Joint diagnostic data processing method and system based on hall electric propulsion data

Abstract

The application provides a joint diagnosis data processing method and system based on Hall electric propulsion data, and relates to the field of space electric propulsion.The method measures the sensor resistance of an erosion sensor through a four-wire method resistance measurement circuit, and calculates the plume erosion rate based on the change rate of the sensor resistance, the material type of the erosion sensor and the geometric size; according to the material sputtering yield of the erosion sensor, the working medium and working voltage of the thruster, the bias voltage of the Faraday probe and the measurement interference data of the bias voltage on the plume erosion rate, the sensor resistance is measured through the four-wire method in a time sequence in a specified period, and the ion current density is measured through the Faraday probe in another time sequence in the specified period; and the plume power density distribution is calculated according to the plume erosion rate, the ion current density, the linearly fitted material sputtering rate function and the position of the joint collection structure in the plume.

Description

Technical Field

[0001] This application relates to the field of space electric propulsion technology, and in particular to a joint diagnostic data processing method and system based on Hall electric propulsion data. Background Technology

[0002] Space electric propulsion technology, characterized by its high specific impulse and low fuel consumption, has been widely applied in missions such as deep space exploration and satellite attitude and orbit maintenance. With the rapid development of commercial spaceflight, the construction of low-Earth orbit (LEO) constellations has become a key focus in the aerospace field. The Starlink constellation (over 9,000 satellites, all equipped with Hall thrusters for orbital lifting) has already achieved large-scale space applications of electric propulsion technology. Currently, research on novel high-performance space electric propulsion systems has become a hot topic, and diagnosing thruster plume erosion rate, ion current density, and power density can help optimize thruster design.

[0003] Currently, in the field of space electric propulsion technology, the diagnosis of Hall electric propulsion plumes typically employs a separate sensor approach, such as ion current density distribution measurement based on Faraday probes or plume erosion rate monitoring based on resistive erosion sensors. However, existing diagnostic methods have low efficiency in diagnosing Hall electric propulsion data. Summary of the Invention

[0004] The purpose of this invention is to provide a joint diagnostic data processing method and system based on Hall electric propulsion data, so as to solve the technical problem of low diagnostic efficiency of Hall electric propulsion data.

[0005] In a first aspect, this application provides a joint diagnostic data processing method based on Hall electric propulsion data, applied to a joint diagnostic system for the plume erosion rate, ion current density, and plume power density of Hall electric propulsion in a thruster. The joint diagnostic system includes a joint acquisition structure and a joint diagnostic circuit system. The joint acquisition structure includes an erosion sensor and a coupled Faraday probe. The joint diagnostic circuit system includes a modified four-wire resistance measurement circuit. The method includes:

[0006] The resistance of the erosion sensor is measured using the four-wire resistance measurement circuit, and the plume erosion rate is calculated based on the rate of change of the sensor resistance, the material type of the erosion sensor, and its geometric dimensions.

[0007] Based on the material sputtering yield of the erosion sensor, the working fluid and operating voltage of the thruster, the bias voltage of the Faraday probe, and the measurement interference data of the bias voltage on the plume erosion rate, the sensor resistance is measured using the four-wire method within a time series in a specified period, and the ion current density is measured using the Faraday probe within another time series in the specified period.

[0008] The distribution of plume power density is calculated based on the plume erosion rate, the ion current density, the linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume. The material sputtering rate function is obtained by linearly processing the sputtering yield of the metal material when the Hall-driven working propellant ions are incident and evaluating the linearity of the sputtering amount of the metal material within the ion energy range.

[0009] In one possible implementation, before calculating the distribution of the plume power density based on the plume erosion rate, the ion current density, a linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume, the method further includes:

[0010] By using the linear approximation principle, the incident ion sputtering yield of the metal material when the working propellant ions of the Hall electric propulsion are incident is fitted to a linear function, and the linearly fitted material sputtering rate function is obtained.

[0011] The incident ion sputtering yield obtained through linear fitting is given by the first formula: ; E Indicates the incident ion energy. a and b It is a constant. The incident ion sputtering yield obtained through linear fitting is represented by the second formula; the erosion depth of the plume on the erosion sensor per unit time is given by the second formula: ; Indicates the depth of erosion. m The atomic mass of the sputtered material. j ( E ) represents the distribution of incident ion current density with respect to incident ion energy. e For elementary charge, ρ The density of the sputtered material.

[0012] In one possible implementation, the plume power density incident on the surface of the erosion sensor is: ρ P =∫ j ( E ) EdE The step of calculating the plume power density distribution based on the plume erosion rate, the ion current density, the linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume includes:

[0013] The ρ P and the linear fitting described Substitute into the second formula Y ( E From this, we obtain the third formula:

[0014]

[0015] in, This represents the plume power density incident on the surface of the erosion sensor; The total ion current density is measured using the Faraday probe. j 0= I P / S P , I P The current collected by the erosion sensor as the collecting electrode of the Faraday probe. S P The area of ​​the collecting electrode; h E This indicates the plume erosion rate. h E = d ΔR / ρ R L , L This indicates the coating length of the erosion sensor. d The value represents the coating width of the corrosion sensor, and ΔR is the change in the sensor resistance of the corrosion sensor per unit time. ρ R The resistivity of the material of the erosion sensor;

[0016] Through the third formula and h E = d ΔR / ρ R L The power density of the plume is calculated to obtain the value.

[0017] In one possible implementation, the amount of sputtering of the metallic material is a function of the incident ion energy and the ion incident angle.

[0018] In one possible implementation, measuring the sensor resistance of the erosion sensor via the four-wire resistance measurement circuit includes:

[0019] The circuit current is measured once at each end of the resistor under test using the modified four-wire resistance measurement circuit to eliminate the influence of ions and electrons from the plasma entering the circuit unbalanced from the erosion sensor on the measurement result of the sensor resistance; the measurement circuit is suspended, and the change of the voltage of the four-wire resistance measurement circuit to ground is additionally measured to determine the polarity of the current flowing from the plasma.

[0020] In one possible implementation, the joint acquisition structure further includes: a single-sided polished high-resistivity monocrystalline silicon wafer, a metal plating layer, silver paste, and a PCB board;

[0021] The single-sided polished high-resistivity monocrystalline silicon wafer is used to prepare a metal coating with a rough surface. The metal coating serves as the electrode for the erosion sensor and the Faraday probe, and is prepared on the surface of the silicon wafer by magnetron sputtering. The silver paste is used to fix both ends of the silicon wafer to the PCB board pads to connect the erosion sensor, the electrode, and the PCB circuitry. The PCB board serves as the substrate for fixing the silicon wafer used for coating. The internal circuitry of the PCB board connects both ends of the erosion sensor and the protective ring of the Faraday probe. The erosion sensor is connected to an external circuit through an interface on the PCB board. The silicon wafer on the PCB board includes an internal erosion sensor and a collector electrode structure for the Faraday probe, an external protective ring structure for the Faraday probe, and connections to different pads and circuitry structures.

[0022] In one possible implementation, the joint diagnostic circuit system further includes: a negative bias circuit, a current measurement circuit, a switching element, and a control and communication element; the negative bias circuit is used to provide the negative bias voltage required by the Faraday probe to repel electron current; the current measurement circuit is used to measure the ion current collected by the collecting electrode of the Faraday probe; the switching element is used to control the conduction and cutoff of each part of the circuit according to an external control signal; the control and communication element is used to establish a connection with the host computer and each circuit module, convert the instructions of the host computer into instruction signals transmitted to each of the circuit modules, and convert the data measured by each of the circuit modules into bus signals and transmit them back to the host computer.

[0023] Secondly, this application provides a joint diagnostic data processing system based on Hall electric propulsion data, applied to the joint diagnostic system of plume erosion rate, ion current density, and plume power density of Hall electric propulsion in thrusters. The joint diagnostic system includes a joint acquisition structure and a joint diagnostic circuit system. The joint acquisition structure includes an erosion sensor and a coupled Faraday probe. The joint diagnostic circuit system includes a corrected four-wire resistance measurement circuit.

[0024] The first measurement module is used to measure the sensor resistance of the erosion sensor through the four-wire resistance measurement circuit, and to calculate the plume erosion rate based on the rate of change of the sensor resistance, the material type of the erosion sensor, and its geometric dimensions.

[0025] The second measurement module is used to measure the sensor resistance using the four-wire method within a specified period, and to measure the ion current density using the Faraday probe within another specified period, based on the material sputtering yield of the erosion sensor, the working fluid and operating voltage of the thruster, the bias voltage of the Faraday probe, and the measurement interference data of the bias voltage on the plume erosion rate.

[0026] The calculation module is used to calculate the distribution of the plume power density based on the plume erosion rate, the ion current density, the linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume; the material sputtering rate function is obtained by linearly processing the sputtering yield of the metal material when the Hall-driven working propellant ions are incident and evaluating the linearity of the sputtering amount of the metal material within the ion energy range.

[0027] Thirdly, this application also provides an electronic device, including a memory and a processor, wherein the memory stores a computer program that can run on the processor, and the processor executes the computer program to implement the method described in the first aspect above.

[0028] Fourthly, this application also provides a computer-readable storage medium storing computer-executable instructions that, when invoked and executed by a processor, cause the processor to perform the method described in the first aspect above.

[0029] This application brings the following beneficial effects:

[0030] This application provides a joint diagnostic data processing method and system based on Hall thruster electric propulsion data. The method is applied to a joint diagnostic system for the plume erosion rate, ion current density, and plume power density of Hall thrusters. The joint diagnostic system includes a joint acquisition structure and a joint diagnostic circuit system. The joint acquisition structure includes an erosion sensor and a coupled Faraday probe. The joint diagnostic circuit system includes a corrected four-wire resistance measurement circuit. The method can measure the sensor resistance of the erosion sensor using the four-wire resistance measurement circuit and calculate the plume erosion rate based on the rate of change of the sensor resistance, the material type of the erosion sensor, and its geometry. Based on the material sputtering yield of the erosion sensor, the working fluid and operating voltage of the thruster, the bias voltage of the Faraday probe, and the interference data of the bias voltage on the plume erosion rate measurement, the method measures the sensor resistance using the four-wire method within a specified time series and the ion current density using the Faraday probe within another time series within the specified period. Based on the plume erosion rate and the ion current density... The distribution of the plume power density is calculated using the sputtering rate function of the linearly fitted material and the position of the joint acquisition structure in the plume. The sputtering rate function is obtained by linearly processing the sputtering yield of the metal material when the working propellant ions of the Hall electric propulsion are incident and evaluating the linearity of the sputtering amount of the metal material within the ion energy range. In this scheme, the erosion sensor and the Faraday probe are integrated into the joint acquisition structure. For this joint acquisition structure placed in the Hall electric propulsion plume, the resistance change of the erosion sensor in the joint acquisition structure is continuously measured by a four-wire resistance measurement circuit for a part of the time. For another part of the time, the resistance measurement circuit is disconnected and a negative bias voltage is applied to the joint acquisition structure of the erosion sensor and the Faraday probe. The ion current density distribution at the location of the erosion sensor is measured through this interactive measurement method. The spatial erosion rate can be solved based on the resistance change of the erosion sensor. The Hall electric propulsion plume power density is obtained by combining the ion current density and the sputtering yield function. This achieves synchronous high-precision measurement of multiple parameters, improves the diagnostic efficiency of Hall electric propulsion data, and solves the technical problem of low diagnostic efficiency of Hall electric propulsion data.

[0031] To make the above-mentioned objectives, features and advantages of this application more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description

[0032] To more clearly illustrate the technical solutions in the specific embodiments of this application or the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0033] Figure 1 A flowchart illustrating the joint diagnostic data processing method based on Hall electric propulsion data provided in this application embodiment;

[0034] Figure 2 A schematic diagram of the Hall electric propulsion plume erosion rate-ion current density-power density joint diagnostic circuit system provided in the embodiments of this application, excluding the control circuit;

[0035] Figure 3 A front view of the combined sensor provided in an embodiment of this application;

[0036] Figure 4 This is a schematic diagram of the PCB substrate of the combined sensor provided in the embodiments of this application;

[0037] Figure 5(a) is a schematic diagram of the linear fitting effect of sputtering yield of Al bombarded by Xe in the range of 50 eV to 600 eV provided in the embodiment of this application;

[0038] Figure 5(b) is a schematic diagram of the linear fitting effect of sputtering yield of Ag bombarded by Xe in the range of 50 eV to 600 eV provided in the embodiments of this application;

[0039] Figure 6 This is a schematic diagram showing the geometric dimensions and orientation of the erosion sensor provided in an embodiment of this application;

[0040] Figure 7 A schematic diagram of a joint diagnostic data processing system based on Hall electric propulsion data provided in this application embodiment;

[0041] Figure 8 A schematic diagram of the structure of an electronic device provided in an embodiment of this application is shown.

[0042] Icons: 100 - Sensor electrode (collector and guard ring); 200 - Four-wire resistance measurement circuit with correction; 300 - Faraday probe negative bias and current measurement circuit; 101 - PCB substrate; 102 - High-resistivity polished silicon wafer (with pulsed magnetron sputtering coating); 103 - Silver paste. Detailed Implementation

[0043] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0044] The terms "comprising" and "having," and any variations thereof, used in the embodiments of this application, are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or device that includes a series of steps or units is not limited to the steps or units listed, but may optionally include other steps or units not listed, or may optionally include other steps or units inherent to these processes, methods, products, or devices.

[0045] Currently, Faraday probe diagnostics is one of the most commonly used methods in Hall electric propulsion research. It can obtain data on the ion current density distribution of the thruster plume, and then calculate parameters such as plume divergence angle and current utilization efficiency to analyze thruster efficiency. Resistive erosion sensors are often used for monitoring the lifespan of industrial equipment and assessing the environmental impact on surfaces; they are now being applied to satellites to study the erosion and contamination effects of electric propulsion plumes on spacecraft surfaces. Given that the main working material of Hall electric propulsion is Xe and the sputtering characteristics of some metallic materials, the power density distribution of the Hall electric propulsion plume can be further obtained by combining the above two diagnostic methods, which can then be used for thruster performance evaluation and optimization design.

[0046] In the field of space electric propulsion technology, the diagnosis of Hall thruster plumes typically employs a discrete sensor approach, including two independent diagnostic methods: one is ion current density measurement based on Faraday probes, and the other is plume erosion rate monitoring based on resistive erosion sensors. For example, the Electric Propulsion Diagnostic Package (EPDP) carried by a certain satellite includes a hindrance potential analyzer (RPA), a planar Langmuir probe (LP), and an erosion sensor. However, these sensors are designed separately and installed in different locations on the spacecraft to measure plasma environmental parameters and surface erosion effects. Similarly, in traditional methods, Faraday probes are often used to obtain the plume ion current density distribution, while resistive erosion sensors (such as those used on satellites) are used to assess the erosion and contamination of the spacecraft surface by the plume. These existing technical solutions typically require multiple independent sensors and circuit systems, making the measurement process unsynchronized and the sensor layout dispersed. Moreover, the sensors are usually optimized for a single parameter: Faraday probes measure ion current by repelling electrons through negative bias, but cannot directly obtain the erosion rate; erosion sensors monitor material loss through resistance changes, but lack ion current density data to support this. While the diagnostic kit can comprehensively measure plasma parameters, each sensor operates independently, requiring data fusion later, and it does not involve direct derivation of power density. Furthermore, existing sensor designs have limitations; for example, erosion sensors typically employ a single metal film structure, making them susceptible to plasma interference.

[0047] Therefore, existing technologies cannot simultaneously measure plume erosion rate, ion current density, and power density at the same location, lacking joint diagnostic capabilities and resulting in low diagnostic efficiency for Hall thruster data. Furthermore, traditional resistance measurement circuits (such as the simple four-wire method) are susceptible to interference from stray ion / electron currents in the plasma environment, leading to erosion rate measurement distortion; the Faraday probe may introduce additional noise during bias switching, resulting in significant measurement errors. Moreover, existing technologies require combining ion current density data measured by the Faraday probe and ion energy distribution function measured by the RPA to calculate plume power density, but the RPA's structure and electrical system are complex, making the diagnostic process more complicated, as is the power density measurement.

[0048] Based on this, the embodiments of this application provide a joint diagnostic data processing method and system based on Hall electric propulsion data, which can solve the technical problem of low diagnostic efficiency of Hall electric propulsion data.

[0049] The embodiments of the present invention will be further described below with reference to the accompanying drawings.

[0050] Figure 1This is a flowchart illustrating a joint diagnostic data processing method based on Hall electric propulsion data, provided in an embodiment of this application. The method is applied to a joint diagnostic system for the plume erosion rate, ion current density, and plume power density of Hall electric propulsion in a thruster. The joint diagnostic system includes a joint acquisition structure and a joint diagnostic circuit system. The joint acquisition structure includes an erosion sensor and a coupled Faraday probe. The joint diagnostic circuit system includes a modified four-wire resistance measurement circuit. Figure 1 As shown, the method includes:

[0051] Step S110: The sensor resistance of the erosion sensor is measured by a four-wire resistance measurement circuit, and the plume erosion rate is calculated based on the rate of change of the sensor resistance, the type of material of the erosion sensor, and the geometric dimensions.

[0052] In this embodiment, the joint acquisition structure is disposed within the Hall-effect electric propulsion plume. For this step, exemplaryly, the resistance change of the erosion sensor in the joint sensor is continuously measured most of the time using a four-wire resistance measurement circuit.

[0053] As one possible implementation, the sensor resistance of the erosion sensor is measured using a four-wire resistance measurement circuit. Specifically, this may include the following steps: measuring the circuit current at each end of the resistor under test using a modified four-wire resistance measurement circuit to eliminate the influence of ions and electrons from the plasma entering the circuit unbalancedly from the erosion sensor on the measurement results of the sensor resistance; suspending the measurement circuit and additionally measuring the change in the voltage of the four-wire resistance measurement circuit to ground to determine the polarity of the current flowing in from the plasma.

[0054] For the four-wire resistance measurement circuit with correction, a ground voltage branch and dual current detection logic are added on the basis of the traditional four-wire method to dynamically correct the plasma injection current error, thereby ensuring high-precision measurement of erosion rate.

[0055] In one optional embodiment, the joint acquisition structure further includes: a single-sided polished high-resistivity monocrystalline silicon wafer, a metal coating, silver paste, and a PCB board; the single-sided polished high-resistivity monocrystalline silicon wafer is used to prepare a metal coating with a rough surface; the metal coating serves as the electrode for the erosion sensor and the Faraday probe, and the metal coating is prepared on the surface of the silicon wafer by magnetron sputtering; the silver paste is used to fix both ends of the silicon wafer to the pads on the PCB board to conduct the erosion sensor, the electrode, and the PCB circuitry; the PCB board serves as the substrate for fixing the silicon wafer used for coating, and the internal circuitry of the PCB board connects both ends of the erosion sensor and the protective ring of the Faraday probe, respectively. The erosion sensor is connected to an external circuit through an interface on the PCB board. The silicon wafer on the PCB board includes an internal erosion sensor and a Faraday probe collecting electrode structure, an external Faraday probe protective ring structure, and structures connected to different pads and circuitry.

[0056] For example, such as Figure 3 As shown, a polished silicon wafer (surface roughness less than 0.5 nm) is coated with a metal film (such as an aluminum film) by magnetron sputtering to serve as the erosion sensor and Faraday probe electrode. The silicon wafer is fixed to the PCB board pads with silver paste and consists of two parts: an inner collector electrode (erosion sensor) and an outer protective ring. The spacing between them is less than five times the Debye length of the plume plasma to ensure electrical isolation and plasma stability.

[0057] like Figure 4 As shown, the 50×50 mm PCB substrate provides internal circuit connections, and the interface is used for secure external circuit connections. The sensor has an effective size of 16mm×20mm and a plating thickness of 2μm. The incident angle measurement is optimized through geometric design. The PCB includes three circular external electrical connection pads and six square internal electrical connection pads. Two of the diagonally located circular pads are used for power supply in Faraday probe mode, and the other, together with the collector power supply pad, is used to measure the erosion sensor resistance. On-board circuit traces are provided on the PCB. Figure 3 It includes a PCB substrate 101, silver paste 103, and a high-resistivity polished silicon wafer 102. The high-resistivity polished silicon wafer 102 is a single-sided polished high-resistivity silicon wafer with a surface metal plating. The silver paste 103 is used to connect the surface metal plating of the silicon wafer and the pads. Figure 3 and Figure 4 As shown, four rectangular silicon wafers are placed on the four outer pads to form the four sides of a rectangular protective ring, surrounding the inner collector and erosion sensor probe. The distance between the two is no more than 2 mm (no more than five times the Debye length of the measured position). The collector, i.e., the erosion sensor, is installed between the two inner pads, with an effective size of approximately 16 × 20 mm. The silicon wafer is 0.5 mm thick, with a polished surface roughness of approximately 0.5 nm. The surface coating material is aluminum, with a thickness of 2 μm and a surface roughness no greater than Ra 0.05 (5 nm). During probe fabrication, the silicon wafer is first ultrasonically cleaned to remove surface impurities. Then, an aluminum film of approximately 2 μm thickness is prepared on its polished surface using coating techniques such as magnetron sputtering (aluminum oxidation will result in a loss of approximately 10 nm of coating thickness; however, since the conductivity of aluminum oxide is much lower than that of aluminum, it will not affect the diagnostic results). The coated silicon wafer is then removed and placed... Figure 2 The position shown is on the PCB board. Apply silver paste between the pads and the silicon wafer (before applying, you can gently sand the aluminum film at both ends to remove the oxide layer) to ensure conductivity between the silver paste and the aluminum layer on the front side of the silicon wafer. After the silver paste has cured, the probe is ready to use.

[0058] For the combined erosion sensor-Faraday probe structure, the internal collecting electrode and the external protective ring are integrated through the PCB substrate, and the metal coating serves as both the erosion sensor and the Faraday probe electrode, realizing multi-functional measurement with a single sensor to solve the data mismatch problem of the split layout.

[0059] In one possible implementation, the joint diagnostic circuit system further includes: a negative bias circuit, a current measurement circuit, a switching element, and a control and communication element; the negative bias circuit is used to provide the negative bias voltage required by the Faraday probe to repel electron current; the current measurement circuit is used to measure the ion current collected by the collecting electrode of the Faraday probe; the switching element is used to control the conduction and cutoff of each part of the circuit according to the external control signal; the control and communication element is used to establish a connection with the host computer and each circuit module, convert the instructions of the host computer into instruction signals transmitted to each circuit module, and convert the data measured by each circuit module into bus signals and transmit them back to the host computer.

[0060] For diagnostic circuit systems, exemplified by, such as Figure 2 As shown, the diagnostic circuit system includes a corrected four-wire resistance measurement circuit, a negative bias circuit, switching elements, and control and communication elements. The four-wire circuit measures the sensor resistance through two precision current detection circuits (A1, A2) and voltage detection circuits (V1, V2), and adds a voltage-to-ground branch (V2) to correct for plasma injection current errors: when the current measurement error is greater than 1%, the direction of voltage-to-ground change is compared (a smaller current value is used for positive charge injection, and a larger value is used for negative charge) to eliminate the effects of non-equilibrium.

[0061] like Figure 2As shown, the above-mentioned four-wire resistance measurement circuit with correction includes: two isolated (voltage measurement side isolated from voltmeter power supply side) high-precision voltmeters V1 (0.1 μV~10 mV) and V2 (1 mV~100 V), used to measure the voltage across the resistor under test and the system's voltage to ground, respectively (used to determine the positive or negative current flowing from the plasma); two isolated high-precision ammeters A1 and A2 (1 μA~0.1 A), used to measure the current on the high-voltage side and low-voltage side of the resistor under test, respectively, to correct for errors caused by the current flowing from the plasma; an isolated high-precision DC power supply (0.01 V), used to provide the small voltage required for resistance measurement; two resistors R1 and R2 representing error sources such as the resistance of the circuit wires, the internal resistance of the voltmeter being much larger than this error resistance; and two switching elements (such as MOSFETs), used to control the circuit to conduct when the diagnostic system is used as an erosion sensor. The sensor electrode 100, within its corresponding box, represents the diagnostic system probe structure, including the erosion sensor / Faraday probe collector structure Rx and the Faraday probe protection ring structure G_R. Both are physical metal platings on a low-roughness, high-resistivity silicon wafer. The Faraday probe negative bias and current measurement circuit 300, within its corresponding box, represents the Faraday probe circuit. It includes a negative regulated power supply (-30 V in this embodiment) to provide the negative bias required when the probe is used as a Faraday probe; an isolated high-precision ammeter (0.1 μA~10 mA) for measuring the ion current collected on the collector when the diagnostic system is used as a Faraday probe; and a switching element for controlling the circuit's conduction when the diagnostic system is used as a Faraday probe. The Faraday probe circuit includes a negative bias power supply (-30V to -80V), an isolated current detection circuit, and a switching element for measuring the ion current.

[0062] Step S120: Based on the material sputtering yield of the erosion sensor, the working fluid and operating voltage of the thruster, the bias voltage of the Faraday probe, and the measurement interference data of the bias voltage on the plume erosion rate, the sensor resistance is measured using the four-wire method within a time series of a specified period, and the ion current density is measured using the Faraday probe within another time series of a specified period.

[0063] Regarding the control of the interactive measurement time series, it should be noted that by periodically switching the resistance measurement and Faraday probe mode using switching elements (such as MOSFETs), allocating the time ratio (such as 99:1), minimizing the interference of negative bias on the erosion rate, and performing error compensation based on ion energy distribution, that is, by estimating the ion energy distribution (such as assuming a monovalent ion energy of 270eV), combined with the negative bias of the Faraday probe, the measurement error is compensated.

[0064] For the control element, the measurement mode is switched in a time sequence by switching elements: resistance measurement is performed for most of the time (e.g., 99%), and negative bias voltage is applied to measure ion current density for a small portion of the time (e.g., 1%). That is, the resistance measurement circuit is disconnected for a small portion of the time, and a negative bias voltage is applied to the erosion sensor-Faraday probe joint structure of the sensor to measure the ion current density distribution at the location of the sensor, so as to minimize the interference of the bias voltage on the erosion rate.

[0065] Step S130: Calculate the distribution of plume power density based on plume erosion rate, ion current density, linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume.

[0066] The material sputtering rate function is obtained by linearly processing the sputtering yield of the metal material when Hall-driven working propellant ions are incident and evaluating the linearity of the sputtering amount of the metal material within the ion energy range.

[0067] In one possible implementation, the sputtering amount of the metallic material is a function of the incident ion energy and the ion incident angle. In this step, the space erosion rate can be solved based on the sensor resistance change, and the Hall electric propulsion plume power density can be approximately obtained by combining the ion current density and the known sputtering yield function.

[0068] As an example, before calculating the distribution of plume power density based on plume erosion rate, ion current density, linearly fitted material sputtering rate function, and the position of the co-collection structure in the plume, the method may further include the following steps:

[0069] By applying the linear approximation principle, the incident ion sputtering yield of metallic materials under Hall-driven electric propellant ion incidence is fitted to a linear function, resulting in a linearly fitted material sputtering rate function; where the incident ion sputtering yield obtained through linear fitting is given by the first formula: ; E Indicates the incident ion energy. a and b It is a constant. The incident ion sputtering yield is represented by the linear fit; the erosion depth of the plume on the erosion sensor per unit time is given by the second formula: ; Indicates the depth of erosion. m The atomic mass of the sputtered material. j ( E ) represents the distribution of incident ion current density with respect to incident ion energy. e For elementary charge, ρ The density of the sputtered material.

[0070] As one possible implementation, the ion sputtering yield is fitted to a linear function based on the linear approximation principle. Y (E ) ≈ aE + b Figures 5(a) and 5(b) show that aluminum and silver exhibit good linearity under Xe ion bombardment, R 2 >0.97, through erosion rate ( h E = d ΔR / ρ R L ), ion current density ( j 0= I P / S P ) and power density ( ρ P Relationship: h E = m ( a * ρ P + b * j 0) / ( e ρ The power density can be solved directly.

[0071] Specifically, the plume power density incident on the surface of the erosion sensor is: ρ P = ∫ j ( E ) EdE The distribution of plume power density is calculated based on the plume erosion rate, ion current density, linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume. Specifically, this may include the following steps:

[0072] Will ρ P and the linear fitting described Substitute into the second formula Y ( E From this, we obtain the third formula:

[0073]

[0074] in, This represents the plume power density incident on the surface of the erosion sensor; This represents the total ion current density, measured using a Faraday probe. j 0= I P / S P , I PThe current collected by the erosion sensor as the collecting electrode of the Faraday probe. S P The area of ​​the collecting pole; h E Indicates plume erosion rate, h E = d ΔR / ρ R L , L This indicates the length of the coating on the erosion sensor. d The value represents the coating width of the corrosion sensor, and ΔR is the change in the sensor resistance per unit time. ρ R To determine the resistivity of the material used in the erosion sensor; through the third formula and h E = d ΔR / ρ R L Calculations were performed to obtain the value of the plume power density.

[0075] For power density calculation algorithms based on linear approximation, by using linear fitting of sputtering yield (such as aluminum and silver data), the erosion rate, ion current density and power density can be correlated, and the plume power density can be directly calculated.

[0076] Figures 5(a) and 5(b) show the fitting results of sputtering yields for two metallic materials in the references provided in the embodiments of the present invention under Xe ion incident conditions. Xe is one of the most commonly used working fluids in Hall electric propulsion; the fitting range is 50–600 eV, covering the energy range of most ions in the Hall electric propulsion plume; the fitting R... 2 The values ​​are 0.9796 and 0.9851, respectively, showing good linearity. For the Hall thruster plume, within the small-scale range of the far field / backflow, the ion incident direction can be approximated as fixed, and the incident ions can be considered as monovalent ions. Therefore, the incident ion sputtering yield, obtained from linear fitting, is: (as shown in the first formula above). At this point, the erosion depth of the plume on the erosion sensor per unit time is given by the second formula above, due to the power density incident on the sensor surface... ρ P = ∫ j ( E ) EdE , bring in Y ( E This yields the third formula mentioned above. h E = d ΔR / ρ R L The length of the coating on the erosion sensorL and width d See definition Figure 6 Therefore, the local plume power density can be determined based on the measurement data from the erosion sensor and the Faraday probe. ρ P .

[0077] During the diagnostic process, common far-field parameters of thrusters are referenced, such as ion current density of 1 mA / cm². 2 With an ion energy of 300 eV (corresponding to approximately 0.5 sputtering yield), the coating thickness loss rate (erosion amount) can be calculated to be approximately 1 nm / s, meaning the maximum measurement time (complete erosion) for the probe is approximately 2000 s. Assuming the wire resistance R1 = R2 = 0.1 Ω and the voltmeter's internal resistance is approximately 10 Ω... 10 The voltage introduced by the wire resistance is much less than 1‰. Limiting the range to five times the minimum measurement range of each instrument, the effective resistance range of the corrosion sensor is approximately 0.017625~20 Ω (20 Ω corresponds to a measurement time of approximately 1998 s; the absolute value of the sum of the ion and electron currents entering the sensor is much less than the 3.2 mA saturation ion current, and has almost no impact on the measurement), with a minimum resistance change rate of 8.8 × 10⁻⁶. -6 Ω / s (at which point the rate of change of resistance is also the smallest relative to the resistance), corresponding to a measurement current change of 7 μA and a minimum current change of 6 μV, both of which are greater than five times the minimum range of the instrument, meaning that the effective measurement time of the erosion sensor accounts for more than 99% of the complete erosion time.

[0078] With a 20-second cycle and a time ratio of 99:1, the sensor can be used as both an erosion sensor and a Faraday probe. This allows for continuous diagnosis of the plume erosion amount, ion current density, and power density values ​​at the combined erosion rate-ion current density-power density diagnostic system over a period of approximately 2000 seconds.

[0079] It should be noted that the above measurement range calculations rely on actual data such as wire resistance and MOSFET on-state voltage drop. Before the experiment, the parameters of each component should be measured, and appropriate range ammeters and voltmeters should be selected based on the measurement data. Furthermore, considering the slight errors caused by factors such as temperature drift in actual voltmeters / ammeters and power supplies, as well as errors due to plating and silicon wafer surface roughness, the actual measurement accuracy and effective measurement time will be slightly less than the above calculations.

[0080] When performing a combined diagnostic test of erosion rate, ion current density, and power density, connect the probe to the circuit system and ensure that each connection point is electrically isolated from the external environment (e.g., wrapped with tape) to prevent plasma from entering through the connection points and affecting the measurement results. Then, place the probe at the location where the diagnostic test is to be performed and begin the experiment.

[0081] In this embodiment, an erosion sensor and a Faraday probe are integrated into a joint acquisition structure. For this joint acquisition structure placed in a Hall electric propulsion plume, the resistance change of the erosion sensor in the joint acquisition structure is continuously measured by a four-wire resistance measurement circuit for a portion of the time. For another portion of the time, the resistance measurement circuit is disconnected and a negative bias voltage is applied to the joint acquisition structure of the erosion sensor and the Faraday probe. The ion current density distribution at the location of the erosion sensor is measured through this interactive measurement method. The spatial erosion rate can be solved based on the resistance change of the erosion sensor. The Hall electric propulsion plume power density is obtained by combining the ion current density and the sputtering yield function. This achieves synchronous high-precision measurement of multiple parameters and improves the diagnostic efficiency of Hall electric propulsion data.

[0082] By integrating sensors, erosion rate and ion current density can be diagnosed simultaneously, thereby obtaining plume power density that was previously difficult to obtain. At an ion current density of 1 mA / cm²... 2 Under 300eV energy conditions, the erosion measurement error introduced by the Faraday probe bias can be controlled within 0.11%, demonstrating reasonable diagnostic capabilities and data accuracy. Furthermore, the single integrated acquisition structure reduces installation complexity and weight, making it suitable for space-constrained environments. The measurement device is less complex than the RPA originally required for measuring plume power density; the corrected four-wire circuit exhibits strong anti-interference capabilities, ensuring stable resistance measurements (effective measurement time accounts for over 99% of the complete erosion time), simplifying and enhancing system reliability. Compared to existing split-type diagnostic packages, this patent achieves more efficient plume characteristic analysis through structural integration and circuit innovation.

[0083] Figure 7 A schematic diagram of a joint diagnostic data processing device based on Hall electric propulsion data is provided. This device can be applied to a joint diagnostic system for the plume erosion rate, ion current density, and plume power density of Hall electric propulsion thrusters. The joint diagnostic system includes a joint acquisition structure and a joint diagnostic circuit system. The joint acquisition structure includes an erosion sensor and a coupled Faraday probe. The joint diagnostic circuit system includes a modified four-wire resistance measurement circuit. Figure 7 As shown, the joint diagnostic data processing device 700 based on Hall thruster data includes:

[0084] The first measurement module 701 is used to measure the sensor resistance of the erosion sensor through the four-wire resistance measurement circuit, and to calculate the plume erosion rate based on the rate of change of the sensor resistance, the material type of the erosion sensor, and its geometric dimensions.

[0085] The second measurement module 702 is used to measure the sensor resistance using the four-wire method within a specified period of time sequence based on the material sputtering yield of the erosion sensor, the working fluid and operating voltage of the thruster, the bias voltage of the Faraday probe, and the measurement interference data of the bias voltage on the plume erosion rate, and to measure the ion current density using the Faraday probe within another specified period of time sequence.

[0086] The calculation module 703 is used to calculate the distribution of the plume power density based on the plume erosion rate, the ion current density, the linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume; the material sputtering rate function is obtained by linearly processing the sputtering yield of the metal material when the Hall-driven working propellant ions are incident and evaluating the linearity of the sputtering amount of the metal material within the ion energy range.

[0087] The joint diagnostic data processing device based on Hall electric propulsion data provided in this application embodiment has the same technical features as the joint diagnostic data processing method based on Hall electric propulsion data provided in the above embodiment, so it can also solve the same technical problems and achieve the same technical effects.

[0088] An electronic device provided in this application embodiment, such as Figure 8 As shown, the electronic device 800 includes a processor 802 and a memory 801. The memory stores a computer program that can run on the processor. When the processor executes the computer program, it implements the steps of the method provided in the above embodiments.

[0089] See Figure 8 The electronic device also includes a bus 803 and a communication interface 804. The processor 802, the communication interface 804 and the memory 801 are connected through the bus 803. The processor 802 is used to execute executable modules, such as computer programs, stored in the memory 801.

[0090] The memory 801 may include high-speed random access memory (RAM) or non-volatile memory, such as at least one disk storage device. Communication between this system network element and at least one other network element is achieved through at least one communication interface 804 (which can be wired or wireless), such as the Internet, wide area network, local area network, or metropolitan area network.

[0091] Bus 803 can be an ISA bus, PCI bus, or EISA bus, etc. The bus can be divided into address bus, data bus, control bus, etc. For ease of representation, Figure 8The symbol is represented by a single double-headed arrow, but this does not mean that there is only one bus or one type of bus.

[0092] The memory 801 is used to store programs. After receiving an execution instruction, the processor 802 executes the program. The method executed by the apparatus defined by the process disclosed in any of the preceding embodiments of this application can be applied to the processor 802 or implemented by the processor 802.

[0093] The processor 802 may be an integrated circuit chip with signal processing capabilities. In implementation, each step of the above method can be completed by the integrated logic circuitry in the hardware of the processor 802 or by instructions in software form. The processor 802 may be a general-purpose processor, including a Central Processing Unit (CPU), a Network Processor (NP), etc.; it may also be a Digital Signal Processor (DSP), an Application Specific Integrated Circuit (ASIC), a Field-Programmable Gate Array (FPGA), or other programmable logic devices, discrete gate or transistor logic devices, or discrete hardware components. It can implement or execute the methods, steps, and logic block diagrams disclosed in the embodiments of this application. The general-purpose processor may be a microprocessor or any conventional processor. The steps of the methods disclosed in the embodiments of this application can be directly manifested as execution by a hardware decoding processor, or execution by a combination of hardware and software modules in the decoding processor. The software module can reside in a mature storage medium in the field, such as random access memory, flash memory, read-only memory, programmable read-only memory, electrically erasable programmable memory, or registers. This storage medium is located in memory 801, and processor 802 reads the information from memory 801 and, in conjunction with its hardware, completes the steps of the above method.

[0094] Corresponding to the above-described joint diagnostic data processing method based on Hall electric propulsion data, this application embodiment also provides a computer-readable storage medium storing computer-executable instructions. When the computer-executable instructions are invoked and executed by a processor, the computer-executable instructions cause the processor to perform the steps of the above-described joint diagnostic data processing method based on Hall electric propulsion data.

[0095] The joint diagnostic data processing device based on Hall thruster data provided in this application embodiment can be specific hardware on the device or software or firmware installed on the device. The implementation principle and technical effects of the device provided in this application embodiment are the same as those in the foregoing method embodiments. For the sake of brevity, any parts not mentioned in the device embodiment can be referred to the corresponding content in the foregoing method embodiments. Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the specific working processes of the systems, devices, and units described above can all be referred to the corresponding processes in the above method embodiments, and will not be repeated here.

[0096] In the embodiments provided in this application, it should be understood that the disclosed apparatus and methods can be implemented in other ways. The apparatus embodiments described above are merely illustrative. For example, the division of units is only a logical functional division, and in actual implementation, there may be other division methods. Furthermore, multiple units or components may be combined or integrated into another system, or some features may be ignored or not executed. Additionally, the displayed or discussed mutual couplings, direct couplings, or communication connections may be through some communication interfaces; indirect couplings or communication connections between devices or units may be electrical, mechanical, or other forms.

[0097] For example, the flowcharts and block diagrams in the accompanying drawings illustrate the architecture, functionality, and operation of possible implementations of apparatus, methods, and computer program products according to various embodiments of this application. In this regard, each block in a flowchart or block diagram may represent a module, segment, or portion of code containing one or more executable instructions for implementing a specified logical function. It should also be noted that in some alternative implementations, the functions marked in the blocks may occur in a different order than those marked in the drawings. For example, two consecutive blocks may actually be executed substantially in parallel, and they may sometimes be executed in reverse order, depending on the functions involved. It should also be noted that each block in a block diagram and / or flowchart, and combinations of blocks in block diagrams and / or flowcharts, can be implemented using a dedicated hardware-based system that performs the specified function or action, or using a combination of dedicated hardware and computer instructions.

[0098] The units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the units can be selected to achieve the purpose of this embodiment according to actual needs.

[0099] In addition, the functional units in the embodiments provided in this application can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit.

[0100] If the aforementioned functions are implemented as software functional units and sold or used as independent products, they can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of this application, in essence, or the part that contributes to the prior art, or a portion of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the joint diagnostic data processing method based on Hall electric propulsion data described in the various embodiments of this application. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0101] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. In addition, the terms "first", "second", "third", etc. are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0102] Finally, it should be noted that the above-described embodiments are merely specific implementations of this application, used to illustrate the technical solutions of this application, and not to limit them. The protection scope of this application is not limited thereto. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that any person skilled in the art can still modify or easily conceive of changes to the technical solutions described in the foregoing embodiments, or make equivalent substitutions for some of the technical features, within the scope of the technology disclosed in this application; and these modifications, changes, or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application. All should be covered within the protection scope of this application. Therefore, the protection scope of this application should be determined by the protection scope of the claims.

Claims

1. A joint diagnostic data processing method based on Hall thruster data, characterized in that, A joint diagnostic system for plume erosion rate, ion current density, and plume power density in Hall-effect electric propulsion applied to thrusters, the joint diagnostic system comprising a joint acquisition structure and a joint diagnostic circuit system, the joint acquisition structure comprising an erosion sensor and a coupled Faraday probe, and the joint diagnostic circuit system comprising a modified four-wire resistance measurement circuit; the method comprising: The resistance of the erosion sensor is measured using the four-wire resistance measurement circuit, and the plume erosion rate is calculated based on the rate of change of the sensor resistance, the material type of the erosion sensor, and its geometric dimensions. Based on the material sputtering yield of the erosion sensor, the working fluid and operating voltage of the thruster, the bias voltage of the Faraday probe, and the measurement interference data of the bias voltage on the plume erosion rate, the sensor resistance is measured using the four-wire method within a time series in a specified period, and the ion current density is measured using the Faraday probe within another time series in the specified period. The distribution of plume power density is calculated based on the plume erosion rate, the ion current density, the linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume. The material sputtering rate function is obtained by linearly processing the sputtering yield of the metal material when the Hall-driven working propellant ions are incident and evaluating the linearity of the sputtering amount of the metal material within the ion energy range.

2. The method according to claim 1, characterized in that, Before calculating the distribution of the plume power density based on the plume erosion rate, the ion current density, the linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume, the method further includes: By using the linear approximation principle, the incident ion sputtering yield of the metal material when the working propellant ions of the Hall electric propulsion are incident is fitted to a linear function, and the linearly fitted material sputtering rate function is obtained. The incident ion sputtering yield obtained through linear fitting is given by the first formula: ; E Indicates the incident ion energy. a and b It is a constant. The incident ion sputtering yield obtained through linear fitting is represented by the second formula; the erosion depth of the plume on the erosion sensor per unit time is given by the second formula: ; Indicates the depth of erosion. m The atomic mass of the sputtered material. j ( E ) represents the distribution of incident ion current density with respect to incident ion energy. e For elementary charge, ρ The density of the sputtered material.

3. The method according to claim 2, characterized in that, The plume power density incident on the surface of the erosion sensor is: ρ P = ∫ j ( E ) EdE The step of calculating the plume power density distribution based on the plume erosion rate, the ion current density, the linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume includes: The ρ P and the linear fitting described Substituting this into the second formula, we obtain the third formula: in, This represents the plume power density incident on the surface of the erosion sensor; The total ion current density is measured using the Faraday probe. j 0= I P / S P , I P The current collected by the erosion sensor as the collecting electrode of the Faraday probe. S P The area of ​​the collecting electrode; h E This indicates the plume erosion rate. h E = d ΔR / ρ R L , L This indicates the coating length of the erosion sensor. d The value represents the coating width of the corrosion sensor, and ΔR is the change in the sensor resistance of the corrosion sensor per unit time. ρ R The resistivity of the material of the erosion sensor; Through the third formula and h E = d ΔR / ρ R L The power density of the plume is calculated to obtain the value.

4. The method according to claim 2, characterized in that, The sputtering amount of the metallic material is a function of the incident ion energy and the ion incident angle.

5. The method according to claim 1, characterized in that, The measurement of the sensor resistance of the erosion sensor using the four-wire resistance measurement circuit includes: The circuit current is measured once at each end of the resistor under test using the modified four-wire resistance measurement circuit to eliminate the influence of ions and electrons from the plasma entering the circuit unbalanced from the erosion sensor on the measurement result of the sensor resistance; the measurement circuit is suspended, and the change of the voltage of the four-wire resistance measurement circuit to ground is additionally measured to determine the polarity of the current flowing from the plasma.

6. The method according to claim 1, characterized in that, The joint acquisition structure also includes: a single-sided polished high-resistivity monocrystalline silicon wafer, a metal plating layer, silver paste, and a PCB board; The single-sided polished high-resistivity monocrystalline silicon wafer is used to prepare a metal coating with a rough surface. The metal coating serves as the electrode for the erosion sensor and the Faraday probe, and is prepared on the surface of the silicon wafer by magnetron sputtering. The silver paste is used to fix both ends of the silicon wafer to the PCB board pads to connect the erosion sensor, the electrode, and the PCB circuitry. The PCB board serves as the substrate for fixing the silicon wafer used for coating. The internal circuitry of the PCB board connects both ends of the erosion sensor and the protective ring of the Faraday probe. The erosion sensor is connected to an external circuit through an interface on the PCB board. The silicon wafer on the PCB board includes an internal erosion sensor and a collector electrode structure for the Faraday probe, an external protective ring structure for the Faraday probe, and connections to different pads and circuitry structures.

7. The method according to claim 1, characterized in that, The combined diagnostic circuit system further includes: a negative bias circuit, a current measurement circuit, a switching element, and a control and communication element; the negative bias circuit is used to provide the negative bias voltage required by the Faraday probe to repel electron current; the current measurement circuit is used to measure the ion current collected by the collecting electrode of the Faraday probe; the switching element is used to control the conduction and cutoff of each part of the circuit according to the external control signal; the control and communication element is used to establish a connection with the host computer and each circuit module, convert the instructions of the host computer into instruction signals transmitted to each circuit module, and convert the data measured by each circuit module into bus signals and transmit them back to the host computer.

8. A joint diagnostic data processing system based on Hall thruster data, characterized in that, A joint diagnostic system for plume erosion rate, ion current density, and plume power density in Hall-effect electric propulsion applied to thrusters. The joint diagnostic system includes a joint acquisition structure and a joint diagnostic circuit system. The joint acquisition structure includes an erosion sensor and a coupled Faraday probe. The joint diagnostic circuit system includes a modified four-wire resistance measurement circuit. The first measurement module is used to measure the sensor resistance of the erosion sensor through the four-wire resistance measurement circuit, and to calculate the plume erosion rate based on the rate of change of the sensor resistance, the material type of the erosion sensor, and its geometric dimensions. The second measurement module is used to measure the sensor resistance using the four-wire method within a specified period, and to measure the ion current density using the Faraday probe within another specified period, based on the material sputtering yield of the erosion sensor, the working fluid and operating voltage of the thruster, the bias voltage of the Faraday probe, and the measurement interference data of the bias voltage on the plume erosion rate. The calculation module is used to calculate the distribution of the plume power density based on the plume erosion rate, the ion current density, the linearly fitted material sputtering rate function, and the position of the joint acquisition structure in the plume; the material sputtering rate function is obtained by linearly processing the sputtering yield of the metal material when the Hall-driven working propellant ions are incident and evaluating the linearity of the sputtering amount of the metal material within the ion energy range.

9. An electronic device comprising a memory and a processor, wherein the memory stores a computer program executable on the processor, characterized in that, When the processor executes the computer program, it implements the steps of the method described in any one of claims 1 to 7.

10. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores computer-executable instructions that, when invoked and executed by a processor, cause the processor to perform the method according to any one of claims 1 to 7.

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