Ultra-low orbit neutral atomic oxygen beam ground test simulation method and device

By accelerating oxygen ions with an ECR ion oxygen source and a sheath electric field, combined with a customized neutralized pore grid and a screening magnetic field, the ground simulation problem of ultra-low orbit neutral atomic oxygen beams was solved, and high-precision aerodynamic testing was achieved.

CN121822883APending Publication Date: 2026-04-10BEIJING INST OF SPACECRAFT ENVIRONMENT ENG
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-12-19
Publication Date
2026-04-10

AI Technical Summary

Technical Problem

Existing technologies cannot accurately simulate neutral atomic oxygen beams in ultra-low orbit environments on the ground, especially failing to meet the requirements of rarefied gas conditions and high speeds, making aerodynamic testing difficult.

Method used

Oxygen ions are generated using an ECR ion oxygen source and accelerated by a sheath electric field. They are then neutralized by collision using a custom-designed neutralized pore grid and treated with a screening magnetic field to form a neutral atomic oxygen beam.

Benefits of technology

It achieves high-precision, low-cost ground simulation of neutral atomic oxygen beams in ultra-low orbit environments, meeting rarefied gas conditions and suitable for research on corrosion and aerodynamic properties of spacecraft materials.

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Abstract

The invention provides an ultra-low orbit neutral atomic oxygen beam ground test simulation method and device. The method comprises the steps that oxygen is ionized into oxygen ions through an ECR ion oxygen source; carrying out acceleration treatment on the obtained oxygen ions by adopting a sheath layer electric field generated at the upstream side, so that the accelerated oxygen ions penetrate through holes in the customized neutral hole gate, and the accelerated oxygen ions collide with hole wall surfaces in the customized neutral hole gate to be neutralized to form neutral atomic oxygen; and screening the neutralized oxygen ions based on a screening magnetic field arranged at the outlet of the customized neutralized hole gate to obtain a neutral atomic oxygen beam. According to the invention, collision neutralization of oxygen ions can be more effectively realized to obtain neutral atomic oxygen, screening treatment is carried out in cooperation with the screening magnetic field, and atomic oxygen beams with higher precision can be obtained.
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Description

Technical Field

[0001] This application relates to a method for simulating ground-based tests of neutral atomic oxygen beams in ultra-low orbit, specifically a method and apparatus for simulating ground-based tests of neutral atomic oxygen beams in ultra-low orbit. Background Technology

[0002] The dynamics of rarefied gases has significant applications in the aerospace field. The atmosphere in very low Earth orbit (LEO) is extremely thin, insufficient to sustain normal human life, yet it can significantly impact high-speed spacecraft. Impacts from high-speed atoms on spacecraft increase aerodynamic drag, causing orbital descent, even crashes, and reducing spacecraft lifespan. With the increasing application of LEO, there is a growing demand for accurate characterization of atmospheric drag. Direct on-orbit testing is too costly; ground-based simulations can significantly reduce costs, offering shorter iteration cycles and repeatability. The primary atmospheric component in the LEO environment (e.g., 300 km) is atomic oxygen, with an average velocity relative to satellites of approximately 7.9 km / s (approximately 5 eV energy). However, there is currently no ground-based simulation equipment for neutral beams in LEO. Achieving high-throughput ground-based simulation of a neutral beam at approximately 7.9 km / s is a key technical challenge. The specific challenges of ground-based simulation of LEO neutral beam environments are: 1) The beam must meet the rarefied gas conditions and must not produce viscous effects. Ultra-low Earth orbit (UOE) gas is a free molecular flow, belonging to the category of rarefied gases. Current wind tunnel equipment operates in continuous flow environments, which do not meet rarefied conditions; therefore, wind tunnel testing methods are unsuitable. 2) Ground-based methods for simulating neutral beams of approximately 7.9 km / s with high flux are immature. Simulating rarefied flows can currently be done using engine jets under vacuum conditions. However, the maximum jet velocity of current chemical propulsion methods (taking the hydrogen-oxygen engine with the highest specific impulse as an example) can only reach 3 km / s. The particle energy for stable operation of electric propulsion jets is at least 30 eV, corresponding to an O particle velocity of at least 20 km / s. Therefore, ground-based tests simulating neutral beams of approximately 7.9 km / s are not feasible.

[0003] Existing atomic oxygen sources use oxygen ionization to generate oxygen ions, which are then neutralized by a neutral target to obtain atomic oxygen. However, these sources suffer from problems such as uncontrolled atomic oxygen energy, low beam flux, and large atomic oxygen energy dissipation. This results in inaccurate source output conditions (uncontrolled energy) and very low aerodynamic forces, making it difficult to conduct aerodynamic force testing.

[0004] Therefore, it is necessary to provide a method and apparatus for simulating ground-based experiments with ultra-low orbit neutral atomic oxygen beams in order to solve one of the aforementioned technical problems. Summary of the Invention

[0005] The purpose of this application is to provide a method and apparatus for simulating ground-based experiments with neutral atomic oxygen beams in ultra-low orbit, which can solve at least one of the aforementioned technical problems. The specific solution is as follows:

[0006] According to a specific embodiment of this application, this application provides a ground test simulation method for ultra-low orbit neutral atomic oxygen beams, comprising: ionizing oxygen into oxygen ions using an ECR ion oxygen source; accelerating the obtained oxygen ions using a sheath electric field generated on the upstream side, so that the accelerated oxygen ions pass through the holes on a customized neutralized aperture grid, wherein the accelerated oxygen ions collide and neutralize with the hole walls on the customized neutralized aperture grid to form neutral atomic oxygen.

[0007] According to a specific embodiment of this application, this application also provides a ground test simulation device for ultra-low orbit neutral atomic oxygen beams, which performs the ground test simulation method for ultra-low orbit neutral atomic oxygen beams described in this application, including: an ECR oxygen ion source for ionizing oxygen into oxygen ions; a custom neutralization aperture grid for neutralizing oxygen ions to form oxygen atoms; a rectifier magnet for screening oxygen ions that can flow through the custom neutralization aperture grid, and disposed at the entrance of the custom neutralization aperture grid; and a screening magnetic field for performing the screening process of neutralized oxygen ions, and disposed at the exit of the custom neutralization aperture grid.

[0008] According to specific embodiments of this application, this application also provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the method described in any of the preceding claims.

[0009] According to specific embodiments of this application, this application also provides an electronic device, including: one or more processors; and a storage device for storing one or more programs, which, when executed by the one or more processors, cause the one or more processors to perform the method described in any of the preceding claims.

[0010] Compared with the prior art, the above-described solutions of this application have at least the following beneficial effects:

[0011] This application generates oxygen ions using an ECR ion oxygen source, accelerates the oxygen ions using a sheath electric field, and achieves more effective collision neutralization of oxygen ions to obtain neutral atomic oxygen through a customized neutralized pore grid with optimized structure. Combined with a screening magnetic field for screening, it can produce a more precise atomic oxygen beam. Attached Figure Description

[0012] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application. It is obvious that the drawings described below are merely some embodiments of this application, and those skilled in the art can obtain other drawings based on these drawings without any inventive effort. In the drawings:

[0013] Figure 1 This is a flowchart illustrating the ground-based simulation method for ultra-low orbit neutral atom oxygen beam experiments according to an embodiment of this application.

[0014] Figure 2 This is a cross-sectional structural diagram of the ultra-low orbit neutral atom oxygen beam ground test simulation device according to an embodiment of this application.

[0015] Figure 3 This is a schematic diagram of an example of a straight hole in a customized neutralized aperture grid in an ultra-low orbit neutral atom oxygen beam ground test simulation device, which is an embodiment of this application.

[0016] Figure 4 This is a schematic diagram of an example of the expansion aperture of a customized neutralized aperture grid in the ultra-low orbit neutral atom oxygen beam ground test simulation device of this application embodiment;

[0017] Figure 5 This is a partial structural diagram of the ultra-low orbit neutral atom oxygen beam ground test simulation device according to an embodiment of this application.

[0018] Figure 6 This is a partial structural diagram of the ultra-low orbit neutral atom oxygen beam ground test simulation device according to an embodiment of this application.

[0019] Figure 7 This is a schematic diagram of the electronic device structure shown in an embodiment of this application. Detailed Implementation

[0020] To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0021] The terminology used in the embodiments of this application is for the purpose of describing particular embodiments only and is not intended to limit the application. The singular forms “a,” “said,” and “the” used in the embodiments of this application and the appended claims are also intended to include the plural forms, and “multiple” generally includes at least two unless the context clearly indicates otherwise.

[0022] It should be understood that the term "and / or" used in this article is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this article generally indicates that the preceding and following related objects have an "or" relationship.

[0023] It should be understood that although the terms first, second, third, etc., may be used in the embodiments of this application, these descriptions should not be limited to these terms. These terms are only used to distinguish the descriptions. For example, first may also be referred to as second without departing from the scope of the embodiments of this application, and similarly, second may also be referred to as first.

[0024] It should also be noted that the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that an article or device that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such an article or device. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the article or device that includes said element.

[0025] This application provides a ground-based simulation method for ultra-low orbit neutral atomic oxygen beam experiments. Specifically, oxygen ions are generated using an ECR ion oxygen source, accelerated by a sheath electric field, and a customized neutralized aperture grid with optimized structure is used to more effectively achieve collision neutralization of oxygen ions to obtain neutral atomic oxygen. Combined with a screening magnetic field for screening, a higher precision atomic oxygen beam can be obtained.

[0026] It should be noted that the ground-based simulation method for ultra-low orbit neutral atomic oxygen beams in this application is designed to address the corrosion, drag, and other effects caused to spacecraft by high-speed neutral atomic oxygen in a rarefied atmosphere (especially ultra-low orbit). This application can meet the special requirements of the ultra-low orbit environment (such as a speed of 7.9 km / s and rarefied gas conditions). Through ground simulation devices, it can efficiently and accurately generate neutral atomic oxygen beams that are consistent with the ultra-low orbit environment, and the test cost is low.

[0027] The following is in conjunction with the appendix Figures 1 to 6 Detailed description of optional embodiments of the method of this application.

[0028] like Figure 1 As shown, in step S101, oxygen is ionized into oxygen ions using an ECR ion oxygen source.

[0029] In ground simulation experiments, an optimized device was used to generate a neutral atomic oxygen beam at approximately 7.9 km / s in an ultra-low orbit. The ultra-low orbit refers to a type of Earth orbit with an extremely low altitude, specifically between 150 km (approximately 93 mi) and 250 km (approximately 155 mi). In this orbit, the spacecraft faces atmospheric flow velocities ranging from approximately 7 km / s to 8 km / s, primarily composed of atomic oxygen and nitrogen. This invention focuses solely on ground simulations of atomic oxygen. Rare gas conditions refer to gas molecules with sufficiently low density that collisions between molecules no longer dominate. The Knudsen number is typically used to measure the rarefaction level; a Knudsen number greater than 0.1 is considered to meet rarefaction conditions.

[0030] like Figure 2 The apparatus shown includes an ECR oxygen ion source 1, a custom-designed neutralized aperture grid 2, a screening magnetic field 3 located at the exit of the custom-designed neutralized aperture grid 2, and a rectifier magnet 4 located at the entrance of the custom-designed neutralized aperture grid 2. Oxygen ions are generated by the ECR oxygen ion source, collide with the custom-designed neutralized aperture grid 2, and are then ejected to form a neutral atomic oxygen beam simulating an ultra-low orbit. The apertures on the custom-designed neutralized aperture grid are configured as straight apertures or expanded apertures.

[0031] Specifically, an ECR (Electron Cyclotron Resonance) ion source 1 is used to ionize oxygen into oxygen ions. That is, the ECR ion source is specifically responsible for ionizing oxygen to produce oxygen ions.

[0032] It should be noted that the above is only an optional example and should not be construed as a limitation of this application.

[0033] In step S102, the obtained oxygen ions are accelerated by the sheath electric field generated on the upstream side, so that the accelerated oxygen ions pass through the holes on the customized neutralized pore gate. The accelerated oxygen ions collide and neutralize with the hole walls on the customized neutralized pore gate to form neutral atomic oxygen.

[0034] Oxygen ions are continuously generated inside the discharge cavity, specifically within the discharge cavity of the ECR (electron cyclotron resonance) oxygen ion source. When a certain concentration of steady-state plasma is accumulated, a sheath electric field is generated within the ECR discharge cavity. Under the influence of the sheath electric field within the ECR discharge cavity, the generated oxygen ions are accelerated.

[0035] It should be noted that the upstream and downstream sides are defined by the direction of the neutral atomic oxygen beam. The sheath forms immediately adjacent to the boundary between the plasma and the entrance surface of the custom-centered aperture grid, i.e., on the upstream side of the custom-centered aperture grid. In the plasma, a sheath is generated within the ion source discharge cavity. This sheath is a thin, charge-separated region formed between the plasma and the device wall. The sheath is a region with a strong electric field, which accelerates positive ions away from the plasma mass and directs them towards the wall (or exit). Furthermore, the sheath can also form above the entrance of the custom-centered aperture grid.

[0036] Specifically, the obtained oxygen ions are accelerated using the sheath electric field generated on the upstream side to obtain a first energy (e.g., approximately 10 eV) so that the accelerated oxygen ions pass through pores on a custom-designed neutralized pore gate. The custom-designed neutralized pore gate is used to neutralize oxygen ions to form oxygen atoms.

[0037] Optionally, oxygen ions that can flow through the custom neutralized aperture grid 2 are filtered using a rectifier magnet before passing through it. The rectifier magnet is a replacement magnet disposed at the inlet of the custom neutralized aperture grid.

[0038] See Figure 3 , Figure 4 and Figure 5 The customized neutral aperture grid has multiple holes, including straight holes and expanded holes.

[0039] In a first optional embodiment, a plurality of holes are arranged on a customized neutral aperture grid, and the spacing between the holes on the customized neutral aperture grid is 0.4 mm to 0.8 mm. The holes on the customized neutral aperture grid are expansion holes.

[0040] The expansion hole includes a straight section and an expansion section.

[0041] Specifically, the sheath thickness is determined by calculating the sheath acceleration parameters, which include characteristic scales characterizing the electric field shielding in the plasma in the sheath electric field, such as sheath thickness, sheath length, and sheath potential.

[0042] It should be noted that, because the Debye shielding distance characterizes the characteristic scale of electric field shielding in plasma, it directly affects the thickness of the sheath and the effective area where ions are accelerated and focused within the sheath. Therefore, in this application, the sheath thickness is determined based on the Debye shielding distance defined within the cavity.

[0043] Specifically, the potential of the sheath is calculated using the following expression:

[0044]

[0045] Where, φ w T represents the potential of the sheath generated within the current cavity; e Let e ​​be the electron temperature at which steady-state plasma is generated in the current cavity; let m be the electron charge at which steady-state plasma is generated in the current cavity; let M be the mass of the oxygen atom (i.e., the mass of the oxygen ion); and let m be the electron mass. For example, if the electron temperature of the plasma is selected to be approximately 2eV to 5eV, then according to the above expression (1), the potential of the sheath, i.e., the wall potential, can be obtained to be approximately 4V to 21V.

[0046] The Debye shielding distance within the current cavity is calculated using the following expression:

[0047]

[0048] Where, λ d Indicates the Debye shielding distance within the current cavity; n e T is the plasma number density, k is the Boltzmann constant; e Let ε0 be the electron temperature at which steady-state plasma is generated within the current cavity; ε0 be the vacuum permittivity, which, after simplification, yields the following expression:

[0049]

[0050] Furthermore, based on the calculated Debye shielding distance within the current cavity, the thickness range of the sheath can be determined (specifically, 2 to 5 Debye shielding distances).

[0051] For example, the Debye shielding distance can be calculated for plasmas with specific electron temperatures and densities. For instance, with an electron temperature of 2.5 eV and a density of 10... 15 / m 3 Taking plasma as an example, its Debye shielding distance is about 0.4 mm, and the sheath thickness is a specified multiple of the Debye shielding distance, such as twice, that is, 2 Debye shielding distances as the sheath thickness.

[0052] It should be noted that in other embodiments, the sheath thickness can be three or four times the Debye shielding distance. The above is only provided as an optional example and should not be construed as a limitation of this application.

[0053] Based on the determined thickness of the sheath, the diameter of the straight section on the customized neutralized perforated grid is determined by simulation calculation, and the expansion angle of the expansion section is determined.

[0054] Optionally, the expansion angle is 8 degrees to 15 degrees (see details). Figure 4The aforementioned expansion angle (θ) effectively reduces the beam divergence angle of atomic oxygen, further optimizes beam directionality, and significantly improves beam flux. If the expansion angle is too large, the electric field formed in the sheath below the aperture will decrease, affecting oxygen ion collision and neutralization at the wall, resulting in lower neutralization efficiency. Conversely, if the expansion angle is too small, it will not be significantly different from a straight aperture, weakening the effect of optimizing beam direction.

[0055] The diameter of the straight section is 1mm to 2mm (see details). Figure 4 (referring to “a” in the text), the length d of the straight section is 1mm to 2mm. The total length of the expansion holes on the customized neutralized perforated grid is 3mm to 7mm (see details). Figure 4 (L' in the diagram). This ensures that oxygen ions collide with the pore wall once during their movement through the pore, and that the collision occurs within the pore between 0 and L'. L' is calculated as follows:

[0056]

[0057] Where a' represents the diameter of the straight section of the expanded hole on the customized neutralized aperture grid; L' represents the total length of the expanded hole on the customized neutralized aperture grid; Te is the plasma temperature. This represents the sheath potential.

[0058] Specifically, the custom-designed neutral aperture grid is made of titanium.

[0059] For example, the diameter of the hole is 2 * 0.4 mm * 2 (two Debye shielding distances) = 1.6 mm. The length L of the hole is chosen to be 5.0 mm.

[0060] In a second alternative embodiment, the diameter of the straight holes on the customized neutralized perforated grid is determined by simulation calculation based on the determined thickness of the sheath. The diameter of the straight holes is 1 mm to 2 mm (see details). Figure 3 In this example, "a" is equal to "a'".

[0061] Based on the determined thickness of the sheath, the diameter of the straight holes on the customized neutralized perforated grid is determined by simulation calculation, and the length of the straight holes is also calculated. The length of the straight holes is 3mm to 7mm (see details). Figure 3 In this example, L = L'.

[0062] By determining the parameters, the structure and layout of the holes on the customized neutralized aperture grid can be optimized. Expanding the hole structure can reduce the beam divergence angle of atomic oxygen, further optimize the beam directionality, and effectively improve the beam flux. Using a sheath electric field to accelerate oxygen ions eliminates the need for an additional accelerating grid, effectively solving the problem of excessively high oxygen ion energy, while also possessing the advantage of low dispersion of atomic oxygen energy.

[0063] It should be noted that the above is only an optional example and should not be construed as a limitation of this application.

[0064] In step S103, neutral oxygen ions are screened based on the screening magnetic field set at the outlet of the customized neutralized aperture grid to obtain a neutral atomic oxygen beam.

[0065] Specifically, a ring magnet is used to surround the outlet of a custom-designed neutralized aperture grid, forming a magnetic field perpendicular to the particle velocity direction to obtain a screening magnetic field. This screening magnetic field is used to perform a screening process to neutralize oxygen ions.

[0066] For example, the annular magnet is installed in a two-stage manner at the outlet of the customized neutralized aperture grid.

[0067] A screening magnetic field is used to screen neutralized oxygen ions to obtain a neutral atomic oxygen beam. Specifically, unneutralized oxygen ions are screened out and removed to obtain a neutral atomic oxygen beam. This effectively improves the purity of atomic oxygen.

[0068] Optionally, the sheath of the sheath electric field and the entrance of the customized neutralized aperture gate are connected by a chamfered connection (see details). Figure 5 The length of the chamfered connecting line is greater than 1 / 2d and less than d. The chamfer design effectively reduces the charge accumulation effect, thereby effectively preventing the risk of plasma sheath distortion near the entrance.

[0069] In one specific embodiment, oxygen ions generated by the ECR ion oxygen source are accelerated by the sheath to obtain, for example, an energy of about 10 eV. After passing through the customized neutral pore gate 2, they collide with the pore wall surface on the customized neutral pore gate 2 to obtain neutral atomic oxygen with, for example, an energy of 5 eV.

[0070] It should be noted that the above is only an optional example and should not be construed as a limitation of this application.

[0071] Compared with existing technologies, this application generates oxygen ions through an ECR ion oxygen source, accelerates oxygen ions using a sheath electric field, and achieves more effective collision neutralization of oxygen ions to obtain neutral atomic oxygen through a customized neutralized pore grid with optimized structure. Combined with a screening magnetic field for screening, it can produce atomic oxygen beams with higher precision.

[0072] A customized neutral aperture grid with optimized aperture layout and structure can reduce the beam divergence angle of atomic oxygen, further optimize beam directionality, and effectively improve beam flux. Accelerating oxygen ions using a sheath electric field eliminates the need for an additional accelerating grid, effectively solving the problem of excessively high oxygen ion energy. It also possesses the advantage of low energy dispersion of atomic oxygen, meeting the simulation requirements under rarefied gas conditions.

[0073] Furthermore, by utilizing the sheath for acceleration, the energy of ion oxygen is easily controlled and has a small energy dispersion, thus solving the problems of uncontrolled energy and large energy dispersion in existing sources.

[0074] Furthermore, this application can provide a more reliable ground simulation and verification platform for the study of material corrosion and aerodynamic properties of spacecraft in ultra-low Earth orbit environments.

[0075] The following is in conjunction with the appendix Figures 2 to 6 Detailed description of optional embodiments of the device in this application.

[0076] like Figure 2 As shown, this application provides a ground-based simulation device for ultra-low orbit neutral atomic oxygen beam tests, which is used to perform the ultra-low orbit neutral atomic oxygen beam ground-based test simulation method described in this application. The ultra-low orbit neutral atomic oxygen beam ground-based test simulation device includes an ECR oxygen ion source 1, a custom-designed neutralization aperture 2, a screening magnetic field 3 located at the exit of the custom-designed neutralization aperture 2, and a rectifier magnet 4 located at the entrance of the custom-designed neutralization aperture 2.

[0077] Specifically, an ECR oxygen ion source 1 is used to ionize oxygen into oxygen ions. A custom-designed neutralization pore grid 2 is used to neutralize oxygen ions to form oxygen atoms. A rectifier magnet 4 is used to filter oxygen ions that can flow through the custom-designed neutralization pore grid 2 and is located at the inlet of the custom-designed neutralization pore grid 2. A filtering magnetic field 3 is used to perform the filtering process of neutralized oxygen ions and is located at the outlet of the custom-designed neutralization pore grid 2. The pores on the custom-designed neutralization pore grid 2 are configured as straight pores or expanded pores, wherein the expanded pores include a straight cylindrical section and an expanded section, the diameter of the straight cylindrical section is calculated and determined, and the expansion angle of the expanded section is determined. A ring magnet is used to surround the outlet of the custom-designed neutralization pore grid to obtain the filtering magnetic field.

[0078] According to an optional implementation, sheath acceleration parameters are calculated to determine the sheath thickness, the sheath acceleration parameters being characterized in the sheath electric field.

[0079] Based on the determined thickness of the sheath, the diameter of the straight holes or the diameter of the expanded holes on the customized neutralized pore grid are calculated and determined.

[0080] According to an optional embodiment, the expansion hole on the customized neutralized aperture grid includes a straight section and an expansion section, wherein the diameter of the straight section is calculated and determined, and the expansion angle of the expansion section is determined.

[0081] According to an optional embodiment, the expansion angle is 8 degrees to 15 degrees. The diameter of the straight section is 1 mm to 2 mm.

[0082] According to an optional embodiment, the spacing of the hole array on the customized neutral hole grid is 0.4mm to 0.8mm. The length of the holes on the customized neutral hole grid is 3mm to 7mm.

[0083] A ring magnet is used to surround the outlet of a custom-neutralized aperture grid to obtain a screening magnetic field.

[0084] According to an optional embodiment, the sheath of the sheath electric field and the entrance of the custom neutralized aperture gate are connected by a chamfered connection.

[0085] It should be noted that the content of the ultra-low orbit neutral atomic oxygen beam ground test simulation method performed by the ultra-low orbit neutral atomic oxygen beam ground test simulation device of this application is largely the same as the content of the ultra-low orbit neutral atomic oxygen beam ground test simulation method described in this application. Therefore, the description of the same content is omitted.

[0086] Compared with existing technologies, this application generates oxygen ions through an ECR ion oxygen source, accelerates oxygen ions using a sheath electric field, and achieves more effective collision neutralization of oxygen ions to obtain neutral atomic oxygen through a customized neutralized pore grid with optimized structure. Combined with a screening magnetic field for screening, it can produce atomic oxygen beams with higher precision.

[0087] A customized neutral aperture grid with optimized aperture layout and structure can reduce the beam divergence angle of atomic oxygen, further optimize beam directionality, and effectively improve beam flux. Accelerating oxygen ions using a sheath electric field eliminates the need for an additional accelerating grid, effectively solving the problem of excessively high oxygen ion energy. It also possesses the advantage of low energy dispersion of atomic oxygen, meeting the simulation requirements under rarefied gas conditions.

[0088] Furthermore, by utilizing the sheath for acceleration, the energy of ion oxygen is easily controlled and has a small energy dispersion, thus solving the problems of uncontrolled energy and large energy dispersion in existing sources.

[0089] Furthermore, this application can provide a more reliable ground simulation and verification platform for the study of material corrosion and aerodynamic properties of spacecraft in ultra-low Earth orbit environments.

[0090] like Figure 7As shown, this embodiment provides an electronic device, which includes: at least one processor; and a memory communicatively connected to the at least one processor; wherein the memory stores instructions executable by the at least one processor, which are executed by the at least one processor to enable the at least one processor to perform the method steps described in the above embodiment.

[0091] This application provides a non-volatile computer storage medium storing computer-executable instructions that can perform the steps described in the above embodiments.

[0092] The following is for reference. Figure 7 The diagram illustrates a structural schematic of an electronic device suitable for implementing the embodiments of this application. The terminal devices in the embodiments of this application may include, but are not limited to, mobile terminals such as mobile phones, laptops, digital broadcast receivers, PDAs (personal digital assistants), PADs (tablet computers), PMPs (portable multimedia players), in-vehicle terminals (e.g., in-vehicle navigation terminals), and fixed terminals such as digital TVs and desktop computers. Figure 7 The electronic device shown is merely an example and should not impose any limitation on the functionality and scope of use of the embodiments of this application.

[0093] like Figure 7 As shown, the electronic device may include a processing unit (e.g., a central processing unit, a graphics processing unit, etc.) 401, which can perform various appropriate actions and processes according to a program stored in a read-only memory (ROM) 402 or a program loaded from a storage device 408 into a random access memory (RAM) 403. The RAM 403 also stores various programs and data required for the operation of the electronic device. The processing unit 401, ROM 402, and RAM 403 are interconnected via a bus 404. An input / output (I / O) interface 405 is also connected to the bus 404.

[0094] Typically, the following devices can be connected to I / O interface 405: input devices 406 including, for example, touchscreens, touchpads, keyboards, mice, cameras, microphones, accelerometers, gyroscopes, etc.; output devices 407 including, for example, liquid crystal displays (LCDs), speakers, vibrators, etc.; storage devices 408 including, for example, magnetic tapes, hard disks, etc.; and communication devices 409. Communication device 409 allows electronic devices to communicate wirelessly or wiredly with other devices to exchange data. Although Figure 7 Electronic devices with various devices are shown, but it should be understood that it is not required to implement or have all of the devices shown. More or fewer devices may be implemented or have alternatively.

[0095] Specifically, according to embodiments of this application, the processes described above with reference to the flowcharts can be implemented as computer software programs. For example, embodiments of this application include a computer program product comprising a computer program carried on a computer-readable medium, the computer program containing program code for performing the methods shown in the flowcharts. In such embodiments, the computer program can be downloaded and installed from a network via a communication device 409, or installed from a storage device 408, or installed from a ROM 402. When the computer program is executed by the processing device 401, it performs the functions defined in the methods of the embodiments of this application.

[0096] It should be noted that the computer-readable medium described above in this application can be a computer-readable signal medium, a computer-readable storage medium, or any combination thereof. A computer-readable storage medium can be, for example,—but not limited to—an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, or device, or any combination thereof. More specific examples of a computer-readable storage medium may include, but are not limited to: an electrical connection having one or more wires, a portable computer disk, a hard disk, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM or flash memory), optical fiber, portable compact disk read-only memory (CD-ROM), optical storage device, magnetic storage device, or any suitable combination thereof. In this application, a computer-readable storage medium can be any tangible medium containing or storing a program that can be used by or in conjunction with an instruction execution system, apparatus, or device. In this application, a computer-readable signal medium can include a data signal propagated in baseband or as part of a carrier wave, carrying computer-readable program code. Such propagated data signals can take various forms, including but not limited to electromagnetic signals, optical signals, or any suitable combination thereof. A computer-readable signal medium can be any computer-readable medium other than a computer-readable storage medium, which can send, propagate, or transmit a program for use by or in connection with an instruction execution system, apparatus, or device. The program code contained on the computer-readable medium can be transmitted using any suitable medium, including but not limited to: wires, optical fibers, RF (radio frequency), etc., or any suitable combination thereof.

[0097] The aforementioned computer-readable medium may be included in the aforementioned electronic device; or it may exist independently and not assembled into the electronic device.

[0098] Computer program code for performing the operations of this application can be written in one or more programming languages ​​or a combination thereof, including object-oriented programming languages ​​such as Java, Smalltalk, and C++, and conventional procedural programming languages ​​such as the "C" language or similar programming languages. The program code can be executed entirely on the user's computer, partially on the user's computer, as a standalone software package, partially on the user's computer and partially on a remote computer, or entirely on a remote computer or server. In cases involving remote computers, the remote computer can be connected to the user's computer via any type of network—including a local area network (LAN) or a wide area network (WAN)—or can be connected to an external computer (e.g., via the Internet using an Internet service provider).

[0099] The flowcharts and block diagrams in the accompanying drawings illustrate the architecture, functionality, and operation of possible implementations of systems, methods, and computer program products according to various embodiments of this application. In this regard, each block in a flowchart or block diagram may represent a module, segment, or portion of code containing one or more executable instructions for implementing a specified logical function. It should also be noted that in some alternative implementations, the functions indicated in the blocks may occur in a different order than those indicated in the drawings. For example, two consecutively indicated blocks may actually be executed substantially in parallel, and they may sometimes be executed in reverse order, depending on the functions involved. It should also be noted that each block in the block diagrams and / or flowcharts, and combinations of blocks in the block diagrams and / or flowcharts, can be implemented using a dedicated hardware-based system that performs the specified function or operation, or using a combination of dedicated hardware and computer instructions.

[0100] The units described in the embodiments of this application can be implemented in software or hardware. The names of the units are not, in some cases, limiting the scope of the unit itself.

Claims

1. A method for simulating ground-based experiments with neutral atomic oxygen beams in ultra-low orbit, characterized in that, include: Using an ECR ion oxygen source to ionize oxygen into oxygen ions; The obtained oxygen ions are accelerated by the sheath electric field generated on the upstream side, so that the accelerated oxygen ions pass through the holes on the customized neutralized pore gate. The accelerated oxygen ions collide and neutralize with the hole walls on the customized neutralized pore gate to form neutral atomic oxygen. The neutralized oxygen ions are screened using a screening magnetic field located at the outlet of the customized neutralized aperture grid to obtain a neutral atomic oxygen beam.

2. The method for simulating ground-based ultra-low orbit neutral atom oxygen beam tests according to claim 1, characterized in that, include: The holes on the customized neutral aperture grid are configured as straight holes or expanded holes.

3. The method for simulating ground-based ultra-low orbit neutral atom oxygen beam tests according to claim 1 or 2, characterized in that, Further includes: Calculate sheath acceleration parameters to determine sheath thickness, the sheath acceleration parameters being characterized in the sheath electric field; Based on the determined thickness of the sheath, the diameter of the straight holes or the diameter of the expanded holes on the customized neutralized pore grid are calculated and determined.

4. The method for simulating ground-based ultra-low orbit neutral atom oxygen beam tests according to claim 3, characterized in that, Further includes: The expanded holes on the customized neutralized aperture grid include a straight section and an expanded section, wherein, The diameter of the straight section is calculated and the expansion angle of the expansion section is determined.

5. The method for simulating ground-based ultra-low orbit neutral atom oxygen beam tests according to claim 4, characterized in that, include: The expansion angle is 8 degrees to 15 degrees; and / or The diameter of the straight section is 1mm to 2mm.

6. The method for simulating ground-based ultra-low orbit neutral atom oxygen beam tests according to claim 1, characterized in that, include: The spacing of the hole array on the customized neutral hole grid is 0.4mm to 0.8mm; The length of the holes on the customized neutral aperture grid is 3mm to 7mm.

7. The method for simulating ground-based ultra-low orbit neutral atom oxygen beam tests according to claim 1, characterized in that, include: A ring magnet is used to surround the outlet of a custom-neutralized aperture grid to obtain a screening magnetic field.

8. The method for simulating ground-based ultra-low orbit neutral atom oxygen beam tests according to claim 5, characterized in that, include: The sheath of the sheath electric field is connected to the entrance of the custom neutralized aperture gate by a chamfered connection.

9. A ground-based simulation device for ultra-low orbit neutral atomic oxygen beam experiments, characterized in that, The method for simulating ground-based ultra-low orbit neutral atom oxygen beam tests according to any one of claims 1 to 8 includes: ECR oxygen ion source is used to ionize oxygen into oxygen ions; Custom-designed neutralized pore gates are used to neutralize oxygen ions to form oxygen atoms; A rectifier magnet, used to filter oxygen ions that can flow through the custom-designed neutralized aperture grid, is disposed at the inlet of the custom-designed neutralized aperture grid; A screening magnetic field, used for screening neutralized oxygen ions, is located at the outlet of the custom-designed neutralization pore grid.

10. The ultra-low orbit neutral atom oxygen beam ground test simulation device according to claim 9, characterized in that, include: The holes on the customized neutral aperture grid are configured as straight holes or expanded holes, wherein the expanded hole includes a straight cylindrical section and an expanded section, the diameter of the straight cylindrical section is calculated and determined, and the expansion angle of the expanded section is determined; A ring magnet is used to surround the outlet of the custom-neutralized aperture grid to obtain a screening magnetic field.