Zero-silicon plate and preparation process thereof

Abstract

The invention belongs to the field of plate preparation, and particularly relates to a zero-silicon plate and a preparation technology thereof.The zero-silicon plate is prepared from glass sand, glass powder, modified carbon fiber powder, polytetrafluoroethylene powder, resin, color paste, a coupling agent and a curing agent; the modified carbon fiber powder is obtained by carrying out oxidation treatment, modification liquid modification and ray irradiation treatment on carbon fiber powder; the raw material composition of the zero-silicon plate is limited, the glass sand and the glass powder are used as main raw materials, the modified carbon fiber powder is introduced to be matched with other raw materials, so that the strength of the prepared zero-silicon plate is improved, meanwhile, the polytetrafluoroethylene powder is introduced to be matched with the modified carbon fiber powder, and the corrosion resistance of the prepared zero-silicon plate can be improved.

Description

TECHNICAL FIELD

[0001] The present application belongs to the field of plate preparation, and particularly relates to a zero-silicon plate and a preparation process thereof. BACKGROUND

[0002] Artificial stone plate is a kind of artificial stone material processed through vacuumizing, vibration compaction, curing and other steps by taking quartz sand powder as the main filler and taking unsaturated polyester resin as the adhesive. Artificial stone plate has hard texture and dense structure, and has the characteristics of wear resistance, pressure resistance, high temperature resistance, corrosion resistance and impermeability, which cannot be compared with other decorative materials. Artificial quartz is widely used in public buildings such as hotels, restaurants, banks, hospitals and exhibition halls, and in household decoration fields such as kitchen countertops, washstands, kitchen and bathroom walls, dining tables, tea tables, window sills and door casings. Silicon-free artificial stone is a kind of high polymer synthetic material composed of aluminum powder, resin and other additives. However, it is different from traditional artificial stone in that it does not contain silicon. Therefore, silicon-free artificial stone has unique advantages in some specific application scenarios.

[0003] Silicon-free artificial stone is usually composed of aluminum powder, resin and other additives, and does not contain silicon. Therefore, it is a more environmentally friendly and healthy material, and has advantages in terms of waterproofness, antibacterial property and easy cleaning. However, since silicon-free artificial stone plate usually uses aluminum powder as filler, the dispersibility of aluminum powder in resin is insufficient and aluminum powder itself is prone to reaction, which leads to poor hardness of the prepared plate and insufficient corrosion resistance and strength, and further improvement is needed. SUMMARY

[0004] The present application aims to overcome the shortcomings of the prior art and provide a zero-silicon plate and a preparation process thereof.

[0005] The present application adopts the following technical solutions:

[0006] A zero-silicon plate comprises the following raw materials by weight: 48-56 parts of glass sand, 21-35 parts of glass powder, 22-28 parts of modified carbon fiber powder, 4-8 parts of polytetrafluoroethylene powder, 18-25 parts of resin, 3-5 parts of color paste, 1-1.5 parts of coupling agent and 1-1.5 parts of curing agent; the modified carbon fiber powder is obtained by oxidizing, modifying and irradiating carbon fiber powder.

[0007] Preferably, the modification method of the modified carbon fiber powder is as follows:

[0008] A. carbon fiber powder is placed at a temperature of 320-350℃ and baked for 50-70min to obtain oxidized carbon fiber powder;

[0009] B. the obtained oxidized carbon fiber is immersed in a modification liquid, soaked for 1-2h, and then sent to a drying equipment to be dried and formed at 150-160℃ to obtain a carbon fiber powder intermediate.

[0010] C, the obtained carbon fiber powder intermediate is sent into a ray irradiation device, and irradiation treatment is performed for 30-40 min to obtain the modified carbon fiber powder.

[0011] Preferably, the modification liquid is a saturated solution of phenolic resin dissolved in anhydrous ethanol, and the addition amount of the phenolic resin is 8-12% of the weight of the carbon fiber powder.

[0012] Preferably, the ray irradiation device is a gamma ray irradiator, and the irradiation dose is 100-125 kGy.

[0013] Preferably, the resin is obtained by mixing an unsaturated polyester resin with liquid terpene resin, and the addition amount of the liquid terpene resin is 8% of the addition amount of the unsaturated polyester resin.

[0014] Preferably, the curing agent is benzoyl peroxide.

[0015] A preparation method of a zero-silicon plate material, comprising the following steps:

[0016] Step 1, a mixing stirrer is used to mix and stir uniformly glass sand, glass powder, modified carbon fiber powder, polytetrafluoroethylene powder and colorant in a required weight ratio, and then half of the resin is added and mixed and stirred uniformly;

[0017] Step 2, the remaining half of the resin, coupling agent and curing agent are continuously added into the mixing stirrer, and after being mixed and stirred uniformly, the mixture is unloaded into a preset mold frame, and the mixture is spread and flattened;

[0018] Step 3, a high-frequency vibration press is used to vibrate, degas and press the flattened mixture in the mold frame, and then the mixture is sent into a curing furnace for curing and forming;

[0019] Step 4, the cured and formed product is cooled by air blowing, and is statically placed at room temperature for more than 24 h, and then is subjected to edge trimming, thickness setting and polishing to obtain the zero-silicon plate material.

[0020] Preferably, in step 3, the curing temperature is 90-95℃, and the curing time is 80-100 min.

[0021] Preferably, in step 3, the high-frequency vibration press is used to perform vacuum extraction for 90 s, vibration pressing for 180 s, and reciprocating pressing for 6-8 times.

[0022] As can be seen from the above description of the present invention, compared with the prior art, the beneficial effects of the present invention are as follows: This application limits the raw material composition of the zero-silicon board, using glass sand and glass powder as the main raw materials, and introducing modified carbon fiber powder to cooperate with other raw materials to improve the strength of the prepared zero-silicon board. At the same time, the introduction of polytetrafluoroethylene powder to cooperate with the modified carbon fiber powder can also improve the corrosion resistance of the prepared zero-silicon board. In particular, the carbon fiber powder after oxidation treatment is modified with a modifying liquid and then subjected to radiation irradiation treatment, which can improve the interfacial performance of carbon fiber powder and resin and other raw materials, thereby improving the strength of the board. Moreover, the subsequent radiation irradiation treatment can optimize the interaction between phenolic resin and carbon fiber powder in the modifying liquid, thereby improving the bonding strength of the prepared modified carbon fiber powder with other raw materials, and thus improving the strength of the prepared zero-silicon board. Detailed Implementation

[0023] The present invention will be further described below through specific embodiments.

[0024] A zero-silicon board comprises the following raw materials in parts by weight: 48-56 parts glass sand, 21-35 parts glass powder, 22-28 parts modified carbon fiber powder, 4-8 parts polytetrafluoroethylene powder, 18-25 parts resin, 3-5 parts color paste, 1-1.5 parts coupling agent, and 1-1.5 parts curing agent; wherein the curing agent is benzoyl peroxide; the resin is obtained by mixing unsaturated polyester resin and liquid terpene resin, and the amount of liquid terpene resin added is 8% of the amount of unsaturated polyester resin added. By adding liquid terpene resin, the viscosity of the resin can be enhanced, thereby improving the bonding force between the raw materials and ensuring the strength of the prepared zero-silicon board; further, the liquid terpene resin is liquid terpene resin GT-30A.

[0025] Specifically, the modification methods for modified carbon fiber powder are as follows:

[0026] A. Place the carbon fiber powder at a temperature of 320-350℃ and calcine for 50-70 minutes to obtain oxidized carbon fiber powder;

[0027] B. Immerse the obtained oxidized carbon fiber in the modification solution, soak for 1-2 hours, and then send it into the drying equipment. Dry and shape it at 150-160℃ to obtain carbon fiber powder intermediate.

[0028] C. The obtained carbon fiber powder intermediate is fed into a radiation irradiation device and irradiated for 30-40 minutes to obtain the modified carbon fiber powder.

[0029] The modified solution is a saturated solution of phenolic resin dissolved in anhydrous ethanol, and the amount of phenolic resin added is 8-12% of the weight of carbon fiber powder; the radiation irradiation equipment is a gamma ray irradiator with an irradiation dose of 100-125 kGy.

[0030] A method for preparing a zero-silicon substrate includes the following steps:

[0031] Step 1: Add the required weight of glass sand, glass powder, modified carbon fiber powder, polytetrafluoroethylene powder and colorant into a mixer, mix and stir evenly, then add half of the resin and mix and stir evenly.

[0032] Step 2: Add the remaining half of the resin, coupling agent and curing agent to the mixer, mix and stir evenly, then unload the mixture into the pre-set mold frame and spread it out flat.

[0033] Step 3: After the mixture spread in the mold frame is vibrated and degassed using a high-frequency vibration press, it is pressed into shape and then sent into a curing oven for curing. The high-frequency vibration press is used in the following sequence: vacuuming for 90 seconds and vibration pressing for 180 seconds, pressing back and forth 6-8 times. The curing temperature is 90-95℃ and the curing time is 80-100 minutes.

[0034] Step 4: Cool the solidified finished product by blowing air through it with a fan, let it stand at room temperature for more than 24 hours, and then trim, fix the thickness, and polish it to obtain the zero-silicon board.

[0035] Example 1

[0036] A zero-silicon board comprises the following raw materials in parts by weight: 48 parts glass sand, 35 parts glass powder, 22 parts modified carbon fiber powder, 8 parts polytetrafluoroethylene powder, 18 parts resin, 5 parts color paste, 1 part coupling agent, and 1 part benzoyl peroxide.

[0037] Specifically, the modification methods for modified carbon fiber powder are as follows:

[0038] A. Place the carbon fiber powder at 320℃ and calcine for 70 minutes to obtain oxidized carbon fiber powder;

[0039] B. Immerse the obtained oxidized carbon fiber in the modification solution, soak for 1 hour, and then send it into the drying equipment. Dry and shape it at 160°C to obtain carbon fiber powder intermediate.

[0040] C. The obtained carbon fiber powder intermediate is fed into a radiation irradiation device and irradiated for 30 minutes to obtain the modified carbon fiber powder.

[0041] The modified solution is a saturated solution of phenolic resin dissolved in anhydrous ethanol, and the amount of phenolic resin added is 12% of the weight of carbon fiber powder; the radiation irradiation equipment is a gamma ray irradiator with an irradiation dose of 100 kGy.

[0042] A method for preparing a zero-silicon substrate includes the following steps:

[0043] Step 1: Add the required weight of glass sand, glass powder, modified carbon fiber powder, polytetrafluoroethylene powder and colorant into a mixer, mix and stir evenly, then add half of the resin and mix and stir evenly.

[0044] Step 2: Add the remaining half of the resin, coupling agent and curing agent to the mixer, mix and stir evenly, then unload the mixture into the pre-set mold frame and spread it out flat.

[0045] Step 3: After the mixture spread in the mold frame is vibrated and degassed using a high-frequency vibration press, it is pressed into shape and then sent to a curing oven for curing. The high-frequency vibration press is used in the following sequence: vacuuming for 90 seconds and vibration pressing for 180 seconds, with 6 round trips. The curing temperature is 90℃ and the curing time is 100 minutes.

[0046] Step 4: Cool the solidified finished product by blowing air through it with a fan, let it stand at room temperature for more than 24 hours, and then trim, fix the thickness, and polish it to obtain the zero-silicon board.

[0047] Example 2

[0048] A zero-silicon board comprises the following raw materials in parts by weight: 56 parts glass sand, 21 parts glass powder, 28 parts modified carbon fiber powder, 4 parts polytetrafluoroethylene powder, 25 parts resin, 3 parts color paste, 1.5 parts coupling agent, and 1.5 parts benzoyl peroxide.

[0049] Specifically, the modification methods for modified carbon fiber powder are as follows:

[0050] A. Place the carbon fiber powder at 350℃ and calcine for 50 minutes to obtain oxidized carbon fiber powder;

[0051] B. Immerse the obtained oxidized carbon fiber in the modification solution, soak for 2 hours, and then send it into the drying equipment. Dry and shape it at 150°C to obtain carbon fiber powder intermediate.

[0052] C. The obtained carbon fiber powder intermediate is fed into a radiation irradiation device and irradiated for 40 minutes to obtain the modified carbon fiber powder.

[0053] The modified solution is a saturated solution of phenolic resin dissolved in anhydrous ethanol, and the amount of phenolic resin added is 8% of the weight of carbon fiber powder; the radiation irradiation equipment is a gamma ray irradiator with an irradiation dose of 125 kGy.

[0054] A method for preparing a zero-silicon substrate includes the following steps:

[0055] Step 1: Add the required weight of glass sand, glass powder, modified carbon fiber powder, polytetrafluoroethylene powder and colorant into a mixer, mix and stir evenly, then add half of the resin and mix and stir evenly.

[0056] Step 2: Add the remaining half of the resin, coupling agent and curing agent to the mixer, mix and stir evenly, then unload the mixture into the pre-set mold frame and spread it out flat.

[0057] Step 3: After the mixture spread in the mold frame is vibrated and degassed using a high-frequency vibration press, it is pressed into shape and then sent into a curing oven for curing. The high-frequency vibration press is used in the following sequence: vacuuming for 90 seconds and vibration pressing for 180 seconds, with 8 round trips. The curing temperature is 95℃ and the curing time is 80 minutes.

[0058] Step 4: Cool the solidified finished product by blowing air through it with a fan, let it stand at room temperature for more than 24 hours, and then trim, fix the thickness, and polish it to obtain the zero-silicon board.

[0059] Example 3

[0060] A zero-silicon board comprises the following raw materials in parts by weight: 52 parts glass sand, 27 parts glass powder, 25 parts modified carbon fiber powder, 6 parts polytetrafluoroethylene powder, 22 parts resin, 4 parts color paste, 1.2 parts coupling agent, and 1.2 parts benzoyl peroxide.

[0061] Specifically, the modification methods for modified carbon fiber powder are as follows:

[0062] A. Place the carbon fiber powder at 335℃ and calcine for 60 minutes to obtain oxidized carbon fiber powder;

[0063] B. Immerse the obtained oxidized carbon fiber in the modification solution, soak for 1.5 hours, and then send it into the drying equipment. Dry and shape it at 155°C to obtain carbon fiber powder intermediate.

[0064] C. The obtained carbon fiber powder intermediate is fed into a radiation irradiation device and irradiated for 35 minutes to obtain the modified carbon fiber powder.

[0065] The modified solution is a saturated solution of phenolic resin dissolved in anhydrous ethanol, and the amount of phenolic resin added is 10% of the weight of carbon fiber powder; the radiation irradiation equipment is a gamma ray irradiator with an irradiation dose of 115 kGy.

[0066] A method for preparing a zero-silicon substrate includes the following steps:

[0067] Step 1: Add the required weight of glass sand, glass powder, modified carbon fiber powder, polytetrafluoroethylene powder and colorant into a mixer, mix and stir evenly, then add half of the resin and mix and stir evenly.

[0068] Step 2: Add the remaining half of the resin, coupling agent and curing agent to the mixer, mix and stir evenly, then unload the mixture into the pre-set mold frame and spread it out flat.

[0069] Step 3: After the mixture spread in the mold frame is vibrated and degassed using a high-frequency vibration press, it is pressed into shape and then sent into a curing oven for curing. The high-frequency vibration press is used in the following sequence: vacuuming for 90 seconds and vibration pressing for 180 seconds, with 7 round trips. The curing temperature is 92℃ and the curing time is 90 minutes.

[0070] Step 4: Cool the solidified finished product by blowing air through it with a fan, let it stand at room temperature for more than 24 hours, and then trim, fix the thickness, and polish it to obtain the zero-silicon board.

[0071] Comparative Example 1

[0072] The raw material composition and preparation method are basically the same as those in Example 3. The difference is that the modified carbon fiber powder in the raw material composition is replaced with unmodified carbon fiber powder, and the corresponding modification method is not included.

[0073] Comparative Example 2

[0074] Its raw material composition and preparation method are basically the same as those in Example 3, the difference being that the modification method of the modified carbon fiber powder is as follows:

[0075] A. Place the carbon fiber powder at 335℃ and calcine for 60 minutes to obtain oxidized carbon fiber powder;

[0076] B. Immerse the obtained oxidized carbon fiber in the modification solution, soak for 1.5 hours, and then send it into the drying equipment to dry and shape at 155°C to obtain modified carbon fiber powder.

[0077] Comparative Example 3

[0078] Its raw material composition and preparation method are basically the same as those in Example 3, except that polytetrafluoroethylene powder is not included in the raw material composition.

[0079] The zero-silica plates prepared in Examples 1-3 and Comparative Examples 1-3 were subjected to corresponding performance tests, and the specific results are shown in Table 1.

[0080] Table 1 Performance Test Data

[0081]

[0082] As shown in the table above, the zero-silicon substrate prepared in this application has the advantages of corrosion resistance, high strength, and good impact resistance. In particular, the modification of the oxidized carbon fiber powder with a modifying liquid followed by X-ray irradiation treatment can improve the interfacial properties of the carbon fiber powder with resin and other raw materials, thereby increasing the strength of the substrate. Furthermore, the subsequent X-ray irradiation treatment can optimize the interaction between the phenolic resin and the carbon fiber powder in the modifying liquid, thereby improving the bonding strength of the prepared modified carbon fiber powder with other raw materials, and thus improving the strength of the prepared zero-silicon substrate.

[0083] This application limits the raw material composition of zero-silicon plates, using glass sand and glass powder as the main raw materials, and introducing modified carbon fiber powder in combination with other raw materials to improve the strength of the prepared zero-silicon plates. At the same time, the introduction of polytetrafluoroethylene powder in combination with modified carbon fiber powder can also improve the corrosion resistance of the prepared zero-silicon plates.

[0084] The above description is merely a preferred embodiment of the present invention and should not be construed as limiting the scope of the present invention. All equivalent changes and modifications made in accordance with the scope of the patent application and the contents of the specification of the present invention should still fall within the scope of the patent of the present invention.

Claims

1. A zero-silica panel, characterized by: The raw materials include the following components by weight: glass sand 48-56 parts, glass powder 21-35 parts, modified carbon fiber powder 22-28 parts, polytetrafluoroethylene powder 4-8 parts, resin 18-25 parts, color paste 3-5 parts, coupling agent 1-1.5 parts, and curing agent 1-1.5 parts; The modified carbon fiber powder is obtained by oxidizing the carbon fiber powder, modifying the liquid, and irradiating the carbon fiber powder.

2. A zero-silica panel according to claim 1, wherein: The modification method of the modified carbon fiber powder is as follows: A. The carbon fiber powder is baked at a temperature of 320-350℃ for 50-70 minutes to obtain oxidized carbon fiber powder; B. The obtained oxidized carbon fiber is immersed in a modification liquid for 1-2 hours, and then dried and formed at 150-160℃ to obtain carbon fiber powder intermediates; C. The obtained carbon fiber powder intermediates are sent to a ray irradiation device for irradiation treatment for 30-40 minutes to obtain the modified carbon fiber powder.

3. A zero-silica panel according to claim 2, wherein: The modification liquid is a saturated solution of phenolic resin dissolved in anhydrous ethanol, and the addition amount of the phenolic resin is 8-12% of the weight of the carbon fiber powder.

4. A zero-silica panel according to claim 2, wherein: The ray irradiation device is a gamma ray irradiator, and the irradiation dose is 100-125 kGy.

5. A zero-silica panel according to claim 1, wherein: The resin is obtained by mixing unsaturated polyester resin with liquid terpene resin, and the addition amount of the liquid terpene resin is 8% of the addition amount of the unsaturated polyester resin.

6. A zero-silica panel according to claim 1, wherein: The curing agent is benzoyl peroxide.

7. The method of claim 1, wherein: The method comprises the following steps: Step 1. The required weight of glass sand, glass powder, modified carbon fiber powder, polytetrafluoroethylene powder, and colorant are sent into a mixing stirrer, and after uniform mixing and stirring, half of the resin is added and uniformly mixed and stirred; Step 2. The remaining half of the resin, coupling agent, and curing agent are continuously added to the mixing stirrer, and after uniform mixing and stirring, the mixture is unloaded into a pre-set mold frame, and the mixture is spread and flattened; Step 3. The flattened mixture in the mold frame is vibrated and degassed using a high-frequency vibration press, and then pressed and formed, and then sent to a curing oven for curing and forming; Step 4. The cured and formed product is cooled by blowing with a fan, and then placed at room temperature for 24 hours or more, and then trimmed, thickened, and polished to obtain the zero-silicon plate.

8. The method of claim 7, wherein: In step 3, the curing temperature is 90-95℃, and the curing time is 80-100 minutes.

9. The method of claim 7, wherein the non-siliceous board is prepared by the steps of: In step 3, the high-frequency vibration press is used for vacuum pumping for 90 seconds and vibration pressing for 180 seconds in sequence, and the pressing is repeated for 6-8 times. ​

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