Valve and chamber matching

Abstract

The invention relates to valve and chamber matching. A method for providing auxiliary control parameters for controlling an auxiliary vacuum valve, comprising the steps of: generating main control parameters for controlling a main vacuum valve by providing target processing information, providing a first processing chamber comprising the main vacuum valve to control fluid flow into or out of the first processing chamber; operating a reference processing cycle in which a valve position of a valve closure of the main vacuum valve varies according to target processing information, deriving first processing information relating to the first processing chamber, and adjusting the valve position based on comparing the first processing information with the target processing information, and deriving a main control parameter for the main vacuum valve based at least on the derived first processing information and the associated valve position; providing a second process chamber including a secondary vacuum valve to control fluid flow into or out of the second process chamber; and controlling the auxiliary vacuum valve based on a main control parameter, the main control parameter being provided as an auxiliary control parameter.

Description

Technical Field

[0001] The present invention relates to a method and controller that provides adjusted pressure control for a processing cycle of a vacuum application performed using a plurality of valves or processing chambers. Background Technology

[0002] Vacuum valves, typically used to regulate volumetric or mass flow rates and to essentially hermetically close flow paths through openings formed in valve housings, are known in various prior art embodiments and are particularly used in vacuum chamber systems in the fields of IC, semiconductor, or substrate manufacturing, where such manufacturing must occur, as far as possible, in a protected atmosphere free of contaminating particles.

[0003] Such a vacuum chamber system specifically includes at least one evacuable vacuum chamber and at least one vacuum pump for evacuating the vacuum chamber. The at least one evacuable vacuum chamber is used to receive semiconductor devices or substrates to be processed or manufactured. The at least one evacuable vacuum chamber has at least one vacuum chamber opening through which semiconductor devices or other substrates can be guided in and out of the vacuum chamber. For example, in a manufacturing plant for semiconductor wafers or liquid crystal substrates, highly sensitive semiconductor or liquid crystal devices sequentially pass through multiple processing vacuum chambers. In each case, components located inside the processing vacuum chambers are processed by processing equipment. Whether during processing within the processing vacuum chambers or during transport from one chamber to another, highly sensitive semiconductor devices or substrates must always be in a protected atmosphere, particularly in an airless environment.

[0004] On the one hand, peripheral valves are used to open and close gas supply or discharge, and on the other hand, transfer valves are used to open and close the transfer openings of the vacuum chamber for the purpose of introducing and removing components.

[0005] The type of vacuum valve through which the semiconductor component passes is designated as a vacuum transfer valve.

[0006] Peripheral valves are specifically designed to control or regulate airflow between a vacuum chamber and a vacuum pump or another vacuum chamber.

[0007] Peripheral valves are located, for example, within piping systems between a processing vacuum chamber or transfer chamber and a vacuum pump, the atmosphere, or another processing vacuum chamber. These valves (also called pump valves) typically have a smaller orifice cross-sectional area than vacuum transfer valves. Because peripheral valves are used not only to fully open and close the orifice, but also to control or regulate flow by continuously adjusting the orifice cross-section between a fully open and hermetically closed position, they are also designated as regulating valves. A possible peripheral valve used to control or regulate airflow is a pendulum valve.

[0008] In typical spool valves known, for example, from US 6,089,537 (Olmsted), in a first step, a valve disc, typically circular, pivots rotatably over an opening, which is also typically circular from the position where the opening is exposed to the intermediate position where it is covered. In the case of spool valves described, such as US 6,416,037 (Geiser) or US 6,056,266 (Blecha), the valve disc and the opening are typically configured as rectangular, and in this first step, the valve disc is linearly pushed from the position where the opening is exposed to the intermediate position where it is covered. In this intermediate position, the valve disc of the spool valve or spool valve is in a relative position spaced apart from the valve seat surrounding the opening. In a second step, the distance between the valve disc and the valve seat is reduced such that the valve disc and the valve seat are pressed uniformly against each other, and the opening is closed in a substantially hermetically sealed manner. This second movement preferably occurs substantially perpendicular to the valve seat.

[0009] Sealing can be achieved, for example, via a sealing ring disposed on the closed side of the valve disc, which is pressed against a valve seat extending around the opening, or via a sealing ring on the valve seat, against which the closed side of the valve disc presses. Due to the closing process occurring in both steps, the sealing ring experiences almost no shear force that would destroy the sealing ring between the valve disc and the valve seat, as the movement of the valve disc in the second step occurs substantially perpendicular to the valve seat.

[0010] Various sealing devices are known from the prior art (e.g., from US 6,629,682 B2 (Duelli)). Suitable materials for sealing rings and seals in vacuum valves are, for example, fluororubber, also known as FKM, particularly fluoroelastomers known by the trade name "Viton," as well as perfluororubber, abbreviated as FFKM.

[0011] Since the aforementioned valves are particularly suitable for the production of highly sensitive semiconductor devices, the generation of particles (especially caused by valve actuation and mechanical loads on the valve-baffle assembly) and the number of free particles in the valve chamber must be kept as low as possible. Particle generation is primarily a result of friction, such as due to metal / metal contact and wear.

[0012] As described above, vacuum regulating valves are used to adjust the defined processing environment within a processing chamber. Adjustment is typically achieved here by providing a pressure signal that relates to the internal pressure of the chamber and by setting a target value (i.e., the desired pressure that should be achieved through adjustment). The position of the valve closure (valve disc) is then changed during adjustment (e.g., closed-loop adjustment) to achieve the desired pressure within specific time intervals.

[0013] In contrast to regulation, vacuum regulating valves can also be operated in a controlled manner using known processing parameters, such as a desired pressure to be achieved in the processing chamber within a predetermined time. For this purpose, a desired position of the valve disc is provided, for example, and the valve approaches that position within the same predetermined time.

[0014] Both methods described above have their specific advantages and disadvantages. While the desired pressure in the processing chamber can be set in a relatively short time using predefined controls, the current dominant pressure can only be predicted through reservations due to the often lack of feedback (e.g., current pressure information). Any undesirable effects on the production process (e.g., altered gas inlets or leaks in the processing chamber) remain completely unidentified, often leading to a reduction in manufacturing quality.

[0015] In vacuum processing applications, operators often desire multiple processing chambers to provide specific (high) production capacity. This allows for the parallel production of workpieces or substrates to increase output. Of course, all workpieces or substrates produced should possess at least substantially the same product characteristics and properties. Here, the desired pressure within the processing chamber is typically set and varied using predetermined control parameters for the chamber.

[0016] One problem with this parallel processing is the fact that the processing chambers and peripheral devices such as gas inlet valves or plasma sources can often differ, at least slightly, between chambers. Therefore, the processing conditions inside different chambers can vary accordingly. This variation can lead to products with different characteristics, such as different surface conditions. Summary of the Invention

[0017] Therefore, the object of the present invention is to provide an improved method or controller to overcome possible deviations between parallel processing operations.

[0018] In particular, the object of the present invention is to provide an improved method or controller for controlling a set of vacuum valves to provide the same processing performance.

[0019] In particular, the object of the present invention is to provide an improved method that enables the processing performance of one process to be adjusted relative to the processing performance of another process.

[0020] This invention relates to a method for controlling the flow rate of fluid in a processing chamber via a vacuum valve. The method aims to provide such control for at least two different valves, wherein control parameters for the respective valves are provided and aligned relative to each other, such that processing can be performed in separately connected processing chambers under the same processing conditions to achieve the same processing results in different chambers.

[0021] This invention relates to a method for providing auxiliary control parameters for controlling an auxiliary vacuum valve. The method includes generating master control parameters for controlling a main vacuum valve.

[0022] The main control parameters are generated by providing target processing information (such as target pressure profile, target pressure, target settling time, etc.) and providing a first processing chamber including a main vacuum valve to control the flow rate of fluids flowing into and / or out of the first processing chamber (in particular, controlling the downstream gas outlet flow rate out of the first processing chamber).

[0023] In addition, a reference processing loop is run, in which the valve position of the valve closure of the main vacuum valve is changed according to the target processing information, wherein first processing information related to the first processing chamber is derived, and the valve position is adjusted based on comparing the first processing information with the target processing information.

[0024] For example, the valve position of the valve closure can be changed based at least on defined control parameters used to control or set the position of the valve closure.

[0025] Valve position is the position of the valve closure relative to the valve seat; that is, the actual flow rate can be changed and set by altering or setting the valve position. Therefore, the opening cross-section depends on the valve position.

[0026] The main control parameters for the main vacuum valve are derived based at least on the first processing information and the associated valve position.

[0027] A second processing chamber is provided, the second processing chamber including an auxiliary vacuum valve to control the flow rate of fluids flowing into and / or out of the second processing chamber, particularly controlling the downstream gas outlet flow rate out of the second processing chamber.

[0028] The auxiliary vacuum valve is controlled based on the main control parameters, which are provided as auxiliary control parameters.

[0029] Therefore, this method enables the auxiliary vacuum valve to be controlled based on the main vacuum valve (i.e., by applying the same control parameters).

[0030] In one embodiment, the second processing chamber may be provided by the first processing chamber, and in particular, the first and second processing chambers are identical. In other words, the main vacuum valve and the auxiliary vacuum valve are housed in the same processing chamber. This becomes important, for example, when the vacuum valve of a chamber is replaced or replaced and processing should continue in the same manner with the new valve. The new valve can operate using the control parameters of the old replacement valve.

[0031] In one implementation, the master control parameters can be generated by simulating the changes in the first processing information based on the adjustment of the valve position using a digital model that provides information about the first processing chamber and the main vacuum valve. This allows for the derivation of ideal processing behavior and corresponding control parameters, which can then be used as a basis for maintaining consistency with the control of other real valves.

[0032] According to one implementation, the first processing information may include at least one of the following:

[0033] • Valve position or valve position curve

[0034] • The pressure or pressure curve in the processing chamber.

[0035] • Stabilization time,

[0036] • Adjust the time,

[0037] • Pressure overshoot or undershoot

[0038] • Pressure error,

[0039] • Maximum pressure deviation, and

[0040] • Temperature, especially the actual temperature in the processing chamber.

[0041] Therefore, the initial processing information can be used as a basis for determining (further) changes in valve position to alter fluid flow. For example, the pressure in the processing chamber depends on the temperature within the chamber, and the flow rate through the vacuum valve can be adjusted based on the temperature to compensate for pressure deviations. Furthermore, changes in valve position can be performed based on pressure deviations.

[0042] In one embodiment, auxiliary control parameters for controlling an auxiliary vacuum valve can be adjusted by the following steps: providing target processing information; running an adjustment processing loop, wherein the valve position of the valve closure element of the auxiliary vacuum valve changes according to the target processing information, wherein second processing information related to a second processing chamber is derived; adjusting the valve position based on the main control parameters and comparing the second processing information with the target processing information; and deriving adjusted auxiliary control parameters for the auxiliary vacuum valve based at least on the derived second processing information and the associated valve position.

[0043] Therefore, the auxiliary control parameters can be adjusted according to the properties of the second processing chamber to provide the same performance as the first processing chamber. This step can further improve and ensure the same performance.

[0044] The present invention also relates to a method for maintaining consistent processing performance between a first processing chamber and a second processing chamber.

[0045] The method includes: providing target processing information; providing a first processing chamber including a first vacuum valve to control the flow rate of fluid flowing into and / or out of the first processing chamber, particularly controlling the downstream gas outlet flow rate out of the first processing chamber; and providing a second processing chamber including a second vacuum valve to control the flow rate of fluid flowing into and / or out of the second processing chamber, particularly controlling the downstream gas outlet flow rate out of the second processing chamber.

[0046] The first control parameters for controlling the first vacuum valve are generated by the following steps: deriving first processing information related to the first processing chamber; running a first processing cycle by adjusting the valve position based on comparing the first processing information with target processing information, wherein the valve position of the valve closure of the first vacuum valve changes according to the target processing information; and deriving the first control parameters for the first vacuum valve based at least on the derived first processing information and the associated valve position.

[0047] The second control parameters for controlling the second vacuum valve are generated by the following steps: deriving second processing information related to the second processing chamber; running a second processing cycle by adjusting the valve position based on comparing the second processing information with target processing information, wherein the valve position of the valve closure of the second vacuum valve changes according to the target processing information; and deriving the second control parameters for the second vacuum valve based at least on the derived second processing information and the associated valve position.

[0048] The first processing information is compared with the second processing information, and common applicable processing information is derived based on the comparison between the first processing information and the second processing information.

[0049] This method aims to provide the same processing chamber performance without assuming that one of the chambers is the basis for consistent relative performance. Faster operating processing chambers can preferably maintain the same performance or curve as slower operating chambers.

[0050] In one implementation, commonly applicable processing information can be compared with first processing information, and based on this, first control parameters can be adjusted.

[0051] This adjustment of the first control parameter may specifically include: running an adjustment processing cycle by deriving updated first processing information related to the first processing chamber and adjusting the valve position based on the first control parameter and by comparing the updated first processing information with the commonly applicable processing information, wherein the valve position of the valve closure of the first vacuum valve changes according to the commonly applicable processing information. The first control parameter for the first vacuum valve is adjusted at least based on the derived updated first processing information and the associated valve position.

[0052] In one implementation, commonly applicable processing information can be compared with second processing information, and the second control parameter can be adjusted accordingly.

[0053] In one embodiment, adjusting the second control parameter may include: running an adjustment processing cycle by deriving updated second processing information related to the second processing chamber, adjusting the valve position based on the second control parameter and by adjusting the valve position based on comparing the updated second processing information with commonly applicable processing information, wherein the valve position of the valve closure of the second vacuum valve changes according to the commonly applicable processing information; and adjusting the second control parameter for the second vacuum valve based at least on the derived updated second processing information and the associated valve position.

[0054] In one embodiment, the first processing information, the second processing information, and / or the target processing information may include at least one of the following: valve position or valve position curve, pressure or pressure curve in the processing chamber, settling time, adjustment time, pressure overshoot or undershoot, pressure error, maximum pressure deviation, and temperature (especially the actual temperature in the processing chamber).

[0055] Furthermore, at least one of the processed information may include a trajectory derived by comparing or processing multiple trajectories of the servo valve. By processing several trajectories, a desired trajectory can be calculated, which represents a feasible trajectory operated by each valve or by valves matched with other valves. For example, the desired trajectory may substantially correspond to the trajectory of one of the valves, but can be slightly adjusted to compensate for overshoot.

[0056] The present invention also relates to a controller for controlling at least one vacuum valve to control the pressure in at least one processing chamber, wherein the controller is configured to control at least one vacuum valve based on corresponding control parameters assigned to the at least one vacuum valve.

[0057] In one embodiment, at least one vacuum valve may be an auxiliary vacuum valve, and the corresponding control parameters are auxiliary control parameters for controlling the auxiliary vacuum valve. The controller is configured to derive the auxiliary control parameters by: receiving main control parameters for controlling the main vacuum valve and deriving auxiliary control parameters for controlling the auxiliary vacuum valve. Deriving the auxiliary control parameters includes: providing target processing information; and running an adjustment processing cycle by deriving second processing information related to the second processing chamber, adjusting the valve position based on the main control parameters, and comparing the second processing information with the target processing information, wherein the valve position of the valve closure of the auxiliary vacuum valve changes according to the target processing information. The adjusted auxiliary control parameters for the auxiliary vacuum valve are derived at least based on the derived second processing information and the associated valve position.

[0058] In one embodiment, at least one vacuum valve may be a first vacuum valve of a first processing chamber, and the corresponding control parameter is a first control parameter for controlling the first vacuum valve, and the controller is configured to control the second vacuum valve of the second processing chamber based on the second control parameter, wherein the controller is configured to keep the processing performance of the first processing chamber consistent with the processing performance of the second processing chamber.

[0059] To ensure that the processing performance of the first processing chamber is consistent with that of the second processing chamber includes: providing target processing information (e.g., pressure profile, settling time, etc.); and generating first control parameters for controlling the first vacuum valve by: deriving first processing information related to the first processing chamber; adjusting the valve position based on comparing the first processing information with the target processing information to run a first processing cycle, wherein the valve position of the valve closure of the first vacuum valve changes according to the target processing information; and deriving the first control parameters of the first vacuum valve based at least on the derived first processing information and the associated valve position.

[0060] Furthermore, a second control parameter for controlling the second vacuum valve is generated by the following steps: deriving second processing information related to the second processing chamber; running a second processing cycle by adjusting the valve position based on comparing the second processing information with target processing information, wherein the valve position of the valve closure of the second vacuum valve changes according to the target processing information; and deriving the second control parameter for the second vacuum valve based at least on the derived second processing information and the associated valve position.

[0061] The first processing information is compared with the second processing information, and common applicable processing information is derived based on the comparison between the first processing information and the second processing information.

[0062] In one implementation, the controller may be configured to compare commonly applicable processing information with first processing information and adjust first control parameters accordingly.

[0063] In one embodiment, adjusting the first control parameter may include: running an adjustment processing cycle by deriving updated first processing information related to the first processing chamber, adjusting the valve position based on the first control parameter and by comparing the updated first processing information with commonly applicable processing information, wherein the valve position of the valve closure of the first vacuum valve changes according to the commonly applicable processing information; and adjusting the first control parameter of the first vacuum valve based at least on the derived updated first processing information and the associated valve position. Attached Figure Description

[0064] The following description, by way of example only, details the apparatus and method according to the invention with reference to specific exemplary embodiments schematically illustrated in the figures, wherein further advantages of the invention are also discussed. Specifically, in the figures:

[0065] Figure 1 An embodiment of the processing system according to the present invention for processing or producing objects under vacuum conditions is illustrated schematically;

[0066] Figure 2 An embodiment of the processing system according to the present invention for processing or producing objects under vacuum conditions is illustrated schematically;

[0067] Figure 3a and Figure 3b The pressure control curve and the curve matching are shown; and

[0068] Figure 4 The steps of a method for providing control parameters to control a vacuum valve based on a desired curve are shown. Detailed Implementation

[0069] Figure 1 An embodiment of a processing system for processing or producing objects under vacuum conditions is schematically illustrated. The system includes two processing chambers 1 and 1'. Each processing chamber 1, 1' is connected to a supply line for supplying fluid to the respective processing chamber (upstream). The supply line is equipped with peripheral devices 2 and 2', such as gas flow meters, mass flow controllers, inlet valves, etc., which allow for the measurement of a defined amount of a specific fluid (e.g., processing gas or precursor gas) flowing into processing chambers 1, 1', or for the appropriate adjustment of the fluid inflow. Furthermore, pressure sensors 3 and 3' are provided, which allow for the determination of the internal pressure (chamber pressure) of the respective processing chambers 1, 1'.

[0070] Vacuum pumps 4 and 4' are connected to the outlet sides of processing chambers 1 and 1' for evacuating them. Corresponding regulating vacuum valves 10 and 10' are arranged between vacuum pumps 4 and 4' and chambers 1 and 1' (downstream) for controlling or regulating the outflow mass flow rate of each chamber 1 and 1'. The (controlled) setting of valves 10 and 10' can be achieved, for example, by mechanical, pneumatic, or hydraulic actuation.

[0071] According to the present invention, the system has a controller 20 (control unit) connected to vacuum valves 10 and 10' and provides controlled changes to the corresponding valve positions (i.e., the positions of the valve closure members relative to the valve seats) via control signals.

[0072] Furthermore, the controller 20 is connected to pressure sensors 3 and 3' for receiving and processing pressure signals from sensors 3 and 3'. Therefore, pressure sensors 3 and 3' are arranged to derive (first and / or second) processing information related to the respective processing chambers 1 and 1'.

[0073] In an alternative embodiment, the controller 20 may also be connected to peripheral devices 2, 2' for controlling or measuring the amount of processing fluid supplied to the processing chambers 1, 1'.

[0074] The processing chambers 1 and 1' and the connecting devices and components are designed to provide identical processing properties for both chambers 1 and 1'. These processing properties are defined, at least by the proper control of vacuum valves 10 and 10'. This allows for the provision of defined or desired pressure profiles within the respective chambers 1 and 1' for processing cycles.

[0075] Vacuum valves 10 and 10' can preferably be controlled in an open-loop manner during substrate or other workpiece processing. This means that, in this case, no feedback information is processed to provide closed-loop regulation of the chamber pressure.

[0076] Therefore, in an alternative embodiment, at least one of the pressure sensors 3, 3' can be omitted, especially after setting the control parameters and operating the processing chamber to process the substrate or workpiece.

[0077] To provide the same processing properties, the pressure profiles of the two chambers 1 and 1' can be kept consistent with each other. For this purpose, according to the invention, specific (auxiliary) control parameters are derived for controlling the (auxiliary) vacuum valve 10'. The auxiliary control parameters are then applied to provide a pressure profile in the second chamber 1' that is at least nearly identical to the pressure profile in the first chamber 1 when the main control parameters are applied to control the main valve 10.

[0078] In the preliminary steps, the main control parameters can be derived based on the learning or optimization operation of the first chamber 1 based on the known target pressure curve.

[0079] In one implementation, these parameters can be derived by performing a model-based simulation.

[0080] A method for providing auxiliary control parameters for controlling the auxiliary vacuum valve 10' includes generating primary control parameters for controlling the main vacuum valve 10 by providing target processing information. Target processing information may include target pressure trajectory, target pressure, settling time, desired processing time, etc.

[0081] Next, a reference processing cycle is run through the first processing chamber 1. The first processing chamber 1 has a main vacuum valve 10 to control the downstream gas outlet flow rate out of the first processing chamber. Running the reference processing cycle involves changing the valve position of the valve closure element of the main vacuum valve 10 according to the target processing information.

[0082] During a reference processing cycle, first processing information related to the first processing chamber 1 is derived or measured, and the valve position is adjusted based on a comparison of the first processing information with target processing information. The first processing information may include the actual chamber pressure and / or the temperature of the fluid in the chamber.

[0083] The main control parameters for the main vacuum valve 10 are derived based at least on the derived first processing information and the associated valve position. The combined knowledge of the valve position and the first processing information as a result of the valve position provides control over the main valve 10, enabling the provision of target processing information.

[0084] The auxiliary vacuum valve 10' can then be controlled based on the main control parameters, which are correspondingly provided as auxiliary control parameters. In other words, the optimized control parameters of the main valve 10 can be used to control the auxiliary valve 10'.

[0085] However, due to natural deviations between chambers, such as structural differences and fluid conduction differences, auxiliary control parameters usually need to be adjusted or optimized in further steps to provide the same treatment.

[0086] Therefore, the auxiliary control parameters used to control the auxiliary vacuum valve 10' can be adjusted by providing target processing information and running an adjustment processing cycle, wherein the valve position of the valve closure element of the auxiliary vacuum valve 10' changes according to the target processing information.

[0087] Therefore, second processing information related to the second processing chamber is derived, and the valve position is adjusted based on the main control parameters and by comparing the second processing information with the target processing information. Adjusted auxiliary control parameters for the auxiliary vacuum valve 10' are derived at least based on the derived second processing information and the associated auxiliary valve position.

[0088] In other words, the control parameters for the auxiliary valve 10' and the auxiliary chamber 1' are generated based on the control parameters of the main valve 10 and by adjusting the control parameters according to the given conditions of the auxiliary processing chamber 1'.

[0089] Figure 2 An embodiment of a processing system for fabricating or handling substrates under vacuum conditions is shown. According to... Figure 2 Implementation methods and basis Figure 1 The difference in the implementation methods lies in the control units 20 and 20'.

[0090] according to Figure 2There is no central control unit, but each processing chamber and its corresponding device is controlled by a separate controller 20, 20'. This means that the main control parameters are derived from one side of the first control unit 20 and transmitted to the second control unit 20' for use or further processing to control the auxiliary vacuum valve 10'.

[0091] Figure 3a and Figure 3b The pressure curves of the two processing chambers, controlled by two vacuum valves, are shown.

[0092] Figure 3a A first pressure trajectory 31 representing the desired pressure trajectory is shown. This curve 31 can be the corresponding control performance of a standard chamber, i.e., its performance should be transferred to other processing chambers. Alternatively, this curve 31 can be derived based on a simulation of the desired processing cycle.

[0093] The second pressure trajectory 32 represents the initial chamber pressure control of the chamber, whose performance should match that of a standard chamber.

[0094] As can be seen, there is a significant deviation between curve 31 and curve 32. Even if the valve of the chamber to be matched is driven by the control parameters of the standard chamber, this deviation may often be caused by the different structural properties of the chamber and / or its peripheral devices.

[0095] Figure 3b The diagram shows the processing trajectory of the chamber after adjusting the control parameters to drive the chamber to be matched. For this purpose, an optimization program (changing the control parameters) can be run to match the desired pressure control behavior as closely as possible.

[0096] Figure 4 A method for providing specific control parameters for controlling (auxiliary) vacuum valves is described.

[0097] In the first sequence 41, main control parameters for controlling the main vacuum valve are generated. For this purpose, target processing information 42 is provided, such as target pressure curve, target pressure, settling time, target valve position or valve position curve, target settling time, maximum pressure deviation, etc.

[0098] A first processing chamber 43 is provided, which includes a main vacuum valve to control the flow rate of fluid entering and / or leaving the first processing chamber. The provided main vacuum valve is considered to be matched with other valves.

[0099] A reference processing cycle 44 is run, in which the valve position of the main vacuum valve's valve closure element is changed according to the target processing information. During the run of the reference processing cycle, first processing information related to the first processing chamber is derived 45, and the valve position is adjusted 46 based on a comparison of the first processing information with the target processing information.

[0100] The main control parameters for the main vacuum valve are derived based at least on the first processing information and the associated valve position.

[0101] A second processing chamber 48 is provided, the second processing chamber including an auxiliary vacuum valve to control the flow rate of fluids flowing into and / or out of the second processing chamber.

[0102] The auxiliary vacuum valve is controlled based on the main control parameters, which are provided as auxiliary control parameters (step 49).

[0103] In a further optional step 50, the auxiliary control parameters can be adjusted by running the adjustment processing loop as described above.

[0104] It should be understood that the accompanying drawings are merely schematic depictions of possible exemplary embodiments. Various methods according to the invention can also be combined with each other and with prior art methods and apparatus for pressure control in vacuum processing.

Claims

1. A method for providing auxiliary control parameters for controlling an auxiliary vacuum valve (10'), the method comprising the steps of: • Generate the main control parameters for controlling the main vacuum valve (10) using the following steps: - Provides target processing information, - Provide a first processing chamber (1) including the main vacuum valve (10) to control the flow rate of fluid flowing into or out of the first processing chamber (1). - Run a reference processing loop, wherein the valve position of the valve closure element of the main vacuum valve (10) changes according to the target processing information, wherein, • Export the first processing information related to the first processing chamber (1), and • Adjusting the valve position based on comparing the first processed information with the target processed information, and - The main control parameters for the main vacuum valve (10) are derived at least based on the derived first processing information and the associated valve position. • A second processing chamber (1') is provided, the second processing chamber (1') including the auxiliary vacuum valve (10') to control the flow rate of fluid flowing into or out of the second processing chamber (1'), and • The auxiliary vacuum valve (10') is controlled based on the main control parameters, wherein the main control parameters are provided as auxiliary control parameters.

2. The method according to claim 1, wherein, The second processing chamber (1') is provided by the first processing chamber (1).

3. The method according to claim 1 or 2, wherein, The main control parameters are generated by simulating the changes in the first processing information based on the adjustment of the valve position using a digital model, which provides information about the first processing chamber (1) and the main vacuum valve (10).

4. The method according to any one of the preceding claims, wherein, The first processing information includes at least one of the following: • Valve position or valve position curve • The pressure or pressure curve in the processing chamber. • Stabilization time, • Adjust the time, • Pressure overshoot or undershoot • Pressure error, • Maximum pressure deviation, and • temperature.

5. The method according to any one of the preceding claims, wherein, The auxiliary control parameters used to control the auxiliary vacuum valve (10') are adjusted by the following steps: • Provide the target processing information, • Run an adjustment processing cycle, wherein the valve position of the valve closure element of the auxiliary vacuum valve (10') is changed according to the target processing information, wherein, - Export the second processing information related to the second processing chamber (1'). - Adjust the valve position based on the following: • The main control parameters, and • Compare the second processing information with the target processing information, and • The adjusted auxiliary control parameters for the auxiliary vacuum valve (10') are derived based at least on the derived second processing information and the associated valve position.

6. A method for ensuring that the processing performance of a first processing chamber (1) is consistent with that of a second processing chamber (2), the method comprising the following steps: • Provide target processing information, • A first processing chamber (1) including a first vacuum valve (10) is provided to control the flow rate of fluid flowing into or out of the first processing chamber (1). • A second processing chamber (1') including a second vacuum valve (10') is provided to control the flow rate of fluid flowing into or out of the second processing chamber (1'). • Generate first control parameters for controlling the first vacuum valve (10) through the following steps: - The first processing cycle is run by the following steps, wherein the valve position of the valve closure element of the first vacuum valve (10) is changed according to the target processing information: • Export the first processing information related to the first processing chamber (1). • Adjusting the valve position based on comparing the first processed information with the target processed information, and - The first control parameters for the first vacuum valve (10) are derived at least based on the derived first processing information and the associated valve position. • Generate second control parameters for controlling the second vacuum valve (10') using the following steps: - The second processing cycle is run by the following steps, wherein the valve position of the valve closure of the second vacuum valve (10') is changed according to the target processing information: • Export the second processing information related to the second processing chamber (1'). • Adjusting the valve position based on comparing the second processing information with the target processing information, and - The second control parameters for the second vacuum valve (10') are derived, at least based on the derived second processing information and the associated valve position. • Compare the first processing information with the second processing information, and • Based on the comparison between the first processing information and the second processing information, commonly applicable processing information is derived.

7. The method according to claim 6, wherein, The commonly applicable processing information is compared with the first processing information, and the first control parameter is adjusted accordingly.

8. The method according to claim 7, wherein, Adjusting the first control parameter includes: • The adjustment processing cycle is run by the following steps, wherein the valve position of the valve closure of the first vacuum valve (10) is changed according to the commonly applicable processing information: - Export updated first processing information related to the first processing chamber (1), - Adjust the valve position based on the following: • The first control parameter, and • Compare the updated first processing information with the commonly applicable processing information, and • The first control parameters for the first vacuum valve (10) are adjusted based at least on the derived updated first processing information and the associated valve position.

9. The method according to any one of claims 6 to 8, wherein, The commonly applicable processing information is compared with the second processing information, and the second control parameter is adjusted accordingly.

10. The method according to claim 9, wherein, Adjusting the second control parameter includes: • The adjustment processing cycle is run by the following steps, wherein the valve position of the valve closure of the second vacuum valve (10') is changed according to the commonly applicable processing information: - Export updated second processing information related to the second processing chamber (1'), - Adjust the valve position based on the following: The second control parameter, and • Compare the updated second processing information with the commonly applicable processing information, and • The second control parameter for the second vacuum valve (10') is adjusted based at least on the exported updated second processing information and the associated valve position.

11. A controller (20, 20') for controlling at least one vacuum valve (10, 10') to control the pressure in at least one processing chamber (1, 1') via the vacuum valve (10, 10'), wherein, The controllers (20, 20') are configured to control the at least one vacuum valve (10, 10') based on corresponding control parameters assigned to the at least one vacuum valve (10, 10').

12. The controller (20, 20') according to claim 11, wherein, The at least one vacuum valve is an auxiliary vacuum valve (10'), and the corresponding control parameter is an auxiliary control parameter for controlling the auxiliary vacuum valve (10'), and the controller is configured to derive the auxiliary control parameter through the following steps: • Receive main control parameters for controlling the main vacuum valve (10), • The auxiliary control parameters for controlling the auxiliary vacuum valve (10') are derived by following these steps: - Provides target processing information, - The adjustment processing cycle is run by the following steps, wherein the valve position of the valve closure element of the auxiliary vacuum valve (10') is changed according to the target processing information: • Export the second processing information related to the second processing chamber (1'). The valve position should be adjusted based on the following: (i) the main control parameters, and (ii) Compare the second processing information with the target processing information, and - The adjusted auxiliary control parameters for the auxiliary vacuum valve (10') are derived at least based on the derived second processing information and the associated valve position.

13. The controller (20, 20') according to claim 11, wherein, The at least one vacuum valve is a first vacuum valve (10) of the first processing chamber, and the corresponding control parameter is a first control parameter for controlling the first vacuum valve (10), and the controller (20, 20') is configured to control the second vacuum valve (10') of the second processing chamber (1') based on the second control parameter, wherein the controller is configured to maintain consistency between the processing performance of the first processing chamber (1) and the processing performance of the second processing chamber (1') through the following steps: • Provide target processing information, • Generate first control parameters for controlling the first vacuum valve (10) through the following steps: - The first processing cycle is run by the following steps, wherein the valve position of the valve closure element of the first vacuum valve (10) is changed according to the target processing information: • Export the first processing information related to the first processing chamber (1). • Adjusting the valve position based on comparing the first processed information with the target processed information, and - The first control parameters for the first vacuum valve (10) are derived at least based on the derived first processing information and the associated valve position. • Generate second control parameters for controlling the second vacuum valve (10') using the following steps: - The second processing cycle is run by the following steps, wherein the valve position of the valve closure of the second vacuum valve (10') is changed according to the target processing information: • Export the second processing information related to the second processing chamber (1'). • Adjusting the valve position based on comparing the second processing information with the target processing information, and - The second control parameters for the second vacuum valve (10') are derived at least based on the derived second processing information and the associated valve position. • Compare the first processing information with the second processing information, and • Based on the comparison between the first processing information and the second processing information, commonly applicable processing information is derived.

14. The controller (20, 20') according to claim 13, wherein, The controllers (20, 20') are configured to compare the commonly applicable processing information with the first processing information and adjust the first control parameters accordingly.

15. The controller (20, 20') according to claim 14, wherein, Adjusting the first control parameter includes: • The adjustment processing cycle is run by the following steps, wherein the valve position of the valve closure of the first vacuum valve (10) is changed according to the commonly applicable processing information: - Export updated first processing information related to the first processing chamber (1), - Adjust the valve position based on the following: • The first control parameter, and • Compare the updated first processing information with the commonly applicable processing information, and • The first control parameter for the first vacuum valve (10) is adjusted based at least on the derived updated first processing information and the associated valve position.

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