Pattern rendering method and device, equipment and storage medium

Abstract

The invention provides a pattern rendering method and device, equipment and a storage medium. The method comprises the steps of obtaining posture information of a pattern under the condition that a pattern rendering event is detected, judging whether the rendered pattern is located at the edge of a three-dimensional board or not under the condition that the pattern is rendered on the three-dimensional board in a posture indicated by the posture information, and if the rendered pattern is located at the edge of the three-dimensional board, outputting the rendered pattern. If yes, obtaining the fabric thickness of the three-dimensional board, processing the pattern at the edge of the board to obtain a sub-pattern with the width equal to the fabric thickness, aligning the texture of the sub-pattern with the texture of the pattern at the edge of the board, and rendering on a plane where the thickness direction is located, therefore, the pattern at the edge of the board can extend towards the thickness direction of the three-dimensional board. When the pattern is rendered on the three-dimensional model, the pattern located at the edge of the board can wrap the edge of the three-dimensional board, so that a better rendering effect is presented.

Description

Technical Field

[0001] This disclosure relates to the field of computer technology, and in particular to a pattern rendering method, apparatus, device, and storage medium. Background Technology

[0002] With the development of 3D simulation and digital technology, simulation systems or software are increasingly being used in product design processes to simulate the final product effect. During the design phase, to enhance product personalization, designers often conceive and apply various patterns to the product. However, current rendering results using these simulation tools to render patterns on 3D models of objects are unsatisfactory. Summary of the Invention

[0003] To overcome the problems existing in related technologies, this disclosure provides a pattern rendering method, apparatus, device and storage medium.

[0004] According to a first aspect of this disclosure, a pattern rendering method is provided, applied to a simulation system, wherein a three-dimensional model of an object is displayed on the interactive interface of the simulation system, the three-dimensional model comprising multiple three-dimensional plates, the method comprising: upon detecting a pattern rendering event, acquiring the pose information of the pattern; upon rendering the pattern on the three-dimensional plates in the pose indicated by the pose information, determining whether the rendered pattern is located at the edge of the three-dimensional plates; if located at the edge of the plates, acquiring the fabric thickness of the three-dimensional plates; processing the pattern located at the edge of the plates to obtain a sub-pattern with a width equal to the fabric thickness; aligning the texture of the sub-pattern with the texture of the pattern at the edge of the plates, and rendering it on a plane in the thickness direction.

[0005] In some embodiments, the interactive interface of the simulation system displays a two-dimensional plate of the object, and the method further includes: when a pattern is detected rendered on any three-dimensional plate of the three-dimensional model, mapping the pattern onto a two-dimensional plate corresponding to the three-dimensional plate; when a seam allowance display instruction is detected, displaying the seam allowance on the two-dimensional plate of the object, and when the pattern is detected to be located at the edge of the two-dimensional plate, displaying a sub-pattern of a preset width on the seam allowance adjacent to the edge of the plate.

[0006] In some embodiments, obtaining the pose information of the pattern upon detecting a pattern rendering event includes: upon detecting a drag event on the pattern, if the release position of the dragged pattern is within the range of any three-dimensional plate, triggering a pattern rendering event and obtaining the pose information of the pattern; or, upon detecting a pose editing trigger event for the pattern, displaying the pose editing interface of the pattern, and in response to detecting a confirmation event for the pose editing interface, triggering a pattern rendering event and obtaining the edited pose information.

[0007] In some embodiments, determining whether the rendered pattern is located at the edge of the 3D plate includes determining whether the rendered pattern intersects with the edge line of the 3D plate.

[0008] In some embodiments, processing the pattern located at the edge of the plate to obtain a sub-pattern with a width equal to the fabric thickness includes: obtaining a sub-pattern with a width equal to the fabric thickness, starting from a position aligned with the edge of the plate.

[0009] In some embodiments, processing the pattern located at the edge of the plate to obtain a sub-pattern with a width equal to the fabric thickness includes: obtaining texture information of the pattern located at the edge of the plate; interpolating the pattern located at the edge of the plate based on the texture information and the width indicated by the fabric thickness to obtain a sub-pattern.

[0010] In some embodiments, the method further includes: when a change in the fabric thickness of the three-dimensional plate is detected, reprocessing the pattern located at the edge of the plate to obtain a sub-pattern with the same width as the changed fabric thickness.

[0011] In some embodiments, the method further includes: when an instruction to enable pattern cross-page function is detected, determining whether the pattern on the three-dimensional model passes through multiple three-dimensional plates when rendered in the posture indicated by the posture information; if it passes through multiple three-dimensional plates, then rendering the pattern onto all the three-dimensional plates that it has passed through.

[0012] In some embodiments, rendering the pattern onto all the 3D plates it passes through includes: acquiring the adjacent first and second 3D plates that the pattern passes through; dividing the pattern passing through the first and second 3D plates into a first pattern and a second pattern; processing the first pattern located at the edge of the first 3D plate to obtain a first sub-pattern with a width equal to the fabric thickness of the first 3D plate, aligning the texture of the first sub-pattern with the pattern texture at the edge of the first 3D plate, and rendering it on the plane in the thickness direction; processing the second pattern located at the edge of the second 3D plate to obtain a second sub-pattern with a width equal to the fabric thickness of the second 3D plate, aligning the texture of the second sub-pattern with the pattern texture at the edge of the second 3D plate, and rendering it on the plane in the thickness direction.

[0013] In some embodiments, the method further includes: upon receiving an instruction to start the UV editing function, the UV editor displays the UV unfolded diagram of the three-dimensional model on a two-dimensional plane; and upon detecting a drag operation on the pattern in the UV unfolded diagram, the dragged pattern is remapped onto the corresponding three-dimensional model.

[0014] According to a second aspect of this disclosure, a pattern rendering apparatus is provided for use in a simulation system, wherein a three-dimensional model of an object is displayed on an interactive interface of the simulation system, the three-dimensional model comprising multiple three-dimensional plates, the apparatus comprising:

[0015] The acquisition unit is used to acquire the pose information of the pattern when a pattern rendering event is detected;

[0016] The judgment unit is used to determine whether the rendered pattern is located at the edge of the three-dimensional plate when the pattern is rendered on the three-dimensional plate in the posture indicated by the posture information. If it is located at the edge of the plate, the fabric thickness of the three-dimensional plate is obtained.

[0017] The processing unit is used to process the pattern located at the edge of the plate to obtain a sub-pattern with a width equal to the thickness of the fabric.

[0018] The rendering unit is used to align the texture of the sub-pattern with the pattern texture of the plate edge and then render it on the plane in the thickness direction.

[0019] In some embodiments, the interactive interface of the simulation system displays a two-dimensional plate of the object. The device further includes: a mapping unit, configured to map the pattern onto a two-dimensional plate corresponding to the three-dimensional plate when a pattern is detected rendered on any three-dimensional plate of the three-dimensional model; to display seam allowance on the two-dimensional plate of the object when a seam allowance display instruction is detected; and to display a sub-pattern of a preset width on the seam allowance adjacent to the edge of the two-dimensional plate when the pattern is detected to be located at the edge of the two-dimensional plate.

[0020] In some embodiments, the acquisition unit is specifically configured to, upon detecting a drag event on a pattern, if the release position of the dragged pattern is within the range of any three-dimensional plate, trigger a pattern rendering event to acquire the posture information of the pattern; or, upon detecting a posture editing trigger event for the pattern, display the posture editing interface of the pattern, and in response to detecting a confirmation event for the posture editing interface, trigger a pattern rendering event to acquire the edited posture information.

[0021] In some embodiments, the determining unit is specifically used to determine whether the rendered pattern intersects with the edge line of the three-dimensional plate.

[0022] In some embodiments, the processing unit is specifically configured to obtain a sub-pattern in the pattern, starting from a position aligned with the edge of the plate, with a width equal to the thickness of the fabric.

[0023] In some embodiments, the processing unit is specifically used to obtain texture information of a pattern located at the edge of the plate; and to interpolate the pattern located at the edge of the plate according to the width indicated by the fabric thickness based on the texture information to obtain a sub-pattern.

[0024] In some embodiments, the rendering unit is further configured to reprocess the pattern located at the edge of the three-dimensional plate when a change in the fabric thickness of the plate is detected, so as to obtain a sub-pattern with the same width as the changed fabric thickness.

[0025] In some embodiments, the apparatus further includes: a cross-page unit, configured to, upon detecting an instruction to enable the pattern cross-page function, determine whether the pattern on the three-dimensional model passes through multiple three-dimensional pages when rendered in the posture indicated by the posture information; if it passes through multiple three-dimensional pages, then render the pattern onto all the three-dimensional pages it has passed through.

[0026] In some embodiments, the cross-plate unit is specifically used to acquire the adjacent first three-dimensional plates and second three-dimensional plates through which the pattern passes; to divide the pattern passing through the first three-dimensional plates and second three-dimensional plates into a first pattern and a second pattern; to process the first pattern located at the edge of the first three-dimensional plate to obtain a first sub-pattern with a width equal to the fabric thickness of the first three-dimensional plate, and to align the texture of the first sub-pattern with the pattern texture at the edge of the first three-dimensional plate before rendering it on the plane in the thickness direction; to process the second pattern located at the edge of the second three-dimensional plate to obtain a second sub-pattern with a width equal to the fabric thickness of the second three-dimensional plate, and to align the texture of the second sub-pattern with the pattern texture at the edge of the second three-dimensional plate before rendering it on the plane in the thickness direction.

[0027] In some embodiments, the apparatus further includes: a UV editing unit, configured to, upon receiving an instruction to activate the UV editing function, display a UV unfolded diagram of the three-dimensional model on a two-dimensional plane; and, upon detecting a dragging operation on a pattern in the UV unfolded diagram, remap the dragged pattern onto the corresponding three-dimensional model.

[0028] According to a third aspect of this disclosure, an electronic device is provided, the device comprising: a processor; and a memory for storing processor-executable instructions to perform the method described in any embodiment of this disclosure.

[0029] According to a fourth aspect of this disclosure, a computer-readable storage medium is provided that stores computer program instructions thereon, which, when executed by a processor, implement the method described in any embodiment of this disclosure.

[0030] The technical solution provided in this disclosure can include the following beneficial effects: Upon detecting a pattern rendering event, the pose information of the pattern is obtained. When the pattern is rendered on a 3D plate in the pose indicated by the pose information, it is determined whether the rendered pattern is located at the edge of the 3D plate. If it is located at the edge, the fabric thickness of the 3D plate is obtained. The pattern located at the edge is processed to obtain a sub-pattern with a width equal to the fabric thickness. After aligning the texture of the sub-pattern with the texture of the pattern at the edge of the plate, it is rendered on the plane in the thickness direction, thereby allowing the pattern located at the edge of the plate to extend into the thickness direction of the 3D plate. When rendering patterns on a 3D model using this disclosure, the pattern located at the edge of the plate can wrap around the edge of the 3D plate, thus presenting a better rendering effect.

[0031] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and are not intended to limit this disclosure. Attached Figure Description

[0032] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with this disclosure and, together with the description, serve to explain the technical solutions of this disclosure.

[0033] Figure 1 This is a partially enlarged schematic diagram of the edge of a three-dimensional plate according to an exemplary embodiment of the present disclosure.

[0034] Figure 2 yes Figure 1 A schematic diagram showing the pattern located at the edge of the plate extending into the plane along the thickness direction.

[0035] Figure 3 This is a flowchart illustrating a pattern rendering method according to an exemplary embodiment of the present disclosure.

[0036] Figure 4 This is a partially enlarged schematic diagram of the seam allowance shown in this disclosure according to an exemplary embodiment.

[0037] Figure 5 This is a schematic diagram of a pattern spanning a page according to an exemplary embodiment of the present disclosure.

[0038] Figure 6 This is a schematic diagram illustrating the enlargement of a pattern across multiple printing plates using relevant technologies.

[0039] Figure 7 This is a schematic diagram illustrating the use of this disclosure to achieve cross-page design.

[0040] Figure 8 This is a schematic diagram illustrating the display of a UV unfolded pattern in a UV editor according to an exemplary embodiment of the present disclosure.

[0041] Figure 9 This is a schematic diagram of a pattern rendering apparatus according to an exemplary embodiment of the present disclosure.

[0042] Figure 10 This is a schematic diagram of an electronic device structure according to an exemplary embodiment of the present disclosure. Detailed Implementation

[0043] Exemplary embodiments will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description relates to the drawings, unless otherwise indicated, the same numerals in different drawings denote the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this disclosure. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this disclosure as detailed in the appended claims.

[0044] In actual production, in order to make the pattern at the edge of the object appear to wrap around the edge of the object, the pattern is usually printed on the seam allowance of the cut piece. However, the current simulation system only adds the pattern to the front of the pattern piece. Figure 1 This is a partially enlarged schematic diagram of the edge of a three-dimensional plate according to an exemplary embodiment of the present disclosure, such as... Figure 1 As shown, the pattern located at the edge of the plate does not extend into the plane where the plate thickness is located, resulting in poor pattern rendering.

[0045] To improve the pattern rendering effect, this disclosure provides a pattern rendering method that can be applied to various scenarios where patterns need to be rendered on objects. The objects can include, but are not limited to, clothing, shoes and socks, home textiles, and products containing fabrics.

[0046] Figure 2 yes Figure 1 A schematic diagram showing the pattern located at the edge of the plate extending into the plane along the thickness direction, as shown below. Figure 2 As shown, when the pattern rendering method detects that the rendered pattern is located at the edge of the 3D plate, it processes the pattern located at the edge of the plate to obtain a sub-pattern with a width that is the same as the fabric thickness of the 3D plate. After aligning the texture of the sub-pattern with the texture of the pattern at the edge of the plate, it renders it on the plane where the thickness direction is located, so that the rendered pattern extends to the plane where the thickness direction of the plate is located, and presents the effect of the pattern wrapping around the edge of the plate on the 3D model.

[0047] The pattern rendering method provided in this disclosure can be applied to simulation systems or software (such as computer-aided design (CAD) software). This simulation system supports displaying all two-dimensional plates constituting a target object on the system's interactive interface, as well as a three-dimensional model generated from a three-dimensional simulation based on all the two-dimensional plates. The two-dimensional plates and the three-dimensional model can be simultaneously displayed in two display areas on the interactive interface. For example, the display area of ​​the interactive interface can be divided into left and right (upper and lower) areas, with the two-dimensional plates displayed in the left (upper) display area and the corresponding three-dimensional model displayed in the right (lower) display area. Alternatively, it can also support a hiding function for the two display areas, allowing users to choose the information they wish to display. Based on this, the method can be executed by a device or apparatus with display capabilities that supports running the simulation system or software, including but not limited to mobile phones, computers, tablets, and servers. Users can choose a suitable device or apparatus to execute the pattern rendering method provided in this disclosure according to their actual needs, and this disclosure does not limit this choice.

[0048] In this embodiment, a two-dimensional plate refers to a planar graphic with two coordinate axes (such as x and y axes) used to represent the planar shape and structure of the target object. Through a simulation system, all two-dimensional plates that make up the target object can be converted or mapped to three-dimensional space to make the two-dimensional plates three-dimensional. The stitching relationship between the two-dimensional plates is simulated by splicing and stitching the three-dimensional plates, forming a spatial graphic with three coordinate axes (such as x, y, and z axes), which is the three-dimensional model of the target object. All two-dimensional plate areas of the target object correspond one-to-one with all three-dimensional plate areas included in the three-dimensional model. The three-dimensional model can simulate objects in the real world, including their shape, size, position, and orientation, and has a three-dimensional feel, which can more intuitively show the spatial structure and appearance features of the object.

[0049] Based on the two-dimensional plate and corresponding three-dimensional model of the target object displayed by the above simulation system, such as Figure 3 As shown, the pattern rendering method provided in this disclosure may include at least the following steps 301 to 305.

[0050] In step 301, if a pattern rendering event is detected, the pose information of the pattern is obtained.

[0051] The pattern rendering event indicates that a pattern is first added to the 3D model, or that the pose of a pattern already rendered on the 3D model changes. When either of these occurs, the system immediately detects and identifies the operation as a pattern rendering event, and sends a message to the simulation system that the pattern pose information has changed. Specifically, when a user adds a new pattern or adjusts the pose of an already rendered pattern, the system will recognize and record this event.

[0052] The pattern rendering event can be detected by recognizing the user's interaction with the interface displaying the 3D model and 2D plate. Specifically, it involves recognizing the received interaction information and determining whether an instruction to add a pattern or adjust its posture is being given. For this simulation system, diverse interaction methods to trigger pattern rendering events can be pre-set to meet the operating habits and preferences of different users, such as drag-and-drop operations, double-click operations, single-click operations combined with operation bar options, shortcut keys, or key combinations.

[0053] Upon detecting a pattern rendering event for any pattern, the pose information of that pattern is obtained. The pose information refers to the specific display state of the pattern on the plate, including but not limited to the pattern's orientation (i.e., the pattern's directionality, such as facing upwards, tilted, etc.), scaling ratio (the change in the pattern's size relative to its original size), rotation angle (the degree by which the pattern rotates around a point), and possible tilt angle (the degree of tilt of the pattern relative to horizontal or vertical lines).

[0054] In step 302, when the pattern is rendered on the three-dimensional plate in the posture indicated by the posture information, it is determined whether the rendered pattern is located at the edge of the three-dimensional plate.

[0055] Once the pose information of the pattern is obtained, the pattern is rendered on the 3D model in the pose indicated by the pose information; that is, the pattern is rendered on the 3D plate where the pattern is located in the pose indicated by the pose information.

[0056] Because a single 3D pattern can have multiple distinct edges—for example, in a short-sleeved sleeve pattern, there might be a shoulder seam edge (or sleeve cap seam), a cuff edge (or sleeve hem edge), and an elbow edge—if the area occupied by a pattern is larger than the area of ​​the pattern, the pattern can simultaneously occupy multiple different edges within the same pattern. Therefore, when determining whether a rendered pattern is located on the edge of the 3D pattern, it is necessary to sequentially check whether the rendered pattern is located on different edges of the 3D pattern. For example, in a scenario where a pattern covers the shoulder to cuff area of ​​a sleeve pattern, if the area occupied by the pattern is larger than the area of ​​the sleeve pattern, then the pattern is simultaneously located on both the shoulder seam edge and the cuff edge of the sleeve pattern.

[0057] In some embodiments, it can be determined whether the rendered pattern is located at the edge of the 3D plate by judging whether the rendered pattern intersects with the edge line of the 3D plate. If the rendered pattern intersects with the edge line of the 3D plate, it is determined that the rendered pattern is located at the edge of the 3D plate; if the rendered pattern does not intersect with the edge line of the 3D plate, it is determined that the rendered pattern is not located at the edge of the 3D plate.

[0058] In step 303, if it is located at the edge of the plate, the fabric thickness of the three-dimensional plate is obtained.

[0059] The fabric thickness of the 3D pattern is a value set by the user or a default value during 3D modeling, and the fabric thickness can be 0.1-3mm.

[0060] In step 304, the pattern located at the edge of the plate is processed to obtain a sub-pattern with the same width as the fabric thickness.

[0061] In step 305, after aligning the texture of the sub-pattern with the pattern texture of the plate edge, it is rendered on the plane in the thickness direction.

[0062] Aligning the texture of the sub-pattern with the texture of the pattern located at the edge of the plate and then rendering it on the plane in the thickness direction can visually create the effect of the pattern located at the edge of the plate extending into the plane in the thickness direction.

[0063] This disclosure, upon detecting a pattern rendering event, acquires the pose information of the pattern. When the pattern is rendered onto a 3D plate in the pose indicated by the pose information, it determines whether the rendered pattern is located at the edge of the 3D plate. If it is, the fabric thickness of the 3D plate is acquired. The pattern located at the edge of the plate is processed to obtain a sub-pattern with a width equal to the fabric thickness. The texture of the sub-pattern is aligned with the texture of the pattern at the edge of the plate, and then rendered on the plane in the thickness direction. This allows the pattern located at the edge of the plate to extend into the thickness direction of the 3D plate. By rendering patterns on a 3D model using this disclosure, patterns located at the edge of the plate can wrap around the edge of the 3D plate, resulting in a better rendering effect.

[0064] In the simulation system, by utilizing the mapping relationship between two-dimensional plates and three-dimensional models of an object, patterns added by the user to two-dimensional plates can be accurately mapped to the corresponding areas of the three-dimensional model, and vice versa. Therefore, when a pattern is detected rendered on any three-dimensional plate of the three-dimensional model, the pattern is mapped to the corresponding two-dimensional plate. Furthermore, when a seam allowance display command is detected, the seam allowance is displayed on the two-dimensional plate of the object, and when the pattern is detected to be located at the edge of the two-dimensional plate, a sub-pattern of a preset width is displayed on the seam allowance adjacent to the edge of the plate.

[0065] A seam allowance is a seam area defined at the edge of a pattern piece to be sewn together with other pattern pieces. In the clothing industry, pattern pieces have a clear seam and a seam allowance. The clear seam is also called the sewing line, and the seam allowance is the area between the sewing line and the seam allowance. When sewing pattern pieces together, the two pattern pieces are secured together along the sewing line. Therefore, the seam allowance can be considered the part where two pattern pieces are held together and prepared for sewing. When the user selects the option to display the seam allowance, it indicates that the system has detected a seam allowance display command and displays the seam allowance on the two-dimensional pattern piece of the object. The system also detects whether the pattern is located at the edge of the two-dimensional pattern piece. If the pattern is located at the edge of the two-dimensional pattern piece, a sub-pattern of a preset width is displayed on the seam allowance at the edge of the pattern piece.

[0066] In this embodiment, if the width of the pattern extending beyond the edge of the 2D pattern sheet is greater than or equal to the width of the seam allowance, a preset width can be determined based on the width of the seam allowance. For example, the width of the seam allowance can be set as the preset width, or 2 / 3 of the seam allowance width can be set as the preset width. If the width of the pattern extending beyond the edge of the 2D pattern sheet is less than the width of the seam allowance, a preset width can be determined based on the width of the pattern extending beyond the edge of the 2D pattern sheet; this embodiment does not impose any limitations on this. When exporting 2D pattern sheet information, if the user selects to display the seam allowance, a 2D pattern sheet with a pattern displayed on the seam allowance is exported.

[0067] Figure 4 This is a partially enlarged schematic diagram of the seam allowance shown in this disclosure according to an exemplary embodiment, such as... Figure 4 As shown, this disclosure allows for the display of sub-patterns on the seams of the edge of a two-dimensional plate when the pattern is located at the edge of the plate.

[0068] The above embodiments have briefly described how a pattern rendering event is triggered and the pattern's pose information is obtained when a pattern is first added to a 3D model or when the pose of a pattern already rendered on a 3D model changes. The following embodiments will provide a detailed explanation of these two situations.

[0069] Upon detecting a pattern addition command, selectable patterns are displayed on the simulation system's interface. Users can drag and drop the selected pattern onto the 3D model. Alternatively, if the user is not satisfied with the position of the pattern rendered on the 3D model, they can adjust the pattern's pose information by dragging. In other words, upon detecting a pattern drag event, if the release position of the dragged pattern is within the range of any 3D plate, a pattern rendering event is triggered, and the pattern's pose information is obtained.

[0070] In addition to adjusting the posture of the pattern through dragging, the posture information of the pattern can also be adjusted through the posture editing interface. That is, when a posture editing trigger event is detected, the posture editing interface of the pattern is displayed. In response to the detection of a confirmation event for the posture editing interface, a pattern rendering event is triggered to obtain the edited posture information.

[0071] The pose editing interface can include an orientation selector, a scaling slider / input box, rotation control, and tilt adjustment. The orientation selector allows the user to choose the orientation of the pattern, for example, through preset direction options (such as upright, inverted, tilted left, tilted right, etc.). The scaling slider / input box provides a slider or input box for the user to control the size of the pattern by adjusting the scaling ratio. The rotation control allows the user to set or adjust the rotation angle of the pattern, which can be achieved through a dial or angle input box. The tilt adjustment allows the user to adjust the tilt angle of the pattern to adapt to specific design requirements. Through the pose editing interface, users can adjust multiple pose features of the pattern.

[0072] When a user determines the pose information of a pattern through drag-and-drop operations or a pose editing interface, and renders the pattern on a 3D plate in the pose indicated by the pose information, if the rendered pattern is located at the edge of the 3D plate, then the pattern located at the edge of the plate needs to be processed to obtain a sub-pattern with a width equal to the fabric thickness. The following embodiments will describe two processing methods for obtaining a sub-pattern with a width equal to the fabric thickness.

[0073] In a first embodiment, processing the pattern located at the edge of the plate to obtain a sub-pattern with a width equal to the fabric thickness includes: obtaining a sub-pattern with a width equal to the fabric thickness, starting from a position aligned with the edge of the plate.

[0074] If the width of the remaining portion of the pattern, starting from the position aligned with the edge of the plate, is greater than or equal to the fabric thickness (e.g., the width of the remaining portion is 5mm and the fabric thickness is 1.5mm), then in the pattern corresponding to the remaining portion, starting from the position aligned with the edge of the plate, a sub-pattern with the same width as the fabric thickness is extracted.

[0075] If the width of the remaining part of the pattern, starting from the position aligned with the edge of the plate, is less than the fabric thickness, for example, the width of the remaining part is 1mm while the fabric thickness is 1.5mm, then the pattern corresponding to the remaining part of the pattern is taken as a sub-pattern.

[0076] In a second embodiment, processing the pattern located at the edge of the plate to obtain a sub-pattern with a width equal to the fabric thickness includes: acquiring texture information of the pattern located at the edge of the plate; and interpolating the pattern located at the edge of the plate based on the texture information and the width indicated by the fabric thickness to obtain a sub-pattern.

[0077] This embodiment uses image analysis technology to obtain the texture information and direction of the pattern located at the edge of the printing plate. Then, based on this texture information and direction, interpolation processing is performed on the pattern edge to obtain the interpolated pattern, which is the sub-pattern. This interpolated pattern can be visually seamlessly connected with the original pattern. The width of the interpolated pattern is determined according to the width indicated by the fabric thickness.

[0078] In this embodiment, the first implementation can be applied to situations where there is no sewing relationship between the edges of the patterned panels, such as when the pattern is located at the cuff edge; it can also be applied to scenarios where there is a sewing relationship but the pattern crossing function is not enabled. The second implementation can be applied to scenarios where the pattern crossing function is enabled and the pattern is rendered across multiple panels after being rendered in the posture indicated by the posture information. For example, if the pattern extends from the front panel to the sleeve panel, in this case, to present a better crossing effect, a sub-pattern for extending to the plane in the thickness direction can be obtained by interpolation based on the texture information of the pattern located at the edge of the panels. When obtaining the sub-pattern extending to the plane in the thickness direction through the second implementation, the size of the original pattern is not destroyed, that is, the pattern after crossing is not reduced, thus presenting a more natural visual effect.

[0079] The rendering process after a pattern spans multiple pages will be described in detail in the following examples.

[0080] During the design process, if the user wants to simulate the effect of pattern cross-page design, the pattern cross-page function can be turned on. That is, when the instruction to turn on the pattern cross-page function is detected, it is determined whether the pattern on the three-dimensional model passes through multiple three-dimensional plates when it is rendered in the posture indicated by the posture information; if it passes through multiple three-dimensional plates, the pattern is rendered on all the three-dimensional plates it passes through.

[0081] In some embodiments, rendering the pattern onto all the 3D plates it passes through includes: acquiring the adjacent first and second 3D plates that the pattern passes through; dividing the pattern passing through the first and second 3D plates into a first pattern and a second pattern; processing the first pattern located at the edge of the first 3D plate to obtain a first sub-pattern with a width equal to the fabric thickness of the first 3D plate, aligning the texture of the first sub-pattern with the pattern texture at the edge of the first 3D plate, and rendering it on the plane in the thickness direction; processing the second pattern located at the edge of the second 3D plate to obtain a second sub-pattern with a width equal to the fabric thickness of the second 3D plate, aligning the texture of the second sub-pattern with the pattern texture at the edge of the second 3D plate, and rendering it on the plane in the thickness direction.

[0082] Figure 5 This is a schematic diagram illustrating a pattern spanning multiple pages according to an exemplary embodiment of this disclosure, such as... Figure 5As shown, the two adjacent 3D plates that the pattern passes through are obtained, referred to as the first 3D plate and the second 3D plate, respectively. The pattern passing through the first 3D plate and the second 3D plate is divided into a first pattern and a second pattern. The first pattern located at the edge of the first 3D plate can be interpolated to obtain a first sub-pattern with a width equal to the fabric thickness of the first 3D plate. After aligning the texture of the first sub-pattern with the pattern texture at the edge of the first 3D plate, it is rendered on the plane in the thickness direction. Similarly, the second pattern located at the edge of the second 3D plate is interpolated to obtain a second sub-pattern with a width equal to the fabric thickness of the second 3D plate. After aligning the texture of the second sub-pattern with the pattern texture at the edge of the second 3D plate, it is rendered on the plane in the thickness direction.

[0083] Figure 6 This is a magnified illustration of a pattern spanning multiple printing plates using relevant technologies. Figure 7 This is a schematic diagram illustrating the use of this disclosure to achieve cross-page design, such as... Figure 6 As shown, patterns created using related technologies have gaps between the printing plates, resulting in an unnatural transition. However, as... Figure 7 As shown, by using this disclosure, the pattern located at the edge of the pattern piece is extended to the plane where the fabric thickness is located before sewing, so that the pattern presents a natural transition effect between the pattern pieces.

[0084] In simulation systems, the UV editor is used to edit and adjust the UV mapping (also known as UV unwrapping or UV layout) of a model within the simulation environment. UV mapping is the process of mapping the surface of a 3D model onto a 2D plane (usually UV texture space). The UV editor allows for more precise application of patterns to 3D models; users can draw texture maps on a 2D plane, and the system reapplies these texture maps to the 3D model based on the mapping relationship. With the UV editor, users can design and edit textures in 2D image editing software and then apply these textures to the corresponding surfaces of the 3D model, effectively avoiding problems such as texture stretching, distortion, or unnatural seams.

[0085] That is, when a command to start the UV editing function is received, the UV editor will display the UV unfolded pattern of the 3D model on a 2D plane; when a drag operation is detected on the pattern in the UV unfolded pattern, the dragged pattern will be remapped onto the corresponding 3D model surface.

[0086] Figure 8 This disclosure is a schematic diagram illustrating the display of a UV unfolded pattern in a UV editor according to an exemplary embodiment, such as... Figure 8As shown, during UV unwrapping, each vertex of the 3D model is mapped to a point on a 2D plane, and these points together constitute the UV layout of the model. Patterns on the 3D model are unwrapped onto the 2D plane along with the model's surface, forming patterns on the UV unwrapped map. Users can adjust the position of the pattern on the UV unwrapped map to adjust its position on the 3D model; these adjustments are mapped back to the 3D model according to the mapping relationship. Through the UV editor, users can finely adjust the position of sub-patterns on the 3D model, thus ensuring that the rendering effect of the sub-patterns on the 3D model meets the user's expectations.

[0087] In some embodiments, the user can adjust the fabric thickness of the 3D model as needed. Therefore, when a change in the fabric thickness of the 3D plate is detected, the pattern located at the edge of the plate is reprocessed to obtain a sub-pattern with the same width as the changed fabric thickness. The texture of the sub-pattern is then aligned with the texture of the pattern at the edge of the plate and rendered on the plane in the thickness direction. That is, when the user adjusts the fabric thickness, the pattern effect rendered on the plane in the thickness direction is updated in real time, so that the pattern on the plane in the thickness direction adapts to the adjusted fabric thickness.

[0088] Corresponding to the embodiments of the foregoing methods, this disclosure also provides embodiments of the apparatus and the terminal to which it is applied.

[0089] like Figure 9 As shown, this embodiment also provides a pattern rendering device applied to a simulation system. The simulation system displays a three-dimensional model of an object on its interactive interface. The three-dimensional model includes multiple three-dimensional plates. The device includes:

[0090] The acquisition unit 901 is used to acquire the pose information of the pattern when a pattern rendering event is detected;

[0091] The judgment unit 902 is used to determine whether the rendered pattern is located at the edge of the three-dimensional plate when the pattern is rendered on the three-dimensional plate in the posture indicated by the posture information. If it is located at the edge of the plate, the fabric thickness of the three-dimensional plate is obtained.

[0092] Processing unit 903 is used to process the pattern located at the edge of the plate to obtain a sub-pattern with a width equal to the thickness of the fabric;

[0093] The rendering unit 904 is used to align the texture of the sub-pattern with the pattern texture of the plate edge and then render it on the plane in the thickness direction.

[0094] In some embodiments, the interactive interface of the simulation system displays a two-dimensional plate of the object. The device further includes: a mapping unit, configured to map the pattern onto a two-dimensional plate corresponding to the three-dimensional plate when a pattern is detected rendered on any three-dimensional plate of the three-dimensional model; to display seam allowance on the two-dimensional plate of the object when a seam allowance display instruction is detected; and to display a sub-pattern of a preset width on the seam allowance adjacent to the edge of the two-dimensional plate when the pattern is detected to be located at the edge of the two-dimensional plate.

[0095] In some embodiments, the acquisition unit is specifically configured to, upon detecting a drag event on a pattern, if the release position of the dragged pattern is within the range of any three-dimensional plate, trigger a pattern rendering event to acquire the posture information of the pattern; or, upon detecting a posture editing trigger event for the pattern, display the posture editing interface of the pattern, and in response to detecting a confirmation event for the posture editing interface, trigger a pattern rendering event to acquire the edited posture information.

[0096] In some embodiments, the determining unit is specifically used to determine whether the rendered pattern intersects with the edge line of the three-dimensional plate.

[0097] In some embodiments, the processing unit is specifically configured to obtain a sub-pattern in the pattern, starting from a position aligned with the edge of the plate, with a width equal to the thickness of the fabric.

[0098] In some embodiments, the processing unit is specifically used to obtain texture information of a pattern located at the edge of the plate; and to interpolate the pattern located at the edge of the plate according to the width indicated by the fabric thickness based on the texture information to obtain a sub-pattern.

[0099] In some embodiments, the rendering unit is further configured to reprocess the pattern located at the edge of the three-dimensional plate when a change in the fabric thickness of the plate is detected, so as to obtain a sub-pattern with the same width as the changed fabric thickness.

[0100] In some embodiments, the apparatus further includes: a cross-page unit, configured to, upon detecting an instruction to enable the pattern cross-page function, determine whether the pattern on the three-dimensional model passes through multiple three-dimensional pages when rendered in the posture indicated by the posture information; if it passes through multiple three-dimensional pages, then render the pattern onto all the three-dimensional pages it has passed through.

[0101] In some embodiments, the cross-plate unit is specifically used to acquire the adjacent first three-dimensional plates and second three-dimensional plates through which the pattern passes; to divide the pattern passing through the first three-dimensional plates and second three-dimensional plates into a first pattern and a second pattern; to process the first pattern located at the edge of the first three-dimensional plate to obtain a first sub-pattern with a width equal to the fabric thickness of the first three-dimensional plate, and to align the texture of the first sub-pattern with the pattern texture at the edge of the first three-dimensional plate before rendering it on the plane in the thickness direction; to process the second pattern located at the edge of the second three-dimensional plate to obtain a second sub-pattern with a width equal to the fabric thickness of the second three-dimensional plate, and to align the texture of the second sub-pattern with the pattern texture at the edge of the second three-dimensional plate before rendering it on the plane in the thickness direction.

[0102] In some embodiments, the apparatus further includes: a UV editing unit, configured to, upon receiving an instruction to activate the UV editing function, display a UV unfolded diagram of the three-dimensional model on a two-dimensional plane; and, upon detecting a dragging operation on a pattern in the UV unfolded diagram, remap the dragged pattern onto the corresponding three-dimensional model.

[0103] The specific implementation methods of each unit in the device have been described in the foregoing embodiments and will not be repeated here.

[0104] This disclosure also provides an electronic device, the structural schematic diagram of which is shown below. Figure 10 As shown, the electronic device 1000 includes at least one processor 1001, a memory 1002, and a bus 1003. The at least one processor 1001 is electrically connected to the memory 1002. The memory 1002 is configured to store at least one computer-executable instruction, and the processor 1001 is configured to execute the at least one computer-executable instruction to perform the steps of any pattern rendering method provided in any embodiment or optional implementation of this disclosure.

[0105] Furthermore, the processor 1001 can be an FPGA (Field-Programmable Gate Array) or other devices with logic processing capabilities, such as an MCU (Microcontroller Unit) or a CPU (Central Processing Unit).

[0106] This disclosure also provides another readable storage medium storing a computer program that, when executed by a processor, implements the steps of any pattern rendering method provided in any embodiment or optional implementation of this disclosure.

[0107] The readable storage media provided in this disclosure include, but are not limited to, any type of disk (including floppy disk, hard disk, optical disk, CD-ROM, and magneto-optical disk), ROM (Read-Only Memory), RAM (Random Access Memory), EPROM (Erasable Programmable Read-Only Memory), EEPROM (Electrically Erasable Programmable Read-Only Memory), flash memory, magnetic cards, or optical cards. In other words, the readable storage media includes any medium by which a device (e.g., a computer) stores or transmits information in a readable form.

[0108] The above description is merely a preferred embodiment of this disclosure and is not intended to limit this disclosure. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this disclosure should be included within the scope of protection of this disclosure.

Claims

1. A pattern rendering method, characterized in that, Applied to a simulation system, the simulation system displays a 3D model of an object on its interactive interface, the 3D model comprising multiple 3D panels, the method comprising: Upon detecting a pattern rendering event, the pose information of the pattern is obtained; When the pattern is rendered on a 3D plate in the posture indicated by the posture information, it is determined whether the rendered pattern is located at the edge of the 3D plate. If it is located at the edge of the plate, then obtain the fabric thickness of the three-dimensional plate; The pattern located at the edge of the plate is processed to obtain a sub-pattern with the same width as the fabric thickness; After aligning the texture of the sub-pattern with the pattern texture of the plate edge, it is rendered on the plane in the thickness direction.

2. The method according to claim 1, characterized in that, The simulation system displays a two-dimensional image of the object on its interactive interface, and the method further includes: If a pattern is detected rendered on any three-dimensional plate of the three-dimensional model, the pattern is mapped onto a two-dimensional plate corresponding to that three-dimensional plate. Upon detecting a seam allowance display command, the seam allowance is displayed on the two-dimensional plate of the object, and upon detecting that the pattern is located at the edge of the two-dimensional plate, a sub-pattern of a preset width is displayed on the seam allowance adjacent to the edge of the plate.

3. The method according to claim 1, characterized in that, The step of obtaining the pose information of the pattern upon detecting a pattern rendering event includes: If a drag event on a pattern is detected, and the release position of the dragged pattern is within the area of ​​any 3D panel, a pattern rendering event is triggered to obtain the pattern's pose information; or, When a pose editing trigger event for a pattern is detected, the pose editing interface for the pattern is displayed. In response to a confirmation event for the pose editing interface, a pattern rendering event is triggered, and the edited pose information is obtained.

4. The method according to claim 1, characterized in that, The step of determining whether the rendered pattern is located at the edge of the 3D plate includes: Determine whether the rendered pattern intersects with the edge line of the 3D plate.

5. The method according to claim 1, characterized in that, The process of processing the pattern located at the edge of the plate to obtain a sub-pattern with a width equal to the fabric thickness includes: Starting from a position aligned with the edge of the pattern, obtain a sub-pattern with a width equal to the thickness of the fabric.

6. The method according to claim 1, characterized in that, The process of processing the pattern located at the edge of the plate to obtain a sub-pattern with a width equal to the fabric thickness includes: Obtain the texture information of the pattern located at the edge of the plate; Based on the texture information, the pattern located at the edge of the plate is interpolated according to the width indicated by the fabric thickness to obtain a sub-pattern.

7. The method according to claim 1, characterized in that, The method further includes: If a change in the fabric thickness of the three-dimensional plate is detected, the pattern located at the edge of the plate is reprocessed to obtain a sub-pattern with the same width as the changed fabric thickness.

8. The method according to claim 1, characterized in that, The method further includes: When an instruction to enable pattern cross-page function is detected, it is determined whether the pattern on the 3D model passes through multiple 3D pages when it is rendered in the posture indicated by the posture information. If the image passes through multiple 3D plates, the pattern will be rendered onto all the 3D plates that have passed through.

9. The method according to claim 8, characterized in that, The step of rendering the pattern onto all the passed 3D plates includes: Obtain the adjacent first and second three-dimensional plates that the pattern passes through; The pattern on the first and second 3D plates is divided into a first pattern and a second pattern. The first pattern located at the edge of the first three-dimensional plate is processed to obtain a first sub-pattern with a width equal to the fabric thickness of the first three-dimensional plate. The texture of the first sub-pattern is then aligned with the texture of the pattern at the edge of the first three-dimensional plate and rendered on the plane in the thickness direction. The second pattern located at the edge of the second three-dimensional plate is processed to obtain a second sub-pattern with the same width as the fabric thickness of the second three-dimensional plate. After aligning the texture of the second sub-pattern with the texture of the pattern at the edge of the second three-dimensional plate, it is rendered on the plane in the thickness direction.

10. The method according to claim 1, characterized in that, The method further includes: Upon receiving a command to activate the UV editing function, the UV editor will display the UV unfolded diagram of the 3D model on a 2D plane; When a drag operation is detected on the pattern in the UV unfolded diagram, the dragged pattern is remapped onto the corresponding 3D model.

11. A pattern rendering device, characterized in that, An apparatus used in a simulation system, wherein a three-dimensional model of an object is displayed on the interactive interface of the simulation system, the three-dimensional model comprising multiple three-dimensional panels, the apparatus comprising: The acquisition unit is used to acquire the pose information of the pattern when a pattern rendering event is detected; The judgment unit is used to determine whether the rendered pattern is located at the edge of the three-dimensional plate when the pattern is rendered on the three-dimensional plate in the posture indicated by the posture information. If it is located at the edge of the plate, the fabric thickness of the three-dimensional plate is obtained. The processing unit is used to process the pattern located at the edge of the plate to obtain a sub-pattern with a width equal to the thickness of the fabric. The rendering unit is used to align the texture of the sub-pattern with the pattern texture of the plate edge and then render it on the plane in the thickness direction.

12. An electronic device, characterized in that, The device includes: processor; Memory for storing processor-executable instructions to perform the method of any one of claims 1 to 10.

13. A computer-readable storage medium having computer program instructions stored thereon, characterized in that, When the computer program instructions are executed by the processor, they implement the method described in any one of claims 1 to 10.

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