Evaporation preparation device for composite metal film

Abstract

The invention relates to the technical field of vacuum coating, and discloses a composite metal film evaporation preparation device which comprises a vacuum cavity, a feeding mechanism and a receiving mechanism which are arranged in the vacuum cavity, and further comprises a plasma cleaning device, an evaporation device, an evaporation device and an evaporation device, the plasma cleaning device is arranged in the vacuum cavity and located on a conveying path of the base film, and the plasma cleaning device is used for cleaning impurities on the surface of the base film and roughening a deposition surface; and the cooling roller assembly is arranged in the vacuum cavity and located on the downstream of the plasma cleaning device, and the base film is wound around the cooling roller assembly and is cooled through the cooling roller assembly. The composite metal film evaporation preparation device aims at solving the problems that an existing device lacks a film layer performance real-time detection and evaporation parameter dynamic feedback regulation and control mechanism, so that the square resistance value fluctuation of a product is large, the performance consistency is poor, and the production yield is low.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of vacuum coating, in particular to a composite metal film evaporation preparation device. BACKGROUND

[0002] With the upgrading of global manufacturing industry to high-end and fine, the limitations of single metal film in performance are increasingly prominent, and the composite metal film has become a research hotspot and application focus in the field of new materials due to its customizable comprehensive performance. In the field of electronic information, the rapid iteration of 5G communication, flexible display and other technologies puts forward multiple requirements for the conductivity, corrosion resistance and flexibility of film materials, and single metal film is difficult to meet all indicators. The composite metal film can realize performance optimization and complementation through multi-layer structure combination and composition regulation.

[0003] At present, most production processes only rely on offline sampling inspection to control the quality of the film layer, and cannot capture the changes of key performance indicators such as sheet resistance value and thickness uniformity of the film layer in real time. Due to the lack of real-time detection data support, it is difficult to dynamically adjust the core parameters such as temperature and evaporation time, so that the parameter deviation in the production process cannot be corrected in time, resulting in large fluctuation range of sheet resistance value of batch products, poor performance consistency, a large number of unqualified products, significantly reducing the production yield, increasing the loss of raw materials and production cost, and failing to meet the high-precision quality demand of metal film products in high-end electronic and new energy fields. SUMMARY

[0004] The purpose of the present application is to solve the problem that the existing device lacks real-time detection of film layer performance and dynamic feedback and regulation mechanism of evaporation parameters, resulting in large fluctuation range of product sheet resistance value, poor performance consistency and low production yield, and a composite metal film evaporation preparation device is provided.

[0005] The technical solution of the present application to solve the above technical problems is as follows: A composite metal film evaporation preparation device, comprising a vacuum cavity and a feeding mechanism and a material collecting mechanism arranged in the vacuum cavity, the feeding mechanism and the material collecting mechanism transmit a base film between them, further comprising: A plasma cleaning device is arranged in the vacuum cavity and located on the conveying path of the base film, which cleans the impurities on the surface of the base film and realizes the roughening treatment of the deposition surface; A cooling roller assembly is arranged in the vacuum cavity and located downstream of the plasma cleaning device, and the base film passes through the cooling roller assembly and realizes cooling; An evaporation assembly is arranged in the vacuum cavity and adjacent to the cooling roller assembly, which deposits the vaporized evaporation material on the surface of the base film and rapidly solidifies into a film; An online sheet resistance detection component is installed in the vacuum chamber and located downstream of the cooling roller assembly. The base film passes through the online sheet resistance detection component after passing through the cooling roller assembly. The online sheet resistance detection component detects the sheet resistance value of the base film in real time and provides feedback to adjust the process parameters of the evaporation assembly. The processed base film is finally wound onto the receiving mechanism.

[0006] Based on the above technical solution, the present invention can be further improved as follows.

[0007] Furthermore, a low-temperature chamber is also provided inside the vacuum chamber. The low-temperature chamber is located downstream of the feeding mechanism and the base film penetrates through its interior. Several water vapor capture tubes are fixed at equal intervals on the inner wall of the low-temperature chamber. The water vapor capture tubes adsorb and remove water molecules passing through the surface of the base film.

[0008] Furthermore, the vacuum chamber is also equipped with several primary flattening rollers, which are located between the feeding mechanism and the plasma cleaning device. The base film passes through each primary flattening roller in sequence to eliminate conveying wrinkles.

[0009] Furthermore, the cooling roller assembly includes: A primary cooling roller is located inside the vacuum chamber and downstream of the primary flattening roller. The base film is cooled initially by passing around the primary cooling roller. The cooling main roller is located in the vacuum chamber and downstream of the primary cooling roller. The base film is in close contact with the outer surface of the cooling main roller to achieve sufficient cooling. The secondary flattening roller is located inside the vacuum chamber and between the primary cooling roller and the main cooling roller. The base film enters the main cooling roller after being corrected by the secondary flattening roller.

[0010] Furthermore, the evaporation assembly includes: An evaporation boat is set inside a vacuum chamber and adjacent to the main cooling roller. Positive and negative electrodes are respectively set at both ends of the evaporation boat. When the positive and negative electrodes are energized, the current flows through the evaporation boat to generate resistance heating. A wire feeding disc is placed inside a vacuum chamber and has a wire-shaped evaporation material wound around its outer periphery. The wire feeding mechanism is located inside the vacuum chamber and cooperates with the wire feeding tray and the evaporation boat. The wire feeding mechanism continuously conveys the evaporation material to the surface of the evaporation boat and heats and vaporizes it. The vaporized evaporation material is deposited on the surface of the base film and quickly condenses and solidifies.

[0011] Furthermore, the evaporation boat is also provided with baffles on its periphery, which guide and constrain the vaporized evaporation material, causing it to move in the vertical direction and be deposited directionally onto the surface of the base film.

[0012] Further, a third flattening roller is arranged in the vacuum cavity, located between the cooling main roller and the square resistance online detection assembly, and the base film is flattened by the third flattening roller before entering the square resistance online detection assembly.

[0013] Further, a tension roller and a fourth flattening roller are arranged in the vacuum cavity, located between the square resistance online detection assembly and the material receiving mechanism, and the base film is wound around the tension roller to realize tension control, and then is flattened by the fourth flattening roller before being delivered to the material receiving mechanism.

[0014] Further, an induction heating roller is arranged in the vacuum cavity, located between the tension roller and the fourth flattening roller, and the base film is wound around the outer surface of the induction heating roller to perform annealing treatment on the metal film layer.

[0015] Further, an incubator is arranged in the vacuum cavity, located outside the material receiving mechanism and inside which the material receiving mechanism is located, and a plurality of heating pipes are arranged on the inner wall of the incubator at equal intervals, and the heating pipes keep the base film after winding at constant temperature to stabilize the performance of the metal film layer.

[0016] Compared with the prior art, the technical scheme of the present application has the following beneficial technical effects: The plasma cleaning device of the present application cleans the impurities on the surface of the base film and realizes roughening treatment, effectively removes the surface contaminants affecting the adhesion of the metal film, and at the same time, increases the surface roughness to improve the bonding strength of the metal film and the base film, laying a foundation for subsequent high-quality evaporation; the cooling roller assembly accurately regulates the temperature of the base film, not only ensuring that the base film has a suitable bearing temperature in the evaporation area to promote the rapid solidification of the metal material, but also avoiding deformation or performance degradation of the base film due to overheating, ensuring the stability of the evaporation process; the evaporation assembly efficiently deposits the vaporized evaporation material on the surface of the pre-treated and temperature-controlled base film, realizing continuous and stable preparation of the metal film layer, the square resistance online detection assembly detects the square resistance value of the base film in real time and feeds back the data to the evaporation assembly in real time, realizes dynamic adjustment of process parameters such as evaporation temperature and evaporation rate, makes the parameter deviation in the production process be identified and corrected in time, effectively suppresses the fluctuation range of the square resistance value of batch products, significantly improves the consistency of film layer performance and the production yield, reduces the loss of raw materials and production cost, and meets the high-precision quality requirements of composite metal film products in high-end application fields. BRIEF DESCRIPTION OF DRAWINGS

[0017] Fig. 1 It is a schematic diagram of the overall connecting structure of the present application; Fig. 2 It is a schematic diagram of the connecting structure of the evaporation assembly of the present application.

[0018] In the figure: 1, vacuum cavity; 2, feeding mechanism; 3, receiving mechanism; 4, base film; 5, plasma cleaning device; 6, cooling roller assembly; 61, first cooling roller; 62, cooling main roller; 63, second flattening roller; 7, evaporation assembly; 71, evaporation boat; 72, electrode; 73, wire feeder; 74, wire feeding mechanism; 8, sheet resistance online detection assembly; 9, low-temperature box; 10, water vapor capture tube; 11, first flattening roller; 12, baffle; 13, third flattening roller; 14, tension roller; 15, fourth flattening roller; 16, induction heating roller; 17, constant-temperature box; 18, heating tube. DETAILED DESCRIPTION

[0019] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0020] In combination Figs. 1-2 As shown in the figure, the composite metal film evaporation preparation device of the present application comprises a vacuum cavity 1 and a feeding mechanism 2 and a receiving mechanism 3 arranged in the vacuum cavity 1, a base film 4 is transmitted between the feeding mechanism 2 and the receiving mechanism 3, and further comprises: a plasma cleaning device 5 arranged in the vacuum cavity 1 and located on the transmission path of the base film 4, the plasma cleaning device 5 performs impurity cleaning on the surface of the base film 4 and realizes roughening treatment of the deposition surface; a cooling roller assembly 6 arranged in the vacuum cavity 1 and located downstream of the plasma cleaning device 5, the base film 4 passes through the cooling roller assembly 6 and realizes cooling through it; an evaporation assembly 7 arranged in the vacuum cavity 1 and adjacent to the cooling roller assembly 6, the evaporation assembly 7 deposits vaporized evaporation material on the surface of the base film 4 and rapidly solidifies into a film; a sheet resistance online detection assembly 8 arranged in the vacuum cavity 1 and located downstream of the cooling roller assembly 6, the base film 4 passes through the cooling roller assembly 6 and then passes through the sheet resistance online detection assembly 8, the sheet resistance online detection assembly 8 detects the sheet resistance value of the base film 4 in real time and feeds back to adjust the process parameters of the evaporation assembly 7, and the processed base film 4 is finally wound to the receiving mechanism 3.

[0021] After the base film 4 is unwound from the feeding mechanism 2, it passes through the plasma cleaning device 5, the cooling roller assembly 6, the evaporation assembly 7 and the sheet resistance online detection assembly 8 in sequence along the transmission path, and is finally wound to the receiving mechanism 3.

[0022] The plasma cleaning device 5 adopts a radio frequency plasma generator with a working frequency of 13.56 MHz, and the surface of the base film 4 is bombarded by plasma of argon or oxygen generated in a vacuum environment. The high-energy particles in the plasma can effectively remove organic contaminants, grease and oxide layers and other impurities on the surface of the base film 4, and etch the surface of the base film 4 to form a nanoscale rough structure at a microscale, so that the surface roughness Ra value is increased from 10-20 nm before treatment to 50-100 nm, significantly enhancing the mechanical interlocking force and chemical bonding effect between the metal film layer and the base film 4, and improving the film-substrate adhesion strength.

[0023] The cooling roller assembly 6 is located downstream of the plasma cleaning device 5, and the base film 4 is wound around the cooling roller assembly 6 to regulate the temperature. The cooling roller assembly 6 is internally provided with a circulating cooling water channel, and by adjusting the flow and temperature of the cooling water, the temperature of the base film 4 is controlled in the range of 0-30℃, and the temperature of the base film 4 can be adaptively adjusted according to the actual situation, which not only ensures that the base film 4 has sufficient heat capacity to withstand the rapid condensation of high-temperature metal vapor, but also avoids the size deformation or performance degradation of the base film 4 due to excessive temperature.

[0024] The evaporation assembly 7 is arranged adjacent to the cooling roller assembly 6, and the metal evaporation material is vaporized and deposited on the surface of the base film 4. The preliminarily cooled film passes through the cooling main roller 62, and the vaporized evaporation material is solidified on the surface of the base film 4 just below the cooling main roller 62.

[0025] The sheet resistance online detection assembly 8 adopts a four-probe test method or an eddy current sensor to detect the sheet resistance value of the deposited metal film layer in a non-contact manner. The detection assembly 8 collects 10-50 measurement point data per second to monitor the sheet resistance value in real time. When the sheet resistance value deviates from the set target value, the control system automatically adjusts the process parameters of the evaporation assembly 7: if the sheet resistance value is too large, the heating power of the evaporation boat 71 is increased or the conveying speed of the base film 4 is reduced to increase the deposition amount of the evaporation material per unit area; if the sheet resistance value is too small, the heating power is reduced or the conveying speed is increased to reduce the deposition amount. The closed-loop feedback control mechanism controls the fluctuation range of the product sheet resistance value within ±5%, which significantly improves the performance consistency of the product.

[0026] A low-temperature box 9 is arranged in the vacuum cavity 1 downstream of the feeding mechanism 2 and the base film 4 passes through the inside of the low-temperature box 9. A plurality of water vapor capturing tubes 10 are fixed on the inner wall of the low-temperature box 9 at equal intervals. The water vapor capturing tubes 10 adsorb and remove the water molecules on the surface of the passing base film 4. The low-temperature box 9 is arranged in the vacuum cavity 1 downstream of the feeding mechanism 2. The low-temperature box 9 maintains the internal temperature at -150℃ to -190℃ through a refrigeration unit. When the base film 4 passes through the inside of the low-temperature box 9, the water molecules adsorbed on the surface of the base film 4 are condensed and adsorbed on the water vapor capturing tubes 10 on the inner wall of the low-temperature box 9 due to the sudden temperature drop. The water vapor capturing tubes 10 are made of porous adsorption materials such as molecular sieves or activated carbon coated copper pipes and are arranged at equal intervals on the inner wall of the low-temperature box 9 to achieve efficient water vapor capture. The pre-treatment step reduces the water content on the surface of the base film 4 to below 10 ppm, preventing the residual water from vaporizing due to heating in the subsequent evaporation process and affecting the quality of the metal film layer.

[0027] A plurality of first flattening rollers 11 are arranged in the vacuum cavity 1 between the feeding mechanism 2 and the plasma cleaning device 5. The base film 4 passes through each first flattening roller 11 in sequence to eliminate the transport wrinkles. Three to five first flattening rollers 11 are arranged between the feeding mechanism 2 and the plasma cleaning device 5. The first flattening rollers 11 are arranged in a staggered manner, and the base film 4 passes through the first flattening rollers 11 in an "S" type or "Z" type path. The surface of the first flattening roller 11 is mirror polished. By applying moderate tension to the base film 4 through multiple reverse winding, the transverse wrinkles and longitudinal bending generated during unwinding are eliminated, ensuring that the base film 4 enters the plasma cleaning device 5 in a flat state and avoiding uneven plasma treatment or thickness deviation of the evaporation film layer caused by the uneven surface of the base film 4.

[0028] The cooling roller assembly 6 includes: A first cooling roller 61 is arranged in the vacuum cavity 1 downstream of the first flattening roller 11. The base film 4 passes through the first cooling roller 61 to achieve preliminary cooling. A cooling main roller 62 is arranged in the vacuum cavity 1 downstream of the first cooling roller 61. The base film 4 tightly adheres to the outer surface of the cooling main roller 62 to achieve sufficient cooling. The second flattening roller 63 is arranged in the vacuum cavity 1 and between the first cooling roller 61 and the cooling main roller 62. The base film 4 is corrected by the second flattening roller 63 and then enters the cooling main roller 62. The cooling roller assembly 6 specifically includes the first cooling roller 61, the cooling main roller 62 and the second flattening roller 63. The first cooling roller 61 is located downstream of the first flattening roller 11. The base film 4 slightly heated after the plasma cleaning is preliminarily cooled by the first cooling roller 61, and the temperature is reduced from 40-50°C to 30-35°C. The second flattening roller 63 performs secondary correction on the base film 4 preliminarily cooled, and eliminates the slight deformation caused by temperature change. The cooling main roller 62 has a diameter of 500-1200 mm, and the surface is plated with chromium or treated with ceramic coating, which has good heat conductivity and wear resistance. The base film 4 tightly adheres to the outer surface of the cooling main roller 62 with a wrap angle of 180-270 degrees. The sufficient heat exchange is achieved by increasing the contact area. Meanwhile, the large-diameter arc surface of the cooling main roller 62 provides an ideal deposition bearing platform for metal vapor, which ensures the flatness and uniformity of the deposited film layer.

[0029] The evaporation assembly 7 includes: The evaporation boat 71 is arranged in the vacuum cavity 1 and adjacent to the cooling main roller 62. The evaporation boat 71 is provided with positive and negative electrodes 72 at both ends. The positive and negative electrodes 72 are electrified to make the current flow through the evaporation boat 71 to generate resistance heating. The wire feeding reel 73 is arranged in the vacuum cavity 1 and has a wire-shaped evaporation material wound around the outer periphery. The wire feeding mechanism 74 is arranged in the vacuum cavity 1 and cooperates with the wire feeding reel 73 and the evaporation boat 71. The wire feeding mechanism 74 continuously feeds the evaporation material to the surface of the evaporation boat 71 and vaporizes it after being heated. The vaporized evaporation material is deposited on the surface of the base film 4 and rapidly condenses and solidifies. The evaporation assembly 7 includes the evaporation boat 71, the electrodes 72, the wire feeding reel 73 and the wire feeding mechanism 74. The evaporation boat 71 is made of high-melting-point metal material, such as tungsten boat or molybdenum boat, and has a boat-shaped or spiral structure. The positive and negative electrodes 72 at both ends of the evaporation boat 71 are connected to the external power supply through the water-cooled copper electrode seat. After being electrified, a large current loop is formed in the evaporation boat 71, and the Joule heat generated by the resistance of the evaporation boat 71 raises the temperature to 1000-2000°C. The evaporation material wound on the wire feeding reel 73 is a metal wire material with a diameter of 0.5-2 mm, such as aluminum wire, copper wire or alloy wire material. The wire feeding mechanism 74 adopts a step motor driven wire feeding wheel to feed the metal wire material to the high-temperature area of the evaporation boat 71 at a constant speed. The metal wire material rapidly melts and vaporizes on the surface of the evaporation boat 71, and the formed metal vapor moves in a vertically upward direction and is deposited on the surface of the base film 4 located above. Compared with the traditional crucible evaporation, the continuous wire feeding mode can maintain the stable supply of the evaporation source, avoid the deposition interruption caused by the depletion of the evaporation material, and realize long-time continuous production.

[0030] The circumferential side of the evaporation boat 71 is also provided with a baffle 12, which guides and restricts the vaporized evaporation material to move in the vertical direction and deposit on the surface of the base film 4. The baffle 12 arranged on the circumferential side of the evaporation boat 71 is in a semi-cylindrical or conical structure, made of stainless steel or copper, and the surface is polished to reduce the adsorption of metal vapor. The baffle 12 forms a physical barrier around the evaporation boat 71, limiting the diffusion of metal vapor in the horizontal direction, and the inner surface of the baffle 12 has a geometric shape that guides the flow of vapor, making the originally conical diffused vapor beam more concentrated and vertical, improving the deposition efficiency and reducing the waste of evaporation material. In addition, the baffle 12 also isolates the high-temperature radiation of the evaporation boat 71, protecting the surrounding electrode 72 and wire feeding mechanism 74 from heat damage.

[0031] A three-stage flattening roller 13 is also arranged in the vacuum chamber 1, located between the cooling main roller 62 and the sheet resistance online detection assembly 8. The base film 4 passes through the three-stage flattening roller 13 after being flattened, and the three-stage flattening roller 13 is arranged between the cooling main roller 62 and the sheet resistance online detection assembly 8. When the base film 4 leaves the cooling main roller 62, it may be slightly warped or stressed due to the newly deposited metal film layer and the temperature change. The three-stage flattening roller 13 flattens the base film 4 again to eliminate residual stress, ensuring that the base film 4 passes through the detection area of the sheet resistance online detection assembly 8 in a completely flat state, avoiding detection errors caused by the surface undulation of the base film 4, and improving the accuracy and repeatability of sheet resistance measurement.

[0032] A tension roller 14 and a four-stage flattening roller 15 are also arranged in the vacuum chamber 1, located between the sheet resistance online detection assembly 8 and the material collecting mechanism 3. The base film 4 passes through the tension roller 14 to adjust the tension, and then passes through the four-stage flattening roller 15 to flatten before being delivered to the material collecting mechanism 3. The tension roller 14 and the four-stage flattening roller 15 are arranged between the sheet resistance online detection assembly 8 and the material collecting mechanism 3. The tension roller 14 adjusts the tension by pneumatic or magnetic suspension, automatically adjusts the roller position by monitoring the tension change of the base film 4, and maintains the tension of the base film 4 within the range of 50-200N, which ensures the stability of the base film 4 and avoids the cracking of the metal film layer or the stretching deformation of the base film 4 caused by excessive tension. The four-stage flattening roller 15 flattens the base film 4 to eliminate various surface defects before winding, ensuring that the flatness of the finished composite metal film meets the requirements of subsequent applications.

[0033] The vacuum cavity 1 is also provided with an induction heating roller 16, which is located between the tension roller 14 and the fourth flattening roller 15, the base film 4 is wound around the outer surface of the induction heating roller 16 and the metal film layer is annealed, the induction heating roller 16 is provided between the tension roller 14 and the fourth flattening roller 15, and the induction heating roller 16 is provided with a high-frequency induction coil, which generates an alternating magnetic field to inductively heat the metal film layer. When the base film 4 is wound around the induction heating roller 16, the temperature of the metal film layer is raised to 80-150 DEG C and maintained for 5-30 seconds, so that the annealing treatment of the film layer is realized. During the annealing process, the metal grains recrystallize and stress is released, the internal stress and defects formed during the deposition process are eliminated, the crystallization quality of the metal film layer is improved, the square resistance value is reduced, and the conductivity and mechanical stability are improved. Compared with the traditional radiation heating or contact heating, the induction heating method has the advantages of fast heating speed, high energy utilization rate, and selective heating of the metal film layer without damaging the base film 4.

[0034] The vacuum cavity 1 is also provided with a thermostat 17, the thermostat 17 is located outside the material collecting mechanism 3 and the material collecting mechanism 3 is located inside the thermostat 17, a plurality of heating pipes 18 are arranged on the inner wall of the thermostat 17 at equal intervals, the heating pipes 18 keep the constant temperature of the wound base film 4 to stabilize the performance of the metal film layer, the thermostat 17 is arranged outside the material collecting mechanism 3, and the thermostat 17 maintains the internal temperature at 40-60 DEG C through the heating pipes 18 arranged at equal intervals on the inner wall. After the base film 4 is wound to the material collecting mechanism 3, it is slowly cooled in the temperature control environment of the thermostat 17, so that the thermal stress concentration of the metal film layer or the interface delamination of the base film 4 and the metal film layer due to the difference in thermal expansion coefficient is avoided. The constant temperature keeping process also promotes the interface diffusion and chemical bonding between the metal film layer and the base film 4, and further improves the film base adhesion strength. The heating pipe 18 adopts resistance heating wire or carbon fiber heating body, and cooperates with a temperature controller to realize accurate temperature regulation.

[0035] The specific working principle of the composite metal film evaporation preparation device is as follows: First, the vacuum system is started to vacuum the vacuum cavity 1 to 0.1-10 -5 Pa working range, then the base film 4 is unwound from the feeding mechanism 2, the base film 4 first enters the low-temperature box 9, and the water molecules on the surface of the base film 4 are condensed and adsorbed by the water vapor capturing pipe 10 in the low-temperature box 9 to remove the water molecules, after the preliminary dehumidification pretreatment is completed, the base film 4 is wound around a plurality of first flattening rollers 11 in turn, and the wrinkles and bends generated during unwinding are eliminated through multiple reverse winding to ensure that the base film 4 enters the plasma cleaning device 5 in a flat state; The plasma cleaning device 5 bombards the surface of the base film 4 by exciting high-energy plasma to effectively remove impurities such as organic contaminants, grease and oxide layers, and at the same time etches the surface of the base film 4 to form a nanoscale rough structure at the microscale, thereby significantly improving the adhesion strength of the metal film layer to the base film 4; the surface pretreated base film 4 is sequentially wound around a first cooling roller 61, a second flattening roller 63 and a cooling main roller 62 in the cooling roller assembly 6, the first cooling roller 61 is used to achieve preliminary cooling, the second flattening roller 63 is used to correct the base film 4, and the base film 4 is tightly attached to the outer surface of the cooling main roller 62 for sufficient cooling, so that the temperature of the base film 4 is accurately controlled within the range of 15-30℃; At this time, the wire feeding mechanism 74 in the evaporation assembly 7 continuously feeds the metal wire wound on the wire feeding disc 73 to the surface of the evaporation boat 71, the metal wire is rapidly melted and vaporized by the resistance heating generated by the positive and negative electrodes 72 electrifying the evaporation boat 71, the vaporized metal vapor moves in the vertical direction under the guidance of the baffle 12 and is deposited on the surface of the base film 4 tightly attached to the cooling main roller 62, and the high-temperature metal vapor rapidly condenses and solidifies to form a dense metal film layer after impacting the surface of the cooled base film 4; After deposition, the base film 4 leaves the cooling main roller 62 and is flattened by the third flattening roller 13 before entering the detection area of the sheet resistance online detection assembly 8, the sheet resistance online detection assembly 8 uses the four-probe method or eddy current sensor to detect the sheet resistance value of the metal film layer in real time, 10-50 measurement point data are collected per second and compared with the set target value, when the sheet resistance value deviates from the target value, the control system immediately feeds back the deviation signal to the evaporation assembly 7, the deposition amount of the evaporation material is corrected by dynamically adjusting the heating power of the evaporation boat 71 or the conveying speed of the base film 4, closed-loop feedback control is realized, and the technical problems of large sheet resistance value fluctuation and poor performance consistency in the background art due to the lack of real-time detection feedback mechanism are effectively solved; The base film 4 that passes the detection is sequentially wound around the tension roller 14 for tension control, the induction heating roller 16 for annealing treatment of the metal film layer to eliminate internal stress and improve crystalline quality, and the fourth flattening roller 15 for final flattening before entering the constant temperature box 17, the base film 4 is slowly cooled and the film-base interface is combined in the constant temperature environment maintained by the heating pipe 18 in the constant temperature box 17, and finally wound on the material receiving mechanism 3 to complete the continuous preparation process of the composite metal film, the process flow controls the sheet resistance value fluctuation range of the product within ±5%, significantly improves the production yield, and meets the high-precision quality demand of the composite metal film product in the fields of high-end electronics and new energy.

[0036] It is to be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting; it is not intended to exclude myriad other embodiments of the present application that other inventors can develop based on the same general inventive concepts embodied by the described embodiments. That is, although the present application is described in terms of particular embodiments and implementations, it is to be understood that the terminology used is for the purpose of descriptive clarity and that it should be taken in a descriptive sense and not a limiting sense.

[0037] While the embodiments of the application have been shown and described herein, it is to be understood that the application is not limited to these embodiments. Rather, many modifications, changes, substitutions, and alterations can be made to the embodiments of the application without departing from the spirit and scope of the application as defined by the appended claims and their equivalents.

Claims

1. A composite metal film evaporation preparation device, comprising a vacuum cavity (1) and a feeding mechanism (2) and a receiving mechanism (3) arranged in the vacuum cavity (1), a base film (4) is transmitted between the feeding mechanism (2) and the receiving mechanism (3), characterized in that, Also include: Plasma cleaning device (5) is arranged in the vacuum cavity (1) and is located on the conveying path of the base film (4), the plasma cleaning device (5) carries out impurity cleaning on the surface of the base film (4) and realizes the roughening treatment of the deposition surface; Cooling roller assembly (6) is arranged in the vacuum cavity (1) and is located downstream of the plasma cleaning device (5), the base film (4) passes through the cooling roller assembly (6) and realizes cooling; Evaporation assembly (7) is arranged in the vacuum cavity (1) and is adjacent to the cooling roller assembly (6), the evaporation assembly (7) deposits the vaporized evaporation material on the surface of the base film (4) and quickly solidifies into a film; Sheet resistance online detection assembly (8) is arranged in the vacuum cavity (1) and is located downstream of the cooling roller assembly (6), the base film (4) passes through the cooling roller assembly (6) and passes through the sheet resistance online detection assembly (8), the sheet resistance online detection assembly (8) detects the sheet resistance value of the base film (4) in real time and feeds back to adjust the process parameters of the evaporation assembly (7), and the treated base film (4) is finally wound to the material receiving mechanism (3).

2. The apparatus according to claim 1, wherein The vacuum cavity (1) is also provided with a low-temperature box (9), the low-temperature box (9) is located downstream of the feeding mechanism (2) and the base film (4) penetrates the inside of the low-temperature box (9), a plurality of water vapor capture tubes (10) are fixed on the inner wall of the low-temperature box (9) at equal intervals, and the water vapor capture tubes (10) adsorb and remove the water molecules on the surface of the passing base film (4).

3. The apparatus according to claim 1, wherein A plurality of first flattening rollers (11) are arranged in the vacuum cavity (1), the first flattening rollers (11) are located between the feeding mechanism (2) and the plasma cleaning device (5), and the base film (4) passes through each first flattening roller (11) in sequence to eliminate the conveying wrinkles.

4. The apparatus according to claim 3, wherein The cooling roller assembly (6) comprises: A first cooling roller (61) is arranged in the vacuum cavity (1) and is located downstream of the first flattening roller (11), the base film (4) passes through the first cooling roller (61) to realize preliminary cooling; A cooling main roller (62) is arranged in the vacuum cavity (1) and is located downstream of the first cooling roller (61), the base film (4) tightly abuts the outer surface of the cooling main roller (62) to realize sufficient cooling; A second flattening roller (63) is arranged in the vacuum cavity (1) and is located between the first cooling roller (61) and the cooling main roller (62), the base film (4) is corrected by the second flattening roller (63) and then enters the cooling main roller (62).

5. The apparatus according to claim 1, wherein The evaporation assembly (7) comprises: An evaporation boat (71) is arranged in the vacuum cavity (1) and is adjacent to the cooling main roller (62), two ends of the evaporation boat (71) are respectively provided with positive and negative electrodes (72), the positive and negative electrodes (72) are electrified to make the current flow through the evaporation boat (71) to generate resistance heating; A wire feeding reel (73) is arranged in the vacuum cavity (1) and has a wire-like evaporation material wound around the outer periphery. A wire feeding mechanism (74) is arranged in the vacuum cavity (1) and cooperates with the wire feeding disc (73) and the evaporation boat (71), which continuously feeds the evaporation material to the surface of the evaporation boat (71) and vaporizes it through heating, and the vaporized evaporation material is deposited on the surface of the base film (4) and rapidly solidifies.

6. The apparatus according to claim 5, wherein The evaporation boat (71) is also provided with a baffle (12) on the side, which guides and restricts the vaporized evaporation material to move in the vertical direction and deposit on the surface of the base film (4).

7. The apparatus according to claim 4, wherein The vacuum cavity (1) is also provided with a three-stage flattening roller (13) between the cooling main roller (62) and the square resistance online detection assembly (8), and the base film (4) is flattened by the three-stage flattening roller (13) before entering the square resistance online detection assembly (8).

8. The apparatus according to claim 1, wherein The vacuum cavity (1) is also provided with a tension roller (14) and a four-stage flattening roller (15) between the square resistance online detection assembly (8) and the material receiving mechanism (3), and the base film (4) is wound around the tension roller (14) to adjust the tension, and then flattened by the four-stage flattening roller (15) before being delivered to the material receiving mechanism (3).

9. The apparatus according to claim 8, wherein The vacuum cavity (1) is also provided with an induction heating roller (16) between the tension roller (14) and the four-stage flattening roller (15), and the base film (4) is wound around the outer surface of the induction heating roller (16) to anneal the metal film layer.

10. The apparatus according to claim 1, wherein The vacuum cavity (1) is also provided with a constant temperature oven (17) outside the material receiving mechanism (3), and the material receiving mechanism (3) is located inside the constant temperature oven (17), and a plurality of heating pipes (18) are arranged on the inner wall of the constant temperature oven (17) at equal intervals, which keeps the wound base film (4) at a constant temperature to stabilize the performance of the metal film layer.

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