Anti-skid treatment method for smooth surface material

Abstract

The invention relates to the technical field of building decoration, in particular to a smooth surface material anti-skid treatment method which comprises the following steps: S100, base material pretreatment: cleaning and activating the smooth base material surface to improve the surface energy of the base material surface, and coating a transparent priming coat according to the base material, forming a pretreated surface with active grafting sites; s200, preparation of an anti-skid precursor solution: preparing an ultraviolet curing anti-skid precursor solution, wherein the precursor solution comprises a photosensitive resin matrix, hydrophobic modified nanoparticles, a photoinitiator and a phase separation inducer; through unique solvent induced phase separation and step-by-step ultraviolet light curing processes, a micro-nano dual-scale structure compounded with micron-sized'micro-sucker 'pits and nano particles is grown on the surface of a smooth base material in situ, and the long-term problem that'high transparency' and'excellent wet antiskid property 'cannot be achieved at the same time in a traditional antiskid technology is creatively solved.

Description

Technical Field

[0001] This invention relates to the field of building decoration technology, and specifically to an anti-slip treatment method for smooth surface materials. Background Technology

[0002] With the rapid development of modern building decoration and consumer electronics industries, smooth surface materials such as glass, polished stone (such as marble and granite), glazed ceramics, and high-gloss polymer composite materials are widely used in high-end hotel flooring, bathroom glass rooms, mobile phone glass back panels, and touch screen display panels due to their transparent visual effect, high-end texture, and easy maintenance.

[0003] However, the aforementioned smooth surface materials generally present a significant safety hazard: a low coefficient of friction. Especially when exposed to water, oil, or high humidity, a water film easily forms, causing a sharp drop in the static friction coefficient (typically below 0.3), leading to slips and falls or equipment damage. Therefore, anti-slip treatment of smooth surfaces is particularly important.

[0004] Existing anti-slip treatment technologies mainly include physical / chemical etching methods and surface coating methods, but they all have insurmountable technical drawbacks in practical applications:

[0005] 1. Limitations of Physical or Chemical Etching Methods: Traditional sandblasting, laser etching, or hydrofluoric acid (HF) chemical etching processes, while improving anti-slip performance by increasing surface roughness, are subtractive processes. Their biggest drawback is the severe damage they cause to the optical properties of the material surface. The irregular uneven structure created by etching produces strong diffuse reflection of light, leading to haze and loss of gloss on the material surface. Transparent materials (such as glass) become opaque, significantly sacrificing the original appearance and texture of the product. Furthermore, chemical etching involves strong acid operations, resulting in severe environmental pollution and high safety risks.

[0006] 2. Defects of traditional granular anti-slip coatings: Another mainstream method is to add anti-slip particles (such as quartz sand, alumina particles, or polymer microspheres) to resin coatings. To ensure sufficient anti-slip force, it is usually necessary to add particles with a relatively large particle size (tens of micrometers or even larger), and the amount added is relatively high.

[0007] The contradiction between transparency and anti-slip properties: Because the refractive index of anti-slip particles is difficult to match perfectly with the resin matrix, and the particle size is much larger than the wavelength of visible light, Rayleigh scattering and Mie scattering are easily generated, resulting in a decrease in the light transmittance of the coating and the generation of obvious haze. This makes it difficult to apply to scenarios with extremely high requirements for optical transparency (such as mobile phone back panels or high-transparency glass).

[0008] Difficult to clean and maintain: Traditional granular coatings rely on the physical protrusions of the particles to hinder sliding, and this rough surface is very easy to "hide dirt and grime". Dust and oil stains are easy to get stuck in the gaps between the particles, and due to the lack of effective hydrophobic and oleophobic design, stains are difficult to remove by simple wiping. After long-term use, the coating surface will become dirty and black, which is not only unhygienic but also affects the appearance.

[0009] In summary, existing technologies lack an anti-slip treatment technology that can maintain the original high light transmittance and high gloss of the substrate, provide excellent anti-slip performance in humid environments, and possess hydrophobic and easy-to-clean surface properties. Therefore, developing an anti-slip treatment method for smooth surface materials has become a key technical problem that urgently needs to be solved in this field. Summary of the Invention

[0010] To achieve the above objectives, the present invention provides the following technical solution:

[0011] This invention provides a method for treating smooth surface materials to prevent slippage, comprising the following steps: S100, substrate pretreatment: cleaning and activating the surface of a smooth substrate to increase its surface energy, and coating a transparent base layer according to the substrate material to form a pretreated surface with active grafting sites; S200, preparation of an anti-slip precursor solution: preparing a UV-curable anti-slip precursor solution, wherein the precursor solution comprises a photosensitive resin matrix, hydrophobically modified nanoparticles, a photoinitiator, and a phase separation inducing agent; the phase separation inducing agent contains at least one volatile non-good solvent that is immiscible with the photosensitive resin matrix; S300, construction of a micro / nano dual-scale structure: applying the anti-slip material prepared in step S200... The precursor solution is uniformly coated on the pretreated surface obtained in step S100 and left to stand under controlled temperature and humidity conditions, allowing the phase separation inducing agent to self-assemble and condense into nuclei on the coating surface, inducing phase separation in the photosensitive resin matrix and forming a wet film structure with a micron-sized droplet array and nanoparticles. In step S400, the wet film structure formed in step S300 is subjected to staged ultraviolet curing treatment for step curing, step S300. First, pre-curing is performed to fix the morphology of the micron-sized droplet array, then the volatile non-good solvent is completely evaporated, leaving a micron-sized pit structure on the coating surface, and finally, complete curing is performed to obtain a transparent anti-slip coating with a composite structure of micron-sized pits and nanoparticles on a smooth substrate surface.

[0012] Further, step S100 specifically includes: the smooth substrate is selected from any one of flat glass, glazed ceramic, polished stone or metal sheet; the activation treatment adopts one or a combination of low temperature plasma treatment, corona discharge treatment or chemical etching treatment to reduce the water contact angle of the substrate surface to below 10°.

[0013] Further, step S100 also includes: the transparent base coating is a silane coupling agent hydrolysate, wherein the silane coupling agent is selected from at least one of γ-methacryloyloxypropyltrimethoxysilane, γ-glycidyl etheroxypropyltrimethoxysilane, and vinyltrimethoxysilane, and the thickness of the transparent base coating after coating and drying is controlled between 50 nm and 500 nm.

[0014] Further, in step S200, the anti-slip precursor solution is composed of the following components in parts by weight: fluorinated modified acrylate oligomer: 30-50 parts; multifunctional acrylate reactive diluent: 40-60 parts; hydrophobic modified nanoparticles: 2-8 parts; photoinitiator: 3-5 parts; phase separation inducer: 15-30 parts; leveling agent: 0.1-1 parts; wherein the fluorinated modified acrylate oligomer is selected from at least one of hexafluorobutyl acrylate modified polyurethane and perfluoropolyether modified epoxy acrylate, and its refractive index is 1.45-1.55.

[0015] Further, step S200 also includes: the hydrophobically modified nanoparticles are nano-silica or nano-alumina with a surface modified by methyltrimethoxysilane or hexamethyldisilazane, and their average particle size is 10nm-50nm; the phase separation inducer is a volatile solvent with a boiling point between 50℃ and 100℃, selected from anhydrous ethanol, isopropanol, ethyl acetate or mixtures thereof, and the solubility parameter difference of the phase separation inducer in the photosensitive resin matrix is... Greater than 2.0 .

[0016] Further, step S300 specifically includes: applying the precursor solution to the substrate surface by high-pressure air atomization spraying or wire bar coating, controlling the wet film thickness to be 15μm-40μm; the controlled temperature and humidity environment is: temperature 20℃-35℃, relative humidity 45%-65%.

[0017] Furthermore, step S300 also includes: the specific process of the settling is as follows: the coating is settling for 45 seconds to 120 seconds under the temperature and humidity environment. During this period, the surface tension gradient is established by utilizing the difference in evaporation rate between the volatile non-good solvent and the photosensitive resin matrix, which induces Marangoni convection inside the coating. Through the convection, the hydrophobic modified nanoparticles are driven to migrate and accumulate at the gas-liquid interface. At the same time, the volatile non-good solvent self-assembles on the coating surface to form a regular microdroplet array with a diameter of 2μm-10μm, thereby constructing a phase-separated precursor structure in which micron-sized droplets and nanoparticles coexist.

[0018] Further, step S400 specifically includes: the pre-curing treatment is irradiated with a low-power ultraviolet LED light source with a peak wavelength of 365nm or 395nm and the irradiation energy is controlled at 30-60mJ / cm², so that the photosensitive resin matrix undergoes partial cross-linking to reach the gel point, thereby locking the spatial morphology of the micron-scale droplet array.

[0019] The process of complete evaporation of the volatile non-good solvent is as follows: after pre-curing, the coating is placed in an infrared drying oven at 40℃-60℃ for 1-3 minutes to completely vaporize and remove the droplets occupying the micro-area position, forming honeycomb-shaped micro-pits with upward openings on the coating surface.

[0020] Furthermore, step S400 also includes:

[0021] The complete curing process is carried out by irradiation with a high-pressure mercury lamp or a high-power UV curing machine, with the irradiation energy controlled at 600-1200mJ / cm², so that the coating is completely cross-linked and hardened.

[0022] The transparent anti-slip coating obtained after step S400 has the following characteristics: visible light transmittance. Water contact angle wet static friction coefficient .

[0023] Beneficial effects

[0024] Compared with known public technologies, the technical solution provided by this invention has the following beneficial effects:

[0025] This invention utilizes a unique solvent-induced phase separation and stepwise UV curing process to grow a micro-nano dual-scale structure on a smooth substrate surface, featuring micron-scale "micro-suction cup" pits and nanoparticles. This innovatively solves the long-standing problem in traditional anti-slip technologies where "high transparency" and "excellent wet anti-slip properties" are mutually exclusive. Under pressure and wet conditions, this special structure can significantly improve the coefficient of friction (COF≥0.6) through a vacuum adsorption mechanism. Simultaneously, in the dry state, it utilizes a nano-hydrophobic layer to achieve a superhydrophobic and easy-to-clean function similar to a "lotus leaf effect" (contact angle≥110°). Furthermore, by eliminating large-particle physical fillers, the coating maintains extremely high visible light transmittance (≥90%) and excellent adhesion, achieving a comprehensive technical effect of invisible anti-slip, durable wear resistance, and easy cleaning. Attached Figure Description

[0026] Figure 1 This is a flowchart of an anti-slip treatment method for a smooth surface material according to the present invention. Detailed Implementation

[0027] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present invention.

[0028] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of the invention described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but includes other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0029] The present invention will now be described in further detail with reference to the accompanying drawings:

[0030] Example:

[0031] As shown in the figure, an anti-slip treatment method for a smooth surface material includes the following steps:

[0032] S100, Substrate pretreatment: Cleaning and activating the smooth substrate surface to improve the surface energy of the substrate surface, and applying a transparent base coating according to the substrate material to form a pretreated surface with active grafting sites.

[0033] The specific implementation process is as follows:

[0034] Step S101: Precision Cleaning and Degreasing of the Substrate: First, select a smooth substrate to be treated (in this embodiment, optical-grade float glass or polished marble slabs are used as examples). Place the substrate in an industrial-grade ultrasonic cleaner and perform multi-stage cleaning sequentially: The first stage uses acetone or industrial alcohol as the cleaning medium, ultrasonically cleaning for 5-10 minutes to thoroughly remove processing grease, fingerprints, and organic contaminants from the substrate surface; the second stage uses deionized water (resistivity > 10 MΩ·cm) for rinsing, ultrasonically cleaning for 5-10 minutes to remove residual solvents and water-soluble ions; after cleaning, use high-purity nitrogen airflow to dry the substrate surface and place it in an 80°C oven for 10 minutes to ensure no moisture residue remains on the substrate surface. This step aims to expose the original physical surface of the substrate, eliminating the shielding layer for subsequent activation treatment.

[0035] Step S102: High-energy surface activation treatment: The dried substrate is placed into the reaction chamber of a low-temperature plasma treatment device. After evacuating to a background pressure of 10-30 Pa, high-purity oxygen (O2) or argon (Ar) is introduced as the working gas, with a flow rate controlled at 50-200 sccm. The radio frequency power supply is turned on, and the power is set to 300W-500W, subjecting the substrate surface to plasma bombardment for 60-180 seconds. During this process, the high-energy particle beam not only etches away trace amounts of stubborn organic matter, but more importantly, it breaks the chemical bonds on the substrate surface (such as the Si-O-Si bonds on the glass surface), transforming them into highly reactive hydroxyl (-OH) or free radical groups. Testing shows that the substrate surface treated in this step exhibits extremely strong hydrophilicity, with the water contact angle dropping sharply from 45°-60° before treatment to below 5° (close to 0°), reaching a superhydrophilic state. This provides the necessary thermodynamic conditions for the uniform wetting and chemical grafting of the subsequent primer.

[0036] Step S103: Hydrolysis and activation of transparent primer: While performing surface activation treatment, a reactive transparent primer is prepared simultaneously.

[0037] The specific procedure is as follows: In a beaker equipped with a magnetic stirrer, add 90-95 parts by weight of an alcohol-water mixed solvent (the mass ratio of anhydrous ethanol to deionized water is 9:1). Then, add glacial acetic acid dropwise to adjust the pH of the solution to a weakly acidic range of 4.0-5.0. This pH environment is the optimal condition for catalyzing the hydrolysis of the silane coupling agent. While stirring, slowly add 1-5 parts by weight of γ-methacryloyloxypropyltrimethoxysilane (KH-570). After the addition is complete, maintain the stirring at room temperature for 30-60 minutes to allow the methoxy groups in the silane coupling agent to be fully hydrolyzed into active silanol groups (Si-OH), resulting in a clear, transparent, and free-of-suspended-particle activated primer.

[0038] Step S104: Construction of Nanoscale Molecular Bridges: Immediately after activation in Step S102, the substrate should be primed (ideally within 15 minutes) to prevent surface activity degradation. Using precision spraying or spin coating, uniformly coat the activated primer prepared in Step S103 onto the substrate surface. Then, place the substrate on a heating stage at 100℃-120℃ for heat treatment for 3-5 minutes. During heat treatment, a dehydration condensation reaction occurs: on one hand, the silanol groups in the primer condense with the hydroxyl groups on the substrate surface, forming strong Si-O-Si covalent bonds, anchoring the substrate like "anchors"; on the other hand, the acrylate double bonds at the other end of the KH-570 molecule are exposed on the outermost layer, forming a transparent molecular brush layer with a thickness of only 50nm-200nm. At this point, step S100 is complete. The originally smooth and inert substrate surface has been successfully modified into an active surface that "contains both inorganic chemical bond anchors and is rich in organic reactive double bonds," thus providing a perfect interface for the covalent bonding of the anti-slip coating in step S300.

[0039] S200, Preparation of anti-slip precursor solution: Prepare a UV-curable anti-slip precursor solution, wherein the precursor solution comprises a photosensitive resin matrix, hydrophobically modified nanoparticles, a photoinitiator, and a phase separation inducing agent; wherein the phase separation inducing agent contains at least one volatile non-good solvent that is immiscible with the photosensitive resin matrix.

[0040] The specific implementation process is as follows:

[0041] Step S201: Premixing and Viscosity Adjustment of the Resin Matrix: First, add the base resin components to a light-shielded stirring tank equipped with a high-speed dispersion disc. According to the predetermined formulation, add 30-50 parts by weight of a fluorinated modified acrylate oligomer (e.g., hexafluorobutyl modified polyurethane acrylate) as the main resin, whose low surface energy characteristics impart excellent hydrophobic and oleophobic properties to the coating. Subsequently, add 40-60 parts by weight of a multifunctional acrylate reactive diluent (e.g., trimethylolpropane triacrylate (TMPTA) or pentaerythritol triacrylate (PETA)). The reactive diluent not only participates in the crosslinking reaction to improve the coating hardness but also plays a role in adjusting the viscosity of the system. Turn on the stirrer, set the speed to 500-800 rpm, and stir at room temperature for 10-15 minutes until the two resins are completely miscible, forming a clear and transparent resin matrix liquid.

[0042] Step S202: Ultrasonic Dispersion and Deagglomeration of Nanoparticles: Slowly add 2-8 parts by weight of hydrophobically modified nano-silica (average original particle size 15-30 nm) to the resin matrix liquid obtained in step S201. At this time, the mixture may temporarily appear turbid. Transfer the mixture to an ultrasonic disperser and perform high-energy ultrasonic dispersion treatment under ice-water bath cooling. Set the ultrasonic power to 600 W, the frequency to 20 kHz, and the treatment time to 20-30 minutes. The cavitation effect generated by the ultrasound instantly breaks down the nano-agglomerates, making the nanoparticles uniformly suspended in the resin matrix. After dispersion, take a sample for testing to ensure that the Tyndall effect of the dispersion is obvious and the optical path is clear, with no particles visible to the naked eye.

[0043] Step S203: Dissolution of the photoinitiator system: Under light-protected conditions, add 3-5 parts by weight of photoinitiator (e.g., a mixture of 1-hydroxycyclohexylphenyl ketone Irgacure184 and TPO, mass ratio 2:1) to the well-dispersed nano-resin slurry. Turn on low-speed stirring (200-300 rpm) and continue stirring for 15-20 minutes until the solid photoinitiator particles are completely dissolved. At this time, the material temperature must be strictly controlled not to exceed 40℃ to prevent thermal decomposition of the photoinitiator or initiation of resin microgelation.

[0044] Step S204: A non-good solvent needs to be introduced into the resin system to bring it to a critical dissolution state of "almost-separated". Weigh 15-30 parts by weight of a phase separation inducer (e.g., a 1:1 mixture of anhydrous ethanol and ethyl acetate). While stirring at high speed (1000-1200 rpm), slowly add the phase separation inducer dropwise to the resin system using a peristaltic pump at a flow rate of 5-10 mL / min.

[0045] Special note: The dropping rate should not be too fast, otherwise the local solvent concentration will be too high, causing the resin to precipitate instantly and form an irreversible white precipitate. By slowly dropping and shearing, the non-good solvent is forced to be uniformly dispersed in the resin in the form of molecular or extremely small droplets, forming a macroscopically transparent and microscopically uniform single-phase solution.

[0046] Step S205: Precision Filtration and Degassing: The precursor solution prepared in step S204 is pressure filtered through a PTFE syringe filter or filter cartridge with a pore size of 1.0 μm to remove any possible gel particles or external dust. These impurities are the main cause of optical defects (such as "fisheyes" or "bright spots") in the coating. The filtered solution is placed in a vacuum degassing chamber and allowed to stand for 10-20 minutes under a vacuum of -0.09 MPa to remove air bubbles entrained during stirring. The final precursor solution is a colorless or slightly yellow transparent liquid with a viscosity controlled between 50-200 cps (25°C). It is sealed and stored in a brown bottle and used within 24 hours to prevent the phase separation inducer from volatilizing and causing component imbalance.

[0047] S300, Construction of micro-nano dual-scale structure: The anti-slip precursor solution prepared in step S200 is uniformly coated on the pretreated surface obtained in step S100 and left to stand in a controlled temperature and humidity environment, so that the phase separation inducer self-assembles and condenses into nuclei on the coating surface, inducing phase separation of the photosensitive resin matrix and forming a wet film structure with micron-scale droplet array and nanoparticles distributed.

[0048] The specific implementation process is as follows:

[0049] Step S301: Precision wet film coating: The substrate pretreated in step S100 is smoothly transported to the coating station. To ensure the uniformity of the final anti-slip structure, the initial wet film thickness must be precisely controlled. In this embodiment, high-pressure air atomization spraying (suitable for curved substrates) or a micron-level wire bar coater (suitable for planar substrates) is used for application. The anti-slip precursor solution prepared in step S200 is uniformly coated onto the substrate surface, and the wet film thickness is strictly controlled between 15μm and 40μm by adjusting the spray gun flow rate or wire bar type.

[0050] It should be further noted that if the wet film thickness is less than 15μm, the micro-pits formed later can easily penetrate the coating and reach the substrate, resulting in insufficient structural strength of the anti-slip layer; if the thickness exceeds 40μm, non-good solvents are difficult to migrate to the surface effectively and are easily trapped inside the coating to form closed-cell bubbles, resulting in a decrease in coating transparency.

[0051] Step S302: Establishment of the Phase Separation Environment: After coating, immediately transfer the substrate to a constant temperature and humidity leveling zone. The environmental parameters in this zone are key variables determining the microstructure morphology. Control the ambient temperature at 20℃-35℃, the relative humidity (RH) at 45%-65%, and maintain laminar flow with a slight breeze (wind speed <0.5m / s) within the zone to avoid strong winds disturbing the liquid film surface. Under this specific temperature and humidity environment, the solvent evaporation rate in the coating is optimally controlled, preventing instantaneous skin formation due to excessively rapid evaporation and sagging due to excessively slow evaporation.

[0052] Step S303: Thermodynamic Instability Induction and Nucleation: Under constant temperature and humidity, the coating enters the static induction period. Since the precursor solution contains both "good solvents" (the photosensitive resin itself and the reactive diluent) and "volatile non-good solvents" (such as ethanol / water), the thermodynamic equilibrium of the coating surface is disrupted in the initial static stage as highly volatile solvents such as ethanol begin to escape from the surface. At this time, spinolysis or nucleation-growth processes occur inside the coating. The remaining non-good solvent molecules, originally dissolved in the system, begin to precipitate in the resin matrix due to decreased solubility, self-assembling and aggregating into tiny spherical droplets. These microdroplets, due to surface tension, spontaneously float upwards and arrange themselves at the gas-liquid interface, forming a "liquid template" of micron-sized pits.

[0053] Step S304: Marangoni Convection and Nanoparticle Migration: During the 45-120 second settling time window, the microstructure further evolves. Due to the heat carried away by solvent evaporation, the surface temperature of the coating is slightly lower than that of the interior. Combined with local differences in surface tension, significant Marangoni convection occurs within the coating. This microscale liquid flow generates a hydrodynamic driving force, carrying hydrophobically modified nanoparticles (such as nano-silica) dispersed in the resin to migrate and accumulate on the coating surface and at the edges of the microdroplets. Final structural morphology: After approximately 60-90 seconds of settling, a highly ordered structure forms on the coating surface—the liquid resin matrix encapsulates regularly arranged micron-sized non-good solvent droplets (approximately 2-10 μm in diameter), while the nanoparticles are tightly embedded in the gaps and edges of these microdroplets. This constructs the "micro-nano dual-scale phase separation precursor structure" described in this invention, preparing for the next step of curing and shaping.

[0054] S400, Step-by-step curing and microstructure shaping: The wet film structure formed in step S300 is subjected to step-by-step ultraviolet curing treatment; first, pre-curing is performed to fix the shape of the micron-sized droplet array, then the volatile non-good solvent is completely evaporated, leaving a micron-sized pit structure on the coating surface, and finally, complete curing is performed to obtain a transparent anti-slip coating with a composite structure of micron-sized pits and nanoparticles on the smooth substrate surface.

[0055] The specific implementation process is as follows:

[0056] Step S401: Low-temperature, low-energy pre-curing: The coated substrate that has completed phase separation and self-assembly (at this point, the surface is in a wet film state and is extremely fragile) is placed into the first-stage UV curing zone. A cold light source UV-LED lamp array is used as the radiation source, emitting monochromatic ultraviolet light with a peak wavelength of 365nm or 395nm. This wavelength band can effectively initiate photoinitiators but produces almost no infrared thermal radiation, avoiding interference from heat on solvent evaporation. The irradiation energy is strictly controlled within an extremely low range of 30-60mJ / cm².

[0057] It should be further explained that this dose of ultraviolet light is sufficient to induce partial polymerization of the photosensitive resin matrix, reaching the "gel point." At this point, the resin matrix transforms from a flowing liquid into a semi-solid, jelly-like gel, thereby "freezing" and locking the spatial positions of the microdroplet array and nanoparticles formed in S300. Although the coating hardness is still low at this stage, it is already able to resist the changes in surface tension during subsequent solvent evaporation, preventing the micro-pit structure from fusing or collapsing.

[0058] Step S402: Thermal Removal of Micro-area Solvents: The pre-cured semi-solid coating enters an infrared (IR) drying tunnel. The tunnel temperature is set to 40℃-60℃, and the dwell time is 1-3 minutes. The coating is gently heated using the penetrating heating characteristics of infrared radiation. During this process, the "phase separation inducing agent / poor solvent" that originally occupied the micron-sized droplet positions vaporizes upon heating, expands in volume, and breaks through the semi-solid resin skin to escape. Because the resin skeleton has been pre-locked in S401, clear and regular cavities are left in situ after the solvent evaporates. This forms upward-opening honeycomb-like micron-sized pits on the coating surface. These pits are the physical basis for the subsequent "vacuum suction cup effect."

[0059] Step S403: High-Energy Complete Curing: After complete solvent removal, the substrate immediately enters the second-stage UV curing zone. A high-pressure mercury lamp or a high-power metal halide lamp is used as the radiation source to provide high-intensity ultraviolet light across the entire wavelength range. The irradiation energy is set to 600-1200 mJ / cm² for instantaneous intense light irradiation. Under this high-energy excitation, the remaining double bonds in the resin system undergo complete transformation, the crosslinking density increases sharply, and the coating rapidly hardens and shrinks.

[0060] It should be further explained that this step gives the coating its final mechanical strength, making its pencil hardness reach 3H-6H (depending on the substrate), and it has excellent abrasion resistance, water resistance and chemical resistance, and can withstand long-term trampling and friction without damage.

[0061] Step S404: Finished Product Cooling and Performance Testing: After curing, the substrate is allowed to cool naturally or by air to room temperature, resulting in a transparent, superhydrophobic, anti-slip coating based on micro / nano dual-scale phase separation technology. Key performance indicators of the final product are tested to verify the comprehensive effectiveness of the S100-S400 processes.

[0062] 1. Transmittance Test: The transmittance of visible light is measured using a transmittance meter. The coating is almost invisible to the naked eye and does not affect the original texture of the substrate.

[0063] 2. Microstructure observation: Under a scanning electron microscope (SEM), micro-pits with a diameter of 2-10 μm can be seen densely distributed on the surface, and nanoparticles are uniformly distributed at the edges of the pits and the protrusions.

[0064] 3. Anti-slip performance test:

[0065] Dry state: Due to the effect of the nano hydrophobic layer, it has a delicate and smooth feel and is not easy to attract dust.

[0066] Wet / Pressurized State: When pressure is applied or water is encountered, the air in the micron-sized pits is expelled, creating a local vacuum and generating a strong adsorption force (micro-suction cup effect). The measured wet static friction coefficient is... It far exceeds the 0.2-0.3 of ordinary smooth surfaces, significantly improving safety.

[0067] The above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions will not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for anti-slip treatment of a smooth surface material, characterized in that, Includes the following steps: S100: Substrate pretreatment: The smooth substrate surface is cleaned and activated to improve the surface energy of the substrate surface, and a transparent base coating is applied according to the substrate material to form a pretreated surface with active grafting sites. S200: Preparation of anti-slip precursor solution: Prepare UV-curable anti-slip precursor solution, wherein the precursor solution comprises a photosensitive resin matrix, hydrophobically modified nanoparticles, a photoinitiator, and a phase separation inducing agent; wherein the phase separation inducing agent contains at least one volatile non-good solvent that is immiscible with the photosensitive resin matrix. S300: Construction of micro-nano dual-scale structure: The anti-slip precursor solution prepared in step S200 is uniformly coated on the pretreated surface obtained in step S100 and left to stand in a controlled temperature and humidity environment, so that the phase separation inducer self-assembles and condenses into nuclei on the coating surface, inducing phase separation of the photosensitive resin matrix and forming a wet film structure with micron-scale droplet arrays and nanoparticles distributed therein. S400: Step-by-step curing and microstructure shaping: The wet film structure formed in step S300 is subjected to step-by-step ultraviolet curing treatment; first, pre-curing is performed to fix the shape of the micron-sized droplet array, then the volatile non-good solvent is completely evaporated, leaving a micron-sized pit structure on the coating surface, and finally, complete curing is performed to obtain a transparent anti-slip coating with a composite structure of micron-sized pits and nanoparticles on the smooth substrate surface.

2. The security verification method based on multi-dimensional data fusion according to claim 1, characterized in that, Step S100 specifically includes: The smooth substrate is selected from any one of flat glass, glazed ceramics, polished stone or metal sheet. The activation treatment employs one or a combination of low-temperature plasma treatment, corona discharge treatment, or chemical etching treatment to reduce the water contact angle on the substrate surface to below 10°.

3. The security verification method based on multi-dimensional data fusion according to claim 2, characterized in that, Step S100 further includes: the transparent base coating is a silane coupling agent hydrolysate, wherein the silane coupling agent is selected from at least one of γ-methacryloyloxypropyltrimethoxysilane, γ-glycidyl etheroxypropyltrimethoxysilane, and vinyltrimethoxysilane, and the thickness of the transparent base coating after coating and drying is controlled between 50 nm and 500 nm.

4. The security verification method based on multi-dimensional data fusion according to claim 3, characterized in that, In step S200, the anti-slip precursor solution is composed of the following components in parts by weight: Fluorine-modified acrylate oligomers: 30-50 parts; Multifunctional acrylate reactive diluent: 40-60 parts; Hydrophobically modified nanoparticles: 2-8 parts; Photoinitiator: 3-5 parts; Phase separation inducer: 15-30 parts; Leveling agent: 0.1-1 part; The fluorinated modified acrylate oligomer is selected from at least one of hexafluorobutyl acrylate modified polyurethane and perfluoropolyether modified epoxy acrylate, and its refractive index is 1.45-1.

55.

5. A security verification method based on multi-dimensional data fusion according to claim 4, characterized in that, Step S200 further includes: The hydrophobically modified nanoparticles are nano-silica or nano-alumina with a surface modified by methyltrimethoxysilane or hexamethyldisilazane, and their average particle size is 10nm-50nm. The phase separation inducer is a volatile solvent with a boiling point between 50°C and 100°C, selected from anhydrous ethanol, isopropanol, ethyl acetate, or mixtures thereof, and the difference in solubility parameter of the phase separation inducer in the photosensitive resin matrix is... Greater than 2.0 .

6. The security verification method based on multi-dimensional data fusion according to claim 5, characterized in that, Step S300 specifically includes: applying the precursor solution to the substrate surface by high-pressure air atomization spraying or wire bar coating, and controlling the wet film thickness to be 15μm-40μm; The controlled temperature and humidity environment is: temperature 20℃-35℃, relative humidity 45%-65%.

7. A security verification method based on multi-dimensional data fusion according to claim 6, characterized in that, Step S300 also includes: The specific process of the settling is as follows: the coating is settling for 45 to 120 seconds under the specified temperature and humidity environment. During this period, a surface tension gradient is established by utilizing the difference in evaporation rates between the volatile non-good solvent and the photosensitive resin matrix, which induces Marangoni convection inside the coating. Through the convection, the hydrophobic modified nanoparticles are driven to migrate and accumulate at the gas-liquid interface. At the same time, the volatile non-good solvent self-assembles on the coating surface to form a regular array of microdroplets with a diameter of 2 μm to 10 μm, thereby constructing a phase-separated precursor structure in which micron-sized droplets and nanoparticles coexist.

8. A security verification method based on multi-dimensional data fusion according to claim 7, characterized in that, Step S400 specifically includes: The pre-curing process uses a low-power ultraviolet LED light source for irradiation, with a peak wavelength of 365nm or 395nm and an irradiation energy controlled at 30-60mJ / cm², so that the photosensitive resin matrix undergoes partial cross-linking to reach the gel point, thereby locking the spatial morphology of the micron-sized droplet array. The process of complete evaporation of the volatile non-good solvent is as follows: after pre-curing, the coating is placed in an infrared drying oven at 40℃-60℃ for 1-3 minutes to completely vaporize and remove the droplets occupying the micro-area position, forming honeycomb-shaped micro-pits with upward openings on the coating surface.

9. A security verification method based on multi-dimensional data fusion according to claim 8, characterized in that, Step S400 further includes: The complete curing process is carried out by irradiation with a high-pressure mercury lamp or a high-power UV curing machine, with the irradiation energy controlled at 600-1200mJ / cm², so that the coating is completely cross-linked and hardened. The transparent anti-slip coating obtained after step S400 has the following characteristics: visible light transmittance. Water contact angle wet static friction coefficient .

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