Adsorption rotor and adsorption recovery device
By setting up adsorption, desorption, and cooling zones in the adsorption rotor, and establishing isolation zones in between, and utilizing inert gas for transport, the problems of gas leakage and mixing in the adsorption recovery device are solved, achieving safe and efficient recovery of volatile substances.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-10
- Publication Date
- 2026-03-13
AI Technical Summary
In existing adsorption recovery devices, there are problems of gas leakage and mixing between the adsorption zone, desorption zone, and cooling zone.
An adsorption rotor with a ventilation gap structure for carrying adsorbent is provided. An adsorption zone, a desorption zone, and a cooling zone are set along the rotation direction, and first and second isolation zones are set in between. Inert gas is used to transport the gas in the isolation zones to prevent gas leakage and mixing.
It effectively prevents gas leakage and mixing between the adsorption zone, desorption zone, and cooling zone, thus improving the safety and processing efficiency of the device.
Smart Images

Figure CN121648704A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to an adsorption recovery device for adsorbing and recovering volatile adsorbed substances by means of an adsorption rotor, and an adsorption rotor installed in the adsorption recovery device, the adsorption rotor being composed of a structure having an air passage gap for carrying adsorbent. Background Technology
[0002] Patent Documents 1 and 2 disclose a technology that can safely and efficiently recover volatile organic compounds at high concentrations, and continuously separate and recover organic compounds while preventing pressure fluctuations in the gas system being processed. Furthermore, Patent Document 3 discloses a gas processing device that does not require high-precision processing and adjustment of sealing materials, and can suppress the mixing of gases inside and outside the rotor even when the processing air volume and regeneration air volume are variably controlled. Existing technical documents Patent documents
[0003] Patent Document 1: Japanese Patent Application Publication No. 2007-44687 Patent Document 2: Japanese Patent Application Publication No. 2007-83238 Patent Document 3: Japanese Patent Application Publication No. 2016-77990 Summary of the Invention The technical problem that the invention aims to solve
[0004] The purpose of this invention is to prevent gas leakage and mixing between the adsorption zone, desorption zone, and cooling zone in an adsorption recovery device that adsorbs and recovers volatile adsorbed substances by means of an adsorption rotor. The adsorption rotor is composed of a structure having a ventilation gap for carrying adsorbent and has an adsorption zone, a desorption zone, and a cooling zone arranged along the rotation direction. means for solving problems
[0005] One embodiment of this disclosure provides an adsorption rotor comprising a structure having a venting gap for carrying an adsorbent, and rotating about an axis in a rotational direction. It includes: an adsorption region for which a gas containing a volatile adsorbate is input and adsorbed onto the structure; a desorption region disposed downstream of the adsorption region in the rotational direction, causing the adsorbate adsorbed onto the structure to be desorbed by the supply of desorption gas; a cooling region disposed downstream of the desorption region in the rotational direction, causing the structure to be cooled by the supply of regeneration gas; a first isolation region disposed between the adsorption region and the desorption region, in which an inert gas is supplied; and a second isolation region disposed between the cooling region and the adsorption region, in which an inert gas is supplied.
[0006] According to this method, in the adsorption rotor, a first isolation region is located between the adsorption region and the desorption region, and a second isolation region is located between the adsorption region and the cooling region. Therefore, mutual gas leakage and mixing between the adsorption region and the desorption region, as well as between the adsorption region and the cooling region, can be prevented. The effects of the invention
[0007] According to this disclosure, an adsorption recovery device that adsorbs and recovers volatile adsorbed substances by means of an adsorption rotor can prevent gas leakage and mixing between the adsorption zone, the desorption zone, and the cooling zone. The adsorption rotor is composed of a structure having a ventilation gap for carrying the adsorbent and has an adsorption zone, a desorption zone, and a cooling zone arranged along the rotation direction. Attached Figure Description
[0008] Figure 1 This is a schematic diagram showing the general structure of the adsorption and recovery device according to the first embodiment. Figure 2 This is a schematic diagram showing the pressure on the upstream and downstream sides of the flow path relative to each region in the adsorption recovery apparatus of the first embodiment. Figure 3 This is a block diagram showing the hardware structure of the control unit. Figure 4 schematically shown Figure 1 The flow of inert gas in the adsorption and recovery device. Figure 5 schematically shown Figure 1 The flow of inert gas in the adsorption and recovery device. Figure 6 This is a schematic diagram showing the general structure of the adsorption recovery device according to the second embodiment. Figure 7 This is a schematic diagram showing the general structure of the adsorption recovery device according to the third embodiment. Detailed Implementation
[0009] Hereinafter, an example of an embodiment for implementing the technology of this disclosure will be described in detail with reference to the accompanying drawings. Furthermore, the same reference numerals are used in all the drawings to indicate constituent elements and processes that perform the same function, action, and operation, and repeated descriptions are sometimes omitted appropriately. The drawings are shown only schematically to provide a full understanding of the technology of this disclosure. Therefore, the technology of this disclosure is not limited to the illustrated examples. In addition, in this embodiment, descriptions of components or well-known components that are not directly related to the technology of this disclosure are sometimes omitted.
[0010] (1) First implementation method Figure 1This is a schematic diagram showing the general structure of the adsorption recovery device 1 according to the first embodiment. The adsorption recovery device 1 of this embodiment has an adsorption rotor 10, which is constructed of a structure having an air passage having a carrying adsorbent, and rotates about an axis 11. The adsorption rotor 10 passes through the adsorption region 12, the first isolation region 15, the desorption region 13, the cooling region 14, and the second isolation region 16, which occupy the largest part, along the rotation direction shown by the arrow in the figure.
[0011] In adsorption zone 12, gas containing volatile adsorbed substances is transported from upstream side 21 to downstream side 22 via adsorption flow path 20 through adsorption fan 21b, thereby adsorbing the adsorbed substances onto adsorption rotor 10. Additionally, in Figure 1 In the adsorption flow path 20, the adsorption fan 21b is disposed on the upstream side 21, but it can also be disposed on the downstream side 22, or it can be disposed on both the upstream side 21 and the downstream side 22. Examples of volatile adsorbed substances include organic solvents used or generated in the manufacturing or processing steps of the product. The gas containing the volatile adsorbed substance contains oxygen from the atmosphere of the manufacturing or processing step. In the adsorption zone 12, the adsorption rotor 10 is cooled to a relatively low temperature in the cooling zone 14 (described later), making it easier to adsorb the adsorbed substance.
[0012] In the desorption region 13, located downstream of the adsorption region 12 in the direction of rotation, heated desorption gas is supplied from the upstream side 31 to the downstream side 32 through the desorption flow path 30, thereby desorbing the adsorbed substance from the adsorption rotor 10. An inert gas such as nitrogen is preferred as the desorption gas.
[0013] In the cooling zone 14, located downstream of the desorption zone 13 in the direction of rotation, the cooled regeneration gas is supplied from the upstream side 41 to the downstream side 42 through the cooling flow path 40, thereby cooling the structure and regenerating the adsorption rotor 10 into a state capable of adsorbing the adsorbed substance. An inert gas such as nitrogen is preferred as the regeneration gas.
[0014] Furthermore, the desorption flow path 30 is connected to the downstream side 42 of the cooling flow path 40 via a heater 80 provided on the upstream side 31, and is also connected to the upstream side 41 of the cooling flow path 40 via a cooler 90 provided on the downstream side 32. That is, the adsorbed material contained in the high-temperature desorbed gas desorbed from the adsorption rotor 10 and flowing out from the downstream side 32 of the desorption flow path 30 is cooled by the cooler 90, condenses into a liquid, and is recovered. The desorbed gas, having had the adsorbed material removed, becomes a cooled, low-temperature regeneration gas, which flows into the cooling zone 14 from the upstream side 41 of the cooling flow path 40 via a cooling fan 41b. The regeneration gas cooled in the cooling zone 14 flows out from the downstream side 42 of the cooling flow path 40, is heated by the heater 80 provided on the upstream side 31 of the desorption flow path 30, and becomes a high-temperature desorbed gas again, flowing into the desorption zone 13 for desorbing the adsorbed material from the adsorption rotor 10.
[0015] A first isolation region 15 is provided between the adsorption region 12 and the desorption region 13, wherein an inert gas is supplied from the upstream side 51 to the downstream side 52 of the first isolation flow path 50. Nitrogen is preferably used as the inert gas. Here, oxygen flowing in from the manufacturing or processing steps of the product is present in the adsorption region 12. This oxygen is to flow into the desorption region 13 through the ventilation gap of the structure, but before that, it reaches the first isolation region 15 disposed between the adsorption region 12 and the desorption region 13 and flows out to the downstream side 52 of the first isolation flow path 50. Thus, by preventing oxygen from flowing from the adsorption region 12 into the desorption region 13, even if the concentration of the adsorbed substance at the downstream side 32 of the desorption flow path 30 becomes high, the risk of explosion due to the presence of oxygen can be reduced.
[0016] A second isolation zone 16 is provided between the cooling zone 14 and the adsorption zone 12, wherein an inert gas is supplied from the upstream side 61 to the downstream side 62 of the second isolation flow path 60. Nitrogen is preferably used as the inert gas. Here, oxygen flowing in from the manufacturing or processing steps of the product is present in the adsorption zone 12. This oxygen flows into the cooling zone 14 through the ventilation gap of the structure, but before that, it reaches the second isolation zone 16 disposed between the cooling zone 14 and the adsorption zone 12 and flows out to the downstream side 62 of the second isolation flow path 60. Thus, by preventing oxygen from flowing from the adsorption zone 12 into the cooling zone 14, it is possible to prevent oxygen from mixing into the upstream side 31 of the desorption flow path 30 via the downstream side 42 of the cooling flow path 40. Even if the concentration of adsorbed material at the downstream side 32 of the desorption flow path 30 becomes high, the risk of explosion due to the presence of oxygen can be reduced. In addition, it can prevent the reduced processing efficiency caused by the leakage of adsorbed material that was not fully recovered from the desorption flow path 30 by the cooler 90 through the cooling zone 14 into the adsorption zone 12 and into the downstream side 22 of the adsorption flow path 20.
[0017] Furthermore, the upstream side 21 of the adsorption flow path 20, the downstream side 32 of the desorption flow path 30, the upstream side 41 of the cooling flow path 40, the downstream side 52 of the first isolation flow path 50, and the downstream side 62 of the second isolation flow path 60 are located on one side relative to the adsorption rotor 10. Figure 1 (Left side of the image). Additionally, the downstream side 22 of the adsorption flow path 20, the upstream side 31 of the desorption flow path 30, the downstream side 42 of the cooling flow path 40, the upstream side 51 of the first isolation flow path 50, and the upstream side 61 of the second isolation flow path 60 are located on the opposite side relative to the adsorption rotor. Figure 1 (The right side of the middle).
[0018] In this embodiment, the adsorption rotor 10 is constructed of a structure having a ventilation gap for carrying adsorbent, and rotates in the rotational direction around a center 11. It includes: an adsorption region 12, to which a gas containing a volatile adsorbate is supplied and adsorbed onto the structure; a desorption region 13, disposed downstream of the adsorption region 12 in the rotational direction, to which a desorption gas is supplied and desorbs the adsorbate adsorbed onto the structure; a cooling region 14, disposed downstream of the desorption region 13 in the rotational direction, to which a regeneration gas is supplied and cools the structure; a first isolation region 15, to which an inert gas is supplied, disposed between the adsorption region 12 and the desorption region 13; and a second isolation region 16, to which an inert gas is supplied, disposed between the adsorption region 14 and the desorption region 12.
[0019] Furthermore, the adsorption recovery device 1 of this embodiment includes the adsorption rotor 10 described above. Gas containing volatile adsorbed substances relative to the adsorption region 12 is supplied from one side of the adsorption rotor 10 to the other side. Relative to the desorption region 13, the desorbed gas is supplied from the other side to the first side. Relative to the cooling region 14, the regeneration gas is supplied from the first side to the other side.
[0020] Furthermore, in the aforementioned adsorption and recovery device 1, the inert gas relative to the first isolation region 15 is supplied from the other side to the first side, and the inert gas relative to the second isolation region 16 is supplied from the other side to the first side.
[0021] Figure 2 This is a schematic diagram showing the pressure on the upstream and downstream sides of the flow path relative to each region in the adsorption recovery apparatus 1 of this embodiment. As shown in this figure, in the adsorption flow path 20, the pressure on the upstream side 21 relative to the adsorption region 12 is set to P. 21 Set the pressure on the downstream side 22 to P. 22 Additionally, in the desorption flow path 30, the pressure on the upstream side 31 is set to P relative to the desorption region 13.31 Set the pressure on the downstream side 32 to P. 32 Furthermore, in the cooling flow path 40, the pressure on the upstream side 41 relative to the cooling region 14 is set to P. 41 Set the pressure on the downstream side 42 to P. 42 Additionally, in the first isolation flow path 50, the pressure on the upstream side 51 is set to P relative to the first isolation region 15. 51 Set the pressure on the downstream side 52 to P. 52 Additionally, in the second isolation flow path 60, the pressure on the upstream side 61 is set to P relative to the second isolation region 16. 61 Set the pressure on the downstream side 62 to P. 62 .
[0022] Furthermore, the adsorption and recovery device 1 of this embodiment includes a control unit 100 (see reference 100). Figure 1 The control unit 100 adjusts the pressures of the adsorption flow path 20, the cooling flow path 40, the first isolation flow path 50, and the second isolation flow path 60 to make each of the above pressures P. 51 >P 21 P 51 >P 22 P 52 >P 21 P 52 >P 22 P 61 <P 42 P 61 <P 22 P 62 <P 41 And P 62 <P 21 The details of the control unit 100 will be described later.
[0023] That is, through P 51 >P 21 P 51 >P 22 P 52 >P 21 And P 52 >P 22 The first isolation zone 15 can be used to prevent oxygen-containing gas from leaking from the adsorption zone 12 to the desorption zone 13.
[0024] Additionally, through P 61 <P 42 And P 62 <P 41 Gas leaks from cooling zone 14 to the second isolation zone 16. Additionally, through P... 61 <P 22 And P 62 <P21 Oxygen-containing gas leaks from adsorption region 12 to second isolation region 16. As a result, the second isolation region 16 can prevent oxygen-containing gas from leaking from adsorption region 12 to cooling region 14, and prevent gas containing adsorbed material from leaking from cooling region 14 to adsorption region 12.
[0025] In other words, the above-mentioned adsorption and recovery device 1 is provided with a control unit 100, which controls the pressure of the first isolation region 15 to be higher than the pressure of the adsorption region 12, and the pressure of the second isolation region 16 to be lower than the pressure of the cooling region 14 and the adsorption region 12.
[0026] Furthermore, such as Figure 1 As shown, the adsorption recovery apparatus 1 of this embodiment further includes: an inert gas supply source 70 for supplying inert gas; a first supply path 71 connecting the inert gas supply source 70 and the upstream side 51 of the first isolation flow path 50; a valve, i.e., a first supply valve 71a, disposed in the middle of the first supply path 71; a second supply path 75 connecting the inert gas supply source 70 and the upstream side 61 of the second isolation flow path 60; a valve, i.e., a second supply valve 75a, disposed in the middle of the second supply path 75; a first circulation path 53 connecting the downstream side 52 of the first isolation flow path 50 and the upstream side 21 of the adsorption flow path 20; a valve, i.e., a first circulation valve 53a, disposed in the middle of the first circulation path 53; a first supplementary path 54 connecting the downstream side 52 of the first isolation flow path 50 and the upstream side 41 of the cooling flow path 40; and a first supplementary path 54 disposed in the first supplementary path 55a. The valve in the middle of the 4 is the first supplementary valve 54a; the second circulation path 63 connects the downstream side 62 of the second isolation flow path 60 and the upstream side 21 of the adsorption flow path 20; the valve in the middle of the second circulation path 63 is the second circulation valve 63a; the second supplementary path 64 connects the downstream side 62 of the second isolation flow path 60 and the upstream side 41 of the cooling flow path 40; the valve in the middle of the second supplementary path 64 is the second supplementary valve 64a; the first recovery path 43 connects the downstream side 42 of the cooling flow path 40 and the upstream side 51 of the first isolation flow path 50; the valve in the middle of the first recovery path 43 is the first recovery valve 43a; the second recovery path 44 connects the downstream side 42 of the cooling flow path 40 and the upstream side 61 of the second isolation flow path 60; the valve in the middle of the second recovery path 44 is the second recovery valve 44a.
[0027] like Figure 3As shown in the hardware structure, the control unit 100 includes a CPU (Central Processing Unit) 110, a ROM (Read Only Memory) 120, a RAM (Random Access Memory) 130, and a storage device 150. All components are communicatively connected to each other via a bus 190.
[0028] CPU 110 is a central processing unit that executes various programs that can be implemented as installed application programs, or controls various parts. That is, CPU 110 reads programs from ROM 120 or storage device 150 and uses RAM 130 as its working area to execute programs. CPU 110 opens and closes various valves according to the programs recorded in ROM 120 or storage device 150.
[0029] ROM 120 stores various programs and data. RAM 130 serves as a temporary storage area for programs or data. Storage device 150 is configured as a storage device based on HDD (Hard Disk Drive), SSD (Solid State Drive), or flash memory, storing various programs, including the operating system, and various data.
[0030] Furthermore, in order to achieve the P as described above, the control unit 100 21 P 22 P 41 P 42 P 51 P 52 P 61 and P 62 Based on the size relationship, the first supply valve 71a, the first replenishment valve 54a, the second circulation valve 63a, and the second recovery valve 44a (these four valves are considered the "first valve group") (shaded in the diagram) are opened and closed synchronously. Additionally, the second supply valve 75a, the first circulation valve 53a, the second replenishment valve 64a, and the first recovery valve 43a (these four valves are considered the "second valve group") (blackened in the diagram) are opened and closed synchronously. Furthermore, sometimes one of the first valve group and the second valve group is open while the other is closed; other times, both are open.
[0031] In addition, the adsorption recovery device 1 of this embodiment is further provided with: an adsorption inflow valve 21a (shown blank in the figure) for opening and closing the upstream side 21 of the adsorption flow path 20; an adsorption outflow valve 22a for opening and closing the downstream side 22 of the adsorption flow path; a first isolation outflow valve 52a for opening and closing the downstream side 52 of the first isolation flow path 50; a second isolation outflow valve 62a for opening and closing the downstream side 62 of the second isolation flow path 60; a first bypass valve 73a for opening and closing the bypass from the first supply path 71 to the downstream side 52 of the first isolation flow path 50, i.e., the first detour path 73; and a second detour valve 77a for opening and closing the bypass from the second supply path 75 to the downstream side 62 of the second isolation flow path 60, i.e., the second detour path 77. These valves are opened and closed appropriately for filling each flow path with inert gas or adjusting the pressure of each flow path.
[0032] For example, if you want to reduce the pressure P on the downstream side 22 of the adsorption flow path 20 22 In such cases, it is advisable to open the adsorption outlet valve 22a and reduce the operating speed of the adsorption fan 21b. Additionally, if it is desired to reduce the pressure P on the upstream side 51 of the first isolation flow path 50... 51 Or, if you want to increase the pressure P on the downstream side 52 52 Alternatively, if it is desired to fill the downstream side 52 with inert gas, the first bypass valve 73a of the first bypass loop 73 is opened. Furthermore, if it is desired to reduce the pressure P on the upstream side 61 of the second isolation flow path 60... 61 Or, if you want to increase the downstream pressure P at 62, 62 Alternatively, if it is desired to fill the downstream side 62 with inert gas, the second bypass valve 77a of the second bypass circuit 77 is opened.
[0033] Figure 4 This is a schematic diagram illustrating the flow of inert gas with the first valve group closed (the valve shown in shaded area) and the second valve group open (the valve shown in black area). Additionally, Figure 5 This is a schematic diagram illustrating the flow of inert gas with the first valve group open and the second valve group closed. Additionally, in Figure 4 and Figure 5 In the blank valve diagram, valves with straight lines drawn along the flow path are open, while valves with straight lines drawn perpendicular to the flow path are closed.
[0034] Figure 4The opening and closing states of the valves shown are primarily performed when the adsorption recovery unit 1 is started and inert gas is being filled into each flow path. Here, the inert gas flows through the flow path shown in bold. Inert gas from the inert gas supply source 70 reaches the upstream side 61 of the second isolation flow path 60 via the open second supply valve 75a, and then reaches the downstream side 62 via the second isolation region 16. The inert gas then reaches the upstream side 41 of the cooling flow path 40 via the open second replenishment valve 64a, and then reaches the downstream side 42 via the cooling region 14.
[0035] Inert gas flows from the downstream side 42 of cooling zone 14 along a branched flow path to desorption flow path 30 and first isolation flow path 50. The inert gas reaching desorption flow path 30 is heated by heater 80 on the upstream side 31, then passes through desorption zone 13 to the downstream side 32, and then back to the upstream side 41 of cooling zone 14. Conversely, the inert gas reaching first isolation flow path 50 passes through the first isolation zone 15 via the opened first recovery valve 43a to the downstream side 52, and then through the opened first circulation valve 53a from the first circulation path 53 to the upstream side 21 of adsorption flow path 20.
[0036] In Figure 4 In this state, the flow paths circulating through the desorption flow path 30 in the desorption region 13 and the cooling flow path 40 in the cooling region 14 are filled with inert gas.
[0037] Figure 5 The opening and closing states of the valves shown are primarily performed when the adsorption recovery device 1 is operating with each flow path filled with inert gas. Here, the inert gas flows through the flow path shown in bold. In the state shown in this figure, the adsorption inflow valve 21a on the upstream side 21 of the adsorption flow path 20 is open, and gas containing volatile adsorbed substances flows into the adsorption flow path 20 from the product manufacturing or processing process. Inert gas from the inert gas supply source 70 reaches the upstream side 51 of the first isolation flow path 50 from the first supply path 71 via the open first supply valve 71a, and reaches the downstream side 52 through the first isolation region 15. The inert gas then reaches the upstream side 41 of the cooling flow path 40 from the first replenishment path 54 via the open first replenishment valve 54a, and reaches the downstream side 42 through the cooling region 14.
[0038] Inert gas flows from the downstream side 42 of the cooling flow path 40 along a branch flow path to the desorption flow path 30 and the second isolation flow path 60. The inert gas arriving at the desorption flow path 30 is heated by the heater 80 at the upstream side 31, then passes through the desorption zone 13 containing the desorbed adsorbed material and reaches the downstream side 32, where it is cooled by the cooler 90. The adsorbed material is condensed and removed, and in a cooled state, it returns to the upstream side 41 of the cooling zone 14, regenerating the structure of the adsorption rotor 10. On the other hand, the inert gas arriving at the second isolation flow path 60 passes through the second isolation zone 16 from the upstream side 61 via the opened second recovery valve 44a to the downstream side 62, and then through the second circulation valve 63a from the second circulation path 63 to the upstream side 21 of the adsorption flow path 20, merging with the gas containing volatile adsorbed material. During its passage through the adsorption zone 12, the adsorbed material is adsorbed onto the adsorption rotor 10, and simultaneously reaches the downstream side 22.
[0039] In Figure 5 Under these conditions, the pressure P on the upstream side 51 of the first isolation flow path 50, located at the upstreammost edge of the inert gas supply source 70, is increased. 51 and downstream pressure P 52 52 (Refer to Figure 2 The pressure P is relatively high, causing the pressure P located on the upstream side 61 of the second isolation flow path 60, which is further downstream of the flow path branching from the downstream side 42 of the downstream cooling flow path 40. 61 and downstream pressure P 62 62 (Refer to Figure 2 The lowest possible concentration of oxygen-containing gas is achieved through the first isolation zone 15, preventing leakage of oxygen-containing gas from the adsorption zone 12 to the desorption zone 13. Furthermore, by making P... 61 <P 42 And P 62 <P 41 Gas leaks from cooling zone 14 to second isolation zone 16, by causing P 61 <P 22 And P 62 <P 21 Oxygen-containing gas leaks from adsorption region 12 to second isolation region 16. As a result, the second isolation region 16 can prevent oxygen-containing gas from leaking from adsorption region 12 to cooling region 14, and prevent gas containing adsorbed material from leaking from cooling region 14 to adsorption region 12.
[0040] Here, as described above, the desorption flow path 30 and the cooling flow path 40 form a loop. However, since the inert gas flows into this loop via the first replenishment path 54, the pressure P on the upstream side 31 of the desorption flow path 30 will not decrease due to a reduction in the inert gas in the loop. 31 and the pressure P on the downstream side 32 32and the pressure P on the upstream side 41 of the cooling flow path 40. 41 and downstream pressure P 42 (Refer to Figure 2 In cases of low pressure, the opening and closing states of the valves can be switched appropriately, and inert gas can be appropriately refilled into each flow path, as well as pressure adjustment can be performed.
[0041] The adsorption recovery apparatus 1 of this embodiment comprises: an adsorption rotor 10, which is constructed of a structure having an air passage for carrying an adsorbent and rotates about an axis in the rotational direction; an adsorption region 12, in which gas containing a volatile adsorbed substance is supplied through an adsorption flow path 20 to adsorb the adsorbed substance; a desorption region 13, located downstream of the adsorption region 12 in the rotational direction, in which heated desorption gas is supplied through a desorption flow path 30 to desorb the adsorbed substance; a cooling region 14, located downstream of the desorption region 13 in the rotational direction, in which cooled regeneration gas is supplied through a cooling flow path 40 to cool the structure; a first isolation region 15, disposed between the adsorption region 12 and the desorption region 13, through which inert gas flows; and a second isolation region 16, disposed between the cooling region 14 and the adsorption region 12, through which inert gas flows.
[0042] In addition, the adsorption recovery device 1 of this embodiment also includes: a cooler 90 for cooling the adsorbed substance contained in the desorbed gas passing through the desorption zone 13; and a heater 80 for heating the regeneration gas passing through the cooling zone 14.
[0043] In addition, in the adsorption recovery device 1 of this embodiment, the regeneration gas cooled by the cooler 90 is supplied to the cooling zone 14, and the desorption gas heated by the heater 80 is supplied to the desorption zone 13.
[0044] Furthermore, the adsorption recovery device 1 of this embodiment further includes: an inert gas supply source 70 for supplying the inert gas; a first supply path 71 connecting the inert gas supply source 70 and the upstream side of the first isolation flow path 50; a first supply valve 71a disposed in the middle of the first supply path 71; a second supply path 75 connecting the inert gas supply source 70 and the upstream side of the second isolation flow path 60; a second supply valve 75a disposed in the middle of the second supply path 75; a first circulation path 53 connecting the downstream side of the first isolation flow path 50 and the upstream side of the adsorption flow path 20; a first circulation valve 53a disposed in the middle of the first circulation path 53; a first replenishment path 54 connecting the downstream side of the first isolation flow path 50 and the upstream side of the cooling flow path 40; a first replenishment valve 54a disposed in the middle of the first replenishment path 54; and a second circulation path 63 connecting the downstream side of the second isolation flow path 60 and the upstream side of the adsorption flow path 20. The control unit 100 provides the following: a second circulation valve 63a located midway through the second circulation path 63; a second supplementary path 64 connecting the downstream side of the second isolation path 60 and the upstream side of the cooling path 40; a second supplementary valve 64a located midway through the second supplementary path 64; a first recovery path 43 connecting the downstream side of the cooling path 40 and the upstream side of the first isolation path 50; a first recovery valve 43a located midway through the first recovery path 43; a second recovery path 44 connecting the downstream side of the cooling path 40 and the upstream side of the second isolation path 60; and a second recovery valve 44a located midway through the second recovery path 44. The control unit 100 synchronously opens and closes the first supply valve 71a, the first supplementary valve 54a, the second circulation valve 63a, and the second recovery valve 44a, and synchronously opens and closes the second supply valve 75a, the first circulation valve 53a, the second supplementary valve 64a, and the first recovery valve 43a.
[0045] (2) Second implementation method Figure 6 This is a schematic diagram showing the general structure of the adsorption recovery device 1 according to the second embodiment. The structure of the adsorption recovery device 1 in this embodiment, besides... Figure 1 The first embodiment shown is identical to the first embodiment except for the first detour 73 and the second detour 77.
[0046] In this embodiment, when the adsorption recovery device 1 is started, inert gas can be rapidly filled into the circulation paths of the desorption flow path 30 and the cooling flow path 40. That is, with the first isolation outlet valve 52a of the first isolation flow path 50 and the second isolation outlet valve 62a of the second isolation flow path 60 closed, and all other valves open, inert gas is supplied from the inert gas supply source 70 to the desorption flow path 30 and the cooling flow path 40 through the first recovery valve 43a of the first supply path 71 and the first recovery path 43, and through the second recovery valve 44a of the second supply path 75 and the second recovery path 44.
[0047] Regarding the operation of each valve and the movement of inert gas in the adsorption recovery device 1 of this embodiment, it differs from the first embodiment in that inert gas is supplied directly from the inert gas supply source 70 to the first isolation flow path 50 and the second isolation flow path 60. Figure 6 The first recovery valve 43a of the first recovery path 43, the second recovery valve 44a of the second recovery path 44, the first replenishment valve 54a of the first replenishment path 54, and the second replenishment valve 64a of the second replenishment path 64, shown in the diagram, are opened, and all other valves are opened. This embodiment envisions a situation where the supply pressure of the inert gas supplied from the inert gas supply source 70 is low, and the pressure P on the upstream side 51 of the first isolation flow path 50 is low. 51 and downstream pressure P 52 52 The pressure P on the upstream side 61 of the second isolation flow path 60 61 and the downstream pressure P at 62 62 This is implemented under relatively low conditions. That is, unlike the first implementation, the pressure in the first isolation zone 15 is assumed to be P. 51 <P 21 P 51 <P 22 P 52 <P 21 And P 52 <P 22 The pressure in the second isolation zone 16 is P. 61 <P 42 P 61 <P 22 P 62< P 41 And P 62 <P 21In this situation, oxygen-containing gas leaks from adsorption region 12 to first isolation region 15, and gas leaks from desorption region 13 to first isolation region 15. As a result, the first isolation region 15 prevents oxygen-containing gas from leaking from adsorption region 12 to desorption region 13, and prevents gas containing a high concentration of adsorbed material from leaking from desorption region 13 to adsorption region 12. Additionally, oxygen-containing gas leaks from adsorption region 12 to second isolation region 16, and gas leaks from cooling region 14 to second isolation region 16. As a result, the second isolation region 16 prevents oxygen-containing gas from leaking from adsorption region 12 to cooling region 14, and prevents gas containing adsorbed material from leaking from cooling region 14 to adsorption region 12.
[0048] (3) Third implementation method Figure 7 This is a schematic diagram showing the general structure of the adsorption recovery device 1 according to the third embodiment. The adsorption recovery device 1 of this embodiment differs from the first and second embodiments in that the direct supply of inert gas from the inert gas supply source 70 takes place only in the first isolation flow path 50, while the first and second embodiments also have a supply path for directly supplying inert gas to the second isolation flow path 60.
[0049] exist Figure 7 Of the valves shown, with the first bypass valve 73a of the first bypass loop 73 closed and all other valves open, inert gas from the inert gas supply source 70 passes through the open first supply valve 71a from the first supply path 71 to the upstream side 51 of the first isolation flow path 50, and then passes through the first isolation region 15 to the downstream side 52. The inert gas then passes through the open first replenishment valve 54a from the first replenishment path 54 to the upstream side 41 of the cooling flow path 40, and then passes through the cooling region 14 to the downstream side 42.
[0050] Inert gas flows from the downstream side 42 of the cooling flow path 40 along a branch flow path to the desorption flow path 30 and the second isolation flow path 60. The inert gas arriving at the desorption flow path 30 is heated by the heater 80 on the upstream side 31, and then passes through the desorption zone 13, reaching the downstream side 32 while containing the desorbed adsorbed material. It is cooled by the cooler 90, the adsorbed material condenses and is removed, and in a cooled state, it returns to the upstream side 41 of the cooling zone 14, regenerating the adsorption rotor 10. On the other hand, inert gas arriving at the second isolation flow path 60 through the opened second recovery valve 44a flows from the upstream side 61 through the second isolation zone 16 to the downstream side 62, and then from the second circulation path 63 through the opened second circulation valve 63a to the upstream side 21 of the adsorption flow path 20, merging with the gas containing volatile adsorbed material. During its passage through the adsorption zone 12, the adsorbed material is adsorbed onto the adsorption rotor 10 and reaches the downstream side 22.
[0051] In Figure 7 Under these conditions, the pressure P on the upstream side 51 of the first isolation flow path 50, which is closest to the inert gas supply source 70, is... 51 and the pressure P on the downstream side 52 52 (Refer to Figure 2 The pressure P is relatively higher, located on the upstream side 61 of the second isolation flow path 60, which is further downstream of the flow path branching from the downstream side 42 of the cooling flow path 40. 61 and downstream pressure P 62 62 (Refer to Figure 2 It becomes the lowest. Explanation of reference numerals in the attached figures
[0052] 1. Adsorption and recovery device 10 Adsorption rotor 11 Shaft 12 Adsorption region 13 Desorption Zone 14 Cooling Zone 15 First Isolation Zone 16 Second Quarantine Zone 20 Adsorption Flow Path 21. Upstream side of the adsorption flow path; 21a. Adsorption inflow valve; 21b. Adsorption air supply fan. 22A Adsorption Outflow Valve on the Downstream Side of the Adsorption Flow Path 30 Desorption Flow Path 31 Upstream side of the desorption flow path 32 Downstream side of the desorption flow path 40 cooling flow path 41 upstream side of the cooling flow path 41b cooling fan 42 Downstream side of the cooling flow path 43 First recovery path 43a First recovery valve 44 Second recovery path 44a Second recovery valve 50 First isolation flow path 51. Upstream side of the first isolation flow path 52 Downstream side of the first isolation flow path 52a First isolation outlet valve 53 First Circulation Path 53a First Circulation Valve 54 First supplementary circuit 54a First supplementary valve 60 Second isolation flow path 61. Upstream side of the second isolation flow path 62 Downstream side of the second isolation flow path 62a Second isolation outlet valve 63 Second Circulation Path 63a Second Circulation Valve 64 Second Supplementary Circuit 64a Second Supplementary Valve 70 Inert Gas Supply Source 71 First Supply Line 71a First Supply Valve 73 First Detour Circuit 73a First Detour Valve 75 Second Supply Circuit 75a Second Supply Valve 77 Second Detour Circuit 77a Second Detour Valve 80 heater 90 cooler 100 Control Unit 110 CPU 120 ROM 130 RAM, 150 storage devices, 190 bus
Claims
1. An adsorption rotor, comprising a structure having an air passage for carrying adsorbent, and rotating about an axis in a rotational direction, characterized in that, have: The adsorption zone is where a gas containing volatile adsorbed substances is introduced and the adsorbed substances are adsorbed onto the structure. The desorption region is disposed downstream of the adsorption region in the direction of rotation, so that the adsorbed substance adsorbed on the structure is desorbed due to the delivery of desorption gas. A cooling zone is disposed downstream of the desorption zone in the direction of rotation, so that the structure is cooled by the delivery of regeneration gas. A first isolation zone is provided between the adsorption zone and the desorption zone, and inert gas is transported in the first isolation zone. as well as A second isolation zone is provided between the cooling zone and the adsorption zone, and inert gas is supplied in the second isolation zone.
2. An adsorption and recovery device, characterized in that, Equipped with the adsorption rotor of claim 1, Relative to the adsorption region, gas containing volatile adsorbed substances is supplied from one side of the adsorption rotor to the other. Relative to the desorption region, the desorbed gas is supplied from the other side to the other side. The regenerated gas is supplied from one side to the other side relative to the cooling zone.
3. The adsorption and recovery device according to claim 2, characterized in that, Relative to the first isolation zone, the inert gas is supplied from the other side to this side. The inert gas is supplied from the other side to the first side relative to the second isolation zone.
4. The adsorption and recovery device according to claim 2, characterized in that, A control unit is provided to control the pressure in the first isolation region to be higher than the pressure in the adsorption region, and to make the pressure in the second isolation region lower than the pressure in the cooling region and the adsorption region.
5. The adsorption and recovery device according to claim 2, characterized in that, The upstream side of the adsorption flow path that supplies air to the adsorption region, the downstream side of the desorption flow path that supplies air to the desorption region, the upstream side of the cooling flow path that supplies air to the cooling region, the downstream side of the first isolation flow path that supplies air to the first isolation region, and the downstream side of the second isolation flow path that supplies air to the second isolation region are located on one side relative to the adsorption rotor. The downstream side of the adsorption flow path, the upstream side of the desorption flow path, the downstream side of the cooling flow path, the upstream side of the first isolation flow path, and the upstream side of the second isolation flow path are located on the other side relative to the adsorption rotor. Furthermore, a control unit is provided, which controls the pressure of the adsorption flow path, the cooling flow path, the first isolation flow path, and the second isolation flow path. In the adsorption flow path, the pressure relative to the upstream side of the adsorption region is set to P. 21 The pressure relative to the downstream side of the adsorption region is set as P. 22 , In the cooling flow path, the pressure relative to the upstream side of the cooling zone is set to P. 41 The pressure relative to the downstream side of the cooling zone is set to P. 42 , In the first isolated flow path, the pressure relative to the upstream side of the first isolated region is set to P. 51 The pressure on the downstream side relative to the first isolation zone is set as P. 52 , In the second isolation flow path, the pressure relative to the upstream side of the second isolation region is set to P. 61 The pressure relative to the downstream side of the second isolation zone is set as P. 62 hour, P 51 >P 21 P 51 >P 22 P 52 >P 21 P 52 >P 22 P 61 <P 42 P 61 <P 22 P 62 <P 41 And P 62 <P 21 .
6. The adsorption and recovery device according to claim 2, characterized in that, The upstream side of the adsorption flow path that supplies air to the adsorption region, the downstream side of the desorption flow path that supplies air to the desorption region, the upstream side of the cooling flow path that supplies air to the cooling region, the downstream side of the first isolation flow path that supplies air to the first isolation region, and the downstream side of the second isolation flow path that supplies air to the second isolation region are located on one side relative to the adsorption rotor. The downstream side of the adsorption flow path, the upstream side of the desorption flow path, the downstream side of the cooling flow path, the upstream side of the first isolation flow path, and the upstream side of the second isolation flow path are located on the other side relative to the adsorption rotor. Furthermore, a control unit is provided, which controls the pressure of the adsorption flow path, the cooling flow path, the first isolation flow path, and the second isolation flow path. In the adsorption flow path, the pressure relative to the upstream side of the adsorption region is set to P. 21 The pressure relative to the downstream side of the adsorption region is set as P. 22 , In the cooling flow path, the pressure relative to the upstream side of the cooling zone is set to P. 41 The pressure relative to the downstream side of the cooling zone is set to P. 42 , In the first isolated flow path, the pressure relative to the upstream side of the first isolated region is set to P. 51 The pressure on the downstream side relative to the first isolation zone is set as P. 52 , In the second isolation flow path, the pressure relative to the upstream side of the second isolation region is set to P. 61 The pressure P relative to the downstream side of the second isolation zone 62 hour, P 51 <P 21 P 51 <P 22 P 52 <P 21 P 52 <P 22 P 61 <P 42 P 61 <P 22 P 62 <P 41 And P 62 <P 21 .
7. The adsorption and recovery device according to claim 2, characterized in that, It also has: A cooler for cooling the adsorbed substances contained in the desorbed gas passing through the desorption zone; and A heater that heats the regenerated gas passing through the cooling zone.
8. The adsorption and recovery device according to claim 7, characterized in that, The regenerated gas cooled by the cooler is supplied to the cooling zone, and the desorbed gas heated by the heater is supplied to the desorption zone.
9. The adsorption and recovery device according to claim 6, characterized in that, It also has: An inert gas supply source for supplying the inert gas; A first supply path connecting the inert gas supply source and the upstream side of the first isolation flow path; A first supply valve is installed in the middle of the first supply path; A second supply path connecting the inert gas supply source and the upstream side of the second isolation flow path; A second supply valve is installed in the middle of the second supply path; A first loop flow path connecting the downstream side of the first isolation flow path and the upstream side of the adsorption flow path; A first circulation valve is installed in the middle of the first circulation path; A first supplementary path connects the downstream side of the first isolation flow path and the upstream side of the cooling flow path; A first replenishment valve is installed midway through the first replenishment path; A second loop flow path connecting the downstream side of the second isolation flow path and the upstream side of the adsorption flow path; A second circulation valve is installed in the middle of the second circulation path; A second supplementary path connects the downstream side of the second isolation flow path and the upstream side of the cooling flow path; A second replenishment valve is installed midway through the second replenishment path; A first recovery path connects the downstream side of the cooling flow path and the upstream side of the first isolation flow path; A first recovery valve is installed midway through the first recovery path; A second recovery path connects the downstream side of the cooling flow path and the upstream side of the second isolation flow path; A second recovery valve is installed midway through the second recovery path. The control unit synchronously opens and closes the first supply valve, the first replenishment valve, the second circulation valve, and the second recovery valve. Furthermore, the control unit synchronously opens and closes the second supply valve, the first circulating valve, the second replenishment valve, and the first recovery valve.
Citation Information
Patent Citations
Apparatus and method of concentrating volatile organic compound, and equipment and method of recovering volatile organic compound
JP2007044687A
Apparatus for concentrating volatile organic compound
JP2007083238A
Gas treatment device and method of reducing leakage
JP2016077990A