Preparation method of ceramic reinforced metal matrix composite material based on atomic layer deposition coating

Abstract

The invention discloses a preparation method of a ceramic reinforced metal matrix composite material based on atomic layer deposition coating. The preparation method comprises the following specific steps: 1, pretreatment of ceramic particles: surface cleaning, roughening treatment and surface activating treatment; 2, ceramic particle surface atomic layer deposition coating: preheating, precursor gas introduction, inert gas purging, oxygen source supply, inert gas secondary purging, cooling and annealing; and 3, preparation of the ceramic reinforced metal-based composite material: preparing a honeycomb-shaped ceramic prefabricated body, and pouring molten metal to obtain a ceramic reinforced metal-based composite material product. The atomic layer deposition technology is utilized, Al2O3, Ni or TiO2 films are deposited on the surfaces of the ceramic particles to improve the interface bonding force between the ceramic particles and the matrix, the surface films are uniform and compact, meanwhile, the thickness of the films can be accurately controlled, the wettability between the ceramic particles and the metal matrix is effectively improved, and the ceramic particles can be prepared. And the interface bonding force between the metal matrix and the ceramic particles is obviously improved.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of metal-based ceramic composite materials, and particularly relates to a preparation method of a ceramic-reinforced metal-based composite material based on atomic layer deposition plating. BACKGROUND

[0002] The ceramic-reinforced metal-based composite material is an important type of metal-based composite materials, and by adding ceramic materials in a metal matrix, the hardness, wear resistance, thermal stability and oxidation resistance and other performances of the material can be significantly improved. With the continuous improvement of the performance requirements of materials in industrial applications, especially in extreme working conditions such as wear resistance, high temperature resistance and high strength, the ceramic-reinforced metal-based composite material is increasingly applied in many application fields such as metallurgy, cement, mining, power, energy and the like.

[0003] However, in the preparation process of ceramic reinforced metal matrix composites, the use of ceramic materials with good wettability with the metal matrix usually faces the problem of high cost, and the use of ceramic materials with poor wettability with the metal matrix, although low in cost, usually faces the problem of poor combination of the metal matrix and ceramic particles, and poor compounding. In recent years, many researchers have adopted various methods to improve the wettability and interfacial bonding effect of the metal matrix and ceramic particles, such as coating active material powder on the surface of ceramic particles by coating, electroplating or chemical plating, etc. Chinese invention patent CN109053215A discloses a Fe-Cr-Ni-Ti micro-powder coated honeycomb ZTA ceramic preform and its preparation and application. After alloying treatment of Fe, Cr, Ni and Ti powder, the melting temperature of Ti powder is reduced, and the diffusion reaction between Ti and oxygen in ZTA ceramic is realized to achieve a high-strength metal-ceramic bonding interface. Chinese invention patent CN111809100A discloses a NiCrAlY high-temperature sintered ZTA particle reinforced steel-based composite material and its preparation method. The method coats the surface of ZTA particles with high-temperature binder phase Ni80Cr20 by physical vapor deposition multi-arc ion plating, and then sintering NiCrAlY alloy powder by hot pressing, which improves the wettability of Ni and ceramic particles, and changes the interface bonding from simple mechanical bonding to metallurgical bonding. Chinese invention patent CN114850472A discloses a method for coating ceramic particles and a method for preparing composite materials. The method mixes ceramic particles with a binder, adds a coating powder, mixes with polyvinyl alcohol, dries, activates, and then uses a plating solution for chemical plating to obtain ceramic particles coated with a coating powder-metal plating layer, and then obtains a composite material by pressureless infiltration with a metal matrix. In summary, although researchers have made many efforts to activate the surface of ceramic particles or improve the metal-ceramic composite interface, there are still problems such as poor interface bonding, many defects, poor dispersion, and low yield in the preparation process of metal-ceramic composites, which directly affects the overall performance and reliability of metal-ceramic composites.

[0004] Atomic layer deposition technology, as an advanced technology that can accurately control the thickness of surface films, has gradually attracted attention in recent years. By alternating gas phase reactions, a uniform, dense and precisely controlled thickness film is deposited on the substrate surface, which can control uniformity at the atomic level, thereby effectively improving the wettability and interfacial bonding of ceramic particles and metal matrix. By depositing a layer of ultra-thin aluminum oxide, nickel, titanium oxide and other plating coatings on the surface of ceramic particles, the affinity between the particle surface and the metal matrix can be significantly improved, and the bonding force between the particle surface and the matrix can also be improved, providing a new solution for the performance optimization of metal-ceramic composites. SUMMARY

[0005] In view of the problems and deficiencies of the prior art and the optimization and supplement of the prior art, the application provides a preparation method of ceramic reinforced metal matrix composite based on atomic layer deposition film plating, which utilizes atomic layer deposition technology to deposit high-quality Al2O3, Ni or TiO2 film on the surface of ceramic particles to improve the interface bonding force between the ceramic particles and the matrix, then prepares the ceramic particles with surface film into a honeycomb-shaped ceramic preform, pours the matrix metal liquid at high temperature to obtain a cermet composite product. The ceramic particles treated by the method have uniform and dense surface film, and the thickness can be accurately controlled, thereby effectively improving the wettability between the ceramic particles and the metal matrix and significantly improving the interface bonding force between the metal matrix and the ceramic particles.

[0006] The application is implemented as follows: a preparation method of ceramic reinforced metal matrix composite based on atomic layer deposition film plating, and the specific steps are as follows: Step one: pretreatment of ceramic particles Step 11: surface cleaning of the ceramic particles to remove impurities and oxides on the surface, and then drying the ceramic particles; Step 12: roughening treatment of the dried ceramic particles; Step 13: surface activation treatment of the ceramic particles after roughening treatment; Step two: atomic layer deposition film plating on the surface of the ceramic particles Step 21: placing the ceramic particles after surface activation treatment in the reaction chamber of the atomic layer deposition equipment for preheating to remove residual moisture; Step 22: after preheating, increasing the temperature of the atomic layer deposition equipment to the target temperature at a certain temperature increasing rate, and setting the pressure of the reaction chamber; Step 23: according to the type of pre-film, alternately introducing the precursor gas into the reaction chamber; Step 24: purging the inner cavity of the reaction chamber with inert gas to remove unreacted precursor gas and by-products; Step 25: supplying an oxygen source to the reaction chamber, and then purging with inert gas to remove unreacted gas and by-products; Repeating steps 23-25 until the required film thickness is reached; Step 26: after film deposition, cooling the ceramic particles to room temperature in a vacuum state, taking out, and performing annealing treatment; Step three: preparation of ceramic reinforced metal matrix composite Mixing the ceramic particles with the surface deposited film and the binder to prepare a honeycomb-shaped ceramic preform, and then pouring the metal liquid to obtain a ceramic reinforced metal matrix composite product.

[0007] Preferably, in step 11, the ceramic particles mainly include one or more of the following: zirconium corundum ceramic particles, silicon nitride ceramic particles, titanium nitride ceramic particles, silicon carbide ceramic particles, titanium boride ceramic particles, or titanium carbide ceramic particles; the ceramic particles are spherical or have any irregular shape, and the particle size is 2-5 mm.

[0008] More preferably, in step 11, the surface cleaning of the ceramic particles mainly involves immersing the ceramic particles in 5%-10% hydrochloric acid or nitric acid for 10-30 minutes, and then rinsing them repeatedly with deionized water to ensure no acid residue; or using ultrasonic cleaning or plasma cleaning.

[0009] Preferably, in step 12, the roughening treatment of the ceramic particles is sandblasting.

[0010] Preferably, in step 13, the surface activation treatment of the ceramic particles mainly involves treating the ceramic particles with oxygen plasma.

[0011] Preferably, in step 21, the ceramic particles in the reaction chamber are placed on a vibrating table or a rotating table; the preheating temperature is 100-250℃ and the preheating time is 10-30 min.

[0012] Preferably, in step 22, the target temperature of the reaction chamber is set to 150-350℃, the heating rate is 5℃ / min-8℃ / min, and the vacuum degree is 10. -3 ~10 -5 Torr.

[0013] Preferably, in step 23, the precursor gas is any one of aluminum chloride (AlCl3) or trimethylaluminum (TMA), di(ethylcyclopentadienyl)nickel (Ni(EtCp)2) or bis(cyclopentadienyl)nickel (NiCp2), titanium tetraisopropoxide (TTIP) or titanium tetrachloride (TiCl4). Further preferred, the precursor gas supply time is 1-8 seconds.

[0014] Preferably, in step 24, the inert gas is nitrogen or argon.

[0015] Preferably, in step 25, the oxygen source is water vapor, oxygen, hydrogen, or hydrazine, and the supply time is 1-8 seconds.

[0016] In a further preferred embodiment, steps 23-25 ​​are repeated 100-500 times, and the film thickness is 10nm-50nm.

[0017] Preferably, in step 26, the annealing process is performed under a nitrogen or argon atmosphere at a temperature of 300-800°C for a holding time of 0.5-2 hours.

[0018] Preferably, in step 31, the binder is a mixture of sodium silicate solution and water, wherein the mass ratio of sodium silicate solution to water is between 4:1 and 9:1, and the mass ratio of ceramic particles to binder is 100:(4~10).

[0019] Preferably, in step 32, the molten metal is high-chromium cast iron, high-manganese steel, or high-alloy steel.

[0020] A ceramic-reinforced metal matrix composite material was prepared using the above-described preparation method.

[0021] The advantages and positive effects of this invention are: 1. This invention uses atomic layer deposition to treat the surface of ceramic particles of different shapes. The deposition process is seamless, and each particle surface can be treated. At the same time, the thickness of the deposited film can be precisely controlled, resulting in a more uniform film and reducing defects caused by uneven coating.

[0022] 2. This invention deposits an alumina film, nickel film, or titanium oxide film on the surface of ceramic particles using atomic layer deposition technology. This effectively improves the wettability between the ceramic particles and the metal matrix, avoids impregnation defects during the casting process, and improves the finished product quality of metal-ceramic composite products. At the same time, the deposited film serves as an effective transition layer between the metal and the ceramic, enhancing the bonding strength between the metal matrix and the ceramic particles, forming a more stable composite interface between the metal and the ceramic, and improving the overall performance of the composite material.

[0023] 3. This invention deposits a film on the surface of ceramic particles through atomic layer deposition. The deposition process is carried out at a low temperature, thus avoiding thermal damage to the ceramic particles. 4. This invention deposits thin films such as alumina or Ni films on the surface of ceramic particles through atomic layer deposition, which can make the surface of ceramic particles have better corrosion resistance and wear resistance. Attached Figure Description

[0024] Figure 1 This is a schematic flowchart of the preparation method of ceramic-reinforced metal matrix composite material based on atomic layer deposition coating according to the present invention. Detailed Implementation

[0025] To make the objectives, technical solutions, and advantages of this invention clearer, and to further understand the invention's content, features, and effects, the following specific embodiments are provided to further illustrate the invention in detail. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of the invention.

[0026] like Figure 1As shown in the figure, this embodiment provides a method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition coating. The specific steps are as follows: Step 1: Pretreatment of ceramic particles Step 11: Clean the surface of the ceramic particles to remove impurities and oxides, and then dry the ceramic particles to remove moisture. Step 12: Roughen the dried ceramic particles to increase surface roughness; Step 13: Perform surface activation treatment on the roughened ceramic particles; Step 2: Atomic layer deposition coating on the surface of ceramic particles Step 21: Place the surface-activated ceramic particles in the reaction chamber of the atomic layer deposition equipment for preheating to remove residual moisture; Step 22: After preheating, raise the temperature of the atomic layer deposition equipment to the target temperature at a certain heating rate, and set the pressure in the reaction chamber; Step 23: Depending on the type of pre-coated film, the precursor gas is alternately introduced into the reaction chamber; Step 24: Purge the reaction chamber with inert gas to remove unreacted precursor gases and byproducts; Step 25: Supply oxygen to the reaction chamber and then purge with inert gas to remove unreacted gases and byproducts. Repeat steps 23 to 25 until the desired film thickness is achieved; Step 26: After the thin film deposition is completed, the ceramic particles are cooled to room temperature under vacuum and then removed for annealing. Step 3: Preparation of ceramic-reinforced metal matrix composites Step 31: Mix the ceramic particles with the thin film deposited on the surface with the binder in a certain proportion, fill them into the honeycomb mold, and obtain the honeycomb ceramic preform after curing. Step 32: Fix the honeycomb ceramic preform in the casting cavity, pour in molten metal, and obtain a ceramic-reinforced metal matrix composite product.

[0027] In a preferred embodiment, in step 11, the ceramic particles mainly include one or more of the following: zirconium corundum ceramic particles, silicon nitride ceramic particles, titanium nitride ceramic particles, silicon carbide ceramic particles, titanium boride ceramic particles, or titanium carbide ceramic particles; the ceramic particles are spherical or any irregular shape, and the particle size is 2~5mm.

[0028] In step 11, the surface cleaning of ceramic particles mainly involves immersing the ceramic particles in 5%-10% hydrochloric acid or nitric acid for 10-30 minutes, and then rinsing them repeatedly with deionized water to ensure no acid residue; or using ultrasonic cleaning or plasma cleaning.

[0029] In a preferred embodiment, step 12 can be used to roughen the ceramic particles by sandblasting to increase the surface area and improve the adhesion of the material during subsequent deposition coating.

[0030] In a preferred embodiment, step 13 involves surface activation of the ceramic particles, which mainly involves treating the ceramic particles with oxygen plasma to increase the hydroxyl groups on the surface of the ceramic particles and promote the adsorption of precursors.

[0031] In a preferred embodiment, in step 21, the ceramic particles in the reaction chamber are placed on a vibrating table or a rotating table to avoid particle accumulation; the preheating temperature is 100-250℃ and the preheating time is 10-30min.

[0032] In a preferred embodiment, in step 22, the target temperature of the reaction chamber is set to 150-350°C, the heating rate is 5°C / min-8°C / min, and the vacuum degree is 10. -3 ~10 -5 Torr.

[0033] In a preferred embodiment, in step 23, the precursor gas is any one of aluminum chloride (AlCl3) or trimethylaluminum (TMA), di(ethylcyclopentadienyl)nickel (Ni(EtCp)2) or bis(cyclopentadienyl)nickel (NiCp2), titanium tetraisopropoxide (TTIP) or titanium tetrachloride (TiCl4). The precursor gas supply time is 1-8 seconds.

[0034] In a preferred embodiment, in step 24, the inert gas is nitrogen or argon, and the purging time lasts for 20 to 50 seconds.

[0035] In a preferred embodiment, in step 25, the oxygen source is water vapor, oxygen, hydrogen, or hydrazine, and the supply time is 1-8 seconds; the inert gas is continuously purged for 20-50 seconds.

[0036] Steps 23-25 ​​are repeated 100-500 times, with a film thickness of 10nm-50nm.

[0037] In a preferred embodiment, step 26 involves annealing under a nitrogen or argon atmosphere at a temperature of 300-800°C for 0.5-2 hours. The main purpose is to improve the density and adhesion of the deposited film.

[0038] In a preferred embodiment, in step 31, the binder is a mixture of sodium silicate solution and water, wherein the mass ratio of sodium silicate solution to water is between 4:1 and 9:1, and the mass ratio of ceramic particles to binder is 100:(4~10); the holes of the honeycomb mold can be hexagonal, circular, or other shapes.

[0039] In a preferred embodiment, in step 32, the molten metal is high-chromium cast iron, high-manganese steel, or high-alloy steel, and the ceramic-reinforced metal matrix composite products made include roller sleeves, liners, hammers, etc.

[0040] To make the present invention clearer, the present invention will be further described in detail below with reference to specific embodiments: Example 1 This embodiment 1 provides a method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition coating, the specific steps of which are as follows: Step 1: Pretreatment of ceramic particles Step 11: Soak spherical zirconium corundum ceramic particles with a particle size of 2-4 mm in a 5% hydrochloric acid solution for 20 minutes to clean the surface of the ceramic particles, remove impurities and oxides, and then rinse repeatedly with deionized water to ensure no acid residue; then dry the ceramic particles to remove moisture. Step 12: Sandblast the dried ceramic particles to increase surface roughness; Step 13: The roughened spherical zirconium corundum ceramic particles are subjected to oxygen plasma treatment to increase the hydroxyl groups on the surface of the ceramic particles.

[0041] Step 2: Atomic layer deposition coating on the surface of ceramic particles Step 21: Place the surface-activated ceramic particles on the vibration table in the reaction chamber, set the preheating temperature to 200℃ and the preheating time to 20min, and remove residual moisture. Step 22: After preheating, raise the temperature of the reaction chamber to 250°C at a heating rate of 5°C / min, with a vacuum degree of 10. -3 Torr; Step 23: Trimethylaluminum (TMA) is introduced into the reaction chamber and pulsed for 5 seconds. Trimethylaluminum (TMA) undergoes chemical adsorption on the surface of zirconium corundum (ZTA) ceramic particles, forming strong chemical bonds. Step 24: Purge the reaction chamber with argon gas for 60 seconds to remove unreacted precursor gases and byproducts, and avoid the residue of precursor gases and byproducts. Step 25: Water vapor (H2O) is introduced into the reaction chamber for 5 seconds. The water vapor reacts alternately with trimethylaluminum (TMA) to form an alumina film on the surface of the ceramic particles. Then, argon gas is introduced again to purge the reaction chamber for 50 seconds to remove residual water vapor and byproducts. Repeat steps 23 to 25 a total of 350 times, with a film thickness of 30 to 42 nm. Step 26: Cool the ceramic particles to room temperature under vacuum, then remove them and anneal them in an argon atmosphere. The annealing temperature is set to 500℃ and the holding time is 1.5h to improve the density and adhesion of the deposited film.

[0042] Step 3: Preparation of ceramic-reinforced metal matrix composites Step 31: Mix 5 parts by weight of sodium silicate solution with 1 part by weight of water evenly, then put 100 parts by weight of zirconium corundum ceramic particles with a thin film deposited on the surface into 6 parts by weight of the mixed sodium silicate aqueous solution, stir evenly, fill into a honeycomb mold, and place in an oven for curing. The oven temperature is 120℃ and the curing time is 20h to obtain a honeycomb ceramic preform. Step 32: Fix the honeycomb ceramic preform in the casting cavity, pour in high alloy steel liquid at a pouring temperature of 1550℃ and a pouring speed of 10kg / s to obtain ceramic-reinforced metal matrix composite material products.

[0043] Example 2 This embodiment 2 provides a method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition coating, the specific steps of which are as follows: Step 1: Pretreatment of ceramic particles Step 11: Immerse irregularly shaped zirconium corundum ceramic particles and silicon nitride ceramic particles with a particle size of 3-5 mm in an 8% nitric acid solution for 15 minutes to clean the surface of the ceramic particles, remove impurities and oxides, and then rinse repeatedly with deionized water to ensure no acid residue; then dry the ceramic particles to remove moisture. Step 12: The dried zirconium corundum ceramic particles and silicon nitride ceramic particles are sandblasted to increase surface roughness. Step 13: The irregularly shaped zirconium corundum ceramic particles and silicon nitride ceramic particles after roughening treatment are subjected to oxygen plasma treatment to increase the hydroxyl groups on the surface of the ceramic particles.

[0044] Step 2: Atomic layer deposition coating on the surface of ceramic particles Step 21: Place the surface-activated zirconium corundum ceramic particles and silicon nitride ceramic particles on the vibration table in the reaction chamber, set the preheating temperature to 150℃ and the preheating time to 30min, and remove residual moisture. Step 22: After preheating, raise the temperature of the reaction chamber containing the zirconium corundum ceramic particles to 200°C at a heating rate of 6°C / min, and raise the temperature of the reaction chamber containing the silicon nitride ceramic particles to 300°C, with a vacuum degree of 10. -4 Torr; Step 23: Di(ethylcyclopentadienyl)nickel (Ni(EtCp)2) is introduced into the reaction chamber containing zirconium corundum ceramic particles, and bis(cyclopentadienyl)nickel (NiCp2) is introduced into the reaction chamber containing silicon nitride ceramic particles. The pulse time is 4s. The precursor gas undergoes chemical adsorption with the surface of the ceramic particles to form strong chemical bonds. Step 24: Purge the reaction chamber with nitrogen for 40 seconds to remove unreacted precursor gases and byproducts, and avoid any residue of precursor gases and byproducts. Step 25: Hydrazine (N2H4) is introduced into the reaction chamber containing zirconium corundum ceramic particles, and hydrogen (H2) is introduced into the reaction chamber containing silicon nitride ceramic particles for 6 seconds. Hydrazine, hydrogen and precursor gases react alternately to form nickel films on the surfaces of zirconium corundum ceramic particles and silicon nitride ceramic particles, respectively. Then nitrogen gas is introduced again to purge the reaction chamber for 40 seconds to remove residual gases and byproducts. Repeat steps 23 to 25 a total of 450 times, with a film thickness of 25 to 35 nm. Step 26: The zirconium corundum ceramic particles and silicon nitride ceramic particles are cooled to room temperature under vacuum, then taken out and annealed in a nitrogen atmosphere. The annealing temperature is set to 300℃ and the holding time is 2h to improve the density and adhesion of the deposited film.

[0045] Step 3: Preparation of ceramic-reinforced metal matrix composites Step 31: Mix 7 parts by weight of sodium silicate solution with 1 part by weight of water evenly. Then, mix 80 parts by weight of zirconium corundum ceramic particles and 20 parts by weight of silicon nitride ceramic particles after the thin film has been deposited on the surface evenly. Put the mixture into 8 parts by weight of the mixed sodium silicate aqueous solution, stir evenly, fill it into the honeycomb mold, and put it into the oven for curing. The oven temperature is 150℃ and the curing time is 15h to obtain the honeycomb ceramic preform. Step 32: Fix the honeycomb ceramic preform in the casting cavity, pour high-chromium cast iron liquid at a pouring temperature of 1560℃ and a pouring speed of 9kg / s to obtain ceramic-reinforced metal matrix composite material products.

[0046] Example 3 This embodiment 3 provides a method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition coating, the specific steps of which are as follows: Step 1: Pretreatment of ceramic particles Step 11: Immerse irregularly shaped zirconium corundum ceramic particles, silicon nitride ceramic particles, and titanium carbide ceramic particles with a particle size of 2.5-4.5 mm in a 5% hydrochloric acid solution for 15 minutes to clean the surface of the ceramic particles, remove impurities and oxides, and then rinse repeatedly with deionized water to ensure no acid residue; then dry the ceramic particles to remove moisture. Step 12: The dried zirconium corundum ceramic particles, silicon nitride ceramic particles, and titanium carbide ceramic particles are sandblasted to increase surface roughness. Step 13: The irregularly shaped zirconium corundum ceramic particles, silicon nitride ceramic particles, and titanium carbide ceramic particles after roughening treatment are surface activated by oxygen plasma treatment, resulting in hydroxyl groups on the surface of the ceramic particles.

[0047] Step 2: Atomic layer deposition coating on the surface of ceramic particles Step 21: Place the surface-activated zirconium corundum ceramic particles, silicon nitride ceramic particles, and titanium carbide ceramic particles on the vibration table in the reaction chamber, set the preheating temperature to 180℃ and the preheating time to 25min, and remove residual moisture. Step 22: After preheating, the temperature of the reaction chambers for the three types of ceramic particles is increased to 250°C at a heating rate of 8°C / min, with a vacuum degree of 10. -5 Torr; Step 23: Titanium chloride (TiCl4) is introduced into the reaction chamber and pulsed for 3 seconds. The precursor gas undergoes chemical adsorption with the surface of the ceramic particles, forming strong chemical bonds. Step 24: Purge the reaction chamber with nitrogen for 30 seconds to remove unreacted precursor gases and byproducts, and avoid any residue of precursor gases and byproducts. Step 25: Water vapor (H2O) is introduced into the reaction chamber for 2 seconds. The water vapor reacts alternately with the precursor gas to form titanium oxide films on the surfaces of the three types of ceramic particles. Then, nitrogen gas is introduced again to purge the reaction chamber for 30 seconds to remove residual gas and byproducts. Repeat steps 23 to 25 a total of 500 times, with a film thickness of 20 to 30 nm; Step 26: The zirconium corundum ceramic particles, silicon nitride ceramic particles, and titanium carbide ceramic particles are cooled to room temperature under vacuum, then removed and annealed in a nitrogen atmosphere at a temperature of 400°C for 1.5 hours to improve the density and adhesion of the deposited film.

[0048] Step 3: Preparation of ceramic-reinforced metal matrix composites Step 31: Mix 9 parts by weight of sodium silicate solution with 1 part by weight of water evenly. Then, mix 60 parts by weight of zirconium corundum ceramic particles, 20 parts by weight of silicon nitride ceramic particles, and 20 parts by weight of titanium carbide ceramic particles with the thin film deposited on the surface evenly, and put them into 10 parts by weight of the mixed sodium silicate aqueous solution. Stir evenly and fill it into a honeycomb mold. Place it in an oven for curing at 180°C for 18 hours to obtain a honeycomb ceramic preform. Step 32: Fix the honeycomb ceramic preform in the casting cavity, pour in high manganese steel liquid at a pouring temperature of 1550℃ and a pouring speed of 8kg / s to obtain ceramic-reinforced metal matrix composite material products.

[0049] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) coatings, characterized in that, The specific steps are as follows: Step 1: Pretreatment of ceramic particles Step 11: Clean the surface of the ceramic particles to remove impurities and oxides, and then dry the ceramic particles. Step 12: Roughen the dried ceramic particles; Step 13: Perform surface activation treatment on the roughened ceramic particles; Step 2: Atomic layer deposition coating on the surface of ceramic particles Step 21: Place the surface-activated ceramic particles in the reaction chamber of the atomic layer deposition equipment for preheating to remove residual moisture; Step 22: After preheating, raise the temperature of the atomic layer deposition equipment to the target temperature at a certain heating rate, and set the pressure in the reaction chamber; Step 23: Depending on the type of pre-coated film, the precursor gas is alternately introduced into the reaction chamber; Step 24: Purge the reaction chamber with inert gas to remove unreacted precursor gases and byproducts; Step 25: Supply oxygen to the reaction chamber and then purge with inert gas to remove unreacted gases and byproducts. Repeat steps 23 to 25 until the desired film thickness is achieved; Step 26: After the thin film deposition is completed, the ceramic particles are cooled to room temperature under vacuum and then removed for annealing. Step 3: Preparation of ceramic-reinforced metal matrix composites Ceramic particles with a thin film deposited on the surface are mixed with a binder to prepare a honeycomb ceramic preform, and then molten metal is poured in to obtain a ceramic-reinforced metal matrix composite product.

2. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) film according to claim 1, characterized in that, In step 11, the ceramic particles mainly include one or more of the following: zirconium corundum ceramic particles, silicon nitride ceramic particles, titanium nitride ceramic particles, silicon carbide ceramic particles, titanium boride ceramic particles, or titanium carbide ceramic particles; the ceramic particles are spherical or any irregular shape, and the particle size is 2~5mm.

3. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) film according to claim 1, characterized in that, In step 11, the surface cleaning of ceramic particles mainly involves immersing the ceramic particles in 5%-10% hydrochloric acid or nitric acid for 10-30 minutes, and then rinsing them repeatedly with deionized water to ensure no acid residue; or using ultrasonic cleaning or plasma cleaning.

4. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) film according to claim 1, characterized in that, In step 12, the roughening treatment of the ceramic particles is achieved by sandblasting.

5. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) according to claim 1, characterized in that, In step 13, the surface activation treatment of ceramic particles mainly involves treating the ceramic particles with oxygen plasma.

6. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) according to claim 1, characterized in that, In step 21, the ceramic particles in the reaction chamber are placed on a vibrating table or a rotating table; the preheating temperature is 100-250℃ and the preheating time is 10-30min.

7. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) film according to claim 1, characterized in that, In step 22, the target temperature of the reaction chamber is set to 150-350℃, the heating rate is 5℃ / min-8℃ / min, and the vacuum degree is 10. -3 ~10 -5 Torr.

8. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) according to claim 1, characterized in that, In step 23, the precursor gas is any one of aluminum chloride or trimethylaluminum, di(ethylcyclopentadienyl)nickel or bis(cyclopentadienyl)nickel, titanium tetraisopropoxide or titanium tetrachloride; the precursor gas supply time is 1-8s.

9. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) film according to claim 1, characterized in that, In step 24, the inert gas is nitrogen or argon; In step 25, the oxygen source is water vapor, oxygen, hydrogen, or hydrazine, and the supply time is 1-8 seconds.

10. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) according to claim 1, characterized in that, Steps 23-25 ​​are repeated 100-500 times, with a film thickness of 10nm-50nm.

11. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) film according to claim 1, characterized in that, In step 26, the annealing process is carried out under a nitrogen or argon atmosphere at a temperature of 300-800℃ for a holding time of 0.5-2 hours.

12. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) according to claim 1, characterized in that, In step 31, the binder is a mixture of sodium silicate solution and water, wherein the mass ratio of sodium silicate solution to water is between 4:1 and 9:1, and the mass ratio of ceramic particles to binder is 100:(4~10).

13. The method for preparing ceramic-reinforced metal matrix composites based on atomic layer deposition (ALD) according to claim 1, characterized in that, In step 32, the molten metal is high-chromium cast iron, high-manganese steel, or high-alloy steel.

14. A ceramic-reinforced metal matrix composite material, characterized in that, It is prepared by the preparation method according to any one of claims 1 to 13.

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