Preparation method of ice crack pattern coating

By forming a multi-layer coating structure on the surface of metal or ceramic, and utilizing vacuum deposition and rapid cooling, the problems of uneven ice crack pattern coating, single color, and high production cost in the existing technology have been solved, realizing stable and diversified ice crack pattern coating and industrial production.

CN121407033APending Publication Date: 2026-01-27SHENZHEN GOLDENHOUSE VACUUM TECH
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Patent Information

Application Number
CN202511520332.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-10-23
Publication Date
2026-01-27

AI Technical Summary

Technical Problem

Existing coating technologies struggle to actively induce uniform and stable ice crack patterns on metal or ceramic substrates, and they also struggle to achieve color diversity. Furthermore, the production process is complex and costly, making them unsuitable for large-scale industrial production.

Method used

The system employs a multi-layer coating structure, including a base color layer and a transparent layer. Ice crack patterns are formed through vacuum deposition and rapid cooling. Different metal materials and reactive gases are combined with different process parameters to form base color layers of various colors. The transparent layer produces a uniform ice crack effect through high-temperature rapid cooling.

Benefits of technology

It achieves the formation of uniform and stable ice crack pattern coatings on metal or ceramic surfaces, while also offering a variety of colors, simplifying the production process, reducing costs, and making it suitable for industrial-scale production.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses a preparation method of an ice crack pattern coating, and relates to the technical field of material surface treatment. The invention relates to a preparation method of an ice crack pattern coating, which comprises the following steps: pretreating a base material, and depositing in an environment of 150-250 DEG C to form a ground color layer; depositing in an environment of 200-300 DEG C to form a transparent layer; and finally, in an environment of (-80)-(-50) DEG C, carrying out rapid cooling treatment by using a cooling medium, taking out, and naturally recovering to normal temperature. According to the preparation method, the transparent layer can actively form a uniform ice crack effect, and the color of the ground color layer is matched, so that the ice crack pattern coating can be uniformly cracked and has the characteristic of color diversity at the same time.
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Description

Technical Field

[0001] This invention relates to the technical field of material surface treatment, and in particular to a method for preparing an ice crack pattern coating. Background Technology

[0002] In the field of surface treatment technology, especially in the area of ​​surface functionality and aesthetic modification of high-temperature resistant substrates such as metals and ceramics, the core idea of ​​current mainstream surface treatment technologies is mainly to maintain the original surface morphology of the substrate, such as traditional polished mirror finishes, brushed textures, or sandblasted matte finishes. While these can improve the appearance and surface properties of materials to some extent, they lack unique and innovative surface effects. However, with technological advancements and the increasing market demand for personalized material appearances and diversified functions, the market demand for coatings with unique textures and surface effects is becoming increasingly strong.

[0003] In recent years, a crackle-pattern coating has been introduced, which can present the effect of crackle on the flat and smooth surface of metal or ceramic. It retains the smooth touch and flatness of the substrate surface, and gives the product an artistic feel and high recognition through the natural and random texture of the cracks, which fully solves the pain point of "lack of innovation in traditional surface treatment" in the industry.

[0004] However, existing coating technologies still face numerous limitations in achieving the ice-crack pattern effect. Firstly, there is a lack of an effective method to actively induce aesthetically pleasing and controllable ice-crack patterns on metal or ceramic substrates. Secondly, existing methods struggle to achieve unique ice-crack textures while simultaneously ensuring diversity in base colors and coating stability. Thirdly, existing methods are often complex, require sophisticated equipment, and incur high production and modification costs, hindering large-scale industrial production. Therefore, the industry urgently needs a coating preparation technology that can actively generate uniform and stable ice-crack patterns, accommodate color diversity, and is suitable for mass production. Summary of the Invention

[0005] In order to actively form a uniform and stable ice crack pattern coating on the surface of metal or ceramic, while also taking into account the color diversity of the coating and making it suitable for industrial-scale production, this application provides a method for preparing an ice crack pattern coating.

[0006] Firstly, the method for preparing an ice-crack pattern coating provided in this application adopts the following technical solution: A method for preparing an ice-crack pattern coating includes the following steps: S1. Pre-treat the surface of the substrate to fully remove grease and impurities from the substrate surface, and obtain the pre-treated substrate after drying. S2. The pretreated substrate is placed in a first vacuum furnace and deposited at a furnace temperature of 100-300°C to form a base color layer on the surface of the pretreated substrate, thereby obtaining a primary substrate. S3. The primary substrate is transferred to a second vacuum furnace and deposited at a furnace temperature of 300-350°C to form a transparent layer on the surface of the base color layer, thus obtaining a secondary substrate. S4. Transfer the secondary substrate to the third vacuum furnace, and rapidly cool the transparent layer at a furnace temperature of (-80)-(-50)℃ using a cooling medium to form an ice crack pattern on the transparent layer. Remove the substrate and allow it to naturally return to room temperature to complete the process of forming an ice crack pattern coating on the surface of the substrate.

[0007] By adopting the above technical solution, the transparent layer at high temperature will instantly shrink and generate extremely high thermal stress after undergoing rapid cooling treatment at low temperature (S4). Due to the rapid change in thermal stress, the transparent layer will release internal thermal stress by cracking, thereby enabling the coating to actively form a uniform ice-crack effect. Combined with the coating color of the base layer, the ice-crack pattern coating can also achieve the characteristic of color diversity. Secondly, the method for forming the ice-crack pattern coating in this application is simple and conducive to achieving industrial-scale production.

[0008] Optionally, in step S2, the base color layer is deposited using a vacuum magnetron sputtering process, wherein a metal material is used as the target material, high-purity argon is used as the working gas, and one or more of high-purity nitrogen and high-purity acetylene are used as the reaction gas.

[0009] By adopting the above technical solution, when metal materials are used as the target material, different reaction gases, coating thicknesses, and process conditions can be combined to form a variety of base color layers on the surface of the pretreated substrate, which is conducive to achieving ice crack pattern coating with color diversity and forming a unique ice crack pattern coating.

[0010] Optionally, the target material is at least one selected from chromium, titanium, gold, copper, zirconium, titanium carbide, and gold-copper alloy.

[0011] By adopting the above technical solutions and selecting the aforementioned metal materials as target materials, along with corresponding reaction gases and process parameters, different colored base layers can be formed on the surface of the pretreated substrate, thereby achieving a variety of colors and forming a unique ice-crack pattern coating. For example, using chromium as the target material can form a silver base layer; using titanium in combination with high-purity nitrogen and high-purity acetylene can form a tarnish-black base layer; and using gold as the target material can form a golden base layer, etc.

[0012] Optionally, in S3, the transparent layer includes a first transparent layer and a second transparent layer formed by sequential deposition. The first transparent layer is formed by vacuum spraying a transparent organosilicon-modified polyurethane coating, and the second transparent layer is formed by vacuum evaporation deposition of a transparent fluorosilicone resin.

[0013] By adopting the above technical solution, the silicone-modified polyurethane coating, serving as the first transparent layer, can form a soft stress buffer layer. Under rapid cooling at high temperatures, it can absorb and redistribute thermal stress through deformation, and transfer the thermal stress more evenly to the upper second transparent layer. As the second transparent layer is further baked at high temperatures to form a fluorocarbon silicon layer, its overall hardness increases, leading to cracking under rapid stress changes. Combined with the uniform transfer of thermal stress in the first transparent layer, this promotes a more uniform change in thermal stress within the fluorocarbon silicon, which is more conducive to the formation of a denser and more uniformly distributed ice-crack pattern when the second transparent layer cracks. Simultaneously, the first transparent layer can also undergo microscopic deformation under rapid cooling at high temperatures, resulting in richer crack shadows produced by the second transparent layer under light illumination, which helps to create a stronger three-dimensional and layered effect for the ice-crack pattern coating.

[0014] Optionally, in step S3, high-purity argon is used as the working gas when depositing the second transparent layer.

[0015] By adopting the above technical solution and using high-purity argon as the working gas, it is possible to effectively ensure that the entire process is in an inert atmosphere during the deposition of the second transparent layer. Combined with high-temperature baking, this is conducive to the formation of a dense and uniform fluorocarbon silicon transparent layer with controllable internal stress, so as to facilitate the subsequent formation of the target ice crack pattern.

[0016] Optionally, the coating thickness of the first transparent layer is 300-500 nm, and the deposition thickness of the second transparent layer is 500-700 nm.

[0017] Optionally, in step S4, a high-pressure spray process is used for rapid cooling, wherein the cooling medium is liquid nitrogen, the spray pressure is 6-10 MPa, the spray direction is perpendicular to the surface of the secondary substrate, the spray distance is 80-120 mm, and the spray time is 5-10 min.

[0018] By adopting the above technical solution, the transparent layer can be rapidly cooled down, and the first and second transparent layers can generate extremely high thermal stress simultaneously. This is conducive to the second transparent layer producing a significant ice crack effect. Combined with the color of the base color layer, the ice crack pattern coating can achieve the characteristics of color diversity.

[0019] Optionally, the substrate is a metallic material or a ceramic material.

[0020] Optionally, the first vacuum furnace, the second vacuum furnace, and the third vacuum furnace are connected sequentially to form a continuous vacuum furnace system, and the pretreated substrate is sequentially conveyed in the continuous vacuum system by an automatic control system.

[0021] By adopting the above technical solution, the continuous vacuum furnace system effectively ensures the stability of the process, which is beneficial to improving the deposition effect of each layer and the overall quality. At the same time, the use of an automatic control system to transport the pretreated substrate in the continuous vacuum furnace system can also effectively improve the accuracy of the overall process, prevent excessive differences in the formation process conditions of the ice crack pattern coating due to time errors caused by manual operation, and improve the controllability and uniformity of the ice crack pattern coating.

[0022] In summary, the technical solution of this application has at least one of the following beneficial effects: 1. By rapidly cooling the high-temperature transparent layer, a uniform ice crack effect can be formed on the transparent layer. Combined with the coating color of the base color layer, the ice crack pattern coating can achieve a variety of colors.

[0023] 2. By setting multiple transparent layers, wherein the first transparent layer is an organosilicon-modified polyurethane coating and the second transparent layer is a fluorocarbon silicon layer, under the condition of rapid cooling at high temperature, the softness of the first transparent layer can promote the uniform change of thermal stress in the second transparent layer, which is conducive to the uniform cracking of the second transparent layer and the formation of ice crack patterns with higher density and more uniform distribution.

[0024] 3. By setting multiple transparent layers, the deformation and cracking between the multiple transparent layers can make the overall crack shadow richer, which is conducive to creating a stronger sense of three-dimensionality and layering for the ice crack pattern coating. Attached Figure Description

[0025] Figure 1 This is a physical image of a crack-patterned coating prepared by a method disclosed in Example 1 of this application. Detailed Implementation

[0026] The present application will be further described in detail below with reference to the accompanying drawings, embodiments, and preparation examples. In the following embodiments and comparative examples: The high-purity argon gas used is argon gas with a concentration of 99.99%, the high-purity nitrogen gas is nitrogen gas with a concentration of 99.99%, and the high-purity acetylene gas is acetylene gas with a concentration of 99.5%.

[0027] The silicone-modified polyurethane coating was specifically purchased from Evonik, specifically the silicone-modified polyurethane with the brand name SILIKOPUR 8081.

[0028] The fluorosilicone resin was specifically purchased from Ruifeng Fluorochemicals, specifically the solvent-based fluorosilicone resin with the brand name RF-901.

[0029] The first, second, and third vacuum furnaces all have identical chamber dimensions: 3000 mm in length, 800 mm in width, and 1500 mm in height, to facilitate calculation of the gas flow rate. Furthermore, the first, second, and third vacuum furnaces are sequentially connected, forming a continuous vacuum furnace system. The pretreated substrate is sequentially conveyed within this system via an automatic control system. Example

[0030]

Example 1

[0031] S2. The pretreated substrate is placed in the first vacuum furnace and vacuum magnetron sputtering is performed at 200°C to deposit a base color layer on the surface of the pretreated substrate to obtain the first-level substrate. In this embodiment, titanium with a purity of 4N is used as the target material. High-purity argon is used as the working gas, and high-purity acetylene is used as the reaction gas. High-purity argon is introduced into the first vacuum furnace at a flow rate of 100 sccm, and high-purity acetylene is introduced into the second vacuum furnace at a flow rate of 20 sccm. The first vacuum furnace is maintained at a vacuum level of less than 1.5 × 10⁻⁶. -3 Pa, and the remaining parameters are those of conventional vacuum magnetron sputtering process.

[0032] S3. Transfer the primary substrate to the second vacuum furnace, first perform vacuum spraying at 200°C to coat the surface of the base color layer to form a first transparent layer, then heat to 300°C and perform vacuum evaporation deposition to deposit a second transparent layer on the surface of the first transparent layer to obtain the second substrate. In this embodiment, the first transparent layer is specifically formed by coating with a transparent silicone-modified polyurethane coating, with a coating thickness of 10 μm. The second transparent layer is specifically formed by vacuum evaporation deposition of fluorosilicone resin, with a deposition thickness of 500 nm. High-purity argon is used as the working gas during the deposition of the second transparent layer and is introduced into the second vacuum furnace at a flow rate of 60 sccm. The second vacuum furnace is continuously maintained at a vacuum level of less than 1.5 × 10⁻⁶. -3 Pa, and the remaining parameters are those used in conventional vacuum electron beam evaporation processes.

[0033] S4. While still hot, quickly transfer the secondary substrate to the third vacuum furnace and perform a high-pressure spraying process at -60℃. Use liquid nitrogen to rapidly cool the transparent layer, causing the transparent layer to form an ice crack pattern. Remove the substrate and allow it to naturally return to room temperature to complete the process of forming an ice crack pattern coating on the surface of the substrate. In this embodiment, the high-pressure spray process uses a spray pressure of 6 MPa, a spray direction perpendicular to the surface of the secondary substrate, a spray distance of 80 mm, and a continuous spray duration of 10 min.

[0034] A crackle-pattern coating, as shown in the reference Figure 1 Specifically, it is prepared by the above-mentioned preparation method.

[0035]

Example 2

[0036] S2. The pretreated substrate is placed in the first vacuum furnace and vacuum magnetron sputtering is performed at 250°C to deposit a base color layer on the surface of the pretreated substrate to obtain the first-level substrate. In this embodiment, chromium is used as the target material with a purity of 3N5. High-purity argon is used as the working gas, and it is introduced into the first vacuum furnace at a flow rate of 120 sccm. The first vacuum furnace maintains a vacuum level of less than 1.5 × 10⁻⁶. -3 Pa, and the remaining parameters are those of conventional vacuum magnetron sputtering process.

[0037] S3. Transfer the primary substrate to the second vacuum furnace, first perform vacuum spraying at 250°C to coat the surface of the base color layer to form a first transparent layer, then heat to 300°C and perform vacuum evaporation deposition to deposit a second transparent layer on the surface of the first transparent layer to obtain the second substrate. In this embodiment, the first transparent layer is specifically formed by coating with a transparent silicone-modified polyurethane coating, with a coating thickness of 10 μm. The second transparent layer is specifically formed by vacuum evaporation deposition of fluorosilicone resin, with a deposition thickness of 1 μm. During the deposition of the second transparent layer, high-purity argon is used as the working gas and is introduced into the second vacuum furnace at a flow rate of 60 sccm. The second vacuum furnace is continuously maintained at a vacuum level of less than 1.5 × 10⁻⁶. -3 Pa, and the remaining parameters are those used in conventional vacuum electron beam evaporation processes.

[0038] S4. While still hot, quickly transfer the secondary substrate to the third vacuum furnace and perform a high-pressure spraying process at -80℃. Use liquid nitrogen to rapidly cool the transparent layer, causing the transparent layer to form an ice crack pattern. Remove the substrate and allow it to naturally return to room temperature to complete the process of forming an ice crack pattern coating on the surface of the substrate. In this embodiment, the high-pressure spray process uses a spray pressure of 10 MPa, a spray direction perpendicular to the surface of the secondary substrate, a spray distance of 120 mm, and a continuous spray duration of 5 minutes.

[0039]

Example 3

[0040] The specific process steps of S2 in this embodiment are as follows: the pretreated substrate is placed in the first vacuum furnace, vacuum magnetron sputtering is performed at 150°C, and a base color layer is deposited on the surface of the pretreated substrate to obtain the first-level substrate; High-purity gold (4N purity) was used as the target material, and high-purity argon was used as the working gas, introduced into the first vacuum furnace at a flow rate of 100 sccm, while maintaining a vacuum level of less than 1.5 × 10⁻⁶. -3 Pa.

[0041]

Example 4

[0042] The specific process steps of S2 in this embodiment are as follows: the pretreated substrate is placed in the first vacuum furnace and vacuum magnetron sputtering is performed at 250°C to deposit a base color layer on the surface of the pretreated substrate to obtain the first-level substrate; The target material is a gold-copper alloy with a purity of 4N. High-purity argon is used as the working gas, and high-purity nitrogen is used as the reactant gas. High-purity argon is introduced into the first vacuum furnace at a flow rate of 80 sccm, and high-purity nitrogen is introduced into the first vacuum furnace at a flow rate of 5 sccm, while maintaining a vacuum level of less than 1.5 × 10⁻⁶. -3 Pa.

[0043]

Example 5

[0044] The specific process steps of S3 in this embodiment are as follows: the primary substrate is transferred to the second vacuum furnace, vacuum evaporation is performed at 300°C, and a transparent layer is deposited on the surface of the base color layer to obtain the secondary substrate; The transparent layer is formed by evaporation and deposition of fluorosilicone resin, with a deposition thickness of 1 μm. High-purity argon is used as the working gas, and it is introduced into the second vacuum furnace at a flow rate of 60 sccm, while maintaining a vacuum level of less than 1.5 × 10⁻⁶. -3 Pa.

[0045] Comparative Example Comparative Example 1 A method for preparing a patterned coating differs from [Example 1] in that the process steps and parameters in S4 are different, while the rest is the same as [Example 1].

[0046] The specific process steps of Comparative Example S4 are as follows: While still hot, the secondary substrate is quickly transferred to the third vacuum furnace and naturally cooled at a furnace temperature of -60℃. After 2 hours, it is taken out and allowed to naturally return to room temperature, thus completing the process of forming a patterned coating on the surface of the substrate.

[0047] Comparative Example 2 A method for preparing a coating differs from [Example 1] in that step S3 is omitted. Specifically, this comparative example includes the following steps: S1. Pre-treat the surface of the substrate to fully remove grease and impurities from the substrate surface, and obtain the pre-treated substrate after drying. In this comparative example, the pretreatment of the substrate surface includes cleaning, isopropanol immersion degreasing, dilute sulfuric acid pickling activation, and secondary cleaning.

[0048] S2. The pretreated substrate is placed in the first vacuum furnace and vacuum magnetron sputtering is performed at 200°C to deposit a base color layer on the surface of the pretreated substrate to obtain the first-level substrate. In this comparative example, titanium with a purity of 4N was used as the target material. High-purity argon was used as the working gas, and high-purity acetylene was used as the reaction gas. High-purity argon was introduced into the first vacuum furnace at a flow rate of 100 sccm, and high-purity acetylene was introduced into the second vacuum furnace at a flow rate of 20 sccm. The first vacuum furnace was maintained at a vacuum level of less than 1.5 × 10⁻⁶. -3 Pa, and the remaining parameters are those of conventional vacuum magnetron sputtering process.

[0049] S4. While still hot, quickly transfer the primary substrate to the third vacuum furnace and perform a high-pressure spraying process at -60°C. Use liquid nitrogen to rapidly cool the transparent layer, causing it to form an ice crack pattern. Remove the substrate and allow it to naturally return to room temperature. This completes the process of forming an ice crack pattern coating on the surface of the substrate. In this comparative example, the high-pressure spray process used a spray pressure of 6 MPa, a spray direction perpendicular to the surface of the secondary substrate, a spray distance of 80 mm, and a continuous spray duration of 10 min.

[0050] Performance test data 1. Appearance evaluation: The appearance of the coatings obtained by each embodiment and comparative example was observed and recorded by visual inspection and touch, including the coating color and coating condition.

[0051] Table 1. Data on the appearance performance of the coating on the substrate surface Based on Example 1 and Comparative Examples 1-2, and the data in Table 1, it can be seen that the pretreated substrate is first placed in a first vacuum furnace to deposit a base color layer, then transferred to a second vacuum furnace to form a transparent layer with a multi-layer structure through vacuum spraying and vacuum evaporation. Finally, it is transferred to a third vacuum furnace while still hot. Through the low-temperature environment and rapid cooling of the cooling medium, the transparent layer on the surface of the substrate shrinks instantly and generates extremely high thermal stress, which in turn produces a uniform ice crack effect. Combined with the color of the base color layer, the ice crack pattern coating can achieve the characteristics of color diversity.

[0052] As shown in Comparative Example 1, rapidly cooling the high-temperature transparent layer using a cooling medium is key to forming the ice-crack pattern coating. While natural cooling of the workpiece in a low-temperature environment will cause the transparent layer to shrink, the overall shrinkage rate is significantly lower than the rapid cooling in Example 1. This allows the thermal stress generated in the transparent layer of Comparative Example 1 to be released and relaxed. However, due to the large temperature difference between the vacuum furnace and the workpiece, considerable thermal stress will still be generated in the transparent layer. Therefore, the final product obtained in Comparative Example 1 will exhibit some microscopic, localized microcracks at the weakest point of the coating or where the cooling is fastest. Consequently, the resulting effect is not the natural ice-crack state as in Example 1, but rather a state of overall microcracks with obvious cracks at the edges.

[0053] Furthermore, as shown in Comparative Example 2 and Example 5, the transparent layer is also crucial for forming the ice-crack pattern coating. Without a transparent layer, even with rapid cooling using a cooling medium, no obvious ice-crack pattern appears. This is likely because the thermal expansion coefficients of the substrate and the target material used in the base color layer are well-matched, resulting in a relatively small stress base. Additionally, since the selected target materials are all metallic, the resulting base color layer possesses a certain degree of toughness. Under rapid cooling, the base color layer can release stress through microscopic mechanisms such as "lattice distortion," without requiring macroscopic cracking. Therefore, no ice-crack pattern forms in Comparative Example 2. However, when only one fluorocarbon silicon layer is retained as the transparent layer, compared to having both an organosilicon-modified polyurethane coating and a fluorocarbon silicon layer, the former produces fewer and less uniform ice-crack patterns, exhibiting not only a few large, coarse cracks but also a lack of depth. This is likely because the first transparent layer acts as a stress buffer. Under rapid cooling from high temperatures, it can undergo significant deformation to absorb and redistribute thermal stress, transferring it more evenly to the upper second transparent layer. This, in turn, promotes the uniform attainment of critical fracture stress on the surface of the second transparent layer. The homogenization of stress directly limits crack propagation to a very small area, resulting in a higher density and more uniform crack distribution. Simultaneously, the first transparent layer may also undergo microscopic deformation under rapid cooling, causing the second transparent layer to form microscopic "graben" and "barrier" structures. Under light, the shadows of the cracks in the overall transparent layer become richer, thus contributing to a stronger sense of three-dimensionality and depth.

[0054] Based on Examples 1-4 and the data in Table 1, it can be seen that by changing the target material used in vacuum magnetron sputtering in S2 and coordinating the deposition process parameters corresponding to each target material, different target materials can be uniformly deposited on the surface of the pretreated substrate, thereby forming a base color layer of different colors. Since the transparent layer formed in S3 does not obscure the color development of the base color layer, it is beneficial to make the ice crack pattern coating have color diversity and achieve a unique ice crack pattern coating.

[0055] This specific embodiment is merely an explanation of this application and is not intended to limit it. After reading this specification, those skilled in the art can make modifications to this specific embodiment without contributing any inventive step, but such modifications are protected by patent law as long as they fall within the scope of the claims of this application.

Claims

1. A method for preparing an ice-crack pattern coating, characterized in that, Includes the following steps: S1. Pre-treat the surface of the substrate to fully remove grease and impurities from the substrate surface, and obtain the pre-treated substrate after drying. S2. The pretreated substrate is placed in a first vacuum furnace and deposited at a furnace temperature of 150-250°C to form a base color layer on the surface of the pretreated substrate, thereby obtaining a primary substrate. S3. The primary substrate is transferred to a second vacuum furnace and deposited at a furnace temperature of 200-300°C to form a transparent layer on the surface of the base color layer, thus obtaining a secondary substrate. S4. Transfer the secondary substrate to the third vacuum furnace, and rapidly cool the transparent layer at a furnace temperature of (-80) to (-50) °C using a cooling medium to form an ice crack pattern on the transparent layer. Remove the substrate and allow it to naturally return to room temperature to complete the process of forming an ice crack pattern coating on the surface of the substrate.

2. The method for preparing an ice-crack pattern coating according to claim 1, characterized in that: In step S2, the base color layer is deposited using a vacuum magnetron sputtering process, wherein a metal material is used as the target material, high-purity argon is used as the working gas, and one or more of high-purity nitrogen and high-purity acetylene are used as the reaction gas.

3. The method for preparing an ice-crack pattern coating according to claim 2, characterized in that: The target material is at least one of chromium, titanium, gold, copper, zirconium, titanium carbide, and gold-copper alloy.

4. The method for preparing an ice-crack pattern coating according to claim 1, characterized in that: In S3, the transparent layer includes a first transparent layer and a second transparent layer formed by sequential deposition. The first transparent layer is formed by vacuum spraying a transparent organosilicon-modified polyurethane coating, and the second transparent layer is formed by vacuum evaporation deposition of a transparent fluorosilicone resin.

5. The method for preparing an ice-crack pattern coating according to claim 4, characterized in that: In step S3, high-purity argon is used as the working gas when depositing the second transparent layer.

6. The method for preparing an ice-crack pattern coating according to claim 4, characterized in that: The coating thickness of the first transparent layer is 8-10 μm, and the deposition thickness of the second transparent layer is 500-800 nm.

7. The method for preparing an ice-crack pattern coating according to claim 1, characterized in that: In step S4, a high-pressure spray process is used for rapid cooling, wherein the cooling medium is liquid nitrogen, the spray pressure is 6-10 MPa, the spray direction is perpendicular to the surface of the secondary substrate, the spray distance is 80-120 mm, and the spray time is 5-10 min.

8. The method for preparing an ice-crack pattern coating according to any one of claims 1, characterized in that: The substrate is a metallic material or a ceramic material.

9. A method for preparing an ice-crack pattern coating according to any one of claims 1-8, characterized in that: The first vacuum furnace, the second vacuum furnace, and the third vacuum furnace are connected in sequence to form a continuous vacuum furnace system. The pretreated substrate is sequentially conveyed in the continuous vacuum system by an automatic control system.