Resin lens and preparation method thereof

Abstract

The invention provides a resin lens and a preparation method thereof, the resin lens comprises a resin substrate, a hardened layer and an interference layer, in a direction away from the resin substrate, the interference layer comprises 5-19 refraction layers; the refraction layer sequentially comprises a first refraction layer, 3-11 second refraction layers and a third refraction layer, the first refraction layer is arranged between the second refraction layers and the hardened layer, and the second refraction layers comprise fourth refraction layers and fifth refraction layers which are alternately arranged; the refractive index of the first refraction layer is n1, the refractive index of the third refraction layer is n3, the refractive index of the fourth refraction layer is n4, the refractive index of the fifth refraction layer is n5, n1 is larger than n4 and smaller than n5, and n1 is larger than or equal to n3 and smaller than n5; the mass ratio of silicon-containing oxide to aluminum-containing oxide in the material of the first refraction layer is (75-99): (1-25). Through the arrangement, the heat resistance of the resin lens can be improved on the basis that the resin lens has good water boiling performance.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of resin lenses, in particular to a resin lens and a preparation method thereof. BACKGROUND

[0002] Resin lenses have become the mainstream material of modern eyeglass lenses due to their advantages of light weight, easy processing, strong impact resistance, high light transmittance, etc. However, the inherent defect of insufficient thermal stability of resin material significantly limits some application scenarios. Most resin substrates are prone to deformation in an environment above 60℃, and the difference in thermal expansion coefficients between the interference layer and the substrate can cause the film layer to crack, fall off, and even burst, thereby affecting visual wearing. This defect is particularly prominent in high-temperature and high-humidity environments (such as summer sun exposure in a car, a sauna room) or daily use scenarios (such as direct blowing of a hair dryer, hot water washing). SUMMARY

[0003] The present application aims to provide a resin lens and a preparation method thereof, so as to improve the heat resistance of the resin lens on the basis of good boiling performance. The specific technical solutions are as follows:

[0004] The first aspect of the present application provides a resin lens, which comprises:

[0005] a resin substrate;

[0006] a hardening layer arranged on the surface of the resin substrate;

[0007] an interference layer arranged on the surface of the hardening layer away from the resin substrate, wherein the interference layer comprises N layers of refractive layers in the direction away from the resin substrate, N ranges from 5 to 19, and N is a natural number;

[0008] wherein the refractive layers comprise a first refractive layer, a second refractive layer, and a third refractive layer in sequence, the first refractive layer is arranged between the second refractive layer and the hardening layer, and the second refractive layer comprises 3-11 layers, and the second refractive layer comprises alternating fourth refractive layers and fifth refractive layers;

[0009] the refractive index of the first refractive layer is n1, the refractive index of the third refractive layer is n3, the refractive index of the fourth refractive layer is n4, and the refractive index of the fifth refractive layer is n5, wherein n4 < n1 < n5, and n3 ≤ n1 < n5;

[0010] the material of the first refractive layer comprises silicon-containing oxide and aluminum-containing oxide, and the mass ratio of the silicon-containing oxide to the aluminum-containing oxide is (75-99):(1-25).

[0011] In some embodiments of the present application, the silicon-containing oxide comprises silicon dioxide, the aluminum-containing oxide comprises aluminum oxide, and the mass ratio of the silicon dioxide to the aluminum oxide is (80-98):(2-20).

[0012] In some embodiments of the present application, the interference layer further comprises an antistatic layer and a water and stain repellent layer, the antistatic layer is arranged between the second refractive layer and the third refractive layer, and the water and stain repellent layer is arranged on the surface of the third refractive layer away from the antistatic layer.

[0013] In some embodiments of the present application, 1.50≤n1≤1.58, 1.50≤n3≤1.58, 1.45≤n4≤1.55, and 1.90≤n5≤2.38.

[0014] In some embodiments of the present application, the material of the third refractive layer comprises silicon-containing oxide and / or aluminum-containing oxide; the material of the fourth refractive layer comprises silicon dioxide; and the material of the fifth refractive layer comprises any one of titanium trioxide, zirconium oxide, tantalum oxide, niobium oxide, and zirconium-titanium mixture.

[0015] Further, the material of the third refractive layer comprises silicon-containing oxide and aluminum-containing oxide, and the mass ratio of the silicon-containing oxide to the aluminum-containing oxide is (75-99):(1-25).

[0016] In some embodiments of the present application, the thickness of the first refractive layer is h1, and 20nm≤h1≤50nm; and the thickness of the third refractive layer is h3, and 60nm≤h3≤180nm.

[0017] In some embodiments of the present application, the thickness of the fourth refractive layer is 10-100nm, the superimposed thickness of the first refractive layer, the third refractive layer, and the fourth refractive layer in the interference layer is h4, the superimposed thickness of the fifth refractive layer is h5, 80nm≤h4-h5≤200nm; the thickness of the antistatic layer is h6, and 4nm≤h6≤10nm; and the thickness of the water and stain repellent layer is h7, and 10nm≤h7≤25nm.

[0018] In some embodiments of the present application, the thickness of the interference layer is h, and 200nm≤h≤800nm.

[0019] The second aspect of the present application provides a preparation method of the resin lens according to any one of the foregoing embodiments, wherein the preparation method comprises the following steps:

[0020] (1) baking after arranging the hardening layer on both surfaces of the resin substrate, the baking temperature is 50-70℃, and the baking time is 30-60min;

[0021] (2) depositing the first refractive layer on the surface of the hardening layer on one side of the resin substrate by using ion beam assisted deposition technology under vacuum condition after heat preservation of the resin substrate to 44-71℃;

[0022] (3) depositing a fourth refractive layer on the surface of the first refractive layer, and then depositing a fifth refractive layer on the surface of the fourth refractive layer, and then repeating the deposition of the fourth refractive layer and the fifth refractive layer alternately 2-10 times, so as to obtain 3-11 layers of the second refractive layer;

[0023] (4) depositing a third refractive layer on the surface of the second refractive layer in a direction away from the resin substrate;

[0024] (5) repeating steps (2)-(4) on the other surface of the resin substrate, so as to obtain the resin lens.

[0025] In some embodiments of the present application, in step (4), a static electricity prevention layer is deposited on the surface of the second refractive layer before the third refractive layer is deposited;

[0026] After the third refractive layer is deposited, a water and dirt prevention layer is deposited on the surface of the third refractive layer.

[0027] Advantages of the present application:

[0028] The present application provides a resin lens and a preparation method thereof, wherein the resin lens comprises a resin substrate, a hardening layer and an interference layer, the hardening layer is arranged on the surface of the resin substrate; the interference layer is arranged on the surface of the hardening layer away from the resin substrate, and in a direction away from the resin substrate, the interference layer comprises refractive layers with a layer number of N, N ranges from 5 to 19, and N is a natural number; wherein the refractive layers comprise a first refractive layer, a second refractive layer and a third refractive layer in sequence, the first refractive layer is arranged between the second refractive layer and the hardening layer, and the layer number of the second refractive layer ranges from 3 to 11 layers, and the second refractive layer comprises fourth refractive layers and fifth refractive layers arranged alternately; the refractive index of the first refractive layer is n1, the refractive index of the third refractive layer is n3, the refractive index of the fourth refractive layer is n4, and the refractive index of the fifth refractive layer is n5, wherein n4 < n1 < n5, and n3 ≤ n1 < n5; the material of the first refractive layer comprises silicon-containing oxide and aluminum-containing oxide, and the mass ratio of the silicon-containing oxide to the aluminum-containing oxide ranges from (75-99):(1-25). By arranging the first refractive layer and the second refractive layer with 3-11 layers adjacent to the hardening layer, and adjusting the mass ratio of silicon dioxide and aluminum oxide in the first refractive layer within the range of the present application, the heat resistance of the resin lens is improved on the basis of good boiling performance.

[0029] Of course, implementing any product or method of the present application does not necessarily require achieving all the advantages described above at the same time. BRIEF DESCRIPTION OF DRAWINGS

[0030] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments description will be briefly introduced. Obviously, the drawings in the following description only constitute some embodiments of the present application, and other embodiments can be obtained by those skilled in the art based on these drawings.

[0031] Figure 1 A schematic diagram of the deformation of the resin substrate in the prior art resin lens caused by the tensile stress of the interference layer;

[0032] Figure 2 A schematic diagram of the structure of the resin lens according to some embodiments of the present application;

[0033] Figure 3 A schematic diagram of the structure of the resin lens according to some other embodiments of the present application.

[0034] The drawings show: resin lens 001, resin substrate 100, first surface 100a, second surface 100b, hardening layer 200, interference layer 300, first refractive layer 10, second refractive layer 20, fourth refractive layer 24, fifth refractive layer 25, third refractive layer 30, refractive layer 40, antistatic layer 50, water and stain resistant layer 60. DETAILED DESCRIPTION

[0035] The technical solutions in the present application will be described clearly and completely below in combination with the embodiments of the present application and the drawings. Obviously, the described embodiments only constitute some of the embodiments of the present application, rather than all the embodiments. All other embodiments obtained by those skilled in the art based on the present application are within the scope of protection of the present application.

[0036] The resin lens is in a high temperature and high humidity environment, for example, as shown in Figure 1 The expansion of the material of the resin substrate 100 is greater than that of the material of the interference layer 300, and the two tend to deform as shown in Figure 1 The stress is generated inside the interference layer 300, and when the stress exceeds the bearing limit of the interference layer 300, film cracking or film explosion will occur. Based on this, the present application provides a resin lens and a preparation method thereof.

[0037] The first aspect of the present application provides a resin lens, which comprises:

[0038] A resin substrate;

[0039] A hardening layer, which is arranged on the surface of the resin substrate; the "surface" mentioned above refers to the two opposite surfaces of the resin substrate along the thickness direction thereof;

[0040] The interference layer is arranged on the surface of the hardening layer away from the resin substrate, wherein the interference layer comprises N layers of refractive layers in the direction away from the resin substrate, N ranges from 5 to 19, and N is a natural number;

[0041] The refractive layers comprise a first refractive layer, a second refractive layer and a third refractive layer in sequence, i.e. the second refractive layer is arranged between the first refractive layer and the third refractive layer; the first refractive layer is arranged between the second refractive layer and the hardening layer, and the second refractive layer has a layer number of 3 to 11 layers; the second refractive layer comprises a fourth refractive layer and a fifth refractive layer arranged alternately;

[0042] The refractive index of the first refractive layer is n1, the refractive index of the third refractive layer is n3, the refractive index of the fourth refractive layer is n4, and the refractive index of the fifth refractive layer is n5, wherein n4 < n1 < n5, and n3 ≤ n1 < n5;

[0043] The material of the first refractive layer comprises silicon-containing oxide and aluminum-containing oxide, and the mass ratio of the silicon-containing oxide to the aluminum-containing oxide is (75-99):(1-25).

[0044] In some embodiments, the silicon-containing oxide comprises at least one of silicon dioxide and silicon monoxide. Preferably, the silicon-containing oxide comprises silicon dioxide, and the aluminum-containing oxide comprises aluminum trioxide, and the mass ratio of the silicon dioxide to the aluminum trioxide is (80-98):(2-20). For example, the layer number of the second refractive layer can be 3, 4, 5, 6, 7, 8, 9, 10 or 11. For example, the mass ratio of the silicon dioxide to the aluminum trioxide can be 75:25, 80:20, 84:16, 89:11, 94:6, 98:2, 99:1 or a range composed of any two of the above values.

[0045] For the convenience of understanding, in the present application, the thickness direction of the resin lens itself is defined as Z. It should be understood that the above definition of the direction is for the purpose of facilitating the description of the present application, and the direction defined in the present application can be understood according to the relative positions of the elements in the actual product and the drawings. Moreover, the thickness directions of the resin substrate, the hardening layer and each layer of the interference layer are the same as the thickness direction of the resin lens. Figure 2 The structural schematic diagram of the resin lens along the thickness direction of some embodiments of the present application is shown in FIG. 1. Figure 2As shown, the resin lens 001 comprises a resin substrate 100 having opposite first and second surfaces 100a and 100b along the thickness direction Z, a hardening layer 200 disposed on each of the first and second surfaces 100a and 100b of the resin substrate 100, and an interference layer 300 disposed on the surface of the hardening layer 200 away from the resin substrate 100 on both sides of the resin substrate 100. The interference layer 300 comprises 5 layers of refractive layers 40, which in turn comprise a first refractive layer 10, a second refractive layer 20, and a third refractive layer 30 along the thickness direction Z of the resin substrate, i.e., the second refractive layer 20 is disposed between the first and third refractive layers 10 and 30. The first refractive layer 10 is disposed between the second refractive layer 20 and the hardening layer 200. The second refractive layer 20 has 3 layers, and the fourth and fifth refractive layers 24 and 25 are alternately disposed in the three layers of the second refractive layer 20, with the fourth refractive layer 21 in each layer of the second refractive layer 20 being closer to the first refractive layer 10 than the fifth refractive layer 25. It can be understood that in other embodiments of the present application, the second refractive layer 20 can also have 4, 5, 6, 7, 8, 9, 10, or 11 layers. It should be noted that the interference layers 300 on both sides of the resin substrate 100 are usually the same, and therefore the number of layers of the second refractive layer 20 is also the same. It should also be noted that when counting the number of layers of the refractive layers, 1 layer of the fourth refractive layer and 1 layer of the fifth refractive layer together constitute 1 layer of the second refractive layer, which is counted as the number of layers of the second refractive layer. Exemplarily, as shown in FIG. 1, the refractive layers are 1 layer of the first refractive layer, 3 layers of the second refractive layer, and 1 layer of the third refractive layer, which together constitute 5 layers, and therefore the number of layers of the refractive layers is counted as 5 layers. Figure 1 As shown, the refractive layers are 1 layer of the first refractive layer, 3 layers of the second refractive layer, and 1 layer of the third refractive layer, which together constitute 5 layers, and therefore the number of layers of the refractive layers is counted as 5 layers.

[0046] The resin lens provided by the first aspect of the present application has the first refractive layer and 3-11 layers of the second refractive layer disposed adjacent to the hardening layer, and the mass ratio of the silicon-containing oxide and the aluminum-containing oxide in the first refractive layer is controlled within the range of the present application, so that the interference layer has antireflection and transmittance effects on visible light, and the comprehensive compressive stress of the interference layer is within the range of -100 to -450 MPa, and the thermal stress, internal stress, and external stress are balanced, so that in the case of increased thermal stress of the interference layer in a high-temperature and high-humidity environment, the thermal stress is regulated by the internal stress and the external stress, so that the interference layer remains stable in the high-temperature and high-humidity environment, thereby improving the heat resistance of the resin lens on the basis of good boiling performance.

[0047] In some embodiments of the present application, the interference layer further comprises an antistatic layer and a waterproof and stain-resistant layer, the antistatic layer is disposed between the second and third refractive layers, and the waterproof and stain-resistant layer is disposed on the surface of the third refractive layer away from the antistatic layer. As shown in FIG. 1, the resin lens 001 further comprises an antistatic layer 400 disposed between the second and third refractive layers 20 and 30, and a waterproof and stain-resistant layer 500 disposed on the surface of the third refractive layer 30 away from the antistatic layer 400. Figure 3As shown, the resin lens 001 comprises a resin substrate 100 having opposite first and second surfaces 100a and 100b along the thickness direction Z, a hardening layer 200 is arranged on each of the first and second surfaces 100a and 100b of the resin substrate 100, an interference layer 300 is arranged on the surface of the hardening layer 200 away from the resin substrate 100 on both sides of the resin substrate 100, the interference layer 300 comprises a refractive layer 40, an antistatic layer 50 and a water and stain resistant layer 60, and the interference layer 300 on both sides of the resin substrate 100 comprises, in sequence in the direction away from the resin substrate 100, a single-layer first refractive layer 10, three-layer second refractive layers 20, a single-layer antistatic layer 50, a single-layer third refractive layer 30 and a single-layer water and stain resistant layer 60, wherein the fourth and fifth refractive layers 24 and 25 of the three-layer second refractive layers 20 are arranged alternately, and the fourth refractive layer 21 of each second refractive layer 20 is closer to the first refractive layer 10 than the fifth refractive layer 25. It can be understood that in some other embodiments of the present application, the number of layers of the second refractive layer 20 can also be 4, 5, 6, 7, 8, 9, 10 or 11. By further arranging the antistatic layer and the water and stain resistant layer in the interference layer, the resin lens can have good water boiling performance and heat resistance, and the antistatic, water and stain resistant performance of the resin lens can be improved.

[0048] In some embodiments of the present application, 1.50≤n1≤1.58, 1.50≤n3≤1.58, 1.45≤n4≤1.55, 1.90≤n5≤2.38. For example, n1 can be 1.5, 1.51, 1.52, 1.53, 1.54, 1.55, 1.56, 1.57, 1.58 or a range formed by any two of the above values. For example, n3 can be 1.50, 1.51, 1.52, 1.53, 1.54, 1.55, 1.56, 1.57, 1.58 or a range formed by any two of the above values. For example, n4 can be 1.45, 1.46, 1.48, 1.49, 1.5, 1.51, 1.53, 1.54, 1.55 or a range formed by any two of the above values. For example, n5 can be 1.9, 1.96, 2.02, 2.08, 2.14, 2.2, 2.26, 2.32, 2.38 or a range formed by any two of the above values.

[0049] In some embodiments of the present application, the material of the third refractive layer comprises silicon-containing oxide and / or aluminum-containing oxide, further, the material of the third refractive layer comprises silicon-containing oxide and aluminum-containing oxide, and the mass ratio of the silicon-containing oxide to the aluminum-containing oxide is (75-99):(1-25). The material of the fourth refractive layer comprises silicon dioxide; the material of the fifth refractive layer comprises any one of titanium pentoxide, zirconium oxide, tantalum oxide, niobium oxide and zirconium-titanium mixture. The use of the above-mentioned materials is conducive to keeping the refractive index of the third refractive layer, the fourth refractive layer and the fifth refractive layer within the range defined in the present application, thereby improving the heat resistance and boiling resistance of the resin lens.

[0050] Further, the third refractive layer can be single-layer or multi-layer. The above-mentioned “multi-layer” refers to two or more layers. For example, in some embodiments, the third refractive layer is provided as a single layer; in other embodiments, the third refractive layer is provided as a double layer; in still other embodiments, the third refractive layer is provided as a triple layer. When the third refractive layer is multi-layer, the materials of the layers can be the same or different.

[0051] The purity of the aluminum oxide and the silicon dioxide is not particularly limited in the present application, as long as the purpose of the present application can be achieved. For example, the purity of the aluminum oxide is >99.99%, and the purity of the silicon dioxide is >99.99%. Controlling the purity of the aluminum oxide and the silicon dioxide within the above-mentioned range is conducive to forming a film layer with uniform internal structure for the first refractive layer, the second refractive layer and the third refractive layer, so that the compressive stress of the interference layer is improved, the thermal stress, internal stress and external stress in the interference layer are balanced, and the heat resistance of the resin lens is further improved.

[0052] In some embodiments of the present application, the thickness of the first refractive layer is h1, and 20nm≤h1≤50nm. The above-mentioned “thickness of the first refractive layer” refers to the thickness of the first refractive layer on one side of the resin substrate. For example, h1 can be 20nm, 24nm, 28nm, 31nm, 35nm, 39nm, 43nm, 46nm, 50nm or a range composed of any two of the above-mentioned values. Controlling the thickness of the first refractive layer within the above-mentioned range is conducive to adjusting the interference layer to a suitable compressive stress, thereby further improving the heat resistance of the resin lens.

[0053] In some embodiments of the present application, the thickness of the third refractive layer is h3, 60nm≤h3≤180nm. In some embodiments of the present application, the thickness of the fourth refractive layer is 10-100nm, the superimposed thickness of the first refractive layer, the third refractive layer and the fourth refractive layer in the interference layer is h4, the superimposed thickness of the fifth refractive layer is h5, 80nm≤h4-h5≤200nm; the thickness of the anti-static layer is h6, 4nm≤h6≤10nm; the thickness of the water and stain resistant layer is h7, 10nm≤h7≤25nm. Further, the thickness of the interference layer is h, 200nm≤h≤800nm. The above-mentioned "thickness" refers to the thickness of each layer on one side of the resin substrate. The above-mentioned "superimposed thickness of the first refractive layer, the third refractive layer and the fourth refractive layer in the interference layer" refers to the sum of the thickness of each layer of the first refractive layer, the third refractive layer and the fourth refractive layer in the interference layer on one side of the resin substrate. For example, when the number of layers of the first refractive layer is 1, the number of layers of the third refractive layer is 1, and the number of layers of the fourth refractive layer is 5 in the interference layer on one side of the resin substrate, the superimposed thickness h4 of the first refractive layer, the third refractive layer and the fourth refractive layer in the interference layer is the sum of the thickness of 1 layer of the first refractive layer, 1 layer of the third refractive layer and each layer of 5 layers of the fourth refractive layer. The above-mentioned "superimposed thickness of the fifth refractive layer" refers to the sum of the thickness of each layer of the fifth refractive layer in the interference layer on one side of the resin substrate. For example, h3 can be 60nm, 77nm, 94nm, 111nm, 129nm, 146nm, 163nm, 180nm or a range composed of any two of the above-mentioned values. For example, the thickness of the fourth refractive layer can be 10nm, 21nm, 33nm, 44nm, 55nm, 66nm, 78nm, 89nm, 100nm or a range composed of any two of the above-mentioned values. For example, h4-h5 can be 80nm, 97nm, 114nm, 131nm, 149nm, 166nm, 183nm, 200nm or a range composed of any two of the above-mentioned values. For example, h6 can be 4nm, 5nm, 6nm, 7nm, 8nm, 9nm, 10nm or a range composed of any two of the above-mentioned values. For example, h7 can be 10nm, 12nm, 13nm, 15nm, 17nm, 18nm, 20nm, 25nm or a range composed of any two of the above-mentioned values. For example, h can be 200nm, 329nm, 457nm, 586nm, 614nm, 743nm, 771nm, 800nm or a range composed of any two of the above-mentioned values. Controlling the thickness of each layer in the resin lens within the range of the present application is beneficial to make the interference layer have appropriate compressive stress, and also has good antireflection and transmittance effect on visible light, so that the interference layer remains stable in a high temperature and high humidity environment with good light transmittance, thereby improving the heat resistance of the resin lens on the basis of good boiling performance.

[0054] In some embodiments of the present application, 150 nm ≤ h4 ≤ 800 nm, 50 nm ≤ h5 ≤ 500 nm. In some embodiments, 200 nm ≤ h4 ≤ 450 nm, 100 nm ≤ h5 ≤ 300 nm. The present application does not have a particular limitation on the thickness of the single layer of the fifth refractive layer as long as the purpose of the present application can be achieved. For example, the thickness of the single layer of the fifth refractive layer is 10-100 nm. Further, the thickness of each fourth refractive layer in the interference layer can be the same or different, and the thickness of the fifth refractive layer in the interference layer can be the same or different.

[0055] Further, the compressive stress of the first refractive layer of the present application is -300 to -500 MPa, and the extinction coefficient is 0 to 0.0001. The compressive stress of the third refractive layer and the fourth refractive layer is -100 to -200 MPa, respectively, and the extinction coefficient is 0 to 0.001, respectively. The tensile stress of the fifth refractive layer is +30 to +100 MPa, and the extinction coefficient is 0 to 0.001. The tensile stress of the anti-static layer is +10 to +50 MPa, and the extinction coefficient is 0 to 0.001.

[0056] In some embodiments of the present application, the refractive index of the resin substrate is 1.499-1.78. For example, the refractive index of the resin substrate can be 1.499, 1.546, 1.593, 1.64, 1.686, 1.733, 1.78, or a range consisting of any two of the above values.

[0057] In some embodiments of the present application, the material of the resin substrate includes any one of acrylate, polyurethane, and polymethyl methacrylate (also known as acrylic).

[0058] The present application does not have a particular limitation on the thickness of the resin substrate as long as the purpose of the present application can be achieved. For example, the thickness of the resin substrate can be 1-5 mm.

[0059] The present application does not have a particular limitation on the thickness of the hardening layer as long as the purpose of the present application can be achieved. For example, the thickness of the hardening layer can be 2-4 μm.

[0060] The present application does not have a particular limitation on the material of the anti-static layer and the water and stain resistant layer as long as the purpose of the present application can be achieved. For example, the material of the anti-static layer can include but is not limited to tin oxide, indium oxide, or indium tin oxide (ITO). For example, the material of the water and stain resistant layer includes but is not limited to any one of a fluorine-modified silicone oil and molybdenum. The present application does not have a particular limitation on the type of the above-mentioned fluorine-modified silicone oil as long as the purpose of the present application can be achieved. For example, D9 anti-fingerprint agent produced by Suzhou Dongxing Surface Technology Co., Ltd. can be selected, and the main component is a high molecular fluorosilicon compound.

[0061] The compressive stress of the resin lens in the present application is in the range of -100 to -450 MPa, preferably -100 to -400 MPa.

[0062] The second aspect of the present application provides a method for preparing the resin lens according to any one of the preceding embodiments, wherein the method comprises the following steps:

[0063] (1) After the hardening layer is arranged on the two surfaces of the resin substrate, baking is performed at a temperature of 50-70°C, preferably 60-70°C, for a time of 30-60 min; for example, the baking temperature can be 50°C, 53°C, 57°C, 60°C, 63°C, 67°C, 70°C, or a range formed by any two of the above values; for example, the baking time can be 30 min, 35 min, 40 min, 45 min, 50 min, 55 min, 60 min, or a range formed by any two of the above values;

[0064] (2) Vacuum is extracted by a three-stage vacuum system of a machine pump, a Roots pump, and a diffusion pump, so as to heat the resin substrate to 44-71°C under the condition of a vacuum degree of 2x10 -6 ~2x10 -4 Pa, and then a first refractive layer is deposited on the surface of the hardening layer by ion beam assisted deposition technology; for example, the vacuum degree can be 2x10 -6 , 8x10 -6 , 2x10 -5 , 7x10 -5 , 2x10 -4 , or a range formed by any two of the above values; for example, the heating temperature can be 44°C, 48°C, 52°C, 56°C, 59°C, 63°C, 67°C, 71°C, or a range formed by any two of the above values; wherein the material of the first refractive layer comprises silicon oxide and aluminum oxide, and further, in some embodiments, 300-500 mesh silicon dioxide powder and 200-500 mesh aluminum oxide powder are mixed in a mass ratio of (75-99):(1-25), stirred uniformly, and then placed in a metal mold to be formed under a pressure of 1000 kg, to obtain a columnar silicon-aluminum mixed plating film material with a diameter of 2-4 mm and a height of 4-6 mm, which is subsequently deposited to form the first refractive layer;

[0065] (3) depositing a fourth refractive layer on the surface of the first refractive layer, and then depositing a fifth refractive layer on the surface of the fourth refractive layer to obtain a second refractive layer, and then repeating the deposition of the fourth refractive layer and the fifth refractive layer for 2-10 times to obtain 3-11 layers of the second refractive layer; for example, the number of times of repeating the deposition of the fourth refractive layer and the fifth refractive layer can be 2 times, 3 times, 4 times, 5 times, 6 times, 7 times, 8 times, 9 times or 10 times; for example, the number of layers of the second refractive layer can be 3 layers, 4 layers, 5 layers, 6 layers, 7 layers, 8 layers, 9 layers, 10 layers or 11 layers;

[0066] (4) depositing a third refractive layer on the surface of the second refractive layer in a direction away from the resin substrate;

[0067] (5) repeating steps (2)-(4) on the other surface of the resin substrate to obtain a resin lens.

[0068] In some embodiments of the present application, the preparation method further comprises:

[0069] In step (4), an anti-static layer is deposited on the surface of the second refractive layer before the third refractive layer is deposited;

[0070] After the third refractive layer is deposited, a water and stain resistant layer is deposited on the surface of the third refractive layer.

[0071] The present application does not have a particular restriction on the setting process of the hardening layer in the above-mentioned step (1), and those skilled in the art can use existing technology to prepare it as long as it can achieve the purpose of the present application. For example, the resin substrate can be subjected to alkali treatment, rinsing, drying, and then immersed in a hardening liquid for lifting, and then cured at high temperature to form a hardening layer. The present application does not have a particular restriction on the process of alkali treatment, rinsing, drying, immersion lifting and high temperature curing, and those skilled in the art can choose according to the actual needs as long as it can achieve the purpose of the present application. The present application does not have a particular restriction on the type of the above-mentioned hardening liquid as long as it can achieve the purpose of the present application. For example, the hardening liquid can include but is not limited to H673 hardening liquid produced by Japan Catalyst Co., Ltd.

[0072] In the above-mentioned step (2), plasma treatment is performed before the first refractive layer is deposited on the surface of the hardening layer. The present application does not have a particular restriction on the process of plasma treatment as long as it can achieve the purpose of the present application. For example, a Hall ion source can be used, argon gas is filled, and plasma is generated by electron bombardment of argon gas, and the surface of the resin substrate is bombarded under the action of a magnetic field to remove impurities, clean the surface and modify the surface, thereby facilitating the deposition of the subsequent interference layer. When the first refractive layer is deposited on the surface of the hardening layer by ion beam assisted deposition technology, it can include but is not limited to the following steps: S1 control the process vacuum degree to <2x10 -5Pa. S2 pre-melting 1, electron gun current 50~70mA, rise time 3~10s, holding time 3~20s; pre-melting 2, electron gun current 70~130mA, rise time 3~5s, holding time 20~30s; pre-melting 3, electron gun current 50~90mA, rise time 3~5s, holding time 3~10s. S3 evaporation, rate set to 0.01~0.8Å / s, thickness set to 20~50nm. During S2 and S3, ion assisted process is turned on, the gas connected can be argon, oxygen, etc., the flow is adjusted to be greater than 0sccm and less than or equal to 40sccm, and the voltage and current are adjusted. Further, the ion assisted process gas is a mixed gas of argon and oxygen, wherein the volume ratio of argon to oxygen is 1:(7~9), the flow is preferably 20~25sccm, and the anode voltage is adjusted to be 90~120V. Mainly control the plasma density and energy, and cooperate with the material to control the stress of the first refractive layer.

[0073] The present application does not particularly limit the method of depositing the fourth refractive layer on the surface of the first refractive layer in step (3) above, as long as the purpose of the present application can be achieved. For example, it can include but is not limited to the following steps: A1 control the process vacuum to be <2×10 -5 Pa. A2 pre-melting 1, electron gun current 30~45mA, rise time 3~5s, holding time 3~5s; pre-melting 2, electron gun current 60~70mA, rise time 3~5s, holding time 3~5s; pre-melting 3, electron gun current 70~90mA, rise time 3~5s, holding time 3~5s. A3 evaporation, rate set to 0.2~1.5Å / s, thickness set to 10~100nm. The present application does not particularly limit the method of depositing the fifth refractive layer on the surface of the fourth refractive layer in step (3) above, as long as the purpose of the present application can be achieved. For example, it can include but is not limited to the following steps: D1 melt the medicine, add one-third of the fifth refractive layer material to the crucible, and vacuum to <2×10 -4 Pa, electron gun current 60~100mA, spot set X-60, Y-60, time 100s, repeat the above step 2~3 times, and melt and crystallize the granular material into a large block. D2 control the process vacuum to be <2×10 -4Pa. D3 pre-melting 1, electron gun current 50~70mA, rise time 3~5s, holding time 3~5s; pre-melting 2, electron gun current 70~150mA, rise time 3~5s, holding time 3~5s; pre-melting 3, electron gun current 180~210mA, rise time 3~5s, holding time 3~5s. D4 evaporation, rate setting 0.01~0.8Å / s, thickness setting 10~100nm. Further, ion assisted process can be turned on at the same time during D3 and D4, the gas connected is oxygen or a mixture of oxygen and argon, the flow is adjusted to 0~40sccm, and the voltage and current are adjusted. Further, the gas connected is oxygen, the flow is 20~25sccm, and the anode voltage is adjusted to 90~120V.

[0074] The method of sequentially depositing the antistatic layer, the third refractive layer and the water and stain resistant layer on the surface of the second refractive layer in step (4) is not particularly limited in the present application, as long as the purpose of the present application can be achieved. For example, the method of depositing the antistatic layer includes but is not limited to the following steps: B1 vacuum setting <1×10 -4 Pa. B2 pre-melting 1, electron gun current 5~8mA, rise time 3~5s, holding time 3~5s; pre-melting 2, electron gun current 8~15mA, rise time 3~5s, holding time 3~5s; pre-melting 3, electron gun current 15~18mA, rise time 3~5s, holding time 3~5s, evaporation rate setting 0.01~0.15Å / s, thickness setting 4~10nm. Further, the ion assisted process gas is oxygen, etc., the flow is adjusted to be greater than 0sccm and less than or equal to 20sccm, and the voltage is 90~125V. The method of depositing the third refractive layer can refer to the method of depositing the fourth refractive layer, and the method of depositing the water and stain resistant layer can use the method known to those skilled in the art, which is not limited in the present application, as long as the purpose of the present application can be achieved.

[0075] In the resin lens of the present application, the refractive index of each layer can be measured by Film Sense ellipsometer.

[0076] Examples

[0077] Hereinafter, examples and comparative examples are given to more specifically explain the embodiments of the present application. Various tests and evaluations are carried out according to the following methods.

[0078] Test method and equipment:

[0079] Test of stress:

[0080] The measurement is carried out by using Shenzhen Supor Instrument (FST5000 thin film stress measurement instrument).

[0081] Test of heat resistance temperature:

[0082] High temperature test starts from 55℃, next test is 5℃ higher than the previous one, 2h each time, low temperature, time remains unchanged (low temperature is 5±2℃, time is 2h), high and low temperature test alternately until the film layer (interference layer) cracks; the high temperature before the film layer cracks is recorded as the final heat resistance temperature.

[0083] Test of boiling water performance:

[0084] The resin lenses prepared in each example and comparative example are immersed in a boiling 5wt% saline solution for 10min, taken out and immersed in normal temperature water for 2min, taken out and wiped dry with a cotton cloth, 11 horizontal and vertical lines each with a spacing of 1mm are cut on the surface to form 10x10 squares with an area of 1mm 2 , a total of 100 squares, then taped on the squares and quickly peeled off in the direction of 90°, check if the interference layer falls off (the whole square completely falls off or there is falling off at the edge and intersection of the cut). The adhesion grade is classified according to the falling area ratio, falling area ratio (%) = number of falling squares / 100x100%:

[0085] 0 grade: no falling, interference layer is intact;

[0086] 1 grade: falling area ratio ≤5%;

[0087] 2 grade: falling area ratio >5% and ≤15%;

[0088] 3 grade: falling area ratio >15% and ≤35%;

[0089] 4 grade: falling area ratio >35% and ≤65%;

[0090] 5 grade: falling area ratio >65%.

[0091] The boiling water performance is characterized by the above adhesion grade, the higher the grade, the worse the boiling water performance of the resin lens; the lower the grade, the better the boiling water performance of the resin lens.

[0092] Example 1

[0093] (1) Select 1.67MR-7 (manufacturer: Mitsubishi Chemical Corporation, Japan) as the resin substrate, cover 3μm hardening layer on both sides of the surface of 1.67MR-7 resin substrate with H673 hardening solution (manufacturer: Japan Catalyst Co., Ltd.), then put into the incubator oven and bake at 70℃ for 30min.

[0094] (2) Move the semi-finished resin prepared as described above to a vacuum coating machine (LEYBOLDOPTICS ECS 1350, Germany), vacuum to 1x10 -2After Pa, turn on the heating lamp, and set the heating temperature to 65℃. Continue to vacuumize to 2x10 -5 After Pa and the temperature is heated to 65℃, use the Hall ion source to perform plasma treatment, and set the anode voltage to 100V, the argon flow to 20sccm, and the time to 100s.

[0095] Then, deposit a first refractive layer on the surface of the hardened layer: under a vacuum degree of 1x10 -5 Pa, first pre-melt at an electron gun current of 50mA, a rising time of 10s, and a holding time of 20s; second pre-melt at an electron gun current of 130mA, a rising time of 5s, and a holding time of 30s; third pre-melt at an electron gun current of 90mA, a rising time of 5s, and a holding time of 10s; set the evaporation rate to 0.3Å / s, set the ion auxiliary process gas to argon:oxygen=1:8 (volume ratio), the flow to 25sccm, and the anode voltage to 120V. After the pre-melt is completed, start to evaporate the single-layer first refractive layer with a thickness of 25nm. The material of the first refractive layer is a coating film material obtained by mixing silicon dioxide and aluminum oxide in a mass ratio of 90:10, and the purity of the silicon dioxide and the aluminum oxide is 99.995%. The refractive index n1 of the first refractive layer is 1.513.

[0096] (3) a. Depositing a fourth refractive layer: under a vacuum degree of 1x10 -5 Pa, first pre-melt at an electron gun current of 50mA, a rising time of 3s, and a holding time of 5s; second pre-melt at an electron gun current of 70mA, a rising time of 3s, and a holding time of 5s; third pre-melt at an electron gun current of 110mA, a rising time of 3s, and a holding time of 5s; set the evaporation rate to 0.8Å / s. After the pre-melt is completed, start to evaporate the single-layer fourth refractive layer with a thickness of 20nm. The material of the fourth refractive layer is silicon dioxide, and the purity of the silicon dioxide is 99.995%. The refractive index n4 of the fourth refractive layer is 1.468.

[0097] b. Depositing a fifth refractive layer: under a vacuum degree of 2x10 -4 Pa, first pre-melt at an electron gun current of 70mA, a rising time of 5s, and a holding time of 5s; second pre-melt at an electron gun current of 150mA, a rising time of 5s, and a holding time of 5s; third pre-melt at an electron gun current of 210mA, a rising time of 5s, and a holding time of 5s; set the evaporation rate to 0.4Å / s, set the oxygen flow of the ion auxiliary process gas to 25sccm, and adjust the anode voltage to 90V. After the pre-melt is completed, start to evaporate the single-layer fifth refractive layer with a thickness of 18nm. The material of the fifth refractive layer is titanium pentoxide, and the refractive index n5 of the fifth refractive layer is 2.304. That is, the deposition of the single-layer second refractive layer is completed.

[0098] The thickness of the single layer of the fourth refractive layer is adjusted to 36 nm in the first repeating a, and the thickness of the single layer of the fifth refractive layer is adjusted to 41 nm in the first repeating b, i.e. the deposition of two layers of the second refractive layer is completed.

[0099] The thickness of the single layer of the fourth refractive layer is adjusted to 14 nm in the second repeating a, and the thickness of the single layer of the fifth refractive layer is adjusted to 49 nm in the second repeating b, i.e. the deposition of three layers of the second refractive layer is completed.

[0100] (4) Depositing the anti-static layer: under the vacuum degree of 2×10 -4 Pa; pre-melting 1, electron gun current 5 mA, rising time 5 s, holding time 5 s; pre-melting 2, electron gun current 10 mA, rising time 5 s, holding time 5 s; pre-melting 3, electron gun current 15 mA, rising time 5 s, holding time 5 s; evaporation rate is set to 0.1 Å / s, the ion auxiliary process gas oxygen flow is set to 20 sccm, and the anode voltage is adjusted to 90 V. After the pre-melting is completed, the single layer of the anti-static layer with a thickness of 10 nm is deposited. The material of the anti-static layer is selected from ITO.

[0101] Depositing the third refractive layer: under the vacuum degree of 1×10 -5 Pa, pre-melting 1, electron gun current 50 mA, rising time 3 s, holding time 5 s; pre-melting 2, electron gun current 70 mA, rising time 3 s, holding time 5 s; pre-melting 3, electron gun current 110 mA, rising time 3 s, holding time 5 s; evaporation rate is set to 0.8 Å / s. After the pre-melting is completed, the single layer of the third refractive layer with a thickness of 112 nm is deposited. The material of the third refractive layer is silicon dioxide, and the purity of the silicon dioxide is 99.995%. The refractive index of the third refractive layer is n3=1.468.

[0102] Depositing the water and stain resistant layer: heating the molybdenum boat to 110 mA, rising time 10 s, holding time 20 s; evaporation rate is set to 0.1 Å / s. After heating, the single layer of the water and stain resistant layer with a thickness of 25 nm is deposited.

[0103] (5) Repeating steps (2)-(4) on the other surface of the resin substrate, i.e. the resin lens is prepared (the structure is shown in Figure 3 , but not limited to Figure 3 ).

[0104] Examples 2-5

[0105] Except that the related preparation parameters are adjusted according to Table 1, the rest is the same as Example 1.

[0106] Example 6

[0107] Except that after the deposition of three layers of the second refractive layer is completed in step (3) of Example 1, the following steps are continued, the rest is the same as Example 1:

[0108] The third time repeating a, the thickness of the single layer of the fourth refractive layer is adjusted to 50 nm; the third time repeating b, the thickness of the single layer of the fifth refractive layer is adjusted to 38 nm; that is, the deposition of four layers of the second refractive layer is completed.

[0109] The fourth time repeating a, the thickness of the single layer of the fourth refractive layer is adjusted to 58 nm; the fourth time repeating b, the thickness of the single layer of the fifth refractive layer is adjusted to 43 nm; that is, the deposition of five layers of the second refractive layer is completed.

[0110] The fifth time repeating a, the thickness of the single layer of the fourth refractive layer is adjusted to 64 nm; the fifth time repeating b, the thickness of the single layer of the fifth refractive layer is adjusted to 46 nm; that is, the deposition of six layers of the second refractive layer is completed.

[0111] Example 7

[0112] In addition to the step (3) of the example 1, after the deposition of three layers of the second refractive layer is completed, the following steps are continued, and the rest is the same as the example 1:

[0113] The third time repeating a, the thickness of the single layer of the fourth refractive layer is adjusted to 50 nm; the third time repeating b, the thickness of the single layer of the fifth refractive layer is adjusted to 38 nm; that is, the deposition of four layers of the second refractive layer is completed.

[0114] The fourth time repeating a, the thickness of the single layer of the fourth refractive layer is adjusted to 58 nm; the fourth time repeating b, the thickness of the single layer of the fifth refractive layer is adjusted to 43 nm; that is, the deposition of five layers of the second refractive layer is completed.

[0115] The fifth time repeating a, the thickness of the single layer of the fourth refractive layer is adjusted to 64 nm; the fifth time repeating b, the thickness of the single layer of the fifth refractive layer is adjusted to 46 nm; that is, the deposition of six layers of the second refractive layer is completed.

[0116] The sixth time repeating a, the thickness of the single layer of the fourth refractive layer is adjusted to 70 nm; the sixth time repeating b, the thickness of the single layer of the fifth refractive layer is adjusted to 50 nm; that is, the deposition of seven layers of the second refractive layer is completed.

[0117] Examples 8-10

[0118] In addition to adjusting the relevant preparation parameters according to the table 1, the rest is the same as the example 1.

[0119] Example 11

[0120] In addition to the step (4) of the example 1, after the deposition of the third refractive layer is completed, a refractive layer which is the same as the first refractive layer is deposited as the second layer of the third refractive layer, and the rest is the same as the example 1. The total thickness of the two layers of the third refractive layer is h3=137 nm.

[0121] Comparative Example 1

[0122] The rest is the same as Example 1 except that no first refractive layer is provided.

[0123] Comparative Examples 2-3

[0124] The rest is the same as Example 1 except that the relevant preparation parameters are adjusted according to Table 1.

[0125] Table 1

[0126] Note: “\” in Table 1 means no corresponding parameter. The difference between Example 11 and Example 1 is that: Example 1 is provided with one third refractive layer; Example 11 is provided with two third refractive layers, the first third refractive layer is the same as the third refractive layer of Example 1, the second third refractive layer is the same as the first refractive layer of Example 1, and the material of the second third refractive layer is silicon dioxide and aluminum oxide (mass ratio 90:10) and the thickness is 25 nm.

[0127] From Examples 1-11 and Comparative Examples 1-3, it can be seen that the resin lens in the examples of the present application has a compressive stress of -150 to -440 MPa by providing a first refractive layer and adjusting the mass ratio of silicon dioxide and aluminum oxide in the first refractive layer within the range of the present application, and the heat resistance temperature is increased to 75-105℃, and the grid test adhesion of the interference layer is excellent, which shows that the resin lens improves the heat resistance performance on the basis of good boiling performance.

[0128] It should be noted that the relational terms herein such as first and second and the like are used solely to distinguish one entity from another entity, without necessarily requiring or implying any actual relationship or order between or among the entities or operations. Also, the terms “comprises”, “comprising”, or any other variations thereof are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can also include other elements not expressly listed or inherent to such process, method, article, or apparatus.

[0129] Each of the embodiments in the specification is described in a related manner, and the same or similar parts between the embodiments can be referred to each other, and each embodiment mainly explains the difference from other embodiments.

[0130] The above only describes the preferred embodiments of the present application and is not intended to limit the present application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A resin lens, comprising: a resin substrate; a hardening layer arranged on a surface of the resin substrate; an interference layer arranged on a surface of the hardening layer away from the resin substrate, wherein the interference layer comprises N layers of refractive layers in a direction away from the resin substrate, N ranges from 5 to 19, and N is a natural number; wherein the refractive layers comprise a first refractive layer, a second refractive layer and a third refractive layer in sequence, the first refractive layer is arranged between the second refractive layer and the hardening layer, and the second refractive layer comprises 3 to 11 layers of fourth refractive layers and fifth refractive layers arranged alternately; a refractive index of the first refractive layer is n1, a refractive index of the third refractive layer is n3, a refractive index of the fourth refractive layer is n4, and a refractive index of the fifth refractive layer is n5, wherein n4 < n1 < n5, and n3 ≤ n1 < n5; a material of the first refractive layer comprises silicon-containing oxide and aluminum-containing oxide, and a mass ratio of the silicon-containing oxide to the aluminum-containing oxide ranges from 75 to 99 to 1 to 25. The silicon-containing oxide comprises silicon dioxide, and the aluminum-containing oxide comprises aluminum oxide, and a mass ratio of the silicon dioxide to the aluminum oxide ranges from 80 to 98 to 2 to 20. The interference layer further comprises an antistatic layer arranged between the second refractive layer and the third refractive layer, and a water-repellent and stain-repellent layer arranged on a surface of the third refractive layer away from the antistatic layer. A thickness of the first refractive layer is h1, and 20 nm ≤ h1 ≤ 50 nm; a thickness of the third refractive layer is h3, and 60 nm ≤ h3 ≤ 180 nm. 1.50 ≤ n1 ≤ 1.58, 1.50 ≤ n3 ≤ 1.58, 1.45 ≤ n4 ≤ 1.55, and 1.90 ≤ n5 ≤ 2.

38. A material of the third refractive layer comprises the silicon-containing oxide and / or the aluminum-containing oxide. A material of the fourth refractive layer comprises silicon dioxide.

2. The resinous ophthalmic lens of claim 1, wherein, A material of the fifth refractive layer comprises at least one of titanium trioxide, zirconium oxide, tantalum oxide, niobium oxide and zirconium-titanium mixture.

3. The resinous ophthalmic lens of claim 1, wherein, A thickness of the fourth refractive layer ranges from 10 nm to 100 nm, a total thickness of the first refractive layer, the third refractive layer and the fourth refractive layer in the interference layer is h4, a total thickness of the fifth refractive layer is h5, and 80 nm ≤ h4-h5 ≤ 200 nm.

4. The resinous ophthalmic lens of claim 3, wherein, A thickness of the antistatic layer is h6, and 4 nm ≤ h6 ≤ 10 nm.

5. The resinous ophthalmic lens of claim 1, wherein, A thickness of the water-repellent and stain-repellent layer is h7, and 10 nm ≤ h7 ≤ 25 nm.

6. The resinous ophthalmic lens of claim 5, wherein, A thickness of the interference layer is h, and 200 nm ≤ h ≤ 800 nm. The preparation method comprises the following steps: (1) baking after arranging the hardening layer on both surfaces of the resin substrate, a temperature of the baking ranges from 50 ℃ to 70 ℃, and a time of the baking ranges from 30 min to 60 min; 7. The resinous ophthalmic lens of claim 4, wherein, (2) depositing the first refractive layer on a surface of the hardening layer on one side of the resin substrate by ion beam assisted deposition technology after keeping the resin substrate at 44 ℃ to 71 ℃ under vacuum condition. ​ ​ 8. The resinous ophthalmic lens of claim 7, wherein, ​ 9. A method of producing the resin lens according to any one of claims 1 to 8, wherein, ​ ​ ​ (3) depositing a fourth refractive layer on the surface of the first refractive layer, and then depositing a fifth refractive layer on the surface of the fourth refractive layer, and then repeating the deposition of the fourth refractive layer and the fifth refractive layer alternately for 2-10 times, so as to obtain 3-11 layers of second refractive layers; (4) depositing a third refractive layer on the surface of the second refractive layer in a direction away from the resin substrate; (5) repeating steps (2)-(4) on the other surface of the resin substrate, so as to obtain the resin lens.

10. The production method according to claim 9, wherein In step (4), before depositing the third refractive layer, an anti-static layer is deposited on the surface of the second refractive layer; After depositing the third refractive layer, a water and dirt repellent layer is deposited on the surface of the third refractive layer.

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