Targeted cleaning process for LCD (liquid crystal display) micro-area

Abstract

The invention discloses a targeted cleaning process for a micro-area of an LCD (Liquid Crystal Display) screen. The targeted cleaning process comprises the following steps: firstly, forming a temporary super-hydrophobic membrane on the surface of an LCD panel; then, the film is damaged at the liquid crystal residual point through local heating, and a lyophilic target region is formed; then, the panel is immersed in inert fluorination liquid, and a stable gas film isolation layer is formed between the super-hydrophobic surface and the fluorination liquid; under the physical isolation protection of the gas film, only micro-injecting an alkaline cleaning solution prepared from methanol and sodium hydroxide in a specific ratio into the lyophilic target region for reaction, and then injecting an acidic ethanol cleaning solution for neutralization replacement; then the panel is taken out, and pyrazole steam gas-phase chelation purification is carried out; and finally, removing the temporary super-hydrophobic membrane. According to the method, powerful chemical cleaning of micron-sized stubborn residues is achieved, meanwhile, corrosion and pollution of a cleaning agent to other sensitive areas are thoroughly avoided through the gas film isolation and micro-area precise feeding technology, and the industrial problem that cleaning effectiveness, area selectivity and substrate safety are difficult to consider at the same time is solved.

Description

Technical Field

[0001] This invention relates to the field of LCD screen cleaning, and in particular to a micro-area targeted cleaning process for LCD screens. Background Technology

[0002] Liquid crystal residue may remain during the manufacturing process of liquid crystal cells, and this residue can affect their use. Currently, the industry primarily relies on traditional methods such as physical wiping or chemical solvent immersion / spraying to clean these residues. Physical wiping is difficult to completely remove solidified or infiltrated liquid crystals and carries the risk of scratching precision electrodes and alignment films. While chemical cleaning methods offer better dissolution, they generally suffer from the following irreconcilable technical contradictions:

[0003] First, there is a conflict between cleaning effectiveness and substrate safety. To effectively break down stubborn liquid crystals, strong cleaning agents (such as alkaline solutions) are often required. However, whether through overall immersion or large-area spraying, the cleaning agent inevitably comes into contact with the electrodes that need protection. Electrodes are sensitive to both acids and alkalis, and are easily corroded, leading to increased resistance or even breakage. This contradiction means that existing methods often face a difficult trade-off between "cleaning" and "damaging," resulting in an extremely narrow cleaning window.

[0004] Secondly, there is a contradiction between localized, targeted cleaning and controlling the spread of contaminants. For stubborn residues at the micrometer level, the ideal scenario is to perform precise, "surgical" treatment only on that specific point. However, in existing liquid cleaning methods, the cleaning agent is fluid on the substrate surface and easily spreads and seeps outward from the target area. This not only fails to strictly limit the chemical action to the "lesion" site but also expands the scope of chemical attack and contamination on intact areas.

[0005] Furthermore, there is a conflict between chemical cleaning and secondary pollution. The cleaning process itself may introduce new, more difficult-to-remove contaminants. For example, using chemicals containing sodium ions (Na+)... + After being cleaned with alkaline cleaning agents, sodium ions readily adsorb onto the substrate surface. These ionic contaminants become mobile ions in subsequent processes, severely degrading the voltage retention rate (VHR) of the display and causing fatal defects such as image retention and flickering. Traditional water-based or solvent rinsing methods are insufficient to completely remove these ionic contaminants.

[0006] Therefore, existing technologies lack a cleaning solution that can simultaneously perform powerful chemical decomposition of micron-sized stubborn liquid crystal residues while absolutely avoiding chemical corrosion, physical damage, and ionic contamination of surrounding sensitive functional areas. Summary of the Invention

[0007] In view of the aforementioned deficiencies of the prior art, the technical problem to be solved by the present invention is to provide a micro-area targeted cleaning process for LCD screens, which aims to achieve precise cleaning of liquid crystal residues and avoid contamination and damage to other sensitive areas.

[0008] To achieve the above objectives, the present invention discloses a micro-area targeted cleaning process for LCD screens, the process comprising:

[0009] Step S1: Spray a volatile temporary superhydrophobic treatment agent onto the surface of the LCD cell, and after curing, form a temporary superhydrophobic film on the surface of the LCD cell.

[0010] Step S2: Locally heat the treatment area corresponding to the liquid crystal residue points on the surface of the LCD cell to destroy the superhydrophobic film of the treatment area and form a hydrophilic target area.

[0011] Step S3: Immerse the LCD cell in an inert fluorinated solution to form and maintain a stable gas film isolation layer between the superhydrophobic surface of the LCD cell and the fluorinated solution.

[0012] Step S4: Under the isolation of the gas film isolation layer, an alkaline cleaning solution prepared by methanol and sodium hydroxide in a mass ratio of 1000g:20g is injected into the hydrophilic target area to react and clean the residual liquid crystal; after the reaction cleaning is completed, an acidic ethanol cleaning solution is injected into the hydrophilic target area for neutralization and replacement.

[0013] Step S5: Remove the LCD cell and dry it, then place it in a sealed processing chamber. Heat and sublimate solid pyrazole to generate pyrazole vapor, and then bring the pyrazole vapor into contact with the surface of the LCD cell to carry out a gas-phase chelation purification reaction.

[0014] Step S6: Remove the temporary superhydrophobic film on the surface of the LCD cell.

[0015] Optionally, step S3 includes:

[0016] After the LCD cell is completely immersed in the fluorinated liquid, a slight negative pressure of -1 kPa to -10 kPa is applied to the sealed cavity containing the fluorinated liquid and maintained for 1 to 10 seconds.

[0017] Remove the micro-negative pressure and apply ultrasonic waves with a frequency of 0.5MHz to 5MHz or mechanical vibrations with an amplitude of 5μm to 200μm to the sealed cavity for 2 to 15 seconds.

[0018] A slight positive pressure of +1 kPa to +10 kPa is applied to and maintained in the sealed cavity to lock the air film isolation layer.

[0019] Optionally, after step S1, the process further includes:

[0020] The LCD cell with the temporary superhydrophobic film is placed under an atmospheric pressure plasma generator and scanned using helium, argon, or a mixture thereof as the working gas. The scanning process activates the surface of the LCD cell to enhance the bonding force between the temporary superhydrophobic film and the surface of the LCD cell, and improves the uniformity of its distribution in different material regions.

[0021] Optionally, the temporary superhydrophobic treatment agent is a solution of fluorinated silane compounds or a nanoparticle dispersion, and the temporary superhydrophobic film formed after curing has a contact angle with water greater than 150°.

[0022] Optionally, the acidic ethanol cleaning solution is prepared by adding acidic substances to ethanol to adjust the pH value to 4.0-6.5, and the amount of ethanol added is 20g.

[0023] Optionally, in step S2, the local heating is achieved using an infrared laser or a miniature hot air pen, with a heating area diameter of 50 μm to 300 μm and a heating time of 50 milliseconds to 1 second, so that the surface temperature of the hydrophilic target area rises to 60°C to 120°C.

[0024] Optionally, step S5 includes:

[0025] Remove the LCD cell and dry it;

[0026] The LCD cell is placed in a sealed purification chamber. First, a vacuum is drawn until the pressure is below 100 Pa. Then, pyrazole vapor generated by the sublimation of solid pyrazole is introduced to restore the chamber pressure to 1 kPa to 10 kPa and maintain it for 1 to 10 minutes. After that, a vacuum is drawn again until the pressure is below 10 Pa to remove the gaseous reaction products.

[0027] Optionally, in step S4, when injecting cleaning fluid into the hydrophilic target area and aspirating waste fluid, the injection needle and the aspiration needle are controlled to perform micro-reciprocating motion relative to the surface of the LCD cell, with a motion amplitude of 5μm to 50μm.

[0028] The beneficial effects of this invention are as follows: 1. This invention, through the synergistic physical barrier of a "temporary superhydrophobic film + gas film isolation layer," strictly confines subsequent strong chemical cleaning steps within the "hydrophilic target area" (i.e., stubborn residue points) defined by local heating. The intact metal electrodes and alignment films are always under the protection of the gas film, with zero contact with the chemical cleaning solution, thus completely eliminating irreversible damage such as corrosion and dissolution caused by strong alkalis and acids, fundamentally solving the contradiction between effectiveness and safety that cannot be reconciled in traditional immersion or spray cleaning. 2. Combining superhydrophobic treatment, local thermal activation, and micro-level liquid precision injection technology, this invention can precisely control the chemical action within a target area with a diameter of 50-300 micrometers. This cleaning method not only greatly saves expensive or dangerous chemical reagents but also achieves "point-to-point" removal of residues at the edges and narrow borders of high-density circuits without affecting surrounding sensitive structures and functional areas, solving the problem of contaminant diffusion during local cleaning. 3. This invention uses "pyrazole vapor gas-phase chelation purification" as the final step. Pyrazole vapor can penetrate evenly to the entire panel surface and microstructure, efficiently complexing and capturing residual sodium ions (Na) from the cleaning agent. + Metal ions such as [insert metal ions here] are completely removed through vacuuming. This process is carried out in the gas phase, eliminating the risk of liquid residue and reducing surface ion contamination to below ppb levels. This ensures extremely high voltage retention rate (VHR) of the treated device, effectively preventing reliability issues such as image retention and flicker. 4. The dynamic gas film stabilization process (micro-negative pressure wetting - energy field screening - micro-positive pressure locking) provided by this invention has high repeatability and robustness, overcoming the influence of minute differences on the substrate surface and ensuring that each panel receives uniform and stable gas film protection. The entire process sequence is clear, parameters are controllable, and it is easy to integrate with automated equipment. It is highly suitable for the manufacturing of high-end LCD panels with extremely high yield and consistency requirements, as well as for the precise rework of high-value panels.

[0029] In summary, by integrating different cleaning technologies with precise timing control, this invention achieves accurate cleaning results while protecting precision electronic components. Attached Figure Description

[0030] Figure 1 This is a schematic flowchart of a micro-area targeted cleaning process for LCD screens provided in a specific embodiment of the present invention.

[0031] Figure 2 This is a schematic diagram of the process for micro-area targeted cleaning of LCD screens in a specific application of the present invention. Detailed Implementation

[0032] This invention discloses a micro-area targeted cleaning process for LCD screens. Those skilled in the art can refer to the content of this document and appropriately modify the technical details to achieve the desired result. It should be particularly noted that all similar substitutions and modifications are obvious to those skilled in the art and are considered to be included in this invention. The methods and applications of this invention have been described through preferred embodiments. Those skilled in the art can clearly modify or appropriately change and combine the methods and applications described herein without departing from the content, spirit, and scope of this invention to implement and apply the technology of this invention.

[0033] This invention provides a micro-area targeted cleaning process for LCD screens, such as... Figure 1 As shown, the process includes:

[0034] Step S1: Spray a volatile temporary superhydrophobic treatment agent onto the surface of the LCD cell, and after curing, form a temporary superhydrophobic film on the surface of the LCD cell.

[0035] It should be noted that step S1 aims to establish a fundamental physical isolation interface for the entire process. By constructing a temporary, completely removable superhydrophobic film (contact angle >150°) on the surface of the LCD panel (including electrodes, substrate, and alignment film), the originally hydrophilic surface is transformed into an extremely hydrophobic state. Its core functions are threefold: First, it provides the necessary conditions for the subsequent formation of a stable "gas film isolation layer" in the fluorination solution (Leyton-Frost effect); second, this temporary film itself acts as the first barrier, preventing any subsequent liquid cleaning agent from directly contacting the intact area; third, its "volatile" nature ensures that it can be completely removed at the end of the process, leaving no residue that affects the electrical or optical performance of the device. This step fundamentally reconstructs the interfacial environment in which the cleaning process occurs.

[0036] In this specific embodiment, after step S1, the process further includes:

[0037] An LCD cell with a temporary superhydrophobic film is placed under an atmospheric pressure plasma generator and scanned using helium, argon, or a mixture thereof as the working gas. The scanning process activates the surface of the LCD cell, thereby enhancing the bonding force between the temporary superhydrophobic film and the LCD cell surface and improving the uniformity of its distribution in different material regions.

[0038] It should be noted that this embodiment includes a step of atmospheric pressure plasma scanning after the formation of the temporary superhydrophobic film. This step aims to solve the technical problem of uneven superhydrophobic film coating and inconsistent adhesion caused by different materials on the LCD panel surface (such as ITO metal oxide electrodes and glass or PI film). The active particles generated by the plasma can instantly clean and activate the entire surface, allowing the temporary treatment agent molecules to obtain consistent and enhanced chemical bonding opportunities in both the ITO and glass regions, thereby significantly improving the uniformity of the superhydrophobic film distribution in different material regions and its bonding strength with the substrate. This step ensures that the subsequent gas film can be formed uniformly and stably on the entire heterogeneous surface, and is a fundamental pretreatment for achieving large-area reliable protection in this embodiment of the invention.

[0039] It is worth mentioning that in specific applications, an LCD cell generally includes a substrate, as well as alignment films and electrodes disposed on the substrate.

[0040] In this specific embodiment, the temporary superhydrophobic treatment agent is a solution of fluorinated silane compounds or a dispersion of nanoparticles, and the temporary superhydrophobic film formed after curing has a contact angle with water greater than 150°.

[0041] It should be noted that this embodiment explicitly specifies that the treatment agent is a solution of fluorosilane compounds or a dispersion of nanoparticles. These two types of substances are mature engineering choices for achieving extreme hydrophobicity. Simultaneously, the contact angle between the formed temporary superhydrophobic film and water must be greater than 150°, which is an internationally recognized quantitative standard for defining "superhydrophobicity." This limitation ensures that the performance of the formed film meets the theoretical requirements for subsequently generating a stable gas film isolation layer, providing a reliable starting point for the entire process in terms of material properties.

[0042] Step S2: Locally heat the treatment area corresponding to the liquid crystal residue points on the surface of the LCD cell to destroy the superhydrophobic film of the treatment area and form a hydrophilic target area.

[0043] It should be noted that step S2 is crucial for achieving spatially selective cleaning. Infrared lasers or hot air pens are used to locally heat stubborn liquid crystal residues with millisecond- or micrometer-level precision. The mechanism is that the heat causes the molecular chains of the temporary superhydrophobic film within this tiny region to break or rearrange, thereby selectively destroying its superhydrophobicity and transforming it from a "superhydrophobic" state to a "hydrophilic" state, forming a "hydrophilic target area" strictly surrounded by the surrounding superhydrophobic region. This step is like "opening a micro-window" in the protective layer that only leads to the lesion, ensuring that subsequent chemical reagents only wet and act on the residues that need cleaning, and do not diffuse laterally.

[0044] In this specific embodiment, in step S2, local heating is achieved using an infrared laser or a miniature hot air pen. The diameter of the heating area is 50 μm to 300 μm, and the heating time is 50 milliseconds to 1 second, raising the surface temperature of the hydrophilic target area to 60°C to 120°C.

[0045] It should be noted that this embodiment defines the key process parameters for the localized heating step. The diameter range of the heating region (50-300 μm) and the heating time (50 ms-1 sec) are specified. This ensures the extreme localization and instantaneity of the energy input, sufficient to destroy the superhydrophobic film of the tiny target site while strictly controlling the thermal diffusion range to prevent damage to surrounding areas. Simultaneously, the target temperature rise of the hydrophilic target region surface (60-120°C) is clearly defined. This temperature window effectively achieves the modification of the superhydrophobic film while remaining far below the decomposition / glass transition temperature of liquid crystal materials or PI films, ensuring the selectivity and safety of the heating process.

[0046] Step S3: Immerse the LCD cell in an inert fluorinated solution to form and maintain a stable gas film isolation layer between the superhydrophobic surface of the LCD cell and the fluorinated solution.

[0047] It should be noted that step S3 is crucial for ensuring the absolute safety of the intact area. After immersing the panel in the inert fluorinated solution, a gas film naturally forms due to the non-wetting property of the superhydrophobic surface and the fluorinated solution. This gas film is actively regulated and strengthened by applying a dynamic sequence of "micro-negative pressure - energy field (ultrasound / vibration) - micro-positive pressure": micro-negative pressure causes the fluorinated solution to initially approach the surface, expelling excessively large bubbles; the energy field filters out unstable and excessively thick gas film areas, leaving a uniform and stable nanoscale gas layer; and micro-positive pressure acts like a "gas cushion," firmly "locking" the optimized gas film onto the substrate surface. This gas film constitutes an unbreakable physical barrier during the chemical cleaning stage.

[0048] In this specific embodiment, step S3 includes:

[0049] After the LCD cell is completely immersed in the fluorinated liquid, a slight negative pressure of -1 kPa to -10 kPa is applied to the sealed cavity containing the fluorinated liquid and maintained for 1 to 10 seconds.

[0050] Remove the slight negative pressure and apply ultrasonic waves with a frequency of 0.5MHz to 5MHz or mechanical vibrations with an amplitude of 5μm to 200μm to the sealed cavity for 2 to 15 seconds.

[0051] A slight positive pressure of +1 kPa to +10 kPa is applied to and maintained in the sealed cavity to lock the air film isolation layer.

[0052] It should be noted that this embodiment specifically defines the dynamic process for forming and maintaining a stable gas film isolation layer. This process includes three sub-steps: applying a micro-negative pressure, applying an energy field, and maintaining a micro-positive pressure. First, the micro-negative pressure brings the fluorinated liquid close enough to the substrate surface, expelling large air bubbles between interfaces and laying the foundation for the formation of a uniform thin gas film. Next, by applying ultrasonic waves or mechanical vibrations of a specific frequency, the "screening" effect is utilized to break down and remove unstable gas film regions that are poorly adhered or excessively thick, retaining the most stable and uniform nanoscale gas film core. Finally, applying and maintaining a micro-positive pressure provides a continuous external support force to the gas film, tightly "locking" it to the substrate surface, thereby resisting possible fluid disturbances and ensuring the absolute stability and reliability of the gas film isolation layer throughout the entire micro-area cleaning process. This series of active control steps transforms the process from passively relying on surface properties to actively controlling the interface state, significantly improving the repeatability and robustness of the process.

[0053] Step S4: Under the isolation of the gas film isolation layer, an alkaline cleaning solution prepared by methanol and sodium hydroxide in a mass ratio of 1000g:20g is injected into the hydrophilic target area to react and clean the residual liquid crystal; after the reaction cleaning is completed, an acidic ethanol cleaning solution is injected into the hydrophilic target area for neutralization and replacement.

[0054] In this specific embodiment, the acidic ethanol cleaning solution is prepared by adding acidic substances to ethanol to adjust the pH value to 4.0-6.5, and the amount of ethanol added is 20g.

[0055] It should be noted that the ethanol addition of 20g is explicitly stated, and its dosage is correlated with that of methanol (1000g) in the alkaline cleaning solution, reflecting the integrity of the formulation system. Limiting the pH value to a weakly acidic range of 4.0-6.5 ensures that it can effectively and quickly neutralize residual strong alkali, immediately stopping potential corrosion of the substrate; furthermore, the weakly acidic environment avoids new acid corrosion risks to materials such as ITO. This embodiment concretizes the chemical state and action environment of the neutralizing agent, which is crucial for ensuring the safety and controllability of micro-area chemical reactions.

[0056] In this specific embodiment, in step S4, when injecting cleaning fluid into the hydrophilic target area and aspirating waste fluid, the injection needle and the aspiration needle are controlled to perform micro-reciprocating motion relative to the surface of the LCD cell, with a motion amplitude of 5μm to 50μm.

[0057] It should be noted that the small amplitude (5-50 μm) motion produces significant shearing and disturbance effects at the microfluidic scale. It can effectively break the static boundary layer inside the microdroplet, promote full contact between the cleaning fluid and the surface of the residue, and help the waste liquid be effectively stripped and drawn from complex surface morphologies. This solves the problem of dead zones and incomplete replacement of nanoliter fluids in microcavities, and further improves the mass and heat transfer efficiency in the micro-region.

[0058] Step S5: Remove and dry the LCD cell, then place it in a sealed processing chamber. Heat and sublimate solid pyrazole to generate pyrazole vapor, and then allow the pyrazole vapor to come into contact with the surface of the LCD cell for a gas-phase chelation purification reaction.

[0059] It should be noted that step S5 aims to eliminate invisible contamination at the molecular / ionic level, ensuring the long-term reliability of the device. The panel is placed in a vacuum chamber, causing the solid pyrazole to sublimate into vapor. As an excellent metal ion chelating agent, the pyrazole molecules diffuse uniformly in the gas phase across the entire panel surface and micropores, actively capturing and complexing trace amounts of sodium ions (Na₂O₃) that may remain from previous steps. + By employing a pulsed process of "vacuuming-vacuuming-re-vacuuming," the complexation reaction is ensured to proceed fully and the product is completely removed. This gas-phase process avoids secondary residues caused by liquid cleaning, fundamentally solving the problem of ion contamination that leads to a decrease in voltage retention rate (VHR).

[0060] In this specific embodiment, step S5 includes:

[0061] Remove the LCD cell and dry it;

[0062] The LCD cell is placed in a sealed cleanroom. First, a vacuum is drawn until the pressure is below 100 Pa. Then, pyrazole vapor generated by the sublimation of solid pyrazole is introduced to restore the chamber pressure to 1 kPa to 10 kPa and maintain it for 1 to 10 minutes. After that, the vacuum is drawn again until the pressure is below 10 Pa to remove the gaseous reaction products.

[0063] It should be noted that this embodiment details the specific operational process of the pyrazole gas-phase purification step. Its core lies in employing a pulsed process of "vacuuming—vapor charging—pressure holding—re-vacuuming." First, a vacuum is drawn to remove air from the chamber, clearing obstacles for the uniform diffusion of pyrazole vapor. Next, pyrazole vapor is introduced and pressure held to ensure sufficient time for the vapor to fully chelate with residual ions on the surface. Finally, a deep vacuum is drawn again to completely remove the complexed gas-phase reaction products. This process design significantly improves the efficiency and thoroughness of gas-phase purification, solving the technical bottlenecks of limited mass transfer and product residue in static gas-phase treatment.

[0064] Step S6: Remove the temporary superhydrophobic film on the surface of the LCD cell.

[0065] It should be noted that in step S6, the temporary superhydrophobic film can be completely removed by gentle oxygen plasma treatment or rinsing with a specific solvent. After removal, the ITO, PI, and other surfaces of the panel regain their original photoelectric properties and wettability, without any temporary coating or cleaning agent residue, thus preparing for subsequent reprocessing.

[0066] In a specific application, the cleaning process for LCD panels can be as follows: Figure 2 As shown, Figure 2 The cleaning process is divided into three stages: formation of an air-film isolation layer, micro-area chemical reaction, and gas-phase chelation purification.

[0067] This invention utilizes a synergistic physical barrier of a "temporary superhydrophobic film + gas film isolation layer" to strictly confine subsequent strong chemical cleaning steps within a "hydrophilic target area" (i.e., stubborn residue points) defined by localized heating. The intact metal electrodes and alignment film remain under the protection of the gas film, maintaining zero contact with the chemical cleaning solution. This completely eliminates irreversible damage such as corrosion and dissolution caused by strong alkalis and acids, fundamentally resolving the inherent contradiction between effectiveness and safety in traditional immersion or spray cleaning methods.

[0068] This invention combines superhydrophobic treatment, localized thermal activation, and micro-level liquid precision injection technology, enabling precise control of chemical action within a target area of ​​50-300 micrometers in diameter. This cleaning method not only significantly reduces the use of expensive or hazardous chemical reagents but also achieves "point-to-point" removal of residues from the edges of high-density circuits and narrow-bezel areas without affecting surrounding sensitive structures and functional areas, thus solving the problem of contaminant diffusion during localized cleaning.

[0069] This invention employs "pyrazole vapor gas-phase chelation purification" as the final step. Pyrazole vapor can uniformly penetrate the entire panel surface and microstructure, efficiently complexing and capturing residual sodium ions (Na+) from the cleaning agent. + Metal ions such as [insert metal ions here] are removed completely by vacuuming. This process is carried out in the gas phase, eliminating the risk of liquid residue and reducing surface ion contamination to below ppb levels. This ensures extremely high voltage retention rate (VHR) of the treated device and effectively prevents reliability issues such as image retention and flicker.

[0070] The dynamic air film stabilization process (micro-negative pressure wetting - energy field screening - micro-positive pressure locking) provided in this invention has high repeatability and robustness, and can overcome the influence of minute differences on the substrate surface, ensuring that each panel can obtain uniform and stable air film protection. The entire process sequence is clear, the parameters are controllable, and it is easy to integrate with automated equipment. It is very suitable for the manufacturing of high-end LCD panels with extremely high requirements for yield and consistency, as well as the precise rework of high-value panels.

[0071] In summary, by integrating different cleaning technologies with precise timing control, the embodiments of the present invention achieve both accurate cleaning results and protection of precision electronic components.

[0072] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes the element.

[0073] The various embodiments in this specification are described in a related manner. Similar or identical parts between embodiments can be referred to mutually. Each embodiment focuses on describing the differences from other embodiments. In particular, the system embodiments are basically similar to the method embodiments, so the description is relatively simple; relevant parts can be referred to the descriptions of the method embodiments.

[0074] The above are merely preferred embodiments of the present invention and are not intended to limit the scope of protection of the present invention. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention are included within the scope of protection of the present invention.

Claims

1. A process for microzone targeted cleaning of LCD liquid crystal panels, characterized in that, The process comprises: Step S1, spraying a volatile temporary super-hydrophobic treatment agent on the surface of an LCD liquid crystal cell to form a temporary super-hydrophobic film on the surface of the LCD liquid crystal cell after solidification; Step S2, locally heating a corresponding treatment area on the liquid crystal residual point on the surface of the LCD liquid crystal cell to destroy the super-hydrophobic film of the treatment area and form a liquidophilic target area; Step S3, immersing the LCD liquid crystal cell in an inert fluorinated liquid to form and maintain a stable air film isolation layer between the super-hydrophobic surface of the LCD liquid crystal cell and the fluorinated liquid; Step S4, under the isolation of the air film isolation layer, injecting an alkaline cleaning solution prepared by mixing methanol and sodium hydroxide at a mass ratio of 1000g:20g into the liquidophilic target area to react and clean the residual liquid crystal; after the reaction and cleaning is completed, injecting an acidic ethanol cleaning solution into the liquidophilic target area for neutralization and replacement; Step S5, taking out and drying the LCD liquid crystal cell, and then placing it in a sealed treatment chamber to generate pyrazole vapor by heating and sublimating solid pyrazole, and making the pyrazole vapor contact the surface of the LCD liquid crystal cell for a gas phase chelation purification reaction; Step S6, removing the temporary super-hydrophobic film on the surface of the LCD liquid crystal cell.

2. The process for microtargeted cleaning of LCD liquid crystal screens according to claim 1, characterized in that, The step S3 comprises: After the LCD liquid crystal cell is completely immersed in the fluorinated liquid, a micro-negative pressure of -1kPa to -10kPa is applied to the sealed cavity containing the fluorinated liquid and maintained for 1-10 seconds; The micro-negative pressure is removed, and an ultrasonic wave with a frequency of 0.5MHz to 5MHz or a mechanical vibration with an amplitude of 5μm to 200μm is applied to the sealed cavity for 2-15 seconds; A micro-positive pressure of +1kPa to +10kPa is applied to the sealed cavity and maintained to lock the air film isolation layer.

3. The process for microtargeted cleaning of LCD liquid crystal screens according to claim 1, characterized in that, After the step S1, the process further comprises: Placing the LCD liquid crystal cell with the temporary super-hydrophobic film formed thereon under a normal pressure plasma generating device to perform a scanning treatment with helium, argon or a mixture thereof as working gas; the scanning treatment activates the surface of the LCD liquid crystal cell to enhance the bonding force between the temporary super-hydrophobic film and the surface of the LCD liquid crystal cell and improve the uniformity of the distribution of the temporary super-hydrophobic film in corresponding areas of different materials.

4. The process for microtargeted cleaning of LCD liquid crystal screens according to claim 1, characterized in that, The temporary super-hydrophobic treatment agent is a solution or nanoparticle dispersion liquid of fluorine-containing silane compounds, and the temporary super-hydrophobic film formed after solidification has a contact angle with water greater than 150°.

5. The process for microtargeted cleaning of LCD liquid crystal screens according to claim 1, characterized in that, The acidic ethanol cleaning solution is prepared by adding an acidic substance to ethanol to adjust the pH value to 4.0-6.5, and the amount of ethanol added is 20g.

6. The process for microtargeted cleaning of LCD liquid crystal screens according to claim 1, characterized in that, In the step S2, the local heating is achieved by using infrared laser or a micro hot air pen, the heating area has a diameter of 50μm to 300μm, and the heating time is 50 milliseconds to 1 second to raise the surface temperature of the liquidophilic target area to 60-120℃.

7. The process for microtargeted cleaning of LCD liquid crystal screens according to claim 1, characterized in that, The step S5 comprises: Taking out and drying the LCD liquid crystal cell; The LCD liquid crystal cell is placed in a closed and purified chamber, vacuumed to a pressure below 100 Pa, then pyrazole vapor generated by sublimation of solid pyrazole is introduced to restore the chamber pressure to 1-10 kPa and keep for 1-10 min; then vacuumed again to a pressure below 10 Pa to remove the gas phase reaction product.

8. The process for microtargeted cleaning of LCD liquid crystal screens according to claim 1, characterized in that, In step S4, when the cleaning liquid is injected and the waste liquid is pumped to the lipophilic target area, the injection needle and the pumping needle are controlled to perform a micro-amplitude reciprocating motion relative to the surface of the LCD liquid crystal cell synchronously, and the motion amplitude is 5-50 μm.

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