Baking device for light beam lines and control method
By unifying the management of the integrated baking equipment and the main controller, the problems of high baking power requirements and incomplete data recording in the ultra-high vacuum system of the beamline were solved, realizing automated process flow and automatic handling of abnormal states, thus improving baking efficiency and safety.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-24
- Publication Date
- 2026-04-03
AI Technical Summary
Existing ultra-high vacuum systems for beamlines suffer from high baking power requirements, incomplete data recording, cumbersome operation, and susceptibility to errors, especially in handling abnormal situations in a timely manner.
An integrated baking equipment is adopted, including several baking ovens, a degassing control cabinet, a main controller and a user terminal. The baking and degassing processes are uniformly managed by the main controller, realizing automated process flow and automatic handling of abnormal states.
It improves baking efficiency and safety, reduces manpower input, ensures the integrity and reliability of data recording, reduces the risk of human error, and achieves automated acquisition of ultra-high vacuum.
Smart Images

Figure CN121782846A_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of vacuum acquisition equipment technology, and specifically relates to baking equipment and control methods for beamlines. Background Technology
[0002] A beamline is an ultra-high vacuum system that transmits synchrotron X-rays to a sample. An ultra-high vacuum system refers to a vacuum system with an ultimate vacuum in the range of 1E-9 to 1E-5 Pa, primarily using an ion pump as the main pump. Achieving ultra-high vacuum requires prolonged high-temperature baking. The purpose of baking is to accelerate the release of gases adsorbed on the surface of the material within the vacuum, especially water vapor, reducing the outgassing rate of the material within the vacuum, thereby achieving ultra-high vacuum after cooling.
[0003] During the process of obtaining ultra-high vacuum, personnel need to monitor the baking temperature and vacuum level in real time, regularly degas the ion pump, collect relevant data in real time, and take appropriate protective measures in case of abnormal data. This process takes a long time (generally 3-5 days). For example, if the vacuum level rises abnormally (which may be due to a leak in the vacuum chamber), the baking process needs to be cooled down immediately, and the molecular pump unit needs to be isolated from the vacuum chamber.
[0004] Current ultra-high vacuum systems have the following drawbacks: 1. The long beam distance and distributed assembly of the baking oven place high demands on baking power. Furthermore, previous methods employed a distributed arrangement of baking power supplies, with separate power supplies for the main chambers.
[0005] 2. There is a large amount of beamline data, which needs to be recorded in real time during the baking process. In the past, manual observation and recording were carried out by personnel at regular intervals, usually every 1 to 2 hours, resulting in many data changes not being fully recorded during the process.
[0006] 3. Achieving ultra-high vacuum in a beamline vacuum system requires following a specific process flow, such as adhering to a pre-set heating-holding-cooling procedure, regular degassing operations using ion pumps and thermal gauges, and performing cooling and valve closure operations according to the established procedures in abnormal situations. Previously, on-site operation by personnel at set times, along with on-site judgment and handling of abnormalities, led to errors and delays in responding to emergencies. Summary of the Invention
[0007] To address the problems in the background art, the present invention proposes a baking device and control method for beamlines.
[0008] To achieve the above objectives, the present invention adopts the following technical solution: This application provides a baking apparatus for beamlines, comprising: Several baking ovens are arranged along the beam line direction, and adjacent baking ovens are connected by pipes; the baking ovens are equipped with baking controllers and baking equipment, and the baking controllers are used to control the temperature of the baking equipment. The degassing control cabinet includes a degassing controller, a vacuum gauge, an ion pump, and an isolation valve; the vacuum gauge, ion pump, and isolation valve are all electrically connected to the degassing controller; the vacuum gauge is connected to the baking oven via a pipeline to obtain the vacuum level of the baking oven and feed it back to the degassing controller; the ion pump is connected to the baking oven via a pipeline to extract gas from the baking oven; the isolation valve is installed on the pipeline between adjacent baking ovens. The main controller is electrically connected to both the baking controller and the degassing controller. The user terminal is connected to the main controller via the network for information exchange.
[0009] Furthermore, the baking oven is also equipped with several temperature sensors, single-phase thyristors, and heating belts; All temperature sensors are electrically connected to the baking equipment and the baking controller, respectively. At least one temperature sensor is used to acquire the temperature of the baking equipment and feed it back to the baking controller; at least one temperature sensor is used to acquire the temperature of the baking equipment and serve as a reference temperature for the remaining temperature sensors. The single-phase thyristor is electrically connected to the baking controller and is used to adjust the heating power according to the instructions of the baking controller; the heating belt is electrically connected to the single-phase thyristor and is used to heat the baking equipment according to the heating power.
[0010] Furthermore, there are two temperature sensors.
[0011] Furthermore, the main controller has a built-in cloud gateway module and / or human-machine interface operation module; Both the cloud grid module and the human-machine interface operation module are connected to the user terminal so that the user terminal can interact with the main controller.
[0012] Furthermore, user terminals include computers and mobile phones.
[0013] This application also provides a control method for a main controller, executed by the aforementioned baking device for beamlines, comprising the following steps: The main controller receives temperature data of the baking equipment uploaded by the baking controller, as well as vacuum level, ion pump status data and isolation valve opening data of the baking equipment uploaded by the degassing controller. Based on the received real-time data, the main controller sends control commands to the baking controller to regulate the temperature of the baking equipment, and / or sends control commands to the degassing controller to regulate the start, stop and degassing intensity of the ion pump and the opening degree of the isolation valve.
[0014] Furthermore, it also includes the following steps: The main controller transmits temperature data of the baking equipment, vacuum level of the baking equipment, status data of the ion pump, and opening degree of the isolation valve to the user terminal. The main controller receives user requests from user terminals. The main controller issues control commands to regulate the temperature of the baking equipment based on user requirements, and / or issues control commands to the degassing controller to regulate the degassing of the ion pump and the opening of the isolation valve.
[0015] This application also provides a control method for a baking controller, executed by the aforementioned baking device for beamlines, comprising the following steps: The baking controller acquires the temperature of the baking equipment and uploads it to the main controller; The baking controller receives control commands from the main controller to adjust the temperature of the baking equipment; After receiving the control command, the baking controller performs PID control based on the temperature of the baking equipment. When the difference between the temperature of the baking equipment and the set temperature exceeds the first set range, it is judged as abnormal and the power output of the baking equipment is cut off. If the difference between the temperature of the baking equipment and the set temperature is within the set range, then you can choose to adjust or maintain the power output of the baking equipment.
[0016] Furthermore, it also includes the following steps: The baking controller is equipped with at least two temperature sensors; After receiving the control command, the baking controller obtains the temperature of the baking equipment collected by one temperature sensor as the monitoring temperature, and at the same time obtains the temperature of the baking equipment collected by another temperature sensor as the reference temperature. The baking controller compares the monitored temperature with the reference temperature. If the temperature difference exceeds the second set range, it is determined to be abnormal and the power output of the baking equipment is cut off.
[0017] This application also provides a control method for a degassing controller, executed by the aforementioned baking equipment for beamlines, comprising the following steps: The degassing controller acquires the status data of the ion pump, the opening degree of the isolation valve, and the vacuum degree of the baking equipment collected by the vacuum gauge, and uploads the collected data to the main controller. The degassing controller receives control commands from the main controller to regulate the start, stop, and degassing intensity of the ion pump, as well as control commands to adjust the opening of the isolation valve. When degassing by the ion pump, the degassing controller obtains the real-time vacuum level of the baking equipment collected by the vacuum gauge. If the real-time vacuum level is within the set vacuum level range, the ion pump stops degassing. At the same time, the degassing controller determines whether the baking oven is leaking. If there is a leak, it controls the isolation valve to shut off the leaking baking oven.
[0018] The beneficial effects of this invention are: 1. This invention features a main controller, an oven, and a degassing control cabinet. During operation, the main controller centrally manages the oven and degassing controllers, replacing the tedious steps that previously required manual adjustment of the temperature of each oven, manual operation of the ion pump, and manual control of the isolation valve. This reduces manpower and avoids problems such as inaccurate temperature control, delayed vacuum adjustment, and incorrect valve opening / closing timing that are prone to occur during manual operation. It also reduces the impact of human error on the production process and improves baking efficiency. 2. This invention allows interaction between the main controller and the user terminal, enabling users to remotely monitor and adjust the parameters of the integrated device, thus improving security and controllability; 2. The integrated baking equipment of the present invention can communicate and store data with vacuum gauges, ion pumps, temperature sensors, isolation valves, etc., and can record the status, vacuum degree, temperature and other parameters of the equipment during the baking process at high frequency, improve the readability and traceability of data changes, and upload key data to the cloud, so that engineers can monitor the baking progress at any time and reduce the dependence on on-site personnel. 3. The integrated baking equipment of the present invention can automate the process of obtaining ultra-high vacuum, ensuring the correct execution of the process; at the same time, the automated handling of abnormal conditions can prevent the expansion of risks and the occurrence of irreversible damage, and reduce the dependence on the on-site experience of personnel.
[0019] Other features and advantages of the invention will be set forth in the following description, and will be apparent in part from the description, or may be learned by practicing the invention. The objects and other advantages of the invention may be realized and obtained by means of the structures pointed out in the description and the drawings. Attached Figure Description
[0020] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0021] Figure 1 A schematic diagram of the structure of a baking device for beamlines according to the present invention is shown; Figure 2 A control framework diagram of a baking apparatus for beamlines according to the present invention is shown; Figure 3 A flowchart of the control method for the integrated baking equipment of the present invention is shown; Figure 4 A flowchart of the control method of the main controller of the present invention is shown; Figure 5 A flowchart of the control method for the baking controller of the present invention is shown; Figure 6 A flowchart of the control method for the degassing controller of the present invention is shown. Detailed Implementation
[0022] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0023] like Figure 1 The diagram illustrates a baking device for beamlines, comprising a baking oven, a degassing control cabinet, a main controller, and a user terminal. Several baking ovens are arranged along the beamline direction, and adjacent ovens are detachably connected via pipelines to form a continuous beamline processing channel. Each baking oven contains baking equipment and a baking controller, which are electrically connected to the baking equipment to control its operating temperature. This embodiment does not limit the number of baking ovens; however, three are preferably used as an example.
[0024] like Figure 2 As shown, the baking oven is also equipped with several temperature sensors, a single-phase thyristor, and a heating element. All temperature sensors are electrically connected to the baking equipment and the baking controller, respectively. At least one temperature sensor is used to acquire the temperature of the baking equipment in real time and feed it back to the baking controller. The temperature acquired by at least one temperature sensor serves as a reference temperature for the other temperature sensors (preferably, two PT100 temperature sensors are used, one for monitoring and the other for reference). The single-phase thyristor is electrically connected to the baking controller and is used to dynamically adjust the heating power according to the controller's instructions. The heating element is electrically connected to the single-phase thyristor and heats the baking equipment based on the adjusted heating power, ensuring a stable temperature field within the baking oven. Furthermore, the integrated baking equipment has 12 channels, each capable of meeting a 2kW baking power requirement, allowing for simultaneous baking in multiple ovens.
[0025] The degassing control cabinet integrates a degassing controller, vacuum gauge, ion pump, and isolation valve. Each component is electrically connected to the degassing controller to form a closed-loop control link. Furthermore, the vacuum gauge is connected to the baking oven via piping, allowing real-time acquisition of vacuum data within the oven and feedback to the degassing controller. The ion pump, also connected to the baking oven via piping, extracts gas from the oven under the control of the degassing controller, reducing the gas partial pressure to approach an ultra-high vacuum state. Isolation valves are installed on the piping between adjacent baking ovens to control the connection or isolation of adjacent ovens, achieving zoned vacuum control. The vacuum gauge, ion pump, and isolation valve are all electrically connected to the degassing controller, ensuring centralized control of all components.
[0026] It should be noted that the aforementioned integrated baking equipment can communicate and store data with vacuum gauges, ion pumps, temperature sensors, isolation valves, etc., at a frequency of up to milliseconds. This enables high-frequency recording of parameters such as equipment status, vacuum level, and temperature during the baking process, improving data readability and traceability of changes. By uploading key data to the cloud, engineers can monitor the baking progress at any time, reducing reliance on on-site personnel.
[0027] The main controller is electrically connected to the baking controllers of each baking oven and the degassing controller of the degassing control cabinet, enabling data acquisition and command issuance. The main controller has a built-in cloud gateway module and / or a Human Machine Interface (HMI) module, establishing a connection with user terminals via a network. User terminals include computers and mobile phones, supporting remote or local information interaction. Furthermore, the cloud gateway module, through cloud configuration, enables remote monitoring of the baking oven's data and remote shutdown in case of abnormalities.
[0028] It should be noted that this embodiment does not limit the selection of equipment such as the main controller, baking oven, and degassing controller. For example, the main controller consists of a CPU and multiple expansion modules, supplemented by other general electrical hardware. Functionally, it integrates feedback information from lower-level systems, processes it according to the control logic set inside the CPU, and then sends control commands to the lower-level systems.
[0029] For example, the baking oven is mainly composed of a remote slave station and multiple expansion modules, supplemented with other functional hardware (such as a single-phase thyristor AC voltage regulator module and a current transmitter) and general electrical hardware. Functionally, the slave station receives control commands from the main controller, outputs analog control signals to control the voltage regulator module, and uses the voltage regulator module to control the power of the heating equipment, thereby indirectly achieving temperature control. The temperature control system also has an interface for acquiring temperature information and uploading it to the main controller via the slave station.
[0030] For example, the degassing control cabinet mainly consists of a remote slave station and multiple expansion modules, supplemented by other general electrical hardware. Functionally, the system collects the values from the vacuum gauge, which are then uploaded from the slave station to the main controller. The main controller, combined with the current cavity vacuum level and external commands, issues control commands to the slave station to control the working status of the ion pump and gate valve, thereby realizing the degassing function and safety interlock function.
[0031] For example, the human-machine interface (HMI) operation module uses an industrial touchscreen as the HMI operating system to realize human-machine interaction. Functionally, the main controller provides the current operating status data of other systems, which is then displayed in real time by the operating system. Users refer to the real-time operating status of other systems and input control requirements to the main controller through the operating system according to actual needs. After receiving the requirements, the main controller processes the requirement information and outputs corresponding control commands to other systems.
[0032] like Figure 3 The aforementioned method for controlling an integrated baking equipment includes the following steps: S1: The main controller receives data from the baking controller and the degassing controller, and interacts with the user terminal through the cloud gateway module / human-machine interface operation module. Then the main controller issues control commands, which can be obtained by the main controller itself or input through the user terminal.
[0033] S2: The degassing controller and the baking controller adjust based on the received control commands.
[0034] It should be noted that the control method of the integrated baking equipment covers three dimensions: the main controller, the baking controller, and the degassing controller. It supports both independent control and coordinated control among these components. The following section will discuss this in conjunction with... Figures 4-6 Please provide an explanation.
[0035] like Figure 4 As shown, the control method of the main controller includes two modes: automatic control and user command response, as detailed below: A1: The main controller receives in real time the baking equipment temperature data uploaded by each baking controller, as well as the baking oven vacuum degree, ion pump status data (such as operating status, fault information, etc.) and isolation valve opening data uploaded by the degassing controller. A2a: Based on the received real-time data, the main controller analyzes the equipment operating status through a preset algorithm, sends temperature control commands to the corresponding baking controller, and / or sends control commands to the degassing controller regarding the degassing intensity of the ion pump and the opening degree of the isolation valve.
[0036] A2b: The main controller transmits all collected real-time data (temperature, vacuum, equipment status, etc.) to the user terminal for user viewing; at the same time, it receives user requests (such as setting target temperature, target vacuum, etc.) from the user terminal, and based on these requests, sends control commands to the baking controller to regulate the temperature of the baking equipment, and / or sends control commands to the degassing controller to regulate the degassing of the ion pump and the opening of the isolation valve, thereby achieving personalized control.
[0037] like Figure 5 The diagram shows the control method for the baking controller, with the specific steps as follows: B1: The baking controller acquires the temperature data of the baking equipment through the configured temperature sensor and uploads it to the main controller in real time.
[0038] B2a: After receiving the temperature control command from the main controller, the baking controller performs PID control based on the current temperature of the baking equipment. If the temperature difference between the baking equipment and the set temperature exceeds the first set range, it is judged as abnormal and the power output of the baking equipment is immediately cut off to avoid damage to the equipment. If the temperature difference is within the first set range, the power output of the heating belt is adjusted or the current power is maintained according to the size of the difference.
[0039] B2b: When at least two temperature sensors are configured, the baking controller acquires the data collected by one of the temperature sensors as the monitoring temperature and the other as the reference temperature. The monitoring temperature is compared with the reference temperature. If the temperature difference exceeds the second set range, it is determined to be abnormal, the power output of the baking equipment is immediately cut off, and the abnormal information is fed back to the main controller.
[0040] It should be noted that after the baking controller performs PID control, it can adjust the output power according to the single-phase thyristor to achieve temperature regulation of the heating belt, thereby achieving temperature regulation of the baking equipment. Additionally, the purpose of using two temperature sensors is to achieve safety redundancy in temperature control. Therefore, in the baking oven (within the same vacuum chamber), two temperature sensors are used: one for temperature control and one for temperature measurement. When the two temperatures differ significantly, it is considered abnormal, and the baking power output needs to be cut off immediately.
[0041] It should be further explained that, for the baking oven, the temperature of its internal baking equipment is a temperature-time curve from room temperature to the highest temperature (e.g., 120℃). In step B2a, the baking controller performs PID control based on the temperature-time curve.
[0042] like Figure 6 The diagram shows a control method for a degassing controller, with the specific steps as follows: D1: The degassing controller acquires the status data of the ion pump, the current opening degree of the isolation valve, and the real-time vacuum degree of the baking oven collected by the vacuum gauge in real time, and uploads all data to the main controller.
[0043] D2: After receiving the control command from the main controller, it controls the start, stop and degassing intensity of the ion pump, and adjusts the opening degree of the isolation valve.
[0044] D3: When degassing is performed by the ion pump, the degassing controller continuously monitors the real-time vacuum level collected by the vacuum gauge. When the real-time vacuum level reaches the set vacuum level range, the controller controls the ion pump to stop degassing and maintain the vacuum state. At the same time, the degassing controller judges whether there is a leak in the corresponding baking oven by parameters such as the rate of change of vacuum level. If a leak is detected, the controller immediately controls the isolation valve to shut off the corresponding baking oven and isolate the leak area.
[0045] It should be noted that, based on the control method of the degassing controller, the operating logic of the degassing control cabinet is as follows: 1) The vacuum level of the baking equipment (vacuum chamber) is collected using a vacuum gauge.
[0046] 2) According to the established process flow, the ion pump is subjected to high-pressure degassing. The real-time voltage and current of the ion pump are monitored. The ion pump degassing is divided into three levels: 3KV, 5KV and 7KV. In each level, when the measured voltage is >80% of the voltage of the current level, the degassing of the next level can be automatically started.
[0047] 3) During the degassing process, the vacuum level will first deteriorate and then improve. The deterioration is due to the large amount of gas released by the ion pump in the initial stage of applying high pressure, while the improvement is due to the gradual improvement of the pumping speed after the gas is released. A degassing threshold for the vacuum level is set; when the vacuum level triggers the degassing threshold, the high pressure of the ion pump can be removed.
[0048] 4) Set a vacuum leakage threshold during the baking process. When the leakage threshold is triggered, the isolation valves before and after the cavity will be automatically closed to reduce the baking temperature. This is to prevent the internal vacuum components from oxidizing after leakage and to prevent the ultra-high vacuum of other cavities from being affected, and to reduce leakage in time.
[0049] Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims
1. A baking apparatus for beamlines, characterized in that, include: Several baking ovens are arranged along the beam line direction, and adjacent baking ovens are connected by pipes; each baking oven has a baking controller and baking equipment inside, and the baking controller is used to control the temperature of the baking equipment. The degassing control cabinet includes a degassing controller, a vacuum gauge, an ion pump, and an isolation valve; the vacuum gauge, ion pump, and isolation valve are all electrically connected to the degassing controller; the vacuum gauge is connected to the baking oven via a pipeline to obtain the vacuum level of the baking oven and feed it back to the degassing controller; the ion pump is connected to the baking oven via a pipeline to extract gas from the baking oven; the isolation valve is installed on the pipeline between adjacent baking ovens. The main controller is electrically connected to both the baking controller and the degassing controller. The user terminal is connected to the main controller via the network for information exchange.
2. The baking apparatus for beamlines according to claim 1, characterized in that, The oven is also equipped with several temperature sensors, a single-phase thyristor, and a heating belt; All of the temperature sensors are electrically connected to the baking equipment and the baking controller, respectively. At least one of the temperature sensors is used to acquire the temperature of the baking equipment and feed it back to the baking controller; at least one of the temperature sensors is used to acquire the temperature of the baking equipment and serve as a reference temperature for the remaining temperature sensors. The single-phase thyristor is electrically connected to the baking controller and is used to adjust the heating power according to the instructions of the baking controller; the heating belt is electrically connected to the single-phase thyristor and is used to heat the baking equipment according to the heating power.
3. The baking apparatus for beamlines according to claim 2, characterized in that, Two temperature sensors are provided.
4. The baking apparatus for beamlines according to claim 1, characterized in that, The main controller has a built-in cloud gateway module and / or human-machine interface operation module; Both the cloud grid module and the human-machine interface operation module are connected to the user terminal so that the user terminal can interact with the main controller.
5. A baking apparatus for beamlines according to any one of claims 1-4, characterized in that, The user terminals include computers and mobile phones.
6. A control method for a main controller, executed by a baking apparatus for beamlines as described in any one of claims 1-5, characterized in that, Includes the following steps: The main controller receives temperature data of the baking equipment uploaded by the baking controller, as well as vacuum level, ion pump status data and isolation valve opening data of the baking equipment uploaded by the degassing controller. Based on the received real-time data, the main controller sends control commands to the baking controller to regulate the temperature of the baking equipment, and / or sends control commands to the degassing controller to regulate the start, stop and degassing intensity of the ion pump and the opening degree of the isolation valve.
7. The control method for a main controller according to claim 6, characterized in that, It also includes the following steps: The main controller transmits temperature data of the baking equipment, vacuum level of the baking equipment, status data of the ion pump, and opening degree of the isolation valve to the user terminal. The main controller receives user requests from user terminals. The main controller issues control commands to regulate the temperature of the baking equipment based on user requirements, and / or issues control commands to the degassing controller to regulate the degassing of the ion pump and the opening of the isolation valve.
8. A control method for a baking controller, executed by a baking apparatus for beamlines as described in any one of claims 1-5, characterized in that, Includes the following steps: The baking controller acquires the temperature of the baking equipment and uploads it to the main controller; The baking controller receives control commands from the main controller to adjust the temperature of the baking equipment; After receiving the control command, the baking controller performs PID control based on the temperature of the baking equipment. When the difference between the temperature of the baking equipment and the set temperature exceeds the first set range, it is judged as abnormal and the power output of the baking equipment is cut off. If the difference between the temperature of the baking equipment and the set temperature is within the set range, then you can choose to adjust or maintain the power output of the baking equipment.
9. The control method of a baking controller according to claim 8, characterized in that, It also includes the following steps: The baking controller is equipped with at least two temperature sensors; After receiving the control command, the baking controller obtains the temperature of the baking equipment collected by one temperature sensor as the monitoring temperature, and at the same time obtains the temperature of the baking equipment collected by another temperature sensor as the reference temperature. The baking controller compares the monitored temperature with the reference temperature. If the temperature difference exceeds the second set range, it is determined to be abnormal and the power output of the baking equipment is cut off.
10. A control method for a degassing controller, executed by a baking apparatus for beamlines as described in any one of claims 1-5, characterized in that, Includes the following steps: The degassing controller acquires the status data of the ion pump, the opening degree of the isolation valve, and the vacuum degree of the baking equipment collected by the vacuum gauge, and uploads the collected data to the main controller. The degassing controller receives control commands from the main controller to regulate the start, stop, and degassing intensity of the ion pump, as well as control commands to adjust the opening of the isolation valve. When degassing by the ion pump, the degassing controller obtains the real-time vacuum level of the baking equipment collected by the vacuum gauge. If the real-time vacuum level is within the set vacuum level range, the ion pump stops degassing. At the same time, the degassing controller determines whether the baking oven is leaking. If there is a leak, it controls the isolation valve to shut off the leaking baking oven.