Elastic profiling polishing grinding wheel and preparation method and application thereof

Abstract

The invention discloses an elastic profiling polishing grinding wheel and a preparation method and application thereof, and belongs to the technical field of polishing grinding wheels. The elastic profiling polishing grinding wheel comprises a profiling base body, n elastic resin layers and m abrasive layers are arranged on the surface of the profiling base body, the elastic resin layers and the abrasive layers are alternately arranged, and the outermost layer of the profiling base body is the abrasive layer. The elastic profiling polishing grinding wheel has elasticity, can be extruded and attached in all directions and can achieve the good polishing effect on all areas of the inner surface and the outer surface of a cover plate of a visual instrument, the abrasive layer in the elastic profiling polishing grinding wheel can provide the necessary cutting or polishing effect, and based on the design of a multi-layer structure, the polishing effect is good. And the elastic layer can be worn at a proper time, so that a deeper abrasive layer is exposed for polishing.

Description

Technical Field

[0001] This invention relates to the field of polishing wheel technology, and more specifically, to an elastic contour polishing wheel, its preparation method, and its application. Background Technology

[0002] As people's demands for visualization instruments increase, more and more products are incorporating AI concepts. These electronic devices typically use glass as a cover to provide durability and optical clarity. Generally, glass covers with shaped designs are shaped using diamond grinding tools, such as shaping, roughing, and finishing, and then polished using polishing slurries, such as cerium oxide.

[0003] To achieve a mirror-like finish, electroplated or sintered diamond grinding wheels must use small-diameter diamond particles (<10µm in diameter). These small-diameter particles need to bond firmly to the substrate to cut into the hard, smooth surface of glass. If the substrate is strong and tough, while it can hold the diamond particles, it hinders self-sharpening; the outer layer of diamond won't fall off after wear, and the inner layer, due to its small particle size and the firm substrate, cannot be exposed quickly. Using small-diameter diamonds with a less tough substrate will cause premature substrate wear, altering the wheel's shape and reducing its polishing capacity. Therefore, after diamond wheel treatment, polishing with cerium oxide / aluminum oxide slurry is typically performed. However, using slurry for polishing is inefficient, involves many steps, and is easily obstructed or affected by the substrate's rounded corners or other structural features, leading to polishing blind spots or poor polishing results, which in turn affects light transmittance and the mirror-like finish. In view of this, the present invention is proposed. Summary of the Invention

[0004] The purpose of this invention is to provide an elastic contour polishing wheel, its preparation method, and its application, so as to solve or improve the above-mentioned technical problems.

[0005] This invention can be implemented as follows: In a first aspect, the present invention provides an elastic contour polishing wheel, the elastic contour polishing wheel including a contour substrate, the surface of the contour substrate being provided with n elastic resin layers and m abrasive layers, the elastic resin layers and abrasive layers being alternately arranged, and the outermost layer of the contour substrate being the abrasive layer.

[0006] In an optional embodiment, the flexible contour polishing wheel includes at least one of the following features: Feature 1: The thickness of a single layer of elastic resin is 10μm~400μm; Feature 2: The thickness of a single abrasive layer is 20μm~400μm; Feature 3: n≥3; Feature 4: m ≥ 3; Feature 5: The total thickness of the n-layer elastic resin layer and the m-layer abrasive layer does not exceed 2mm; Feature 6: The abrasive layer contains abrasive, and the mass percentage of abrasive in the abrasive layer does not exceed 70%; Feature 7: The abrasive layer contains resin; the resin is a UV-curable and heat-curable resin, preferably an acrylic resin; Feature 8: The resin in the elastic resin layer is a UV-curable and heat-curable resin; preferably a polyurethane resin; Feature 9: Different layers of the elastic layer have different colors; Feature 10: The surface hardness of the flexible contour polishing wheel is 20HA~80HA.

[0007] In an optional embodiment, the abrasive includes at least one of alumina, silicon carbide, and diamond.

[0008] In an optional embodiment, the abrasive is an agglomerated abrasive formed from at least one of alumina, silicon carbide, and diamond, and a binder.

[0009] In an optional embodiment, the particle size of the agglomerated abrasive is 20 μm to 250 μm.

[0010] In an optional embodiment, the binder includes glass powder.

[0011] In an optional embodiment, the raw materials for preparing the abrasive layer include a first resin prepolymer and a powder mixture; The raw materials for preparing the first resin prepolymer include diluents, photoinitiators, thermal initiators, and UV-curable and heat-curable resins; the powder mixture includes agglomerated diamond, alumina, fillers, coupling agents, and wetting agents.

[0012] In an optional embodiment, the filler includes wollastonite.

[0013] In an optional embodiment, the raw materials for preparing the abrasive layer also include an antifoaming agent.

[0014] In an optional embodiment, the raw materials for preparing the elastic resin layer include photoinitiators, thermal initiators, and UV-curable and heat-curable resins.

[0015] In a second aspect, the present invention provides a method for preparing an elastic contour polishing wheel as described in any of the foregoing embodiments, comprising the following steps: preparing an elastic resin layer and an abrasive layer on the surface of a contour substrate at predetermined positions and in predetermined numbers.

[0016] In an optional embodiment, the raw materials for preparing the elastic resin layer are mixed to form a second resin prepolymer, and the raw materials for preparing the abrasive layer are mixed to form an abrasive layer slurry. A multi-stage contouring mold that transmits light is used. The second resin prepolymer or abrasive slurry used to form the first layer on the surface of the contouring substrate is added to the first-stage contouring mold. After adding the contouring substrate, it is cured under ultraviolet light to obtain the first intermediate contouring substrate. Subsequently, the second resin prepolymer or abrasive slurry used to form the second layer on the surface of the contouring substrate is added to the second-stage contouring mold. After adding the first intermediate contouring substrate, it is cured under ultraviolet light. This process is repeated until the second resin prepolymer or abrasive slurry in the final-stage contouring mold is cured under ultraviolet light. Finally, the entire multi-stage contouring mold is thermo-cured.

[0017] In an optional embodiment, the heat curing temperature is 50℃~150℃, and the heat curing time is 2min~2h.

[0018] Thirdly, the present invention provides a visualization instrument, the cover of which is obtained by polishing with an elastic contour polishing wheel according to any of the foregoing embodiments.

[0019] The beneficial effects of this invention include: The elastic contour polishing wheel provided by this invention has an elastic resin layer that facilitates the compression and adhesion of the wheel in all directions, thereby achieving better polishing results on various areas of the inner and outer surfaces of the cover plate of the visualization instrument. The abrasive layer in the elastic contour polishing wheel provides the necessary cutting or polishing action. Based on the multi-layer structure with alternating elastic resin and abrasive layers, the elastic layer can be worn down at appropriate times, thereby exposing a deeper abrasive layer for polishing and improving polishing efficiency. Attached Figure Description

[0020] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a schematic diagram of the structure of the elastic contour polishing wheel provided by the present invention; Figure 2 This is a schematic diagram of the abrasive layer structure in the elastic contour polishing wheel provided by the present invention; Figure 3 SEM image of agglomerated diamond in an elastic contour polishing wheel provided by the present invention; Figure 4A cross-sectional view of a portion of the elastic contour polishing wheel is provided for Embodiment 1 of the present invention; Figure 5 This is a dimensional diagram of the workpiece in the test example.

[0022] Icons: 10 - contoured substrate; 20 - elastic resin layer; 30 - abrasive layer; 31 - abrasive. Detailed Implementation

[0023] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Where specific conditions are not specified in the embodiments, conventional conditions or conditions recommended by the manufacturer shall apply. Reagents or instruments whose manufacturers are not specified are all conventional products that can be purchased commercially.

[0024] The following is a detailed description of the elastic contour polishing wheel provided by the present invention, its preparation method, and its application.

[0025] This invention provides an elastic contour polishing wheel, such as... Figure 1 As shown, the elastic contour polishing wheel includes a contour base 10. The surface of the contour base 10 is provided with n layers of elastic resin layer 20 and m layers of abrasive layer 30. The elastic resin layer 20 and abrasive layer 30 are alternately arranged, and the outermost layer of the contour base 10 is the abrasive layer 30.

[0026] The contouring substrate 10 can be made of hard metal. From the inside out, the first layer on the surface of the contouring substrate 10 can be an elastic resin layer 20 or an abrasive layer 30.

[0027] The aforementioned abrasive layer 30 primarily provides the necessary cutting or polishing action, while the elastic resin layer 20 provides resilience, facilitating the compression and adhesion of the elastic contour polishing wheel in all directions. This allows the abrasive 31 to adhere to the area requiring polishing during equipment rotation, achieving optimal polishing results on various areas of the inner and outer surfaces of the visualization instrument's cover. By designing a multi-layered alternating structure for the abrasive layer 30 and elastic resin layer 20, the elastic resin layer 20 wears down at appropriate times during polishing, exposing a deeper layer of abrasive 30 for polishing, thus improving polishing efficiency. This design is suitable for fine polishing of various forms (such as internal cavity, regular, or irregular structures).

[0028] In some alternative embodiments, the total number of elastic resin layers 20 is n≥2, further, n≥3, and even further, n≥5. The total number of abrasive layers 30 is m≥2, further, m≥3, and even further, m≥5.

[0029] In some optional embodiments, the thickness of a single layer of the elastic resin layer 20 can be from 10 μm to 400 μm, such as 10 μm, 20 μm, 50 μm, 100 μm, 150 μm, 200 μm, 250 μm, 300 μm, 350 μm, or 400 μm, or other values ​​within the range of 10 μm to 400 μm. Further, the thickness of a single layer of the elastic resin layer 20 can be from 15 μm to 30 μm.

[0030] The thickness of a single layer of abrasive layer 30 can be from 20μm to 400μm, such as 20μm, 50μm, 100μm, 150μm, 200μm, 250μm, 300μm, 350μm, or 400μm, or other values ​​within the range of 20μm to 400μm. Furthermore, the thickness of a single layer of abrasive layer 30 can be from 20μm to 100μm.

[0031] It should be noted that if the thickness of a single layer of elastic resin layer 20 is less than 10 μm, it may not provide sufficient elasticity; if the thickness of a single layer of elastic resin layer 20 is greater than 400 μm, the elastic layer is too thick, which may prevent the underlying material from being exposed in time to perform its grinding function. If the thickness of a single layer of abrasive layer 30 is less than 20 μm, it may be too thin, resulting in reduced holding force on the abrasive; if the thickness of a single layer of abrasive layer 30 is greater than 400 μm, it may lead to a decrease in the self-sharpening properties of the abrasive.

[0032] Preferably, the total thickness of the above-mentioned n-layer elastic resin layer 20 and m-layer abrasive layer 30 does not exceed 2 mm.

[0033] In some alternative embodiments, the abrasive layer 30 contains abrasive 31 (e.g., ...). Figure 2 As shown), preferably, the abrasive is non-light-blocking so that light can pass through the abrasive 31 itself more easily during the photocuring process, allowing the resin encapsulating the abrasive 31 to cure faster.

[0034] The mass percentage of abrasive 31 in the abrasive layer 30 does not exceed 70%. If the mass percentage of abrasive 31 in the abrasive layer 30 exceeds 70%, it will hinder light transmission. Furthermore, the mass percentage of abrasive 31 in the abrasive layer 30 does not exceed 50%.

[0035] The abrasive 31 described above may include at least one of alumina, silicon carbide, and diamond. In some preferred embodiments, the abrasive 31 is an agglomerated abrasive formed from at least one of alumina, silicon carbide, and diamond, and a binder. For example, agglomerated diamond (e.g.) Figure 3 As shown, aggregated diamond breaks down under pressure, reducing scratches. By using aggregated diamond, it can be combined with the elastic resin layer 20 to further improve the elasticity of the entire contour polishing wheel, resulting in better polishing performance.

[0036] In some alternative embodiments, the particle size of the agglomerated abrasive can be 20μm to 250μm, such as 20μm, 50μm, 100μm, 150μm, 200μm or 250μm.

[0037] If the particle size of agglomerated abrasive is too small, the polishing efficiency will be poor; if the particle size of agglomerated abrasive is too large, deep scratches are likely to occur.

[0038] In some alternative implementations, the binder may exemplary include glass powder.

[0039] The abrasive layer 30 also contains a resin, which is a UV-curable and heat-curable resin, preferably an acrylic resin. In some alternative embodiments, the raw materials for preparing the abrasive layer 30 include a mixture of a first resin prepolymer and a powder, and may further include other additives such as defoamers.

[0040] The raw materials for preparing the first resin prepolymer may include diluents, photoinitiators, thermal initiators, and UV-curable and heat-curable resins (such as acrylic resins). The powder mixture may include agglomerated diamond, alumina powder, fillers (such as wollastonite), coupling agents, and wetting agents.

[0041] In some alternative embodiments, the raw materials for preparing the abrasive layer 30 may include 20 to 80 parts by weight of the first resin prepolymer, 5 to 40 parts by weight of the powder mixture, and 0.1 to 2 parts by weight of the defoamer (such as BYK-530 defoamer).

[0042] The raw materials for preparing the first resin prepolymer, by mass, may include 10 to 70 parts of photocurable polyurethane modified acrylic resin, 5 to 80 parts of photocurable acrylic resin, 10 to 60 parts of diluent (such as tetrahydrofuran acrylate or 1,6-hexanediol diacrylate, etc.), 0.5 to 2 parts of photoinitiator (such as 1173 photoinitiator), and 0.2 to 2 parts of thermal initiator (such as AIBN thermal initiator).

[0043] By weight, the powder mixture may include 5 to 50 parts of spherical agglomerated diamond, 10 to 40 parts of alumina powder, 5 to 30 parts of filler (wollastonite or nano-silica), 0.1 to 1 part of coupling agent (such as 6040 coupling agent), and 0.2 to 3 parts of wetting agent (such as W903 wetting agent). The agglomerated diamond has a D... 50 The agglomerate diamond particles can range from 20μm to 55μm in size, and their density (D) can be... 50 It can be 1μm~20μm, D of alumina powder 50 It can be 10nm~250nm.

[0044] In some alternative embodiments, the resin in the elastic resin layer 20 is a UV-curable and heat-curable resin, preferably a polyurethane resin.

[0045] In some alternative embodiments, the raw materials for preparing the elastic resin layer 20 may include photoinitiators, thermal initiators, and UV-curable and heat-curable polyurethane resins, and may further include other additives.

[0046] In some optional embodiments, the raw materials for preparing the elastic resin layer 20, by weight, include 20 to 80 parts of photocurable polyurethane resin, 10 to 60 parts of photocurable acrylic resin, 10 to 60 parts of diluent (such as isobornyl acrylate), 0.2 to 2 parts of photoinitiator (such as 1173 photoinitiator), and 0.1 to 2 parts of thermal initiator (such as AIBN initiator).

[0047] In some alternative implementations, different layers of the elastic material are different colors to indicate the degree of use of the grinding wheel. For example, the bottom layer can be red to let the user know when the end of use has been reached and the grinding wheel needs to be replaced.

[0048] In some alternative implementations, the surface hardness of the flexible contour polishing wheel is 20HA to 80HA, for example, 23HA to 55HA.

[0049] As described above, the application process of the elastic contour polishing wheel provided by this invention is similar to that of conventional grinding wheels. It requires no equipment change and can be used on CNC machines. This elastic contour polishing wheel is elastic, allowing it to be pressed against the sidewalls and bottom, and also extends to the bottom for polishing. Furthermore, this elastic contour polishing wheel has a multi-layered structure, which can be designed according to specific application environments. The abrasive layer 30 ensures that it firmly holds small diamond particles. When the abrasive 31 in the abrasive layer 30 is used up, the elastic resin layer 20 between the two abrasive layers 30 can break down promptly, exposing the next layer of diamond abrasive 31 (self-sharpening), allowing the process to continue, thus achieving continuous processing while maintaining elasticity.

[0050] Accordingly, the present invention also provides a method for preparing the above-mentioned elastic contour polishing wheel, comprising the following steps: preparing an elastic resin layer 20 and an abrasive layer 30 on the surface of the contour substrate 10 according to a preset position and number of layers.

[0051] In some alternative embodiments, the raw materials for preparing the elastic resin layer 20 are mixed to form a second resin prepolymer, and the raw materials for preparing the abrasive layer 30 are mixed to form an abrasive layer slurry.

[0052] A multi-stage contouring mold that transmits light is used. The second resin prepolymer or abrasive layer slurry used to form the first layer on the surface of the contouring substrate 10 is added to the first-stage contouring mold. After placing the contouring substrate 10 inside, it is cured under UV light to obtain a first intermediate contouring substrate. Subsequently, the second resin prepolymer or abrasive layer slurry used to form the second layer on the surface of the contouring substrate 10 is added to the second-stage contouring mold. After placing the first intermediate contouring substrate inside, it is cured under UV light. This process is repeated until the second resin prepolymer or abrasive layer slurry in the final-stage contouring mold is completely cured under UV light. The entire multi-stage contouring mold is then thermo-cured. The dimensions of each subsequent-stage contouring mold are larger than the dimensions of the preceding-stage mold.

[0053] In some alternative implementations, the heat curing temperature can be 50°C to 150°C, and the heat curing time can be 2 min to 2 h.

[0054] In some alternative implementations, it can be made in the following manner: (1) Rod making: Make a rod with a similar outline to the target workpiece but slightly smaller using metal.

[0055] (2) Mold preparation: Use a light-transmitting mold (to facilitate the penetration of ultraviolet rays and form a light solid). The inner cavity contour of the mold matches the target contour, but is 100μm larger than the rod. Then use multi-stage molds, each stage being about 100μm larger than the previous stage.

[0056] (3) Fabrication of the contouring elastic grinding wheel: First, add the second resin prepolymer used to form the first layer on the surface of the contouring substrate 10 into the contouring mold, then place the contouring substrate 10 in, turn on the ultraviolet lamp to cure it, and achieve the desired shape to obtain the first intermediate contouring substrate. Next, add the abrasive layer slurry used to form the second layer on the surface of the contouring substrate 10 into the larger contouring mold, then place the first intermediate contouring substrate in, turn on the ultraviolet lamp to cure it, and achieve the desired shape to obtain the second intermediate contouring substrate. Then, add the second resin prepolymer used to form the third layer on the surface of the contouring substrate 10 into the even larger contouring mold, then place the second intermediate contouring substrate in, turn on the ultraviolet lamp to cure it, and achieve the desired shape to obtain the third intermediate contouring substrate. Next, add the abrasive layer slurry used to form the fourth layer on the surface of the contouring substrate 10 into the next level of the contouring mold, then place the third intermediate contouring substrate in, turn on the ultraviolet lamp to cure it, and achieve the desired shape. The elastic resin layer 20 and abrasive layer 30 are prepared alternately in the above manner until the preset number of layers is reached. Then, the whole thing is placed in an oven and heat-cured at 80°C for 2 hours to obtain an elastic contour polishing wheel.

[0057] It should be noted that the contouring process needs to be formed and maintain the required design shape in a very short time, that is, the shape must be fixed before the abrasive particles 31 settle. This invention first uses UV curing, which has the characteristic of oxygen inhibition, that is, the reaction efficiency is very slow in the presence of oxygen. By taking advantage of this defect, the second resin prepolymer or abrasive layer slurry is kept in a semi-dry state after coating, which is conducive to the subsequent layer of second resin prepolymer or abrasive layer slurry continuing to adhere to the previous layer of abrasive layer slurry or second resin prepolymer until the tool is completed. Then, the thermosetting characteristic is used to heat and continue to carry out deep curing, so that all layers of the contouring grinding wheel are cured and the overall strength of abrasive 31 is improved.

[0058] In addition, the present invention also provides a visualization instrument, the cover of which is obtained by polishing with the above-mentioned elastic contour polishing wheel.

[0059] The features and performance of the present invention will be further described in detail below with reference to embodiments. Embodiment 1 This embodiment provides a flexible contour polishing wheel (such as...). Figure 4 As shown), its preparation method includes: S1: Prepare abrasive layer slurry.

[0060] S1-1: Take 10 portions of the purchased D 50 It consists of spherical aggregated diamonds with a diameter of 25 μm (containing glass powder and a particle size of D). 50 (2μm diamond particles), 20 parts with a particle size D 50 Flat alumina powder of 50 nm and 15 parts of filler (10 parts of wollastonite powder and 5 parts of nano silica) were dried in an oven at 100°C for 5 hours. After passing through a 200-mesh sieve, the powder was poured into a V-type mixer, and 0.27 parts of coupling agent 6040 and 0.5 parts of wetting agent W903 were added and mixed for 2 hours to obtain a powder mixture.

[0061] S1-2: Add 30 parts of light-curable polyurethane modified acrylic resin, 10 parts of light-curable acrylic resin, and 20 parts of diluent (tetrahydrofuran acrylate) to a heated stirrer, then add 0.8 parts of 1173 photoinitiator and 0.4 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the first resin prepolymer.

[0062] S1-3: Take 50.5 parts of the above first resin prepolymer, 0.4 parts of defoamer BYK-530 and 20 parts of the above powder mixture and add them to a mechanical stirrer. Stir at 50°C or below for 30 minutes. Place the stirred premix into a wet ball mill and ball mill for 30 minutes to obtain the abrasive slurry.

[0063] S2: Prepare the second resin prepolymer of the elastic resin layer 20.

[0064] Add 40 parts of UV-curable polyurethane resin, 20 parts of UV-curable acrylic resin, and 35 parts of diluent (isoborneol acrylate) to a heated stirrer, then add 0.4 parts of 1173 photoinitiator and 0.1 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the second resin prepolymer.

[0065] S3: Prepare an elastic contour polishing wheel.

[0066] S3-1: Make a rod out of metal with a similar but slightly smaller shape to the target workpiece.

[0067] S3-2: Use a light-transmitting abrasive. The inner contour of the mold cavity matches the target contour, but is 50μm larger than the rod body. Then use a multi-stage abrasive. When curing the elastic layer, it is 50μm larger than the previous stage. When curing the abrasive layer, it is 100μm larger than the previous stage. Then adjust according to the actual situation.

[0068] S3-3: Fabrication of the Contouring Elastic Grinding Wheel: First, add the second resin prepolymer, used to form the first layer on the surface of the contouring substrate 10, to the contouring mold. Then, place the contouring substrate 10 in, turn on the UV lamp, and cure it to achieve the desired shape, obtaining the first intermediate contouring substrate. Next, add the abrasive layer slurry, used to form the second layer on the surface of the contouring substrate 10, to the larger contouring mold. Then, place the first intermediate contouring substrate in, turn on the UV lamp, and cure it to achieve the desired shape, obtaining the second intermediate contouring substrate. Then, add the second resin prepolymer, used to form the third layer on the surface of the contouring substrate 10, to the even larger contouring mold. Then, place the second intermediate contouring substrate in, turn on the UV lamp, and cure it to achieve the desired shape, obtaining the third intermediate contouring substrate. Finally, add the abrasive layer slurry, used to form the fourth layer on the surface of the contouring substrate 10, to the next level of the contouring mold. Then, place the third intermediate contouring substrate in, turn on the UV lamp, and cure it to achieve the desired shape. The elastic resin layer 20 and the abrasive layer 30 are prepared alternately in the above manner, and the process is repeated 5 times (each time including 1 layer of elastic resin layer 20 and 1 layer of abrasive layer 30). After that, the mixture is placed in an oven and heat-cured at 80°C for 2 hours to obtain an elastic contour polishing wheel.

[0069] The flexible contour polishing wheel includes a contouring substrate 10. The surface of the substrate 10 is provided with five elastic resin layers 20 and five abrasive layers 30. The thicknesses of the elastic resin layers 20 are 29 μm, 16 μm, 23 μm, and 17 μm, respectively, and the thicknesses of the abrasive layers 30 are 77 μm, 27 μm, 26 μm, and 91 μm, respectively. The surface hardness of the flexible contour polishing wheel is 35 HA.

[0070] Example 2 This embodiment provides an elastic contour polishing wheel, the preparation method of which includes: S1: Prepare abrasive layer slurry.

[0071] S1-1: Take 10 portions of the purchased D 50 It consists of spherical aggregated diamonds with a diameter of 30 μm (containing glass powder and a particle size of D). 50 (3μm diamond particles), 20 parts with a particle size D 50 Flat alumina powder of 50 nm and 15 parts of filler (10 parts of wollastonite powder and 5 parts of nano silica) were dried in an oven at 100°C for 5 hours. After passing through a 200-mesh sieve, the powder was poured into a V-type mixer, and 0.27 parts of coupling agent 6040 and 0.5 parts of wetting agent W903 were added and mixed for 2 hours to obtain a powder mixture.

[0072] S1-2: Add 30 parts of light-curable polyurethane modified acrylic resin, 10 parts of light-curable acrylic resin, and 20 parts of diluent (tetrahydrofuran acrylate) to a heated stirrer, then add 0.8 parts of 1173 photoinitiator and 0.4 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the first resin prepolymer.

[0073] S1-3: Take 50.5 parts of the above first resin prepolymer, 0.4 parts of defoamer BYK-530 and 20 parts of the above powder mixture and add them to a mechanical stirrer. Stir at 50°C or below for 30 minutes. Place the stirred premix into a wet ball mill and ball mill for 30 minutes to obtain the abrasive slurry.

[0074] S2: Prepare the second resin prepolymer of the elastic resin layer 20.

[0075] Add 40 parts of UV-curable polyurethane resin, 20 parts of UV-curable acrylic resin, and 35 parts of diluent (isoborneol acrylate) to a heated stirrer, then add 0.4 parts of 1173 photoinitiator and 0.1 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the second resin prepolymer.

[0076] S3: Prepare an elastic contour polishing wheel.

[0077] S3-1: Make a rod out of metal with a similar but slightly smaller shape to the target workpiece.

[0078] S3-2: Use a light-transmitting abrasive. The inner contour of the mold cavity matches the target contour, but is 50μm larger than the rod body. Then use a multi-stage abrasive. When curing the elastic layer, it is 50μm larger than the previous stage. When curing the abrasive layer, it is 100μm larger than the previous stage. Then adjust according to the actual situation.

[0079] S3-3: Fabrication of the Contouring Elastic Grinding Wheel: First, add the second resin prepolymer, used to form the first layer on the surface of the contouring substrate 10, to the contouring mold. Then, place the contouring substrate 10 in, turn on the UV lamp, and cure it to achieve the desired shape, obtaining the first intermediate contouring substrate. Next, add the abrasive layer slurry, used to form the second layer on the surface of the contouring substrate 10, to the larger contouring mold. Then, place the first intermediate contouring substrate in, turn on the UV lamp, and cure it to achieve the desired shape, obtaining the second intermediate contouring substrate. Then, add the second resin prepolymer, used to form the third layer on the surface of the contouring substrate 10, to the even larger contouring mold. Then, place the second intermediate contouring substrate in, turn on the UV lamp, and cure it to achieve the desired shape, obtaining the third intermediate contouring substrate. Finally, add the abrasive layer slurry, used to form the fourth layer on the surface of the contouring substrate 10, to the next level of the contouring mold. Then, place the third intermediate contouring substrate in, turn on the UV lamp, and cure it to achieve the desired shape. The elastic resin layer 20 and the abrasive layer 30 are prepared alternately in the above manner, and the process is repeated 5 times (each time including 1 layer of elastic resin layer 20 and 1 layer of abrasive layer 30). After that, the mixture is placed in an oven and heat-cured at 80°C for 2 hours to obtain an elastic contour polishing wheel.

[0080] The elastic contour polishing wheel includes a contour base 10, the surface of which is provided with 5 layers of elastic resin 20 and 5 layers of abrasive 30, and the surface hardness of the elastic contour polishing wheel is 35HA.

[0081] Example 3 This embodiment provides an elastic contour polishing wheel, the preparation method of which includes: S1: Prepare abrasive layer slurry.

[0082] S1-1: Take 10 portions of the purchased D 50 It consists of spherical aggregated diamonds with a diameter of 50 μm (containing glass powder and a particle size of D). 50 (2μm diamond particles), 20 parts with a particle size D 50 Flat alumina powder of 50 nm and 15 parts of filler (10 parts of wollastonite powder and 5 parts of nano silica) were dried in an oven at 100°C for 5 hours. After passing through a 200-mesh sieve, the powder was poured into a V-type mixer, and 0.27 parts of coupling agent 6040 and 0.5 parts of wetting agent W903 were added and mixed for 2 hours to obtain a powder mixture.

[0083] S1-2: Add 30 parts of light-curable polyurethane modified acrylic resin, 10 parts of light-curable acrylic resin, and 20 parts of diluent (tetrahydrofuran acrylate) to a heated stirrer, then add 0.8 parts of 1173 photoinitiator and 0.4 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the first resin prepolymer.

[0084] S1-3: Take 50.5 parts of the above first resin prepolymer, 0.4 parts of defoamer BYK-530 and 20 parts of the above powder mixture and add them to a mechanical stirrer. Stir at 50°C or below for 30 minutes. Place the stirred premix into a wet ball mill and ball mill for 30 minutes to obtain the abrasive slurry.

[0085] S2: Prepare the second resin prepolymer of the elastic resin layer 20.

[0086] Add 50 parts of UV-curable polyurethane resin, 20 parts of UV-curable acrylic resin, and 35 parts of diluent (isoborneol acrylate) to a heated stirrer, then add 0.4 parts of 1173 photoinitiator and 0.1 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the second resin prepolymer.

[0087] S3: Prepare an elastic contour polishing wheel.

[0088] S3-1: Make a rod out of metal with a similar but slightly smaller shape to the target workpiece.

[0089] S3-2: Use a light-transmitting abrasive. The inner cavity contour of the mold should match the target contour, but be 100μm larger than the rod. Then use a multi-stage abrasive. When curing the elastic layer, the abrasive should be 50μm larger than the previous stage, and when curing the abrasive layer, it should be 100μm larger than the previous stage. Then make adjustments according to the actual situation.

[0090] S3-3: Fabrication of the Contouring Elastic Grinding Wheel: First, add the second resin prepolymer, used to form the first layer on the surface of the contouring substrate 10, to the contouring mold. Then, place the contouring substrate 10 in, turn on the UV lamp, and cure it to achieve the desired shape, obtaining the first intermediate contouring substrate. Next, add the abrasive layer slurry, used to form the second layer on the surface of the contouring substrate 10, to the larger contouring mold. Then, place the first intermediate contouring substrate in, turn on the UV lamp, and cure it to achieve the desired shape, obtaining the second intermediate contouring substrate. Then, add the second resin prepolymer, used to form the third layer on the surface of the contouring substrate 10, to the even larger contouring mold. Then, place the second intermediate contouring substrate in, turn on the UV lamp, and cure it to achieve the desired shape, obtaining the third intermediate contouring substrate. Finally, add the abrasive layer slurry, used to form the fourth layer on the surface of the contouring substrate 10, to the next level of the contouring mold. Then, place the third intermediate contouring substrate in, turn on the UV lamp, and cure it to achieve the desired shape. The elastic resin layer 20 and abrasive layer 30 are prepared alternately in the manner described above, and this alternation is repeated 5 times (each time including one layer of elastic resin layer 20 and one layer of abrasive layer 30). The mixture is then placed in an oven and heat-cured at 80°C for 2 hours to obtain an elastic contour polishing wheel. The surface hardness of this elastic contour polishing wheel is 25HA.

[0091] Example 4 The difference between this embodiment and Embodiment 1 is that: S1-2: Take 5 portions of aggregated diamond (D 50 (20μm) (containing glass powder and particle size D) 50 (2μm diamond particles), 10 parts of particle size D 50 Flat alumina powder of 10 nm and 5 parts filler (4 parts wollastonite powder and 1 part nano silica) were dried in an oven at 100°C for 5 h. After passing through a 200-mesh sieve, the powder was poured into a V-type mixer. 0.1 parts coupling agent 6040 and 0.2 parts wetting agent W903 were added and mixed for 2 h to obtain a powder mixture.

[0092] S1-3: Add 10 parts of light-curable polyurethane modified acrylic resin, 5 parts of light-curable acrylic resin, and 10 parts of diluent (1,6-hexanediol diacrylate) to a heated stirrer, then add 0.5 parts of 1173 photoinitiator and 0.2 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the first resin prepolymer.

[0093] S1-4: Take 20 parts of the above-mentioned first resin prepolymer, 0.1 parts of defoamer BYK-530 and 5 parts of powder mixture and add them to a mechanical stirrer. Stir at 50°C or below for 30 minutes. Put the stirred premix into a wet ball mill and ball mill for 30 minutes to obtain the abrasive layer slurry.

[0094] S2: Prepare the second resin prepolymer of the elastic resin layer 20.

[0095] Add 20 parts of UV-curable polyurethane resin, 10 parts of UV-curable acrylic resin, and 10 parts of diluent (1,6-hexanediol diacrylate) to a heated stirrer, then add 0.2 parts of 1173 photoinitiator and 0.1 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the second resin prepolymer.

[0096] The surface hardness of the flexible contour polishing wheel is 55HA.

[0097] Example 5 The difference between this embodiment and Embodiment 1 is that: S1-2: Take 50 portions of aggregated diamond (D 50 (55μm) (containing glass powder and particle size D) 50 (3μm diamond particles), 40 parts with a particle size D 50Flat alumina powder of 250 nm and 30 parts of filler (20 parts of wollastonite powder and 10 parts of nano silica) were dried in an oven at 100 °C for 5 h. After passing through a 200-mesh sieve, the powder was poured into a V-type mixer, and 1 part of coupling agent 6040 and 3 parts of wetting agent W903 were added and mixed for 2 h to obtain a powder mixture.

[0098] S1-3: Add 70 parts of light-curable polyurethane modified acrylic resin, 80 parts of light-curable acrylic resin, and 60 parts of diluent (1,6-hexanediol diacrylate) to a heated stirrer, then add 2 parts of 1173 photoinitiator and 2 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the first resin prepolymer.

[0099] S1-4: Take 80 parts of the above-mentioned first resin prepolymer, 2 parts of defoamer BYK-530 and 40 parts of powder mixture and add them to a mechanical stirrer. Stir at 50°C or below for 30 minutes. Put the stirred premix into a wet ball mill and ball mill for 30 minutes to obtain the abrasive layer slurry.

[0100] S2: Prepare the second resin prepolymer of the elastic resin layer 20.

[0101] Add 80 parts of UV-curable polyurethane resin, 60 parts of UV-curable acrylic resin, and 60 parts of diluent (1,6-hexanediol diacrylate) to a heated stirrer, then add 2 parts of 1173 photoinitiator and 2 parts of AIBN thermal initiator. Then raise the temperature to 50°C, start stirring, and stir until the resin and initiator are completely dissolved to obtain the second resin prepolymer.

[0102] The surface hardness of the flexible contour polishing wheel is 23HA.

[0103] Comparative Example 1 This comparative example uses commercially available 3M TD2V 2μm (abrasive diamond powder with a D content of 1000 μm). 50 A grinding wheel is wrapped with abrasive paper with a diameter of 2μm.

[0104] Comparative Example 2 This comparative example uses 2μm (D of abrasive diamond powder) from a domestic brand. 50 Electroplated grinding wheel (2μm).

[0105] Comparative Example 3 This comparative example provides a polishing wheel, the preparation method of which includes: S1: Preparation of abrasive powder. Take 10 portions of particle size D 50 Diamond particles of 2μm, 20 parts with a particle size D 50Flat alumina powder of 50 nm and 15 parts of filler (10 parts of wollastonite powder and 5 parts of nano silica) were dried in an oven at 100°C for 5 hours. After passing through a 200-mesh sieve, the powder was poured into a V-type mixer, and 0.27 parts of coupling agent 6040 and 0.5 parts of wetting agent W903 were added and mixed for 2 hours to obtain a powder mixture.

[0106] S2: Preparation of resin prepolymer.

[0107] Add 100 parts of polyether polyol, 40 parts of isocyanate, 1 part of catalyst and 3.5 parts of crosslinking agent to a stirrer, turn on the stirrer and stir until the mixture is uniform to obtain the resin prepolymer.

[0108] S3: Flexible profile grinding wheel manufacturing. S3-1: Make a rod out of metal with a similar but slightly smaller shape to the target workpiece.

[0109] S3-2: Prepare a mold whose inner cavity contour matches the target contour and is 1mm larger than the rod body.

[0110] S3-3: Add 20 parts of the above powder mixture and 80 parts of the above resin prepolymer resin to a heated stirrer and stir evenly to obtain a mixture.

[0111] S3-4: Add the mixture into the mold, gel at 30°C for 4 minutes, and then cure for 30 hours to obtain a contour polishing wheel.

[0112] The surface hardness of this contour polishing wheel is 35HA.

[0113] Comparative Example 4 This comparative example provides a polishing wheel, the preparation method of which includes: S1: Preparation of abrasive powder. Take 10 portions of particle size D 50 Diamond particles of 2μm, 20 parts with a particle size D 50 Flat alumina powder of 50 nm and 15 parts of filler (10 parts of wollastonite powder and 5 parts of nano silica) were dried in an oven at 100°C for 5 hours. After passing through a 200-mesh sieve, the powder was poured into a V-type mixer, and 0.27 parts of coupling agent 6040 and 0.5 parts of wetting agent W903 were added and mixed for 2 hours to obtain a powder mixture.

[0114] S2: Preparation of resin prepolymer.

[0115] Add 36 parts of modified epoxy acrylate resin and 19 parts of polyurethane modified acrylate to a heated stirrer, raise the temperature to 50°C, turn on the stirrer, and stir until the resin is completely dissolved to obtain the resin prepolymer.

[0116] S3: Preparation of slurry.

[0117] Add 45.5 parts of the above resin prepolymer, 0.4 parts of defoamer BYK-530, and 60 parts of the above powder mixture to a mechanical stirrer and stir at 50°C or below for 30 minutes; then add 0.8 parts of AIBN thermal initiator and continue stirring for 10 minutes. Place the stirred premix into a wet ball mill and ball mill for 30 minutes to obtain a slurry with abrasive 31.

[0118] S4: Contouring grinding wheel manufacturing.

[0119] S4-1: Make a rod out of metal with a similar but slightly smaller shape to the target workpiece.

[0120] S4-2: Prepare a mold with an inner cavity contour that matches the target contour and is 1mm larger than the rod body.

[0121] S4-3: Add the slurry containing abrasive 31 into the mold and cure it at 60℃ for 5 hours; then raise the temperature to 90℃ and cure it for 1 hour to obtain the mold polishing wheel.

[0122] The surface hardness of this contour polishing wheel is 80HA.

[0123] Test case The workpiece was processed using a Beijing Jingdiao JDLV600E grinding wheel. The workpiece is Corning Gorilla Glass 2. The inner surface of the workpiece was treated with an 800# contour-plating grinding wheel. The workpiece dimensions are shown in the attached drawing. Figure 5 As shown, R0.8 and R50 in the inner cavity are the target areas that need to be polished. The cutting fluid flow rate was set to 10 L / min, and 100 workpieces were continuously machined. The number of workpieces whose R0.8 and R50 target areas were properly polished was counted as the number of "effective workpieces". In addition, the surface roughness Sa after polishing was tested, and the grinding wheel dressing frequency was compared; the results are shown in Table 1.

[0124] Table 1 Performance Results of Examples and Comparative Examples

[0125] As can be seen from Table 1: Examples 1-5 can process more effective workpieces than Comparative Examples 1-4, and the grinding wheel correction frequency is low.

[0126] Effective workpieces: Although both Comparative Example 3 (sponge grinding wheel) and Comparative Example 4 (resin) can be polished to the target area, due to poor self-sharpening properties, after polishing several workpieces, the shape of the grinding wheel has lost its conforming significance and the contour needs to be re-adjusted before it can continue to be polished to the target area.

[0127] Although Example 2 could reach the target area, its roughness was greater than that of Example 1 due to the use of larger-sized diamond particles for agglomeration. In Example 3, the increased polyurethane acrylic resin content in the elastic resin layer led to a decrease in hardness and better wheel elasticity, resulting in a smaller roughness than that of Example 1.

[0128] Although Comparative Example 2 could reach the target area, the diamond grit was small in size, had a short lifespan, and was prone to dulling. Because the electroplating layer was single-layered and could not be repaired, only 70 polishing passes were possible. Furthermore, the electroplated wheel had a rigid substrate, resulting in high surface roughness and deep scratches, failing to achieve the desired polishing effect.

[0129] In Comparative Example 1, the sandpaper was adhered to an elastic substrate, exhibiting good adhesion and covering the target areas on both sides. However, because the sandpaper was glued on, the outer contour could not be trimmed. After polishing 15 workpieces, some areas were worn and required replacement with newer sandpaper for continued use.

[0130] Example 1 demonstrates that both the resin itself and the aggregated diamond are elastic, and because it is designed according to the contour of the target area, it can completely adhere to the surface of the target area. Its multi-layered structure can also break down at the appropriate time, exposing new aggregated diamond particles, allowing polishing to continue. The combined structure of the elastic matrix and the aggregated diamond results in a low roughness after polishing (Sa < 100 nm), giving the workpiece a mirror-like finish.

[0131] In summary, in the elastic contour polishing wheel provided by this invention, the abrasive layer 30 mainly provides the necessary cutting or polishing action, while the elastic resin layer 20 provides resilience, which facilitates the elastic contour polishing wheel to be squeezed and adhered in all directions. This allows the abrasive 31 to adhere to the area to be polished when the equipment rotates, achieving better polishing results on various areas of the inner and outer surfaces of the cover plate of the visualization instrument. By designing a multi-layered alternating structure for the abrasive layer 30 and the elastic resin layer 20, the elastic resin layer 20 wears down at appropriate times during the polishing process, thereby exposing a deeper layer of abrasive 30 for polishing, improving polishing efficiency. This method is suitable for fine polishing of various forms (such as internal cavity, regular, or irregular structures).

[0132] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A flexible contour polishing wheel, characterized in that, The elastic contour polishing wheel includes a contour substrate. The surface of the contour substrate is provided with n elastic resin layers and m abrasive layers. The elastic resin layers and the abrasive layers are alternately arranged, and the outermost layer of the contour substrate is the abrasive layer.

2. The elastic contour polishing wheel according to claim 1, characterized in that, The elastic contour polishing wheel includes at least one of the following features: Feature 1: The thickness of a single layer of the elastic resin layer is 10μm~400μm; Feature 2: The thickness of a single abrasive layer is 20μm~400μm; Feature 3: n≥3; Feature 4: m ≥ 3; Feature 5: The total thickness of the n-layer elastic resin layer and the m-layer abrasive layer does not exceed 2mm; Feature 6: The abrasive layer contains abrasive, and the mass percentage of the abrasive in the abrasive layer does not exceed 70%; Feature 7: The abrasive layer contains resin; the resin is a UV-curable and heat-curable resin; preferably an acrylic resin; Feature 8: The resin in the elastic resin layer is a UV-curable and heat-curable resin; preferably, it is a polyurethane resin; Feature 9: Different layers of the elastic layer have different colors; Feature 10: The surface hardness of the elastic contour polishing wheel is 20HA~80HA.

3. The elastic contour polishing wheel according to claim 2, characterized in that, The abrasive includes at least one of alumina, silicon carbide, and diamond.

4. The elastic contour polishing wheel according to claim 3, characterized in that, The abrasive is an agglomerated abrasive formed by at least one of alumina, silicon carbide and diamond and a binder. Preferably, the particle size of the agglomerated abrasive is 20μm~250μm; Preferably, the binder comprises glass powder.

5. The elastic contour polishing wheel according to claim 3, characterized in that, The raw materials for preparing the abrasive layer include a first resin prepolymer and a powder mixture; The raw materials for preparing the first resin prepolymer include diluents, photoinitiators, thermal initiators, and UV-curable and heat-curable resins; the powder mixture includes agglomerated diamond, alumina, fillers, coupling agents, and wetting agents.

6. The elastic contour polishing wheel according to claim 3, characterized in that, The raw materials for preparing the elastic resin layer include photoinitiators, thermal initiators, and UV-curable and heat-curable resins.

7. A method for preparing an elastic contour polishing wheel as described in any one of claims 1 to 6, characterized in that, Includes the following steps: The elastic resin layer and the abrasive layer are prepared on the surface of the contoured substrate according to a predetermined position and number of layers.

8. The preparation method according to claim 7, characterized in that, The raw materials for preparing the elastic resin layer are mixed to form a second resin prepolymer, and the raw materials for preparing the abrasive layer are mixed to form an abrasive layer slurry. A multi-stage contouring mold that transmits light is used. The second resin prepolymer or abrasive slurry used to form the first layer on the surface of the contouring substrate is added to the first-stage contouring mold. After adding the contouring substrate, it is cured under ultraviolet light to obtain the first intermediate contouring substrate. Subsequently, the second resin prepolymer or abrasive slurry used to form the second layer on the surface of the contouring substrate is added to the second-stage contouring mold. After adding the first intermediate contouring substrate, it is cured under ultraviolet light. This process is repeated until the second resin prepolymer or abrasive slurry in the final-stage contouring mold is cured under ultraviolet light. Finally, the entire multi-stage contouring mold is thermo-cured.

9. The preparation method according to claim 8, characterized in that, The temperature for heat curing is 50℃~150℃, and the curing time is 2min~2h.

10. A visualization instrument, characterized in that, The cover plate of the visualization instrument is obtained by polishing with the elastic contour polishing wheel as described in any one of claims 1 to 6.

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