Gas distributor for quench tower, quench tower and separation and recovery method

Abstract

The invention discloses a gas distributor for a quench tower, which is arranged below the liquid level of a tower kettle of the quench tower, and comprises a plurality of gas outlet components used for enabling a solid-containing gas-phase material to enter the quench tower, the gas outlet direction of each gas outlet component is a set direction, and the set direction is as follows: the gas outlet direction of each gas outlet component is the set direction; the projection of the axis of the quench tower on the horizontal plane where the gas outlet components are located serves as the circle center, the gas outlet directions of the gas outlet components are the same rotation direction around the circle center in the tangential direction of the circumferential position where the gas outlet components are located. The gas distributor disclosed by the invention is reasonable in structural arrangement, the gas phase and liquid phase contact degree is effectively improved, the solid-phase separation degree and the efficiency of trapping a solid phase by a liquid phase are greatly improved, and stable operation of the quench tower is ensured. The invention also provides a quench tower and a separation and recovery method.

Description

Technical Field

[0001] This invention specifically relates to a gas distributor for a quench tower, a quench tower, and a separation and recovery method. Background Technology

[0002] In the production of polysilicon, trichlorosilane (TCS), hydrogen, and silicon powder undergo a reduction reaction in a reduction furnace to produce polysilicon rods. Trichlorosilane is a crucial raw material in the polysilicon production process. Currently, trichlorosilane is mainly obtained through a cold hydrogenation process, where silicon tetrachloride, silicon powder, and hydrogen react under catalyst and high temperature and pressure conditions to produce trichlorosilane. The conversion rate of this reaction is generally between 25% and 30%, which means that a large amount of chlorosilane, hydrogen, and silicon powder do not participate in the reaction and need to be separated and recovered.

[0003] In the polysilicon industry, quench towers are used to cool, remove dust, and separate components from the fluidized bed reaction material. The quench tower is a crucial piece of equipment in the downstream of the cold hydrogenation process. Its main functions are as follows: (1) Cooling and dust removal separation: The fluidized bed outlet material generally enters the quench tower after heat recovery through multiple heat exchangers. The liquid-phase chlorosilane contacts the gas-phase feed, cooling the material and simultaneously capturing silicon powder and other impurities through the liquid phase, thus achieving gas-solid separation; (2) Impurity removal: The quench tower effectively reduces the content of impurities such as metallic aluminum chloride in the gas phase through fresh tetrasilane rinsing. The stable operation of the quench tower plays a decisive role in the effective removal of impurities from the entire system.

[0004] Currently, structural optimization of quench towers mainly focuses on modifications to internal packing or tray structures, with insufficient attention paid to gas distributors. As the initial structure for the solid-containing gas phase entering the quench tower, the gas distributor significantly impacts the gas phase distribution and gas-liquid contact within the tower. The gas distributor ensures the gaseous feed enters the quench tower in a bubbling manner, guaranteeing sufficient contact with the liquid phase to achieve cooling and component separation. Therefore, a well-designed gas distributor structure is crucial for maximizing the quench tower's functionality. However, existing quench tower gas distributor structures are often flawed, resulting in uneven gas phase distribution, large bubble sizes, insufficient gas-liquid contact, and poor cooling, impurity removal, and component separation. Ultimately, this negatively impacts the quench tower's efficiency and stable operation. Summary of the Invention

[0005] The technical problem to be solved by this invention is to address the aforementioned shortcomings in the prior art by providing a gas distributor for a quench tower. This gas distributor has a reasonable structure, effectively improving the contact between the gas and liquid phases, greatly increasing the degree of solid-phase separation and the efficiency of liquid-phase solid-phase capture, thus ensuring the stable operation of the quench tower. This invention also provides a quench tower and a separation and recovery method.

[0006] This invention provides a gas distributor for a quench tower, which is installed below the liquid level in the bottom of the quench tower and includes multiple gas outlet components for allowing solid-containing gaseous materials to enter the quench tower. The gas outlet direction of each of the gas outlet components is a predetermined direction, which is the tangential direction of the circumference of the gas outlet component with the projection of the quench tower axis onto the horizontal plane where the gas outlet component is located as the center. Furthermore, the gas outlet directions of each of the gas outlet components are all in the same rotational direction around the center of the circle.

[0007] Furthermore, the gas outlet component has a microbubble generating structure.

[0008] Furthermore, the gas outlet components are arranged in multiple layers along the vertical direction, with each gas outlet component in any layer being evenly arranged on the same circumference surrounding the axis of the quench tower.

[0009] Furthermore, the circumferential diameter of the outlet components in each layer gradually decreases from top to bottom, so that the outlet components are distributed as a whole on the outer surface of a cone coaxial with the quench tower.

[0010] Furthermore, the angle between the generatrix of the cone containing the gas outlet components and the vertical direction is 10° to 60°, and the apex of the cone is 500mm to 500mm from the slag discharge port of the quench tower.

[0011] 2000mm.

[0012] Furthermore, the gas outlet component is located on the outer surface of the cone at a distance of 200mm to 1000mm from the liquid phase outlet of the quench tower.

[0013] Furthermore, the gas distributor also includes a connecting pipe and a gas distribution pipe. The connecting pipe is a loop pipe and is coaxial with the quench tower. The connecting pipe is provided with an inlet that communicates with the solid-containing gaseous material supply equipment. There are multiple gas distribution pipes, and the inlet end of each gas distribution pipe is connected to the connecting pipe. The gas outlet component is provided on the body of the gas distribution pipe.

[0014] Furthermore, each of the gas distribution pipes is distributed along an oblique line that is inclined relative to the vertical direction, so that each gas distribution pipe gradually points towards the axis of the quench tower from the top to the bottom, and each gas distribution pipe is evenly distributed around the axis of the quench tower, so that each gas distribution pipe is evenly distributed on the outer surface of the same cone. Each gas outlet component is located on the side where the gas distribution pipe is tangent to the cone, and the distribution side of each gas outlet component is the side that points to the same rotation direction around the axis of the cone.

[0015] The present invention also provides a quench tower, comprising a tower body, a tray, packing, and the aforementioned gas distributor for the quench tower. The packing is filled in a packing zone located in the upper part of the tower body, the tray is installed in a tray zone located in the middle part of the tower body, and the gas distributor for the quench tower is installed in the lower part of the tower body, located below the liquid level in the bottom of the tower body.

[0016] Furthermore, the quench tower also includes a clear liquid pump and a circulation pump. A clear liquid spray port is provided above the packing zone of the tower body. The clear liquid spray port is connected to a clear liquid storage tank via the clear liquid pump for introducing clear liquid into the tower body. A gas phase inlet is provided at the location of the gas distributor for the quench tower. The gas phase inlet is connected to a solid-containing gas phase material supply device for allowing the solid-containing gas phase material to enter below the bottom liquid level of the tower. A liquid phase outlet is provided below the gas distributor for the quench tower, and a circulation spray port is provided in the middle of the tray area. The liquid phase outlet and the circulation spray port are connected via a circulation pump to transport the bottom liquid phase to the circulation spray port. A gas phase outlet is provided at the top of the tower body for discharging the treated gas phase. A slag discharge port is provided at the bottom of the tower body for discharging the collected solid phase.

[0017] The present invention also provides a separation and recovery treatment method, using the above-mentioned quench tower, the method comprising the following steps:

[0018] The inside of the tower is cleaned with a cleaning solution, and then the cleaning solution is discharged.

[0019] The clear liquid is fed back into the tower body to establish a bottom liquid level higher than that of the gas distributor for the quench tower;

[0020] Start the circulation pump, and then send the solid-containing gaseous material through the gas distributor of the quench tower to the bottom of the tower bottom liquid level;

[0021] Spray the cleaning liquid into the tower;

[0022] The solid phase after emission and capture.

[0023] Furthermore, the gas velocity of the solid-containing gaseous material entering the outlet component of the gas distributor for the quench tower is 15 m / s to 25 m / s.

[0024] Furthermore, the gas velocity at the gas inlet of the quench tower containing solid gas is 5 m / s to 15 m / s, and the gas velocity entering the gas distributor body of the quench tower is 10 m / s.

[0025] ~20m / s.

[0026] The gas distributor for the quench tower of the present invention is provided with multiple gas outlet components. The multiple subdivided gas outlet components can make the bubble volume at a single gas outlet position smaller under the same gas volume, thereby increasing the contact degree between the solid-containing gas phase and the liquid phase in the tower. At the same time, it increases the collection efficiency and collection effect of the liquid phase on the solid phase in the solid-containing gas phase, and also accelerates the heat exchange between the solid-containing gas phase and the liquid phase, thus enhancing the cooling function.

[0027] Furthermore, unlike conventional gas distributors, each gas outlet component has a predetermined direction for its gas outlet. This predetermined direction refers to the tangential direction of the circumference of the gas outlet component, centered on the projection of the quench tower axis onto the horizontal plane where the gas outlet component is located. Therefore, when the solid-containing gas phase enters the quench tower, it will push the liquid phase inside the tower. Moreover, the gas outlet directions of each gas outlet component are all in the same rotational direction around the center, that is, all are clockwise or all are counterclockwise, avoiding the gas outlet components pushing in opposite directions. Under this unified pushing action, the liquid phase inside the quench tower keeps rotating and forms a vortex. Under this rotational action, solid particles are gathered at the center of the liquid phase vortex, while the solid content in the liquid phase around the vortex is reduced, causing it to detach from the liquid phase and deposit to the bottom of the tower.

[0028] This invention cleverly sets the outlet direction so that the energy carried by the gas phase drives the liquid phase in the tower bottom to rotate, causing the entire fluid to rotate and form a vortex. This process not only significantly improves the heat exchange rate and degree between the two, but also further increases the degree of liquid-solid separation and accelerates this separation process. This further enhances the cooling, dust removal, and component separation functions of the quench tower, reduces the impurity content of the gas phase at the top of the quench tower, improves the operational stability of downstream system equipment, and further achieves energy saving and consumption reduction in the large system. Attached Figure Description

[0029] Figure 1 This is a three-dimensional structural schematic diagram of the gas distributor for the quench tower in Embodiment 1 of the present invention;

[0030] Figure 2 This is a schematic diagram of the planar structure of the gas distributor for the quench tower in Embodiment 1 of the present invention;

[0031] Figure 3 This is a schematic diagram of the horizontal cross-sectional structure of the gas distributor for the quench tower in Embodiment 1 of the present invention;

[0032] Figure 4 This is a schematic diagram of the vertical cross-sectional structure of the gas distributor for the quench tower in Embodiment 1 of the present invention;

[0033] Figure 5 This is a front view of the gas distribution pipe of the gas distributor for the quench tower in Embodiment 1 of the present invention;

[0034] Figure 6 This is a side view of the gas distribution pipe of the gas distributor for the quench tower in Embodiment 1 of the present invention;

[0035] Figure 7 This is a cross-sectional view of the gas distribution pipe of the gas distributor for the quench tower in Embodiment 1 of the present invention;

[0036] Figure 8 This is a top view of the gas distribution pipe of the gas distributor for the quench tower in Embodiment 1 of the present invention;

[0037] Figure 9 This is a schematic diagram of the tower structure of the quench tower in Embodiment 2 of the present invention;

[0038] Figure 10 This is a schematic diagram of the overall structure of the quench tower in Embodiment 2 of the present invention.

[0039] In the diagram: 1. Connecting pipe; 11. Inlet; 12. Anti-erosion coating; 2. Gas distribution pipe; 3. Microbubble generating structure; 4. Tower body; 41. Packing area; 42. Tray area; 43. Clear liquid spray port; 44. Gas phase inlet; 45. Liquid phase outlet; 451. Circulation backup port; 46. Circulation spray port; 47. Gas phase outlet; 471. Gas phase backup port; 48. Slag discharge port; 5. Tray; 6. Packing; 7. Clear liquid pump; 8. Circulation pump; 9. Skirt. Detailed Implementation

[0040] The technical solutions of the invention will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the invention, not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without creative effort are within the scope of the invention.

[0041] Various cross-sectional views of embodiments of the present invention are shown in the accompanying drawings. These drawings are not to scale, and some details have been enlarged for clarity, and some details may have been omitted. The shapes of the various regions and layers shown in the drawings, as well as their relative sizes and positional relationships, are merely exemplary and may deviate from reality due to manufacturing tolerances or technical limitations. Furthermore, those skilled in the art can design regions / layers with different shapes, sizes, and relative positions as needed.

[0042] In the description of this invention, it should be noted that the terms "upper" and "lower" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience and simplification of the description and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0043] In the description of this invention, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0044] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "connection," "setting," "installation," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0045] Any range described in this invention includes the endpoint, any value between the endpoints, and any subrange consisting of the endpoint or any value between the endpoints.

[0046] Unless otherwise specified, all raw materials used in this invention can be obtained commercially, and the equipment used in this invention can be conventional equipment in the relevant field or refer to existing technology in the relevant field.

[0047] Example 1

[0048] like Figure 1 and Figure 2 As shown, the gas distributor for the quench tower in this embodiment is located below the liquid level in the bottom of the quench tower, ensuring that the solid-containing gas enters the quench tower in the form of bubbles for processing. It includes multiple gas outlet components for allowing the solid-containing gaseous material to enter the quench tower. The gas outlet direction of each gas outlet component is a predetermined direction, which is the tangential direction of the circumference of the gas outlet component with the projection of the quench tower axis onto the horizontal plane where the gas outlet component is located as the center. The gas outlet directions of each gas outlet component are all in the same rotational direction around the center.

[0049] In this embodiment, the multiple gas outlet components, under the same gas volume, can make the bubble volume of a single gas outlet position smaller, thus increasing the contact degree between the solid-containing gas phase and the liquid phase in the tower. This also increases the liquid phase's capture efficiency and capture effect on the solid phase in the solid-containing gas phase, and accelerates the heat exchange between the solid-containing gas phase and the liquid phase, enhancing the cooling function.

[0050] Furthermore, unlike conventional gas distributors, the gas outlets of each component have the aforementioned set direction. Therefore, when the solid-containing gas phase enters the quench tower, it pushes the liquid phase inside the tower. Moreover, the gas outlets of each component are all rotating in the same direction around the center, i.e., all are clockwise or all are counterclockwise, avoiding conflicting gas pushing directions. Under this unified pushing action, the liquid phase inside the quench tower keeps rotating and forms a vortex. Under this rotational action, solid particles are gathered at the center of the liquid phase vortex, while reducing the solid content in the liquid phase around the vortex, causing it to detach from the liquid phase and deposit at the bottom of the tower.

[0051] This invention cleverly uses the air outlet orientation to drive the air inlet action, causing the energy carried by the gas phase to rotate the liquid phase in the tower bottom, thus creating a vortex. This process not only significantly increases the heat exchange rate and degree between the two phases but also enhances the degree of liquid-solid phase separation and accelerates the separation process. This further enhances the cooling, dust removal, and component separation functions of the quench tower, reduces the impurity content in the gas phase at the top of the quench tower, improves the operational stability of downstream system equipment, and further achieves energy saving and consumption reduction in the large system.

[0052] In this embodiment, as Figures 5 to 7 As shown, the gas outlet component is a microbubble generating structure 3. The microbubble generating structure 3 can fully disperse the gas phase into micro- and nano-bubble clusters, preventing the bubbles from entering below the liquid level in the form of conventional large bubbles. On one hand, the microbubble generating structure 3 effectively reduces the gas velocity and increases the residence time of the gas phase by converting the kinetic energy of the gas into the surface energy of the microbubble clusters and the kinetic energy of the liquid rotation, which is beneficial for cooling, dust removal, and component separation processes, while simultaneously creating a swirling structure in the liquid phase. On the other hand, by dispersing the gas phase into microbubble clusters, the gas-liquid contact area and the liquid-solid contact area are increased, enhancing the cooling, dust removal, and component separation processes. The microbubble generating structure 3 can employ microbubble generators including, but not limited to, Venturi type, jet flow type, and oscillating type.

[0053] In this embodiment, the gas outlet components are arranged in multiple layers along the vertical direction, with each gas outlet component in any layer evenly arranged on the same circumference surrounding the axis of the quench tower. This multi-layer arrangement allows the gas outlet components to provide propulsion not only in a single horizontal plane but also in the longitudinal space, thereby further enhancing the degree to which the liquid phase forms a vortex coaxial with the quench tower.

[0054] In this embodiment, the circumferential diameter of the gas outlet components gradually decreases from top to bottom, so that the gas outlet components are distributed on the outer surface of a cone coaxial with the quench tower. As a result, the liquid phase forms a cone-shaped vortex under the impetus of the gas outlet. The spatial layout of the cone structure is consistent with the vortex structure, which is most conducive to the liquid phase swirling structure and can maximize the effective utilization of gas phase energy.

[0055] In this embodiment, the angle between the generatrix of the cone containing the gas outlet components and the vertical direction is 10° to 60°. This angle range is most favorable for the stable operation of the equipment. If the angle is too small (below this range), the gas may be too close to the quench tower wall, posing a risk that the gas phase may enter the bottom liquid circulation pump, affecting the stable operation of the equipment. If the angle is too large (above this range), the equipment may not be fully submerged in the liquid phase after it forms a vortex, resulting in the risk that the solid-containing gas phase may not fully contact the bottom liquid phase before entering the quench tower. This angle range has a serious impact on the stable operation and performance of the equipment. The distance between the apex of the cone and the quench tower slag discharge port 48 is 500mm to 2000mm. This distance range ensures that the solid phase accumulates at the slag discharge port 48, preventing it from redispersing into the liquid phase due to excessive distance, while also providing sufficient space for slag discharge. This prevents the solid-containing gas phase material from entering the bottom slag discharge pump due to excessive distance during the slag discharge process, which could lead to a safety accident in the system. This distance range is primarily to ensure a sufficient safe distance between the center of the vortex and the slag discharge port. Too small a distance could lead to the vortex center directly connecting to the slag discharge port, while too large a distance results in excessively large equipment size, too much liquid phase in the reboiler, increased equipment investment, and reduced inherent system safety.

[0056] In this embodiment, the distance between the outer surface of the cone where the gas outlet component is located and the liquid outlet 45 of the quench tower is 200mm to 1000mm. The specific distance can be selected based on the tower diameter to ensure that the gas phase output from the gas distributor does not enter the liquid outlet 45 of the tower bottom. This distance range primarily prevents the gas phase at the vortex center or the feed gas phase from directly communicating with the liquid outlet 45 of the quench tower, which could lead to gas phase entering the liquid circulation pump and causing cavitation damage. Too small a distance could result in the risk of the vortex center directly communicating with the liquid outlet, while too large a distance would result in excessively large equipment size, too much liquid in the tower bottom, increased equipment investment, and reduced inherent system safety.

[0057] In this embodiment, as Figures 1 to 4 As shown, the gas distributor also includes a connecting pipe 1 and a gas distribution pipe 2. The connecting pipe 1 is a loop pipe, and it is coaxial with the quench tower. The connecting pipe 1 is equipped with an inlet 11 that connects to the solid-containing gaseous material supply equipment. There are multiple gas distribution pipes 2, and the inlet end of each gas distribution pipe 2 is connected to the connecting pipe 1. An outlet component is installed on the pipe body of the gas distribution pipe 2. The loop pipe enables interconnection between each gas distribution pipe 2, which can better solve the problem of uneven gas velocity and pressure at different gas supply locations. Since each gas distribution pipe 2 is supplied with gas from two directions, the uniform distribution effect is better during operation.

[0058] In this embodiment, there can be one or two inlets 11, or multiple gas inlets arranged symmetrically. Preferably, there are two gas inlets 11 arranged symmetrically. The gas velocity entering the inlet 11 is 5 m / s to 15 m / s, preferably 10 m / s to 15 m / s. The solid gas inlet 11 is less than 1.0 m from the liquid surface of the bottom of the tower, preferably less than 1.5 m. Two or more inlets 11 can better achieve consistent pressure and gas velocity throughout the loop.

[0059] In this embodiment, each gas distribution pipe 2 is distributed along an oblique line that is inclined relative to the vertical direction, so that each gas distribution pipe 2 gradually points towards the axis of the quench tower from the top to the bottom, and each gas distribution pipe 2 is evenly distributed around the axis of the quench tower, so that each gas distribution pipe 2 is evenly distributed on the outer surface of the same cone. Each gas outlet component is located on the side of the gas distribution pipe 2 that is tangent to the cone, and the distribution side of each gas outlet component is the side that points to the same rotation direction around the axis of the cone. That is, each gas outlet component is located on the side of the gas distribution pipe 2 that is tangent to the cone surface in a clockwise direction or in a counterclockwise direction, or in other words, the microbubble generating structure 3 is arranged on the gas distribution pipe 2 in the same clockwise or counterclockwise direction. The gas distribution pipe 2 not only provides a gas supply path for the gas outlet component, but also serves as the connection basis for the gas outlet component, enabling it to achieve the aforementioned corresponding conical layout.

[0060] In this embodiment, the distance between the connecting pipe 1 and the wall of the quench tower body 4 (tower bottom) is 20mm to 300mm, preferably 20mm to 200mm. To prevent solids in the solid-containing gas from clogging the connecting pipe 1 and to prevent the solid-containing gas from severely scouring the pipe and causing leakage, the internal gas velocity is guaranteed to be 10m / s to 20m / s, preferably 15m / s to 20m / s.

[0061] The connecting pipe 1 has uniformly spaced holes, preferably 6-8 holes, arranged symmetrically with respect to the solid-containing gas inlet 11, for connecting the gas distribution pipe 2. The gas distribution pipe 2 is located below the annular pipe, with its top open and connected to the connecting pipe 1, and its bottom closed. It forms a conical shape with an angle of 10° to 60° to the vertical direction. The apex of the formed cone structure is 500mm to 2000mm from the slag discharge port 48. There are 6 to 8 gas distribution pipes; in this embodiment, 8 are specifically selected. They are uniformly arranged on the annular pipe to ensure that the gas feed can fully drive the liquid in the tower bottom to swirl. The center of the swirling vortex is located at the slag discharge port 48 at the very center of the bottom of the tower bottom, effectively achieving the collection and discharge of solid materials. The tower bottom liquid outlet 45 is designed to have a distance of 200mm to 1000mm between it and the conical surface formed by the gas distributor, specifically selected according to the tower diameter, to ensure that the gas phase from the gas distribution pipe 2 does not enter the tower bottom liquid outlet 45. In this embodiment, the angle between the gas distribution pipe 2 and the vertical direction is further optimized to 15° to 45°, that is, the angle between the generatrix of the cone where the gas outlet component is located and the vertical direction is optimized to 15° to 45°; the distance between the apex of the cone structure and the slag discharge port 48 is further optimized to 500mm to 1500mm, that is, the distance between the apex of the cone where the gas outlet component is located and the slag discharge port 48 of the quench tower is optimized to 500mm to 1500mm.

[0062] The gas velocity of solid-containing gaseous material entering inlet 11 is 5m / s to 15m / s. The interior of inlet 11 is lined with ceramic and other anti-erosion structures as an anti-erosion coating 12 to prevent the solid-containing gas from severely eroding the pipeline and causing pipeline leakage. In this embodiment, its internal gas velocity is further optimized to 10m / s to 15m / s. The solid-containing gas inlet 11 is guaranteed to be at least 1.5m below the liquid surface of the quench tower bottom. The gas velocity entering the connecting pipe 1 is 10 m / s to 20 m / s. Specifically, in this embodiment, the gas distributor (both the connecting pipe 1 and the gas distribution pipe 2) uses an anti-erosion coating 12 with an inner ceramic lining to prevent severe erosion of the pipe by solid-containing gas, which could lead to leakage. Its thickness is 20-50% of the outer shell thickness of the gas distributor, preferably 40-50%. The internal gas velocity of the connecting pipe 1 and the gas distribution pipe 2 is further optimized to 15 m / s to 20 m / s. The connecting pipe 1 has a circular ring structure, with a distance of 20 mm to 200 mm between the ring and the tower. The overall opening ratio of the gas distribution pipe 2 is 10%-50%, preferably 20%-40%. This opening ratio range can effectively balance the relationship between the structural strength of the equipment and the gas velocity required for the microbubble generation structure. The gas distributor formed by the connecting pipe 1 has a conical structure, ensuring that after the gas enters the tower, it drives the liquid in the tower to swirl. The flow rate of the solid-containing gaseous material entering the quench tower via the gas inlet 44 and the main body can be varied by changing the cross-sectional area at these two locations. The gas velocity gradually increases from its entry into the gas distributor to its exit from the gas distributor, thus ensuring the gas velocity required for the microbubble generation structure 3.

[0063] like Figures 5 to 8 As shown, the number of microbubble generating structures 3 arranged on a single gas distribution pipe 2 is 2-6, preferably 4. That is, from the overall perspective, the microbubble generating structures 3, which serve as the gas outlet component, have 2-6 layers from top to bottom, and in this embodiment, 4 layers are preferred. The gas velocity of the solid-containing gaseous material entering the microbubble generating structure 3 is 15m / s to 25m / s, and in this embodiment, it is further preferred to be 20m / s to 25m / s. This flow velocity range has a good effect on the effective rotation of liquid, gas breakup, and normal operation of equipment. Below this flow velocity range, it is difficult for the liquid to form effective rotation, and the gas phase is difficult to break into microbubble clusters; above this flow velocity range, the gas-solid fluid will cause too much abrasion to the pipe, and at the same time, if the gas velocity is too high, there is a safety risk that the gas phase will directly enter the circulating pump from the side liquid phase circulation port.

[0064] In this embodiment, the microbubble generating structure 3 employs an anti-erosion coating 12 with an inner ceramic lining to prevent severe erosion of the pipeline by solid-containing gas, which could lead to pipeline leakage. The microbubble generating structure 3 in this embodiment uses a Venturi-type microbubble generating structure, which, while dispersing the gas phase into microbubbles, slows down the microbubble cluster through the diffusion section of the Venturi structure, increasing the contact time between the solid-containing gas phase and the liquid phase in the tower bottom, thus enhancing the separation effect of cooling and dust removal components. Further, as... Figure 7 As shown, the Venturi-type microbubble generating structure is radially perpendicular to the gas distribution pipe 2 and the conical surface it forms. The throat diameter of each Venturi-type microbubble generating structure gradually increases from the gas distributor downwards along the gas distribution pipe, thereby ensuring that the gas is evenly distributed along the gas distribution pipe as much as possible, so that the formed vortex can effectively realize the solid-liquid phase separation process.

[0065] This embodiment of the gas distributor for a quench tower relates to the field of chemical technology and can be used in quench towers for material processing and recovery after fluidized bed reactions in the polysilicon industry. Through reasonable optimization of the gas distributor structure, the cooling, dust removal, and component separation effects of the quench tower can be effectively improved. Structurally, it mainly includes a connecting pipe 1 for the gas distributor, an inlet 11 containing solid and gaseous phase materials, a gas distribution pipe 2, and a microbubble generating structure 3 as the gas outlet component. In terms of function, the structure includes:

[0066] Inlet 11 serves as the inlet for the entire structure. Inlet 11 is positioned below the bottom liquid level of the quench tower to ensure that solid-containing gas enters the quench tower in the form of bubbles for processing. The pipe of inlet 11 is connected to the loop-shaped connecting pipe 1 to introduce the gas phase into the gas distribution pipe 2 and then discharge it from the microbubble generating structure 3.

[0067] The connecting pipe 1, which is in the shape of a ring tube (also known as the gas distributor shell), has an overall ring structure. This is mainly to ensure that the solid gas is evenly distributed in the gas distributor, so that the amount of gas entering each gas distribution pipe 2 is approximately the same.

[0068] Anti-erosion coating 12 covers the entire inner wall of the gas distributor. Due to the increased gas flow rate in this structural design, the solid particles entrained in the gas phase cause severe erosion of the pipeline. In order to ensure the long-term stable operation of this structure, an anti-erosion coating is applied to the entire inner wall of the gas distributor. The coating material includes, but is not limited to, ceramics, polytetrafluoroethylene, etc.

[0069] Gas distribution pipe 2 is connected to connecting pipe 1 at its top and has openings on its side connecting to microbubble generating structure 3. It is uniformly arranged on connecting pipe 1, forming a conical structure with the connecting pipe 1. Its inner wall is also covered with an anti-erosion coating 12. Microbubble generating structure 3 is arranged on gas distribution pipe 2 to disperse the gas phase into microbubble clusters. Microbubble generating structure 3 is perpendicular to gas distribution pipe 2 and parallel to the plane of connecting pipe 1. On one hand, the microbubble generating structure 3 causes the gas phase to drive the liquid phase in the tower bottom to rotate, producing a liquid phase rotation effect and achieving solid-liquid phase separation. On the other hand, the introduction of microbubble generating structure 3 disperses the gas phase into microbubble clusters, enhancing heat transfer, mixing, and mass transfer processes, and improving the separation of components in the cooling and dust removal process of the quench tower.

[0070] In general, the gas distributor of this embodiment has the following advantages:

[0071] (1) By utilizing the gas's own outflow motion to propel the liquid phase, the liquid phase in the quench tower bottom can be effectively rotated, achieving solid-liquid phase separation. On the one hand, this ensures that the liquid phase collected from the bottom of the tower and entering the bottom pump is basically free of solid silicon powder, improving the operational stability of the bottom pump. It also prevents silicon powder from entering the quench tower plates or packing during the circulating spraying process, which could lead to blockage of the relevant structures and affect the separation efficiency of the quench tower. This effectively improves the overall operational stability of the quench tower and fully utilizes the cooling, dust removal, and component separation functions of the quench tower. On the other hand, the collection of solid silicon powder and chlorides through the new gas distributor reduces the amount of chlorosilane discharged from the bottom slag outlet. To a certain extent, the relevant slag can be directly sent to the hydrolysis reactor for processing, eliminating the need for the original slurry section and effectively reducing the related process investment and operating costs.

[0072] (2) Because a gas distribution pipe 2 is arranged on the gas distributor, and a horizontally placed microbubble generating structure 3 is arranged on the gas distribution pipe. On the one hand, the horizontally arranged gas inlet structure effectively avoids fluctuations in the gas phase feed rate or the liquid level in the tower bottom, which would cause the solid-containing gas phase to enter the quench tower without sufficient contact with the liquid phase in the tower bottom. This can reduce the problem of blockage caused by silicon powder entering the lower tray and upper packing, and further lead to flooding. The horizontal structure can, to a certain extent, effectively ensure the contact time between the solid-containing gas phase and the liquid phase in the tower bottom, and enhance the cooling and dust removal component separation function of the quench tower. On the other hand, the introduction of the microbubble generating structure 3 disperses the solid-containing gas phase into microbubble groups, effectively increasing the contact area between the gas phase and the liquid phase in the tower bottom, enhancing the heat transfer rate of the solid-containing gas phase and the efficiency of the absorption of impurities such as metal chlorides by the liquid phase, and increasing the probability of solid particles in the gas phase being captured by the liquid phase. This structure effectively enhances the cooling and dust removal component separation function of the quench tower, and can effectively ensure that the tower plates and packing of the quench tower can further perform their functions, reducing the metal impurity content of the gas phase taken out from the top of the tower.

[0073] As can be seen from the above, the gas distributor in this embodiment utilizes the kinetic energy carried by the feed gas phase itself. Through a newly designed structure, the gas phase can drive the liquid phase to rotate, producing a separation effect and effectively realizing the solid-liquid phase separation process. At the same time, by introducing a microbubble generator into the gas distribution pipe, the gas phase is dispersed into a microbubble cluster, enhancing the heat transfer, mixing, and mass transfer effects between the feed gas phase and the bottom liquid phase, and fully leveraging the cooling and dust removal component separation effect of the quench tower.

[0074] Example 2

[0075] The quench tower in this embodiment, such as Figure 9 and Figure 10 As shown, the tower includes a tower body 4, trays 5, packing 6, and the gas distributor for the quench tower in Example 1. The packing 6 fills the packing zone 41 located in the upper part of the tower body 4, mainly for component separation. The trays 5 are installed in the tray zone 42 located in the middle (or lower or lower-middle) part of the tower body 4, mainly for cooling and dust removal. The trays 5 are numbered 1# to 10#. The number of trays here does not refer to the actual number of trays, but is only for illustration. Some trays are below the middle circulation spray port for cooling and dust removal of gaseous materials, while other trays are above the middle circulation spray port to prevent solids in the gas phase from entering the packing zone due to incomplete treatment. The gas distributor for the quench tower is installed in the lower part of the tower body 4, below the liquid level in the tower bottom. In summary, the tower body 4 consists of a packing zone 41, a tray zone 42, and a gas distributor from top to bottom.

[0076] In this embodiment, the quench tower also includes a clear liquid pump 7 and a circulation pump 8. The tower body 4 has a clear liquid spray port 43 above the packing zone 41. The clear liquid spray port 43 is connected to the clear liquid storage tank through the clear liquid pump 7, which is used to introduce clear liquid into the tower body 4 and send fresh liquid materials into the quench tower. It is mainly used for the gas-liquid mass transfer process in the packing zone 41 to realize the component separation function.

[0077] The tower body 4 has a gas phase inlet 44 at the location of the gas distributor for the emergency cooling tower. The gas phase inlet 44 is connected to the solid-containing gas phase material supply equipment and serves as the feed inlet of the emergency cooling tower to allow the solid-containing gas phase material to enter below the liquid level in the tower bottom. The inlet of the connecting pipe 1 in the gas distributor is connected to the gas phase inlet 44.

[0078] The tower body 4 has a liquid phase outlet 45 below the gas distributor for the quench tower. The liquid phase outlet 45 is located above the slag discharge port 48 and serves as the liquid phase outlet of the tower bottom. Then, it is sent to the central circulating spray port 46 through the tower bottom circulating pump 8.

[0079] A circulating spray port 46 is provided in the middle of the tray area 42. The liquid phase outlet 45 and the circulating spray port 46 are connected by a circulating pump 8 to transport the bottom liquid phase to the circulating spray port 46 and send the bottom liquid phase back to the quench tower to achieve cooling and dust removal of the gas phase.

[0080] The top of the tower body 4 is provided with a gas phase outlet 47, which serves as the outlet for the gas phase after the quench tower has finished processing, and is used to discharge the gas phase after the processing is completed.

[0081] The bottom of the tower body 4 is provided with a slag discharge port 48, which serves as the solid slag discharge port of the tower bottom for discharging the collected solid phase.

[0082] This embodiment of the quench tower is based on the concept in Embodiment 1, and provides an application of the gas distributor in the quench tower, which effectively ensures the separation of solid-containing gas phase cooling and dust removal components. Depending on the specific application, the overall structure of the quench tower generally also includes:

[0083] Skirt 9 is installed between the tower body 4 and the ground (or mounting plane) to serve as the base of the quench tower and support related tower equipment.

[0084] The circulating backup port 451 serves as a backup port for the liquid phase outlet 45 in the column bottom, preventing the liquid phase outlet 45 from becoming unusable due to abnormal reasons and affecting the normal operation of the column.

[0085] Gas phase backup port 471 serves as a backup port in case of an anomaly in the top gas phase outlet 47;

[0086] In this embodiment, there are four manholes, located at the liquid outlet 45 (the manhole number here is set as M1, the same below), the circulating spray port 46 (M2), between the tray area 42 and the packing area 43 (M3), and the clear liquid spray port 43 (M4), which are mainly used for the maintenance process of the quench tower.

[0087] In this embodiment, three differential pressure level gauge ports are installed above and below the gas distributor (below the liquid phase outlet 45°), numbered L1a, L2a, L3a, L1b, L2b, and L3b, respectively. These ports serve as indicators of the liquid level in the tower bottom, ensuring the distance between the liquid level in the tower bottom and the gas distribution pipe 2, and preventing the gas phase from directly entering other components in the upper part of the quench tower without contacting the liquid phase in the tower bottom.

[0088] Inspection holes are provided in this embodiment, two of which are located on the skirt base 9 and numbered B1 and B2 respectively. They are mainly used for the maintenance of the quench tower.

[0089] In general, the lower section of the quench tower is equipped with tray 5, which has the functions of cooling, dust removal and anti-clogging. The upper section is equipped with packing 6, which has the function of component separation. The liquid phase in the tower bottom is pumped into the circulating spray port 46, and fresh silicon tetrasilicon is sprayed through the clear liquid spray port 43 at the top. At the same time, the gas phase inlet 44 is set below the liquid level in the bottom of the quench tower, so that the gas phase feed enters the quench tower in the form of bubbles, ensuring that it is in full contact with the liquid phase to achieve the functions of cooling, dust removal and component separation, reducing the amount of silicon powder entering the packing or tray area, thereby effectively ensuring the function of the quench tower.

[0090] During operation, the gaseous material enters the bottom of the quench tower below the liquid level, exchanges heat with the liquid phase, and pushes the liquid phase to form a vortex, allowing the liquid phase to fully capture the solid slag in the gas phase. Then, the vortex action causes the solid slag to concentrate at the bottom of the tower bottom. The supernatant in the liquid phase containing solid material inside the quench tower bottom is pumped to the circulating spray port 46 for spraying. The slag at the bottom slag discharge port 48 is sent to the slurry section for treatment. After treatment, the gas phase rises and passes through a portion of the tower plates and the middle circulating spray port 46 to achieve cooling and dust removal. It is then further filtered by another portion of the tower plates and further separated into gas and liquid phase components in the packing zone before being recovered through the gas phase outlet 47.

[0091] In the past, due to the difficulty in separating the materials in the tower bottom, the supernatant often contained a large amount of silicon powder, affecting the stable operation of the tower bottom circulating pump. At the same time, the bottom slag was not completely separated, containing a large amount of liquid chlorosilane, resulting in large fluctuations in the tower bottom liquid level. However, in this embodiment, the gas distributor in Embodiment 1 is used to fully utilize the kinetic energy of the gas phase feed to achieve material rotation and separation, concentrating the solid phase at the bottom of the vortex, and then sending it to the slurry section for processing. A liquid phase outlet 45 is arranged on the side, higher than the slag discharge port 48, to ensure that it does not carry silicon powder into the tower bottom circulating pump 8 for spraying. This can effectively ensure the stable operation of the quench tower, and at the same time effectively improve the cooling and dust removal component separation function of the quench tower, and reduce the impurity content of the gas phase at the top of the quench tower.

[0092] In this embodiment, the quench tower is combined with the optimized gas distributor from Embodiment 1. While maintaining the original solid-containing gaseous feed flow rate unchanged, the solid-containing gaseous phase originates from the fluidized bed reaction product. The fluidized bed reaction conditions are 165 t / h silicon tetrachloride material and 45000 Nm³ / h. 3 The fluidized bed temperature was 550℃, and the fluidized bed pressure was 3.0 MPa / h. The table below compares the top gas phase impurity content of the original quench tower and the quench tower using a hydrocyclone-like gas distributor. The relevant indicators are shown in the table below.

[0093] Table 1. Indicator Comparison Table

[0094]

[0095]

[0096] Example 3

[0097] The separation and recovery treatment method in this embodiment uses the quench tower of Example 2, and the method includes the following steps:

[0098] The interior of the tower body 4 is cleaned with a clean liquid sprayed through the clean liquid spray port 43, and the clean liquid after cleaning is discharged through the slag discharge port 48.

[0099] The clean liquid is sent into the tower body 4 through the clean liquid spray port 43 to establish a tower bottom liquid level higher than that of the gas distributor for the quench tower;

[0100] Start the circulation pump 8, and then send the solid-containing gaseous material through the gas inlet 44 and the gas distributor for the quench tower to the bottom of the tower bottom liquid level.

[0101] Clean liquid is sprayed into the tower body 4 through the clean liquid spray nozzle 43;

[0102] Open the slag discharge port 48 to discharge the collected solid phase.

[0103] Based on the specific structure in Example 2, the method steps of this example are further specified as follows:

[0104] 1) Before system operation, after the micro-oxygen dew point is qualified through replacement, fresh material is sent into the quench tower through the cleaning pump 7 to clean the quench tower. The cleaning pump 7 is then turned off, and the cleaning liquid is discharged through the bottom slag discharge port 48. Then, the cleaning liquid is sent into the tower body 4 through the cleaning liquid spray port 43 through the cleaning pump 7 to establish a tower bottom liquid level higher than that of the gas distributor of the quench tower. The specific height is adjusted according to the aforementioned requirements.

[0105] 2) Start the tower bottom circulation pump 8 to send the tower bottom liquid phase to the central circulation spray port 46 for spraying. The solid-containing gas phase enters the quench tower from the gas distributor. Through the special structure of the device, the solid-containing gas phase carries its own kinetic energy to make the tower bottom liquid phase rotate. At the same time, through the microbubble generating structure 3 arranged on the gas distribution pipe, the solid-containing gas feed is dispersed into microbubble groups, increasing the contact area between the gas phase and the tower bottom liquid phase, enhancing the gas-liquid heat and mass transfer process, and the liquid-solid mixing process.

[0106] 3) Start the top clear liquid pump 7 to send fresh clear liquid to the clear liquid spray port 43, and gradually open the bottom slag discharge port 48 to discharge slag. After the relevant parameters of the quench tower stabilize, monitor the impurity content in the gas phase at the top gas phase outlet 47 and the stability rate of the relevant tower parameters.

[0107] In this embodiment, the gas velocity of the solid-containing gaseous material entering the outlet component (i.e., microbubble generating structure 3) of the gas distributor for the quench tower is 15 m / s to 25 m / s. The gas velocity of the solid-containing gaseous material entering the gas phase inlet 44 of the quench tower is 5 m / s to 15 m / s. Specifically, the gas velocity entering the gas phase inlet 44 of the quench tower and the inlet 11 of the gas distributor for the quench tower is 5 m / s to 15 m / s; the gas velocity entering the main body of the gas distributor for the quench tower (i.e., connecting pipe 1 and gas distribution pipe 2) is 10 m / s to 20 m / s.

[0108] It is understood that the above embodiments are merely exemplary implementations used to illustrate the principles of the present invention, and the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention.

Claims

1. A gas distributor for a quench tower, disposed below the quench tower sump level, characterized by: The gas outlet component is a micro-bubble generating structure (3). The gas outlet component is arranged in multiple layers along the vertical direction, Each gas outlet component in any layer is uniformly arranged on the same circumference around the axis of the quench tower. The diameters of the circumferences of the arrangement positions of the gas outlet components in each layer gradually decrease from top to bottom, so that the gas outlet components are distributed on the outer surface of a cone coaxial with the quench tower.

2. The gas distributor for quench columns according to claim 1, characterized in that: The angle between the generatrix of the cone where the gas outlet components are distributed and the vertical direction is 10°-60°, and the distance from the vertex of the cone to the slag discharge port (48) of the quench tower is 500mm-2000mm.

3. The gas distributor for quench columns according to claim 1, characterized in that: The distance from the outer surface of the cone where the gas outlet components are distributed to the liquid phase outlet (45) of the quench tower is 200mm-1000mm. The connecting pipe (1) is an annular pipe coaxial with the quench tower, and the inlet (11) of the connecting pipe (1) is connected to the solid-gas phase material supply device.

4. The gas distributor for quench columns according to claim 3, characterized in that: Each gas distribution pipe (2) is distributed along an inclined line direction relative to the vertical direction, so that each gas distribution pipe (2) gradually points to the axis of the quench tower from the top end to the bottom end, 5. The gas distributor for quench columns according to claim 4, characterized in that: and each gas distribution pipe (2) is uniformly distributed around the axis of the quench tower, so that each gas distribution pipe (2) is uniformly distributed on the same outer surface of a cone, 6. The gas distributor for quench columns according to claim 4, characterized in that: each gas outlet component is arranged on the side of the gas distribution pipe (2) tangent to the cone, and the distribution side of each gas outlet component is the side pointing to the same rotation direction around the axis of the cone.

7. The gas distributor for quench towers according to any one of claims 1 to 6, characterized in that: The tower body (4), the tower plate (5), the filler (6), and the gas distributor for the quench tower according to any one of claims 1-8 are included, The filler (6) is filled in the filler area (41) arranged at the upper part of the tower body (4), The tower plate (5) is installed in the tower plate area (42) arranged at the middle part of the tower body (4), 8. The gas distributor for quench columns according to claim 7, characterized in that: The gas distributor for the quench tower is installed at the lower part of the tower body (4) below the liquid level in the tower kettle. The clear liquid pump (7) and the circulating pump (8) are also included, The tower body (4) is provided with a clear liquid spraying port (43) above the filler area (41), the clear liquid spraying port (43) is connected to the clear liquid storage tank through the clear liquid pump (7), and is used to introduce clear liquid into the tower body (4); 9. A quench tower characterized by: The tower body (4) is provided with a gas phase inlet (44) at the position of the gas distributor for the quench tower, the gas phase inlet (44) is connected to the solid-gas phase material supply device, and is used to introduce the solid-gas phase material into the lower part of the tower kettle. ​ ​ ​ 10. The quench tower of claim 9, characterized by: ​ ​ ​ The tower body (4) is provided with a liquid phase outlet (45) below the gas distributor for quenching tower, and a circulating spray opening (46) in the middle of the tray area (42), the liquid phase outlet (45) and the circulating spray opening (46) are communicated by a circulating pump (8) to deliver the liquid phase in the tower kettle to the circulating spray opening (46); The top of the tower body (4) is provided with a gas phase outlet (47) for discharging the gas phase after treatment; The bottom of the tower body (4) is provided with a slag discharge opening (48) for discharging the captured solid phase.

11. A separation and recovery treatment method characterized by comprising: The method using the quenching tower of claim 10 comprises the following steps: The inside of the tower body (4) is cleaned with clean liquid, and then the cleaned clean liquid is discharged; The clean liquid is sent into the tower body (4) again to establish a liquid level in the tower kettle higher than the gas distributor for quenching tower; The circulating pump (8) is started, and then the solid-containing gas phase material is sent into the tower kettle below the liquid level through the gas distributor for quenching tower; The clean liquid is sprayed into the tower body (4); The captured solid phase is discharged.

12. The separation and recovery treatment method according to claim 11, characterized by: The gas velocity of the solid-containing gas phase material entering the gas outlet part of the gas distributor for quenching tower is 15-25 m / s.

13. The separation and recovery treatment method according to claim 11, characterized by: The gas velocity of the solid-containing gas phase material entering the gas phase inlet (44) of the quenching tower is 5-15 m / s, and the gas velocity entering the body of the gas distributor for quenching tower is 10-20 m / s. The gas velocity of the solid-containing gas phase material entering the gas outlet part of the gas distributor for quenching tower is 15-25 m / s. The gas velocity of the solid-containing gas phase material entering the gas phase inlet (44) of the quenching tower is 5-15 m / s, and the gas velocity entering the body of the gas distributor for quenching tower is 10-20 m / s.

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