Vacuum coating production line

Abstract

The invention relates to a vacuum coating production line which comprises a plurality of chambers, the plurality of processing chambers comprise a feeding chamber, a heating chamber, a feeding buffer chamber, a coating chamber, a discharging buffer chamber, a cooling chamber and a discharging chamber which are connected in sequence, so that a tray loaded with a substrate enters from the feeding chamber, and the substrate enters from the cooling chamber. The plurality of treatment chambers are arranged in the heating chamber, sequentially pass through the heating chamber, the feeding buffer chamber, the coating chamber, the discharging buffer chamber and the cooling chamber and then are moved out of the discharging chamber, the plurality of treatment chambers are detachably connected, at least one of the treatment chambers is arranged as an adjusting chamber, the number of the adjusting chambers can be adjusted, and the number of the adjusting chambers can be adjusted. According to the magnetron sputtering vacuum coating production line, different combinations of vacuum coating production lines are formed, so that different coating production requirements are met, and the problem that a traditional magnetron sputtering vacuum coating production line cannot be flexibly adjusted according to different coating requirements is solved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of coating, in particular to a vacuum coating production line. BACKGROUND

[0002] Magnetron sputtering is a highly efficient physical vapor deposition technology, which plays an extremely important role in modern industrial production. It is widely used in many fields such as semiconductors, optics, photovoltaic cells, glass, magnetic materials, etc. It can produce various functional thin films such as metal thin films (gold, silver, copper, aluminum, molybdenum, etc.), metal oxide thin films, semiconductor thin films, and insulator thin films. With the continuous development of these industries, the demand for magnetron sputtering coating technology is increasing, which promotes the continuous progress of magnetron sputtering coating equipment technology to meet higher production efficiency and product quality requirements. The emergence of magnetron sputtering technology makes thin film preparation more efficient and accurate, providing strong support for the development of related industries.

[0003] In the field of magnetron sputtering coating equipment technology, continuous magnetron sputtering vacuum coating production line is a common production equipment. The principle of magnetron sputtering is that in a vacuum state, argon ions and electrons are generated by ionizing argon gas, argon ions bombard the surface of the target material under the acceleration of the electric field, and the atoms or molecules on the surface of the target material are sputtered and deposited on the surface of the coated substrate. At the same time, the electrons increase the collision with argon atoms under the constraint of the magnetic field, which greatly increases the gas ionization. However, the current continuous magnetron sputtering vacuum coating production line has a single layout, and when performing magnetron sputtering coating production, it cannot flexibly adjust the production line according to different coating requirements, making it difficult to improve the function of the coating production line and not well adapted to diversified production needs. SUMMARY

[0004] In order to solve the problem that the traditional magnetron sputtering vacuum coating production line cannot flexibly adjust the production line according to different coating requirements, the present application provides a vacuum coating production line.

[0005] The vacuum coating production line provided by the present application adopts the following technical scheme: A vacuum coating production line includes a plurality of chambers, a plurality of said processing chambers include a feeding chamber, a heating chamber, a feeding buffer chamber, a coating chamber, a discharging buffer chamber, a cooling chamber and a discharging chamber connected in sequence, so that the tray carrying the substrate enters from the feeding chamber and sequentially passes through the heating chamber, the feeding buffer chamber, the coating chamber, the discharging buffer chamber and the cooling chamber, and then moves out of the discharging chamber. A plurality of said processing chambers are detachably connected, and at least one of said processing chambers is provided as an adjusting chamber. The number of said adjusting chambers can be adjusted to form different combinations of said vacuum coating production line.

[0006] By adopting the technical scheme, the plurality of processing chambers are detachably connected, so as to increase or reduce the chambers according to the needs of the production line, and the number of the adjusting chambers is changed to combine with the remaining chambers to form a vacuum coating production line with different combinations, so as to meet the needs of different coating production, thereby solving the problem that the traditional magnetron sputtering vacuum coating production line cannot be flexibly adjusted according to different coating needs.

[0007] Preferably, the feeding chamber and the discharging chamber are both arranged as the adjusting chambers, and the number of the feeding chambers is the same as that of the discharging chambers.

[0008] By adopting the technical scheme, the feeding chambers are increased to reduce the time for vacuumizing the feeding chambers from the atmosphere to the target vacuum degree, improve the pace of the feeding chambers, and the discharging chambers are increased to reduce the time for recovering the discharging chambers to the atmospheric pressure, improve the pace of the discharging chambers, and the number of the feeding chambers is the same as that of the discharging chambers, so that the pace of the feeding chambers is consistent with that of the discharging chambers, so as to avoid affecting the pace of the whole production line due to different paces.

[0009] Preferably, the heating chamber and the cooling chamber are both arranged as the adjusting chambers, and the number of the heating chambers is the same as that of the cooling chambers.

[0010] By adopting the technical scheme, the heating chambers and the cooling chambers are increased to heat the tray and the coating substrate to a higher temperature or cool the tray and the coating substrate to a lower temperature under the premise of meeting the pace of the production line, and the number of the heating chambers is the same as that of the cooling chambers, so that the pace of the heating chambers is consistent with that of the cooling chambers, so as to avoid affecting the pace of the whole production line due to different paces.

[0011] Preferably, each of the processing chambers is provided with a return device, and the return devices of the plurality of processing chambers are correspondingly arranged, so that the tray removed from the discharging chamber can be returned to the feeding end of the feeding chamber.

[0012] By adopting the technical scheme, the return devices are arranged on the processing chambers, so that the plurality of return devices can be connected to form a tray return production line when the processing chambers are spliced, on the one hand, the tray carrying the substrate can be removed from the discharging chamber after coating and returned to the feeding end of the feeding chamber, realizing the recycling of the tray in the production line and ensuring the continuous production of the production line, and on the other hand, the space of the processing chambers can be utilized to form a return system, thereby effectively reducing the floor space of the whole production line.

[0013] Preferably, each of the return devices comprises: The backhaul structure comprises a fixed part and a movable part, the fixed part and the movable part are arranged in up-down direction, the fixed part is provided with a sliding groove for accommodating the upper end of the tray, the movable part is movably installed at the lower end of the processing chamber for conveying the tray; and The backhaul driving device is arranged in the processing chamber and is drivingly connected with the movable part.

[0014] By adopting the above technical scheme, the fixed part and the movable part are arranged in up-down direction to limit the movement of the tray in up-down direction, and the sliding groove is arranged to limit the movement of the tray in the width direction of the processing chamber, so that the tray can move linearly in the length direction of the processing chamber, and the movable part is arranged to convey the tray, and the backhaul driving device is arranged to drive the movement of the movable part, so that the movable part can move the tray.

[0015] Preferably, the movable part comprises a plurality of rotating wheels rotatably installed on the processing chamber, and the plurality of rotating wheels are arranged in the length direction of the processing chamber. The backhaul driving device is drivingly connected with the plurality of rotating wheels.

[0016] By adopting the above technical scheme, the plurality of rotating parts are arranged in the length direction of the processing chamber to support the tray, and the backhaul driving device is drivingly connected with the plurality of rotating wheels to enable the plurality of rotating wheels to rotate, so that the tray can move linearly in the length direction of the processing chamber to complete the backhaul of the tray.

[0017] Preferably, the backhaul driving device comprises: A driving motor arranged in the processing chamber; A synchronization structure comprising a driving wheel, a plurality of driven wheels and a synchronous belt, the driving wheel is drivingly connected with the driving motor, the plurality of driven wheels are respectively arranged on the plurality of rotating wheels, and the synchronous belt is arranged between the driving wheel and the plurality of driven wheels.

[0018] By adopting the above technical scheme, the plurality of rotating wheels are arranged to enable the movable part to stably support the tray, the driving motor is arranged to drive the movement of the plurality of rotating wheels, and the synchronization structure is arranged to enable the plurality of rotating wheels to rotate synchronously, so that the rotating speeds of the plurality of rotating wheels can be kept consistent to improve the stability of the conveying of the movable part, and the number of driving devices can be reduced to reduce the cost of the backhaul driving device.

[0019] Preferably, the movable part comprises a rotating wheel provided with an accommodating groove for accommodating the lower end of the tray; and / or, The sliding groove is provided with a first magnetic part for cooperating with a second magnetic part on the tray to form a magnetic levitation structure.

[0020] By adopting the technical scheme, the groove is arranged to accommodate the lower end of the tray, the movement of the lower end of the tray in the width direction of the processing chamber is limited, and the tray is more stable during the return process; meanwhile, the first magnetic force part of the sliding groove cooperates with the second magnetic force part of the tray to form a magnetic suspension structure, so that the upper end of the tray does not contact the fixed part, which can reduce the friction between the tray and the sliding groove, make the tray return more smoothly, reduce energy consumption and wear, and reduce the risk of contamination of the tray.

[0021] Preferably, each of the processing chambers is provided with an opening, and the opening is provided with a light-transmitting part made of transparent material. The outer side of each of the processing chambers is provided with a displacement sensor corresponding to the light-transmitting part, which is used to detect the position of the tray in the corresponding processing chamber; and / or, The processing chambers are the heating chamber and / or the cooling chamber, and the outer side of the heating chamber and / or the cooling chamber is provided with a temperature sensor corresponding to the light-transmitting part, which is used to detect the temperature of the coated substrate on the tray in the corresponding chamber; and / or, The processing chamber is the discharge chamber, and the outer side of the discharge buffer chamber is provided with a thickness sensor corresponding to the light-transmitting part, which is used to detect the thickness of the coating in the chamber.

[0022] By adopting the technical scheme, the opening and the light-transmitting part are arranged, so that the sensor can be arranged on the outer side of the processing chamber, which is convenient for maintaining the sensor and reduces the requirements of the sensor, helps to reduce the cost of the sensor, and the displacement sensor is arranged to detect the displacement of the tray in the chamber in real time, determine the position of the tray in the chamber, ensure that the tray moves to the position, the temperature sensor is arranged to detect the temperature of the coated substrate on the tray in real time, ensure that the temperature of the coated substrate meets the requirements, and the thickness sensor is arranged to detect the thickness of the coating on the tray in real time, determine whether the thickness of the coating meets the requirements.

[0023] Preferably, each of the processing chambers includes a chamber body and a mounting member detachably mounted to the processing chamber body. The first opening, the second opening, or the third opening is arranged on the mounting member.

[0024] By adopting the technical scheme, the opening and the light-transmitting part are arranged on the mounting member which is detachably mounted to the processing chamber body, which is convenient for disassembling and replacing the mounting member, convenient for maintaining the sensor on the mounting member, and convenient for processing the light-transmitting part on the mounting member, and the processing chamber body does not need to be operated during the maintenance process, which reduces the difficulty and cost of maintenance.

[0025] In summary, the present application includes at least one of the following beneficial technical effects: 1. The processing chamber is detachably connected, and the number of adjustment chambers can be increased or reduced as needed, so that different production lines can be freely combined to meet different production needs; 2. Each processing chamber is provided with a return device to return the tray from the discharge chamber to the feeding end of the feeding chamber, thereby reducing the floor space occupied by the production line and ensuring the continuity of the production process; 3. The processing chamber is provided with displacement, temperature and thickness sensors to monitor the tray position, coating substrate temperature and coating thickness online, and the sensors are installed outside the vacuum chamber, which is convenient for maintenance and has low environmental requirements for the sensors. BRIEF DESCRIPTION OF DRAWINGS

[0026] Figure 1 is a structural schematic diagram of the vacuum coating production line provided by the present application; Figure 2 is a layout structural schematic diagram of the vacuum coating production line in Figure 1 ; Figure 3 is another layout structural schematic diagram of the vacuum coating production line in Figure 1 ; Figure 4 is a perspective structural schematic diagram of the processing chamber in Figure 1 from one angle; Figure 5 is a perspective structural schematic diagram of the processing chamber in Figure 1 from another angle; Figure 6 is a perspective structural schematic diagram of the coating chamber in Figure 1 from one angle; Figure 7 is a perspective structural schematic diagram of the coating chamber in Figure 1 from another angle; Figure 8 is a front view structural schematic diagram of the chamber body of the processing chamber in Figure 1 ; Figure 9 is a rear view structural schematic diagram of the chamber body of the processing chamber in Figure 1 ; Figure 10 is a front view structural schematic diagram of the mounting member of the processing chamber in Figure 1 ; Figure 11 is a sectional view structural schematic diagram of the mounting member in Figure 10 ;

[0027] BRIEF DESCRIPTION OF DRAWINGS: 100, vacuum coating production line; 1, processing chamber; 1a, feeding chamber; 1b, heating chamber; 1c, feeding buffer chamber; 1d, coating chamber; 1e, discharging buffer chamber; 1f, cooling chamber; 1g, discharging chamber; 11, chamber body; 12, mounting piece; 121, opening; 13, light-transmitting part; 14, vacuum device; 15, magnetron cathode; 16, elastic piece; 17, sealing piece; 2, return device; 21, fixed part; 211, sliding groove; 22, movable part; 221, rotating wheel; 23, return driving device; 231, synchronization structure; 31, displacement sensor; 32, temperature sensor; 33, thickness sensor; 4, gate valve; 5, tray. DETAILED DESCRIPTION

[0028] The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings, and the described embodiments are only possible technical implementations of the present application, not all possible implementations. Those skilled in the art can obtain other embodiments by combining the embodiments of the present application without creative effort, and these embodiments are also within the protection scope of the present application.

[0029] The present application mainly adopts modular chamber combination and return and monitoring design, so as to improve the function, efficiency and quality monitoring of the coating production line. The present application will be described in further detail below.

[0030] Please refer to Figures 1 to 3 A vacuum coating production line 100 includes a plurality of chambers, and the plurality of processing chambers 1 includes feeding chamber 1a, heating chamber 1b, feeding buffer chamber 1c, coating chamber 1d, discharging buffer chamber 1e, cooling chamber 1f and discharging chamber 1g connected in sequence, so that the tray 5 carrying the substrate enters from the feeding chamber 1a, and then passes through the heating chamber 1b, the feeding buffer chamber 1c, the coating chamber 1d, the discharging buffer chamber 1e and the cooling chamber 1f, and then moves out from the discharging chamber 1g. The plurality of processing chambers 1 are detachably connected, and at least one of the processing chambers 1 is arranged as an adjusting chamber. The number of adjusting chambers can be adjusted to form different combinations of vacuum coating production lines 100. Such design enables the production line to be flexibly adjusted according to different coating requirements, improving the adaptability and functionality of the production line.

[0031] Specifically, the feeding chamber 1a is the starting position of the tray 5 entering the production line, and is characterized by having a certain space to accommodate the tray 5 and perform a preliminary vacuum operation. The feeding chamber 1a can be made of stainless steel to ensure its sealing and durability, and of course, other metal materials such as aluminum alloy can also be used. The feeding chamber 1a is connected with the heating chamber 1b through the door valve 4, which plays a role of isolating the atmosphere from the feeding chamber 1a. The door valve 4 can be a self-made door valve 4 with a valve chamber, which can effectively realize the isolation function. The function of the feeding chamber 1a module is to transfer the tray 5 with the coated substrate (glass or other coated parts) from the atmospheric end to the low-vacuum chamber inside. After the tray 5 enters the feeding chamber 1a, the door valve 4 between the feeding chamber 1a and the atmosphere is closed, and then the vacuum device 14 is used to draw vacuum, and the vacuum degree is usually below 5 Pa.

[0032] The function of the heating chamber 1b is to heat the tray 5 and the coated substrate to meet the requirement of the magnetron sputtering process for the thermal uniformity of the coated substrate. The heating chamber 1b can be provided with heating elements such as heating wires, which are installed on the inner wall of the chamber in a winding manner to generate heat by power supply. Of course, other heating forms such as heating plates can also be used. After the feeding chamber 1a reaches a certain vacuum degree, the door valve 4 between the feeding chamber 1a and the heating chamber 1b is opened, and then the tray 5 is transferred from the feeding chamber 1a, the door valve 4 between the heating chamber 1b and other chambers is closed, and the tray 5 and the coated substrate are heated in the heating chamber 1b. The heating chamber 1b and the feeding buffer chamber 1c are also connected by the door valve 4 to ensure that the heat is not excessively lost.

[0033] The feeding buffer chamber 1c is a transition chamber connecting the heating chamber 1b and the coating chamber 1d. Since the tray 5 in the feeding chamber 1a and the heating chamber 1b is transferred in a pulse form, that is, it needs to stay in the chamber for a period of time before being transferred to the next chamber, and the coating is carried out in the coating chamber 1d by continuous walking of the tray 5, the feeding buffer chamber 1c converts the pulse transmission mode into a continuous walking mode to adapt to the continuous coating process in the coating chamber 1d. The feeding buffer chamber 1c usually has a process of following the film, so that the tray 5 reaches the same transmission speed as the coating chamber 1d before entering the coating chamber 1d, and the spacing of the tray 5 is kept within a suitable range, for example, the spacing is between 50-100 mm, to improve the utilization rate of the target material. The feeding buffer chamber 1c and the heating chamber 1b are connected by the door valve 4 to isolate the heating chamber 1b from the feeding buffer chamber 1c.

[0034] The coating chamber 1d is the core part of the magnetron sputtering process for coating, please refer to Figure 6 and Figure 7The film deposition chamber 1d is usually provided with a magnetron cathode 15 and a vacuum device 14. The magnetron cathode 15 is installed on the film deposition chamber 1d and powered by a power supply to generate a magnetic field and an electric field, so as to realize magnetron sputtering. The vacuum device 14 is installed on the film deposition chamber 1d to maintain the vacuum degree of the film deposition chamber 1d.

[0035] The discharge buffer chamber 1e is opposite to the feeding buffer chamber 1c and is used to convert the continuous transmission of the tray 5 into pulse transmission, so as to facilitate the subsequent removal of the tray 5. The structure and working principle of the discharge buffer chamber 1e are similar to those of the feeding buffer chamber 1c. The discharge buffer chamber 1e is connected with the cooling chamber 1f through a gate valve 4 to isolate the discharge buffer chamber 1e from the cooling chamber 1f.

[0036] The cooling chamber 1f is used to cool the tray 5 and the film deposition substrate, so that the tray 5 reaches a suitable temperature when being transmitted out of the equipment. The cooling chamber 1f can be provided with a cooling pipeline in which a cooling liquid such as cooling water is circulated to take away heat. Of course, other cooling methods such as air cooling can also be used. The cooling chamber 1f is connected with the discharge chamber 1g through a gate valve 4 to isolate the cooling chamber 1f from the discharge chamber 1g.

[0037] The discharge chamber 1g is used to transmit the tray 5 from the production line in a vacuum state to an atmospheric environment. The discharge chamber 1g has similar structural features to the feeding chamber 1a and needs to be subjected to vacuumizing and air releasing operations. The discharge chamber 1g is connected with the outside atmosphere through a gate valve 4 to isolate the discharge chamber 1g from the outside atmosphere.

[0038] It should be further noted that at least one of the processing chambers 1 is set as an adjusting chamber, that is, one or more of the feeding chamber 1a, the heating chamber 1b, the feeding buffer chamber 1c, the film deposition chamber 1d, the discharge buffer chamber 1e, the cooling chamber 1f and the discharge chamber 1g are set as the adjusting chamber, and the embodiments of the present application do not limit this. Further, by changing the number of adjusting chambers, the production line can be flexibly combined according to different needs. In addition, the plurality of processing chambers 1 are detachably connected, that is, the adjacent two processing chambers 1 are detachably connected, so as to increase or decrease the processing chambers 1 to form a vacuum film deposition production line 100 with different combinations. Further, the detachable connection mode can be various, for example, can be bolted connection, can be buckle connection, or can be a combination of bolted connection and buckle connection, and the embodiments of the present application do not limit this.

[0039] The technical scheme of the embodiment can be detachably connected with multiple processing chambers 1, so as to increase or reduce the chambers according to the needs of the production line, change the number of the adjusting chambers, combine with the remaining chambers, form a vacuum coating production line 100 with different combinations, and meet the needs of different coating production, thereby solving the problem that the traditional magnetron sputtering vacuum coating production line 100 cannot be flexibly adjusted according to different coating needs.

[0040] Further, referring to Figure 2 , the feeding chamber 1a and the discharging chamber 1g are both set as adjusting chambers, and the number of the feeding chambers 1a is the same as that of the discharging chambers 1g. In this way, by increasing the feeding chambers 1a, the vacuum is divided into steps to reduce the time for the feeding chamber 1a to be pumped from the atmosphere to the target vacuum degree, improve the feeding chamber 1a, and by increasing the discharging chamber 1g, the gas pressure is divided into steps to reduce the time for the discharging chamber 1g to be restored to the atmospheric pressure, improve the discharging chamber 1g, and the number of the feeding chambers 1a is the same as that of the discharging chambers 1g, so that the feeding chamber 1a and the discharging chamber 1g are kept consistent, so as not to affect the whole production line due to different beats.

[0041] It should be noted that the beat refers to the total time required to complete a specific task or produce a single product, and the time used by each processing chamber 1, that is, the beat of the chamber, wherein the time used by each chamber of the whole vacuum coating production line 100 tends to be a time, which is the beat of the whole coating production line, please refer to Figure 2 In the high-beat production line, usually 50-60 seconds, the feeding chamber 1a needs a long time (about 20s) to be pumped from the atmosphere to a vacuum degree below 5Pa. Therefore, by increasing the feeding chamber and the discharging chamber 1g, the vacuum is divided into steps and the gas pressure is recovered. For example, one feeding chamber 1a and one discharging chamber 1g are added, the feeding chamber 1a1 is pumped from the atmosphere to 1000Pa (10s), and then transferred to the feeding chamber 1a2, which is pumped to 5Pa (10s). In this way, the vacuum pumping time is reduced by 10s, and the beat time is reduced by 10s.

[0042] In an embodiment of the present application, referring to Figure 3 , the heating chamber 1b and the cooling chamber 1f are both set as adjusting chambers, and the number of the heating chambers 1b is the same as that of the cooling chambers 1f. In this way, by increasing the heating chamber 1b and the cooling chamber 1f, the tray 5 and the coated substrate can be heated to a higher temperature or cooled to a lower temperature under the premise of meeting the production line beat, and the number of the heating chamber 1b and the cooling chamber 1f is the same, so that the beat of the heating chamber 1b and the cooling chamber 1f is kept consistent, so as not to affect the whole production line due to different beats.

[0043] In an embodiment of the present application, referring to Figure 4 and Figure 5 each processing chamber 1 is provided with a return device 2, and the return devices 2 of the plurality of processing chambers 1 are correspondingly arranged so that the tray 5 removed from the discharge chamber 1g can be returned to the feeding end of the feeding chamber 1a. In this way, by arranging the return device 2 on each processing chamber 1, the plurality of return devices 2 can be connected to form a tray 5 return production line when the processing chambers 1 are spliced. On the one hand, the tray 5 loaded with the substrate can be removed from the discharge chamber 1g after coating and returned to the feeding end of the feeding chamber 1a, realizing the recycling of the tray 5 in the production line and ensuring continuous production of the production line. On the other hand, the space of the processing chamber 1 can be reused to form a return system, thereby effectively reducing the floor space of the entire production line.

[0044] Further, referring to Figure 4 and Figure 5 each return device 2 comprises a return structure and a return driving device 23. The return structure comprises a fixed part 21 and a movable part 22. The fixed part 21 and the movable part 22 are arranged in a vertical direction. The fixed part 21 is provided with a sliding groove 211 for accommodating the upper end of the tray 5. The movable part 22 is movably installed at the lower end of the processing chamber 1 for abutting the lower end of the tray 5. The return driving device 23 is arranged in the processing chamber 1 and is drivingly connected to the movable part 22. In this way, the fixed part 21 and the movable part 22 are arranged in a vertical direction to limit the movement of the tray 5 in the vertical direction. The sliding groove 211 is arranged to limit the movement of the tray 5 in the width direction of the processing chamber 1, so that the tray 5 can move linearly in the length direction of the processing chamber 1. The movable part 22 is arranged to convey the tray 5. The return driving device 23 is arranged to drive the movable part 22 to move the tray 5.

[0045] In an embodiment of the present application, referring to Figure 4 and Figure 6 the fixed part 21 has an extension end extending in the length direction of the processing chamber 1. The extension end extends out of the processing chamber 1. In this way, when the processing chambers 1 are spliced, the extension end can extend to another processing chamber 1 to abut with the fixed part 21 of the other processing chamber 1. The abutment seams of the adjacent two processing chambers 1 are staggered with the abutment seams of the corresponding two fixed parts 21, so that the tray 5 can be smoothly transferred to the next processing chamber 1.

[0046] Please refer to Figure 5 and Figure 7The moving part 22 comprises a plurality of rotating wheels 221 rotatably installed on the processing chamber 1, the plurality of rotating wheels 221 are arranged along the length direction of the processing chamber 1, the return driving device 23 is drivingly connected with the plurality of rotating wheels 221, in this way, the plurality of rotating wheels 221 are arranged along the length direction of the processing chamber 1 to support the tray 5, and the return driving device 23 is drivingly connected with the plurality of rotating wheels 221 to enable the plurality of rotating wheels 221 to rotate, so that the tray 5 can move linearly along the length direction of the processing chamber 1 to complete the return of the tray 5. Of course, in other embodiments, the moving part 22 can also be a conveyor belt or the like, and the embodiments of the present application do not limit this.

[0047] Further, there are various ways to drive the plurality of rotating wheels 221 to rotate, for example, a plurality of driving motors can be used for driving respectively, or one motor can be used for driving simultaneously, and the embodiments of the present application do not limit this. Specifically, in the embodiment, the return driving device 23 comprises a driving motor and a synchronous structure 231, the driving motor is arranged on the processing chamber 1, the synchronous structure 231 comprises a driving wheel, a plurality of driven wheels and a synchronous belt, the driving wheel is drivingly connected with the driving motor, the plurality of driven wheels are respectively arranged on the plurality of rotating wheels 221, and the synchronous belt is arranged between the driving wheel and the plurality of driven wheels, in this way, the plurality of rotating wheels 221 are arranged to enable the moving part 22 to stably support the tray 5, the driving motor is arranged to drive the plurality of rotating wheels 221 to move, and the synchronous structure 231 is arranged to enable the plurality of rotating wheels 221 to rotate synchronously, so that the rotating speeds of the plurality of rotating wheels 221 can be kept consistent to improve the stability of the moving part 22, and the number of driving devices can be reduced to reduce the cost of the return driving device 23.

[0048] In an embodiment of the present application, the moving part 22 comprises the rotating wheel 221, and the rotating wheel 221 is provided with a containing groove for containing the lower end of the tray 5, in this way, the containing groove is arranged to contain the lower end of the tray 5 to limit the movement of the lower end of the tray 5 along the width direction of the processing chamber 1, so that the tray 5 is more stable during the return process.

[0049] In an embodiment of the present application, the chute 211 is provided with a first magnetic force part to cooperate with a second magnetic force part on the tray 5 to form a magnetic levitation structure, in this way, the first magnetic force part of the chute 211 cooperates with the second magnetic force part on the tray 5 to form the magnetic levitation structure to prevent the upper end of the tray 5 from contacting the fixed part 21, which can reduce the friction between the tray 5 and the chute 211 to make the return of the tray 5 more smooth, reduce the energy consumption and wear, and reduce the risk of the tray 5 being contaminated.

[0050] It should be noted that the above two associated technical features: "the rotating wheel 221 is provided with a containing groove for containing the lower end of the tray 5", "the sliding groove 211 is provided with a first magnetic force part", can be set alternatively or simultaneously, and the embodiments of the present application do not limit this.

[0051] In an embodiment of the present application, referring to Figure 8 , the processing chamber 1 is provided with an opening 121, the opening 121 is provided with a light-transmitting part 13, the material of the light-transmitting part 13 is transparent, the outer side of each processing chamber 1 is provided with a displacement sensor 31 corresponding to the light-transmitting part 13, which is used to detect the position of the tray 5 in the corresponding processing chamber 1. In this way, by setting the opening 121 and the light-transmitting part 13, the sensor can be set on the outer side of the processing chamber 1, which is convenient for maintaining the sensor and can reduce the requirements of the sensor, thereby helping to reduce the cost of the sensor. Further, the light-transmitting part 13 can be a glass plate or an acrylic plate, and the embodiments of the present application do not limit this.

[0052] Further, the number of displacement sensors 31 can be one or multiple, but if the number is too large, the cost is high, and if the number is too small, the position of the tray 5 cannot be accurately determined. Therefore, in the embodiment, four displacement sensors 31 are provided, which are arranged at intervals along the length direction of the processing chamber 1, so as to reduce the number of displacement sensors 31 while ensuring detection accuracy.

[0053] In an embodiment of the present application, referring to Figure 9 , the processing chamber 1 is provided with an opening 121, the opening 121 is provided with a light-transmitting part 13, the material of the light-transmitting part 13 is transparent, the processing chamber 1 is set as a heating chamber 1b and / or a cooling chamber 1f, the outer side of the heating chamber 1b and / or the cooling chamber 1f is provided with a temperature sensor 32 corresponding to the light-transmitting part 13, which is used to detect the temperature of the coated substrate on the tray 5 in the corresponding chamber. In this way, by setting the opening 121 and the light-transmitting part 13, the sensor can be set on the outer side of the processing chamber 1, which is convenient for maintaining the sensor and can reduce the requirements of the sensor, thereby helping to reduce the cost of the sensor. Further, the light-transmitting part 13 can be a glass plate or an acrylic plate, and the embodiments of the present application do not limit this.

[0054] Further, the number of temperature sensors 32 can be one or more, but if the number is too large, the cost is high, and if the number is too small, the temperature distribution of the coated substrate cannot be accurately determined. Therefore, in the embodiment, three temperature sensors 32 are provided, and the three temperature sensors 32 are arranged in the up-down direction. In this way, the number of temperature sensors 32 is reduced under the premise of ensuring detection accuracy, the temperature of the coated substrate can be kept uniform, and the cost is reduced.

[0055] In an embodiment of the present application, referring to Figure 8 , each processing chamber 1 is provided with an opening 121, and the opening 121 is provided with a light-transmitting part 13. The material of the light-transmitting part 13 is transparent. The processing chamber 1 is provided as a discharge buffer chamber 1e. The outer side of the discharge buffer chamber 1e is provided with a thickness sensor 33. The thickness sensor 33 corresponds to the light-transmitting part 13 and is used to detect the thickness of the coating in the chamber.

[0056] It should be noted that the number of thickness sensors 33 can be one or more, but if the number is too large, the cost is high, and if the number is too small, the thickness of the coating cannot be accurately determined. Therefore, in the embodiment, three thickness sensors 33 are provided, and the three thickness sensors 33 are arranged in the up-down direction. In this way, the number of thickness sensors 33 is reduced under the premise of ensuring detection accuracy, the thickness and uniformity of the coating can be ensured, and the cost is reduced.

[0057] It should be noted that the above three associated technical features: "the outer side of each processing chamber 1 is provided with a displacement sensor 31", "the outer side of the heating chamber 1b and / or the cooling chamber 1f is provided with a temperature sensor 32", and "the outer side of the discharge buffer chamber 1e is provided with a thickness sensor 33" can be set alternatively, set simultaneously, or set simultaneously. The embodiments of the present application do not limit this.

[0058] In an embodiment of the present application, referring to Figure 10 and Figure 11 , each processing chamber 1 includes a chamber body 11 and a mounting member 12 detachably mounted on the body of the processing chamber 1. The opening 121 and the light-transmitting part 13 are arranged on the mounting member 12. In this way, the opening 121 and the light-transmitting part 13 are arranged on the mounting member 12 which is detachably mounted on the body of the processing chamber 1. This facilitates the disassembly and replacement of the mounting member 12, facilitates the maintenance of the sensors on the mounting member 12, facilitates the processing of the light-transmitting part 13 on the mounting member 12, and reduces the difficulty and cost of maintenance without operating the body of the processing chamber 1 during maintenance.

[0059] It can be understood that the detachable connection mode can be various, for example, can be bolt connection, can also be buckle connection, can also be the combination of bolt connection and buckle connection, and the embodiments of the present application do not limit this.

[0060] Further, please refer to Figure 11 , the inner side wall of the opening 121 is inwardly recessed to form a first positioning step surface, the processing chamber 1 further comprises an elastic member 16 and a sealing member 17 arranged between the mounting member 12 and the light-transmitting part 13, the elastic member 16 is arranged at the outer side of the light-transmitting part 13 to abut against the first positioning step surface, and the sealing member 17 is arranged at the inner side of the light-transmitting part 13, thus, by arranging the sealing member 17, the inner side of the light-transmitting part 13 is closed, thereby improving the sealing between the mounting member 12 and the light-transmitting part 13, and by arranging the elastic member 16, the sealing between the mounting member 12 and the light-transmitting part 13 can be increased, and soft contact with the light-transmitting part 13 can be formed, so as to avoid damage of the light-transmitting part 13 due to excessive fastening force.

[0061] The above are preferred embodiments of the present application, and are not intended to limit the protection scope of the present application, therefore: equivalent changes made according to the structure, shape, principle of the present application should be covered within the protection scope of the present application.

Claims

1. A vacuum coating production line, characterized in that, The system includes multiple processing chambers (1), each of which comprises a feeding chamber (1a), a heating chamber (1b), a feeding buffer chamber (1c), a coating chamber (1d), a discharge buffer chamber (1e), a cooling chamber (1f), and a discharge chamber (1g) connected in sequence. A tray (5) carrying a substrate enters from the feeding chamber (1a), passes through the heating chamber (1b), the feeding buffer chamber (1c), the coating chamber (1d), the discharge buffer chamber (1e), and the cooling chamber (1f) in sequence, and then exits from the discharge chamber (1g). The multiple processing chambers (1) are detachably connected, and at least one of the processing chambers (1) is configured as an adjustment chamber. The number of adjustment chambers can be adjusted to form different combinations of the vacuum coating production line.

2. The vacuum coating production line according to claim 1, characterized in that, The feed chamber (1a) and the discharge chamber (1g) are both configured as the regulating chamber, and the number of feed chambers (1a) and discharge chambers (1g) is the same.

3. The vacuum coating production line according to claim 1, characterized in that, The heating chamber (1b) and the cooling chamber (1f) are both configured as the adjustment chamber, and the number of the heating chamber (1b) and the cooling chamber (1f) are the same.

4. The vacuum coating production line according to claim 1, characterized in that, Each of the processing chambers (1) is provided with a return device (2), and the return devices (2) of the multiple processing chambers (1) are arranged accordingly so that the tray (5) removed from the discharge chamber (1g) can be returned to the feed end of the feed chamber (1a).

5. The vacuum coating production line according to claim 4, characterized in that, Each of the aforementioned return transmission devices (2) includes: The return structure includes a fixed part (21) and a movable part (22), the fixed part (21) and the movable part (22) being spaced apart vertically. The fixed part (21) is provided with a groove (211) for accommodating the upper end of the tray (5), and the movable part (22) is movably mounted on the lower end of the processing chamber (1) for conveying the tray (5); and, A return drive device (23) is provided in the processing chamber (1) and is driven to the movable part (22).

6. The vacuum coating production line according to claim 5, characterized in that, The movable part (22) includes a plurality of rotating wheels (221) rotatably mounted on the processing chamber (1), and the plurality of rotating wheels (221) are spaced apart along the length direction of the processing chamber (1); The return drive device (23) drives the multiple rotating wheels (221) connected to it.

7. The vacuum coating production line according to claim 6, characterized in that, The return drive device (23) includes: A drive motor is provided in the processing chamber (1); and, The synchronization structure (231) includes a drive wheel, a plurality of driven wheels and a timing belt. The drive wheel is driven and connected to the drive motor. The plurality of driven wheels are respectively disposed on the plurality of rotating wheels (221). The timing belt is disposed on the drive wheel and the plurality of driven wheels.

8. The vacuum coating production line according to claim 5, characterized in that, The movable part (22) includes a rotating wheel (221), the rotating wheel (221) having a receiving groove for receiving the lower end of the tray (5); and / or, The slide (211) is provided with a first magnetic part, which is used to cooperate with the second magnetic part on the tray (5) to form a magnetic levitation structure.

9. The vacuum coating production line according to claim 1, characterized in that, Each of the processing chambers (1) is provided with an opening (121), and a light-transmitting part (13) is provided at the opening (121). The light-transmitting part (13) is made of a transparent material, wherein: Each of the processing chambers (1) is provided with a displacement sensor (31) on its outer side. The displacement sensor (31) is provided corresponding to the light-transmitting part (13) to detect the position of the tray (5) in the corresponding processing chamber (1); and / or, The processing chamber (1) is configured as the heating chamber (1b) and / or the cooling chamber (1f). A temperature sensor (32) is provided on the outside of the heating chamber (1b) and / or the cooling chamber (1f). The temperature sensor (32) is positioned corresponding to the light-transmitting portion (13) to detect the temperature of the coated substrate on the tray (5) within the corresponding chamber; and / or, The processing chamber (1) is configured as the discharge chamber (1g). A thickness sensor (33) is provided on the outside of the discharge buffer chamber (1e). The thickness sensor (33) is provided corresponding to the light-transmitting part (13) to detect the thickness of the coating in the chamber.

10. The vacuum coating production line according to claim 9, characterized in that, Each of the processing chambers (1) includes a chamber body (11) and a mounting component (12) that is detachably installed on the body of the processing chamber (1); The opening (121) and the light-transmitting part (13) are both provided on the mounting part (12).

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