Plasma on-line monitoring device

Abstract

The invention provides a plasma on-line monitoring device which comprises a cleaning bin, a first monitoring mechanism and a cleaning mechanism, the first monitoring mechanism comprises a monitoring seat, a plurality of probes and a plurality of adjusting parts, the monitoring seat is installed in the cleaning bin, the plurality of probes are all installed on the monitoring seat, and the plurality of adjusting parts are all installed on the monitoring seat. According to the plasma on-line monitoring device provided by the invention, non-stop monitoring can be realized, monitoring is convenient, a plurality of probes can be cleaned in an operation process, the accuracy of a monitoring structure of the probes can be improved, and operation is safe.

Description

Technical Field

[0001] This application relates to the field of plasma monitoring technology, and in particular to an online plasma monitoring device. Background Technology

[0002] Plasma, often referred to as the "fourth state of matter," is an ionized gas composed of electrons, ions, atoms, and neutral particles. Plasma is typically generated in environments with extremely high temperatures or strong electromagnetic fields.

[0003] During the production process, the plasma generator produces high-concentration ion oscillations, generating plasma. Under the influence of the airflow, the plasma impacts the workpiece surface, modifying its microstructure and altering its surface properties (e.g., adhesion and hydrophilicity). It also removes foreign matter (e.g., dust) from the workpiece surface. However, the high energy of the plasma outlet makes it susceptible to oxidation and blockage, leading to a decrease in plasma concentration in the corresponding area. Furthermore, blockage causes a rise in temperature within the chamber, negatively impacting the workpiece. In conclusion, a decrease in plasma concentration degrades the processing effectiveness of the plasma generator and can even affect workpiece quality. Therefore, plasma monitoring is crucial during the production process.

[0004] When monitoring plasma, electrode plates or probes are typically used. Electrode plates allow monitoring of changes in plasma capacitance, and further analysis can determine if plasma levels have decreased. Probes, upon contact with the plasma, generate an electric current on their surface from charged particles within the plasma. Measuring this current allows for the estimation of plasma concentration. Furthermore, the magnitude and shape of the current can be used to calculate the plasma's temperature and potential, similarly enabling the monitoring of parameters such as particle density, temperature, and potential. It's worth noting that probes are usually made of tungsten wire, which offers significant resistance to plasma etching. However, using electrode plates or probes for plasma monitoring can generally negatively impact workpiece processing efficiency. Summary of the Invention

[0005] The purpose of this application is to provide an online plasma monitoring device to solve the technical problem in the prior art that the monitoring of plasma will affect the processing efficiency of the workpiece.

[0006] To achieve the above objectives, the technical solution adopted in this application is: to provide an online plasma monitoring device, including a transport mechanism and a plasma generating mechanism, and further comprising: Cleaning chamber; The first monitoring unit is located between the transport unit and the plasma generating unit; The first monitoring mechanism includes a monitoring base, multiple probes, and multiple adjusting components. The monitoring base is installed in the cleaning chamber, the multiple probes are all installed in the monitoring base, and the multiple adjusting components are all installed in the monitoring base and are used to drive the multiple probes to move along the axial direction, and are set in a one-to-one correspondence with the multiple probes.

[0007] Optionally, the plasma online monitoring device further includes a cleaning mechanism, which includes a cleaning cylinder, an internal baffle group, an external baffle group, and multiple opening and closing components, wherein the cleaning cylinder is installed in the cleaning chamber; The internal baffle assembly includes an internal baffle and an internal pull rod. The internal baffle is sleeved on a plurality of probes, and the internal pull rod is connected to the internal baffle and exposed from inside the cleaning cylinder. The external baffle assembly includes a scraper, an external pull rod, and multiple external baffles. The scraper is sleeved on multiple probes and the internal pull rod. The external pull rod is connected to the scraper and sleeved on the internal pull rod, and is exposed from inside the cleaning cylinder. The multiple external baffles are all connected to the outer periphery of the external pull rod and are spaced apart. The internal baffle and the scraper are each equipped with a plurality of opening and closing components, and each of the plurality of opening and closing components is respectively configured to correspond one-to-one with a plurality of probes.

[0008] Optionally, both the inner baffle and the outer baffle have multiple sets of first slots, and each set of first slots includes two first slots; The opening and closing component includes two locking blocks, two elastic structures, and two inclined surfaces. The two locking blocks are respectively locked into the two first locking slots. The two elastic structures are respectively disposed in the two first locking slots and are used to drive the two locking blocks to move towards each other. The two inclined surfaces are respectively opened on the two locking blocks and are configured to drive the two locking blocks to move away from each other through the probe.

[0009] Optionally, the internal baffle assembly further includes a plurality of second slots, a plurality of first magnetic structures, and a plurality of second magnetic structures. The plurality of second slots are all opened on the side of the internal baffle facing the cleaning cylinder. The plurality of first magnetic structures are respectively installed in the plurality of second slots and are arranged in a one-to-one correspondence with the plurality of second slots. The plurality of second magnetic structures are all installed in the cleaning cylinder and are configured to be engaged with the plurality of second slots by the plurality of first magnetic structures and are arranged in a one-to-one correspondence with the plurality of first magnetic structures.

[0010] Optionally, the first monitoring mechanism further includes a first flange and a plurality of guide rods. The first flange is connected to the outer periphery of the monitoring base, and the plurality of guide rods are all connected to the first flange and pass through the inner baffle. The cleaning mechanism also includes a second flange and multiple retaining sleeves. The second flange is connected to the outer periphery of the cleaning cylinder, and the multiple retaining sleeves are all installed on the second flange and used to engage the multiple guide rods, and are arranged in a one-to-one correspondence with the multiple guide rods.

[0011] Optionally, the internal baffle is provided with multiple clearance slots, and the multiple clearance slots and the multiple guide rods are arranged in a one-to-one correspondence.

[0012] Optionally, the distance between any two adjacent external baffles is less than the dimension of the cleaning cylinder along the axial direction.

[0013] Optionally, the cross-sectional shape of the internal tie rod is set to a polygon or an ellipse; The outer pull rod has a third slot, the cross-sectional shape of which is polygonal or elliptical, and is used to engage the inner pull rod.

[0014] Optionally, the monitoring base includes a base body, multiple installation spaces, and a plate. The base body is installed in the cleaning chamber, the multiple installation spaces are all opened in the base body and are respectively set with multiple adjustment components. The plate is installed at the end of the base body away from the cleaning chamber and covers the multiple installation spaces. The adjusting component includes a mounting plate, a screw, a mounting bracket, and a knob. The mounting plate is mounted on the probe and located within the mounting space. The screw is connected to the mounting plate and passes through the plate body. The mounting bracket is mounted on the plate body. The knob is sleeved on the screw and screwed to the screw, and is located between the plate body and the mounting bracket. The installation space includes a moving space and at least one sliding groove, wherein at least one sliding groove is connected to the moving space; The adjusting member further includes at least one lug, which is connected to the outer periphery of the mounting plate and engaged in at least one of the slide grooves, and is provided in a one-to-one correspondence with at least one of the slide grooves.

[0015] This application provides an online plasma monitoring device, including a transport mechanism and a plasma generating mechanism, and further comprising: A second monitoring unit is located between the transport unit and the plasma generating unit; The second monitoring mechanism includes a driver and an electrode plate, the electrode plate being mounted on the driver and moving or rotating under the drive of the driver.

[0016] The beneficial effects of the plasma online monitoring device provided in this application are partly the same as those in the specific implementation method, and will not be repeated here. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 A plan view of an online plasma monitoring device provided in Embodiment 1 of this application; Figure 2 This is a first-view perspective perspective view of an online plasma monitoring device provided in Embodiment 2 of this application; Figure 3 This is a second-view perspective perspective view of an online plasma monitoring device provided in Embodiment 2 of this application; Figure 4 This is a perspective view of the internal structure of an online plasma monitoring device provided in Embodiment 2 of this application; Figure 5 This is a perspective view of the internal structure of the cleaning mechanism of a plasma online monitoring device provided in Embodiment 2 of this application; Figure 6 for Figure 5 A magnified view of a section at point A in the middle; Figure 7 for Figure 4 A magnified view of a section at point B in the middle; Figure 8 for Figure 4 A magnified view of a section at point C; Figure 9 for Figure 4 A magnified view of a section at point D; Figure 10 for Figure 4 A magnified view of a section at point E in the middle; Figure 11 for Figure 2 A magnified view of a section at point F.

[0019] The following are the labeling elements in the figure: 1. First monitoring mechanism; 11. Monitoring base; 111. Base body; 112. Installation space; 1121. Movement space; 1122. Slide groove; 113. Plate; 12. Probe; 13. Adjusting component; 131. Mounting plate; 132. Screw; 133. Mounting bracket; 134. Knob; 135. Lug; 136. Cable hole; 14. First flange; 15. Guide rod; 2. Cleaning mechanism; 21. Cleaning cylinder; 22. Internal baffle assembly; 221. Internal baffle plate; 222. Internal pull rod; 223. First slot; 224. Second slot; 225. First magnetic attraction structure; 226. Second magnetic attraction structure; 227. Sealing ring; 228. Alternating groove; 23. External baffle assembly; 231. Scraper; 232. External pull rod; 233. External baffle plate; 234. Opening and closing element; 2341. Locking block; 2342. Elastic structure; 2343. Inclined surface; 24. Second flange; 25. Compression sleeve; 3. Transportation agencies; 4. Plasma generating mechanism; 5. Second monitoring unit; 51. Driver; 52. Electrode plate. Detailed Implementation

[0020] To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.

[0021] It should be noted that when a component is referred to as being "mounted to," "fixed to," or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0022] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0023] Example 1 like Figure 1 As shown, this application provides an online plasma monitoring device, including a transport mechanism 3, a plasma generating mechanism 4, and a second monitoring mechanism 5. The second monitoring mechanism 5 is disposed between the transport mechanism 3 and the plasma generating mechanism 4. The second monitoring mechanism 5 includes a driver 51 and an electrode plate 52, the electrode plate 52 being mounted on the driver 51 and moving or rotating under the drive of the driver 51.

[0024] It should be noted that in this embodiment, the workpiece is set as a display screen. Of course, in other embodiments, the workpiece can also be made of plastic, metal, or other components, and this is not the only limitation.

[0025] The plasma online monitoring device provided in Embodiment 1 of this application can be used to monitor the plasma concentration of the plasma generating mechanism 4 under the action of the electrode plate 52. When cleaning the workpiece, the electrode plate 52 can be moved out between the transport mechanism 3 and the plasma generating mechanism 4 by the driver 51, so as to avoid the electrode plate 52 interfering with the transport of plasma and preventing the plasma from impacting the surface of the workpiece.

[0026] Alternatively, the driver 51 may be configured as an electric cylinder or a motor.

[0027] The working principle of the online plasma monitoring device provided in Embodiment 1 of this application is as follows: When the transport mechanism 3 conveys the workpiece to the plasma generator 4, the plasma generator 4 impacts the workpiece surface with plasma to remove foreign matter. After the process is complete, the transport mechanism 3 continues to convey the next workpiece to the plasma generator 4. During this conveying process, the actuator 51 moves the electrode plate 52 between the transport mechanism 3 and the plasma generator 4 to monitor the plasma concentration in the plasma generator 4. Before the next workpiece is conveyed to the plasma generator 4, the actuator 51 removes the electrode plate 52 from between the transport mechanism 3 and the plasma generator 4. In summary, the combined action of the actuator 51 and the electrode plate 52 enables continuous monitoring with high efficiency, without affecting workpiece processing, and is convenient.

[0028] Example 2 like Figures 1 to 11 As shown, this application provides an online plasma monitoring device including a cleaning chamber (not shown in the figure), a transport mechanism 3, a plasma generating mechanism 4, a first monitoring mechanism 1, and a cleaning mechanism 2. The transport mechanism 3, the plasma generating mechanism 4, and the first monitoring mechanism 1 are all disposed within the cleaning chamber. The first monitoring mechanism 1 includes a monitoring base 11, multiple probes 12, and multiple adjusting components 13. The monitoring base 11 is installed in the cleaning chamber, the multiple probes 12 are all installed on the monitoring base 11, and the multiple adjusting components 13 are all installed on the monitoring base 11 and are used to drive the multiple probes 12 to move along the axial direction, and are arranged in a one-to-one correspondence with the multiple probes 12.

[0029] The plasma online monitoring device provided in Embodiment 2 of this application, under the action of probe 12, can be used to monitor parameters such as particle density, temperature, and potential of plasma in the cleaning chamber. It can also achieve monitoring without stopping the machine, resulting in high monitoring efficiency. Compared with the electrode plate 52 in Embodiment 1, it does not interfere with the plasma's processing of the workpiece, avoids frequent use of the driver 51, and helps to further improve the convenience of monitoring.

[0030] In one embodiment of this application, please refer to Figures 1 to 11The plasma online monitoring device also includes a cleaning mechanism 2. The cleaning mechanism 2 includes a cleaning cylinder 21, an internal baffle group 22, an external baffle group 23, and multiple opening and closing components 234. The cleaning cylinder 21 is installed in the cleaning chamber. The internal baffle group 22 includes an internal baffle 221 and an internal pull rod 222. The internal baffle 221 is sleeved on multiple probes 12, and the internal pull rod 222 is connected to the internal baffle 221 and exposed from inside the cleaning cylinder 21. The external baffle group 23 includes a scraper 231, an external pull rod 232, and multiple external baffles 233. The scraper 231 is sleeved on multiple probes 12 and the internal pull rod 222. The external pull rod 232 is connected to the scraper 231, sleeved on the internal pull rod 222, and exposed from inside the cleaning cylinder 21. The multiple external baffles 233 are all connected to the outer periphery of the external pull rod 232 and are spaced apart. The internal baffle 221 and scraper 231 are each equipped with multiple opening and closing components 234, and each of the multiple opening and closing components 234 is respectively set to correspond one-to-one with multiple probes 12.

[0031] It should be noted that the axial directions above and below refer to the bidirectional directions of the central axis defined by the structure of the cleaning cylinder 21 itself, as detailed below. Figure 4 The X-axis is shown in the figure.

[0032] It should also be noted that the working principle of probe 12 is based on the interaction between particles in the plasma and probe 12. When probe 12 comes into contact with the plasma, the charged particles in the plasma will generate an electric current on the surface of probe 12. By measuring this current, the concentration of the plasma can be inferred. Furthermore, based on the magnitude and shape of the current, the temperature and potential of the plasma can be calculated.

[0033] Experiments have shown that when probe 12 is exposed to the atmosphere, it can be contaminated by impurities in the atmosphere within seconds or even a second, exhibiting a significant hysteresis effect that can greatly affect monitoring results. Since probe 12 is typically located in the strong electromagnetic environment of a clean chamber, cleaning probe 12 is quite difficult.

[0034] With this configuration, the length of multiple probes 12 extending into the cleaning chamber can be adjusted by the multiple adjusting components 13. Compared to related technologies, the first monitoring mechanism 1 is more accurate and comprehensive. The internal pull rod 222 moves the internal baffle 221 and scraper 231, allowing the internal baffle 221 to shield the cleaning cylinder 21 and the scraper 231 to scrape impurities from the exterior of the multiple probes 12 into the cleaning cylinder 21. The internal baffle 221 separates the cleaning cylinder 21 from the cleaning chamber, preventing damage to personnel from the strong electromagnetic environment inside the cleaning chamber when cleaning the multiple probes 12. The multiple opening and closing components 234 can prevent the multiple probes 12 from being obstructed when scraping away impurities from their surfaces, and can also close the obstruction channel when the internal baffle 221 cleans the chamber and cleaning cylinder 21 separately, preventing the cleaning chamber and cleaning cylinder 21 from connecting. Under the action of the external pull rod 232, the scraper 231 can be pulled out from the cleaning cylinder 21, making it convenient for workers to clean the scraper 231 and for future use. In summary, under the combined action of the internal baffle 221, the internal pull rod 222, the scraper 231, the external pull rod 232, and multiple external baffles 233, multiple probes 12 can be cleaned during operation without being affected by the strong electromagnetic environment inside the cleaning chamber. This helps improve the accuracy of the probe 12's monitoring structure and ensures safe operation.

[0035] Alternatively, probe 12 can be configured as a tungsten rod.

[0036] In one embodiment of this application, please refer to Figures 1 to 11 Both the inner baffle 221 and the outer baffle 233 have multiple sets of first slots 223, each set of first slots 223 including two first slots 223. The opening and closing member 234 includes two locking blocks 2341, two elastic structures 2342 and two inclined surfaces 2343. The two locking blocks 2341 are respectively locked into the two first slots 223. The two elastic structures 2342 are respectively disposed in the two first slots 223 and are used to drive the two locking blocks 2341 to move towards each other. The two inclined surfaces 2343 are respectively disposed in the two locking blocks 2341 and are configured to drive the two locking blocks 2341 to move away from each other through the probe 12.

[0037] With this configuration, the two elastic structures 2342 cause the two locking blocks 2341 to tend to move towards each other. When the inner baffle 221 is disengaged from the probe 12, the two locking blocks 2341 move towards each other, thus blocking the probe 12 channel on the inner baffle 221 and separating the cleaning cylinder 21 from the cleaning chamber. When the inner baffle 221 is installed on the end of the probe 12 near the monitoring seat 11, the two inclined surfaces 2343, under the action of the probe 12, cause the two locking blocks 2341 to move away from each other, thus opening the probe 12 channel on the inner baffle 221 and avoiding interference between the inner baffle 221 and the probe 12. Similarly, under the action of the two inclined surfaces 2343, the scraper 231 can also avoid interference between the scraper 231 and the probe 12.

[0038] Optionally, the elastic structure 2342 can be configured as a sheet or a spring.

[0039] In one embodiment of this application, please refer to the following: Figures 1 to 11 The internal baffle 22 also includes multiple second slots 224, multiple first magnetic structures 225, and multiple second magnetic structures 226. The multiple second slots 224 are all opened on the side of the internal baffle 221 facing the cleaning cylinder 21. The multiple first magnetic structures 225 are respectively installed in the multiple second slots 224 and are set in a one-to-one correspondence with the multiple second slots 224. The multiple second magnetic structures 226 are all installed in the cleaning cylinder 21 and are configured to be snapped into the multiple second slots 224 by the multiple first magnetic structures 225 and are set in a one-to-one correspondence with the multiple first magnetic structures 225.

[0040] This configuration, with the combined action of multiple first magnetic structures 225 and multiple second magnetic structures 226, increases the structural stability between the internal baffle 221 and the cleaning cylinder 21, making it less likely for the internal baffle 221 to detach from the cleaning cylinder 21, thus further enhancing the safety performance of the device. Under the action of the second slot 224, after the first magnetic structures 225 and the second magnetic structures 226 are magnetically connected, they can be engaged, further improving the structural stability between the internal baffle 221 and the cleaning cylinder 21.

[0041] Optionally, both the first magnetic structure 225 and the second magnetic structure 226 are configured as magnets.

[0042] In one embodiment of this application, see [reference] Figures 1 to 11 The internal baffle 22 also includes a sealing ring 227, which is installed on the side of the internal baffle 221 facing the cleaning cylinder 21.

[0043] With this configuration, when the internal baffle 221 separates the cleaning chamber and the cleaning cylinder 21, the sealing ring 227 can seal the gap between the internal baffle 221 and the cleaning cylinder 21, resulting in a good sealing effect and further reducing the impact of strong electromagnetic environment on cleaning.

[0044] In one embodiment of this application, please refer to Figures 1 to 11 The first monitoring mechanism 1 also includes a first flange 14 and multiple guide rods 15. The first flange 14 is connected to the outer periphery of the monitoring base 11, and the multiple guide rods 15 are all connected to the first flange 14 and pass through the internal baffle 221. The cleaning mechanism 2 also includes a second flange 24 and multiple retaining sleeves 25. The second flange 24 is connected to the outer periphery of the cleaning cylinder 21, and the multiple retaining sleeves 25 are all installed on the second flange 24 and used to engage the multiple guide rods 15, and are arranged one-to-one with the multiple guide rods 15.

[0045] This configuration, with the assistance of multiple guide rods 15 and multiple retaining sleeves 25, and through the first flange 14 and the second flange 24, effectively limits the movement of the internal baffle 221, preventing it from rotating within the cleaning chamber and connecting to the external environment. It also prevents damage to the multiple probes 12 caused by the internal baffle 221's rotation, effectively protecting both personnel and the probes 12. Furthermore, the guide rods 15 and multiple retaining sleeves 25 guide the movement of the internal baffle 221, improving its stability and preventing jamming. This facilitates the movement of the scraper 231 by the personnel, making cleaning easier. In addition, during assembly, it facilitates the alignment of the monitoring seat 11 with the cleaning cylinder 21, allowing the probes 12 to accurately pass through the internal baffle 221 and the scraper 231, similarly preventing damage to the probes 12.

[0046] In one embodiment of this application, please refer to the following: Figures 1 to 11 The internal baffle 221 has multiple clearance slots 228, and the multiple clearance slots 228 and multiple guide rods 15 are set one-to-one.

[0047] With this configuration, the multiple clearance slots 228 can prevent multiple retaining sleeves 25 from interfering with the internal baffle 221, thus preventing the internal baffle 221 and the cleaning cylinder 21 from being unable to contact each other.

[0048] In one embodiment of this application, see [reference] Figures 1 to 11 The distance between any two adjacent external baffles 233 is less than the dimension of the cleaning cylinder 21 along the axial direction.

[0049] With this setup, when scraping away impurities from the surface of the probe 12, an external baffle 233 is always present inside the cleaning cylinder 21 to block the cleaning cylinder 21, thus preventing the staff from being affected by the strong electromagnetic environment inside the cleaning chamber and effectively protecting the staff.

[0050] In one embodiment of this application, please refer to Figures 1 to 11 The internal tie rod 222 has a polygonal or elliptical cross-sectional shape. The external tie rod 232 has a third slot (not shown in the figure), which has a polygonal or elliptical cross-sectional shape and is used to engage the internal tie rod 222.

[0051] It should be noted that in this embodiment, the cross-sectional shape of both the internal tie rod 222 and the third slot is set to quadrilateral. Of course, in other embodiments, the cross-sectional shape of the internal tie rod 222 and the third slot can also be set to ellipse, triangle, pentagon, hexagon, etc., and other shapes are not limited here.

[0052] This design allows the internal pull rod 222 and the external pull rod 232 to be interlocked. Under the action of multiple guide rods 15, the internal baffle 221 also limits the movement of the scraper 231, preventing it from rotating within the cleaning chamber and damaging the probe 12. Furthermore, it improves the stability of the scraper 231's movement, enabling it to reliably scrape away impurities from the probe 12 surface, resulting in a better cleaning effect.

[0053] In one embodiment of this application, please refer to the following: Figures 1 to 11 The monitoring base 11 includes a base body 111, multiple mounting spaces 112, and a plate 113. The base body 111 is installed in the cleaning chamber. The multiple mounting spaces 112 are all opened in the base body 111 and are correspondingly set with multiple adjusting components 13. The plate 113 is installed at the end of the base body 111 away from the cleaning chamber and covers the multiple mounting spaces 112. The adjusting component 13 includes a mounting plate 131, a screw 132, a mounting bracket 133, and a knob 134. The mounting plate 131 is installed on the probe 12 and is located in the mounting space 112. The screw 132 is connected to the mounting plate 131 and passes through the plate 113. The mounting bracket 133 is installed on the plate 113. The knob 134 is sleeved on the screw 132 and screwed to the screw 132, and is located between the plate 113 and the mounting bracket 133.

[0054] This configuration allows the knob 134 to move the screw 132, which in turn moves the probe 12 via the mounting plate 131, thus adjusting the size of the probe 12 exposed within the cleaning chamber. During actual monitoring, adjustments can be made according to monitoring needs and conditions, resulting in more accurate and comprehensive monitoring results, while also facilitating easy adjustment. The plate 113 shields multiple installation spaces 112, reducing the impact of strong electromagnetic fields on workers.

[0055] Optionally, the adjusting member 13 also includes a wire passage hole 136, which is formed in the mounting plate 131 and the screw 132.

[0056] With this configuration, the wires on the tungsten rod can be connected to external devices through the wire hole 136.

[0057] In one embodiment of this application, see [reference] Figures 1 to 11 The installation space 112 includes a moving space 1121 and at least one slide groove 1122, which communicates with the moving space 1121. The adjusting member 13 also includes at least one lug 135, which is connected to the outer periphery of the mounting plate 131 and is engaged in the at least one slide groove 1122, and is provided in a one-to-one correspondence with the at least one slide groove 1122.

[0058] With this configuration, the engagement can be achieved by at least one groove 1122 and at least one lug 135, allowing the screw 132 to move along the axial direction and preventing the screw 132 from rotating synchronously with the knob 134. This makes it easier for the operator to adjust the position of the probe 12.

[0059] The working principle of the online plasma monitoring device provided in Embodiment 2 of this application is as follows: During assembly, the cleaning mechanism 2 is installed after the cleaning chamber, followed by the monitoring structure. Multiple guide rods 15 are then passed through the internal baffle 221 and aligned with the internal baffle 221, so that the guide rods 15 are engaged within multiple retaining sleeves 25. The internal baffle 221 is then pushed to the monitoring seat 11 via the internal pull rod 222 until the internal baffle 221 contacts the monitoring seat 11. Subsequently, the scraper 231 is pushed to the internal baffle 221 via the external pull rod 232 until the scraper 231 contacts the internal baffle 221.

[0060] During cleaning, the operator pulls the internal baffle 221 via the internal lever 222, causing the internal baffle 221 to move towards the cleaning cylinder 21 until they come into contact. At this point, the first magnetic attraction structure 225 and the second magnetic attraction structure 226 are magnetically connected and engaged in the second slot 224. Under the action of the first magnetic attraction structure 225 and the second magnetic attraction structure 226, the sealing ring 227 is tightly pressed between the internal baffle 221 and the second flange 24, and the internal baffle 221 separates the cleaning chamber and the cleaning cylinder 21. During this process, when the internal baffle 221 detaches from the probe 12, the two elastic structures 2342 drive the two locking blocks 2341 to move towards each other, and the two locking blocks 2341 block the probe 12 channel on the internal baffle 221. Under the action of the internal baffle 221, the scraper 231 moves with the internal baffle 221 until it enters the cleaning cylinder 21. During this process, when the scraper 231 detaches from the probe 12, the two elastic structures 2342 drive the two locking blocks 2341 to move towards each other, blocking the probe 12 channel on the scraper 231. The operator then pulls the external lever 232, which moves the scraper 231 out of the cleaning cylinder 21, allowing the operator to clean the impurities on the scraper 231, the external baffle 233, and the external lever 232 for future use.

[0061] After cleaning, the operator pushes the scraper 231 into the cleaning cylinder 21 using the external lever 232 until the scraper 231 contacts the internal baffle 221. Under the action of the scraper 231, the internal baffle 221 moves towards the monitoring seat 11 until it contacts the monitoring seat 11. During this process, under the action of the probe 12, the two inclined surfaces 2343 allow the two locking blocks 2341 to move in opposite directions, enabling the probe 12 to pass through the internal baffle 221 and the scraper 231.

[0062] One or more embodiments in this application are intended to cover all such substitutions, modifications, and variations that fall within the broad scope of this application. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of one or more embodiments in this application should be included within the protection scope of this application.

Claims

1. A plasma online monitoring device, comprising a transport mechanism (3) and a plasma generating mechanism (4), characterized in that, Also includes: Cleaning chamber; The first monitoring unit (1) is located between the transport unit (3) and the plasma generating unit (4); The first monitoring mechanism (1) includes a monitoring base (11), multiple probes (12) and multiple adjusting components (13). The monitoring base (11) is installed in the cleaning chamber, the multiple probes (12) are all installed in the monitoring base (11), and the multiple adjusting components (13) are all installed in the monitoring base (11) and are used to drive the multiple probes (12) to move along the axial direction, and are set in a one-to-one correspondence with the multiple probes (12).

2. The plasma online monitoring device as described in claim 1, characterized in that, The plasma online monitoring device further includes a cleaning mechanism (2), which includes a cleaning cylinder (21), an internal baffle group (22), an external baffle group (23), and multiple opening and closing components (234). The cleaning cylinder (21) is installed in the cleaning chamber. The internal baffle (22) includes an internal baffle (221) and an internal pull rod (222). The internal baffle (221) is sleeved on a plurality of probes (12), and the internal pull rod (222) is connected to the internal baffle (221) and exposed from inside the cleaning cylinder (21). The external baffle assembly (23) includes a scraper (231), an external pull rod (232), and multiple external baffles (233). The scraper (231) is sleeved on multiple probes (12) and the internal pull rod (222). The external pull rod (232) is connected to the scraper (231) and sleeved on the internal pull rod (222), and is exposed from inside the cleaning cylinder (21). The multiple external baffles (233) are all connected to the outer periphery of the external pull rod (232) and are spaced apart. The internal baffle (221) and the scraper (231) are each equipped with a plurality of opening and closing components (234), and the plurality of opening and closing components (234) are respectively configured to correspond one-to-one with the plurality of probes (12).

3. The plasma online monitoring device as described in claim 2, characterized in that, Both the inner baffle (221) and the outer baffle (233) have multiple sets of first slots (223), and each set of first slots (223) includes two first slots (223). The opening and closing component (234) includes two locking blocks (2341), two elastic structures (2342), and two inclined surfaces (2343). The two locking blocks (2341) are respectively locked into the two first slots (223). The two elastic structures (2342) are respectively disposed in the two first slots (223) and are used to drive the two locking blocks (2341) to move towards each other. The two inclined surfaces (2343) are respectively opened on the two locking blocks (2341) and are configured to drive the two locking blocks (2341) to move away from each other through the probe (12).

4. The plasma online monitoring device as described in claim 2, characterized in that, The internal baffle (22) further includes a plurality of second slots (224), a plurality of first magnetic structures (225) and a plurality of second magnetic structures (226). The plurality of second slots (224) are all opened on the side of the internal baffle (221) facing the cleaning cylinder (21). The plurality of first magnetic structures (225) are respectively installed in the plurality of second slots (224) and are configured to correspond one-to-one with the plurality of second slots (224). The plurality of second magnetic structures (226) are all installed in the cleaning cylinder (21) and are configured to be engaged in the plurality of second slots (224) by the plurality of first magnetic structures (225) and are configured to correspond one-to-one with the plurality of first magnetic structures (225).

5. The plasma online monitoring device as described in claim 1, characterized in that, The first monitoring mechanism (1) further includes a first flange (14) and a plurality of guide rods (15). The first flange (14) is connected to the outer periphery of the monitoring seat (11), and the plurality of guide rods (15) are all connected to the first flange (14) and are all inserted through the inner baffle (221). The cleaning mechanism (2) further includes a second flange (24) and a plurality of clamps (25). The second flange (24) is connected to the outer periphery of the cleaning cylinder (21). The plurality of clamps (25) are all installed on the second flange (24) and are used to clamp the plurality of guide rods (15), and are arranged one-to-one with the plurality of guide rods (15).

6. The plasma online monitoring device as described in claim 5, characterized in that, The internal baffle (221) is provided with multiple clearance slots (228), and the multiple clearance slots (228) and the multiple guide rods (15) are provided in a one-to-one correspondence.

7. The plasma online monitoring device as described in claim 1, characterized in that, The distance between any two adjacent external baffles (233) is less than the dimension of the cleaning cylinder (21) along the axial direction.

8. The plasma online monitoring device as described in claim 1, characterized in that, The cross-sectional shape of the internal tie rod (222) is set to be polygonal or elliptical; The outer pull rod (232) has a third slot, the cross-sectional shape of which is set to polygonal or elliptical, and is used to engage the inner pull rod (222).

9. The plasma online monitoring device as described in claim 1, characterized in that, The monitoring base (11) includes a base body (111), multiple installation spaces (112) and a plate (113). The base body (111) is installed in the cleaning chamber. The multiple installation spaces (112) are all opened in the base body (111) and are correspondingly set with the multiple adjustment components (13). The plate (113) is installed at the end of the base body (111) away from the cleaning chamber and covers the multiple installation spaces (112). The adjusting component (13) includes a mounting plate (131), a screw (132), a mounting bracket (133), and a knob (134). The mounting plate (131) is mounted on the probe (12) and located in the mounting space (112). The screw (132) is connected to the mounting plate (131) and passes through the plate body (113). The mounting bracket (133) is mounted on the plate body (113). The knob (134) is sleeved on the screw (132) and screwed to the screw (132), and is located between the plate body (113) and the mounting bracket (133). The installation space (112) includes a moving space (1121) and at least one slide (1122), wherein at least one slide (1122) is connected to the moving space (1121); The adjusting member (13) further includes at least one lug (135), which is connected to the outer periphery of the mounting plate (131) and is engaged in at least one of the slide grooves (1122), and is provided in a one-to-one correspondence with at least one of the slide grooves (1122).

10. A plasma online monitoring device, comprising a transport mechanism (3) and a plasma generating mechanism (4), characterized in that, Also includes: The second monitoring unit (5) is located between the transport unit (3) and the plasma generating unit (4); The second monitoring mechanism (5) includes a driver (51) and an electrode plate (52), the electrode plate (52) being mounted on the driver (51) and moving or rotating under the drive of the driver (51).

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