Electrodeposition device for preparing alpha plane source

Abstract

The invention relates to the technical field of radioactive sources, and provides an electro-deposition device for preparing an alpha plane source, which comprises a base, a ratchet wheel assembly, a fixing sleeve, an electroplating bath, a plurality of connecting rods and a plurality of pawl assemblies, the ratchet wheel assembly is rotationally connected with the base; the ratchet wheel assembly is sleeved with the fixing sleeve. The electroplating bath is sleeved outside the positioning column, an annular convex edge is arranged at one end, close to the base, of the electroplating bath, and the annular convex edge is sleeved outside the fixing sleeve; one end of the connecting rod extends into the fixing sleeve; the multiple pawl assemblies are annularly arranged in the circumferential direction of the electroplating bath, and the first end of each pawl assembly is connected with one connecting rod; when the ratchet wheel assembly rotates in the first direction, the second end of the pawl assembly abuts against the annular protruding edge. When the ratchet wheel assembly rotates in the direction opposite to the first direction, the second end of the pawl assembly is separated from the annular protruding edge. According to the electro-deposition device for preparing the alpha plane source, the loading and unloading time is shortened, the production efficiency is improved, no tool is needed for loading and unloading, and the operation is simple.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of radioactive sources, in particular to an electrodeposition device for preparing an alpha plane source. BACKGROUND

[0002] Alpha plane sources are prepared by using alpha radionuclides. In order to avoid the energy attenuation of alpha particles in the source and reduce the self-absorption effect as much as possible, the active layer must be made very thin. In the 1960s, Parker and Kitov and others developed a new method for preparing radioactive sources and targets for nuclear physics experiments in weakly polar organic solvents. This method uses organic solvents such as isopropyl alcohol and adds a small amount of inorganic acid plating solution containing radioactive substances for source plating. The plating process is carried out under high-voltage direct current and low current density, and the radionuclide is deposited on the cathode surface in the form of hydroxide or other compounds. This method is called molecular plating and has been widely used in the preparation of alpha plane sources.

[0003] The existing electrodeposition device for alpha plane sources uses a bolt fixing method for the tank body, which has the following problems: the installation and disassembly of the tank body are time-consuming and cumbersome, especially in situations where the source sheet needs to be frequently replaced, which affects work efficiency; the plating solution is often corrosive, and after long-term use, the threaded parts are prone to accumulate crystals or corrode, causing the threads to seize and be difficult to disassemble; in addition, the sealing of the tank body depends on the fastening force between the tank body and the base, and insufficient tightening of the bolts can cause liquid leakage, and excessive tightening can easily damage the sealing gasket or damage the threads. Therefore, developing a new type of electrodeposition device has become a key problem that needs to be solved in the industry. SUMMARY

[0004] The present application provides an electrodeposition device for preparing an alpha plane source to solve the defects of low work efficiency and difficult disassembly caused by the bolt fastening of the tank body in the prior art.

[0005] The application provides an electrodeposition device for preparing an alpha plane source, comprising a base, a ratchet wheel assembly rotatably connected with the base, a fixing sleeve sleeved outside the ratchet wheel assembly, the fixing sleeve being provided with a positioning column for bearing a source sheet, an electroplating tank sleeved outside the positioning column, the electroplating tank being provided with an annular convex edge at one end close to the base, the annular convex edge being sleeved outside the fixing sleeve, a plurality of connecting rods, one end of each connecting rod extending into the fixing sleeve, a plurality of pawl assemblies arranged in an annular shape along the circumferential direction of the electroplating tank, and a first end of each pawl assembly being connected with one connecting rod, when the ratchet wheel assembly rotates in a first direction, the connecting rods are pushed to move away from the ratchet wheel assembly, so that a second end of the pawl assembly abuts against the annular convex edge, and the electroplating tank is sealingly connected with the fixing sleeve, when the ratchet wheel assembly rotates in the opposite direction of the first direction, the connecting rods move towards the ratchet wheel assembly, the second end of the pawl assembly is separated from the annular convex edge, and the electroplating tank is unlocked from the fixing sleeve.

[0006] According to the application, the ratchet wheel assembly comprises a rotating shaft rotatably connected with the base, and a plurality of ratchet teeth are arranged along the circumferential direction of the rotating shaft, when the rotating shaft rotates in the first direction, the ratchet teeth can push the connecting rods to move away from the ratchet teeth.

[0007] According to the application, the electrodeposition device for preparing an alpha plane source further comprises a plurality of connecting blocks arranged on the base, and the fixing sleeve is connected with the plurality of connecting blocks.

[0008] According to the application, the ratchet wheel assembly further comprises a handle connected with the rotating shaft, the handle is used for rotating the rotating shaft, and the handle is located below the fixing sleeve.

[0009] According to the application, the pawl assembly comprises a pawl, a first end of the pawl being connected with the connecting rod, a second end of the pawl being provided with a first convex platform, a surface abutting against the annular convex edge of the first convex platform being an inclined surface, the first convex platform can abut against the annular convex edge when the ratchet wheel assembly rotates in the first direction, and a connecting piece connected with the fixing sleeve and hinged with the pawl.

[0010] According to the application, the connecting piece comprises a pair of first plate bodies arranged in parallel and hinged with the pawl, and a second plate body connected with the fixing sleeve and having two ends connected with the pair of first plate bodies.

[0011] The pawl assembly further comprises an elastic member connected with the pawl, and the elastic member is used to reset the pawl when the ratchet wheel assembly moves in the opposite direction of the first direction.

[0012] The electroplating tank comprises a tank body, one end of the tank body is provided with the annular protrusion, the tank body is sleeved outside the positioning column, and the annular protrusion is sleeved outside the fixing sleeve.

[0013] The electroplating tank further comprises a fastener, the first end of the cover body is embedded in the tank body, the cover body is provided with a first through hole in the height direction of the cover body, the first through hole is used to accommodate the anode wire, the cover body is provided with a second through hole in the diameter direction of the cover body, the second through hole is communicated with the first through hole, and the fastener is sleeved in the second through hole.

[0014] The cover body comprises a first cover body embedded in the tank body and a second cover body connected with the first cover body, the diameter of the second cover body is greater than that of the first cover body, the second cover body is located outside the tank body, a second boss is arranged on the second cover body, the second boss is provided with the second through hole in the diameter direction of the second boss, and the first through hole penetrates through the first cover body, the second cover body and the second boss.

[0015] The electroplating device for preparing an alpha plane source provided by the application comprises a ratchet wheel assembly, a connecting rod and a plurality of pawl assemblies, when the ratchet wheel assembly rotates, the plurality of pawl assemblies can synchronously apply pressure to the annular protrusion, the annular protrusion is subjected to uniform circumferential compression force, local overpressure or poor contact is avoided, uniform deformation of the sealing gasket is ensured, a high-reliability static seal is formed, and the leakage of the electroplating liquid is effectively prevented, the experimental safety and environmental cleanness are ensured, the loading and unloading time is shortened, the production efficiency is improved, the loading and unloading do not require tools, the operation is simple, the corrosion and jamming of threads are avoided, and the service life of the electroplating device is improved. BRIEF DESCRIPTION OF DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the present application or the prior art, the following will briefly introduce the drawings needed in the embodiments or prior art description. Obviously, the drawings described below are only some embodiments of the present application, and all other drawings obtained by those of ordinary skill in the art without creative effort based on these drawings also belong to the protection scope of the present application.

[0017] Figure 1 is a structural schematic diagram of an electrodeposition device for preparing an alpha plane source provided by the present application.

[0018] Figure 2 is a structural schematic diagram of a fixing sleeve.

[0019] Figure 3 is Figure 1 is a structural schematic diagram of a ratchet assembly shown in

[0020] Figure 4 is Figure 1 is a structural schematic diagram of a pawl assembly shown in

[0021] Figure 5 is a structural schematic diagram of a groove body.

[0022] Figure 6 is a structural schematic diagram of a cover body.

[0023] Reference signs: 10, base; 20, ratchet assembly; 21, rotating shaft; 22, ratchet tooth; 23, handle; 30, electroplating groove; 31, groove body; 32, annular protrusion; 33, second cover body; 34, second protrusion; 35, first through hole; 40, pawl assembly; 41, pawl; 411, first protrusion; 42, connecting piece; 421, first plate body; 422, second plate body; 43, elastic piece; 50, connecting block; 60, fixing sleeve; 61, positioning column; 70, connecting rod. DETAILED DESCRIPTION

[0024] In order to make the objects, technical solutions and advantages of the present application clearer, the following will combine the drawings in the present application to clearly and completely describe the technical solutions in the present application. Obviously, the described embodiments are only some embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort also belong to the protection scope of the present application.

[0025] The following will describe the electrodeposition device for preparing an alpha plane source provided by the present application. Figures 1-6

[0026] As Figure 1 and Figure 2 ​As shown, in the embodiment of the present application, the electrodeposition device for preparing the alpha plane source comprises a base 10, a ratchet assembly 20, an electroplating tank 30, a plurality of pawl assemblies 40, a fixing sleeve 60 and a plurality of connecting rods 70. The ratchet assembly 20 is arranged on the base 10 and rotationally connected with the base 10. The fixing sleeve 60 is sleeved outside the ratchet assembly 20, and the ratchet assembly 20 is rotatable relative to the fixing sleeve 60. The fixing sleeve 60 is provided with a plurality of third through holes along the circumferential direction thereof. One end of each connecting rod 70 is arranged in one third through hole, so that the one end of the connecting rod 70 extends into the fixing sleeve 60. The top surface of the fixing sleeve 60 is provided with a positioning column 61 for bearing the source sheet and the sealing gasket, and the electroplating tank 30 is sleeved outside the positioning column 61 and used for containing the electrodeposition liquid. The electroplating tank 30 is provided with an annular protruding edge 32 at the end close to the base 10, the annular protruding edge 32 is sleeved outside the fixing sleeve 60, and the connecting rod 70 is located below the annular protruding edge 32. Each connecting rod 70 is connected with the first end of one pawl assembly 40.

[0027] In the embodiment, when the ratchet assembly 20 is rotated in the first direction, the ratchet teeth on the ratchet assembly 20 can push the connecting rod 70 to move away from the ratchet assembly 20, converting the rotational movement of the ratchet assembly 20 into the linear movement of the connecting rod 70. For the convenience of description, the movement of the connecting rod 70 away from the ratchet assembly 20 is referred to as outward movement, and the movement of the connecting rod 70 close to the ratchet assembly 20 is referred to as inward movement. When the connecting rod 70 moves outward, the second end of the pawl assembly 40 is pushed to move obliquely downward, and then abuts against the annular protruding edge 32 of the electroplating tank 30, so that the annular protruding edge 32 drives the electroplating tank 30 to move downward, and the electroplating tank 30 is pressed against the sealing gasket, thereby sealingly connecting the electroplating tank 30 and the fixing sleeve 60. When the ratchet assembly 20 is rotated in the opposite direction of the first direction, the ratchet teeth on the ratchet assembly 20 gradually separate from the connecting rod 70, so that there is a gap between the connecting rod 70 and the ratchet teeth. When the connecting rod 70 moves inward, the second end of the pawl assembly 40 separates from the annular protruding edge 32, and the electroplating tank 30 is unlocked from the fixing sleeve 60. In the embodiment, the first direction can be the clockwise direction, and the opposite direction of the first direction is the counterclockwise direction.

[0028] Optionally, in the embodiment of the present application, the number of the pawl assemblies 40 and the connecting rods 70 is three, and the angle between two adjacent pawl assemblies 40 is 120°.

[0029] The electrodeposition apparatus for preparing α-planar sources provided in this invention, by setting up a ratchet assembly, a connecting rod, and multiple pawl assemblies, allows the multiple pawl assemblies to simultaneously apply pressure to the annular convex edge when the ratchet assembly rotates. This ensures that the annular convex edge is subjected to a uniform circumferential clamping force, avoiding local overpressure or poor contact, ensuring uniform deformation of the sealing gasket, forming a highly reliable static seal, effectively preventing leakage of the electrodeposition solution, and ensuring experimental safety and environmental cleanliness. At the same time, it shortens the loading and unloading time, improves production efficiency, requires no tools for loading and unloading, is simple to operate, avoids thread corrosion and jamming, and extends the service life of the electrodeposition apparatus.

[0030] like Figure 3 As shown, in an embodiment of the present invention, the ratchet assembly 20 includes a rotating shaft 21, which is rotatably connected to the base 10. The rotating shaft 21 has multiple ratchet teeth 22 along its circumferential direction. In this embodiment, the thickness of each ratchet tooth 22 gradually increases in the opposite direction to the first direction. When the rotating shaft 21 is rotated along the first direction, the thickness of the ratchet tooth 22 opposite to the connecting rod 70 gradually increases, and the ratchet tooth 22 pushes the connecting rod 70 outward. The second end of the pawl assembly 40 moves obliquely downward under gravity and abuts against the annular protrusion 32. Continuing to rotate the rotating shaft 21 along the first direction allows the ratchet assembly 20 to self-lock, thereby pressing the electroplating tank 30 against the fixing sleeve 60. In this embodiment, a portion of the sealing gasket is located between the electroplating tank 30 and the fixing sleeve 60. When the electroplating tank 30 presses against the fixing sleeve 60, the sealing gasket deforms under pressure, filling the gap and forming a reliable seal, thus sealing the electroplating tank 30 and the fixing sleeve 60.

[0031] like Figure 1 As shown, in an embodiment of the present invention, the electrodeposition apparatus for preparing an α-plane source further includes a plurality of connecting blocks 50, which are disposed on the base 10, and the fixing sleeve 60 is connected to the plurality of connecting blocks 50.

[0032] like Figure 3 As shown, in an embodiment of the present invention, the ratchet assembly 20 further includes a handle 23, which is connected to the rotating shaft 21. The handle 23 is located below the fixed sleeve 60, and pushing the handle 23 can drive the rotating shaft 21 to rotate. In this embodiment, by setting the handle 23, the entire locking process can be completed in a few seconds, which greatly improves the operating efficiency and is particularly suitable for high-frequency experiments or batch production.

[0033] like Figure 4 As shown, in an embodiment of the present invention, the pawl assembly 40 includes a pawl 41 and a connector 42. The first end of the pawl 41 is connected to the connecting rod 70, and the second end of the pawl 41 is provided with a first boss 411. The surface of the first boss 411 that abuts against the annular flange 32 is a slope. When the ratchet assembly 20 rotates in the first direction, the first boss 411 can abut against the annular flange 32.

[0034] Further, in order to improve the locking force when the first protrusion 411 abuts against the annular protrusion 32, in the embodiment of the present application, the surface of the annular protrusion 32 abutting against the first protrusion 411 can be provided with a circular arc shape, so as to improve the contact area when the two abut against each other, and improve the locking force. In the embodiment, when the rotating shaft 21 is rotated in the first direction, the first protrusion 411 abuts against the annular protrusion 32, and when the rotating shaft 21 is continuously rotated, the first protrusion 411 cannot move downward any more, and the first protrusion 411 is locked with the annular protrusion 32, and the ratchet assembly 20 is self-locked.

[0035] In the embodiment, the connecting piece 42 is connected with the fixed sleeve 60, and is hingedly connected with the pawl 41. That is, when the connecting rod 70 moves outward, the pawl 41 can rotate relative to the connecting piece 42, so that the first protrusion 411 of the pawl 41 abuts against the annular protrusion 32.

[0036] As shown in Figure 4 , in the embodiment of the present application, the connecting piece 42 comprises a pair of first plate bodies 421 and a second plate body 422. The pair of first plate bodies 421 are arranged in parallel and are hingedly connected with the pawl 41. The two ends of the second plate body 422 are connected with the pair of first plate bodies 421 respectively, and the second plate body 422 is connected with the fixed sleeve 60.

[0037] As shown in Figure 4 , in the embodiment of the present application, the pawl assembly 40 further comprises an elastic piece 43, and the elastic piece 43 is connected with the pawl 41. When the rotating shaft 21 is rotated in the first direction, when the first protrusion 411 of the pawl 41 abuts against the annular protrusion 32, the elastic piece 43 is in a compressed state; when the rotating shaft 21 moves in the opposite direction of the first direction, there is a gap between the connecting rod 70 and the ratchet tooth 22, and the elastic piece 43 drives the second end of the pawl 41 to reset by the elastic force.

[0038] As shown in Figure 5 , in the embodiment of the present application, the electroplating tank 30 comprises a tank body 31 and a cover body. One end of the tank body 31 is provided with the annular protrusion 32, and the tank body 31 is sleeved outside the positioning column 61, and the annular protrusion 32 is sleeved outside the fixed sleeve 60. When the first protrusion 411 abuts against the annular protrusion 32, the sealing gasket is clamped between the end of the tank body 31 and the top surface of the fixed sleeve 60, so as to realize the sealing connection between the tank body 31 and the fixed sleeve 60. The first end of the cover body is embedded in the tank body 31, so as to seal the other end of the tank body 31.

[0039] Furthermore, in an embodiment of the present invention, the electroplating tank 30 further includes fasteners. A first through hole 35 is provided along its height direction for accommodating the anode wire. A second through hole is provided along its diameter direction, and the second through hole is connected to the first through hole. Fasteners are inserted into the second through hole and are used to secure the anode wire after its height has been adjusted appropriately, thereby preventing the anode wire from drifting during electrolysis.

[0040] Furthermore, such as Figure 6 As shown, in an embodiment of the present invention, the cover includes a first cover, a second cover 33, and a second protrusion 34. The first cover is embedded in the groove 31, and the second cover 33 is connected to the first cover and located outside the groove 31. The diameter of the second cover 33 is larger than that of the first cover. The surface of the second cover 33 is provided with a second protrusion 34, and the second protrusion 34 has a second through hole along its diameter. The first through hole 35 penetrates the first cover, the second cover 33, and the second protrusion 34. The anode wire extends into the groove 31 through the first through hole 35. In this embodiment, by setting the second through hole to the second protrusion 34, the length of the second through hole can be reduced, thereby shortening the length of the fastener.

[0041] In this embodiment, the base 10 has a through hole for placing conductive components. During electrodeposition, the anode wire is connected to the positive electrode, the base 10 is connected to the negative electrode, the electrodeposition solution is injected into the tank 31, and the sealing gasket has an opening to define the electrodeposition position on the source wafer. When a constant current or voltage is applied, metal ions are reduced and deposited on the surface of the source wafer to form an α-radioactive source film.

[0042] The electrodeposition apparatus for preparing α-planar sources provided in this invention features a ratchet assembly and a pawl assembly forming a one-way self-locking mechanism. Once locked, it automatically prevents reverse loosening. Even with minor impacts during vibration or electrolysis, the electrodeposition apparatus maintains a stable, sealed state, eliminating the risk of accidental loosening and improving experimental safety. Furthermore, each locking operation is completed with the same mechanical stroke and pressure, ensuring consistent assembly position and clamping force. This guarantees consistency in electrode contact resistance, deposition area, and sealing state across different batches of experiments, significantly improving the repeatability and reliability of experimental data. The apparatus is also simple to operate, requiring no professional training, reducing errors caused by human error and lowering reliance on operator skills.

[0043] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. An electrodeposition apparatus for preparing an α-planar source, characterized in that, include: Base; The ratchet assembly is rotatably connected to the base; A fixing sleeve is fitted over the ratchet assembly, and the fixing sleeve is provided with a positioning post, which is used to support the source piece; An electroplating tank is fitted over the positioning post, and an annular protrusion is provided at one end of the electroplating tank near the base, which is fitted over the fixing sleeve. Multiple connecting rods, one end of which extends into the fixing sleeve; Multiple pawl assemblies are arranged in a ring along the circumference of the electroplating tank, and the first end of each pawl assembly is connected to a connecting rod. When the ratchet assembly rotates in the first direction, it can push the connecting rod to move away from the ratchet assembly, so that the second end of the pawl assembly abuts against the annular flange, thereby making the electroplating tank and the fixed sleeve sealed together. When the ratchet assembly rotates in the opposite direction to the first direction, the connecting rod moves toward the ratchet assembly, the second end of the pawl assembly separates from the annular flange, and the electroplating tank is released from the fixing sleeve.

2. The electrodeposition apparatus for preparing an α-planar source according to claim 1, characterized in that, The ratchet assembly includes a rotating shaft that is rotatably connected to the base. The rotating shaft has multiple ratchet teeth along its circumference. When the rotating shaft rotates in the first direction, the ratchet teeth can push the connecting rod to move away from the ratchet teeth.

3. The electrodeposition apparatus for preparing an α-planar source according to claim 2, characterized in that, It also includes multiple connecting blocks, which are disposed on the base, and the fixing sleeve is connected to the multiple connecting blocks.

4. The electrodeposition apparatus for preparing an α-planar source according to claim 3, characterized in that, The ratchet assembly also includes a handle connected to the rotating shaft, the handle being used to rotate the rotating shaft, and the handle being located below the retaining sleeve.

5. The electrodeposition apparatus for preparing an α-planar source according to claim 1, characterized in that, The ratchet assembly includes: The ratchet has a first end connected to the connecting rod and a second end provided with a first boss. The surface of the first boss that abuts against the annular flange is an inclined surface. When the ratchet assembly rotates in the first direction, the first boss can abut against the annular flange. The connector is connected to the fixed sleeve and hinged to the pawl.

6. The electrodeposition apparatus for preparing an α-planar source according to claim 5, characterized in that, The connector includes: A pair of first plates are arranged in parallel and hinged to the ratchet pawl; The second plate has two ends connected to a pair of the first plates respectively, and the second plate is connected to the fixing sleeve.

7. The electrodeposition apparatus for preparing an α-planar source according to claim 5, characterized in that, The pawl assembly further includes an elastic element connected to the pawl. When the ratchet assembly moves in the opposite direction to the first direction, the elastic element is used to drive the pawl to reset.

8. The electrodeposition apparatus for preparing an α-planar source according to claim 1, characterized in that, The electroplating tank includes: The groove body has an annular protrusion at one end, the groove body is sleeved on the positioning post, and the annular protrusion is sleeved on the fixing sleeve. A cover body, the first end of which is embedded in the groove body.

9. The electrodeposition apparatus for preparing an α-planar source according to claim 8, characterized in that, The electroplating tank also includes fasteners; The first end of the cover is embedded in the groove. The cover has a first through hole along its height direction, which is used to accommodate the anode wire. The cover has a second through hole along its diameter direction, which communicates with the first through hole. The fastener passes through the second through hole and is used to fix the anode wire.

10. The electrodeposition apparatus for preparing an α-planar source according to claim 9, characterized in that, The cover includes: The first cover is embedded in the groove; A second cover is connected to the first cover, the diameter of the second cover is larger than the diameter of the first cover, and the second cover is located outside the groove. A second protrusion is provided on the second cover, and the second protrusion has a second through hole along its diameter direction; The first through hole penetrates the first cover, the second cover, and the second boss.

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