Device for generating plasma

By using a sensing-controlled power application method in the plasma generation device, the problems of component damage and impurity contamination were solved, and rapid and pure initial plasma discharge was achieved.

CN121368057APending Publication Date: 2026-01-20EN2CORE TECH INC
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Patent Information

Application Number
CN202511540397.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2020-06-30
Filing Date
2021-06-29
Publication Date
2026-01-20

AI Technical Summary

Technical Problem

In the initial discharge process of plasma, existing technologies are prone to damage to components and the introduction of impurities, which leads to contamination of the generated active species.

Method used

A plasma generation device is employed, including a chamber, an antenna module, electrodes, sensors, and a controller. The power supply is controlled by sensing the plasma condition, avoiding unnecessary pulse voltages and reducing component damage and impurity generation.

Benefits of technology

Rapid initial discharge of plasma was achieved, reducing component damage and impurity generation, and improving the purity of plasma generation.

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Abstract

The present invention provides an apparatus for generating plasma, the apparatus comprising: a chamber configured to provide a generation space for plasma; an antenna module disposed adjacent to the chamber and configured to be connected to a first power source and generate an induced electric field in the chamber; an electrode disposed adjacent to the chamber and configured to be connected to a second power source and assist in generating plasma; a sensor configured to obtain sensing information related to a condition of the plasma; and a controller configured to control the first power supply and the second power supply.
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