Transparent display device

Abstract

A transparent display device according to an embodiment of the present disclosure includes: a substrate including a display area having a transmissive area and a non-transmissive area in which a plurality of sub-pixels are arranged; a plurality of inorganic film layers, wherein the plurality of inorganic film layers are arranged on the substrate; the outermost side signal line is arranged below the inorganic film layer located on the lowermost side in the inorganic film layers; and a step portion located at an end portion of at least one of the plurality of inorganic film layers, the outermost signal line being disposed at an edge portion of the non-transmissive region, the step portion overlapping the outermost signal line.

Description

[0001] Cross-references to related applications

[0002] This application claims the benefit of Korean Patent Application No. 10-2024-0113087, filed on August 22, 2024, which is incorporated herein by reference as if it were described in its entirety herein. Technical Field

[0003] This disclosure relates to a transparent display device for displaying images. Background Technology

[0004] With the advancement of the information age, the demand for display devices for displaying images has increased in various forms. As a result, various types of display devices have recently been used, such as liquid crystal display (LCD) devices, plasma display panel (PDP) devices, organic light-emitting diode (OLED) devices, and quantum dot light-emitting diode (QLED) devices.

[0005] Recently, research has been actively conducted on transparent display devices that allow users to see objects on the opposite side through the display device.

[0006] A transparent display device may include a display area for displaying images in a substrate, and the display area may include a transmissive area that can transmit external light and a non-transmissive area that does not transmit light.

[0007] Meanwhile, multiple inorganic film layers can be formed in the transmission region of a transparent display device, and considering adhesion to the substrate, at least one of these inorganic film layers may include an inorganic film layer with a different refractive index. However, the total internal reflection caused by the difference in refractive index of the inorganic film layers with different refractive indices reduces the transmittance of the transmission region. Therefore, methods for removing inorganic film layers with different refractive indices are being investigated, but when removing inorganic film layers with different refractive indices, other inorganic film layers formed on them will form a step. When such a step is formed in the transmission region, there is a problem of reduced clarity of objects seen by the user through the transmission region. Summary of the Invention

[0008] This disclosure aims to provide a transparent display device that can improve the clarity of objects displayed to a user through a transmissive area.

[0009] This disclosure aims to provide a transparent display device that can improve the transmittance of the transmission region.

[0010] The present disclosure aims to provide a transparent display device that can reduce overall power consumption.

[0011] The technical effects of this disclosure are not limited to those described above, and those skilled in the art will clearly understand from the following description other effects not mentioned above.

[0012] A transparent display device according to an embodiment of the present disclosure includes: a substrate, the substrate including a display area having a transmissive area and a non-transmissive area, wherein a plurality of sub-pixels are arranged in the non-transmissive area; a plurality of inorganic film layers disposed on the substrate; an outermost signal line disposed below the lowermost inorganic film layer among the plurality of inorganic film layers; and a step portion located at the end of at least one of the plurality of inorganic film layers, wherein the outermost signal line is disposed at the edge of the non-transmissive area, and the step portion overlaps with the outermost signal line. Attached Figure Description

[0013] The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the present disclosure and, together with the description, serve to explain the principles of the disclosure. In the drawings:

[0014] Figure 1 This is a plan view showing a transparent display device according to an embodiment of the present disclosure.

[0015] Figure 2 yes Figure 1 A schematic enlarged view of part A, showing a single pixel.

[0016] Figure 3 It is shown Figure 2 A schematic diagram of multiple lines and protective electrodes.

[0017] Figure 4 It is along Figure 3 The diagram shows a schematic cross-section taken by line I-I'.

[0018] Figure 5 It is along Figure 3 The schematic cross-sectional view taken by line II-II' is shown.

[0019] Figure 6 It is along Figure 3 The schematic cross-sectional view taken by line III-III' is shown.

[0020] Figure 7 It is along Figure 3 The diagram shows a schematic cross-section taken by line IV-IV'.

[0021] Figure 8 This is a schematic cross-sectional view of a transparent display device according to another embodiment of the present disclosure. Detailed Implementation

[0022] Reference will now be made in detail to embodiments of the present disclosure, examples of which are illustrated in the accompanying drawings. Where possible, the same reference numerals will be used throughout the drawings to refer to the same or similar parts. The advantages and features of the present disclosure and methods of implementation thereof will be elucidated by the following embodiments described with reference to the accompanying drawings. However, the present disclosure may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that the present disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art.

[0023] The shapes, dimensions, ratios, angles, and quantities disclosed in the accompanying drawings to describe embodiments of this disclosure are merely examples, and therefore, this disclosure is not limited to the details shown. The same reference numerals always refer to the same elements. In the following description, detailed descriptions of relevant known functions or configurations will be omitted where it is determined that they would unnecessarily obscure the focus of this disclosure.

[0024] Where terms such as “comprising,” “having,” and “including” are used as described in this specification, an additional part may be added unless “only” is used. Unless otherwise stated, singular terms may include plural forms. When interpreting an element, it is interpreted as including a range of tolerances, even if not explicitly stated otherwise.

[0025] When describing positional relationships, for example, when the positional relationship between two parts is described as "above", "over", "below", and "adjacent", one or more other parts can be placed between the two parts, unless "only" or "directly" is used.

[0026] When describing temporal relationships, such as when time sequence is described as “after,” “following,” “next,” and “before,” discontinuous cases may be included unless “only” or “directly” is used.

[0027] It should be understood that although the terms “first,” “second,” etc., may be used in this document to describe various elements, these elements should not be limited by these terms.

[0028] These terms are used only to distinguish one element from another. For example, without departing from the scope of this disclosure, a first element may be referred to as a second element, and similarly, a second element may be referred to as a first element.

[0029] The “X-axis direction,” “Y-axis direction,” and “Z-axis direction” should not be interpreted solely by their geometric relationship of being perpendicular to each other, and the elements of this disclosure can have a wider range of orientations within the scope of their functional effectiveness.

[0030] The term "at least one" should be understood to include any and all combinations of one or more associated listed items. For example, "at least one of the first, second, and third items" means a combination of all items drawn from two or more of the first, second, and third items, as well as the first, second, or third item.

[0031] Features of the various embodiments of this disclosure may be combined or integrated with each other in part or in whole, and as will be fully understood by those skilled in the art, may be interoperable and technically driven differently.

[0032] The embodiments disclosed herein may be implemented independently of each other, or may be implemented together in an interdependent relationship.

[0033] In the following, preferred embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.

[0034] Figure 1 This is a plan view illustrating a transparent display device according to an embodiment of the present disclosure. Figure 2 yes Figure 1 A schematic enlarged view of part A, showing a single pixel. Figure 3 It is shown Figure 2 A schematic diagram of multiple lines and protective electrodes.

[0035] In the following text, the first direction (Y-axis direction) refers to the direction parallel to the data line DL (e.g., Figure 3 The direction shown is the first direction, and the second direction (X-axis direction) is parallel to the gate line GL (as shown). Figure 3 The direction shown is the thickness direction of the transparent display device 100, and the third direction (Z-axis direction) represents the thickness direction of the transparent display device 100.

[0036] The following description is based on the premise that the transparent display device 100 according to one embodiment of the present disclosure is an organic light-emitting display device, but is not limited thereto. That is, the transparent display device according to one embodiment of the present disclosure can be implemented as any one of a liquid crystal display device, a field emission display device, a quantum dot light-emitting diode device, an electrophoretic display device, and an organic light-emitting display device.

[0037] Reference Figures 1 to 3 A transparent display device 100 according to an embodiment of the present disclosure may include a display panel having a gate driver GD, a source driver integrated circuit (hereinafter referred to as "source driver IC") 120, a flexible film 130, a circuit board 140, and a timing controller 150.

[0038] The display panel may include substrates 110 and opposing substrates 200 bonded to each other (e.g., ...). Figure 4 (As shown).

[0039] The substrate 110 may include thin-film transistors, and may be a transistor array substrate, a lower substrate, a base substrate, or a first substrate. The substrate 110 may be a transparent glass substrate or a transparent plastic substrate.

[0040] The opposing substrate 200 can be bonded to the substrate 110 via an adhesive member. For example, the size of the opposing substrate 200 can be smaller than the size of the substrate 110, and the opposing substrate 200 can be bonded to the remaining portion of the substrate 110 except for the pad portion. The opposing substrate 200 can be an upper substrate, a second substrate, or a package substrate.

[0041] The gate driver GD supplies a gate signal to the gate line according to the gate control signal input from the timing controller 150. When the source driver IC 120 is fabricated as a driver chip, the source driver IC 120 can be mounted on the flexible film 130 using a chip-on-film (COF) method or a chip-on-plastic (COP) method.

[0042] For example, power pads and data pads can be formed in the non-display area of ​​the display panel. The flexible film 130 may include lines connecting the pads to the source driver IC 120 and lines connecting the pads to the circuit board 140. The flexible film 130 can be attached to the pads using an anisotropic conductive film, allowing the pads to be connected to the lines on the flexible film 130.

[0043] Reference Figure 1 The substrate 110, according to the example, may include a display area DA and a non-display area NDA.

[0044] The display area DA is the area where an image is displayed, and it can be a pixel array area, an active area, a pixel array unit, a display unit, or a screen. For example, the display area DA can be located in the center of the display panel.

[0045] The example display area DA may include gate lines, data lines, pixel drive power lines, and multiple pixels P (such as...). Figure 2 (As shown). Each of the plurality of pixels P may include a plurality of sub-pixels SP that may be defined by gate lines and data lines, and a transmissive region TA configured to be adjacent to some or all of the plurality of sub-pixels SP. The transmissive region TA is configured to be an area where light can be transmitted through the front and rear surfaces of the display panel. Therefore, a user located in the direction of the front surface of the display panel can view an image through the transmissive region TA or a background located in the direction of the rear surface of the display panel.

[0046] like Figure 2 As shown, the remaining portion of the display area DA, excluding the transmissive area TA, can be the non-transmissive area NTA. The transmissive area TA is the area through which most of the light incident from the outside can pass, and the non-transmissive area NTA is the area through which most of the light incident from the outside cannot pass.

[0047] According to an example, the non-transmissive region NTA may include a light-emitting region EA for each of multiple sub-pixels SP and a region including a black matrix BM between the light-emitting regions EA. Since the region including the black matrix BM is a non-light-emitting region, it can be included in the non-light-emitting region NEA (e.g., ...). Figure 4 (As shown). According to the example, the non-emitting region NEA can be disposed on the substrate 110 between the transmissive region TA and the plurality of sub-pixels SP, and between the plurality of sub-pixels SP.

[0048] Meanwhile, since the non-transmissive region NTA is a region that cannot transmit light, if the dam 115 is set to be a black dam, the area where the black dam is arranged can also be included in the non-transmissive region NTA (or the non-light-emitting region NEA). However, when the dam 115 is a transparent dam, the line or electrode located below the dam (e.g., the second protective electrode PE2) Figure 3 As shown, the light is blocked, so in this case, the area where the wire or electrode (e.g., the second protective electrode PE2) is arranged can be included in the non-transmissive region NTA (or the non-emitting region NEA). Therefore, the user can identify objects or images on the user-opposite side of the substrate 110 only through the transmissive region TA.

[0049] Each of the multiple sub-pixels SP can be defined as the smallest unit that actually emits light.

[0050] According to one example, at least four sub-pixels SP1, SP2, SP3, and SP4, which are configured to emit light of different colors and are arranged adjacent to each other, together with a transmissive region TA, constitute a unit pixel P. The transmissive region TA included in the unit pixel can be divided into multiple regions.

[0051] A unit pixel may include, but is not limited to, a red sub-pixel, a green sub-pixel, a blue sub-pixel, a white sub-pixel, and a transmissive region TA. According to another example, three sub-pixels of a plurality of sub-pixels SP that are configured to emit light of different colors and are arranged adjacent to each other, together with a transmissive region TA, constitute a unit pixel. A unit pixel may include, but is not limited to, at least one red sub-pixel, at least one green sub-pixel, at least one blue sub-pixel, and a transmissive region TA. Hereinafter, an example will be described of a transparent display device 100 according to an embodiment of the present disclosure, in which a unit pixel P includes four sub-pixels SP1, SP2, SP3, SP4, and a transmissive region TA.

[0052] Each of the multiple sub-pixels SP may include a thin-film transistor and a light-emitting element connected to the thin-film transistor. The sub-pixel may include a light-emitting layer (or an organic light-emitting layer) interposed between a first electrode and a second electrode.

[0053] The emissive layers in each of the multiple sub-pixels SP1, SP2, SP3, and SP4 can individually emit light of different colors, or they can collectively emit white light. According to one example, when the emissive layers of each of the multiple sub-pixels SP collectively emit white light, each of the red, green, and blue sub-pixels can include a color filter (or wavelength conversion component) for converting white light into different colors. In this case, the white sub-pixel, according to one example, may not include a color filter. According to one example, the color filter CF can include a green color filter CF1, a blue color filter CF2, and a red color filter CF3.

[0054] In a transparent display device 100 according to an embodiment of the present disclosure, the area provided with a green color filter CF1 can be a green sub-pixel SP1, the area provided with a blue color filter CF2 can be a blue sub-pixel SP3, the area provided with a red color filter CF3 can be a red sub-pixel SP4, and the area without a color filter can be a white sub-pixel SP2. In this disclosure, the green sub-pixel SP1 can be described as a first sub-pixel emitting green light, the blue sub-pixel SP3 can be described as a third sub-pixel emitting blue light, the red sub-pixel SP4 can be described as a fourth sub-pixel emitting red light, and the white sub-pixel SP2 can be described as a second sub-pixel emitting white light.

[0055] Therefore, a transparent display device 100 according to an embodiment of the present disclosure may include a plurality of sub-pixels SP, the plurality of sub-pixels SP including a plurality of colored sub-pixels and a white sub-pixel SP2. According to one example, the plurality of colored sub-pixels may include a first sub-pixel SP1 as a green sub-pixel, a third sub-pixel SP3 as a blue sub-pixel, and a fourth sub-pixel SP4 as a red sub-pixel.

[0056] When a gate signal is input from the gate line using a thin-film transistor, each of the multiple sub-pixels SP supplies a predetermined current to the organic light-emitting element according to the data voltage of the data line. Therefore, the light-emitting layer of each sub-pixel can emit light with a predetermined brightness according to the predetermined current.

[0057] like Figure 1 As shown, in the display area DA, multiple pixels P and multiple lines for driving each of the multiple pixels P can be set. According to one example, the multiple lines may include multiple first signal lines SL1 and multiple second signal lines SL2.

[0058] Multiple first signal lines SL1 may extend along a second direction (X-axis direction). Each of the multiple first signal lines SL1 may include at least one scan line (or gate line).

[0059] In the following text, when the first signal line SL1 comprises multiple lines, one first signal line SL1 may refer to a signal line group consisting of multiple lines. For example, when the first signal line SL1 comprises two scan lines, one first signal line SL1 may refer to a signal line group consisting of two scan lines.

[0060] Multiple second signal lines SL2 may extend along a first direction (Y-axis direction). The multiple second signal lines SL2 may intersect with multiple first signal lines SL1. Each of the multiple second signal lines SL2 may include a pixel power line EVDD and a common power line EVSS spaced apart from the pixel power line EVDD. In an embodiment, the multiple second signal lines SL2 may further include a reference line RL and multiple data lines DL. The multiple data lines DL may include a first data line DL1 for driving a first sub-pixel SP1, a second data line DL2 for driving a second sub-pixel SP2, a third data line DL3 for driving a third sub-pixel SP3, and a fourth data line DL4 for driving a fourth sub-pixel SP4.

[0061] In the following text, when the second signal line SL2 comprises multiple lines, one second signal line SL2 may refer to a signal line group consisting of multiple lines. For example, when the second signal line SL2 comprises a pixel power line, a common power line, a reference line, and four data lines, one second signal line SL2 may refer to a signal line group consisting of the pixel power line, the common power line, the reference line, and the four data lines.

[0062] At least one transmission region TA can be provided between adjacent first signal lines SL1. Furthermore, at least one transmission region TA can be provided between adjacent second signal lines SL2. That is, the transmission region TA can be arranged adjacent to at least one first signal line SL1 and at least one second signal line SL2. However, it is not limited to this; depending on the wiring arrangement, such as… Figure 3 As shown, the first signal line SL1 (or gate line GL) can be configured to intersect the transmission region TA in the second direction (X-axis direction).

[0063] Return to reference Figure 1 The non-display area NDA is the area where no image is displayed, and can be a peripheral circuit area, signal supply area, invalid area, or border area. The non-display area NDA can be configured to be near the display area DA. That is, the non-display area NDA can be set to surround the display area DA.

[0064] A transparent display device 100 according to an embodiment of the present disclosure may include a pad portion PA disposed in a non-display area NDA. The pad portion PA can be used to drive a plurality of pixels P. For example, the pad portion PA can supply power and / or signals to the plurality of pixels P disposed in the display area DA to output an image. The non-display area NDA may include a first non-display area NDA1, a second non-display area NDA2, a third non-display area NDA3, and a fourth non-display area NDA4. According to one example, the pad portion PA may be disposed in the first non-display area NDA1.

[0065] The gate driver GD supplies gate signals to the gate lines according to the gate control signal input from the timing controller 150. The gate driver GD can be formed on one side of the display area DA of the display panel using an in-panel gate (GIP) method, or on a non-display area NDA other than the two sides of the display area DA, such as... Figure 1 As shown. Alternatively, the gate driver GD can be manufactured as a driver chip, mounted on a flexible film, and attached to a non-display area NDA outside one or both sides of the display area DA of the display panel via a tape auto-bonding (TAB) method.

[0066] Multiple gate drivers GD can be respectively disposed to the left of the display area DA (i.e., the second non-display area NDA2) and to the right of the display area DA (i.e., the third non-display area NDA3). According to one example, the multiple gate drivers GD can be connected to multiple pixels P and multiple first signal lines SL1 to supply signals to the multiple pixels P. The multiple first signal lines SL1 may include at least one signal line for supplying signals to drive the pixels P.

[0067] Multiple second signal lines SL2 may extend along a first direction (Y-axis direction). The multiple second signal lines SL2 may intersect with multiple first signal lines SL1. The multiple second signal lines SL2 may include a pixel power line EVDD and at least one data line supplying data voltage to pixel P. Each of the multiple second signal lines SL2 may be connected to at least one of multiple pads, a pixel power short bar VDDB, and a common power short bar VSSB. The pixel power short bar VDDB and the common power short bar VSSB may be located in a fourth non-display area NDA4, positioned based on the display area DA facing the pad portion PA.

[0068] A pixel is configured to overlap with at least one of a first signal line SL1 and a second signal line SL2 and emits predetermined light to display an image. The emitting region EA may correspond to the emitting region in pixel P.

[0069] Each of the green subpixel SP1 (or first subpixel SP1), white subpixel SP2 (or second subpixel SP2), blue subpixel SP3 (or third subpixel SP3), and red subpixel SP4 (or fourth subpixel SP4) may include at least one or more light-emitting regions. At least one light-emitting region of each of the subpixels SP1, SP2, SP3, and SP4 may have the same shape and size, but is not limited thereto.

[0070] The non-emitting area (NEA) can refer to an area within the display area (DA) that does not emit light, and because it does not emit light, it can be described as a dead zone. According to one example, a dead zone can be an area with a black matrix and / or a dam, but is not limited to this, and can refer to an area that does not emit light at all.

[0071] The non-light-emitting area (NEA) can have multiple wirings, such as a first signal line SL1 and a second signal line SL2. According to the example, the first signal line SL1 may include a gate line GL extending along a second direction (X-axis direction). According to the example, the second signal line SL2 may include a pixel power line EVDD, a common power line EVSS, a reference line RL, and multiple data lines DL extending along a first direction (Y-axis direction).

[0072] A transparent display device 100 according to an embodiment of the present disclosure may include a plurality of protective electrodes PE that partially overlap with one of a plurality of lines (e.g., a pixel power line EVDD (or common power line EVSS) that is the outermost edge of a non-transparent region NTA). The plurality of protective electrodes PE are provided to protect the pixel power line EVDD (or common power line EVSS) from the effects of etching materials that etch at least one of a plurality of inorganic film layers. This will be referred to later. Figure 4 and Figure 6 Describe it.

[0073] In the following text, reference will be made to Figures 4 to 7 A transparent display device 100 according to an embodiment of the present disclosure will be described in more detail.

[0074] Figure 4 It is along Figure 3 The diagram shows a schematic cross-section taken by line I-I'. Figure 5 It is along Figure 3 The schematic cross-sectional view taken by line II-II' is shown. Figure 6 It is along Figure 3 The schematic cross-sectional view taken by line III-III' shown. Figure 7 It is along Figure 3 The diagram shows a schematic cross-section taken by line IV-IV'.

[0075] Reference Figure 4A transparent display device 100 according to an embodiment of the present disclosure may include: a substrate 110 including a display area DA having a transmissive area TA and a non-transmissive area NTA, wherein a plurality of sub-pixels SP1, SP2, SP3 and SP4 are arranged in the non-transmissive area NTA; a plurality of inorganic film layers 111 disposed on the substrate 110; an outermost signal line disposed below the lowermost inorganic film layer among the plurality of inorganic film layers 111; and a step portion STP located at the end of at least one of the plurality of inorganic film layers 111. The outermost signal line may be disposed at the edge of the non-transmissive area NTA. Furthermore, the step portion STP may overlap with the outermost signal line. Here, the outermost signal line may refer to the pixel power line EVDD and / or the common power line EVSS. The edge of the non-transmissive area NTA where the outermost signal line is disposed may refer to the edge of the non-light-emitting area NEA (e.g., Figure 3 (As shown). Meanwhile, the outermost signal line can refer to a signal line, but is not limited to this; it can also refer to a power line. Therefore, in this disclosure, the outermost signal line can also be referred to as the outermost wiring.

[0076] Multiple inorganic film layers 111 are disposed between the substrate 110 and the light-emitting element layer E to prevent moisture and oxygen from penetrating into the light-emitting element layer E. In addition, at least one of the multiple inorganic film layers 111 may be disposed between the metal (or the outermost signal line) and another inorganic film layer to compensate for the weak adhesion between the metal (or the outermost signal line) and another inorganic film layer.

[0077] For example, since the adhesion between the copper (Cu) metal (or the outermost signal line) and the SiO2 inorganic film is poor, a SiN-containing layer can be placed between the metal (or the outermost signal line) and the SiO2 inorganic film. x The inorganic film layer. Therefore, the plurality of inorganic film layers 111 may include SiN. x The inorganic film layer (or the first inorganic film layer 111a) and the inorganic film layer containing SiO2 (or the second inorganic film layer 111b).

[0078] As described above, containing SiN x The inorganic film layer (or the first inorganic film layer 111a) is designed to increase the adhesion between the SiO2-containing inorganic film layer (or the second inorganic film layer 111b) and the metal (or the outermost signal line), so it can be located between the SiO2-containing inorganic film layer (or the second inorganic film layer 111b) and the metal (or the outermost signal line). Therefore, the metal (or the outermost signal line), containing SiN... x An inorganic film layer (or the first inorganic film layer 111a) and an inorganic film layer containing SiO2 (or the second inorganic film layer 111b) can be sequentially stacked on the substrate 110.

[0079] Therefore, in a transparent display device 100 according to an embodiment of the present disclosure, the lowest inorganic film layer among the plurality of inorganic film layers 111 may contain SiN. x An inorganic film layer (or a first inorganic film layer 111a). For example, containing SiN. x The inorganic film layer (or the first inorganic film layer 111a) can be a first buffer layer. Furthermore, the inorganic film layer containing SiO2 (or the second inorganic film layer 111b) can be a second buffer layer. Figure 4 As shown, the second inorganic film layer 111b is disposed on the first inorganic film layer 111a, and may include a portion that is thicker than the first inorganic film layer 111a. Therefore, the second inorganic film layer 111b can flatten the uneven structure of the first inorganic film layer 111a.

[0080] At the same time, due to the presence of SiN x The inorganic film layer (or the first inorganic film layer 111a) is made of a different material than the inorganic film layer containing SiO2 (or the second inorganic film layer 111b), therefore their refractive indices may differ from each other. Thus, in the case of SiN... x Total internal reflection may occur at the interface between the inorganic film layer (or the first inorganic film layer 111a) and the inorganic film layer containing SiO2 (or the second inorganic film layer 111b), which may lead to a decrease in the transmittance (or transparency) of the transparent display device. Therefore, in the case of conventional transparent display devices, removing the SiN-containing inorganic film layer... x Inorganic films are used to improve transparency, but when SiN-containing films are removed... x When forming an inorganic film layer, it is placed in a substrate containing SiN. x Steps (or film steps) can form in other inorganic films on top of an inorganic film layer, which may increase haze values. For example, when SiN-containing films are formed in the transmission region... x When there are steps (or thin film steps) in the inorganic film layer, light from an object or image passing through the transmission area may be diffracted by these steps (or thin film steps), thereby increasing the haze value. Therefore, in the case of conventional transparent display devices, the sharpness of objects or images may be reduced due to the steps (or thin film steps) formed in the transmission area.

[0081] Conversely, a transparent display device 100 according to an embodiment of the present disclosure may be configured such that a step portion STP, from which at least one of the plurality of inorganic film layers 111 has been removed, overlaps with the outermost signal line (pixel power line EVDD or common power line EVSS) arranged in the non-transmissive region NTA (or the edge of the non-transmissive region NTA).

[0082] For example, a transparent display device 100 according to an embodiment of the present disclosure may include a stepped portion STP, which removes SiN-containing material. xThe first inorganic film layer 111a and the second inorganic film layer 111b containing SiO2 are used to improve transmittance (or transparency). The stepped portion STP can be set on the outermost signal line (pixel power line EVDD or common power line EVSS) in the non-transmissive region NTA (or the edge of the non-transmissive region NTA). Therefore, as Figure 4 As shown, the stepped STP can overlap with the outermost signal line (or pixel power line EVDD) in the third direction (Z-axis direction), and as... Figure 6 As shown, the stepped portion STP can overlap with the outermost signal line (or common power line EVSS) in the third direction (Z-axis direction). According to one embodiment of this disclosure, the transparent display device 100 is configured such that the stepped portion STP overlaps with the outermost signal line (pixel power line EVDD or common power line EVSS), thereby reducing haze and further improving clarity compared to conventional transparent display devices where the stepped portion is arranged in the transmissive area.

[0083] In a transparent display device 100 according to one embodiment of the present disclosure, the stepped portion STP may be formed by a first inorganic film layer 111a and a second inorganic film layer 111b. However, it is not limited thereto, and the stepped portion STP may be formed only by the first inorganic film layer 111a. Hereinafter, an example of the stepped portion STP being formed by the first inorganic film layer 111a and the second inorganic film layer 111b will be described.

[0084] According to one example, a second inorganic film layer 111b is disposed on a first inorganic film layer 111a and may have a different refractive index than the first inorganic film layer 111a. For example, the first inorganic film layer 111a may contain SiN. x The first buffer layer. The second inorganic film layer 111b may be a second buffer layer containing SiO2.

[0085] According to one embodiment of the present disclosure, the transparent display device 100 is configured such that a first inorganic film layer 111a and a second inorganic film layer 111b with different refractive indices are not disposed in the transmissive region TA, but overlap only in the non-transmissive region NTA, thereby preventing multiple inorganic film layers with different refractive indices from being disposed in the transmissive region, thereby improving transmittance (or transparency). Furthermore, in the transparent display device 100 according to one embodiment of the present disclosure, a stepped portion STP formed by removing the first inorganic film layer 111a and the second inorganic film layer 111b with different refractive indices is arranged on the outermost signal line (pixel power line EVDD or common power line EVSS) in the non-transmissive region NTA (or the edge of the non-transmissive region NTA), such that the outermost signal line (pixel power line EVDD or common power line EVSS) can prevent light from an object or image from incident into the interior of the substrate 110, thereby preventing diffraction. Therefore, due to the reduction in haze value, the transparent display device 100 according to one embodiment of the present disclosure can have improved clarity (purity).

[0086] Reference Figure 4 In a transparent display device 100 according to an embodiment of the present disclosure, a first inorganic film layer 111a may contact the upper surface of the substrate 110 in the non-transmissive region NTA and partially cover the outermost signal line (hereinafter, the pixel power line EVDD will be described as an example).

[0087] As described above, in a transparent display device 100 according to an embodiment of the present disclosure, the first inorganic film layer 111a comprises SiN. x Therefore, it can be placed only in the non-transmissive region NTA to increase transmittance. Furthermore, since the first inorganic film layer 111a contains SiN... x Therefore, it can be placed between the second inorganic film layer 111b containing SiO2 and multiple lines (e.g., the outermost signal line (pixel power line EVDD)) to increase the adhesion strength. Thus, the second inorganic film layer 111b can be attached to the multiple lines (e.g., the outermost signal line (pixel power line EVDD)) through the first inorganic film layer 111a, and thus the adhesion strength between the second inorganic film layer 111b and the multiple lines (e.g., the outermost signal line (pixel power line EVDD)) can be enhanced.

[0088] like Figure 4 As shown, the first inorganic film layer 111a is arranged as a common layer in the non-transmissive region NTA between the second inorganic film layer 111b and the multiple lines and covers each of the multiple lines, such that it can partially cover the outermost signal line (e.g., pixel power line EVDD) located at the outermost part of the multiple lines in the non-transmissive region NTA and contact the upper surface of the substrate 110 located in the non-transmissive region NTA.

[0089] Meanwhile, since the stepped portion STP is arranged on the outermost signal line (e.g., pixel power line EVDD), a portion of the outermost signal line (e.g., pixel power line EVDD) can be configured not to be covered by the first inorganic film layer 111a and the second inorganic film layer 111b. Therefore, a portion of the outermost signal line (e.g., pixel power line EVDD) may be exposed to the etching material of other inorganic film layers formed in subsequent processes, which may lead to damage to the outermost signal line (e.g., pixel power line EVDD). Therefore, in a transparent display device 100 according to an embodiment of this disclosure, the substrate 110 may further include a plurality of protective electrodes PE for protecting the outermost signal line (e.g., pixel power line EVDD).

[0090] According to one example, multiple protective electrodes PE are used to protect the outermost signal lines (e.g., pixel power lines EVDD) from the etchant materials that etch the inorganic film layer. Therefore, as... Figure 4 As shown, each of the plurality of protection electrodes PE can be configured to cover the portion of the outermost signal line (e.g., pixel power line EVDD) not covered by the first inorganic film layer 111a and the second inorganic film layer 111b, as well as the step portion STP. The step portion STP can be a part of the first inorganic film layer 111a and a part of the second inorganic film layer 111b. Furthermore, a portion of the outermost signal line (e.g., pixel power line EVDD) can be the end of the outermost signal line adjacent to the transmission region TA. Additionally, each of the plurality of protection electrodes can be configured to cover a gate insulating film layer 111c configured as an island on the second inorganic film layer 111b. Therefore, each of the plurality of protection electrodes PE can be configured in a stepped manner and can contact the upper surface of the substrate 110, a portion and side of the upper surface of the outermost signal line (e.g., pixel power line EVDD), the side of the first inorganic film layer 111a, the side of the second inorganic film layer 111b, and the side and upper surface of the gate insulating film layer 111c. Therefore, as Figure 4 As shown, each of the plurality of protective electrodes PE covering the stepped portion STP may have a step. According to one example, each of the plurality of protective electrodes PE may be made of the same material as the outermost signal line (e.g., pixel power line EVDD) to enhance adhesion to the outermost signal line (e.g., pixel power line EVDD). For example, each of the plurality of protective electrodes PE may be made of a metallic material. Figure 4 As shown, in a transparent display device 100 according to an embodiment of the present disclosure, at least one of a plurality of protective electrodes PE may overlap with a black matrix BM.

[0091] Meanwhile, an island-shaped gate insulating film layer 111c is arranged adjacent to the step portion STP on the upper surface of the second inorganic film layer 111b, and can therefore be described as a step portion insulating film layer. Conversely, an island-shaped gate insulating film layer 111c is arranged adjacent to the active layer 112a on the upper surface of the active layer 112a of the thin film transistor 112, and can therefore be described as an active layer insulating film layer.

[0092] In a transparent display device 100 according to an embodiment of the present disclosure, a plurality of protection electrodes PE can be formed together when forming the gate line GL. Therefore, the transparent display device 100 according to an embodiment of the present disclosure can form a plurality of protection electrodes PE for protecting the outermost signal line (e.g., pixel power line EVDD) without adding a separate process. Since the plurality of protection electrodes PE are formed together with the gate line GL, they can be formed in the same layer as the gate line GL. For example, the plurality of protection electrodes PE can be disposed on the gate insulating film layer 111c. Furthermore, since the plurality of protection electrodes PE are formed together with the gate line GL, the plurality of protection electrodes PE can be formed of the same material as the gate line GL.

[0093] At the same time, such as Figure 3 As shown, the outermost signal line (e.g., pixel power line EVDD) can be arranged in an elongated shape in the first direction (Y-axis direction). This is to apply a voltage to each of the plurality of pixels P (or plurality of sub-pixels SP) arranged adjacent to each other in the first direction (Y-axis direction). Therefore, each of the plurality of guard electrodes PE used to cover a portion of the outermost signal line (e.g., pixel power line EVDD) can be electrically connected to the outermost signal line (e.g., pixel power line EVDD) while being arranged in an elongated shape in the non-transmissive region NTA along the first direction (Y-axis direction).

[0094] A transparent display device 100 according to an embodiment of the present disclosure is provided with a plurality of protective electrodes PE to partially cover the outermost signal line (e.g., pixel power line EVDD), thereby protecting the outermost signal line (e.g., pixel power line EVDD) from the effects of etching materials of the inorganic film layer. Furthermore, the transparent display device 100 according to an embodiment of the present disclosure is configured such that the plurality of protective electrodes PE are electrically connected to the outermost signal line (e.g., pixel power line EVDD), so that the plurality of protective electrodes PE can be used as auxiliary electrodes. Therefore, the transparent display device 100 according to an embodiment of the present disclosure can prevent voltage reduction (or drop) applied to the plurality of pixels P (or the plurality of sub-pixels SP) through the outermost signal line (e.g., pixel power line EVDD).

[0095] In conventional transparent display devices, a voltage drop may occur when the voltage supplied from the edge of the display panel is applied to the center of the panel. Therefore, conventional transparent display devices suffer from uneven image brightness emanating from the edge and center of the display panel. Furthermore, since conventional large-area transparent display devices must drive the display panel with high power to address this uneven image brightness issue, overall power consumption is increased.

[0096] However, since the transparent display device 100 according to one embodiment of the present disclosure is configured such that a plurality of protection electrodes PE are connected to the outermost signal lines (e.g., pixel power line EVDD and / or common power line EVSS), the plurality of protection electrodes PE can be used as auxiliary electrodes (or auxiliary lines), thereby preventing voltage drop in the center of the display panel. Therefore, the transparent display device 100 according to one embodiment of the present disclosure can make the brightness of the edge and center of the display panel uniform.

[0097] Furthermore, the transparent display device 100 according to one embodiment of the present disclosure is configured such that a plurality of protection electrodes PE are connected to the outermost signal line (e.g., pixel power line EVDD and / or common power line EVSS), thereby preventing voltage drop in the center of the display panel and thus enabling uniform brightness at the edges and center of the display panel with low power, thereby reducing overall power consumption.

[0098] Refer again Figure 3 In a transparent display device 100 according to an embodiment of the present disclosure, the substrate 110 may further include gate lines GL (or scan lines GL) arranged along a second direction (X-axis direction) intersecting the first direction (Y-axis direction).

[0099] like Figure 3 As shown, the gate line GL (or scan line GL) can be arranged along a direction (second direction (X-axis direction)) that intersects with the outermost signal line (e.g., pixel power line EVDD and / or common power line EVSS). According to one example, the gate line GL (or scan line GL) can be square to apply a gate voltage (or gate signal) to each of the first sub-pixel SP1, the second sub-pixel SP2, the third sub-pixel SP3, and the fourth sub-pixel SP4, but is not necessarily limited to this.

[0100] The gate line GL (or scan line GL) can be applied with a voltage (or signal) different from that applied to the outermost signal line (e.g., pixel power line EVDD and / or common power line EVSS). As described above, each of the plurality of guard electrodes PE is electrically connected to the outermost signal line (e.g., pixel power line EVDD and / or common power line EVSS), and therefore can be not electrically connected to the gate line GL (or scan line GL) that applies a different voltage (or signal) to the outermost signal line (e.g., pixel power line EVDD and / or common power line EVSS). Therefore, each of the plurality of guard electrodes PE can be configured with a structure (or a discontinuous structure) based on the non-connection of the gate line GL (or scan line GL). Thus, as Figure 3 As shown, each of the multiple protective electrodes PE can be configured as an island shape that is not connected in the first direction (Y-axis direction). Figure 3 As shown, each of the plurality of protection electrodes PE can be arranged to be spaced apart from the gate line GL. For example, each of the plurality of protection electrodes PE can be arranged to be spaced apart from the gate line GL in a first direction (Y-axis direction).

[0101] At the same time, such as Figure 3 As shown, the gate line GL may include a closed-loop structure that partially overlaps with the outermost signal line (e.g., pixel power line EVDD). As described above, since each of the plurality of guard electrodes PE can be arranged to be spaced apart from the gate line GL in a first direction (Y-axis direction), the plurality of guard electrodes PE may not be formed on the outermost signal line (e.g., pixel power line EVDD and / or common power line EVSS) that overlaps with the closed-loop structure.

[0102] According to one example, multiple protective electrodes PE may include a first protective electrode PE1 and a second protective electrode PE2.

[0103] According to one example, a first protective electrode PE1 can be disposed between multiple color sub-pixels and a transmissive region TA. For example, the first protective electrode PE1 can be disposed between a first sub-pixel SP1 (which is a green sub-pixel or the light-emitting region EA of the first sub-pixel SP1) and the transmissive region TA. According to the example, a second protective electrode PE2 can be disposed between a white sub-pixel SP2 and the transmissive region TA.

[0104] Meanwhile, in a transparent display device 100 according to an embodiment of the present disclosure, the substrate 110 may further include a black matrix BM disposed between a plurality of sub-pixels SP. The black matrix BM is designed to prevent light from emitting from the light-emitting sub-pixels to the non-light-emitting sub-pixels. Therefore, the black matrix BM may be disposed between a plurality of sub-pixels SP and may be disposed adjacent to the light-emitting region EA of each of the plurality of sub-pixels SP.

[0105] Furthermore, the black matrix BM can be located between multiple sub-pixels SP and the transmission region TA. In one example, the black matrix BM can be located between each of the multiple colored sub-pixels SP1, SP3, and SP4 and the transmission region TA. However, the black matrix BM may not be located between the transmission region TA and the second sub-pixel SP2, which is a white sub-pixel. Since the second sub-pixel SP2 is set to emit white light, no color filter is set. If there is no black matrix BM between the second sub-pixel SP2 and the transmission region TA, the width TW1 of the transmission region TA adjacent to the second sub-pixel SP2 can be formed to be relatively larger than the width TW2 of the transmission region TA adjacent to other colored sub-pixels SP. For example, the width TW1 of the transmission region TA adjacent to the second sub-pixel SP2, which is a white sub-pixel, can be set to be larger than the width TW2 of the transmission region TA adjacent to the fourth sub-pixel SP4, which is a red sub-pixel.

[0106] Therefore, since the transparent display device 100 according to an embodiment of the present disclosure does not have a black matrix BM between the transmissive region TA and the second sub-pixel SP2, which is a white sub-pixel, the transmittance (or transparency) can be increased due to the increase in the area of ​​the transmissive region TA adjacent to the second sub-pixel SP2.

[0107] Refer again Figure 4 The stepped portion STP can be superimposed on the black matrix BM. As described above, since the black matrix BM is located between multiple color sub-pixels and the transmissive region TA, the black matrix BM can partially overlap with the outermost signal line (e.g., pixel power line EVDD), which is the outermost edge of the non-transmissive region NTA. Therefore, the stepped portion STP on the outermost signal line (e.g., pixel power line EVDD) can overlap with the black matrix BM. Therefore, the transparent display device 100 according to an embodiment of the present disclosure is configured such that the stepped portion STP double overlaps with the outermost signal line (e.g., pixel power line EVDD) and the black matrix BM, thereby maximally preventing diffraction phenomena and maximally improving the clarity of objects or images displayed to the user through the transmissive region TA.

[0108] Meanwhile, in a transparent display device 100 according to an embodiment of the present disclosure, the first protective electrode PE1 may be disposed spaced apart from the transmissive region TA. For example... Figure 4 As shown, the black matrix BM can be arranged between the transmissive region TA and the first sub-pixel SP1, which is a color sub-pixel. The black matrix BM can be formed to protrude further toward the transmissive region TA than the first protective electrode PE1, making the first protective electrode PE1 invisible to the user. Therefore, a transparent display device 100 according to an embodiment of the present disclosure may include a structural feature in which the first protective electrode PE1 is arranged spaced apart from the transmissive region TA.

[0109] Conversely, in a transparent display device 100 according to an embodiment of the present disclosure, the second protective electrode PE2 may be arranged adjacent to the transmissive region TA. For example... Figure 6 As shown, the black matrix BM may not be positioned between the transmissive region TA and the second sub-pixel SP2, which is a white sub-pixel, to improve transmittance. Therefore, a transparent display device 100 according to an embodiment of this disclosure may include a structural feature where the second protective electrode PE2 is arranged adjacent to the transmissive region TA. Therefore, as... Figure 3 As shown in the plan view, the second protective electrode PE2 can be arranged between the second sub-pixel SP2 and the transmission region TA.

[0110] In the following text, refer to Figure 4 The structure of each of the multiple sub-pixels SP will be described in detail.

[0111] Reference Figure 4 A transparent display device 100 according to an embodiment of the present disclosure may include a plurality of inorganic film layers 111, thin film transistors 112, planarization layers 113, pixel electrodes 114, diaphragms 115, organic light-emitting layers 116, counter electrodes 117, filling layers 118, upper organic film layers 119, color filters CF and black matrix BM.

[0112] According to one example, the plurality of inorganic film layers 111 may include a first inorganic film layer 111a, a second inorganic film layer 111b, a gate insulating layer 111c, a third inorganic film layer 111d, and a fourth inorganic film layer 111e.

[0113] A first inorganic film layer 111a may be disposed between the substrate 110 and the second inorganic film layer 111b. According to one example, the first inorganic film layer 111a may be configured to cover all or part of each of a plurality of lines. The first inorganic film layer 111a may contain SiN. x The first inorganic membrane layer 111a can be a first buffer layer.

[0114] A second inorganic film layer 111b may be disposed on the first inorganic film layer 111a. According to one example, the second inorganic film layer 111b may have a different refractive index than the first inorganic film layer 111a. The second inorganic film layer 111b may contain SiO2. The second inorganic film layer 111b may be a second buffer layer.

[0115] A gate insulating layer 111c can be disposed on the second inorganic film layer 111b. The gate insulating layer 111c is used to insulate the active layer 112a of the thin-film transistor 112 from the gate 112b. The gate insulating layer 111c formed on the step portion STP can be formed together with the gate insulating layer 111c of the thin-film transistor 112. Figure 4As shown, the gate insulating layer 111c can be configured as an island on the thin film transistor 112 and / or the stepped portion STP.

[0116] A first inorganic film layer 111a and a second inorganic film layer 111b can be formed between the substrate 110 and the gate insulating layer 111c to protect the thin-film transistor 112. A transparent display device 100 according to an embodiment of this disclosure may have a first inorganic film layer 111a and a second inorganic film layer 111b partially disposed on one side (or the front side) of the substrate 110 in the non-transmittent region NTA to improve the transmittance of the transmissive region TA. An outermost signal line (e.g., a pixel power line EVDD) for pixel driving can be arranged between the first inorganic film layer 111a and the substrate 110. The outermost signal line (e.g., the pixel power line EVDD) can be arranged to be spaced apart from the thin-film transistor 112 and partially overlap with the dam 115. Figure 5 As shown, a reference line RL may also be provided between the first inorganic film layer 111a and the substrate 110. The reference line RL may be located in the non-light-emitting region NEA (or the non-transmissive region NTA) that does not overlap with the light-emitting region EA. The first inorganic film layer 111a and the second inorganic film layer 111b may also serve to prevent the material contained in the substrate 110 from diffusing into the transistor layer during the high-temperature process in the manufacturing process of the thin-film transistor.

[0117] The third inorganic film layer 111d can be disposed on the second inorganic film layer 111b. According to one example, the third inorganic film layer 111d can be disposed below the source electrode 112c and the drain electrode 112d. The third inorganic film layer 111d can be an interlayer insulating film.

[0118] A fourth inorganic film layer 111e can be disposed on the third inorganic film layer 111d. According to one example, the fourth inorganic film layer 111e can be configured to cover both the source electrode 112c and the drain electrode 112d. The fourth inorganic film layer 111e can be disposed as a common layer beneath the planarization layer 113, thereby protecting the light-emitting element from moisture and oxygen. The fourth inorganic film layer 111e can be a passivation film.

[0119] Thin-film transistors 112 for driving sub-pixels SP can be arranged on multiple inorganic film layers 111. These multiple inorganic film layers 111 can also be described as circuit element layers. Pixel electrodes 114, organic light-emitting layers 116, and counter electrodes 117 arranged on planarization layer 113 can be included in the light-emitting element layer E.

[0120] The thin-film transistor 112 (or driving transistor) according to the example may include an active layer 112a, a gate 112b, a source 112c, and a drain 112d.

[0121] The active layer 112a may include a channel region, a drain region, and a source region in the thin-film transistor region of the circuit region of the sub-pixel SP. The drain region and the source region may be spaced apart from each other, and the channel region is located between the drain region and the source region.

[0122] The active layer 112a can be formed from a semiconductor material based on any one of amorphous silicon, polycrystalline silicon, oxide and organic materials.

[0123] The gate insulating layer 111a can be formed on the channel region of the active layer 112a. As an example, the gate insulating layer 111a can be formed in an island shape on the channel region of the active layer 112a.

[0124] The gate 112b can be formed on the gate insulating layer 111a and overlap with the channel region of the active layer 112a.

[0125] The third inorganic film layer 111d can be formed on the gate 112b and the drain and source regions of the active layer 112a. For example... Figure 4 As shown, the third inorganic film layer 111d can be formed in the entire light-emitting region from the sub-pixel SP. However, embodiments of this disclosure are not limited thereto. The third inorganic film layer 111d can be patterned between the drain 112d and the gate 112b and the drain region of the active layer 112a and can be arranged in an island shape. In addition, it can be patterned between the source 112c and the gate 112b and the source region of the active layer 112a and can be arranged in an island shape.

[0126] The source electrode 112c can be electrically connected to the source region of the active layer 112a through a source contact hole provided in the third inorganic film layer 111d that overlaps with the source region of the active layer 112a. The drain electrode 112d can be electrically connected to the drain region of the active layer 112a through a drain contact hole provided in the third inorganic film layer 111d that overlaps with the drain region of the active layer 112a.

[0127] The drain 112d and the source 112c can be made of the same metallic material. For example, each of the drain 112d and the source 112c can be made of a single metal layer, a single alloy layer, or a multilayer of two or more layers that are the same as or different from the gate.

[0128] Furthermore, the circuit region may also include a first switching thin-film transistor and a second switching thin-film transistor disposed together with the thin-film transistor 112, as well as a capacitor. Since each of the first and second switching thin-film transistors is disposed on the circuit region of the sub-pixel SP and has the same structure as the thin-film transistor 112, its description will be omitted. The capacitor (not shown) may be disposed in the overlapping region between the gate 112b and the source 112c of the thin-film transistor 112, where they overlap (with the interlayer insulating layer 111b disposed therebetween).

[0129] Furthermore, to prevent the threshold voltage of the thin-film transistors located in the pixel area from shifting due to light, the display panel or substrate 110 may also include a light-shielding layer LS disposed below the active layer 112a of at least one of the thin-film transistors 112, the first switching thin-film transistor, and the second switching thin-film transistor. The light-shielding layer can be disposed between the substrate 110 and the active layer 112a to shield light incident on the active layer 112a through the substrate 110, thereby minimizing changes in the threshold voltage of the transistors caused by external light. Furthermore, since the light-shielding layer is disposed between the substrate 110 and the active layer 112a, the thin-film transistors can be prevented from being seen by the user.

[0130] The fourth inorganic film layer 111e can be disposed on the substrate 110 and cover the pixel area. The fourth inorganic film layer 111e can cover the drain 112d, source 112c, gate 112b of the thin film transistor 112 and the second inorganic film layer 111b.

[0131] On the other hand, such as Figure 4 As shown, the pixel power line EVDD can be configured to overlap with the embankment 115 portion in the third direction (Z-axis direction), and as... Figure 5 As shown, the baseline RL can overlap with the embankment 115 in the third direction (Z-axis direction). The fourth inorganic film layer 111e can be formed above the circuit region and the light-emitting region. The fourth inorganic film layer 111e can be omitted.

[0132] A planarization layer 113 may be disposed on the substrate 110 and cover the fourth inorganic film layer 111e. When the fourth inorganic film layer 111e is omitted, the planarization layer 113 may be disposed on the substrate 110 and cover the circuit region (or thin-film transistor 112). The planarization layer 113 may be formed in the circuit region CA where the thin-film transistor 112 is disposed and in the light-emitting region EA. Furthermore, the planarization layer 113 may be formed in other non-display regions NDA except for the pad portion PA of the non-display region NDA and the entire display region DA. For example, the planarization layer 113 may include an extension (or an enlarged portion) extending or expanding from the display region DA to other non-display regions NDA except for the pad portion PA. Therefore, the planarization layer 113 may have a size that is relatively wider than the size of the display region DA.

[0133] According to one example, the planarization layer 113 can be formed to have a relatively thick thickness, thereby providing a flat surface on the display area DA and the non-display area NDA. For example, the planarization layer 113 can be made of organic materials such as photoacrylic resin, benzocyclobutene, polyimide, and fluoropolymer.

[0134] On the other hand, the upper surface of the planarization layer 113 can be flat. Therefore, the pixel electrode 114 on the planarization layer 113 can also be flat, as can the organic light-emitting layer 116 and the counter electrode 117 formed thereon. Since the pixel electrode 114, the organic light-emitting layer 116, and the counter electrode 117, i.e., the light-emitting element layer E, are flat within the light-emitting region EA, the thickness of each of the pixel electrode 114, the organic light-emitting layer 116, and the counter electrode 117 within the light-emitting region EA can be uniformly formed. Therefore, the organic light-emitting layer 116 can emit light uniformly within the light-emitting region EA without deviation.

[0135] According to one example, a pixel electrode 114 can be formed on a planarization layer 113. Since multiple lines are disposed between the planarization layer 113 and the substrate 110, the pixel electrode 114 can be arranged on at least one of these lines. The pixel electrode 114 can be connected to the drain or source of the thin-film transistor 112 through contact holes passing through the planarization layer 113 and the fourth inorganic film layer 111e. One edge of the pixel electrode 114 can be covered by a dike 115. The pixel electrode 114 can be made of at least one of a transparent metallic material or a semi-transparent metallic material.

[0136] Since the transparent display device 100 according to one embodiment of the present disclosure is a top-emitting type, the pixel electrode 114 can be made of a highly reflective metal material or a stacked structure of a highly reflective metal material and a transparent metal material. For example, the first electrode 114 can be formed of a metal material with high reflectivity, such as a stacked structure of aluminum and titanium (Ti / Al / Ti), a stacked structure of aluminum and ITO (ITO / Al / ITO), an Ag alloy, and a stacked structure of Ag alloy and ITO (ITO / Ag alloy / ITO). The Ag alloy can be, for example, an alloy of silver (Ag), palladium (Pd), and copper (Cu).

[0137] Meanwhile, the material constituting the pixel electrode 114 may include MoTi. The pixel electrode 114 may be a first electrode or an anode.

[0138] The dam 115 may be a non-light-emitting region located on one side of the light-emitting region EA of each of the plurality of sub-pixels SP. For example, the dam 115 may be located in the non-light-emitting region NEA (or the non-transmissive region NTA). The dam 115 may be formed to cover the edge of the pixel electrode 114. Therefore, the dam 115 can prevent the edge of the pixel electrode 114 from being electrically connected to the counter electrode 117. The exposed portion of the pixel electrode 114 not covered by the dam 115 may be included in the light-emitting portion (or the light-emitting region EA).

[0139] After forming the dam 115, an organic light-emitting layer 116 can be formed and cover the pixel electrode 114 and the dam 115. Thus, the dam 115 can be disposed between the pixel electrode 114 and the organic light-emitting layer 116. The dam 115 can be represented as a pixel-defining film. According to one example, the dam 115 may contain organic and / or inorganic materials.

[0140] Simultaneously, the dam 115 can be positioned between one of the multiple colored sub-pixels and a white sub-pixel. For example, as... Figure 5 As shown, the dam 115 can be arranged between the white sub-pixel SP2 and the first sub-pixel SP1, which is a green sub-pixel. In this case, the dam 115 can be configured to cover a portion of each of the pixel electrode 114 of the first sub-pixel SP1 and the pixel electrode 114 of the second sub-pixel SP2. Since the area where the dam 115 is arranged is the non-light-emitting region NEA (or the non-transmissive region NTA), the dam 115 can overlap with the portion of the black matrix BM arranged in the non-light-emitting region NEA (or the non-transmissive region NTA).

[0141] In a transparent display device 100 according to an embodiment of the present disclosure, the width of the black matrix BM (BMW) can be set to be narrower than the width of the dam 115 (BW). This is to prevent the black matrix BM from covering the light-emitting area EA when the opposing substrate 200, on which the black matrix BM is disposed, is not properly aligned with the substrate 110 (or the lower substrate) on which the light-emitting element layer E is disposed. If the width of the black matrix is ​​equal to or greater than the width of the dam, the black matrix will cover the light-emitting area when the opposing substrate and the lower substrate are not properly aligned, thus reducing the light efficiency. Therefore, in a transparent display device 100 according to an embodiment of the present disclosure, the width of the black matrix BM (BMW) between the color sub-pixel and the white sub-pixel SP2 is set to be narrower than (or less than) the width of the dam 115 (BW), thereby preventing a decrease in light efficiency even if misalignment occurs.

[0142] Conversely, the width of the black matrix BM between the color subpixel and the transmission region TA can be set to be greater than the width of the dam 115. For example... Figure 4 As shown, the black matrix BM between the color sub-pixel (or the first sub-pixel SP1) and the transmission region TA protrudes further towards the transmission region TA than the first protective electrode PE1, making the first protective electrode PE1 invisible to the user. Here, the fact that the black matrix BM protrudes further towards the transmission region TA could mean that the black matrix BM is formed by positioning (or offsetting) towards the transmission region TA. Therefore, as... Figure 4 As shown, the black matrix BM between the transmissive region TA and the color sub-pixel (or the first sub-pixel SP1) can be arranged closer to the transmissive region TA than the dam 115, such that even if misalignment occurs, the black matrix BM does not cover the light-emitting region EA of the color sub-pixel. Therefore, the transparent display device 100 according to an embodiment of the present disclosure may have a structural feature in which the width of the black matrix BM between the color sub-pixel and the transmissive region TA is set to be wider (or larger) than the width of the dam 115.

[0143] At the same time, such as Figure 5 As shown, the second data line DL2, the reference line RL, and the third data line DL3 can be arranged to overlap with the embankment 115 in the third direction (Z-axis direction). However, this is not a limitation; the second data line DL2 and the third data line DL3 can be arranged not to overlap with the embankment 115. Since the transparent display device 100 according to one embodiment of this disclosure is a top-emitting type, even if each of the second data line DL2 and the third data line DL3 overlaps with the light-emitting area EA of the corresponding sub-pixel, it may not be recognized by the user.

[0144] Refer again Figure 4An organic light-emitting layer 116 can be formed on the pixel electrode 114 and the dam 115. According to one example, the organic light-emitting layer 116 can be disposed in the light-emitting region EA and the non-light-emitting region NEA. The organic light-emitting layer 116 can be disposed between the pixel electrode 114 and the counter electrode 117. Therefore, when a voltage is applied to each of the pixel electrode 114 and the counter electrode 117, an electric field is formed between the pixel electrode 114 and the counter electrode 117. Therefore, the organic light-emitting layer 116 can emit light. The organic light-emitting layer 116 can be formed from a plurality of sub-pixels SP and a common layer disposed on the dam 115.

[0145] The organic light-emitting layer 116 according to the embodiment can be configured to emit white light. The organic light-emitting layer 116 may include multiple layers emitting different colors of light. For example, the organic light-emitting layer 116 may include a first layer, a second layer, and a charge-generating layer (CGL) disposed between the first layer and the second layer. Since the light-emitting layer can be configured to emit white light, each of the multiple sub-pixels SP may include a color filter CF suitable for the corresponding color.

[0146] The first stack can be disposed on the pixel electrode 114, and can be implemented as a structure in which the hole injection layer (HIL), hole transport layer (HTL), emitter layer (EML(B)) and electron transport layer (ETL) are stacked in sequence.

[0147] The charge generation layer can supply charge to the first and second stacks. The charge generation layer can include an N-type charge generation layer that supplies electrons to the first stack and a P-type charge generation layer that supplies holes to the second stack. The N-type charge generation layer can contain a metallic material as a dopant.

[0148] The second stack can be disposed on the first stack, and can be implemented as a structure in which the hole transport layer (HTL), yellow-green (YG) emitter layer (EML(YG)) and electron injection layer (EIL) are stacked in sequence.

[0149] In the display device 100 according to an embodiment of the present disclosure, since the organic light-emitting layer 116 is set as a common layer, the first stack, the charge-generating layer, and the second stack can all be arranged above the plurality of sub-pixels SP. According to another example, depending on the number of stacks, the organic light-emitting layer 116 can be set as a three-layer stack structure or a four-layer stack structure.

[0150] A counter electrode 117 can be formed on the organic light-emitting layer 116. The counter electrode 117 can be disposed in the light-emitting region EA and the non-light-emitting region NEA. According to one example, the counter electrode 117 can comprise a metallic material. The counter electrode 117 can reflect light emitted from the organic light-emitting layer 116 in the plurality of sub-pixels SP toward the lower surface of the substrate 110. Therefore, the display device 100 according to an embodiment of the present disclosure can be implemented as a bottom-emitting display device.

[0151] Since the transparent display device 100 according to one embodiment of the present disclosure is a top-emitting type, the counter electrode 117 can be formed of a transparent conductive material TCO (e.g., ITO, IZO) capable of transmitting light or of a semi-transparent conductive material TMCM (e.g., magnesium (Mg), silver (Ag), or an alloy of magnesium (Mg) and silver (Ag)). Such a counter electrode 117 can be referred to as a second electrode or a cathode.

[0152] A filler layer 118 is formed on the counter electrode 117. The filler layer 118 serves to prevent oxygen or moisture from penetrating into the organic light-emitting layer 116 and the counter electrode 117. For this purpose, the filler layer 118 may be configured to include an absorbent capable of absorbing oxygen or moisture. Alternatively, the filler layer 118 may include multiple layers, including at least one inorganic film layer and at least one organic film layer.

[0153] On the other hand, such as Figure 4 As shown, the filling layer 118 can be disposed not only in the light-emitting region EA, but also in the non-light-emitting region NEA. Additionally, the filling layer 118 can also be disposed in the transmissive region TA. The filling layer 118 can be disposed between the counter electrode 117 and the counter substrate 200.

[0154] An upper organic film layer 119 covering the color filter CF and the black matrix BM can be disposed between the filler layer 118 and the opposing substrate 200. The upper organic film layer 119 is configured to cover the color filter CF and the black matrix BM, thereby planarizing a surface where the opposing substrate 200 is bonded to the substrate 110. Therefore, since the adhesive strength between the substrate 110 and the opposing substrate 200 is improved by the upper organic film layer 119, the transparent display device 100 according to an embodiment of the present disclosure can have improved impact resistance reliability.

[0155] Color filters CF and black matrix BM can be disposed between the upper organic film layer 119 and the opposing substrate 200. As described above, the white sub-pixel SP2 may not have a color filter because the organic light-emitting layer 116 emits white light. On the other hand, the first color filter CF1 (or green color filter CF1) can be disposed between the upper organic film layer 119 and the opposing substrate 200 in the green sub-pixel SP1. In the blue sub-pixel SP3, the second color filter CF2 (or blue color filter CF2) can be disposed between the upper organic film layer 119 and the opposing substrate 200. In the red sub-pixel SP4, the third color filter CF3 (or red color filter CF3) can be disposed between the upper organic film layer 119 and the opposing substrate 200. Figure 4 As shown, the color filter CF can be set to partially cover the black matrix BM.

[0156] On the other hand, a black matrix BM can be disposed between multiple sub-pixels SP1, SP2, SP3, and SP4 to prevent color mixing and / or light leakage. However, to increase the area of ​​the transmissive region TA, a black matrix BM may not be disposed between the white sub-pixel SP2 and the transmissive region TA. Furthermore, since the second sub-pixel SP2 is configured to emit white light, color mixing will not occur even if the black matrix BM is not disposed between the second sub-pixel SP2 and the transmissive region TA. Therefore, a transparent display device 100 according to an embodiment of the present disclosure may have a structural feature where a black matrix BM is not disposed between the second sub-pixel SP2 and the transmissive region TA.

[0157] The black matrix BM can be formed from a black series material. At least a portion of the black matrix BM can be arranged to overlap with the dam 115. The area where the black matrix BM and / or the dam 115 are disposed can be a dead zone or a non-light-emitting area. According to the example, the black matrix BM can be formed on the opposing substrate 200 and overlap with at least a portion of the dam 115, thereby reducing the cell gap between the organic light-emitting layer 116 and the opposing substrate 200 to prevent sub-pixel mixing.

[0158] Reference Figure 4 In a transparent display device 100 according to an embodiment of the present disclosure, the third inorganic film layer 111d and the fourth inorganic film layer 111e may overlap with the transmission region TA. As described above, by removing the SiN-containing... xThe stepped portion STP formed by the first inorganic film layer 111a and the second inorganic film layer 111b containing SiO2 can be arranged to overlap the outermost signal line (e.g., pixel power line EVDD or common power line EVSS). Therefore, the first inorganic film layer 111a and the second inorganic film layer 111b can be provided only in the non-transmissive region NTA, and can be omitted from the transmissive region TA. Therefore, the third inorganic film layer 111d and the fourth inorganic film layer 111e, which are provided as common layers on the second inorganic film layer 111b, can be provided in the transmissive region TA.

[0159] like Figure 4 As shown, the third inorganic film layer 111d and the fourth inorganic film layer 111e are arranged to extend into the transmission region TA while covering the first protective electrode PE1, such that the third inorganic film layer 111d and the fourth inorganic film layer 111e can overlap with the transmission region TA. Furthermore, as... Figure 4 As shown, the third inorganic film layer 111d is arranged to overlap with the transmission region TA, so that the third inorganic film layer 111d can contact the upper surface of the substrate 110.

[0160] At the same time, such as Figure 6 As shown, the third inorganic film layer 111d and the fourth inorganic film layer 111e are arranged to extend into the transmission region TA while covering the second protective electrode PE2, such that the third inorganic film layer 111d and the fourth inorganic film layer 111e can overlap with the transmission region TA. Figure 6 As shown, the third inorganic film layer 111d is arranged to overlap with the transmission region TA and to contact the upper surface of the substrate 110.

[0161] According to one embodiment of this disclosure, the transparent display device 100 may have a gate line GL arranged in an elongated shape in a second direction (X-axis direction) between the first sub-pixel SP1 and the third sub-pixel SP3 and between the second sub-pixel SP2 and the fourth sub-pixel SP4. Conversely, the outermost signal line (e.g., the pixel power line EVDD) may be arranged in an elongated shape in a first direction (Y-axis direction). Therefore, the outermost signal line (e.g., the pixel power line EVDD) and the gate line GL may be arranged to intersect. Furthermore, a plurality of guard electrodes PE electrically connected to the outermost signal line (e.g., the pixel power line EVDD) may be arranged spaced apart from each other (with the gate line GL located therebetween). Therefore, the plurality of guard electrodes PE may be configured as an island shape.

[0162] Simultaneously, the gate line GL can apply a different voltage (or signal) to the sub-pixel SP than the outermost signal line (e.g., the pixel power line EVDD). Therefore, as... Figure 7As shown, the gate line GL can be arranged spaced apart from the outermost signal line (e.g., the pixel power line EVDD). For example, the gate line GL can be arranged to be spaced apart from the outermost signal line (e.g., the pixel power line EVDD) (with the first inorganic film layer 111a, the second inorganic film layer 111b, and the gate insulating layer 111c located therebetween), such that the gate line GL can be insulated from the outermost signal line (e.g., the pixel power line EVDD). Therefore, the transparent display device 100 according to an embodiment of the present disclosure can have a structure in which each of the plurality of guard electrodes PE electrically connected to the outermost signal line (e.g., the pixel power line EVDD) is not electrically connected to the gate line GL.

[0163] like Figure 7 As shown, the gate line GL can partially cover the stepped portion STP. This is because the gate line GL is arranged in an elongated shape in the second direction (X-axis direction). Figure 7 As shown, the gate line GL covering the stepped portion STP can be arranged to be spaced apart from and cover the outermost signal line (e.g., pixel power line EVDD).

[0164] Figure 8 This is a schematic cross-sectional view showing a transparent display device according to another embodiment of the present disclosure.

[0165] Reference Figure 8 Apart from the structural changes in the third inorganic film layer 111d and the fourth inorganic film layer 111e, the transparent display device 100 according to another embodiment of this disclosure is similar to the one described above. Figure 1 The transparent display devices are the same. Therefore, the same reference numerals are assigned to the same configurations, and in the following text, only the different configurations will be described.

[0166] According to Figure 1 In the case of a transparent display device, the third inorganic film layer 111d and the fourth inorganic film layer 111e can be set as a common layer. Therefore, according to Figure 1 In the case of a transparent display device, the third inorganic film layer 111d and the fourth inorganic film layer 111e can be configured to overlap with the transmission region TA. Therefore, according to Figure 1 In the case of a transparent display device, the third inorganic film layer 111d and the fourth inorganic film layer 111e are also arranged in the transmission region TA, thereby preventing moisture and oxygen from penetrating into the light-emitting element layer E through the substrate 110.

[0167] On the contrary, according to Figure 8 In the case of a transparent display device, the third inorganic film layer 111d and the fourth inorganic film layer 111e can be configured not to be located in the transmission region TA. For example, as Figure 8As shown, the ends of the third inorganic film layer 111d and the fourth inorganic film layer 111e can be located on the outermost signal line (e.g., pixel power line EVDD) (or step portion STP). Therefore, according to Figure 8 In the case of a transparent display device, the ends of the third inorganic film layer 111d and the fourth inorganic film layer 111e are configured not to be located in the transmission region TA, thereby maximizing the transmittance (or transparency) of the transmission region TA.

[0168] At the same time, such as Figure 8 As shown, a transparent display device 100 according to another embodiment of the present disclosure may have a structural feature in which the third inorganic film layer 111d and the fourth inorganic film layer 111e are not arranged in the transmission region TA, such that the planarization layer 113 contacts the upper surface of the substrate 110 in the transmission region TA.

[0169] Furthermore, the transparent display device 100 according to another embodiment of the present disclosure can be configured such that each end of the third inorganic film layer 111d and the fourth inorganic film layer 111e is located on the outermost signal line (e.g., pixel power line EVDD and / or common power line EVSS), such that the outermost signal line (pixel power line EVDD and / or common power line EVSS) can cover another step portion (or second step portion) formed by the third inorganic film layer 111d and the fourth inorganic film layer 111e. Therefore, in the transparent display device 100 according to another embodiment of the present disclosure, the step portion STP formed by the first inorganic film layer 111a and the second inorganic film layer 111b and the other step portion (or second step portion) formed by the third inorganic film layer 111d and the fourth inorganic film layer 111e are covered by the outermost signal line (e.g., pixel power line EVDD and / or common power line EVSS), thereby preventing diffraction and improving the clarity of objects or images.

[0170] Embodiments of the present disclosure have been described in more detail with reference to the accompanying drawings; however, the present disclosure is not necessarily limited to these embodiments and can be practiced with various modifications without departing from the technical concept of the present disclosure. Therefore, the embodiments disclosed herein are intended to illustrate, not limit, the technical concept of the present disclosure, and the scope of the technical concept of the present disclosure is not limited by these embodiments. Thus, the above embodiments are exemplary in all respects and should be understood as non-limiting. The scope of protection of this specification should be interpreted by the claims, and all technical concepts within the scope of the claims should be interpreted as being included within the scope of the claims.

[0171] In this disclosure, the stepped portion of the inorganic film layer is arranged to overlap with the outermost signal line arranged at the edge of the non-transmissive region, thereby improving the clarity of the object or image displayed to the user through the transmissive region.

[0172] In this disclosure, inorganic films with different refractive indices are removed from the transmission region, thereby improving the transmittance of the transmission region.

[0173] In this disclosure, since the auxiliary electrode covering the stepped portion is connected to the outermost signal line, voltage drop at the center of the display panel can be prevented, so that even under low power conditions, the brightness of the edge and center of the display panel can be uniform, thereby reducing overall power consumption.

[0174] The effects that can be obtained from this disclosure are not limited to those mentioned above, and other effects not mentioned will be obvious to those skilled in the art based on the above description.

Claims

1. A transparent display device, comprising: A substrate, the substrate including a display area having a transmissive area and a non-transmissive area, wherein a plurality of sub-pixels are arranged in the non-transmissive area; Multiple inorganic film layers are disposed on the substrate; The outermost signal line is arranged below the lowest inorganic film layer among the plurality of inorganic film layers; as well as The stepped portion is located at the end of at least one of the plurality of inorganic film layers. The outermost signal line is arranged at the edge of the non-transmissive region, and The stepped portion overlaps with the outermost signal line.

2. The transparent display device according to claim 1, wherein, The stepped portion is formed by removing a first inorganic film layer and a second inorganic film layer disposed on the first inorganic film layer with a different refractive index than the first inorganic film layer.

3. The transparent display device according to claim 2, wherein, The first inorganic film layer and the second inorganic film layer are arranged to overlap only in the non-transmissive region.

4. The transparent display device according to claim 2, wherein, The first inorganic film layer contacts the upper surface of the substrate in the non-transmissive region and partially covers the outermost signal line.

5. The transparent display device according to claim 2, wherein, The first inorganic film layer contains SiN x ,and The second inorganic film layer contains SiO2.

6. The transparent display device according to claim 1, wherein, The substrate also includes multiple protective electrodes covering a portion of the outermost signal line and the stepped portion.

7. The transparent display device according to claim 6, wherein, Each of the plurality of protective electrodes covers the end of the outermost signal line.

8. The transparent display device according to claim 6, wherein, Each of the plurality of protective electrodes covering the stepped portion has a stepped portion.

9. The transparent display device according to claim 6, wherein, The substrate also includes a black matrix arranged between the plurality of sub-pixels, and At least one of the plurality of protective electrodes overlaps with the black matrix.

10. The transparent display device according to claim 6, wherein, The outermost signal line is arranged along the first direction, and Each of the plurality of protection electrodes is arranged along the first direction in the non-transmissive region and is electrically connected to the outermost signal line.

11. The transparent display device according to claim 10, wherein, Each of the plurality of protective electrodes is configured as an island.

12. The transparent display device according to claim 10, wherein, The plurality of sub-pixels includes a plurality of colored sub-pixels and a white sub-pixel arranged adjacent to each of the plurality of colored sub-pixels, and The plurality of protective electrodes include: A first protective electrode is located between the plurality of color sub-pixels and the transmissive region; and The second protective electrode is located between the white sub-pixel and the transmissive region.

13. The transparent display device according to claim 12, wherein, The first protective electrode is configured to be spaced apart from the transmission region.

14. The transparent display device according to claim 12, wherein, The second protective electrode is positioned adjacent to the transmission region.

15. The transparent display device according to claim 10, wherein, The substrate further includes gate lines arranged along a second direction intersecting the first direction, and The gate line is not electrically connected to each of the plurality of protection electrodes.

16. The transparent display device according to claim 15, wherein, Each of the plurality of protection electrodes is arranged to be spaced apart from the gate line.

17. The transparent display device according to claim 15, wherein, Each of the plurality of protection electrodes is formed of the same material as the gate line.

18. The transparent display device according to claim 15, wherein, The gate line includes a closed-loop structure that partially overlaps with the outermost signal line, and Each of the plurality of protection electrodes is not formed on the outermost signal line overlapping the closed-loop structure.

19. The transparent display device according to claim 15, wherein, The gate line partially covers the stepped portion.

20. The transparent display device according to claim 19, wherein, The gate line covering the stepped portion is spaced apart from and covers the outermost signal line.

21. The transparent display device according to claim 3, wherein, The plurality of inorganic membrane layers also include: A third inorganic film layer is disposed on the second inorganic film layer; and A fourth inorganic film layer is disposed on the third inorganic film layer. The third inorganic film layer and the fourth inorganic film layer overlap in the transmission region.

22. The transparent display device according to claim 21, wherein, The third inorganic film layer is in contact with the upper surface of the substrate in the transmission region.

23. The transparent display device according to claim 1, wherein, The substrate also includes a black matrix arranged between the plurality of sub-pixels, and The stepped portion overlaps with the black matrix.

24. The transparent display device according to claim 23, wherein, The plurality of sub-pixels includes white sub-pixels and a plurality of colored sub-pixels, and The black matrix is ​​arranged between each of the plurality of colored sub-pixels and the transmission region, but not between the white sub-pixels and the transmission region.

25. The transparent display device according to claim 24, wherein, The substrate also includes a dike disposed between one of the plurality of color sub-pixels and the white sub-pixel. The embankment partially overlaps with the black matrix.

26. The transparent display device according to claim 25, wherein, The width of the black matrix is ​​narrower than the width of the dike.

27. The transparent display device according to claim 21, wherein, The ends of the third inorganic film layer and the ends of the fourth inorganic film layer are arranged on the outermost signal line.

28. The transparent display device according to claim 27, wherein, The substrate includes a planarization layer disposed on the fourth inorganic film layer, and The planarization layer is in contact with the upper surface of the substrate in the transmission region.

29. A transparent display device, comprising: A substrate, the substrate including a display area having a plurality of pixels, each of the plurality of pixels including a transmissive area and a non-transmissive area; First inorganic film layer; as well as The second inorganic film layer is disposed on the first inorganic film layer. Specifically, the first inorganic film layer and the second inorganic film layer in the non-transmissive region and the transmissive region are removed, so that a step portion is formed in the non-transmissive region.

30. The transparent display device according to claim 29 further includes an outermost wiring, the outermost wiring being disposed below the first inorganic film layer and overlapping the stepped portion.

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