A device for polishing the side edges of a crystalline silicon plate

Abstract

The application discloses a kind of crystalline silicon plate side edge polishing devices, it is related to crystalline silicon plate processing technical field, including rack, main conveying belt is installed in the top of rack and is used to polish the polishing device to crystalline silicon plate side wall, chain plate conveyor is installed on rack, chain plate conveyor corresponds with the position of polishing device, chain plate conveyor is installed with the adsorption component for the adsorption positioning of crystalline silicon plate bottom surface. By the setting of adsorption component, when crystalline silicon plate is conveyed to polishing device and polished, provide vertical downward adsorption force to crystalline silicon plate, increase the friction force between crystalline silicon plate and main conveying belt, and form adsorption positioning to the bottom of crystalline silicon plate, so as to reduce the possibility of crystalline silicon plate slip and deflection when crystalline silicon plate contacts polishing disc, ensure that crystalline silicon plate is stabilized on the preset constant polishing path.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of crystalline silicon plate processing, in particular to a crystalline silicon plate side polishing device. BACKGROUND

[0002] After cutting, the side of the crystalline silicon plate is rough and sharp, and needs to be polished. The side polishing process of the crystalline silicon plate is a key link in the processing flow.

[0003] In the prior art, a conveying belt is often used to continuously convey the crystalline silicon plate to a work station provided with high-speed rotating polishing discs on both sides for side polishing. However, in actual production, it is found that when the polishing disc is in high-speed contact with the side of the crystalline silicon plate, significant lateral friction and impact forces will be generated. Due to the limited static friction between the crystalline silicon plate and the conveying belt, and the certain mass inertia of the plate itself, the plate is prone to slip or deflect on the conveying belt, causing the preset constant polishing path of the crystalline silicon plate to deviate from the actual plate edge position, resulting in missed polishing or over-polishing, and even causing damage such as corner collapse. SUMMARY

[0004] To solve the above technical problems, the present application provides a crystalline silicon plate side polishing device.

[0005] The technical scheme is as follows:

[0006] A crystalline silicon plate side polishing device, comprising a rack, a main conveying belt mounted on the top of the rack, the conveying direction of the main conveying belt being along the length direction of the rack, the main conveying belt extending from the head end of the rack to the tail end of the rack, two mounting seats symmetrically mounted on the middle position of the top of the rack, the two mounting seats being located on the outer side of the main conveying belt, polishing devices for polishing the side wall of the crystalline silicon plate mounted on the two mounting seats, a chain plate conveyor mounted on the rack, the chain plate conveyor corresponding in position to the polishing devices, and an adsorption assembly for adsorbing and positioning the bottom surface of the crystalline silicon plate mounted on the chain plate conveyor.

[0007] Further, the adsorption assembly comprises two symmetrical fixed seats fixedly mounted on the rack and a plurality of adsorption accessories detachably provided at the two ends of the chain plates of the chain plate conveyor. The fixed seat comprises two symmetrical and detachably connected matching pieces. A recess is formed on the side wall of each matching piece that faces the other. The two recesses together form an air cavity. The periphery of the recess has a protrusion. An air channel is formed between the protrusions of the two matching pieces and communicates with the air cavity. The adsorption accessory communicates with the air channel and the air cavity.

[0008] Further, the adsorption accessory comprises a connecting arm fixedly connected to the end portion of the chain plate of the chain plate conveyor. A vertical pipe is slidingly mounted on the connecting arm. A base is mounted at the top end of the vertical pipe. A suction disc is mounted on the top of the base. A spring is mounted between the base and the connecting arm.

[0009] Further, the convex part is provided with a sliding groove on the side away from the groove, the sliding grooves of the two matching parts form a sliding cavity together, the vertical pipe is provided with an air pipe at the bottom, and the air pipe is provided with a sliding block matched with the sliding cavity at the end away from the vertical pipe.

[0010] Further, the sliding cavity is provided with an annular flexible belt slidably installed therein, the annular flexible belt is fixedly connected to the top of the sliding block, and the vertical pipe is provided with an electromagnetic valve below the connecting arm.

[0011] Further, the convex part is provided with a guide groove on the side facing the sliding cavity, the sliding block is provided with a positioning block matched with the guide groove at the bottom, and the sliding block is rotatably provided with a pulley matched with the side wall of the sliding groove at both ends.

[0012] Further, the connecting arm is provided with a trigger switch at the bottom, the fixed seat is provided with a first trigger piece for opening the trigger switch at the bottom near the input end of the chain plate conveyor, and the fixed seat is provided with a second trigger piece for closing the trigger switch at the top near the output end of the chain plate conveyor, the first trigger piece and the second trigger piece are located on the movement path of the trigger switch.

[0013] Further, the mounting seat is provided with an auxiliary conveying belt and a pressing assembly, the auxiliary conveying belt is located above the main conveying belt, the auxiliary conveying belt comprises two driving wheels, a belt is installed between the two driving wheels, the pressing assembly comprises a fixed frame arranged on the side wall of the mounting seat and a plurality of air cylinders fixedly installed on the fixed frame, a connecting plate is installed at the telescopic end of the air cylinder, the fixed frame is provided with a mounting cavity, a plurality of mounting columns fixedly installed on the connecting plate are uniformly spaced, a pressing plate is connected to the mounting column after penetrating through the bottom wall of the mounting cavity, and the mounting column and the fixed frame are in sliding fit.

[0014] Further, the rack is provided with two guide assemblies symmetrically installed near the input end of the main conveying belt, the guide assembly comprises a driving device arranged on the top of the rack, and the driving device is fixedly connected with a mounting frame, and the mounting frame is provided with a roller matched with the side wall of the crystalline silicon plate.

[0015] Further, the rack is provided with a flushing device and a blow-drying device fixedly installed at the output end of the chain plate conveyor.

[0016] As described above, the crystalline silicon plate side edge polishing device has the following beneficial effects:

[0017] Through the setting of the adsorption assembly, when the crystalline silicon plate is conveyed to the polishing device for polishing, the crystalline silicon plate is provided with a vertically downward adsorption force, the friction force between the crystalline silicon plate and the main conveying belt is increased, and the bottom of the crystalline silicon plate is adsorbed and positioned, so that the possibility of slippage and deflection of the crystalline silicon plate when the crystalline silicon plate contacts the polishing disc is reduced, the crystalline silicon plate is ensured to be stably on the preset constant polishing path, the conditions of missing polishing or over-polishing and damage caused by edge collapse of the crystalline silicon plate are avoided, the product qualification rate and surface consistency are significantly improved, and meanwhile, the automatic conveying, positioning, polishing and releasing processes are realized, and the production efficiency is improved.

[0018] Through the setting of the spring, the upward pressing force provided by the spring can ensure that the suction cup adapts to the slight unevenness of the bottom surface of the crystalline silicon plate, and the suction member and the crystalline silicon plate are tightly attached. Meanwhile, the slight vertical jumping of the crystalline silicon plate in the conveying process can be absorbed, and the rigid impact damage to the suction cup or the crystalline silicon plate is prevented.

[0019] Through the cooperation of the trigger switch, the first trigger member and the second trigger member, the adsorption and release processes are fully automated. Before the chain plate conveyor drives the crystalline silicon plate to run to the polishing area, that is, before the starting point of the polishing device, the first trigger member opens the trigger switch, the electromagnetic valve is opened, and the adsorption starts. When the crystalline silicon plate is about to leave the polishing area, that is, when the polishing device, the second trigger member closes the trigger switch, so that the electromagnetic valve is closed, the adsorption is closed, and the adsorption positioning of the bottom of the crystalline silicon plate is gradually released. The whole process does not need manual intervention or additional sensor positioning, and the position relationship of the mechanical structure itself is ingeniously used for control, the reliability and response speed of the device are improved, and the precise synchronization with the production rhythm is realized.

[0020] Through the setting of the pressing assembly, the top surface of the crystalline silicon plate is limited, and the top surface of the crystalline silicon plate has a friction force with the belt of the auxiliary conveying belt, so that the stability of the polishing device when polishing the side wall of the crystalline silicon plate is improved. BRIEF DESCRIPTION OF DRAWINGS

[0021] Figure 1 It is a perspective view of the overall component of the present application from a first perspective;

[0022] Figure 2 It is a perspective view of the overall component of the present application from a second perspective;

[0023] Figure 3 It is a perspective view of the pressing assembly and other components of the present application;

[0024] Figure 4 It is a perspective view of the chain plate conveyor and the adsorption assembly of the present application;

[0025] Figure 5 It is a sectional view of the chain plate conveyor and the adsorption assembly of the present application;

[0026] Figure 6 This is a three-dimensional schematic diagram of the adsorption component of the present invention;

[0027] Figure 7 This is a side sectional view of the entire invention;

[0028] Figure 8 This is a three-dimensional schematic diagram of the second trigger element and other components of the present invention.

[0029] The reference numerals in the accompanying drawings of this invention are as follows:

[0030] 100. Rack;

[0031] 200. Main conveyor belt; 210. Chain conveyor;

[0032] 300. Auxiliary conveyor belt;

[0033] 410. Fixing bracket; 420. Cylinder; 430. Mounting post; 440. Pressure plate; 450. Connecting plate;

[0034] 500. Polishing equipment;

[0035] 610. Mounting bracket; 620. Roller; 630. Drive unit;

[0036] 710. Fixing base; 711. Groove; 712. Protrusion; 713. Slide groove; 714. Guide groove; 720. Bolt; 730. Annular flexible belt; 741. Connecting arm; 742. Vertical tube; 743. Base; 744. Suction cup; 745. Spring; 746. Solenoid valve; 747. Air pipe; 748. Slider; 7481. Pulley; 7482. Positioning block; 749. Trigger switch; 750. First trigger element; 760. Second trigger element. Detailed Implementation

[0037] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0038] The embodiments provided by the present invention will be described in detail below:

[0039] like Figures 1 to 8As shown, a kind of crystalline silicon plate side polishing device, including rack 100, multiple main conveyors 200 are installed on the top of rack 100, the conveying direction of main conveyor 200 is along the length direction of rack 100, and main conveyor 200 extends from the head end of rack 100 to the tail end of rack 100.Multiple main conveyors 200 are arranged along the width direction of rack 100, and all main conveyors 200 are distributed at equal intervals in parallel with each other, and main conveyor 200 is used to transport crystalline silicon plate, since the area of crystalline silicon plate is larger, the stability of conveying can be ensured by setting multiple main conveyors 200.Two mounting seats are symmetrically installed at the middle position of the top of rack 100, and the two mounting seats are located on the outer side of the two main conveyors 200 at the edge, respectively, and auxiliary conveyor 300 is installed on each mounting seat, and auxiliary conveyor 300 is located above main conveyor 200, and crystalline silicon plate can pass through the gap between auxiliary conveyor 300 and main conveyor 200.Polishing device 500 for polishing the side wall of crystalline silicon plate is installed on the mounting seat, and polishing device 500 is located on the outer side of auxiliary conveyor 300, and chain plate conveyor 210 is installed on rack 100, and chain plate conveyor 210 corresponds to the position of polishing device 500, and chain plate conveyor 210 is located below main conveyor 200, and the operation of chain plate conveyor 210 will not interfere with the operation of main conveyor 200.Chain plate conveyor 210 is provided with adsorption assembly for adsorbing and positioning the bottom wall of crystalline silicon plate.

[0040] It should be noted that polishing device 500 includes motor and polishing disc arranged on the output end of motor, and the side wall of crystalline silicon plate is polished by driving polishing disc to rotate, which is prior art, and will not be described here.

[0041] Rack 100 is fixedly installed with flushing device (not shown) and blow-drying device (not shown) at the output end of chain plate conveyor 210, the flushing device is used to cooperate with polishing device 500 to flush crystalline silicon plate when polishing the side wall of crystalline silicon plate, and the blow-drying device is used to blow dry water on crystalline silicon plate.

[0042] Adsorption assembly includes two symmetrical fixed seats 710 fixedly installed on rack 100 and multiple adsorption members detachably arranged at both ends of chain plate of chain plate conveyor 210, fixed seat 710 includes two symmetrical latching matching parts, and the two symmetrical matching parts are detachably connected by bolt 720, wherein the side wall of the two matching parts, which is close to each other, is provided with groove 711, and the grooves 711 of the two matching parts form air cavity together, the periphery of groove 711 has protrusion 712, and the protrusions 712 of the two matching parts form air duct communicated with air cavity.

[0043] The convex part 712 is provided with a sliding groove 713 on the side away from the groove 711, and the sliding grooves 713 of the two matched parts form a sliding cavity together. An annular flexible belt 730 is slidably installed in the sliding cavity. The convex part 712 is provided with a guide groove 714 on the side facing the sliding cavity.

[0044] It should be noted that the adsorption assembly further comprises a negative pressure pump (not shown) provided on the fixing seat 710, which is used to draw the air cavity to negative pressure. This is prior art and will not be described here.

[0045] As shown in Figure 5 and Figure 6 , the suction accessory comprises a connecting arm 741 fixedly connected to the chain plate end of the chain plate conveyor 210. A vertical pipe 742 is slidably installed on the connecting arm 741. A base 743 is installed at the top end of the vertical pipe 742. A suction cup 744 for adsorbing the bottom surface of the crystalline silicon plate is installed on the top of the base 743. A spring 745 is installed between the base 743 and the connecting arm 741. The spring 745 is used to provide an upward elastic force to hold the base 743.

[0046] It should be noted that through the setting of the spring 745, the upward pressing force provided by the spring 745 can ensure that the suction cup 744 adapts to the slight unevenness of the bottom surface of the crystalline silicon plate, and realizes the close fit of the suction accessory and the crystalline silicon plate. At the same time, it can also absorb the slight vertical jumping of the crystalline silicon plate during the conveying process, preventing rigid impact damage to the suction cup 744 or the crystalline silicon plate.

[0047] It can be understood that the fixing seat 710 is detachably composed of two symmetrically arranged matched parts, which is convenient for the installation of the sliding block 748 and the annular flexible belt 730.

[0048] As shown in Figure 6 , the bottom of the vertical pipe 742 is fixedly connected with an air pipe 747. The air pipe 747 is provided with a sliding block 748 matched with the sliding cavity at the end away from the vertical pipe 742. The sliding block 748 is located in the sliding cavity and can slide in the sliding cavity. The annular flexible belt 730 is connected to the top of the sliding block 748. An electromagnetic valve 746 is installed on the vertical pipe 742, below the connecting arm 741. The electromagnetic valve 746 can control the opening and closing of the air path of the vertical pipe 742.

[0049] The sliding block 748 is rotatably installed with a pulley 7481 matched with the side wall of the sliding groove 713 at both ends. The bottom of the sliding block 748 is provided with a positioning block 7482 matched with the guide groove 714.

[0050] It should be noted that through the setting of the sliding block 748 and the pulley 7481, the sliding block 748 can stably slide along the sliding cavity. In combination with the setting of the positioning block 7482, the sliding block 748 avoids rotating displacement when moving, further improving the stability of the sliding of the sliding block 748.

[0051] Specifically, the chain conveyor 210 drives the chain plates on the chain conveyor 210 to move in a cycle, the chain plates moving in a cycle drive the suction accessories on the chain plates to move in a cycle, the suction accessories moving drive the sliders 748 on the suction accessories to move, and the sliders 748 moving drive the annular flexible belt 730 to slide along the sliding cavity.

[0052] As shown in Figures 5 to 8 The bottom of the connecting arm 741 is provided with a trigger switch 749, the fixed seat 710 is fixedly provided with a first trigger 750 for opening the trigger switch 749 at the bottom near the input end of the chain conveyor 210, and the fixed seat 710 is fixedly provided with a second trigger 760 for closing the trigger switch 749 at the top near the output end of the chain conveyor 210. The first trigger 750 and the second trigger 760 are located on the movement path of the trigger switch 749. When a certain suction accessory moves to the output end of the chain conveyor 210, and the trigger switch 749 on the suction accessory contacts the second trigger 760, the second trigger 760 will touch the button of the trigger switch 749, so that the suction accessory is closed. The suction accessory continues to move with the chain conveyor 210 until the suction accessory moves to the input end of the chain conveyor 210, and the trigger switch 749 on the suction accessory contacts the first trigger 750, the first trigger 750 will touch the button of the trigger switch 749, so that the suction accessory is opened. Therefore, when the suction accessory further moves above the fixed seat 710, it is in an open suction state.

[0053] Through the arrangement of the suction assembly, when the crystal silicon plate is conveyed to the polishing device 500 for polishing, a vertical downward suction force is provided for the crystal silicon plate, the friction between the crystal silicon plate and the main conveying belt 200 is increased, and the bottom of the crystal silicon plate is positioned by suction, thereby reducing the possibility of crystal silicon plate slipping and deflecting when the crystal silicon plate contacts the polishing disc, ensuring that the crystal silicon plate is stably on the preset constant polishing path, avoiding the situation that the crystal silicon plate is not polished or over-polished, and the edge of the crystal silicon plate is damaged, etc. Significantly improve the product pass rate and surface consistency, at the same time, the automatic conveying, positioning, polishing and releasing process realizes high-efficiency continuous operation, and improves the production efficiency.

[0054] Further, through the cooperation of the trigger switch 749 and the first trigger 750 and the second trigger 760, the complete automation of the adsorption and release process is realized. Before the chain conveyor 210 drives the silicon wafer to run to the polishing area, that is, before the polishing device 500 starts, the first trigger 750 opens the trigger switch 749, opens the electromagnetic valve 746, and the adsorption starts; when the silicon wafer is about to leave the polishing area, that is, when the polishing device 500, the second trigger 760 closes the trigger switch 749, thereby closing the electromagnetic valve 746, and the adsorption is closed, and the adsorption positioning of the bottom of the silicon wafer is gradually released. The whole process does not need manual intervention or additional sensor positioning, and ingeniously uses the position relationship of the mechanical structure itself for control, improves the reliability and response speed of the device, and realizes the precise synchronization with the production rhythm.

[0055] The overall working process is as follows:

[0056] The main conveying belt 200 conveys the silicon wafer to the chain conveyor 210, when the silicon wafer is conveyed to the input end of the chain conveyor 210, the silicon wafer contacts the suction cup 744, and the bottom surface of the silicon wafer is adsorbed by the suction cup 744, when the silicon wafer is completely conveyed to the chain conveyor 210, the bottom surface of the silicon wafer is adsorbed by the plurality of suction cups 744, and the adsorption positioning of the bottom of the silicon wafer is formed. The polishing device 500 polishes the sidewall of the silicon wafer, when the silicon wafer is conveyed by the chain conveyor 210 to the output end of the chain conveyor 210, the second trigger 760 triggers the trigger switch 749 on the suction member in turn, closes the electromagnetic valve 746, and the suction member is sequentially separated from the adsorption of the bottom of the silicon wafer, thereby releasing the adsorption positioning of the silicon wafer. When the closed suction member follows the chain conveyor 210 to rotate to the input end of the chain conveyor 210, it touches the first trigger 750, the first trigger 750 triggers the trigger switch 749 on the suction member to reopen the electromagnetic valve 746, and sequentially circulates to continuously adsorb and position the silicon wafer.

[0057] As Figures 1 to 3As shown, the auxiliary conveying belt 300 includes two driving wheels, and a belt is installed between the two driving wheels. The mounting seat is fixedly installed with a pressing assembly, and the pressing assembly includes a fixed frame 410 arranged at the side wall of the mounting seat and a plurality of air cylinders 420 fixedly installed on the fixed frame 410. The plurality of air cylinders 420 are arranged in a row and uniformly distributed on the fixed frame 410, and the fixed frame 410 is located between the two driving wheels. The telescopic end of the air cylinder 420 is installed with a connecting plate 450, the fixed frame 410 is provided with a mounting cavity, the connecting plate 450 is fixedly installed with a plurality of mounting columns 430 which are uniformly spaced, and the mounting column 430 is connected with a pressing plate 440 after penetrating through the bottom wall of the mounting cavity. The mounting column 430 is in sliding fit with the fixed frame 410, and the pressing plate 440 is located above the belt of the auxiliary conveying belt 300 in the lower position. The air cylinder 420 is used to drive the connecting plate 450 to move up and down, and drive the pressing plate 440 on the mounting column 430 to extrude the belt of the auxiliary conveying belt 300 in the lower position.

[0058] When the crystalline silicon plate is conveyed to the position of the chain plate conveyor 210, the air cylinder 420 drives the connecting plate 450 and the pressing plate 440 to move downward, limits the top surface of the crystalline silicon plate, and also makes the top surface of the crystalline silicon plate have friction with the belt of the auxiliary conveying belt 300, thereby improving the stability of the polishing device 500 when polishing the side wall of the crystalline silicon plate.

[0059] As shown in the figure, Figure 2 The rack 100 is symmetrically installed with two guide assemblies near the input end of the main conveying belt 200, and the guide assembly includes a driving device 630 arranged at the top of the rack 100. In this embodiment, the driving device 630 can be an air cylinder, and the telescopic end of the driving device 630 is installed with a mounting frame 610, and the mounting frame 610 is provided with a roller 620 matched with the side wall of the crystalline silicon plate.

[0060] When the crystalline silicon plate is placed on the main conveying belt 200, the crystalline silicon plate is located between the two guide assemblies, the driving device 630 pushes the roller 620 to move towards the crystalline silicon plate, guides the crystalline silicon plate, and makes the crystalline silicon plate can be conveyed along the specified path, which provides the basis for the crystalline silicon plate to enter the polishing device 500 for polishing.

[0061] It is easy to understand that the skilled in the art can combine, split, recombine, etc. the embodiments of the present application on the basis of one or several embodiments provided in the present application to obtain other embodiments, and these embodiments do not exceed the protection scope of the present application.

[0062] The above description of the present application and its embodiments is illustrative only, and is not limiting, and the examples shown are only a part of the embodiments of the present application, and the actual structure is not limited thereto. Therefore, if a person skilled in the art is inspired by it, without departing from the spirit of the present application, similar structural modes and examples are designed without creativity, and all should belong to the protection scope of the present application.

Claims

1. A side polishing device for crystalline silicon substrates, characterized in that, Includes a frame (100), a main conveyor belt (200) is installed on the top of the frame (100), the conveying direction of the main conveyor belt (200) is along the length of the frame (100), the main conveyor belt (200) extends from the head end of the frame (100) to the tail end of the frame (100), two mounting seats are symmetrically installed in the middle position of the top of the frame (100), the two mounting seats are located on the outside of the main conveyor belt (200), the two mounting seats are equipped with polishing devices (500) for polishing the sidewalls of the crystalline silicon plate, a chain plate conveyor (210) is installed on the frame (100), the chain plate conveyor (210) corresponds to the position of the polishing device (500), the chain plate conveyor (210) is equipped with an adsorption component for adsorption and positioning of the bottom surface of the crystalline silicon plate; The adsorption assembly includes two symmetrical fixed seats (710) fixedly installed on the frame (100) and a plurality of adsorption components detachably disposed at both ends of the chain plate of the chain conveyor (210). The fixed seat (710) includes two symmetrically arranged and detachably connected mating parts. The side wall of the two mating parts that are close to each other is provided with a groove (711). The two grooves (711) together form an air cavity. The groove (711) has a protrusion (712) around its periphery. An air passage communicating with the air cavity is formed between the protrusions (712) of the two mating parts. The adsorption component communicates with the air passage and the air cavity. The adsorption component includes a connecting arm (741) fixedly connected to the end of the chain plate of the chain plate conveyor (210), a vertical tube (742) is slidably installed on the connecting arm (741), a base (743) is installed at the top of the vertical tube (742), a suction cup (744) is installed at the top of the base (743), and a spring (745) is installed between the base (743) and the connecting arm (741). The protrusion (712) has a sliding groove (713) on the side away from the groove (711). The sliding grooves (713) of the two mating parts together form a sliding cavity. An air pipe (747) is installed at the bottom of the vertical tube (742). A slider (748) that mates with the sliding cavity is installed at the end of the air pipe (747) away from the vertical tube (742). An annular flexible belt (730) is slidably installed inside the sliding cavity. The annular flexible belt (730) is fixedly connected to the top of the slider (748). A solenoid valve (746) is installed on the vertical tube (742). The solenoid valve (746) is located below the connecting arm (741). The protrusion (712) has a guide groove (714) on the side facing the sliding cavity. The bottom of the slider (748) is provided with a positioning block (7482) that cooperates with the guide groove (714). Both ends of the slider (748) are rotatably mounted with pulleys (7481) that cooperate with the side wall of the sliding groove (713). A trigger switch (749) is installed at the bottom of the connecting arm (741). A first trigger (750) for turning on the trigger switch (749) is fixedly installed at the bottom of the fixed seat (710) near the input end of the chain conveyor (210). A second trigger (760) for turning off the trigger switch (749) is fixedly installed at the top of the fixed seat (710) near the output end of the chain conveyor (210). The first trigger (750) and the second trigger (760) are located on the movement path of the trigger switch (749). Each of the mounting bases is equipped with an auxiliary conveyor belt (300) and a clamping assembly. The auxiliary conveyor belt (300) is located above the main conveyor belt (200). The auxiliary conveyor belt (300) includes two drive wheels and a belt is installed between the two drive wheels. The clamping assembly includes a fixed frame (410) located on the side wall of the mounting base and multiple cylinders (420) fixedly installed on the fixed frame (410). A connecting plate (450) is installed on the telescopic end of the cylinder (420). The fixed frame (410) is provided with a mounting cavity. Multiple evenly spaced mounting columns (430) are fixedly installed on the connecting plate (450). After the mounting column (430) passes through the bottom wall of the mounting cavity, it is connected to a pressure plate (440). The mounting column (430) slides in cooperation with the fixed frame (410).

2. The side polishing device for crystalline silicon substrates according to claim 1, characterized in that, Two guide components are symmetrically installed on the rack (100) near the input end of the main conveyor belt (200). The guide components include a drive device (630) located on the top of the rack (100). The drive device (630) is fixedly connected to a mounting frame (610). The mounting frame (610) is provided with rollers (620) that cooperate with the side wall of the silicon wafer.

3. The side polishing device for crystalline silicon substrates according to claim 1, characterized in that, The frame (100) is fixedly installed with a rinsing device and a drying device at the output end of the chain conveyor (210).

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