Vacuum processing device and pressing plate chamber

Abstract

The invention discloses a vacuum processing apparatus and a pressure plate chamber. The pressure plate chamber includes a pressure plate mechanism, a bottom portion, a rear wall portion, a lateral side wall portion, a front flange portion, and a curved top portion. The platen mechanism rotates, under reduced pressure, the substrate between a horizontal position in which the substrate can be carried in and out and a vertical position in which the substrate is close to the vacuum processing unit and stands up so as to be vacuum-processed. The rear wall portion stands upward from the rear end of the bottom portion and has a slit formed therein for loading and unloading the substrate. The lateral side wall parts stand upwards from the left and right ends of the bottom part, and the rear ends of the lateral side wall parts are connected with the rear wall part. The front flange portion stands upward from the front end of the bottom portion, is connected to the front end of the lateral side wall portion, and surrounds the periphery of a processing opening portion that opens toward the vacuum processing portion. And the curved top part is connected with the upper ends of the front flange part, the rear wall part and the transverse side wall part respectively. The lateral side wall portion is bent in an outwardly convex manner from the curved top portion to the bottom portion.

Description

Technical Field

[0001] The present invention relates to a suitable technique for a pressure chamber used in a vacuum processing apparatus. Background Technology

[0002] Vacuum processing is performed on substrates in the fields of semiconductor devices and flat panel displays (FPDs).

[0003] Vacuum treatments for substrates include vapor deposition, sputtering, CVD and other film-forming processes, heat treatment, and etching.

[0004] In a typical vacuum processing apparatus, a substrate is vacuum-processed within a reduced-pressure vacuum chamber. The vacuum processing apparatus performs vacuum processing in a vertical position (standing position) with the substrate upright (i.e., with the surface of the substrate to be processed aligned approximately vertically). Sometimes, the vacuum processing apparatus also transports the substrate in a vertical position. Alternatively, the substrate may be transported in a horizontal position (laying down position) with the substrate laid flat (i.e., with the surface of the substrate to be processed aligned approximately horizontally).

[0005] The vacuum processing apparatus has a pressure chamber that allows the substrate to be rotated so as to change the orientation of the substrate between a horizontal (lying) position and a vertical (standing) position (Patent Document 1).

[0006] In recent years, glass substrates in FPD manufacturing have tended to be larger. The so-called pressure chamber, which can change the orientation of the glass substrate between horizontal (lying) and vertical (standing) positions, has also tended to be larger.

[0007] Patent Document 1: Japanese Patent No. 6579726

[0008] The glass substrate is rotated under reduced pressure and a vacuum. Therefore, the pressure chamber needs to be strong enough to withstand the pressure difference between the inside and outside. Consequently, reducing the weight of the pressure chamber is not easy.

[0009] Furthermore, as glass substrates become larger, the shape of the pressure chamber, which requires space for glass substrate rotation, also increases. Consequently, with the increase in the size of the pressure chamber, its own weight also increases. Therefore, it is necessary to minimize the weight of the pressure chamber. In addition, the increased weight and size of the pressure chamber may create obstacles when transporting it to the installation site.

[0010] As a countermeasure to the increasing size of the pressure chamber, it is possible to construct the pressure chamber as a disassembleable structure and assemble it into units. In this case, a sealing element needs to be provided in the assembly section of the pressure chamber. The total length of the required sealing element increases throughout the entire pressure chamber. Furthermore, the possibility of particle generation in the assembly section may increase. In addition, the weight corresponding to the assembly section and the sealing element increases. Summary of the Invention

[0011] The present invention is made in view of the above circumstances and aims to achieve the following objectives.

[0012] 1. Reduce the weight of the pressure chamber that changes the orientation of the substrate between the longitudinal and transverse directions.

[0013] 2. Maintain the necessary strength of the pressure plate chamber.

[0014] 3. It is easy to maintain a seal.

[0015] 4. Reduce particle generation.

[0016] One aspect of the present invention relates to a pressure chamber comprising: a pressure mechanism for rotating a substrate under reduced pressure between a horizontal position capable of being moved in and out and a vertical position adjacent to a vacuum processing section and capable of vacuum processing; a bottom; a rear wall portion erected upward from the rear end of the bottom and having a slit formed for moving the substrate in and out; transverse sidewall portions erected upward from the left and right ends of the bottom, the rear ends of the transverse sidewall portions being connected to the rear wall portion; a front flange portion erected upward from the front end of the bottom and connected to the front end of the transverse sidewall portions, and surrounding a processing opening that opens into the vacuum processing section; and a curved top portion connected to the upper ends of the front flange portion, the rear wall portion, and the transverse sidewall portions, respectively. The transverse sidewall portions are curved outwardly from the curved top portion to the bottom portion.

[0017] In one aspect of the invention, the pressure chamber of the invention may have three surfaces: the curved top and the left and right transverse sidewalls, which may be curved surfaces that are bent in an outward convex manner.

[0018] In one embodiment of the invention, the pressure plate chamber includes a pressure plate mechanism with a horizontally oriented axis. The transverse sidewall may have a through hole near the bottom and the front flange for the pressure plate shaft to pass through. The front connection point of the curved top, which connects to the front flange, may be higher than the rear connection point connecting to the rear wall. The curved top may bend outwardly along the circumference of the pressure plate shaft from the front connection point to the rear connection point.

[0019] In the pressure chamber according to one aspect of the invention, both the front flange and the rear wall can be substantially flat. The outward convex curvature of the transverse sidewall at the front longitudinal line position connected to the front flange can be less than the outward convex curvature at the rear longitudinal line position connected to the rear wall.

[0020] In one aspect of the invention, the pressure chamber can be composed of conical surfaces having apexes further rearward than the rear wall portion.

[0021] In one aspect of the invention, the pressure chamber can be composed of a combination of planes along an imaginary triangular facet, which has a vertex further rearward than the rear wall portion.

[0022] In one aspect of the invention, the pressure plate chamber may have an inner rib positioned above the pressure plate shaft. The inner rib may form a truss such that its front end is connected to the front flange, and the inner rib descends rearward, with its rear end connected to the bottom. The outer lateral end of the inner rib may be connected to the inner surface of the lateral sidewall.

[0023] In one aspect of the invention, the thickness of the transverse sidewall portion may be less than the thickness of the rear wall portion.

[0024] In one aspect of the invention, the pressure plate chamber may have a plurality of parallel protrusions at the bottom.

[0025] In a pressure chamber according to one aspect of the present invention, with respect to the left-right separation distance of the transverse sidewall portions facing each other in the left-right direction, the separation distance at the rear longitudinal line position connected to the rear wall portion is equal to or less than the separation distance at the front longitudinal line position connected to the front flange portion.

[0026] One aspect of the present invention relates to a vacuum processing apparatus, which includes the pressure plate chamber described above.

[0027] One aspect of the present invention relates to a pressure chamber comprising: a pressure mechanism for rotating a substrate under reduced pressure between a horizontal position capable of being moved in and out and a vertical position adjacent to a vacuum processing section and capable of vacuum processing; a bottom; a rear wall portion erected upward from the rear end of the bottom and having a slit formed for moving the substrate in and out; transverse sidewall portions erected upward from the left and right ends of the bottom, the rear ends of the transverse sidewall portions being connected to the rear wall portion; a front flange portion erected upward from the front end of the bottom and connected to the front end of the transverse sidewall portions, and surrounding a processing opening that opens into the vacuum processing section; and a curved top portion connected to the upper ends of the front flange portion, the rear wall portion, and the transverse sidewall portions, respectively. The transverse sidewall portions are curved outward from the curved top portion to the bottom portion. Here, "curved outward" means bent or folded. This solves the aforementioned problem.

[0028] In the above structure, the pressure plate chamber has a transverse sidewall portion that bends outward. Therefore, it has sufficient strength to prevent excessive deformation when the pressure inside the chamber (pressure plate chamber) is reduced due to the pressure difference with the outside.

[0029] Furthermore, the transverse sidewall is connected to the front flange, rear wall, curved top, and bottom, respectively. Therefore, it possesses sufficient strength to withstand loads applied to the cavity due to the pressure difference with the outside when decompression is applied inside the cavity, without causing excessive deformation.

[0030] Here, the load caused by the internal and external pressure difference is applied to the chamber in a way that flattens the chamber. However, by having a transverse sidewall portion that bends outward, the load caused by this pressure difference can be withstood, thereby preventing deformation of the chamber. Similarly, since the transverse sidewall portion is connected to the front flange portion, the rear wall portion, and the curved top portion respectively, it can withstand the load caused by the internal and external pressure difference, thereby preventing deformation of the chamber.

[0031] Therefore, even by reducing the thickness of the chamber walls, sufficient strength can be maintained. Consequently, the chamber can be made lightweight.

[0032] Furthermore, since the necessary chamber strength can be maintained, there is no need to install the ribs that were previously provided on the outer surface of the chamber. Therefore, compared with conventional chambers, the absence of ribs enables weight reduction. At the same time, compared with conventional chambers, the space corresponding to the ribs allows for miniaturization of the chamber and saving of chamber space.

[0033] Here, the phrase "the transverse sidewall bends outward from the top to the bottom" means that in a vertical cross-section along the transverse direction, the transverse sidewall depicts a curve that bends outward. Furthermore, "the transverse sidewall bends outward" means that in a vertical cross-section along the transverse direction, compared to the straight line connecting the position of the transverse sidewall to the top and the position to the bottom, the transverse sidewall located at the midpoint between the top and bottom in the vertical direction is situated outside the chamber.

[0034] In particular, the line formed by the boundary where the transverse sidewall connects to the front flange can be drawn as a curve that curves outward. Similarly, the line formed by the boundary where the transverse sidewall connects to the rear wall can be drawn as a curve that curves outward.

[0035] Simultaneously, this refers to the fact that the longitudinal section of the transverse sidewall is depicted as a curve curving outwards along its entire length in the front-back direction. In this case, the curvature of the curve of the transverse sidewall can vary depending on its position in the front-back direction. That is, the curvature of the longitudinal section of the transverse sidewall can be distributed in the front-back direction.

[0036] Furthermore, the curvature of the transverse sidewall can be constant depending on its position in the front-to-back direction. That is, the curvature of the longitudinal section of the transverse sidewall can remain unchanged in the front-to-back direction.

[0037] Similarly, the phrase "the transverse sidewall bends outward from the top to the bottom" refers to the transverse sidewall being depicted as a zigzag line bending outward in a vertical cross-section along the transverse direction. The zigzag line is composed of straight lines connected in a zigzag manner.

[0038] In particular, the line formed by the boundary where the transverse sidewall connects to the front flange can be depicted as a zigzag line that bends outwards. Similarly, the line formed by the boundary where the transverse sidewall connects to the rear wall can be depicted as a zigzag line that bends outwards.

[0039] Furthermore, the case of infinitely increasing the bends in a broken line is equivalent to a curve. Here, curvature refers to the degree to which, in a horizontal vertical cross-section, the curvature lies outside the cavity at the midpoint between the top and bottom of the curve, compared to a straight line connecting the top and bottom of the curve.

[0040] Simultaneously, this refers to the transverse sidewall portion being depicted as a convex, outward-curving broken line along its entire length in the longitudinal direction. In this case, the interval between the intersection points of adjacent broken lines in the vertical direction of the longitudinal section of the transverse sidewall portion varies depending on its position in the longitudinal direction. That is, the interval between the intersection points of the broken lines in the vertical direction of the longitudinal section of the transverse sidewall portion is distributed in the longitudinal direction. Furthermore, the phrase "convexly curved" means that the broken lines of the longitudinal section of the transverse sidewall portion intersect at an angle of less than 180° at their intersection points, thus tilting inward towards the cavity interior.

[0041] Furthermore, the curvature of the broken line in the transverse sidewall can be constant depending on its position in the front-back direction. That is, the curvature of the longitudinal section of the transverse sidewall can remain unchanged in the front-back direction.

[0042] Furthermore, the term "vertical position in which the substrate is positioned close to the vacuum processing unit and able to perform vacuum processing" refers to the orientation of the surface to be processed along the vertical direction. This orientation means that the substrate is positioned opposite the vacuum processing unit, such as the cathode and the vapor deposition source. Alternatively, the term "vertical position in which the substrate is positioned close to the vacuum processing unit and able to perform vacuum processing" refers to the orientation of the surface to be processed along the vertical direction. This orientation means that when the surface to be processed is transported while maintaining its vertical orientation, the substrate is positioned opposite the vacuum processing unit, such as the cathode and the vapor deposition source. In this case, the pressure chamber can also serve as a loading and unloading chamber, or the pressure chamber can also serve as a transfer chamber.

[0043] In one aspect of the invention, the pressure chamber of the invention may have three surfaces: the curved top and the left and right transverse sidewalls, which may be curved surfaces that are bent in an outward convex manner.

[0044] In the above structure, the top of the curved section and the left and right transverse sidewalls are connected to the bottom, the front flange, and the rear wall. The front flange and the rear wall are generally flat. The transverse sidewalls curve outward from the top to the bottom. That is, in the vertical cross-section along the transverse direction, the transverse sidewalls depict a curve or a broken line that curves outward in a convex manner. The transverse sidewalls are curved outward. In the vertical cross-section along the transverse direction, compared to the positions of the transverse sidewalls connected to the top and bottom, the transverse sidewalls are located outside the chamber at a position midway between the top and bottom in the vertical direction.

[0045] Here, curved surfaces include curved surfaces with circular arc cross-sections and bent surfaces with polygonal cross-sections.

[0046] Similarly, the curved top bends outward from the front flange to the rear wall. In a vertical cross-section along the front-rear direction, the curved top depicts a curve that bends outward. That is, the curved top bends outward. In a vertical cross-section along the front-rear direction, compared to the straight line connecting the points of connection between the curved top and the front flange and the rear wall, the curved top is located outside the chamber at a position midway between the front flange and the rear wall in the front-rear direction.

[0047] Therefore, relative to the front flange, rear wall, and bottom, which are formed as approximately flat surfaces, the curved top and the left and right lateral sidewalls connected to the front flange, rear wall, and bottom are formed as three surfaces that curve outwards. This provides sufficient strength to withstand the load applied to the cavity due to the pressure difference with the outside during decompression within the cavity, without causing excessive deformation. Furthermore, these three surfaces—the curved top and the left and right lateral sidewalls—possess sufficient strength to withstand the load applied to the cavity due to the pressure difference with the outside during decompression within the cavity, without causing deformation.

[0048] Here, the load caused by the internal and external pressure difference is applied to the chamber by flattening it. However, by having three surfaces—a curved top that convex outwards and left and right lateral sidewalls—the chamber can withstand the load caused by this pressure difference, thereby preventing deformation. Similarly, since the curved top and left and right lateral sidewalls are connected to the front flange, rear wall, and bottom respectively, they can withstand the load caused by the internal and external pressure difference, thereby preventing deformation of the chamber.

[0049] Therefore, even by reducing the thickness of the chamber walls, sufficient strength can be maintained. Consequently, the chamber can be made lightweight.

[0050] Furthermore, since the necessary chamber strength can be maintained, the ribs that were previously provided on the outer surface of the chamber are no longer necessary. Therefore, compared to conventional chambers, the absence of ribs enables weight reduction. At the same time, compared to conventional chambers, the space corresponding to the ribs allows for miniaturization of the chamber and savings in chamber space.

[0051] Furthermore, the curvature of the top of the curve can remain constant depending on its position in the left-right direction. That is, the curvature of the longitudinal section of the top of the curve can remain unchanged in the left-right direction. The pressure plate chamber has a bilaterally symmetrical shape.

[0052] In one embodiment of the invention, the pressure plate chamber includes a pressure plate mechanism with a horizontally oriented axis. The transverse sidewall may have a through hole near the bottom and the front flange for the pressure plate shaft to pass through. The front connection point of the curved top, which connects to the front flange, may be higher than the rear connection point connecting to the rear wall. The curved top may bend outwardly along the circumference of the pressure plate shaft from the front connection point to the rear connection point.

[0053] In the above structure, the pressure plate shaft has an axis in the horizontal direction. The pressure plate shaft is located below the front flange in the vertical direction. The pressure plate shaft is close to the front flange. The pressure plate shaft is close to the bottom. A through hole for the pressure plate shaft to pass through is formed on the transverse sidewall portion near the bottom and the front flange. Thus, the base plate, supported by the pressure plate mechanism in a manner that allows it to rotate around the pressure plate shaft, rotates and moves between the horizontal and vertical positions, thereby changing its posture.

[0054] Because the top of the curve is bent outwards, the internal volume of the cavity can be set to the necessary minimum without hindering the rotation of the substrate inside the cavity.

[0055] Meanwhile, the through hole through which the pressure plate shaft passes is close to the front flange and the bottom, thereby maintaining strength. The through hole through which the pressure plate shaft passes is close to the front flange and the bottom, thereby suppressing deformation during decompression.

[0056] In one embodiment of the pressure chamber of the present invention, both the front flange and the rear wall can be substantially flat. The outward convex curvature of the transverse sidewall at the front longitudinal line position connected to the front flange can be smaller than the outward convex curvature at the rear longitudinal line position connected to the rear wall. Here, the rear longitudinal line position is a rear end boundary curve or a rear end boundary broken line. Conversely, the front longitudinal line position is a front end boundary curve or a front end boundary broken line.

[0057] In the above structure, the front flange and the rear wall are approximately flat plates that stand upright from the bottom in a generally vertical direction. The front boundary curve formed by the boundary where the lateral sidewall connects to the front flange curves outward. The rear boundary curve formed by the boundary where the lateral sidewall connects to the rear wall curves outward.

[0058] When comparing the front and rear boundary curves, the curvature of the front boundary curve of the transverse sidewall is smaller than that of the rear boundary curve. That is, the radius of curvature of the rear boundary curve is smaller than that of the front boundary curve. Additionally, the front flange can tilt backward at a slight angle as it moves from the bottom upwards towards the rear wall.

[0059] Furthermore, the front boundary line formed by the boundary where the transverse sidewall connects to the front flange is depicted as a convex outward bend. The rear boundary line formed by the boundary where the transverse sidewall connects to the rear wall is depicted as a convex outward bend.

[0060] When comparing the front and rear boundary lines, similar to the front and rear boundary curves, the curvature of the front boundary line of the transverse sidewall is smaller than that of the rear boundary line. That is, for the transverse sidewall, relative to the straight line connecting the top and bottom of the curve, in the left-right direction of the chamber at the midpoint between the top and bottom of the curve, the degree of outward protrusion of the transverse sidewall is greater at the front boundary line than at the rear boundary line.

[0061] That is, the angle at which the fold lines forming the transverse sidewalls tilt toward the inside of the chamber at the intersection of the fold lines is greater at the front boundary fold line than at the rear boundary fold line.

[0062] In this case, the front flange can also be tilted back at a slight angle as it moves from the bottom upwards away from the bottom and approaches the rear wall.

[0063] In one aspect of the invention, the pressure chamber can be composed of conical surfaces having apexes further rearward than the rear wall portion.

[0064] In the above structure, the front flange and the rear wall are approximately flat plates that stand upright from the bottom in a generally vertical direction. The front boundary curve formed by the boundary where the lateral sidewall connects to the front flange is a generally circular arc that curves outward. The rear boundary curve formed by the boundary where the lateral sidewall connects to the rear wall is a generally circular arc that curves outward.

[0065] The curvature of the front boundary curve of the transverse sidewall is smaller than that of the rear boundary curve. Furthermore, the pressure chamber has a bilaterally symmetrical shape. This allows it to withstand loads caused by the internal and external pressure difference, thus preventing chamber deformation. Sufficient strength is maintained even when the chamber wall thickness is reduced. Therefore, lightweight chamber design is possible. This also enables chamber miniaturization and space saving.

[0066] In this case, the transverse sidewalls can be easily formed by bending a plate according to its curvature.

[0067] In one aspect of the invention, the pressure chamber can be composed of a combination of planes along an imaginary triangular facet, which has a vertex at the rear of the rear wall.

[0068] In the above structure, the front boundary line formed by the boundary where the transverse sidewall connects to the front flange is depicted as a convex outward bend. The rear boundary line formed by the boundary where the transverse sidewall connects to the rear wall is depicted as a convex outward bend. The rear boundary line and the front boundary line are similar in shape. Furthermore, even when the front flange is tilted backward at a slight angle as it moves from the bottom upward toward the rear wall, the rear boundary line and the front boundary line are still approximately similar in shape.

[0069] The curvature of the front boundary polygon of the transverse sidewall is smaller than that of the rear boundary polygon. Furthermore, the pressure plate chamber has a bilaterally symmetrical shape. This allows it to withstand loads caused by internal and external pressure differences, thus preventing chamber deformation. Even with reduced chamber wall thickness, sufficient strength is maintained. Therefore, chamber weight reduction is possible. This also enables chamber miniaturization and space saving.

[0070] In this case, the transverse sidewall can be formed by bending a sheet of material along a fold line.

[0071] In one aspect of the invention, the pressure plate chamber may have an inner rib positioned above the pressure plate shaft. The inner rib may form a truss such that its front end is connected to the front flange, and the inner rib descends rearward, with its rear end connected to the bottom. The outer lateral end of the inner rib may be connected to the inner surface of the lateral sidewall.

[0072] In the above structure, the inner rib is a flat plate. The inner lateral end of the inner rib is a straight line. The entire length of the outer lateral end of the inner rib connects to the inner surface of the lateral sidewall. The inner rib may not be inclined in the circumferential direction. The inner rib is inclined in a backward downward manner. On the front side of the pressure plate axis, the inner rib is positioned above the pressure plate axis. The rear end of the inner rib is positioned below the pressure plate axis. The plate surface of the inner rib is parallel to the axis of the pressure plate axis and is in a torsional position.

[0073] The inner rib, front flange, and bottom surround the pressure plate shaft. When viewed from the left and right, the inner rib, front flange, and bottom form a triangle including the pressure plate shaft.

[0074] The front end of the inner rib connects to the front flange located inside the transverse sidewall. The rear end of the inner rib connects to the bottom located inside the transverse sidewall.

[0075] The inner ribs, front flange, and bottom form a truss structure near the point where the pressure plate shaft passes through. This allows it to withstand loads caused by the pressure difference between the inside and outside, thus preventing chamber deformation in the area near the pressure plate shaft's penetration point. Even with reduced chamber wall thickness, sufficient strength is maintained in the area near the pressure plate shaft's penetration point. Therefore, chamber weight reduction is possible. Chamber miniaturization and space saving are also possible. Furthermore, it does not impede the rotational movement of the pressure plate shaft.

[0076] In one aspect of the invention, the thickness of the transverse sidewall portion may be less than the thickness of the rear wall portion.

[0077] In the above structure, the plate thickness of the transverse sidewall is less than that of the front flange. The plate thickness of the transverse sidewall is less than that of the rear wall. The plate thickness of the curved top is less than that of the front flange. The plate thickness of the curved top is less than that of the rear wall. The plate thickness of the curved top is less than that of the transverse sidewall.

[0078] The rear wall has a slit with a valve to allow horizontally positioned substrates perpendicular to the rear wall to be moved in and out. The front flange can support vertically positioned substrates in a manner opposite to the vacuum processing unit.

[0079] That is, the following relationship must be satisfied regarding the thickness of the rear wall, the front flange, the transverse side wall, and the curved top.

[0080] Rear wall section ≥ Front flange section > Lateral side wall section ≥ Curved top.

[0081] In other words, even if the rear wall and front flange, which are flat plates, are set to have a thickness that resists deformation, the thickness of the convex lateral sidewalls and curved top can be set to be smaller than that of the rear wall and front flange. The convex lateral sidewalls and curved top have the necessary resistance to deformation. As a result, they can withstand the load caused by the internal and external pressure difference, thereby preventing deformation of the chamber. Lightweight design is achieved. At the same time, compared with conventional chambers, miniaturization of the chamber and saving chamber space are possible.

[0082] In addition, the thickness of each plate is the average value or the value of the part with the largest area in its respective structure.

[0083] In one aspect of the invention, the pressure plate chamber may have a plurality of parallel protrusions at the bottom. Here, "protrusions" are, for example, sheet piles. Additionally, "a plurality of parallel protrusions" are, for example, a plurality of protrusions extending in a left-right direction.

[0084] In the above structure, the bottom has an uneven surface formed by zigzag lines extending in the left-right direction. The bottom has multiple protrusions extending in the left-right direction. The vertical dimensions of these protrusions are identical. The front-back dimensions of these protrusions are identical. The horizontal dimensions of these protrusions remain unchanged. The bottom has a so-called sheet pile structure.

[0085] Therefore, the chamber possesses sufficient strength to withstand the loads exerted on it due to the pressure difference with the outside during decompression within the chamber, without causing excessive deformation. Multiple protrusions at the bottom can withstand the loads caused by this pressure difference, thus preventing chamber deformation. Similarly, multiple protrusions at the bottom can withstand the loads caused by the pressure difference between the inside and outside, thus preventing chamber deformation.

[0086] In one aspect of the present invention, the pressure plate chamber, with respect to the left-right separation distance of the transverse sidewall portions facing each other in the left-right direction, has a separation distance at the rear longitudinal line position connected to the rear wall portion that is equal to or less than the separation distance at the front longitudinal line position connected to the front flange portion.

[0087] In the above structure, the rear wall portion moves the horizontally positioned substrate in and out in a forward-backward direction perpendicular to the rear wall portion. The rear wall portion has a slit with a valve. The front flange portion supports the vertically positioned substrate in a manner opposite to the vacuum processing unit. At this time, the opening of the front flange portion is configured to have space allowance for arranging a mask around the substrate. Alternatively, the opening of the front flange portion is configured to have space allowance for the substrate and the vacuum processing unit to swing relative to each other in the left-right direction. The pressure chamber has a trapezoidal shape when viewed from above. The pressure chamber has a trapezoidal shape with the rear wall portion as the short side and the front flange portion as the long side when viewed from above.

[0088] Therefore, the chamber possesses sufficient strength to withstand the loads exerted on it due to the pressure difference with the outside during decompression within the chamber, without causing excessive deformation. Its trapezoidal shape in top view allows it to withstand the loads caused by this pressure difference, thus preventing chamber deformation. Similarly, its trapezoidal shape in top view allows it to withstand the loads caused by the internal and external pressure differences, thus preventing chamber deformation. The internal space of the pressure plate chamber can be set to the necessary minimum, thereby achieving space savings.

[0089] One aspect of the present invention relates to a vacuum processing apparatus, which includes the pressure plate chamber described above.

[0090] In the above structure, the vacuum processing device possesses sufficient strength to prevent excessive deformation from being caused by the load applied to it due to the pressure difference with the outside during depressurization. It can withstand the load caused by this pressure difference, thereby preventing deformation of the vacuum processing device. Similarly, it can withstand the load caused by the internal and external pressure differences, thereby preventing deformation of the vacuum processing device. The internal space of the vacuum processing device can be set to the necessary minimum, achieving space saving.

[0091] According to the present invention, it is possible to provide a pressure chamber and a vacuum processing device that can reduce the weight of the pressure chamber that changes the orientation of the substrate between the longitudinal and transverse directions, maintain the necessary pressure chamber strength, easily maintain a seal, and reduce particle generation. Attached Figure Description

[0092] Figure 1 This is a schematic diagram illustrating the vacuum processing apparatus according to the first embodiment of the present invention.

[0093] Figure 2 This is a perspective view showing the pressure plate chamber of the vacuum processing apparatus constituting the first embodiment of the present invention.

[0094] Figure 3 This is a partial perspective perspective view of the pressure plate chamber of the vacuum processing apparatus constituting the first embodiment of the present invention.

[0095] Figure 4 This is a perspective view showing the pressure plate chamber of the vacuum processing apparatus constituting the first embodiment of the present invention.

[0096] Figure 5 This is a perspective view showing the pressure plate chamber of the vacuum processing apparatus constituting the first embodiment of the present invention.

[0097] Figure 6 This is a top view showing the pressure plate chamber of the vacuum processing apparatus constituting the first embodiment of the present invention.

[0098] Figure 7 This is a bottom view showing the pressure plate chamber of the vacuum processing apparatus constituting the first embodiment of the present invention.

[0099] Figure 8 This is a right view showing the pressure plate chamber of the vacuum processing apparatus constituting the first embodiment of the present invention.

[0100] Figure 9 This is a left view showing the pressure chamber of the vacuum processing apparatus constituting the first embodiment of the present invention.

[0101] Figure 10 This is a rear view showing the pressure plate chamber of the vacuum processing apparatus constituting the first embodiment of the present invention.

[0102] Figure 11 This is a front view showing the pressure plate chamber that constitutes the vacuum processing apparatus according to the first embodiment of the present invention.

[0103] Figure 12 This is a perspective view showing the pressure plate chamber of the vacuum processing apparatus according to the second embodiment of the present invention.

[0104] Figure 13 This is a rear view showing the pressure plate chamber of the vacuum processing apparatus according to the second embodiment of the present invention.

[0105] Figure 14 This is a left view showing the pressure plate chamber of the vacuum processing apparatus constituting the second embodiment of the present invention.

[0106] Figure 15 This is an explanatory diagram showing the right transverse sidewall portion of the vacuum processing apparatus according to the second embodiment of the present invention. Detailed Implementation

[0107] Hereinafter, the vacuum processing apparatus and pressure plate chamber according to the first embodiment of the present invention will be described with reference to the accompanying drawings.

[0108] Furthermore, this embodiment is specifically described in order to better understand the spirit of the invention, and unless otherwise specified, the invention is not limited.

[0109] In this embodiment, an XYZ orthogonal coordinate system is used to describe the positional relationships of the various structures. The direction of gravity, which is parallel to the vertical direction, is called the Z-direction. Within the Z-direction, the direction aligned with the direction of gravity is called the downward direction (below), and the direction opposite to the direction of gravity is called the upward direction (above). In the following description, "viewing from above" refers to observing the object from the direction of gravity or the downward direction. The direction of transporting the glass substrate is called the front-back direction or X-direction in the horizontal direction. The direction orthogonal to the Z-direction and X-direction is called the left-right direction or Y-direction.

[0110] Vacuum Processing Equipment

[0111] Figure 1 This is a schematic side view showing the vacuum processing apparatus in this embodiment. In the figure, reference numeral 1 indicates the vacuum processing apparatus.

[0112] In the following description, the vacuum processing apparatus 1 involved in this embodiment is, for example, a sputtering apparatus for performing film formation processing in a vacuum process.

[0113] The vacuum processing apparatus 1 described in this embodiment is used, for example, in the manufacturing process of flat panel displays (FPDs). The vacuum processing apparatus 1 performs vacuum processing on a single substrate GS made of glass or resin under a vacuum atmosphere. The vacuum processing apparatus 1 is suitable for reciprocating sputtering apparatuses that perform vacuum processing such as heat treatment, film formation, and etching, or for vapor deposition apparatuses used to manufacture organic electroluminescence (EL). In other words, in the vacuum processing apparatus 1, the surface treatment is a film formation process, i.e., sputtering. The vacuum processing apparatus 1 is a substrate processing apparatus.

[0114] like Figure 1 As shown, the vacuum processing apparatus 1 includes a loading and unloading chamber 2, a transfer chamber 3, and a vacuum processing chamber 4. The vacuum processing apparatus 1 may have multiple vacuum processing chambers 4. The loading and unloading chamber 2, the transfer chamber 3, and the vacuum processing chamber 4 are interconnected. Each of the loading and unloading chamber 2, the transfer chamber 3, and the vacuum processing chamber 4 is composed of a chamber. The vacuum processing chamber 4 is, for example, a film-forming chamber.

[0115] Multiple chambers constituting the loading and unloading chamber 2 and the vacuum processing chamber 4 may be arranged around the transfer chamber 3. Each of the multiple chambers may be, for example, two loading and unloading chambers 2 and multiple vacuum processing chambers 4 formed adjacent to each other.

[0116] A partition valve is provided on each of the portions between the loading and unloading chamber 2 and the transfer chamber 3, between the vacuum processing chamber 4 and the transfer chamber 3, and between the film forming chamber 4 and the transfer chamber 3.

[0117] In addition, the vacuum processing apparatus 1 has a control device (not shown) for controlling the vacuum processing apparatus 1. The control device controls the operations in the film-forming chamber 4, the transfer chamber 3, and the loading and unloading chamber 2.

[0118] <Loading and Unloading Room>

[0119] Loading and unloading chamber 2 loads / unloads horizontally positioned glass substrates GS with the surface to be processed. Loading and unloading chamber 2 loads / unloads approximately rectangular glass substrates (substrates to be processed) GS.

[0120] In the case where the vacuum processing apparatus 1 has two loading and unloading chambers 2, one loading and unloading chamber 2 functions as a loading chamber for moving the glass substrate GS from the outside to the inside of the vacuum processing apparatus 1. The other loading and unloading chamber 2 functions as an unloading chamber for moving the glass substrate GS from the inside to the outside of the vacuum processing apparatus 1.

[0121] <Transmission Chamber>

[0122] A transfer chamber 3 is arranged between a vacuum processing chamber 4 and a loading and unloading chamber 2. The transfer chamber 3 connects the vacuum processing chamber 4 and the loading and unloading chamber 2. The transfer chamber 3 is capable of transporting the glass substrate GS between the vacuum processing chamber 4 and the loading and unloading chamber 2. The transfer chamber 3 is capable of transporting glass substrates GS with the processed surface horizontally positioned.

[0123] The transfer chamber 3 includes a transport device 3a disposed inside the transfer chamber 3. The transport device 3a is, for example, a transport robot.

[0124] The handling device 3a includes a rotating shaft, a drive source for rotating the rotating shaft, a robotic arm mounted on the rotating shaft, a manipulator formed on a part of the robotic arm, and a vertical movement mechanism. The robotic arm includes intersecting first and second moving tracks, a first base capable of moving the second moving track relative to the first moving track, and a second base capable of moving the manipulator relative to the second moving track. The handling device 3a enables the glass substrate GS, which is the object being handled, to move between chambers 2, 3, and 4. Alternatively, the robotic arm may be composed of a first active arm, a second active arm, a first driven arm, and a second driven arm that are mutually flexible.

[0125] <Vacuum Processing Chamber>

[0126] Vacuum processing chamber 4 performs vacuum processing on the surface of the glass substrate GS to be processed. In multiple vacuum processing chambers 4, the same film deposition process can be performed separately, or different film deposition processes can be performed.

[0127] For example, vacuum processing chamber 4 performs sputtering treatment on the surface of the glass substrate GS to be processed. Vacuum processing chamber 4 forms a coating, such as a ZnO-based or In2O3-based transparent conductive film, on the surface of the glass substrate GS to be processed by sputtering. In this case, vacuum processing chamber 4 is a film-forming chamber. Sputtering treatment is performed in vacuum processing chamber 4 under reduced pressure.

[0128] The vacuum processing apparatus 1 involved in this embodiment is a side sputtering type in the figure. That is, the vacuum processing chamber 4 performs sputtering processing on the glass substrate GS whose surface to be processed is approximately along the longitudinal position of the Z direction.

[0129] Vacuum processing chamber 4 includes a plasma chamber 4m and a pressure plate chamber 4n. The pressure plate chamber 4n changes the orientation of the glass substrate GS, which is transported horizontally, to vertical. The plasma chamber 4m performs vacuum processing such as film formation on the vertically positioned glass substrate GS.

[0130] <Plasma Chamber>

[0131] In the plasma chamber 4m, a film deposition process is performed on the glass substrate GS. That is, the plasma chamber 4m is part of the vacuum processing chamber 4. The plasma chamber 4m includes a power supply 4p, a gas atmosphere setting mechanism 4g, and a cathode unit 5 (vacuum processing section).

[0132] The power supply 4p, the gas atmosphere setting mechanism 4g, and the cathode unit 5 perform film deposition on the glass substrate GS. The power supply 4p, the gas atmosphere setting mechanism 4g, and the cathode unit 5 are an example of a vacuum processing unit. Furthermore, the vacuum processing unit can be referred to as a substrate processing mechanism or a film deposition source. In the case where the vacuum processing apparatus 1 is a vapor deposition apparatus, the vacuum processing unit is a vapor deposition source.

[0133] The power supply 4p is connected to the backplate 6 of the cathode unit 5. The power supply 4p applies a negative potential sputtering voltage to the backplate 6.

[0134] The gas atmosphere setting mechanism 4g is configured to set the gas atmosphere inside the vacuum processing chamber 4.

[0135] The gas atmosphere setting mechanism 4g includes a gas inlet for introducing process gas into the plasma chamber 4m and a high-vacuum exhaust section for depressurizing (evacuating) the internal space of the plasma chamber 4m. The gas inlet is connected to a gas supply source. The gas inlet is, for example, a mass flow controller that adjusts the flow rate of the process gas supplied from the gas supply source. The high-vacuum exhaust section is, for example, a turbomolecular pump.

[0136] The cathode unit 5 has a target 7 and a backplate 6. The target 7 and the backplate 6 are disposed inside the plasma chamber 4m.

[0137] The cathode unit 5 is erected inside the plasma chamber, which is 4m in size.

[0138] The cathode unit 5 has a target 7 and a back plate 6 for holding the target 7.

[0139] The backplate 6 functions as the cathode electrode. The backplate 6 is erected inside the plasma chamber 4m, at the position furthest from the transmission chamber 3.

[0140] On the front side of the backplate 6, a target 7 is fixed, which faces the glass substrate GS approximately parallel to it during processing. The backplate 6 is an electrode used to apply a negative potential sputtering voltage to the target 7.

[0141] On the rear side of the backplate 6, a magnetron magnetic circuit for forming a predetermined magnetic field on the target 7 is provided. The magnetron magnetic circuit is mounted on a swing mechanism. The swing mechanism has a drive device for swinging the magnetron magnetic circuit. The drive device of the swing mechanism is configured to swing the magnetron magnetic circuit.

[0142] The plasma chamber 4m has an opening 4b that opens into the pressure plate chamber 4n and a connecting flange 4c surrounding the opening 4b. The connecting flange 4c is the part that connects to the connecting flange 13 of the pressure plate chamber 4n.

[0143] <Pressure Plate Chamber>

[0144] The pressure chamber 4n is adjacent to the plasma chamber 4m in the X direction. The pressure chamber 4n has a processing opening 4d that opens into the plasma chamber 4m and a connecting flange 13 (front flange) surrounding the processing opening 4d. The connecting flange 13 is the part that connects to the connecting flange 4c of the plasma chamber 4m.

[0145] Connecting flange 4c and connecting flange portion 13 are connected in a mutually opposing manner. Through the connection of connecting flange 4c and connecting flange portion 13, plasma chamber 4m and pressure plate chamber 4n are assembled to form vacuum processing chamber 4. Furthermore, through the connection of connecting flange 4c and connecting flange portion 13, opening portion 4b and processing opening portion 4d communicate with each other. Thus, an internal space 4e is formed between plasma chamber 4m and pressure plate chamber 4n. Through the connection of connecting flange 4c and connecting flange portion 13, internal space 4e is sealed.

[0146] Within the sealed structure of the internal space 4e, an O-ring is disposed on one of the connecting flange 4c and the connecting flange portion 13, and a sealing surface is formed on the other of the connecting flange 4c and the connecting flange portion 13. The surfaces on which the connecting flange 4c and the connecting flange portion 13 connect are mating surfaces. The mating surface is an example of the boundary position between the processing chamber and the back chamber.

[0147] Furthermore, in this embodiment, the shape of the mating surface is approximately planar. However, the shape of the mating surface is not limited to a planar shape. It can also be determined based on the shapes of the connecting flange 4c and the connecting flange portion 13.

[0148] Alternatively, the mating surface can be located away from the pressure chamber 4n in the X direction from the target 7 and the back plate 6. In this case, the target 7 and the back plate 6 protrude from the connecting flange 4c toward the pressure chamber 4n. Alternatively, the mating surface can be located near the conveying port 4a in the X direction from the target 7 and the back plate 6.

[0149] like Figure 1 As shown, the internal space 4e has a front space 4e1 and a rear space 4e2. The front space 4e1 and the rear space 4e2 are arranged adjacent to each other in the X direction.

[0150] The front space 4e1 is the space facing the surface exposed during film deposition of the glass substrate GS. The front space 4e1 can be formed by a combination of the internal space of the plasma chamber 4m and the internal space of the pressure plate chamber 4n. A back plate 6, on which the target 7 is fixed, is disposed in the front space 4e1.

[0151] The rear space 4e2 is the main internal space of the pressure chamber 4n. The rear space 4e2 is the space facing the back side of the glass substrate GS during film deposition. The pressure chamber 4n is a back chamber located on the back side of the substrate being processed, relative to the film deposition chamber. A pressure mechanism 4h is arranged in the rear space 4e2. The pressure mechanism 4h can be referred to as a rotary support mechanism.

[0152] The front space 4e1 and the rear space 4e2 form the internal space 4e of the vacuum processing chamber 4 in a sealed state, which is assembled from the plasma chamber 4m and the pressure plate chamber 4n.

[0153] A mask 4j is disposed at the boundary position 4d (processing opening) between the front space 4e1 and the rear space 4e2.

[0154] The pressure chamber 4n has a transport port 4a. The transport port 4a is an opening through which the glass substrate GS passes when transported in the X direction. The transport port 4a is located between the transfer chamber 3 and the vacuum processing chamber 4. The pressure chamber 4n is adjacent to the transfer chamber 3 through the transport port 4a. A separation valve is provided on the transport port 4a. By opening and closing the separation valve, the state in which the pressure chamber 4n is connected to the transfer chamber 3 and the state in which the pressure chamber 4n is isolated from the transfer chamber 3 are switched.

[0155] The pressure chamber 4n has a pressure mechanism 4h.

[0156] The pressure plate mechanism 4h supports the glass substrate GS, which is brought in from the transport port 4a, in a horizontal position. While supporting the glass substrate GS, the pressure plate mechanism 4h rotates the glass substrate GS. During the film deposition process in the plasma chamber 4m, the pressure plate mechanism 4h supports the glass substrate GS in a vertical position. The pressure plate mechanism 4h changes the orientation of the glass substrate GS between the horizontal and vertical positions.

[0157] Furthermore, the plasma chamber 4m and the pressure plate chamber 4n can be separated from each other in the X direction. With the plasma chamber 4m and the pressure plate chamber 4n separated, the mask 4j can be disposed inside the pressure plate chamber 4n. Simultaneously, the target 7 and the backplate 6 can be disposed inside the plasma chamber 4m.

[0158] <mask>

[0159] Mask 4j is disposed inside pressure chamber 4n. In the X direction, mask 4j is closer to the transport port 4a than the connecting flange 13. Mask 4j is disposed between the glass substrate GS and the cathode unit 5 in the film-forming upright position (vertical position). Mask 4j is erected opposite the plasma chamber 4m.

[0160] Mask 4j has a generally rectangular mask frame. Mask 4j may have multiple ribs stretched along the mask frame in a longitudinal and lateral manner. The multiple ribs define the internal area of ​​the mask frame.

[0161] The mask frame is formed of a rigid metal such as SUS. The ribs are formed of metal foil such as Invar. The ribs are fixed to the mask frame while their ends are stretched at both ends. The area surrounded by multiple ribs stretched longitudinally and laterally on the inner side of the mask frame is the film-forming area.

[0162] The mask 4j has a film-forming opening in its central portion. The film-forming opening is an opening formed by the mask frame. The film-forming opening is located at the boundary between the front space 4e1 and the rear space 4e2.

[0163] The mask 4j has a mask support. The mask support is provided at both ends of the mask frame in the Z direction and at both ends of the mask frame in the Y direction. The mask 4j is supported by the mask support in the pressure chamber 4n or the plasma chamber 4m. At this time, the position of the mask 4j can be aligned in the pre-film deposition process through the mask alignment part (not shown).

[0164] <Pressure Plate Mechanism>

[0165] The pressure plate mechanism 4h has a pressure plate shaft 4h1 (rotation shaft), a substrate holding part 4h2, and a lifting pin 4f.

[0166] The pressure plate mechanism 4h is located below the rear space 4e2 inside the pressure plate chamber 4n.

[0167] The pressure plate shaft 4h1 extends in the Y direction. The pressure plate shaft 4h1 is substantially parallel to at least one of the conveying port 4a and the connecting flange portion 13.

[0168] The pressure plate shaft 4h1 can rotate around the rotation center along the Y direction.

[0169] A rotary drive unit 4h11 is connected to the pressure plate shaft 4h1. The rotary drive unit 4h11 enables the pressure plate shaft 4h1 to rotate around the rotation center. The rotary drive unit 4h11 has a rotary drive source such as an electric motor and a rotary transmission unit such as a reducer that transmits the driving force of the rotary drive source to the pressure plate shaft 4h1.

[0170] As described below, the pressure plate shaft 4h1 extends through to form the side wall of the pressure plate chamber 4n. The pressure plate shaft 4h1 also extends through to form the side wall of the rear space 4e2 of the pressure plate chamber 4n. The position where the pressure plate shaft 4h1 extends through the side wall of the pressure plate chamber 4n is near the connecting flange 13. The position where the pressure plate shaft 4h1 extends through the side wall of the pressure plate chamber 4n is separate from the connecting flange 13. The rotary drive unit 4h11 is disposed outside the vacuum processing chamber 4. The rotary drive unit 4h11 can be connected to both ends of the pressure plate shaft 4h1 in the Y direction.

[0171] The substrate holding portion 4h2 is mounted on the pressure plate shaft 4h1 via the fixing portion 4h3. The substrate holding portion 4h2 is, for example, a pressure plate. When the substrate holding portion 4h2 is in the horizontal transport position (horizontal position), the outline shape of the substrate holding portion 4h2 is approximately rectangular flat plate when viewed from the Z direction. The substrate holding portion 4h2 can rotate around the rotation center of the pressure plate shaft 4h1 between the horizontal transport position and the film-forming upright position.

[0172] The substrate holding part 4h2 can support the back side of the glass substrate GS within the pressure chamber 4n. The pressure mechanism 4h can rotate the glass substrate GS between a horizontal transport position and a film-forming upright position while supporting the glass substrate GS through the substrate holding part 4h2.

[0173] When the glass substrate GS moves horizontally through the transport port 4a, the substrate holding part 4h2 is located in a horizontal transport position. In this case, the outline of the substrate holding part 4h2 is a rectangle along the X and Y directions. The substrate holding part 4h2, located in the horizontal transport position, supports the horizontally positioned glass substrate GS.

[0174] When the substrate holding part 4h2 is positioned in the horizontal transport position, the platen mechanism 4h can move the glass substrate GS from the transport port 4a into the film deposition chamber 4. When the substrate holding part 4h2 is positioned in the horizontal transport position, the platen mechanism 4h can also move the glass substrate GS from the transport port 4a out of the film deposition chamber 4. That is, in the horizontal transport position, the platen mechanism 4h can maintain the support state of the glass substrate GS and can release the support state of the glass substrate GS.

[0175] When the substrate holding part 4h2 is positioned in the film-forming upright position, the pressure plate mechanism 4h supports the glass substrate GS in a vertical position. The substrate holding part 4h2 supports the glass substrate GS in the film-forming upright position in a manner opposite to the mask 4j.

[0176] In this state, the pressure plate mechanism 4h maintains the glass substrate GS (supports it) so that the glass substrate GS is aligned with the target 7 during film formation. In this state, film formation is performed on the glass substrate GS.

[0177] The pressure plate mechanism 4h has a lifting pin 4f and a lifting pin moving device 4f1 for moving the lifting pin 4f up and down. The lifting pin 4f is provided on the substrate holding portion 4h2. The lifting pin 4f is a pin extending in the vertical direction. A plurality of lifting pins 4f are arranged at approximately equal intervals along the upper surface of the substrate holding portion 4h2. When the glass substrate GS is moved into the vacuum processing chamber 4, or when the glass substrate GS is moved out of the vacuum processing chamber 4, the lifting pin 4f protrudes upward from the substrate holding portion 4h2, which is arranged in a horizontal transport position. The lifting pin 4f protruding upward from the substrate holding portion 4h2 supports the glass substrate GS, which is located above the substrate holding portion 4h2.

[0178] In the raised position, the front end of the lifting pin 4f is positioned above the surface of the substrate holding portion 4h2. In the raised position, and above the substrate holding portion 4h2 in the horizontal transport position, the front end of the lifting pin 4f abuts against and supports the back of the glass substrate GS.

[0179] The lifting pin 4f moves vertically downward from the rising position to the falling position via the lifting pin moving device 4f1.

[0180] In the lowered position, the tip of the lifting pin 4f is positioned below the surface of the substrate holding part 4h2. The lifting pin 4f is positioned in the lowered position so as not to interfere with the rotational movement of the substrate holding part 4h2. In the lowered position, the lifting pin 4f places the glass substrate GS onto the substrate holding part 4h2.

[0181] In addition, the lifting pin 4f can be provided on the substrate holding part 4h2 or at the bottom of the pressure plate chamber 4n.

[0182] The lifting pin moving device 4f1 is a drive device such as a drive motor disposed outside the vacuum processing chamber 4. The lifting pin moving device 4f1 has a structure that extends or retracts the lifting pin 4f by means of a drive device. The lifting pin 4f can be driven by the drive device while the vacuum processing chamber 4 is kept sealed. According to this structure, when the glass substrate GS is moved into or out of the film forming chamber 4, the glass substrate GS can be freely transferred between the substrate holding part 4h2 and the robot arm of the transport device 3a.

[0183] When the substrate holding part 4h2 is positioned in a horizontal transport position, the pressure plate mechanism 4h can receive and deliver the glass substrate GS via the lifting pin 4f.

[0184] <Pressure plate chamber outer shell>

[0185] The pressure plate chamber 4n has a pressure-resistant chamber wall as its outer shell.

[0186] The chamber wall of the pressure chamber 4n will be described below as the pressure chamber 10.

[0187] Figure 2 This is a perspective view of the pressure plate chamber of this embodiment, viewed from the upper right rear. Figure 3 This is a perspective view of the pressure plate chamber of this embodiment, viewed from the upper right rear. Figure 4 This is a perspective view of the pressure plate chamber of this embodiment, viewed from the upper right front. Figure 5 This is a perspective view of the pressure plate chamber of this embodiment, viewed from the lower right front. Figure 6 This is a top view of the pressure plate chamber in this embodiment. Figure 7 This is a bottom view of the pressure plate chamber in this embodiment. Figure 8 This is a right view of the pressure plate chamber in this embodiment. Figure 9 This is a left view of the pressure plate chamber in this embodiment. Figure 10 This is a rear view of the pressure plate chamber in this embodiment. Figure 11 This is a front view of the pressure plate chamber in this embodiment.

[0188] like Figures 2 to 11 As shown, the pressure chamber 10 has a bottom 11, a rear wall 12, a front flange 13 (connecting flange), a right transverse side wall 14 (transverse side wall), a left transverse side wall 15 (transverse side wall), and a curved top 16.

[0189] The three surfaces of the pressure plate chamber 10—the curved top 16, the right transverse side wall 14, and the left transverse side wall 15—are all curved surfaces that curve outwards.

[0190] The bottom 11 extends along a generally horizontal plane. The bottom 11 covers the lower surface of the pressure plate chamber 10.

[0191] The rear wall portion 12 extends vertically upward from the rear end of the bottom 11. The rear wall portion 12 is planar in both the Z and Y directions. The rear wall portion 12 is generally flat. A transport port 4a is formed in the rear wall portion 12 for loading and unloading the glass substrate GS. The transport port 4a is a slit whose dimension in the Y direction is longer than its dimension in the Z direction. The transport port 4a is formed in the center of the rear wall portion 12 in the Y direction. The transport port 4a has a generally rectangular outline when viewed from the X direction.

[0192] The rear wall portion 12 has a rear inner lower transverse rib 72s1 and a rear inner upper transverse rib 72s2. Both the rear inner lower transverse rib 72s1 and the rear inner upper transverse rib 72s2 are disposed on the front surface 12b. The rear inner lower transverse rib 72s1 and the rear inner upper transverse rib 72s2 are disposed along the Y direction. The rear inner lower transverse rib 72s1 and the rear inner upper transverse rib 72s2 are disposed near the transport port 4a. The rear inner lower transverse rib 72s1 and the rear inner upper transverse rib 72s2 are disposed along the transport port 4a. The rear inner lower transverse rib 72s1 is disposed below the transport port 4a. The rear inner upper transverse rib 72s2 is disposed above the transport port 4a.

[0193] The right transverse sidewall portion 14 and the left transverse sidewall portion 15 are transverse sidewall portions.

[0194] The right transverse sidewall portion 14 rises vertically upwards in the Z direction from the right end of the bottom 11 in the Y direction. The front end of the right transverse sidewall portion 14 in the X direction connects to the front flange portion 13. The rear end of the right transverse sidewall portion 14 in the X direction connects to the rear wall portion 12. The upper end of the right transverse sidewall portion 14 in the Z direction connects to the curved top 16. The lower end of the right transverse sidewall portion 14 in the Z direction connects to the bottom 11.

[0195] The left transverse sidewall portion 15 rises vertically upwards in the Z direction from the left end of the bottom 11 in the Y direction. The front end of the left transverse sidewall portion 15 in the X direction is connected to the front flange portion 13. The rear end of the left transverse sidewall portion 15 in the X direction is connected to the rear wall portion 12. The upper end of the left transverse sidewall portion 15 in the Z direction is connected to the curved top 16. The lower end of the left transverse sidewall portion 15 in the Z direction is connected to the bottom 11.

[0196] The right transverse sidewall portion 14 and the left transverse sidewall portion 15 are symmetrical in shape in the Y direction. The shapes of the right transverse sidewall portion 14 and the left transverse sidewall portion 15 will be described later.

[0197] The front flange portion (connecting flange portion) 13 stands upright in the Z direction from the front end of the bottom 11 in the X direction. The front flange portion 13 has a planar shape along the Z and Y directions. The front flange portion 13 is generally flat.

[0198] The front flange portion 13 has a processing opening 4d that opens toward the vacuum processing unit 5. The front flange portion 13 surrounds the entire circumference of the rectangular processing opening 4d. The front flange portion 13 is frame-shaped.

[0199] The front flange portion 13, when viewed from the front, has a profile shape larger than that formed by the right transverse sidewall portion 14, the left transverse sidewall portion 15, and the curved top 16. The rear side (i.e., the rear side in the X direction) of the front flange portion 13 is connected to the right transverse sidewall portion 14, the left transverse sidewall portion 15, and the curved top 16.

[0200] The front flange portion 13 and the rear wall portion 12 are generally parallel to each other. In addition, the upper end of the front flange portion 13 may be closer to the rear wall portion 12 in the X direction than the lower end.

[0201] The upper end of the front flange 13 is positioned higher than the upper end of the rear wall 12.

[0202] The front end of the curved top 16 in the X direction is connected to the front flange portion 13. The rear end of the curved top 16 in the X direction is connected to the rear wall portion 12. The right end of the curved top 16 in the Y direction is connected to the right transverse side wall portion 14. The left end of the curved top 16 in the Y direction is connected to the left transverse side wall portion 15.

[0203] The curved top 16 is a curved surface that curves outward from the front flange portion 13 to the rear wall portion 12. The height of the curved top 16 is constant in the Y direction. The height of the curved top 16 varies slowly in the X direction. That is, the curved top 16 has a local surface similar to the cylindrical surface surrounding the central axis of the pressure plate shaft 4h1.

[0204] The curved top 16 connects to the front flange 13 at the transverse straight line B36 at the upper front boundary. The transverse straight line B36 at the upper front boundary is the connection point between the curved top 16 and the front flange 13. The transverse straight line B36 at the upper front boundary is a straight line along the Y direction.

[0205] The curved top 16 connects to the rear wall portion 12 at the transverse straight line B26 of the upper rear boundary. The transverse straight line B26 of the upper rear boundary is the connection point between the curved top 16 and the rear wall portion 12. The transverse straight line B26 of the upper rear boundary is a straight line along the Y direction.

[0206] The horizontal straight line B26 of the rear upper boundary is lower in the Z direction than the horizontal straight line B36 of the front upper boundary. The front connection position where the curved top 16 connects to the front flange 13 is higher than the rear connection position where it connects to the rear wall 12.

[0207] The curved top 16 curves outward along the periphery of the pressure plate axis 4h1 from the rear upper boundary transverse line B26 to the front upper boundary transverse line B36. The curved top 16 rises from the rear upper boundary transverse line B26 to the front upper boundary transverse line B36.

[0208] The curved top 16 extends rearward in the X direction from the front upper boundary transverse straight line B36. The curved top 16 connects to the front flange 13 in a generally horizontal direction.

[0209] The curved top 16 extends approximately upward in the Z direction from the rear upper boundary transverse straight line B26. The curved top 16 connects to the rear wall portion 12 in a generally vertical direction. The curved top 16 may also connect to the rear wall portion 12 in a manner that is more inclined than in a generally vertical direction.

[0210] The curved top 16 connects to the right transverse sidewall 14 at the upper right boundary curve B46. The upper right boundary curve B46 is the connection point between the curved top 16 and the right transverse sidewall 14. The upper right boundary curve B46 is the boundary line between the curved top 16 and the right transverse sidewall 14. Both the curved top 16 and the right transverse sidewall 14 are curved surfaces. Therefore, the upper right boundary curve B46 is the junction line of the two curved surfaces.

[0211] The upper right boundary curve B46 is located at the right end of the curved top 16. The upper right boundary curve B46 is also located at the upper end of the right transverse sidewall 14. The upper right boundary curve B46 is an arc-shaped curve. The rear end of the upper right boundary curve B46 connects to the rear wall 12. The front end of the upper right boundary curve B46 connects to the front flange 13.

[0212] The curved top 16 connects to the left transverse sidewall 15 at the upper left boundary curve B56. The upper left boundary curve B56 is the connection point between the curved top 16 and the left transverse sidewall 15. Both the curved top 16 and the left transverse sidewall 15 are curved surfaces. Therefore, the upper left boundary curve B56 is the junction line of the two curved surfaces.

[0213] The upper left boundary curve B56 is located at the left end of the curved top 16. The upper left boundary curve B56 is located at the upper end of the left transverse side wall 15. The upper left boundary curve B56 is an arc-shaped curve. The rear end of the upper left boundary curve B56 connects to the rear wall 12. The front end of the upper left boundary curve B56 connects to the front flange 13.

[0214] The upper right boundary curve B46 and the upper left boundary curve B56 are symmetrical to each other. The distance between the front end of the upper right boundary curve B46 and the front end of the upper left boundary curve B56 in the Y direction is greater than the distance between the rear end of the upper right boundary curve B46 and the rear end of the upper left boundary curve B56 in the Y direction.

[0215] Since the top of the curved section 16 connects to the front flange section 13 in a generally horizontal direction, the portion near the connection between the upper right boundary curve B46 and the upper left boundary curve B56 and the transverse straight line B36 of the upper front boundary can also be a straight line. The portion of the upper right boundary curve B46 and the upper left boundary curve B56 near the transverse straight line B36 of the upper front boundary can be a straight line extending rearward in the X direction from the transverse straight line B36 of the upper front boundary.

[0216] The curved top 16 has an outer front reinforcing rib 76s2 near the portion where the upper right boundary curve B46 and the upper left boundary curve B56 transition from straight lines to curves. The outer front reinforcing rib 76s2 is positioned near the transverse straight line B36 of the upper front boundary. The outer front reinforcing rib 76s2 connects to the outer surface of the curved top 16. The outer front reinforcing rib 76s2 protrudes outward from the curved surface of the curved top 16. The outer front reinforcing rib 76s2 is positioned along the transverse straight line B36 of the upper front boundary. The outer front reinforcing rib 76s2 is positioned along the Y-direction.

[0217] Since the top of the curve 16 connects to the rear wall portion 12 in a generally vertical direction, the portion near the connection between the upper right boundary curve B46 and the upper left boundary curve B56 and the rear upper boundary transverse line B26 can also be a straight line. The portion of the upper right boundary curve B46 and the upper left boundary curve B56 near the rear upper boundary transverse line B26 can be a straight line that extends approximately upward in the Z direction from the rear upper boundary transverse line B26.

[0218] The curved top 16 has an outer rear reinforcing rib 76s1 near the portion where the upper right boundary curve B46 and the upper left boundary curve B56 transition from straight lines to curves. The outer rear reinforcing rib 76s1 is positioned near the transverse straight line B26 of the upper rear boundary. The outer rear reinforcing rib 76s1 connects to the outer surface of the curved top 16. The outer rear reinforcing rib 76s1 protrudes outward from the curved surface of the curved top 16. The outer rear reinforcing rib 76s1 is positioned along the transverse straight line B26 of the upper rear boundary. The outer rear reinforcing rib 76s1 is positioned along the Y-direction.

[0219] The front flange 13 connects to the right transverse sidewall 14 at the right front end boundary curve B34. The right front end boundary curve B34 is the connection point between the front flange 13 and the right transverse sidewall 14. The right front end boundary curve B34 is formed along the rear surface 13b of the front flange 13. The right front end boundary curve B34 is the front end position of the right transverse sidewall 14. The right front end boundary curve B34 is the front longitudinal line position and the front boundary curve. The right front end boundary curve B34 is a curved arc. The upper end of the right front end boundary curve B34 connects to the upper right boundary curve B46 and the front upper boundary transverse line B36 at a single point. The lower end of the right front end boundary curve B34 connects to the lower right boundary line B14 and the front lower boundary transverse line B13. The horizontal straight line B13 at the lower front boundary marks the connection point between the front flange 13 and the bottom 11. The horizontal boundary line B14 at the lower right end marks the connection point between the right horizontal sidewall 14 and the bottom 11.

[0220] The front flange 13 connects to the left transverse sidewall 15 at the left front end boundary curve B35. The left front end boundary curve B35 is the connection point between the front flange 13 and the left transverse sidewall 15. The left front end boundary curve B35 is formed along the rear surface 13b of the front flange 13. The left front end boundary curve B35 is the front end position of the left transverse sidewall 15. The left front end boundary curve B35 is the front longitudinal line position and the front boundary curve. The left front end boundary curve B35 is a curved arc. The upper end of the left front end boundary curve B35 connects to the upper left boundary curve B56 and the upper front boundary transverse line B36. The upper end of the left front end boundary curve B35 connects to the upper left boundary curve B56 and the upper front boundary transverse line B36 at a single point. The lower end of the left front end boundary curve B35 connects to the lower left boundary line B15 and the lower front boundary transverse line B13. The lower left boundary line B15 is the connection point between the left transverse side wall 15 and the bottom 11.

[0221] The right front edge boundary curve B34 and the left front edge boundary curve B35 are symmetrical to each other. Both curves are formed on the rear surface 13b of the front flange portion 13, which is a plane. The curvature of the right front edge boundary curve B34 is equal to that of the left front edge boundary curve B35. The radius of curvature of the right front edge boundary curve B34 is equal to that of the left front edge boundary curve B35.

[0222] The rear wall portion 12 connects to the right transverse side wall portion 14 at the right rear end boundary curve B24. The right rear end boundary curve B24 is the connection point between the rear wall portion 12 and the right transverse side wall portion 14. The right rear end boundary curve B24 is formed along the front surface 12b of the rear wall portion 12. The right rear end boundary curve B24 is the rear end position of the right transverse side wall portion 14. The right rear end boundary curve B24 is the rear longitudinal line position and the rear end boundary curve. The right rear end boundary curve B24 is a curved arc. The upper end of the right rear end boundary curve B24 connects to the upper right boundary curve B46 and the upper rear boundary transverse line B26 at a single point. The lower end of the right rear end boundary curve B24 connects to the lower right boundary line B14 and the lower rear boundary transverse line B12. The horizontal straight line B12 at the lower rear boundary is the connection point between the rear wall 12 and the bottom 11.

[0223] The rear wall portion 12 connects to the left transverse side wall portion 15 at the left rear end boundary curve B25. The left rear end boundary curve B25 is the connection point between the rear wall portion 12 and the left transverse side wall portion 15. The left rear end boundary curve B25 is formed along the front surface 12b of the rear wall portion 12. The left rear end boundary curve B25 is the rear end position of the left transverse side wall portion 15. The left rear end boundary curve B25 is the rear longitudinal line position and the rear end boundary curve. The left rear end boundary curve B25 is a curved arc. The upper end of the left rear end boundary curve B25 connects to the upper left boundary curve B56 and the upper rear boundary transverse line B26 at a single point. The lower end of the left rear end boundary curve B25 connects to the lower left boundary line B15 and the lower rear boundary transverse line B12.

[0224] The right rear end boundary curve B24 and the left rear end boundary curve B25 are symmetrical to each other. Both curves are formed on the front surface 12b of the rear wall portion 12, which is a plane. The curvature of the right rear end boundary curve B24 is equal to that of the left rear end boundary curve B25. The radius of curvature of the right rear end boundary curve B24 is equal to that of the left rear end boundary curve B25.

[0225] Both the right front boundary curve B34 and the right rear boundary curve B24 lie on the same conical surface. That is, the right transverse sidewall 14 lies on a conical surface. The right front boundary curve B34, the right rear boundary curve B24, and the right transverse sidewall 14 lie on a conical surface with one vertex. Therefore, when the front flange 13 and the rear wall 12 are parallel to each other, the right front boundary curve B34 and the right rear boundary curve B24 are similar arcs. When the front flange 13 and the rear wall 12 are approximately parallel to each other, the right front boundary curve B34 and the right rear boundary curve B24 are approximately similar arcs. When the front flange 13 is inclined at a slight angle relative to the rear wall 12 from a parallel position, the right front boundary curve B34 and the right rear boundary curve B24 are approximately similar arcs.

[0226] The outward convex curvature of the right front boundary curve B34 is less than that of the right rear boundary curve B24. The radius of curvature of the right front boundary curve B34 is greater than that of the right rear boundary curve B24.

[0227] The vertex of the conical surface of the right transverse sidewall portion 14 is located outside the pressure plate chamber 10. The vertex of the conical surface of the right transverse sidewall portion 14 is located rearward in the X direction from the rear wall portion 12. The vertex of the conical surface of the right transverse sidewall portion 14 is located closer to the center of the pressure plate chamber 10 in the Y direction than the right rear end boundary curve B24. The vertex of the conical surface of the right transverse sidewall portion 14 can also be located above the rear upper boundary transverse line B26 in the Z direction. The vertex of the conical surface of the right transverse sidewall portion 14 can also be located between the rear upper boundary transverse line B26 and the rear lower boundary transverse line B12 in the Z direction. The vertex of the conical surface of the right transverse sidewall portion 14 can also be located below the rear lower boundary transverse line B12 in the Z direction.

[0228] The left front boundary curve B35 and the left rear boundary curve B25 both lie on the same conical surface. That is, the left transverse sidewall 15 lies on the conical surface. The left front boundary curve B35, the left rear boundary curve B25, and the left transverse sidewall 15 lie on a conical surface with one vertex. Therefore, when the front flange 13 and the rear wall 12 are parallel to each other, the left front boundary curve B35 and the left rear boundary curve B25 are similar arcs. When the front flange 13 and the rear wall 12 are approximately parallel to each other, the left front boundary curve B35 and the left rear boundary curve B25 are approximately similar arcs. When the front flange 13 is inclined at a slight angle relative to the rear wall 12 from a parallel position, the left front boundary curve B35 and the left rear boundary curve B25 are approximately similar arcs.

[0229] The outward convex curvature of the left front boundary curve B35 is less than that of the left rear boundary curve B25. The radius of curvature of the left front boundary curve B35 is greater than that of the left rear boundary curve B25.

[0230] The vertex of the conical surface of the left transverse sidewall portion 15 is located outside the pressure plate chamber 10. The vertex of the conical surface of the left transverse sidewall portion 15 is located rearward in the X direction from the rear wall portion 12. The vertex of the conical surface of the left transverse sidewall portion 15 is located closer to the center of the pressure plate chamber 10 in the Y direction than the left rear end boundary curve B25. The vertex of the conical surface of the left transverse sidewall portion 15 can also be located above the rear upper boundary transverse line B26 in the Z direction. The vertex of the conical surface of the left transverse sidewall portion 15 can also be located between the rear upper boundary transverse line B26 and the rear lower boundary transverse line B12 in the Z direction. The vertex of the conical surface of the left transverse sidewall portion 15 can also be located below the rear lower boundary transverse line B12 in the Z direction.

[0231] The right transverse sidewall portion 14 and the left transverse sidewall portion 15 are opposite each other in the left-right direction. The right transverse sidewall portion 14 and the left transverse sidewall portion 15 have mutually symmetrical shapes in the Y direction. Since both the right transverse sidewall portion 14 and the left transverse sidewall portion 15 are composed of conical surfaces, the distance between them in the Y direction is greater at the front than at the rear. That is, the distance between the right front end boundary curve B34 and the left front end boundary curve B35 in the Y direction is greater than the distance between the right rear end boundary curve B24 and the left rear end boundary curve B25 in the Y direction.

[0232] Furthermore, since both the right transverse sidewall 14 and the left transverse sidewall 15 are composed of conical surfaces, their separation distance in the Y direction decreases as they face rearward in the X direction. Therefore, the pressure chamber 10 has a trapezoidal shape when viewed from above. The pressure chamber 10 has a trapezoidal profile with the rear wall 12 as the short side and the front flange 13 as the long side when viewed from above. This is because the Y-direction dimension of the mask 4j is larger than the Y-direction dimension of the conveying port 4a.

[0233] Furthermore, when the Y-direction dimension of the conveying port 4a is equal to that of the mask 4j, the pressure chamber 10 can have a rectangular outline in which the side length of the rear wall portion 12 is approximately the same as the side length of the front flange portion 13 when viewed from above.

[0234] Furthermore, when the Y-direction dimension of the mask 4j is smaller than the Y-direction dimension of the conveying port 4a, the pressure chamber 10 can have a trapezoidal profile with the rear wall portion 12 as the long side and the front flange portion 13 as the short side when viewed from above.

[0235] The right transverse sidewall portion 14 has a through hole portion 14h. The through hole portion 14h is formed near the bottom 11 and the front flange portion 13. The through hole portion 14h is a through hole through which the pressure plate shaft 4h1 passes. The right transverse sidewall portion 14 may also have a through working opening portion 14m. The working opening portion 14m may have an opening area larger than that of the through hole portion 14h. The working opening portion 14m is formed closer to the rear wall portion 12 in the X direction than the through hole portion 14h. The working opening portion 14m can be closed and sealed by a door or the like (not shown).

[0236] The left transverse sidewall portion 15 has a through hole portion 14h. The through hole portion 14h is formed near the bottom 11 and the front flange portion 13. The through hole portion 14h is a through hole through which the pressure plate shaft 4h1 passes. The left transverse sidewall portion 15 may also have a through working opening portion 14m. The working opening portion 14m may have an opening area larger than that of the through hole portion 14h. The working opening portion 14m is formed closer to the rear wall portion 12 in the X direction than the through hole portion 14h. The working opening portion 14m can be closed and sealed by a door or the like (not shown).

[0237] The through-hole portion 14h of the right transverse sidewall portion 14 and the through-hole portion 14h of the left transverse sidewall portion 15 are located at an overlapping position when viewed along the Y direction. The left and right through-hole portions 14h are coaxial. The left and right through-hole portions 14h have the same diameter. The left and right through-hole portions 14h are equidistant from the bottom 11. The left and right through-hole portions 14h are equidistant from the front flange portion 13.

[0238] Both the left and right through-hole sections 14h have pipe sections with an axis along the Y direction of the through-hole. Both left and right through-hole sections 14h have through-flange sections formed around the through-hole. The left and right through-hole sections 14h are strengthened by the pipe sections and flange sections. Similarly, the left and right working openings 14m are also strengthened by having pipe sections and flange sections.

[0239] The bottom 11 has multiple parallel protrusions. These protrusions extend in the left-right direction. That is, the bottom 11 has the same structure as so-called sheet piles. The bottom 11 has an alternating concave-convex structure.

[0240] The bottom 11, facing the X direction, has a top surface 11a, a rear sloping surface 11b, a bottom surface 11c, a front sloping surface 11d, a top surface 11e, a rear sloping surface 11f, a bottom surface 11g, a front sloping surface 11h, a top surface 11j, a rear sloping surface 11k, and a bottom surface 11m. The length dimension in the Y direction of the top surface 11a, the rear sloping surface 11b, the bottom surface 11c, the front sloping surface 11d, the top surface 11e, the rear sloping surface 11f, the bottom surface 11g, the front sloping surface 11h, the top surface 11j, the rear sloping surface 11k, and the bottom surface 11m is larger than the width dimension in the X direction.

[0241] The bottom upper surfaces 11a, 11e, and 11j are all located on the same plane. The bottom upper surfaces 11a, 11e, and 11j are approximately horizontal. The bottom upper surfaces 11a, 11e, and 11j are on the same plane as the rear inner lower transverse rib 72s1. The bottom upper surfaces 11a, 11e, and 11j may be located on a horizontal plane above the rear inner lower transverse rib 72s1. The bottom upper surfaces 11a, 11e, and 11j may also be located on a horizontal plane below the rear inner lower transverse rib 72s1.

[0242] The bottom surfaces 11c, 11g, and 11m are all located on the same plane. The bottom surfaces 11c, 11g, and 11m are approximately horizontal. The top surfaces 11a, 11e, and 11j are located above the bottom surfaces 11c, 11g, and 11m in the Z direction.

[0243] The top surfaces 11a, 11e, 11j, 11c, 11g, and 11m are all parallel. The top surfaces 11a, 11e, and 11j all have the same width dimension in the X direction. The bottom surfaces 11c and 11g also have the same width dimension in the X direction. The width dimension of the bottom surface 11m in the X direction is greater than that of the bottom surface 11g. The width dimension of the top surfaces 11a, 11e, and 11j in the X direction is greater than that of the bottom surface 11g.

[0244] The rearward inclined surface 11b connects to the upper bottom surface 11a in the X direction. The rearward inclined surface 11b connects to the lower bottom surface 11c in the X direction. The rearward inclined surface 11b is inclined in the X direction, descending from the upper bottom surface 11a to the lower bottom surface 11c. The rearward inclined surface 11f connects to the upper bottom surface 11e in the X direction. The rearward inclined surface 11f connects to the lower bottom surface 11g in the X direction. The rearward inclined surface 11f is inclined in the X direction, descending from the upper bottom surface 11e to the lower bottom surface 11g.

[0245] The bottom rear inclined surface 11b and bottom rear inclined surface 11f are parallel. The bottom rear inclined surface 11k connects to the bottom upper surface 11j at the rear in the X direction. The bottom rear inclined surface 11k connects to the bottom lower surface 11m at the front in the X direction. The bottom rear inclined surface 11k slopes downward from the bottom upper surface 11j to the bottom lower surface 11m in the X direction. The bottom rear inclined surface 11k and bottom rear inclined surface 11f are parallel.

[0246] The inclination angles of the bottom rear inclined surface 11b relative to the bottom upper surface 11a, the bottom rear inclined surface 11f relative to the bottom upper surface 11e, and the bottom rear inclined surface 11k relative to the bottom upper surface 11j are all equal.

[0247] The front inclined surface 11d connects to the lower surface 11c at the rear in the X direction. The front inclined surface 11d connects to the upper surface 11e at the front in the X direction. The front inclined surface 11d slopes downwards from the upper surface 11e to the lower surface 11c in the X direction. The front inclined surface 11h connects to the lower surface 11g at the rear in the X direction. The front inclined surface 11h connects to the upper surface 11j at the front in the X direction. The front inclined surface 11h slopes downwards from the upper surface 11j to the lower surface 11g in the X direction.

[0248] The inclination angle of the front inclined surface 11d relative to the upper surface 11e is equal to the inclination angle of the front inclined surface 11h relative to the upper surface 11j. The inclination angle of the rear inclined surface 11b relative to the upper surface 11a is equal to the inclination angle of the front inclined surface 11d relative to the lower surface 11c.

[0249] The rear inclined surface 11b, the lower surface 11c, and the front inclined surface 11d form downward ridges in the Z direction relative to the upper surfaces 11a, 11e, and 11j. The rear inclined surface 11f, the lower surface 11g, and the front inclined surface 11h form downward ridges in the Z direction relative to the upper surfaces 11a, 11e, and 11j. The rear inclined surface 11k and the lower surface 11m form downward ridges in the Z direction relative to the upper surfaces 11a, 11e, and 11j. The upper surface 11a and the rear inclined surface 11b form upward ridges in the Z direction relative to the lower surfaces 11c, 11g, and 11m. The front inclined surface 11d, the upper surface 11e, and the rear inclined surface 11f form upward protrusions in the Z direction relative to the lower surface 11c, the lower surface 11g, and the lower surface 11m. The front inclined surface 11h, the upper surface 11j, and the rear inclined surface 11k form upward protrusions in the Z direction relative to the lower surface 11c, the lower surface 11g, and the lower surface 11m.

[0250] The bottom 11 has the same vertical dimension among the multiple protrusions. The bottom 11 has the same front-to-back dimension among the multiple protrusions. The bottom 11 has the same horizontal dimension among the multiple protrusions, which is set by the Y-direction distance between the lower right boundary line B14 and the lower left boundary line B15.

[0251] The bottom upper surfaces 11a, 11e, and 11j are located below the lower end of the pressure plate mechanism in the Z direction. Therefore, the bottom 11 does not obstruct the movement of the glass substrate GS by the pressure plate mechanism. The bottom 11 is strengthened by forming multiple protrusions.

[0252] A gas atmosphere setting mechanism 4g and a lifting pin moving device 4f1 penetrate the bottom 11. The gas atmosphere setting mechanism 4g and the lifting pin moving device 4f1 penetrate the bottom 11 at predetermined positions on the upper bottom surface 11a, upper bottom surface 11e, upper bottom surface 11j, lower bottom surface 11c, lower bottom surface 11g, and lower bottom surface 11m. By setting the positions of the gas atmosphere setting mechanism 4g and the lifting pin moving device 4f1 penetrating the bottom 11 to the upper bottom surface 11a, upper bottom surface 11e, upper bottom surface 11j, lower bottom surface 11c, lower bottom surface 11g, and lower bottom surface 11m, it is possible to easily form a through hole and maintain a tight seal.

[0253] <Inner rib area>

[0254] The pressure plate chamber 10 has a right inwardly inclined rib (inner rib) 74 and a left inwardly inclined rib (inner rib) 75. The right inwardly inclined rib 74 and the left inwardly inclined rib 75 are respectively disposed on the left and right sides of the front lower side of the pressure plate chamber 10.

[0255] The right inwardly inclined rib 74 is positioned at the lower right front of the pressure plate chamber 10. The right inwardly inclined rib 74 is flat. The right inwardly inclined rib 74 is inclined downwards in the X direction. The right inwardly inclined rib 74 is positioned above the through hole portion 14h. The right inwardly inclined rib 74 is not connected to the through hole portion 14h. The right inwardly inclined rib 74 may also be connected to the through hole portion 14h. The right inwardly inclined rib 74 is not connected to the working opening portion 14m. The right inwardly inclined rib 74 may also be connected to the working opening portion 14m.

[0256] The front end 74d of the right inward inclined rib 74 is connected to the rear surface 13b of the front flange portion 13. The connection position between the front end 74d and the rear surface 13b is a straight line along the Y direction. The entire length of the front end 74d is connected to the rear surface 13b of the front flange portion 13.

[0257] The rear end 74a of the right inner inclined rib 74 is connected to the bottom rear inclined surface 11f of the bottom 11. The connection between the rear end 74a and the bottom 11 is a straight line along the Y direction. The entire length of the rear end 74a is connected to the bottom 11.

[0258] The rear end 74a of the right inner inclined rib 74 can also be connected to the lower surface 11g of the bottom 11. The rear end 74a of the right inner inclined rib 74 can also be connected to the boundary position of the bottom rear inclined surface 11f and the lower surface 11g of the bottom 11.

[0259] The right outer end (lateral outer end) 74b of the right inwardly inclined rib 74 is connected to the right transverse sidewall portion 14. The right outer end 74b is a curve along the inner surface of the right transverse sidewall portion 14. The right outer end 74b descends from the front end 74d to the rear end 74a. The entire length of the right outer end 74b is connected to the right transverse sidewall portion 14.

[0260] The left inner end 74c of the right inward inclined rib 74 is a straight line. The left inner end 74c descends along the X direction from the front end 74d to the rear end 74a. Viewed from the X direction, the left inner end 74c is a straight line approximately aligned with the longitudinal edge of the processing opening 4d of the front flange 13. Viewed from the Z direction, the left inner end 74c is a straight line along the X direction. Viewed from the Z direction, the left inner end 74c is a straight line approximately aligned with the longitudinal edge of the processing opening 4d of the front flange 13. The left inner end 74c may not be connected to other parts of the pressure plate chamber 10.

[0261] The right inner inclined rib 74, viewed from the Y direction, forms a truss structure consisting of the portion near the lower end of the front flange portion 13 and the portion near the front end of the bottom 11. Viewed from the Y direction, the through hole portion 14h is located inside the truss structure of the right inner inclined rib 74, the front flange portion 13, and the bottom 11. The through hole portion 14h may not be connected to any of the right inner inclined rib 74, the front flange portion 13, or the bottom 11.

[0262] The truss structure formed by the right inwardly inclined rib 74 is connected to the right transverse sidewall 14 on its outer side in the Y direction. The position of the through hole 14h is precisely where the pressure plate chamber 10 bears a large load when the pressure plate mechanism is driven. By forming the truss structure close to the through hole 14h, it can withstand the load on the lower front part of the pressure plate chamber 10, thereby preventing deformation of the lower front part of the pressure plate chamber 10. The right inwardly inclined rib 74 can enhance the strength of the pressure plate chamber 10.

[0263] The left inwardly inclined rib 75 is positioned at the lower left front of the pressure plate chamber 10. The left inwardly inclined rib 75 is flat. The left inwardly inclined rib 75 is inclined downwards in the X direction. The left inwardly inclined rib 75 is positioned above the through hole portion 14h. The left inwardly inclined rib 75 is not connected to the through hole portion 14h. The left inwardly inclined rib 75 may also be connected to the through hole portion 14h. The left inwardly inclined rib 75 is not connected to the working opening portion 14m. The left inwardly inclined rib 75 may also be connected to the working opening portion 14m.

[0264] The front end 75d of the left inwardly inclined rib 75 is connected to the rear surface 13b of the front flange portion 13. The connection position between the front end 75d and the rear surface 13b is a straight line along the Y direction. The entire length of the front end 75d is connected to the rear surface 13b of the front flange portion 13.

[0265] The rear end 75a of the left inner inclined rib 75 is connected to the bottom rear inclined surface 11f of the bottom 11. The connection between the rear end 75a and the bottom 11 is a straight line along the Y direction. The entire length of the rear end 75a is connected to the bottom 11.

[0266] The rear end 75a of the left inwardly inclined rib 75 can also be connected to the lower surface 11g of the bottom 11. The rear end 75a of the left inwardly inclined rib 75 can also be connected to the boundary position of the bottom rearwardly inclined surface 11f and the lower surface 11g of the bottom 11.

[0267] The left outer end (lateral outer end) 75b of the left inwardly inclined rib 75 is connected to the left transverse sidewall portion 15. The left outer end 75b is a curve along the inner surface of the left transverse sidewall portion 15. The left outer end 75b descends from the front end 75d to the rear end 75a. The entire length of the left outer end 75b is connected to the left transverse sidewall portion 15.

[0268] The right inner end 75c of the left inward inclined rib 75 is a straight line. The right inner end 75c descends along the X direction from the front end 75d to the rear end 75a. Viewed from the X direction, the right inner end 75c is a straight line approximately aligned with the longitudinal edge of the processing opening 4d of the front flange 13. Viewed from the Z direction, the right inner end 75c is a straight line along the X direction. Viewed from the Z direction, the right inner end 75c is a straight line approximately aligned with the longitudinal edge of the processing opening 4d of the front flange 13. The right inner end 75c may not be connected to other parts of the pressure plate chamber 10.

[0269] The left inner inclined rib 75, viewed from the Y direction, forms a truss structure consisting of the portion near the lower end of the front flange portion 13 and the portion near the front end of the bottom 11. Viewed from the Y direction, the through hole portion 14h is located inside the truss structure of the left inner inclined rib 75, the front flange portion 13, and the bottom 11. The through hole portion 14h may not be connected to any of the left inner inclined rib 75, the front flange portion 13, or the bottom 11.

[0270] The truss structure formed by the left inwardly inclined rib 75 is connected to the left transverse sidewall 15 on both sides in the Y direction. The through hole 14h is located where the pressure plate chamber 10 bears a large load when the pressure plate mechanism is driven. By forming the truss structure close to the through hole 14h, it can withstand the load on the lower front part of the pressure plate chamber 10, thereby preventing deformation of the lower front part of the pressure plate chamber 10. The left inwardly inclined rib 75 can enhance the strength of the pressure plate chamber 10.

[0271] The right inward-sloping rib 74 and the left inward-sloping rib 75 are symmetrical. The right inward-sloping rib 74 and the left inward-sloping rib 75 prevent deformation of the lower front part of the pressure chamber 10 on both sides. Inside the pressure chamber 10, the right inward-sloping rib 74 and the left inward-sloping rib 75 do not obstruct the movement of the glass substrate GS performed by the pressure mechanism. By providing the right inward-sloping rib 74 and the left inward-sloping rib 75, the pressure chamber 10 can maintain necessary strength without the need for reinforcing members such as ribs on its outer surface.

[0272] The plate thickness of the pressure chamber 10 varies at the bottom 11, rear wall 12, front flange 13, right transverse side wall 14, left transverse side wall 15, and curved top 16. The right transverse side wall 14 and left transverse side wall 15 have the same plate thickness.

[0273] The plate thickness of the right transverse sidewall 14 and the left transverse sidewall 15 is less than the plate thickness of the rear wall 12. The plate thickness of the right transverse sidewall 14 and the left transverse sidewall 15 is less than the plate thickness of the front flange 13. The plate thickness of the right transverse sidewall 14 and the left transverse sidewall 15 is greater than the plate thickness of the curved top 16. The plate thickness of the front flange 13 is less than the plate thickness of the rear wall 12. The plate thickness of the curved top 16 is less than the plate thickness of the rear wall 12. The plate thickness of the curved top 16 is less than the plate thickness of the front flange 13. The plate thickness of the front flange 13 is less than the plate thickness of the rear wall 12.

[0274] In addition, the thickness of the bottom plate 11 is less than the thickness of the front flange 13.

[0275] That is, the thicknesses of the rear wall 12, front flange 13, transverse side walls 14 and 15, and curved top 16 constituting the pressure plate chamber 10 satisfy the following relationship.

[0276] Rear wall section 12 ≥ Front flange section 13 > Transverse side wall section 14, 15 ≥ Curved top 16

[0277] Specifically, the settings can be configured as follows.

[0278] • Rear wall section: 65mm

[0279] Front flange section: 30mm

[0280] • Lateral sidewall portion: 19mm

[0281] • Curved top: 15mm

[0282] • Bottom 11: 21mm.

[0283] In addition, the plate thickness of the right inward inclined rib 74 (inner rib) and the left inward inclined rib 75 (inner rib) can be set to 19 mm.

[0284] The plate thickness of the rear inner lower transverse rib 72s1 and the rear inner upper transverse rib 72s2 can be set to 19mm.

[0285] The plate thickness of the outer rear reinforcing rib 76s1 and the outer front reinforcing rib 76s2 can be set to 19mm.

[0286] In this embodiment, the vacuum processing apparatus 1 has three curved surfaces in the pressure plate chamber 10: the right transverse sidewall 14, the left transverse sidewall 15, and the curved top 16. Furthermore, by forming multiple protrusions on the bottom 11, it can provide sufficient strength to withstand stress caused by the internal and external pressure difference, thereby preventing deformation. Additionally, since the pressure plate chamber 10 forms a truss structure with the right inwardly inclined rib 74 and the left inwardly inclined rib 75, it can provide sufficient strength to withstand loads caused by the rotational movement of the pressure plate mechanism, thereby preventing deformation.

[0287] Therefore, compared with the past, the plate thickness of the right transverse sidewall 14, the left transverse sidewall 15, and the curved top 16 can be reduced. Therefore, the weight of the pressure plate chamber 10 can be reduced.

[0288] In particular, compared with the past, the thickness of the right transverse sidewall 14 and the left transverse sidewall 15 can be reduced by about 30%. Compared with the past, the thickness of the curved top 16 can be reduced by about 30%.

[0289] Therefore, there is no need to install the multiple strength-reinforcing ribs R (refer to) that were previously installed on the outer surface. Figure 1 This can reduce the weight of the pressure chamber 10.

[0290] Furthermore, even if the previously required joint portion R1 is not formed (see reference...) Figure 1 This also allows for the manufacture of the pressure chamber 10. This reduces the weight required for the joining portion R1. Furthermore, since there is no joining portion R1, sealing is unnecessary. Moreover, since there are no particles generated from the joining portion R1, particle generation, which can be problematic in vacuum processing, can be significantly reduced.

[0291] At the same time, the truss structure eliminates the need for a structure to handle the loads caused by the rotational movements of the pressure plate mechanism, thus reducing weight. Furthermore, the truss structure improves the operational reliability of the pressure plate mechanism.

[0292] Hereinafter, the vacuum processing apparatus and pressure plate chamber according to the second embodiment of the present invention will be described with reference to the accompanying drawings.

[0293] Figure 12 This is a perspective view of the pressure plate chamber in this embodiment, viewed from the upper right rear. Figure 13 This is a rear view of the pressure plate chamber in this embodiment. Figure 14 This is a left view of the pressure plate chamber in this embodiment. Figure 15 This is an explanatory diagram of the right transverse sidewall portion 14 in this embodiment. In this embodiment, unlike the first embodiment described above, the points related to the curved top 16, and the points related to the right transverse sidewall portion 14 and the left transverse sidewall portion 15, are labeled with the same reference numerals as those in the first embodiment described above, and their descriptions are omitted.

[0294] exist Figure 15 In the middle, with Figure 13 The right transverse sidewall portion 14 on the left side is described in the same manner as the right transverse sidewall portion 14. Figure 15 In the middle, the right transverse sidewall portion 14 on the right side is related to the use of Figure 14 The left transverse sidewall 15 is represented by a left-right reversal method, corresponding to the right transverse sidewall 14.

[0295] like Figure 12 , Figure 13 As shown, the pressure chamber 10 of this embodiment has a structure in which a flat plate is bent by a right transverse sidewall portion 14 and a left transverse sidewall portion 15. Since the right transverse sidewall portion 14 and the left transverse sidewall portion 15 are symmetrical, the right transverse sidewall portion 14 will be described below.

[0296] In this embodiment, the right transverse sidewall 14 is composed of a combination of planes along an imaginary triangular facet, which has a vertex 14P located behind the rear wall 12 in the X direction.

[0297] The right transverse sidewall 14 has a first plane 14a, a second plane 14b, a third plane 14c, a fourth plane 14d, and a fifth plane 14e from bottom to top. The first plane 14a, the second plane 14b, the third plane 14c, the fourth plane 14d, and the fifth plane 14e are all part of an imaginary triangle sharing a vertex 14P.

[0298] The boundary line between the first plane 14a and the second plane 14b is the boundary line 14ab. The boundary line between the second plane 14b and the third plane 14c is the boundary line 14bc. The boundary line between the third plane 14c and the fourth plane 14d is the boundary line 14cd. The boundary line between the fourth plane 14d and the fifth plane 14e is the boundary line 14de.

[0299] Boundary lines 14ab, 14bc, 14cd, and 14de all intersect at vertex 14P.

[0300] The first plane 14a, the second plane 14b, the third plane 14c, the fourth plane 14d, and the fifth plane 14e are pyramidal surfaces corresponding to the conical surface of the right transverse sidewall portion 14 in the first embodiment. Therefore, the vertex of the conical surface of the right transverse sidewall portion 14 in the first embodiment is the same point as vertex 14P.

[0301] In this embodiment, the right lateral sidewall portion 14 and the left lateral sidewall portion 15 are composed of imaginary triangular faces, which are pyramidal faces corresponding to the conical faces in the first embodiment. Therefore, they can have the same strength as the right lateral sidewall portion 14 and the left lateral sidewall portion 15 in the first embodiment.

[0302] In addition, such as Figure 15 As shown, the lower end position of the substrate holding portion 4h2 in the horizontal transport position is indicated by the lower end line 4h2u. The transport port 4a is slightly above this lower end line 4h2u. The through hole portion 14h is slightly below this lower end line 4h2u.

[0303] like Figure 12 , Figure 13As shown, the curved top 16 of the pressure plate chamber 10 in this embodiment is a sheet pile structure.

[0304] In this embodiment, the curved top 16 is composed of multiple planes extending from the rear wall portion 12 toward the front flange portion 13. The curved top 16 has: a front inclined surface 16a, an inner plane 16b, a rear inclined surface 16c, an outer plane 16d, a front inclined surface 16e, an inner plane 16f, a rear inclined surface 16g, an outer plane 16h, a front inclined surface 16j, an inner plane 16k, a rear inclined surface 16m, and an outer plane 16n.

[0305] The top inner plane 16b, top inner plane 16f, and top inner plane 16k form an inner plane that curves around the pressure plate axis 4h1. This inner plane corresponds to the curved surface of the curved top 16 in the first embodiment.

[0306] The top outer plane 16d, top outer plane 16h, and top outer plane 16n form an outer plane that curves around the pressure plate axis 4h1. This outer plane corresponds to the curved surface of the curved top 16 in the first embodiment. The outer plane is further away from the pressure plate axis 4h1 in the radial direction than the inner plane.

[0307] The top front inclined surface 16j, the top inner plane 16k, and the top rear inclined surface 16m form protrusions that project from the outer plane toward the pressure plate shaft 4h1. The top front inclined surface 16e, the top inner plane 16f, and the top rear inclined surface 16g form protrusions that project from the outer plane toward the pressure plate shaft 4h1. The top front inclined surface 16a, the top inner plane 16b, and the top rear inclined surface 16c form protrusions that project from the outer plane toward the pressure plate shaft 4h1.

[0308] The top rear inclined surface 16c, the top outer plane 16d, and the top front inclined surface 16e form protrusions that project away from the pressure plate axis 4h1 relative to the inner plane. The top rear inclined surface 16g, the top outer plane 16h, and the top front inclined surface 16j form protrusions that project away from the pressure plate axis 4h1 relative to the inner plane.

[0309] The curved top 16 of this embodiment can also face the X and Y directions, and has an outer top reinforcing rib 76s4 and an outer top reinforcing rib 76s5 along the inner plane.

[0310] In this embodiment, the pressure plate chamber 10, by forming a curved top 16 of a sheet pile structure, can have the strength corresponding to the bottom 11 of the first embodiment.

[0311] Furthermore, in this invention, various structures in the above embodiments can be selected individually and combined separately.

[0312] Explanation of reference numerals in the attached figures

[0313] 1...Vacuum processing equipment

[0314] 2... Loading and unloading chamber (cavity)

[0315] 3...Transmission chamber (chamber)

[0316] 4... Vacuum processing chamber (cavity, film formation chamber)

[0317] 4h……Pressure plate mechanism

[0318] 4h2u……lower line

[0319] 5... Cathode Unit (Vacuum Processing Section)

[0320] 10……Pressure plate chamber

[0321] 11... Bottom

[0322] 11a, 11e, 11j... Bottom surface

[0323] 11b, 11f, 11k... Bottom sloped surface

[0324] 11c, 11g, 11m... bottom surface

[0325] 11d, 11h... Bottom front inclined surface

[0326] 12……Rear wall

[0327] 13……Connecting flange section (front flange section)

[0328] 14……Right transverse sidewall (transverse sidewall portion)

[0329] 14a……First Plane

[0330] 14ab, 14bc, 14cd, 14de... boundary lines

[0331] 14b……Second plane

[0332] 14c……Third plane

[0333] 14d……Fourth plane

[0334] 14e……The Fifth Plane

[0335] 14h...through hole section

[0336] 14m...Work opening

[0337] 14p...the pinnacle

[0338] 15……Left transverse sidewall (transverse sidewall)

[0339] 16……Top of the curve

[0340] 16a, 16e, 16j... Top front inclined surface

[0341] 16b, 16f, 16k... Top Inner Plane

[0342] 16c, 16g, 16m... Top Back Inclined Surface

[0343] 16d, 16h, 16n... Top outer plane

[0344] 72s1……Peripheral lower transverse rib

[0345] 72s2……Post-inner upper transverse rib

[0346] 74……Right medial tilted rib (inner rib)

[0347] 74b……Right outer end (lateral outer end)

[0348] 75……Left medial tilted rib (inner rib)

[0349] 75b……Left outer end (lateral outer end)

[0350] 76s1...rear lateral reinforcing ribs

[0351] 76s2...Outer front reinforcing ribs

[0352] 76s4...Outer top reinforcing ribs

[0353] 76s5...Outer top reinforcing ribs

[0354] B12……Rear lower boundary horizontal straight line

[0355] B13……Horizontal straight line at the lower front boundary

[0356] B14……Lower right boundary line

[0357] B15……Lower left boundary line

[0358] B24……Right rear end boundary curve

[0359] B25……Left rear end boundary curve

[0360] B26……Rear upper boundary horizontal straight line

[0361] B34……Right front end boundary curve

[0362] B35……Left front end boundary curve

[0363] B36……Horizontal straight line at the upper front boundary

[0364] B46……Upper right boundary curve

[0365] B56……Top left boundary curve

[0366] GS... Glass substrate (substrate to be processed)

Claims

1. A pressure plate chamber, comprising: A pressure plate mechanism is used to rotate a substrate between a horizontal position that allows it to be moved in and out and a vertical position that is close to the vacuum processing section and can be erected in a manner that allows vacuum processing under reduced pressure. bottom; The rear wall extends upward from the rear end of the bottom and has a slit for moving the substrate in and out. The transverse sidewall portion rises vertically from the left and right ends of the bottom, and the rear end of the transverse sidewall portion is connected to the rear wall portion; The front flange extends upward from the front end of the bottom and connects to the front end of the transverse sidewall, and surrounds the processing opening that opens into the vacuum processing section. as well as The top of the curved section is connected to the upper ends of the front flange, the rear wall, and the transverse side wall, respectively. The lateral sidewall portion bends outward from the top to the bottom of the curve.

2. The pressure plate chamber according to claim 1, wherein, The top of the curve and the left and right transverse sidewalls are curved surfaces that curve outwards.

3. The pressure plate chamber according to claim 1, wherein, The pressure plate mechanism includes a pressure plate shaft with a horizontal axis. The transverse sidewall portion has a through hole near the bottom and the front flange portion for the pressure plate shaft to pass through. The front connection position at the top of the curved section, which connects to the front flange, is higher than the rear connection position, which connects to the rear wall. The top of the curve bends outwards from the front connection position to the rear connection position along the periphery of the pressure plate axis.

4. The pressure plate chamber according to claim 1, wherein, Both the front flange and the rear wall are flat plates. The outward convex curvature of the transverse sidewall portion at the front longitudinal line position connected to the front flange portion is less than the outward convex curvature of the rear longitudinal line position connected to the rear wall portion.

5. The pressure plate chamber according to claim 1, wherein, The left and right lateral sidewalls are each composed of a conical surface with a vertex located further back than the rear sidewall.

6. The pressure plate chamber according to claim 1, wherein, The left and right lateral sidewalls are each composed of a combination of planes along an imaginary triangular facet, which has a vertex further back than the rear sidewall.

7. The pressure plate chamber according to claim 3, having an inner rib positioned above the pressure plate shaft. The inner rib forms a truss in the following manner: the front end of the inner rib is connected to the front flange, the inner rib slopes backward, and the rear end of the inner rib is connected to the bottom. The outer lateral end of the inner rib is connected to the inner side surface of the lateral sidewall.

8. The pressure plate chamber according to claim 1, wherein, The thickness of the transverse sidewall is smaller than that of the rear wall.

9. The pressure plate chamber according to claim 1, wherein, The bottom has multiple parallel protrusions.

10. The pressure plate chamber according to claim 1, wherein, Regarding the left-right separation distance of the opposing transverse sidewall portions, the separation distance at the rear longitudinal line position connected to the rear wall portion is equal to or less than the separation distance at the front longitudinal line position connected to the front flange portion.

11. A vacuum processing apparatus comprising a pressure plate chamber according to any one of claims 1 to 10.

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