A single-polarization broadband signal anti-reflection power generation glass, etching method and installation method

Abstract

This invention discloses a single-polarization broadband signal anti-reflection power-generating glass, an etching method, and an installation method, relating to the fields of communication and photovoltaic power generation technology. The power-generating glass includes an ultra-clear glass substrate and a plurality of single-segment thin-film solar cells connected in series within a layer of the ultra-clear glass substrate. Each single-segment thin-film solar cell includes a positive electrode, a power-generating thin film layer, and a back electrode. The positive electrode, power-generating thin film layer, and back electrode are sequentially stacked and bonded along the thickness direction of the ultra-clear glass substrate, and each is etched with periodically arranged rectangular patterns. The long side of each rectangular pattern is horizontal, forming a frequency-selective surface for the penetration of vertically polarized electromagnetic signals. This invention, by etching rectangular patterns on the power-generating glass, achieves efficient transmission of signals in the target frequency band while ensuring power generation functionality, solving the problem of traditional power-generating glass blocking communication signals and improving the quality of broadband signal transmission.

Description

Technical Field

[0001] This invention relates to the fields of communication and photovoltaic power generation technology, and in particular to a single-polarization broadband signal anti-reflection power generation glass, an etching method, and an installation method. Background Technology

[0002] Photovoltaic glass, a material combining photovoltaic power generation and building integration, achieves electrical energy conversion through the photovoltaic effect. Specifically, when sunlight shines on the surface of the photovoltaic glass, photon energy is absorbed, generating electron-hole pairs. These photogenerated carriers separate under the influence of a built-in electric field, forming an electric current. The collected electrical energy can be used to power electrical appliances, which is of great significance for promoting carbon neutrality goals. Photovoltaic glass is typically composed of an ultra-clear glass substrate, a positive electrode, a back electrode in the interlayer, and a photovoltaic thin film layer. However, the presence of the positive and back electrodes can significantly block wireless communication signals, leading to a decrease in communication quality and causing inconvenience to daily life and production.

[0003] In existing power-generating glass designs, non-power-generating areas and regions that conduct electrical energy but do not generate photogenerated carriers are called dead zones. Dead zones affect current collection efficiency, increase series resistance, and reduce power generation efficiency. Meanwhile, light transmittance, as a key parameter, directly affects the lighting effect and power generation efficiency, but current technologies struggle to balance power generation functionality and signal transmittance.

[0004] With the development of broadband communication technology, higher requirements are being placed on the signal transmission performance of power-generating glass. Traditional products cannot meet the high-efficiency signal transmission needs of target frequency bands. Therefore, there is an urgent need for power-generating glass and related methods that can achieve high transmittance of vertically polarized electromagnetic signals in specific frequency bands while ensuring power generation efficiency and light transmittance, in order to fill the gap in existing technologies. Summary of the Invention

[0005] The technical problem this invention aims to solve is that, in existing technologies in the fields of communication and photovoltaic power generation, the positive and back electrodes of the photovoltaic glass block wireless communication signals, affecting communication quality. Furthermore, dead zones and light transmittance issues reduce power generation efficiency, failing to meet the signal transmission requirements of the target frequency band. Therefore, an effective solution is urgently needed to address these technical problems.

[0006] To solve the above-mentioned technical problems, the technical solution adopted by the present invention is as follows:

[0007] In a first aspect, the present invention provides a single-polarization broadband signal anti-reflection power generation glass, comprising an ultra-white glass substrate and a plurality of single-segment thin-film solar cells connected in series in the interlayer of the ultra-white glass substrate. The single-segment thin-film solar cells include a positive electrode, a power generation thin film layer and a back electrode. The positive electrode, the power generation thin film layer and the back electrode are sequentially stacked and bonded along the thickness direction of the ultra-white glass substrate, and each is etched with a periodically arranged rectangular pattern. The long side of the rectangular pattern is horizontal, and the rectangular pattern forms a frequency-selective surface for the penetration of vertically polarized electromagnetic signals.

[0008] In one implementation, the interval between the rectangular patterns is 1. -3000 The width of the rectangular pattern is 1. -3000 .

[0009] In one implementation, etch-free regions are provided at both ends of the positive electrode, the power generation thin film layer, and the back electrode in the horizontal direction. The width of the etch-free region is equal to the width of the single-polarized broadband signal anti-reflection power generation glass, and the length of the etch-free region is equal to half the length of a single single-cell thin-film solar cell. The etch-free region is used to connect wires to lead out the current generated by the power generation thin film.

[0010] In one implementation, a gap is provided between two adjacent single-cell thin-film solar cells, the gap comprising a P1 laser-etched groove filled with an insulating polymer, a P2 laser-etched groove filled with a back electrode material, and a P3 laser-etched groove filled with EVA adhesive.

[0011] In one implementation, the single-polarized broadband signal anti-reflection power generation glass has a dead zone, which is a non-power generation region in the single-section thin-film solar cell and a region that can conduct electrical energy but cannot effectively generate photogenerated carriers.

[0012] The dead zone includes a basic dead zone and an additional dead zone. The basic dead zone is the gap between two adjacent single-cell thin-film solar cells, and the additional dead zone is the area that cannot generate electricity after etching.

[0013] Secondly, embodiments of the present invention also provide an etching method for a single-polarization broadband signal anti-reflection power generation glass, applicable to the single-polarization broadband signal anti-reflection power generation glass described in any of the above solutions, wherein the etching method includes:

[0014] The positive electrode, power-generating thin film layer, and back electrode of the single-section thin-film solar cell are etched to form a periodically arranged rectangular pattern.

[0015] In one implementation, the formula for calculating the etching area of ​​the rectangular pattern is:

[0016]

[0017] in, The etched area of ​​the rectangular pattern is [area]. The width of the single-polarized broadband signal anti-reflection power-generating glass, The length of the rectangular pattern is... The width of the rectangular pattern. The interval distance of the rectangular pattern;

[0018] The formula for calculating the area of ​​the basic dead zone is:

[0019]

[0020] in, The area of ​​the basic dead zone, The length of the single-polarized broadband signal anti-reflection power-generating glass. The distance between two adjacent single-segment thin-film solar cells. The length of a single segment of the thin-film solar cell;

[0021] The formula for calculating the area of ​​the additional dead zone is:

[0022]

[0023] in, The area of ​​the additional dead zone;

[0024] The formula for calculating the total area of ​​the dead zone of the single-polarization broadband signal anti-reflection power-generating glass is as follows:

[0025]

[0026]

[0027] in, The total area of ​​the dead zone.

[0028] In one implementation, the formula for calculating the transmittance of the single-polarized broadband signal antireflection power-generating glass before etching is:

[0029]

[0030] in, The transmittance before etching;

[0031] The formula for calculating the transmittance of the single-polarized broadband signal anti-reflection power generation glass after etching is as follows:

[0032]

[0033] in, The transmittance after etching;

[0034] The conversion formula between the light transmittance of the single-polarized broadband signal anti-reflection power generation glass and the etched area of ​​the rectangular pattern is as follows:

[0035]

[0036] In one implementation, the proportion of the etched area of ​​the rectangular pattern is determined based on the target frequency point, and the spacing distance and width of the rectangular pattern are determined based on the etched area of ​​the rectangular pattern.

[0037] When the target frequency is 3.6GHz, 10GHz, or 28GHz, the percentage of the etched area of ​​the rectangular pattern, the spacing of the rectangular patterns, and the width of the rectangular patterns in the single-polarization broadband signal antireflection glass at the target frequency where the penetration loss to vertically polarized electromagnetic signals is ≤5dB are specifically as follows:

[0038] The etched area of ​​the rectangular pattern accounts for 10%, the spacing between the rectangular patterns is 0.3mm-2.2mm, and the width of the rectangular pattern is 0.03mm-0.24mm.

[0039] Alternatively, the etched area of ​​the rectangular pattern may account for 20%, the spacing between the rectangular patterns may be 0.4mm-2.4mm, and the width of the rectangular pattern may be 0.1mm-0.6mm.

[0040] Alternatively, the etched area of ​​the rectangular pattern may account for 30%, the spacing between the rectangular patterns may be 0.6mm-2.8mm, and the width of the rectangular pattern may be 0.26mm-1.2mm.

[0041] Alternatively, the etched area of ​​the rectangular pattern accounts for 40%, the spacing between the rectangular patterns is 0.8mm-2.6mm, and the width of the rectangular pattern is 0.53mm-1.73mm.

[0042] Alternatively, the etched area of ​​the rectangular pattern may account for 50%, the spacing between the rectangular patterns may be 0.9mm-2.3mm, and the width of the rectangular pattern may be 0.9mm-2.3mm.

[0043] Alternatively, the etched area of ​​the rectangular pattern may account for 60%, the spacing between the rectangular patterns may be 1.2mm-1.6mm, and the width of the rectangular pattern may be 1.8mm-2.4mm.

[0044] Thirdly, embodiments of the present invention also provide an installation method for a single-polarization broadband signal anti-reflection power generation glass, applicable to the single-polarization broadband signal anti-reflection power generation glass described in any of the above solutions, the installation method comprising:

[0045] The single-polarized broadband signal anti-reflective power generation glass is installed with the long side of the rectangular pattern parallel to the ground.

[0046] Beneficial Effects: This invention discloses a single-polarization broadband signal anti-reflection power-generating glass, an etching method, and an installation method, relating to the fields of communication and photovoltaic power generation technology. The power-generating glass includes an ultra-clear glass substrate and a plurality of single-segment thin-film solar cells connected in series within the interlayer of the ultra-clear glass substrate. Each single-segment thin-film solar cell includes a positive electrode, a power-generating thin film layer, and a back electrode. The positive electrode, the power-generating thin film layer, and the back electrode are sequentially stacked and bonded along the thickness direction of the ultra-clear glass substrate, and each is etched with periodically arranged rectangular patterns. The long side of the rectangular patterns is horizontal, and the rectangular patterns form a frequency-selective surface for the penetration of vertically polarized electromagnetic signals. This invention forms a frequency-selective surface by etching periodic rectangular patterns with horizontal long sides, adapting to vertically polarized signals, reducing the penetration loss of multiple target frequency bands, solving the problem of traditional power-generating glass blocking communication signals, and is suitable for scenarios that need to balance photovoltaic power generation and communication transmission, thus improving the quality of broadband signal transmission. Attached Figure Description

[0047] Figure 1 This is a schematic diagram of the etched rectangular pattern of a single-polarization broadband signal anti-reflection power generation glass provided in an embodiment of the present invention.

[0048] Figure 2 This is a schematic diagram of the structure of the single-polarized broadband signal anti-reflection power generation glass provided in an embodiment of the present invention before etching.

[0049] Figure 3 This is a schematic diagram of the installation method of the single-polarized broadband signal anti-reflection power generation glass provided in an embodiment of the present invention.

[0050] Figure 4 This is a simulation diagram of the transmission amplitude at three frequency points at different intervals under 10% of the etching area of ​​the etching method for single-polarized broadband signal anti-reflection power generation glass provided in the embodiments of the present invention.

[0051] Figure 5 This is a simulation diagram of the transmission amplitude at three frequency points with different spacing distances under 20% etching area of ​​the etching method for single-polarized broadband signal anti-reflection power generation glass provided in the embodiments of the present invention.

[0052] Figure 6This is a simulation diagram of the transmission amplitude at three frequency points at different intervals under 30% etching area of ​​the etching method for single-polarized broadband signal anti-reflection power generation glass provided in the embodiments of the present invention.

[0053] Figure 7 This is a simulation diagram of the transmission amplitude at three frequency points at different intervals under 40% etching area of ​​the etching method for single-polarized broadband signal anti-reflection power generation glass provided in the embodiments of the present invention.

[0054] Figure 8 This is a simulation diagram of the transmission amplitude at three frequency points at different intervals under 50% etching area of ​​the etching method for single-polarized broadband signal anti-reflection power generation glass provided in the embodiments of the present invention.

[0055] Figure 9 This is a simulation diagram of the transmission amplitude at three frequency points at different intervals under 60% of the etching area of ​​the etching method for single-polarized broadband signal anti-reflection power generation glass provided in the embodiments of the present invention.

[0056] Figure 10 This is a simulation comparison of the single-polarization transmission amplitude before and after etching of the single-polarization broadband signal anti-reflection power generation glass provided in this embodiment of the invention.

[0057] 100. Single-segment thin-film solar cell; 200. Gap between adjacent single-segment thin-film solar cells; 300. Rectangular pattern; 400. Ultra-white glass substrate; 500. EVA adhesive; 600. P1 laser-etched groove; 700. P2 laser-etched groove; 800. P3 laser-etched groove; 101. Positive electrode; 102. Power generation thin film layer; 103. Back electrode. Detailed Implementation

[0058] To make the objectives, technical solutions, and effects of this invention clearer and more explicit, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

[0059] The flowchart shown in the attached diagram is for illustrative purposes only and does not necessarily include all content, operations, or steps, nor does it require execution in the described order. For example, some operations or steps can be broken down, combined, or partially merged, so the actual execution order may change depending on the actual situation.

[0060] It should be understood that the terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to limit the invention. As used in this specification and the appended claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise.

[0061] It should be understood that, in order to clearly describe the technical solutions of the embodiments of the present invention, the terms "first" and "second" are used in the embodiments of the present invention to distinguish identical or similar items with essentially the same function and effect. For example, "first control information" and "second control information" are only used to distinguish different control information and do not limit their order.

[0062] Those skilled in the art will understand that the words "first" and "second" do not limit the quantity or the order of execution, and that the words "first" and "second" do not necessarily imply that they are different.

[0063] It should also be understood that the term “and / or” as used in this specification and the appended claims refers to any combination of one or more of the associated listed items and all possible combinations, and includes such combinations.

[0064] Photovoltaic glass, a material combining photovoltaic power generation and building integration, achieves electrical energy conversion through the photovoltaic effect. Specifically, when sunlight shines on the surface of the cell, photon energy is absorbed, generating electron-hole pairs. These photogenerated carriers separate under the influence of a built-in electric field, forming an electric current. The collected electrical energy can be used to power small electrical appliances, which is of great significance to promoting the goal of carbon neutrality. Photovoltaic glass is usually composed of an ultra-clear glass substrate, a positive electrode, a back electrode in the interlayer, and a photovoltaic thin film layer. However, the presence of the positive and back electrodes can significantly block wireless communication signals, leading to a decrease in communication quality and causing inconvenience to daily life and production.

[0065] In existing photovoltaic glass designs, the dead zone is defined as the non-power-generating region within a single-cell thin-film solar cell, as well as regions that, while capable of conducting electrical energy, cannot effectively generate photogenerated carriers. In other words, the dead zone refers to areas that do not contribute to the cell's output power during photoelectric conversion. The presence of the dead zone affects the cell's internal current collection efficiency. In photovoltaic glass, current needs to be collected and conducted through structures such as electrodes. The dead zone may lead to increased current loss during transmission, reducing the cell's output current and thus affecting power generation efficiency. For example, when the dead zone width increases, the cell's series resistance may increase, leading to increased energy loss during current transmission and reduced efficiency. Therefore, the dead zone area is crucial to the photovoltaic glass's power generation efficiency.

[0066] Furthermore, in power-generating glass, transmittance is defined as the ratio of transmitted light intensity to incident light intensity when light passes through the glass, usually expressed as a percentage. Transmittance is an important parameter for measuring the optical performance of power-generating glass, directly affecting its lighting effect and power generation efficiency in building-integrated applications. However, current technologies struggle to balance power generation functionality with signal transmittance.

[0067] With the development of broadband communication technology, higher requirements are placed on the signal transmission performance of power-generating glass, and traditional products cannot meet the high-efficiency signal transmission needs of the target frequency band.

[0068] Therefore, in order to ensure power generation efficiency and light transmittance while achieving high transmittance of vertically polarized electromagnetic signals in a specific frequency band in power generation glass, this embodiment provides a single-polarization broadband signal antireflection power generation glass, such as... Figure 1 As shown, a single-segment thin-film solar cell 100 connected in series is included in an ultra-white glass substrate and a plurality of single-segment thin-film solar cells 100 disposed in the interlayer of the ultra-white glass substrate. The single-segment thin-film solar cell 100 includes a positive electrode, a power generation thin film layer and a back electrode. The positive electrode, the power generation thin film layer and the back electrode are sequentially stacked and bonded along the thickness direction of the ultra-white glass substrate, and each is etched with a periodically arranged rectangular pattern 300. The long side of the rectangular pattern 300 is horizontal, and the rectangular pattern 300 forms a frequency-selective surface for vertically polarized electromagnetic signal penetration.

[0069] In this embodiment, Figure 2 A schematic diagram of the unetched photovoltaic glass structure is provided, showing the complete composition of the photovoltaic glass from top to bottom and the arrangement of each layer. Specifically, the top layer is an ultra-white glass substrate 400, which serves as the basic support layer for the photovoltaic glass. Below the upper ultra-white glass substrate 400 is the positive electrode 101, which is one of the current collection structures of the photovoltaic glass. The middle layer below the positive electrode 101 is the photovoltaic thin film layer 102, which is the core functional layer for realizing the photovoltaic effect, that is, the core functional layer for converting light energy into electrical energy. P1 laser-etched grooves 600 are spaced apart inside the positive electrode 101 and the photovoltaic thin film layer 102, and the interior is filled with insulating polymer to ensure insulation between the positive electrodes of adjacent single-cell thin-film solar cells 100. In the photovoltaic thin film layer 102, P2 laser-etched grooves 700 are provided. When preparing the back electrode, the back electrode material fills the P2 laser-etched grooves 700, so that the surfaces of the positive electrode 101 and the back electrode 103 are in contact, for forming a series connection between the single-cell thin-film solar cells 100. A back electrode 103 is disposed below the power generation thin film layer 102. A P3 laser groove 800 is disposed on the back electrode 103, away from the P1 laser groove 600, to ensure insulation between the negative electrodes of adjacent single-cell thin-film solar cells 100. Below the back electrode 103, an ultra-white glass substrate 400 is bonded to it with EVA adhesive 500. Together with the upper ultra-white glass substrate 400, they form a protective shell for the power generation glass, protecting the internal electrodes and thin film layer from external environmental influences.

[0070] The overall structure of the unetched power-generating glass is formed by alternating layers of ultra-white glass substrate 400, electrode layer, power-generating thin film layer 102 and EVA adhesive 500, without any etching treatment, thus fully presenting the basic physical structure of the power-generating glass.

[0071] In the unetched power-generating glass, the three layers—positive electrode 101, back electrode 103, and power-generating thin film layer 102—are stacked to form a continuous shielding structure, which physically blocks wireless communication signals. Because the electrode layers are conductive, they reflect or absorb electromagnetic signals, making it difficult for vertically polarized signals in the target frequency band to penetrate, thus affecting communication quality.

[0072] Therefore, in order to solve the problem of signal penetration, Figure 1 The diagram illustrates a spatially periodic distribution of an etched pattern. When the etched pattern is periodically distributed in space, the entire surface forms a slit array, which in turn constitutes a frequency-selective surface, equivalent to a bandpass filter, enabling electromagnetic waves in the target frequency band to have high transmittance.

[0073] Specifically, such as Figure 1 As shown, a complete power-generating glass is composed of several single-segment thin-film solar cells 100 connected in series. Adjacent single-segment thin-film solar cells 100 are separated by gaps 200. Each single-segment thin-film solar cell 100 includes a positive electrode 101, a back electrode 103, and a power-generating thin-film layer 102, arranged vertically as follows: positive electrode 101, power-generating thin-film layer 102, back electrode 103. By etching the single-segment thin-film solar cells 100, a specific rectangular pattern is formed, constituting a frequency-selective surface to control the induced current and surface impedance of the power-generating glass, thereby achieving high transmittance for target frequency wireless signals. Figure 1 As shown, The width of the entire power-generating glass panel. The length of the entire power-generating glass panel. The interval distance of the rectangular pattern 300. The length of the rectangular pattern 300 is... The width of the rectangular pattern 300 is... The distance between two adjacent single-segment thin-film solar cells 100 is the width of the gap 200 between adjacent single-segment thin-film solar cells. The length of a single segment of the thin-film solar cell 100. Figure 1 In one example, the power-generating glass comprises seven single-cell thin-film solar cells 100 and five etched rectangular patterns 300. Furthermore, the long side of the rectangular patterns 300 is horizontal, thus forming a frequency-selective surface for the penetration of vertically polarized electromagnetic signals.

[0074] The frequency-selective surface is applied to a target frequency band, which can be any frequency point or sub-band from 0 GHz to 40 GHz, for example, 0 GHz to 6 GHz, 8.5 GHz to 9.4 GHz, 10 GHz to 12.7 GHz, or 32 GHz to 37.5 GHz.

[0075] In one implementation, the spacing between the rectangular patterns 300 is 1. -3000 The width of the rectangular pattern 300 is 1. -3000 .

[0076] In this embodiment, for the specifically selected target frequency band, the spacing of the etched rectangular pattern 300 corresponds to a value range of 1. -3000 For example, 1 10 50 80 500 And so on, while the value range corresponding to the width of the etched rectangle is 1. -3000 For example, 10 50 60 80 100 wait.

[0077] In practical applications, the range of values ​​for the spacing and width of the rectangular pattern 300 is based on a balance design between the target frequency band signal penetration requirements and power generation efficiency. Specifically, it can be selected from two perspectives.

[0078] From the perspective of signal transmission enhancement, the spacing and width of the slits directly affect the filtering characteristics of the frequency-selective surface. The slit array formed by periodically etched patterns is equivalent to a bandpass filter, and its parameters must be matched to the electromagnetic wavelength of the target frequency band. When the spacing is close to 1 / 4 or 1 / 2 of the signal wavelength, the signal transmittance can be enhanced through a resonance effect. For example, for frequency bands such as 3.6 GHz or 28 GHz, selecting 1... -3000 The period and width can be adjusted by superimposing multiple periods to adapt to the signal penetration requirements of the frequency band, and the surface impedance can be more precisely controlled to reduce signal reflection.

[0079] From the perspective of power generation efficiency, the spacing and width determine the area ratio of the etched pattern. The etched area needs to retain sufficient power generation thin film layer 102 to generate photogenerated carriers. Overly dense periods or overly wide rectangles will result in an excessively large etched area, reducing power generation efficiency. Conversely, overly large periods or overly small widths may prevent the etched pattern from forming an effective frequency-selective surface, weakening the signal enhancement effect.

[0080] In one implementation, an etch-free region is provided at each end of the positive electrode 101, the power generation thin film layer 102, and the back electrode 103 in the horizontal direction. The width of the etch-free region is equal to the width of the single-polarized broadband signal anti-reflection power generation glass, and the length of the etch-free region is equal to half the length of a single single-segment thin-film solar cell 100. The etch-free region is used to connect wires to lead out the current generated by the power generation thin film.

[0081] In this embodiment, a certain length of the positive electrode 101, back electrode 103, and power generation thin film layer 102 of the power generation glass is retained without etching. Generally, the retention is made at both ends of the long side of the etched rectangular pattern 300, i.e., in the horizontal direction, but it can also be made at both ends of the short side. The length of this un-etched retention is half the length of a single single-cell thin-film solar cell 100. This length ensures that the battery modules at both ends maintain power generation function, and also allows for the collection of electrical energy by leading wires from both ends.

[0082] In one implementation, a gap is provided between two adjacent single-cell thin-film solar cells 100, the gap including a P1 laser-etched groove 600 filled with an insulating polymer, a P2 laser-etched groove 700 filled with a back electrode material, and a P3 laser-etched groove 800 filled with EVA adhesive.

[0083] In this embodiment, there are gaps between two adjacent single-segment thin-film solar cells 100, which are P1 laser-etched grooves 600, P2 laser-etched grooves 700, and P3 laser-etched grooves 800. Specifically, the P1 laser-etched groove 600 is filled with an insulating polymer, the P2 laser-etched groove 700 is filled with a back electrode metal material and partially with EVA film, and the P3 laser-etched groove 800 is filled with EVA film. Specifically, P1 laser-etched grooves 600 are spaced apart inside both the positive electrode 101 and the power-generating thin-film layer 102, filled with an insulating polymer to ensure insulation between the positive electrodes of adjacent single-segment thin-film solar cells 100. Specifically, P2 laser-etched grooves 700 are provided in the power-generating thin-film layer 102. When preparing the back electrode, the back electrode material fills the P2 laser-etched grooves 700, making the surfaces of the positive electrode 101 and the back electrode 103 in contact, for forming a series connection between the single-segment thin-film solar cells 100. A back electrode 103 is provided below the power-generating thin-film layer 102. On the back electrode 103, a P3 laser line groove 800 is provided in a direction away from the P1 laser line groove 600 to ensure insulation between the negative electrodes of adjacent single-cell thin-film solar cells 100.

[0084] The material in the gap 200 between adjacent single-cell thin-film solar cells is an integral part of the power-generating glass structure design, and its type selection must balance structural stability and power generation performance. Using an air cavity reduces light reflection loss, increases light transmittance, and facilitates light energy absorption by the power-generating thin-film layer 102. Choosing a vacuum cavity further reduces heat conduction, minimizing the impact of temperature changes on the cell module's performance, making it suitable for environments with large temperature differences. Selecting an adhesive layer such as EVA adhesive 500 enhances the bonding strength between adjacent modules, improves the overall structure's impact resistance and sealing, and prevents moisture and dust from entering and affecting electrode conductivity.

[0085] In one implementation, the single-polarized broadband signal anti-reflection power generation glass has a dead zone, which is a non-power generation region in the single-segment thin-film solar cell 100, and a region that can conduct electrical energy but cannot effectively generate photogenerated carriers.

[0086] The dead zone includes a basic dead zone and an additional dead zone. The basic dead zone is the gap between two adjacent single-cell thin-film solar cells 100, i.e., the gap 200 between adjacent single-cell thin-film solar cells. The additional dead zone is the area that cannot generate electricity after etching.

[0087] In this embodiment, the dead zone refers to the area in the power-generating glass that does not contribute to the battery's output power. Specifically, it includes non-power-generating areas that cannot generate photogenerated carriers, as well as areas that can conduct electrical energy but cannot effectively generate photogenerated carriers, i.e., conductive areas that do not participate in photoelectric conversion. Further, in this embodiment, the dead zone is divided into a basic dead zone and an additional dead zone. The basic dead zone refers to the gap between two adjacent single-cell thin-film solar cells 100, i.e., the laser lines of adjacent single-cell thin-film solar cells and the thermally affected failure area caused during laser line processing. It is the physical interval required for the internal circuit connection of the module and is an inherent dead zone in the unetched state. The additional dead zone refers to the area that cannot generate power after the rectangular pattern 300 is formed by the etching process, due to the removal of the electrode or the power-generating thin film layer 102. It is a functional dead zone caused by etching.

[0088] Therefore, the division and quantification of dead zones are crucial for balancing power generation efficiency and signal transmission enhancement performance. The basic dead zone, acting as the gap between adjacent single-cell thin-film solar cells 100, is essentially the physical spacing required for module connection. Although it doesn't directly participate in photoelectric conversion, its area can be adjusted by controlling the gap width, i.e., controlling the distance between adjacent modules. If the gap is too wide, it reduces the effective power generation area; if it's too wide or too narrow, it may cause electrical interference between modules. Therefore, adjustments need to be made in conjunction with parameters such as the length of individual modules. The additional dead zone is a functional area created by the etching process. Its area is directly related to the parameters of the etched rectangle. The larger the width and the smaller the spacing of the etched rectangular pattern 300, the higher the proportion of etched area, and the larger the corresponding additional dead zone area. This area cannot generate photogenerated carriers because the electrodes or thin film layer are etched, but the periodic pattern formed by etching constructs a frequency-selective surface, providing a channel for signal transmission. Therefore, the existence of additional dead zones is a trade-off between sacrificing some power generation area for signal transmission enhancement. The area of ​​the dead zone needs to be coordinated with the basic dead zone through etching parameters to ensure that the total dead zone area is within a reasonable range. This way, the power generation efficiency is not significantly reduced, and the penetration loss requirements of the target frequency band are met.

[0089] Based on the above embodiments, the present invention also provides an etching method for a single-polarization broadband signal anti-reflection power generation glass, applicable to the single-polarization broadband signal anti-reflection power generation glass described in any one of the above solutions, wherein the etching method includes:

[0090] The positive electrode 101, the power generation thin film layer 102, and the back electrode 103 of the single-section thin-film solar cell 100 are etched to form a periodically arranged rectangular pattern 300.

[0091] In this embodiment, an etching process is used to process the power-generating glass. Etching is a key step in semiconductor manufacturing, microelectronic integrated circuit manufacturing, and micro / nano manufacturing processes. It is a patterning process associated with photolithography and is mainly divided into dry etching and wet etching. Wet etching mainly uses a wet etching machine, which utilizes the chemical reaction between the solution and the pre-etching material to remove the parts not covered by the masking film material. For example, hydrofluoric acid solution is used to etch silicon dioxide to remove it. Dry etching mainly uses a reactive ion etching machine, which uses reactive ion etching to etch the material by physical and chemical reactions between ions and free radicals in plasma. In this embodiment, the choice is based on specific process requirements.

[0092] In the etching process, the retention area is first positioned, and un-etched areas are demarcated at both ends of the positive electrode 101, the power generation thin film layer 102, and the back electrode 103 in the horizontal direction to ensure that the lead-out channels of the wires are not damaged. Optionally, the length is half the length of a single single-cell thin-film solar cell 100, and the width is equal to the entire glass surface. Subsequently, laser etching is performed on the remaining areas to form a periodic rectangular pattern 300 with the long side along the horizontal direction.

[0093] Figure 10 The diagram illustrates the transmittance (S21) curves of the power-generating glass before and after the etching process. S21 is a commonly used scattering parameter in the RF microwave field, representing the signal transmission coefficient from port 2 to port 1, measured in decibels (dB). In this embodiment, S21 (dB) characterizes the power attenuation of vertically polarized electromagnetic signals after penetrating the power-generating glass. A higher S21 value, closer to 0dB, indicates lower signal penetration loss and better transmittance. It is evident that etching the power-generating glass enhances signal transmittance within the 0-40GHz frequency band. Currently, according to data from the Ministry of Industry and Information Technology, 2.515GHz to 2.675GHz is the 5G signal band with frequency number n41, 3.4GHz to 3.6GHz is the 5G signal band with frequency number n78, and 4.8GHz to 4.9GHz is the 5G signal band with frequency number n79. Internationally, millimeter-wave bands of 28GHz or 39GHz are used. The power-generating glass provided in this embodiment maintains high transmittance in these 5G signal frequency bands, and has application prospects and value in the construction and transportation industries.

[0094] In one implementation, the formula for calculating the etching area of ​​the rectangular pattern 300 is:

[0095]

[0096] in, The etching area of ​​the rectangular pattern 300. The width of the single-polarized broadband signal anti-reflection power-generating glass, The length of the rectangular pattern 300 is... The width of the rectangular pattern 300 is... The interval distance of the rectangular pattern 300;

[0097] The formula for calculating the area of ​​the basic dead zone is:

[0098]

[0099] in, The area of ​​the basic dead zone, The length of the single-polarized broadband signal anti-reflection power-generating glass. The distance between two adjacent single-segment thin-film solar cells 100 is the width of the gap 200 between adjacent single-segment thin-film solar cells. The length of a single single-segment thin-film solar cell 100;

[0100] The formula for calculating the area of ​​the additional dead zone is:

[0101]

[0102] in, The area of ​​the additional dead zone;

[0103] The formula for calculating the total area of ​​the dead zone of the single-polarization broadband signal anti-reflection power-generating glass is as follows:

[0104]

[0105]

[0106] in, The total area of ​​the dead zone.

[0107] In this embodiment, the specific areas of the two dead zones can be calculated by providing the specific dimensions of one etched surface of the power-generating glass. For example, when the etched area... The area is 45,000 mm², and the etched area accounts for 50%. It is 300mm. It is 300mm. It is 285.2mm. It is 2.04mm. It is 1.8mm. It is 7.4mm. When the value is 170um, the total dead area corresponding to the etched area can be calculated based on the parameters mentioned above. Specifically, It is 2021 mm². It is 44427 mm². It is 46448 mm².

[0108] In one implementation, the formula for calculating the transmittance of the single-polarized broadband signal antireflection power-generating glass before etching is:

[0109]

[0110] in, The transmittance before etching;

[0111] The formula for calculating the transmittance of the single-polarized broadband signal anti-reflection power generation glass after etching is as follows:

[0112]

[0113] in, The transmittance after etching;

[0114] The conversion formula between the light transmittance of the single-polarized broadband signal anti-reflection power generation glass and the etched area of ​​the rectangular pattern 300 is as follows:

[0115]

[0116] In this embodiment, after giving the dimensions of one etched photovoltaic glass surface and calculating the dead area, the next step is to calculate the light transmittance before and after etching. For example, when the etching area... The area is 45,000 mm², and the etched area accounts for 50%. It is 300mm. It is 300mm. It is 285.2mm. It is 2.04mm. It is 1.8mm. It is 7.4mm. When the value is 170 μm, the dead area calculated using the above formula is... The value is 46448 mm². Based on this, the transmittance before and after etching is further calculated using the above formula. It is 0.022. It is 0.516.

[0117] Therefore, based on the actual dead area area and light transmittance requirements, the corresponding etching area can be calculated using the above formula, thereby determining the etching rectangle period and etching rectangle width of the etching pattern.

[0118] In one implementation, the proportion of the etched area of ​​the rectangular pattern 300 is determined based on the target frequency point, and the spacing distance and width of the rectangular pattern 300 are determined based on the etched area of ​​the rectangular pattern 300.

[0119] When the target frequency is 3.6GHz, 10GHz, or 28GHz, the percentage of the etched area of ​​the rectangular pattern 300, the spacing of the rectangular pattern 300, and the width of the rectangular pattern 300 for which the penetration loss to vertically polarized electromagnetic signals at the target frequency is ≤5dB, are as follows:

[0120] The etched area of ​​the rectangular pattern 300 accounts for 10%, the spacing between the rectangular patterns 300 is 0.3mm-2.2mm, and the width of the rectangular pattern 300 is 0.03mm-0.24mm.

[0121] Alternatively, the etched area of ​​the rectangular pattern 300 may account for 20%, the spacing between the rectangular patterns 300 may be 0.4mm-2.4mm, and the width of the rectangular pattern 300 may be 0.1mm-0.6mm.

[0122] Alternatively, the etched area of ​​the rectangular pattern 300 may account for 30%, the spacing between the rectangular patterns 300 may be 0.6mm-2.8mm, and the width of the rectangular pattern 300 may be 0.26mm-1.2mm.

[0123] Alternatively, the etched area of ​​the rectangular pattern 300 may account for 40%, the spacing between the rectangular patterns 300 may be 0.8mm-2.6mm, and the width of the rectangular pattern 300 may be 0.53mm-1.73mm.

[0124] Alternatively, the etched area of ​​the rectangular pattern 300 may account for 50%, the spacing between the rectangular patterns 300 may be 0.9mm-2.3mm, and the width of the rectangular pattern 300 may be 0.9mm-2.3mm.

[0125] Alternatively, the etched area of ​​the rectangular pattern 300 may account for 60%, the spacing between the rectangular patterns 300 may be 1.2mm-1.6mm, and the width of the rectangular pattern 300 may be 1.8mm-2.4mm.

[0126] In this embodiment, when the target frequency is set to 3.6GHz, 10GHz, or 28GHz, in order to ensure that the electromagnetic penetration loss is within 5dB, etching with a specific etching area and etching rectangle period is required. The specific etching area ratio and the spacing and width of the rectangular pattern 300 are as described above. Figure 4 , Figure 5 , Figure 6 , Figure 7 , Figure 8 , Figure 9 The diagrams show the transmission amplitude of this type of power-generating glass under different etching areas and different etching rectangle periods. S21 represents the transmittance of the power-generating glass. The interval between the rectangular patterns 300 is in millimeters. This can be used as a reference during the actual fabrication process. Figures 4-9 The simulation image is used to design the parameters of the etching pattern so as to achieve an electromagnetic penetration loss of less than 5dB under the requirements of multiple etching areas and etching pattern cycles.

[0127] Based on the above embodiments, the present invention also provides an installation method for a single-polarization broadband signal anti-reflection power generation glass, applicable to the single-polarization broadband signal anti-reflection power generation glass described in any one of the above solutions, the installation method comprising:

[0128] The single-polarized broadband signal anti-reflective power generation glass is installed with the long side of the rectangular pattern 300 parallel to the ground.

[0129] In this embodiment, the wall-mounting method for the power-generating glass is determined under the combined constraints of international communication standards, strict electromagnetic radiation safety regulations, and the pursuit of optimal practical performance. Currently, most communication base stations employ vertical polarization because the main communication antenna inside a mobile phone uses a vertically distributed monopole antenna. When a user holds the phone, the device is in a vertical orientation, and the polarization directions of the transmitting and receiving antennas are consistent, reducing polarization mismatch losses. Upon reflection from a horizontal surface, the polarization direction of the vertically polarized wave remains essentially unchanged, reducing signal distortion. Vertically polarized antennas radiate more uniformly in the horizontal direction, making them suitable for macro base stations requiring 360° coverage. Therefore, the wall-mounting of the power-generating glass must first satisfy vertical polarization. Figure 3 As shown, considering the current free space wireless signal propagation situation, the method for mounting this type of power-generating glass on the wall should be such that the etched pattern is installed parallel to the ground.

[0130] In summary, this invention discloses a single-polarization broadband signal anti-reflection power-generating glass, an etching method, and an installation method, relating to the fields of communication and photovoltaic power generation technology. The power-generating glass includes an ultra-clear glass substrate and a plurality of series-connected single-segment thin-film solar cells disposed within the interlayer of the ultra-clear glass substrate. Each single-segment thin-film solar cell comprises a positive electrode, a power-generating thin film layer, and a back electrode. The positive electrode, the power-generating thin film layer, and the back electrode are sequentially stacked and bonded along the thickness direction of the ultra-clear glass substrate, and each is etched with periodically arranged rectangular patterns. The long side of each rectangular pattern is horizontal, forming a frequency-selective surface for the penetration of vertically polarized electromagnetic signals. This invention forms a frequency-selective surface by etching periodic rectangular patterns with horizontal long sides, adapting to vertically polarized signals, reducing penetration loss in multiple target frequency bands, solving the problem of traditional power-generating glass blocking communication signals, and is suitable for scenarios requiring both photovoltaic power generation and communication transmission, thus improving the quality of broadband signal transmission. Meanwhile, the technology of this application has the advantages of simple processing flow, low processing cost, strong versatility and wide coverage frequency band, which can effectively reduce the amount of signal relay equipment used and adapt to a variety of indoor and outdoor application scenarios, which is of great significance to the development of the construction industry and transportation industry.

[0131] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0132] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of this patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this application should be determined by the appended claims.

Claims

1. A single-polarization broadband signal anti-reflection power generation glass, characterized in that, The invention includes an ultra-white glass substrate and a plurality of single-segment thin-film solar cells connected in series within the interlayer of the ultra-white glass substrate. Each single-segment thin-film solar cell includes a positive electrode, a power-generating thin film layer, and a back electrode. The positive electrode, the power-generating thin film layer, and the back electrode are sequentially stacked and bonded along the thickness direction of the ultra-white glass substrate, and each is etched with a periodically arranged rectangular pattern. The long side of the rectangular pattern is horizontal, and the rectangular pattern forms a frequency-selective surface for the penetration of vertically polarized electromagnetic signals. The frequency-selective surface makes the penetration loss of the power-generating glass for vertically polarized electromagnetic signals ≤5dB at target frequencies of 3.6GHz, 10GHz, and 28GHz. The relationship between the percentage of the etched area of ​​the rectangular pattern, the spacing between the rectangular patterns, and the width of the rectangular pattern is as follows: When the etched area of ​​the rectangular pattern accounts for 10%, the spacing between the rectangular patterns is 0.3mm-2.2mm, and the width of the rectangular pattern is 0.03mm-0.24mm. Or, when the etching area of ​​the rectangular pattern accounts for 20%, the spacing between the rectangular patterns is 0.4mm-2.4mm, and the width of the rectangular pattern is 0.1mm-0.6mm; Or, when the etched area of ​​the rectangular pattern accounts for 30%, the spacing between the rectangular patterns is 0.6mm-2.8mm, and the width of the rectangular pattern is 0.26mm-1.2mm; Or, when the etching area of ​​the rectangular pattern accounts for 40%, the spacing between the rectangular patterns is 0.8mm-2.6mm, and the width of the rectangular pattern is 0.53mm-1.73mm; Or, when the etched area of ​​the rectangular pattern accounts for 50%, the spacing between the rectangular patterns is 0.9mm-2.3mm, and the width of the rectangular pattern is 0.9mm-2.3mm; When the etched area of ​​the rectangular pattern accounts for 60%, the spacing between the rectangular patterns is 1.2mm-1.6mm, and the width of the rectangular pattern is 1.8mm-2.4mm.

2. The single-polarization broadband signal anti-reflection power-generating glass according to claim 1, characterized in that, The interval between the rectangular patterns is 1. -3000 The width of the rectangular pattern is 1. -3000 .

3. The single-polarization broadband signal anti-reflection power-generating glass according to claim 1, characterized in that, Unetched regions are provided at both ends of the positive electrode, the power generation thin film layer, and the back electrode in the horizontal direction. The width of the unetched region is equal to the width of the single-polarized broadband signal anti-reflection power generation glass, and the length of the unetched region is equal to half the length of a single single-cell thin film solar cell. The unetched region is used to connect wires to lead out the current generated by the power generation thin film.

4. The single-polarization broadband signal anti-reflection power-generating glass according to claim 1, characterized in that, A gap is provided between two adjacent single-cell thin-film solar cells, the gap including a P1 laser-etched groove filled with an insulating polymer, a P2 laser-etched groove filled with the material of the back electrode, and a P3 laser-etched groove filled with EVA adhesive.

5. The single-polarization broadband signal anti-reflection power-generating glass according to claim 4, characterized in that, The single-polarized broadband signal anti-reflection power generation glass has a dead zone, which is the non-power generation region in the single-section thin-film solar cell, as well as the region that can conduct electrical energy but cannot effectively generate photogenerated carriers. The dead zone includes a basic dead zone and an additional dead zone. The basic dead zone is the gap between two adjacent single-cell thin-film solar cells, and the additional dead zone is the area that cannot generate electricity after etching.

6. An etching method for a single-polarization broadband signal antireflection power generation glass, characterized in that, The etching method, applied to the realization of the single-polarization broadband signal anti-reflection power-generating glass as described in any one of claims 1-5, comprises: The positive electrode, power-generating thin film layer, and back electrode of the single-section thin-film solar cell are etched to form a periodically arranged rectangular pattern.

7. The etching method for single-polarization broadband signal antireflection power generation glass according to claim 6, characterized in that, The formula for calculating the etching area of ​​the rectangular pattern is: in, The etched area of ​​the rectangular pattern is [area]. The width of the single-polarized broadband signal anti-reflection power-generating glass, The length of the rectangular pattern is... The width of the rectangular pattern. The interval distance of the rectangular pattern; The formula for calculating the area of ​​the basic dead zone is: in, The area of ​​the basic dead zone, The length of the single-polarized broadband signal anti-reflection power-generating glass. The distance between two adjacent single-segment thin-film solar cells. The length of a single segment of the thin-film solar cell; The formula for calculating the area of ​​the additional dead zone is: in, The area of ​​the additional dead zone; The formula for calculating the total area of ​​the dead zone of the single-polarization broadband signal anti-reflection power-generating glass is as follows: in, The total area of ​​the dead zone.

8. The etching method for single-polarization broadband signal antireflection power generation glass according to claim 7, characterized in that, The formula for calculating the transmittance of the single-polarized broadband signal antireflection power generation glass before etching is as follows: in, The transmittance before etching; The formula for calculating the transmittance of the single-polarized broadband signal anti-reflection power generation glass after etching is as follows: in, The transmittance after etching; The conversion formula between the light transmittance of the single-polarized broadband signal anti-reflection power generation glass and the etched area of ​​the rectangular pattern is as follows: 。 9. A method for installing a single-polarization broadband signal anti-reflection power-generating glass, characterized in that, The method of installing the single-polarized broadband signal anti-reflection power-generating glass as described in any one of claims 1-5 includes: The single-polarized broadband signal anti-reflective power generation glass is installed with the long side of the rectangular pattern parallel to the ground.

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