Gas path system and vertical furnace

Abstract

The invention provides a gas path system and a vertical furnace. The gas path system comprises a gas inlet, a flow distribution unit, at least one purification module and a control unit. The gas inlet is configured to receive a preset gas. The flow distribution unit is connected with the air inlet. The flow distribution unit comprises at least one airflow distribution outlet. And the purification module corresponds to and is connected with the airflow distribution outlet. The purification module comprises an output port and a recovery port. The output port extends to a sealed space and is configured to output preset gas. The recovery port extends to the sealed space and is configured to recover gas within the sealed space. The control unit is in signal connection with at least one purification module and controls the output port and the recovery port to be opened or closed. The purification module in the embodiment of the invention forms an independent gas path cycle, can perform independent control, can realize modular control, and is beneficial to simplifying the structure of a gas path system, reducing the control difficulty and improving the integrity and safety in the semiconductor processing process.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor processing, and particularly to a gas path system and a vertical furnace. BACKGROUND

[0002] In the technical field of semiconductor processing, in order to drive an actuator, maintain cleanliness, or avoid oxidation, a specific gas needs to be provided by a gas path system. The existing gas path system has a complex structure, dispersed control, and cannot achieve rapid switching and precise control of gas flow. Coordination between different gas paths and gas-consuming equipment is difficult, which affects the integrity and safety of the semiconductor processing process.

[0003] Chinese patent CN120027608A discloses a vertical furnace heat treatment equipment, which specifically discloses driving the movement of an actuator in the vertical furnace heat treatment equipment using an internal gas path. The internal gas path in CN120027608A is closed and cannot achieve other functions. For example, when cleaning a wafer box in the vertical furnace heat treatment equipment, another gas path system needs to be separately provided, resulting in overly complex gas path control and high control difficulty.

[0004] The content of the background section merely represents the best of the inventor's knowledge and does not necessarily represent the state of the art. SUMMARY

[0005] To address one or more of the problems in the prior art, the present application provides a gas path system, which comprises: a gas inlet configured to receive a preset gas; a flow distribution unit connected with the gas inlet; the flow distribution unit comprises at least one gas flow distribution outlet; at least one purification module corresponding to and connected with the gas flow distribution outlet; the purification module comprises: an output port extending to a sealed space and configured to output the preset gas; a recovery port extending to the sealed space and configured to recover the gas in the sealed space; a control unit signal-connected with the at least one purification module and controlling the opening or closing of the output port and the recovery port.

[0006] According to an aspect of the present application, the gas path system comprises a plurality of purification modules; the flow distribution unit comprises a plurality of gas flow distribution outlets, and the plurality of purification modules correspond to the plurality of gas flow distribution outlets; and the control unit independently controls the plurality of purification modules.

[0007] According to an aspect of the present application, the gas path system further comprises: a recovery pipeline connected with the recovery port; an outlet connected with the recovery pipeline; wherein the preset gas entering the sealed space is discharged through the recovery port, the recovery pipeline and the outlet in sequence.

[0008] According to an aspect of the present application, the purification module comprises: a first interface connected with one of the gas flow distribution outlets; a second interface connected with the first interface and connected with the output port; a first valve arranged between the second interface and the output port, the first valve being signal connected with the control unit; a third interface connected with the recovery port and connected with the recovery pipeline.

[0009] According to an aspect of the present application, the gas path system comprises a plurality of the purification modules; the plurality of the purification modules share the same first interface, and / or the plurality of the purification modules share the same third interface.

[0010] According to an aspect of the present application, the purification module further comprises: a filter unit arranged upstream of the gas path of the output port; the preset gas comprises nitrogen.

[0011] According to an aspect of the present application, the filter unit is arranged between the first valve and the output port.

[0012] According to an aspect of the present application, the purification module further comprises a second valve arranged between the recovery port and the third interface.

[0013] According to an aspect of the present application, the control unit comprises at least one electromagnetic valve group corresponding to the at least one purification module; one of the electromagnetic valve groups comprises: an electromagnetic valve connected with the first valve and configured to control the first valve to open or close.

[0014] According to an aspect of the present application, the control unit comprises a plurality of the electromagnetic valve groups integrated into an electromagnetic valve island; the control unit further comprises a silencer arranged at a port of the electromagnetic valve island.

[0015] According to an aspect of the present application, the recovery pipeline comprises: at least one recovery valve connected with the recovery port in the at least one purification module; a first manifold block connected with the at least one recovery valve and the gas outlet.

[0016] According to an aspect of the present application, the recovery pipeline further comprises: a digital valve disposed between the first manifold block and the gas outlet and configured to obtain the flow rate passing through the digital valve.

[0017] According to an aspect of the present application, the flow distribution unit comprises: a second manifold block disposed downstream of the gas inlet and connected with the gas inlet, an output end of the second manifold block being connected with the at least one purification module; at least one flow meter disposed between the second manifold block and the at least one gas flow distribution outlet, and the at least one flow meter, the at least one gas flow distribution outlet and the at least one purification module corresponding.

[0018] According to an aspect of the present application, the control unit is connected with the flow distribution unit and configured to receive a control signal to control the at least one gas flow distribution outlet and the at least one purification module to be connected or disconnected.

[0019] According to an aspect of the present application, the gas circuit system further comprises: a pressure regulating valve disposed between the gas inlet and the flow distribution unit and configured to change the gas pressure upstream of the flow distribution unit; a pressure sensor disposed between the pressure regulating valve and the flow distribution unit.

[0020] According to an aspect of the present application, the gas circuit system further comprises a filter disposed between the gas inlet and the pressure regulating valve.

[0021] According to an aspect of the present application, the gas circuit system further comprises: at least one pneumatic unit connected with the at least one gas flow distribution outlet and configured to drive a preset actuator.

[0022] According to an aspect of the present application, the present application further comprises a vertical furnace, which comprises: a gas circuit system as described above; at least one wafer box forming a sealed space, the output port and the recovery port in the purification module of the gas circuit system extending into the wafer box.

[0023] According to an aspect of the present application, the vertical furnace comprises a plurality of wafer boxes; the gas path system comprises a plurality of the purification modules; the plurality of wafer boxes correspond to the plurality of purification modules.

[0024] According to an aspect of the present application, the gas path system further comprises at least one pneumatic unit; the vertical furnace further comprises: at least one preset actuator, the at least one pneumatic unit is configured to drive the preset actuator.

[0025] According to an aspect of the present application, the preset actuator comprises one or more of a vertical furnace door, a user operation front end, a robot, and a negative pressure suction cup.

[0026] Compared with the prior art, the embodiment of the present application provides a gas path system, which supplies gas to at least one purification module through at least one gas flow distribution outlet in the flow distribution unit. The purification module comprises an output port for outputting gas and a recovery port for recovering gas, forming a single gas path circulation. The control unit is in signal connection with the purification module to control the opening or closing of the output port and the recovery port. The purification module in the embodiment constitutes a single gas path circulation and can be independently controlled, which can realize modular control, is conducive to simplifying the structure of the gas path system, reducing the control difficulty, and improving the integrity and safety in the semiconductor processing process.

[0027] The embodiment of the present application further comprises a vertical furnace applying the gas path system as described above. BRIEF DESCRIPTION OF DRAWINGS

[0028] The accompanying drawings are included to provide a further understanding of the present application, and constitute a part of the specification, illustrate the embodiments of the present application, and are used to explain the present application, and do not constitute a limitation on the present application. In the drawings: Figure 1 a schematic diagram of an exemplary gas path system consistent with some embodiments of the present application is shown; Figure 2 a schematic diagram of an exemplary purification module consistent with some embodiments of the present application is shown; Figure 3 a schematic diagram of an exemplary recovery pipeline and control unit consistent with some embodiments of the present application is shown; Figure 4 a schematic diagram of an exemplary flow distribution unit consistent with some embodiments of the present application is shown; Figure 5 a block diagram of an exemplary vertical furnace consistent with some embodiments of the present application is shown. DETAILED DESCRIPTION

[0029] In the following certain exemplary embodiments are simply described. As will be realized by those skilled in the art, the described embodiments can be modified in various different ways. Therefore, the drawings and descriptions are to be regarded as illustrative in nature rather than restrictive.

[0030] In the description of the present application, it is to be understood that the orientations or positional relationships indicated by the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like are based on the orientations or positional relationships shown in the drawings, and are merely for the purpose of facilitating the description of the present application and simplifying the description, and do not indicate or imply that the devices or elements indicated thereby must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second" are merely for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated thereby. Therefore, the features defined with "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise explicitly and specifically limited.

[0031] In the description of the present application, it should be noted that, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connection" should be understood broadly, for example, it can be fixed connection, or detachable connection, or integrally connected; it can be mechanical connection, or electrical connection or can communicate with each other; it can be directly connected, or indirectly connected through intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0032] In the present application, unless otherwise explicitly specified and limited, the "upper" or "lower" of the first feature to the second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the "upper", "above" and "on" of the first feature to the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The "under", "below" and "under" of the first feature to the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0033] The disclosure that follows provides many different embodiments, or examples, for implementing different structures of the application. For the purpose of simplicity, the elements of the specific examples below are described in a manner that is intended to convey the essence of the applications. Of course, they are presented by way of example and are not intended to limit the application. Further, the application can comprise different examples in which not all of the described elements are employed. It is contemplated that the applications can be carried out in a manner that departs from the specific examples disclosed herein. For example, certain acts or events can be performed in a different sequence. Alternatively, certain acts or events can be combined. Furthermore, not all of the described elements can be required. Additionally, the described elements can be used in a manner that is different from the use described. Other uses and carrying out the application are expressly intended.

[0034] Embodiments of the present application will be described below with reference to the accompanying drawings. It should be understood that the embodiments described below are merely for the purpose of illustrating and explaining the present application, and are not intended to limit the present application.

[0035] Figure 1 A schematic diagram of an exemplary gas path system 100 is shown, which is consistent with some embodiments of the present application. Referring to Figure 1 , the gas path system 100 includes an air inlet 110, a flow distribution unit 120, at least one purification module 130, and a control unit 140.

[0036] The air inlet 110 can receive a predetermined gas. In some embodiments, the air inlet 110 is connected to a gas tank, a gas pump, or a gas supply pipeline. In some embodiments, the gas path system 100 is applied in a vertical furnace for semiconductor wafer processing, and the predetermined gas can be nitrogen.

[0037] The flow distribution unit 120 is connected to the air inlet 110, and the flow distribution unit 120 includes at least one gas flow distribution outlet 121 (as shown in the air inlet circuit diagram in Figure 1 ). The gas flow distribution outlet 121 is used to output the predetermined gas to the at least one purification module 130. In some embodiments, the flow distribution unit 120 includes a plurality of gas flow distribution outlets 121, and the predetermined gas obtained by the flow distribution unit 120 from the air inlet 110 is uniformly output by the plurality of gas flow distribution outlets 121. Alternatively, in some embodiments, the flow distribution unit 120 includes a plurality of gas flow distribution outlets 121, and the opening or closing of each gas flow distribution outlet 121 can be independently controlled, for example, by the control unit 140 or manually controlled by an operator. Further, in some embodiments, the flow of each gas flow distribution outlet 121 can be the same or different.

[0038] Referring to Figure 1The purification module 130 corresponds to and is connected to the air flow distribution outlet 121. According to a preferred embodiment of the present application, the air path system 100 comprises a plurality of purification modules 130. The flow distribution unit 120 comprises a plurality of air flow distribution outlets 121. The plurality of purification modules 130 correspond to the plurality of air flow distribution outlets 121, and the control unit 140 independently controls each purification module 130.

[0039] In some embodiments, the number of air flow distribution outlets 121 is greater than the number of purification modules 130, which allows the flow distribution unit 120 to support different numbers of purification modules 130, so that the air path system 100 can expand the number of purification modules 130 according to actual needs, meet different use requirements, and expand the application range of the air path system 100. In some embodiments, the number of air flow distribution outlets 121 is greater than the number of purification modules 130, and some air flow distribution outlets 121 can be connected to other gas-using equipment, such as pneumatic devices. The air flow distribution outlet 121 can supply gas to the pneumatic device, expanding the function of the air path system 100. Specifically, according to a preferred embodiment of the present application, the air path system 100 further comprises at least one pneumatic unit (not shown in the figure). The at least one pneumatic unit is connected to the at least one air flow distribution outlet 121, and the pneumatic unit can drive a preset actuator. The air path system 100 can drive the preset actuator through the pneumatic unit, and the preset actuator includes, for example, a pneumatic valve, a pneumatic manipulator, a manual operation assisting device, etc.

[0040] Referring to Figure 1 The purification module 130 comprises an output port 131 and a recovery port 132. The output port 131 can extend into a sealed space 200 and output a preset gas into the sealed space 200. The recovery port 132 also extends into the sealed space 200 and recovers gas in the sealed space 200. In some embodiments, the sealed space 200 can be a sealed chamber for storing or processing wafers, such as a wafer box.

[0041] In the purification module 130, the output port 131 and the recovery port 132 extend into the sealed space 200. The output port 131 inputs the preset gas into the sealed space 200, and the recovery port 132 recovers the gas from the sealed space 200. The preset gas can be used to purify the sealed space 200, and the preset gas can be filled into the sealed space 200. In some embodiments, the preset gas is dry nitrogen, and the output port 131 and the recovery port 132 cooperate to clean and purify the sealed space 200, and protect objects (such as wafers) in the sealed space 200.

[0042] Specifically, the output port 131 and the recovery port 132 can form a preset air pressure to form an air path circulation (such as Figure 1The recovery port 132 forms a negative pressure relative to the internal air pressure of the sealed space 200 to recover the gas in the sealed space 200. Alternatively, in some embodiments, the recovery port 132 forms a positive pressure or a negative pressure smaller than the pressure of the output port 131 to recover the gas in the sealed space 200. In some embodiments, the output port 131 and the recovery port 132 can form different pressures by a gas pump.

[0043] In some embodiments, the gas path system 100 includes a plurality of purification modules 130. The plurality of purification modules 130 can correspond to a plurality of sealed spaces 200 for purifying the plurality of sealed spaces 200, for example, the plurality of purification modules 130 can be controlled simultaneously or separately to purify a plurality of wafer boxes.

[0044] The control unit 140 is in signal connection with at least one purification module 130. In some embodiments, the gas path system 100 includes a plurality of purification modules 130, and the control unit 140 can be in signal connection with the plurality of purification modules 130. The control unit 140 can control the opening or closing of the output port 131 and the recovery port 132 in the purification module 130. The control unit 140 can control the operation of each purification module 130 to meet different use requirements and achieve precise control of each purification module 130.

[0045] In the gas path system 100 in the embodiment, each purification module 130 can be controlled and operated independently, precise control of the gas flow of different purification modules 130 can be achieved, and rapid switching between the plurality of purification modules 130 can be achieved, thereby reducing the control difficulty of the gas path system 100. In the embodiment, the output port 131 and the recovery port 132 of the purification module 130 form independent gas path circulation, the number of purification modules 130 in the gas path system 100 can be expanded according to actual needs, the modular adjustment of the gas path system 100 is achieved, the structure of the gas path system 100 is simplified, and the overall integrity and safety in the semiconductor processing process are improved.

[0046] Referring to Figure 1 In the preferred embodiment of the present application, the gas path system 100 further includes a recovery pipeline 150 and an air outlet 160. The recovery pipeline 150 is connected with the recovery port 132 of the purification module 130. The air outlet 160 is connected with the recovery pipeline 150, and the recovery pipeline 150 and the air outlet 160 cooperate to discharge the gas in the sealed space 200 recovered by the recovery port 132. For example, in some embodiments, the recovery port 132 recovers the gas in the sealed space 200, and the recovered gas is discharged in sequence through the recovery port 132, the recovery pipeline 150 and the air outlet 160, as shown in the exhaust line diagram in Figure 1

[0047] ​According to a preferred embodiment of the present application, the recovery pipeline 150 comprises at least one recovery valve 151. The recovery valve 151 is connected with the recovery port 132 in the purification module 130. In some embodiments, the gas path system 100 comprises a plurality of purification modules 130. The recovery pipeline 150 comprises a plurality of recovery valves 151, and the plurality of recovery valves 151 and the recovery ports 132 in the plurality of purification modules 130 are correspondingly connected, so that the gas path circulation of each purification module 130 can be accurately controlled. In some embodiments, the number of recovery valves 151 in the recovery pipeline 150 is greater than or equal to the number of purification modules 130.

[0048] Figure 2 The structure of an exemplary purification module 130 consistent with some embodiments of the present application is shown. The purification module 130 is described below in conjunction with Figure 2 The purification module 130 is described.

[0049] Referring to Figure 2 The purification module 130 further comprises a first interface 133, a second interface 134, a first valve 135, and a third interface 136. The first interface 133 is connected with one gas flow distribution outlet 121 in the flow distribution unit 120, and the first interface 133 can serve as an inlet of the purification module 130. In some embodiments, the gas path system 100 comprises a plurality of purification modules 130, and the first interfaces 133 of the plurality of purification modules 130 have equal specifications, facilitating the modular expansion of the plurality of purification modules 130.

[0050] The second interface 134 is connected with the first interface 133, and the second interface 134 is further connected with the output port 131. A pipeline for the passage of preset gas is included between the first interface 133 and the second interface 134. Referring to Figure 2 In some embodiments, the gas path system 100 comprises a plurality of purification modules 130, and the plurality of purification modules 130 can share the same first interface 133, which is conducive to simplifying the structure of the purification module 130. Referring to Figure 2 In some embodiments, the number of the plurality of purification modules 130 sharing the same first interface 133 can be two, which is conducive to maintaining the modular expansion of the purification module 130. Preferably, the two purification modules 130 can be integrated on the same fixed structure, maintaining the structural stability of the purification module 130 and simplifying the structure of the purification module 130.

[0051] The first valve 135 is arranged between the second interface 134 and the output port 131, and the first valve 135 is signal connected with the control unit 140. The control unit 140 can control the first valve 135 to be opened or closed, thereby controlling the output port 131 to output the preset gas into the sealed space 200. In some embodiments, the first valve 135 includes a pneumatic valve, which can be controlled to be opened or closed by using the gas flow in the gas circuit system 100 through pipeline design, thereby facilitating simplification of the control system of the gas circuit system 100, reduction of the structural complexity of the gas circuit system 100, and improvement of the stability of the gas circuit system 100.

[0052] Referring to Figure 2 The purification module 130 further includes a third interface 136. The third interface 136 is connected with the recovery port 132, and the third interface 136 is connected with the recovery pipeline 150. The recovery port 132 recovers the gas in the sealed space 200 and is connected with the recovery pipeline 150 through the third interface 136, for example, connected with a recovery valve 151 in the recovery pipeline 150. In some embodiments, the gas circuit system 100 includes a plurality of purification modules 130, and the plurality of purification modules 130 share the same third interface 136, thereby facilitating simplification of the structure of the purification module 130 and the recovery pipeline 150, reduction of the number of interfaces, and reduction of material costs and assembly and expansion difficulty of the purification module 130. Referring to Figure 2 In some embodiments, the number of the plurality of purification modules 130 sharing the same third interface 136 can be two, thereby facilitating modular expansion of the purification module 130.

[0053] Referring to Figure 2 In some embodiments, the purification module 130 further includes a filtering unit 137. The filtering unit 137 is arranged upstream of the gas circuit of the output port 131 and is used for filtering the preset gas, thereby improving the purification effect of the purification module 130 on the sealed space 200. In some embodiments, the preset gas is dry nitrogen, and the filtering unit 137 can filter impurities and water vapor to protect the semiconductor material in the sealed space 200. In some embodiments, the filtering unit 137 is arranged between the first valve 135 and the output port 131. In some embodiments, the filtering unit 137 is arranged between the first interface 133 and the second interface 134, or the filtering unit 137 is arranged between the second interface 134 and the first valve 135. Preferably, the purification module 130 can include a plurality of filtering units 137 arranged at different positions, thereby further improving the purification effect on the preset gas.

[0054] Referring to Figure 1In some embodiments, the gas path system 100 further comprises a filter 111. The filter 111 can be arranged between the gas inlet 110 and the flow distribution unit 120. Alternatively, in some embodiments, the filter is arranged between the flow distribution unit 120 and the purification module 130, so as to improve the quality of the preset gas through multiple purifications.

[0055] According to a preferred embodiment of the present application, the purification module 130 further comprises a second valve (not shown in the figure). The second valve is arranged between the recovery port 132 and the third interface 136. Preferably, the second valve is in signal connection with the control unit 140, and the control unit 140 can control the second valve to open or close, thereby controlling the recovery of the gas in the sealed space 200 through the recovery port 132. In some embodiments, the second valve can cooperate with the recovery valve 151 in the recovery pipeline 150.

[0056] Figure 3 The structure of the exemplary recovery pipeline 150 and the control unit 140 consistent with some embodiments of the present application is shown. It should be noted that those skilled in the art can understand that, Figure 3 the recovery pipeline 150 and the control unit 140 do not have a specific relative positional relationship.

[0057] Referring to Figure 3 In a preferred embodiment of the present application, the control unit 140 comprises at least one electromagnetic valve group 141. The at least one electromagnetic valve group 141 corresponds to at least one purification module 130. The electromagnetic valve group 141 comprises at least one electromagnetic valve, which is connected to the first valve 135 in the purification module 130 and can control the first valve 135 to open or close. In some embodiments, the electromagnetic valve group 141 further comprises another electromagnetic valve, which is connected to the second valve in the purification module 130 and controls the second valve to open or close. Specifically, the first valve 135 is connected to the port of the electromagnetic valve through a pipeline and a joint, and the first valve 135 is controlled through the electromagnetic valve (as shown in the control circuit diagram in Figure 1 ).

[0058] In some embodiments, the control unit 140 further comprises a processor (not shown in the figure). The processor can control the first valve 135 to open or close through the electromagnetic valve according to a preset program or accept an operator's instruction. Specifically, the gas path system 100 further comprises a human-computer interaction module, which can receive an operator's instruction, wherein the human-computer interaction module comprises, for example, a touch screen or physical buttons.

[0059] In some embodiments, the control unit 140 comprises a plurality of electromagnetic valve groups 141. The plurality of electromagnetic valve groups 141 can correspond to a plurality of purification modules 130, so as to independently control each purification module 130 through the control unit 140, thereby improving the control accuracy of the gas path system 100.

[0060] Preferably, in some embodiments, the plurality of electromagnetic valve groups 141 are integrated into an electromagnetic valve island 142, which is conducive to simplifying the structure of the control unit 140. In some embodiments, the control unit 140 further comprises a muffler 143 arranged at a port of the electromagnetic valve island 142, which is used to reduce the noise generated by the control unit 140, improve the user experience, and meet the process requirements.

[0061] Referring to Figure 3 According to a preferred embodiment of the present application, the recovery pipeline 150 comprises a plurality of recovery valves 151, and the recovery valves 151 are connected with the recovery ports 132 in the at least one purification module 130. Specifically, the recovery valves 151 are connected with the third interface 136. In some embodiments, the plurality of purification modules 130 share the same third interface 136, and accordingly, one recovery valve 151 can correspond to a plurality of purification modules 130.

[0062] Referring to Figure 1 The recovery pipeline 150 further comprises a first manifold block 152. The first manifold block 152 is connected with the at least one recovery valve 151 and the gas outlet 160. The first manifold block 152 can make the gas paths of the plurality of recovery valves 151 converge and be discharged by the gas outlet 160, which is conducive to simplifying the structure of the gas path system 100.

[0063] According to a preferred embodiment of the present application, referring to Figure 3 The recovery pipeline 150 further comprises a digital valve 153. The digital valve 153 is arranged between the first manifold block 152 and the gas outlet 160, and can obtain the flow data passing through the digital valve 153. Specifically, the digital valve 153, for example, comprises a digital flow meter, which can be used to reflect the working state of the purification module 130 and the sealing condition of the gas path system 100 by detecting the flow between the first manifold block 152 and the gas outlet 160, in cooperation with the number of activated purification modules 130.

[0064] Figure 4 The structure of an exemplary flow distribution unit 120 consistent with some embodiments of the present application is shown. Referring to Figure 4 In some embodiments, the flow distribution unit 120 further comprises a second manifold block 122 and at least one flow meter 123.

[0065] The second manifold block 122 is arranged downstream of the gas inlet 110, and the second manifold block 122 is connected with the gas inlet 110, and the output end of the second manifold block 122 is connected with the at least one purification module 130. Specifically, the second manifold block 122 can split the preset gas input by the gas inlet 110 to different gas flow distribution outlets 121, and connect with the at least one purification module 130 through the gas flow distribution outlets 121.

[0066] At least one flow meter 123 is arranged between the second manifold block 122 and the at least one gas flow distribution outlet 121, and the at least one flow meter 123, the at least one gas flow distribution outlet 121 and the at least one purification module 130 correspond. Preferably, the at least one flow meter 123 and the at least one gas flow distribution outlet 121 correspond one-to-one, and the flow meter 123 is used to obtain the flow of the corresponding gas flow distribution outlet 121.

[0067] Further, according to the preferred embodiment of the present application, the control unit 140 is also in signal connection with the flow distribution unit 120, and can receive a control signal to control the connection or disconnection between the at least one gas flow distribution outlet 121 and the at least one purification module 130 according to the control signal. Specifically, for example, there is a valve between the gas flow distribution outlet 121 and the purification module 130, and the control unit 140 can control the opening or closing of the valve, thereby controlling the connection or disconnection between the gas flow distribution outlet 121 and the purification module 130. This embodiment can further improve the control accuracy of the purification module 130.

[0068] Referring to Figure 1 In the preferred embodiment of the present application, the gas path system 100 further comprises a pressure regulating valve 170. The pressure regulating valve 170 is arranged between the gas inlet 110 and the flow distribution unit 120, and can change the gas pressure upstream of the flow distribution unit 120. The pressure regulating valve 170 can control the operation and shutdown of the entire gas path system 100, facilitating replacement, repair and maintenance of the gas path system 100, for example, after the pressure regulating valve 170 is closed, the connection with the gas inlet 110 is disconnected, the flow distribution unit 120, the purification module 130, the control unit 140 and the recovery pipeline 150 can be repaired and replaced without affecting the sealed space 200 and the like. Specifically, the pressure regulating valve 170 can be a pressure reducing valve.

[0069] In some embodiments, the gas path system 100 further comprises a filter 111 arranged between the gas inlet 110 and the pressure regulating valve 170. The filter 111 can filter impurities of the gas input by the gas inlet 110, for example, dry the preset gas, reduce water vapor and facilitate protection of the parts in the gas path system 100.

[0070] Further, referring to Figure 1 , the gas path system 100 further comprises a pressure sensor 180. The pressure sensor 180 is arranged between the pressure regulating valve 170 and the flow distribution unit 120. The pressure sensor 180 can detect the input gas pressure, which is conducive to improving the stability of the gas path system 100.

[0071] Embodiments of the present application also include a vertical furnace. Figure 5 A block diagram of an example vertical furnace 10 consistent with some embodiments of the present application is shown. Referring toFigure 5 The vertical furnace 10 comprises the gas path system 100 and at least one wafer box 300 as described in the foregoing embodiments.

[0072] The output port 131 and the recovery port 132 in the purification module 130 of the gas path system 100 extend to the inside of the wafer box 300. The inside of the wafer box 300 constitutes a sealed space, which in some embodiments is the sealed space 200 described in the foregoing embodiments.

[0073] The present embodiment utilizes the gas path system 100 to clean and purify at least one wafer box 300. Moreover, the gas path system 100 is simple in structure, each purification module 130 can constitute an independent gas path circulation, can be expanded according to actual needs, and has a wide range of applications. Moreover, the control logic of the gas path system 100 is clear, each purification module 130 can be independently controlled, which reduces the control difficulty and is conducive to improving the integrity and safety in the semiconductor processing process.

[0074] Preferably, the vertical furnace 10 comprises a plurality of wafer boxes 300. The gas path system 100 comprises a plurality of purification modules 130. The plurality of wafer boxes 300 correspond to the plurality of purification modules 130, and the plurality of wafer boxes 300 can be cleaned and purified at the same time.

[0075] Referring to Figure 5 According to the preferred embodiments of the present application, the gas path system 100 further comprises at least one pneumatic unit 190. The vertical furnace 10 further comprises at least one preset execution mechanism 400. The at least one pneumatic unit 190 is capable of driving the preset execution mechanism 400. Specifically, in some embodiments, the preset execution mechanism 400 can comprise one or more of a vertical furnace door, a user operation front end, a robot, and a negative pressure suction cup. In some embodiments, the pneumatic unit 190 can also supply gas to other pneumatic devices other than the vertical furnace 10, such as a blowing device, a transfer device, etc.

[0076] Finally, it should be noted that the above description is only an embodiment of the present application and is not intended to limit the present application. Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent replacements to some technical features. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.

Claims

1. A gas path system, characterized in that, The gas path system includes: An air inlet, configured to receive a preset gas; A flow distribution unit is connected to the air inlet; the flow distribution unit includes at least one airflow distribution outlet; At least one purification module, the purification module corresponding to and connected to the airflow distribution outlet; the purification module includes: An output port that extends into a sealed space and is configured to output the preset gas; A recovery port extends into the sealed space and is configured to recover gas within the sealed space; The control unit is connected to the at least one purification module by signal and controls the output port and the recycling port to open or close.

2. The gas path system according to claim 1, characterized in that, The gas path system includes multiple purification modules; the flow distribution unit includes multiple airflow distribution outlets, and the multiple purification modules correspond to the multiple airflow distribution outlets; the control unit independently controls the multiple purification modules.

3. The gas path system according to claim 1, characterized in that, The gas path system also includes: A recycling pipeline, wherein the recycling pipeline is connected to the recycling port; An air outlet, which is connected to the recovery pipeline; The preset gas that enters the sealed space is discharged sequentially through the recovery port, the recovery pipeline and the gas outlet.

4. The gas path system according to claim 3, characterized in that, The purification module includes: A first interface, the first interface being connected to one of the airflow distribution outlets; The second interface is connected to the first interface and also to the output port; A first valve is disposed between the second interface and the output port, and the first valve is signal-connected to the control unit; The third interface is connected to the recycling port and to the recycling pipeline.

5. The gas path system according to claim 4, characterized in that, The gas path system includes multiple purification modules; the multiple purification modules share the same first interface, and / or the multiple purification modules share the same third interface.

6. The gas path system according to claim 4, characterized in that, The purification module also includes: A filtration unit is disposed upstream of the gas path of the output port; the preset gas includes nitrogen.

7. The gas path system according to claim 6, characterized in that, The filter unit is located between the first valve and the output port.

8. The gas path system according to claim 4, characterized in that, The purification module also includes a second valve, which is located between the recovery port and the third interface.

9. The pneumatic system according to claim 5, characterized in that, The control unit includes at least one solenoid valve assembly, which corresponds to the at least one purification module; one of the solenoid valve assemblies includes: A solenoid valve, which is connected to the first valve and configured to control the opening or closing of the first valve.

10. The gas path system according to claim 9, characterized in that, The control unit includes a plurality of solenoid valve groups, which are integrated into a solenoid valve island; the control unit also includes a muffler, which is disposed at the port of the solenoid valve island.

11. The gas path system according to claim 3, characterized in that, The recycling pipeline includes: At least one recovery valve, the at least one recovery valve being connected to the recovery port in the at least one purification module; A first manifold block is connected to the at least one recovery valve and the outlet.

12. The gas path system according to claim 11, characterized in that, The recycling pipeline also includes: A digital valve is disposed between the first manifold block and the outlet and is configured to acquire the flow rate passing through the digital valve.

13. The pneumatic system according to any one of claims 1-12, characterized in that, The traffic allocation unit includes: The second manifold block is located downstream of the air inlet and connected to the air inlet. The output end of the second manifold block is connected to the at least one purification module. At least one flow meter is disposed between the second manifold block and the at least one airflow distribution outlet, and the at least one flow meter, the at least one airflow distribution outlet, and the at least one purification module correspond to each other.

14. The gas path system according to claim 13, characterized in that, The control unit is connected to the flow distribution unit and is configured to receive control signals to control the connection or disconnection of the at least one airflow distribution outlet and the at least one purification module.

15. The pneumatic system according to any one of claims 1-12, characterized in that, The gas path system also includes: A pressure regulating valve is disposed between the air inlet and the flow distribution unit and is configured to change the air pressure upstream of the flow distribution unit; A pressure sensor is disposed between the pressure regulating valve and the flow distribution unit.

16. The gas path system according to claim 15, characterized in that, The air circuit system also includes a filter, which is disposed between the air inlet and the pressure regulating valve.

17. The pneumatic system according to any one of claims 1-12, characterized in that, The gas path system also includes: At least one pneumatic unit is connected to the at least one airflow distribution outlet and is configured to drive a preset actuator.

18. A vertical furnace, characterized in that, include: The pneumatic system as described in any one of claims 1-17; At least one wafer cassette forms a sealed space, and the output port and the recovery port of the purification module of the gas path system extend into the wafer cassette.

19. The vertical furnace according to claim 18, characterized in that, The vertical furnace includes multiple wafer cells; the gas path system includes multiple purification modules; the multiple wafer cells correspond to the multiple purification modules.

20. The vertical furnace according to claim 18, characterized in that, The gas path system further includes at least one pneumatic unit; the vertical furnace further includes: At least one preset actuator, wherein the at least one pneumatic unit is configured to drive the preset actuator.

21. The vertical furnace according to claim 20, characterized in that, The preset actuator includes one or more of the following: a vertical furnace door, a user operation front end, a robotic arm, and a negative pressure suction cup.

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