Auxiliary graph adding method and system and layout

Abstract

The invention provides an auxiliary graph adding method and system and a layout, and belongs to the field of semiconductors. The auxiliary graph adding method comprises the following steps: providing a layout, dividing the layout into a plurality of areas, adding a second auxiliary graph on one side, far away from the main graph, of the first auxiliary graph, and adjusting parameters of the second auxiliary graph until the graph density of the target area is within a target threshold range, the minimum distance between the second auxiliary graph and the main graph meets a set value. According to the invention, the second auxiliary pattern is added, and the minimum distance between the second auxiliary pattern and the main pattern meets the set value, so that the second auxiliary pattern cannot be imaged and does not influence the key size of the main pattern, thereby reducing the load effect, avoiding the influence on the pattern size uniformity, and improving the problem of non-uniform pattern density in the layout. Especially for a low-density graph area in the layout, the light transmittance distribution of the area is ensured to be uniform, and the problem of non-uniform imaging is reduced.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and in particular to an auxiliary graphic addition method, system, and layout. Background Technology

[0002] With the development of integrated circuit manufacturing processes, the feature size of semiconductor devices is constantly shrinking, and the scale of designs is constantly expanding, which makes the design complexity of semiconductor devices increasingly higher. When the feature size approaches the theoretical resolution limit of the photolithography system, the image formed on the wafer after photolithography will produce significant distortion, resulting in a serious deterioration in photolithography quality. To solve this problem, the industry has proposed and adopted resolution enhancement techniques, which mainly include off-axis illumination, optical proximity correction, phase-shifting masks, and sub-resolution assisted patterning (SRAF) correction methods.

[0003] Traditional SRAF (Self-Range Image Filter) is typically placed close to the main pattern, ensuring only the lithography process window of the main pattern is protected. Using this conventional approach results in uneven optical density distribution. The light transmittance load on the mask and the pattern density affect the uniformity of the exposure target threshold, with smaller line diameters having a greater impact. In areas of low pattern density, the thermal effect of the projection lens (lens heating) during lithography can change the lens's refractive index, altering the optical path and creating thermal phase difference. This reduces image sharpness and contrast, affecting the precision and quality of the lithographic pattern.

[0004] It should be noted that the information disclosed in the background section of this invention is intended only to enhance the understanding of the general background of this invention, and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Summary of the Invention

[0005] The purpose of this invention is to provide an auxiliary pattern addition method, system, and layout to address the problem that in areas with low pattern density, the thermal effect of the projection lens (lens heating) during the photolithography process may cause changes in the refractive index of the lens, thereby altering the optical path, generating thermal phase difference, reducing the clarity and contrast of the image, and affecting the accuracy and quality of the photolithographic pattern.

[0006] To solve the above-mentioned technical problems, the present invention provides an auxiliary graphic addition method, comprising:

[0007] Provide a map, divide the map into several regions, and obtain the graphic density of each region;

[0008] Based on the rules for adding auxiliary graphics and the graphic density of each region, the target region for adding auxiliary graphics is obtained, and the target region includes several main graphics.

[0009] Add a first auxiliary graphic around the main graphic;

[0010] A second auxiliary graphic is added on the side of the first auxiliary graphic that is far from the main graphic. The parameters of the second auxiliary graphic are adjusted so that the graphic density of the target area is within the target threshold range, and the minimum distance between the second auxiliary graphic and the main graphic meets the set value.

[0011] Preferably, providing a layout, dividing the layout into several regions, and obtaining the graphic density of each region includes:

[0012] Based on the layout design data, obtain the total area of ​​the layout;

[0013] Based on the total area, the map is divided into several regions, each with an equal area;

[0014] Based on the layout design data, obtain the graphic density of each region.

[0015] Preferably, the step of obtaining the target area for adding auxiliary graphics based on the auxiliary graphics addition rules and the graphics density of each region, wherein the target area includes several main graphics, including:

[0016] Based on the graphic density of each region, a target threshold for the graphic density of the map is defined.

[0017] Regions with graphic density below the target threshold and regions with uneven graphic density are identified to pinpoint the target areas where auxiliary graphics need to be added.

[0018] Preferably, the step of adding a second auxiliary graphic on the side of the first auxiliary graphic away from the main graphic, adjusting the parameters of the second auxiliary graphic until the graphic density of the target area is within a target threshold range, and ensuring that the minimum distance between the second auxiliary graphic and the main graphic meets a set value includes:

[0019] Add a second auxiliary graphic to the side of the first auxiliary graphic that is far from the main graphic, and obtain the first graphic density of the target area;

[0020] The first graphic density is compared with the target threshold. If the first graphic density is within the target threshold range, the second auxiliary graphic is added. If the first graphic density is not within the target threshold range, the parameters of the second auxiliary graphic are adjusted until the final graphic density of the target area is within the target threshold range.

[0021] Preferably, the parameters for adjusting the second auxiliary graphic include:

[0022] The width of the second auxiliary graphic, the spacing between two adjacent second auxiliary graphics, the minimum distance between the second auxiliary graphic and the main graphic, and the number of second auxiliary graphics.

[0023] Preferably, the minimum distance between the second auxiliary graphic and the main graphic is greater than or equal to 600 nm.

[0024] Preferably, the addition of the second auxiliary graphic satisfies the layout design rules.

[0025] Preferably, the shape of the second auxiliary graphic includes one or any combination of rectangles, squares, T-shapes, L-shapes, and irregular shapes.

[0026] Based on the same inventive concept, the present invention also provides an auxiliary graphic addition system, comprising:

[0027] The acquisition module is used to provide a map, divide the map into several regions, and acquire the graphic density of each region; based on the auxiliary graphic addition rules and the graphic density of each region, acquire the target region for adding auxiliary graphics, the target region including several main graphics;

[0028] An addition module is used to add a first auxiliary graphic around the main graphic; add a second auxiliary graphic on the side of the first auxiliary graphic away from the main graphic, adjust the parameters of the second auxiliary graphic so that the graphic density of the target area is within a target threshold range, and the minimum distance between the second auxiliary graphic and the main graphic satisfies a set value.

[0029] Based on the same inventive concept, the present invention also provides a layout comprising:

[0030] Add auxiliary graphics to the layout using the method described above.

[0031] Compared with the prior art, the auxiliary graphic addition method of the present invention has the following advantages:

[0032] This invention provides a layout, divides the layout into several regions, and obtains the graphic density of each region. Based on auxiliary graphic addition rules and the graphic density of each region, a target region for adding auxiliary graphics is obtained, the target region including several main graphics. A first auxiliary graphic is added around the main graphics; a second auxiliary graphic is added on the side of the first auxiliary graphic away from the main graphics, and the parameters of the second auxiliary graphic are adjusted so that the graphic density of the target region is within a target threshold range, and the minimum distance between the second auxiliary graphic and the main graphics meets a set value. By adding the first auxiliary graphic, the process window of the main graphics can be increased. By adding the second auxiliary graphic, and the minimum distance between the second auxiliary graphic and the main graphics meets the set value, the second auxiliary graphic neither forms an image nor affects the critical dimensions of the main graphics, thereby reducing the load effect and avoiding affecting the uniformity of graphic size, thus improving the problem of uneven graphic density in the layout. In particular, for low-density graphic areas in the layout, it ensures uniform light transmission distribution in the area and reduces the problem of uneven imaging.

[0033] The auxiliary pattern adding system and layout provided by this invention belong to the same inventive concept as the auxiliary pattern adding method provided by this invention. Therefore, the auxiliary pattern adding system and layout provided by this invention have at least all the advantages of the auxiliary pattern adding method provided by this invention, avoiding affecting the uniformity of pattern size, thereby improving the problem of uneven pattern density in the layout and improving the reliability and yield of the device. Attached Figure Description

[0034] Figure 1 This is a schematic diagram of adding the first auxiliary graphic on both sides of the main graphic;

[0035] Figure 2 This is a flowchart of an auxiliary graphic addition method according to an embodiment of the present invention;

[0036] Figure 3 This is a schematic diagram illustrating the addition of a second auxiliary graphic to a main graphic using the method provided by the present invention in one embodiment of the present invention;

[0037] Figure 4 This is a schematic diagram illustrating the division of the layout into different regions in one embodiment of the present invention;

[0038] Figure 5 This is a graph showing the change in graphic density as a function of the distance between the second auxiliary graphic and the main graphic in one embodiment of the present invention.

[0039] Figure 6 This is a schematic diagram of an embodiment of the present invention where the second auxiliary graphic is too close to the main graphic, allowing the second auxiliary graphic to be imaged.

[0040] Figure 7This is a schematic diagram illustrating how, in one embodiment of the present invention, the second auxiliary graphic is so close to the main graphic that it can influence the CD value of the main graphic.

[0041] Figure 8 This is a schematic diagram in one embodiment of the present invention where the second auxiliary graphic cannot be imaged and does not affect the CD value of the main graphic.

[0042] Figure 9 This is a graph showing the change in graphic density as a function of the number of second auxiliary graphics in one embodiment of the present invention;

[0043] Figure 10 This is a schematic diagram of light intensity distribution formed by adding only the first auxiliary graphic in one embodiment of the present invention;

[0044] Figure 11 This is a schematic diagram of light intensity distribution formed by adding a second auxiliary graphic in one embodiment of the present invention;

[0045] Figure 12 This is a schematic diagram of the layout graphic density distribution when only the first auxiliary graphic is added in one embodiment of the present invention;

[0046] Figure 13 This is a schematic diagram of the layout graphic density distribution after adding a second auxiliary graphic in one embodiment of the present invention;

[0047] 100 - Main graphic; 200 - First auxiliary graphic;

[0048] 300 - Second auxiliary graphic. Detailed Implementation

[0049] To make the objectives, advantages, and features of the present invention clearer, the auxiliary graphic addition method, system, and layout proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be noted that the drawings are all in a very simplified form and use non-precise scales, only for the purpose of conveniently and clearly illustrating the embodiments of the present invention. It should be understood that the drawings do not necessarily show the specific structure of the present invention to scale, and the illustrative features used to illustrate certain principles of the present invention in the drawings are also drawn in a slightly simplified manner. Specific design features of the present invention disclosed herein, including, for example, specific dimensions, orientations, positions, and shapes, will be determined in part by the specific application and usage environment. Furthermore, in the embodiments described below, the same reference numerals are sometimes used across different drawings to denote the same parts or parts having the same function, and their repeated descriptions are omitted. In this specification, similar reference numerals and letters are used to denote similar items; therefore, once an item is defined in one drawing, it does not need to be further discussed in subsequent drawings.

[0050] In addition, the terms "first" and "second" are for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, such as two, three, etc., unless otherwise specifically defined.

[0051] In the description of this specification, the description referring to terms such as "one embodiment", "some embodiments", "example", "specific example", or "some examples", etc. means that the specific features, structures, materials, or characteristics described in connection with that embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described can be combined in a suitable manner in any one or more embodiments or examples. In addition, without contradiction, those skilled in the art can combine and combine the different embodiments or examples described in this specification and the features of different embodiments or examples.

[0052] As shown Figure 1 When correcting the main pattern 100, in order to ensure the lithography process window of the main pattern 100, only the first auxiliary pattern 200 is added on both sides of the main pattern 100. However, since the distance between the first auxiliary pattern 200 and the main pattern 100 is too close, it has almost no influence on the pattern density, resulting in uneven optical density distribution. The light transmission load degree and pattern density on the photomask will affect the uniformity of the exposure target threshold, and the smaller the line width of the first auxiliary pattern 200, the greater the influence. When the pattern density in this area is low, it will be affected by the thermal effect of the projection lens during the lithography process, resulting in a change in the optical path, generating thermal phase difference, and decreasing the clarity and contrast of the imaging, affecting the accuracy and quality of the lithography pattern, and further affecting the yield of the device.

[0053] The core idea of the present invention is to provide a method for adding auxiliary patterns, which can monitor the processing efficiency of the Scrubber device in real time and avoid the problem of lag in monitoring the processing efficiency of exhaust gas.

[0054] To achieve the above idea, the present invention provides a method for adding auxiliary patterns, as shown Figures 2 to 13 A specific implementation manner of a method for adding auxiliary patterns is disclosed. The method for adding auxiliary patterns includes the following steps S1 to step S4.

[0055] Step S1: Provide a layout, divide the layout into several regions, and obtain the pattern density of each region.

[0056] Specifically, as shown Figures 2 to 4As shown, a layout is provided, which includes several patterns. These patterns can be metal layer patterns, via layer patterns, contact via patterns, gate patterns, etc. During layout design, a GDS file is generated. Providing a layout, dividing it into several regions, and obtaining the pattern density of each region, as well as the uniformity of the pattern density in each region, includes: First, based on the data provided in the GDS file, the total area of ​​the layout can be obtained. Second, based on the total area of ​​the layout, the layout is divided into several regions. Each region has an equal area. The layout can be divided into one region, two regions, or multiple regions (i.e., three or more regions). For example, it can be divided as follows... Figure 4 As shown, the map is divided into 28 regions. Finally, the graphic density of each region, as well as the uniformity of the graphic density in each region, can be obtained through the GDS file.

[0057] Step S2: Based on the auxiliary graphic addition rules and the graphic density of each region, obtain the target region for adding auxiliary graphics, wherein the target region includes several main graphics 100.

[0058] Specifically, continue to participate Figures 2 to 4 As shown, based on the rules for adding auxiliary graphics and the graphic density of each region, the target regions for adding auxiliary graphics include:

[0059] First, based on the graphic density of each region, a target threshold for the graphic density of the entire map is defined. The graphic density of each region is obtained from the data in the GDS file. Based on the graphic density of each region, the target threshold for the graphic density of the entire map can be defined.

[0060] Next, areas with graphic density below the target threshold and areas with uneven graphic density are identified to pinpoint the target areas where auxiliary graphics need to be added. For example, it can be done as follows: Figure 4 As shown, regions with image density below the target threshold and regions with uneven image density are marked, forming a pattern as follows. Figure 4 The diagram shown is from... Figure 4 It is clear that the areas containing A1, A2, and A3 are the target areas where auxiliary graphics need to be added.

[0061] Step S3: Add a first auxiliary graphic 200 around the main graphic 100.

[0062] Specifically, refer to Figure 2 and Figure 3 As shown, adding a first auxiliary graphic 200 around the main graphic 100 can increase the process window of the main graphic 100. The minimum distance between the first auxiliary graphic 200 and the main graphic 100, as well as the key dimensions of the first auxiliary graphic 200, are already familiar to those skilled in the art and will not be described in detail here.

[0063] Step S4: Add a second auxiliary graphic 300 on the side of the first auxiliary graphic 200 away from the main graphic 100, adjust the parameters of the second auxiliary graphic 300 until the graphic density of the target area is within the target threshold range, and the minimum distance between the second auxiliary graphic 300 and the main graphic 100 meets the set value.

[0064] Specifically, refer to Figures 2 to 13 As shown, the second auxiliary graphic 300 can be one of the following: rectangle, square, L-shape, T-shape, or irregular shape, or any combination thereof, to better adapt to the requirements of specific graphic density.

[0065] A second auxiliary graphic 300 is added to the side of the first auxiliary graphic 200 away from the main graphic 100. The parameters of the second auxiliary graphic 300 are adjusted so that the graphic density of the target area is within a target threshold range. The minimum distance between the second auxiliary graphic 300 and the main graphic 100 satisfies the set value, including:

[0066] First, a second auxiliary graphic 300 is added to the side of the first auxiliary graphic 200 away from the main graphic 100, and the first graphic density of this target area is obtained. The width of the second auxiliary graphic 300 (i.e., Figure 3 The W in the figure), and the spacing between two adjacent second auxiliary figures 300 (i.e., Figure 3 The initial values ​​of W and S satisfy the layout design rules. The initial values ​​of W and S can be the minimum values ​​that satisfy the design rules. The initial number of the second auxiliary graphic 300 on one side of the main graphic 100 can be one, two, or as shown below. Figure 3 The three shown are examples; of course, you can choose more than three. Figure 3 The example shown uses three secondary auxiliary graphics 300 on one side of the main graphic 100. The layout after adding the secondary auxiliary graphics 300 can be simulated, and the graphic density of the target area can be obtained through the simulation system.

[0067] The first graphic density is compared with the target threshold. If the first graphic density is within the target threshold range, the second auxiliary graphic 300 is added. If the first graphic density is not within the target threshold range, the parameters of the second auxiliary graphic 300 are adjusted to increase the graphic density of the target area until the final graphic density of the target area is within the target threshold range.

[0068] Adjusting the parameters of the second auxiliary graphic 300 includes: the width of the second auxiliary graphic 300 (i.e., Figure 3 The W in the figure), the spacing between two adjacent second auxiliary figures 300 (i.e., Figure 3The minimum spacing (i.e., S in ) between the second auxiliary pattern 300 and the main pattern 100, Figure 3 the D in ), and the number of the second auxiliary patterns 300.

[0069] The minimum spacing (i.e., Figure 3 the D in ) between the second auxiliary pattern 300 and the main pattern 100 meets a set value.

[0070] Refer Figure 6 as shown, select a value of D less than 200 nm, and form a simulation schematic diagram as Figure 6 shown through simulation. It can be seen from Figure 6 that the second auxiliary pattern 300 is imaged. Therefore, during the lithography process, the second auxiliary pattern 300 will also form an etched pattern on the wafer, affecting the performance of the device. Refer Figure 7 as shown, select a value of D between 200 nm and 600 nm, form the second auxiliary pattern 300, and form a simulation schematic diagram as Figure 7 shown through simulation. It can be seen from Figure 7 that although the second auxiliary pattern 300 is not imaged, it affects the critical dimension of the main pattern 100 (i.e., Figure 3 the CD value in ). In the Figure 7 simulation schematic diagram shown, the original CD value of the main pattern 100 can be designed to be 70 nm, the actual target value of the pattern obtained by exposing the main pattern 100 is 64.2. If the spacing between the second auxiliary pattern 300 and the main pattern 100 is too small, the CD value of the main pattern 100 formed through simulation is 62.99 nm, and the CD value of the main pattern 100 after simulation decreases. When transferring this main pattern 100 to the wafer, it is easy to cause poor device contact and reduce the reliability of the device. Refer Figure 8 as shown, select a value of D greater than 600 nm when forming the second auxiliary pattern 300. Form a simulation schematic diagram as Figure 8 shown through simulation. It can be seen from Figure 8 that the second auxiliary pattern 300 neither images nor affects the CD value of the main pattern 100.

[0071] Refer Figure 5 as shown, in Figure 5 , when the value of D reaches 600 nm, the graphic density area is stable. To ensure that the second auxiliary pattern 300 does not image and does not affect the CD value of the main pattern 100, select the distance between the second auxiliary pattern 300 and the main pattern 100 to be greater than or equal to 600 nm, and preferably the distance between the second auxiliary pattern 300 and the main pattern 100 to be greater than or equal to 1 μm. Figure 5The dot in it, that is, when the minimum distance between the second auxiliary figure 300 and the main figure 100 is 0, it means that the second auxiliary figure 300 is not added.

[0072] Refer Figure 9 As shown, the figure density increases with the increase in the number of the second auxiliary figures 300. Therefore, as long as the number of the second auxiliary figures 300 is increased, the figure density of the target area can also be improved. However, the number of the second auxiliary figures 300 will not increase infinitely. When adding the second auxiliary figure 300, the second auxiliary figure 300 also needs to meet the design rules. For example, the distance between the second auxiliary figure 300 and other adjacent figures also needs to meet the minimum value of the setting rules. Although the distance D between the second auxiliary figure 300 and the main figure 100 is greater than or equal to 1 μm. However, based on the number of the second auxiliary figures 300 and the distance S between two adjacent second auxiliary figures 300, the value of the distance D between the second auxiliary figure 300 and the main figure 100 can also be limited.

[0073] Refer Figure 10 and Figure 11 As shown, Figure 11 It is a schematic diagram of the light intensity distribution formed by only adding the first auxiliary figure 200. Figure 11 It is a schematic diagram of the light intensity distribution formed by adding the second auxiliary figure 300. From Figure 10 and Figure 11 The comparison diagram, it can be seen that Figure 11 The light intensity distribution in it is more uniform.

[0074] Refer Figure 12 and Figure 13 As shown, Figure 12 It is a schematic diagram of the layout figure density distribution when only adding the first auxiliary figure 200. Figure 13 It is a schematic diagram of the layout figure density distribution after adding the second auxiliary figure 300. From Figure 12 and Figure 13 It can be seen that the figure density distribution of the 50 scan areas without adding the second auxiliary figure 300 filling is between 30 and 41, and the average figure density is 37.6. After adding the second auxiliary figure 300 filling figure, the figure density distribution is 33 - 41, and the average figure density is 38.5.

[0075] The auxiliary graphic addition method disclosed in this embodiment adds a second auxiliary graphic 300 after adding a first auxiliary graphic 200 to the main graphic 100. The distance between the added second auxiliary graphic 300 and the main graphic 100 is greater than or equal to 1 μm. This ensures that the added second auxiliary graphic 300 neither forms an image nor affects the CD value of the main graphic 100, thereby reducing the load effect and avoiding impact on graphic size uniformity, thus improving the problem of uneven graphic density in the layout. In particular, it ensures uniform light transmission distribution in low-density graphic areas of the layout, reducing the problem of uneven imaging.

[0076] To achieve the above idea, this embodiment also discloses an auxiliary graphics adding system, including:

[0077] The acquisition module is used to provide a map, divide the map into several regions, and acquire the graphic density of each region; based on the auxiliary graphic addition rules and the graphic density of each region, acquire the target region for adding auxiliary graphics, the target region including several main graphics 100;

[0078] An addition module is used to add a first auxiliary graphic 200 around the main graphic 100; add a second auxiliary graphic 300 on the side of the first auxiliary graphic 200 away from the main graphic 100; adjust the parameters of the second auxiliary graphic 300 so that the graphic density of the target area is within the target threshold range; and the minimum distance between the second auxiliary graphic 300 and the main graphic 100 satisfies the set value.

[0079] To achieve the above idea, this embodiment also discloses a layout, including:

[0080] Add auxiliary graphics to the layout using the method described above.

[0081] The auxiliary pattern adding system and layout provided in this embodiment belong to the same inventive concept as the auxiliary pattern adding method provided in this embodiment. Therefore, the auxiliary pattern adding system and layout provided in this embodiment have at least all the advantages of the auxiliary pattern adding method provided in this embodiment, avoiding affecting the uniformity of pattern size, so as to improve the problem of uneven pattern density in the layout and improve the reliability and yield of the device.

[0082] In summary, the above embodiments have provided detailed descriptions of different configurations of the auxiliary graphic addition method, system, and layout. Of course, the above descriptions are only descriptions of preferred embodiments of the present invention and are not intended to limit the scope of the present invention in any way. The present invention includes, but is not limited to, the configurations listed in the above embodiments. Those skilled in the art can draw inferences from the above embodiments. Any changes or modifications made by those skilled in the art based on the above disclosure are within the protection scope of the claims.

Claims

1. A method for adding auxiliary graphics, characterized in that, include: Provide a map, divide the map into several regions, and obtain the graphic density of each region; Based on the rules for adding auxiliary graphics and the graphic density of each region, the target region for adding auxiliary graphics is obtained, and the target region includes several main graphics. Add a first auxiliary graphic around the main graphic; A second auxiliary graphic is added on the side of the first auxiliary graphic that is far from the main graphic. The parameters of the second auxiliary graphic are adjusted so that the graphic density of the target area is within the target threshold range, and the minimum distance between the second auxiliary graphic and the main graphic meets the set value.

2. The auxiliary graphic addition method according to claim 1, characterized in that, The provision of a layout, dividing the layout into several regions, and obtaining the graphic density of each region includes: Based on the layout design data, obtain the total area of ​​the layout; Based on the total area, the map is divided into several regions, each with an equal area; Based on the layout design data, obtain the graphic density of each region.

3. The auxiliary graphic addition method according to claim 2, characterized in that, The method involves obtaining the target region for adding auxiliary graphics based on the rules for adding auxiliary graphics and the graphic density of each region. The target region includes several main graphics, including: Based on the graphic density of each region, a target threshold for the graphic density of the map is defined. Regions with graphic density below the target threshold and regions with uneven graphic density are identified to pinpoint the target areas where auxiliary graphics need to be added.

4. The auxiliary graphic addition method according to claim 1, characterized in that, The step of adding a second auxiliary graphic on the side of the first auxiliary graphic away from the main graphic, and adjusting the parameters of the second auxiliary graphic so that the graphic density in the target area is within a target threshold range, and the minimum distance between the second auxiliary graphic and the main graphic satisfies a set value, includes: Add a second auxiliary graphic to the side of the first auxiliary graphic that is far from the main graphic, and obtain the first graphic density of the target area; The first graphic density is compared with the target threshold. If the first graphic density is within the target threshold range, the second auxiliary graphic is added. If the first graphic density is not within the target threshold range, the parameters of the second auxiliary graphic are adjusted until the final graphic density of the target area is within the target threshold range.

5. The auxiliary graphic addition method according to claim 4, characterized in that, The parameters for adjusting the second auxiliary graphic include: The width of the second auxiliary graphic, the spacing between two adjacent second auxiliary graphics, the minimum distance between the second auxiliary graphic and the main graphic, and the number of second auxiliary graphics.

6. The auxiliary graphic addition method according to claim 1, characterized in that, The minimum distance between the second auxiliary graphic and the main graphic is greater than or equal to 600 nm.

7. The auxiliary graphic addition method according to claim 1, characterized in that, The addition of the second auxiliary graphic satisfies the layout design rules.

8. The auxiliary graphic addition method according to claim 1, characterized in that, The shape of the second auxiliary graphic includes rectangle, square, T-shape, L-shape, and irregular shape or any combination thereof.

9. An auxiliary graphic addition system, characterized in that, include: The acquisition module is used to provide a layout, divide the layout into several regions, and acquire the graphic density of each region; Based on the rules for adding auxiliary graphics and the graphic density of each region, the target region for adding auxiliary graphics is obtained, and the target region includes several main graphics. Add a module for adding a first auxiliary graphic around the main graphic; A second auxiliary graphic is added on the side of the first auxiliary graphic that is far from the main graphic. The parameters of the second auxiliary graphic are adjusted so that the graphic density of the target area is within the target threshold range, and the minimum distance between the second auxiliary graphic and the main graphic meets the set value.

10. A layout, characterized in that, include: Add auxiliary graphics to the layout using the method described in any one of claims 1-8.

Images