Curved glass coating method, curved glass coating device and curved glass coating system

Abstract

The invention discloses a curved glass coating method, a curved glass coating device and a curved glass coating system, and relates to the technical field of glass coating. The technological process suitable for curved glass coating is developed, the technological system can adjust technological parameters in real time according to different parts of curved glass and coating requirements, and uniform deposition and high-quality formation of a film layer are guaranteed. And meanwhile, an advanced online detection and feedback mechanism is introduced, so that the quality of the film layer is ensured, and adjustment and optimization are carried out in time. The application bottleneck of a horizontal film coating line and a vertical film coating line in curved glass film coating is broken through, an efficient, stable and high-quality solution is provided for the curved glass film coating industry, and wide application and development of curved glass can be powerfully promoted.

Description

Technical Field

[0001] This invention relates to the field of glass coating technology, and in particular to a method, apparatus and system for coating curved glass. Background Technology

[0002] Many industrial products require glass with a surface coating. The industry commonly uses magnetron sputtering equipment for glass coating. Traditional glass coating methods typically involve keeping the target stationary while the glass moves at a constant speed past it. During this movement, the target, under the influence of a magnetic field, sputters particles onto the glass, thus achieving the coating. However, these methods are primarily suitable for flat glass, and the horizontal and vertical coating lines in these technologies are only applicable to flat glass. When applied to curved glass, the equipment structure is difficult to perfectly match the unique shape and size of curved glass. For example, horizontal coating lines are prone to inaccurate glass positioning and misalignment during transport; vertical coating lines are prone to difficulties in precisely controlling the distance between equipment components and the glass surface. These problems limit the production efficiency and quality of curved glass coating. Summary of the Invention

[0003] The main objective of this invention is to develop a novel coating method for curved glass, and to develop a precise control algorithm and process flow suitable for coating curved glass. This process system can adjust process parameters in real time according to different parts of the curved glass and coating requirements, ensuring uniform deposition and high-quality film formation.

[0004] To achieve the above objectives, the present invention proposes a method for coating curved glass, the method comprising the following steps: S1. The curved glass component is conveyed to the first detection device, and the physical parameters of the curved glass component are detected. S2. The curved glass component leaves the first detection device and is transferred to the magnetron sputtering device. The magnetron sputtering device is adjusted to the first working state according to the physical parameters of the curved glass component in step S1. S3. The magnetron sputtering device pre-coats the curved glass component, forming a pre-coating layer on the surface of the curved glass component. S4. The curved glass component is conveyed to the second detection device, which detects the pre-coating layer and obtains the physical parameters of the pre-coating layer; the magnetron sputtering device is adjusted to the second working state according to the physical parameters of the pre-coating layer; the magnetron sputtering device performs a second coating on the curved glass component. S5. Complete the coating of the curved glass component.

[0005] In one embodiment, in step S1, when the curved glass piece reaches the corresponding position of the first detection device, it is locked by the positioning device and then detected.

[0006] In one embodiment, in step S1, the first detection device includes a surface detector.

[0007] In one embodiment, in step S1, the physical parameters of the curved glass component include the curvature and arch height of the curved glass component.

[0008] In one embodiment, in step S2, the first detection device transmits the physical parameters of the curved glass component to the data processor. The data processor performs calculations based on the physical parameters of the curved glass component to obtain the first operating parameters of the magnetron sputtering device and transmits them to the magnetron sputtering device. The magnetron sputtering device adjusts to the first operating state based on the first operating parameters.

[0009] In one embodiment, the first operating parameters of the magnetron sputtering device include the magnetic field strength, magnetic field direction, and output power of the magnetic cathode.

[0010] In one embodiment, in step S4, the second detection device includes a photometer; the physical parameters of the pre-coating layer include color data of different sites on the pre-coating layer, and the color data includes the chromaticity coordinates X measured at a set wavelength λ of the photometer. n Y n and brightness value L n a n and b n .

[0011] In one embodiment, in step S4, the second detection device transmits the physical parameters of the pre-plated layer to the data processor. The data processor performs calculations based on the physical parameters of the pre-plated layer to obtain the second operating parameters of the magnetron sputtering device and transmits them to the magnetron sputtering device. The magnetron sputtering device adjusts to the second operating state based on the second operating parameters.

[0012] In one embodiment, the second operating parameters of the magnetron sputtering device include the magnetic field strength, magnetic field direction, and output power of the magnetic cathode.

[0013] In one embodiment, step S4 specifically includes the following steps: S41. During the detection process of the pre-coating layer by the second detection device, n sites are selected at equal intervals along a curved cross section of the curved glass piece. The color data of the sites is measured by the photometer and uploaded to the data processor. The data processor calculates the first thickness of the pre-coating layer at the n sites through optical software. S42, The data processor calculates the second thickness d that needs to be deposited in the secondary coating process for the n sites to achieve the target thickness value based on the pre-coating layer. n ; S43. The data processor calculates the second working parameters according to the empirical formula and transmits the second working parameters to the magnetron sputtering device. The magnetron sputtering device adjusts to the second working state according to the second working parameters and performs secondary coating on the curved glass part. The empirical formula includes: d n =(k·P·Ln·t·B n ) / (2πrl); k is a coefficient with a value of 0.05~10; P is the output power of the magnetic cathode in watts; Ln is the distance between the site and the target material corresponding in the vertical direction in millimeters; t is the magnetron sputtering time of the site in seconds; Bn is the magnetic field strength corresponding to the site in millitalas; r is the radius of the target material corresponding to the site in millimeters; l is the length of the target material corresponding to the site in millimeters.

[0014] In one embodiment, the curved glass component undergoes step S4 repeatedly during the coating process.

[0015] The present invention also proposes a curved glass coating apparatus, which is applied in the above-mentioned curved glass coating method; the curved glass coating apparatus includes a first detection device and a magnetron sputtering device; wherein, the first detection device includes the positioning device, the curved surface detector, the conveying device and the motor; the magnetron sputtering device includes a second detection device, the magnetron sputtering device, the conveying device and the motor.

[0016] The present invention also proposes a system applied in the curved glass coating method; the system includes a data acquisition system, a data processing system, and a data execution system; the data acquisition system is used to acquire the physical parameters of the curved glass component or the physical parameters of the pre-coated layer and transmit them to the data processing system; the data processing system includes a data processor, used to analyze and process the data transmitted by the data acquisition system and convert it into the first working parameter or the second working parameter and transmit it to the data execution system; the data execution system adjusts the magnetron sputtering device to the first working state or the second working state according to the first working parameter or the second working parameter transmitted by the data processing system.

[0017] The technical solution of this invention develops a process flow suitable for coating curved glass. This process system can adjust process parameters in real time according to different parts of the curved glass and coating requirements, ensuring uniform deposition and high-quality film formation. It also introduces an advanced online detection and feedback mechanism to guarantee film quality and allow for timely adjustments and optimizations. This breakthrough overcomes the application bottlenecks of horizontal and vertical coating lines in curved glass coating, providing the curved glass coating industry with an efficient, stable, and high-quality solution that can strongly promote the widespread application and development of curved glass. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0019] Figure 1 This is a schematic diagram of the structure of a magnetron sputtering apparatus according to an embodiment of the present invention; Figure 2 This is a schematic diagram of a sputtering structure according to an embodiment of the present invention; Figure 3 This is a schematic diagram of the structure of the driving component and the magnetic component according to an embodiment of the present invention; Figure 4 This is a schematic diagram of the driving component and the magnetic component in a sputtering structure according to an embodiment of the present invention from another perspective. Figure 5 This is a schematic diagram of the structure of a first detection device according to an embodiment of the present invention; Figure 6 This is a schematic diagram of the thickness distribution of the pre-plated layer at each point in one embodiment of the present invention; Explanation of icon numbers: 1. Housing; 11. Cavity; 12. Sputtering nozzle; 100. Sputtering structure; 2. Drive assembly; 21. Drive component; 22. Transmission rod; 23. Sleeve; 3. Magnetic assembly; 31. Mounting base; 311. Mounting surface; 312. Slot; 32. Magnetic component; 321. Sputtering magnetic field; 201. Target material; 202. Curved glass component; 300. Magnetron sputtering device; 301. Coating base; 3011. Reaction chamber; 302. Transfer mechanism; 3021. Working plane; 303. Positioning sensor; 4. First detection device; 41. Curved surface detector; 42. Positioning device.

[0020] The realization of the objective, functional features and advantages of the present invention will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0021] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present invention.

[0022] It should be noted that if the embodiments of the present invention involve directional indicators (such as up, down, left, right, front, back, etc.), the directional indicators are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indicators will also change accordingly.

[0023] Furthermore, if the embodiments of this invention involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the use of "and / or" or "and / or" throughout the text includes three parallel solutions. For example, "A and / or B" includes solution A, solution B, or a solution where both A and B are satisfied simultaneously. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this invention.

[0024] The technical problem addressed by this application is that most glass coating processes in the industry use magnetron sputtering equipment. Traditional glass coating methods typically involve fixing the target and then moving the glass at a constant speed past it. During this movement, the target, under the influence of a magnetic field, sputters particles onto the glass, thus achieving coating. However, these methods are primarily suitable for flat glass, and the horizontal and vertical coating lines in related technologies are only applicable to flat glass. When applied to curved glass, the equipment structure is difficult to perfectly match the unique shape and size of the curved glass.

[0025] Existing horizontal and vertical coating lines have revealed a series of pressing technical challenges in practical applications, including: First, insufficient equipment adaptability. Horizontal coating lines are prone to problems such as inaccurate glass positioning and misalignment during transport; vertical coating lines are prone to difficulties in precisely controlling the distance between equipment components and the glass surface. Second, insufficient process stability. Existing horizontal and vertical coating lines lack precise process control mechanisms for coating curved glass, making it difficult to effectively control the deposition rate, thickness, and uniformity of the film during the coating process. Third, uneven film quality. Due to the curvature of curved glass, the distribution of coating particles during deposition is greatly affected, resulting in significant inhomogeneities in film thickness, composition, and optical properties. These problems restrict the production efficiency and quality of curved glass coating.

[0026] To address the aforementioned technical problems, this application proposes a method for coating curved glass, comprising the following steps: S1. The curved glass component is conveyed to the first detection device, and the physical parameters of the curved glass component are detected. S2. The curved glass component leaves the first detection device and is transferred to the magnetron sputtering device. The magnetron sputtering device is adjusted to the first working state according to the physical parameters of the curved glass component in step S1. S3. The magnetron sputtering device pre-coats the curved glass component, forming a pre-coating layer on the surface of the curved glass component. S4. The curved glass component is conveyed to the second detection device, which detects the pre-coating layer and obtains the physical parameters of the pre-coating layer; the magnetron sputtering device is adjusted to the second working state according to the physical parameters of the pre-coating layer; the magnetron sputtering device performs a second coating on the curved glass component. S5. Complete the coating of the curved glass component.

[0027] It should be noted that the above-mentioned curved glass coating method combines real-time detection with process adjustment to address the challenges of controlling film thickness and uniformity on curved substrates due to their complex geometry during magnetron sputtering. Through a multi-level feedback mechanism of "detection-adjustment-pre-coating-re-detection-fine coating," the quality consistency, film uniformity, and production efficiency of curved glass coating are significantly improved.

[0028] Specifically, in step S1, the first detection device first acquires the physical parameters of the curved glass substrate, including the curvature and camber of the curved glass part. These data provide a precise basis for the initial process settings of the magnetron sputtering device, such as the target output power, magnetic field strength, and magnetic field direction, aiming to make the pre-deposition conditions more suitable for the curved glass part. The pre-deposition process in step S3 can effectively characterize the film formation characteristics of this specific curved workpiece in the actual coating environment. Subsequently, in the crucial step S4, the second detection device performs online measurement on the pre-deposition layer to acquire its key physical parameters, such as film thickness distribution, color difference, or spectral characteristics. These data truly reflect the actual deposition rate and uniformity at each point on the curved surface. Based on this, the magnetron sputtering device makes secondary adjustments and enters the second working state, which involves dynamically correcting the sputtering power distribution or adjusting the magnetic field strength corresponding to the target at different sites.

[0029] In one embodiment, in step S1, when the curved glass piece reaches the corresponding position of the first detection device, it is locked by the positioning device and then detected.

[0030] In one specific embodiment, the curved glass piece is transported to the corresponding position of the first detection device via a conveyor belt driven by a high-precision servo motor. The conveying speed and position of the glass piece can be precisely controlled according to a preset program to ensure that the glass piece can accurately reach the detection area.

[0031] In one embodiment, in step S1, the first detection device includes a surface measuring instrument. It is understood that this measuring instrument employs high-precision optical measurement technology, enabling it to quickly and accurately measure the curvature and camber of the glass component. Its measurement results possess high accuracy and reliability, providing crucial data support for the quality assessment of the glass component.

[0032] In one embodiment, in step S1, the physical parameters of the curved glass component include the curvature and camber of the curved glass component. The curved surface inspection instrument is used to accurately obtain the curvature and camber of the curved glass component. Its core principle lies in rapidly constructing a three-dimensional digital model of the glass component through non-contact optical scanning or laser three-dimensional contour measurement technology, and accurately calculating the curvature and camber that characterize its curved surface shape.

[0033] In one embodiment, in step S2, the first detection device transmits the physical parameters of the curved glass component to the data processor. The data processor performs calculations based on the physical parameters of the curved glass component to obtain the first operating parameters of the magnetron sputtering device and transmits them to the magnetron sputtering device. The magnetron sputtering device adjusts to the first operating state based on the first operating parameters.

[0034] It should be noted that the data processor, as the "brain" of the entire equipment, integrates advanced technologies such as programmable logic controllers (PLCs) and human-machine interfaces (HMIs) into the electrical automation control system. Through pre-set programs, it can achieve precise control of various components, coordinate the workflow between components, and ensure the efficient operation of the equipment.

[0035] By adopting the above technical solution, the magnetron sputtering device can make precise pre-adjustments to the unique curved surface profile of the workpiece before contacting it, thereby macroscopically compensating for the uneven film thickness caused by the change in surface curvature. This can improve the coating quality and uniformity of the product and reduce the cost and time of subsequent corrections.

[0036] In one embodiment, the first operating parameters of the magnetron sputtering device include the magnetic field strength, magnetic field direction, and output power of the magnetic cathode. It is understood that the data processor calculates the required magnetic field configuration based on the curvature and arch height of the surface using an electromagnetic field simulation model: adjusting the magnetic field strength directly alters the ability to confine electrons; a strong magnetic field tightly binds the plasma near the target surface, thus maintaining a high ionization rate in areas of high curvature; precisely controlling the magnetic field direction guides the angular distribution of the plasma cloud and sputtered particles to deflect in a specific orientation, actively aligning with the normal direction of different parts of the surface and compensating for deposition rate attenuation caused by viewing angle effects; simultaneously, the output power is adjusted accordingly to match the changes in deposition rate caused by magnetic field variations and to provide balanced energy input to the entire surface, ensuring film density.

[0037] By adopting the above technical solution, the three working parameters of the magnetron sputtering device are dynamically adapted to the surface geometry, optimizing the flux distribution and incident angle of the deposited particles on the complex three-dimensional surface, thereby effectively suppressing the inherent edge effect and central thin area problem in curved surface coating on a macroscopic level.

[0038] In one embodiment, in step S4, the second detection device includes a photometer; the physical parameters of the pre-coated layer include color data of different sites of the pre-coated layer, and the color data includes chromaticity coordinates Xn, Yn and lightness values ​​Ln, an and bn measured at a set wavelength λ of the photometer.

[0039] In a specific embodiment, in step S4, the second detection device transmits the physical parameters of the pre-plating layer to the data processor. The data processor performs calculations based on the physical parameters of the pre-plating layer to obtain the second operating parameters of the magnetron sputtering device and transmits them to the magnetron sputtering device. The magnetron sputtering device adjusts to the second operating state based on the second operating parameters.

[0040] It should be noted that the thickness of the pre-coating is directly related to the optical interference conditions. Any slight change in thickness will cause a sensitive shift in its chromaticity coordinates and lightness values. Therefore, these multi-point color data actually constitute a high-resolution spectrum reflecting the thickness distribution and uniformity of the pre-coating on the entire curved glass, thereby inversely interpreting the optical measurement signal into the film thickness distribution state.

[0041] Based on a built-in thin-film optical interference model library, the data processor compares the acquired multi-point color data with the color spectrum of the target film. By calculating the color difference and its spatial distribution, it can accurately diagnose the areas of thickness non-uniformity and their degree of deviation in the pre-coating stage. The data processor then performs adaptive calculations based on this thickness deviation to determine the second operating parameters for achieving film thickness uniformity. This allows the magnetron sputtering device to be adjusted to a second operating state, specifically compensating for the identified thickness deviations. For example, in areas with thinner color development, the sputtering power can be increased or the magnetic field optimized to improve the local deposition rate.

[0042] By adopting the above technical solution, based on real-time correction of optical color feedback, the secondary coating process can actively smooth out the unevenness of the pre-coated layer, thereby achieving high-precision film thickness control on complex curved surfaces.

[0043] In one embodiment, the second operating parameters of the magnetron sputtering apparatus include the magnetic field strength, magnetic field direction, and output power of the magnetic cathode.

[0044] In one specific embodiment, step S4 specifically includes the following steps: S41. During the detection process of the pre-coating layer by the second detection device, n sites are selected at equal intervals along a curved cross section of the curved glass piece. The color data of the sites is measured by the photometer and uploaded to the data processor. The data processor calculates the first thickness of the pre-coating layer at the n sites through optical software. S42, The data processor calculates the second thickness dn that the n sites need to be coated in the secondary coating process to achieve the target thickness value on the basis of the pre-coating layer; S43. The data processor calculates the second working parameters according to the empirical formula and transmits the second working parameters to the magnetron sputtering device. The magnetron sputtering device adjusts to the second working state according to the second working parameters and performs secondary coating on the curved glass part. The empirical formula includes: d n =(k·P·L n ·t·B n ) / (2πrl); k is a coefficient with a value of 0.05~10; P is the output power of the magnetic field cathode, in watts; L n t represents the distance between the site and the corresponding target material in the vertical direction, in millimeters; t represents the magnetron sputtering time at the site, in seconds; B n ρ is the magnetic field strength corresponding to the site, in millitalas; r is the target radius corresponding to the site, in millimeters; l is the target length corresponding to the site, in millimeters.

[0045] Understandably, the first thickness reflects the actual deposition result of the pre-coating layer, while the second thickness represents the theoretically expected thickness under the current process settings. By comparing the distribution differences of the first and second thicknesses across the entire curved surface, the systemic deviation between the current process model and the actual operating conditions is intelligently analyzed. Based on this deviation, the data processor performs reverse optimization calculations, adjusts and outputs a new set of second operating parameters, so that the film thickness after the second coating is close to the theoretically expected thickness.

[0046] In one embodiment, the curved glass component undergoes step S4 repeatedly during the coating process.

[0047] Understandably, in step S4, after the secondary coating is completed, the second detection device can be used again to detect the film thickness and readjust the operating parameters of the magnetron sputtering device, thus forming a dynamic, iteratively optimized precision process to achieve progressive and precise control of the film thickness on complex curved surfaces. Each cycle of step S4 is equivalent to performing a high-resolution scan of the current film state and executing a local refinement.

[0048] It should also be noted that the above empirical formulas are closely related to the structure of the magnetron sputtering apparatus, such as... Figure 1 As shown, in a specific embodiment, reference Figure 1 The magnetron sputtering device 300 of the present invention includes a sputtering structure 100.

[0049] In one specific embodiment, reference is made to Figure 2On a horizontal plane, the first direction is a1-a2, and the second direction is b1-b2, with the first and second directions perpendicular to each other. The sputtering structure 100 includes a housing 1, multiple driving components 2, and multiple magnetic components 3. The housing 1 encloses a cavity 11 and has a sputtering port 12 connected to the cavity 11, used to mount the target material 201. Multiple driving components 2 are sequentially arranged within the cavity 11 along the first direction. Each magnetic component 3 is connected to the output end of a driving component 2 and is used to generate a sputtering magnetic field 321. The driving components 2 can drive the magnetic components 3 to move relative to the target material 201.

[0050] Specifically, the housing 1 serves as the structural foundation, forming a cavity 11 for accommodating the drive assembly 2 and the magnetic assembly 3. A sputtering port 12 is located on one side of the housing 1, used to mount the target material 201 and serving as a channel for the ejection of target material 201 atoms during sputtering. Each drive assembly 2 is connected to a magnetic assembly 3, and the drive assembly 2 can move the magnetic assembly 3 relative to the target material 201 to optimize the sputtering effect of the target material 201 atoms. By setting multiple magnetic assemblies 3, each magnetic assembly 3 can generate a sputtering magnetic field 321. These multiple sputtering magnetic fields 321 cooperate with each other, acting together on a curved glass component 202. Simultaneously, the magnetic assembly 3 is connected to the drive assembly 2, and the drive assembly 2 drives the magnetic assembly 3 to move relative to the target material 201. Due to the different distances between different parts of the curved glass component 202 and the target material 201, the distance between the magnetic assembly 3 and the target material 201 can be adjusted, changing the initial energy and sputtering range of the target material 201 atoms. For the target 201 that is close to the curved glass component 202, the corresponding magnetic component 3 is driven away from the target 201, and vice versa. This can optimize the sputtering effect of each area in a targeted manner, ensuring that the amount of atoms of the target 201 deposited on the glass surface tends to be consistent, thereby improving the uniformity of the coating layer.

[0051] In one specific embodiment, reference is made to Figure 3 Each magnetic component 3 includes a mounting base 31 and a plurality of magnetic elements 32. The mounting base 31 is connected to the output end of the drive component 2, and the mounting base 31 has a mounting surface 311 facing the target material 201. The plurality of magnetic elements 32 are arranged sequentially on the mounting surface 311 along the second direction.

[0052] It should be noted that the curved glass component 202 has a certain curvature along the first direction, while it is at the same height along the second direction. Therefore, this solution only requires adjusting the distance between each magnetic component 3 and the target material 201 along the first direction, and each sputtering magnetic field 321 can bombard the target material 201 along the second direction.

[0053] In this embodiment, the mounting surface 311 on the mounting base 31 is arranged facing the target material 201. By arranging a plurality of magnetic elements 32 along the second direction, the magnetic assembly 3 can generate a sputtering magnetic field 321 arranged along the second direction to ensure the uniformity of the coating layer on the curved glass part 202 in the second direction.

[0054] Understandably, the more magnetic components 32 there are, the more uniform the magnetic field will be along the second direction, ensuring the uniformity of the coating layer in the second direction, but the cost will increase accordingly. The fewer magnetic components 32 there are, the greater the distance between the target material 201 acted upon by two adjacent magnetic components 32, which will cause a certain change in the magnetic field strength of the target material 201 between the two magnetic components 32, and may not be able to achieve uniform coverage along the second direction, but the cost will decrease accordingly.

[0055] Understandably, the more magnetic components 32 there are, the more uniform the magnetic field will be along the second direction, ensuring the uniformity of the coating layer in the second direction, but the cost will increase accordingly. The fewer magnetic components 32 there are, the greater the distance between the target material 201 acted upon by two adjacent magnetic components 32, which will cause a certain change in the magnetic field strength of the target material 201 between the two magnetic components 32, and may not be able to achieve uniform coverage along the second direction, but the cost will decrease accordingly.

[0056] In one implementation, please refer to Figure 3 The magnetic element 32 includes three, and the magnetic field lines emitted by the middle magnetic element 32 enter the magnetic elements 32 on both sides respectively to form a sputtering magnetic field 321.

[0057] In this embodiment, the magnetic element 32 includes three magnetic elements. The magnetic field lines generated by the middle magnetic element 32 enter the magnetic elements 32 on both sides respectively, so that when the sputtering magnetic field 321 acts on the target material 201, it can bombard the atoms of the target material 201 to both sides, so that the atoms of the target material 201 are sputtered more uniformly along the second direction, thereby ensuring the uniformity of the coating layer.

[0058] Alternatively, magnetic field lines emitted from the magnetic elements 32 on both sides can converge into the central magnetic element 32 to form a sputtering magnetic field 321. However, when the sputtering magnetic field 321 acts on the target 201, it will bombard the atoms of the target 201 towards the center, causing the atoms of the target 201 to converge at a point along the second direction, resulting in the final coating layer having a structure that is thick in the middle and thin on both sides along the second direction.

[0059] Optionally, in order to further enhance the magnetic field strength and focusing effect, a magnetic sleeve or magnetic shield can be provided around the magnetic component 32 to guide the direction of the magnetic field lines and reduce magnetic field leakage, thereby improving the utilization efficiency of the magnetic field. This structure is common in the prior art and will not be described in detail here.

[0060] In one implementation, please refer to Figure 3 Magnetic component 32 is a neodymium magnet.

[0061] In this embodiment, neodymium magnets are high-performance permanent magnet materials, and the sputtering magnetic field 321 they generate can effectively promote the sputtering of target material 201 atoms while maintaining the stability of the sputtering magnetic field 321.

[0062] Alternatively, the magnetic component 32 can also be a ferrite magnet or a samarium cobalt magnet.

[0063] In one implementation, please refer to Figure 3 Each drive assembly 2 includes a drive member 21 and a transmission rod 22. The drive member 21 is disposed on the inner wall of the housing 1. One end of the transmission rod 22 is connected to the mounting base 31, and the other end of the transmission rod 22 is movably connected to the output end of the drive member 21.

[0064] In this embodiment, the drive element 21 is mounted on the inner wall of the housing 1 to provide power. One end of the transmission rod 22 is connected to the mounting base 31 of the magnetic component 3, and the other end is movably connected to the output end of the drive element 21. When the drive element 21 is started, the movement of its output end is transmitted to the mounting base 31 through the transmission rod 22, causing the magnetic component 3 to move relative to the target material 201.

[0065] Optionally, the drive component 21 can be a cylinder, and the output end of the cylinder is directly connected to the side of the mounting base 31 facing away from the mounting surface 311. In this case, the transmission rod 22 is not required.

[0066] In one implementation, please refer to Figure 3 The drive assembly 2 also includes a sleeve 23 and a gear set. The output end of the drive component 21 is connected to the sleeve 23 through the gear set, and the transmission rod 22 is rotatably disposed inside the sleeve 23. The drive component 21 drives the gear set to rotate, thereby causing the sleeve 23 to rotate, so that the transmission rod 22 moves relative to the target material 201.

[0067] In this embodiment, the drive assembly 2 forms a screw drive structure. Specifically, the output end of the drive member 21 drives the sleeve 23 to rotate after being changed in speed and direction by a gear set. The transmission rod 22 passes through the sleeve 23 and is threadedly connected to the sleeve 23. The rotation of the sleeve 23 allows the transmission rod 22 to move along the extension direction of the sleeve 23, thereby driving the magnetic assembly 3 to move.

[0068] Optionally, the drive assembly 2 can also form a rack and pinion transmission structure. In this case, the drive assembly 2 includes a drive element 21, a gear set and a transmission rod 22. The drive assembly 2 is connected to the transmission rod 22 through the gear set. The transmission rod 22 is a rack. The gear set meshes with the rack. By rotating the gear set, the rack moves relative to the target material 201.

[0069] Understandably, the gear set can use various gear types, such as spur gears, helical gears, or worm gears. The purpose of setting up the gear set in this scheme is to transmit the motion of the drive component 21 to the transmission rod 22. The specific design structure can be adjusted according to the actual situation and is not limited here.

[0070] In one implementation, please refer to Figure 3 The transmission rod 22 is detachably connected to the mounting base 31.

[0071] In this embodiment, the transmission rod 22 and the mounting base 31 are detachably connected, which facilitates disassembly and replacement, thereby making it easy to adjust the distance between two adjacent magnetic components 32, and can be applied to different types of curved glass components 202.

[0072] Alternatively, the transmission rod 22 and the mounting base 31 can be connected by means of threaded connection or snap-fit ​​connection.

[0073] In one implementation, please refer to Figure 3 The mounting base 31 is also provided with a slot 312, which is located on opposite sides of the mounting base 31 and the mounting surface 311 respectively. The transmission rod 22 is threadedly connected to the slot 312.

[0074] In this embodiment, the mounting base 31 has a slot 312 and a mounting surface 311 on opposite sides, respectively. The transmission rod 22 is inserted into the slot 312 and further locked with the slot 312 by a threaded connection to ensure the stability of the connection.

[0075] Alternatively, the transmission rod 22 and the slot 312 can also be connected by an interference fit. In this case, the side wall of the slot 312 can have a certain degree of elasticity to facilitate the insertion and removal of the transmission rod 22.

[0076] In one implementation, please refer to Figure 2 and Figure 4 Multiple drive components 2 and multiple magnetic components 3 are arranged at equal intervals.

[0077] In this embodiment, the equidistant spacing aims to achieve uniform coverage and synergistic effect of the sputtering magnetic field 321, ensuring a uniform coating effect across all parts of the curved glass component 202. Understandably, this arrangement allows the curved glass component 202 to be uniformly divided into multiple regions along the first direction. Each sputtering magnetic field 321 is used to bombard the target material 201 within a specific region. By adjusting the distance between the corresponding magnetic component 3 and the target material 201, the curvature of the curved glass component 202 can be roughly matched to form a uniform coating layer.

[0078] Understandably, reducing the distance between two adjacent magnetic components 3 can improve the uniformity of the coating layer, but this requires increasing the number of magnetic components 3, thus increasing costs. Conversely, increasing the distance reduces the uniformity of the coating layer and reduces costs.

[0079] Please see Figure 1 The present invention also proposes a magnetron sputtering device 300, which includes a coating base 301, a transfer mechanism 302 and a sputtering structure 100. The specific structure of the sputtering structure 100 is as described in the above embodiments. Since the magnetron sputtering device 300 adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought about by the technical solutions of the above embodiments, which will not be described in detail here.

[0080] The coating base 301 has a reaction chamber 3011, the transfer mechanism 302 is disposed in the reaction chamber 3011 and has a working plane 3021, which is used to transport materials; the sputtering structure 100 is disposed in the reaction chamber 3011 and is disposed relative to the working plane 3021.

[0081] In this embodiment, the reaction chamber 3011 is a vacuum environment, and an inert gas needs to be introduced into the reaction chamber 3011. At the same time, a high voltage needs to be introduced into the reaction chamber 3011 to ionize the inert gas. It can be understood that by changing the intensity of the power supply, the number of ionized ions can also be adjusted, thereby adjusting the intensity when bombarding the target 201.

[0082] In one implementation, please refer to Figure 1 The transmission structure is equipped with a positioning sensor 303 for positioning materials.

[0083] In this embodiment, when the transmission mechanism 302 transports the curved glass component 202, it uses the positioning sensor 303 to position the curved glass component 202 so that the curved glass component 202 is located exactly below the sputtering structure 100, thereby facilitating sputtering coating.

[0084] Understandably, when other variables are constant, by adjusting the distance between the magnetic component 3 and the target material 201, the magnetic field strength Bn of the sputtering magnetic field 321 at the corresponding curved glass part 202 can be adjusted, thereby changing the film thickness.

[0085] The present invention also proposes a curved glass coating apparatus, which is applied to the above-mentioned curved glass coating method; the curved glass coating apparatus in this embodiment includes a first detection device 4 and a magnetron sputtering device 300 arranged sequentially.

[0086] Reference Figure 5In this embodiment, the first detection device 4 includes a positioning device 41, a curved surface detector 42, a transmission mechanism 302, and a positioning sensor 303; the magnetron sputtering device 300 also includes a second detection device, which can be a photometer.

[0087] Understandably, during the detection process, the first detection device 4 uses the positioning sensor 303 to obtain the position of the curved glass 202 when transporting the curved glass 202. The positioning device 41 is used to lock the curved glass 202 so that it is exactly below the curved surface detector 42, thereby measuring the curvature and arch height of the curved glass 202. After that, the transmission device 302 transports the curved glass 202 to the magnetron sputtering device 300 for coating.

[0088] The present invention also proposes a system for application in the above-mentioned curved glass coating method; The system includes a data acquisition system, a data processing system, and a data execution system. The data acquisition system is used to acquire the physical parameters of the curved glass component or the physical parameters of the pre-coated layer and transmit them to the data processing system. The data processing system includes a data processor, which is used to analyze and process the data transmitted by the data acquisition system and convert it into the first working parameter or the second working parameter and transmit it to the data execution system. The data execution system adjusts the magnetron sputtering device to the first working state or the second working state according to the first working parameter or the second working parameter transmitted by the data processing system.

[0089] The present invention will be further illustrated below through specific embodiments: Example 1 In Example 1, the curved glass component has a certain curvature in the first direction, is at the same height in the second direction, and the first and second directions are perpendicular.

[0090] The curved glass coating method in Example 1 includes the following steps: S1. The curved glass piece is conveyed to the corresponding position in the first detection device, the positioning device locks it, the curved surface detector detects the curvature and arch height of the curved glass piece and transmits them to the data processor. After receiving the data processor, it calculates and generates the first working parameters and transmits them to the magnetron sputtering device. S2. The curved glass part leaves the first detection device through the transmission device and is transferred to the magnetron sputtering device. The first working parameter of the magnetron sputtering device is adjusted to the first working state. S3. The magnetron sputtering device pre-coats the curved glass parts, forming a pre-coating layer on the surface of the curved glass parts; S4. The curved glass component is transferred to the photometer. The photometer detects the color data of different sites on the pre-coating layer and transfers it to the data processor. After receiving the data, the data processor calculates and generates the second working parameters and transfers them to the magnetron sputtering device. The magnetron sputtering device adjusts to the second working state according to the second working parameters. The magnetron sputtering device performs a second coating on the curved glass component. S5. Complete the coating of curved glass parts.

[0091] In step S4, when the photometer detects the pre-coating layer of the curved glass component, 33 points are selected at equal intervals along the curve in the first direction. The photometer is used to decompose and measure the chromaticity coordinates, lightness values, and other color data of the above 33 points and upload them to the data processor. The data processor uses optical software and combines the material and other conditions of the pre-coating layer to calculate the first thickness of the pre-coating layer at the above 33 points, which is the actual thickness of the pre-coating layer. For specific data, see [link to relevant documentation]. Figure 6 ; Subsequently, the data processor calculates the second thickness d that needs to be deposited during the secondary coating process for the aforementioned 33 sites to achieve the target thickness value based on the pre-coating layer. n And refer to the empirical formula d n =(k·P·L n ·t·B n The second working parameters are obtained by adjusting the conditions for the second coating by (2πrl). In this embodiment, other coating conditions are kept unchanged, and only the magnetic field strength B at different sites is changed. n Thus, d calculated using empirical formulas is obtained. n Meets the requirements.

[0092] In Example 1, the pre-coating thickness at one site of the curved glass component is 11.9 nm. It is known that during the pre-coating process, the target material corresponding to this site is a cylinder with a length of 3855 mm and a diameter of 155 mm. The distance between the target material and the corresponding site on the curved glass component is 100 mm. The output power is 55 kW, and the sputtering time of the curved glass component at this site is 4.5 seconds. Based on experience, k is adjusted within the range of 0.05 to 10. During the secondary coating process, the magnetic field strength B at the aforementioned 33 sites is adjusted... n This allows the 33 sites to be coated at the second thickness d obtained by the secondary coating. n When combined with the first thickness, it meets the target thickness value.

[0093] The above description is merely an exemplary embodiment of the present invention and does not limit the patent scope of the present invention. Any equivalent structural transformations made using the contents of the present invention specification and drawings under the technical concept of the present invention, or direct / indirect applications in other related technical fields, are included within the patent protection scope of the present invention.

Claims

1. A method for coating curved glass, characterized in that, The method for coating curved glass includes the following steps: S1. The curved glass component is conveyed to the first detection device, and the physical parameters of the curved glass component are detected. S2. The curved glass component leaves the first detection device and is transferred to the magnetron sputtering device. The magnetron sputtering device is adjusted to the first working state according to the physical parameters of the curved glass component in step S1. S3. The magnetron sputtering device pre-coats the curved glass component, forming a pre-coating layer on the surface of the curved glass component. S4. The curved glass component is conveyed to the second detection device, which detects the pre-coating layer and obtains the physical parameters of the pre-coating layer; the magnetron sputtering device is adjusted to the second working state according to the physical parameters of the pre-coating layer; the magnetron sputtering device performs a second coating on the curved glass component. S5. Complete the coating of the curved glass component.

2. The method for coating curved glass as described in claim 1, characterized in that, In step S1, when the curved glass piece reaches the corresponding position of the first detection device, it is locked by the positioning device and then detected.

3. The method for coating curved glass as described in claim 1, characterized in that, In step S1, the first detection device includes a surface detector; And / or, in step S1, the physical parameters of the curved glass component include the curvature and arch height of the curved glass component.

4. The method for coating curved glass as described in claim 1, characterized in that, In step S2, the first detection device transmits the physical parameters of the curved glass component to the data processor. The data processor performs calculations based on the physical parameters of the curved glass component to obtain the first operating parameters of the magnetron sputtering device and transmits them to the magnetron sputtering device. The magnetron sputtering device adjusts to the first operating state based on the first operating parameters.

5. The method for coating curved glass as described in claim 4, characterized in that, The first operating parameters of the magnetron sputtering device include the magnetic field strength, magnetic field direction, and output power of the magnetic cathode.

6. The method for coating curved glass as described in claim 1, characterized in that, In step S4, the second detection device includes a photometer; The physical parameters of the pre-coating layer include color data at different locations of the pre-coating layer, and the color data includes the chromaticity coordinates X measured at a set wavelength λ of the photometer. n Y n and brightness value L n a n and b n .

7. The method for coating curved glass as described in claim 6, characterized in that, In step S4, the second detection device transmits the physical parameters of the pre-plated layer to the data processor. The data processor performs calculations based on the physical parameters of the pre-plated layer to obtain the second operating parameters of the magnetron sputtering device and transmits them to the magnetron sputtering device. The magnetron sputtering device adjusts to the second operating state based on the second operating parameters.

8. The method for coating curved glass as described in claim 7, characterized in that, The second operating parameters of the magnetron sputtering device include the magnetic field strength, magnetic field direction, and output power of the magnetic cathode.

9. The method for coating curved glass as described in claim 7, characterized in that, Step S4 specifically includes the following steps: S41. During the detection process of the pre-coating layer by the second detection device, n sites are selected at equal intervals along a curved cross section of the curved glass piece. The color data of the sites is measured by the photometer and uploaded to the data processor. The data processor calculates the first thickness of the pre-coating layer at the n sites through optical software. S42, The data processor calculates the second thickness d that needs to be deposited in the secondary coating process for the n sites to achieve the target thickness value based on the pre-coating layer. n ; S43. The data processor calculates the second working parameters according to the empirical formula and transmits the second working parameters to the magnetron sputtering device. The magnetron sputtering device adjusts to the second working state according to the second working parameters and performs secondary coating on the curved glass part. The empirical formula includes: d n =(k·P·L n ·t·B n ) / (2πrl); k is a coefficient with a value of 0.05 to 10; P represents the output power of the magnetic field cathode, measured in watts. The L n The distance between the location and the corresponding target material in the vertical direction is expressed in millimeters. The t represents the magnetron sputtering time at the site, in seconds; The B n The magnetic field strength corresponding to the site is expressed in millitalas. r is the target radius corresponding to the site, in millimeters; The length of the target material corresponding to the site is in millimeters.

10. The method for coating curved glass as described in claim 9, characterized in that, During the coating process, the curved glass component undergoes step S4 repeatedly.

11. A curved glass coating apparatus, characterized in that, The curved glass coating apparatus is applied to the curved glass coating method according to any one of claims 1 to 10; The curved glass coating apparatus includes the first detection device and a magnetron sputtering device; The first detection device includes the positioning device, the curved surface detector, and the transmission mechanism; the magnetron sputtering device includes the second detection device, the sputtering structure, and the transmission mechanism.

12. A system, characterized in that, The system is applied to the curved glass coating method according to any one of claims 1 to 10; The system includes a data acquisition system, a data processing system, and a data execution system; The data acquisition system is used to acquire the physical parameters of the curved glass component or the physical parameters of the pre-coated layer and transmit them to the data processing system; The data processing system includes the data processor, which is used to analyze and process the data transmitted by the data acquisition system and convert it into the first working parameter or the second working parameter and transmit it to the data execution system. The data execution system adjusts the magnetron sputtering device to the first working state or the second working state according to the first working parameters or the second working parameters transmitted by the data processing system.

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