendicular to the optical axis OA in the range of 1 mm to 3 mm.

[0093] The second barrier unit 109 is configured as a hole plate in the embodiment shown here and is provided with second barrier openings 118 for the passage of the primary electron beam, which have an extension in the range of 5 pm to 500 pm, for example 35 pm. Instead thereof, it is proposed in a further embodiment that the second barrier unit 109 is provided with a plurality of barrier openings, which can be mechanically offset to the primary electron beam or which can be reached by the primary electron beam in the case of the use of electric and / or magnetic deflection elements. The second barrier unit 109 is designed as a pressure staging plate. This pressure staging plate separates a first region, in which the electron source 101 is arranged and in which an ultrahigh vacuum prevails (10 -7 hPa to 10 -12 hPa), from a second region with a high vacuum (10 -3 hPa to 10 -7 hPa). The second region is the intermediate pressure region of the beam guide 104, which guides the sample chamber 120.

[0094] The sample chamber 120 is in a vacuum. For generating the vacuum, a pump (not shown) is arranged at the sample chamber 120. In the embodiment shown in Figure 2 , the sample chamber 120 works in a first pressure range or in a second pressure range. The first pressure range comprises only pressures less than or equal to 10 -3 hPa, while the second pressure range comprises only pressures greater than 10 -3 hPa. In order to guarantee these pressure ranges, the sample chamber 120 is closed in terms of vacuum technology.

[0095] The object holder 114 is arranged on a stage 122. The stage 122 is formed movable in three directions arranged perpendicular to each other, namely in an x-direction (first stage axis), a y-direction (second stage axis) and a z-direction (third stage axis). Furthermore, the stage 122 can be rotated around two rotation axes (stage rotation axes) arranged perpendicular to each other. The present invention is not limited to the above described stage 122. Rather, the stage 122 can have further translation axes and rotation axes along which the stage 122 can be moved or around which the stage 122 can be rotated.

[0096] The further SEM 100 also has a third detector 121 arranged in the sample chamber 120. In particular, the third detector 121 is arranged behind the stage 122 along the optical axis OA as seen from the electron source 101. The stage 122 and thus the object holder 114 can be rotated such that an object 125 arranged on the object holder 114 can be transmitted by the primary electron beam. When the primary electron beam passes through the object 125 to be investigated, the electrons of the primary electron beam interact with the material of the object 125 to be investigated. The electrons passing through the object 125 to be investigated are detected by the third detector 121.

[0097] At the sample chamber 120, a radiation detector 500 is arranged by which interaction radiation, such as X-ray radiation and / or cathodoluminescence, generated when the primary electron beam hits the object 125 is detected. The radiation detector 500, the first detector 116, the second detector 117 and the sample chamber detector 119 are connected with a control device 123 having a monitor 124. The third detector 121 is also connected with the control device 123. For the sake of clarity, this is not illustrated. The control device 123 processes the detection signals generated by the first detector 116, the second detector 117, the sample chamber detector 119, the third detector 121 and / or the radiation detector 500 and displays these detection signals in the form of images on the monitor 124.

[0098] The control device 123 also has a database 126 in which data are stored and from which data are read out. Furthermore, the control device 123 is connected with deflection devices in the form of a first deflection unit 130 and a second deflection unit 115. Furthermore, the control device 123 is connected with other units of the further SEM 100. For the sake of clarity, these are not shown in detail.

[0099] The control device 123 of the further SEM 100 has a processor 127. In the processor 127, a computer program product having program code is loaded which, when executed, implements a method for operating the further SEM 100. This will be explained in further detail below.

[0100] In another SEM 100, the distance A can be set using the control device 123 of the other SEM 100. The distance A is given by (a) an object distance between the outer boundary of the first objective 107 of the other SEM 100 and the object 125 or (b) a focal plane distance between the outer boundary of the first objective 107 of the other SEM 100 and the focal plane of the first objective 107. The above-mentioned distance A according to case (a) or case (b) is also referred to as working distance. The distance A is set, for example, under case (a) by moving the object table 122 and / or by moving the first objective 107 by means of the movement device 25. The distance A is set, for example, under case (b) by a change in excitation of the first objective 107 along the optical axis OA of the other SEM 100.

[0101] Figure 3 A particle radiation device in the form of a combination device 200 is shown. The combination device 200 has two particle radiation columns. On the one hand, the combination device 200 is provided with a further SEM 100 as already shown in Figure 2 , but without a sample chamber 120. More precisely, the further SEM 100 is arranged at a sample chamber 201. The sample chamber 201 is under vacuum. In order to generate the vacuum, a pump (not shown) is arranged at the sample chamber 201. In the embodiment shown in Figure 3 , the sample chamber 201 works in a first pressure range or in a second pressure range. The first pressure range only comprises pressures less than or equal to 10 -3 hPa, while the second pressure range only comprises pressures greater than 10 -3 hPa. In order to guarantee these pressure ranges, the sample chamber 201 is closed in terms of vacuum technology.

[0102] In the sample chamber 201, a sample chamber detector 119 is arranged, which is designed, for example, as an Everhart-Thornley detector or as an ion detector and which has a light-shielded detection surface that is coated with metal. Furthermore, a third detector 121 is arranged in the sample chamber 201.

[0103] The further SEM 100 serves to generate a first particle beam, i.e. a primary electron beam, which has already been described above and which has an optical axis that is designated with the reference sign 709 in Figure 3 and which is also referred to as first beam axis in the following. In addition, the combination device 200 is provided with an ion radiation device 300, which is also arranged at the sample chamber 201. The ion radiation device 300 likewise has an optical axis, which is designated with the reference sign 710 in Figure 3 and which is also referred to as second beam axis in the following.

[0104] The further SEM 100 is arranged vertically with respect to the sample chamber 201. In contrast, the ion irradiation device 300 is arranged at an angle of about 0° to 90° with respect to the SEM 100. In Figure 3 about 50° is shown, for example. The ion irradiation device 300 has a second beam generator in the form of an ion beam generator 301. Ions are generated by the ion beam generator 301, which constitute a second particle beam in the form of an ion beam. The ions are accelerated by means of an extraction electrode 302 at a predefinable electrical potential. The second particle beam then passes through ion optics of the ion irradiation device 300, which have a condenser lens 303 and a second objective 304. The second objective 304 finally generates an ion probe, which is focused onto an object 125 arranged at the object holder 114. The object holder 114 is arranged on a stage 122.

[0105] Above the second objective 304, i.e. in the direction towards the ion beam generator 301, a settable or selectable baffle 306 and a deflection device are arranged. The deflection device has a first deflection unit 307 and a second deflection unit 308. The first deflection unit 307 is arranged on the source side within the second objective 304. In contrast, the second deflection unit 308 is arranged on the object side within the second objective 304. The first deflection unit 307 and the second deflection unit 308 are crossed beam deflection units. In other words, the first deflection unit 307 and the second deflection unit 308 are each designed such that they deflect the ion beam in two mutually non-parallel directions, which are oriented perpendicular to the direction of the optical axis in the form of the second beam axis 710 of the ion irradiation device 300. For example, the first deflection unit 307 and / or the second deflection unit 308 are designed as magnetic deflection units. In particular, the first deflection unit 307 and / or the second deflection unit 308 each have, for example, four hollow coils arranged around the optical axis in the form of the second beam axis 710 of the ion irradiation device 300. However, the application is not limited to the number of hollow coils mentioned. Rather, any number of hollow coils suitable for the application can be used. In addition or alternatively, the first deflection unit 307 and / or the second deflection unit 308 are designed as electrostatic deflection units. In particular, the first deflection unit 307 and / or the second deflection unit 308 each have, for example, four electrodes arranged around the optical axis in the form of the second beam axis 710 of the ion irradiation device 300, which can be applied with different electrostatic potentials. However, the application is not limited to the number of electrodes mentioned. Rather, any number of electrodes suitable for the application can be used. The ion beam is deflected by means of the first deflection unit 307 and the second deflection unit 308 and can be made to sweep over (or scan over) the object 125.

[0106] As described above, an object holder 114 is arranged on the stage 122. Figure 3 In the illustrated embodiment, the stage 122 is also configured to be movable in three mutually perpendicular directions, namely, in the x-direction (first stage axis), y-direction (second stage axis), and z-direction (third stage axis). Furthermore, the stage 122 can rotate about two mutually perpendicular rotation axes (stage rotation axes).

[0107] exist Figure 3 The distances between the various units of the combined device 200 shown are exaggerated in order to better illustrate the various units of the combined device 200.

[0108] A radiation detector 500 is installed in sample chamber 201 to detect interacting radiation, such as X-ray radiation and / or cathodoluminescence. The radiation detector 500 is connected to a control device 123, which has a monitor 124.

[0109] Control device 123 processes data from the first detector 116 (in...) Figure 3 (not shown in the image), second detector 117 (in...) Figure 3 The detection signals generated by the sample chamber detector 119, the third detector 121 and / or the radiation detector 500 (not shown in the image) are displayed as images on the monitor 124.

[0110] The control device 123 also has a database 126 in which data is stored and data is read from. Furthermore, the control device 123 is connected to a first deflection unit 130 (in which the primary electron beam of another SEM 100 is deflected) Figure 3 (not shown in the image) and the second deflection unit 115 (in the image) Figure 2 It is connected to a deflection device in the form of a first deflection unit 307 and a second deflection unit 308 for use with an ion beam in an ion radiation device 300.

[0111] The control unit 123 of the combined device 200 includes a processor 127. A computer program product with program code is loaded in the processor 127, which, when executed, implements methods for operating the combined device 200. This will be described in more detail below.

[0112] The working distance can also be set in the combined device 200. For example, in another SEM 100, the distance A1 can be set using the control device 123. The distance A1 is given by (a) the object distance between the outer boundary of the first objective lens 107 of the other SEM 100 and the object 125 or (b) the focal plane distance between the outer boundary of the first objective lens 107 of the other SEM 100 and the focal plane of the first objective lens 107. The distance A1 described above, depending on case (a) or case (b), is also referred to as the working distance. For example, in case (a), the distance A1 is set by moving the stage 122 and / or by moving the first objective lens 107 using the moving device 25. For example, in case (b), the distance A1 is set by varying the excitation of the first objective lens 107 along the first beam axis 709 of the other SEM 100. Furthermore, the distance A2 can be set using the control device 123. Distance A2 is given by (a) the object distance between the outer boundary of the second objective lens 304 of the ion radiation device 300 and the object 125, or (b) the focal plane distance between the outer boundary of the second objective lens 304 of the ion radiation device 300 and the focal plane of the second objective lens 304. Distance A2, depending on case (a) or (b), is also referred to as the working distance. For example, in case (a), distance A2 is set by moving the stage 122 and / or by moving the second objective lens 304 via the moving device 25. For example, in case (b), distance A2 is set by varying the excitation of the second objective lens 304 along the second beam axis 710 of the ion radiation device 300.

[0113] The following will elaborate on the basis Figure 3 Another SEM 100 and according to Figure 4 The combined device 200 includes a stage 122. The stage 122 is designed as a movable stage, which... Figure 5 and Figure 1 The diagram is shown schematically. According to... Figure 4 The stage 19 of the SEM 100 is applicable to the following situations.

[0114] It should be noted that the present invention is not limited to the stage 122 described herein. Rather, the present invention can have any movable stage suitable for the present invention.

[0115] An object holder 114 is arranged at the stage 122. The stage 122 has moving elements that ensure the movement of the stage 122, allowing regions of interest on the object 125 to be studied, for example, by means of a particle beam. Figure 5 and Figure 5 The moving element is illustrated in the diagram and will be explained below.

[0116] The stage 122 has a first moving element 600, which is arranged, for example, at the housing 601 of the sample chamber 120 or 201 (in which the stage 122 is further arranged). The first moving element 600 allows the stage 122 to move along the z-axis (the axis of the third stage). Furthermore, a second moving element 602 is provided. The second moving element 602 allows the stage 122 to rotate about the first stage rotation axis 603 (also referred to as the tilt axis). The second moving element 602 is used to tilt the object 125 about the first stage rotation axis 603, wherein the object 125 is arranged at the object holder 114.

[0117] A third moving element 604 is further arranged on the second moving element 602. This third moving element is designed as a guide for the slider and ensures that the stage 122 can move in the x-direction (the axis of the first stage). The aforementioned slider is further a fourth moving element, namely a fourth moving element 605. The fourth moving element 605 is designed to allow the stage 122 to move in the y-direction (the axis of the second stage). For this purpose, the fourth moving element 605 has a guide that guides another slider, on which an object holder 114 is further arranged. The object holder 114 is further designed to have a fifth moving element 606, which enables the object holder 114 to rotate about the rotation axis 607 of the second stage. The rotation axis 607 of the second stage is oriented perpendicular to the rotation axis 603 of the first stage.

[0118] Based on the above arrangement, the stage 122 of the embodiment discussed herein has the following kinematic chain: first moving element 600 (moving along the z-axis) - second moving element 602 (rotating about the first stage rotation axis 603) - third moving element 604 (moving along the x-axis) - fourth moving element 605 (moving along the y-axis) - fifth moving element 606 (rotating about the second stage rotation axis 607).

[0119] In another (not shown) embodiment, additional moving elements are arranged at the stage 122, enabling movement along additional translation axes and / or about additional rotation axes.

[0120] As from Figure 5As can be seen, each of the aforementioned moving elements is connected to a drive unit in the form of motors M1 to M5. Therefore, the first moving element 600 is connected to the first drive unit M1 and is driven by the driving force provided by the first drive unit M1. The second moving element 602 is connected to the second drive unit M2, which drives the second moving element 602. The third moving element 604 is further connected to the third drive unit M3. The third drive unit M3 provides driving force to drive the third moving element 604. The fourth moving element 605 is connected to the fourth drive unit M4, which drives the fourth moving element 605. Furthermore, the fifth moving element 606 is connected to the fifth drive unit M5. The fifth drive unit M5 provides driving force to drive the fifth moving element 606.

[0121] The aforementioned drive units M1 to M5 can, for example, be designed as stepper motors and controlled by the drive control unit 608, which also supplies power to each other (see [reference]). Figure 1 It should be clearly stated that the present invention is not limited to movement achieved by a stepper motor. Rather, any drive unit suitable for the present invention can be used as a drive unit, such as a brushless motor or a piezoelectric actuator.

[0122] The following will address the issue based on Figure 2 The SEM 100 provides a more detailed explanation of the implementation of the method according to the invention. According to... Figure 3 Another SEM 100 and according to Figure 6 The combined equipment 200 is applicable to the following situations.

[0123] Figure 1 An embodiment of the method according to the present invention is shown, the method being implemented using... Figure 6 Implemented using SEM 100. Based on... Figure 6In an embodiment of the method according to the invention, distance A is determined in method step S1 using control device 123 of SEM 100. Distance A is given by (a) the object distance between the outer boundary of objective lens 10 of SEM 100 and object 15 or (b) the focal plane distance between the outer boundary of objective lens 10 of SEM 100 and focal plane of objective lens 10. The aforementioned distance according to case (a) or case (b) is also referred to as the working distance. For example, it is proposed to determine distance A according to case (a) (i.e., determine the working distance) by the relative movement of object 15 relative to objective lens 10 (e.g., by moving object 15 and / or by moving objective lens 10) and / or by determining the object distance. Determining the object distance includes, for example, measuring the object distance and / or reading the object distance at a measuring device. In another embodiment of the method according to the invention, it is additionally or alternatively proposed to determine distance A according to case (b) by manipulating objective lens 10 to position the focal plane of objective lens 10 and / or by determining the focal plane distance. Determining the focal plane distance includes, for example, measuring the focal plane distance and / or reading the focal plane distance at a measuring device. In yet another embodiment of the method according to the invention, it is additionally or alternatively proposed that the distance A (i.e., the working distance) be determined by at least one of the following method steps: (i) moving the stage 19 on which the object 15 is disposed along the optical axis 20 of the SEM 100; (ii) moving the stage 19 on which the object 15 is disposed relative to the optical axis 20 of the SEM 100, wherein the movement is not perpendicular to the optical axis 20; (iii) moving the objective lens 10 of the SEM 100 along the optical axis 20 of the SEM 100 using the moving device 25; and (iv) moving the objective lens 10 of the SEM 100 relative to the optical axis 20 using the moving device 25, wherein the movement is not perpendicular to the optical axis 20.

[0124] According to Figure 6 According to an embodiment of the method of the present invention, in step S2, the primary electron beam is guided and / or shaped by the first converging lens 5 and / or the second converging lens 6 of the SEM 100, thereby generating a first cross CO1 in the objective lens 10. The first converging lens 5 and the second converging lens 6 are operated using a control device 123 with a preset value of the converging lens current to generate the first cross CO1.

[0125] According to Figure 6 According to an embodiment of the method of the present invention, in method step S3, the objective lens 10 is used to guide and / or shape the primary electron beam, thereby generating a second cross CO2 that can be arranged on the object 15 to produce the primary electron beam. For this purpose, the objective lens 10 is operated using a control device 123 with a preset value of the objective lens current.

[0126] According to Figure 6According to an embodiment of the method of the present invention, in step S4, a particle beam in the form of a primary electron beam is deflected to a position KP along the optical axis 20 of the SEM 100 by a deflection device in the form of a first deflection unit 9 and a second deflection unit 12, according to a determined distance A (i.e., a determined working distance). Therefore, the position KP is associated with the determined distance A. In other words, the primary electron beam is guided to this position KP along the optical axis 20 of the SEM 100 by the first deflection unit 9 and the second deflection unit 12 according to the determined working distance A.

[0127] The aforementioned position KP of the primary electron beam along the optical axis 20 of the SEM 100 is, for example, the turning point of the primary electron beam as explained above. Furthermore, the aforementioned position KP of the primary electron beam along the optical axis 20 is arranged within the second deflection unit 12. The control device 123 of the SEM 100 manipulates the deflection device, which takes the form of the first deflection unit 9 and the second deflection unit 12, by means of control signals, thereby reducing or avoiding aberrations generated by the objective lens 10. The above-described embodiments for reducing aberrations are also applicable here. For example, the control device 123 of the SEM 100 manipulates the deflection device to minimize aberrations generated by the objective lens 10.

[0128] Therefore, aberrations of the objective lens 10 are reduced or avoided in this invention. Thus, compared to the prior art, a large image field with smaller and / or no aberrations can be achieved. Therefore, based on this invention, a large image field of the SEM 100 can always be achieved in different operating modes of the SEM 100, resulting in smaller navigation errors for the object 15 and / or for the object 15 relative to another structural unit of the SEM 100 within the sample chamber 13 of the SEM 100.

[0129] For example, it is proposed that the first cross CO1 be arranged in the region of the pole shoe gap 23. In particular, it is proposed that the first cross CO1 and / or the second deflection unit 12 be arranged in the region of the pole shoe gap 23.

[0130] For example, at the aforementioned position KP along the optical axis 20 of SEM 100, the center path of the primary electron beam has an axial distance perpendicular to the optical axis 20 of SEM 100. The above-described embodiments referenced in defining the center path also apply here. In the case of the determined distance A (i.e., the determined working distance), in this embodiment of the method according to the invention, the axial distance of the center path of the primary electron beam at this position KP along the optical axis 20 is less than all other axial distances of the center path of the primary electron beam perpendicular to the optical axis 20, wherein for the distance A determined according to case (a), the other axial distances are arranged between the center of the second deflection unit 12 and the object 15, and wherein for the distance A determined according to case (b), the other axial distances are arranged between the center of the second deflection unit 12 and the focal plane of the objective lens 10.

[0131] According to Figure 7 In another embodiment of the method according to the invention, in method step S4, a control device 123 is used to manipulate the first deflection unit 9 by means of a first control signal. Furthermore, the control device 123 is used to manipulate the second deflection unit 12 by means of a second control signal. The position KP of the primary electron beam associated with the determined distance is determined by the ratio of the first control signal to the second control signal. In other words, the position KP associated with the determined distance depends on the ratio of the first control signal to the second control signal.

[0132] Figure 7 This is another embodiment of the method according to the present invention. Figure 6 The implementation method is based on Figure 6 Therefore, the above-described embodiments are referred to first, and these embodiments are also applicable here. Figure 7 The implementation methods are different. Figure 6 The implementation includes another method step, namely method step S1A, which is performed, for example, between method steps S1 and S2. In method step S1A, the landing energy of the electrons of the primary electron beam that strike the object 15 is set and / or determined using the control device 123. For example, determining the landing energy includes measuring the landing energy and / or reading the landing energy from a landing energy measuring device. In method step S2, a preset value for the converging lens current is selected based on the landing energy. Furthermore, a preset value for the objective lens current is also selected based on the landing energy. Therefore, in this implementation, the first cross CO1 also depends on the landing energy of the electrons of the primary electron beam; the second cross CO2 is independent of the landing energy of the electrons of the primary electron beam and is always located at the position of the object 15. For example, in the implementation of the method according to the invention explained herein, the control device 123 is used to have an acceleration device and / or a deceleration device for the electrons of the primary electron beam.

[0133] According toFigure 7 or Figure 8 In an embodiment of the method according to the present invention, step S1 is additionally or alternatively proposed to determine the distance by setting a preset value for the converging lens current, wherein the preset value for the objective lens current remains constant. Therefore, in this embodiment of the method according to the present invention, the working distance is set only by the first converging lens 5 and / or the second converging lens 6. The objective lens current remains constant. In other words, the objective lens current remains unchanged.

[0134] Figure 8 Another embodiment of the method according to the present invention is shown. Figure 6 The embodiments of the method according to the present invention are based on... Figure 6 The embodiments of the method according to the present invention. Therefore, the embodiments derived above also apply here. Figure 8 The implementation methods according to the present invention differ, depending on... Figure 9 An embodiment of the method according to the present invention includes another method step, namely method step S1B, which is between method steps S1 and S2. In method step S1B, it is proposed that the position KP of the primary electron beam along the optical axis 20 of the SEM 100, associated with a determined distance A (i.e., a determined working distance), is calculated using the control device 123. The above-described embodiment, to which the calculation is referred, also applies here. Then, in method step S4, the primary electron beam is deflected using a deflection device in the form of a first deflection unit 9 and a second deflection unit 12, such that the primary electron beam is guided to the calculated position KP. Addendum to or alternatively to this is proposed that the position KP associated with distance A is stored in a database 126 and / or a storage unit.

[0135] Figure 9 Another embodiment of the method according to the present invention is shown. Figure 6 The embodiments of the method according to the present invention are based on... Figure 6 The embodiments of the method according to the present invention. Therefore, the embodiments derived above also apply here. Figure 9 In different embodiments of the method according to the present invention, after performing method steps S1 to S4, method steps S1 to S4 are executed multiple times in sequence. For example, after performing method steps S1 to S4, method step S1 is performed first, then method step S2, then method step S3, and then method step S4. This results in multiple determinations of distance A; multiple guidance and / or shaping of the primary electron beam using the first converging lens 5 and / or the second converging lens 6 to generate another first cross CO1; multiple guidance and / or shaping of the primary electron beam using the objective lens 10 to generate another second cross CO2; and multiple deflections of the primary electron beam to a position KP associated with the corresponding determined distance A.

[0136] According to Figure 10 According to an embodiment of the method of the present invention, when the determined distance A (i.e., the determined working distance A) changes, the associated position KP of the primary electron beam along the optical axis 20 of the SEM 100 also changes. Therefore, in this embodiment of the method of the present invention, the determined distance A is a first distance, the associated position KP of the primary electron beam along the optical axis 20 is a first associated position, the object distance is a first object distance, and the focal plane distance is a first focal plane distance. When repeating step S1, a second distance is determined using the control device 123 of the SEM 100. However, the determined second distance A is greater than or less than the determined first distance A. The second distance A is given by (c) the second object distance between the outer boundary of the objective lens 10 of the SEM 100 and the object 15, or (d) the second focal plane distance between the outer boundary of the objective lens 10 of the SEM 100 and the focal plane of the objective lens 10. For example, it is proposed that the second distance A (i.e., the second working distance A) according to case (c) be determined by the relative movement of the object 15 relative to the objective lens 10 and / or by determining the object distance. Determining the object distance includes, for example, measuring the object distance and / or reading the object distance at a measuring device. In yet another embodiment of the method according to the invention, it is additionally or alternatively proposed that the second distance A, according to case (d), is determined by manipulating the objective lens 10 to position its focal plane and / or by determining the focal plane distance. Determining the focal plane distance includes, for example, measuring the focal plane distance and / or reading the focal plane distance at a measuring device. In yet another embodiment of the method according to the invention, it is additionally or alternatively proposed that the second distance A be determined by at least one of the following method steps: (i) moving the stage 19 on which the object 15 is disposed along the optical axis 20 of the SEM 100; (ii) moving the stage 19 on which the object 15 is disposed relative to the optical axis 20 of the SEM 100, wherein the movement is not perpendicular to the optical axis 20; (iii) moving the objective lens 10 of the SEM 100 along the optical axis 20 of the SEM 100 using the moving device 25; and (iv) moving the objective lens 10 of the SEM 100 relative to the optical axis 20 using the moving device 25, wherein the movement is not perpendicular to the optical axis 20.

[0137] When repeating step S2, the first converging lens 5 and / or the second converging lens 6 are used to guide and / or shape the primary electron beam, thereby generating another first cross CO1 of the primary electron beam in the objective lens 10. For this purpose, the first converging lens 5 and / or the second converging lens 6 are operated using the control device 123 at another preset value of the converging lens current. When repeating step S3, the value of the objective lens current remains unchanged. The objective lens 10 is used to guide and / or shape the particle beam, causing the primary electron beam to generate another second cross CO2 at the object 15.

[0138] When repeating step S4, a deflection device in the form of a first deflection unit 9 and a second deflection unit 12 is used to deflect the primary electron beam generated by the beam generator 1 of the SEM 100 to a second position KP along the optical axis 20 of the SEM 100 according to a determined second distance (i.e., a determined second working distance). Therefore, the second position KP is associated with the determined second distance. In other words, the primary electron beam is guided to this second position KP along the optical axis 20 of the SEM 100 by the deflection device according to the determined second working distance. This second position KP of the primary electron beam along the optical axis 20 of the SEM 100 is, for example, another turning point of the primary electron beam. Furthermore, the second position KP of the primary electron beam along the optical axis 20 is arranged within the second deflection unit 12. In this embodiment of the method according to the invention, the deflection device is also operated by the control device 123 of the SEM 100 using additional control signals to reduce or avoid aberrations generated by the objective lens 10. The above-described embodiments for reducing aberrations are also applicable here accordingly. Therefore, compared with the prior art, this embodiment can also achieve a large image field with smaller aberrations and / or no aberrations.

[0139] Figure 10 Another embodiment of the method according to the present invention is shown. Figure 6 The embodiments of the method according to the present invention are based on... Figure 6 The embodiments of the method according to the present invention. Therefore, the embodiments derived above also apply here. Figure 10 The implementation methods according to the present invention differ, depending on... Figure 6An embodiment of the method according to the present invention includes another method step, namely method step S1C, which is between method steps S1 and S2. In method step S1C, the position KP of the primary electron beam along the optical axis 20 associated with the determined distance A (i.e., the determined working distance) is loaded into the control device 123 from the database 126 of the SEM 100 and / or from another storage unit. Then, in method step S4, the primary electron beam is deflected using a deflection device in the form of a first deflection unit 9 and a second deflection unit 12, thereby guiding the primary electron beam to the loaded position KP. In other words, in this embodiment of the method according to the present invention, the relationship between the position KP of the inflection point and the working distance A is stored in the database 126 and / or the storage unit. If the working distance A is determined, the associated position KP can be loaded from the database 126 and / or the storage unit. The primary electron beam is guided to this position KP by the deflection device in the form of the first deflection unit 9 and the second deflection unit 12.

[0140] Based on Figure 11 According to another embodiment of the method of the present invention, an objective lens 10 excited by an objective lens current generates a magnetic field. The magnetic field has a local distribution along the optical axis 20 of the SEM 100 in a region of the objective lens 10. The local distribution of the magnetic field has a half-value width. The first cross CO1 of the primary electron beam generated in method step S2 is located within the half-value width of the local distribution. Figure 11 A schematic diagram showing the relationship between the magnetic field B of objective lens 10 and the z-coordinate is presented. The advantageous position of the resulting first intersection CO1 lies within half the width of the local distribution of the magnetic field B. Figure 11 In the diagram, the advantageous position of the first intersection CO1 lies between the vertical lines of the area marked "CO position". The optimal turning point KP lies within half the width of the local distribution of the magnetic field B. Figure 6 In this context, the advantageous position of the optimal inflection point KP lies between the vertical lines of the region marked "optimal inflection point". Consideration results indicate that the method according to the invention performs particularly well when the first cross CO1 of the primary electron beam is arranged within half the width of the local distribution of the magnetic field B of the objective lens 10.

[0141] Based on ​ According to another embodiment of the method of the present invention, in step S3, the primary electron beam is defocused by the objective lens 10 to achieve maximum deflection of the primary electron beam relative to the optical axis 20 of the SEM 100.

[0142] All the above and following embodiments of the method according to the present invention are not limited to the described order of method steps. The present invention also includes different orders of method steps suitable for achieving the significance and objectives of the present invention. Alternatively or additionally, in the method according to the present invention, it is also proposed to perform at least two method steps in parallel. Furthermore, the above and following embodiments of the method according to the present invention are not limited to the complete scope of all method steps mentioned above or below. In particular, it is proposed that, in other embodiments, one or more method steps in the above or following method steps are omitted.

[0143] The features of the invention disclosed in this specification, in the drawings, and in the claims are important individually and in any combination for implementing the invention in its various embodiments. The invention is not limited to the described embodiments. The invention can be modified within the scope of the claims and taking into account the knowledge of those skilled in the art.

[0144] List of reference numerals

[0145] 1 Beam Generator

[0146] 2 Extraction Electrode

[0147] 3 control electrodes

[0148] 4 anodes

[0149] 5 First converging lens

[0150] 6 Second converging lens

[0151] 7-baffle unit

[0152] 8 Second detector unit

[0153] 9 First deflection unit

[0154] 10 objectives

[0155] 11-loop coil

[0156] 12 Second Deflection Unit

[0157] 13 Sample Rooms

[0158] 14 First Detector Unit

[0159] 15 objects

[0160] 16 Object Plane

[0161] 17 Pressure classifying plate retainer

[0162] 18 baffle openings

[0163] 19 Movable platform

[0164] 20 optical axes

[0165] 21 beam guide tube

[0166] 22 Extreme Boots

[0167] 23 Pole shoe gap

[0168] 25 mobile devices

[0169] 100 SEMs / Another SEM

[0170] 101 Electronic Source

[0171] 102 Extraction Electrode

[0172] 103 anode

[0173] 104 beam guide tube

[0174] 105 First converging lens

[0175] 106 Second Converging Lens

[0176] 107 First Objective

[0177] 108 First Baffle Unit

[0178] 108A First Baffle Opening

[0179] 109 Second baffle unit

[0180] 110 Extreme Boots

[0181] 111 coil

[0182] 112 individual electrodes

[0183] 113 tubular electrode

[0184] 114 Object Holder

[0185] 115 Second Deflection Unit

[0186] 116 First Detector

[0187] 116A Reverse Field Grille

[0188] 117 Second Detector

[0189] 118 Second baffle opening

[0190] 119 Sample Chamber Detector

[0191] 120 Sample Room

[0192] 121 Third Detector

[0193] 122 Platform

[0194] 123 control device

[0195] 124 monitor

[0196] 125 objects

[0197] 126 Database

[0198] 127 processor

[0199] 130 First Deflection Unit

[0200] 200 combination equipment

[0201] Sample Room 201

[0202] 300 Ionization Radiation Equipment

[0203] 301 Ion Beam Generator

[0204] Extraction electrode in 302 ionization radiation equipment

[0205] 303 converging lens

[0206] 304 Second Objective

[0207] 306 configurable or selectable baffle

[0208] 307 First Deflection Unit

[0209] 308 Second Deflection Unit

[0210] 500 radiation detector

[0211] 600 First Moving Component

[0212] 601 housing

[0213] 602 Second Moving Element

[0214] 603 First stage rotation axis

[0215] 604 Third Moving Element

[0216] 605 Fourth Moving Element

[0217] 606 Fifth Moving Element

[0218] 607 Second Stage Rotation Axis

[0219] 608 drive control unit

[0220] M1 First Drive Unit

[0221] M2 Second Drive Unit

[0222] M3 Third Drive Unit

[0223] M4 Fourth Drive Unit

[0224] M5 Fifth Drive Unit

[0225] 709 First Beam Axis

[0226] 710 Second Beam Axis

[0227] The distance determined by A

[0228] The distance determined by A1

[0229] The distance determined by A2

[0230] B magnetic field

[0231] CO1 First Cross

[0232] CO2 second cross

[0233] CO position, first intersection, advantageous position

[0234] KP is associated with the location / turning point of the determined distance.

[0235] OA optical axis

[0236] S1 to S4 Method Steps

[0237] S1A Method Steps

[0238] S1B Method Steps

[0239] S1C Method Steps

Claims

1. A method for operating a particle radiation device (100, 200, 300) for imaging, analyzing and / or processing an object (15, 125), wherein the method has the following steps: - determining a distance (A, Al, A2) using a control device (123) of the particle radiation device (100, 200, 300), wherein the distance (A, Al, A2) is given by (a) an object distance between an outer boundary of an objective (10, 107, 304) of the particle radiation device (100, 200, 300) and the object (15, 125) or (b) a focal plane distance between an outer boundary of an objective (10, 107, 304) of the particle radiation device (100, 200, 300) and a focal plane of the objective (10, 107, 304); - guiding and / or shaping a particle beam of the particle radiation device (100, 200, 300) using a condenser lens (5, 6, 105, 106, 303) arranged between a beam generator (1, 101, 301) for generating the particle beam of the particle radiation device (100, 200, 300) and the objective (10, 107, 304) to produce a first cross-over (COl) of the particle beam in the objective (10, 107, 304), wherein the condenser lens (5, 6, 105, 106, 303) is operated using the control device (123) with a preset value of a condenser lens current; - guiding and / or shaping the particle beam using the objective (10, 107, 304) to produce a second cross-over (CO2) of the particle beam which can be arranged on the object (15, 125), wherein the objective (10, 107, 304) is operated using the control device (123) with a preset value of an objective current; and - determining a distance (A, Al, A2) using a control device (123) of the particle radiation device (100, 200, 300), wherein the distance (A, Al, A2) is given by (a) an object distance between an outer boundary of an objective (10, 107, 304) of the particle radiation device (100, 200, 300) and the object (15, 125) or (b) a focal plane distance between an outer boundary of an objective (10, 107, 304) of the particle radiation device (100, 200, 300) and a focal plane of the objective (10, 107, 304); - deflecting the particle beam according to the determined distance (A, Al, A2) to a position (KP) along an optical axis (20, 709, 710, OA) of the particle radiation device (100, 200, 300) associated with the determined distance (A, Al, A2) using a deflection device (9, 12, 115, 130, 307, 308) arranged within the objective (10, 107, 304), the deflection device having at least one first deflection unit (9, 130, 307) and at least one second deflection unit (12, 115, 308), wherein, seen in the direction from the beam generator (1, 101, 301) towards the objective (10, 107, 304), the first deflection unit (9, 130, 307) is arranged along the optical axis (20, 709, 710, OA) first, followed by the second deflection unit (12, 115, 308), wherein the position (KP) of the particle beam along the optical axis (20, 709, 710, OA) is arranged within the second deflection unit (12, 115, 308), and wherein the control device (123) of the particle radiation device (100, 200, 300) manipulates the deflection device (9, 12, 115, 130, 307, 308) by means of control signals in such a way that the aberrations produced by the objective (10, 107, 304) are reduced.

2. The method of claim 1, wherein, The control device (123) of the particle radiation device (100, 200, 300) manipulates the deflection device (9, 12, 115, 130, 307, 308) in such a way that the aberrations produced by the objective (10, 107, 304) are minimized.

3. The method according to claim 1 or 2, characterized in that, The control device (123) manipulates the deflection device (9, 12, 115, 130, 307, 308) in the following way: - the control device manipulates the first deflection unit (9, 130, 307) by means of a first control signal, and - the control device (123) manipulates the second deflection unit (12, 115, 308) by means of a second control signal, wherein the position (KP) of the particle beam associated with the determined distance (A, Al, A2) is determined by the ratio of the first control signal to the second control signal.

4. The method according to one of the preceding claims, characterized in that, The control device (123) sets and / or determines the landing energy with which the particles of the particle beam hit the object (15, 125), wherein the pre-set value of the objective current and / or the convergence lens current is selected in dependence on the landing energy.

5. The method of claim 4, wherein, The control device (123) is used as the control device having an acceleration device and / or a deceleration device for the particles of the particle beam.

6. The method according to one of the preceding claims, characterized in that, The distance (A, Al, A2) is determined by setting the pre-set value of the convergence lens current, wherein the pre-set value of the objective current is constant.

7. The method according to one of the preceding claims, characterized in that: (i) determining the distance (A, A1, A2) according to case (a) by relative movement of the object (15, 125) with respect to the objective (10, 107, 304) and / or by determining the object distance; (ii) determining the distance (A, A1, A2) according to case (b) by positioning a focal plane of the objective (10, 107, 304) by manipulating the objective (10, 107, 304) and / or by determining the focal plane distance.

8. The method according to one of the preceding claims, characterized in that, Determining the distance (A, A1, A2) according to case (a) comprises at least one of the following steps: (i) moving an object holder (19, 114, 122) arranged with the object (15, 125) along the optical axis (20, 709, 710, OA); (ii) moving an object holder (19, 114, 122) arranged with the object (15, 125) relative to the optical axis (20, 709, 710, OA), wherein the movement is not performed perpendicular to the optical axis (20, 709, 710, OA); (iii) moving an objective (10, 107, 304) of the particle radiation device (100, 200, 300) along the optical axis (20, 709, 710, OA) using a movement device (25); (iv) moving an objective (10, 107, 304) of the particle radiation device (100, 200, 300) relative to the optical axis (20, 709, 710, OA) using the movement device (25), wherein the movement is not performed perpendicular to the optical axis (20, 709, 710, OA).

9. The method according to one of the preceding claims, characterized in that, Calculating, using the control device (123), a position (KP) of the particle beam along the optical axis (20, 709, 710, OA) associated with the determined distance (A, A1, A2).

10. The method according to one of the preceding claims, characterized in that, The determined distance (A, A1, A2) is a first distance, wherein a position (KP) of the particle beam along the optical axis (20, 709, 710, OA) associated with the first distance is a first position, wherein the object distance is a first object distance, wherein the focal plane distance is a first focal plane distance, wherein the preset value of the condenser lens current is a first preset value of the condenser lens current, and wherein the method comprises the following steps: - determining, using the control device (123) of the particle radiation device (100, 200, 300), a second distance (A, A1, A2), wherein the second distance (A, A1, A2) is given by (c) a second object distance between an outer boundary of the objective (10, 107, 304) of the particle radiation device (100, 200, 300) and the object (15, 125) or (b) a second focal plane distance between an outer boundary of the objective (10, 107, 304) of the particle radiation device (100, 200, 300) and a focal plane of the objective (10, 107, 304); - guiding and / or shaping the particle beam using the condenser lens (5, 6, 105, 106, 303) to produce a further first crossover (CO1) of the particle beam in the objective (10, 107, 304), wherein the control device (123) is used to operate the condenser lens (5, 6, 105, 106, 303) with a second preset value of the condenser lens current; - guiding and / or shaping the particle beam using the objective (10, 107, 304) to produce a further second crossover (CO2) of the particle beam, which can be arranged on the object (15, 125); and - deflecting the particle beam using the deflection device (9, 12, 115, 130, 307, 308) to a second position (KP) along an optical axis (20, 709, 710, OA) of the particle radiation device (100, 200, 300) associated with the determined second distance (A, A1, A2), wherein the second position (KP) of the particle beam along the optical axis (20, 709, 710, OA) is arranged within the second deflection unit (12, 115, 308), and wherein the control device (123) of the particle radiation device (100, 200, 300) operates the deflection device (9, 12, 115, 130, 307, 308) by means of a further control signal such that an aberration produced by the objective (10, 107, 304) is reduced.

11. The method according to one of the preceding claims, characterized in that, Loading the position of the particle beam in the deflection device (9, 12, 115, 130, 307, 308) into the control device (123) from a database (126) and / or a storage unit. - guiding and / or shaping the particle beam using the condenser lens (5, 6, 105, 106, 303) to produce a further first crossover (CO1) of the particle beam in the objective (10, 107, 304), wherein the control device (123) is used to operate the condenser lens (5, 6, 105, 106, 303) with a second preset value of the condenser lens current; - guiding and / or shaping the particle beam using the objective (10, 107, 304) to produce a further second crossover (CO2) of the particle beam, which can be arranged on the object (15, 125); and - deflecting the particle beam using the deflection device (9, 12, 115, 130, 307, 308) to a second position (KP) along an optical axis (20, 709, 710, OA) of the particle radiation device (100, 200, 300) associated with the determined second distance (A, A1, A2), wherein the second position (KP) of the particle beam along the optical axis (20, 709, 710, OA) is arranged within the second deflection unit (12, 115, 308), and wherein the control device (123) of the particle radiation device (100, 200, 300) operates the deflection device (9, 12, 115, 130, 307, 308) by means of a further control signal such that an aberration produced by the objective (10, 107, 304) is reduced. Loading the position of the particle beam in the deflection device (9, 12, 115, 130, 307, 308) into the control device (123) from a database (126) and / or a storage unit.

12. The method according to one of the preceding claims, characterized in that, The central path of the particle beam has an axial distance from the optical axis (20, 709, 710, OA) of the particle radiation device (100, 200, 300) at the position (KP) along the optical axis (20, 709, 710, OA), wherein the axial distance of the central path of the particle beam at the position (KP) along the optical axis (20, 709, 710, OA) is smaller than all other axial distances of the central path of the particle beam from the optical axis (20, 709, 710, OA) of the particle radiation device (100, 200, 300) in the case of the determined distance, wherein for the distance (A, Al, A2) determined according to case (a) the other axial distances are arranged between the center of the second deflection unit (12, 115, 308) of the deflection device (9, 12, 115, 130, 307, 308) and the object (15, 125), and wherein for the distance (A, Al, A2) determined according to case (b) the other axial distances are arranged between the center of the second deflection unit (12, 115, 308) of the deflection device (9, 12, 115, 130, 307, 308) and the focal plane.

13. The method according to one of the preceding claims, characterized in that - the objective (10, 107, 304) excited with the objective current generates a magnetic field (B), - the magnetic field (B) has a local distribution along the optical axis (20, 709, 710, OA) of the particle radiation device (100, 200, 300) in the region of the objective (10, 107, 304), - the local distribution of the magnetic field (B) has a half-value width, and wherein - the first crossing (COl) of the particle beam lies within the half-value width of the local distribution, and / or wherein the associated position (KP) lies within the half-value width of the local distribution.

14. The method according to one of the preceding claims, characterized in that, Electrostatic and / or magnetic deflection devices (9, 12, 115, 130, 307, 308) are used as the deflection devices (9, 12, 115, 130, 307, 308).

15. The method according to one of the preceding claims, characterized in that, The particle beam is defocused by the objective (10, 107, 304) such that a maximum deflection of the particle beam relative to the optical axis (20, 709, 710, OA) of the particle radiation device (100, 200, 300) is achieved.

16. Computer program product having a program code, which can be loaded into a processor (127) and which, when executed, controls a particle radiation device (100, 200, 300) such that a method according to at least one of the preceding claims is carried out.

17. Particle radiation device (100, 200, 300) for imaging, analyzing and / or processing an object (15, 125), the particle radiation device having - at least one beam generator (1, 101, 301) for generating a particle beam with charged particles, - at least one deflection device (9, 12, 115, 130, 307, 308) for deflecting the particle beam, - at least one converging lens (5, 6, 105, 106, 303) for guiding and / or shaping the particle beam, - at least one objective (10, 107, 304) for guiding and / or shaping the particle beam onto the object (15, 125), - at least one deflection device (9, 12, 115, 130, 307, 308) having at least one first deflection unit (9, 130, 307) and at least one second deflection unit (12, 115, 308), wherein the first deflection unit (9, 130, 307) is arranged first and the second deflection unit (12, 115, 308) is arranged second in the direction from the beam generator (1, 101, 301) towards the objective (10, 107, 304), wherein the first deflection unit (9, 130, 307) and the second deflection unit (12, 115, 308) are arranged in the objective (10, 107, 304); and - at least one control device (123) having at least one processor (127) in which a computer program product according to claim 16 is loaded.

18. Particle radiation device (100, 200, 300) according to claim 17, characterized in that - the first deflection unit (9, 130, 307) is arranged in the objective (10, 107, 304) on the side of the objective (10, 107, 304) facing the beam generator (1, 101, 301), and wherein - the second deflection unit (12, 115, 308) is arranged in the objective (10, 107, 304) on the side of the objective (10, 107, 304) facing the object (15, 125).

19. The particle radiation device (100, 200, 300) according to claim 17 or 18, characterized in that The particle radiation device has at least one of the following features: (i) at least one detector unit (8, 14, 116, 117, 119, 121, 500) for detecting interaction particles and / or interaction radiation resulting from an interaction of the particle beam with the object (15, 125); (ii) at least one acceleration device for accelerating particles and / or deceleration device for decelerating particles in the particle radiation device (100, 200, 300).

20. The particle radiation device (100, 200, 300) according to one of the claims 17 to 19, characterized in that, The particle radiation device (100, 200, 300) has at least one of the following features: (i) an object holder (19, 114, 122) designed to be movable, at which the object (15, 125) is arranged; (ii) a movement device (25) for moving the objective (10, 107, 304).

21. The particle radiation device (200) according to one of the claims 17 to 20, characterized in that, The beam generator (101) is designed as a first beam generator and the particle beam is formed as a first particle beam with first charged particles, wherein the objective (107) is designed as a first objective for focusing the first particle beam onto the object (125), and wherein the particle radiation device further has: (i) at least one second beam generator (301) for generating a second particle beam with second charged particles; and (ii) at least one second objective (304) for focusing the second particle beam onto the object (125).

22. The particle radiation device (100, 200, 300) according to one of the claims 17 to 21, characterized in that, The particle radiation device (100, 200, 300) is an electron radiation device and / or an ion radiation device.

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