Pipeline and sub-normal-pressure chemical vapor deposition equipment

By installing a heated nitrogen vent and a gas pump in the pipeline of the sub-atmospheric pressure chemical vapor deposition equipment, the problem of frequent material cleaning in the pipeline is solved by using heated and diverted nitrogen to remove particles in the pipeline, thus achieving efficient cleaning and extended maintenance cycle.

CN121344561APending Publication Date: 2026-01-16SHANGHAI OPTICAL COMMUNICATIONS CORP
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Patent Information

Application Number
CN202410948835.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-07-15
Publication Date
2026-01-16

AI Technical Summary

Technical Problem

In existing technologies, the materials adhering to the pipelines of sub-atmospheric pressure chemical vapor deposition equipment require frequent cleaning and maintenance, leading to abnormal equipment operation.

Method used

A nitrogen venting section, including a heating pipe and a venting plate, is installed in the pipeline. After being heated, nitrogen enters the pipeline through a porous structure. Combined with an air pump to accelerate the airflow, the heated and diverted nitrogen rubs against the particles and generates a pressure difference, thereby achieving effective removal of the particles.

Benefits of technology

It effectively avoids condensation buildup in the pipeline, reduces turbulence, improves cleaning efficiency, and extends the cleaning and maintenance cycle of the pipeline.

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Abstract

The invention belongs to the technical field of semiconductors, and particularly relates to a pipeline and sub-normal-pressure chemical vapor deposition equipment. The invention provides a pipeline. The pipeline comprises a pipeline body, a nitrogen ventilation part and an air pump. The nitrogen ventilation part comprises a heating pipe and a ventilation piece, the ventilation piece is provided with a plurality of hole-shaped structures and installed on the side wall of the pipeline body, and nitrogen enters the pipeline body through the hole-shaped structures of the ventilation piece after being heated by the heating pipe. The invention further provides the sub-normal-pressure chemical vapor deposition equipment comprising the pipeline. According to the technical scheme, after the nitrogen is heated through the heating pipe, gathering caused by condensation is avoided, meanwhile, the divided nitrogen can enter the pipeline in a dispersed mode, particles on the pipe wall can be removed more easily, and therefore the pipeline cleaning frequency is effectively reduced; the technical defect that in the prior art, materials attached to a pipeline of deposition equipment need to be cleaned and maintained frequently is overcome.
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Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of semiconductors, and particularly relates to a pipeline and a sub-atmospheric chemical vapor deposition device. BACKGROUND

[0002] The deposition device is one of the three core devices in the semiconductor field. The sub-atmospheric chemical vapor deposition (SACVD) has the ability of rapid gap filling due to the unique high-temperature (400-550℃) and high-pressure (30-600 Torr) environment of the reaction cavity, and is mainly applied to the trench filling process. The deposition materials are mainly non-metals such as silicon dioxide, silicon nitride and polysilicon, and metals such as copper. The pipeline in the deposition device will have deposition materials attached thereto. In order to effectively remove the materials attached to the pipeline, nitrogen is usually introduced into the pipeline, and then pumped out. Most of the deposition material powder will be pumped away along the pipeline, but part of the powder will still remain in the pipeline, affecting the normal use of the device. SUMMARY

[0003] Therefore, it is necessary to provide a pipeline and a sub-atmospheric chemical vapor deposition device to solve the technical defects that the materials attached to the pipeline of the deposition device need to be frequently cleaned and maintained in the prior art.

[0004] The application provides a pipeline, which comprises a pipeline body, a nitrogen gas inlet part and a gas pump, wherein the gas pump is connected with the pipeline body and used for adjusting the gas flow speed of the pipeline body and / or pumping away the particles in the pipeline body.

[0005] The nitrogen gas inlet part comprises a heating pipe and an inlet piece, wherein the inlet piece is provided with a plurality of hole structures, the inlet piece is installed on the side wall of the pipeline body, and nitrogen gas enters the pipeline body through the hole structures of the inlet piece after being heated by the heating pipe.

[0006] In one embodiment, the nitrogen gas inlet amount of the nitrogen gas inlet part is 50-60 L / min.

[0007] In one embodiment, the number of the hole structures in the inlet piece is 6-10.

[0008] In one embodiment, the diameter of the hole structures is 0.4-0.5 cm.

[0009] In one embodiment, the heating temperature of the heating pipe is 150-160℃.

[0010] In one embodiment, the length of the heating pipe is 26-32 cm, and the diameter of the heating pipe is 0.8-1 cm.

[0011] In one of the embodiments, the nitrogen gas venting part further comprises a temperature control module and a temperature detection module.

[0012] The temperature detection module is arranged above the venting sheet, and the detection result of the temperature detection module is transmitted to the temperature control module, and the temperature control module controls the heating power of the heating pipe.

[0013] In one of the embodiments, the nitrogen gas venting part is detachably connected with the pipeline body.

[0014] In one of the embodiments, a valve is arranged at the inlet of the nitrogen gas venting part, for adjusting the venting amount of nitrogen gas.

[0015] The application further provides a sub-atmospheric pressure chemical vapor deposition device comprising the pipeline.

[0016] In summary, the application provides a pipeline, which comprises a pipeline body, a nitrogen gas venting part and a gas pump, the gas pump is connected with the pipeline body, for adjusting the gas flow speed of the pipeline body and / or sucking away the particles in the pipeline body; the nitrogen gas venting part comprises a heating pipe and a venting sheet, the venting sheet is provided with a plurality of hole structures, the venting sheet is installed on the side wall of the pipeline body, and the nitrogen gas is heated by the heating pipe and then enters the pipeline body through the hole structures of the venting sheet. The application further provides a sub-atmospheric pressure chemical vapor deposition device comprising the above pipeline. In the technical solution provided by the application, the nitrogen gas is heated by the heating pipe to avoid the aggregation caused by condensation, at the same time, the divided nitrogen gas can be dispersed into the pipeline, which is more conducive to the particle removal of the pipeline wall, thereby effectively reducing the cleaning frequency of the pipeline. The technical defect that the materials attached in the pipeline of the deposition device need to be frequently cleaned and maintained in the prior art is solved. BRIEF DESCRIPTION OF DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced below. Obviously, the drawings in the following description are only embodiments of the application, and those skilled in the art can obtain other drawings according to the provided drawings without any creative effort.

[0018] Figure 1 In the technical solution provided by the embodiments of the application, a structural schematic diagram of a pipeline is provided.

[0019] Figure 2 In the pipeline provided by the embodiments of the application, a structural schematic diagram of a venting sheet of a nitrogen gas venting part is provided.

[0020] The heating pipe 11, the air vent 12, the hole structure 121, the temperature control module 13, the temperature detection module 14, the inlet 15, the valve 16 and the pipe body 2. DETAILED DESCRIPTION

[0021] The pipe and the sub-atmospheric pressure chemical vapor deposition device provided by the embodiments of the present application solve the technical defect that the material attached to the pipe of the deposition device needs to be cleaned and maintained frequently in the prior art.

[0022] In order to make the above objectives, characteristics and advantages of the present application more apparent, clear and easy to understand, the specific embodiments of the present application will be described in detail below with reference to the drawings. In the following description, a large number of specific details are set forth in order to provide a thorough understanding of the present application. However, the present application can be implemented in many different ways other than the ones described herein, and those skilled in the art can make similar improvements without departing from the spirit of the present application, so the present application is not limited to the specific embodiments disclosed below.

[0023] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0024] In addition, the terms "first", "second" are only for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present application, the meaning of "a plurality of" is at least two, for example, two, three, etc., unless otherwise specifically limited.

[0025] In the present application, unless otherwise specifically defined and limited, the terms "mounting", "connection", "connection", "fixing" and the like should be understood broadly, for example, can be fixedly connected, or can be detachably connected, or can be integrated; can be mechanically connected, or can be electrically connected; can be directly connected, or can be indirectly connected through an intermediate medium; can be the internal communication of two elements or the interaction relationship between two elements, unless otherwise specifically defined. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0026] In the present application, unless specifically stated and limited otherwise, a first feature is "on" or "under" a second feature can mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature "over", "above" and "on top of" the second feature can mean that the first feature is directly above or obliquely above the second feature, or only means that the first feature is horizontally higher than the second feature. The first feature "under", "below" and "underneath" the second feature can mean that the first feature is directly below or obliquely below the second feature, or only means that the first feature is horizontally lower than the second feature.

[0027] It should be noted that when an element is referred to as being "fixed to" or "set to" another element, it can be directly on the other element or there can be an intermediate element. When an element is considered to be "connected" to another element, it can be directly connected to the other element or there can be an intermediate element. The terms "vertical", "horizontal", "up", "down", "left", "right" and similar expressions used herein are only for illustrative purposes and do not represent the only implementation.

[0028] Please refer to Figure 1 and Figure 2 , the embodiment of the present application provides a pipeline, which comprises a pipeline body 2, a nitrogen ventilation part and a gas pump, the gas pump is connected with the pipeline body 2, and is used for accelerating the gas flow speed of the pipeline body 2 and / or removing the particles in the pipeline body 2; the nitrogen ventilation part comprises a heating pipe 11 and a ventilation piece 12, the ventilation piece 12 is provided with a plurality of hole structures 121, the ventilation piece 12 is installed on the side wall of the pipeline body 2, and the nitrogen is heated by the heating pipe 11 and then enters the pipeline body 2 through the hole structure 121 of the ventilation piece 12. The pipeline provided by the embodiment of the present application solves the technical defects that the materials attached in the pipeline of the deposition equipment need to be frequently cleaned and maintained in the prior art.

[0029] Herein Figure 1 It should be additionally explained that, due to the actual pipeline structure, the length of the pipeline body 2 is relatively long, and the gas pump is arranged at the rightmost end of the pipeline body 2, in order to embody the specific structure of the nitrogen ventilation part, which is the core of the present application, the structure of the gas pump is not embodied in Figure 1 .

[0030] The pipeline is an important structure in a sub-atmospheric pressure chemical vapor deposition device. In the sub-atmospheric pressure chemical vapor deposition device, particles of consumables such as silicon dioxide and aluminum fluoride are attached to the inner wall of the pipeline body 2. When the attachment amount accumulates to a certain amount, the pipeline body 2 needs to be maintained. Through the action of the nitrogen gas inlet part, nitrogen gas enters the pipeline body 2, and the gas flow speed in the pipeline is further increased by the gas pump. During the high-speed passing of the nitrogen gas through the pipeline body 2, the particles can be carried away, thereby reducing the cleaning and maintenance frequency of the pipeline.

[0031] However, the pipeline body in the prior art has the following problems. First, when nitrogen gas enters the pipeline, the low temperature of the nitrogen gas can cause the condensation of by-products in the pipeline, which can accumulate in the pipeline and affect the pumping speed. Second, the nitrogen gas directly enters the pipeline at a vertical angle, which can cause turbulence in the pipeline and easily cause backflow of the gas flow. Third, the single gas inlet causes the nitrogen gas to be sprayed in a whole, which has a short action length and is not good for the removal of materials in the pipeline. The above reasons cause the materials attached to the pipeline of the deposition device in the prior art to need frequent cleaning and maintenance, and there is a large improvement space.

[0032] The technical scheme provided in the embodiment of the application further optimizes the structure of the pipeline.

[0033] On the one hand, the heating pipe 11 structure is additionally arranged in the nitrogen gas inlet part. After the nitrogen gas is heated, the heated nitrogen gas is less likely to condense with the particles in the pipeline body 2 after entering the pipeline body 2, thereby facilitating the rapid passing of the nitrogen gas and the particles through the pipeline body 2, and more facilitating the extraction of the particles. Meanwhile, the increase of the ventilation amount is also beneficial to the improvement of the cleaning efficiency of the pipeline as a whole.

[0034] On the other hand, when the nitrogen gas flow entering the pipeline body 2 flows through the pipeline body 2, the nitrogen gas and the particles in the pipeline body 2 rub against each other, that is, the liquid viscosity. According to the Coanda effect, since the particle size of the particles is small, that is, the curvature is small, the nitrogen gas deviates from the original flow direction (that is, the direction of vertically entering the pipeline body 2), and the flow direction of the nitrogen gas changes to the flow direction of the particles. At this time, the nitrogen gas forms a nitrogen gas curtain in the pipeline body 2, which is helpful for the rapid discharge of the particles.

[0035] In the third aspect, when the nitrogen enters the pipeline body 2, the nitrogen is in a high-speed flow state, and Bernoulli's law is combined at this time: when the flow is equal, the greater the flow rate, the smaller the pressure, that is, the smaller the pressure per unit area. At this time, due to the large flow rate of the nitrogen, the nitrogen flow pressure is reduced, and a corresponding low-pressure ring is generated near the high-speed flow of the nitrogen flow. At this time, the nitrogen in the pipeline body 2 and the particles generate a corresponding pressure difference, and the nitrogen effectively adsorbs the particles through the pressure difference because the pressure of the nitrogen is smaller than the pressure of the particles, thereby facilitating the discharge of the particles.

[0036] Compared with the prior art, first, by means of heating the nitrogen, the heated nitrogen enters the pipeline body 2, effectively avoiding the condensation of the original particles in the pipeline body 2, and facilitating the blowing out of the particles; second, according to the Coanda effect, the flow direction of the nitrogen changes after the nitrogen rubs with the particles, and the nitrogen no longer moves in the pipeline body 2 at a vertical angle, and is not easy to produce turbulence; third, after the nitrogen is distributed through the hole structure 121, the nitrogen flow is more dispersed, and a plurality of nitrogen flows generate a pressure difference with the particles in the pipeline body based on Bernoulli's law, thereby effectively adsorbing the particles and achieving a better cleaning effect on the particles.

[0037] The above technical effects are effectively superimposed, and after the synergistic effect, the particles in the pipeline body 2 are effectively removed, thereby effectively prolonging the cleaning and maintenance period of the pipeline and reducing the cleaning and maintenance frequency of the pipeline.

[0038] Further optimize the technical scheme, the nitrogen gas ventilation part of the pipeline provided by the embodiment of the present application has a ventilation amount of 50-60 L / min. If the ventilation amount of the nitrogen gas ventilation part is too large, on the one hand, the cost will increase, and at the same time, the strength requirement of the pipeline will also increase, which may cause certain damage to the pipeline structure; if the ventilation amount of the nitrogen gas ventilation part is too small, the cleaning effect on the particles in the pipeline body 2 may be affected. Therefore, on the basis of ensuring good cleaning effect on the particles, the ventilation amount of the nitrogen gas ventilation part is 50-60 L / min, while considering the overall maintenance cost and the bearing strength of the pipeline structure.

[0039] Please refer to Figure 2 In the technical scheme provided by the embodiment of the present application, the number of hole structures 121 in the ventilation piece 12 is 6-10. If the hole structures 121 are too many, the dispersed nitrogen flow is small and cannot effectively carry away the particles; if the hole structures 121 are too few, they cannot act on the inner wall of the pipeline body 2 evenly, which may cause the deposition of particles on part of the inner wall of the pipeline body 2. Therefore, in order to achieve a better cleaning effect on the particles, the number of hole structures 121 in the ventilation piece 12 is 6-10.

[0040] Further, the technical scheme is further optimized, in order to realize the removal effect of the particles, the diameter of the hole structure 121 is planned in combination with the number of the hole structure 121, it is calculated that when the total inlet area of the hole structure 121 is 1 / 4 of the area of the nitrogen gas venting part and the connecting port of the pipeline main body 2, the removal effect of the particles is the best, accordingly, in combination with the number of the hole structure 121 being 6-10, the diameter of the hole structure 121 is 0.4-0.5 cm.

[0041] The heating temperature of the heating pipe 11 is 150-160℃ in the pipeline provided by the embodiment of the application, which comprehensively considers the energy consumption of the heating pipe 11 and the fact that the condensed particles of the heated gas do not adhere to the particles of the pipeline main body 2.

[0042] In order to ensure the good heating effect of the gas flow, meanwhile, the heating pipe 11 can be better adapted to the pipeline main body 2, and the factors of the convenience and cost accounting of the installation and purchase of the accessories are taken into account, the length of the heating pipe 11 is 26-32 cm and the diameter of the heating pipe 11 is 0.8-1 cm in the technical scheme provided by the embodiment of the application.

[0043] In the pipeline provided by the embodiment of the application, the nitrogen gas venting part further comprises a temperature control module 13 and a temperature detection module 14, the temperature detection module 14 is arranged above the venting sheet 12, the detection result of the temperature detection module 14 is transmitted to the temperature control module 13, and the temperature control module 13 controls the heating power of the heating pipe 11. The temperature of the gas flow passing through the venting sheet 12 is monitored in real time by the temperature detection module 14, the monitoring result is transmitted to the temperature control module 13 in real time, the temperature control module 13 adjusts the heating power of the heating pipe in real time, the gas flow passing through the venting sheet 12 is ensured to be at the best working temperature, and the good removal effect of the particles adhering to the inner wall of the pipeline main body 2 is ensured.

[0044] In order to facilitate the maintenance and replacement of the pipeline, the nitrogen gas venting part is detachably connected with the pipeline main body 2 in the pipeline provided by the embodiment of the application.

[0045] In the technical scheme provided by the embodiment of the application, the valve 16 is arranged at the inlet 15 of the nitrogen gas venting part, which is used for adjusting the venting amount of the nitrogen gas. After the valve 16 is installed, the correspondence between the actual test amount of the venting amount and the best blowing effect of the particles on the inner wall of the pipeline main body 2 can be facilitated, meanwhile, the venting amount can be adjusted in real time according to the amount of the particles adhering to the inner wall of the pipeline main body 2, and the removal effect of the particles is ensured.

[0046] The application further provides a sub-atmospheric pressure chemical vapor deposition device provided with the above pipeline. It can be concluded from the above description that the sub-atmospheric pressure chemical vapor deposition device provided with the above pipeline can effectively remove the deposited particles and reduce the cleaning and maintenance frequency of the pipeline.

[0047] In summary, the application provides a pipeline, which comprises a pipeline body, a nitrogen gas venting part and a gas pump, the gas pump is connected with the pipeline body, used for accelerating the gas flow speed of the pipeline body and / or removing the particles in the pipeline body; the nitrogen gas venting part comprises a heating pipe and a venting sheet, the venting sheet is provided with a plurality of hole structures, the venting sheet is installed on the side wall of the pipeline body, and the nitrogen gas is heated by the heating pipe and then enters the pipeline body through the hole structures of the venting sheet. The application also provides a sub-atmospheric pressure chemical vapor deposition device comprising the pipeline. In the technical scheme, the nitrogen gas is heated by the heating pipe to avoid the condensation caused aggregation, at the same time, the shunted nitrogen gas can enter the pipeline in a dispersed manner, which is more conducive to the particle removal of the pipeline wall, thereby effectively reducing the pipeline cleaning frequency; and the technical defects in the prior art that the materials attached in the pipeline of the deposition device need to be cleaned and maintained frequently are solved.

[0048] The technical features of the above-mentioned embodiments can be combined arbitrarily, and in order to make the description simple, all possible combinations of the technical features in the above-mentioned embodiments are not described, however, as long as the combinations of the technical features do not exist contradictory, it should be considered that it is within the scope of the present disclosure. At the same time, other embodiments can be derived by using the above-mentioned embodiments, so that the structure and logic replacement and change can be made without departing from the scope of the present disclosure.

[0049] The above-mentioned embodiments only express several embodiments of the application, and the description is more specific and detailed, but it should not be understood as a limitation on the scope of the patent application. It should be pointed out that for ordinary skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are all within the scope of the present application. Therefore, the protection scope of the patent of the present application should be subject to the appended claims.

Claims

1. A pipe, characterized in that The pipeline comprises a pipeline body, a nitrogen gas ventilation part and a gas pump, the gas pump is connected with the pipeline body and used for adjusting the gas flow speed of the pipeline body and / or removing the particles in the pipeline body; The nitrogen gas ventilation part comprises a heating pipe and a ventilation sheet, the ventilation sheet is provided with a plurality of hole structures, the ventilation sheet is installed on the side wall of the pipeline body, and the nitrogen gas is heated by the heating pipe and enters the pipeline body through the hole structures of the ventilation sheet.

2. The tubing of claim 1, wherein, The ventilation amount of the nitrogen gas ventilation part is 50-60 L / min.

3. The pipe according to claim 1 or 2, characterized in that The number of the hole structures in the ventilation sheet is 6-10.

4. The tubing set of claim 3, wherein, The diameter of the hole structure is 0.4-0.5 cm.

5. The tubing of claim 1, wherein, The heating temperature of the heating pipe is 150-160 DEG C.

6. The tubing set of claim 5, wherein, The length of the heating pipe is 26-32 cm, and the diameter of the heating pipe is 0.8-1 cm.

7. A pipe according to claim 5 or 6, characterised in that The nitrogen gas ventilation part further comprises a temperature control module and a temperature detection module. The temperature detection module is arranged above the ventilation sheet, the detection result of the temperature detection module is transmitted to the temperature control module, and the temperature control module controls the heating power of the heating pipe.

8. The tubing of claim 1, wherein, The nitrogen gas ventilation part is detachably connected with the pipeline body.

9. The tubing of claim 1, wherein, A valve is arranged at the inlet of the nitrogen gas ventilation part and used for adjusting the ventilation amount of the nitrogen gas.

10. A sub-atmospheric chemical vapor deposition apparatus, characterized by, The sub-normal pressure chemical vapor deposition equipment comprises the pipeline according to any one of claims 1-9.