Diamond infrared window film and preparation method thereof
By depositing a rare earth metal oxide film on the surface of a diamond substrate, destructive interference is used to reduce reflectivity and form a chemical barrier, thus solving the problems of easy oxidation and high reflectivity of diamond at high temperatures and achieving compatibility between high transmittance and high thermal shock resistance.
Patent Information
- Application Number
- CN202511486326.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-17
- Publication Date
- 2026-01-13
AI Technical Summary
Diamond is easily oxidized in high-temperature and high-oxygen environments and has high reflectivity, resulting in low transmittance. Existing technologies cannot achieve both high transmittance and high resistance to thermal shock and oxidation.
A rare earth metal oxide film is deposited on the surface of a diamond substrate. Taking advantage of the fact that the refractive index of rare earth oxides is between that of diamond and air, the reflectivity is reduced through destructive interference, and a dense chemical barrier is formed to prevent oxidation. The rare earth oxides are deposited using an ion-assisted thermal evaporation method.
It significantly improves the transmittance of the diamond window and effectively blocks oxidation at high temperatures, ensuring the stability of the structure and optical performance.