High-performance HUD free-form surface reflector and preparation method thereof
By using a PEI substrate and depositing multiple layers of film on the HUD reflector, the problems of low reflectivity and unstable optical precision are solved, achieving high reflectivity and excellent heat resistance and corrosion resistance, making it suitable for HUD reflectors in the automotive and aerospace fields.
Patent Information
- Application Number
- CN202610073515.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-01-20
- Publication Date
- 2026-02-27
AI Technical Summary
Traditional HUD freeform surface mirrors have low reflectivity and perform poorly in constant humidity and heat accelerated aging tests, and the optical accuracy and dimensional stability of the substrate material are insufficient.
A PEI substrate is used, and Cr film, Al film, Al2O3 film, multilayer SiO2 and Ti3O5 film, and anti-fingerprint AF film are deposited on it in sequence. These films are deposited using an electron beam evaporation coating equipment, and RF ion source assisted deposition is used to improve adhesion, combined with specific deposition rate and temperature control.
It achieves high reflectivity (94.54%~96.76%) and excellent heat resistance, creep resistance, and chemical resistance, exhibiting outstanding corrosion resistance and optical precision and dimensional stability in extreme environments.
Smart Images
Figure CN121578428A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The application relates to the technical field of HUD reflection mirrors, in particular to a high-performance HUD free-form reflection mirror and a preparation method thereof. BACKGROUND
[0002] With the continuous development of science and technology, HUD reflection mirrors have been widely applied in the fields of automobiles, aviation, games and the like. As a head-up display, the HUD is a key technology for improving driving safety and interactive experience in the modern automobile and aviation industries. The core of the HUD is to project key information in front of the user's line of sight, superimposed with the real road scene, to realize the driving state of "eyes not leaving the road". The HUD reflection mirror (usually a free-form mirror) as a core component of optical imaging directly determines the quality and reliability of the HUD imaging. The HUD reflection mirror is an optical element made by vacuum coating aluminum film on a substrate.
[0003] The conventional HUD free-form reflection mirror usually uses glass or PC as a substrate, has low reflectivity, and has poor results in constant damp heat accelerated aging tests. SUMMARY
[0004] The application aims to provide a high-performance HUD free-form reflection mirror and a preparation method thereof.
[0005] To achieve the above-mentioned purpose, the application provides the following technical scheme. The application provides a high-performance HUD free-form reflection mirror, which comprises a PEI substrate, and a Cr film layer, an Al film layer, an Al2O3 film layer, a first SIO2 layer, a first TI3O5 layer, a second SIO2 layer, a second TI3O5 layer, a third SIO2 layer, a third TI3O5 layer, a fourth SIO2 layer and a fingerprint-resistant AF film layer are sequentially coated on the PEI substrate.
[0006] Further, the thickness of the Cr film layer is 35-50 nm, the thickness of the Al film layer is 100-130 nm, the thickness of the Al2O3 film layer is 20-25 nm, the thickness of the first SIO2 layer is 50-55 nm, the thickness of the first TI3O5 layer is 45-50 nm, the thickness of the second SIO2 layer is 80-90 nm, the thickness of the second TI3O5 layer is 1000-1100 nm, the thickness of the third SIO2 layer is 35-45 nm, the thickness of the third TI3O5 layer is 90-95 nm, the thickness of the fourth SIO2 layer is 65-70 nm, and the thickness of the fingerprint-resistant AF film layer is 10-20 nm.
[0007] Further, the thickness of the Cr film layer is 42 nm, the thickness of the Al film layer is 115 nm, the thickness of the Al2O3 film layer is 22 nm, the thickness of the first SIO2 layer is 52 nm, the thickness of the first TI3O5 layer is 47 nm, the thickness of the second SIO2 layer is 85 nm, the thickness of the second TI3O5 layer is 1050 nm, the thickness of the third SIO2 layer is 40 nm, the thickness of the third TI3O5 layer is 92 nm, the thickness of the fourth SIO2 layer is 67 nm, and the thickness of the anti-fingerprint AF film layer is 15 nm.
[0008] The application also includes a preparation method of the HUD free-form mirror, which sequentially deposits the Cr film layer, the Al film layer, the Al2O3 film layer, the first SIO2 layer, the first TI3O5 layer, the second SIO2 layer, the second TI3O5 layer, the third SIO2 layer, the third TI3O5 layer, the fourth SIO2 layer, and the anti-fingerprint AF film layer on the surface of the PEI substrate by using an electron beam evaporation coating device. The deposition rate of the Cr film layer is 0.4±0.1 nm / s, the deposition rate of the Al film layer is 2.5-3.5 nm / s, the deposition rate of the Al2O3 film layer is 0.45 nm / s, the deposition rate of the first SIO2 layer is 0.8 nm / s, the deposition rate of the first TI3O5 layer is 0.45 nm / s, the deposition rate of the second SIO2 layer is 0.8 nm / s, the deposition rate of the second TI3O5 layer is 0.45 nm / s, the deposition rate of the third SIO2 layer is 0.8 nm / s, the deposition rate of the third TI3O5 layer is 0.45 nm / s, the deposition rate of the fourth SIO2 layer is 0.8 nm / s, and the deposition rate of the anti-fouling AS film layer is 0.8 nm / s.
[0009] Further, in the process of coating by using the electron beam evaporation coating device, an RF ion source is used for auxiliary deposition to improve the adhesion of the film layer.
[0010] Further, the vacuum degree during deposition of the film layer by using the electron beam evaporation coating device is 8×10 -4 Pa; the temperature of the coating chamber environment is 70℃ before coating the Al2O3 film layer and the temperature is increased to 150℃ after coating the Al2O3 film layer.
[0011] Further, before deposition on the surface of the PEI substrate, the PEI substrate is cleaned by using an ultrasonic cleaner and then is baked, the baking temperature is 150±5℃ and the baking time is 6 hours.
[0012] Compared with the prior art, the high-performance HUD free-form reflector provided by the application has an average reflectivity of 94.54% and a maximum reflectivity of 96.76% in the 420-680 nm band under the condition of an incident angle of 6-55°, has high reflectivity, and has absolute advantages of optical precision and dimensional stability under extreme environments, excellent heat resistance, excellent creep resistance, natural high flame resistance, excellent chemical resistance and the like relative to the traditional PC material. In addition, the application has excellent performance under high temperature and high pressure, cold and hot impact and high temperature storage, and has excellent corrosion resistance. BRIEF DESCRIPTION OF DRAWINGS
[0013] Figure 1 It is a film layer arrangement diagram.
[0014] Figure 2 It is a reflectivity diagram of light under the incident angles of 6°, 30° and 55°.
[0015] 1-PEI substrate; 2-Cr film layer; 3-Al film layer; 4-Al2O3 film layer; 5-first SIO2 layer; 6-first TI3O5 layer; 7-second SIO2 layer; 8-second TI3O5 layer; 9-third SIO2 layer; 10-third TI3O5 layer; 11-fourth SIO2 layer; 12-fingerprint-proof AF film layer. DETAILED DESCRIPTION
[0016] The technical solutions of the application will be further described below in combination with specific embodiments. It should be understood that the following embodiments are only illustrative and explanatory of the application, and should not be interpreted as limiting the scope of protection of the application. Any technology realized based on the above description of the application is covered within the scope of protection intended by the application.
[0017] In an embodiment of the application, a high-performance HUD free-form reflector includes a PEI substrate 1, which is coated with a Cr film layer 2 (to improve the adhesion of the AL film and the corrosion resistance of the reflector), an Al film layer 3 (to realize high reflectivity of the HUD reflector as the main reflective film layer), an Al2O3 film layer 4 (to improve the corrosion resistance of the aluminum layer), a first SIO2 layer 5, a first TI3O5 layer 6, a second SIO2 layer 7, a second TI3O5 layer 8, a third SIO2 layer 9, a third TI3O5 layer 10, a fourth SIO2 layer 11 and a fingerprint-proof AF film layer 12 (to prevent fingerprints and improve the scratch resistance of the film layer) in sequence; the SIO2 layer and the TI3O5 layer are used to further prevent water and enhance the reflectivity of the aluminum layer.
[0018] In an embodiment of the application, the selected material Ti3O5 has a refractive index of 2.41-2.45, SIO2 has a refractive index of 1.45-1.48, and Al2O3 has a refractive index of 1.65-1.69.
[0019] In an embodiment of the present application, the thickness of the Cr film layer 2 is 35-50 nm, the thickness of the Al film layer 3 is 100-130 nm, the thickness of the Al2O3 film layer 4 is 20-25 nm, the thickness of the first SIO2 layer 5 is 50-55 nm, the thickness of the first TI3O5 layer 6 is 45-50 nm, the thickness of the second SIO2 layer 7 is 80-90 nm, the thickness of the second TI3O5 layer 8 is 1000-1100 nm, the thickness of the third SIO2 layer 9 is 35-45 nm, the thickness of the third TI3O5 layer 10 is 90-95 nm, the thickness of the fourth SIO2 layer 11 is 65-70 nm, and the thickness of the anti-fingerprint AF film layer 12 is 10-20 nm.
[0020] In an embodiment of the present application, the thickness of the Cr film layer 2 is 42 nm, the thickness of the Al film layer 3 is 115 nm, the thickness of the Al2O3 film layer 4 is 22 nm, the thickness of the first SIO2 layer 5 is 52 nm, the thickness of the first TI3O5 layer 6 is 47 nm, the thickness of the second SIO2 layer 7 is 85 nm, the thickness of the second TI3O5 layer 8 is 1050 nm, the thickness of the third SIO2 layer 9 is 40 nm, the thickness of the third TI3O5 layer 10 is 92 nm, the thickness of the fourth SIO2 layer 11 is 67 nm, and the thickness of the anti-fingerprint AF film layer 12 is 15 nm.
[0021] In an embodiment of the present application, the HUD free-form mirror is prepared according to the following steps: The PEI substrate 1 is cleaned using an ultrasonic cleaner to remove surface dirt and foreign matter, and then pre-baking treatment is performed to remove internal water vapor, reduce the water content in the substrate to below 0.02%, release the internal stress of the PEI material, and improve the size thermal stability of the substrate. The baking temperature is 150±5℃, and the baking time is 6 hours. The baked PEI substrate 1 is placed in an electron beam evaporation coating equipment, the vacuum degree of the electron beam evaporation coating equipment is set to 8×10 -4 Pa, the chamber environment heating temperature is 70℃, and an RF ion source is used for auxiliary deposition. According to Table 1 below, the Cr film layer 2, the Al film layer 3, and the Al2O3 film layer 4 are sequentially deposited on the surface of the baked PEI substrate 1. The temperature of the heating chamber is raised to 150℃, and then the first SIO2 layer 5, the first TI3O5 layer 6, the second SIO2 layer 7, the second TI3O5 layer 8, the third SIO2 layer 9, the third TI3O5 layer 10, the fourth SIO2 layer 11, and the anti-fingerprint AF film layer 12 are sequentially deposited to obtain the HUD free-form mirror.
[0022] Table 1
[0023] The HUD free-form mirror prepared above (hereinafter referred to as product) is subjected to the following tests: ①High reflectivity: The product is actually tested, and the average reflectivity of the product is 94.54% in the wavelength range of 420nm-680nm at an incident angle of 6-55°, and the maximum reflectivity value can reach 96.76%. The specific reflectivity data is shown in Table 1. Figure 2
[0024] ②PEI material can be efficiently manufactured by injection molding process, and is easier to shape, and can be mass-produced HUD mirror substrate. PEI material has absolute advantages in maintaining optical precision and dimensional stability in extreme environments. (PEI substrate can be used as a free-form surface, which can be used to correct HUD aberration and magnify virtual image. The core optical element of HUD is aspherical or free-form surface), which is more stable than PC.
[0025] ③Excellent corrosion resistance: 1. High temperature and high humidity: (65℃ 93%RH) environment: After 1200H test, the product appearance is normal. No corrosion.
[0026] 2. Cold and hot impact (high temperature 140±2℃ for 1h, and then put into low temperature-40±2℃ for 1h within 30s, as a cycle) environment, after 1000H test, the product appearance is normal, no corrosion.
[0027] 3. High temperature storage: (140℃) environment: After 1200H test, the product appearance is normal, no corrosion.
[0028] Although the specific embodiments of the present application are described above, those skilled in the art should understand that the specific examples described are only illustrative, and are not intended to limit the scope of the present application. Modifications and changes made by those skilled in the art in accordance with the spirit of the present application should be covered within the scope of the claims of the present application.
Claims
1. A high-performance HUD freeform surface reflector, characterized in that: The PEI substrate includes a Cr film, an Al film, an Al2O3 film, a first SiO2 layer, a first Ti3O5 layer, a second SiO2 layer, a second Ti3O5 layer, a third SiO2 layer, a third Ti3O5 layer, a fourth SiO2 layer, and an anti-fingerprint AF film.
2. The high-performance HUD freeform surface reflector according to claim 1, characterized in that: The thickness of the Cr film is 35-50nm, the thickness of the Al film is 100nm-130nm, the thickness of the Al2O3 film is 20nm-25nm, the thickness of the first SiO2 layer is 50nm-55nm, the thickness of the first Ti3O5 layer is 45nm-50nm, the thickness of the second SiO2 layer is 80nm-90nm, the thickness of the second Ti3O5 layer is 1000nm-1100nm, the thickness of the third SiO2 layer is 35nm-45nm, the thickness of the third Ti3O5 layer is 90nm-95nm, the thickness of the fourth SiO2 layer is 65nm-70nm, and the thickness of the anti-fingerprint AF film is 10nm-20nm.
3. The high-performance HUD freeform surface reflector according to claim 1, characterized in that: The thickness of the Cr film is 42 nm, the thickness of the Al film is 115 nm, the thickness of the Al2O3 film is 22 nm, the thickness of the first SiO2 layer is 52 nm, the thickness of the first Ti3O5 layer is 47 nm, the thickness of the second SiO2 layer is 85 nm, the thickness of the second Ti3O5 layer is 1050 nm, the thickness of the third SiO2 layer is 40 nm, the thickness of the third Ti3O5 layer is 92 nm, the thickness of the fourth SiO2 layer is 67 nm, and the thickness of the anti-fingerprint AF film is 15 nm.
4. The method for fabricating a HUD freeform surface reflector as described in any one of claims 1-3, characterized in that: The following layers were sequentially deposited on the surface of the PEI substrate using an electron beam evaporation coating apparatus: Cr film, Al film, Al2O3 film, first SiO2 layer, first Ti3O5 layer, second SiO2 layer, second Ti3O5 layer, third SiO2 layer, third Ti3O5 layer, fourth SiO2 layer, and anti-fingerprint AF film. The deposition rate of the Cr film is 0.4 ± 0.1 nm / s; the deposition rate of the Al film is 2.5-3.5 nm / s; the deposition rate of the Al2O3 film is 0.45 nm / s; and the deposition rate of the first SiO2 layer is 0.8 nm / s. The deposition rate of the first Ti3O5 layer was 0.45 nm / s; the deposition rate of the second SiO2 layer was 0.8 nm / s. The deposition rate of the second Ti3O5 layer is 0.45 nm / s; the deposition rate of the third SiO2 layer is 0.8 nm / s. The deposition rate of the third Ti3O5 layer is 0.45 nm / s; the deposition rate of the fourth SiO2 layer is 0.8 nm / s. The deposition rate of the antifouling AS film is 0.8 nm / s.
5. The method for fabricating a freeform surface HUD mirror according to claim 4, characterized in that: In the process of coating using electron beam evaporation equipment, an RF ion source is used to assist deposition in order to improve the adhesion of the film layer.
6. The method for fabricating a freeform surface HUD mirror according to claim 4, characterized in that: The vacuum level during film deposition using an electron beam evaporation deposition apparatus is 8 × 10⁻⁶. -4 Pa; The temperature of the coating chamber environment is 70℃ before and after the Al2O3 film is coated, and then the temperature is raised to 150℃ after the Al2O3 film is coated.
7. The method for fabricating a freeform surface HUD mirror according to claim 4, characterized in that: Before deposition on the surface of the PEI substrate, the PEI substrate is first cleaned with an ultrasonic cleaner and then baked at a temperature of 150±5℃ for 6 hours.