Curved surface solar cell film layer etching method and system

Abstract

The invention provides a curved-surface solar cell film layer etching method and system. The method comprises the following steps: acquiring a three-dimensional scanning image of a first film-coated curved-surface cell arranged on a positioning platform of the curved-surface solar cell film layer etching system; mapping the first scribed line curved surface to the three-dimensional scanning image to obtain a first target three-dimensional image; according to the first galvanometer speed of a galvanometer dynamic focusing device of the curved surface solar cell film layer etching system, the first scribed line number and the first target three-dimensional image, the first film-coated curved surface cell is etched, and a first etched curved surface cell is obtained; coating the first etched curved-surface battery piece with a film to obtain a second coated curved-surface battery piece; and repeating the operation twice to complete the three-layer etching action. According to the scheme, by providing a flight marking working mode, focusing can adapt to film layer etching of the three-layer large-area curved surface solar cell, the system structure can be simplified, a high-precision etching method is provided, and efficient and stable large-area high-precision curved surface etching is achieved.

Description

Technical Field

[0001] This invention relates to the field of photovoltaic cell manufacturing technology, and in particular to a method and system for etching the film layer of curved solar cells. Background Technology

[0002] The design of curved solar cells is of great significance, as it allows solar cells to be used not only on planar structures, but also better integrated into car roofs, building facades, and various irregularly shaped lighting devices, thus enabling more flexible applications than planar solar cells.

[0003] The etching method for curved solar cells is the same as that for planar solar cells, both requiring laser equipment for etching to obtain series-connected sub-cells to create a high-efficiency cell structure. Traditional solar laser etching equipment is mostly planar etching. Existing equipment for etching curved structures uses five-axis CNC machine tools, which, due to their large size, high inertia, and slow rotation speed, are difficult to use for high-speed and high-precision processing. To improve accuracy, current technology uses two-dimensional galvanometer etching to meet the requirements of relatively complex curved surface etching. However, for etching large-area curved solar cells, selecting a large-format field lens results in a longer focal length, leading to relatively poor etching accuracy at the edges of the surface, making it difficult to meet high-precision etching requirements. Summary of the Invention

[0004] This invention provides a method and system for etching curved solar cell films, which solves the problems of poor focal length adaptability of galvanometer optical paths on large-area curved surfaces, high difficulty in path control, and difficulty in completing curved surface etching processes in a simple, efficient, stable and high-precision manner.

[0005] To solve the above-mentioned technical problems, the technical solution of the present invention is as follows: This invention provides a method for etching a curved solar cell film layer, comprising: Acquire a three-dimensional scan image of the first coated curved solar cell placed on the positioning platform of the curved solar cell film etching system; The first scribing surface is mapped onto the three-dimensional scanned image to obtain the first target three-dimensional image; The first coated curved solar cell is etched according to the first galvanometer speed, the first number of etch lines and the first target three-dimensional image of the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain the first etched curved solar cell. The first etched curved surface solar cell is coated to obtain a second coated curved surface solar cell; The position of the second etched line is obtained by offsetting and rotating the position of the first etched line. The surface of the second etched line is then mapped onto the corresponding position of the first target 3D image to obtain the second target 3D image. The second coated curved solar cell is etched according to the second mirror speed, the second number of etch lines and the second target three-dimensional image of the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain the second etched curved solar cell. The second etched curved surface solar cell is coated to obtain a third coated curved surface solar cell; The position of the third etched line is obtained by offsetting and rotating the position of the second etched line. The surface of the third etched line is then mapped onto the corresponding position of the second target three-dimensional image to obtain the third target three-dimensional image. The third coated curved solar cell is etched according to the third mirror speed, the third number of scribing lines and the third target three-dimensional image of the galvanometer dynamic focusing device of the curved solar cell film etching system, to obtain the third etched curved solar cell. The etching processes of the first, second, and third etched curved surface solar cells employ an infinite field of view processing function to achieve integrated processing of the solar cells.

[0006] Optionally, a three-dimensional scanning image of the first coated curved solar cell placed on the positioning platform of the curved solar cell film etching system is acquired, including: Scan the planar position of each point on the first coated curved battery cell to obtain the horizontal and vertical coordinate data; according to The height change of each point on the first coated curved battery cell is calculated to obtain the vertical coordinate data; where h represents the height of each point on the first coated curved battery cell, i.e., the vertical coordinate data; and d represents the distance between the laser source and the camera. Indicates the laser incident angle; Indicates the camera's receiving angle; A three-dimensional scan image is obtained based on the horizontal coordinate data, the vertical coordinate data, and the vertical axis data.

[0007] Optionally, mapping the first scribing surface onto the three-dimensional scanned image to obtain a first target three-dimensional image includes: A geometric transformation is performed on the first etch line to obtain a three-dimensional first etch line; the three-dimensional first etch line is a curve. The first three-dimensional etched line is mapped onto the three-dimensional scanned image to obtain the first target three-dimensional image.

[0008] Optionally, the first coated curved solar cell is etched according to the first mirror speed, the first number of etch lines, and the first target three-dimensional image of the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain the first etched curved solar cell, including: The first platform speed is obtained based on the speed of the first galvanometer and the number of the first scribe lines; According to the speed of the first platform, the positioning platform moves, and the galvanometer dynamic focusing device etches the first coated curved surface solar cell that follows the positioning platform according to the three-dimensional image of the first target, so as to obtain the first etched curved surface solar cell.

[0009] Optionally, the position of the second etched line is obtained based on the positional offset and rotation of the first etched line, and the surface of the second etched line is mapped onto the corresponding position of the first target 3D image to obtain the second target 3D image, including: The position of the first etched line is detected by the visual positioning device of the curved solar cell film etching system to obtain the position information of the first etched line. The first rotation angle is obtained based on the position information of the preset calibration line and the first etched line; The first scribe line is rotated according to the first rotation angle to obtain the first rotation position information; Based on the preset calibration line and the first rotation position information, the first offset is obtained; The position of the second scribe line is obtained based on the first rotation angle and the first offset. A geometric transformation is performed on the second etch line to obtain a three-dimensional second etch line; the three-dimensional second etch line is a curve. The three-dimensional second scribed line is mapped onto the first target three-dimensional image to obtain the second target three-dimensional image.

[0010] Optionally, the first rotation angle is obtained based on the position information of the preset calibration line and the first scribe line, including: according to Thus, the first rotation angle is obtained; in, Indicates the first rotation angle; This represents the x-coordinate of the starting point of the preset calibration line; The ordinate of the starting point of the preset calibration line; The x-coordinate of the endpoint of the preset calibration line; The ordinate of the endpoint of the preset calibration line; The x-coordinate of the starting point of the first etched line position information; The ordinate of the starting point of the first etched line position information; The x-coordinate of the endpoint of the first etched line position information; The vertical coordinate represents the endpoint of the first etched line position information.

[0011] Optionally, the first offset is obtained based on the preset calibration line and the first rotation position information, including: according to , thus obtaining the first offset; in, Represents the first offset; This represents the x-coordinate of the starting point of the preset calibration line; The x-coordinate represents the starting point in the rotational position information.

[0012] Optionally, the second coated curved solar cell is etched according to the second mirror speed, the second number of etch lines, and the second target three-dimensional image of the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain the second etched curved solar cell, including: The second platform speed is obtained based on the second galvanometer speed and the second number of scribe lines; According to the second platform speed, the positioning platform moves, and the galvanometer dynamic focusing device etches the second coated curved surface solar cell that follows the positioning platform according to the three-dimensional image of the second target, so as to obtain the second etched curved surface solar cell.

[0013] Optionally, based on the position of the second etched line, the position of the third etched line is obtained by offset and rotation. The surface of the third etched line is then mapped onto the corresponding position of the second target 3D image to obtain the third target 3D image, including: The position of the second etched line is detected by the visual positioning device of the curved solar cell film etching system to obtain the position information of the second etched line. The second rotation angle is obtained based on the position information of the preset calibration line and the second scribe line; The second scribe line is rotated according to the second rotation angle to obtain the second rotation position information; The second offset is obtained based on the preset calibration line and the second rotation position information; The position of the third scribe line is obtained based on the second rotation angle and the second offset. A geometric transformation is performed on the third scribe line to obtain a three-dimensional third scribe line; the three-dimensional third scribe line is a curve. The three-dimensional third scribe line is mapped onto the second target three-dimensional image to obtain the third target three-dimensional image.

[0014] Optionally, the third coated curved solar cell is etched according to the third mirror speed, the third number of scribe lines, and the third target three-dimensional image of the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain the third etched curved solar cell, including: The third platform speed is obtained based on the third galvanometer speed and the number of third scribe lines; According to the speed of the third platform, the positioning platform moves, and the galvanometer dynamic focusing device etches the third coated curved surface solar cell that follows the positioning platform according to the three-dimensional image of the third target, so as to obtain the third etched curved surface solar cell.

[0015] Embodiments of the present invention also provide a curved solar cell film etching system, comprising: Positioning platform; A visual scanning device placed above the positioning platform to scan the battery cells on the positioning platform; A galvanometer dynamic focusing device installed at the bottom of the visual scanning device; A visual positioning device placed in front of the battery cell on the positioning platform to scan and position the battery cell. A control system electrically connected to the visual scanning device, positioning platform, galvanometer dynamic focusing device, and visual positioning device; The visual scanning device acquires a three-dimensional scan image of the first coated curved solar cell placed on the positioning platform of the curved solar cell film etching system; The control system maps the first etched surface onto the three-dimensional scanned image to obtain a first target three-dimensional image; etches the first coated curved solar cell according to the first mirror speed, the first number of etched lines, and the first target three-dimensional image using the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain a first etched curved solar cell; coats the first etched curved solar cell to obtain a second coated curved solar cell; determines the position of the second etched line based on the position offset and rotation of the first etched line, maps the second etched surface onto the corresponding position of the first target three-dimensional image to obtain a second target three-dimensional image; and etches the first coated curved solar cell according to the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain a second target three-dimensional image. The second coated curved solar cell is etched using the second galvanometer speed, the second number of scribe lines, and the second target 3D image of the dynamic focusing device to obtain the second etched curved solar cell; the second etched curved solar cell is then coated to obtain the third coated curved solar cell; the position of the third scribe line is obtained based on the position offset and rotation of the second scribe line, and the curved surface of the third scribe line is mapped onto the corresponding position of the second target 3D image to obtain the third target 3D image; the third coated curved solar cell is etched using the third galvanometer speed, the third number of scribe lines, and the third target 3D image of the dynamic focusing device of the galvanometer of the curved solar cell film etching system to obtain the third etched curved solar cell; The etching processes of the first, second, and third etched curved surface solar cells employ an infinite field of view processing function to achieve integrated processing of the solar cells.

[0016] The technical solution of the present invention has at least the following effects: The above-described solution of the present invention acquires a three-dimensional scan image of a first coated curved solar cell placed on a positioning platform of a curved solar cell film etching system; maps a first etched curved surface onto the three-dimensional scan image to obtain a first target three-dimensional image; etches the first coated curved solar cell according to the first galvanometer speed, the first number of etched lines, and the first target three-dimensional image of the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain a first etched curved solar cell; coats the first etched curved solar cell to obtain a second coated curved solar cell; obtains the position of the second etched line according to the position offset and rotation of the first etched line, maps the second etched curved surface onto the corresponding position of the first target three-dimensional image to obtain a second target three-dimensional image; and uses the second galvanometer speed of the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain a second target three-dimensional image. The second coated curved solar cell is etched using a speed, the number of second etched lines, and the second target 3D image to obtain a second etched curved solar cell. The second etched curved solar cell is then coated to obtain a third coated curved solar cell. The position of the third etched line is obtained based on the positional offset and rotation of the second etched line, and the curved surface of the third etched line is mapped onto the corresponding position of the second target 3D image to obtain a third target 3D image. The third coated curved solar cell is then etched using the third mirror speed, the number of third etched lines, and the third target 3D image of the galvanometer dynamic focusing device of the curved solar cell film etching system to obtain a third etched curved solar cell. The etching processes of the first, second, and third etched curved solar cells employ an infinite field of view processing function to achieve integrated processing of the solar cells. This allows for focusing adaptation to the film etching of multi-layer, large-area curved solar cells. Simultaneously, by providing a flying marking working mode, the system structure is simplified, a high-precision etching method is provided, and high efficiency and stability of large-area, high-precision curved surface etching are achieved. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the curved solar cell film etching system provided in an embodiment of the present invention; Figure 2 This is a schematic diagram of the structure of the galvanometer dynamic focusing device provided in an embodiment of the present invention; Among them, 1. visual scanning device; 2. galvanometer dynamic focusing device; 3. visual positioning device; 4. positioning platform; 5. curved solar cell; 6. laser; 7. reflector; 8. beam expander; 31. scanning galvanometer; 32. focusing objective lens; 33. dynamic focusing lens. Detailed Implementation

[0018] Exemplary embodiments of the invention will now be described in more detail with reference to the accompanying drawings. While exemplary embodiments of the invention are shown in the drawings, it should be understood that the invention may be implemented in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this invention will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.

[0019] like Figure 1 and Figure 2 As shown, an embodiment of the present invention proposes a method for etching a curved solar cell film layer, comprising: Step 11: Obtain a three-dimensional scan image of the first coated curved solar cell placed on the positioning platform of the curved solar cell film etching system; Step 12: Map the first scribing surface onto the three-dimensional scanned image to obtain the first target three-dimensional image; Step 13: Etch the first coated curved solar cell according to the first galvanometer speed, the first number of etch lines and the first target three-dimensional image of the galvanometer dynamic focusing device 2 of the curved solar cell film etching system to obtain the first etched curved solar cell. Step 14: Coat the first etched curved surface solar cell with a film to obtain a second coated curved surface solar cell; Step 15: Obtain the position of the second etched line based on the position offset and rotation of the first etched line, and map the surface of the second etched line onto the corresponding position of the first target 3D image to obtain the second target 3D image; Step 16: Etch the second coated curved solar cell according to the second mirror speed, the second number of scribing lines and the second target three-dimensional image of the galvanometer dynamic focusing device 2 of the curved solar cell film etching system to obtain the second etched curved solar cell. Step 17: Coat the second etched curved surface solar cell with a film to obtain the third coated curved surface solar cell; Step 18: Obtain the position of the third etched line based on the position offset and rotation of the second etched line, and map the surface of the third etched line onto the corresponding position of the second target 3D image to obtain the third target 3D image; Step 19: Etch the third coated curved solar cell according to the third mirror speed, the number of third scribe lines and the third target three-dimensional image of the galvanometer dynamic focusing device 2 of the curved solar cell film etching system to obtain the third etched curved solar cell. The etching processes of the first, second, and third etched curved surface solar cells employ an infinite field of view processing function to achieve integrated processing of the solar cells.

[0020] In this embodiment, the curved solar cell film etching system can operate using either flying marking or offline single-area marking methods. The number of etching layers is the same as the number of film layers in the solar cell, i.e., 3 layers. The curved solar cell 5 during the first etching is itself a cell with one layer of film coating, i.e., the first coated curved solar cell. The etching process for each layer of a three-layer coated curved solar cell mainly includes: (1) Generating virtual images The curved solar cell 5 is placed on the positioning platform 4 of the curved solar cell film etching system using a clamping machine. The curved solar cell 5 includes a first coated curved solar cell, a second coated curved solar cell, and a third coated curved solar cell. The first coated curved solar cell is a curved solar cell 5 with one layer of film; the second coated curved solar cell is a curved solar cell 5 with two layers of film and one etching operation between the two layers; the third coated curved solar cell is a curved solar cell 5 with three layers of film and two etching operations between the three layers. The visual scanning device 1 of the curved solar cell film etching system scans the first coated curved solar cell, transmits the scanned data to the control system, and the control system generates a three-dimensional scan image corresponding to the curved solar cell 5. The three-dimensional scan image is a proportional virtual image of the curved solar cell 5.

[0021] (2) Mapping preset scribing lines The control system uses processing software to map preset etching lines onto a 3D image, forming a 3D virtual image with etching lines, namely, a first target 3D image, a second target 3D image, and a third target 3D image. The preset etching lines are straight lines, namely the first etching line, the second etching line, and the third etching line. The mapped 3D etching lines are curves that conform to the curved battery cell 5, namely, the first 3D etching line, the second 3D etching line, and the third 3D etching line. The first 3D etching line, the second 3D etching line, and the third 3D etching line are parallel curves with a narrow distance between them. The first etching line is the first etching line that needs to be etched onto the curved battery cell 5, that is, the etching line etched on the first coated curved battery cell. The second etching line is the second etching line that needs to be etched onto the curved battery cell 5, that is, the etching line etched on the second coated curved battery cell. The position of the second etching line needs to be determined based on the position of the first etching line. The third etching line is the third etching line that needs to be etched onto the curved battery cell 5, that is, the etching line etched on the third coated curved battery cell. The position of the third etching line needs to be determined based on the position of the second etching line.

[0022] (3) Perform the etching action.

[0023] The control system determines the actual position on the curved battery cell 5 where the preset scribing lines should be processed based on the target 3D image. Before the etching process begins, the galvanometer speed in the galvanometer dynamic focusing device 2 and the number of preset scribing lines on one galvanometer plane can be obtained. Based on the galvanometer speed and the number of preset scribing lines, the required moving speed of the positioning platform 4, i.e., the platform speed, can be determined. The curved battery cell 5 moves according to the positioning platform 4. The galvanometer dynamic focusing device 2 etches the positions on the curved battery cell 5 that should be etched using a laser 6, completing the etching action. Specifically, the laser 6 reflects the laser light to the beam expander 8 through a reflector 7, and the beam expander 8 transmits the laser light to the galvanometer dynamic focusing device 2, completing one etching operation. The etching process uses a dynamic focusing galvanometer for scanning etching, and simultaneously, the positioning platform 4 moves along with the etching action (movement direction as shown in the image). Figure 1 As shown by the arrow in the image, the entire battery area is processed using the infinite field of view processing function to obtain the corresponding etched curved battery cell.

[0024] (4) Perform the film coating operation The curved solar cell 5 with three-layer coating is a complete large-area cell before processing. After each etching, it becomes a series of sub-cells connected in series. After coating again, it is restored to a complete large-area cell. This process is repeated until three etching operations are completed, resulting in the final series of sub-cells. The coating process is completed outside the system.

[0025] The three-layer etching process described above can all achieve unlimited field of view processing, that is, realize seamless processing of ultra-large-format solar cells, and complete the etching of film layers through an integrated processing process.

[0026] This technical solution achieves high-precision etching of large-area multilayer curved solar cells. It solves the problem of multi-axis collaborative processing required to complete the etching of curved surfaces by using a galvanometer dynamic focusing device and a vision scanning device, and also greatly simplifies the structure of the equipment.

[0027] In an optional embodiment of the present invention, step 11, acquiring a three-dimensional scan image of the first coated curved solar cell placed on the positioning platform of the curved solar cell film etching system, may include: Step 111: Scan the planar position of each point on the first coated curved battery cell to obtain the horizontal and vertical coordinate data; Step 112, according to The height change of each point on the first coated curved battery cell is calculated to obtain the vertical coordinate data; where h represents the height of each point on the first coated curved battery cell, i.e., the vertical coordinate data; and d represents the distance between the laser source and the camera. Indicates the laser incident angle; Indicates the camera's receiving angle; Step 113: Obtain a three-dimensional scan image based on the horizontal coordinate data, the vertical coordinate data, and the vertical axis data.

[0028] In this embodiment, in step 111, the visual scanning device 1 scans the curved battery cell 5 line by line using a camera or other sensing device; a corresponding coordinate system is established based on the positioning platform 4, and during each line scan, the sensing device can extract the horizontal and vertical coordinates of the surface of the curved battery cell 5, thereby generating two-dimensional grid data of the horizontal and vertical coordinates.

[0029] In step 112, based on the principle of laser triangulation, using the formula h= The vertical coordinate data corresponding to each point of the curved battery cell 5 are obtained, where d represents the fixed baseline distance formed by the laser source and the camera (usually 50). 200mm); Indicates the laser incident angle (e.g., 30°); Indicates the camera's receiving angle (e.g., 45°).

[0030] In step 113, the virtual coordinates of the three-dimensional scan image are obtained based on the horizontal, vertical and vertical coordinates. The virtual coordinates are obtained by multiplying the actual coordinates by a scaling factor, which can be selected according to the actual situation of the system. Then, the specific position of each point after scaling can be known through the virtual coordinates of each point, thereby generating the three-dimensional scan image.

[0031] In an optional embodiment of the present invention, step 12, mapping the first scribing surface onto the three-dimensional scanned image to obtain the first target three-dimensional image, may include: Step 121: Perform a geometric transformation on the first etch line to obtain a three-dimensional first etch line; the three-dimensional first etch line is a curve; Step 122: Map the three-dimensional first etched line onto the three-dimensional scanned image to obtain the first target three-dimensional image.

[0032] In this embodiment, surface mapping essentially involves fitting a planar pattern onto a spatial curved surface through geometric transformation, and using dynamic focusing to achieve precise marking. The etched planar pattern of the first coated curved battery cell is the first etched line (straight line). After parametric modeling and mapping the first etched line, it is fitted onto the spatial curved surface, and the three-dimensional virtual image becomes an image with the three-dimensional first etched line, i.e., the first target three-dimensional image.

[0033] In an optional embodiment of the present invention, step 13, etching the first coated curved solar cell according to the first mirror speed, the first number of etch lines, and the first target three-dimensional image of the galvanometer dynamic focusing device 2 of the curved solar cell film etching system to obtain the first etched curved solar cell, may include: Step 131: Obtain the first platform speed based on the speed of the first galvanometer and the number of the first scribe lines; Step 132: Move the positioning platform 4 according to the speed of the first platform, and the galvanometer dynamic focusing device 2 etches the first coated curved surface battery cell that moves with the positioning platform 4 according to the three-dimensional image of the first target, to obtain the first etched curved surface battery cell.

[0034] In this embodiment, the galvanometer speed can be determined by multiple factors such as the laser absorptivity, thermal conductivity, and etching depth of the curved solar cell 5. The galvanometer speed includes a first galvanometer speed, a second galvanometer speed, and a third galvanometer speed. The first galvanometer speed is the moving speed of the scanning galvanometer 31 in the galvanometer dynamic focusing device 2 during the first etching. The first galvanometer speed used for the first etching can be set to 1000. 8000mm / s. The number of graduations includes the number of first graduations, second graduations, and third graduations. The number of first graduations, second graduations, and third graduations must be equal; for example, the number of first graduations can be set to 15. According to... and It can be deduced Thus, the first platform speed is obtained; the automatic adjustment system positioning platform 4 moves according to the first platform speed, and the galvanometer dynamic focusing device 2 performs an etching action on the first coated curved surface battery cell placed on the positioning platform 4; wherein... This indicates the operating speed of positioning platform 4 during the first etching. Indicates the length of the first graduation line; Indicates the time of the first etching; This indicates the galvanometer speed at which the first etch line is formed; This indicates the number of lines etched on a single galvanometer surface, i.e., the number of first etched lines.

[0035] In an optional embodiment of the present invention, step 14, coating the first etched curved surface solar cell to obtain a second coated curved surface solar cell, may include: Step 141: Coating the first etched curved surface solar cell with a film to obtain a second coated curved surface solar cell.

[0036] In this embodiment, after the first etching of the first etched curved surface solar cell is completed, the first etched curved surface solar cell will change from a complete solar cell to a series of sub-cells. In order to perform a second etching, the series of sub-cells need to be coated to make them into a complete second coated curved surface solar cell.

[0037] In an optional embodiment of the present invention, step 15, obtaining the position of the second etched line based on the position offset and rotation of the first etched line, and mapping the surface of the second etched line onto the corresponding position of the first target three-dimensional image to obtain the second target three-dimensional image, may include: Step 151: The position of the first etched line is detected by the visual positioning device 3 of the curved solar cell film etching system to obtain the position information of the first etched line; Step 152: Obtain the first rotation angle based on the position information of the preset calibration line and the first etched line; Step 153: Rotate the first scribe line according to the first rotation angle to obtain the first rotation position information; Step 154: Obtain the first offset based on the preset calibration line and the first rotation position information; Step 155: Obtain the position of the second scribe line based on the first rotation angle and the first offset. Step 156: Perform a geometric transformation on the second etched line to obtain a three-dimensional second etched line; the three-dimensional second etched line is a curve; Step 157: Map the three-dimensional second scribed surface onto the first target three-dimensional image to obtain the second target three-dimensional image.

[0038] In this embodiment, the position of the first etched line is obtained by the visual positioning device 3, and the starting point coordinates of the first etched line are obtained. and endpoint coordinates That is, the position information of the first etched line; the starting point coordinates of the preset calibration line. The coordinates of the endpoint of the preset calibration line are ;according to The angle between the preset calibration line and the first etched line is obtained, i.e., the first rotation angle. Rotation is performed based on the first rotation angle; the visual positioning device 3 can obtain the first rotation position information after rotation, and offset information can be obtained from the first rotation position information. For example, the offset is calculated by selecting the starting point coordinates of the first rotation position information and the starting point coordinates of the preset calibration line, and then... The first offset is obtained; where, Indicates the first rotation angle; The x-coordinate represents the starting point coordinates of the preset calibration coordinates; The ordinate represents the starting point coordinates of the preset calibration coordinates; The x-coordinate represents the coordinates of the endpoint of the preset calibration coordinates; The ordinate represents the coordinates of the endpoint of the preset calibration coordinates; The x-coordinate of the starting point of the first etch line; The ordinate of the starting point of the first etch line; The x-coordinate of the end point of the first etch line; The vertical coordinate of the endpoint of the first etch line; The x-coordinate of the starting point of the first rotation position information; This represents the first offset. After parametrically modeling and mapping the second etched line, it is fitted onto a spatial surface, thus the first target 3D image becomes an image with the 3D second etched line, i.e., the second target 3D image.

[0039] In an optional embodiment of the present invention, step 16, etching the second coated curved solar cell according to the second mirror speed, the second number of etch lines, and the second target three-dimensional image of the galvanometer dynamic focusing device 2 of the curved solar cell film etching system to obtain the second etched curved solar cell, may include: Step 161: Obtain the second platform speed based on the second galvanometer speed and the second number of scribe lines; Step 162: Move the positioning platform 4 according to the speed of the second platform, and the galvanometer dynamic focusing device 2 etches the second coated curved surface solar cell that follows the positioning platform 4 according to the three-dimensional image of the second target to obtain the second etched curved surface solar cell.

[0040] In this embodiment, the second galvanometer speed is the moving speed of the scanning galvanometer 31 in the galvanometer dynamic focusing device 2 during the second etching. Since the second etching requires two passes, i.e., the depth of the second etching is the depth of two layers of film, the second galvanometer speed can be set to half of the normal speed. For the etching process of a curved battery cell 5, the number of the three etching processes needs to be equal. If the number of the first etching lines is set to 15, the number of the second etching lines also needs to be set to 15. According to... and It can be deduced Thus, the second platform speed is obtained; the automatic adjustment system positioning platform 4 moves according to the second platform speed, and the galvanometer dynamic focusing device 2 performs an etching action on the second coated curved surface battery cell placed on the positioning platform 4; wherein... This indicates the operating speed of positioning platform 4 during the second etching process; Indicates the length of the second scribe line; Indicates the time of the second etching; This indicates the galvanometer speed at which the second etch line is formed; This indicates the number of lines etched on a single galvanometer surface for the second etch, i.e., the number of second etch lines.

[0041] In an optional embodiment of the present invention, step 17, coating the second etched curved surface solar cell to obtain a third coated curved surface solar cell, may include: Step 171: Coat the second etched curved surface solar cell with a film to obtain a third coated curved surface solar cell.

[0042] In this embodiment, after the second etching of the second etched curved surface solar cell is completed, the second etched curved surface solar cell will change from a complete solar cell back into a series of sub-cells. In order to perform a third etching, the series of sub-cells need to be coated to make them into a complete third coated curved surface solar cell.

[0043] In an optional embodiment of the present invention, step 18, obtaining the position of the third etched line based on the position offset and rotation of the second etched line, and mapping the surface of the third etched line onto the corresponding position of the second target three-dimensional image to obtain the third target three-dimensional image, may include: Step 181: The position of the second etched line is detected by the visual positioning device 3 of the curved solar cell film etching system to obtain the position information of the second etched line; Step 182: Obtain the second rotation angle based on the position information of the preset calibration line and the second etched line; Step 183: Rotate the second scribe line according to the second rotation angle to obtain the second rotation position information; Step 184: Obtain the second offset based on the preset calibration line and the second rotation position information; Step 185: Obtain the position of the third scribe line based on the second rotation angle and the second offset. Step 186: Perform a geometric transformation on the third scribe line to obtain a three-dimensional third scribe line; the three-dimensional third scribe line is a curve; Step 187: Map the three-dimensional third scribed surface onto the second target three-dimensional image to obtain the third target three-dimensional image.

[0044] In this embodiment, the position of the second etched line is acquired by the visual positioning device 3, and the starting point coordinates of the second etched line are obtained. and endpoint coordinates That is, the position information of the second etched line; the starting point coordinates of the preset calibration line. The coordinates of the endpoint of the preset calibration line are ;according to The angle between the preset calibration line and the second etched line is obtained, i.e., the second rotation angle. Rotation is performed based on the second rotation angle; the visual positioning device 3 can obtain the second rotation position information after rotation, and offset information can be obtained from the second rotation position information. For example, the starting point coordinates of the second rotation position information and the starting point coordinates of the preset calibration line are selected to calculate the offset, based on... The second offset is obtained; where, Indicates the second rotation angle; The x-coordinate represents the starting point coordinates of the preset calibration coordinates; The ordinate represents the starting point coordinates of the preset calibration coordinates; The x-coordinate represents the coordinates of the endpoint of the preset calibration coordinates; The ordinate represents the coordinates of the endpoint of the preset calibration coordinates; This indicates the x-coordinate of the starting point of the second scribe line; This indicates the ordinate of the starting point of the second etch line; Indicates the x-coordinate of the end point of the second etch line; The vertical coordinate of the endpoint of the second etch line; The x-coordinate of the starting point of the second rotation position information; This represents the second offset. After parametric modeling and mapping, the third etched line is fitted onto a spatial surface, thus the second target 3D image becomes an image with the 3D third etched line, i.e., the third target 3D image.

[0045] In an optional embodiment of the present invention, step 19, etching the third coated curved solar cell based on the third mirror speed, the number of third etch lines, and the third target three-dimensional image of the galvanometer dynamic focusing device 2 of the curved solar cell film etching system to obtain the third etched curved solar cell, may include: Step 191: Obtain the third platform speed based on the third galvanometer speed and the number of third scribe lines; Step 192: According to the speed of the third platform, the positioning platform 4 moves, and the galvanometer dynamic focusing device 2 etches the third coated curved surface solar cell that follows the positioning platform 4 according to the three-dimensional image of the third target, so as to obtain the third etched curved surface solar cell.

[0046] In this embodiment, the third galvanometer speed is the moving speed of the scanning galvanometer 31 in the galvanometer dynamic focusing device 2 during the third etching. Since the third etching requires three passes, i.e., the depth of the third etching is the depth of three layers of film, the third galvanometer speed can be set to one-third of the normal speed. For the etching process of a curved battery cell 5, the number of the three etchings needs to be equal. If the number of the first and second etching lines is set to 15, then the number of the third etching lines also needs to be set to 15. According to and It can be deduced Thus, the third platform speed is obtained; the automatic adjustment system positioning platform 4 moves according to the third platform speed, and the galvanometer dynamic focusing device 2 performs an etching action on the third coated curved surface battery cell placed on the positioning platform 4; wherein... This indicates the operating speed of positioning platform 4 during the third etching. Indicates the length of the third scribe line; Indicates the time of the third etching; This indicates the galvanometer speed at which the third etch line is formed; This indicates the number of lines etched on a single galvanometer surface for the third etch line, i.e., the number of third etch lines.

[0047] The proposed method for etching curved solar cell films in this invention, by constructing a curved solar cell film etching system and using a flying marking mode, can easily adapt to large-area curved surface etching, precisely control the etching path, and achieve a simpler, more efficient, more stable, and more precise curved surface etching process.

[0048] like Figure 1 and Figure 2 As shown, embodiments of the present invention also provide a curved solar cell film etching system, comprising: Positioning platform 4; The visual scanning device 1 is placed above the positioning platform 4 and scans the battery cells on the positioning platform 4. A galvanometer dynamic focusing device 2 installed at the bottom of the visual scanning device 1; A visual positioning device 3 is placed in front of the battery cell on the positioning platform 4 to scan and position the battery cell. A control system electrically connected to the visual scanning device 1, the positioning platform 4, the galvanometer dynamic focusing device 2, and the visual positioning device 3; The visual scanning device 1 acquires a three-dimensional scan image of the first coated curved solar cell placed on the positioning platform of the curved solar cell film etching system; The control system maps the first etched surface onto the three-dimensional scanned image to obtain a first target three-dimensional image; etches the first coated curved solar cell according to the first mirror speed, the first number of etched lines, and the first target three-dimensional image of the galvanometer dynamic focusing device 2 of the curved solar cell film etching system to obtain a first etched curved solar cell; coats the first etched curved solar cell to obtain a second coated curved solar cell; determines the position of the second etched line based on the position offset and rotation of the first etched line, maps the second etched surface onto the corresponding position of the first target three-dimensional image to obtain a second target three-dimensional image; and maps the first coated curved surface onto the corresponding position of the first target three-dimensional image according to the second mirror speed, the second number of etched lines, and the second target three-dimensional image of the galvanometer dynamic focusing device 2 of the curved solar cell film etching system to obtain a second target three-dimensional image. The second coated curved solar cell is etched to obtain a second etched curved solar cell; the second etched curved solar cell is coated to obtain a third coated curved solar cell; the position of the third etched line is obtained according to the position offset and rotation of the second etched line, and the curved surface of the third etched line is mapped onto the corresponding position of the second target three-dimensional image to obtain a third target three-dimensional image; the third coated curved solar cell is etched according to the third galvanometer speed, the number of third etched lines, and the third target three-dimensional image of the galvanometer dynamic focusing device 2 of the curved solar cell film etching system to obtain a third etched curved solar cell; wherein, the etching process of the first etched curved solar cell, the second etched curved solar cell, and the third etched curved solar cell adopts the infinite field of view processing function to realize the integrated processing of the solar cell.

[0049] In this embodiment of the present invention, the control system can implement the scheme of any of the above method embodiments and achieve the same technical effect. The curved battery cell 5 is placed on the positioning platform 4 and moves with the positioning platform 4. The galvanometer dynamic focusing device 2 etches the curved battery cell 5 with a laser in the optical path system. The optical path system includes a laser 6 that emits laser light, a reflector 7 that reflects laser light, and a beam expander 8 that adjusts laser light. The laser 6 is an ultrafast laser with a wavelength of infrared, green light, or ultraviolet light. The galvanometer dynamic focusing device 2 includes a scanning galvanometer 31, a focusing objective lens 32, and a dynamic focusing lens 33.

[0050] In this system, the sample is initially positioned on a positioning platform. A three-dimensional image is obtained by scanning the sample using a visual scanning device. The control system obtains the image information and coordinate data, maps the first etched line onto the three-dimensional image, and determines the position of the first etched line. A galvanometer dynamic focusing device performs high-precision zoom etching using the data from the three-dimensional image. After etching the first etched line, the control system determines the position of the first etched line using a visual positioning device and offsets and rotates it on the image to obtain the positions of the second and third etched lines. After the worktable moves to the designated position, the galvanometer dynamic focusing device starts working rapidly to complete the etching of the second and third etched lines. Furthermore, by selecting either online flying marking or offline single-area marking methods, high-precision marking of batteries of varying sizes can be achieved.

[0051] The above are preferred embodiments of the present invention. It should be noted that, for those skilled in the art, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A method for etching a curved solar cell film layer, characterized in that, include: Acquire a three-dimensional scan image of the first coated curved solar cell placed on the positioning platform of the curved solar cell film etching system; The first scribing surface is mapped onto the three-dimensional scanned image to obtain the first target three-dimensional image; The first coated curved solar cell is etched according to the first galvanometer speed, the first number of etch lines and the first target three-dimensional image of the galvanometer dynamic focusing device (2) of the curved solar cell film etching system, to obtain the first etched curved solar cell. The first etched curved surface solar cell is coated to obtain a second coated curved surface solar cell; The position of the second etched line is obtained by offsetting and rotating the position of the first etched line. The surface of the second etched line is then mapped onto the corresponding position of the first target 3D image to obtain the second target 3D image. The second coated curved solar cell is etched according to the second mirror speed, the second number of etch lines and the second target three-dimensional image of the galvanometer dynamic focusing device (2) of the curved solar cell film etching system to obtain the second etched curved solar cell. The second etched curved surface solar cell is coated to obtain a third coated curved surface solar cell; The position of the third etched line is obtained by offsetting and rotating the position of the second etched line. The surface of the third etched line is then mapped onto the corresponding position of the second target three-dimensional image to obtain the third target three-dimensional image. The third coated curved solar cell is etched according to the third mirror speed, the third number of etch lines and the third target three-dimensional image of the galvanometer dynamic focusing device (2) of the curved solar cell film etching system, to obtain the third etched curved solar cell. The etching processes of the first, second, and third etched curved surface solar cells employ an infinite field of view processing function to achieve integrated processing of the solar cells.

2. The method for etching the curved solar cell film layer according to claim 1, characterized in that, Acquire a 3D scan image of the first coated curved solar cell placed on the positioning platform of the curved solar cell film etching system, including: Scan the planar position of each point on the first coated curved battery cell to obtain the horizontal and vertical coordinate data; according to The height change of each point on the first coated curved battery cell is calculated to obtain the vertical coordinate data; where h represents the height of each point on the first coated curved battery cell, i.e., the vertical coordinate data; and d represents the distance between the laser source and the camera. Indicates the laser incident angle; Indicates the camera's receiving angle; A three-dimensional scan image is obtained based on the horizontal coordinate data, the vertical coordinate data, and the vertical axis data.

3. The method for etching curved solar cell film layers according to claim 1, characterized in that, Mapping the first etched surface onto the three-dimensional scanned image yields a first target three-dimensional image, including: A geometric transformation is performed on the first etch line to obtain a three-dimensional first etch line; the three-dimensional first etch line is a curve. The first three-dimensional etched line is mapped onto the three-dimensional scanned image to obtain the first target three-dimensional image.

4. The method for etching the curved solar cell film layer according to claim 1, characterized in that, The first coated curved solar cell is etched according to the first galvanometer speed, the first number of etch lines, and the first target three-dimensional image of the galvanometer dynamic focusing device (2) of the curved solar cell film etching system, to obtain the first etched curved solar cell, including: The first platform speed is obtained based on the speed of the first galvanometer and the number of the first scribe lines; According to the speed of the first platform, the positioning platform (4) moves, and the galvanometer dynamic focusing device (2) etches the first coated curved surface battery cell that moves with the positioning platform (4) according to the three-dimensional image of the first target, so as to obtain the first etched curved surface battery cell. The positioning platform (4) moves along with the etching process and uses the infinite field of view processing function to process the entire battery and obtain the first etched curved surface battery cell.

5. The method for etching the curved solar cell film layer according to claim 1, characterized in that, The position of the second etched line is obtained by offsetting and rotating the first etched line. The surface of the second etched line is mapped onto the corresponding position of the first target 3D image to obtain the second target 3D image, including: The position of the first etched line is detected by the visual positioning device (3) of the curved solar cell film etching system, and the position information of the first etched line is obtained. The first rotation angle is obtained based on the position information of the preset calibration line and the first etched line; The first scribe line is rotated according to the first rotation angle to obtain the first rotation position information; Based on the preset calibration line and the first rotation position information, the first offset is obtained; The position of the second scribe line is obtained based on the first rotation angle and the first offset. A geometric transformation is performed on the second etch line to obtain a three-dimensional second etch line; the three-dimensional second etch line is a curve. The three-dimensional second scribed line is mapped onto the first target three-dimensional image to obtain the second target three-dimensional image.

6. The method for etching the curved solar cell film layer according to claim 5, characterized in that, Based on the position information of the preset calibration line and the first scribe line, the first rotation angle is obtained, including: according to Thus, the first rotation angle is obtained; in, Indicates the first rotation angle; This represents the x-coordinate of the starting point of the preset calibration line; The ordinate of the starting point of the preset calibration line; The x-coordinate of the endpoint of the preset calibration line; The ordinate of the endpoint of the preset calibration line; The x-coordinate of the starting point of the first etched line position information; The ordinate of the starting point of the first etched line position information; The x-coordinate of the endpoint of the first etched line position information; The vertical coordinate represents the endpoint of the first etched line position information.

7. The method for etching the curved solar cell film layer according to claim 5, characterized in that, Based on the preset calibration line and the first rotation position information, the first offset is obtained, including: according to , thus obtaining the first offset; in, Represents the first offset; This represents the x-coordinate of the starting point of the preset calibration line; The x-coordinate represents the starting point in the rotational position information.

8. The method for etching the curved solar cell film layer according to claim 1, characterized in that, The second coated curved solar cell is etched according to the second mirror speed, the second number of etch lines, and the second target three-dimensional image of the galvanometer dynamic focusing device (2) of the curved solar cell film etching system, to obtain the second etched curved solar cell, including: The second platform speed is obtained based on the second galvanometer speed and the second number of scribe lines; According to the second platform speed, the positioning platform (4) moves, and the galvanometer dynamic focusing device (2) etches the second coated curved surface battery cell that moves with the positioning platform (4) according to the three-dimensional image of the second target, so as to obtain the second etched curved surface battery cell; The positioning platform (4) moves along with the etching process and uses the infinite field of view processing function to process the entire battery and obtain the second etched curved surface battery cell.

9. The method for etching the curved solar cell film layer according to claim 1, characterized in that, The position of the third etched line is obtained by offsetting and rotating based on the position of the second etched line. The surface of the third etched line is then mapped onto the corresponding position of the second target 3D image to obtain the third target 3D image, including: The position of the second etched line is detected by the visual positioning device (3) of the curved solar cell film etching system, and the position information of the second etched line is obtained. The second rotation angle is obtained based on the position information of the preset calibration line and the second scribe line; The second scribe line is rotated according to the second rotation angle to obtain the second rotation position information; The second offset is obtained based on the preset calibration line and the second rotation position information; The position of the third scribe line is obtained based on the second rotation angle and the second offset. A geometric transformation is performed on the third scribe line to obtain a three-dimensional third scribe line; the three-dimensional third scribe line is a curve. The three-dimensional third scribe line is mapped onto the second target three-dimensional image to obtain the third target three-dimensional image.

10. A curved solar cell film etching system, characterized in that, include: Positioning platform (4); A visual scanning device (1) is placed above the positioning platform (4) and scans the battery cells on the positioning platform (4). A galvanometer dynamic focusing device (2) installed at the bottom of the visual scanning device (1); A visual positioning device (3) is placed in front of the battery cell on the positioning platform (4) to scan and position the battery cell. A control system electrically connected to the visual scanning device (1), the positioning platform (4), the galvanometer dynamic focusing device (2), and the visual positioning device (3); The visual scanning device (1) acquires a three-dimensional scan image of the first coated curved solar cell placed on the positioning platform of the curved solar cell film etching system; The control system maps the first etched surface onto the three-dimensional scan image to obtain the first target three-dimensional image; the first coated curved solar cell is etched according to the first galvanometer speed, the first number of etched lines and the first target three-dimensional image of the galvanometer dynamic focusing device (2) of the curved solar cell film etching system to obtain the first etched curved solar cell. The first etched curved surface solar cell is coated to obtain a second coated curved surface solar cell; The position of the second etched line is obtained by offsetting and rotating the position of the first etched line. The curved surface of the second etched line is mapped onto the corresponding position of the three-dimensional image of the first target to obtain the three-dimensional image of the second target. The second coated curved solar cell is etched according to the second mirror speed, the number of second etched lines and the three-dimensional image of the second target of the galvanometer dynamic focusing device (2) of the curved solar cell film etching system to obtain the second etched curved solar cell. The second etched curved surface solar cell is coated to obtain a third coated curved surface solar cell; The position of the third etched line is obtained by offsetting and rotating the position of the second etched line. The surface of the third etched line is mapped onto the corresponding position of the second target three-dimensional image to obtain the third target three-dimensional image. The third coated curved solar cell is etched according to the third mirror speed, the number of third etched lines and the third target three-dimensional image of the galvanometer dynamic focusing device (2) of the curved solar cell film etching system to obtain the third etched curved solar cell. The etching process of the first etched curved solar cell, the second etched curved solar cell and the third etched curved solar cell adopts the infinite field of view processing function to realize the integrated processing of the solar cell.

Images