Cleaning device and working method of cleaning device

Abstract

The invention discloses a cleaning device and a working method of the cleaning device, the device comprises a first end and a second end, the first end is used for supplying gas, and the second end is used for being connected with a to-be-cleaned structure; the two ends of the first liquid supply system are connected with the first end and the second end correspondingly, and the first liquid supply system introduces cleaning liquid into the structure to be cleaned through the second end; and the first liquid supply system is arranged on the bearing device. The cleaning device is safer in cleaning and has a stable cleaning effect.

Description

Technical Field

[0001] This invention relates to the field of liquid crystal display manufacturing, and more particularly to a cleaning apparatus and a method for operating the cleaning apparatus. Background Technology

[0002] In recent years, with the development of the information and communication field, the demand for various types of display devices has been increasing. Currently, mainstream display devices include liquid crystal displays (LCDs), plasma displays, electroluminescent displays (EMFs), and vacuum fluorescent displays (VFLDs). Due to their advantages such as being lightweight, thin, small in size, low in power consumption, and low in radiation, LCDs are widely used in various data processing devices, such as televisions, laptops, mobile phones, and personal digital assistants (PDAs).

[0003] Liquid crystal displays (LCDs) typically consist of two substrates: color filters (CFs) and thin-film transistors (TFTs). The primary material for color filters (CFs) is photoresist. During the photoresist production process, when using filling equipment to fill the photoresist, the piping of the filling equipment is an accessory that can be disassembled, cleaned, and reused.

[0004] Improving the cleanliness and efficiency of cleaning the piping of filling equipment is an ongoing problem that needs to be addressed. Summary of the Invention

[0005] The technical problem solved by this invention is to provide a cleaning device and a method for operating the cleaning device, so as to improve the cleanliness and efficiency of the piping of filling equipment.

[0006] To solve the above-mentioned technical problems, the present invention provides a cleaning device, comprising: a first end and a second end, wherein the first end is used to supply gas and the second end is used to connect to the structure to be cleaned; a first liquid supply system, wherein the two ends of the first liquid supply system are respectively connected to the first end and the second end, and the first liquid supply system supplies cleaning liquid into the structure to be cleaned through the second end; and a support device, wherein the first liquid supply system is disposed on the support device.

[0007] Optionally, the first liquid supply system includes: a first air pump connected to the first end and the second end; a first liquid storage tank connected to the first air pump; and a first gas-liquid mixing chamber disposed at the second end, the first gas-liquid mixing chamber including a plurality of interfaces, and the first air pump disposed between the first liquid storage tank and the first gas-liquid mixing chamber via a connecting pipeline.

[0008] Optionally, the first liquid supply system further includes: a first flow meter disposed between the first air pump and the first gas-liquid mixing chamber via a connecting pipeline, the first flow meter being connected to an interface of the first gas-liquid mixing chamber; a first pipeline connecting the first liquid storage tank and the first air pump; and a second pipeline connecting the first air pump and the first gas-liquid mixing chamber, the first flow meter being disposed on the second pipeline.

[0009] Optionally, the structure to be cleaned includes an inlet end and an outlet end, the first gas-liquid mixing chamber is connected to the inlet end, and the cleaning device further includes a second gas-liquid mixing chamber connected to the outlet end, the second gas-liquid mixing chamber includes several interfaces, and the first liquid storage tank is connected to one interface of the second gas-liquid mixing chamber.

[0010] Optionally, the cleaning device further includes a filter canister, which is connected to an interface of the second gas-liquid mixing chamber, and the filter canister is used to filter the gas entering the filter canister from the structure to be cleaned via the second gas-liquid mixing chamber.

[0011] Optionally, the cleaning device further includes a pressure relief valve disposed on the connecting pipeline between the first gas-liquid mixing chamber and the inlet end.

[0012] Optionally, the cleaning device further includes: a second liquid supply system, the second liquid supply system including: a second air pump connected to the first end and the second end; a second liquid storage tank connected to the second air pump, the second air pump being disposed between the second liquid storage tank and the connecting pipeline of the first gas-liquid mixing chamber.

[0013] Optionally, the second liquid supply system further includes: a second flow meter disposed between the second air pump and the connecting pipeline of the first gas-liquid mixing chamber, the second flow meter being connected to an interface of the first gas-liquid mixing chamber.

[0014] Optionally, the second liquid supply system further includes: a fifth pipeline connecting the second liquid storage tank and the second air pump; and a sixth pipeline connecting the second air pump and the first gas-liquid mixing chamber, wherein the second flow meter is disposed on the sixth pipeline.

[0015] Optionally, the supporting device includes: a first supporting surface, wherein the first air pump, the second air pump, the first liquid storage tank, and the second liquid storage tank are disposed on the first supporting surface; a second supporting surface, wherein the second supporting surface is disposed above the first supporting surface, the second supporting surface is used to support the cleaning tank and the cleaning support, the cleaning tank is used to soak the structure to be cleaned, and the cleaning support is used to support the structure to be cleaned; and a movable device, wherein the movable device is disposed at the bottom of the first supporting surface.

[0016] Accordingly, the present invention also provides a method for operating a cleaning device, comprising: providing a cleaning device; using the cleaning device to clean a structure to be cleaned; and using the cleaning device to blow-blow the structure to be cleaned.

[0017] Optionally, the cleaning device is used to clean the structure to be cleaned, including: using a first liquid supply system to circulate and clean the structure to be cleaned; and using a second liquid supply system to rinse the structure to be cleaned.

[0018] Optionally, when the first liquid supply system is used to perform cyclic cleaning of the structure to be cleaned, the structure to be cleaned includes an inlet end and an outlet end, a first gas-liquid mixing chamber is connected to the inlet end, and a second gas-liquid mixing chamber is connected to the outlet end; the cyclic cleaning includes: a gas-driven first air pump, the first air pump draws cleaning liquid from the first storage tank and enters the structure to be cleaned from the inlet end through the first gas-liquid mixing chamber, and the cleaning liquid in the structure to be cleaned then enters the first storage tank from the second gas-liquid mixing chamber through the outlet end.

[0019] Optionally, when using the second liquid supply system to rinse the structure to be cleaned, the structure to be cleaned includes an inlet end and an outlet end, a first gas-liquid mixing chamber is connected to the inlet end, and a second gas-liquid mixing chamber is connected to the outlet end; the rinsing includes: a gas-driven second air pump, the second air pump drawing cleaning liquid from the second storage tank into the structure to be cleaned through the first gas-liquid mixing chamber from the inlet end, and the cleaning liquid in the structure to be cleaned then entering the first storage tank from the second gas-liquid mixing chamber through the outlet end; the cleaning liquid during the rinsing process enters the first storage tank from the second storage tank, and the cleaning liquid in the second storage tank is clean cleaning liquid.

[0020] Optionally, before using the first liquid supply system to perform circulating cleaning of the structure to be cleaned, the method further includes: using the first liquid supply system to pre-clean the structure to be cleaned; when using the first liquid supply system to pre-clean the structure to be cleaned, the structure to be cleaned includes an inlet end and an outlet end, a first gas-liquid mixing chamber is connected to the inlet end, and a waste liquid tank at the equipment end is connected to the outlet end; the pre-cleaning includes: a gas-driven first air pump, the first air pump drawing cleaning liquid from the first storage tank and entering the structure to be cleaned from the inlet end through the first gas-liquid mixing chamber, and the cleaning liquid in the structure to be cleaned then entering the waste liquid tank at the equipment end through the outlet end.

[0021] Optionally, the first end includes: a gas source processor and a gas collection chamber connected to the gas source processor. The gas source processor is connected to an external gas source. The gas collection chamber includes a first valve, a second valve, and a third valve. A first air pump is connected to the first valve, a second air pump is connected to the second valve, and a first gas-liquid mixing chamber is connected to the third valve. The cleaning device is used to purge the structure to be cleaned, including: closing the first and second valves, opening the third valve, and allowing gas to enter the structure to be cleaned from the inlet end through the first gas-liquid mixing chamber. The gas in the structure to be cleaned then enters the filter tank from the second gas-liquid mixing chamber from the outlet end.

[0022] Compared with the prior art, the technical solution of the present invention has the following beneficial effects:

[0023] The cleaning device of the present invention has two ends of a first liquid supply system connected to the first end and the second end respectively. The first liquid supply system supplies cleaning liquid into the structure to be cleaned through the second end. By simply connecting the pipes of the first end and the second end, the equipment can be automatically circulated for cleaning. The cleaning effect is highly consistent and does not affect the health of personnel. Cleaning or blowing can be started with one button, and the operation steps and methods are simplified, thus improving the cleaning efficiency.

[0024] Furthermore, the two ends of the second liquid supply system are connected to the first end and the second end respectively. The second liquid supply system introduces cleaning fluid into the structure to be cleaned through the second end. By simply connecting the pipes of the first end and the second end, the equipment can be automatically flushed, with a strong consistency in cleaning effect, without affecting personnel health. Cleaning or blowing can be started with one button, and the operation steps and methods are simplified, improving cleaning efficiency. Moreover, the cleaning fluid of the second liquid supply system can be returned to the first storage tank, which can realize the recycling of cleaning fluid and save costs.

[0025] Furthermore, the cleaning device introduces gas into the structure to be cleaned through the second end via gas entering from the first end, so as to dry the structure after cleaning is completed, thereby improving the cleanliness of the structure.

[0026] The working method of the cleaning device of the present invention involves supplying gas to the first end, and then using the gas supplied at the first end to drive the first liquid supply system to introduce cleaning liquid into the structure to be cleaned through the second end. By simply connecting the pipelines at the first and second ends, the equipment can automatically circulate and clean, achieving a high degree of consistency in cleaning effect without affecting personnel health. Cleaning or blowing can be started with a single button, and the operation steps and techniques are simplified, thereby improving cleaning efficiency. Attached Figure Description

[0027] Figures 1 to 3 These are schematic diagrams of the cleaning device from various perspectives in embodiments of the present invention. Detailed Implementation

[0028] As described in the background section, improving the cleanliness and efficiency of cleaning piping for filling equipment is a problem that needs to be addressed continuously.

[0029] Specifically, the piping of the filling equipment must be disassembled and soaked for cleaning after each use to avoid affecting subsequent filling. Each disassembly and soaking cleaning will cause the following problems: (1) Cumbersome steps: Each production end requires a complicated disassembly process, and hand washing after disassembly requires a lot of time and manpower; (2) Risk of damage: Hand washing after disassembly may damage parts due to improper operation, and the diaphragm of the hand valve often needs to be replaced; (3) Low cost-effectiveness: Soaking and hand washing takes a long time, and as production increases, the number of cleanings will continue to increase, which will inevitably form a production bottleneck in the long run; (4) Weak consistency: Hand washing may result in different cleaning effects due to different operators; (5) Poor safety: During cleaning, personnel need to soak their hands in the cleaning solvent, which may affect personnel health.

[0030] To address the aforementioned problems, the present invention provides a cleaning device and a method for operating the cleaning device. The two ends of the liquid supply system are connected to the first end and the second end, respectively. The liquid supply system introduces cleaning liquid into the structure to be cleaned through the second end. After supplying gas to the first end, the cleaning device can automatically begin cleaning the structure to be cleaned. The operation is simple, requires no complicated steps, improves cleaning efficiency, and has a good cleaning effect, avoiding health damage to personnel during operation.

[0031] To make the above-mentioned objectives, features and beneficial effects of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0032] Figures 1 to 3 These are schematic diagrams of the cleaning device from various perspectives in embodiments of the present invention.

[0033] Please refer to Figures 1 to 3 , Figure 1 This is a front view of the cleaning device. Figure 2 An oblique view that includes the front. Figure 3 The cleaning device, viewed from the side, includes:

[0034] A first end A and a second end B, wherein the first end A is used to supply gas and the second end B is used to connect to the structure 60 to be cleaned.

[0035] The first liquid supply system has two ends connected to the first end A and the second end B respectively, and the first liquid supply system supplies cleaning liquid into the structure 60 to be cleaned through the second end B.

[0036] The first liquid supply system is mounted on the support device 10.

[0037] The cleaning device has a first liquid supply system connected to the first end A and the second end B respectively. The first liquid supply system supplies cleaning liquid into the structure 60 to be cleaned through the second end B. After supplying gas to the first end A, the cleaning device can automatically start cleaning the structure 60 to be cleaned. The operation is simple, without complicated steps, improving cleaning efficiency and achieving good cleaning effect, while avoiding health damage to personnel during operation.

[0038] Please continue to refer to this. Figures 1 to 3 The first liquid supply system includes: a first air pump 201 connected to the first end A and the second end B; a first liquid storage tank 202 connected to the first air pump 201; and a first gas-liquid mixing chamber 203 disposed at the second end B. The first gas-liquid mixing chamber 203 includes several interfaces, and the first air pump 201 is disposed between the first liquid storage tank 202 and the connecting pipeline of the first gas-liquid mixing chamber 203.

[0039] The first liquid storage tank 202 is used to store cleaning fluid; the first air pump 201 is used to pump the cleaning fluid in the first liquid storage tank 202 into the first gas-liquid mixing chamber 203 at the second end B.

[0040] In this embodiment, the first liquid storage tank 202 is equipped with a liquid level line, so that the amount of cleaning fluid used in the first liquid storage tank 202 is visible, and timely replenishment and replacement of liquid are possible.

[0041] In this embodiment, the first air pump 201 is an acid and alkali resistant pneumatic diaphragm pump to meet the requirements of explosion-proof workshops; the first liquid storage tank 202 is made of 304 stainless steel to resist acid and alkali corrosion.

[0042] In other embodiments, the air pump may be other types of air pumps. The liquid storage tank may also be made of other materials that meet the required performance specifications.

[0043] In this embodiment, the cleaning fluid includes propylene glycol methyl ether acetate (PGMEA).

[0044] In other embodiments, the cleaning solution may be other types of cleaning solutions, such as deionized water, organic solutions with cleaning effects, etc.

[0045] The first air pump 201 automatically starts when it receives gas from the first end A. After starting, the first air pump 201 draws cleaning fluid from the first storage tank 202 and pumps it into the second end B, and then enters the structure 60 to be cleaned through the second end B.

[0046] In this embodiment, the structure to be cleaned 60 is a photoresist filling pipeline, which has an inlet end C1 and an outlet end C2, and the inlet end C1 is connected to the second end B.

[0047] In other embodiments, the structure to be cleaned may also be a tubular structure with other functions.

[0048] Please continue to refer to this. Figures 1 to 3 In this embodiment, the liquid supply system further includes: a first pipeline 301 connecting the first liquid storage tank 202 and the first air pump 201; and a second pipeline 302 connecting the first air pump 201 and the first gas-liquid mixing chamber 203.

[0049] The first pipeline 301 is used to transmit the cleaning fluid in the first storage tank 202, and the second pipeline 302 is used to transmit the cleaning fluid pumped in by the first air pump 201.

[0050] In this embodiment, the first pipe 301 and the second pipe 302 are made of Teflon flexible tubing. The Teflon flexible tubing has good shock resistance. When the first air pump 201 vibrates during operation, the first pipe 301 and the second pipe 302 are not easy to loosen or fall off, and the connection performance is good.

[0051] In other embodiments, the first pipeline and the second pipeline may be made of other materials that meet performance requirements.

[0052] Please continue to refer to this. Figures 1 to 3 The first liquid supply system further includes a first flow meter 204 disposed on a second pipeline 302 connecting the first air pump 201 and the first gas-liquid mixing chamber 203. The first flow meter 204 is connected to an interface of the first gas-liquid mixing chamber 203. The cleaning liquid enters the structure 60 to be cleaned via the first storage tank 202, the first air pump 201, the first flow meter 204 and the first gas-liquid mixing chamber 203.

[0053] The first flow meter 204 is used to monitor the flow rate and flow volume of the cleaning fluid in real time.

[0054] In this embodiment, the flow rate of the cleaning fluid is less than 1 meter per second.

[0055] In other embodiments, the first flow meter may not be required.

[0056] Please continue to refer to this. Figures 1 to 3The structure to be cleaned 60 includes an inlet end C1 and an outlet end C2. The first gas-liquid mixing chamber 203 is connected to the inlet end C1. The cleaning device further includes a second gas-liquid mixing chamber 205 connected to the outlet end C2. The second gas-liquid mixing chamber 205 includes several interfaces. The first liquid storage tank 202 is connected to one interface of the second gas-liquid mixing chamber 205.

[0057] In this embodiment, several of the interfaces also include a detection port 2051 for sampling and detecting the liquid that enters the second gas-liquid mixing chamber 205 via the structure to be cleaned 60.

[0058] Please continue to refer to this. Figures 1 to 3 The cleaning device further includes a filter canister 206, which is connected to an interface of the second gas-liquid mixing chamber 205. The filter canister 206 is used to filter the gas entering the filter canister 206 from the structure to be cleaned 60 via the second gas-liquid mixing chamber 205.

[0059] The filter canister 206 is equipped with an activated carbon filter screen. The filter canister 206 absorbs and filters the residual liquid in the gas that enters the second gas-liquid mixing chamber 205 through the structure to be cleaned 60, so as to discharge dry gas. The waste gas is discharged through the workshop organic exhaust gas to carry out environmental protection treatment of the waste gas.

[0060] In other embodiments, the filter canister may be omitted.

[0061] Please continue to refer to this. Figures 1 to 3 The cleaning device further includes: a third pipe 303 connecting the first gas-liquid mixing chamber 203 to the inlet end C1; and a fourth pipe 304 connecting the second gas-liquid mixing chamber 205 to the outlet end C2.

[0062] The third pipeline 303 is used to transmit the introduced gas, cleaning fluid, or gas-liquid mixture, and the fourth pipeline 304 is used to transmit the cleaning fluid, gas, or gas-liquid mixture through the structure to be cleaned 60.

[0063] In this embodiment, the third pipe 303 and the fourth pipe 304 are made of Teflon flexible tubing.

[0064] In this embodiment, the aperture of the third pipe 303 is larger than the aperture of the structure 60 to be cleaned, so as to ensure that a large flow of cleaning fluid can enter the structure 60 to be cleaned, and to have a large impact force when cleaning the structure 60 to be cleaned, thereby improving cleaning efficiency and cleaning effect.

[0065] In this embodiment, a check valve (not shown) is also provided between the third pipeline 303 and the first gas-liquid mixing chamber 203 to prevent gas backflow.

[0066] In other embodiments, the check valve may not be required.

[0067] In other embodiments, a one-way valve is provided between the third pipeline and the first gas-liquid mixing chamber, so that gas can only enter the third pipeline from the first gas-liquid mixing chamber and cannot flow back. The use of a one-way valve can save costs.

[0068] Please continue to refer to this. Figures 1 to 3 The cleaning device further includes a pressure relief valve (not shown) installed on the third pipeline 303.

[0069] In this embodiment, a pressure gauge is also provided on the third pipeline 303. When the pressure is greater than the preset value, the pressure relief valve on the third pipeline 303 will automatically open to relieve pressure and maintain the pipeline pressure stability.

[0070] In another embodiment, the pressure relief valve also has a pressure anomaly recording function, which facilitates subsequent tracing of the cause of the fault.

[0071] In other embodiments, the pressure relief valve may not be required.

[0072] Please continue to refer to this. Figures 1 to 3 The cleaning device further includes a second liquid supply system, which includes a second air pump 211 connected to the first end A and the second end B; and a second liquid storage tank 212 connected to the second air pump 211. The second air pump 211 is disposed between the second liquid storage tank 212 and the connecting pipeline of the first gas-liquid mixing chamber 203.

[0073] The second liquid storage tank 212 is used to store cleaning fluid; the second air pump 211 is used to pump the cleaning fluid in the second liquid storage tank 212 into the first gas-liquid mixing chamber 203 at the second end B.

[0074] In this embodiment, the second liquid storage tank 212 is equipped with a liquid level line, so that the amount of cleaning fluid used in the second liquid storage tank 212 is visible, and timely replenishment and replacement of liquid are possible.

[0075] In this embodiment, the second air pump 211 is an acid and alkali resistant pneumatic diaphragm pump to meet the requirements of explosion-proof workshops; the second liquid storage tank 212 is made of 304 stainless steel to resist acid and alkali corrosion.

[0076] In other embodiments, the air pump may be other types of air pumps. The liquid storage tank may also be made of other materials that meet the required performance specifications.

[0077] The second air pump 211 automatically starts when it receives gas from the first end A. After starting, the second air pump 211 draws cleaning fluid from the second storage tank 212 and pumps it into the second end B, and then enters the structure 60 to be cleaned through the second end B.

[0078] Please continue to refer to this. Figures 1 to 3 The second liquid supply system further includes: a fifth pipeline 305 connecting the second liquid storage tank 212 and the second air pump 211; and a sixth pipeline 306 connecting the second air pump 211 and the first gas-liquid mixing chamber 205.

[0079] The fifth pipeline 305 is used to transmit the cleaning fluid in the second storage tank 212, and the sixth pipeline 306 is used to transmit the cleaning fluid pumped in by the first air pump 201.

[0080] In this embodiment, the fifth pipe 305 and the sixth pipe 306 are made of Teflon tubing. Teflon tubing has good shock resistance. When the second air pump 211 vibrates during operation, the fifth pipe 305 and the sixth pipe 306 are not easy to loosen or fall off, and the connection performance is good.

[0081] In other embodiments, the fifth and sixth pipelines may be made of other materials that meet performance requirements.

[0082] In this embodiment, the second liquid supply system further includes a second flow meter 214 disposed between the connecting pipeline of the second air pump 211 and the first gas-liquid mixing chamber 203, the second flow meter being connected to an interface of the first gas-liquid mixing chamber 205, and the second flow meter 214 being disposed on the sixth pipeline 306.

[0083] The second flow meter 214 is used to monitor the flow rate of the cleaning fluid in real time.

[0084] In other embodiments, the second flow meter may not be required.

[0085] In other embodiments, the cleaning apparatus may exclude the second liquid supply system.

[0086] Please continue to refer to this. Figures 1 to 3 The first end A includes: a gas source processor 207 and a gas collection chamber 208 connected to the gas source processor 207. The gas source processor 207 is connected to an external gas source. The gas collection chamber 208 includes a first valve 2081, a second valve 2082 and a third valve 2083.

[0087] The first air pump 201 is connected to the first valve 2081, and the first valve 2081 is used to control whether gas enters the first air pump 201.

[0088] The second air pump 211 is connected to the second valve 2082, which is used to control whether gas enters the second air pump 211.

[0089] The first gas-liquid mixing chamber 203 is connected to the third valve 2083, which is used to control whether gas enters the first gas-liquid mixing chamber 203.

[0090] In this embodiment, the external gas source is clean and dry gas (CDA).

[0091] The gas collecting chamber 208 is equipped with a CDA pressure regulating component, which can control the gas pressure output via the gas source processor 207. In this embodiment, the gas pressure range is 0.2 MPa to 0.3 MPa.

[0092] In other embodiments, the CDA voltage regulating component may not be required.

[0093] Please continue to refer to this. Figures 1 to 3 The cleaning device further includes: a seventh pipeline 307 connecting the first valve 2081 and the first air pump 201; an eighth pipeline 308 connecting the second valve 2082 and the second air pump 211; and a ninth pipeline 309 connecting the first gas-liquid mixing chamber 203 and the third valve 2083.

[0094] The seventh pipeline 307 is used to transmit gas from the first end A to the first air pump 201; the eighth pipeline 308 is used to transmit gas from the first end A to the second air pump 211; and the ninth pipeline 309 is used to transmit gas to the first gas-liquid mixing chamber 203.

[0095] In this embodiment, the seventh pipe 307, the eighth pipe 308, and the ninth pipe 309 are made of acid and alkali resistant PE (polyethylene) pipes.

[0096] The working process of the first liquid supply system is as follows: the gas introduced at the first end A enters the first air pump 201 through the first valve 2081 and the seventh pipeline 307 to automatically start the first air pump 201. After the first air pump 201 is started, the cleaning liquid is drawn from the first storage tank 202 and enters the first air pump 201 through the first pipeline 301. The cleaning liquid then enters the first flow meter 204 through the second pipeline 302, and then enters the first gas-liquid mixing chamber 203 through the first flow meter 204. Finally, it enters the structure to be cleaned 60 through the third pipeline 303 to clean the structure to be cleaned 60.

[0097] The working process of the second liquid supply system is as follows: the gas introduced at the first end A enters the second air pump 211 through the second valve 2082 and the eighth pipeline 308 to automatically start the second air pump 211. After the second air pump 211 is started, the cleaning liquid is drawn from the second storage tank 212 and enters the second air pump 211 through the fifth pipeline 305. The cleaning liquid then enters the second flow meter 214 through the sixth pipeline 306, and then enters the first gas-liquid mixing chamber 203 through the second flow meter 214. Finally, it enters the structure to be cleaned 60 through the third pipeline 303 to clean the structure to be cleaned 60.

[0098] Please continue to refer to this. Figures 1 to 3 The cleaning device further includes: a cleaning tank 61 for carrying and soaking the structure 60 to be cleaned; a cleaning bracket 62 for supporting the structure 61 to be cleaned; a drain outlet (not shown) located at the bottom of the cleaning tank 204 for discharging the cleaning liquid in the cleaning tank 61; and a ninth pipeline (not shown) connecting the drain outlet and the first storage tank 202.

[0099] When the structure 60 to be cleaned needs to be soaked, the drain port is closed, and cleaning solution of a certain depth is added to the cleaning tank 61 to submerge the structure 60. After soaking, the drain port is opened, and the cleaning solution in the cleaning tank 61 is discharged into the first storage tank 202 through the ninth pipeline to achieve recycling of the cleaning solution. The drain port makes it convenient to inject and drain the solution into the cleaning tank 61 without manual handling.

[0100] The cleaning tank 61 is also equipped with a cleaning support 62. When the structure to be cleaned 60 does not need to be soaked, the structure to be cleaned 60 is placed on the cleaning support 62, and the third pipe 303 and the fourth pipe 304 are respectively connected to the two ends of the structure to be cleaned 60. The first air pump 201 is started with one button to realize the cyclic cleaning of the structure to be cleaned 60 and the drying after cleaning.

[0101] The cleaning device includes a cleaning tank 61, which can realize the individual rinsing and soaking functions of the structure 60 to be cleaned, shorten the length of the entire pipeline, and improve the cleaning effect.

[0102] In other embodiments, the cleaning tank can be omitted, and the third and fourth pipelines are respectively connected to both ends of the filling pipeline on the filling equipment. Cleaning can be achieved without removing the filling pipeline, which further simplifies the operation process and extends the service life of the disassembly valve of the filling pipeline.

[0103] In other embodiments, a cleaning bracket may not be required.

[0104] Please continue to refer to this. Figures 1 to 3The supporting device includes: a first supporting surface 101, on which the first air pump 201, the second air pump 202, the first liquid storage tank 202 and the second liquid storage tank 212 are disposed; and a second supporting surface 102, which is disposed above the first supporting surface 101, and is used to support the cleaning tank 61 and the cleaning bracket 62.

[0105] A support is provided between the first bearing surface 101 and the second bearing surface 102, and the first air pump 201, the second air pump 202, the first liquid storage tank 202 and the second liquid storage tank 212 are disposed in the space between the first bearing surface 101 and the second bearing surface 102.

[0106] In this embodiment, the material of the bearing device 10 includes 304 stainless steel, which has good resistance to acid and alkali corrosion and is easy to clean.

[0107] In other embodiments, the cleaning tank is not provided, and the second bearing surface may not be included.

[0108] Please continue to refer to this. Figures 1 to 3 The supporting device also has a movable device 70, which is disposed at the bottom of the first supporting surface 101.

[0109] The movable device 70 can move the cleaning device, making the application site of the cleaning device more flexible. Personnel only need to push the cleaning device to the designated area, connect the inlet and outlet pipes, and start the machine to automatically complete the cleaning without complicated disassembly steps.

[0110] The movable device 70 includes pulleys, sliders, etc. The pulleys include casters, one-way wheels, etc., and the sliders move between devices by cooperating with guide rails.

[0111] In this embodiment, the supporting device 10 includes a movable handcart.

[0112] In other embodiments, the support device may also be other types of structures suitable for production.

[0113] The cleaning device has a first liquid supply system connected to the first end A and the second end B respectively. The first liquid supply system supplies cleaning liquid into the structure 60 to be cleaned through the second end B. By simply connecting the pipes of the first end A and the second end B, the equipment can automatically circulate and clean, achieving a high degree of consistency in cleaning effect without affecting personnel health. Cleaning or blowing can be started with a single button, simplifying operation steps and techniques, and improving cleaning efficiency.

[0114] Furthermore, the two ends of the second liquid supply system are connected to the first end A and the second end B respectively. The second liquid supply system supplies cleaning fluid into the structure 60 to be cleaned through the second end B. By simply connecting the pipes of the first end A and the second end B, the equipment can be automatically flushed, resulting in a highly consistent cleaning effect without affecting personnel health. Cleaning or blowing can be started with a single button, simplifying the operation steps and techniques, and improving cleaning efficiency. In addition, the cleaning fluid of the second liquid supply system can be returned to the first storage tank 202, enabling the recycling of the cleaning fluid and saving costs.

[0115] Accordingly, embodiments of the present invention also provide a method for operating a cleaning device, comprising:

[0116] Provide such as Figures 1 to 3 The aforementioned cleaning device;

[0117] The cleaning device is used to clean the structure 60 to be cleaned.

[0118] The cleaning device is used to blow clean the structure 60 to be cleaned.

[0119] The cleaning device operates by supplying gas to the first end A, and then using the gas supplied to the first end A to drive the first liquid supply system to introduce cleaning liquid into the structure 60 to be cleaned through the second end B. By simply connecting the pipes of the first end A and the second end B, the equipment can automatically circulate and clean, achieving consistent cleaning results without affecting personnel health. Cleaning or blowing can be started with a single button, simplifying operation steps and techniques, and improving cleaning efficiency.

[0120] In this embodiment, the cleaning device is used to clean the structure 60 to be cleaned, including: using a first liquid supply system to circulate and clean the structure 60 to be cleaned; and using a second liquid supply system to rinse the structure 60 to be cleaned.

[0121] In this embodiment, the cleaning device is used to clean the structure 60 to be cleaned, which further includes: pre-cleaning the structure 60 to be cleaned using the first liquid supply system before circulating the cleaning process. This pre-cleaning washes away some of the dirt, ensuring that the cleaning fluid circulating in the first storage tank 202 is not overly contaminated during subsequent circulating cleaning, thus improving the utilization rate of the cleaning fluid.

[0122] When the first liquid supply system is used to pre-clean the structure 60 to be cleaned, the structure 60 to be cleaned includes an inlet end C1 and an outlet end C2. The first gas-liquid mixing chamber 203 is connected to the inlet end C1, and the waste liquid tank at the equipment end is connected to the outlet end C2. The pre-cleaning using the first liquid supply system includes: a gas-driven first air pump 201, the first air pump 201 drawing cleaning liquid from the first storage tank 202 and entering the structure 60 to be cleaned from the inlet end C1 through the first gas-liquid mixing chamber 203, and the cleaning liquid in the structure 60 to be cleaned then entering the waste liquid tank at the equipment end through the outlet end C2.

[0123] During pre-cleaning, a first flow meter 204 is used to monitor the flow rate and volume of the cleaning fluid. The pre-cleaning process stops when 5 kg of cleaning fluid has been consumed. The waste liquid generated during pre-cleaning is discharged directly from the outlet C2 of the structure to be cleaned into a waste liquid tank.

[0124] In other embodiments, pre-cleaning may not be necessary.

[0125] In this embodiment, when the first liquid supply system is used to perform cyclic cleaning on the structure 60 to be cleaned, the structure 60 to be cleaned includes an inlet end C1 and an outlet end C2. The first gas-liquid mixing chamber 203 is connected to the inlet end C1, and the second gas-liquid mixing chamber 205 is connected to the outlet end C2.

[0126] The first liquid supply system is used to perform cyclic cleaning of the structure 60 to be cleaned. The cyclic cleaning includes: a gas-driven first air pump 201, which draws the cleaning liquid from the first storage tank 202 and enters the structure 60 to be cleaned from the inlet end C1 through the first gas-liquid mixing chamber 203. The cleaning liquid in the structure 60 to be cleaned then enters the first storage tank 202 from the second gas-liquid mixing chamber 205 through the outlet end C2.

[0127] Specifically, the gas introduced at the first end A enters the first air pump 201 through the first valve 2081 and the seventh pipeline 307, automatically starting the first air pump 201. After starting, the first air pump 201 draws cleaning fluid from the first storage tank 202, which then enters the first air pump 201 through the first pipeline 301. The cleaning fluid then enters the first flow meter 204 through the second pipeline 302, and then enters the first gas-liquid mixing chamber 203 through the first flow meter 204. Finally, it enters the structure to be cleaned 60 through the third pipeline 303 for cyclic cleaning. During the cyclic cleaning process, the cleaning fluid is drawn out from the first storage tank 202 and then returned to the first storage tank 202.

[0128] In this embodiment, during the cyclic cleaning process, gas is introduced into the first gas-liquid mixing chamber 203 through the third valve 2083. The first gas-liquid mixing chamber 203 mixes the introduced gas and the cleaning liquid evenly, thereby improving the cleaning effect.

[0129] In this embodiment, when the second liquid supply system is used to rinse the structure 60 to be cleaned, the structure 60 to be cleaned includes an inlet end C1 and an outlet end C2. The first gas-liquid mixing chamber 203 is connected to the inlet end C1, and the second gas-liquid mixing chamber 205 is connected to the outlet end C2.

[0130] A second liquid supply system is used to rinse the structure 60 to be cleaned. The rinsing process includes: a gas-driven second air pump 211 drawing cleaning fluid from the second storage tank 212 and introducing it into the structure 60 to be cleaned through the inlet end C1 of the first gas-liquid mixing chamber 203; the cleaning fluid in the structure 60 then enters the first storage tank 202 through the outlet end C2 from the second gas-liquid mixing chamber 205. During the rinsing process, the cleaning fluid enters the first storage tank 202 from the second storage tank 212, and the cleaning fluid in the second storage tank 212 is clean.

[0131] In this embodiment, the rinsing process also includes: detecting the rinsing effect of the second liquid supply system.

[0132] The method for testing the flushing effect of the second liquid supply system includes: taking a sample of the cleaning liquid at the detection port 2051 of the second gas-liquid mixing chamber 205 to test the cleaning effect.

[0133] In one embodiment, the cleaning solution in the second storage tank contains a colorimetric agent, which can quickly determine the cleaning effect through colorimetric reaction during sampling and testing, replacing traditional indicator detection and shortening the detection time.

[0134] In one embodiment, the structure to be cleaned can be pre-cleaned using a first liquid supply system, then circulated and cleaned using the first liquid supply system, and finally rinsed using a second liquid supply system.

[0135] In another embodiment, the structure to be cleaned can be pre-cleaned using a first liquid supply system, then rinsed using a second liquid supply system, and then circulated cleaned using the first liquid supply system.

[0136] After cleaning the structure 60 to be cleaned, the structure 60 to be cleaned is blown to dry it.

[0137] In this embodiment, the first end A includes: a gas source processor 207 and a gas collection chamber 208 connected to the gas source processor 207. The gas source processor is connected to an external gas source. The gas collection chamber 208 includes a first valve 2081, a second valve 2082 and a third valve 2083. The first air pump 201 is connected to the first valve 2081, the second air pump 201 is connected to the second valve 2082, and the first gas-liquid mixing chamber 203 is connected to the third valve 2083.

[0138] In this embodiment, the cleaning device is used to purge the structure 60 to be cleaned, including: closing the first valve 2081 and the second valve 2082, opening the third valve 2083, and the gas entering the structure 60 to be cleaned from the inlet end C1 through the first gas-liquid mixing chamber 203. The gas in the structure 60 to be cleaned then enters the filter tank 206 from the second gas-liquid mixing chamber 205 through the outlet end C2.

[0139] The filter tank 206 can absorb the residual liquid carried out through the outlet end C2 of the structure to be cleaned 60, so as to discharge dry gas. The exhaust gas is discharged through the workshop organic exhaust gas, which improves environmental protection.

[0140] In this embodiment, during the purging process, when the pressure gauge on the third pipeline 303 exceeds the preset value, the pressure relief valve on the third pipeline 303 automatically opens to release pressure until the pressure drops to 0.5 MPa~0.6 MPa to maintain stable pipeline pressure.

[0141] In this embodiment, a check valve is also provided between the third pipeline 303 and the first gas-liquid mixing chamber 203 to prevent gas backflow.

[0142] The cleaning device introduces gas into the structure to be cleaned through the second end B via gas entering from the first end A, so as to dry the structure after cleaning and improve the cleanliness of the structure.

[0143] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A cleaning device, characterized in that, include: A first end and a second end, the first end being used to supply gas, and the second end being used to connect to the structure to be cleaned; A first liquid supply system, the two ends of which are respectively connected to the first end and the second end, and the first liquid supply system supplies cleaning liquid into the structure to be cleaned through the second end; A support device, wherein the first liquid supply system is mounted on the support device.

2. The cleaning device as described in claim 1, characterized in that, The first liquid supply system includes: a first air pump connected to the first end and the second end; a first liquid storage tank connected to the first air pump; and a first gas-liquid mixing chamber disposed at the second end, the first gas-liquid mixing chamber including a plurality of interfaces, and the first air pump disposed between the first liquid storage tank and the first gas-liquid mixing chamber via a connecting pipeline.

3. The cleaning device as described in claim 2, characterized in that, The first liquid supply system further includes: a first flow meter disposed between the first air pump and the first gas-liquid mixing chamber via a connecting pipe, the first flow meter being connected to an interface of the first gas-liquid mixing chamber; a first pipe connecting the first liquid storage tank and the first air pump; and a second pipe connecting the first air pump and the first gas-liquid mixing chamber, the first flow meter being disposed on the second pipe.

4. The cleaning device as described in claim 2, characterized in that, The structure to be cleaned includes an inlet end and an outlet end. The first gas-liquid mixing chamber is connected to the inlet end. The cleaning device further includes a second gas-liquid mixing chamber connected to the outlet end. The second gas-liquid mixing chamber includes several interfaces. The first liquid storage tank is connected to one interface of the second gas-liquid mixing chamber.

5. The cleaning device as described in claim 4, characterized in that, The cleaning device further includes a filter canister, which is connected to an interface of the second gas-liquid mixing chamber. The filter canister is used to filter the gas entering the filter canister from the structure to be cleaned via the second gas-liquid mixing chamber.

6. The cleaning apparatus as described in claim 4, characterized in that, The cleaning device further includes a pressure relief valve disposed on the connecting pipeline between the first gas-liquid mixing chamber and the inlet end.

7. The cleaning apparatus as described in claim 2, characterized in that, The cleaning device further includes a second liquid supply system, which includes a second air pump connected to the first end and the second end; and a second liquid storage tank connected to the second air pump, wherein the second air pump is disposed between the second liquid storage tank and the connecting pipeline of the first gas-liquid mixing chamber.

8. The cleaning apparatus as described in claim 7, characterized in that, The second liquid supply system further includes a second flow meter disposed between the second air pump and the first gas-liquid mixing chamber, the second flow meter being connected to an interface of the first gas-liquid mixing chamber.

9. The cleaning apparatus as described in claim 8, characterized in that, The second liquid supply system further includes: a fifth pipeline connecting the second liquid storage tank and the second air pump; and a sixth pipeline connecting the second air pump and the first gas-liquid mixing chamber, wherein the second flow meter is disposed on the sixth pipeline.

10. The cleaning apparatus as described in claim 7, characterized in that, The supporting device includes: a first supporting surface, on which the first air pump, the second air pump, the first liquid storage tank, and the second liquid storage tank are disposed; a second supporting surface, which is disposed above the first supporting surface and is used to support a cleaning tank and a cleaning support, wherein the cleaning tank is used to soak the structure to be cleaned and the cleaning support is used to support the structure to be cleaned; and a movable device, which is disposed at the bottom of the first supporting surface.

11. A method for operating a cleaning device, characterized in that, include: Provide a cleaning apparatus as described in any one of claims 1 to 10; The cleaning device is used to clean the structure to be cleaned; The cleaning device is used to blow clean the structure to be cleaned.

12. The operating method of the cleaning device as described in claim 11, characterized in that, The cleaning device is used to clean the structure to be cleaned, including: using a first liquid supply system to circulate and clean the structure to be cleaned; and using a second liquid supply system to rinse the structure to be cleaned.

13. The operating method of the cleaning device as described in claim 12, characterized in that, When the first liquid supply system is used to perform cyclic cleaning on the structure to be cleaned, the structure to be cleaned includes an inlet end and an outlet end. The first gas-liquid mixing chamber is connected to the inlet end, and the second gas-liquid mixing chamber is connected to the outlet end. The cyclic cleaning includes: a gas-driven first air pump, which draws cleaning liquid from the first storage tank and enters the structure to be cleaned from the inlet end through the first gas-liquid mixing chamber. The cleaning liquid in the structure to be cleaned then enters the first storage tank from the second gas-liquid mixing chamber through the outlet end.

14. The operating method of the cleaning device as described in claim 12, characterized in that, Before the first liquid supply system is used to perform circulating cleaning of the structure to be cleaned, the process further includes: pre-cleaning the structure to be cleaned using the first liquid supply system; when the first liquid supply system is used to pre-clean the structure to be cleaned, the structure to be cleaned includes an inlet end and an outlet end, a first gas-liquid mixing chamber is connected to the inlet end, and a waste liquid tank at the equipment end is connected to the outlet end; the pre-cleaning includes: a gas-driven first air pump, the first air pump drawing cleaning liquid from the first storage tank and entering the structure to be cleaned from the inlet end through the first gas-liquid mixing chamber, and the cleaning liquid in the structure to be cleaned then entering the waste liquid tank at the equipment end through the outlet end.

15. The operating method of the cleaning device as described in claim 12, characterized in that, When the second liquid supply system is used to rinse the structure to be cleaned, the structure to be cleaned includes an inlet end and an outlet end. The first gas-liquid mixing chamber is connected to the inlet end, and the second gas-liquid mixing chamber is connected to the outlet end. The rinsing includes: a gas-driven second air pump, which draws cleaning liquid from the second storage tank and enters the structure to be cleaned from the inlet end through the first gas-liquid mixing chamber. The cleaning liquid in the structure to be cleaned then enters the first storage tank from the second gas-liquid mixing chamber through the outlet end. The cleaning liquid in the second storage tank enters the first storage tank from the second storage tank during the rinsing process. The cleaning liquid in the second storage tank is clean.

16. The operating method of the cleaning device as described in claim 11, characterized in that, The first end includes: The system includes a gas source processor and a gas collection chamber connected to the gas source processor. The gas source processor is connected to an external gas source. The gas collection chamber includes a first valve, a second valve, and a third valve. A first air pump is connected to the first valve, a second air pump is connected to the second valve, and a first gas-liquid mixing chamber is connected to the third valve. The cleaning device is used to purge the structure to be cleaned, including: closing the first and second valves, opening the third valve, allowing gas to enter the structure to be cleaned from the inlet end through the first gas-liquid mixing chamber, and then allowing the gas in the structure to be cleaned to enter the filter tank from the outlet end through the second gas-liquid mixing chamber.

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