Multi-station reaction equipment and gas distribution system thereof

Abstract

The invention provides multi-station reaction equipment and a gas distribution system thereof. The gas distribution system of the multi-station reaction equipment comprises a plurality of first process gas pipelines, a plurality of first waste gas pipelines and a plurality of purging gas pipelines, the plurality of first process gas pipelines are arranged above the plurality of reaction stations, one ends of the first process gas pipelines are connected with a first process gas source at the center above the plurality of reaction stations, and the other ends of the first process gas pipelines are respectively introduced into the corresponding reaction stations with the same length; the plurality of purge gas pipelines are arranged on the plurality of first process gas pipelines, the first ends of the purge gas pipelines are connected with a purge gas source, and the second ends of the purge gas pipelines are respectively extended by avoiding the plurality of first process gas pipelines and are led into the corresponding reaction stations with the same length. The plurality of first waste gases are arranged on the plurality of purge gas pipelines, the first ends of the plurality of first waste gases are connected with the waste gas header pipe at the center above the plurality of reaction stations, and the second ends of the plurality of first waste gases are respectively extended by avoiding the plurality of first process gas pipelines and the plurality of purge gas pipelines and are introduced into the corresponding reaction stations at the same length.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of semiconductor equipment, in particular to a multi-station reaction equipment and a gas distribution system thereof. BACKGROUND

[0002] Thin film deposition techniques are used to manufacture thin films of microelectronic devices, forming deposits on a substrate, common thin film deposition techniques include physical vapor deposition, chemical vapor deposition and other techniques.

[0003] In an atomic layer deposition process, two or more reaction sources are often alternately introduced into the reaction chamber to react, and the reaction is carried out by chemical adsorption on the substrate surface to deposit thin films. After each reaction source reaction is completed, inert gas is followed to purge to remove excess reaction source and chemical reaction by-products.

[0004] In order to meet the different process and functional requirements of the multi-station semiconductor reaction equipment, the number and types of pipelines in the prior art are numerous, and therefore there are often problems of space layout and height limitation of each pipeline. If the gas distribution of each pipeline is uneven, the process consistency of each reaction station is easily damaged.

[0005] In order to solve the above technical problems, the present application provides a multi-station reaction equipment and a gas distribution system thereof, which realizes the uniformity of gas distribution, the rational use of space and the miniaturization of the equipment by reasonable layout of each gas pipeline. SUMMARY

[0006] The following presents a simplified summary of one or more aspects in order to provide a basic understanding of such aspects. This summary is not an extensive overview of all contemplated aspects, and is intended to neither identify key or critical elements of all aspects nor delineate the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed description that is presented later.

[0007] In order to solve the above technical problems, the present application provides a multi-station reaction equipment and a gas distribution system thereof, which realizes the uniformity of gas distribution, the rational use of space and the miniaturization of the equipment by reasonable layout of each gas pipeline.

[0008] Specifically, the first aspect of the present application provides a gas distribution system for a multi-station reaction apparatus. The gas distribution system for a multi-station reaction apparatus comprises a plurality of first process gas pipes, a plurality of first exhaust pipes and a plurality of purge gas pipes. The plurality of first process gas pipes are arranged above a plurality of reaction stations, with one end of each of the plurality of first process gas pipes being connected to a first manifold at a center above the plurality of reaction stations, and the other end of each of the plurality of first process gas pipes extending to a corresponding reaction station by the same length and then entering the corresponding reaction station. The plurality of purge gas pipes are arranged above the plurality of first process gas pipes, with a first end of each of the plurality of purge gas pipes being connected to a second manifold at the center above the plurality of reaction stations, and a second end of each of the plurality of purge gas pipes extending to the corresponding reaction station by the same length and then entering the corresponding reaction station, while bypassing the plurality of first process gas pipes. The plurality of first exhaust pipes are arranged above the plurality of purge gas pipes, with a first end of each of the plurality of first exhaust pipes being connected to a third manifold at the center above the plurality of reaction stations, and a second end of each of the plurality of first exhaust pipes extending to the corresponding reaction station by the same length and then entering the corresponding reaction station, while bypassing the plurality of first process gas pipes and the plurality of purge gas pipes.

[0009] Further, in some embodiments of the present application, the gas distribution system further comprises a plurality of gas distribution blocks. Each of the plurality of gas distribution blocks has a plurality of gas inlets and a plurality of gas outlets, wherein a first gas inlet of the gas distribution block is connected to the second end of the corresponding first process gas pipe, and is connected to a first gas outlet of the corresponding reaction station via a first internal passage and a first valve, a second gas inlet is connected to the second end of the corresponding purge gas pipe, and is connected to the first gas outlet via a second internal passage and a second valve, and a second gas outlet is connected to the second end of the corresponding first exhaust pipe, and is connected to the first gas inlet via a third internal passage and a third valve.

[0010] Further, in some embodiments of the present application, the first valve and the second valve are integrated into a first three-way valve to combine the first internal passage and the second internal passage between the first three-way valve and the first gas outlet, and to purge the first process gas remaining in the gas distribution block via the purge gas flowing through the first three-way valve.

[0011] Further, in some embodiments of the present application, the gas distribution system further comprises a plurality of second process gas pipes and a plurality of second exhaust pipes. The plurality of second process gas pipes are disposed between the plurality of first process gas pipes and the plurality of purge gas pipes, with their first ends connected to a fourth manifold above the plurality of reaction stations and leading to a second process gas source, and their second ends extending the same length to the corresponding reaction stations while bypassing the plurality of first process gas pipes, and leading into the corresponding reaction stations. The plurality of second exhaust pipes are disposed between the plurality of first exhaust pipes and the plurality of purge gas pipes, with their first ends connected to a fifth manifold above the plurality of reaction stations and leading to an exhaust manifold, and their second ends extending the same length to the corresponding reaction stations while bypassing the plurality of first process gas pipes, the plurality of second process gas pipes, and the plurality of purge gas pipes, and leading into the corresponding reaction stations.

[0012] Further, in some embodiments of the present application, each gas distribution block further has a third inlet port for connecting the second end of the corresponding second process gas pipe, and connecting to the merged internal passage between the first three-way valve and the first outlet port via a fourth internal passage and a second three-way valve, to purge the second process gas remaining in the gas distribution block via the purge gas flowing through the second three-way valve.

[0013] Further, in some embodiments of the present application, each gas distribution block further has a third outlet port for connecting the second end of the corresponding second exhaust pipe, and connecting the second inlet port via a fifth internal passage and a fourth valve.

[0014] Further, in some embodiments of the present application, the first outlet port of each gas distribution block is located on a first surface of the gas distribution block facing the corresponding reaction station. The second inlet port, the third inlet port, and the second outlet port of the gas distribution block are located on a second surface of the gas distribution block facing away from the corresponding reaction station. The first inlet port of the gas distribution block is located on a third surface of the gas distribution block perpendicular to the second surface. The third outlet port of the gas distribution block and the first three-way valve are located on a fourth surface of the gas distribution block perpendicular to the second surface and the third surface. The second three-way valve, the third valve, and the fourth valve of the gas distribution block are located on a fifth surface of the gas distribution block perpendicular to the second surface and the third surface.

[0015] Further, in some embodiments of the present application, the gas distribution system further comprises a plurality of cleaning gas pipes. The plurality of cleaning gas pipes are disposed above the plurality of purge gas pipes, with their first ends connected to a remote plasma source, and their second ends extending the same length to the corresponding reaction stations along a predetermined downward angle, and leading into the corresponding reaction stations.

[0016] Further, in some embodiments of the present application, the first process gas pipes have the same number of bending inflection points and the same bending inflection point angles, and / or the second process gas pipes have the same number of bending inflection points and the same bending inflection point angles, and / or the first exhaust gas pipes have the same number of bending inflection points and the same bending inflection point angles, and / or the second exhaust gas pipes have the same number of bending inflection points and the same bending inflection point angles, and / or the purge gas pipes have the same number of bending inflection points and the same bending inflection point angles, and / or the cleaning gas pipes have the same number of bending inflection points and the same bending inflection point angles.

[0017] Further, the second aspect of the present application provides a multi-station reaction apparatus comprising a plurality of reaction stations, at least one process gas source, an exhaust gas manifold, a purge gas source, and

[0018] The first aspect of the present application provides a multi-station reaction apparatus. BRIEF DESCRIPTION OF DRAWINGS

[0019] The above features and advantages of the present application will be better understood through reading the detailed description of embodiments of the present application in conjunction with the following drawings, in which: the components are not necessarily drawn to scale, and components of similar or identical function or features can have the same or similar reference label.

[0020] Figure 1 A schematic diagram of a multi-station reaction apparatus according to some embodiments of the present application is shown.

[0021] Figure 2 A schematic diagram of a gas distribution system according to some embodiments of the present application is shown.

[0022] Figure 3 A schematic diagram of a first process gas pipe according to some embodiments of the present application is shown.

[0023] Figure 4 A schematic diagram of a second process gas pipe according to some embodiments of the present application is shown.

[0024] Figure 5 A schematic diagram of a first exhaust gas pipe according to some embodiments of the present application is shown.

[0025] Figure 6 A schematic diagram of a second exhaust gas pipe according to some embodiments of the present application is shown.

[0026] Figure 7 A schematic diagram of a purge gas pipe according to some embodiments of the present application is shown.

[0027] Figure 8A schematic view of a clean gas conduit according to some embodiments of the present application is shown.

[0028] Figure 9 A partial schematic view of a gas distribution system according to some embodiments of the present application is shown.

[0029] Figure 10 A schematic view of a gas distribution block according to some embodiments of the present application is shown.

[0030] Figure 11 A schematic view of a gas distribution block according to some embodiments of the present application is shown.

[0031] Figure 12 A side view of a gas distribution block according to some embodiments of the present application is shown.

[0032] Reference signs:

[0033] First process gas conduit 21

[0034] Purge gas conduit 22

[0035] First exhaust gas conduit 23

[0036] Gas distribution block 24

[0037] Second process gas conduit 31

[0038] Second exhaust gas conduit 32

[0039] Clean gas conduit 33 DETAILED DESCRIPTION

[0040] The present application now will be described by way of specific embodiments thereof. These embodiments are described in order to enable those skilled in the art to practice the application, and not to limit the scope thereof. Numerous modifications and variations of the present application are possible in light of the above teachings. It is therefore to be understood that within the scope of the present application, the application can be practiced otherwise than specifically described, without departing from the spirit and scope of the present application. With specific reference now to the drawings in detail, it is stressed that the particulars shown are by way of example and for purposes of illustrative discussion of the preferred embodiments only, and are presented in the cause of providing what is believed to be the most useful and readily understood description of the principles and conceptual aspects of the application. In this regard, no attempt is made to show structural details of the application in more detail than is necessary for a fundamental understanding of the application, the description taken with the drawings making apparent to those skilled in the art how the several forms of the application can be embodied in practice. Furthermore, in the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the application. However, it will be apparent to one skilled in the art that the application can be practiced without such specific details. In other instances, well known methods have not been described in detail in order to avoid unnecessarily complicating the present description.

[0041] In the description of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connection", "linking" should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integral connection; it can be mechanical connection, or electrical connection; it can be direct connection, or indirect connection through intermediate medium, or internal communication of two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0042] In addition, "up", "down", "left", "right", "top", "bottom", "horizontal", "vertical" used in the following description should be understood as the orientation shown in the section and the related drawings. The relative terms are only for the convenience of description, and do not mean that the device described should be manufactured or operated in a particular orientation, so it should not be understood as a limitation on the present application.

[0043] It can be understood that although the terms "first", "second", "third" and the like are used herein to describe various components, regions, layers and / or parts, these components, regions, layers and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers and / or parts. Therefore, the first component, region, layer and / or part discussed below can be referred to as the second component, region, layer and / or part without departing from some embodiments of the present application.

[0044] As described above, thin film deposition techniques are used to manufacture thin films of microelectronic devices, forming deposits on a substrate, and common thin film deposition techniques include physical vapor deposition, chemical vapor deposition and the like. In the atomic layer deposition process, two or more reaction sources are often alternately introduced into the reaction chamber for reaction, and the reaction is carried out by chemical adsorption on the substrate surface to deposit thin films. After each reaction source reaction is completed, inert gas is followed by purging to remove excess reaction source and chemical reaction by-products.

[0045] In order to meet the different process and functional requirements in the multi-station semiconductor reaction equipment, there are many pipe lines and many types in the prior art, so there are often problems of space layout and height limitation of each pipe line. If the gas distribution of each pipe line is uneven, the process consistency of each reaction station is easily damaged.

[0046] In order to solve the above technical problems, the present application provides a multi-station reaction equipment and its gas distribution system, through the reasonable layout of each gas pipe line, the uniformity of gas distribution, the rational use of space and the miniaturization demand are realized, and through the cooperation of each valve in the gas distribution block, the flexible switching of each process stage is realized.

[0047] In some non-limiting embodiments, the gas distribution system of the multi-station reaction device provided in the first aspect of the present invention is disposed in the multi-station reaction device provided in the second aspect of the present invention.

[0048] Specifically, please refer to the following: Figure 1 , Figure 1 A schematic diagram of a multi-station reaction apparatus according to some embodiments of the present invention is shown.

[0049] like Figure 1 As shown, the multi-station reaction equipment includes multiple reaction stations 1, at least one process gas source (not shown in the figure) concentrated in the middle of the equipment, a waste gas main pipe (not shown in the figure) and a purge gas source (not shown in the figure), as well as a gas distribution system connecting each reaction station 1.

[0050] Next, we will combine Figures 1-2 This section provides a detailed description of the gas distribution system of the multi-station reaction equipment. Figure 2 A schematic diagram of a gas distribution system according to some embodiments of the present invention is shown.

[0051] Please refer to Figures 1-2 In some embodiments of the present invention, the gas distribution system includes multiple first process gas pipelines 21, multiple purge gas pipelines 22, and multiple first waste gas pipelines 23. The multiple first process gas pipelines 21 (e.g., 6 pipelines) are disposed above multiple reaction stations 1, with their first ends connected at the center above the multiple reaction stations to a first main pipe leading to a first process gas source, and their second ends extending the same length towards the corresponding reaction station before entering the corresponding reaction station. The multiple purge gas pipelines 22 (e.g., 6 pipelines) are disposed above the multiple first process gas pipelines 21, with their first ends connected at the center above the multiple reaction stations to a second main pipe leading to a purge gas source, and their second ends extending the same length towards the corresponding reaction station, bypassing the multiple first process gas pipelines 21, before entering the corresponding reaction station. Multiple first exhaust gas pipes 23 (e.g., 6 pipes) are installed above multiple purge gas pipes 22. Their first ends connect to a third main pipe leading to the exhaust gas main pipe at the center above the multiple reaction stations, while their second ends extend the same length to the corresponding reaction station, bypassing both the multiple first process gas pipes 21 and the multiple purge gas pipes 22, before entering the corresponding reaction station. Thus, by prioritizing the arrangement of process gas pipes in the gas path layout, followed by purge gas pipes, and finally exhaust gas pipes, this invention prioritizes minimizing the inlet flow resistance of the process gas while ensuring appropriate flow resistance in the purge gas pipes to improve purging efficiency. It also achieves the same flow resistance for each exhaust gas pipe leading to the exhaust gas main pipe.

[0052] Furthermore, in some embodiments of the present invention, the gas distribution system further includes multiple gas distribution blocks 24, each gas distribution block 24 having multiple inlets and multiple outlets, and each gas distribution block 24 independently controls multiple pipelines to enter the corresponding reaction station to implement various process stages.

[0053] Furthermore, in some embodiments of the present invention, the gas distribution system further includes multiple second process gas pipelines 31 and multiple second waste gas pipelines 32. The multiple second process gas pipelines 31 are located between multiple first process gas pipelines 21 and multiple purge gas pipelines 22. Their first ends are connected at the center above multiple reaction stations to a fourth main pipe leading to the second process gas source, while their second ends extend the same length to the corresponding reaction station, bypassing the multiple first process gas pipelines 21, before entering the corresponding reaction station. The multiple second waste gas pipelines 32 are located between multiple first waste gas pipelines 23 and multiple purge gas pipelines 22. Their first ends are connected at the center above multiple reaction stations to a fifth main pipe leading to the waste gas main pipe, while their second ends extend the same length to the corresponding reaction station, bypassing the multiple first process gas pipelines, multiple second process gas pipelines, and multiple purge gas pipelines, before entering the corresponding reaction station. The aforementioned first process gases and first process gases are respectively introduced into the reaction stations to generate different process membranes, or are respectively discharged into the waste gas main pipe via their respective waste gas pipelines.

[0054] Furthermore, in some embodiments of the present invention, the gas distribution system further includes multiple clean gas pipes 33 disposed above multiple purge gas pipes 22. The first end of each clean gas pipe is connected to a remote plasma source, while the second end extends by the same length along a preset downward angle (e.g., 20°~40°) towards the corresponding reaction station before entering the corresponding reaction station. Thus, by configuring the multiple clean gas pipes 33 as an arched structure towards the center, the present invention provides more top space for each first process gas pipe, each second process gas pipe, each first waste gas pipe, each second waste gas pipe, and each purge gas pipe, further improving space utilization and achieving the integration of the gas distribution system.

[0055] Please refer to the following for information on the independent structures of each pipe. Figures 3-8 In the embodiments, Figure 3 A schematic diagram of a first process gas pipeline according to some embodiments of the present invention is shown. Figure 4 A schematic diagram of a second process gas pipeline according to some embodiments of the present invention is shown. Figure 5 A schematic diagram of a first exhaust gas duct is shown according to some embodiments of the present invention. Figure 6 A schematic diagram of a second exhaust gas duct is shown according to some embodiments of the present invention. Figure 7 A schematic diagram of a purge gas conduit according to some embodiments of the present invention is shown. Figure 8A schematic diagram of the cleaning gas pipes is shown according to some embodiments of the present application.

[0056] In some embodiments of the present application, as shown in Figure 3 the number of the first process gas pipes 21 can be 6, which are centrally symmetrically distributed. The first process gas flows from the first process gas source, passes through the first manifold, and is then divided into 6 first process gas pipes 21, and each first process gas pipe 21 has the same number and angle of bending inflection points, ensuring that the flow resistance of each first process gas pipe 21 to the reaction station is uniform.

[0057] Correspondingly, as shown in the embodiments in Figure 4 the number of the second process gas pipes 32 can also be 6, which are centrally symmetrically distributed. The second process gas flows from the second process gas source, passes through the fourth manifold, and is then divided into 6 second process gas pipes 32, and each second process gas pipe has the same number and angle of bending inflection points, ensuring that the flow resistance of each second process gas pipe 32 to the reaction station is uniform.

[0058] Correspondingly, as shown in the embodiments in Figure 5 the number of the first exhaust gas pipes 23 corresponding to the first process gas pipes 21 can also be 6, which are centrally symmetrically distributed. Each first exhaust gas pipe 23 respectively leads the corresponding first process gas out of each reaction station and to the exhaust gas manifold, and each first exhaust gas pipe 23 also has the same number and angle of bending inflection points, ensuring that the flow resistance of each first process gas into the exhaust gas manifold is uniform.

[0059] Correspondingly, as shown in the embodiments in Figure 6 the number of the second exhaust gas pipes 32 corresponding to the second process gas pipes 31 can also be 6, which are centrally symmetrically distributed. Each second exhaust gas pipe 32 respectively leads the corresponding second process gas out of each reaction station and to the exhaust gas manifold, and each second exhaust gas pipe 32 also has the same number and angle of bending inflection points, ensuring that the flow resistance of each second process gas into the exhaust gas manifold is uniform.

[0060] Correspondingly, as shown in the embodiments in Figure 7 the number of the purge gas pipes 22 can also be 6, which are centrally symmetrically distributed. The purge gas flows from the purge gas source, passes through the second manifold, and is then divided into 6 purge gas pipes 22, and each purge gas pipe 22 has the same number and angle of bending inflection points, ensuring that the flow resistance of each purge gas pipe 22 to each reaction station is uniform.

[0061] Correspondingly, as shown in the embodiments in Figure 8As shown in the embodiment, there can also be six clean gas pipelines 33, arranged in a centrally symmetrical distribution. The clean gas originates from the remote plasma source and is divided into six clean gas pipelines 33, which flow along a preset downward angle to the corresponding reaction stations. Each clean gas pipeline 33 has the same number and angle of bends, ensuring uniform flow resistance from each clean gas pipeline 33 to each reaction station.

[0062] In summary, this invention achieves the shortest path for each gas to enter and exit each reaction station by first setting up process gas pipelines in a limited space to ensure the minimum flow resistance of the pipelines, then setting up corresponding waste gas pipelines, then setting up purging pipelines, and finally setting up clean gas pipelines with a downward inclination angle. This achieves the highest efficiency of gas distribution pipelines and realizes the miniaturization of the integrated space of the gas distribution system.

[0063] Next, we will combine Figures 9-12 The structure of the gas distribution block will be described in detail. Figure 9 A partial schematic diagram of a gas distribution system according to some embodiments of the present invention is shown. Figure 10 A schematic diagram of a gas distribution block according to some embodiments of the present invention is shown. Figure 11 A schematic diagram of the packaging of a gas distribution block according to some embodiments of the present invention is shown. Figure 12 A side view of a gas distribution block is shown according to some embodiments of the present invention.

[0064] like Figures 9-10 As shown, in some embodiments of the present invention, the gas distribution block 24 has multiple air inlets, multiple air outlets and multiple valves. The first air inlet of the gas distribution block 24 is used to connect to the second end of the corresponding first process gas pipeline and is connected to the first air outlet leading to the corresponding reaction station via a first internal channel and a first valve. The second air inlet is used to connect to the second end of the corresponding purge gas pipeline and is connected to the first air outlet via a second internal channel and a second valve. The second air outlet is used to connect to the second end of the corresponding first waste gas pipeline and is connected to the first air inlet via a third internal channel and a third valve.

[0065] Furthermore, the first valve and the second valve are integrated into a first three-way valve to combine the portions of the first internal passage and the second internal passage between the first three-way valve and the first outlet, and to purge the first process gas remaining in the gas distribution block via purge gas flowing through the first three-way valve.

[0066] Further reference can be made based on the above settings. Figure 11 In the embodiment, when the first process gas reaction stage is performed, the first process gas flows into the first internal channel through the first three-way valve and finally enters the reaction station through the first gas outlet.

[0067] When the first process gas reaction stage ends, the first process gas flows into the first exhaust gas pipeline 23 via the first two-way valve.

[0068] When the purge stage is performed, the purge gas sequentially purges each internal passage via the first three-way valve to clean the first process gas remaining in the gas distribution block, and finally enters the corresponding reaction station.

[0069] Further, as shown in Figure 12 the second process gas pipeline, and is connected to the merged internal passage between the first three-way valve and the first exhaust gas outlet via the fourth internal passage and the second three-way valve to purge the second process gas remaining in the gas distribution block via the purge gas flowing through the second three-way valve. The third exhaust gas outlet is used to connect the second end of the corresponding second exhaust gas pipeline, and is connected to the second inlet via the fifth internal passage and the fourth valve.

[0070] Via the above arrangement, when the first process stage is performed, the first process gas flows into the first internal passage via the first three-way valve, and finally enters the reaction station via the first exhaust gas outlet.

[0071] When the first process gas reaction stage ends, the first process gas flows into the first exhaust gas pipeline 23 via the first two-way valve. When the second process stage is performed, the second process gas is connected to the merged internal passage between the first three-way valve and the first exhaust gas outlet via the fourth internal passage and the second three-way valve, and finally enters the reaction station via the first exhaust gas outlet.

[0072] When the second process gas reaction stage ends, the second process gas flows into the second exhaust gas pipeline 33 via the third exhaust gas outlet.

[0073] When the purge stage is performed, the purge gas sequentially purges each internal passage via the first three-way valve to clean the first process gas remaining in the gas distribution block, and finally enters the corresponding reaction station.

[0074] Further, please further refer to Figures 10-11In some embodiments of the present application, the first gas outlet of the gas distribution block is located on a first surface (e.g. the back surface) of the gas distribution block facing the corresponding reaction station, the second gas inlet, the third gas inlet and the second gas outlet of the gas distribution block are located on a second surface (e.g. the front surface) of the gas distribution block facing away from the corresponding reaction station, the first gas inlet of the gas distribution block is located on a third surface (e.g. the lower surface) of the gas distribution block perpendicular to the second surface, the third gas outlet and the first three-way valve of the gas distribution block are located on a fourth surface (e.g. the right surface) of the gas distribution block perpendicular to the second surface and the third surface, and the second three-way valve, the third valve and the fourth valve of the gas distribution block are located on a fifth surface (e.g. the left surface) of the gas distribution block perpendicular to the second surface and the third surface. In this way, the present application also avoids the direct blowing of the gas inlets to the valves, which affects the service life of the valves.

[0075] Those skilled in the art can understand that the above-mentioned embodiments of performing the process gas reaction process, then performing the process gas exhaust pipeline, and then performing the once-through purging process and the once-through cleaning process are only some non-limiting embodiments provided by the present application, which are intended to clearly show the main concept of the present application and provide some specific solutions for facilitating the public to implement, but not to limit the overall function or overall working mode of the gas distribution block. Similarly, the gas distribution block is also only some non-limiting embodiments provided by the present application, which does not limit the execution subject or execution order of each step in the gas distribution system. Any solution achieved by increasing, decreasing and / or replacing the steps of the prior art according to the principle of the present application should be included in the protection scope of the present application.

[0076] In summary, the present application provides a multi-station reaction device and a gas distribution system thereof, which realizes the uniformity of gas distribution, the rational use of space and the miniaturization of the device by the reasonable layout of the gas pipelines, and realizes the flexible switching of each process stage by the cooperation of the valves in the gas distribution block.

[0077] Although the above methods are illustrated and described as a series of acts, it will be understood and appreciated that the methods are not limited by the order of acts, as some acts may, in accordance with one or more embodiments, occur in different orders and / or concurrently with other acts from that shown and described herein. For example, those skilled in the art will understand and appreciate that a measurement act and a decision act can depend on the results of each other, and that the methods can be conducted in an iterative manner.

[0078] Those skilled in the art will understand that information, signals, and data can be represented using any of a variety of different technologies and techniques. For example, data, instructions, commands, information, signals, bits, symbols, and chips that can be referenced throughout the above description can be represented by voltages, currents, electromagnetic waves, magnetic fields or particles, optical fields or particles, or any combination thereof.

[0079] The previous description of the disclosure is provided to enable any person skilled in the art to make or use the disclosure. Various modifications to the disclosure will be readily apparent to those skilled in the art, and the generic principles defined herein can be applied to other variations without departing from the spirit or scope of the disclosure. Thus, the disclosure is not intended to be limited to the examples described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A gas distribution system for a multi-station reaction apparatus, comprising: The system comprises: a plurality of first process gas pipes disposed above the plurality of reaction stations, with first ends connected to a first manifold above the plurality of reaction stations and second ends extending to the corresponding reaction stations; a plurality of purge gas pipes disposed above the plurality of first process gas pipes, with first ends connected to a second manifold above the plurality of reaction stations and second ends extending to the corresponding reaction stations; a plurality of first exhaust pipes disposed above the plurality of purge gas pipes, with first ends connected to a third manifold above the plurality of reaction stations and second ends extending to the corresponding reaction stations.

2. The gas distribution system of claim 1, wherein, The system further comprises: a plurality of gas distribution blocks each having a plurality of gas inlets and a plurality of gas outlets, wherein the first gas inlet of the gas distribution block is connected to the second end of the corresponding first process gas pipe and connected to the first gas outlet of the corresponding reaction station via a first internal passage and a first valve, the second gas inlet is connected to the second end of the corresponding purge gas pipe and connected to the first gas outlet via a second internal passage and a second valve, and the second gas outlet is connected to the second end of the corresponding first exhaust pipe and connected to the first gas inlet via a third internal passage and a third valve.

3. The gas distribution system of claim 2, wherein, The first valve and the second valve are integrated as a first three-way valve to combine the first internal passage and the second internal passage between the first three-way valve and the first gas outlet, and to purge the first process gas remaining in the gas distribution block via the purge gas flowing through the first three-way valve.

4. The gas distribution system of claim 3, wherein, The system further comprises: a plurality of second process gas pipes disposed between the plurality of first process gas pipes and the plurality of purge gas pipes, with first ends connected to a fourth manifold above the plurality of reaction stations and second ends extending to the corresponding reaction stations; and a plurality of second exhaust pipes disposed between the plurality of first exhaust pipes and the plurality of purge gas pipes, with first ends connected to a fifth manifold above the plurality of reaction stations and second ends extending to the corresponding reaction stations.

5. The gas distribution system of claim 4, wherein, The plurality of gas distribution blocks further each have a third gas inlet, wherein the third gas inlet is connected to the second end of the corresponding second process gas pipe and connected to the combined internal passage between the first three-way valve and the first gas outlet via a fourth internal passage and a second three-way valve to purge the second process gas remaining in the gas distribution block via the purge gas flowing through the second three-way valve. ​ 6. The gas distribution system of claim 4, wherein, The plurality of gas distribution blocks further respectively have a third gas outlet, The third gas outlet is configured to connect to a second end of a corresponding second exhaust conduit, and is connected to the second gas inlet via a fifth internal passage and a fourth valve.

7. The gas distribution system of claim 5 or 6, wherein, The first gas outlet of the gas distribution block is located on a first surface of the gas distribution block facing the corresponding reaction station, The second gas inlet, the third gas inlet and the second gas outlet of the gas distribution block are located on a second surface of the gas distribution block facing away from the corresponding reaction station, The first gas inlet of the gas distribution block is located on a third surface of the gas distribution block perpendicular to the second surface, The third gas outlet and the first three-way valve of the gas distribution block are located on a fourth surface of the gas distribution block perpendicular to the second surface and the third surface, The second three-way valve, the third valve and the fourth valve of the gas distribution block are located on a fifth surface of the gas distribution block perpendicular to the second surface and the third surface.

8. The gas distribution system of claim 4, wherein, Further comprising: a plurality of cleaning gas conduits disposed above the plurality of purge gas conduits, having a first end connected to a remote plasma source, and a second end respectively extending to the corresponding reaction station along a predetermined downward angle for the same length, and then into the corresponding reaction station.

9. The gas distribution system of claim 8, wherein, Each of the first process gas conduits has the same number and angle of bending inflection points, and / or Each of the second process gas conduits has the same number and angle of bending inflection points, and / or Each of the first exhaust conduits has the same number and angle of bending inflection points, and / or Each of the second exhaust conduits has the same number and angle of bending inflection points, and / or Each of the purge gas conduits has the same number and angle of bending inflection points, and / or Each of the cleaning gas conduits has the same number and angle of bending inflection points.

10. A multi-station reaction apparatus characterized by comprising: Comprising: a plurality of reaction stations; at least one process gas source; an exhaust manifold; a purge gas source; and a gas distribution system of the multi-station reaction apparatus according to any one of claims 1-9. ​

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